Ultra-low volume showerhead with dual distribution spokes and high-density holes
JP2025538310APending Publication Date: 2025-11-27LAM RES CORP
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Patent Information
- Application Number
- JP2025531724
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-12-02
- Filing Date
- 2023-11-28
- Publication Date
- 2025-11-27
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Figure 2025538310000001_ABST
Abstract
A showerhead for a substrate processing system includes a first plate and a faceplate. The first plate includes a first plurality of gas channels having a first length and a second plurality of gas channels having a second length greater than the first length. The first and second plurality of gas channels alternately extend radially from the center of the first plate toward the outer diameter of the first plate. The faceplate is coupled to the first plate and includes a plurality of through-holes. The faceplate and the first plate define a plenum. The first and second plurality of gas channels and the plurality of through-holes are in fluid communication with the plenum.
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