Image forming apparatus

Abstract

To reduce the amount of developer flowing toward an opening used for discharging gas, as compared with a case where the opening used for discharging gas is provided directly above a developer flow path.SOLUTION: The gas that has flowed from the developing device 14 to the supplying device 70 flows toward the opening 518R via the developer flow path 518P. Then, the gas moves to the outside of the supplying device 70 through the opening 518P. The opening 518P is arranged at a position deviated from just above the developer flow path 518R. When positions in an intersecting direction which is a direction intersecting the vertical direction are compared, the position of the opening 518P in the intersecting direction and the position of the developer flow path 518R in the intersecting direction are different from each other.SELECTED DRAWING: Figure 23

Description

[Technical Field]

[0001] The present invention relates to an image forming apparatus. [Background technology]

[0002] Patent Document 1 discloses an image forming apparatus having a toner transport section that connects a toner supply means and a developing device, and in which a pressure relief filter is provided in the toner transport section. Patent Document 2 discloses a configuration in which a paddle shape is provided corresponding to the communication passage at a downstream position of a first stirring / conveying screw on the side closer to the developing sleeve. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2006-84487 [Patent Document 2] Japanese Patent Application Laid-Open No. 2006-235474 Summary of the Invention [Problem to be solved by the invention]

[0004] An image forming apparatus may be provided with a developing device that applies developer to an image carrier, and a supplying device that has a developer flow path through which the developer passes and supplies the developer to the developing device. Here, let us consider a case where an opening for discharging gas from the supply device to the outside is provided directly above the developer flow path of the supply device. In this case, the developer floating in the developer flow path is likely to reach the opening. In this case, if a filter is installed at the opening, a large amount of developer will be supplied to the filter, which is likely to shorten the filter's lifespan. An object of the present invention is to reduce the amount of developer heading toward the opening used for discharging gas, compared to when the opening used for discharging gas is provided directly above the developer flow path. [Means for solving the problem]

[0005] The invention described in claim 1 is an image forming apparatus comprising: an image carrier; a developing device that adheres developer to the image carrier; and a supply device that supplies developer to the developing device, the supply device having a developer flow path that is arranged to extend in a direction intersecting the vertical direction and through which the developer passes; and an opening that is arranged at a location away from directly above the developer flow path and is used to exhaust gas that has flowed from the developing device to the supply device. A second aspect of the present invention is the image forming apparatus according to the first aspect, wherein the position of the opening in the width direction of the developer flow path is different from the position of the developer flow path in the width direction. The invention described in claim 3 is an image forming apparatus described in claim 2, in which the gas flowing from the developing device to the supply device flows along the developer flow path and then heads toward the side of the developer flow path, and in the direction of the gas flowing toward the side, a wall portion is provided along the developer flow path downstream of the developer flow path. The invention described in claim 4 is the image forming device described in claim 1, in which the position of the opening in the intersecting direction, which is a direction intersecting the vertical direction, is different from the position of the developer flow path in the intersecting direction, and a recess that is recessed downward is provided between the opening and the developer flow path in the intersecting direction. The invention described in claim 5 is an image forming device described in claim 4, in which the position of the opening and the position of the developer flow path are different in the intersecting direction, and the position of the opening and the position of the developer flow path are also different in the width direction of the developer flow path, and the recess is provided along the developer flow path. The invention described in claim 6 is an image forming apparatus described in claim 1, in which new developer is supplied to a predetermined supply point in the developer flow path, and the new developer supplied to the supply point moves to a downstream portion of the developer flow path that is located downstream of the supply point in the developer movement direction, and gas flowing from the developing device to the supply device flows toward the opening via the developer flow path, and the cross-sectional area of ​​the developer flow path at the supply point is smaller than the cross-sectional area of ​​the developer flow path at the downstream portion. [Effects of the Invention]

[0006] According to the invention of claim 1, the amount of developer heading toward the opening used for discharging gas can be reduced compared to when the opening used for discharging gas is provided directly above the developer flow path. According to the invention of claim 2, the position of the opening in the width direction of the developer flow path coincides with the position of the developer flow path in this width direction, and the amount of developer heading toward the opening used to discharge gas can be reduced compared to when the opening used to discharge gas is located directly above the developer flow path. According to the invention of claim 3, the amount of developer flowing from the developer flow path to the side can be reduced compared to a configuration in which no wall portion is provided downstream of the developer flow path in the direction of gas flow toward the side of the developer flow path. According to the invention of claim 4, the amount of developer flowing from the developer flow path toward the opening can be reduced compared to a configuration in which there is no downward recess between the opening and the developer flow path. According to the fifth aspect of the invention, the amount of developer flowing from the developer flow path toward the opening can be reduced compared to when the recessed portion is provided along a direction intersecting the extension direction of the developer flow path. According to the sixth aspect of the present invention, the amount of developer contained in the gas flowing toward the opening can be reduced compared to when the cross-sectional area of ​​the supply location is larger than the cross-sectional area of ​​the downstream portion. [Brief explanation of the drawings]

[0007] [Figure 1]FIG. 1 is a diagram illustrating an image forming apparatus. [Figure 2] FIG. 2 is a diagram of the developing device as seen from above. [Figure 3] 3 is a cross-sectional view of the developing device taken along line III-III in FIG. 2. [Figure 4] 4 is a cross-sectional view of the developing device taken along line IV-IV in FIG. 2. [Figure 5] 3 is a cross-sectional view of the developing device taken along line VV in FIG. 2. [Figure 6] 6 is a cross-sectional view of the developing device taken along line VI-VI in FIG. 5. [Figure 7] FIG. 2 is a perspective view of the supply device as seen from the rear side of the image forming apparatus. [Figure 8] FIG. 2 is a diagram illustrating a developer storage portion. [Figure 9] 10(A) and 10(B) are diagrams showing the filling portion and the gas flow path. [Figure 10] FIG. 2 is a perspective view of the developer storage portion as viewed from above. [Figure 11] FIG. 4 is an enlarged view of one end of the developer storage portion. [Figure 12] FIG. 10 is a diagram showing a state in which an upper member is attached onto a lower container. [Figure 13] 13 is a cross-sectional view of the supply device taken along line XIII-XIII in FIG. 7. [Figure 14] 3 is a cross-sectional view of the supply device taken along a plane perpendicular to the longitudinal direction of the developer storage container. FIG. [Figure 15] FIG. 4 is a diagram showing the flow of gas when the supply device is viewed from above. [Figure 16] 10A and 10B are diagrams illustrating other configuration examples of the supply device and the developer storage container. [Figure 17] 17 is a cross-sectional view of the supply device and the developer container taken along line XVII-XVII in FIG. 16. [Figure 18] 10A and 10B are diagrams illustrating other configuration examples of the developer storage container. [Figure 19] 10A and 10B are diagrams illustrating other configuration examples of the main body side flow path. [Figure 20]10A and 10B are diagrams illustrating other configuration examples of the supply device and the developer storage container. [Figure 21] 10A and 10B are diagrams illustrating other configuration examples of the developer storage container. [Figure 22] 10A and 10B are diagrams illustrating other configuration examples of the supply device and the developer storage container. [Figure 23] FIG. 2 is a diagram of the supply device and the developing device as seen from above. [Figure 24] FIG. 2 is a diagram of the supply device and the developing device as seen from diagonally below. [Figure 25] 25 is a cross-sectional view of the supply device taken along line XXV-XXV in FIG. 23. [Figure 26] 26 is a view of the inlet portion as viewed from the direction indicated by arrow XXVI in FIG. 25. FIG. [Figure 27] FIG. 27 is a cross-sectional view of the supply device taken along line XXVII-XXVII in FIG. 23. [Figure 28] FIG. 2 is a diagram illustrating a transport device and a waste container. [Figure 29] FIG. 2 is a diagram illustrating the internal configuration of a lateral conveying unit. DETAILED DESCRIPTION OF THE INVENTION

[0008] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a diagram showing an image forming apparatus 100 according to this embodiment. Fig. 1 shows the image forming apparatus 100 as viewed from the front side. The image forming apparatus 100 is an intermediate transfer type image forming apparatus 100 called a tandem type. This image forming apparatus 100 is provided with a plurality of image forming sections 200. Each of the image forming sections 200 forms an image to be transferred onto a sheet of paper P, which is an example of a recording medium.

[0009] Each of the image forming units 200 includes a photosensitive drum 11 as an example of an image carrier. Each of the image forming units 200 uses a developer containing toner to form a toner image, which is an image to be transferred to paper P, on the photosensitive drum 11. In other words, each of the image forming units 200 uses a powder developer to form a toner image on the photosensitive drum 11. The developer of this embodiment is composed of a dry carrier and a dry toner. Each of the image forming units 200 forms a toner image on the photosensitive drum 11 using the carrier and the toner.

[0010] The six image forming units 200 form toner images on the photosensitive drums 11 using different types of developers. Of the six image forming units 200, four image forming units 200 form toner images using developers of basic colors. More specifically, the four image forming units 200 form toner images using developers of yellow, magenta, cyan, and black. The remaining two image forming units 200 form toner images using developers other than the basic colors. The remaining two image forming units 200 form toner images using developers such as clear, white, gold, or silver, or alternatively, the remaining two image forming units 200 form toner images using developers such as pink, green, or orange.

[0011] Other examples of developers other than the basic colors include developers containing magnetic toner, developers containing conductive toner, and developers containing toner that emits light when irradiated with light such as ultraviolet or infrared light. In this embodiment, the developer used is a so-called two-component developer in which a carrier and a toner are mixed, but a so-called one-component developer composed only of toner may also be used.

[0012] The image forming apparatus 100 is also provided with an intermediate transfer belt 15. The image forming apparatus 100 is also provided with a primary transfer unit 10. The toner images formed in the image forming units 200 are transferred to the intermediate transfer belt 15 in the primary transfer unit 10. Furthermore, the image forming apparatus 100 is provided with a secondary transfer unit 20. The toner image transferred onto the intermediate transfer belt 15 is transferred onto a sheet of paper P in the secondary transfer unit 20. The image forming apparatus 100 is also provided with a fixing device 60 that fixes the toner image transferred onto the paper P onto the paper P.

[0013] Furthermore, the image forming apparatus 100 is provided with a control unit 40 having a CPU that executes a program. The control unit 40 controls each unit in the image forming apparatus 100. The image forming apparatus 100 is also provided with a UI (User Interface) 45. The UI 45 is configured with a display panel and the like. The UI 45 accepts instructions from a user. The UI 45 also displays information to the user.

[0014] Each of the image forming units 200 is provided with a developing device 14. Furthermore, each of the image forming units 200 is provided with a supply device 70. The developing device 14 deposits the developer onto the photosensitive drum 11. The supplying device 70 supplies the developer to the developing device 14. When the developing device 14 deposits developer onto the photosensitive drum 11, the electrostatic latent image on the photosensitive drum 11 is made visible by the toner. The developing device 14 develops the photosensitive drum 11, which is an image carrier. As a result, an image made of toner is formed on the photosensitive drum 11.

[0015] The supply device 70 supplies new developer to the developing device 14 . A developer container 80 is attached to the image forming apparatus 100. The supply device 70 transports the developer from the developer container 80 to the developing device 14. In this way, the developer is supplied to the developing device 14. As described above, the developer is composed of a carrier and a toner. The supply device 70 supplies the carrier and the toner as the developer to the developing device 14. In this embodiment, the carrier has a positive charge polarity, and the toner has a negative charge polarity.

[0016] In each of the image forming units 200, a photosensitive drum 11, which is an example of an image carrier, rotates in the direction of arrow A. Each of the image forming sections 200 is provided with a charger 12. Each of the image forming sections 200 is also provided with an exposure device 13. The charger 12 charges the photosensitive drum 11. The exposure device 13 forms an electrostatic latent image on the photosensitive drum 11. The exposure device 13 includes a light source such as an LED. The exposure device 13 irradiates the photosensitive drum 11 with light to form an electrostatic latent image on the photosensitive drum 11.

[0017] Each image forming unit 200 is provided with a primary transfer roll 16. The primary transfer roll 16 is provided in the primary transfer unit 10. The primary transfer roll 16 is used to transfer a toner image from the photosensitive drum 11 to the intermediate transfer belt 15. Each image forming unit 200 is provided with a drum cleaner 17 that removes developer remaining on the photosensitive drum 11.

[0018] The intermediate transfer belt 15 is circulated by a driving roll 31 at a predetermined speed in the direction of arrow B shown in Fig. 1. The driving roll 31 is driven by a motor (not shown) and rotates counterclockwise in the figure. The primary transfer unit 10 includes a primary transfer roll 16 disposed opposite the photosensitive drum 11 with an intermediate transfer belt 15 sandwiched therebetween. The toner image on the photosensitive drum 11 moves to the intermediate transfer belt 15 in the primary transfer unit 10. As a result, a toner image is formed on the intermediate transfer belt 15.

[0019] The secondary transfer unit 20, which is an example of a transfer unit, is provided with a secondary transfer roll 22 that is disposed on the outer surface side of the intermediate transfer belt 15. The secondary transfer unit 20 also is provided with a backup roll 25 that is disposed on the inner surface side of the intermediate transfer belt 15. In the secondary transfer section 20, the toner image formed on the intermediate transfer belt 15 is transferred onto the paper P that has been transported to the secondary transfer section 20.

[0020] Furthermore, a reversing mechanism 900 for reversing the paper P is provided. The reversing mechanism 900 reverses the paper P, one side of which has a toner image transferred thereon, by the secondary transfer unit 20. Then, the reversing mechanism 900 supplies the paper P, which has been reversed, to the secondary transfer unit 20 again. As a result, toner images are formed on both sides of the paper P.

[0021] The reversing mechanism 900 sends the paper P, which has passed through the fixing device 60, to a branch path R2 branching from the paper transport path R1. After the sheet P passes through the branching section BP, the reversing mechanism 900 transports the sheet P in the opposite direction. Furthermore, the reversing mechanism 900 sends the sheet P to the branching path R2. Branch path R2 merges with paper transport path R1 upstream of secondary transfer unit 20. As a result, paper P sent to branch path R2 is supplied again to secondary transfer unit 20. Paper P is supplied again to secondary transfer unit 20 with its front and back inverted. In this case, a toner image is formed not only on one side of the paper P but also on the other side thereof. As a result, toner images are formed on both sides of the paper P.

[0022] The flow of processing performed by the image forming apparatus 100 will be described. The image forming apparatus 100 receives image data output from, for example, an image reading device or a computer (not shown). The image forming apparatus 100 then performs image processing on the image data. As a result, image data corresponding to each of the multiple image forming units 200 is generated. Specifically, image data corresponding to each of the four basic colors, yellow, magenta, cyan, and black, is generated, and in addition, image data corresponding to colors other than the basic colors is generated. The generated image data is output to the exposure device 13 provided in the image forming section 200.

