Method and system for determining reticle deformation

Abstract

Disclosed herein is a computer system configured to determine a shape and / or deformation of a reticle using a reticle heating model, and to control operation of a lithography process using the reticle depending on the modeled shape and / or deformation. The computer system is configured to determine that a long track fault has occurred depending on generated reticle process data and known thermal characteristics of the reticle, and in response to determining that a long track fault has occurred, reset the reticle heating model to the same initialization state used at the start of performance of the lithography process on a lot of substrates.

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