electrostatic chuck

JP2026054717APending Publication Date: 2026-03-30TOTO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-09-17
Publication Date
2026-03-30

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  • Figure 2026054717000001_ABST
    Figure 2026054717000001_ABST
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Abstract

We provide an electrostatic chuck that allows for precise temperature control using a heater. [Solution] The electrostatic chuck 10 comprises a dielectric substrate 100 and a heater unit 300 for heating the dielectric substrate 100. In a top view, the heater unit 300 has heating elements 331, which are conductors individually and linearly routed in each of a plurality of regions HA that are separated so as not to overlap each other. The plurality of regions HA include a first region HA1 located at the outermost position and a second region HA2 located at a position closer to the inner circumference than the first region HA1. The line width of the heating elements 331 routed in the first region HA1 is smaller than the line width of the heating elements 331 routed in the second region HA2.
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Citation Information

Patent Citations

  • Ceramic heater; and semiconductor or liquid crystal manufacturing device composed by mounting it

    JP2004296254A

  • Electrostatic chuck device

    JP2011176275A

  • Electrostatic chuck heater

    JP2017152137A

  • Electrostatic chuck

    JP2018170501A

  • Holding device

    JP2019149434A