[0023] The exposure device 13 irradiates the photosensitive drum 11 with light emitted from a light source in accordance with input image data. Before the exposure device 13 irradiates the photosensitive drums 11 with light, the surfaces of the photosensitive drums 11 are charged by the chargers 12. After the charging, the exposure device 13 irradiates the surfaces with light. As a result, an electrostatic latent image is formed on the surfaces of the photosensitive drums 11. Next, development is performed by the developing device 14, and the toner contained in the developer adheres to the photosensitive drum 11. As a result, a toner image is formed on the photosensitive drum 11. This toner image is transferred onto the intermediate transfer belt 15 at the primary transfer unit 10.

[0024] After the toner image is transferred onto the intermediate transfer belt 15, the toner image moves to the secondary transfer unit 20 as the intermediate transfer belt 15 moves. At this time, the paper P from the first paper storage unit 53 or the second paper storage unit 54 is transported to the secondary transfer unit 20 by the transport rolls 52 etc. Then, the toner images on the intermediate transfer belt 15 are electrostatically transferred onto the paper P all at once in the secondary transfer unit 20.

[0025] Thereafter, the paper P onto which the toner image has been transferred is peeled off from the intermediate transfer belt 15 and conveyed to the conveyor belt 55. The conveyor belt 55 conveys the paper P to the fixing device 60. The paper P conveyed to the fixing device 60 is heated and pressurized in the fixing device 60. As a result, the toner image on the paper P is fixed to the paper P. Then, the paper P is discharged from the image forming apparatus 100.

[0026] When toner images are formed on both sides of the paper P, the paper P is transported to branch path R2 after passing through fixing device 60. At this time, a toner image is formed on one side of the paper P. Thereafter, the paper P passes through secondary transfer unit 20 again. In the secondary transfer unit 20, a toner image is transferred to the other side of the paper P. Thereafter, the paper P passes through the fixing device 60 again, and the toner image transferred to the other side is fixed to the paper P.

[0027] The developing device 14 will now be described. FIG. 2 is a diagram of the developing device 14 as seen from above. When installed in image forming apparatus 100, developing device 14 is arranged along the depth direction of image forming apparatus 100. Developing device 14 has one end 141 and the other end 142 that are located at different positions in the longitudinal direction. When the developing device 14 is installed in the image forming apparatus 100, one end 141 is located on the rear side of the image forming apparatus 100, and the other end 142 is located on the front side of the image forming apparatus 100.

[0028] A driving force receiving portion 143 that receives a driving force is provided at one end 141 of the developing device 14. The driving force is transmitted to the driving force receiving portion 143 from a driving source (not shown) such as a motor provided on the main body side of the image forming apparatus 100. The driving force receiving portion 143 is interlocked with a transport member and the like (described later) provided inside the developing device 14. When a driving force from a drive source is transmitted to the driving force receiving portion 143, the transport member and the like rotate.

[0029] Fig. 3 is a cross-sectional view of the developing device 14 taken along line III-III in Fig. 2. Fig. 3 shows a cross-sectional view of the developing device 14 at the center in the longitudinal direction. The developing device 14 is provided with a unidirectional movement path 191 along which the developer moves in one direction. The developing device 14 is also provided with an opposite direction movement path 192 along which the developer moves in the opposite direction to the one direction. The opposite direction movement path 192 is disposed below the one direction movement path 191.

[0030] In the one-way movement path 191, the developer moves in a direction perpendicular to the paper surface of Fig. 3 and toward the back side of the paper surface. In the opposite-way movement path 192, the developer moves in a direction perpendicular to the paper surface of Fig. 3 and toward the front side of the paper surface. A one-way transport member 410 for transporting the developer is provided on the one-way movement path 191. The one-way transport member 410 has a spiral protrusion 479 provided around a rotation shaft 411. The one-way transport member 410 rotates around a rotation axis 411 extending along the one-way movement path 191. This rotation of the one-way transport member 410 moves the developer toward the depth of the paper surface of FIG.

[0031] A reverse direction transport member 420 that transports the developer is provided on the reverse direction movement path 192. The reverse direction transport member 420 is disposed below the one direction transport member 410. The reverse direction transport member 420 also has a spiral protrusion 479. The opposite direction transport member 420 rotates around a rotation axis 421 extending along the opposite direction movement path 192. As a result, the developer transported by the opposite direction transport member 420 moves toward the front side of the paper surface of FIG. The opposite direction transport member 420 transports the developer in the opposite direction to the above-mentioned one direction.

[0032] Furthermore, a rotating body 430 is provided on the left side of the one-way transport member 410. The rotating body 430 is used to supply developer to the photosensitive drum 11, which is an example of an image carrier. Furthermore, the developing device 14 is provided with an opposing opening 480. The opposing opening 480 is disposed at a position opposite the photosensitive drum 11. A rotating body 430 is installed in the opposing opening 480. In this embodiment, a part of the rotating body 430 is exposed through this opposing opening 480. The rotating body 430 supplies the developer supplied to it from the one-way transport member 410 to the photosensitive drum 11. The rotating body 430 receives the developer supplied from the one-way transport member 410 and supplies the developer to the photosensitive drum 11. Rotating body 430 is made of a cylindrical body and is made of metal such as SUS.

[0033] Rotating body 430 rotates counterclockwise in the drawing around shaft center 431. Rotating body 430 moves the developer supplied from unidirectional transport member 410 and adhering to its outer circumferential surface to photosensitive drum 11. As a result, the developer is supplied to the photosensitive drum 11, and the toner contained in the developer adheres to the surface of the photosensitive drum 11. Furthermore, a first movement regulating portion 450 is provided between the rotating body 430 and the one-way transport member 410. The first movement regulating portion 450 regulates the movement of a portion of the developer that attempts to move from the one-way transport member 410 to the rotating body 430. In this embodiment, a part of the developer on the one-way movement path 191 passes over this first movement regulating portion 450. In this embodiment, the developer that has passed over the first movement regulating portion 450 is supplied to the rotating body 430.

[0034] Furthermore, below the rotating body 430, a lower conveying member 440 is provided. The lower conveying member 440 is a rotating member that rotates around an axis 440A along the one direction. The lower conveying member 440 is also provided with a spiral protrusion 479. The lower transport member 440 is disposed closer to the photosensitive drum 11 than the opposite direction transport member 420 is. The lower transport member 440 transports the developer that has separated from the rotating body 430 in a direction perpendicular to the paper surface of FIG. 3 and toward the depth of the paper surface. The lower transport member 440 transports the developer that has separated from the rotating body 430 in the one direction, whereby the developer is supplied to one end side of the opposite direction transport member 420 (details will be described later).

[0035] Furthermore, a second movement regulating portion 452 is provided between the lower transport member 440 and the opposite direction transport member 420. The second movement regulating portion 452 regulates the movement of the developer from the opposite direction transport member 420 to the lower transport member 440. Further, a third movement restricting portion 453 is provided between the rotating body 430 and the opposite direction transport member 420. The third movement restricting portion 453 restricts the movement of the developer from the opposite direction transport member 420 to the rotating body 430.

[0036] Furthermore, a fourth movement restricting portion 454 is provided between the one-way conveying member 410 and the opposite-way conveying member 420. The fourth movement regulating portion 454 regulates the movement of developer from the one-way transport member 410 to the opposite-way transport member 420. The fourth movement regulating portion 454 also regulates the movement of developer from the opposite-way transport member 420 to the one-way transport member 410. Furthermore, a fifth movement restricting portion 455 is provided between the rotating body 430 and the lower transport member 440. The fifth movement restricting portion 455 restricts the movement of the developer from the lower transport member 440 to the rotating body 430.

[0037] Inside the rotor 430, a magnet roll 145B is provided. The magnet roll 145B is provided with five magnetic poles 121 to 125 arranged along the circumferential direction of the magnet roll 145B. The magnetic pole 121 is a pickup pole, and attracts the developer supplied from the one-way movement path 191. As a result, the developer adheres to the surface of the rotating body 430.

[0038] The magnetic poles 122 to 124 function as transport poles, and move the developer on the surface of the rotating body 430 downstream in the direction of rotation of the rotating body 430. In the rotation direction of rotor 430, opposing restriction portion 127 is provided downstream of magnetic pole 122 and upstream of magnetic pole 123. Opposing restriction portion 127 is arranged at an opposing position on the outer circumferential surface of rotor 430. Counter regulating portion 127 is disposed with a gap between it and rotating body 430. Counter regulating portion 127 regulates the movement of a portion of the developer adhering to the surface of rotating body 430. As a result, the thickness of the developer adhering to the surface of rotating body 430 becomes a predetermined thickness.

[0039] The developer on the surface of the rotating body 430 moves downstream in the rotation direction of the rotating body 430. Thereafter, the developer moves to the surface of the photosensitive drum 11, and the toner contained in the developer adheres to the photosensitive drum 11. As a result, development is carried out and a toner image is formed on the surface of the photosensitive drum 11. This toner image is temporarily held by the photosensitive drum 11. Then, this toner image is moved to the primary transfer unit 10 (see FIG. 1) by the rotating photosensitive drum 11. Then, this toner image is transferred to the intermediate transfer belt 15.

[0040] The magnetic pole 125 (see FIG. 3) serves as a pick-off pole. The magnetic pole 125 generates a repulsive magnetic field, which separates the developer adhering to the surface of the rotating body 430 from the rotating body 430. The magnetic pole 125 separates the developer that has not been transferred to the photosensitive drum 11 from the rotating body 430 . The developer separated from the rotating body 430 moves downward and reaches the downward movement path 193 . The developer that has reached the downward movement path 193 is moved toward one end 141 (see FIG. 2) of the developing device 14 by the downward transport member 440. Then, the developer moves to the opposite direction movement path 192 (details will be described later).

[0041] FIG. 4 is a cross-sectional view of the developing device 14 taken along line IV-IV in FIG. FIG. 4 shows a cross section of the other end 142 of the developing device 14. An upward movement path 196 arranged along the vertical direction is provided at the other end 142 of the developing device 14. The developer that has moved through the opposite direction movement path 192 passes through this upward movement path 196 and heads toward the one-way movement path 191. In this embodiment, the developer accumulates at the end of the opposite direction movement path 192 located on the downstream side in the direction of movement of the developer. In this embodiment, the developer accumulated at this end is pressed by the developer sequentially conveyed from the upstream side. As a result, the developer accumulated at this end moves upward through the upward movement path 196. As a result, the developer on the opposite direction movement path 192 passes through the upward movement path 196 and heads toward the one direction movement path 191 .

[0042] Fig. 5 is a cross-sectional view of the developing device 14 taken along line VV in Fig. 2. Fig. 6 is a cross-sectional view of the developing device 14 taken along line VI-VI in Fig. 5. FIG. 5 shows a cross section of one end 141 of the developing device 14. As shown in FIG. 5, one end 141 of the developing device 14 is provided with a downward movement path 197 that is arranged along the up-down direction. The developer that has moved through the one-way movement path 191 passes through this downward movement path 197 and heads toward the opposite-way movement path 192 .

[0043] 5 and 6, a connecting path 190 is provided in this embodiment. The connecting path 190 extends in the horizontal direction and connects the downward movement path 193 and the opposite direction movement path 192. In this embodiment, the developer is moved along the downward movement path 193 by the lower conveying member 440. Then, the developer that has moved along the downward movement path 193 passes through the connecting path 190 and moves to the opposite direction movement path 192.

[0044] In this embodiment, the developer accumulates at the end of the downward movement path 193 that is located downstream in the direction of movement of the developer. In this embodiment, the developer accumulated at this end is pressed by the developer sequentially conveyed from the upstream side, causing the developer accumulated at this end to move through the connecting path 190 to the opposite direction movement path 192.

[0045] In this embodiment, the developer moves along a one-way movement path 191 (see FIG. 3) and an opposite-way movement path 192. As a result, in this embodiment, the developer moves circulatingly. In this embodiment, a part of the developer moving along the one-way movement path 191 is supplied to the rotating body 430. This developer is supplied to the photosensitive drum 11 via the rotating body 430. The developer that has not been supplied to the photosensitive drum 11 and remains on the surface of the rotating body 430 separates from the rotating body 430 and moves to the downward movement path 193. Then, this developer moves to the opposite direction movement path 192 via the downward movement path 193.

[0046] 2, the developing device 14 is provided with a first receiving port 151 for receiving the developer. The developing device 14 receives the developer sent from the supply device 70 through the first receiving port 151. As shown in FIG. 5, the developer sent from the supply device 70 enters the inside of the developing device 14 through the first receiving port 151. In this embodiment, a second receiving port 152 is provided at a location indicated by reference symbol 2A in FIG.

[0047] In this embodiment, a user can manually supply new developer to the developing device 14 using a jig (not shown). When the user manually supplies new developer, the user first peels off the blocking member 153. Then, the user supplies the developer to the developing device 14 through the second receiving port 152 that appears when the blocking member 153 is peeled off. Furthermore, as shown in FIG. 3, the developing device 14 of this embodiment is provided with an opposing opening 480 in which the rotating body 430 is installed. In this embodiment, a first receiving port 151, a second receiving port 152, and an opposing opening 480 are provided as openings.

[0048] In this embodiment, the developing device 14 is not provided with any openings other than the first receiving opening 151, the second receiving opening 152, and the opposing opening 480. The developing device 14 of this embodiment is provided with a connection opening, which is an opening that connects the inside and outside of the developing device 14. In this embodiment, the developing device 14 is not provided with any connection openings other than the first receiving opening 151, the second receiving opening 152, and the opposing opening 480.

[0049] In this embodiment, the internal pressure of the developing device 14 is released through an opening provided in the supply device 70, rather than through a connection opening provided in the developing device 14. Also, in this embodiment, as will be described later, the internal pressure of the developing device 14 may be released through an opening provided in the developer storage container 80. In this embodiment, the internal pressure of the developing device 14 is released through an opening provided in a transport device, which will be described later. This transport device is a device that transports the developer discharged from the developing device 14.

[0050] In this embodiment, the developer adhering to the surface of the rotating body 430 is returned to the inside of the developing device 14 without being transferred to the photosensitive drum 11. At this time, air outside the developing device 14 is taken into the inside of the developing device 14. As a result, the internal pressure of the developing device 14 increases. As the internal pressure of the developing device 14 increases, gas tends to move from the inside to the outside of the developing device 14. In this embodiment, the gas that moves from the inside to the outside of the developing device 14 moves toward the supply device 70 (see FIG. 1). This gas also moves toward the transport device, which will be described later. Then, this gas is discharged to the outside of the supply device 70 through an opening (not shown in FIG. 1) provided in the supply device 70. In addition, this gas is discharged to the outside of the supply device 70 through an opening provided in the conveying device. An example of the gas is air.

