Washing device, adjustment jig and adjustment method

JP2025122882A5Pending Publication Date: 2026-08-05SHIBAURA MECHATRONICS CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
SHIBAURA MECHATRONICS CORP
Filing Date
2024-02-09
Publication Date
2026-08-05

AI Technical Summary

Technical Problem

In substrate cleaning apparatuses using brush scrubbing, impurities removed from the substrate can adhere to the brush and contaminate the next substrate, leading to a deterioration in substrate quality.

Method used

A cleaning apparatus with a substrate cleaning unit that cleans both sides of the substrate using rotating brushes and a brush cleaning unit that cleans the brushes by discharging brush cleaning liquid onto their contact surfaces while retracted, supported by a unit that prevents interference between discharge paths, and an adjustment jig for precise positioning of discharge units.

Benefits of technology

Maintains the cleanliness of the brushes, thereby improving the quality of the substrates being cleaned.

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Abstract

To provide a washing device which improves the quality of a substrate by maintaining cleanliness of a brush which washes the substrate, an adjustment jig and an adjustment method.SOLUTION: A washing device comprises a support section 63 which includes a first discharge part 62A and a second discharge part 62B for discharging brush cleaning liquids CL1 and CL2 so as to be linearly deposited on a contact surface 351 of a first brush 35A and a second brush 35B for washing a substrate in a state where the first brush 35A and the second brush 35B are located at retreat positions deviated from the substrate, and supports the first discharge part 62A and the second discharge part 62B so as not to be interfered mutually until the brush cleaning liquids CL1 and CL2 are deposited on the contact surface of the first brush 35A and the second brush 35B.SELECTED DRAWING: Figure 3
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Description

[Technical Field]

[0001] The present invention relates to a cleaning device, an adjustment jig, and an adjustment method. [Background technology]

[0002] Substrate processing equipment is used in the manufacturing process of semiconductors, liquid crystal panels, etc. to process the surface of a substrate (e.g., a wafer or liquid crystal substrate) with a chemical solution, rinse the substrate with a rinse solution after the chemical processing, and dry the substrate after rinsing. This type of substrate processing equipment uses a single-wafer processing method, in which substrates are processed one by one, for reasons of uniformity and reproducibility. In a single-wafer processing equipment, the substrate is placed on a turntable, and a processing solution such as a chemical solution is supplied to the substrate on the rotating turntable, and the substrate is processed with the processing solution.

[0003] After the substrate processing step using this processing liquid, the substrate is cleaned using a substrate cleaning apparatus to maintain a high level of cleanliness. Furthermore, when multiple substrate processing steps using several types of processing liquids are performed, the substrate may be cleaned using a substrate cleaning apparatus after each step to maintain a high level of cleanliness. Brush scrubbing is used as a substrate cleaning method using such a substrate cleaning apparatus. In scrubbing, the substrate is rotated and a brush is moved horizontally while in contact with the surface of the substrate to remove impurities (metals, organic matter, particles, etc.) from the substrate. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 7-283180 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in a substrate cleaning apparatus using the above-described scrubbing method, impurities removed from the substrate may adhere to the brush and contaminate the next substrate to be cleaned, resulting in a deterioration in the quality of the substrate.

[0006] The embodiments of the present invention have been proposed to solve the above-mentioned problems, and their purpose is to provide a substrate cleaning apparatus, an adjustment jig, and an adjustment method that can maintain the cleanliness of a brush used to clean a substrate and improve the quality of the substrate. [Means for solving the problem]

[0007] In order to solve the above-mentioned problems, a cleaning apparatus according to an embodiment includes a substrate cleaning unit that cleans a first surface and a second surface of a substrate while holding and rotating the substrate by bringing a circular contact surface of a rotating first brush into contact with the first surface of the substrate while supplying substrate cleaning liquid to the first surface of the substrate, and bringing a circular contact surface of a rotating second brush into contact with the second surface of the substrate while supplying substrate cleaning liquid to the second surface of the substrate, and a brush cleaning unit that cleans the first brush by discharging brush cleaning liquid from a discharge unit onto each contact surface of the first brush and the second brush while the first brush and the second brush are in retracted positions outside the area where the substrate is held. and a brush cleaning unit that cleans the first brush and the second brush, the discharge unit including a first discharge unit that discharges brush cleaning liquid so that the liquid lands in a straight line on the contact surface of the first brush, and a second discharge unit that discharges brush cleaning liquid so that the liquid lands in a straight line on the contact surface of the second brush, and the brush cleaning unit has a support unit that supports the first discharge unit and the second discharge unit so that the brush cleaning liquid discharged from the first discharge unit and the second discharge unit do not interfere with each other until the brush cleaning liquid lands on the contact surfaces of the first brush and the second brush.

[0008] The cleaning device of the embodiment includes a substrate cleaning unit that cleans one side of a rotating substrate by contacting the circular contact surface of a brush that is held and rotated while supplying substrate cleaning liquid to the one side of the substrate; a brush cleaning unit that cleans the brush by discharging brush cleaning liquid from a discharge unit onto the contact surface while the brush is in a retracted position outside the area where the substrate is held; and a support unit that supports the discharge unit, wherein the support unit includes a rectangular pillar-shaped fixing joint that supports the discharge unit and has an internal flow path that supplies brush cleaning liquid to the discharge unit; and a fixture into which the fixing joint is inserted, which includes multiple surfaces with which multiple side surfaces of the fixing joint contact, and which has an insertion hole that fixes the angle of the fixing joint.

[0009] The adjustment jig of the embodiment is an adjustment jig for adjusting the positions of the first and second discharge portions of a cleaning device, and includes a liquid receiving plate onto which the brush cleaning liquid from the first and second discharge portions arrives at positions corresponding to the contact surfaces of the first and second brushes, reference holes which are multiple through holes arranged in a line corresponding to the respective liquid receiving areas of the brush cleaning liquid from the first and second discharge portions on the liquid receiving plate, and a fixing portion which selectively fixes the liquid receiving plate to either the position corresponding to the contact surface of the first brush or the position corresponding to the contact surface of the second brush.

[0010] An adjustment method of an embodiment is a method for adjusting the positions of the first discharge unit and the second discharge unit of the cleaning device using an adjustment jig, and includes: a first fixing step of fixing the liquid arrival plate at a position corresponding to the contact surface of the first brush; a first liquid arrival step of, after the first fixing step, discharging brush cleaning liquid from the first discharge unit to cause the brush cleaning liquid to be applied to the liquid arrival plate; a first adjustment step of adjusting the position of the first discharge unit based on the passage status of the brush cleaning liquid through the multiple reference holes in the first liquid arrival step; a second fixing step of fixing the liquid arrival plate at a position corresponding to the contact surface of the second brush; a second liquid arrival step of, after the second fixing step, discharging brush cleaning liquid from the second discharge unit to cause the brush cleaning liquid to be applied to the liquid arrival plate; and a second adjustment step of adjusting the position of the second discharge unit based on the passage status of the brush cleaning liquid through the multiple reference holes in the second liquid arrival step. [Effects of the Invention]

[0011] According to an embodiment of the present invention, the cleanliness of the brushes that clean the substrates can be maintained, thereby improving the quality of the substrates. [Brief explanation of the drawings]

[0012] [Figure 1] 1 is a perspective side view showing a schematic configuration of a cleaning device according to an embodiment. [Figure 2] 1 is a plan view showing a schematic configuration of a cleaning device according to an embodiment. [Figure 3] FIG. 2 is a front view showing a brush cleaning unit of the cleaning device according to the embodiment. [Figure 4] FIG. 2 is a perspective view showing a brush cleaning unit and an adjustment jig. [Figure 5] An explanatory diagram showing the angle at which brush cleaning liquid is ejected onto the brush by the ejection unit, where (A) is a diagram of the brush seen from the back of the first ejection unit, and (B) is a diagram of the brush seen from the back of the second ejection unit. [Figure 6] 1A is a plan view showing an area where the liquid is applied to a first brush, and FIG. 1B is a plan view showing an area where the liquid is applied to a second brush. [Figure 7]FIG. [Figure 8] FIG. 2A is a perspective view showing a first fixture, and FIG. 2B is a perspective view showing a second fixture. [Figure 9] FIG. 10 is a perspective view showing the fixing joint supporting the first discharge portion before it is inserted into the first fixture. [Figure 10] 10 is a perspective view showing the state after the fixing joint supporting the first discharge portion is inserted into the first fixing tool. FIG. [Figure 11] FIG. 2 is a perspective view showing a first fixture and a second fixture before they are attached to a holder. [Figure 12] FIG. 10 is a perspective view showing the fixing joint supporting the second discharge portion before it is inserted into the second fixture. [Figure 13] FIG. 10 is a perspective view showing the state after the fixing joint supporting the second discharge portion is inserted into the second fixing tool. [Figure 14] FIG. 10 is a perspective view showing a first discharge portion whose angle is determined by an angle determining portion. [Figure 15] FIG. 4 is a horizontal cross-sectional view showing the cover. [Figure 16] FIG. 10 is a front view showing the base plate attached to the fixed plate. [Figure 17] 1A is a front view, FIG. 1B is a plan view, and FIG. 1C is a side view showing an adjustment jig. [Figure 18] FIG. 10A is an explanatory diagram showing confirmation of the discharge of brush cleaning liquid from the first discharge unit using an adjustment jig, and FIG. 10B is an explanatory diagram showing confirmation of the discharge of brush cleaning liquid from the second discharge unit using an adjustment jig. DETAILED DESCRIPTION OF THE INVENTION

[0013] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. As shown in Figures 1 and 2, this embodiment is a cleaning apparatus 1 that cleans a substrate W using a substrate cleaning liquid SL and a brush 35 while rotating the substrate W. The substrate W to be cleaned is typically a semiconductor wafer, but may also be a substrate for a display device, etc.

