Imprint apparatus, imprint method, and method of manufacturing article

Abstract

To provide an imprint apparatus which is advantageous in improving viscosity of a curable composition.SOLUTION: An imprint apparatus that forms a pattern in a curable composition by performing alignment between a substrate and a mold in a state in which the mold on which the pattern is formed is in contact with the curable composition applied onto a first layer that contains carbon and on which the pattern is not formed on the substrate, and curing the curable composition by curing light, the imprint apparatus comprising: The apparatus includes a viscosity adjusting unit configured to adjust a viscosity of the curable composition by irradiating the curable composition with first light different from the curing light, and a control unit configured to control the viscosity adjusting unit based on a condition concerning the first layer.SELECTED DRAWING: Figure 5

Description

[Technical Field]

[0001] The present invention relates to an imprint apparatus, an imprint method, and a method for manufacturing an article. [Background technology]

[0002] There is known an imprinting apparatus that forms a pattern in a curable composition by bringing a mold into contact with the curable composition on a substrate and curing the curable composition. Patent Document 1 describes an imprinting apparatus that has a viscosity adjusting unit that increases the viscosity of the curable composition when aligning the substrate and the mold, and that changes parameters that control the viscosity adjusting unit in response to changes in control information for controlling the alignment operation. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-190595 Summary of the Invention [Problem to be solved by the invention]

[0004] Before applying the curable composition to the substrate to be imprinted, a first layer containing carbon and on which no pattern is to be formed may be applied. Depending on the conditions of this first layer, the viscosity adjuster may not be able to sufficiently increase the viscosity of the curable composition.

[0005] Therefore, an object of the present invention is to provide an imprinting apparatus that is advantageous in improving the viscosity of a curable composition. [Means for solving the problem]

[0006] In order to achieve the above-mentioned object, one aspect of the present invention provides an imprinting apparatus that aligns a curable composition applied to a first layer on a substrate, which contains carbon and on which no pattern is formed, with a mold on which the pattern is formed while the curable composition is brought into contact with the mold, and hardens the curable composition with curing light to form the pattern in the curable composition.The imprinting apparatus is characterized by having: a viscosity adjusting unit that adjusts the viscosity of the curable composition by irradiating the curable composition with a first light different from the curing light; and a control unit that controls the viscosity adjusting unit based on conditions related to the first layer.

[0007] Further objects and other aspects of the present invention will become apparent from the following description of the embodiments with reference to the accompanying drawings. [Effects of the Invention]

[0008] According to the present invention, it is possible to provide an imprinting apparatus that is advantageous in improving the viscosity of a curable composition. [Brief explanation of the drawings]

[0009] [Figure 1] FIG. 1 is a diagram showing an outline of an imprint system. [Figure 2] FIG. 2 is a diagram showing the configuration of a light source unit. [Figure 3] FIG. 10 is a diagram showing an example in which the waiting time after the application of the undercoat layer is short. [Figure 4] FIG. 10 is a diagram showing an example of a conventional method in which the waiting time after the application of the undercoat layer is long. [Figure 5] FIG. 10 is a diagram showing an example in which the waiting time after the application of the undercoat layer is long in the first embodiment. [Figure 6] 1 is a flowchart of an imprint process. [Figure 7] Schematic diagram of a method for manufacturing an article. DETAILED DESCRIPTION OF THE INVENTION

[0010] Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and the embodiments may be combined in any manner. Furthermore, in the drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0011] In addition, in this specification and drawings, directions are basically indicated by an XYZ coordinate system in which the vertical direction is the Z-axis direction and the horizontal plane perpendicular to the vertical direction is the XY plane, with each axis being orthogonal to each other. However, if an XYZ coordinate system is shown in each drawing, that coordinate system takes precedence.

[0012] Specific configurations of each embodiment will be described below.

[0013] First Embodiment 1 is a diagram showing an outline of an imprint system. The imprint system of this embodiment can include a coating apparatus 100 and an imprint apparatus 1. The coating apparatus 100 uses a spin coater or the like to coat a first layer (underlayer U) that contains carbon and on which no pattern is to be formed onto a substrate S.

[0014] The underlayer U is, for example, a coated carbon film containing spin-on carbon (SOC) and serving as an etching mask. After being coated, the underlayer U is baked in the coating apparatus 100 or in an apparatus separate from the coating apparatus 100 to volatilize the solvent. The thickness of the underlayer U is, for example, approximately 100 to 300 nm. Furthermore, if a foreign object is present on the substrate S during imprinting in the imprint apparatus 1, the underlayer U acts as a cushion, thereby reducing damage to the mold M.

[0015] Furthermore, the coating apparatus 100 may coat an adhesion layer A on the base layer U to improve adhesion between the curable composition IM and the base layer U (substrate S). This adhesion layer A can reduce the possibility that the curable composition IM will separate from the substrate S and adhere to the mold M during demolding. The substrate S is, for example, a silicon wafer, a compound semiconductor wafer, or quartz glass. The substrate S coated with the base layer U by the coating apparatus 100 is transported to the imprint apparatus 1.

[0016] The imprint apparatus 1 performs an imprint process to form a pattern in a curable composition IM on a substrate S. The imprint process may include a contacting step of bringing the curable composition IM on the substrate S into contact with a mold M, an alignment step of aligning the substrate S with the mold M after the contacting step, and a curing step of curing the curable composition IM after the alignment step. This curing step is a step of curing the entire curable composition IM, in other words, a step of completely curing the curable composition IM.

[0017] The imprint apparatus 1 can include a substrate driving mechanism SD, a measuring instrument 29, a mold driving mechanism MD, a discharge section 5, a curing light source 2, a detector 12, an imaging section 6, a light source unit 20, a user interface section 200, and a control section .

[0018] The substrate driving mechanism SD includes a substrate holder SH that holds the substrate S, and a substrate stage SS that supports the substrate holder SH. The substrate stage SS includes an actuator (not shown), which drives the substrate S to move about multiple axes (e.g., three axes: X-axis, Y-axis, and θZ-axis, and preferably six axes: X-axis, Y-axis, Z-axis, θX-axis, θY-axis, and θZ-axis).