[0051] When the gas is discharged only through the connection opening provided in the developing device 14, the gas in a high pressure state is easily discharged. In contrast, in this embodiment, the gas is discharged through an opening provided in the supply device 70 that is distant from the developing device 14. Also, in this embodiment, the gas is discharged through an opening provided in the transport device that is distant from the developing device 14. In this case, the gas in a relaxed state is discharged through the opening. When the gas is discharged in a relaxed state, the amount of developer that moves to the outside through the opening is reduced. In this case, the filter installed in the opening is less likely to become dirty, and the filter's lifespan can be extended.

[0052] It should be noted that providing a connection opening in the developing device 14 is not excluded. A configuration may be adopted in which a connection opening is provided in the developing device 14 and an opening is further provided in the supply device 70. Also, a configuration may be adopted in which a connection opening is provided in the developing device 14 and an opening is further provided in the transport device. In this case, the gas inside the developing device 14 is discharged to the outside of the developing device 14 through the connection opening. In this case, the gas inside the developing device 14 is discharged to the outside of the developing device 14 through an opening provided in the supply device 70. In this case, the gas inside the developing device 14 is discharged to the outside of the developing device 14 through an opening provided in the transport device.

[0053] 7 is a perspective view of the supply device 70 as seen from the rear side of the image forming apparatus 100. In FIG. 7, a state in which the developer container 80 is attached is shown. The developer storage container 80 stores, for example, unused developer. In this embodiment, the developer storage container 80 is detachable from the image forming apparatus 100 (see FIG. 1). The developer storage container 80 is attached to an attachment portion 701 of the supply device 70.

[0054] When the developer container 80 is attached to the image forming apparatus 100, the developer container 80 moves in the direction indicated by the arrow 7A in FIG. The developer storage container 80 is formed in a cylindrical shape. Specifically, the developer storage container 80 is formed in a cylindrical shape. However, the shape of the developer storage container 80 is not limited to a cylindrical shape. The developer storage container 80 may also be formed in a prismatic shape.

[0055] When the developer storage container 80 is attached to the image forming apparatus 100, the supply device 70 is located below the developer storage container 80. In this embodiment, the supply device 70 supplies the developer from the developer storage container 80 to the developing device 14 (not shown in FIG. 7). The developer storage container 80 has one end 81 that is located at the front when the developer storage container 80 is attached to the image forming apparatus 100. The developer storage container 80 also has another end 82 that is located on the opposite side to the one end 81. A developer outlet is provided at the bottom of one end 81 of the developer storage container 80. The developer in the developer storage container 80 passes through this outlet and moves to the supply device 70 located below.

[0056] The feeding device 70 has one end 71 and another end 72 . One end 71 of the supply device 70 is located on the rear side of the image forming apparatus 100. The other end 72 of the supply device 70 is located on the front side of the image forming apparatus 100. The supply device 70 is provided at one end 71 side with a receiving port (not shown in FIG. 7) for receiving the developer from the developer storage container 80. In this embodiment, the developer is transported from the upstream side of the supply device 70 in the developer transport direction to the supply device 70. The supply device 70 is provided with a receiving port that receives the developer transported from the upstream side thereof.

[0057] The developer container 80 has a function of sending out the developer therein to the outside. A spiral protrusion is provided on the inner surface of the developer storage container 80. The developer storage container 80 is rotated in the circumferential direction by a driving device (not shown). As a result, the spiral protrusion pushes out the developer in the developer accommodating container 80 toward one end 81 of the developer accommodating container 80. As a result, the developer in the developer accommodating container 80 moves toward one end 81 of the developer accommodating container 80. Additionally, a conveying member that conveys the developer in the developer accommodating container 80 toward the one end 81 may be provided inside the developer accommodating container 80. In this case, the developer in the developer accommodating container 80 moves toward the one end 81 by this conveying member.

[0058] In the developer transport direction, the developer storage container 80 is located upstream of the supply device 70. The receiving port of the supply device 70 receives the developer supplied from the developer storage container 80 located upstream. Furthermore, the supply device 70 is provided with a developer storage section 500 for storing the developer that has entered the supply device 70 through the receiving port. The developer supplied from the developer container 80 to the supply device 70 is temporarily stored in the developer storage section 500 . The developer storage section 500 temporarily stores the developer.

[0059] The developer moves through the inside of the developer storage section 500 and is then discharged from a discharge port 74 provided at one end 71 of the supply device 70 . The supply device 70 is provided with a discharge port 74 used to discharge the developer received at the receiving port. The developer discharged from the discharge port 74 is supplied to the developing device 14 (not shown in FIG. 7) located below the discharge port 74.

[0060] In this embodiment, a first receiving port 151 (see FIG. 2) provided in the developing device 14 is disposed directly below the discharge port 74 of the supply device 70. The developer discharged from the discharge port 74 moves into the developing device 14 through this first receiving port 151. In this way, the developer is supplied from the supply device 70 to the developing device 14. Furthermore, the supply device 70 is provided with an opening 505 that allows the inside and outside of the supply device 70 to communicate with each other.

[0061] The developer storage section 500 temporarily stores the developer. This allows the supply of developer from the supply device 70 to the developing device 14 even if the developer container 80 is removed. As the developer container 80 becomes empty, the developer container 80 is removed. In this embodiment, even if the developer container 80 is removed, the developer in the developer storage section 500 is supplied to the developing device 14.

[0062] This allows the supply of developer from the supply device 70 to the developing device 14 even if the developer container 80 is removed. In this case, it is possible to avoid an immediate stop of the image forming operation even when the developer storage container 80 is removed, and image formation can be continued until a new developer storage container 80 is attached.

[0063] FIG. 8 is a diagram illustrating the developer storage unit 500. As shown in FIG. The developer storage unit 500 is provided with a developer flow path 510 through which the developer flows toward the developing device 14. The developer flow path 510 is provided so as to extend from the inside of the developer storage unit 500 toward the outside. A filling portion 511 is present above the developer flow path 510. In the filling portion 511, the developer is filled over the entire cross section of the developer flow path 510. In this specification, the "cross section" of the developer flow path 510 refers to the cross section of the developer flow path 510 in a plane perpendicular to the extension direction of the developer flow path 510.

[0064] A cylindrical portion 512 is provided around the filling portion 511. In this embodiment, the inside of this cylindrical portion 512 becomes the filling portion 511. On a cross section perpendicular to the axial direction of the cylindrical portion 512, the developer is filled throughout the entire inside of the cylindrical portion 512. As a result, the developer becomes dense on a cross section perpendicular to the axial direction of the cylindrical portion 512.

[0065] As a result, in this embodiment, a filled portion 511 is formed inside the cylindrical portion 512, where the developer is filled. In the configuration in which the filling portion 511 is formed, the amount of developer supplied from the supply device 70 to the developing device 14 per unit time is stabilized. If the filling portion 511 does not exist, the developer flowing toward the developing device 14 tends to vary in density. In this case, the amount of developer supplied from the supply device 70 to the developing device 14 per unit time tends to fluctuate.

[0066] In the developer transport direction, downstream of the filling portion 511, the developer flow path 510 changes direction and faces downward. The developer flow path 510 is provided with a horizontal flow path 513 extending in the horizontal direction and a vertical flow path 514 extending in the vertical direction. The developer that has passed through the filling portion 511 moves through the horizontal flow path 513 in a direction away from the filling portion 511. Thereafter, the developer moves downward through the vertical flow path 514. The developer falls in the vertical flow path 514.

[0067] An outlet 74 of the supply device 70 and a first inlet 151 of the developing device 14 are provided below the vertical flow path 514. The developer flowing downward through the vertical flow path 514 is supplied to the developing device 14. Furthermore, a gas flow path 530 is provided as a flow path through which gas that has flowed from the developing device 14 to the supply device 70 passes. The gas flow path 530 is provided separately from the developer flow path 510. In this embodiment, as described above, as the internal pressure of the developing device 14 increases, gas flows from the developing device 14 toward the supply device 70. The gas flowing from the developing device 14 to the supply device 70 enters the inside of the supply device 70 through the outlet 74 of the supply device 70 .

[0068] Thereafter, the gas flows upward through a vertical flow path 514, which is an example of a falling portion, and then enters a gas flow path 530 that is provided by branching off from the developer flow path 510. The gas that enters the gas flow path 530 flows toward an opening 505 provided in the supply device 70 and is discharged from this opening 505. A filter 506 is provided in the opening 505. In FIG. 8, the opening 505 is provided behind the filter 506.

[0069] 9(A) and 9(B) are diagrams showing the filling portion 511 and the gas flow path 530. FIG. Fig. 9(A) is a perspective view of the filling portion 511 and the gas flow path 530. Fig. 9(B) is a view of the filling portion 511 and the gas flow path 530 when viewed from the direction indicated by arrow IXB in Fig. 9(A). 9(A), the present embodiment is provided with a developer flow path 510. The developer flow path 510 runs from the inside of the developer storage unit 500 to the outside. A filling portion 511 is present on the developer flow path 510 and inside the cylindrical portion 512. Furthermore, a gas flow path 530 is provided above the cylindrical portion 512 in the figure. The gas flow path 530 is provided above the filling portion 511.

[0070] As shown in FIG. 8, the gas flow path 530 is provided in a form branching off from the developer flow path 510. There is a branching portion 98, which is an example of a branching point where the gas flow path 530 branches off from the developer flow path 510. This branching portion 98 is located downstream of the filling portion 511 in the developer transport direction. A gas flow path 530 branches off from the developer flow path 510 downstream of the filling portion 511 in the developer transport direction.

[0071] The gas flow path 530 branches off from the developer flow path 510 and then passes above the filling portion 511 as shown in FIG. 9(A). The gas passing through the gas flow path 530 passes above the filling portion 511. The gas passing through the gas flow path 530 passes through a portion other than the filling portion 511 and moves toward the upstream side in the moving direction of the developer. In the filling portion 511, the developer is dense and it is difficult for the gas to pass through. Therefore, in this embodiment, a gas flow path 530 for passing the gas is provided in a location other than the filling portion 511.

[0072] 8, the gas flow path 530 extends from the branching portion 98 toward the side where the cylindrical portion 512 is provided. The gas flow path 530 further passes above the cylindrical portion 512 and extends toward the upstream side in the moving direction of the developer. Then, as will be described later, the gas flow path 530 is again connected to the internal space of the supply device 70. In other words, the gas flow path 530 enters the internal space of the supply device 70. The gas flow path 530 is connected again to the space inside the supply device 70 on the upstream side of the filling portion 511 in the moving direction of the developer.

[0073] The gas flow path 530 is connected again to the internal space of the supply device 70 at a location other than the branching portion 98 . In this embodiment, there is a branching portion 98 where the gas flow path 530 branches off from the developer flow path 510. The gas flow path 530 is connected again to the internal space of the supply device 70 at a location separate from this branching portion 98.

[0074] 9(B), the gas from the developing device 14 first passes through a vertical flow path 514 provided as part of the developer flow path 510. The vertical flow path 514 is a portion through which the developer moves while falling. The gas from the developing device 14 passes through this vertical flow path 514. The gas passes through this vertical flow path 514 and heads toward the upstream side in the moving direction of the developer. A filling portion 511 is provided on the developer flow path 510. In the filling portion 511, as described above, the developer is filled over the entire cross section of the developer flow path 510. The vertical flow path 514 is located downstream of the filling portion 511 in the direction of movement of the developer.

[0075] The gas flowing from the developing device 14 to the supply device 70 first passes through the vertical flow path 514 shown in FIG. 9(B) and then moves upward. The gas then enters the lateral flow channel 513, and then enters the gas flow channel 530 located above the lateral flow channel 513. The gas then passes through the gas flow channel 530 and moves leftward in the figure. 9(B), the gas flow path 530 extends in the horizontal direction. The gas flow path 530 is provided with a horizontal portion 531 that is a portion that extends in the horizontal direction.

[0076] 9(A), a slope 532 inclined relative to the horizontal direction is provided on the bottom surface of the lateral portion 531. This slope 532 is an inclination that increases toward the upstream side in the movement direction of the gas passing through the gas flow path 530. By providing the bottom surface with the slope 532, the developer is less likely to accumulate on this bottom surface. The developer that sits on the portion of the bottom surface of the gas flow path 530 where the slope 532 is provided slides and moves. As a result, the developer moves in the lower right direction in FIG. 9(A). On the downstream side in the lower right direction is located the lateral flow passage 513. The developer placed on the bottom surface of the gas flow passage 530 moves to this lateral flow passage 513.

[0077] Fig. 10 is a perspective view of the developer accumulating section 500 as seen from above. Fig. 11 is an enlarged view of one end 500A of the developer accumulating section 500. FIG. 10 shows the developer storage unit 500 as viewed from the other end 500B side of the developer storage unit 500.

[0078] 10, the developer storage unit 500 is provided with a rectangular parallelepiped lower container 518. The developer supplied from the developer storage container 80 (not shown in FIG. 10) is first stored in this lower container 518. A one-way transport member 521 that transports the developer in one direction is provided inside lower container 518. Also, a reverse direction transport member 522 that transports the developer in the direction opposite to the one direction is provided inside lower container 518.

[0079] The one-way transport member 521 and the opposite-way transport member 522 are arranged parallel to each other. The one-way transport member 521 and the opposite-way transport member 522 are also arranged along the longitudinal direction of the lower container 518. Furthermore, a driving source such as a motor (not shown) is provided to drive the one-way transport member 521. Also, a driving source such as a motor (not shown) is provided to drive the opposite-way transport member 522.

[0080] The unidirectional conveying member 521 is made of a coil. In other words, the unidirectional conveying member 521 is made of a wire material bent into a spiral shape. A rod-shaped rotation shaft (not shown) is provided on the opposite direction conveying member 522. This rotation shaft is provided along the longitudinal direction of the lower container 518. Further, a protrusion 522A that protrudes from the outer circumferential surface of the rotating shaft is provided on the opposite direction conveying member 522. The protrusion 522A is disposed around the rotating shaft and is provided in a spiral shape.

[0081] The opposite direction conveying member 522 may be a conveying member made of a coil, similar to the one direction conveying member 521. Similarly to the opposite direction conveying member 522, the one-way conveying member 521 may be a conveying member having a rotation shaft and a spiral protrusion. Moreover, both the one-way transport member 521 and the opposite-way transport member 522 may be transport members made of coils. Moreover, both the one-way transport member 521 and the opposite-way transport member 522 may be transport members each having a rotation shaft and a spiral protrusion.