[0014] The substrate W has a disk shape. In the following description, the top and bottom surfaces of the substrate W are referred to as the front surface (first surface) and back surface (second surface), and when referring to both the front surface and back surface, the front and back surfaces of the substrate W are referred to. The outer peripheral edge surface is a side surface of the substrate W other than the front and back surfaces. In FIG. 1, the vertical direction is the Z direction, and in the horizontal direction perpendicular to the Z direction, the left-right direction when viewed from the front (right side of FIG. 1) is the X direction, and the front-rear direction perpendicular to the X direction is the Y direction.

[0015] [composition] 1 and 2, the cleaning apparatus 1 includes a chamber 10, a rotation drive unit 20, a substrate cleaning unit 30, a brush drive unit 40, a cleaning liquid discharge unit 50, a brush cleaning unit 60, and a control unit 100. An adjustment jig 70 is used to adjust the positions of a first discharge unit 62A and a second discharge unit 62B in the brush cleaning unit 60 (see FIG. 4). Note that FIG. 1 is a see-through view of the inside of the chamber 10, and FIG. 2 is a plan view of the inside of the chamber 10. An enlarged view of the brush cleaning unit 60 is shown in FIG. 3.

[0016] (Chamber) The chamber 10 is a container having a cleaning chamber 11 for cleaning the substrate W that is loaded into it. The chamber 10 is a rectangular parallelepiped housing, and the internal space serves as the cleaning chamber 11. The bottom of the chamber 10 is indicated by 10a. Although not shown, a loading / unloading port is provided on one side of the chamber 10 for loading and unloading the substrate W by a transfer robot, and a working port for maintenance work is provided on the other side. The loading / unloading port and the working port are each configured to be openable and closable by doors driven by opening / closing mechanisms. Although not shown, a drainage port is formed in the bottom 10a of the chamber 10. The substrate cleaning liquid and brush cleaning liquid that fall onto the bottom 10a of the chamber 10 are discharged to the outside of the cleaning apparatus 1 via the drainage port.

[0017] (Rotation drive unit) 2, the rotation drive unit 20 rotates a plurality of rollers 20a that hold the outer periphery of the substrate W, thereby driving the substrate W to rotate. As shown in Fig. 1, the rotation drive unit 20 has a first holding unit 21 and a second holding unit 22. The first holding unit 21 and the second holding unit 22 are arranged at positions that face each other in the left-right direction in Fig. 2 with respect to the center of the substrate W.

[0018] The first holding unit 21 and the second holding unit 22 each have a pair of rollers 20a. The rollers 20a are rotatable about an axis perpendicular to the direction in which the surface of the substrate W extends. Each roller 20a has a large-diameter portion having a cylindrical shape and a small-diameter portion having a small diameter and arranged coaxially with the large-diameter portion. The rollers 20a hold the substrate W by abutting the side of the small-diameter portion against the outer periphery of the substrate W. The rollers 20a are made of a material that is resistant to the substrate cleaning liquid SL, such as PEEK.

[0019] A rotation mechanism such as a motor that rotates roller 20a is housed inside first holding unit 21 and second holding unit 22. Furthermore, first holding unit 21 and second holding unit 22 are configured so that roller 20a can be moved in a direction toward and away from substrate W by a drive mechanism (not shown). When first holding unit 21 and second holding unit 22 are moved in directions away from each other by the drive mechanism, roller 20a reaches a release position where it is separated from substrate W. When first holding unit 21 and second holding unit 22 are moved in directions toward each other by the drive mechanism, roller 20a reaches a holding position where it contacts and holds substrate W.

[0020] (Substrate cleaning section) The substrate cleaning unit 30 has brushes 35 that clean the surface of the rotating substrate W by rotating and contacting the surface of the substrate W. The brushes 35 include a first brush 35A and a second brush 35B. The first brush 35A and the second brush 35B each have a contact surface 351 with the substrate W. The first brush 35A and the second brush 35B are cylindrical, and each contact surface 351 is circular (see FIG. 6). The first brush 35A and the second brush 35B are provided coaxially and are arranged one above the other so that their contact surfaces 351 face each other.

[0021] When there is no need to distinguish between the first brush 35A and the second brush 35B, they are simply referred to as the brush 35. Note that contact between the brush 35 and the surface of the substrate W includes both a case where the contact surface 351 of the brush 35 is in direct contact with the substrate W and a case where the contact surface 351 is in contact with the substrate W via the substrate cleaning liquid SL. The brush 35 is made of a flexible and elastic material.

[0022] The brush 35 is made of a spongy resin such as PVA (nylon resin) or PTFE (fluorine resin). A bristle brush made of a similar resin may also be used. In other words, the brush 35 may be a spongy mass or a mass of numerous densely packed hairs. The spongy mass of the brush 35 may also be a mass of multiple densely packed fibers. In such cases, a contact surface 351 that is not strictly flat comes into contact with the substrate W.

[0023] 1, brush 35 is detachably mounted on a support provided on cylindrical body 31 via brush holder 32. Body 31 has a built-in motor (not shown) that is a drive source for rotating brush 35.

[0024] (Brush drive unit) The brush driving unit 40 moves the substrate cleaning unit 30 in a direction parallel to the surface of the substrate W. As shown in FIG. 1, the brush driving unit 40 has an arm 41 and a driving mechanism 42. The arm 41 is a member that extends in a direction parallel to the substrate W, and has the substrate cleaning unit 30 attached to one end. The first brush 35A is supported by a first arm 41A, and the second brush 35B is supported by a second arm 41B, but when there is no need to distinguish between the two, they will simply be referred to as arm 41. The driving mechanism 42 has a swinging mechanism and a lifting mechanism.

[0025] As shown in FIG. 2, the swing mechanism reciprocates the arm 41 parallel to the substrate W, from the outer periphery of the substrate W to the opposite outer periphery, along an arcuate trajectory with the end opposite the substrate cleaning unit 30 as its axis. The swing mechanism also reciprocates the arm 41 so that the arm 41 moves from a retracted position outside the area where the substrate W is held to the outer periphery of the substrate W. In FIG. 2, the first arm 41A and the substrate cleaning unit 30 are indicated by a two-dot chain line when the brush 35 is positioned at the retracted position. The retracted position also serves as a brush cleaning position where the brush 35 is cleaned by the brush cleaning unit 60, as will be described later. The swing mechanism includes a spindle extending from the other end of the arm 41 in a direction perpendicular to the surface of the substrate W, and a motor (not shown) that serves as a drive source for swinging the spindle. When cleaning the substrate W is not being performed, the arm 41 is positioned so that the brush 35 is positioned at the retracted position.

[0026] The lifting mechanism moves the arm 41 in a direction in which the substrate cleaning unit 30 approaches or moves away from the substrate W. A ball screw mechanism, a cylinder, or the like that raises and lowers the support shaft of the arm 41 can be used as the lifting mechanism. As shown in FIG. 3, the lifting mechanism of this embodiment raises and lowers the arm 41 so that the contact surface 351 of the first brush 35A and the contact surface 351 of the second brush 35B are spaced apart when the brush 35 is in the retracted position. More specifically, the lifting mechanism raises and lowers the first arm 41A so that the position of the contact surface 351 of the first brush 35A coincides with the position of a first liquid contact surface 71a of the adjustment jig 70 when the adjustment jig 70, which will be described later, is attached (see FIG. 18(A)). In addition, the lifting mechanism raises and lowers the second arm 41B so that the position of the contact surface 351 of the second brush 35B is the position of the second liquid contact surface 71b of the adjustment jig 70 when the adjustment jig 70 described below is attached (see Figure 18(B)).

[0027] (Cleaning liquid discharge part) The cleaning liquid discharge unit 50 discharges the substrate cleaning liquid SL onto the substrate W. The cleaning liquid discharge unit 50 discharges the substrate cleaning liquid SL from a nozzle 51 toward both surfaces of the rotating substrate W. In this embodiment, the substrate cleaning liquid SL is ozone water, pure water, or SC-1 (a cleaning liquid made by mixing ammonia water and hydrogen peroxide water). The cleaning liquid discharge unit 50 is connected to a supply mechanism for the substrate cleaning liquid SL (not shown) via piping. The supply mechanism has a liquid delivery device, valves, etc. connected to a pure water production device (pure water storage tank), an ozone water production device (ozone water storage tank), and an SC-1 supply device, and is capable of switching between supplying pure water, ozone water, and SC-1.

[0028] The substrate cleaning unit 30, brush driving unit 40, and cleaning liquid discharge unit 50 as described above are provided as a pair above and below the substrate W so as to be able to clean both the front and back surfaces of the substrate W. That is, in the pair of substrate cleaning units 30, the first arm 41A and the second arm 41B of the brush driving unit 40 are arranged above and below the substrate W so that the contact surfaces 351 of the first brush 35A and the second brush 35B, respectively, face the substrate W. The driving mechanism 42 moves the first arm 41A and the second arm 41B between a contact position where the first brush 35A and the second brush 35B are in contact with the substrate W so as to sandwich the substrate W therebetween, and a separated position where they are separated from the substrate W.

[0029] The drive mechanism 42 also moves the first brush 35A and the second brush 35B, which are in the contact position, along an arc trajectory by swinging the first arm 41A and the second arm 41B. Furthermore, the first brush 35A and the second brush 35B are cleaned by a brush cleaning unit 60, which will be described later, at a retracted position away from the substrate W.

