Substrate processing equipment

Abstract

To provide a substrate processing apparatus that appropriately supplies processing liquid. [Solution] The substrate processing apparatus 1 comprises a front block 3, a cabinet section 4, and a rear block 5. The front block 3 comprises a chamber 6. The rear block 5 comprises a chamber 8. The cabinet section 4 comprises a processing liquid container 71a, piping 72Fa, and a liquid supply section 79Fa. The processing liquid container 71a stores the processing liquid Ra. Piping 72Fa connects the processing liquid container 71a and the chamber 6. The liquid supply section 79Fa is provided on piping 72Fa. The front block 3, cabinet section 4, and rear block 5 are arranged in this order in the front-to-back direction X.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus for processing a substrate. The substrate is, for example, any one of a semiconductor wafer, a substrate for a liquid crystal display, a substrate for an organic EL (Electroluminescence), a substrate for a FPD (Flat Panel Display), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, a substrate for a photomask, and a substrate for a solar cell.

Background Art

[0002] Patent Document 1 discloses a substrate processing apparatus. Hereinafter, the reference numerals described in Patent Document 1 will be denoted in parentheses. The substrate processing apparatus (100) includes an index block (10), a processing block (20), and a processing block (30). The index block (10), the processing block (20), and the processing block (30) are arranged in the first direction (X). The processing block (30) includes a coating processing unit (SC).

[0003] The substrate processing apparatus (100) includes a cabinet (60) and a processing liquid supply mechanism (90). The cabinet (60) is installed in the index block (10). The cabinet (60) includes a bottle (70). The bottle (70) stores the processing liquid. The processing liquid supply mechanism (90) supplies the processing liquid from the bottle (70) to the coating processing unit (SC). The processing liquid supply mechanism (90) extends from the index block (10) to the processing block (20) and further from the processing block (20) to the processing block (30).

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] Proper supply of the processing solution is crucial for the quality of substrate processing.

[0006] This invention has been made in view of these circumstances, and aims to provide a substrate processing apparatus that appropriately supplies processing liquid. [Means for solving the problem]

[0007] To achieve this objective, the present invention has the following configuration. That is, the present invention is a substrate processing apparatus comprising a first block, a cabinet section, and a second block, wherein the first block, the cabinet section, and the second block are arranged in this order in a first direction, the first direction being horizontal, the first block comprises a first chamber, the second block comprises a second chamber, and the cabinet section comprises a first processing liquid container for storing processing liquid, a first pipe connecting the first processing liquid container and the first chamber, and a first liquid supply section provided on the first pipe.

[0008] The substrate processing apparatus comprises a first block, a cabinet section, and a second block. The first block comprises a first chamber. The second block comprises a second chamber. The cabinet section comprises a first processing liquid container, a first pipe, and a first liquid supply section. The first processing liquid container stores the processing liquid. The first pipe connects the first processing liquid container and the first chamber. The first liquid supply section is provided on the first pipe.

[0009] Here, the first block, the cabinet section, and the second block are arranged in this order in the first direction. The first direction is horizontal. Therefore, the cabinet section is close to the first block. Thus, it is easy to shorten the first piping. Consequently, the first liquid supply section appropriately supplies the processing liquid to the first chamber.

[0010] In summary, this substrate processing apparatus ensures that the processing solution is supplied appropriately.

[0011] In this substrate processing apparatus, it is preferable that the cabinet section comprises a second pipe connecting the first processing liquid container and the second chamber, and a second liquid supply section provided on the second pipe. The cabinet section comprises the second pipe and the second liquid supply section. The second pipe connects the first processing liquid container and the second chamber. The second liquid supply section is provided on the second pipe. As described above, the first block, the cabinet section, and the second block are arranged in this order in the first direction. Therefore, the cabinet section is close to the second block. Thus, it is easy to shorten the second pipe. Consequently, the second liquid supply section appropriately supplies the processing liquid to the second chamber.

[0012] In this substrate processing apparatus, it is preferable that the cabinet section is adjacent to the first chamber, and that the cabinet section is adjacent to the second chamber. The cabinet section is adjacent to the first chamber. Therefore, it is even easier to shorten the first piping. Consequently, the first liquid supply section supplies the processing liquid to the first chamber more appropriately.

[0013] The cabinet section is adjacent to the second chamber. Therefore, shortening the second piping is even easier. Consequently, the second liquid supply section can supply the processing liquid to the second chamber more effectively.

[0014] In this substrate processing apparatus, it is preferable that the second pipe has the same length as the first pipe. Therefore, it is easy to make the quality of substrate processing in the second chamber equal to the quality of substrate processing in the first chamber.

[0015] In this substrate processing apparatus, the first piping has a downstream section from the first liquid supply section to the first chamber, and the second piping has a downstream section from the second liquid supply section to the second chamber, and it is preferable that the downstream section of the second piping has the same length as the downstream section of the first piping. Therefore, it is easy to make the quality of substrate processing in the second chamber equal to the quality of substrate processing in the first chamber.

[0016] In this substrate processing apparatus, it is preferable that the second chamber be positioned at the same height as the first chamber. Therefore, it is easy to have the second piping be the same length as the first piping.

[0017] In this substrate processing apparatus, it is preferable that the second liquid supply unit is positioned at the same height as the first liquid supply unit. Therefore, it is easy to have the second piping be the same length as the first piping.

[0018] In this substrate processing apparatus, the first liquid supply unit is equipped with a first pump provided on the first piping, and the second liquid supply unit is equipped with a third pump provided on the second piping, and it is preferable that the third pump is positioned at the same height as the first pump. The first liquid supply unit is equipped with a first pump. The first pump is provided on the first piping. Therefore, it is easy for the first liquid supply unit to supply processing liquid from the first processing liquid container to the first chamber.

[0019] The second liquid supply unit is equipped with a third pump. The third pump is mounted on the second piping. Therefore, it is easy for the second liquid supply unit to supply the processing liquid from the first processing liquid container to the second chamber.

[0020] The third pump is positioned at the same height as the first pump. Therefore, it is easy to position the second liquid delivery unit at the same height as the first liquid delivery unit.

[0021] In this substrate processing apparatus, the first liquid supply unit is equipped with a second pump provided on the first piping, and the second pump is positioned downstream of the first pump. The second liquid supply unit is equipped with a fourth pump provided on the second piping, and the fourth pump is positioned downstream of the fourth pump. Preferably, the fourth pump is positioned at the same height as the second pump. The first liquid supply unit is equipped with a second pump. The second pump is provided on the first piping. The second pump is positioned downstream of the first pump. Therefore, it is easy for the first liquid supply unit to supply processing liquid from the first processing liquid container to the first chamber.

[0022] The second liquid delivery unit includes a fourth pump. The fourth pump is provided on the second pipe. The fourth pump is arranged downstream of the third pump. Therefore, it is easy for the second liquid delivery unit to supply the processing liquid from the first processing liquid container to the second chamber.

[0023] The fourth pump is arranged at the same height position as the second pump. Therefore, it is easy to arrange the second liquid delivery unit at the same height position as the first liquid delivery unit.

[0024] In this substrate processing apparatus, it is preferable that the second pump is closer to the first block than the center of the cabinet portion in the first direction, and the fourth pump is closer to the second block than the center of the cabinet portion in the first direction. The second pump is closer to the first block than the center of the cabinet portion in the first direction. Therefore, the distance in the first direction between the second pump and the first chamber is relatively short. Thus, it is easy to shorten the length of the portion of the first pipe between the second pump and the first chamber. Therefore, the first liquid delivery unit appropriately supplies the processing liquid to the first chamber.

[0025] The fourth pump is closer to the second block than the center of the cabinet portion in the first direction. Therefore, the distance in the first direction between the fourth pump and the second chamber is relatively short. Thus, it is easy to shorten the length of the portion of the second pipe between the fourth pump and the second chamber. Therefore, the second liquid delivery unit appropriately supplies the processing liquid to the second chamber.

[0026] In this substrate processing apparatus, it is preferable that the first pipe extends from the cabinet section to the first block, and the first pipe includes a first inner portion disposed within the cabinet section, a first outer portion disposed within the first block, and a first joint connecting the first inner portion and the first outer portion. The second pipe extends from the cabinet section to the second block, and the second pipe preferably includes a second inner portion disposed within the cabinet section, a second outer portion disposed within the second block, and a second joint connecting the second inner portion and the second outer portion. The first pipe extends from the cabinet section to the first block. The first pipe includes a first inner portion, a first outer portion, and a first joint. The first inner portion is disposed within the cabinet section. The first outer portion is disposed within the first block. The first joint connects the first inner portion and the first outer portion. Therefore, it is easy to separate the first pipe at the boundary between the cabinet section and the first block.

[0027] The second pipe extends from the cabinet section to the second block. The second pipe includes a second inner portion, a second outer portion, and a second joint. The second inner portion is disposed within the cabinet section. The second outer portion is disposed within the second block. The second joint connects the second inner portion and the second outer portion. Therefore, it is easy to separate the second pipe at the boundary between the cabinet section and the second block.

[0028] In this substrate processing apparatus, it is preferable that the first pipe does not reach the second block and the second pipe does not reach the first block. The first pipe does not reach the second block. Therefore, it is easy to shorten the first pipe. Further, the number of joints of the first pipe is small.

[0029] The second pipe does not reach the first block. Therefore, it is easy to shorten the second pipe. Further, the number of joints of the second pipe is small.

[0030] In this substrate processing apparatus, it is preferable that the cabinet section is adjacent to the first chamber. Therefore, shortening the first piping becomes even easier. Consequently, the first liquid supply section supplies the processing liquid to the first chamber more appropriately.

[0031] In this substrate processing apparatus, it is preferable that the first liquid supply unit includes a first pump provided on the first piping. Therefore, it is easy for the first liquid supply unit to supply processing liquid from the first processing liquid container to the first chamber.

[0032] In this substrate processing apparatus, it is preferable that the first pump be positioned lower than the first processing liquid container. Therefore, gravity facilitates the flow of the processing liquid from the first processing liquid container to the first pump. Thus, it is easy for the processing liquid to flow from the first processing liquid container to the first pump. For example, it is easy for the first pump to draw the processing liquid from the first processing liquid container.

[0033] In this substrate processing apparatus, it is preferable that the first pump overlaps with the first processing liquid container in a plan view. Therefore, it is easy to reduce the size of the cabinet in a plan view. In other words, it is easy to reduce the footprint of the cabinet.

[0034] In this substrate processing apparatus, the first liquid supply unit is preferably equipped with a second pump located on the first piping, and the second pump is preferably positioned downstream of the first pump. Therefore, it is easy for the first liquid supply unit to supply processing liquid from the first processing liquid container to the first chamber.

[0035] In this substrate processing apparatus, it is preferable that the second pump be closer to the first block than to the center of the cabinet in the first direction. Therefore, the distance between the second pump and the first chamber in the first direction is relatively short. Thus, it is easy to shorten the length of the first piping between the second pump and the first chamber. Consequently, the first liquid supply unit appropriately supplies the processing liquid to the first chamber.

[0036] In this substrate processing apparatus, it is preferable that at least a portion of the second pump is positioned at the same height as at least a portion of the first chamber. Therefore, the vertical distance between the second pump and the first chamber is relatively short. Thus, it is even easier to shorten the length of the first piping between the second pump and the first chamber. Consequently, the first liquid supply unit appropriately supplies the processing liquid to the first chamber.

[0037] In this substrate processing apparatus, the first chamber comprises a first processing unit, the first processing unit comprises a holding part for holding a substrate, and a nozzle for discharging a processing liquid onto the substrate held by the holding part, and the first piping preferably connects the first processing liquid container and the nozzle. The first chamber comprises a first processing unit. The first processing unit comprises a holding part and a nozzle. The holding part holds the substrate. The nozzle discharges a processing liquid onto the substrate held by the holding part. The first piping connects the first processing liquid container and the nozzle. Therefore, it is easy for the first liquid supply unit to supply the processing liquid from the first processing liquid container to the nozzle.

[0038] In this substrate processing apparatus, it is preferable that at least a portion of the second pump is positioned lower than the nozzle. Therefore, the first liquid supply unit appropriately supplies the processing liquid to the nozzle.

[0039] In this substrate processing apparatus, the first chamber preferably comprises a second processing unit, and the second processing unit preferably shares the nozzle of the first processing unit. The chamber comprises the second processing unit. Therefore, the chamber efficiently processes the substrate.

[0040] The second processing unit shares the nozzle of the first processing unit. Therefore, it is easy to make the processing quality of the substrate in the second processing unit equal to the processing quality of the substrate in the first processing unit.

[0041] In this substrate processing apparatus, the first processing unit includes a cup positioned outside the holding portion, the cup having an upper end, and preferably at least a portion of the second pump is positioned lower than the upper end of the cup. The first processing unit includes a cup. The cup is positioned outside the holding portion. The cup has an upper end. At least a portion of the second pump is positioned lower than the upper end of the cup. Therefore, the first liquid supply unit appropriately supplies the processing liquid to the nozzle.

[0042] In this substrate processing apparatus, the cabinet section comprises a second processing liquid container for storing processing liquid, a third pipe connecting the second processing liquid container and the first chamber, and a third liquid supply section provided on the third pipe. The third liquid supply section comprises a fifth pump provided on the third pipe and a sixth pump provided on the third pipe. Preferably, the sixth pump is located downstream of the fifth pump and at the same height as the second pump. The cabinet section comprises a second processing liquid container, a third pipe, and a third liquid supply section. The second processing liquid container stores processing liquid. The third pipe connects the second processing liquid container and the first chamber. The third liquid supply section is provided on the third pipe. The third liquid supply section comprises a fifth pump and a sixth pump. The fifth pump is provided on the third pipe. The sixth pump is provided on the third pipe. The sixth pump is located downstream of the fifth pump. Therefore, it is easy for the third liquid supply unit to supply the processing liquid from the second processing liquid container to the first chamber.

[0043] The second and sixth pumps are positioned at the same height. Therefore, it is easy to improve the quality of substrate processing in the first chamber. For example, it is easy to make the processing quality of substrates using the processing liquid in the second processing liquid container in the first chamber equal to the processing quality of substrates using the processing liquid in the first processing liquid container in the first chamber.

[0044] In this substrate processing apparatus, it is preferable that the second pump and the sixth pump are aligned in a second direction, and that the second direction is horizontal and perpendicular to the first direction. The second pump and the sixth pump are aligned in a second direction. The second direction is horizontal. Therefore, it is easy to position the sixth pump at the same height as the second pump.

[0045] The second direction is perpendicular to the first direction. Therefore, the second pump and the sixth pump are not aligned in the first direction. Thus, it is easy to shorten the length of the cabinet section in the first direction.

[0046] In this substrate processing apparatus, it is preferable to have an indexer section, the indexer section comprising a carrier stage and a transport mechanism, the carrier stage and the transport mechanism being aligned in a second direction, the second direction being horizontal and perpendicular to the first direction. The substrate processing apparatus comprises an indexer section. The indexer section comprises a carrier stage and a transport mechanism. The carrier stage and the transport mechanism are aligned in a second direction. The second direction is horizontal. The second direction is perpendicular to the first direction. Therefore, it is easy to shorten the length of the indexer section in the first direction. Thus, even if the substrate processing apparatus comprises a cabinet section, the length of the substrate processing apparatus in the first direction does not increase significantly.

[0047] In this substrate processing apparatus, it is preferable that the indexer unit, the first block, the cabinet unit, and the second block are arranged in this order in the first direction. Even when the indexer unit, the first block, the cabinet unit, and the second block are arranged in this order in the first direction, the first liquid supply unit will appropriately supply the processing liquid to the first chamber.

[0048] In this substrate processing apparatus, it is preferable that the first block, the cabinet section, the second block, and the indexer section are arranged in this order in the first direction. Even when the first block, the cabinet section, the second block, and the indexer section are arranged in this order in the first direction, the first liquid supply section will appropriately supply the processing liquid to the first chamber.

[0049] In this substrate processing apparatus, it is preferable that the first piping does not extend to the indexer section. Therefore, it is easy to shorten the first piping. Furthermore, the number of joints in the first piping is small.

[0050] In this substrate processing apparatus, a bridge section is provided, the bridge section transports substrates to the first block and the second block, the first block, the bridge section, and the second block are arranged in this order in the first direction, and the cabinet section and the bridge section are arranged in the second direction, which is preferable. The substrate processing apparatus includes a bridge section. The bridge section transports substrates to the first block and the second block. Therefore, it is easy for the first block to process the substrates. It is easy for the second block to process the substrates.

[0051] The first block, the bridge section, and the second block are arranged in this order in the first direction. Therefore, it is easy for the bridge section to transport the substrate to the first block and the second block.

[0052] The cabinet section and the bridge section are aligned in the second direction. Therefore, it is easy to arrange the first block, the bridge section, and the second block in this order in the first direction.

[0053] In this substrate processing apparatus, a slider section is provided, the slider section transports the substrate between the indexer section and the bridge section, and it is preferable that the slider section overlaps with either the first block or the second block in a plan view. The substrate processing apparatus includes a slider section. The slider section transports the substrate between the indexer section and the bridge section. Therefore, the substrate is efficiently transported between the indexer section and the bridge section.