[0019] The measuring instrument 29 is, for example, an interferometer, which receives light from a reference mirror arranged on the substrate stage SS and measures the position and orientation of the substrate S (substrate stage SS). Note that the measuring instrument 29 may also be an encoder. The control unit 7 controls the substrate driving mechanism SD based on the measurement results of the measuring instrument 29.

[0020] The mold driving mechanism MD includes a mold holding unit MH that holds the mold M and a mold driving actuator MM that drives the mold holding unit MH. The mold holding unit MH includes a mold deformation mechanism that deforms the mold M, and the mold deformation mechanism can deform the mold M, for example, by applying force to the side of the mold M. The mold driving mechanism MD drives the mold M about multiple axes (e.g., three axes: Z axis, θX axis, and θY axis; preferably six axes: X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis). The mold M has a pattern region PR in which a pattern to be transferred to the curable composition IM is formed. The mold driving mechanism MD can include a pressure regulator PC that adjusts the pressure in a space SP on the back side of the mold M (opposite the pattern region PR) to deform the mold M (pattern region PR) into a convex shape toward the substrate S or flatten it. In a contact step in which the mold M is brought into contact with the substrate S (curable composition IM), the pressure regulator PC adjusts the pressure in the space SP so that contact between the curable composition IM on the substrate S and the pattern region PR begins in a state in which the mold M is deformed into a convex shape toward the substrate S. Thereafter, the pressure regulator PC adjusts the pressure in the space SP so that the contact area between the curable composition IM and the pattern region PR gradually expands.

[0021] In each sequence of contacting the curable composition IM with the mold M, aligning the substrate S with the mold M, and separating the mold M from the cured curable composition IM, at least one of the substrate driving mechanism SD and the mold driving mechanism MD is driven to adjust the relative position between the substrate S and the mold M. Aligning the substrate S with the mold M may include control of the position and / or attitude of at least one of the substrate S and the mold M. Alignment may also include control to correct or change the shape of at least one of the substrate S and the mold M. The control unit 7 controls the driving of at least one of the substrate driving mechanism SD and the mold driving mechanism MD in the alignment process based on the detection result of the detector 12.

[0022] The discharging unit 5 supplies, applies, or places the curable composition IM on the substrate S. Note that, although the present embodiment illustrates an example in which the discharging unit 5 is included in the imprinting apparatus 1, the curable composition IM may be supplied, applied, or placed by an external device to the imprinting apparatus 1.

[0023] The curable composition IM is a photocurable composition that cures upon irradiation with light. The photocurable composition contains at least a polymerizable compound and a photopolymerization initiator and may further contain a non-polymerizable compound or a solvent, as necessary. The non-polymerizable compound is at least one selected from the group consisting of sensitizers, hydrogen donors, internal mold release agents, surfactants, antioxidants, and polymer components. The curable composition IM can be arranged on a substrate in the form of droplets, or in the form of islands or a film formed by connecting multiple droplets. The viscosity of the curable composition IM (at 25°C) can be, for example, 1 mPa·s or more and 100 mPa·s or less.

[0024] The curing light source 2 irradiates light 9 (curing light) for curing the curable composition IM between the substrate S and the mold M (the pattern region PR thereof) in the curing step of curing the curable composition IM.

[0025] The detector 12 irradiates the substrate S with detection light 15 and detects the relative position of the alignment mark provided on the mold M with the alignment mark provided on the substrate S.

[0026] The imaging unit 6 detects the contact state between the curable composition IM on the substrate S and (the pattern region PR of) the mold M, or the filling state of the curable composition IM in the space between the substrate S and (the pattern region PR of) the mold M. The imaging unit 6 can also be used to detect foreign matter between the substrate S and the mold M. The imaging unit 6 can illuminate the layered structure composed of the substrate S, the curable composition IM, and the mold M with observation light 18 and capture an image formed by this layered structure.

[0027] The light source unit 20 emits modulated light 21. The light source unit 20 will be described in detail later.

[0028] The optical axes of the curing light source 2, detector 12, imaging section 6, and light source unit 20 share part of the optical path. To achieve this, a combining mirror 22 and dichroic mirrors 23 and 24 are provided. The combining mirror 22 transmits the observation light 18 and reflects the light 21. The dichroic mirror 23 transmits the observation light 18 and the light 21 and reflects the detection light 15. The dichroic mirror 24 transmits the observation light 18, the light 21, and the detection light 15 and reflects the curing light 9.

[0029] The control unit 7 includes a processing unit, a bus, a ROM, a RAM, and a storage device, and each component functions according to a program. The processing unit is a processing device that performs control calculations according to the program and controls each component connected to the bus. This processing unit can be configured with a CPU, a PLD such as an FPGA, an ASIC, a computer with a built-in program, or a combination of all or part of these. The ROM is a memory for reading data only and stores programs and data. The RAM is a memory for reading and writing data and is used to store programs and data. The RAM is used for temporary storage of data such as the results of CPU calculations. The storage device is also used to store programs and data. The storage device is also used as a temporary storage area for the operating system (OS) program and data of the control unit 7. The storage device has slower data input / output speed than RAM, but is capable of storing large amounts of data. The storage device is preferably a non-volatile storage device that can store data as permanent data so that the data can be referenced for a long period of time. The storage device is mainly configured as a magnetic storage device (HDD), but may also be a device that reads and writes data from and to external media such as CDs, DVDs, and memory cards. The control unit 7 may be configured separately from the imprint apparatus 1 (in a separate housing).

[0030] The user interface unit 200 includes an input device and a display device (display unit). The input device is a device for inputting characters and data into the imprinting apparatus 1, and corresponds to various types of keyboards, mice, touch panels, etc. The display device is a device for displaying information necessary for operating the imprinting apparatus 1, processing results, etc., and corresponds to a CRT or LCD monitor, etc. The user interface unit 200 may be located outside the imprinting apparatus 1. The input device may also be a mobile communication terminal, etc.