[0030] (Brush cleaning section) 3, the brush cleaning unit 60 cleans the first brush 35A and the second brush 35B with brush cleaning liquid CL while the first brush 35A and the second brush 35B are in the retracted position. In the following description, the cleaning liquid discharged by the first brush 35A will be referred to as brush cleaning liquid CL1, and the cleaning liquid discharged by the second brush 35B will be referred to as brush cleaning liquid CL2. When there is no need to distinguish between the two, they will be referred to as brush cleaning liquid CL. The brush cleaning unit 60 has a fixed plate 61, a discharge unit 62, a support unit 63, a support column 64, and a cover 65.

[0031] <Fixed plate> As shown in FIGS. 1 and 4, the fixed plate 61 is a plate member that stands vertically from the bottom 10a of the chamber 10.

[0032] <Discharge part> As shown in FIGS. 4 and 5, the discharge unit 62 discharges the brush cleaning liquid CL onto the contact surface 351 to clean the first brush 35A and the second brush 35B. The discharge unit 62 includes a first discharge unit 62A and a second discharge unit 62B. As shown in FIG. 6A, the first discharge unit 62A discharges the brush cleaning liquid CL1 so that it is applied in a linear manner to the contact surface 351 of the first brush 35A. This liquid application area is referred to as LA1. As shown in FIG. 6B, the second discharge unit 62B discharges the brush cleaning liquid CL2 so that it is applied in a linear manner to the contact surface 351 of the second brush 35B. This liquid application area is referred to as LA2. In the planar direction of the contact surfaces 351 of the first brush 35A and the second brush 35B, the linear extension direction of the liquid application area LA1 is different from the linear extension direction of the liquid application area LA2. The first discharge part 62A and the second discharge part 62B discharge the brush cleaning liquid CL from the outside of the first brush 35A and the second brush 35B so that the discharge direction (the direction in which the axis of a nozzle tip 621 of the discharge part 62, which will be described later, extends) is oblique to the contact surface 351. For example, it is preferable that the discharge direction be 35° to 45° with respect to the contact surface 351. Hereinafter, when there is no need to distinguish between the first discharge part 62A and the second discharge part 62B, they will simply be referred to as the discharge part 62. When there is no need to distinguish between the liquid landing areas LA1 and LA2, they will simply be referred to as the liquid landing area LA.

[0033] The discharge part 62 has a cylindrical nozzle tip 621. That is, the discharge part 62 of this embodiment is a so-called nozzle that discharges the brush cleaning liquid CL. An elliptical discharge port 622 is formed at the tip of the nozzle tip 621. As a result, as shown in FIGS. 3 and 5, the brush cleaning liquid CL discharged from the discharge port 622 spreads in a fan-shaped surface from the discharge port 622, and as shown in FIG. 6, a linear liquid landing area LA is formed on the contact surface 351 of the brush 35 along the major axis direction of the discharge port 622. The brush cleaning liquid CL spreading in a fan-shaped surface means that the cross section of the spray pattern of the discharged brush cleaning liquid CL spreads in a flattened shape. The liquid landing area LA may be formed in an elongated ellipse. That is, the discharge part 62 (nozzle tip 621) may be one in which the liquid landing area LA forms an elongated elliptical spray pattern. In this way, even if the liquid landing area LA bulges in the width direction perpendicular to the longitudinal direction, the linear shape is included. A thread groove is cut on the outer periphery of the rear end of the nozzle tip 621, and the nozzle tip 621 is screwed and fixed onto the end of a discharge portion side joint 633 (described later). By changing the amount of threading of the nozzle tip 621, the angle of the discharge port 622 centered on the axis of the nozzle tip 621 can be changed, and the angle of the liquid landing area LA on the contact surface 351 can be adjusted.

[0034] <Support part> The support portion 63 supports the first discharge portion 62A and the second discharge portion 62B. The first discharge portion 62A and the second discharge portion 62B supported by the support portion 63 are disposed in the area between the first arm 41A and the second arm 41B when the brush 35 is positioned at the retracted position, as shown in FIG.

[0035] Furthermore, the first discharge part 62A and the second discharge part 62B supported by the support part 63 are positioned so that the brush cleaning liquids CL1 and CL2 discharged from them do not interfere with each other. In other words, the support part 63 supports the first discharge part 62A and the second discharge part 62B so that the brush cleaning liquids CL1 and CL2 discharged in fan-shaped planes from the first discharge part 62A and the second discharge part 62B do not collide with each other before landing on the contact surface 351.

[0036] 6(A) and 6(B), the linear liquid landing area LA where the liquid lands on the contact surface 351 of the brush 35 from the discharge portion 62 is a length including the length from the outer periphery of the contact surface 351 to the center C. Furthermore, as shown in FIGS. 5(A) and 5(B), the surface where the brush cleaning liquid CL discharged from the discharge portion 62 spreads before landing on the contact surface 351 of the brush 35 is perpendicular to the contact surface 351.

[0037] As shown in FIG. 4, the support portion 63 includes a fixing joint 631, a fixture 632, a discharge portion side joint 633, a supply side joint 634 (see FIG. 9), a holder 635, and a base plate 636.

[0038] As shown in FIGS. 3, 4, 7, and 9, the fixing joint 631 supports the discharge portion 62, has a flow path therein that supplies the brush cleaning liquid CL to the discharge portion 62, and has corners on its outer periphery. In this embodiment, the fixing joint 631 supports the discharge portion 62 via a discharge portion-side joint 633, which will be described later. The fixing joint 631 has a rectangular column shape. As shown in FIG. 7, the fixing joint 631 of this embodiment includes rectangular parallelepiped blocks 631a and 631b. The blocks 631a and 631b are rotatably connected to each other.

[0039] As shown in FIG. 8 , the fixture 632 has an insertion hole 632c into which the fixing joint 631 is inserted, including multiple surfaces with which multiple side surfaces of the fixing joint 631 abut, and which fixes the angle of the fixing joint 631. The insertion hole 632c also has an abutment surface 632d against which the end of the inserted fixing joint 631 abuts, determining the position of the fixing joint 631 in the insertion direction. The fixture 632 of this embodiment is a cylindrical body with a rectangular parallelepiped shape, and one end of the insertion hole 632c is open and the other end is closed by the abutment surface 632d. Because the fixing joint 631 and the insertion hole 632c have a rectangular parallelepiped shape, the angle around an axis parallel to the insertion direction of the fixing joint 631 is fixed by the abutment of their four surfaces. Furthermore, an attachment plate 632e is fixed to the end of the fixture 632 on the abutment surface 632d side.

[0040] 9, when the rotatably connected blocks 631a and 631b of the fixing joint 631 are inserted into the insertion hole 632c, the four faces of the blocks 631a and 631b come into contact with the four faces of the insertion hole 632c, restricting rotation around the axis. Note that the fixing joint 631 inserted into the insertion hole 632c is fixed with fasteners B such as bolts through holes provided in the fixture 632, thereby restricting movement in the insertion direction.

[0041] 8(A) and 8(B), a side surface of fixing device 632 is formed with a discharge groove 632f into which a connecting portion between discharge side joint 633 and fixing joint 631, which will be described later, is inserted, and a supply groove 632g into which a connecting portion between supply side joint 634 and fixing joint 631 is inserted, from the open end. Discharge groove 632f and supply groove 632g have different lengths in the insertion direction. In other words, supply groove 632g is a deeper groove than discharge groove 632f.

[0042] Here, fixture 632 into which fixing joint 631 supporting first discharge portion 62A is inserted is referred to as first fixture 632A, and fixture 632 into which fixing joint 631 supporting second discharge portion 62B is inserted is referred to as second fixture 632B. As shown in FIG. 8(A), discharge portion groove 632f and supply groove 632g of first fixture 632A are formed on two adjacent side surfaces. As shown in FIG. 8(B), discharge portion groove 632f and supply groove 632g of second fixture 632B are formed on two opposing side surfaces.

[0043] As shown in Figures 3, 9 and 10, the discharge portion-side joint 633 has a flow path formed therein that supplies the brush cleaning liquid CL to the discharge portion 62, and is connected to the fixing joint 631 so that the angle of the discharge portion 62 fixed to the discharge portion-side joint 633 can be changed. The discharge portion-side joint 633 in this embodiment is an L-shaped block. As described above, the nozzle tip 621 is screwed into one end of the discharge portion-side joint 633 (see Figure 3). The other end of the discharge portion-side joint 633 is connected to the fixing joint 631.

[0044] The fixing joint 631 is inserted into the insertion hole 632c of the fixture 632, and the connection portion between the discharge portion side joint 633 and the fixing joint 631 is inserted into the discharge portion groove 632f. As a result, the discharge portion side joint 633 is supported so as to protrude from one side surface of the fixture 632.

[0045] 10, the first fixture 632A corresponding to the first discharge portion 62A is provided with an angle determining portion 632h that contacts the discharge portion-side joint 633 and determines the angle of the discharge portion 62. The angle determining portion 632h has an inclined surface 632i, and the inclined surface 632i contacts the side surface of the discharge portion-side joint 633, thereby determining the angle of the discharge portion-side joint 633.

[0046] As shown in FIGS. 3, 9, and 10, the supply-side joint 634 is connected to the fixing joint 631, has a flow path formed therein for supplying the brush cleaning liquid CL to the discharge unit 62, and is connected to a pipe 624a for supplying the brush cleaning liquid CL. In this embodiment, the supply-side joint 634 is an L-shaped block. As shown in FIG. 3, one end of the supply-side joint 634 is connected to the fixing joint 631, and the other end is connected to the liquid supply unit 624. The liquid supply unit 624 has a pipe 624a and a valve 624b connected to the other end of the supply-side joint 634, and a brush cleaning liquid CL supply device 624c connected to the pipe 624a. The brush cleaning liquid CL is, for example, pure water. The supply device 624c may be the same as that of the cleaning liquid discharge unit 50. Furthermore, part of the supply mechanism, such as the supply source of the brush cleaning liquid CL, may be common to the cleaning liquid discharge unit 50.