[0054] In a plan view, the slider section overlaps with either the first or second block. Therefore, even when the substrate processing device includes a slider section, the substrate processing device does not become significantly larger in a plan view. In other words, even when the substrate processing device includes a slider section, the footprint of the substrate processing device does not become significantly larger. [Effects of the Invention]

[0055] This substrate processing apparatus ensures that the processing solution is supplied appropriately. [Brief explanation of the drawing]

[0056] [Figure 1] This is a schematic side view of the substrate processing apparatus according to the embodiment. [Figure 2] This is a control block diagram of a substrate processing unit. [Figure 3] This is a plan view of the substrate processing device. [Figure 4] This is a plan view of the substrate processing device. [Figure 5] This is a plan view of the substrate processing device. [Figure 6] This is a first side view of the substrate processing device. [Figure 7] This is a second side view of the substrate processing device. [Figure 8] This is a front view of the indexer section. [Figure 9] This is a front view of the front block. [Figure 10] This is a front view of the bridge section. [Figure 11] This is a front view of the rear block. [Figure 12] This is a detailed front view of the indexer section. [Figure 13] This is a detailed plan view of the slider section. [Figure 14] This is a piping diagram between the cabinet and the chamber. [Figure 15] This is a detailed piping diagram between the cabinet and the chamber. [Figure 16] This is a detailed plan view of a portion of the bridge section. [Figure 17] This is a detailed plan view of the cabinet section. [Figure 18] This is a detailed side view of the cabinet section. [Figure 19] This is a schematic side view of a substrate processing device, illustrating its operation. [Figure 20] This diagram schematically shows the transport path for the substrate. [Figure 21] This is a schematic side view illustrating an example of the operation of a substrate processing device. [Figure 22] This is a schematic side view of a modified embodiment of a substrate processing apparatus. [Figure 23] This is a schematic side view of a modified embodiment of a substrate processing apparatus. [Modes for carrying out the invention]

[0057] The substrate processing apparatus of the present invention will be described below with reference to the drawings.

[0058] <1. Overview of substrate processing equipment> Figure 1 is a schematic side view of the substrate processing apparatus 1 of the embodiment. The substrate processing apparatus 1 processes the substrate W.

[0059] The substrate W is, for example, a semiconductor wafer, a substrate for liquid crystal displays, an organic electroluminescence (EL) substrate, a flat panel display (FPD) substrate, an optical display substrate, a magnetic disk substrate, a magneto-optical disk substrate, a photomask substrate, or a solar cell substrate. The substrate W has a thin, flat shape. The substrate W has a roughly circular shape in plan view.

[0060] The substrate processing apparatus 1 comprises an indexer unit 2, a front block 3, a cabinet unit 4, and a rear block 5. The indexer unit 2, front block 3, cabinet unit 4, and rear block 5 are arranged in this order in the front-to-back direction X.

[0061] The front-to-back direction X is horizontal. In this specification, the direction from the cabinet section 4 toward the front block 3 within the front-to-back direction X is referred to as "front". The direction opposite to the front is referred to as "rear". The width direction Y is horizontal. The width direction Y is perpendicular to the front-to-back direction X. One direction in the width direction Y is referred to as the "first side". The direction opposite to the first side is referred to as the "second side". The vertical direction Z is perpendicular to the front-to-back direction X. The vertical direction Z is perpendicular to the width direction Y. In each figure, FRONT, REAR, FIRST SIDE, SECOND SIDE, UP, and DOWN are shown as appropriate for reference.

[0062] The front-to-back direction X is an example of the first direction of the present invention. The width direction Y is an example of the second direction of the present invention.

[0063] Cabinet section 4 is positioned behind the front block 3. Cabinet section 4 is positioned in front of the rear block 5. Cabinet section 4 is positioned between the front block 3 and the rear block 5.

[0064] The cabinet section 4 is connected to the front block 3. The cabinet section 4 is detachable from the front block 3.

[0065] The cabinet section 4 is connected to the rear block 5. The cabinet section 4 is detachable from the rear block 5.

[0066] The front block 3 includes a chamber 6. The rear block 5 includes a chamber 8. Chamber 8 is positioned at the same height as chamber 6.

[0067] Chamber 6, cabinet section 4, and chamber 8 are aligned in the front-to-back direction X. Cabinet section 4 is adjacent to chamber 6. Cabinet section 4 is adjacent to chamber 8.

[0068] Chambers 6 and 8 process the substrate W, respectively. For example, chamber 6 performs a liquid treatment on the substrate W. For example, chamber 8 performs a liquid treatment on the substrate W.

[0069] "Liquid treatment" is a process performed on a substrate W by supplying a treatment liquid to the substrate W. "Liquid treatment" includes, for example, at least one of coating, developing, etching, and cleaning. "Treatment liquid" includes, for example, at least one of a coating material, a developer, an etching solution, and a cleaning solution.

[0070] The "coating process" involves forming a coating film on the substrate W. The "coating film" is formed by applying a coating material to the substrate W. The "coating film" is, for example, at least one of a base layer film, an intermediate layer film, and an upper layer film. The "coating film" is, for example, at least one of a resist film, an anti-reflective film, an SOG (Spin on Glass) film, and a protective film.

[0071] The processing performed by chamber 8 on the substrate W is the same as the processing performed by chamber 6 on the substrate W. For example, chambers 6 and 8 each supply resist solution to the substrate W and form a resist film on the substrate W.

[0072] Chamber 6 includes a processing unit 20. The processing unit 20 processes one substrate W at a time.

[0073] The processing unit 20 comprises a holding part 41, a nozzle 42, and a cup 43. The holding part 41 holds the substrate W. The holding part 41, for example, adsorbs the back surface of the substrate W. The holding part 41 holds only the center of the back surface of the substrate W by vacuum suction force. The holding part 41 is, for example, a vacuum chuck. The substrate W held by the holding part 41 is in a horizontal position. The holding part 41 is configured to allow the substrate W to rotate. The nozzle 42 discharges processing liquid onto the substrate W held by the holding part 41. The cup 43 is positioned outside the holding part 41. The cup 43 surrounds the holding part 41. The cup 43 has a cylindrical shape. The cup 43 receives liquid splashed from the substrate W.

[0074] Chamber 8 comprises a processing unit 30. Processing unit 30 has the same structure as processing unit 20. In this specification, when different elements have a common structure, a common reference numeral is used for those elements, and detailed explanation is omitted. For example, processing unit 30 comprises a holding part 41, a nozzle 42, and a cup 43.

[0075] The cabinet section 4 includes a processing liquid container 71a. The processing liquid container 71a stores the processing liquid Ra. The processing liquid container 71a is, for example, at least one of a gallon bottle, a tank, and a bottle. After the processing liquid container 71a is empty, it is not refilled with processing liquid Ra. After the processing liquid container 71a is empty, it is removed from the cabinet section 4. The empty processing liquid container 71a is replaced with another processing liquid container 71a that stores processing liquid Ra.

[0076] Cabinet section 4 is equipped with piping 72Fa. Piping 72Fa connects the processing liquid container 71a and the chamber 6. Piping 72Fa extends from the processing liquid container 71a to the chamber 6. Piping 72Fa connects the processing liquid container 71a to the nozzle 42 of the chamber 6. Piping 72Fa extends from the processing liquid container 71a to the nozzle 42 of the chamber 6.

[0077] Cabinet section 4 is equipped with a liquid supply section 79Fa. The liquid supply section 79Fa is provided on the piping 72Fa. The liquid supply section 79Fa delivers the processing liquid Ra from the processing liquid container 71a to the chamber 6. The liquid supply section 79Fa delivers the processing liquid Ra from the processing liquid container 71a to the nozzle 42 of the chamber 6.

[0078] Cabinet section 4 is equipped with piping 72Ra. Piping 72Ra connects the processing liquid container 71a and the chamber 8. Piping 72Ra extends from the processing liquid container 71a to the chamber 8. Piping 72Ra connects the processing liquid container 71a and the nozzle 42 of the chamber 8. Piping 72Ra extends from the processing liquid container 71a to the nozzle 42 of the chamber 8.

[0079] The cabinet section 4 is equipped with a liquid supply section 79Ra. The liquid supply section 79Ra is provided on the piping 72Ra. The liquid supply section 79Ra delivers the processing liquid Ra from the processing liquid container 71a to the chamber 8. The liquid supply section 79Ra delivers the processing liquid Ra from the processing liquid container 71a to the nozzle 42 of the chamber 8.

[0080] Pipe 72Ra has the same length as pipe 72Fa.

[0081] The piping 72Fa has an upstream section 73Fa. The upstream section 73Fa connects the processing liquid container 71a and the liquid supply section 79Fa. The upstream section 73Fa extends from the processing liquid container 71a to the liquid supply section 79Fa.

[0082] The piping 72Ra has an upstream section 73Ra. The upstream section 73Ra connects the processing liquid container 71a and the liquid delivery section 79Ra. The upstream section 73Ra extends from the processing liquid container 71a to the liquid delivery section 79Ra.

[0083] The upstream section 73Ra has the same length as the upstream section 73Fa.

[0084] The piping 72Fa has a downstream section 75Fa. The downstream section 75Fa connects the fluid delivery section 79Fa to the chamber 6. The downstream section 75Fa extends from the fluid delivery section 79Fa to the chamber 6. For example, the downstream section 75Fa connects the fluid delivery section 79Fa to the nozzle 42 of the chamber 6. The downstream section 75Fa extends from the fluid delivery section 79Fa to the nozzle 42 of the chamber 6.

[0085] The piping 72Ra has a downstream section 75Ra. The downstream section 75Ra connects the fluid delivery section 79Ra to the chamber 8. The downstream section 75Ra extends from the fluid delivery section 79Ra to the chamber 8. For example, the downstream section 75Ra connects the fluid delivery section 79Ra to the nozzle 42 of the chamber 8. The downstream section 75Ra extends from the fluid delivery section 79Ra to the nozzle 42 of the chamber 8.

[0086] The downstream section 75Ra has the same length as the downstream section 75Fa.

[0087] Piping 72Fa extends to the front block 3. Piping 72Fa extends from the cabinet section 4 to the front block 3.

[0088] Piping 72Fa crosses boundary Q1. Boundary Q1 is the boundary between cabinet section 4 and front block 3.

[0089] The piping 72Fa has an internal portion 76Fa and an external portion 77Fa. The internal portion 76Fa is located inside the cabinet 4. The external portion 77Fa is located inside the front block 3.

[0090] The piping 72Fa is equipped with one fitting 78Fa. Fitting 78Fa is located on boundary Q1. Fitting 78Fa connects the inner portion 76Fa and the outer portion 77Fa. Fitting 78Fa connects and disconnects the inner portion 76Fa and the outer portion 77Fa. Fitting 78Fa is located downstream of the fluid delivery section 79Fa.

[0091] "Downstream" means downstream in the flow direction of the processing liquid Ra. The flow direction of the processing liquid Ra is, for example, the direction from the processing liquid container 71a towards the chamber 6. The flow direction of the processing liquid Ra is, for example, the direction from the processing liquid container 71a towards the chamber 8. Similarly, "upstream" means upstream in the flow direction of the processing liquid Ra. "Upstream" is the opposite direction to "downstream".

[0092] Piping 72Fa does not extend to the rear block 5. Piping 72Fa does not extend from the cabinet section 4 to the rear block 5.

[0093] Piping 72Fa does not cross boundary Q2. Boundary Q2 is the boundary between cabinet section 4 and rear block 5.

[0094] Piping 72Fa does not extend to the indexer section 2. Piping 72Fa does not extend from the cabinet section 4 to the indexer section 2.

[0095] Piping 72Fa does not cross boundary Q3. Boundary Q3 is the boundary between indexer section 2 and front block 3.

[0096] Pipe 72Fa has one fitting 78Fa.

[0097] The piping 72Ra extends to the rear block 5. The piping 72Ra extends from the cabinet section 4 to the rear block 5.

[0098] Pipe 72Ra crosses boundary Q2.

[0099] The piping 72Ra has an inner portion 76Ra and an outer portion 77Ra. The inner portion 76Ra is located inside the cabinet portion 4. The outer portion 77Ra is located inside the rear block 5.

[0100] The piping 72Ra is equipped with one fitting 78Ra. Fitting 78Ra is located on boundary Q2. Fitting 78Ra connects the inner portion 76Ra and the outer portion 77Ra. Fitting 78Ra connects and disconnects the inner portion 76Ra and the outer portion 77Ra. Fitting 78Ra is located downstream of the fluid delivery section 79Ra.

[0101] Piping 72Ra does not extend to the front block 3. Piping 72Ra does not extend from the cabinet section 4 to the front block 3.

[0102] Pipe 72Ra does not cross boundary Q1.

[0103] The piping 72Ra does not extend to the indexer section 2. The piping 72Ra does not extend from the cabinet section 4 to the indexer section 2.

[0104] Piping 72Ra does not cross boundary Q3.

[0105] Pipe 72Ra has one fitting 78Ra.

[0106] The liquid delivery unit 79Ra is positioned at the same height as the liquid delivery unit 79Fa.

[0107] The entire liquid supply unit 79Fa is located in the cabinet unit 4. The liquid supply unit 79Fa does not extend to the front block 3. The liquid supply unit 79Fa does not extend to the rear block 5. The liquid supply unit 79Fa does not extend to the indexer unit 2.

[0108] The entire fluid supply unit 79Ra is located in the cabinet unit 4. The fluid supply unit 79Ra does not extend to the front block 3. The fluid supply unit 79Ra does not extend to the rear block 5. The fluid supply unit 79Ra does not extend to the indexer unit 2.

[0109] Front block 3 is an example of the first block of the present invention. Chamber 6 is an example of the first chamber of the present invention. Processing unit 20 is an example of the first processing unit of the present invention.

[0110] The processing liquid container 71a is an example of the first processing liquid container of the present invention.

[0111] Rear block 5 is an example of a second block of the present invention. Chamber 8 is an example of a second chamber of the present invention.

[0112] Figure 2 is a control block diagram of the substrate processing apparatus 1. The substrate processing apparatus 1 includes a control unit 10. The control unit 10 controls the indexer unit 2, the front block 3, the cabinet unit 4, and the rear block 5. Specifically, the control unit 10 controls the chamber 6. The control unit 10 controls the processing unit 20. The control unit 10 controls the liquid supply units 79Fa and 79Ra. The control unit 10 controls the chamber 8. The control unit 10 controls the processing unit 30.

[0113] The control unit 10 is implemented by, for example, a central processing unit (CPU), random access memory (RAM), and a storage medium. The central processing unit performs arithmetic processing. The random access memory functions as a workspace for arithmetic processing. The storage medium is, for example, a hard disk. The control unit 10 has various types of information pre-stored in the storage medium. The information held by the control unit 10 includes, for example, transport information and processing information. The transport information defines the procedure for transporting the substrate W. The processing information defines the procedure for processing the substrate W. The processing information is also called a processing recipe.

[0114] <2. Indexer Section 2> Figures 3, 4, and 5 are plan views of the substrate processing apparatus 1, respectively. Figure 3 shows the lower part of the substrate processing apparatus 1 in the vertical Z direction. Figure 4 shows the middle part of the substrate processing apparatus 1 in the vertical Z direction. Figure 5 shows the upper part of the substrate processing apparatus 1 in the vertical Z direction. Figure 6 is a first side view of the substrate processing apparatus 1. Figure 7 is a second side view of the substrate processing apparatus 1. Figure 8 is a front view of the indexer section 2. Figure 9 is a front view of the front block 3. Figure 10 is a front view of the bridge section 60. Figure 11 is a front view of the rear block 5.

[0115] The indexer unit 2 comprises multiple (for example, four) carrier stages 11. One carrier C is placed on each carrier stage 11.

[0116] Carrier C accommodates multiple substrates W. Carrier C is, for example, a FOUP (Front Opening Unified Pod), SMIF (Standard Mechanical Interface), or OC (Open Cassette). Carrier C is transported to the substrate processing apparatus 1 by a carrier transport mechanism (not shown).

[0117] The indexer unit 2 includes a transport mechanism 12. The transport mechanism 12 transports the substrate W to the carrier C. The transport mechanism 12 transports the substrate W between the carrier C and the slider unit 50.

[0118] The transport mechanism 12 comprises a support column 13, a lifting section 14, a rotating section 15, and a support section 16. In Figure 8, for convenience, the support column 13 is shown with a dashed line. The support column 13 is fixedly installed. The support column 13 extends in the vertical direction Z. The lifting section 14 is supported by the support column 13. The lifting section 14 moves in the vertical direction Z relative to the support column 13. The rotating section 15 is supported by the lifting section 14. The rotating section 15 rotates around the rotation axis A15 relative to the lifting section 14. The rotation axis A15 is shown in Figure 8. The rotation axis A15 extends in the vertical direction Z. The rotation axis A15 passes through, for example, the rotating section 15. The support section 16 is supported by the rotating section 15. The support section 16 moves forward and backward relative to the rotating section 15. More specifically, the support portion 16 reciprocates in one direction determined by the orientation of the rotating portion 15. The "one direction determined by the orientation of the rotating portion 15" is the radial direction of the rotation axis A15. The radial direction of the rotation axis A15 is horizontal. The support portion 16 supports the substrate W.

[0119] The support section 16 supports multiple substrates W at once. The transport mechanism 12 transports multiple substrates W at once.

[0120] The support unit 16 comprises a multi-joint arm 17 and a plurality of hands 18. The multi-joint arm 17 is directly supported by the rotating unit 15. The hands 18 are directly supported by the multi-joint arm 17. The multi-joint arm 17 bends and extends. As a result, the hands 18 move forward and backward relative to the rotating unit 15. Each hand 18 supports one substrate W.