[0031] 2 is a diagram showing the configuration of the light source unit 20. The light source unit 20 includes a first light source 121 that emits a first light having a first wavelength range and a second light source 122 that emits a second light having a second wavelength range. The light source unit 20 also includes a spatial light modulator 133 that modulates the first light and the second light. The spatial light modulator 133 is, for example, a DMD (digital mirror device). The light source unit 20 may also include an optical system (125, 126, 111, 132) that causes the first light from the first light source 121 and the second light from the second light source 122 to enter the spatial light modulator 133.

[0032] In one example, the light source unit 20 may be configured by connecting an illumination section 120 and a modulation section 130 via an optical fiber 110. The illumination section 120 may include a first light source 121, a second light source 122, and mirrors 125 and 126. The optical path of the first light emitted from the first light source 121 and the optical path of the second light emitted from the second light source 122 are made common by the mirrors 125 and 126. The first light and the second light are incident on an incident section 111 of the optical fiber 110. The first light and the second light emitted from an exit section 112 of the optical fiber 110 are emitted to the modulation section 130 and then incident on the spatial light modulator 133 via an optical system 132. The optical system 132 may include, for example, a focusing optical system and an illumination system (e.g., a microlens array) that homogenizes the light from the focusing optical system and illuminates the spatial light modulator 133. The spatial light modulator 133 includes a plurality of micromirrors (not shown) that reflect light and an actuator that drives each of the micromirrors. Each actuator controls the corresponding micromirror to an angle of −12 degrees (ON state) or +12 degrees (OFF state) relative to the array surface of the micromirrors according to instructions from the control unit 7. Light reflected by the micromirrors in the ON state forms an image on the substrate S as light 21 via an optical system 134 (projection optical system) that establishes a conjugate relationship between the spatial light modulator 133 and the substrate S. Light reflected by the micromirrors in the OFF state is reflected in a direction that does not reach the substrate S. The area projected onto the substrate S when all micromirrors are in the ON state (maximum irradiation area) is larger than the size of the maximum pattern formation area on the substrate S. The spatial light modulator 133 does not have to be a DMD, and other spatial light modulators, such as a liquid crystal display (LCD), may be used.

[0033] The configuration in which the modulation section 130 is shared by the first light source 121 and the second light source 122 is advantageous for reducing the size of the modulation section 130 or the light source unit 20, thereby simplifying the structure of the imprint apparatus 1.

[0034] The control unit 7 can individually control the first light source 121 and the second light source 122. For example, the control unit 7 can control the first light source 121 and the second light source 122 so that when one of the first light source 121 and the second light source 122 is turned on, the other is turned off. From another perspective, the control unit 7 can control the first light source 121 and the second light source 122 so that when one of the first light from the first light source 121 and the second light from the second light source 122 is incident on the spatial light modulator 133, the other of the first light and the second light is not incident on the spatial light modulator 133. This may be achieved, for example, by controlling the first light source 121 and the second light source 122, or by a mechanism that selectively blocks one of the first light and the second light.

[0035] Furthermore, the control unit 7 may generate control data for controlling switching between the ON state and the OFF state of each micromirror of the spatial light modulator 133, for example, based on data on the light intensity distribution (illuminance distribution) to be formed on the surface of the substrate S. The light intensity distribution data may include, for example, information on the time for which each micromirror is to be turned ON and information on the time for which each micromirror is to be turned OFF. The more micromirrors that are in the ON state and the longer the ON state is, the greater the exposure amount that can be applied to the pattern formation region of the substrate S. The control unit 7 stores light intensity distribution data for modulating the first light and light intensity distribution data for modulating the second light.

[0036] The light 21 may include at least one of first light that partially cures the curable composition IM and second light that deforms the substrate S to align the substrate S with the mold M. It is preferable that when the substrate S is irradiated with the first light, the substrate S is not irradiated with the second light, and when the substrate S is irradiated with the second light, the substrate S is not irradiated with the first light. However, if the period during which the substrate S is irradiated with light 21 including both the first light and the second light is sufficiently short, both the first light and the second light may be irradiated onto the substrate S. The first light and the second light are light whose wavelength ranges do not overlap. Alternatively, the first light and the second light may be light whose peaks are at different wavelengths.

[0037] The first light has a wavelength that hardens the curable composition IM, in other words, a wavelength that increases the viscosity (viscoelasticity) of the curable composition IM. The first light can be modulated to increase the viscosity of the curable composition IM at any location in the pattern formation region of the substrate S, thereby increasing the bonding strength between the substrate S and the mold M via the imprint material IM. This type of first light irradiation is called pre-exposure, pre-exposure, pre-curing, or vibration-damping exposure, and is performed in the alignment process to improve alignment accuracy by reducing relative vibration between the substrate S and the mold M. When the bonding strength between the substrate S and the mold M via the curable composition IM is weak (before irradiation with the first light), the substrate S and the mold M may vibrate independently due to external disturbances, etc. (i.e., the relative vibration between the substrate S and the mold M is large). Irradiating the curable composition IM with the first light partially increases the viscosity of the curable composition IM (partially hardening the curable composition IM) and increases the bonding strength between the substrate S and the mold M. This reduces the relative vibration between the substrate S and the mold M and improves alignment convergence. In one example, increasing the viscosity (viscoelasticity) of the curable composition IM by irradiating it with the first light so that the magnitude of the shear force generated by the relative movement between the substrate S and the mold M is within a range of 0.5 to 1.0 N is effective in improving the convergence of alignment. In this embodiment, the first light source 121 and the spatial light modulator 133 that irradiate the first light are referred to as a viscosity adjustment unit. Note that the viscosity adjustment unit may include, in addition to the first light source 121 and the spatial light modulator 133, optical elements that are interposed between the first light and the substrate S before it is irradiated with the first light.

[0038] The second light may be light modulated so that it is irradiated onto the substrate S with a light intensity distribution (illuminance distribution) that deforms the substrate S (the shot area, which is the pattern formation area of ​​the substrate S) into the target shape. In the alignment process, a temperature distribution is formed on the substrate S by irradiating the substrate S with the second light, and this temperature distribution causes the pattern formation area of ​​the substrate S to deform into the target shape. After the pattern formation area of ​​the substrate S has deformed into the target shape and the pattern formation area of ​​the substrate S has been aligned with the pattern area PR of the mold M, a curing process (a process in which the curing light source 2 irradiates the curable composition IM with curing light, thereby curing the curable composition IM) is carried out. The second light is light having a wavelength that does not cure the curable composition IM.