[0047] When fixing joint 631 is inserted into insertion hole 632c of fixture 632, the connection portion between supply-side joint 634 and fixing joint 631 is inserted into supply groove 632g. As a result, supply-side joint 634 is supported so as to protrude from one side surface of fixture 632 different from the surface from which discharge-side joint 633 protrudes.

[0048] The discharge portion 62 and the supply-side joint 634 are provided at positions spaced apart from each other in the insertion direction of the fixing joint 631 into the fixture 632. More specifically, the discharge portion-side joint 633 and the supply-side joint 634 are connected to different blocks 631a and 631b of the fixing joint 631, and the lengths of the discharge portion groove 632f and the supply groove 632g provided in the fixture 632 of the fixing joint 631 are different. As a result, the positions of the discharge portion 62 and the supply-side joint 634 are misaligned in the insertion direction.

[0049] Furthermore, the protruding direction of discharge portion-side joint 633 and the protruding direction of supply side joint 634 differ between first fastener 632A and second fastener 632B. Discharge portion groove 632f and supply groove 632g of first fastener 632A are formed on two adjacent side surfaces, so that discharge portion-side joint 633 and supply side joint 634 protrude from the two adjacent side surfaces. Discharge portion groove 632f and supply groove 632g of second fastener 632B are formed on two opposing side surfaces, so that discharge portion-side joint 633 and supply side joint 634 protrude from the two opposing side surfaces.

[0050] As shown in FIG. 4, the holder 635 secures the support part 63 to the cleaning device 1. The holder 635 includes a main body plate 635a, an extension plate 635b, and a support plate 635c. The main body plate 635a is a plate secured to the fixed plate 61 with fasteners B. As shown in FIG. 11, an attachment plate 632e of the second fixture 632B is secured to the main body plate 635a with fasteners B. The extension plate 635b is a plate extending vertically from the main body plate 635a (toward the left in FIG. 11). The support plate 635c is a plate secured to the end of the extension plate 635b opposite the main body plate 635a so as to face the main body plate 635a in parallel. As shown in FIGS. 11 and 12, an attachment plate 632e of the first fixture 632A is secured to the support plate 635c with fasteners B. First fixture 632A and second fixture 632B fixed to holder 635 are parallel in the longitudinal direction, and open ends face in opposite directions.

[0051] 4 and 16, the base plate 636 is a plate body fixed to the same surface of the fixed plate 61 to which the holder 635 is fixed. A scale member 636a for aligning the adjustment jig 70, which will be described later, is attached to the base plate 636. Mounting holes 636b and 636c for mounting the adjustment jig 70 are also formed in the base plate 636. The scale member 636a and the mounting holes 636b and 636c will be described together with the adjustment jig 70.

[0052] <Strut> As shown in FIGS. 1, 3 and 15, the support pillar 64 extends vertically from the bottom 10a of the chamber 10 at a position adjacent to the end of the fixed plate 61.

[0053] <Cover> The cover 65 is interposed between the first brush 35A and the second brush 35B in the retracted position and the substrate W, and prevents the brush cleaning liquid CL from splashing onto the substrate W. The cover 65 also covers the first discharge unit 62A and the second discharge unit 62B. As shown in the horizontal cross-sectional view of FIG. 15 , the cover 65 is a plate body that covers the periphery of the first brush 35A and the second brush 35B, and has a fixed cover 651 and an openable cover 652. The fixed cover 651 is fixed to the fixed plate 61. The fixed cover 651 has an opening 651a through which the first brush 35A and the second brush 35B can pass.

[0054] The openable cover 652 is fixed to a support 64 and rotates around the support 64 to open and close the opening 651a. The support 64 is rotatable by a drive source such as a motor (not shown), so the openable cover 652 rotates in accordance with the rotation of the support 64. A labyrinth structure, which is a curved ventilation path, is formed between the end of the openable cover 652 that closes the opening 651a and the end of the fixed cover 651. The bottom of the cover 65 is open, allowing the brush cleaning liquid CL to flow downward into the chamber 10. Although not shown, the fixed cover 651 and the openable cover 652 each have a notch at the top at a position corresponding to the body 31 of the first brush 35A. As a result, when the openable cover 652 is closed, the fixed cover 651 and the openable cover 652 cover the periphery of the body 31.

[0055] [Adjustment jig] The adjustment jig 70 is a tool for adjusting the positions of the first discharge unit 62A and the second discharge unit 62B of the cleaning apparatus 1. As shown in FIG. 17 , the adjustment jig 70 has a liquid receiving plate 71, a reference hole 72, and a fixing portion 73. The liquid receiving plate 71 is a plate body onto which the brush cleaning liquids CL1 and CL2 from the first discharge unit 62A and the second discharge unit 62B are received at positions corresponding to the contact surfaces 351 of the first brush 35A and the second brush 35B when the brushes are in the retracted position. One surface of the liquid receiving plate 71 is a first liquid receiving surface 71a onto which the brush cleaning liquid CL1 from the first discharge unit 62A is received, and the other surface is a second liquid receiving surface 71b onto which the brush cleaning liquid CL2 from the second discharge unit 62B is received.

[0056] The reference holes 72 are through-holes arranged in a line in the liquid arrival plate 71 corresponding to the liquid arrival areas LA1 and LA2 of the brush cleaning liquids CL1 and CL2 from the first and second discharge parts 62A and 62B, respectively. In this embodiment, the reference hole 72 provided for checking the liquid arrival area LA1 of the first discharge part 62A is referred to as the first reference hole 72a, and the reference hole 72 provided for checking the liquid arrival area LA2 of the second discharge part 62B is referred to as the second reference hole 72b.

[0057] The first reference hole 72a is, for example, an oval with its major axis parallel to the linear liquid landing area LA1 (see FIG. 6), and is composed of a plurality of through-holes (four in FIG. 17) arranged in a row at a position corresponding to the liquid landing area LA1. The second reference hole 72b is, for example, an oval with its major axis parallel to the linear liquid landing area LA2 (see FIG. 6), and is composed of a plurality of through-holes (four in FIG. 17) arranged in a row at a position corresponding to the liquid landing area LA2. In this embodiment, the first reference hole 72a and the second reference hole 72b are arranged at different angles in a plan view, but the through-holes at one end of each are formed to be connected. Therefore, the through-holes at one end of each have a shape obtained by combining two ovals at different angles. This one end corresponds to the center C of the contact surface 351.

[0058] The fixing portion 73 selectively fixes the liquid arrival plate 71 to either a position corresponding to the contact surface 351 of the first brush 35A or a position corresponding to the contact surface 351 of the second brush 35B (see Figure 18). The fixing portion 73 is a plate body in which one end side of the liquid arrival plate 71 is bent in a direction perpendicular to the liquid arrival plate 71. The fixing portion 73 is provided with a reference mark 73a and a mounting hole 73b. The reference mark 73a is a linear groove parallel to the liquid arrival plate 71. The mounting hole 73b is a through hole for fixing to the base plate 636 with a fastener B.

[0059] 16, a scale member 636a provided on a base plate 636 of the cleaning device 1 is provided with a first scale S1 for positioning the liquid arrival plate 71 corresponding to the contact surface 351 of the first brush 35A and a second scale S2 for positioning the liquid arrival plate 71 corresponding to the contact surface 351 of the second brush 35B. The first scale S1 and the second scale S2 are grooves formed in the scale member 636a. Furthermore, a mounting hole 636b provided in the base plate 636 is a hole for positioning the liquid arrival plate 71 corresponding to the contact surface 351 of the first brush 35A. A mounting hole 636c is a hole for positioning the liquid arrival plate 71 corresponding to the contact surface 351 of the second brush 35B.

[0060] By aligning the reference mark 73a of the fixing portion 73 with the first scale S1 and inserting a fastener B through the mounting hole 73b and fastening it to the mounting hole 636b, the first liquid receiving surface 71a of the liquid receiving plate 71 can be positioned at the same height as the contact surface 351 of the first brush 35A when the liquid receiving plate 71 is positioned in the retracted position, as shown in FIG. 18(A). By aligning the reference mark 73a of the fixing portion 73 with the second scale S2 and inserting a fastener B through the mounting hole 73b and fastening it to the mounting hole 636c, the second liquid receiving surface 71b of the liquid receiving plate 71 can be positioned at the same height as the contact surface 351 of the second brush 35B, as shown in FIG. 18(B). Note that the first brush 35A and brush holder 32 in FIG. 18(A) are shown by imaginary two-dot chain lines to illustrate the height position of the first liquid receiving surface 71a (shown by the dashed line). In addition, the second brush 35B and the brush holder 32 in FIG. 18(B) are shown imaginarily by two-dot chain lines to explain the height position of the second liquid landing surface 71b (shown by one-dot chain lines).

[0061] (Control unit) As shown in FIG. 1, the control unit 100 is a computer that controls each part of the cleaning apparatus 1, and includes a storage unit that stores various information and programs related to substrate cleaning, and a processor that executes the various programs.

[0062] The control unit 100 controls each mechanism by outputting operation commands to a drive circuit that drives the opening / closing mechanism for the door of the loading / unloading entrance and the work entrance of the chamber 10, the rotation mechanism for the roller 20a of the rotation drive unit 20, the drive mechanism that moves the first holder 21 and the second holder 22, the drive mechanism 42 of the brush drive unit 40, the supply mechanism of the cleaning liquid discharge unit 50, the liquid supply unit 624 that supplies the brush cleaning liquid CL to the discharge unit 62 of the brush cleaning unit 60, and the drive source that rotates the open-close cover 652. In this embodiment, the control unit 100 is configured to cause the discharge unit 62 to discharge the brush cleaning liquid CL only when the brush 35 is in the retracted position. Alternatively, the discharge unit 62 may be configured to discharge the brush cleaning liquid CL only when the open-close cover 652 closes the opening 651a.