[0121] Each hand 18 supports the substrate W in a horizontal position. Each hand 18 contacts the back surface of the substrate W. Each hand 18 contacts the peripheral edge of the back surface of the substrate W. Each hand 18 has a Y-shape in plan view.

[0122] Figure 12 is a detailed front view of the indexer section 2. The carrier C supports the substrates W in a horizontal position. In the carrier C, multiple substrates W are arranged in the vertical direction Z. The distance between two adjacent substrates W in the vertical direction Z is called the pitch B1. The pitch B1 is, for example, 10 mm.

[0123] Multiple hands 18 are aligned in the vertical direction Z. The distance between two adjacent hands 18 in the vertical direction Z is called the pitch B2. Pitch B2 is twice the pitch B1. For example, pitch B2 is 20 mm.

[0124] The substrates W within carrier C are called substrates W1, W2, W3, W4, W5, W6, W7, and W8. Substrates W1, W2, W3, W4, W5, W6, W7, and W8 are arranged in this order in the vertical direction Z. The transport mechanism 12 takes substrates W1, W3, W5, and W7 from carrier C on carrier stage 11 all at once. The transport mechanism 12 places substrates W1, W3, W5, and W7 into carrier C on carrier stage 11 all at once. Similarly, the transport mechanism 12 transports substrates W2, W4, W6, and W8 into carrier C on carrier stage 11 all at once.

[0125] At least one hand 18 may move relative to the rotating part 15 independently of the other hands 18. In this case, the transport mechanism 12 can easily transport one substrate W at a time.

[0126] For example, the articulated arm 17 comprises articulated arms 17a and 17b. Articulated arm 17b operates independently of articulated arm 17a. Articulated arms 17a and 17b are each directly supported by the rotating part 15. Articulated arm 17a supports one hand 18. Articulated arm 17b supports the other three hands 18.

[0127] For convenience, one hand 18 supported by the articulated arm 17a will be called "hand 18a". A hand 18 supported by the articulated arm 17b will be called "hand 18b". The articulated arm 17a moves hand 18a forward and backward relative to the rotating part 15. The articulated arm 17b moves hand 18b forward and backward relative to the rotating part 15. Hand 18b moves independently of hand 18a.

[0128] For example, when the transport mechanism 12 transports one substrate W, only the articulated arm 17a moves the hand 18a, and the articulated arm 17b does not move the hand 18b. When the transport mechanism 12 transports one substrate W, only the hand 18a supports the substrate W, and the hand 18b does not support the substrate W.

[0129] For example, when the transport mechanism 12 transports multiple substrates W, the articulated arms 17a and 17b may move the hands 18a and 18b in synchronous motion. When the transport mechanism 12 transports multiple substrates W, the hands 18a and 18b may each support the substrates W simultaneously.

[0130] <3. Front block 3 and rear block 5> Refer to Figure 3-11. The front block 3 comprises a first front section 3a. The first front section 3a is one layer of the front block 3. The first front section 3a comprises a plurality of chambers 6. Each chamber 6 comprises a plurality of processing units 20. Furthermore, the first front section 3a comprises a plurality of processing units 21 and a plurality of processing units 22. The first front section 3a comprises a mounting section 23. The first front section 3a comprises a transport mechanism 24. The transport mechanism 24 transports the substrate W to the chambers 6, processing units 21 and 22, and mounting section 23.

[0131] The front block 3 comprises a second front section 3b. The second front section 3b is another layer of the front block 3. The second front section 3b comprises a plurality of chambers 7. Each chamber 7 comprises a plurality of processing units 25. Furthermore, the second front section 3b comprises a plurality of processing units 26 and a plurality of processing units 27. The second front section 3b comprises a mounting section 28. The second front section 3b comprises a transport mechanism 29. The transport mechanism 29 transports the substrate W to the chambers 7, processing units 26 and 27, and mounting section 28.

[0132] The rear block 5 includes a first rear section 5a. The first rear section 5a is one layer of the rear block 5. The first rear section 5a includes a plurality of chambers 8. Each chamber 8 includes a plurality of processing units 30. Furthermore, the first rear section 5a includes a plurality of processing units 31 and a plurality of processing units 32. The first rear section 5a includes a mounting section 33. The first rear section 5a includes a transport mechanism 34. The transport mechanism 34 transports the substrate W to the chambers 8, processing units 31 and 32, and mounting section 33.

[0133] The rear block 5 comprises a second rear section 5b. The second rear section 5b is another layer of the rear block 5. The second rear section 5b comprises a plurality of chambers 9. Each chamber 9 comprises a plurality of processing units 35. Furthermore, the second rear section 5b comprises a plurality of processing units 36 and a plurality of processing units 37. The second rear section 5b comprises a mounting section 38. The second rear section 5b comprises a transport mechanism 39. The transport mechanism 39 transports the substrate W to the chambers 9, processing units 36, 37 and mounting section 38.

[0134] The chambers 6 and processing units 20 will now be described. Each chamber 6 is equipped with a processing unit 20 as described above. The processing unit 20 is equipped with a plurality of nozzles 42. Each nozzle 42 discharges a processing liquid. The composition of the processing liquid discharged from one nozzle 42 may be different from the composition of the processing liquid discharged from another nozzle 42. The composition of the processing liquid discharged from one nozzle 42 may be the same as the composition of the processing liquid discharged from another nozzle 42.

[0135] The processing unit 20 further includes a nozzle transport mechanism 44. The nozzle transport mechanism 44 holds one nozzle 42 and moves the nozzle 42 between a standby position and a processing position. The standby position is outside the cup 43. The processing position is above the substrate W held by the holding part 41. When the nozzle 42 is in the processing position, the nozzle 42 discharges processing liquid onto the substrate W held by the holding part 41.

[0136] For example, the nozzle 42 is shared by multiple processing units 20 belonging to a single chamber 6.

[0137] For convenience, the multiple processing units 20 belonging to a single chamber 6 are referred to as processing units 20a and 20b. A single chamber 6 comprises processing units 20a and 20b. Processing unit 20a is equipped with a nozzle 42. Processing unit 20b shares the nozzle 42 of processing unit 20a.

[0138] For example, the nozzle 42 discharges processing liquid onto a substrate W held in the holding part 41 of the processing unit 20a, and also discharges processing liquid onto a substrate W held in the holding part 41 of the processing unit 20b. The nozzle 42 is configured to move to a position above the substrate W held in the holding part 41 of the processing unit 20a, and also to move to a position above the substrate W held in the holding part 41 of the processing unit 20b.

[0139] Processing unit 20a is an example of the first processing unit of the present invention. Processing unit 20b is an example of the second processing unit of the present invention.

[0140] Chamber 7 has the same structure as chamber 6. Similarly, chamber 8 has the same structure as chamber 6. Chamber 9 has the same structure as chamber 6.

[0141] Processing unit 25 has the same structure as processing unit 20. Similarly, processing unit 30 has the same structure as processing unit 20. Processing unit 35 has the same structure as processing unit 20.

[0142] Processing units 21 and 22 will now be described. Processing units 21 and 22 each process substrate W. Processing units 21 and 22 each process one substrate W at a time.

[0143] Processing units 21 and 22 each perform a non-liquid treatment on the substrate W.

[0144] "Non-liquid treatment" is a treatment or inspection performed on a substrate W without supplying a treatment liquid to the substrate W. "Non-liquid treatment" includes, for example, at least one of heat treatment and inspection.

[0145] Refer to Figure 6. For example, some processing units 21 are classified as adhesion strengthening processing units PAHP. The adhesion strengthening processing unit PAHP performs adhesion strengthening processing. The adhesion strengthening processing is for improving the adhesion between the substrate W and the coating film. For example, the adhesion strengthening processing unit PAHP supplies hexamethyldisilase (HMDS) to the substrate W and adjusts the substrate W to a predetermined temperature. Other processing units 21 are classified as heating and cooling units PHP. The heating and cooling unit PHP heats the substrate W and then cools the substrate W.

[0146] Refer to Figure 3. Each processing unit 21 comprises one or two support members 45. The support members 45 support the substrate W in a horizontal position. The support members 45 include, for example, at least one of a horizontal plate and a vertical pin. Each processing unit 21 may also include a heating unit (not shown). The heating unit heats the substrate W on the support members 45. Each processing unit 21 may also include a cooling unit (not shown). The cooling unit cools the substrate W on the support members 45. If the processing unit 21 comprises two support members 45, the processing unit 21 may further include a local transport mechanism (not shown). The local transport mechanism transports the substrate W between the two support members 45.

[0147] Processing unit 26 has the same structure as processing unit 21. Similarly, processing units 31 and 36 each have the same structure as processing unit 21.

[0148] For example, the processing unit 22 is classified as a cooling unit CP. The cooling unit CP cools the substrate W.

[0149] Each processing unit 22 includes one support member 46. The support member 46 supports the substrate W in a horizontal position. The support member 46 includes, for example, at least one of a horizontal plate and a vertical pin. Each processing unit 22 includes a cooling unit (not shown). The cooling unit cools the substrate W on the support member 46.

[0150] Processing unit 27 has the same structure as processing unit 22. Similarly, processing units 32 and 37 each have the same structure as processing unit 22.

[0151] The mounting section 23 will now be described. Multiple (for example, four) substrates W are placed on the mounting section 23 at one time. The mounting section 23 supports the substrates W in a horizontal position. The multiple substrates W on the mounting section 23 are aligned in the vertical direction Z. Although not shown in the figures, the mounting section 23 includes, for example, at least one of a horizontal plate, support pins, and a shelf.

[0152] The mounting section 28 has the same structure as the mounting section 23. Similarly, the mounting sections 33 and 38 each have the same structure as the mounting section 23.

[0153] The structure of the transport mechanism 24 will now be described. The transport mechanism 24 comprises a support column 47a, a lifting section 47b, a rotating section 47c, and a support section 47d. The support column 47a is fixedly installed. The support column 47a extends in the vertical direction Z. The lifting section 47b is supported by the support column 47a. The lifting section 47b moves in the vertical direction Z relative to the support column 47a. The rotating section 47c is supported by the lifting section 47b. The rotating section 47c rotates around a rotation axis A47 relative to the lifting section 47b. The rotation axis A47 is shown in Figure 9. The rotation axis A47 extends in the vertical direction Z. The rotation axis A47 passes through, for example, the rotating section 47c. The support section 47d is supported by the rotating section 47c. The support section 47d moves forward and backward relative to the rotating section 47c. More specifically, the support portion 47d reciprocates in one direction determined by the orientation of the rotating portion 47c. This "one direction determined by the orientation of the rotating portion 47c" is the radial direction of the rotation axis A47. The radial direction of the rotation axis A47 is horizontal. The support portion 47d supports the substrate W.

[0154] The support section 47d supports multiple substrates W at once. The transport mechanism 24 transports multiple substrates W at once.

[0155] The support section 47d comprises a plurality (e.g., two) of hands 47e. Each hand 47e is directly supported by the rotating section 47c. Each hand 47e slides relative to the rotating section 47c. Each hand 47e supports one substrate W.

[0156] Each hand 47e supports the substrate W in a horizontal position. Each hand 47e contacts the back surface of the substrate W. Each hand 47e contacts the peripheral edge of the back surface of the substrate W. Each hand 47e has a Y-shape in plan view.

[0157] Multiple hands 47e are aligned in the vertical direction Z.

[0158] Multiple hands 47e may move independently of each other relative to the rotating part 47c.

[0159] The conveying mechanism 29 has the same structure as the conveying mechanism 24. Similarly, the conveying mechanisms 34 and 39 each have the same structure as the conveying mechanism 24.

[0160] <4. Slider section and bridge section> Refer to Figures 4, 6, and 9. The substrate processing apparatus 1 further comprises a slider section 50 and a bridge section 60. The slider section 50 is connected to the indexer section 2. The slider section 50 is connected to the bridge section 60. The slider section 50 transports the substrate W between the indexer section 2 and the bridge section 60.

[0161] The slider section 50 will now be described. The slider section 50 includes a transport mechanism 51. The transport mechanism 51 transports the substrate W.

[0162] The transport mechanism 51 includes a guide 52 and a support 53. The guide 52 is fixedly installed. The guide 52 extends linearly. The guide 52 extends in the front-rear direction X. The support 53 is attached to the guide 52. The support 53 is guided by the guide 52. The support 53 slides relative to the guide 52. The support 53 moves parallel to the guide 52. The support 53 moves linearly along the guide 52. The support 53 moves in the front-rear direction X along the guide 52. The support 53 moves back and forth along the guide 52. The support 53 supports the substrate W.

[0163] The transport mechanism 51 does not reach the indexer section 2. The guide 52 does not reach the indexer section 2. The transport mechanism 51 does not enter the indexer section 2. The support section 53 does not enter the indexer section 2.

[0164] The transport mechanism 51 does not reach the bridge section 60. The guide 52 does not reach the bridge section 60. The transport mechanism 51 does not enter the bridge section 60. The support section 53 does not enter the bridge section 60.

[0165] The support portion 53 does not move in the width direction Y relative to the guide 52. For example, the support portion 53 does not extend or contract relative to the guide 52.

[0166] The support section 53 supports multiple substrates W at once. The transport mechanism 51 transports multiple substrates W at once.

[0167] The support unit 53 comprises a movable element 54 and a plurality (e.g., 8) of hands 55. The movable element 54 is directly supported by the guide 52. The hands 55 are directly supported by the movable element 54. The movable element 54 slides relative to the guide 52. As a result, the hands 55 move relative to the guide 52. Each hand 55 supports one substrate W.

[0168] Each hand 55 supports the substrate W in a horizontal position. Each hand 55 contacts the back surface of the substrate W. Each hand 55 contacts the center of the back surface of the substrate W. Each hand 55 has a T-shape in plan view.

[0169] Multiple hands 55 are aligned in the vertical direction Z.

[0170] Some of the hands 55 may move relative to the guide 52 independently of the other hands 55. In this case, the transport mechanism 51 can easily transport many substrates W efficiently.

[0171] For example, the movable element 54 comprises movable elements 54a and 54b. Movable element 54b operates independently of movable element 54a. Each movable element 54a and 54b is directly supported by the guide 52. Each movable element 54a and 54b supports multiple (four) hands 55.

[0172] For convenience, the hand 55 supported by the movable element 54a will be called "hand 55a". The hand 55 supported by the movable element 54b will be called "hand 55b". The movable element 54a moves hand 55a relative to the guide 52. The movable element 54b moves hand 55b relative to the guide 52. Hand 55b moves independently of hand 55a.

[0173] For example, hands 55a and 55b may each transport the substrate W in only one direction. Hand 55a transports the substrate W from the indexer unit 2 to the bridge unit 60, but does not transport the substrate W from the bridge unit 60 to the indexer unit 2. Hand 55b transports the substrate W from the bridge unit 60 to the indexer unit 2, but does not transport the substrate W from the indexer unit 2 to the bridge unit 60.

[0174] Alternatively, hands 55a and 55b may each transport the substrate W in both directions. Hand 55a transports the substrate W from the indexer unit 2 to the bridge unit 60, and transports the substrate W from the bridge unit 60 to the indexer unit 2. Hand 55b transports the substrate W from the indexer unit 2 to the bridge unit 60, and transports the substrate W from the bridge unit 60 to the indexer unit 2.

[0175] The structure of the transport mechanism 51 will now be described. Although not shown in the diagram, the transport mechanism 51 includes a drive mechanism. The drive mechanism moves the support portion 53 relative to the guide 52.

[0176] The drive mechanism is provided, for example, on the guide 52. The drive mechanism comprises, for example, a pair of drive pulleys, a driven pulley, a belt, and a motor. The belt is stretched over the drive pulleys and the driven pulleys. The belt extends along the guide 52. The support 53 is attached to the belt. For example, the movable element 54 is attached to the belt. The motor is connected to the drive pulleys. The motor rotates the drive pulleys in the forward and reverse directions. When the drive pulleys rotate, the belt rotates between the drive pulleys and the driven pulleys, and the support 53 reciprocates between the drive pulleys and the driven pulleys.

[0177] Alternatively, the drive mechanism may be provided on the support portion 53. The drive mechanism may include a ball screw mechanism. The drive mechanism may include an air cylinder.

[0178] The bridge section 60 will now be explained.

[0179] Refer to Figures 3-6 and 3-10. The bridge section 60 is connected to the front block 3 and the rear block 5. The bridge section 60 transports the substrate W to the front block 3 and the rear block 5. For example, the bridge section 60 transports the substrate W between the slider section 50 and the front block 3 and the rear block 5.

[0180] For example, the bridge section 60 is connected to the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b. The bridge section 60 transports the substrate W to the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b. The bridge section 60 also transports the substrate W between the slider section 50, the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b.

[0181] The bridge unit 60 performs "intake," "distribution," "recovery," and "discharge."

[0182] "Taking in" refers to taking the substrate W from the slider unit 50 and transporting the substrate W from the slider unit 50 to the bridge unit 60.

[0183] "Distribution" refers to transporting the substrate W from the bridge section 60 to the front block 3 and the rear block 5, and placing the substrate W on the front block 3 and the rear block 5. For example, "distribution" refers to transporting the substrate W from the bridge section 60 to the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b, and placing the substrate W on the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b.

[0184] "Retrieval" refers to taking the substrate W from the front block 3 and the rear block 5 and transporting the substrate W from the front block 3 and the rear block 5 to the bridge section 60. For example, "retrieval" refers to taking the substrate W from the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b, and transporting the substrate W from the first front section 3a, the second front section 3b, the first rear section 5a, and the second rear section 5b to the bridge section 60.