[0039] An example of wavelength allocation for the curing light 9, detection light 15, observation light 18, and light 21 (first light, second light) will be described below. The curing light 9 can have any wavelength range within the range of 300 nm to 380 nm, but may have a wavelength range of 300 nm or less. In one example, the detection light 15 has a wavelength range of 550 nm to 750 nm. The observation light 18 can have a wavelength range selected from the wavelength range of 400 nm to 480 nm so as not to overlap with the wavelength ranges of the curing light 9 and the detection light 15. The light 21 includes a first light having a wavelength range that cures the curable composition IM and a second light having a wavelength range that does not cure the curable composition IM. The light 21 can be selected from the same wavelength range as the observation light 18, for example, the wavelength range of 400 nm to 480 nm so as not to overlap with the wavelength ranges of the curing light 9 and the detection light 15. The wavelengths of the first light emitted by the first light source 121 and the second light emitted by the second light source 122 can be determined based on the upper limit of the wavelength range in which the curable composition IM cures. For example, if the upper limit of the wavelength range in which the curable composition IM cures is 440 nm, the wavelength of the first light emitted by the first light source 121 can be set to approximately 410 nm, and the wavelength of the second light emitted by the second light source 122 can be set to approximately 460 nm. The first light source 121 and the second light source 122 are preferably light sources that emit single-wavelength light with a narrow wavelength range, and for example, laser diodes are suitable. Laser diodes are also advantageous in that they can be switched on and off quickly.

[0040] The optical system constituting the modulation unit 130 must transmit both the first light having a wavelength that cures the curable composition IM and the second light having a wavelength that does not cure the curable composition IM. Furthermore, with a typical DMD, the maximum light intensity that can be irradiated onto the micromirror array decreases at wavelengths of 420 nm or less. Furthermore, near 400 nm, which is the boundary between ultraviolet light and visible light, the maximum light intensity that can be irradiated onto the micromirror array drops dramatically to about 1 / 1000. Therefore, it is desirable to use a laser diode or the like with a narrow wavelength range to bring the wavelengths of the first light source 121 and the second light source 122 close to the upper limit of the wavelength range in which the curable composition IM cures.

[0041] FIG. 3 shows an example in which the waiting time after the application of the underlayer U is short. The waiting time is the time between the end of the application step and the start of the imprinting step (imprint processing). The imprinting step includes a contacting step, an alignment step, a curing step, and a demolding step. The contacting step is a step of bringing the curable composition IM on the substrate S into contact with the mold M. The alignment step is a step of aligning the substrate S with the mold M after the contacting step. The curing step is a step of curing the curable composition IM after the alignment step. The demolding step is a step of releasing the mold M from the substrate S after the curing step. The alignment step involves irradiating the first light, irradiating the second light, and driving at least one of the substrate driving mechanism SD and the mold driving mechanism MD. The irradiation of the first light increases the viscosity (viscoelasticity) of the curable composition IM. The irradiation of the second light deforms the substrate S (the shot area, which is the pattern formation area of ​​the substrate S) into the target shape. The filling step also proceeds in parallel with the alignment step. In the filling process, the curable composition IM between the substrate S and the pattern region PR of the mold M is filled into the recesses that form the pattern of the pattern region PR, and the gaps that exist between the substrate S and the pattern region PR of the mold M are reduced (preferably eliminated).

[0042] The substrate S, on which the base layer U has been applied by the application apparatus 100, is transported to the imprint apparatus 1 at a desired timing before the imprint process is performed. The transported substrate S is subjected to each of the processes included in the imprint process.

[0043] Here, the base layer U occludes oxygen during the waiting time between the end of the coating process in which the base layer U is applied and the start of the imprinting process. This oxygen occlusion in the base layer U is more likely to occur the longer the waiting time, the more easily the base layer U is made of a material that occludes oxygen, and the thicker the base layer U. In other words, the amount of oxygen occluded in the base layer U varies depending on the conditions related to the base layer U (first layer) (the waiting time, the material of the base layer U, and the thickness of the base layer U).

[0044] When the curable composition IM is applied onto the base layer U, some of the oxygen occluded in the base layer U diffuses into the curable composition IM. Therefore, if the base layer U occludes a large amount of oxygen, the amount of oxygen diffusing from the base layer U into the curable composition IM also increases. Because oxygen inhibits the curing of the curable composition IM, if the base layer U occludes a large amount of oxygen and the amount of oxygen diffusing into the curable composition IM increases, the viscosity adjuster cannot sufficiently increase the viscosity of the curable composition IM.

[0045] Therefore, in this embodiment, an imprinting apparatus 1 is provided that is advantageous for improving the viscosity of the curable composition IM by controlling the viscosity adjusting unit based on conditions related to the base layer U. In other words, in this embodiment, the viscosity adjusting unit is controlled based on the amount of oxygen occluded in the base layer.

[0046] The allowable time is the upper limit of the waiting time during which the viscosity adjusting unit can increase the viscosity of the curable composition IM to the desired effect (the target value for viscoelasticity) without changing the control parameters of the viscosity adjusting unit. In the example of Figure 3, the waiting time is shorter than the allowable time. In such a case, the viscosity adjusting unit can sufficiently increase the viscosity of the curable composition IM. In other words, the viscosity of the curable composition can be increased to the target value by pre-exposure of the viscosity adjusting unit during alignment. Therefore, the relative vibration between the mold M and the substrate S can be sufficiently reduced before the curing process.

[0047] FIG. 4 shows a conventional example in which the waiting time after the application of the base layer U is long. In the example of FIG. 4, the waiting time is longer than the allowable time. In such a case, the base layer U absorbs a large amount of oxygen, and a large amount of oxygen diffuses into the curable composition IM, inhibiting the curing of the curable composition IM. As a result, the viscosity of the curable composition IM cannot be sufficiently increased by the viscosity adjusting unit. In other words, the viscosity of the curable composition IM cannot be increased to the target value by pre-exposure of the viscosity adjusting unit during alignment. Therefore, the relative vibration between the mold M and the substrate S cannot be sufficiently reduced before the curing process. This results in low alignment accuracy.