[0063] Although not shown, a display unit and an input unit are connected to the control unit 100. The display unit is an output device such as a display, lamp, meter, etc. that displays information for checking the status of the cleaning device 1 in a manner that is visible to the operator. The input unit is an input device such as a switch, touch panel, keyboard, mouse, etc. that allows the operator to operate the cleaning device 1 and input settings via the control unit 100.

[0064] [Installation of the outlet part] A procedure will be described below for attaching the discharge part 62 as described above so that it is supported by the support part 63. The holder 635 is attached to the fixed plate 61 by fixing the main body plate 635a to the fixed plate 61 with a fastener B.

[0065] (Installation of the first discharge part) First, the procedure for attaching the first discharge part 62A will be described. As shown in Fig. 9, the discharge part-side joint 633 and the supply side joint 634 are connected to the fixing joint 631. More specifically, the discharge part-side joint 633 is connected to one side surface of the block 631a, and the supply side joint 634 is connected to one side surface of the block 631b. Because these one side surfaces are parallel to the longitudinal direction of the fixing joint 631, the discharge part-side joint 633 and the supply side joint 634 protrude in a direction perpendicular to the longitudinal direction of the fixing joint 631.

[0066] At this point, the angles of the blocks 631a and 631b can be changed by rotating them about the longitudinal axis of the fixing joint 631. In addition, the angles of the discharge side joint 633 and the supply side joint 634 can be changed by rotating them about the axis perpendicular to the longitudinal direction of the fixing joint 631.

[0067] The fixing joint 631 is inserted into the insertion hole 632c of the first fixture 632A until it abuts against the abutment surface 632d, and the fastener B is screwed into the hole to fix the fixing joint 631. At this time, the angles of the blocks 631a and 631b are adjusted so that the connection portion with the discharge portion-side joint 633 enters the discharge portion groove 632f and the connection portion with the supply side joint 634 enters the supply groove 632g. Also, as shown in FIG. 10, the discharge portion-side joint 633 is rotated so that its side surface is aligned with the inclined surface 632i of the angle determining portion 632h.

[0068] As a result, the four surfaces of blocks 631a and 631b come into contact with the four surfaces of insertion hole 632c, thereby restricting rotation of fixing joint 631 around its axis. Furthermore, the end of fixing joint 631 comes into contact with abutment surface 632d, thereby determining its position in the insertion direction. Furthermore, the side surface of discharge portion-side joint 633 comes into contact with inclined surface 632i of angle determining portion 632h, thereby determining the angle of discharge portion-side joint 633. By determining the angle of discharge portion-side joint 633, the axial angle of first discharge portion 62A fixed to discharge portion-side joint 633 is determined.

[0069] 11, first fixture 632A is attached to holder 635. That is, first fixture 632A to which fixing joint 631 is fixed as described above is inserted between support plate 635c and main body plate 635a, and mounting plate 632e of first fixture 632A is attached to support plate 635c with fastener B.

[0070] Here, the first discharge part 62A is connected to the discharge part-side joint 633 (see FIG. 14). That is, the nozzle tip 621 is screwed onto the end of the discharge part-side joint 633. The first discharge part 62A is fixed in a direction toward the first brush 35A located in the retracted position. Furthermore, by adjusting the degree of screw engagement of the nozzle tip 621, the extension direction of the liquid landing area LA1 formed by the brush cleaning liquid CL1 discharged from the elliptical discharge port 622 is set to be the radial direction of the contact surface 351 of the first brush 35A.

[0071] 3 and 5, the first discharge part 62A is positioned to discharge the brush cleaning liquid CL1 obliquely upward toward the first brush 35A from outside the first brush 35A and second brush 35B, which are in the retracted position, so as to intersect with the axis of the first brush 35A. The fan-shaped surface of the brush cleaning liquid CL1 discharged from the first discharge part 62A is perpendicular to the contact surface 351 of the first brush 35A. Also, as shown in FIG. 6A, the first discharge part 62A is disposed so that the liquid landing area LA1 of the brush cleaning liquid CL1 on the first brush 35A extends from the outer periphery of the contact surface 351 to the center C. For example, one end of the liquid landing area LA1 is positioned slightly beyond the center C of the contact surface 351, and the other end is positioned to contact the underside of the brush holder 32. Therefore, the brush cleaning liquid CL1 is applied to an area equal to or larger than the radius of the contact surface 351 of the first brush 35A and to the entire side surface of the first brush 35A in the axial direction of the first brush 35A.

[0072] (Installation of the second discharge part) Next, a procedure for attaching second discharge part 62B will be described. First, as shown in Fig. 11, second fixture 632B is attached to holder 635. That is, second fixture 632B is attached to main body plate 635a with fastener B so that second fixture 632B is parallel to the axis of first fixture 632A.

[0073] Next, the discharge portion side joint 633 provided with the second discharge portion 62B and the supply side joint 634 are connected to the fixing joint 631. This procedure is the same as that for the first discharge portion 62A described above.

[0074] 12 and 13, the fixing joint 631 is inserted into the insertion hole 632c of the second fixing device 632B until it abuts against the abutment surface 632d, and the fastener B is screwed into the hole to fix the fixing joint 631. At this time, the angles of the blocks 631a and 631b are adjusted so that the connection portion with the discharge portion-side joint 633 enters the discharge portion groove 632f and the connection portion with the supply side joint 634 enters the supply groove 632g. As a result, rotation of the fixing joint 631 around its axis is restricted and its position in the insertion direction is determined, as described above.

[0075] 14, the second discharge part 62B is connected to the discharge part-side joint 633. That is, the nozzle tip 621 is screwed into the end of the discharge part-side joint 633. The axial direction of the second discharge part 62B is set to be perpendicular to the axis of the fixing joint 631. As a result, the second discharge part 62B is fixed in the direction toward the second brush 35B. Furthermore, by adjusting the degree of threading of the nozzle tip 621, the extension direction of the liquid landing area LA2 formed by the brush cleaning liquid CL2 discharged from the elliptical discharge port 622 is set to be the radial direction of the contact surface 351 of the second brush 35B.

[0076] As a result, as shown in FIGS. 3 and 5, the second discharger 62B is positioned to discharge the brush cleaning liquid CL2 diagonally downward from the outside of the first brush 35A and the second brush 35B, which are in the retracted position, toward the second brush 35B, so as to intersect with the axis of the second brush 35B. The fan-shaped surface of the brush cleaning liquid CL2 discharged from the second discharger 62B is perpendicular to the contact surface 351 of the second brush 35B. As shown in FIG. 6B, the second discharger 62B is disposed so that the liquid landing area LA2 of the brush cleaning liquid CL2 on the second brush 35B extends from the outer periphery of the contact surface 351 to the center C. For example, one end of the liquid landing area LA2 is located slightly beyond the center C of the contact surface 351, and the other end is located in contact with the upper surface of the brush holder 32. Therefore, the brush cleaning liquid CL2 is applied to an area equal to or larger than the radius of the contact surface 351 of the second brush 35B and to the entire side surface of the second brush 35B in the axial direction of the second brush 35B.

[0077] Since the first discharge portion 62A is inclined by the inclined surface 632i of the angle determining portion 632h, the brush cleaning liquid CL1 that spreads in a fan-shaped surface from the discharge port 622 of the first discharge portion 62A and lands in a straight line on the contact surface 351 lands in a liquid landing area LA1 having a length including the outer periphery to the center C of the contact surface 351 of the first brush 35A without interfering with the brush cleaning liquid CL2 that is discharged in a fan-shaped surface from the discharge port 622 of the second discharge portion 62B.

[0078] (Adjusting the mounting position) An adjustment method for adjusting the positions of the first discharge portion 62A and the second discharge portion 62B attached as described above using the adjustment jig 70 will be described.

[0079] <Adjustment of the first discharge part> First, the adjustment of the position of the first discharge portion 62A will be described. As shown in Figures 4 and 18(A), the reference mark 73a of the fixing portion 73 of the adjustment jig 70 is aligned with the first scale S1, and a fastener B is passed through the mounting hole 73b and fastened to the mounting hole 636b. This fixes the liquid arrival plate 71 at a position corresponding to the contact surface 351 of the first brush 35A when it is in the retracted position (first fixing step). In other words, the first liquid arrival surface 71a of the liquid arrival plate 71 is set to the height position of the contact surface 351 of the first brush 35A.

[0080] Then, the brush cleaning liquid CL1 is discharged from the first discharge part 62A, causing the brush cleaning liquid CL1 to land on the liquid arrival plate 71 (first liquid arrival step). As a result, the brush cleaning liquid CL1 is deposited on the first liquid arrival surface 71a. The operator adjusts the position of the first discharge part 62A based on the passage status of the brush cleaning liquid CL1 through the reference hole 72 (first adjustment step).

[0081] That is, the operator checks whether the brush cleaning liquid CL1 passes through the four through-holes of the first reference hole 72a. If the brush cleaning liquid CL1 passes through the four through-holes, it can be determined that the position of the first discharge part 62A is normal.

[0082] On the other hand, if there is at least one through-hole among the four through-holes through which the brush cleaning liquid CL1 has not passed, it can be determined that the position of the first discharge part 62A is not normal. If this is determined to be abnormal, the operator adjusts the position of the first discharge part 62A. For example, the operator adjusts the angle of the linear liquid landing area LA1 by adjusting the amount of threading of the nozzle tip 621.