[0185] "Dispensing" refers to transporting the substrate W from the bridge section 60 to the slider section 50 and placing the substrate W on the slider section 50.

[0186] The bridge section 60 is equipped with a transport mechanism 61. The transport mechanism 61 performs the above-mentioned "intake," "distribution," "recovery," and "discharge."

[0187] For example, the transport mechanism 61 is composed of multiple transport mechanisms. The transport mechanism 61 includes transport mechanisms 62, 63, and 64. Transport mechanism 62 performs "receiving," "recovering," and "discharging." Transport mechanisms 63 and 64 each perform a part of "distribution." Transport mechanism 63 performs distribution related to the first front section 3a and the first rear section 5a. Transport mechanism 64 performs distribution related to the second front section 3b and the second rear section 5b.

[0188] The bridge section 60 includes a mounting section 65. Multiple (e.g., eight) substrates W are placed on the mounting section 65 at one time. The mounting section 65 supports the substrates W in a horizontal position. The multiple substrates W on the mounting section 65 are aligned in the vertical direction Z. Although not shown in the figures, the mounting section 65 includes, for example, at least one of a horizontal plate, support pins, and a shelf.

[0189] The bridge section 60 includes a mounting section 66. The mounting section 66 has the same structure as the mounting section 65.

[0190] Transport mechanisms 62 and 63 transfer substrates W to each other via the mounting section 65. Transport mechanisms 62 and 64 transfer substrates W to each other via the mounting section 66. For example, transport mechanism 62 distributes substrates W to the mounting sections 65 and 66. Transport mechanism 62 distributes substrates W to transport mechanisms 63 and 64 via the mounting sections 65 and 66.

[0191] The structure of the transport mechanism 62 will now be described. The transport mechanism 62 has the same structure as the transport mechanism 12 of the indexer unit 2. For example, the transport mechanism 62 includes a support column 13, a lifting unit 14, a rotating unit 15, and a support unit 16. The support unit 16 includes a multi-joint arm 17 and a plurality of hands 18.

[0192] The structures of the conveying mechanisms 63 and 64 will now be described. For example, conveying mechanisms 63 and 64 each have the same structure as the conveying mechanism 24 of the front block 3. For example, conveying mechanisms 63 and 64 each include a support column 47a, a lifting section 47b, a rotating section 47c, and a support section 47d. The support section 47d includes multiple (e.g., two) hands 47e.

[0193] Figure 13 is a detailed plan view of the slider section 50. The hand 55 includes one or more (e.g., three) contact sections 56. The contact sections 56 contact the back surface of the substrate W. The contact sections 56 contact the central part of the back surface of the substrate W. The contact sections 56 have, for example, a pin shape or a pad shape.

[0194] The contact portion 56 may also adhere to the back surface of the substrate W.

[0195] The hand 55 is equipped with one or more (e.g., four) guards 57. The guards 57 are positioned slightly outside the substrate W. The guards 57 are capable of contacting the peripheral edge of the substrate W. For example, if the substrate W shifts significantly relative to the hand 55, the guards 57 will contact the peripheral edge of the substrate W. The guards 57 then prevent the substrate W from falling out of the hand 55.

[0196] The guard 57 is positioned outside the contact portion 56.

[0197] Guard 57 includes guard 57a and guard 57b. Guard 57a, contact portion 56, and guard 57b are arranged in this order in the front-to-back direction X. Guard 57a is positioned in front of the contact portion 56. Guard 57b is positioned behind the contact portion 56. The contact portion 56 is positioned between guard 57a and guard 57b.

[0198] The transport mechanism 12 and the transport mechanism 51 transfer substrates W to each other. The transport mechanism 12 and the transport mechanism 51 may transfer multiple substrates W to each other at once.

[0199] When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, a part of the transport mechanism 12 enters the slider section 50. When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the support section 16 of the transport mechanism 12 enters the slider section 50.

[0200] When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the support portion 53 is located at the first position P1. The first position P1 is located within the slider portion 50.

[0201] When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the support part 53 remains stationary. The transport mechanism 12 places the substrate W on the transport mechanism 51. The transport mechanism 12 takes the substrate W from the transport mechanism 51.

[0202] When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the contact portion 56 does not interfere with the transport mechanism 12. When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the contact portion 56 does not overlap with the hand 18 of the transport mechanism 12 in a plan view. When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the hand 18 of the transport mechanism 12 is located outside the contact portion 56 in a plan view.

[0203] When transport mechanisms 12 and 51 transfer substrate W to each other, the guard 57 does not interfere with transport mechanism 12. When transport mechanisms 12 and 51 transfer substrate W to each other, the guard 57 does not overlap with the hand 18 of transport mechanism 12 in a plan view. When transport mechanisms 12 and 51 transfer substrate W to each other, the hand 18 of transport mechanism 12 is located inside the guard 57 in a plan view. When transport mechanisms 12 and 51 transfer substrate W to each other, the hand 18 of transport mechanism 12 is located between the guard 57a and the contact portion 56, and between the guard 57b and the contact portion 56 in a plan view.

[0204] The transport mechanism 62 and the transport mechanism 51 transfer substrates W to each other. The transport mechanism 62 and the transport mechanism 51 may transfer multiple substrates W to each other at once.

[0205] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, a part of the transport mechanism 62 enters the slider section 50. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the support section 16 of the transport mechanism 62 enters the slider section 50.

[0206] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the support part 53 is located at the second position P2. The second position P2 is located within the slider part 50.

[0207] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the support part 53 remains stationary. The transport mechanism 62 places the substrate W on the transport mechanism 51. The transport mechanism 62 takes the substrate W from the transport mechanism 51.

[0208] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the contact portion 56 does not interfere with the transport mechanism 62. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the contact portion 56 does not overlap with the hand 18 of the transport mechanism 62 in a plan view. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the hand 18 of the transport mechanism 62 is located outside the contact portion 56.

[0209] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the guard 57 does not interfere with the transport mechanism 62. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the guard 57 does not overlap with the hand 18 of the transport mechanism 62 in a plan view. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the hand 18 of the transport mechanism 62 is located inside the guard 57. When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the hand 18 of the transport mechanism 62 is located between the guard 57a and the contact portion 56, and between the guard 57b and the contact portion 56 in a plan view.

[0210] <5. Cabinet 5> Figure 14 is a piping diagram between the cabinet section 4 and the chambers 6 and 8. Figure 14 shows a simplified configuration of the cabinet section 4 and the chambers 6 and 8. The cabinet section 4 supplies the processing liquid Ra to multiple chambers 6. The cabinet section 4 supplies the processing liquid Ra to multiple chambers 8.

[0211] The cabinet section 4 is equipped with multiple pipes 72Fa. The cabinet section 4 is equipped with multiple pipes 72Ra. The cabinet section 4 is equipped with multiple liquid supply sections 79Fa. The cabinet section 4 is equipped with multiple liquid supply sections 79Ra.

[0212] The cabinet section 4 includes a processing liquid container 71b in addition to the processing liquid container 71a. The processing liquid container 71b stores the processing liquid Rb. For example, the processing liquid Ra has a different composition from the processing liquid Rb. The cabinet section 4 supplies the processing liquid Rb to a plurality of chambers 6. The cabinet section 4 supplies the processing liquid Rb to a plurality of chambers 8.

[0213] The cabinet section 4 is equipped with multiple pipes 72Fb. The cabinet section 4 is equipped with multiple pipes 72Rb. The cabinet section 4 is equipped with multiple liquid supply sections 79Fb. ​​The cabinet section 4 is equipped with multiple liquid supply sections 79Rb.

[0214] Although not shown in the diagram, the cabinet 4 may further supply processing liquids Ra and Rb to the chamber 7. The cabinet 4 may also supply processing liquids Ra and Rb to the chamber 9.

[0215] For convenience, multiple chambers 6 will be referred to as chambers 6a, 6b, 6c, and 6d to distinguish between them. For convenience, multiple chambers 8 will be referred to as chambers 8a, 8b, 8c, and 8d to distinguish between them. For convenience, multiple processing units 20 will be referred to as processing units 20a and 20b to distinguish between them. For convenience, multiple processing units 30 will be referred to as processing units 30a and 30b to distinguish between them. For convenience, multiple nozzles 42 will be referred to as nozzles 42a and 42b to distinguish between them.

[0216] To distinguish between multiple pipes 72Fa, they are called pipes 72Fa1 and 72Fa2. To distinguish between multiple fittings 78Fa, they are called fittings 78Fa1 and 78Fa2. To distinguish between multiple fluid supply units 79Fa, they are called fluid supply units 79Fa1 and 79Fa2.

[0217] To distinguish between multiple pipes 72Ra, they are called pipes 72Ra1 and 72Ra2. To distinguish between multiple fittings 78Ra, they are called fittings 78Ra1 and 78Ra2. To distinguish between multiple fluid delivery units 79Ra, they are called fluid delivery units 79Ra1 and 79Ra2.

[0218] To distinguish between multiple pipes 72Fb, they are called pipes 72Fb1 and 72Fb2. To distinguish between multiple fittings 78Fb, they are called fittings 78Fb1 and 78Fb2. To distinguish between multiple fluid delivery units 79Fb, they are called fluid delivery units 79Fb1 and 79Fb2.

[0219] To distinguish between multiple pipes 72Rb, they are called pipes 72Rb1 and 72Rb2. To distinguish between multiple fittings 78Rb, they are called fittings 78Rb1 and 78Rb2. To distinguish between multiple fluid delivery units 79Rb, they are called fluid delivery units 79Rb1 and 79Rb2.

[0220] The liquid supply unit 79Fa1 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42a of chambers 6a and 6b. The liquid supply unit 79Fa2 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42a of chambers 6c and 6d. The liquid supply unit 79Ra1 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42a of chambers 8a and 8b. The liquid supply unit 79Ra2 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42a of chambers 8c and 8d. The nozzles 42a of chambers 6 and 8 discharge the processing liquid Ra.

[0221] The liquid delivery unit 79Fb1 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42b of chambers 6a and 6b. The liquid delivery unit 79Fb2 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42b of chambers 6c and 6d. The liquid delivery unit 79Rb1 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42b of chambers 8a and 8b. The liquid delivery unit 79Rb2 delivers the processing liquid Ra from the processing liquid container 71a to the nozzles 42b of chambers 8c and 8d. The nozzles 42b of chambers 6 and 8 discharge the processing liquid Rb.

[0222] The processing liquid container 71a is an example of the first processing liquid container in the present invention. The processing liquid container 71b is an example of the second processing liquid container in the present invention. The liquid delivery unit 79Fa1 is an example of the first liquid delivery unit in the present invention. The liquid delivery unit 79Ra1 is an example of the second liquid delivery unit in the present invention. The liquid delivery unit 79Fa2 is an example of the third liquid delivery unit in the present invention. The chamber 6a is an example of the first chamber in the present invention. The chamber 8a is an example of the second chamber in the present invention. The chamber 6b is an example of the third chamber in the present invention.

[0223] The cabinet section 4 will be described in more detail. The processing liquid container 71a is connected to the pipes 72Fa1, 72Fa2, 72Ra1, and 72Ra2. For example, the cabinet section 4 includes a pipe 80a and a branch section 81a. The pipe 80a is connected to the processing liquid container 71a. The branch section 81a is provided on the pipe 80a. The branch section 81a is connected to the pipes 72Fa1, 72Fa2, 72Ra1, and 72Ra2.

[0224] The processing liquid container 71b is connected to the pipes 72Fb1, 72Fb2, 72Rb1, and 72Rb2. For example, the cabinet section 4 includes pipes 80b and a branch section 81b. The pipes 80b are connected to the processing liquid container 71b. The branch section 81b is provided on the pipes 80b. The branch section 81b is connected to pipes 72Fb1, 72Fb2, 72Rb1, and 72Rb2.

[0225] The configuration between the processing liquid container 71a and the chambers 6a and 6b will now be described. Piping 72Fa1 is connected to the nozzle 42a of chamber 6a. The liquid delivery unit 79Fa1 is provided on piping 72Fa1.

[0226] The liquid delivery unit 79Fa1 is equipped with a pump 91Fa1. The pump 91Fa1 is mounted on the piping 72Fa1.

[0227] The liquid transfer unit 79Fa1 is equipped with a pump 92Fa1. Pump 92Fa1 is mounted on piping 72Fa1. Pump 92Fa1 is located downstream of pump 91Fa1. Piping 72Fa1 connects pump 91Fa1 and pump 92Fa1 in series.

[0228] The joint 78Fa1 is installed on the piping 72Fa1. The joint 78Fa1 is located downstream of the fluid delivery section 79Fa1.

[0229] Cabinet section 4 comprises a branch section 85Fa1, a branch pipe 86Fa1, and a fitting 87Fa1. The branch section 85Fa1 is provided on the piping 72Fa1. The branch section 85Fa1 is located downstream of the liquid delivery section 79Fa1 and upstream of the fitting 78Fa1. The branch pipe 86Fa1 connects the branch section 85Fa1 to the nozzle 42a of the chamber 6b. The fitting 87Fa1 is provided on the branch pipe 86Fa1.

[0230] Chamber 6a is equipped with a valve 88Fa1. The valve 88Fa1 is mounted on the piping 72Fa1. The valve 88Fa1 is positioned downstream of the fitting 78Fa1.

[0231] Chamber 6b is equipped with a valve 88Fa2. The valve 88Fa2 is mounted on a branch pipe 86Fa1. The valve 88Fa2 is positioned downstream of the joint 87Fa1.

[0232] Piping 72Fa1 is an example of the first piping in the present invention. Pump 91Fa1 is an example of the first pump in the present invention. Pump 92Fa1 is an example of the second pump in the present invention.

[0233] The configuration between the processing liquid container 71a and chambers 6c and 6d is the same as the configuration between the processing liquid container 71a and chambers 6a and 6b. For example, chamber 6c corresponds to chamber 6a, and chamber 6d corresponds to chamber 6b. Piping 72Fa2 corresponds to pipe 72Fa1, fitting 78Fa2 corresponds to fitting 78Fa1, liquid delivery section 79Fa2 corresponds to liquid delivery section 79Fa1, branch section 85Fa2 corresponds to branch section 85Fa1, branch pipe 86Fa2 corresponds to branch pipe 86Fa1, fitting 87Fa2 corresponds to fitting 87Fa1, valve 88Fa3 corresponds to valve 88Fa1, and valve 88Fa4 corresponds to valve 88Fa2.

[0234] The configuration between the processing liquid container 71a and the chambers 8a and 8b will now be described. Piping 72Ra1 is connected to the nozzle 42a of chamber 8a. The liquid delivery unit 79Ra1 is provided on piping 72Ra1.

[0235] The liquid delivery unit 79Ra1 is equipped with a pump 91Ra1. The pump 91Ra1 is mounted on the piping 72Ra1.

[0236] The liquid delivery unit 79Ra1 is equipped with a pump 92Ra1. Pump 92Ra1 is mounted on piping 72Ra1. Pump 92Ra1 is located downstream of pump 91Ra1. Piping 72Ra1 connects pump 91Ra1 and pump 92Ra1 in series.

[0237] The fitting 78Ra1 is installed on the piping 72Ra1. The fitting 78Ra1 is located downstream of the fluid delivery section 79Ra1.

[0238] Cabinet section 4 comprises a branch section 85Ra1, a branch pipe 86Ra1, and a fitting 87Ra1. The branch section 85Ra1 is provided on the piping 72Ra1. The branch section 85Ra1 is located downstream of the liquid delivery section 79Ra1 and upstream of the fitting 78Ra1. The branch pipe 86Ra2 connects the branch section 85Ra1 to the nozzle 42a of the chamber 8b. The fitting 87Ra1 is provided on the branch pipe 86Ra1.

[0239] Chamber 6a is equipped with a valve 88Ra1. The valve 88Ra1 is mounted on the piping 72Ra1. The valve 88Ra1 is positioned downstream of the fitting 78Ra1.

[0240] Chamber 6b is equipped with a valve 88Ra2. The valve 88Ra2 is located on a branch pipe 86Ra1. The valve 88Ra2 is positioned downstream of the joint 87Ra1.

[0241] Piping 72Ra1 is an example of the second piping in the present invention. Pump 91Ra1 is an example of the third pump in the present invention. Pump 92Ra1 is an example of the fourth pump in the present invention.

[0242] The configuration between the processing liquid container 71a and the chambers 8c and 8d is the same as the configuration between the processing liquid container 71a and the chambers 8a and 8b. For example, piping 72Ra2 corresponds to piping 72Ra1. Fitting 78Ra2 corresponds to fitting 78Ra1. Liquid delivery section 79Ra2 corresponds to liquid delivery section 79Ra1. Branch section 85Ra2 corresponds to branch section 85Ra1. Branch pipe 86Ra2 corresponds to branch pipe 86Ra1. Fitting 87Ra2 corresponds to fitting 87Ra1. Valve 88Ra3 corresponds to valve 88Ra1. Valve 88Ra4 corresponds to valve 88Ra2.

[0243] The configuration between the processing liquid container 71b and the chambers 6a and 6b will now be described. Piping 72Fb1 is connected to the nozzle 42b of chamber 6a. The liquid delivery unit 79Fb1 is provided on piping 72Fb1.

[0244] The liquid delivery unit 79Fb1 is equipped with a pump 91Fb1. The pump 91Fb1 is mounted on the piping 72Fb1.