[0048] In this embodiment, even if the curing of the curable composition IM is inhibited by adjusting the control parameters for controlling the viscosity adjuster based on the conditions related to the base layer U (in this case, the waiting time), the viscosity adjuster can sufficiently increase the viscosity of the curable composition IM. FIG. 5 is a diagram showing an example of a long waiting time after the base layer U is applied in this embodiment. In this embodiment, when the waiting time after the base layer U is applied is long, the control parameters of the viscosity adjuster can be adjusted to increase the viscosity of the curable composition to the target value during pre-exposure. Therefore, the relative vibration between the mold M and the substrate S can be sufficiently reduced before the curing step. The control of the viscosity adjuster based on the conditions related to the base layer U is, in other words, control based on the amount of oxygen stored in the base layer U. Specifically, the viscosity adjuster controls the viscosity of the curable composition IM on the base layer U where the amount of oxygen stored is a first amount differently from the viscosity of the curable composition IM on the base layer U where the amount of oxygen stored is a second amount greater than the first amount.

[0049] FIG. 6 is a flowchart of the imprint process according to this embodiment. First, a base layer U is applied to a substrate S using a coating apparatus 100 (base coating step, S10). Step S10 may further include a step of applying an adhesion layer A on the base layer U or a step of baking the base layer U. Next, at a desired timing before the imprint process, the substrate S is transported to the imprint apparatus 1 (transport step, S20). Next, control parameters for the viscosity adjuster are determined based on conditions related to the base layer U (waiting time, material of the base layer U, thickness of the base layer U) (S30, determination step). The determination step includes an acquisition step of acquiring conditions related to the base layer U. The acquisition step and determination step are information processing methods performed by the control unit 7 (information processing device) according to a program stored therein. The control unit 7 includes an acquisition unit that acquires conditions related to the base layer U and a determination unit that determines control parameters for the viscosity adjuster. Here, the determination step may be performed by an information processing device within the imprint apparatus 1 other than the control unit 7, or by an information processing device external to the imprint apparatus 1. In this case, the information processing device includes an acquisition unit that acquires the conditions (information) related to the underlayer U, and a determination unit that determines the control parameters of the viscosity adjusting unit. The determination step will be described in detail later.

[0050] Next, the curable composition IM is applied onto the substrate S, and the curable composition IM is brought into contact with the mold M (S40, contact step). Next, the substrate S (shot area) and the mold M are aligned (S50, alignment step). In this alignment step, the control unit 7 controls the viscosity adjustment unit using the control parameters of the viscosity adjustment unit determined in the determination step. That is, the viscosity of the curable composition IM is increased by the viscosity adjustment unit, thereby reducing relative vibration between the substrate S and the mold M. In this alignment step, as described above, irradiation with second light that deforms the substrate S (shot area, which is the pattern formation area of ​​the substrate S) into a target shape, driving at least one of the substrate driving mechanism SD and the mold driving mechanism MD, etc. are also performed.

[0051] After the alignment of the substrate S and the mold M is completed, the curable composition IM is completely cured by the curing light 9 from the curing light source 2 (curing step, S60). Next, the mold M is released from the cured curable composition IM (mold releasing step, S70). Next, the control unit 7 determines whether or not the imprint process has been completed for all shot areas on the substrate S that are the targets of the imprint process (determination step, S80). If the imprint process has been completed for all shot areas, the process ends. If the imprint process has not been completed for all shot areas, the imprint process from step S40 onwards is performed on the shot areas for which the imprint process has not been completed.

[0052] The control parameters of the viscosity adjusting unit may be determined for each lot or for each substrate S. Since the waiting time after coating the underlayer U for each substrate S varies even within a lot, determining the control parameters of the viscosity adjusting unit for each substrate S allows appropriate viscosity adjustment for alignment for each substrate S.

[0053] Next, the details of the determination process for determining the control parameters of the viscosity adjustment unit will be described. The control unit 7 determines the control parameters of the viscosity adjustment unit, namely, the illuminance (W / m2) of the first light source 121, the irradiation time (msec) of the first light, and the wavelength (nm) of the first light, based on conditions related to the base layer U (standby time, material of the base layer U, thickness of the base layer U). Here, the control parameters of the viscosity adjustment unit may be determined based on at least one of the standby time, material of the base layer U, and thickness of the base layer U.

[0054] For example, the longer the waiting time, the more easily the base layer U is made of a material that absorbs oxygen, and the thicker the base layer U, the more oxygen the base layer U absorbs. Therefore, the illuminance of the first light source 121 is increased, the irradiation time of the first light is lengthened, and the wavelength of the first light is made closer to the wavelength of the curing light 9. Specifically, when any of the waiting time, the oxygen absorption property of the material of the base layer U, and the thickness of the base layer U exceeds a reference value, the illuminance of the first light source 121 is increased, the irradiation time of the first light is lengthened, and the wavelength of the first light is made closer to the wavelength of the curing light 9. Note that it is sufficient to adjust at least one of the illuminance of the first light source 121, the irradiation time of the first light, and the wavelength of the first light, or a combination of these may be adjusted. Furthermore, the necessity of adjusting the control parameters of the viscosity adjustment unit based on the waiting time may be determined by comparing it with, for example, the aforementioned allowable time.

[0055] The acquisition of (information about) the conditions related to the underlayer U in the acquisition process included in the determination process can be obtained, for example, by receiving information from the coating apparatus 100 or by an operator inputting information through the user interface unit 200. Alternatively, the information can be obtained based on a lot number or an index given to the lot or substrate for identification.

[0056] For example, if the standby time is 48 hours, the illuminance of the first light source 121 is increased by about 100 to 300 W / m2.