[0082] In this embodiment, the coil-shaped one-way transport member 521 rotates around a rotation axis along the axial direction of the one-way transport member 521. As a result, the developer gradually moves in the axial direction of the one-way transport member 521. More specifically, the developer moves toward one end 521A of the one-way transport member 521 in the axial direction.

[0083] In this embodiment, the opposite direction conveying member 522 rotates around a rotation axis. As a result, the developer is pushed out by the protrusion 522A provided on the opposite direction transport member 522. In response to this, the developer moves in the axial direction of the opposite direction transport member 522. More specifically, the developer moves toward the other end 522B of the opposite direction transport member 522 in the axial direction.

[0084] Furthermore, inside the lower container 518, a one-way flow path 541 is provided, which is a flow path through which the developer moves in one direction. Furthermore, inside the lower container 518, there is provided an opposite direction flow path 542, which is a flow path through which the developer passes when moving in the opposite direction to the one direction. The one-way flow path 541 and the opposite-direction flow path 542 are provided parallel to each other. The one-way flow path 541 and the opposite-direction flow path 542 are also provided along the longitudinal direction of the lower container 518.

[0085] A one-way transport member 521 is disposed in the one-way flow path 541. The developer transported by the one-way transport member 521 moves within the one-way flow path 541. The opposite direction transport member 522 is disposed in the opposite direction flow path 542. The developer transported by the opposite direction transport member 522 moves within the opposite direction flow path 542.

[0086] Furthermore, a one end side connecting flow path 543 is provided. The one-end-side connecting flow path 543 is provided at one end 500A of the developer storage unit 500 and inside the lower container 518. The one-end-side connecting flow path 543 connects one end 541A of the one-way flow path 541 and one end 542A of the opposite-direction flow path 542. Also, the other end side connecting flow path 544 is provided. The other-end-side connecting flow path 544 is provided at the other end 500B of the developer storage portion 500 and inside the lower container 518. The other-end-side connecting flow path 544 connects the other end 541B of the one-way flow path 541 and the other end 542B of the opposite-direction flow path 542.

[0087] Furthermore, as shown in FIG. 10, the lower container 518 is provided with an annular wall portion 550 inside, which is a wall portion provided in an annular shape. When the lower container 518 is viewed from above, the annular wall portion 550 has an annular shape. When the lower container 518 is viewed from above, the annular wall portion 550 has a rectangular shape. The annular wall portion 550 is provided between the one-way flow path 541 and the opposite-way flow path 542. The annular wall portion 550 is also provided between the one-end side connecting flow path 543 and the other-end side connecting flow path 544.

[0088] 10, the annular wall portion 550 is provided so as to protrude upward from the bottom surface of the lower container 518. Furthermore, the annular wall portion 550 is provided so as to extend along the longitudinal direction of the lower container 518. A one-way flow path 541 and an opposite-way flow path 542 are provided around the annular wall portion 550. Also, a one-end side connecting flow path 543 and an other-end side connecting flow path 544 are provided around the annular wall portion 550.

[0089] In this embodiment, the developer is transported by one-way transport member 521 and opposite-way transport member 522. The transported developer moves through a space located around annular wall portion 550 within the space inside lower container 518. The transported developer passes through one-way flow passage 541 and then reaches one-end side connecting flow passage 543. Thereafter, the developer moves from one-end side connecting flow passage 543 to opposite-direction flow passage 542. Next, the developer passes through opposite-direction flow passage 542 and moves to other-end side connecting flow passage 544. Then, the developer passes through other-end side connecting flow passage 544 and moves to one-way flow passage 541.

[0090] The transported developer circulates by moving along the periphery of the annular wall portion 550. In this embodiment, an annular circulation flow path 590 is provided around the annular wall portion 550, through which the developer circulates. A circulation flow path 590 as an example of an annular flow path is made up of a one-way flow path 541, a one-end side connecting flow path 543, an opposite-way flow path 542, and an other-end side connecting flow path 544.

[0091] The developer transported by the one-way transport member 521 flows toward one end 541A of the one-way flow path 541. Then, this developer reaches one end 541 A. Furthermore, the developer is sequentially transported by one-way transport member 521 from the upstream side to one end 541 A. The developer that has reached the one end 541A is pressed by the developer transported from the upstream side, whereby the developer that has reached the one end 541A moves to the one end side connecting flow path 543. Then, the developer moves through the one end side connecting flow path 543 to the opposite direction flow path 542 .

[0092] The developer that has moved to the opposite direction flow path 542 moves toward the other end 542B of the opposite direction flow path 542. The developer that has moved to the opposite direction flow path 542 is moved toward the other end 542B by the opposite direction transport member 522. As a result, the developer reaches the other end 542B. The developer that reaches the other end 542B of the opposite direction flow passage 542 flows toward the other end side connecting flow passage 544.

[0093] In this embodiment, the developer is sequentially transported from the upstream side to the other end 542B by the opposite direction transport member 522. The developer that reaches the other end 542B is pressed by the developer sequentially transported from the upstream side to the other end 542B. As a result, the developer enters the other end side connecting flow path 544. Thereafter, the developer reaches the one-way flow path 541. As a result, in this embodiment, the developer moves around the annular wall portion 550. In other words, the developer moves along the circulation flow path 590. As a result, in this embodiment, the developer circulates.

[0094] The annular wall portion 550 is made up of four wall portions. The annular wall 550 is provided with two axial walls 551 . The two axial wall portions 551 are aligned along the axial direction of the one-way conveying member 521. The two axial wall portions 551 are aligned along the axial direction of the opposite-direction conveying member 522. The two axial wall portions 551 are disposed opposite to each other, and are also disposed parallel to each other.

[0095] 11, the annular wall portion 550 is provided with a one-end side wall portion 552. The one-end side wall portion 552 is located at one end in the longitudinal direction of the annular wall portion 550. The one-end side wall portion 552 connects the two axial wall portions 551. 10, the annular wall portion 550 is provided with an other end side wall portion 553. The other end side wall portion 553 is located at the other end in the longitudinal direction of the annular wall portion 550. The other end side wall portion 553 connects the two axial direction walls 551.

[0096] 11, an opening 507 through which the gas flow path 530 passes is provided at one end 500A of the developer storage unit 500. The gas from the developing device 14 passing through the gas flow path 530 passes through this opening 507. Furthermore, as shown in FIG. 10, an upwardly extending wall portion 519 is provided. The wall portion 519 is provided above one side wall 518A extending along the longitudinal direction of the lower container 518.

[0097] Lower container 518 has four side walls, and side wall 518A extends along the longitudinal direction of lower container 518. Wall portion 519 is provided above side wall 518A extending along the longitudinal direction of lower container 518. The wall portion 519 is provided so as to extend along the longitudinal direction of the lower container 518 . The wall portion 519 is provided with an opening 505 used to exhaust gas that has flowed from the developing device 14. The opening 505 allows the inside and outside of the supply device 70 to communicate with each other.

[0098] A plurality of openings 505 are provided. The plurality of openings 505 are arranged in the longitudinal direction of the lower container 518. Furthermore, each of the openings 505 is provided so as to extend in the axial direction of the developer accommodating container 80 that is to be mounted in the mounting portion 701 (see FIG. 7). The gas that has passed through the gas flow path 530 (see FIG. 11) is finally discharged to the outside of the supply device 70 from this opening 505.

[0099] As shown in FIG. 11, an inner wall space 556, which is a space located inside the annular wall 550, is provided inside the annular wall 550. In this embodiment, the gas that has flowed through the gas flow path 530 then enters this wall space 556 as shown by arrow 11A. Thereafter, the gas passes through the wall space 556 and flows toward the other end 500B of the developer storage section 500 (see FIG. 10). The gas then flows toward one-way flow path 541 as shown by arrow 10E in FIG. The gas then moves along wall 519, as shown by arrow 10F, toward opening 505 formed in wall 519. The gas then moves through opening 505 to the outside of supply device 70.

[0100] As shown in FIG. 11, the developer storage section 500 is provided at one end 500A with the filling portion 511 described above. Furthermore, there is also provided a central conveying member 526 that passes through this filling portion 511. The central conveying member 526 is provided in the center of the lower container 518 in the short side direction of the lower container 518. The central transport member 526 is disposed between the one-way transport member 521 and the opposite-way transport member 522. The central transport member 526 is provided along the longitudinal direction of the lower container 518. Furthermore, a drive source (not shown) such as a motor for driving the central transport member 526 is provided.

[0101] The central conveying member 526 includes a rod-shaped rotating shaft 526A and a protruding portion 526B. Protrusion 526B is arranged around rotation shaft 526A in a spiral shape and protrudes from the outer circumferential surface of rotation shaft 526A. In this embodiment, the central transport member 526 is rotated around the rotation shaft 526A by the drive source, whereby the developer is pushed out by the protrusion 526B, and the developer moves in the axial direction of the central transport member 526. In this embodiment, the developer in the one end side connecting flow path 543 is sent to the filling portion 511 by the central transport member 526 .

[0102] The developer transported by the one-way transport member 521 accumulates in the one-end side connection flow path 543 . Between the filling portion 511 and the one end side wall portion 552, a space 94 (hereinafter referred to as the "pre-filling space 94") is provided. The one end side connecting flow path 543 passes through this pre-filling space 94. In the pre-filling space 94, the developer transported by the one-way transport member 521 accumulates.

[0103] In this embodiment, the developer accumulated in the pre-filling space 94 is pushed into the filling portion 511 by the central conveying member 526. As a result, the developer is filled into the filling portion 511, and then the developer is supplied downstream. The developer that has passed through the filling portion 511 flows toward a horizontal flow path 513 (see FIG. 9B) located downstream of the filling portion 511. Thereafter, the developer flows toward the developing device 14 through a vertical flow path 514.

[0104] As shown in FIG. 10, the central conveying member 526 is provided from one end to the other end of the lower container 518 in the longitudinal direction. Furthermore, central conveying member 526 is provided so as to pass through inside annular wall portion 550. In other words, central conveying member 526 is provided so that a portion of it is located in intra-wall space 556. 11, a groove 552A is formed in one end side wall portion 552 of the annular wall portion 550. The central conveying member 526 passes through this groove 552A.

[0105] The one end side wall portion 552 is provided to prevent the developer from entering the wall portion intra-space 556. More specifically, the developer in the pre-filling space 94 is prevented from entering the wall portion intra-space 556. 10, an opening 553A is provided in the side wall portion 553 at the other end of the annular wall portion 550. The central conveying member 526 is provided so as to pass through this opening 553A. In this embodiment, the other-end side wall portion 553 is provided, thereby preventing the developer from entering the wall portion inner space 556. More specifically, the developer in the other-end side connection flow path 544 is prevented from entering the wall portion inner space 556.

[0106] FIG. 12 is a diagram showing a state in which an upper member 561 is attached onto the lower container 518. As shown in FIG. In the supply device 70 , an upper member 561 is attached on top of the lower container 518 . The upper member 561 includes a blocking portion 562. The blocking portion 562 is provided to extend horizontally. The blocking portion 562 blocks a part of the opening 518X located at the top of the lower container 518.

[0107] The upper member 561 further includes a wall portion 563 . The wall portion 563 is connected to the closing portion 562. The wall portion 563 is provided so as to extend upward from the closing portion 562. The wall portion 563 is provided so as to face the wall portion 519 provided in the lower container 518. A gap is provided between the wall portion 563 and the wall portion 519 to allow gas to pass through. In other words, a space (described later) for passing gas is provided between wall portion 563 and wall portion 519.

[0108] The gas passes through an opening 507 provided at one end 500A of the developer reservoir 500 (see FIG. 11). The gas that passes through the opening 507 moves as shown by arrow 12A in FIG. The gas that has passed through the opening 507 passes through the gap between the lower container 518 and the upper member 561, as indicated by an arrow 12A. The gas then flows toward the other end 500B of the developer storage section 500. The gas flow path 530 (see FIG. 11) is provided between the lower container 518 and the upper member 561 (not shown in FIG. 11).

[0109] The gas that has passed through the opening 507 passes through this gas flow path 530 located between the lower container 518 and the upper member 561. Then, the gas flows toward the other end 500B of the developer storage section 500, as shown by an arrow 12A in FIG. The gas then enters the wall space 556 as indicated by arrow 11A in Figure 11. The gas then passes through the wall space 556 and flows toward the other end 500B (see Figure 12) of the developer storage section 500.

[0110] Thereafter, the gas flows toward the one-way flow path 541 through the recess 561C provided in the lower surface of the upper member 561 (see FIG. 12). The gas then passes above this one-way flow path 541 and moves to the space located between wall portion 563 and wall portion 519 . The gas then moves upward through this space and then out of the supply device 70 through the opening 505 (see FIG. 10) formed in the wall 519.

[0111] Fig. 13 is a cross-sectional view of the supply device 70 taken along line XIII-XIII in Fig. 7. Note that in Fig. 13, the developer storage container 80 shown in Fig. 7 is omitted. The gas flow in the supply device 70 will be further explained with reference to FIG. In this embodiment, first, gas from the developing device 14 (not shown in FIG. 13) enters the supply device 70. Then, the gas flows upward through the vertical flow path 514 that constitutes a part of the developer flow path 510. Thereafter, the gas passes through a gas flow path 530 that is provided in a form branching off from the developer flow path 510 and heads toward the other end 72 of the supply device 70 .

[0112] The gas flow path 530 is again connected to the internal space of the supply device 70 at the location indicated by reference numeral 13A. Below the location indicated by reference numeral 13A, there is an inner wall space 556 located inside the annular wall 550 (not shown in FIG. 13). The gas flow path 530 is connected at a location indicated by reference numeral 13A to an inner wall space 556 located inside the annular wall 550. This inner wall space 556 is a space located inside the supply device .

[0113] The gas flow path 530 then passes through the intra-wall space 556 . The wall portion inner space 556 is a space that is not positioned above the developer flow path 510. The wall portion inner space 556 is a space that is positioned at a location away from the developer flow path 510. The gas flow path 530 is connected to a wall space 556, which is a portion of the internal space of the supply device 70 that is not the developer flow path 510. The gas flow path 530 passes through this wall space 556.

[0114] The gas flow path 530 is connected to this wall space 556 which is the space inside the supply device 70 . As shown by an arrow 11A in FIG. 11, the gas flow path 530 is connected to the wall interior space 556 from the upper side of the wall interior space 556.

[0115] The gas that enters the wall space 556 moves along the longitudinal direction of the wall space 556 . The gas flow path 530 passes through the intra-wall space 556. The gas flow path 530 is provided so as to extend in the longitudinal direction of the intra-wall space 556. Therefore, the gas that enters the intra-wall space 556 moves along the longitudinal direction of the intra-wall space 556. The gas flow path 530 flows toward the recess 561C (see FIG. 12) after passing through the wall inner space 556. The gas passing through the gas flow path 530 flows toward this recess 561C.