[0245] The liquid delivery unit 79Fb1 is equipped with a pump 92Fb1. Pump 92Fb1 is mounted on piping 72Fb1. Pump 92Fb1 is located downstream of pump 91Fb1. Piping 72Fb1 connects pump 91Fb1 and pump 92Fb1 in series.

[0246] The fitting 78Fb1 is installed on the piping 72Fb1. The fitting 78Fb1 is located downstream of the fluid delivery section 79Fb1.

[0247] Cabinet section 4 comprises a branch section 85Fb1, a branch pipe 86Fb1, and a fitting 87Fb1. The branch section 85Fb1 is provided on the piping 72Fb1. The branch section 85Fb1 is located downstream of the liquid delivery section 79Fb1 and upstream of the fitting 78Fb1. The branch pipe 86Fb2 connects the branch section 85Fb1 to the nozzle 42b of the chamber 6b. The fitting 87Fb1 is provided on the branch pipe 86Fb1.

[0248] Chamber 6a is equipped with a valve 88Fb1. The valve 88Fb1 is mounted on the piping 72Fb1. The valve 88Fb1 is located downstream of the fitting 78Fb1.

[0249] Chamber 6b is equipped with a valve 88Fb2. The valve 88Fb2 is mounted on a branch pipe 86Fb1. The valve 88Fb2 is positioned downstream of the fitting 87Fb1.

[0250] Piping 72Fb1 is an example of the third piping in the present invention. Pump 91Fb1 is an example of the fifth pump in the present invention. Pump 92Fb1 is an example of the sixth pump in the present invention.

[0251] The configuration between the processing liquid container 71b and the chambers 6c and 6d is the same as the configuration between the processing liquid container 71b and the chambers 6a and 6b. For example, pipe 72Fb2 corresponds to pipe 72Fb1. Fitting 78Fb2 corresponds to fitting 78Fb1. Liquid delivery section 79Fb2 corresponds to liquid delivery section 79Fb1. Branch section 85Fb2 corresponds to branch section 85Fb1. Branch pipe 86Fb2 corresponds to branch pipe 86Fb1. Fitting 87Fb2 corresponds to fitting 87Fb1. Valve 88Fb3 corresponds to valve 88Fb1. Valve 88Fb4 corresponds to valve 88Fb2.

[0252] The configuration between the processing liquid container 71b and the chambers 8a and 8b will now be described. Piping 72Rb1 is connected to the nozzle 42b of chamber 8a. The liquid delivery unit 79Rb1 is provided on piping 72Rb1.

[0253] The liquid delivery unit 79Rb1 is equipped with a pump 91Rb1. The pump 91Rb1 is mounted on the piping 72Rb1.

[0254] The fluid transfer unit 79Rb1 is equipped with a pump 92Rb1. Pump 92Rb1 is mounted on piping 72Rb1. Pump 92Rb1 is located downstream of pump 91Rb1. Piping 72Rb1 connects pump 91Rb1 and pump 92Rb1 in series.

[0255] The fitting 78Rb1 is installed in the piping 72Rb1. The fitting 78Rb1 is located downstream of the fluid delivery section 79Rb1.

[0256] Cabinet section 4 comprises a branch section 85Rb1, a branch pipe 86Rb1, and a fitting 87Rb1. The branch section 85Rb1 is provided on the piping 72Rb1. The branch section 85Rb1 is located downstream of the liquid delivery section 79Rb1 and upstream of the fitting 78Rb1. The branch pipe 86Rb2 connects the branch section 85Rb1 to the nozzle 42b of the chamber 8b. The fitting 87Rb1 is provided on the branch pipe 86Rb1.

[0257] Chamber 6a is equipped with a valve 88Rb1. The valve 88Rb1 is mounted on the piping 72Rb1. The valve 88Rb1 is located downstream of the fitting 78Rb1.

[0258] Chamber 6b is equipped with a valve 88Rb2. The valve 88Rb2 is mounted on a branch pipe 86Rb1. The valve 88Rb2 is positioned downstream of the fitting 87Rb1.

[0259] The configuration between the processing liquid container 71b and the chambers 8c and 8d is the same as the configuration between the processing liquid container 71b and the chambers 8a and 8b. For example, pipe 72Rb2 corresponds to pipe 72Rb1. Fitting 78Rb2 corresponds to fitting 78Rb1. Liquid delivery section 79Rb2 corresponds to liquid delivery section 79Rb1. Branch section 85Rb2 corresponds to branch section 85Rb1. Branch pipe 86Rb2 corresponds to branch pipe 86Rb1. Fitting 87Rb2 corresponds to fitting 87Rb1. Valve 88Rb3 corresponds to valve 88Rb1. Valve 88Rb4 corresponds to valve 88Rb2.

[0260] Figure 15 is a detailed piping diagram between the cabinet section 4 and the chamber 6. The cabinet 3 may include a trap tank 82a. The trap tank 82a temporarily stores the processing liquid Ra. The trap tank 82a collects air bubbles in the processing liquid Ra. The trap tank 82a is configured to degas the processing liquid Ra.

[0261] Specifically, the trap tank 82a is installed on the piping 80a. The treatment liquid container 71a is connected to the piping 72Fa1 via the trap tank 82a. Although not shown in the diagram, the treatment liquid container 71a is connected to the piping 72Fa2, 72Ra1, and 72Ra2 via the trap tank 82a.

[0262] Cabinet section 4 includes a discharge pipe 83a and a valve 84a. The discharge pipe 83a is connected to a trap tank 82a. The discharge pipe 83a communicates with a drainage system not shown. The valve 84a is provided on the discharge pipe 83a. When the valve 84a is open, the discharge pipe 83a discharges gas and treated liquid Ra from the trap tank 82a to the drainage system.

[0263] Although not shown in the diagram, the cabinet section 3 may include a trap tank provided on the piping 80b.

[0264] The liquid delivery section 79Fa1 will now be described. As mentioned above, the liquid delivery section 79Fa1 includes pumps 91Fa1 and 92Fa1. Pumps 91Fa1 and 92Fa1 are each mounted on the piping 72Fa1. Pump 92Fa1 is positioned downstream of pump 91Fa1.

[0265] The liquid delivery unit 79Fa1 is equipped with a filter 93Fa1. The filter 93Fa1 is installed on the piping 72Fa1. The filter 93Fa1 is located downstream of the pump 91Fa1 and upstream of the pump 92Fa1.

[0266] The liquid delivery section 79Fa1 includes a branch section 94Fa1 and a return pipe 95Fa1. The branch section 94Fa1 is located on the piping 72Fa1. The branch section 94Fa1 is located downstream of the pump 91Fa1 and upstream of the filter 93Fa1. The return pipe 95Fa1 connects the pump 92Fa1 and the branch section 94Fa1. The return pipe 95Fa1 is separate from the piping 72Fa1.

[0267] The liquid supply unit 79Fa1 is equipped with a discharge pipe 96Fa1. The discharge pipe 96Fa1 is connected to a filter 93Fa1. The discharge pipe 96Fa1 is connected to a drainage system not shown.

[0268] The liquid delivery unit 79Fa1 includes valves 97Fa1, 98Fa1, and 99Fa1. The valves 97Fa1, 98Fa1, and 99Fa1 are respectively provided on the pipe 72Fa1. The valve 97Fa1 is arranged upstream of the pump 91Fa1. The valve 98Fa1 is arranged downstream of the branch portion 94Fa1 and upstream of the filter 93Fa1. The valve 99Fa1 is arranged downstream of the filter 93Fa1 and upstream of the pump 92Fa!

[0269] The liquid delivery unit 79Fa1 includes a valve 100Fa1. The valve 100Fa1 is provided on the return pipe 95Fa1.

[0270] The liquid delivery unit 79Fa1 includes a valve 101Fa1. The valve 101Fa1 is provided on the discharge pipe 96Fa1.

[0271] The pumps 91Fa1 and 92Fa1 are respectively classified as, for example, reciprocating pumps. The pumps 91Fa1 and 92Fa1 respectively perform suction and discharge alternately in time. The pumps 91Fa1 and 92Fa1 are respectively, for example, any one of a diaphragm pump, a plunger pump, and a piston pump.

[0272] [[ID=十七]] For example, the pump 91Fa1 has a pump chamber (not shown). The pump 91Fa1 is configured to change the volume of the pump chamber. When the pump 91Fa1 increases the volume of the pump chamber, the pump 91Fa1 sucks in the processing liquid. When the pump 91Fa1 decreases the volume of the pump chamber, the pump 91Fa1 discharges the processing liquid.

[0273] The pump 92Fa1 has, for example, the same structure as the pump 91Fa1.

[0274] An operation example of the liquid delivery unit 79Fa1 will be described.

[0275] The liquid delivery unit 79Fa1 executes a first step, a second step, and a third step.

[0276] In the first step, pump 91Fa1 sucks in the processing liquid Ra. Specifically, valve 84a closes. Valve 97Fa1 opens. Valves 98Fa1 and 100Fa1 close. Pump 91Fa1 sucks in the processing liquid Ra. The processing liquid Ra enters pump 91Fa1 from the processing liquid container 71a through pipe 72Fa1.

[0277] In the second step, pump 92Fa1 sucks in the processing liquid Ra. Specifically, valve 97Fa1 closes. Valves 98Fa1 and 99Fa1 open. Valves 100Fa1 and 101Fa1 close. Valves 88Fa1 and 88Fa2 close. Pump 91Fa1 discharges the processing liquid Ra. Pump 92Fa1 sucks in the processing liquid Ra. The processing liquid Ra enters pump 92Fa from pump 91Fa1 through pipe 72Fa1 and filter 93Fa1. Filter 93Fa1 filters the processing liquid Ra. Filter 93Fa1 removes at least one of foreign matter or air bubbles from the processing liquid Ra.

[0278] In the third step, pump 92Fa1 sends the processing liquid Ra to nozzle 42a. Specifically, valves 99Fa1 and 100Fa1 close. Either valve 88Fa1 or 88Fa2 opens. Pump 92Fa1 discharges the processing liquid Ra. When valve 88Fa1 opens, the processing liquid Ra flows from pump 92Fa1 through pipe 72Fa1 to nozzle 42a in chamber 6a. Nozzle 42a in chamber 6a discharges the processing liquid Ra. When valve 88Fa2 opens, the processing liquid Ra enters nozzle 42a in chamber 6b from pump 92Fa1 through branch pipe 86Fa1. Nozzle 42a in chamber 6b discharges the processing liquid Ra.

[0279] In the above-described operation example, the period during which the third step is executed may overlap with the period during which the first step is executed. Alternatively, the period during which the third step is executed may not overlap with the period during which the first step is executed.

[0280] The liquid delivery unit 79Fa1 may further perform a fourth step. In the fourth step, the pump 92Fa1 returns the processed liquid Ra. Specifically, valve 99Fa1 closes. Valve 100Fa1 opens. Valves 88Fa1 and 88Fa2 close. Pump 92Fa1 discharges the processed liquid Ra. The processed liquid Ra flows from pump 92Fa1 to the return pipe 95Fa1. For example, in the fourth step, it is easy to adjust the amount of processed liquid Ra in pump 92Fa1. For example, in the fourth step, it is easy to adjust the pressure of the processed liquid Ra in pump 92Fa1.

[0281] For example, step 4 is executed after step 2 and before step 3. Or, step 4 is executed after step 3 and before step 2.

[0282] Although not shown in the diagram, the liquid delivery unit 79Fa2 has the same structure as the liquid delivery unit 79Fa1. The liquid delivery units 79Ra1 and 79Ra2 each have the same structure as the liquid delivery unit 79Fa1. The liquid delivery units 79Fb1, 79Fb2, 79Rb1, and 79Rb2 each have the same structure as the liquid delivery unit 79Fa1.

[0283] Refer to Figure 2. The control unit 10 further controls the transport mechanism 12 of the indexer unit 2. The control unit 10 controls the chamber 7 of the front block 3. The control unit 10 controls the processing unit 25. The control unit 10 controls the transport mechanisms 24 and 29. The control unit 10 controls the chamber 9 of the rear block 5. The control unit 10 controls the processing unit 35. The control unit 10 controls the transport mechanisms 34 and 39. The control unit 10 controls the slider unit 50. The control unit 10 controls the transport mechanism 51. The control unit 10 controls the bridge unit 60. The control unit 10 controls the transport mechanism 61.

[0284] <6. Placement> Refer to Figure 8. For convenience, to distinguish between the multiple carrier stages 11, we will call them carrier stages 11a, 11b, 11c, and 11d. Carrier stage 11a is located on the first side of the transport mechanism 12 in the width direction Y. Carrier stage 11b is located on the second side of the transport mechanism 12 in the width direction Y. Carrier stage 11c is located on the first side of the transport mechanism 12 in the width direction Y. Carrier stage 11c is located above carrier stage 11a in the vertical direction Z. Carrier stage 11d is located on the second side of the transport mechanism 12 in the width direction Y. Carrier stage 11d is located above carrier stage 11b in the vertical direction Z.

[0285] Refer to Figure 3. The carrier stage 11 and the transport mechanism 12 are aligned in the width direction Y. The carrier stage 11a, the transport mechanism 12, and the carrier stage 11b are aligned in the width direction Y in this order. The carrier stage 11a and the carrier stage 11b face each other.

[0286] The carrier stage 11 and the transport mechanism 12 are not aligned in the front-to-back direction X. The carrier stage 11 is not positioned in front of the transport mechanism 12 in the front-to-back direction X.

[0287] Therefore, the length of the indexer section 2 in the front-to-back direction X is short.

[0288] Figure 3 shows the length U. Length U is the length of the indexer portion 2 in the front-to-back direction X. Length U is short.

[0289] The processing unit 21, the transport mechanism 24, and the chamber 6 are arranged in this order along the width Y direction. The processing unit 21, the transport mechanism 24, and the processing unit 20 are arranged in this order along the width Y direction. The processing unit 21 is located on the first side of the transport mechanism 24. The chamber 6 is located on the second side of the transport mechanism 24. The processing unit 20 is located on the second side of the transport mechanism 24.

[0290] The processing unit 22, the transport mechanism 24, and the mounting section 23 are arranged in this order in the front-to-back direction X. The processing unit 22 is positioned in front of the transport mechanism 24. The mounting section 23 is positioned behind the transport mechanism 24.

[0291] The cabinet section 4 and the bridge section 60 are aligned in the width direction Y. The bridge section 60 is positioned on the first side of the cabinet section 4.

[0292] The transport mechanism 62, the transport mechanism 63, and the mounting section 65 are arranged in a triangular shape in a plan view. The transport mechanism 62, the transport mechanism 63, and the mounting section 65 are each located at the vertices of a virtual triangle (specifically, an acute triangle) in a plan view.

[0293] The conveying mechanisms 62 and 63 are aligned in the width direction Y. The conveying mechanism 63 is positioned on the first side of the conveying mechanism 62.

[0294] The transport mechanism 62 and the mounting section 65 are aligned in the front-to-back direction X. The mounting section 65 is positioned behind the transport mechanism 62.

[0295] The transport mechanism 63 and the mounting section 65 are aligned in the width direction Y. The mounting section 65 is positioned on the second side of the transport mechanism 63.

[0296] The processing unit 31, the transport mechanism 34, and the chamber 8 are arranged in this order along the width Y direction. The processing unit 31, the transport mechanism 34, and the processing unit 30 are arranged in this order along the width Y direction. The processing unit 31 is located on the first side of the transport mechanism 34. The chamber 8 is located on the second side of the transport mechanism 34. The processing unit 30 is located on the second side of the transport mechanism 34.

[0297] The mounting section 33, the transport mechanism 34, and the processing unit 32 are arranged in this order in the front-to-back direction X. The mounting section 33 is positioned in front of the transport mechanism 34. The processing unit 32 is positioned behind the transport mechanism 34.

[0298] The indexer unit 2, the front block 3, the cabinet unit 4, and the rear block 5 are arranged in this order in the front-rear direction X. The indexer unit 2, the front block 3, the cabinet unit 4, and the rear block 5 are arranged in a line.

[0299] The indexer unit 2, the first front unit 3a, the cabinet unit 4, and the first rear unit 5a are arranged in this order in the front-rear direction X. The indexer unit 2, the first front unit 3a, the cabinet unit 4, and the first rear unit 5a are arranged in a line.

[0300] The indexer unit 2, the front block 3, the bridge unit 60, and the rear block 5 are arranged in this order in the front-rear direction X. The indexer unit 2, the front block 3, the bridge unit 60, and the rear block 5 are arranged in a line.

[0301] The indexer unit 2, the first front unit 3a, the bridge unit 60, and the first rear unit 5a are arranged in this order in the front-rear direction X. The indexer unit 2, the first front unit 3a, the bridge unit 60, and the first rear unit 5a are arranged in a line.

[0302] The transport mechanism 12, the processing unit 22, the transport mechanism 24, the placement unit 23, the transport mechanism 62, the placement unit 65, the placement unit 33, the transport mechanism 34, and the processing unit 32 are arranged in this order in the front-rear direction X.

[0303] The carrier stage 11a, the processing unit 21, the transport mechanism 63, and the processing unit 31 are arranged in this order in the front-rear direction X.

[0304] The carrier stage 11b, the chamber 6, the cabinet unit 4, and the chamber 8 are arranged in this order in the front-rear direction X. The carrier stage 11b, the processing unit 20, the cabinet unit 4, and the processing unit 30 are arranged in this order in the front-rear direction X.

[0305] The length of the bridge unit 60 in the width direction Y is smaller than the length of the front block 3 in the width direction Y.