[0057] The adjustment of the irradiation time of the first light is realized by adjusting the lighting time of the first light source 121, adjusting the blocking time of the first light by a blocking member that blocks the first light from the first light source 121, and adjusting the time for which the first light is irradiated from the spatial light modulator 133. Adjusting the time for which the first light is irradiated from the spatial light modulator 133 means, for example, adjusting the time for which the micromirror is turned on when the spatial light modulator 133 is a DMD.

[0058] Specifically, the irradiation time can be increased by increasing the lighting time of the first light source 121, shortening the time that the first light from the first light source 121 is blocked by a shielding member, or increasing the time that the first light is irradiated from the spatial light modulator 133.

[0059] For example, if the standby time is 48 hours, the irradiation time of the first light is increased by about 40 to 80 mSec.

[0060] When there is sufficient time for the irradiation time of the first light, the control parameters of the viscosity adjusting unit are adjusted with priority to lengthen the irradiation time of the first light. For example, the control parameters of the viscosity adjusting unit are adjusted (changed) with priority in the order of the irradiation time of the first light, the illuminance of the first light source 121, and the wavelength of the first light.

[0061] The control unit 7 determines the control parameters of the viscosity adjustment unit based on, for example, a table stored in the control unit 7 or another storage device. This table is, for example, a table in which conditions related to the base layer U correspond to control parameters of the viscosity adjustment unit, and the control unit 7 selects, as the control parameters to be used, the control parameters corresponding to the conditions related to the base layer U for the base layer U to be imprinted. Alternatively, the control parameters of the viscosity adjustment unit are determined using an equation stored in the control unit 7 or another storage device. This equation is, for example, an equation in which the control parameters are calculated by substituting numerical values ​​of conditions related to the base layer U. Alternatively, the control unit 7 or another information processing device may determine the control parameters of the viscosity adjustment unit using a model in which the conditions related to the base layer U are input and the control parameters of the viscosity adjustment unit are output. The control unit 7 may update the table, equation, or model based on the results of the relative vibration between the mold M and the substrate S in the alignment process.

[0062] The user interface unit 200 may, for example, display the control parameters of the viscosity adjustment unit after adjustment. Furthermore, the control parameters of the viscosity adjustment unit before adjustment and information on conditions related to the base layer U may be displayed. The control parameters of the viscosity adjustment unit may also be determined based on input from the operator via the user interface unit 200. Furthermore, for example, the control parameters of the viscosity adjustment unit before adjustment and the control parameters of the viscosity adjustment unit calculated based on conditions related to the base layer U may be displayed, allowing the operator to select whether or not to adjust the control parameters of the viscosity adjustment unit.

[0063] In the present embodiment, an example has been shown in which the viscosity adjustment unit is controlled based on conditions related to the first layer. However, the viscosity adjustment unit may be controlled based on conditions related to the adhesion layer A in addition to the conditions related to the first layer. Conditions related to the adhesion layer include, for example, the material of the adhesion layer A and the thickness of the adhesion layer A. For example, the amount of oxygen diffusing from the base layer U to the curable composition IM increases as the adhesion layer A becomes thinner, or as the adhesion layer A becomes a material that easily occludes oxygen, or as the adhesion layer A becomes a material that easily allows oxygen to pass through. Therefore, for example, the thinner the adhesion layer A is, or the more easily the adhesion layer A becomes a material that easily occludes oxygen, or as the adhesion layer A becomes a material that easily allows oxygen to pass through, the illuminance of the first light source 121 should be increased, the irradiation time of the first light should be lengthened, and the wavelength of the first light should be closer to the wavelength of the curing light 9.

[0064] Furthermore, in this embodiment, the imprint apparatus 1 has been described as an example, but it may also be a planarizing apparatus that uses a flat plate to planarize the composition on the substrate.

[0065] According to this embodiment, the viscosity in the alignment process is adjusted using control parameters of the viscosity adjustment unit based on conditions related to the base layer U, so it is possible to adjust the viscosity according to the waiting time, material, thickness, etc. of the base layer U. In other words, it is possible to adjust the viscosity to the desired level regardless of the waiting time, material, thickness, etc. of the base layer U, and it is possible to reduce relative vibration between the mold M and the substrate S. This is therefore advantageous for aligning the mold M and the substrate S.

[0066] Second Embodiment This embodiment relates to a method for manufacturing an article, characterized in that the article is manufactured using the imprint apparatus 1 described in the first embodiment.

[0067] 7A and 7B are schematic diagrams illustrating a method for manufacturing an article according to the present embodiment. As shown in Fig. 7A, a substrate S is prepared, on the surface of which a workpiece 50 such as an insulator is formed. Then, a curable composition IM is applied to the surface of the workpiece 50 by an inkjet method or the like. Here, the state in which the curable composition IM in the form of multiple droplets has been applied to the substrate S is shown.

[0068] Next, as shown in FIG. 7(b), the mold M is placed so that the side of the mold M on which the concave-convex pattern is formed faces the curable composition IM on the substrate S.

[0069] 7(c), a mold M is brought into contact with (pressed against) the substrate S on which the curable composition IM has been applied. The curable composition IM fills the gap between the mold M and the workpiece 50. In this state, curing light 9 is irradiated as energy for curing, and the curable composition IM is cured.

[0070] Next, as shown in Fig. 7(d), after the curable composition IM is cured, the mold M is released (pulled away) from the substrate S. This forms a pattern of the cured product of the curable composition IM on the substrate S. In this cured product pattern, the recesses of the mold M correspond to the protrusions of the cured product, and the recesses of the mold correspond to the protrusions of the cured product, i.e., the concave-convex pattern of the mold M is transferred to the curable composition IM.

[0071] 7(e), etching is performed using the pattern of the cured material and the first layer (base layer) (not shown) as an etching-resistant mask, thereby removing the portions of the surface of the workpiece 50 where there is no cured material or where only a thin layer remains, and grooves 51 are formed.

[0072] Next, as shown in FIG. 7(f), the pattern of the cured product is removed, whereby an article having grooves 51 formed on the surface of the workpiece 50 can be obtained.

[0073] Here, the pattern of the cured product was removed, but it may be left unremoved after processing and used as, for example, an interlayer insulating film included in a semiconductor element or the like, that is, as a component of an article.