[0116] Thereafter, the gas flow path 530 passes through the upper part of the one-way flow path 541 and heads toward the opening 505 (see FIG. 10). After passing through the upper part of the one-way flow path 541, the gas flow path 530 passes between the wall portion 563 and the wall portion 519 and heads toward the opening 505. The gas in wall space 556 passes through recess 561C (see FIG. 12) and reaches the upper part of unidirectional flow path 541. Thereafter, the gas reaches opening 505 formed in wall 519 (see FIG. 10). Then, the gas passes through opening 505 and moves to the outside of supply device 70.

[0117] Figure 14 is a cross-sectional view of the supply device 70 taken along a plane perpendicular to the longitudinal direction of the developer container 80. In Figure 14, the developer container 80 is indicated by a broken line. The supply device 70 is provided with a protruding portion 76 that extends obliquely upward and has a hollow interior. In this embodiment, the protruding portion 76 is provided with an opening 505. In this embodiment, the lower container 518 is provided with a wall portion 519. The upper member 561 is also provided with a wall portion 563. In this embodiment, the protrusion 76 is formed by the wall portion 519 and the wall portion 563. The wall portion 563 and the wall portion 519 protrude upward. The wall portion 563 and the wall portion 519 are disposed so as to face each other.

[0118] In this embodiment, a part of the upwardly extending protrusion 76 is located to the side of the developer container 80 . The protruding portion 76 has a facing surface 761 that faces the developer accommodating container 80. The protruding portion 76 also has an opposite surface 762 that is located on the opposite side to the facing surface 761. An opening 505 is provided on an opposite surface 762 of the multiple surfaces of the protruding portion 76. The opening 505 is provided in a manner facing away from the side on which the developer accommodating container 80 is installed. In this case, gas is more easily discharged from the opening 505 than when the opening 505 faces the side where the developer accommodating container 80 is installed. As described above, the filter 506 is installed at a position opposite the opening 505.

[0119] The supply device 70 is provided with a receiving port 79A for receiving the developer from the developer storage container 80. The supply device 70 is also provided with a discharge port 74 for discharging the developer. The opening 505 provided in the protruding portion 76 is provided above the receiving port 79A. Furthermore, the opening 505 is provided above the discharge port 74 which is provided below the receiving port 79A.

[0120] Furthermore, the opening 505 is provided at a position away from the developer flow path 510. The developer flow path 510 is provided inside the developer storage unit 500. The opening 505 is provided at a position away from the developer flow path 510 inside the developer storage unit 500. The filling portion 511 (not shown in FIG. 14) also constitutes a part of the developer flow path 510. In addition, a portion located downstream of the filling portion 511 in the moving direction of the developer also constitutes a part of the developer flow path 510. The opening 505 is provided at a location away from the developer flow path 510 .

[0121] An opening 505 provided in the protruding portion 76 is an opening that allows the inside and outside of the supply device 70 to communicate with each other. The supply device 70 is provided with an opening 505 in addition to the receiving port 79A and the discharge port 74. The gas flowing from the developing device 14 is discharged to the outside of the supply device 70 through this opening 505.

[0122] 15 is a diagram showing the flow of gas when the supply device 70 is viewed from above. In FIG. 15, the upper member 561 and the like are not shown. The gas flowing from the developing device 14 passes through an outlet 74 provided in the supply device 70 and enters the inside of the supply device 70. The gas that has entered the inside of the supply device 70 passes through the vertical flow path 514 and then enters the gas flow path 530.

[0123] The gas then passes through the gas flow path 530 and heads toward the wall interior space 556. The gas then passes through the wall interior space 556 and heads toward the other end 72 of the supply device . The gas flow path 530 is provided so as to pass through the wall space 556. Therefore, the gas passes through the wall space 556 and heads toward the other end 72 of the supply device . The developer is not transported in the wall portion inner space 556. Therefore, the amount of developer in the wall portion inner space 556 is small.

[0124] Next, the gas flows from wall portion inner space 556 toward one-way flow channel 541. More specifically, the gas flows toward a location of one-way flow channel 541 other than one end 541A. The gas flowing toward one-way flow channel 541 flows toward a portion of one-way flow channel 541 that is located upstream of one end 541A. This "upstream side" refers to the upstream side in the direction of movement of the developer in one-way flow channel 541.

[0125] In this embodiment, as shown in FIG. 12, a recess 561C is provided on the lower surface of the upper member 561. 15, a connection flow path 594 that constitutes a part of the gas flow path 530 is provided at the location where this recess 561C is provided. The connection flow path 594 is a flow path that connects the wall portion inner space 556 and the one-way flow path 541.

[0126] As shown in FIG. 15, the connection flow path 594 is connected to the central portion 541C of the one-way flow path 541 in the longitudinal direction. 15, the connection flow path 594 is also connected to the other end portion 541T of the one-way flow path 541. The other end portion 541T is a portion located closer to the other end portion 541B than the central portion 541C.

[0127] Therefore, the gas that has passed through wall interior space 556 flows toward central portion 541C when heading toward one-way flow path 541. Furthermore, the gas that has passed through wall interior space 556 flows toward other end portion 541T when heading toward one-way flow path 541. The gas then passes through the space inside the protrusion 76 (see FIG. 14) and heads toward the opening 505 provided in the protrusion 76.

[0128] The developer transported by the unidirectional transport member 521 accumulates at one end 541A of the unidirectional flow path 541 (see FIG. 15). As a result, the height of the upper surface of the developer increases at this one end 541A. It is also possible to consider a mode in which the gas in wall portion space 556 passes above one end 541A and is directed toward opening 505. In this case, it becomes difficult for the gas to pass above one end 541A. In contrast, when the gas passes above the central portion 541C or above the other end portion 541T, the gas flows more easily. In this case, the gas passes through a portion where the height of the upper surface of the developer is low, and the gas flows more easily.

[0129] The central conveying member 526 is also provided in the wall space 556 . The central transport member 526, which is an example of a moving member, moves the developer accumulated in the wall space 556. Gas passing through the gas flow path 530 is supplied into the wall interior space 556. In this case, the developer contained in this gas accumulates in the wall interior space 556. The developer accumulated in the wall space 556 is transported to the pre-filling space 94 by the central transport member 526. The developer in the wall space 556 is discharged from the wall space 556.

[0130] [Another configuration example of the supply device 70] 16 is a diagram showing another example of the configuration of the supply device 70 and the developer storage container 80. FIG. 17 is a cross-sectional view of the supply device 70 and the developer storage container 80 taken along the line XVII-XVII in FIG. In the above description, the opening 505 and the filter 506 are provided in the protrusion 76 (see FIG. 14) provided on the supply device 70.

[0131] 16, the developer storage container 80, which is an example of a detachable body, is provided with an opening 505. Furthermore, a filter 506 is provided at the opening 505 of the developer storage container 80. As described above, the developer container 80 is a container that contains the developer to be supplied to the developing device 14.

[0132] In the state shown in FIG. 16, a developer storage container 80, which is an example of a detachable body, is attached to the attachment portion 701. In this configuration example, similarly to the above, the gas discharged from the developing device 14 is supplied to the supply device 70. Then, this gas supplied to the supply device 70 flows to the location where the developer storage container 80 is installed. Then, this gas is supplied to the developer storage container 80. The gas supplied from the developing device 14 to the supply device 70 flows toward the mounting portion 701 of the developer storage container 80. Then, this gas is supplied to the developer storage container 80 mounted in the mounting portion 701.

[0133] Specifically, the gas that reaches the supply device 70 from the developing device 14 first enters the inside of the protruding portion 76. Specifically, the gas that reaches the supply device 70 from the developing device 14 passes through the wall space 556 (see FIG. 11) and the like, and then enters the inside of the protruding portion 76. Thereafter, in this configuration example, the gas moves along the axial direction of the developer accommodating container 80, as indicated by arrow 16A. The gas moves toward one end 81 of the developer accommodating container 80 in the axial direction.

[0134] In the supply device 70 shown in FIG. 16, the position of the protrusion 76 is different from that described above. In the configuration example shown in FIG. 7, when the protruding portion 76 is viewed from one end 81 side of the developer accommodating container 80, the protruding portion 76 is disposed to the left of the developer accommodating container 80. 16, the protruding portion 76 is disposed to the right of the developer storage container 80. When the protruding portion 76 is viewed from one end 81 side of the developer storage container 80, the protruding portion 76 is disposed to the right of the developer storage container 80. The position of the protruding portion 76 is not particularly limited, and it may be located on either the left or right side of the developer container 80 .

[0135] As described above and as indicated by the arrow 16A, the gas moves toward the one end 81 of the developer storage container 80 in the axial direction. 17, the gas is supplied to the developer storage container 80. The gas supplied to the developer storage container 80 enters the inside of the developer storage container 80.

[0136] The gas then passes through the opening 505 and moves out of the developer container 80 . When the gas passes through the opening 505, the gas passes through a filter 506 provided in the opening 505. At this time, the filter 506 removes developer, which is an example of powder contained in the gas. In this embodiment, the developing device 14 is the source of the gas containing the powder. The source of this gas is not limited to the developing device 14, but may be another device. In this case, the gas from this other device is directed toward the mounting portion 701 of the developer storage container 80. This also makes it possible to remove the powder from the gas containing the powder that is generated in this other device.

[0137] In this configuration example, gas from the developing device 14 is supplied to the developer container 80 via a supply device 70. However, the present invention is not limited to this, and a dedicated flow path for passing gas may be provided separately from the supply device 70, and the gas may be supplied directly from the developing device 14 to the developer storage container 80. Alternatively, the gas from the developing device 14 may be supplied to the developer container 80 via a device other than the supply device 70.

[0138] 16 and 17, gas flows from the installation location of the developing device 14 to the developer accommodating container 80. In the configuration examples shown in Figures 16 and 17, gas flows to the developer accommodating container 80 from a location other than the installation location of the developer accommodating container 80. As described above, the developer container 80 is provided with the filter 506. This filter 506 removes the developer contained in the gas that has flowed from the developing device 14 to the developer container 80 . Note that "removal" means reducing the developer contained in the gas. "Removal" is not limited to removing all of the developer contained in the gas. "Removal" also includes reducing the developer contained in the gas.

[0139] In this embodiment, when the developer storage container 80 attached to the attachment portion 701 reaches a predetermined state, the developer storage container 80 is removed. Then, a new developer storage container 80 is attached to the attachment portion 701. When the developer container 80 is removed, the old filter 506 is removed from the image forming apparatus 100. Then, when a new developer container 80 is attached, a new filter 506 is installed.

[0140] The "predetermined state" mentioned above may be, for example, a state in which the developer container 80 is empty. In this embodiment, when the developer storage container 80 becomes empty, a notification is given to the user via the UI 45 (see FIG. 1). As a notification to the user, for example, a notification of information indicating that the developer in the developer storage container 80 has run out can be given. Accordingly, the user removes the developer storage container 80 from the mounting portion 701. After that, the user mounts a new developer storage container 80 in the mounting portion 701. In this case, not only is the developer storage container 80 replaced, but the filter 506 is also replaced.

[0141] Additionally, the "predetermined state" may also be a state in which the container is filled with powder. Filter 506 may be provided in a container in which the amount of powder inside gradually increases as images are formed in image forming apparatus 100. In this case, when the container becomes full of powder, it is replaced with a new container. At this time, the old filter 506 is replaced with a new filter 506. An example of a container in which the amount of powder inside gradually increases is a disposal container, which will be described later.

[0142] It is preferable that filter 506 be provided in a container in which the amount of powder inside gradually decreases as images are formed in image forming apparatus 100. An example of this container is the developer container 80 described above. Alternatively, it is preferable that filter 506 be provided in a storage container in which the amount of powder inside gradually increases as images are formed in image forming apparatus 100. An example of this storage container is a waste storage container, which will be described later.

[0143] As shown in FIG. 17, the developer container 80 is formed in a cylindrical shape. In addition, a discharge opening is provided on the outer peripheral surface of the developer storage container 80 and at the bottom of the developer storage container 80. The discharge opening is provided at the location indicated by reference numeral 17A in FIG. 17. The discharge opening is provided on the outer peripheral surface of the developer storage container 80 and at the bottom of the developer storage container 80. The discharge opening is located at a position that is not directly below the opening 505 and the filter 506. For this reason, the discharge opening is not shown in FIG. The discharge opening is used to discharge the developer contained in the developer container 80. The developer in the developer container 80 moves to the supply device 70 through this discharge opening.

[0144] The opening 505 and the filter 506 are provided on the opposite side of the axis 80G of the developer accommodating container 80 from the side on which the discharge opening is provided. The opening 505 and the filter 506 are provided on the opposite side of an imaginary horizontal plane 80H passing through the axis 80G from the side on which the discharge opening is provided. In this configuration, the degree of freedom in placing the opening 505, the filter 506, and the discharge opening is improved. Assume that opening 505 and filter 506 are provided on the same side as the discharge opening, in which case the degree of freedom in placing opening 505, filter 506, and the discharge opening is likely to decrease. In contrast to this, if the opening 505 and the filter 506 are provided on the opposite side to the discharge opening, the degree of freedom in installation is improved.

[0145] 17, the developer accommodating container 80 is provided with a gas flow path 80R, which is a flow path through which gas flowing from the developing device 14 passes. The gas flow path 80R has an inlet portion 80E. The gas flowing from the developing device 14 passes through the inlet portion 80E and enters the gas flow path 80R. A main body side flow path 91, which is a flow path through which gas flows toward the developer storage container 80, is provided on the main body 100H side of the image forming apparatus 100. The main body side flow path 91 is provided inside the supply device . The gas flowing from the developing device 14 passes through this main body side flow path 91 and heads toward the developer storage container 80. The main body side flow path 91 has an outlet 91A for discharging the gas.

[0146] In this configuration example, when the developer accommodating container 80 is attached to the attachment portion 701, the gas flow path 80R and the main body side flow path 91 are connected. When the developer accommodating container 80 is attached to the attachment portion 701, the inlet portion 80E of the gas flow path 80R and the outlet 91A of the main body side flow path 91 face each other, thereby connecting the gas flow path 80R and the main body side flow path 91. The gas flow path 80R starts from the inlet portion 80E and reaches an opening 505 provided on the outer peripheral surface of the developer accommodating container 80. The gas flow path 80R extends from the inlet portion 80E through the inside of the developer accommodating container 80 and reaches the opening 505. As described above, the filter 506 is provided in this opening 505 .