[0306] The length of the bridge section 60 in the width direction Y is smaller than the length of the first front section 3a in the width direction Y.

[0307] The length of the bridge section 60 in the width direction Y is smaller than the length of the rear block 5 in the width direction Y.

[0308] The length of the bridge section 60 in the width direction Y is smaller than the length of the first rear section 5a in the width direction Y.

[0309] The total length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the front block 3 in the width direction Y.

[0310] The total length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the first front section 3a in the width direction Y.

[0311] The overall length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the rear block 5 in the width direction Y.

[0312] The total length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the first rear section 5a in the width direction Y.

[0313] The length of the bridge section 60 in the width direction Y is longer than the length of the cabinet section 4 in the width direction Y.

[0314] The length of the bridge section 60 in the front-to-back direction X is equal to the length of the cabinet section 4 in the front-to-back direction X.

[0315] Refer to Figure 4. The slider section 50, the transport mechanism 24, and the chamber 6 are arranged in this order along the width Y direction. The slider section 50, the transport mechanism 24, and the processing unit 20 are arranged in this order along the width Y direction. The slider section 50 is positioned on the first side of the transport mechanism 62.

[0316] The indexer section 2, slider section 50, bridge section 60, and rear block 5 are arranged in this order in the front-to-back direction X. The indexer section 2, slider section 50, bridge section 60, and rear block 5 are arranged in a single line.

[0317] The indexer section 2, slider section 50, bridge section 60, and first rear section 5a are arranged in this order in the front-to-back direction X. The indexer section 2, slider section 50, bridge section 60, and first rear section 5a are arranged in a single line.

[0318] The carrier stage 11a, the slider section 50, and the transport mechanism 63 are arranged in this order in the front-to-back direction X.

[0319] The slider section 50 is positioned behind the transport mechanism 12 and on the first side of the transport mechanism 12.

[0320] The slider section 50 is positioned in front of the transport mechanism 62 and on the first side of the transport mechanism 62.

[0321] The slider section 50 is positioned in front of the transport mechanism 63.

[0322] The length of the slider section 50 in the width direction Y is smaller than the length of the bridge section 60 in the width direction Y. Therefore, the length of the slider section 50 in the width direction Y is smaller than the length of the front block 3 in the width direction Y. The length of the slider section 50 in the width direction Y is smaller than the length of the rear block 5 in the width direction Y.

[0323] The length of the slider section 50 in the width direction Y is smaller than the length of the bridge section 60 in the width direction Y. Therefore, the length of the slider section 50 in the width direction Y is smaller than the length of the first front section 3a in the width direction Y. The length of the slider section 50 in the width direction Y is smaller than the length of the first rear section 5a in the width direction Y.

[0324] Refer to Figure 5. The carrier stage 11c, the transport mechanism 12, and the carrier stage 11d are arranged in this order in the width direction Y. The carrier stage 11c and the carrier stage 11d face each other.

[0325] The processing unit 26, the transport mechanism 29, and the chamber 7 are arranged in this order along the width Y direction. The processing unit 26, the transport mechanism 29, and the processing unit 25 are arranged in this order along the width Y direction. The processing unit 26 is positioned on the first side of the transport mechanism 29 in the width Y direction. The chamber 7 is positioned on the second side of the transport mechanism 29 in the width Y direction. The processing unit 25 is positioned on the second side of the transport mechanism 29 in the width Y direction.

[0326] The processing unit 27, the transport mechanism 29, and the mounting section 28 are arranged in this order in the front-to-back direction X. The processing unit 27 is positioned in front of the transport mechanism 29. The mounting section 28 is positioned behind the transport mechanism 29.

[0327] The transport mechanism 62, the transport mechanism 64, and the mounting section 66 are arranged in a triangular configuration in a plan view. The transport mechanism 62, the transport mechanism 64, and the mounting section 66 are each located at the vertices of a virtual triangle (specifically, an acute triangle) in a plan view.

[0328] The conveying mechanisms 62 and 64 are aligned in the width direction Y. The conveying mechanism 64 is positioned on the first side of the conveying mechanism 62.

[0329] The transport mechanism 62 and the mounting section 66 are aligned in the front-to-back direction X. The mounting section 66 is positioned behind the transport mechanism 62.

[0330] The transport mechanism 64 and the mounting section 66 are aligned in the width direction Y. The mounting section 66 is positioned on the second side of the transport mechanism 64.

[0331] The processing unit 36, the transport mechanism 39, and the chamber 9 are arranged in this order along the width Y direction. The processing unit 36, the transport mechanism 39, and the processing unit 35 are arranged in this order along the width Y direction. The processing unit 36 ​​is positioned on the first side of the transport mechanism 39. The chamber 9 is positioned on the second side of the transport mechanism 39. The processing unit 35 is positioned on the second side of the transport mechanism 39.

[0332] The mounting section 38, the transport mechanism 39, and the processing unit 37 are arranged in this order in the front-to-back direction X. The mounting section 38 is positioned in front of the transport mechanism 39. The processing unit 37 is positioned behind the transport mechanism 39.

[0333] The indexer section 2, the second front section 3b, the cabinet section 4, and the second rear section 5b are arranged in this order in the front-to-back direction X. The indexer section 2, the second front section 3b, the cabinet section 4, and the second rear section 5b are arranged in a single line.

[0334] The indexer section 2, the second front section 3b, the bridge section 60, and the second rear section 5b are arranged in this order in the front-to-back direction X. The indexer section 2, the second front section 3b, the bridge section 60, and the second rear section 5b are arranged in a single line.

[0335] The transport mechanism 12, processing unit 27, transport mechanism 29, mounting unit 28, transport mechanism 62, mounting unit 66, mounting unit 38, transport mechanism 39, and processing unit 37 are arranged in this order in the front-to-back direction X.

[0336] The carrier stage 11c, processing unit 26, transport mechanism 64, and processing unit 36 ​​are arranged in this order in the front-to-back direction X.

[0337] The carrier stage 11d, chamber 7, cabinet section 4, and chamber 9 are arranged in this order in the front-to-back direction X. The carrier stage 11d, processing unit 25, cabinet section 4, and processing unit 35 are arranged in this order in the front-to-back direction X.

[0338] The length of the bridge section 60 in the width direction Y is smaller than the length of the second front section 3b in the width direction Y. The length of the bridge section 60 in the width direction Y is smaller than the length of the second rear section 5b in the width direction Y.

[0339] As described above, the length of the slider section 50 in the width direction Y is smaller than the length of the bridge section 60 in the width direction Y. Therefore, the length of the slider section 50 in the width direction Y is smaller than the length of the second front section 3b in the width direction Y. The length of the slider section 50 in the width direction Y is smaller than the length of the second rear section 5b in the width direction Y.

[0340] The total length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the second front section 3b in the width direction Y. The total length of the bridge section 60 and the cabinet section 4 in the width direction Y is equal to the length of the second rear section 5b in the width direction Y.

[0341] Refer to Figure 3-5. Career stages 11a and 11c overlap in a plan view. Career stages 11b and 11d overlap in a plan view.

[0342] The first front section 3a and the second front section 3b overlap in a plan view. Specifically, chamber 6 and chamber 7 overlap in a plan view. Processing unit 20 and processing unit 25 overlap in a plan view. Processing unit 21 and processing unit 26 overlap in a plan view. Processing unit 22 and processing unit 27 overlap in a plan view. Mounting section 23 and mounting section 28 overlap in a plan view. Conveying mechanism 24 and conveying mechanism 29 overlap in a plan view.

[0343] Similarly, the first rear section 5a and the second rear section 5b overlap in a plan view.

[0344] The mounting section 65 and the mounting section 66 overlap in a plan view. The transport mechanism 63 and the transport mechanism 64 overlap in a plan view.

[0345] In a plan view, the slider section 50 overlaps with the front block 3.

[0346] In a plan view, the slider portion 50 overlaps with the first front portion 3a.

[0347] In a plan view, the slider section 50 overlaps with the processing unit 21. The entire slider section 50 overlaps with the processing unit 21 in a plan view.

[0348] In a plan view, the slider section 50 does not overlap with the chamber 6. In a plan view, the slider section 50 does not overlap with the processing unit 20. In a plan view, the slider section 50 does not overlap with the processing unit 22. In a plan view, the slider section 50 does not overlap with the mounting section 23. In a plan view, the slider section 50 does not overlap with the transport mechanism 24.

[0349] In a plan view, the slider section 50 overlaps with the second front section 3b.

[0350] In a plan view, the slider section 50 overlaps with the processing unit 26. The entire slider section 50 overlaps with the processing unit 26 in a plan view.

[0351] In a plan view, the slider section 50 does not overlap with the chamber 7. In a plan view, the slider section 50 does not overlap with the processing unit 25. In a plan view, the slider section 50 does not overlap with the processing unit 27. In a plan view, the slider section 50 does not overlap with the mounting section 28. In a plan view, the slider section 50 does not overlap with the transport mechanism 29.

[0352] In a plan view, the slider section 50 does not overlap with the indexer section 2.

[0353] In a plan view, the slider section 50 does not overlap with the bridge section 60.

[0354] In a plan view, the slider section 50 does not overlap with the rear block 5.

[0355] In a plan view, the slider section 50 does not overlap with the first rear section 5a. In a plan view, the slider section 50 does not overlap with the chamber 6. In a plan view, the slider section 50 does not overlap with the processing unit 30. In a plan view, the slider section 50 does not overlap with the processing unit 31. In a plan view, the slider section 50 does not overlap with the processing unit 32. In a plan view, the slider section 50 does not overlap with the mounting section 33. In a plan view, the slider section 50 does not overlap with the transport mechanism 34.

[0356] In a plan view, the slider section 50 does not overlap with the second rear section 5b. In a plan view, the slider section 50 does not overlap with the chamber 8. In a plan view, the slider section 50 does not overlap with the processing unit 35. In a plan view, the slider section 50 does not overlap with the processing unit 36. In a plan view, the slider section 50 does not overlap with the processing unit 37. In a plan view, the slider section 50 does not overlap with the mounting section 38. In a plan view, the slider section 50 does not overlap with the transport mechanism 39.

[0357] In a plan view, the indexer section 2 does not overlap with the front block 3. In a plan view, the indexer section 2 does not overlap with the first front section 3a. In a plan view, the indexer section 2 does not overlap with the second front section 3b. In a plan view, the indexer section 2 does not overlap with the rear block 5. In a plan view, the indexer section 2 does not overlap with the first rear section 5a. In a plan view, the indexer section 2 does not overlap with the second rear section 5b.

[0358] The indexer section 2 does not overlap with the bridge section 60 in a plan view.

[0359] In a plan view, the bridge section 60 does not overlap with the front block 3. In a plan view, the bridge section 60 does not overlap with the first front section 3a. In a plan view, the bridge section 60 does not overlap with the second front section 3b. In a plan view, the bridge section 60 does not overlap with the rear block 5. In a plan view, the bridge section 60 does not overlap with the first rear section 5a. In a plan view, the bridge section 60 does not overlap with the second rear section 5b.

[0360] Refer to Figure 13. When the transport mechanism 12 and the transport mechanism 51 transfer the substrate W to each other, the support portion 53 overlaps with the processing unit 21 in a plan view.

[0361] When the support portion 53 is in the first position P1, the support portion 53 overlaps with the processing unit 21 in a plan view.

[0362] When the transport mechanism 62 and the transport mechanism 51 transfer the substrate W to each other, the support portion 53 overlaps with the processing unit 21 in a plan view.

[0363] When the support portion 53 is in the second position P2, the support portion 53 overlaps with the processing unit 21 in a plan view.

[0364] The first position P1 and the second position P2 are aligned in the front-to-back direction X. The second position P2 is positioned behind the first position P1.

[0365] The support portion 53 moves back and forth between the first position P1 and the second position P2.

[0366] Figure 13 shows the transport distance L. The transport distance L is the transport distance of the substrate W in the slider section 50. The transport distance L is, for example, the distance in the front-to-back direction X between the first position P1 and the second position P2.

[0367] The transport distance L is relatively short.

[0368] Figure 13 shows distance K. Distance K is the distance in the front-rear direction X between the indexer section 2 and the bridge section 60. Distance K corresponds to the distance in the front-rear direction X of the front block 3. Distance K corresponds to the distance in the front-rear direction X of the first front section 3a. Distance K corresponds to the distance in the front-rear direction X of the second front section 3b. The transport distance L is shorter than distance K.

[0369] Figure 16 is a detailed plan view of the bridge section 60. The transport mechanism 63 is positioned at the center of the bridge section 60 in the front-rear direction X. For example, the rotation axis A47 of the transport mechanism 63 is positioned at the center of the bridge section 60 in the front-rear direction X.

[0370] Figure 16 shows distances Da and Db. Distance Da is the distance in the longitudinal direction X between the transport mechanism 63 and the front block 3. Distance Db is the distance in the longitudinal direction X between the transport mechanism 63 and the rear block 5. Distance Da is equal to distance Db.

[0371] The conveying mechanism 62 is positioned in front of the conveying mechanism 63. For example, the rotation axis A15 of the conveying mechanism 62 is positioned in front of the rotation axis A47 of the conveying mechanism 63.

[0372] In the front-to-back direction X, the transport mechanism 62 is closer to the slider section 50 than the center of the bridge section 60. In the front-to-back direction X, the transport mechanism 62 is closer to the slider section 50 than the transport mechanism 63.

[0373] Figure 16 shows distance Dc. Distance Dc is the distance in the front-rear direction X between the transport mechanism 62 and the slider section 50. Distance Da corresponds to the distance in the front-rear direction X between the center of the bridge section 60 and the slider section 50. Distance Da corresponds to the distance in the front-rear direction X between the transport mechanism 63 and the slider section 50. Distance Dc is smaller than distance Da.

[0374] The mounting section 65 is positioned behind the transport mechanism 63. For example, the mounting section 65 is positioned behind the rotation axis A47 of the transport mechanism 63. In the front-rear direction X, the mounting section 65 is closer to the rear block 5 than to the center of the bridge section 60.

[0375] Figure 16 shows the distance Dd. Distance Dd is the distance in the longitudinal direction X between the mounting section 65 and the rear block 5. Distance Db corresponds to the distance in the longitudinal direction X between the center of the bridge section 60 and the rear block 5. Distance Dd is smaller than distance Db.

[0376] The mounting section 65 is close to the rear block 5. The substrate W placed on the mounting section 65 overlaps with the rear block 5 in a plan view. A portion of the substrate W placed on the mounting section 65 overlaps with the rear block 5 in a plan view. The mounting section 65 does not overlap with the rear block 5 in a plan view.

[0377] The distance Dd is smaller than the radius of the substrate W.

[0378] The mounting section 65 is closer to the rear block 5 than to the front block 3 in the front-rear direction X.

[0379] Figure 16 shows distance De. Distance De is the distance in the front-rear direction X between the mounting section 65 and the front block 3. Distance Dd is smaller than distance De.

[0380] The mounting section 33 is close to the bridge section 60. The substrate W placed on the mounting section 33 overlaps with the bridge section 60 in a plan view. A portion of the substrate W placed on the mounting section 33 overlaps with the bridge section 60 in a plan view. The mounting section 33 does not overlap with the bridge section 60 in a plan view.

[0381] Figure 16 shows the distance Df. Distance Df is the distance in the front-to-back direction X between the mounting section 33 and the bridge section 60. Distance Df is smaller than the radius of the substrate W.

[0382] The mounting section 33 is closer to the bridge section 60 than the mounting section 23.

[0383] Figure 16 shows the distance Dg. Distance Dg is the distance in the front-rear direction X between the mounting section 23 and the bridge section 60. Distance Df is smaller than distance Dg.

[0384] The substrate W placed on the mounting section 23 does not overlap with the bridge section 60 in a plan view. The mounting section 23 does not overlap with the bridge section 60 in a plan view. The distance Dg is greater than the radius of the substrate W.

[0385] The mounting section 65 is close to the mounting section 33. In a plan view, the substrate W placed on the mounting section 65 overlaps with the substrate W placed on the mounting section 33. In a plan view, a portion of the substrate W placed on the mounting section 65 overlaps with a portion of the substrate W placed on the mounting section 33.

[0386] Figure 16 shows the distance Ea. Distance Ea is the distance in the front-to-back direction X between the mounting section 65 and the mounting section 33. Distance Ea is shorter than the diameter of the substrate W.

[0387] The mounting section 65 is closer to the mounting section 33 than to the mounting section 23. In a plan view, the substrate W placed on the mounting section 65 does not overlap with the substrate W placed on the mounting section 23.

[0388] Figure 16 shows the distance Eb. Distance Eb is the distance in the front-to-back direction X between the mounting section 65 and the mounting section 23. Distance Ea is smaller than distance Eb. Distance Eb is larger than the diameter of the substrate W.

[0389] In a plan view, the substrate W placed on the mounting section 23 does not overlap with the substrate W placed on the mounting section 33.

[0390] The transport mechanism 64 is positioned in the same location as the transport mechanism 63 in a plan view. The mounting section 66 is positioned in the same location as the mounting section 65 in a plan view. The mounting section 28 is positioned in the same location as the mounting section 23 in a plan view. The mounting section 38 is positioned in the same location as the mounting section 33 in a plan view.

[0391] Refer to Figure 6. The first front section 3a and the second front section 3b are aligned in the vertical direction Z. The second front section 3b is positioned above the first front section 3a.

[0392] Processing units 21 and 26 are aligned in the vertical direction Z. Processing unit 26 is positioned above processing unit 21.