[0074] The pattern of the cured product formed using the imprint apparatus 1 is used permanently on at least a part of various articles, or temporarily when manufacturing various articles.

[0075] The article may be an electric circuit element, an optical element, a MEMS, a recording element, a sensor, or a mold. Examples of the electric circuit element include volatile or non-volatile semiconductor memory such as DRAM, SRAM, flash memory, and MRAM, and semiconductor elements such as LSI, CCD, image sensor, and FPGA. Examples of the optical element include a microlens, a light guide, a waveguide, an anti-reflection film, a diffraction grating, a polarizing element, a color filter, a light-emitting element, a display, and a solar cell. Examples of the MEMS include a DMD, a microchannel, and an electromechanical conversion element. Examples of the recording element include an optical disk such as a CD or a DVD, a magnetic disk, a magneto-optical disk, and a magnetic head. Examples of the sensor include a magnetic sensor, an optical sensor, and a gyro sensor. Examples of the mold include an imprint mold.

[0076] The pattern of the cured product may be used as it is as at least a part of a component of the article, or may be used temporarily as a resist mask, which is removed after etching or ion implantation in a substrate processing step.

[0077] The disclosure of this specification includes the following imprint apparatus, information processing method, program, imprint method, and article manufacturing method.

[0078] (Item 1) an imprinting apparatus that aligns a substrate with a mold on which a pattern has been formed, while bringing a curable composition coated on a first layer containing carbon and on which a pattern is not to be formed into contact with the mold, and cures the curable composition with curing light to form the pattern in the curable composition, a viscosity adjusting unit that adjusts the viscosity of the curable composition by irradiating the curable composition with a first light different from the curing light; a control unit that controls the viscosity adjusting unit based on conditions related to the first layer; An imprinting apparatus comprising:

[0079] (Item 2) The imprinting apparatus described in item 1, characterized in that the conditions related to the first layer include at least one of the material of the first layer, the thickness of the first layer, and the waiting time between applying the first layer and starting the imprinting process.

[0080] (Item 3) 3. The imprint apparatus according to item 1 or 2, wherein the control unit controls the viscosity adjustment unit using control parameters of the viscosity adjustment unit based on conditions related to the first layer.

[0081] (Item 4) 4. The imprint apparatus according to item 3, wherein the control parameters include at least one of an illuminance of the first light, an irradiation time of the first light, and a wavelength of the first light.

[0082] (Item 5) The imprinting apparatus described in item 4, characterized in that the adjustment of the irradiation time is included in the viscosity adjustment unit and includes at least one adjustment of the lighting time of a light source that irradiates the first light, the blocking time that the first light is blocked, and the adjustment of a spatial light modulator that modulates the first light.

[0083] (Item 6) The imprinting apparatus described in item 2 is characterized in that the control unit adjusts the control parameters of the viscosity adjustment unit when any of the waiting time, the thickness of the first layer, and the oxygen absorption ability of the material exceeds a reference value.

[0084] (Item 7) Item 6. The imprinting apparatus of item 6, characterized in that, when any one of the waiting time, the thickness of the first layer, and the oxygen absorption ability of the material of the first layer exceeds a reference value, the control unit performs at least one of control to increase the illuminance of the first light, control to lengthen the irradiation time of the first light, and control to bring the wavelength of the first light closer to the wavelength of the curing light that completely cures the curable composition.

[0085] (Item 8) The imprint apparatus described in item 3, characterized in that the control parameters are determined based on at least one of a table in which the conditions related to the first layer correspond to the control parameters, and a model or formula that uses the conditions related to the first layer as input.

[0086] (Item 9) 9. The imprinting apparatus of item 8, wherein the output of the model or the equation is the control parameter.

[0087] (Item 10) 9. The imprint apparatus according to item 8, wherein the control unit updates at least one of the table, the model, and the formula based on the result of the alignment.

[0088] (Item 11) The imprinting apparatus described in any one of items 1 to 10, characterized in that the control unit acquires conditions related to the first layer based on at least one of information received from a coating device that coated the first layer, input by an operator from a user interface unit, and an indicator for identifying the substrate.

[0089] (Item 12) 4. The imprint apparatus according to item 3, further comprising a display unit that displays the control parameters.

[0090] (Item 13) 13. The imprinting apparatus according to any one of items 1 to 12, wherein the control unit controls the viscosity adjusting unit based on the amount of oxygen absorbed by the first layer.

[0091] (Item 14) 14. The imprinting apparatus according to any one of items 1 to 13, wherein the control unit controls the viscosity adjusting unit based on conditions related to an adhesive layer.

[0092] (Item 15) an imprinting apparatus that aligns a substrate with a mold on which a pattern has been formed, while bringing a curable composition coated on a first layer containing carbon and on which a pattern is not to be formed into contact with the mold, and cures the curable composition with curing light to form the pattern in the curable composition, a viscosity adjusting unit that adjusts the viscosity of the curable composition by irradiating the curable composition with a first light different from the curing light; a control unit that controls the viscosity adjusting unit, the control unit controls the viscosity adjusting unit differently for adjusting the viscosity of the curable composition applied on a first layer having a first amount of oxygen storage and adjusting the viscosity of the curable composition applied on a first layer having a second amount of oxygen storage that is greater than the first amount. An imprinting apparatus comprising:

[0093] (Item 16) An information processing method for an imprinting apparatus that aligns a substrate with a mold on which a pattern is formed, in a state in which the substrate and the mold are brought into contact with a curable composition coated on a first layer on a substrate, the curable composition being coated on the first layer and containing carbon, and that forms the pattern in the curable composition by curing the curable composition with curing light, the information processing method comprising determining a control parameter for a viscosity adjusting unit that adjusts the viscosity of the curable composition, the control parameter being used in the alignment an acquisition step of acquiring condition information related to the first layer; a determination step of determining the control parameters based on the information acquired in the acquisition step; An information processing method comprising:

[0094] (Item 17) 17. The information processing method according to item 16, further comprising a display step of displaying the control parameters.

[0095] (Item 18) 18. A program for causing a computer to execute the information processing method according to item 16 or 17.