[0147] 18 is a diagram showing another example of the configuration of the developer storage container 80. Fig. 18 shows the developer storage container 80 as viewed from the direction indicated by the arrow XVIII in Fig. 16. In this configuration example, a blocking portion 80F is provided to block an inlet portion 80E of the gas flow path 80R. Furthermore, a biasing member 80J is provided to bias the blocking portion 80F. The biasing member 80J biases the closing portion 80F toward the downstream side in the moving direction of the developer accommodating container 80. This “moving direction” refers to the moving direction of the developer accommodating container 80 when the developer accommodating container 80 is attached to the attachment portion 701 .

[0148] Before the developer accommodating container 80 is attached to the attachment portion 701, the closing portion 80F is located at a position facing the inlet portion 80E. In this case, the inlet portion 80E is closed. When the developer accommodating container 80 is attached to the attachment portion 701, the end portion 80T of the closing portion 80F abuts against an abutting portion (not shown). The end portion 80T of the closing portion 80F abuts against an abutting portion (not shown) provided on the main body side of the image forming apparatus 100. When the developer accommodating container 80 is attached to the attachment portion 701, the end portion 80T of the closing portion 80F abuts against the abutted portion. As a result, the main body 80N of the developer accommodating container 80 moves, while the movement of the closing portion 80F is restricted. As a result, in this configuration example, when the developer accommodating container 80 is attached to the attachment portion 701, the entrance portion 80E is opened.

[0149] When the developer storage container 80 is to be removed, the main body 80N of the developer storage container 80 moves in the direction in which the developer storage container 80 is to be removed. On the other hand, at this time, the blocking portion 80F remains in contact with the abutted portion, and therefore the blocking portion 80F does not move. When the main body 80N reaches a predetermined position, the blocking portion 80F is positioned opposite the entrance portion 80E, thereby blocking the entrance portion 80E.

[0150] When the blocking portion 80F is provided, the developer is prevented from being discharged from the inlet portion 80E. There is a risk that developer contained in the gas flowing from the developing device 14 may accumulate in the gas flow path 80R. In this case, when the developer accommodating container 80 is removed, the developer accumulated in the gas flow path 80R may be discharged from the inlet portion 80E. Furthermore, when the gas flow path 80R is configured to pass through the inside of the developer storage container 80, the developer may be discharged from the inlet portion 80E. Specifically, the developed image in the developer storage container 80 may be discharged from the inlet portion 80E. In contrast to this, when the blocking portion 80F is provided as described above, the developer is prevented from being discharged from the inlet portion 80E.

[0151] In this embodiment, as shown in FIG. 17, when the developer accommodating container 80 is attached to the attachment portion 701, the inlet portion 80E faces obliquely upward. In this case, even if the blocking portion 80F is not provided, the developer is unlikely to be discharged from the inlet portion 80E. In this case, the developer is unlikely to be discharged from the inlet portion 80E while the developer accommodating container 80 is being removed. In addition to orienting the inlet 80E obliquely upward, a blocking portion 80F may be provided, which makes it even more difficult for the developer to be discharged from the inlet 80E.

[0152] Alternatively, the inlet portion 80E may be arranged so as to face laterally or so as to face upward in the vertical direction. Specifically, in a state where the developer accommodating container 80 is attached to the attachment portion 701, the inlet portion 80E may be arranged so that the inlet portion 80E faces in the horizontal direction. Furthermore, in a state where the developer accommodating container 80 is attached to the attachment portion 701, the inlet portion 80E may be disposed so that the inlet portion 80E faces upward in the vertical direction.

[0153] FIG. 19 is a diagram illustrating another example of the configuration of the main body side flow path 91. In FIG. FIG. 19 shows the main body side flow path 91 as viewed from the direction indicated by the arrow XIX in FIG. In this configuration example, there is provided a blocking portion 90F that blocks a discharge port 91A provided in a main body side flow path 91. Furthermore, there is provided a biasing member 90J that biases this blocking portion 90F in the direction indicated by an arrow 19A in the figure. The biasing member 90J biases the closing portion 90F toward the upstream side in the mounting direction of the developer accommodating container 80.

[0154] In this configuration example, a pressing portion (not shown) provided on the developer accommodating container 80 presses the closing portion 90F. When the developer accommodating container 80 is attached to the attachment portion 701, this pressing portion presses the closing portion 90F. As a result, the closing portion 90F moves downstream in the mounting direction of the developer accommodating container 80. The closing portion 90F moves in the direction indicated by an arrow 19B in FIG. When the attachment of the developer accommodating container 80 is completed, the closing portion 90F is positioned at a position that is not opposed to the discharge opening 91A, as shown in Figure 19. This opens the discharge opening 91A.

[0155] When the developer storage container 80 is removed from the image forming apparatus 100, the pressing portion moves in the direction in which the developer storage container 80 is removed. Accordingly, the blocking portion 90F also moves in the direction in which the developer storage container 80 is removed. The blocking portion 90F moves in the direction indicated by arrow 19A in FIG. When the developer accommodating container 80 is removed, the closing portion 90F is located at a position facing the discharge opening 91A, so that the discharge opening 91A is closed by the closing portion 90F. When the blocking portion 90F that blocks the discharge port 91A is provided, the developer accumulated in the main body side flow path 91 is prevented from being discharged to the outside of the main body side flow path 91.

[0156] FIG. 20 is a diagram showing another example of the configuration of the supply device 70 and the developer container 80. In FIG. In this configuration example, a discharge port 91A provided in the main body side flow path 91 faces obliquely upward. In this case, the developer accumulated in the main body-side flow path 91 is less likely to be discharged to the outside of the main body-side flow path 91. In this case, even if the blocking portion 90F shown in FIG. 19 is not provided, the developer accumulated in the main body-side flow path 91 is less likely to be discharged to the outside of the main body-side flow path 91. Note that the provision of the blocking portion 90F is not excluded, and the blocking portion 90F may also be provided in this configuration example shown in FIG.

[0157] Alternatively, the outlet 91A of the main body side flow path 91 may be oriented in the horizontal direction or in the vertical direction. In addition, in this configuration example shown in Fig. 20, it is preferable to provide the blocking portion 80F shown in Fig. 18. In this configuration example shown in Fig. 20, since the inlet portion 80E faces diagonally downward, it is preferable to provide the blocking portion 80F.

[0158] FIG. 21 is a diagram showing another example of the configuration of the developer container 80. In FIG. Here, imagine a virtual plane that is perpendicular to the axial direction of the developer accommodating container 80. Figure 21 shows the state of the cross section of the developer accommodating container 80 on this virtual plane. The developer storage container 80 is provided with a storage portion 86A that stores the developer, which is a powder, stored in the developer storage container 80. Furthermore, the developer storage container 80 is provided with a gas flow path 80R, similar to the above. In this configuration example, the gas flow path 80R is directed to the filter 506 without passing through the containing portion 86A of the developer containing container 80.

[0159] The storage portion 86A is provided inside a cylindrical member 86B, which is a cylindrical member. In contrast, the gas flow path 80R is provided outside the cylindrical member 86B. The gas flow path 80R does not pass through the storage portion 86A of the developer storage container 80. In this configuration example, the gas that flows from the developing device 14 to the developer container 80 also passes through the gas flow path 80R. The gas passes through the gas flow path 80R that is provided on the outside of the cylindrical member 86B. The gas then passes through this gas flow path 80R and reaches a filter 506 provided on the outside of the cylindrical member 86B.

[0160] In this configuration example, the space between the outer peripheral surface 86D of the cylindrical member 86B and the opposing member 87 is used as the gas flow path 80R. In this configuration example, the developer accommodating container 80 includes the cylindrical member 86B as described above. The cylindrical member 86B accommodates the developer accommodated in the developer accommodating container 80. Furthermore, in this configuration example, an opposing member 87 is provided, which is arranged at a position opposing the outer circumferential surface 86D of the cylindrical member 86B.

[0161] In this configuration example, a gap 86G exists between an outer peripheral surface 86D of the cylindrical member 86B and the opposing member 87. In this configuration example, this gap 86G is used as a gas flow path 80R. In this configuration example, the gas passes through a gas flow path 80R provided outside the cylindrical member 86B and heads toward a filter 506 also provided outside the cylindrical member 86B. The filter 506 is attached to the opposing member 87.

[0162] The gas flow path 80R is not essential, and the developer storage container 80 may not be provided with the gas flow path 80R. FIG. 22 is a diagram showing another example of the configuration of the supply device 70 and the developer container 80. In FIG. In this configuration example, the filter 506 is provided outside the outer circumferential surface 87A of the opposing member 87. The filter 506 is provided along the radial direction of the developer accommodating container 80. The filter 506 is supported by a frame-shaped support member 87B positioned around the periphery of the filter 506.

[0163] 22 shows a state in which the developer accommodating container 80 is attached to the attachment portion 701. In this configuration example, the filter 506 is located at a position facing the discharge port 91A of the main body side flow path 91. In this configuration example, when the developer accommodating container 80 is attached to the attachment portion 701, the filter 506 is positioned opposite the discharge opening 91A. In this case, the gas discharged from the outlet 91A of the main body side flow path 91 is supplied directly to the filter 506. In this case, it is not necessary to provide the gas flow path 80R in the developer storage container 80. When the gas flow path 80R is not provided in the developer storage container 80, the configuration of the developer storage container 80 can be simplified more easily. Additionally, a member for protecting the filter 506 may be provided around the filter 506. In this case, the filter 506 is less likely to be damaged.

[0164] [Another configuration example of the supply device] 23 and 24 are diagrams showing other configuration examples of the supply device 70 and the developing device 14. Fig. 23 is a diagram showing the supply device 70 and the developing device 14 as viewed from above. Fig. 24 is a diagram showing the supply device 70 and the developing device 14 as viewed obliquely from below. 24, the supply device 70 is provided with a lower container 518. The developer storage container 80 is placed on top of the lower container 518.

[0165] A lid member 621 is provided between the lower container 518 and the developer accommodating container 80 placed on the lower container 518. The lid member 621 closes an opening 518K shown in FIG. 23, which is located at the top of the lower container 518. Note that the lid member 621 and the developer accommodating container 80 are not shown in FIG. 23, a developer flow path 518R is provided inside the lower container 518. The developer supplied from the developer storage container 80 passes through this developer flow path 518R. The developer flow path 518R is disposed so as to extend in a direction intersecting the vertical direction. More specifically, the developer flow path 518R is disposed so as to extend in the horizontal direction.

[0166] New developer supplied from the developer storage container 80 is supplied to the supply destination 631. This new developer is supplied to the predetermined supply destination 631 in the developer flow path 518R. The new developer supplied to the supply destination 631 moves to a downstream portion 632 of the developer flow path 518R. The developer is transported by the transport member 18H and moves to the downstream portion 632. The "downstream portion 632" refers to a portion located downstream of the supply location 631. The direction of movement of the developer is assumed as the developer moves through the developer flow path 518R. In this movement direction, the downstream portion 632 is located downstream of the supply location 631.

[0167] After passing through the downstream portion 632 , the developer enters the inside of the cylindrical portion 633 . In this configuration example, the developer does not become dense inside the cylindrical portion 633. The developer does not exist in the upper space of the space inside the cylindrical portion 633. The developer that has passed through the cylindrical portion 633 passes through the inside of a tubular member 634 that is disposed so as to intersect with the cylindrical portion 633, and heads toward the developing device 14. The tubular member 634 has, for example, a U-shaped cross section. A transport member for transporting the developer is provided inside the tubular member 634. The developer inside the tubular member 634 is directed toward the developing device 14 by this transport member. The developer is then supplied to the developing device 14.

[0168] Next, the gas flow will be described. In this configuration example, gas is also discharged from the developing device 14. The gas discharged from the developing device 14 passes through the tubular member 634 toward the supply device 70. Then, the gas passes through the cylindrical portion 633 of the supply device 70 and enters the supply device 70. The gas then flows along the developer flow path 518R as indicated by an arrow 23A, and then flows toward a side 518S of the developer flow path 518R as indicated by an arrow 23B.

[0169] In the direction of the gas flow toward the side 518S, a wall portion 518H is provided downstream of the developer flow path 518R. The wall portion 518H is provided along the developer flow path 518R. Further, a side space 518L is provided on a side 518S of the developer flow path 518R. The side space 518L is a space located on the side 518S of the developer flow path 518R. The wall portion 518H is provided between the developer flow path 518R and the side space 518L.

[0170] Assume that the gas flows from the developer flow path 518R toward a side 518S of the developer flow path 518R. In this flow direction, a side space 518L is provided downstream of the developer flow path 518R. The wall portion 518H functions as a partition, and serves to separate the side space 518L from the developer flow path 518R. In the direction of the gas flow toward the side space 518L, a partition is provided downstream of the developer flow path 518R.

[0171] Gas moving toward the side space 518L passes above the wall portion 518H and moves to this side space 518L. An opening 518P is provided in this side space 518L. The gas that has moved into the side space 518L then reaches this opening 518P. The gas then passes through the opening 518P and moves to the outside of the supply device 70. In this configuration example, the lower container 518 has an opening 518P at its bottom.

[0172] The opening 518P in this configuration example is also used to exhaust the gas that has flowed from the developing device 14 to the supply device 70, in the same manner as above. In this configuration example, the gas flowing from the developing device 14 to the supply device 70 passes through the developer flow path 518R and heads toward the opening 518P. Then, the gas moves to the outside of the supply device 70 through the opening 518P.

[0173] The opening 518P is disposed at a position not directly above the developer flow path 518R. Here, the positions in the intersecting direction, which is a direction intersecting the vertical direction, are compared. In Figure 23, this intersecting direction is indicated by arrow 23X. In the configuration example shown in FIG. 23, the position of the opening 518P in the intersecting direction and the position of the developer flow path 518R in the intersecting direction are different from each other. Furthermore, the position in the width direction of the developer flow path 518R is compared. In the configuration example shown in Figure 23, the position in the width direction of the opening 518P and the position in the width direction of the developer flow path 518R are different. The "width direction" of the developer flow path 518R refers to the horizontal direction, which is perpendicular to the extension direction of the developer flow path 518R.

[0174] Furthermore, in this configuration example, a recess 518B that is recessed downward is provided. The recess 518B is provided between the opening 518P and the developer flow path 518R in the intersecting direction. The recess 518B is provided along the developer flow path 518R. The recess 518B is provided from one end to the other end of the developer flow path 518R.

[0175] Figure 25 is a cross-sectional view of the supply device 70 taken along line XXV-XXV in Figure 23. Figure 25 shows the cross-sectional state of the downstream portion 632. The wall portion 518H protrudes upward from the bottom surface of the lower container 518, and its tip in the protruding direction is the upper end portion 18J. A lid member 621 is provided above the upper end 18J of the wall portion 518H. The lid member 621 closes an opening 518K located at the top of the lower container 518.