[0393] Multiple processing units 21 are arranged in the front-to-back direction X and the vertical direction Z. Multiple processing units 26 are arranged in the front-to-back direction X and the vertical direction Z.

[0394] The slider section 50 is provided so as to penetrate the front block 3.

[0395] The first front section 3a, the slider section 50, and the second front section 3b are arranged in this order in the vertical direction Z. The slider section 50 is positioned above the first front section 3a. The slider section 50 is positioned below the second front section 3b. The slider section 50 is positioned between the first front section 3a and the second front section 3b.

[0396] The processing unit 21, the slider unit 50, and the processing unit 26 are arranged in this order in the vertical direction Z. The processing unit 21 is positioned below the slider unit 50. The processing unit 26 is positioned above the slider unit 50. The slider unit 50 is positioned between the processing unit 21 and the processing unit 26.

[0397] The transport mechanisms 63 and 64 are aligned in the vertical direction Z. Transport mechanism 64 is positioned above transport mechanism 63.

[0398] The transport mechanism 63 is positioned at the same height as the first front section 3a. The transport mechanism 63 is positioned at the same height as the first rear section 5a.

[0399] The transport mechanism 64 is positioned at the same height as the second front section 3b. The transport mechanism 64 is positioned at the same height as the second rear section 5b.

[0400] The first rear section 5a and the second rear section 5b are aligned in the vertical direction Z. The second rear section 5b is positioned above the first rear section 5a.

[0401] Processing units 31 and 36 are aligned in the vertical direction Z. Processing unit 36 ​​is positioned above processing unit 31.

[0402] Multiple processing units 31 are arranged in the front-to-back direction X and the vertical direction Z. Multiple processing units 36 are arranged in the front-to-back direction X and the vertical direction Z.

[0403] At least one processing unit 21 is in contact with the bridge section 60. For example, the adhesion strengthening processing unit PAHP of processing unit 21 is in contact with the bridge section 60.

[0404] At least one processing unit 21 is adjacent to the transport mechanism 63. For example, the adhesion strengthening processing unit PAHP of processing unit 21 is adjacent to the transport mechanism 63.

[0405] At least one processing unit 31 is in contact with the bridge section 60. For example, the adhesion strengthening processing unit PAHP of processing unit 31 is in contact with the bridge section 60.

[0406] At least one processing unit 31 is adjacent to the transport mechanism 63. For example, the adhesion strengthening processing unit PAHP of processing unit 31 is adjacent to the transport mechanism 63.

[0407] At least one processing unit 26 is in contact with the bridge section 60. For example, the adhesion strengthening processing unit PAHP of processing unit 26 is in contact with the bridge section 60.

[0408] At least one processing unit 26 is adjacent to the transport mechanism 64. For example, the adhesion strengthening processing unit PAHP of processing unit 26 is adjacent to the transport mechanism 64.

[0409] At least one processing unit 36 ​​is in contact with the bridge section 60. For example, the adhesion strengthening processing unit PAHP of processing unit 26 is in contact with the bridge section 60.

[0410] At least one processing unit 36 ​​is adjacent to the transport mechanism 64. For example, the adhesion strengthening processing unit PAHP of processing unit 36 ​​is adjacent to the transport mechanism 64.

[0411] Refer to Figure 7. Chambers 6 and 7 are aligned in the vertical direction Z. Chamber 7 is positioned above chamber 6.

[0412] Multiple chambers 6 are arranged vertically in the Z direction. For example, chamber 6b is positioned above chamber 6a. Chamber 6c is positioned above chamber 6b. Chamber 6d is positioned above chamber 6c. Similarly, multiple chambers 7 are arranged vertically in the Z direction.

[0413] Processing units 20 and 25 are aligned in the vertical direction Z. Processing unit 25 is positioned above processing unit 20.

[0414] Multiple processing units 20 are arranged in the front-to-back direction X and the vertical direction Z. Multiple processing units 25 are arranged in the front-to-back direction X and the vertical direction Z.

[0415] Chambers 8 and 9 are aligned in the vertical direction Z. Chamber 9 is positioned above chamber 8.

[0416] Multiple chambers 8 are arranged vertically in the Z direction. For example, chamber 8b is positioned above chamber 8a. Chamber 8c is positioned above chamber 8b. Chamber 8d is positioned above chamber 8c. Similarly, multiple chambers 9 are arranged vertically in the Z direction.

[0417] Processing units 30 and 35 are aligned in the vertical direction Z. Processing unit 35 is positioned above processing unit 30.

[0418] Multiple processing units 30 are arranged in the front-to-back direction X and the vertical direction Z. Multiple processing units 35 are arranged in the front-to-back direction X and the vertical direction Z.

[0419] Chamber 8 is positioned at the same height as Chamber 6. For example, Chamber 8a is positioned at the same height as Chamber 6a. Chamber 8b is positioned at the same height as Chamber 6b.

[0420] The processing unit 30 is positioned at the same height as the processing unit 20.

[0421] Chamber 9 is positioned at the same height as Chamber 7.

[0422] The processing unit 35 is positioned at the same height as the processing unit 25.

[0423] Chamber 6 is adjacent to cabinet section 4.

[0424] Chamber 7 is adjacent to cabinet section 4.

[0425] Chamber 8 is adjacent to cabinet section 4.

[0426] Chamber 9 is adjacent to cabinet section 4.

[0427] At least one processing unit 20 is adjacent to the cabinet section 4.

[0428] At least one processing unit 25 is adjacent to the cabinet section 4.

[0429] At least one processing unit 30 is adjacent to the cabinet section 4.

[0430] At least one processing unit 35 is adjacent to the cabinet section 4.

[0431] Refer to Figure 8. For convenience, the slider section 50 is shown with a dashed line in Figure 8. In a front view, the slider section 50 is located on the first side of the transport mechanism 12. In a front view, the slider section 50 does not overlap with the rotating section 15 of the transport mechanism 12. In a front view, the slider section 50 does not overlap with the rotation axis A15 of the transport mechanism 12.

[0432] In a front view, the carrier stage 11a, the slider section 50, and the carrier stage 11c are aligned in the vertical Z direction in this order. In a front view, the carrier stage 11a is positioned below the slider section 50. In a front view, the carrier stage 11c is positioned above the slider section 50. In a front view, the slider section 50 is positioned between the carrier stage 11a and the carrier stage 11c. In a front view, the slider section 50 does not overlap with the carrier stage 11.

[0433] Refer to Figure 9. The movable elements 54a and 54b are aligned in the vertical direction Z. Movable element 54b is positioned above movable element 54a.

[0434] The transport mechanisms 24 and 29 are aligned in the vertical direction Z. Transport mechanism 29 is positioned above transport mechanism 24.

[0435] The transport mechanism 24 is configured to move to the same height position as the slider section 50.

[0436] For example, the slider section 50 includes a lower section 50a. The movable element 54a is positioned on the lower section 50a. The transport mechanism 24 is configured to move to the same height position as the lower section 50a.

[0437] The processing unit 21 and the slider section 50 are aligned in the vertical direction Z. Multiple processing units 20 are aligned in the vertical direction Z. At least one of the processing units 20 is positioned at the same height as the slider section 50.

[0438] Processing unit 20 includes processing unit 20H. Processing unit 20H is positioned at the highest position among the multiple processing units 20. Processing unit 20H is positioned at the same height as the lower part 50a. Therefore, the number of processing units 20 is relatively large.

[0439] As described above, the transport mechanism 24 is configured to move to the same height position as the slider section 50. Therefore, it is easy for the transport mechanism 24 to transport the substrate W to the processing unit 20H.

[0440] The transport mechanism 29 is configured to move to the same height position as the slider section 50.

[0441] For example, the slider section 50 includes an upper section 50b. The upper section 50b is located above the lower section 50a. The movable element 54b is positioned on the upper section 50b. The transport mechanism 29 is configured to move to the same height as the upper section 50b.

[0442] The processing unit 26 and the slider section 50 are aligned in the vertical direction Z. Multiple processing units 25 are aligned in the vertical direction Z. At least one of the processing units 25 is positioned at the same height as the slider section 50.

[0443] Processing unit 25 includes processing unit 25L. Processing unit 25L is positioned at the lowest position among the multiple processing units 25. Processing unit 25L is positioned at the same height as the upper part 50b. Therefore, the number of processing units 25 is relatively large.

[0444] As described above, the transport mechanism 29 is configured to move to the same height position as the slider section 50. Therefore, it is easy for the transport mechanism 29 to transport the substrate W to the processing unit 25L.

[0445] The mounting sections 23 and 28 are aligned in the vertical direction Z. Mounting section 28 is positioned above mounting section 23.

[0446] The mounting section 23 is positioned below the slider section 50. The mounting section 28 is positioned above the slider section 50.

[0447] Although not shown in the diagram, processing units 22 and 27 are aligned in the vertical direction Z. Processing unit 27 is positioned above processing unit 22.

[0448] Refer to Figure 10. The mounting sections 65 and 66 are aligned in the vertical direction Z. Mounting section 66 is positioned above mounting section 65.

[0449] In Figure 10, for convenience, the slider section 50 is shown with a dashed line. The mounting section 65 is positioned below the slider section 50. The mounting section 66 is positioned above the slider section 50.

[0450] In Figure 10, for convenience, mounting sections 23 and 28 are shown with dashed lines. Mounting section 65 is located above mounting section 23. Mounting section 65 is located below mounting section 28.

[0451] The mounting section 66 is positioned above the mounting section 28.

[0452] Figure 10 shows the mounting sections 33 and 38 with dashed lines for convenience. Mounting section 33 is positioned at the same height as mounting section 23. Mounting section 33 overlaps with mounting section 23 in a front view. Mounting section 38 is positioned at the same height as mounting section 28. Mounting section 38 overlaps with mounting section 33 in a front view.

[0453] The mounting section 65 is positioned above the mounting section 33. The mounting section 65 is positioned below the mounting section 38.

[0454] The mounting section 66 is positioned above the mounting section 38.

[0455] Refer to Figure 11. The transport mechanisms 34 and 39 are aligned in the vertical direction Z. Transport mechanism 39 is positioned above transport mechanism 34.

[0456] The mounting sections 33 and 38 are aligned in the vertical direction Z. Mounting section 38 is positioned above mounting section 33.

[0457] Although not shown in the diagram, processing units 32 and 37 are aligned in the vertical direction Z. Processing unit 37 is positioned above processing unit 32.

[0458] Figure 17 is a detailed plan view of the cabinet section 4. When the processing liquid containers 71a and 71b are not distinguished, they are simply referred to as "processing liquid container 71". The processing liquid container 71 is positioned at the center of the cabinet section 4 in the front-to-back direction X.

[0459] Figure 17 shows the center Q4. The center Q4 passes through the center of the cabinet section 4 in the front-to-back direction X. The center Q4 is a virtual plane perpendicular to the front-to-back direction X. The processing liquid container 71 is positioned at the center Q4 in the front-to-back direction X.

[0460] Multiple processing liquid containers 71 are arranged in the front-to-back direction X and the width direction Y.

[0461] When trap tanks 82a and 82b are not distinguished, they are simply referred to as "trap tank 82". Multiple trap tanks 82 are arranged in the width direction Y.

[0462] The trap tank 82 is positioned at the center Q4 in the longitudinal direction X.

[0463] Some of the processing liquid containers 71 are positioned in front of the trap tank 82. Other processing liquid containers 71 are positioned behind the trap tank 82.

[0464] When the aforementioned pumps 91Fa1, 91Fa2, 91Fb1, 91Fb2, 91Ra1, 91Ra2, 91Rb1, and 91RFb2 are not distinguished, they are simply referred to as "pump 91". Pump 91 is an example of the first, third, and fifth pumps of the present invention.

[0465] Multiple pumps 91 are arranged in the front-to-back direction X and the width direction Y.

[0466] In a plan view, the pump 91 overlaps with the processing liquid container 71.

[0467] In a plan view, the pump 91 overlaps with the trap tank 82.

[0468] When pumps 92Fa1, 92Fa2, 92Fb1, and 92Fb2 are not distinguished, they are simply referred to as "pump 92F". Pump 92F is an example of the second and sixth pumps of the present invention.

[0469] Multiple pumps 92F are arranged in the width direction Y. For example, pumps 92Fa1 and 92Fb1 are arranged in the width direction Y. For example, pumps 92Fa2 and 92Fb2 are arranged in the width direction Y.

[0470] Pump 92F is closer to the front block 3 than to the center Q4 in the longitudinal direction X. Specifically, the distance between pump 92F and the front block 3 in the longitudinal direction X is smaller than the distance between the center Q4 and the front block 3 in the longitudinal direction X.

[0471] Pump 92F is closer to the front block 3 than the processing liquid container 71 in the longitudinal direction X. Specifically, the distance between pump 92F and front block 3 in the longitudinal direction X is smaller than the distance between processing liquid container 71 and front block 3 in the longitudinal direction X.

[0472] The pump 92F and the processing liquid container 71 are aligned in the front-to-back direction X. The pump 92F is positioned in front of the processing liquid container 71.

[0473] In a plan view, the pump 92F does not overlap with the processing liquid container 71.

[0474] Pump 92F is closer to the front block 3 than the trap tank 82 in the longitudinal direction X. Specifically, the distance between pump 92F and the front block 3 in the longitudinal direction X is smaller than the distance between the trap tank 82 and the front block 3 in the longitudinal direction X.

[0475] Pump 92F and trap tank 82 are aligned in the front-to-back direction X. Pump 92F is positioned in front of trap tank 82.

[0476] In a plan view, pump 92F does not overlap with trap tank 82.

[0477] Pump 92F is closer to the front block 3 than pump 91 in the longitudinal direction X. Specifically, the distance between pump 92F and the front block 3 in the longitudinal direction X is smaller than the distance between pump 91 and the front block 3 in the longitudinal direction X.

[0478] Pumps 92F and 91 are aligned in the front-to-back direction X. Pump 92F is positioned in front of pump 91.

[0479] Pump 92F does not overlap with pump 91 in a plan view.

[0480] Pump 92F is close to boundary Q1.

[0481] The cabinet section 4 is equipped with a partition wall 4F. The partition wall 4F is positioned between the cabinet section 4 and the front block 3. For example, the partition wall 4F is positioned on boundary Q1. The partition wall 4F separates the cabinet section 4 and the front block 3. The partition wall 4F extends in the width direction Y and the vertical direction Z.

[0482] Pump 92F will be installed on the bulkhead at floor 4.

[0483] When pumps 92Ra1, 92Ra2, 92Rb1, and 92Rb2 are not distinguished, they are simply referred to as "pump 92R". Pump 92R is an example of the fourth pump of the present invention.

[0484] Multiple pumps 92R are arranged in the width direction Y. For example, pumps 92Ra1 and 92Rb1 are arranged in the width direction Y. For example, pumps 92Ra2 and 92Rb2 are arranged in the width direction Y.

[0485] Pump 92R is closer to the rear block 5 than to the center Q4 of the cabinet section 4 in the longitudinal direction X. Specifically, the distance between pump 92R and the rear block 5 in the longitudinal direction X is smaller than the distance between the center Q4 of the cabinet section 4 and the rear block 5 in the longitudinal direction X.

[0486] Pump 92R is closer to the rear block 5 than the processing liquid container 71 in the longitudinal direction X. Specifically, the distance between pump 92R and rear block 5 in the longitudinal direction X is smaller than the distance between the processing liquid container 71 and rear block 5 in the longitudinal direction X.

[0487] The pump 92R and the processing liquid container 71 are aligned in the front-to-back direction X. The pump 92R is positioned behind the processing liquid container 71.

[0488] In a plan view, the pump 92R does not overlap with the processing liquid container 71.

[0489] Pump 92R is closer to the rear block 5 than the trap tank 82 in the longitudinal direction X. Specifically, the distance between pump 92R and rear block 5 in the longitudinal direction X is smaller than the distance between the trap tank 82 and rear block 5 in the longitudinal direction X.

[0490] The pump 92R and the trap tank 82 are aligned in the front-to-back direction X. The pump 92R is positioned behind the trap tank 82.

[0491] Pump 92R does not overlap with trap tank 82 in a plan view.

[0492] Pump 92R is closer to the rear block 5 than pump 91 in the longitudinal direction X. Specifically, the distance between pump 92R and the rear block 5 in the longitudinal direction X is smaller than the distance between pump 91 and the rear block 5 in the longitudinal direction X.

[0493] Pumps 92R and 91 are aligned in the front-to-back direction X. Pump 92R is positioned behind pump 91.

[0494] Pump 92R does not overlap with pump 91 in a plan view.

[0495] Pumps 92R and 92F are aligned in the front-to-back direction X. Pump 92R is positioned behind Pump 92F.

[0496] Pump 92R does not overlap with pump 92F in a plan view.

[0497] Pump 92R is close to boundary Q2.

[0498] The cabinet section 4 is equipped with a partition wall 4R. The partition wall 4R is positioned between the cabinet section 4 and the rear block 5. For example, the partition wall 4R is positioned on boundary Q2. The partition wall 4R separates the cabinet section 4 and the rear block 5. The partition wall 4R extends in the width direction Y and the vertical direction Z.

[0499] Pump 92R is mounted on bulkhead 4R.

[0500] Figure 18 is a detailed side view of the cabinet section 4. The processing liquid container 71 is positioned at the same height as the chamber 6. The processing liquid container 71 is positioned at the same height as the chamber 8.

[0501] Although not shown in the diagram, the trap tank 82 is positioned at the same height as the processing liquid container 71. The trap tank 82 is positioned at the same height as the chambers 6 and 8.