[0083] <Adjustment of the second discharge part> Next, adjustment of the position of the second discharge portion 62B will be described. As shown in Figures 4 and 18(B), the reference mark 73a of the fixing portion 73 of the adjustment jig 70 is aligned with the second scale S2, and a fastener B is passed through the mounting hole 73b and fastened to the mounting hole 636c. This fixes the liquid arrival plate 71 at a position corresponding to the contact surface 351 of the second brush 35B when it is in the retracted position (second fixing step). In other words, the second liquid arrival surface 71b of the liquid arrival plate 71 is set to the height position of the contact surface 351 of the second brush 35B.

[0084] Then, the brush cleaning liquid CL2 is discharged from the second discharge part 62B, causing the brush cleaning liquid CL2 to land on the liquid arrival plate 71 (second liquid arrival step). As a result, the brush cleaning liquid CL2 is deposited on the second liquid arrival surface 71b. The operator adjusts the position of the second discharge part 62B based on the passage status of the brush cleaning liquid CL2 through the reference hole 72 (second adjustment step).

[0085] That is, the operator checks whether the brush cleaning liquid CL2 passes through the four through-holes of the second reference hole 72b. If the brush cleaning liquid CL2 passes through the four through-holes, it can be determined that the position of the second discharge part 62B is normal.

[0086] On the other hand, if there is at least one through-hole among the four through-holes through which the brush cleaning liquid CL2 has not passed, it can be determined that the attachment position of the second discharge part 62B is not normal. If the worker determines that the attachment position is not normal, he or she adjusts the position of the second discharge part 62B. For example, the angle of the linear liquid landing area LA2 is adjusted by adjusting the amount of threading of the nozzle tip 621. In addition, the angle of the second discharge part 62B is adjusted by adjusting the angle of the discharge part-side joint 633 relative to the fixing joint 631.

[0087] After adjusting the attachment positions of the first discharge portion 62A and the second discharge portion 62B as described above, the adjustment jig 70 is removed from the base plate 636.

[0088] [Operation] The operation of the cleaning device 1 configured as above will be described.

[0089] (Board delivery) First, the operation of loading the substrate W will be described. The transport robot loads the substrate W, which has been transported from the previous process, from the loading / unloading entrance of the cleaning apparatus 1 into between the rollers 20a of the first holding unit 21 and the second holding unit 22. The first holding unit 21 and the second holding unit 22 move in directions approaching each other. Then, the four rollers 20a move toward the substrate W and contact the outer periphery of the substrate W, thereby holding the substrate W. At this time, the upper and lower arms 41 are in a state of being retracted outside the substrate W so that the brushes 35 are located at the retracted positions.

[0090] (Cleaning the front and back of the substrate) Next, a description will be given of the cleaning operation of the substrate W. As shown in Fig. 2, the roller 20a rotates clockwise in the drawing, causing the substrate W to rotate counterclockwise.

[0091] The substrate cleaning liquid SL is discharged from the discharge port of the nozzle 51 of the cleaning liquid discharge unit 50. The substrate cleaning liquid SL supplied to the substrate W flows over the front and back surfaces of the substrate W due to the centrifugal force generated by the rotation of the substrate W, and is scattered outward from the substrate W.

[0092] The upper and lower arms 41 (shown by two-dot chain lines in FIG. 2) in the retracted positions swing above the outer periphery of the substrate W and then stop temporarily while rotating the brushes 35 by the motor. Then, the upper and lower arms 41 move in directions approaching the substrate W, so that the brushes 35 of the upper and lower substrate cleaning units 30 come into contact with the front and back surfaces of the substrate W.

[0093] As the upper and lower arms 41 swing, the upper and lower brushes 35 move horizontally while contacting the substrate W. At this time, the substrate cleaning liquid SL is discharged from the discharge port of the nozzle 51, so that the substrate cleaning liquid SL flows between the brushes 35 and the substrate W. In other words, the brushes 35 start moving from one side of the outer periphery of the substrate W, and as they move along an arcuate trajectory, they push contaminants together with the substrate cleaning liquid SL out to the outer periphery of the substrate W.

[0094] 2, the brush 35 moves while passing near the center of the substrate W. Thereafter, when the brush 35 passes over the other side of the outer periphery of the substrate W and leaves the substrate W, the cleaning process of the substrate W by the brush 35 ends.

[0095] Then, the upper and lower arms 41 move in directions away from each other, causing the upper and lower brushes 35 to move away from each other, and the arms 41 further swing, causing the brushes 35 to retreat to retreat positions outside the outer periphery of the substrate W. Thereafter, the above-described operation may be repeated to perform cleaning with the brushes 35 multiple times.

[0096] The cleaning liquid discharge unit 50 continues to discharge the substrate cleaning liquid SL for a predetermined time even after the brush 35 has been detached from the substrate W. This performs a rinse process on the substrate W. That is, the brush 35 is moved to the retracted position, and the rinse process is started. The brush 35 is cleaned in parallel with the rinse process, as described below. When a predetermined time has elapsed since the start of the rinse process, the discharge of the substrate cleaning liquid SL is stopped, the rinse process is completed, and the cleaning process of the substrate W is completed. When the cleaning process of the substrate W is completed, the first holder 21 and the second holder 22 move in directions away from each other to release the substrate W. The transport robot unloads the released substrate W from the loading / unloading port of the cleaning apparatus 1. The rinse process may be performed by supplying a liquid other than the substrate cleaning liquid SL to the substrate W.

[0097] (Brush cleaning) The operation of cleaning the brush 35 will be described. First, the arm 41 is swung to move the brush 35, which has completed the cleaning process of the substrate W with the brush 35, to the retracted position. At this time, the openable cover 652 is opened, and the brush 35 enters the cover 65 through the opening 651a of the fixed cover 651. Then, the openable cover 652 is closed to cover the periphery of the brush 35.

[0098] Next, first arm 41A and second arm 41B are raised and lowered, so that contact surface 351 of first brush 35A is positioned at the position of first liquid landing surface 71a when adjustment jig 70 is attached, and contact surface 351 of second brush 35B is positioned at the position of second liquid landing surface 71b when adjustment jig 70 is attached. Then, the rotation speed (number of rotations per unit time) of brush 35 is made lower than the rotation speed when cleaning substrate W.

[0099] In this state, the first discharger 62A and the second discharger 62B discharge the brush cleaning liquids CL1 and CL2 onto the first brush 35A and the second brush 35B, which are rotating at a low rotation speed. At this time, as shown in FIG. 5, the brush cleaning liquid CL1 discharged from the first brush 35A spreads in a fan-shaped plane and reaches the contact surface 351, forming a linear liquid-receiving area LA1, as shown in FIG. 6A. Also, as shown in FIG. 5, the brush cleaning liquid CL2 discharged from the second brush 35B spreads in a fan-shaped plane and reaches the contact surface 351, forming a linear liquid-receiving area LA2, as shown in FIG. 6B. The brush cleaning liquid CL1 discharged from the first brush 35A and the brush cleaning liquid CL2 discharged from the second brush 35B and the brush cleaning liquid CL2 do not collide with each other. In other words, there is no interference between the brush cleaning liquids CL1 and CL2, preventing them from reaching the contact surface 351. Furthermore, the water pressure of the brush cleaning liquid CL can be increased in the liquid landing area LA by setting the rotation speed of the brush 35 lower than the rotation speed when cleaning the substrate W. The high water pressure makes it easier to push out particles adhering to the brush 35, allowing the brush 35 to be cleaned more cleanly.

[0100] (effect) (1) The cleaning apparatus 1 of this embodiment as described above includes a substrate cleaning unit 30 that cleans the first and second surfaces of the substrate W by bringing the circular contact surface 351 of the rotating first brush 35A into contact with the first surface of the rotating substrate W while supplying the substrate cleaning liquid SL to the first surface of the rotating substrate W, and bringing the circular contact surface 351 of the rotating second brush 35B into contact with the second surface of the rotating substrate W while supplying the substrate cleaning liquid SL to the second surface of the rotating substrate W, and a cleaning unit 62 that discharges brush cleaning liquids CL1 and CL2 from a discharge unit 62 onto the respective contact surfaces 351 to clean the first brush 35A and the second brush 35B while the first brush 35A and the second brush 35B are in retracted positions away from the substrate W. The brush cleaning unit 60 has a brush cleaning unit 62, and the discharge unit 62 includes a first discharge unit 62A that discharges brush cleaning liquid CL1 so that it lands in a straight line on the contact surface 351 of the first brush 35A, and a second discharge unit 62B that discharges brush cleaning liquid CL2 so that it lands in a straight line on the contact surface 351 of the second brush 35B. The brush cleaning unit 60 has a support unit 63 that supports the first discharge unit 62A and the second discharge unit 62B so that the brush cleaning liquids CL1, CL2 discharged from the first discharge unit 62A and the second discharge unit 62B do not interfere with each other until the brush cleaning liquids CL1, CL2 land on the contact surfaces 351 of the first brush 35A and the second brush 35B.

[0101] Therefore, the brush cleaning liquid CL1 discharged by the first discharger 62A and the brush cleaning liquid CL2 discharged by the second discharger 62B do not collide with each other, and therefore the brush cleaning liquid CL is not scattered before reaching the contact surface 351. Therefore, the brush cleaning liquids CL1 and CL2 can be efficiently supplied to the first brush 35A and the second brush 35B, respectively, for cleaning. This maintains the cleanliness of the first brush 35A and the second brush 35B, improving the quality of the substrate W. Furthermore, since the brush cleaning liquid CL is not scattered due to collision, adhesion of the brush cleaning liquid CL to the substrate W can be suppressed, improving the quality of the substrate W. Furthermore, even after the substrate W is unloaded, the brush cleaning liquid CL can be prevented from scattering and adhering to components in the cleaning chamber 11, particularly the roller 20a. Therefore, adhesion of the brush cleaning liquid CL to the next substrate W via the roller 20a can be suppressed, improving the quality of the substrate W.