[0176] The lid member 621 has an opposing surface 621A that faces downward and faces the lower container 518. A gap 18K is provided between an upper end 18J of the wall portion 518H and the opposing surface 621A of the lid member 621. The gas moving from the developer flow path 518R toward the side space 518L passes through this gap 18K. The gas moves through this gap 18K into the side space 518L.

[0177] A transport member 18H is provided in the developer flow path 518R. The transport member 18H rotates around a rotation axis 18G along the developer flow path 518R to transport the developer. The conveying member 18H is made of a coil, in other words, made of a wire material bent into a spiral shape. Comparing the positions in the vertical direction, in this configuration example, the upper end 18J of the wall portion 518H is located above the rotation shaft 18G of the conveying member 18H. Furthermore, in this configuration example, a recess 518B is provided on the opposite side of the wall 518H from the side where the developer flow path 518R is provided.

[0178] A gap 18K located between the opposing surface 621A of the lid member 621 and the upper end 18J of the wall portion 518H functions as an inlet portion 18E for gas. The gas flowing from the developing device 14 flows along the developer flow path 518R. Then, the gas heads toward the side space 518L located on the side 518S of the developer flow path 518R. At this time, the gas passes through the inlet portion 18E.

[0179] An inlet 18E through which gas flows from the developer flow path 518R toward the side space 518L is provided above the upper end 18J of the wall portion 518H. The gas that flows along the developer flow path 518R passes through the inlet 18E and flows toward the side space 518L. The inlet portion 18E is formed by the gap 18K. The inlet portion 18E is provided along the extension direction of the developer flow path 518R.

[0180] The gas in the developer flow path 518R passes through the inlet portion 18E and enters the side space 518L. The gas then passes above recess 518B and heads toward opening 518P. As described above, filter 506 is provided at opening 518P. The opening 518P is located above the bottom 18T of the recess 518B. The opening 518P is also provided facing downward.

[0181] The gas entering the side space 518L contains the developer. The developer contained in the gas moves to the bottom 18T of the recess 518B on the way to the opening 518P. As a result, the developer accumulates in the recess 518B. As described above, the recess 518B is provided along the extension direction of the developer flow path 518R. 25, the opening 518P is provided in the bottom of the lower container 518. However, the present invention is not limited to this, and the opening 518P may be provided in the side of the lower container 518, such as the location indicated by reference numeral 25A. In any case, the opening 518P is preferably provided above the bottom 18T of the recess 518B.

[0182] Further explanation will be given with reference to FIG. In this configuration example, new developer is supplied to the supply location 631 of the developer flow path 518R. The supply location 631 is supplied with developer from the developer storage container 80 shown in FIG. The new developer supplied to the supply destination 631 moves to the downstream portion 632 of the developer flow path 518R. Thereafter, the developer passes through the cylindrical portion 633 and heads toward the developing device .

[0183] In this embodiment, a blocking member 18F is provided on a side 518S of the developer flow path 518R, on the side of the supplied portion 631. The blocking member 18F blocks the inlet portion 18E shown in FIG. This closing member 18F is made of, for example, a plate-like member made of resin. In this embodiment, the upper end of this closing member 18F comes into contact with an opposing surface 621A of a cover member 621 shown in FIG.

[0184] FIG. 26 is a view of the inlet portion 18E as viewed from the direction indicated by the arrow XXVI in FIG. In this embodiment, a portion of the inlet 18E is blocked by the blocking member 18F. More specifically, a portion of inlet 18E located on the side of supply destination 631 shown in FIG. 23 is blocked by blocking member 18F. As a result, in this configuration example, the inlet portion 18E is not provided on the side of the supplied portion 631. 26 is provided on the side of supply destination 631. As a result, in this configuration example, inlet portion 18E is not provided on the side of supply destination 631.

[0185] In contrast, the portion of inlet 18E located to the side of downstream portion 632 shown in Fig. 23 is not blocked. Blocking member 18F is not provided to the side of downstream portion 632. As a result, the portion of inlet 18E located to the side of downstream portion 632 shown in Fig. 23 is not blocked. The portion of the inlet portion 18E located to the side of the downstream portion 632 is not blocked but is open. The gas from the developing device 14 passes through this open portion of the inlet portion 18E toward the side space 518L.

[0186] The developer is supplied to the supply destination 631 from above the supply destination 631. The developer is supplied to the supply destination 631 from the developer storage container 80 located above the supply destination 631. In this case, the developer tends to float at the supply location 631. As in the present embodiment, if the inlet portion 18E is not provided on the side of the supply location 631, the floating developer is less likely to move to the side space 518L. In this case, the developer is less likely to reach the opening 518P in the side space 518L.

[0187] 26, upper end 18X of closing member 18F comes into contact with opposing surface 621A of lid member 621. However, the present invention is not limited to this configuration, and other configurations may also be used. For example, the upper end 18X of the blocking member 18F and the opposing surface 621A of the lid member 621 may not come into contact with each other. In this case, a gap is formed between the upper end 18X and the facing surface 621A. Even when a gap is formed in this way, the amount of developer heading toward the opening 518P is reduced compared to a configuration in which the blocking member 18F is not provided.

[0188] Figure 27 is a cross-sectional view of the supply device 70 taken along line XXVII-XXVII in Figure 23. Figure 27 shows the cross-sectional state at the supply location 631. In this figure, the blocking member 18F described above is shown. In this embodiment, the position of the opposing surface 621A is different as indicated by reference numeral 25X in Fig. 25 and reference numeral 27X in Fig. 27. The position of the opposing surface 621A is different in the height direction.

[0189] In this configuration example, the position of the opposing surface 621A in the height direction differs depending on the position in the extension direction of the developer flow path 518R. As shown in FIG. 25, the position in the height direction of the portion of the facing surface 621A that faces the downstream portion 632 is indicated by the symbol 25X. As shown in FIG. 27, the position in the height direction of the portion of opposing surface 621A that faces supply destination location 631 is indicated by reference symbol 27X. In this configuration example, the position indicated by the reference symbol 27X is located below the position indicated by the reference symbol 25X. In this configuration example, the portion of opposing surface 621A that faces supply destination location 631 is located lower than the portion of opposing surface 621A that faces downstream portion 632.

[0190] Accordingly, in this embodiment, the cross-sectional area of ​​the developer flow path 518R varies depending on the portion of the developer flow path 518R. The cross-sectional area of ​​the developer flow path 518R at the supply location 631 is defined as a cross-sectional area S1. The cross-sectional area of ​​the developer flow path 518R at the downstream portion 632 is defined as a cross-sectional area S2. In this configuration example shown in FIGS. 25 and 27, the cross-sectional area S1 is smaller than the cross-sectional area S2. In this case, compared to when the cross-sectional area S1 is the same as the cross-sectional area S2, floating of the developer is less likely to occur at the supply portion 631. In this case, the amount of developer moving toward the side space 518L decreases.

[0191] Alternatively, the cross-sectional area S1 may be made smaller than the cross-sectional area S2 by varying the position of the bottom surface of the developer flow path 518R. Here, the portion of the bottom surface of developer flow path 518R that is located below supplied location 631 shown in Fig. 27 is referred to as supplied bottom surface 18W. Also, the portion of the bottom surface of developer flow path 518R that is located below downstream portion 632 shown in Fig. 25 is referred to as downstream bottom surface 18Y. The cross-sectional area S1 may be made smaller than the cross-sectional area S2 by making the position of the supplied bottom surface 18W and the position of the downstream bottom surface 18Y different. Specifically, the cross-sectional area S1 may be made smaller than the cross-sectional area S2 by positioning the supplied bottom surface 18W higher than the downstream bottom surface 18Y.

[0192] Alternatively, both the position of the opposing surface 621A and the position of the bottom surface of the developer flow path 518R may be made different. Here, the "cross-sectional area of ​​the developer flow path 518R" refers to the cross-sectional area of ​​the developer flow path 518R on a virtual plane perpendicular to the extension direction of the developer flow path 518R. In other words, the cross-sectional area of ​​the developer flow path 518R refers to the cross-sectional area of ​​the developer flow path 518R on a virtual plane perpendicular to the movement direction of the developer.

[0193] In the configuration examples shown in FIGS. 23 to 27, as described above, the conveying member 18H is a conveying member made of a wire material. Furthermore, in the configuration examples shown in FIGS. 23 to 27, the transport member 18H is configured to be driven intermittently. As a result, in the configuration examples shown in FIGS. 23 to 27, floating of the developer caused by driving the conveying member 18H is reduced. Although not described above, the one-way transport member 521 and the opposite-way transport member 522 shown in FIG. 10 are also driven intermittently.

[0194] [Description of the conveying device] Next, the transport device will be described. Although not described above, the image forming apparatus 100 of this embodiment is provided with a conveying device 800, as shown in Fig. 1. The conveying device 800 conveys the developer discharged from the developing device 14. In FIG. 1, a part of the conveying device 800 is disposed on the near side of the image forming unit 200 and the intermediate transfer belt 15. In this embodiment, new developer is supplied to the developing device 14 by the supply device 70. Accordingly, in this embodiment, excess developer is discharged from the developing device 14. The developer discharged from the developing device 14 is transported by the transport device 800 to a waste container, which will be described later.

[0195] In this embodiment, the gas discharged from the developing device 14 also flows into the transport device 800. The transport device 800 is provided with a gas opening, which is an opening used to discharge the gas flowing from the developing device 14 to the transport device 800. The gas opening will be described later. In this embodiment, the gas discharged from the developing device 14 flows not only toward the supply device 70 and the developer container 80 but also toward the transport device 800.

[0196] The gas discharged from the developing device 14 is discharged from the opening 505 shown in Fig. 7, which is provided in the supply device 70. Alternatively, the gas discharged from the developing device 14 is discharged from the opening 505 shown in Fig. 16, which is provided in the developer storage container 80. The gas discharged from the developing device 14 is also discharged from a gas opening, which is an opening provided in the transport device 800 . It is not essential to provide an opening in both the supply device 70 and the transport device 800. An opening may be provided in only one of the supply device 70 and the transport device 800. Furthermore, it is not essential to provide an opening in both the developer storage container 80 and the transport device 800. An opening may be provided in only one of the developer storage container 80 and the transport device 800.

[0197] Figure 28 is a diagram illustrating the transport device 800 and the waste storage container 850. Figure 28 shows the state of each part of the image forming apparatus 100 as viewed from the front side. 28 shows only one of the multiple developing devices 14. In addition, in FIG. 28, the developing device 14 is shown moved diagonally to the right in the drawing from its actual installation position.

[0198] The transport device 800 transports the developer discharged from the developing device 14 to a waste container 850. The conveying device 800 is provided with a lateral conveying section 810, a depth direction conveying section 841, and a vertical direction conveying section 842. The lateral conveying section 810 conveys the developer discharged from each of the developing devices 14 in the lateral direction as indicated by the arrow 28A in the figure. The lateral conveying section 810 conveys the developer discharged from the plurality of developing devices 14 in the lateral direction.

[0199] The depth direction conveying section 841 conveys the developer conveyed by the lateral direction conveying section 810 to the rear side of the image forming apparatus 100. A transport member 841A is provided in the depth direction transport section 841. The developer is transported to the rear side of the image forming apparatus 100 by this transport member 841A. The transport member 841A is accommodated inside a tubular member (not shown). The developer transported by the transport member 841A passes through the inside of this tubular member and heads toward the rear side of the image forming apparatus 100.

[0200] The vertical transport section 842 transports the developer transported by the depthwise transport section 841 to a waste container 850 located below it. The lateral conveying unit 810 is detachable. When the developing device 14 or the like is to be attached to or detached from the image forming apparatus 100, the lateral conveying unit 810 is removed. After the attachment or detachment of the developing device 14 or the like to or from the image forming apparatus 100 is completed, the lateral conveying unit 810 is reattached to the image forming apparatus 100.

[0201] FIG. 29 is a diagram showing the internal configuration of the lateral conveying section 810. As shown in FIG. The horizontal transport section 810 is provided with a developer flow path 811 through which the developer discharged from the developing device 14 passes. A transport member 812 is provided in the developer flow path 811 to transport the developer in the developer flow path 811 to the right in the drawing. The developer in the lateral transport section 810 is directed toward the depth direction transport section 841 by the transport member 812 .

[0202] The developer flow path 811 is provided so as to extend in the horizontal direction. The developer flow path 811 is provided so as to follow the direction in which the multiple developing devices 14 are arranged. Note that only one developing device 14 is shown in the drawing. In this embodiment, the gas discharged from the developing device 14 passes through this developer flow path 811 and heads toward the gas opening 813 . The wall portion 814 for forming the developer flow path 811 is provided with an inlet portion 93 through which gas from the developing device 14 enters the developer flow path 811 . The gas discharged from the developing device 14 is supplied to the developer flow path 811 of the transport device 800. Then, the gas passes through the developer flow path 811 and heads toward the gas opening 813.

[0203] The gas opening 813 is provided in a wall portion 814 for forming the developer flow path 811 . A wall portion 814 is provided around the developer flow path 811 so as to surround the developer flow path 811. The gas opening 813 is provided in the wall portion 814. The lateral transport section 810 is provided with a cylindrical tubular member 815 through which a developer flow path 811 passes. The developer discharged from the developing device 14 passes through the inside of this tubular member 815 and heads toward the depth direction conveying section 841. In addition, the gas discharged from the developing device 14 also passes through the inside of this tubular member 815. The gas opening 813 is provided in the tubular member 815. The gas opening 813 connects the inner space of the tubular member 815 with the outer space.

[0204] The tubular member 815 is provided so as to extend in a direction intersecting the vertical direction. More specifically, the tubular member 815 is provided so as to extend in the horizontal direction. The gas opening 813 is provided in a portion of the tubular member 815 that is positioned above the axial center 815G of the tubular member 815. In other words, the gas opening 813 is provided in a portion of the wall portion 814 positioned around the developer flow path 811, which is positioned above the axis center 815G. Although not shown in FIG. 29, each of the gas openings 813 is provided with a filter 506 in the same manner as above.

[0205] A plurality of gas openings 813 are provided. As the gas openings 813, a first gas opening 813A to a fifth gas opening 813E are provided. The first gas opening 813A is located at the most upstream side in the direction of developer movement in the developer flow path 811. The fifth gas opening 813E is located at the most downstream side in the direction of developer movement in the developer flow path 811. The multiple gas openings 813 are provided at different positions in the extension direction of the developer flow path 811. Furthermore, as described above, each of the gas openings 813 is provided in the wall portion 814 that forms the developer flow path 811.