[0096] (Item 19) 1. An imprinting method comprising: aligning a substrate with a mold on which a pattern has been formed, in a state where a curable composition coated on a first layer containing carbon and on which a pattern is not to be formed is brought into contact with the mold; and curing the curable composition with curing light to form the pattern in the curable composition, an alignment step of irradiating the curable composition with a first light different from the curing light to adjust the viscosity of the curable composition and aligning the substrate with the mold; a curing step of irradiating the curable composition with the curing light to cure the curable composition; and a demolding step of releasing the mold from the cured curable composition, The viscosity of the curable composition is adjusted based on information about the conditions of the first layer. An imprint method comprising:

[0097] (Item 20) A forming step of forming a pattern on a substrate using the imprint method according to item 19; a processing step of processing the substrate on which the pattern has been formed in the forming step; A method for manufacturing an article, comprising:

[0098] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention.

Claims

1. an imprinting apparatus that aligns a substrate with a mold on which a pattern has been formed, in a state where a curable composition applied onto a first layer containing carbon and on which a pattern is not to be formed is brought into contact with the mold, and cures the curable composition with curing light to form the pattern in the curable composition, a viscosity adjusting unit that adjusts the viscosity of the curable composition by irradiating the curable composition with a first light different from the curing light; a control unit that controls the viscosity adjusting unit based on a condition related to the first layer; An imprinting apparatus comprising:

2. 2. The imprint apparatus according to claim 1, wherein the conditions related to the first layer include at least one of a material of the first layer, a thickness of the first layer, and a waiting time from application of the first layer until the start of the imprint process.

3. The imprint apparatus according to claim 1 , wherein the control unit controls the viscosity adjustment unit using control parameters of the viscosity adjustment unit that are based on conditions related to the first layer.

4. 4. The imprint apparatus according to claim 3, wherein the control parameters include at least one of an illuminance of the first light, an irradiation time of the first light, and a wavelength of the first light.

5. The imprint apparatus of claim 4, characterized in that the adjustment of the irradiation time is included in the viscosity adjustment unit and includes at least one adjustment of the lighting time of a light source that irradiates the first light, the blocking time that the first light is blocked, and the adjustment of a spatial light modulator that modulates the first light.

6. 3. The imprint apparatus according to claim 2, wherein the control unit adjusts a control parameter of the viscosity adjustment unit when any one of the waiting time, the thickness of the first layer, and the oxygen occlusion ability of the material exceeds a reference value.

7. 7. The imprint apparatus according to claim 6, wherein the control unit performs at least one of control to increase the illuminance of the first light, control to lengthen the irradiation time of the first light, and control to bring the wavelength of the first light closer to the wavelength of the curing light that completely cures the curable composition when any of the waiting time, the thickness of the first layer, and the oxygen occlusion ability of the material of the first layer exceeds a reference value.

8. 4. The imprint apparatus according to claim 3, wherein the control parameters are determined based on at least one of a table in which the conditions related to the first layer correspond to the control parameters, and a model or an equation in which the conditions related to the first layer are input.

9. 9. The imprinting apparatus of claim 8, wherein an output of the model or the equation is the control parameter.

10. The imprint apparatus according to claim 8 , wherein the control unit updates at least one of the table, the model, and the formula based on the result of the alignment.

11. The imprint apparatus according to claim 1, characterized in that the control unit acquires conditions regarding the first layer based on at least one of receiving information from a coating device that applied the first layer, input by an operator from a user interface unit, and an indicator for identifying the substrate.

12. The imprint apparatus according to claim 3 , further comprising a display unit that displays the control parameters.

13. The imprint apparatus according to claim 1 , wherein the control unit controls the viscosity adjusting unit based on an amount of oxygen absorbed by the first layer.

14. The imprint apparatus according to claim 1 , wherein the control unit controls the viscosity adjusting unit based on conditions related to an adhesion layer.

15. an imprinting apparatus that aligns a substrate with a mold on which a pattern has been formed, in a state where a curable composition applied onto a first layer containing carbon and on which a pattern is not to be formed is brought into contact with the mold, and cures the curable composition with curing light to form the pattern in the curable composition, a viscosity adjusting unit that adjusts the viscosity of the curable composition by irradiating the curable composition with a first light different from the curing light; a control unit that controls the viscosity adjusting unit, the control unit controls the viscosity adjusting unit differently for adjusting the viscosity of the curable composition applied on a first layer having a first amount of oxygen storage and adjusting the viscosity of the curable composition applied on a first layer having a second amount of oxygen storage that is greater than the first amount. An imprinting apparatus comprising:

16. An information processing method for an imprinting apparatus that aligns a substrate with a mold on which a pattern has been formed, in a state in which the curable composition is brought into contact with a first layer on a substrate, the first layer containing carbon and on which a pattern is not formed, and hardens the curable composition with curing light to form the pattern in the curable composition, the information processing method comprising determining a control parameter for a viscosity adjusting unit that adjusts the viscosity of the curable composition, the control parameter being used in the alignment an acquisition step of acquiring condition information related to the first layer; a determination step of determining the control parameters based on the information acquired in the acquisition step; An information processing method comprising:

17. 17. The information processing method according to claim 16, further comprising a display step of displaying the control parameters.

18. A program for causing a computer to execute the information processing method according to claim 16 or 17.

19. 1. An imprinting method comprising: aligning a substrate with a mold on which a pattern has been formed, in a state in which a curable composition applied onto a first layer containing carbon and on which a pattern is not to be formed is brought into contact with the mold; and curing the curable composition with curing light to form the pattern in the curable composition, an alignment step of irradiating the curable composition with a first light different from the curing light to adjust the viscosity of the curable composition and aligning the substrate with the mold; a curing step of irradiating the curable composition with the curing light to cure the curable composition; and a demolding step of releasing the mold from the cured curable composition, The viscosity of the curable composition is adjusted based on information about the conditions of the first layer. An imprint method comprising:

20. a forming step of forming a pattern on a substrate using the imprint method according to claim 19; a processing step of processing the substrate on which the pattern has been formed in the forming step; A method for manufacturing an article, comprising:

Images