[0102] (2) The support portion 63 supports the first discharge portion 62A and the second discharge portion 62B so that the direction in which the linear liquid landing area LA1 that reaches the contact surface 351 of the first brush 35A extends is different from the direction in which the linear liquid landing area LA2 that reaches the contact surface 351 of the second brush 35B extends. Therefore, the brush cleaning liquid CL1 discharged by the first discharge portion 62A can reach the contact surface 351 of the first brush 35A without colliding with the brush cleaning liquid CL2 discharged by the second discharge portion 62B. Furthermore, the brush cleaning liquid CL2 discharged by the second discharge portion 62B can reach the contact surface 351 of the second brush 35B without colliding with the brush cleaning liquid CL1 discharged by the first discharge portion 62A.

[0103] (3) The linear liquid landing area LA, which reaches the contact surface 351 from the discharge portion 62, is a length that includes the length from the outer periphery of the contact surface 351 to the center C. Therefore, the brush cleaning liquid CL hits an area that exceeds the radius of the rotating brush 35, and the brush cleaning liquid CL can be applied to and cleaned over the entire rotating contact surface 351. Because the liquid landing area LA does not need to be expanded to the diameter of the brush 35, scattering of the brush cleaning liquid CL due to diffusion can be suppressed.

[0104] (4) The discharge direction of the discharge part 62 is set so that the surface over which the brush cleaning liquid CL discharged from the discharge part 62 spreads before reaching the contact surface 351 is perpendicular to the contact surface 351. This allows the brush cleaning liquid CL to be strongly applied to the contact surface 351, improving cleaning performance.

[0105] (5) The first brush 35A and the second brush 35B are arranged to be swingable via the first arm 41A and the second arm 41B, respectively, and are positioned in the area between the first arm 41A and the second arm 41B when the first brush 35A and the second brush 35B are in the retracted position.

[0106] Therefore, the first discharge section 62A and the second discharge section 62B fit between the first arm 41A and the second arm 41B, which reduces the space required in a plan view and prevents the device from becoming too large.

[0107] (6) The support portion 63 has a rectangular pillar-shaped fixing joint 631 that supports the discharge portion 62 and has a flow path inside that supplies the brush cleaning liquid CL to the discharge portion 62, and a fixing device 632 into which the fixing joint 631 is inserted, the fixing device 632 including multiple surfaces that contact multiple side surfaces of the fixing joint 631, and an insertion hole 632c that fixes the angle of the fixing joint 631.

[0108] Therefore, by inserting the fixing joint 631 into the insertion hole 632c of the fixing tool 632, the position of the discharge part 62 can be determined.

[0109] (7) The portion of the fixing joint 631 that is inserted into the insertion hole 632c includes a rectangular parallelepiped block, so that the fixing joint 631 can be configured to position the discharge portion 62 with a simple shape.

[0110] (8) The support portion 63 has a flow path therein for supplying the brush cleaning liquid CL to the discharge portion 62, and has a discharge portion side joint 633 connected to the fixing joint 631 so that the angle of the discharge portion 62 can be changed, and the fixing device 632 has an angle determining portion 632h that contacts the discharge portion side joint 633 and determines the angle of the discharge portion 62.

[0111] Therefore, the angle of the discharge part 62 can be easily determined by inserting the fixing joint 631 into the fixture 632 and bringing the discharge part side joint 633 into contact with the angle determining part 632h.

[0112] (9) The insertion hole 632c has an abutment surface 632d that the end of the inserted fixing joint 631 abuts against to determine the position in the insertion direction of the fixing joint 631. Therefore, by inserting the fixing joint 631 until it abuts against the abutment surface 632d, the position of the discharge part 62 in the insertion direction can be easily determined.

[0113] (10) The cleaning device 1 has a supply side joint 634 that is connected to the fixing joint 631 and has a flow path therein that supplies the brush cleaning liquid CL to the discharge part 62, and to which a pipe 624a that supplies the brush cleaning liquid CL is connected, and the discharge part 62 and the supply side joint 634 are positioned apart from each other in the direction of insertion of the fixing joint 631 into the fixture 632.

[0114] Therefore, the discharge portion 62 and the supply side joint 634 can be shifted in the horizontal direction, and the increase in the space in the height direction can be suppressed.

[0115] (11) The brush cleaning unit 60 has a cover 65 that is interposed between the first brush 35A and the second brush 35B in the retracted position and the substrate cleaning unit 30, and that blocks the brush cleaning liquid CL from splashing onto the substrate W. This prevents the brush cleaning liquid CL from adhering to the substrate W during brush cleaning.

[0116] (12) The cover 65 has a fixed cover 651 having an opening 651a through which the first brush 35A and the second brush 35B can pass, and an openable / closable cover 652 that opens and closes the opening 651a. This allows the first brush 35A and the second brush 35B to be inserted into and removed from the cover 65, while preventing the brush cleaning liquid CL from splashing onto the substrate W during brush cleaning.

[0117] (13) A labyrinth structure, which is a curved ventilation path, is formed between the opening / closing cover 652 that closes the opening 651a and the fixed cover 651. This prevents the brush cleaning liquid CL from leaking between the opening / closing cover 652 and the fixed cover 651 and adhering to the substrate W.

[0118] (14) The adjustment jig 70 of this embodiment is used to adjust the positions of the first discharge portion 62A and the second discharge portion 62B of the cleaning device 1, and includes a liquid collection plate 71 on which the brush cleaning liquids CL1 and CL2 from the first discharge portion 62A and the second discharge portion 62B collect at positions corresponding to the contact surfaces 351 of the first brush 35A and the second brush 35B, reference holes 72 which are multiple through holes arranged in a line corresponding to the liquid collection areas LA1 and LA2 of the brush cleaning liquids CL1 and CL2 from the first discharge portion 62A and the second discharge portion 62B on the liquid collection plate 71, and a fixing portion 73 which selectively fixes the liquid collection plate 71 to either the position corresponding to the contact surface 351 of the first brush 35A or the position corresponding to the contact surface 351 of the second brush 35B.

[0119] The adjustment method for adjusting the positions of the first discharge part 62A and the second discharge part 62B of the cleaning device 1 using the above-mentioned adjustment jig 70 includes a first fixing step of fixing the liquid receiving plate 71 at a position corresponding to the contact surface 351 of the first brush 35A, a first liquid receiving step of, after the first fixing step, discharging the brush cleaning liquid CL1 from the first discharge part 62A to cause the brush cleaning liquid CL1 to adhere to the liquid receiving plate 71, and a second liquid receiving step of adjusting the positions of the first discharge part 62A and the second discharge part 62B of the cleaning device 1 based on the passing state of the brush cleaning liquid CL1 through the plurality of reference holes 72 in the first liquid receiving step. The method includes a first adjustment step of adjusting the position of the first discharge portion 62A, a second fixing step of fixing the liquid receiving plate 71 at a position corresponding to the contact surface 351 of the second brush 35B, a second liquid receiving step of discharging the brush cleaning liquid CL2 from the second discharge portion 62B after the second fixing step, thereby causing the brush cleaning liquid CL2 to be deposited on the liquid receiving plate 71, and a second adjustment step of adjusting the position of the second discharge portion 62B based on the passing status of the brush cleaning liquid CL2 through the multiple reference holes 72 in the second liquid receiving step.

[0120] This allows the positions of the first discharge portion 62A and the second discharge portion 62B to be adjusted by checking in advance the state of liquid on the contact surface 351 of the first brush 35A and the state of liquid on the contact surface 351 of the second brush 35B.

[0121] (15) The cleaning device 1 has a first scale S1 for positioning the liquid receiving plate 71 corresponding to the contact surface 351 of the first brush 35A and a second scale S2 for positioning the liquid receiving plate 71 corresponding to the contact surface 351 of the second brush 35B, and the fixed part 73 is provided with a reference mark 73a which, when aligned with the first scale S1, positions the liquid receiving plate 71 corresponding to the contact surface 351 of the first brush 35A, and which, when aligned with the second scale S2, positions the liquid receiving plate 71 corresponding to the contact surface 351 of the second brush 35B.

[0122] Therefore, by aligning the reference mark 73a with the first scale S1 or the second scale S2, the position of the liquid landing plate 71 can be determined easily and accurately.

[0123] (Variation) This embodiment is not limited to the above-described aspects, and the following modifications can also be configured.

[0124] (1) In the above embodiment, the first discharge portion 62A is disposed on the lower side and the second discharge portion 62B is disposed on the upper side. However, the first discharge portion 62A may be disposed on the upper side and the second discharge portion 62B may be disposed on the lower side. In addition, the angle determining portion 632h may be provided on the second discharge portion 62B.

[0125] (2) The retracted position where the brush 35 is cleaned may be located outside the area where the substrate W is held. Therefore, a position where the brush 35 is retracted may be provided separately from the brush cleaning position.

[0126] (3) The flow rates of the brush cleaning liquids CL1 and CL2 from the first and second discharge portions 62A and 62B may be the same or different.

[0127] (4) The number of reference holes 72 is not limited to four, as long as it is plural.

[0128] (5) The first scale S1, the second scale S2, and the reference mark 73a may be grooves formed in the component, or may be attached or printed as long as they are visible to the worker.

[0129] (6) The brush cleaning liquid CL is not limited to pure water. For example, various liquids such as those exemplified as the substrate cleaning liquid SL can be used. Furthermore, multiple types of liquids may be switched and supplied to the brush 35.

[0130] (7) A two-fluid nozzle may be used for the discharge unit 62. For example, a nozzle that discharges a mixture of N2 gas and pure water may be used.