[0206] The gas opening 813 is provided on the upstream side in the moving direction of the developer from the middle position in the extending direction of the developer flow path 811. The developer flow path 811 starts at a point indicated by reference numeral 28A in FIG. 28 and extends to a point indicated by reference numeral 28B. FIG. 28 shows the intermediate position 28C in the direction in which the developer flow path 811 extends. In this embodiment, the gas opening 813 is provided upstream of the intermediate position 28C in the developer movement direction.

[0207] More specifically, the fifth gas opening 813E (see FIG. 29) located on the most downstream side is provided upstream of the intermediate position 28C. When the gas opening 813 is provided upstream of the intermediate position 28C, the pressure of the gas increases when the gas reaches the gas opening 813. Compared to when the gas opening 813 is provided downstream of the intermediate position 28C, the pressure of the gas increases when the gas reaches the gas opening 813. In this case, the gas is discharged from the gas opening 813 more efficiently.

[0208] 29 is provided in a tubular member 815. The multiple gas openings 813 are provided such that their positions in the extension direction of the tubular member 815 are shifted from one another. As described above, the transport device 800 is provided with the developer flow path 811 through which the developer discharged from the developing device 14 passes. The gas that flows from the developing device 14 to the transport device 800 moves through this developer flow path 811. Then, this gas is discharged from the gas opening 813.

[0209] As described above, the wall portion 814 for forming the developer flow path 811 is provided with the inlet portion 93. The gas from the developing device 14 passes through this inlet portion 93 and enters the developer flow path 811. A first inlet portion 93A to a fifth inlet portion 93E are provided as the inlet portion 93. The inlet portions 93 are provided in a shape corresponding to each of the plurality of developing devices 14 provided. The multiple inlet portions 93 are provided at different positions in the extension direction of the developer flow path 811. In other words, the multiple inlet portions 93 are provided at different positions in the extension direction of the tubular member 815.

[0210] The first inlet 93A is located at the most upstream side in the direction of movement of the developer in the developer flow path 811. The fifth inlet 93E is located at the most downstream side in the direction of movement of the developer in the developer flow path 811. In this embodiment, a drum inlet portion 98X is also provided in the wall portion 814 that forms the developer flow path 811. A plurality of drum inlet portions 98X are provided. The drum inlet portions 98X are provided at different positions in the extension direction of the developer flow path 811. In this embodiment, the developer is removed from the photosensitive drum 11 by the drum cleaner 17 shown in Fig. 1. This developer is also supplied to the developer flow path 811 through the drum inlet portion 98X.

[0211] In this embodiment, a gas opening 813 is provided downstream of the inlet portion 93 in the developer movement direction in the developer flow path 811. Specifically, a second gas opening 813B is provided downstream of the first inlet portion 93A. A third gas opening 813C is provided downstream of the second inlet portion 93B. A fourth gas opening 813D is provided downstream of the third inlet portion 93C. A fifth gas opening 813E is provided downstream of the fourth inlet portion 93D.

[0212] When the gas opening 813 is provided downstream of the inlet portion 93 as in this embodiment, backflow of the developer is less likely to occur. Here, for example, it is assumed that there is only one inlet portion 93 and one gas opening 813. Furthermore, it is assumed that the gas opening 813 is provided upstream of the inlet portion 93. In this case, the gas that has entered the developer flow path 811 through the inlet portion 93 flows toward the upstream side in the moving direction of the developer.

[0213] In this case, there is a risk that the developer will move in the opposite direction to the intended transport direction, i.e., a backflow of the developer may occur due to gas flowing upstream in the developer movement direction. In contrast to this, when the gas opening 813 is provided downstream of the inlet portion 93 as in this embodiment, this backflow is less likely to occur.

[0214] Each of the inlets 93 is a common inlet 93 that is used for both the developer and the gas. Developer and gas are discharged from each of the developing devices 14. The developer and gas enter the developer flow path 811 through a common inlet portion 93 provided for each of the developing devices 14.

[0215] As shown in FIG. 2, the developing device 14 is provided with a discharge path 249 on an extension line of the one-way movement path 191. In this embodiment, the developer in the developing device 14 moves to the outside of the developing device 14 through this discharge path 249. In this way, the developer is discharged from the developing device 14. In this embodiment, part of the developer that has moved up the upward movement path 196 heads toward the discharge path 249. As a result, part of the developer in the developing device 14 is discharged from the developing device 14.

[0216] In this embodiment, a discharge transport member 412 is provided in addition to the one-way transport member 410 . The discharge conveying member 412 is provided with a spiral protrusion 479, similar to the one-way conveying member 410. In this embodiment, the direction of rotation of the protrusion 479 provided on the one-way transport member 410 and the direction of rotation of the protrusion 479 provided on the discharge transport member 412 are opposite to each other. As a result, the developer that has entered the discharge path 249 flows in the direction opposite to the side where the one-way transport member 410 is provided. As a result, a portion of the developer is discharged from the developing device 14.

[0217] In this embodiment, part of the gas inside the developing device 14 passes through this exhaust path 249 and moves to the outside of the developing device 14. In this way, the gas is exhausted from the developing device 14. As described above, part of the gas in the developing device 14 flows toward the supply device 70 through the first inlet 151 shown in FIG. Another part of the gas in the developing device 14 flows through the exhaust path 249 toward the transport device 800 .

[0218] The transport device 800 will be further described with reference to FIG. In this configuration example, a gas opening 813 is provided between two inlet portions 93 that are adjacent to each other in the direction in which the developer flow path 811 extends. Specifically, a second gas opening 813B is provided between the first inlet portion 93A and the second inlet portion 93B. A third gas opening 813C is provided between the second inlet portion 93B and the third inlet portion 93C. A fourth gas opening 813D is provided between the third inlet portion 93C and the fourth inlet portion 93D. A fifth gas opening 813E is provided between the fourth inlet portion 93D and the fifth inlet portion 93E.

[0219] In this embodiment, a gas opening 813 is provided for each of the multiple sets of two inlet portions 93. The gas opening 813 provided between the two inlet portions 93 is provided for each of the multiple sets of two inlet portions 93. There are a plurality of pairs of adjacent inlet portions 93. The gas opening 813 is provided for each of the two inlet portions 93 in a shape corresponding to the two inlet portions 93.

[0220] It should be noted that the "gas opening 813 provided between the two inlet portions 93" is not limited to a mode in which the gas opening 813 is positioned on a straight line connecting the two inlet portions 93. Even if the gas opening 813 is located at a position that is off the line connecting the two inlet portions 93, it still falls under the category of "a gas opening 813 provided between the two inlet portions 93." Here, of the two inlets 93, the inlet 93 located on the upstream side is referred to as the upstream inlet 93. The inlet 93 located on the downstream side is referred to as the downstream inlet 93. If the following conditions 1 and 2 are met, it corresponds to "a gas opening 813 provided between two inlet portions 93." Condition 1: The gas opening 813 is located downstream of the upstream inlet portion 93. Condition 2: The gas opening 813 is located upstream of the downstream inlet portion 93.

[0221] In this embodiment, the developer discharged from each of the multiple developing devices 14 moves through the inside of a common tubular member 815. In addition, the gas discharged from each of the multiple developing devices 14 also moves through the common tubular member 815. Here, among the multiple inlets 93, the inlet 93 located at the middle position is assumed. In this embodiment, the gas opening 813 is provided downstream in the developer movement direction from the inlet portion 93 located at this intermediate position.

[0222] The "inlet portion 93 located at the intermediate position" refers to the inlet portion 93 located at the intermediate position in the extension direction of the tubular member 815. When the number of inlets 93 is an even number, the "inlet 93 located at the intermediate position" refers to the inlet 93 located on the downstream side. In this case, the "inlet 93 located at the intermediate position" refers to the inlet 93 located on the downstream side of the two inlet parts 93 located at the intermediate positions.

[0223] In this embodiment, the inlet portion 93 located at the intermediate position is a third inlet portion 93C. In this embodiment, a fourth gas opening 813D and a fifth gas opening 813E are provided downstream of the third inlet portion 93C in the developer movement direction.

[0224] When the gas opening 813 is provided only upstream of the inlet portion 93 located at the intermediate position, the area where the gas flows back is expanded. Compared to when the gas opening 813 is provided downstream of the inlet portion 93 located at the intermediate position, the area where the gas flows back is expanded. As in this embodiment, when the gas opening 813 is provided downstream of the inlet portion 93 located at the intermediate position, the area where the gas flows back becomes smaller. Alternatively, depending on the position of the gas opening 813, the backflow of gas does not occur.

[0225] In this embodiment, a plurality of gas openings 813 are provided downstream of the inlet portion 93 located at the intermediate position. Specifically, as described above, the fourth gas opening 813D and the fifth gas opening 813E are provided downstream of the third inlet portion 93C. In this embodiment, a gas opening 813 is also provided upstream of the third inlet portion 93C, which is the inlet portion 93 located at the intermediate position. Specifically, a first gas opening 813A to a third gas opening 813C are provided upstream of the third inlet portion 93C. In this embodiment, a plurality of gas openings 813 are also provided upstream of the third inlet portion 93C.

[0226] The gas opening 813 may be provided at a location other than the lateral conveying section 810 . Specifically, for example, the gas opening 813 may be provided in the depth direction transport section 841 or the up-down direction transport section 842 shown in FIG. The gas opening 813 may also be provided in the waste storage container 850. In this case, the waste storage container 850 will be provided with a filter 506 located at the location where the gas opening 813 is provided. If the gas opening 813 is provided in the waste container 850, as described above, the filter 506 can be replaced when the waste container 850 is replaced.

[0227] The gas opening 813 may also be provided in a member of the transport device 800 that is connected to the developing device 14 . 29, in this embodiment, a connecting member 879 is provided to be connected to the developing device 14. A plurality of connecting members 879 are provided in a shape corresponding to the plurality of developing devices 14 that are provided. A gas opening 813 may be provided in each of the plurality of connection members 879 .

[0228] (Addendum) (((1))) an image carrier; a developing device that deposits a developer onto the image carrier; a supply device for supplying developer to the developing device, the supply device including: a developer flow path extending in a direction intersecting the vertical direction and through which the developer passes; and an opening disposed at a position away from directly above the developer flow path and used to exhaust gas that has flowed from the developing device to the supply device; An image forming apparatus comprising: (((2))) The image forming apparatus according to (((1))), wherein the position of the opening in the width direction of the developer flow path is different from the position of the developer flow path in the width direction. (((3))) the gas flowing from the developing device to the supply device flows along the developer flow path and then flows toward a side of the developer flow path, The image forming apparatus according to (((2))), wherein a wall portion is provided along the developer flow path downstream of the developer flow path in the direction of gas flow toward the side. (((4))) a position of the opening in a cross direction that is a direction crossing a vertical direction and a position of the developer flow path in the cross direction are different from each other; The image forming apparatus according to any one of (((1))) to (((3))), wherein a recessed portion recessed downward is provided between the opening and the developer flow path in the intersecting direction. (((5))) a position of the opening and a position of the developer flow path are different in the intersecting direction, and a position of the opening and a position of the developer flow path are different in a width direction of the developer flow path, The image forming apparatus according to (((4))), wherein the recess is provided along the developer flow path. (((6))) new developer is supplied to a predetermined supply location in the developer flow path, and the new developer supplied to the supply location moves to a downstream portion of the developer flow path that is located downstream of the supply location in the developer movement direction, the gas flowing from the developing device to the supply device passes through the developer flow path and heads toward the opening; An image forming apparatus according to any one of (((1))) to (((5))), wherein the cross-sectional area of ​​the developer flow path at the supply point is smaller than the cross-sectional area of ​​the developer flow path at the downstream portion.

[0229] According to the image forming device of (((1))), the amount of developer heading toward the opening used to discharge gas can be reduced compared to when the opening used to discharge gas is located directly above the developer flow path. According to the image forming device of (((2))), the position of the opening in the width direction of the developer flow path coincides with the position of the developer flow path in this width direction, and the amount of developer heading toward the opening used to discharge gas can be reduced compared to when the opening used to discharge gas is provided directly above the developer flow path. According to the image forming device of (((3))), the amount of developer flowing from the developer flow path to the side can be reduced compared to a configuration in which a wall portion is not provided downstream of the developer flow path in the direction of gas flow toward the side of the developer flow path. According to the image forming device of (((4))), the amount of developer flowing from the developer flow path toward the opening can be reduced compared to a configuration in which there is no downward recess between the opening and the developer flow path. According to the image forming device of (((5))), the amount of developer flowing from the developer flow path toward the opening can be reduced compared to when the recess is provided along a direction intersecting the extension direction of the developer flow path. According to the image forming device of (((6))), the amount of developer contained in the gas heading toward the opening can be reduced compared to when the cross-sectional area at the supply location is larger than the cross-sectional area at the downstream portion. [Explanation of symbols]

[0230] 11...photosensitive drum, 14...developing device, 70...supply device, 80...developer container, 80R...gas flow path, 86A...storage section, 93...inlet section, 100...image forming device, 506...filter, 518B...recess, 518H...wall section, 518P...opening, 518R...developer flow path, 631...supplied location, 632...downstream portion, 701...mounted section, 800...conveying device, 811...developer flow path, 813...gas opening, 814...wall section

Claims

1. an image carrier; a developing device that deposits a developer onto the image carrier; a supply device for supplying developer to the developing device, the supply device including: a developer flow path extending in a direction intersecting the vertical direction and through which the developer passes; and an opening disposed at a position away from directly above the developer flow path and used to exhaust gas that has flowed from the developing device to the supply device; An image forming apparatus comprising:

2. 2. The image forming apparatus according to claim 1, wherein a position of the opening in the width direction of the developer flow path is different from a position of the developer flow path in the width direction.

3. the gas flowing from the developing device to the supply device flows along the developer flow path and then flows toward a side of the developer flow path, 3. The image forming apparatus according to claim 2, further comprising a wall portion provided along the developer flow path downstream of the developer flow path in the lateral gas flow direction.

4. a position of the opening in a cross direction that is a direction crossing a vertical direction and a position of the developer flow path in the cross direction are different from each other; 2. The image forming apparatus according to claim 1, wherein a recessed portion recessed downward is provided between the opening and the developer flow path in the crossing direction.

5. a position of the opening and a position of the developer flow path are different in the intersecting direction, and a position of the opening and a position of the developer flow path are different in the width direction of the developer flow path, The image forming apparatus according to claim 4 , wherein the recess is provided along the developer flow path.

6. new developer is supplied to a predetermined supply location in the developer flow path, and the new developer supplied to the supply location moves to a downstream portion of the developer flow path that is located downstream of the supply location in the developer movement direction, the gas flowing from the developing device to the supply device passes through the developer flow path and heads toward the opening; 2. The image forming apparatus according to claim 1, wherein the cross-sectional area of ​​the developer flow path at the supply location is smaller than the cross-sectional area of ​​the developer flow path at the downstream portion.

Images