Vapor deposition technology for the preparation of pharmaceutical compositions

JP2025521240A5Pending Publication Date: 2026-06-15NANEXA
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
NANEXA
Filing Date
2023-06-09
Publication Date
2026-06-15

AI Technical Summary

⚠Technical Problem

Existing drug delivery systems face challenges in controlling the release profile of active ingredients, particularly in sustained release compositions, leading to initial rapid release (burst release) and issues with particle aggregation that can clog needles and affect stability.

⚗Method used

A novel process using atomic layer deposition (ALD) with a fixed gas phase deposition reactor chamber and controlled immersion times to apply multiple layers of metal-containing compounds, ensuring uniform coating and controlled release profiles, while avoiding particle aggregation through vibrating sieving techniques.

🎯Benefits of technology

The process achieves uniform coating with minimal pinholes or cracks, allowing for predictable and sustained release of active ingredients, preventing initial burst release and ensuring stable suspension for injection.

✦ Generated by Eureka AI based on patent content.

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Abstract

A process for the preparation of a pharmaceutical or veterinary composition in the form of a plurality of particles is provided, the process comprising: (a) loading a plurality of solid cores containing a biologically active agent into a fixed gas phase deposition reactor chamber; (b) applying a gas phase deposition technique to surround, enclose, and / or encapsulate the cores with one or more layers of a coating material, each layer containing one or more metal-containing compounds or metalloid-containing compounds; (c) optionally, repeating step (b) continuously to form a plurality of particles having a weight-, number-, and / or volume-based average diameter of from about 10 nm to about 100 μm, each particle comprising a respective solid core and a coating surrounding, enclosing, and / or encapsulating the core; wherein the gas phase deposition technique comprises: (1) introducing a pulse of a first reactive gas into the fixed gas phase deposition reactor chamber to allow the first reactive gas to contact the solid core for a predetermined immersion period; (2) after step (1), evacuating and / or purging the fixed gas phase deposition reactor chamber with an inert gas; (3) introducing a pulse of a second reactive gas into the fixed gas phase deposition reactor chamber to allow the second reactive gas to contact the solid core for a predetermined immersion period; (4) after step (3), evacuating and / or purging the fixed gas phase deposition reactor chamber with an inert gas; wherein either the first reactive gas or the second reactive gas contains a metal-containing compound or a metalloid-containing compound.
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