[0131] (8) The cleaning apparatus 1 may not include the second brush 35B and may be an apparatus that cleans only one surface of the substrate W. In other words, the cleaning apparatus 1 may include: a substrate cleaning unit 30 that cleans one surface of the substrate W by contacting the circular contact surface 351 of the rotating brush 35 with the one surface of the substrate W while supplying the substrate cleaning liquid SL to the substrate W; a brush cleaning unit 60 that cleans the brush 35 by discharging the brush cleaning liquid CL from a discharge unit 62 onto the contact surface 351 while the brush 35 is in a retracted position away from the substrate W; and a support unit 63 that supports the discharge unit 62.

[0132] In this case, all of the configurations described in the above aspects are applicable except for the absence of second brush 35B and second discharge portion 62B. For example, support portion 63 may include: a rectangular pillar-shaped fixing joint 631 that supports discharge portion 62 and has an internal flow path for supplying brush cleaning liquid CL to discharge portion 62; and fixture 632 into which fixing joint 631 is inserted, having a plurality of surfaces with which a plurality of side surfaces of fixing joint 631 contact, and having insertion holes 632c that fix the angle of fixing joint 631.

[0133] [Other embodiments] Although the embodiments of the present invention and modifications of each part have been described above, these embodiments and modifications of each part are presented as examples and are not intended to limit the scope of the invention. These novel embodiments described above can be embodied in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and modifications are included within the scope and spirit of the invention, and are also included in the invention described in the claims. [Explanation of symbols]

[0134] 1 Cleaning equipment 10 Chambers 10a bottom 11 Cleaning Room 20 Rotation drive unit 20a Laura 21 First holding part 22 Second holding part 30 Substrate cleaning section 31 Torso 32 Brush holder 35 Brushes 35A First Brush 35B Second Brush 40 Brush drive unit 41 Arm 41A First Arm 41B Second Arm 42 Drive mechanism 50 Cleaning liquid discharge part 51 nozzles 60 Brush cleaning section 61 Fixed plate 62 Discharge part 62A First outlet 62B second discharge section 63 Support part 64 Pillar 65 Cover 70 Adjustment jig 71 Liquid contact plate 71a First liquid contact surface 71b Second liquid contact surface 72 Reference hole 72a First reference hole 72b Second reference hole 73 Fixed part 73a Reference Mark 73b Mounting hole 100 control section 351 Contact surface 621 Nozzle Tip 622 Discharge port 624 Liquid supply section 624a Piping 624b valve 624c feeding device 631 Fixing joint Block 631a Block 631b 632 Fixtures 632A First Fixture 632B Second Fixture 632c insertion hole 632d Contact surface 632e Mounting plate 632f Outlet groove 632g supply groove 632h Angle setting part 632i Slope 633 Discharge side joint 634 Supply side joint 635 Holder 635a Main board 635b Extension plate 635c support plate 636 Base Plate 636a Scale member 636b Mounting hole 636c Mounting hole 651 Fixed cover 651a aperture 652 Opening and closing cover B Fastener C center CL, CL1, CL2 Brush Cleaning Fluid S1 First scale S2 Second scale SL Substrate Cleaning Solution W substrate

Claims

1. A substrate cleaning unit cleans the first and second surfaces of a substrate by supplying substrate cleaning fluid to the first surface of a held and rotating substrate, bringing the circular contact surface of a rotating first brush into contact with the first surface, and supplying substrate cleaning fluid to the second surface of the rotating substrate, bringing the circular contact surface of a rotating second brush into contact with the second surface of the rotating substrate. A brush cleaning unit cleans the first brush and the second brush by discharging brush cleaning fluid from a discharge unit onto their respective contact surfaces while the first brush and the second brush are in a retracted position away from the area where the substrate is held. It has, The aforementioned discharge section is A first discharge unit that discharges brush cleaning liquid so as to adhere linearly to the contact surface of the first brush, A second discharge unit that discharges brush cleaning liquid so as to land linearly on the contact surface of the second brush, Includes, The brush cleaning unit is characterized by having a support portion that supports the first discharge portion and the second discharge portion so that the brush cleaning liquid discharged from the first discharge portion and the second discharge portion does not interfere with each other until the brush cleaning liquid comes into contact with the contact surfaces of the first brush and the second brush.

2. The cleaning apparatus according to claim 1, characterized in that the support portion supports the first discharge portion and the second discharge portion such that the direction in which the linear liquid application area that adheres to the contact surface of the first brush extends is different from the direction in which the linear liquid application area that adheres to the contact surface of the second brush extends.

3. The cleaning apparatus according to claim 1, characterized in that the linear liquid deposition region from the discharge portion to the contact surface includes the length from the outer edge to the center of the contact surface.

4. The cleaning apparatus according to claim 1, characterized in that the discharge direction of the discharge unit is set such that the surface over which the brush cleaning liquid discharged from the discharge unit spreads before coming into contact with the contact surface is perpendicular to the contact surface.

5. The first brush and the second brush are each pivotably mounted via a first arm and a second arm, respectively. The cleaning apparatus according to claim 1, characterized in that the first discharge section and the second discharge section are arranged in the region between the first arm and the second arm when the first brush and the second brush are in the retracted position.

6. The aforementioned support portion is A rectangular prism-shaped fixing joint is provided, on which the discharge section is supported and on which a flow path for supplying brush cleaning fluid to the discharge section is provided inside, A fixing device into which the fixing joint is inserted, including multiple surfaces into which multiple sides of the fixing joint come into contact, and having an insertion hole for fixing the angle of the fixing joint, The cleaning device according to claim 1, characterized by having the following features.

7. The cleaning device according to claim 6, characterized in that the fixing joint includes a rectangular parallelepiped-shaped block in the portion that is inserted into the insertion hole.

8. The aforementioned support portion is A flow path for supplying brush cleaning fluid to the discharge section is provided inside, and the discharge section side joint is connected to the fixing joint so that the angle of the discharge section can be changed. The cleaning device according to claim 6, characterized in that the fixing device has an angle-determining portion that contacts the discharge-side joint and determines the angle of the discharge portion.

9. The cleaning device according to claim 6, characterized in that the insertion hole has a contact surface that determines the position of the fixed joint in the insertion direction when the end of the inserted fixed joint abuts against it.

10. The supply-side joint is connected to the aforementioned fixing joint and has a flow path inside which supplies brush cleaning fluid to the discharge section, and to which a pipe for supplying brush cleaning fluid is connected. The cleaning device according to claim 6, characterized in that the discharge section and the supply-side joint are provided at positions separated from each other in the direction in which the fixing joint is inserted into the fixing device.

11. The cleaning apparatus according to claim 1, characterized in that the brush cleaning section is interposed between the first brush and the second brush in the retracted position and the substrate cleaning section, and has a cover that prevents the brush cleaning liquid from splashing onto the substrate.

12. The aforementioned cover is A fixed cover having an opening in part through which the first brush and the second brush can pass, An opening / closing cover for opening and closing the aforementioned opening, The cleaning apparatus according to claim 11, characterized by having the following features.

13. The cleaning device according to claim 12, characterized in that a curved path is formed between the opening / closing cover with the opening closed and the fixed cover.

14. A substrate cleaning unit that cleans one side of a substrate by supplying substrate cleaning fluid to one side of a held and rotating substrate and bringing the circular contact surface of a rotating brush into contact with the substrate, A brush cleaning unit cleans the brush by discharging brush cleaning liquid from a discharge unit onto the contact surface while the brush is in a retracted position away from the area where the substrate is held. A support portion that supports the discharge portion, It has, The aforementioned support portion is A rectangular prism-shaped fixing joint is provided, on which the discharge section is supported and on which a flow path for supplying brush cleaning fluid to the discharge section is provided inside, A fixing device into which the fixing joint is inserted, including multiple surfaces into which multiple sides of the fixing joint come into contact, and having an insertion hole for fixing the angle of the fixing joint, A cleaning device characterized by having the following features.

15. An adjustment jig for adjusting the positions of the first discharge section and the second discharge section of a cleaning device according to any one of claims 1 to 13, A liquid contact plate is provided at a position corresponding to the contact surface of the first brush and the second brush, to which the brush cleaning liquid from the first discharge section and the second discharge section adheres. The liquid contact plate has a plurality of through holes, which are reference holes, arranged in a straight line, corresponding to the respective liquid contact areas of the brush cleaning liquid from the first discharge section and the second discharge section, A fixing part for selectively fixing the liquid contact plate to either a position corresponding to the contact surface of the first brush or a position corresponding to the contact surface of the second brush, An adjustment jig characterized by having the following features.

16. The cleaning device has a first scale for positioning the liquid contact plate to correspond to the contact surface of the first brush, and a second scale for positioning the liquid contact plate to correspond to the contact surface of the second brush. The adjustment jig according to claim 15, characterized in that the fixing portion is provided with reference marks that, when aligned with the first scale, position the liquid contact plate to correspond to the contact surface of the first brush, and when aligned with the second scale, position the plate to correspond to the contact surface of the second brush.

17. An adjustment method for adjusting the positions of the first and second discharge portions of the cleaning device using the adjustment jig described in claim 15, A first fixing step involves fixing the liquid contact plate at a position corresponding to the contact surface of the first brush, Following the first fixing step, a first liquid application step is performed in which the brush cleaning liquid is discharged from the first discharge unit to apply the brush cleaning liquid to the liquid application plate, A first adjustment step is performed to adjust the position of the first discharge unit based on the passage of the brush cleaning liquid through the plurality of reference holes in the first liquid application step, A second fixing step involves fixing the liquid contact plate at a position corresponding to the contact surface of the second brush, Following the second fixing step, a second liquid application step is performed in which the brush cleaning liquid is discharged from the second discharge unit to apply the brush cleaning liquid to the liquid application plate, A second adjustment step is performed to adjust the position of the second discharge section based on the passage of the brush cleaning fluid through the plurality of reference holes in the second liquid application step, A method of adjustment characterized by including the following.