Ion source and system using ion source
JP2026009617APending Publication Date: 2026-01-21KK TOSHIBA +1
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Patent Information
- Application Number
- JP2024109615
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-07-08
- Publication Date
- 2026-01-21
AI Technical Summary
Technical Problem
Existing ion sources face challenges in directly confirming the positional relationship between electrodes, leading to degraded ion beam quality due to machining and assembly inaccuracies, which are difficult to rectify without opening the vacuum chamber.
Method used
The ion source incorporates scribed lines on the inner surfaces of the vacuum vessels and electrodes to allow direct visual confirmation of electrode positions, ensuring accurate alignment and preventing beam quality degradation.
Benefits of technology
Direct confirmation of electrode positions enhances ion beam performance by allowing immediate correction of assembly errors, reducing the need for disassembly and improving beam quality.
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Smart Images
Figure 2026009617000001_ABST
Abstract
To prevent deterioration in quality of an ion beam by directly confirming a positional relationship between electrodes.SOLUTION: The ion source 10 includes a first pole 1 having a first opening 1A for extracting an ion beam α, a first vacuum vessel 11 having the first pole inside, a second pole 2 having a second opening 2A for extracting the ion beam and set at a potential different from that of the first pole, and a second vacuum vessel 12 having the second pole inside. A marking line 15 for electrode position confirmation is provided on at least one of the inner surface of the first vacuum vessel 11 and the first electrode 1, and on at least one of the inner surface of the second vacuum vessel 12 and the second electrode 2.SELECTED DRAWING: Figure 1
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