Alicyclic diamine and alicyclic diamine composition

JP2026029275APending Publication Date: 2026-02-20MITSUBISHI GAS CHEM CO INC
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Patent Information

Application Number
JP2024132108
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-08-08
Publication Date
2026-02-20

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Abstract

To provide a new alicyclic diamine capable of forming a coating film excellent in appearance especially when used as an epoxy resin curing agent. And to provide an alicyclic diamine which can be produced by using a raw material derived from biomass. The present invention also provides an epoxy resin curing agent containing the alicyclic diamine and an alicyclic diamine composition containing the alicyclic diamine.SOLUTION: The alicyclic diamine is represented by general formula (1). (In the formula (1), n1 is 1 to 5, n2 is 1 to 5, - (CH2) n1 - NH2 is bonded to a or b, and - (CH2) n2 - NH2 is bonded to c or d.). ) SELECTED DRAWING: None
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Patent Citations

  • Bisimide compound, bisamic acid compound and method for producing those

    JP2011219539A