Diamond film deposition device and method for depositing diamond film
JP2025167951APending Publication Date: 2025-11-07NAT UNIV CORP EHIME UNIV +1
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Patent Information
- Application Number
- JP2024072987
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-04-26
- Publication Date
- 2025-11-07
AI Technical Summary
Technical Problem
The formation of diamond films on substrates is hindered by the attachment of single-crystal diamond particles with iron-containing metal components, which interfere with proper deposition using liquid plasma chemical vapor deposition methods.
Method used
An acid pickling treatment is applied to diamond single crystal particles to remove iron-containing metal components before attaching them to the substrate, followed by a plasma-based diamond film formation process.
Benefits of technology
This method enhances the success rate of diamond film deposition, promotes homoepitaxial growth, and allows for multiple layers of diamond films to be formed efficiently, reducing impurity reattachment and improving the overall efficiency of the process.
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Smart Images
Figure 2025167951000001_ABST
Abstract
To provide a method for depositing a diamond film, capable of effectively depositing the diamond film on a substrate.SOLUTION: A method for depositing a diamond film on the surface of a substrate comprises: installing a substrate and an electrode part having a tip facing the substrate in a vessel and holding a raw material solution; generating plasma at the tip of the electrode part; and subjecting diamond single crystal particles having an iron-containing metal component adhering to the surface to acid cleaning before installing the substrate in the vessel to attach the acid-cleaned diamond single crystal particles to the surface of the substrate separately facing the tip of the electrode part.SELECTED DRAWING: Figure 1
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Citation Information
Patent Citations
Method for producing diamond
JP2008150246A