Ultra-low volume showerhead with dual distribution spokes and high-density holes

JP2025538310APending Publication Date: 2025-11-27LAM RES CORP
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Patent Information

Application Number
JP2025531724
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-12-02
Filing Date
2023-11-28
Publication Date
2025-11-27

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Abstract

A showerhead for a substrate processing system includes a first plate and a faceplate. The first plate includes a first plurality of gas channels having a first length and a second plurality of gas channels having a second length greater than the first length. The first and second plurality of gas channels alternately extend radially from the center of the first plate toward the outer diameter of the first plate. The faceplate is coupled to the first plate and includes a plurality of through-holes. The faceplate and the first plate define a plenum. The first and second plurality of gas channels and the plurality of through-holes are in fluid communication with the plenum.
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