[0502] The multiple processing liquid containers 71 are further arranged in the vertical direction Z.

[0503] Pump 91 is positioned at the same height as chamber 6. Pump 91 is positioned at the same height as chamber 8.

[0504] The multiple pumps 91 are further aligned in the vertical direction Z.

[0505] The processing liquid container 71 and the pump 91 are aligned in the vertical direction Z. The pump 91 is positioned lower than the processing liquid container 71. The pump 91 is positioned below the processing liquid container 71.

[0506] More specifically, the processing liquid containers 71 and pumps 91 are arranged alternately in the vertical direction Z. For example, pumps 91Fa1, 91Fa2, 91Ra1, and 91Ra2 are positioned below the processing liquid container 71a. Pumps 91Fa1, 91Fa2, 91Ra1, and 91Ra2 are in communication with the processing liquid container 71a. Pumps 91Fa1, 91Fa2, 91Ra1, and 91Ra2 are positioned at the same height relative to each other.

[0507] The processing liquid container 71b is located below pumps 91Fa1, 91Fa2, 91Ra1, and 91Ra2. Pumps 91Fb1, 91Fb2, 91Rb1, and 91Rb2 are located below the processing liquid container 71b. Pumps 91Fb1, 91Fb2, 91Rb1, and 91Rb2 are in communication with the processing liquid container 71b. Pumps 91Fb1, 91Fb2, 91Rb1, and 91Rb2 are located at the same height relative to each other.

[0508] Multiple pumps 92F are further aligned in the vertical direction Z.

[0509] Pump 92F is positioned at the same height as chamber 6.

[0510] For example, the pump 92Fa1 is positioned at the same height as the chamber 6a. At least a portion of the pump 92Fa1 is positioned at the same height as at least a portion of the chamber 6a. The pump 92Fa1 communicates with the chamber 6a.

[0511] Pump 92Fb1 is also positioned at the same height as chamber 6a. Pump 92Fb1 is also in communication with chamber 6a.

[0512] Pump 92Fb1 is positioned at the same height as pump 92Fa1.

[0513] For example, pump 92Fa2 is positioned at the same height as chamber 6c. Pump 92Fa2 is in communication with chamber 6c.

[0514] Pump 92Fa2 is positioned above pump 92Fa1.

[0515] Pump 92Fb2 is also positioned at the same height as chamber 6c. Pump 92Fb2 is also in communication with chamber 6c.

[0516] Pump 92Fb2 is positioned at the same height as pump 92Fa2. Pump 92Fb2 is positioned above pump 92Fa1. Pump 92Fb2 is positioned above pump 92Fb1.

[0517] The height position of pump 92Fa1 will be explained in detail.

[0518] Chamber 6a has a lower end 6aB. At least a portion of the pump 92Fa1 is positioned higher than the lower end 6aB. For example, the entire pump 92Fa1 is positioned higher than the lower end 6aB.

[0519] Chamber 6a has an upper end 6aT. At least a portion of the pump 92Fa1 is positioned lower than the upper end 6aT. For example, the entire pump 92Fa1 is positioned lower than the upper end 6aT.

[0520] Pump 92Fa1 is positioned lower than chamber 6b. The entirety of pump 92Fa1 is positioned lower than the entirety of chamber 6b.

[0521] At least a portion of the pump 92Fa1 is positioned lower than the nozzle 42 in the chamber 6a. For example, the entire pump 92Fa1 is positioned lower than the nozzle 42 in the chamber 6a.

[0522] Although not shown in the diagram, the nozzle 42 has an outlet for discharging the processing liquid. At least a portion of the pump 92Fa1 is positioned lower than the outlet of the nozzle 42 in the chamber 6a. For example, the entire pump 92Fa1 is positioned lower than the outlet of the nozzle 42 in the chamber 6a.

[0523] Figure 18 shows the height position V. Height position V indicates the height of the discharge port of the nozzle 42 in chamber 6a. At least a portion of the pump 92Fa1 is lower than height position V.

[0524] The pump 92Fa1 is positioned at the same height as the cup 43 of the chamber 6a. At least a portion of the pump 92Fa1 is positioned at the same height as at least a portion of the cup 43 of the chamber 6a.

[0525] The cup 43 has an upper end 43T. At least a portion of the pump 92Fa1 is positioned lower than the upper end 43T. For example, the entire pump 92Fa1 is positioned lower than the upper end 43T.

[0526] The positional relationship between pump 92Fb1 and chambers 6a and 6b in the vertical Z direction is the same as the positional relationship between pump 92Fa1 and chambers 6a and 6b in the vertical Z direction.

[0527] The positional relationship in the vertical Z direction between pumps 92Fa2 and 92Fb2 and chambers 6c and 6d is the same as the positional relationship in the vertical Z direction between pump 92Fa1 and chambers 6a and 6b.

[0528] Multiple pumps 92R are further aligned in the vertical Z direction.

[0529] Pump 92R is positioned at the same height as chamber 8.

[0530] For example, pump 92Ra1 is positioned at the same height as chamber 8a. At least a portion of pump 92Fa1 is positioned at the same height as at least a portion of chamber 8a. Pump 92Ra1 communicates with chamber 8a.

[0531] Pump 92Rb1 is also positioned at the same height as chamber 8a. Pump 92Ra1 is also connected to chamber 8a.

[0532] Pump 92Rb1 is positioned at the same height as pump 92Ra1.

[0533] For example, pump 92Ra2 is positioned at the same height as chamber 8c. Pump 92Ra2 is in communication with chamber 8c.

[0534] Pump 92Ra2 is positioned above pump 92Ra1.

[0535] Pump 92Rb2 is also positioned at the same height as chamber 8c. Pump 92Rb2 is also in communication with chamber 8c.

[0536] Pump 92Rb2 is positioned at the same height as pump 92Ra2. Pump 92Rb2 is positioned above pump 92Ra1. Pump 92Rb2 is positioned above pump 92Fb1.

[0537] The positional relationship in the vertical Z direction between pumps 92Ra1 and 92Rb1 and chambers 8a and 8b is the same as the positional relationship in the vertical Z direction between pump 92Fa1 and chambers 6a and 6b.

[0538] The positional relationship in the vertical Z direction between pumps 92Ra2 and 92Rb2 and chambers 8c and 8d is the same as the positional relationship in the vertical Z direction between pump 92Fa1 and chambers 6a and 6b.

[0539] Pump 92R is positioned at the same height as pump 92F. For example, pump 92Ra1 is positioned at the same height as pump 92Fa1. Pump 92Rb1 is positioned at the same height as pump 92Fb1. Pump 92Ra2 is positioned at the same height as pump 92Fa2. Pump 92Rb2 is positioned at the same height as pump 92Fb2.

[0540] For example, pumps 92Fa1, 92Fb1, 92Ra1, and 92Rb1 are placed at the same height. Pumps 92Fa2, 92Fb2, 92Ra2, and 92Rb2 are placed at the same height.

[0541] Although not shown in the diagram, for example, the liquid delivery unit 79Ra1 is located at the same height as the liquid delivery unit 79Fa1. The liquid delivery unit 79Rb1 is located at the same height as the liquid delivery unit 79Fb1. The liquid delivery unit 79Ra2 is located at the same height as the liquid delivery unit 79Fa2. The liquid delivery unit 79Rb2 is located at the same height as the liquid delivery unit 79Fb2.

[0542] For example, the liquid delivery units 79Fa1, 79Fb1, 79Ra1, and 79Rb1 are positioned at the same height. The liquid delivery units 79Fa2, 79Fb2, 79Ra2, and 79Rb2 are positioned at the same height.

[0543] Although not shown in the diagram, pipe 72Ra1 has the same length as pipe 72Fa1. Pipe 72Ra2 has the same length as pipe 72Fa2. Pipe 72Rb1 has the same length as pipe 72Fb1. Pipe 72Rb2 has the same length as pipe 72Fb2.

[0544] For example, pipes 72Fa1, 72Fb1, 72Ra1, and 72Rb1 have the same length. Pipes 72Fa2, 72Fb2, 72Ra2, and 72Rb2 have the same length.

[0545] <7. Example of Operation> An example of the operation of the substrate processing device 1 will be explained.

[0546] Figure 19 is a schematic side view of the substrate processing apparatus 1, illustrating its operation. For convenience, the multiple substrates W are referred to as substrates Wa, Wb, Wc, and Wd.

[0547] The slider unit 50 transports the substrates Wa, Wb, Wc, and Wd from the indexer unit 2 to the bridge unit 60.

[0548] The bridge unit 60 performs input and distribution. This allows the bridge unit 60 to transport substrates Wa, Wb, Wc, and Wd from the slider unit 50 to the front block 3 and rear block 5. Specifically, the bridge unit 60 transports substrate Wa from the slider unit 50 to the first front section 3a. The bridge unit 60 transports substrate Wb from the slider unit 50 to the first rear section 5a. The bridge unit 60 transports substrate Wc from the slider unit 50 to the second front section 3b. The bridge unit 60 transports substrate Wd from the slider unit 50 to the second rear section 5b.

[0549] The first front section 3a processes substrate Wa. The first rear section 5a processes substrate Wb. The second front section 3b processes substrate Wc. The second rear section 5b processes substrate Wd.

[0550] The bridge unit 60 performs retrieval and discharge. This allows the bridge unit 60 to transport substrates Wa, Wb, Wc, and Wd from the front block 3 and rear block 5 to the slider unit 50. Specifically, the bridge unit 60 transports substrate Wa from the first front unit 3a to the slider unit 50. The bridge unit 60 transports substrate Wb from the first rear unit 5a to the slider unit 50. The bridge unit 60 transports substrate Wc from the second front unit 3b to the slider unit 50. The bridge unit 60 transports substrate Wd from the second rear unit 5b to the slider unit 50.

[0551] The slider unit 50 transports the substrates Wa, Wb, Wc, and Wd from the bridge unit 60 to the indexer unit 2.

[0552] Figure 20 is a schematic diagram showing the transport path of the substrate W. In Figure 20, the path through which multiple substrates W are transported at once is shown by double lines. However, one substrate W may be transported at a time along the path shown by the double lines. Figure 21 is a schematic side view showing an example of the operation of the substrate processing apparatus 1. Figure 21 shows the transport operation T1-T20.

[0553] Transport operation T1 The transport mechanism 12 picks up multiple substrates W of carrier C on the carrier stage 11 at once.

[0554] Transport operation T2 The transport mechanism 12 transports multiple substrates W from the indexer section 2 to the slider section 50 at once. The transport mechanism 12 also places multiple substrates W onto the transport mechanism 51 at once.

[0555] Through transport operations T1 and T2, the transport mechanism 12 transports multiple substrates W from the carrier C to the transport mechanism 51 at once.

[0556] Transport operation T3 The transport mechanism 51 transports multiple substrates W from the first position P1 to the second position P2 at once. In this way, the transport mechanism 51 transports multiple substrates W from the indexer section 2 to the bridge section 60 at once. In other words, the transport mechanism 51 transports multiple substrates W from the transport mechanism 12 to the transport mechanism 62 at once.

[0557] Transport operation T4 The transport operation T4 corresponds to the "grabbing" described above. The transport mechanism 62 picks up multiple substrates W from the transport mechanism 51 at once. The transport mechanism 62 transports multiple substrates W from the slider section 50 to the bridge section 60 at once.

[0558] Transport operations T5a, T5b The transport mechanism 62 places multiple substrates W on the mounting section 65 at once. The transport mechanism 62 also places multiple substrates W on the mounting section 66 at once.

[0559] During transport operations T4 and T5a, the transport mechanism 62 transports multiple substrates W from the transport mechanism 51 to the mounting section 65 at once. During transport operations T4 and T5b, the transport mechanism 62 transports multiple substrates W from the transport mechanism 51 to the mounting section 66 at once.

[0560] Transport operation T6a The transport mechanism 63 picks up one substrate W from the mounting section 65 at once.

[0561] Transport operation T6b The transport mechanism 64 picks up one substrate W from the mounting section 66 at once.

[0562] Transport operations T4, T5a, and T6a cause transport mechanism 62 to transport substrate W from transport mechanism 51 to transport mechanism 63. Transport operations T4, T5b, and T6b cause transport mechanism 62 to transport substrate W from transport mechanism 51 to transport mechanism 64.

[0563] Conveyor operations T7a, T7b The transport operations T7a and T7b correspond to the "distribution" described above. The transport mechanism 63 transports the substrate W from the bridge section 60 to the first front section 3a. A part of the transport mechanism 63 enters the first front section 3a. The support section 47d of the transport mechanism 63 enters the first front section 3a. The transport mechanism 63 places the substrate W on one of the processing units 21. Specifically, the transport mechanism 63 places the substrate W on the adhesion strengthening processing unit PAHP of the processing unit 21. Similarly, the transport mechanism 63 transports the substrate W from the bridge section 60 to the first rear section 5a. A part of the transport mechanism 63 enters the first rear section 5a. The support section 47d of the transport mechanism 63 enters the first rear section 5a. The transport mechanism 63 places the substrate W on one of the processing units 31. Specifically, the transport mechanism 63 places the substrate W on the adhesion strengthening processing unit PAHP of the processing unit 31.

[0564] Conveyor operation T7c, T7d The transport operations T7c and T7d correspond to the "distribution" described above. The transport mechanism 64 transports the substrate W from the bridge section 60 to the second front section 3b. A part of the transport mechanism 64 enters the second front section 3b. The support section 47d of the transport mechanism 64 enters the second front section 3b. The transport mechanism 64 places the substrate W on one of the processing units 26. Specifically, the transport mechanism 64 places the substrate W on the adhesion strengthening processing unit PAHP of the processing unit 26. Similarly, the transport mechanism 64 transports the substrate W from the bridge section 60 to the second rear section 5b. A part of the transport mechanism 64 enters the second rear section 5b. The support section 47d of the transport mechanism 64 enters the second rear section 5b. The transport mechanism 64 places the substrate W on one of the processing units 36. Specifically, the transport mechanism 64 places the substrate W on the adhesion strengthening processing unit PAHP of the processing unit 36.

[0565] In transport operations T5a, T6a, and T7a, the transport mechanism 63 transports the substrate W from the transport mechanism 62 to the processing unit 21. In transport operations T5a, T6a, and T7b, the transport mechanism 63 transports the substrate W from the transport mechanism 62 to the processing unit 31.

[0566] In transport operations T5b, T6b, and T7c, the transport mechanism 64 transports the substrate W from the transport mechanism 62 to the processing unit 26. In transport operations T5b, T6b, and T7d, the transport mechanism 64 transports the substrate W from the transport mechanism 62 to the processing unit 36.

[0567] The operation in the first front section 3a will now be explained. The adhesion strengthening processing unit PAHP performs adhesion strengthening processing on the substrate W. The transport mechanism 24 takes the substrate W from the adhesion strengthening processing unit PAHP (transport operation T8a). The transport mechanism 24 places the substrate W in the chamber 6 (transport operation T9a). Specifically, the transport mechanism 24 places the substrate W on the processing unit 20.

[0568] Chamber 6 performs liquid treatment on the substrate W. The processing unit 20 performs liquid treatment on the substrate W. For example, the liquid supply unit 79Fa sends the processing liquid Ra from the processing liquid container 71a to the chamber 6a. The chamber 6a supplies the processing liquid Ra to the substrate W.

[0569] Subsequently, the transport mechanism 24 takes the substrate W from the chamber 6 (transport operation T10a). The transport mechanism 24 takes the substrate W from the processing unit 20. The transport mechanism 24 places the substrate W on the heating / cooling unit PHP (transport operation T11a). The heating / cooling unit PHP heats the substrate W, and then cools the substrate W. The transport mechanism 24 takes the substrate W from the heating / cooling unit PHP (transport operation T12a). The transport mechanism 24 places the substrate W on the processing unit 22 (transport operation T13a). The processing unit 22 cools the substrate W. The transport mechanism 24 takes the substrate W from the processing unit 22 (transport operation T14a). The transport mechanism 24 places the substrate W on the mounting section 23 (transport operation T15a).

[0570] Each time the first front section 3a repeats the transport operation T15a, the number of substrates W placed on the mounting section 23 increases by one.

[0571] The operation of the first rear section 5a is the same as the operation of the first front section 3a. The operations of the second front section 3b and the second rear section 5b are also the same as the operation of the first front section 3a.

[0572] Transport operations T16a, T16b, T16c, T16d The transport operations T16a, T16b, T16c, and T16d correspond to the "recovery" described above. Part of the transport mechanism 62 enters the first front section 3a. The support section 16 of the transport mechanism 62 enters the first front section 3a. The transport mechanism 62 picks up multiple substrates W from the mounting section 23 at once. The transport mechanism 62 transports multiple substrates W from the first front section 3a to the bridge section 60 at once. Similarly, part of the transport mechanism 62 enters the first rear section 5a. The support section 16 of the transport mechanism 62 enters the first rear section 5a. The transport mechanism 62 picks up multiple substrates W from the mounting section 33 at once. The transport mechanism 62 transports multiple substrates W from the first rear section 5a to the bridge section 60 at once. Part of the transport mechanism 62 enters the second front section 3b. The support section 16 of the transport mechanism 62 enters the second front section 3b. The transport mechanism 62 picks up multiple substrates W from the mounting section 28 at once. The transport mechanism 62 transports multiple substrates W from the second front section 3b to the bridge section 60 at once. Part of the transport mechanism 62 enters the second rear section 5b. The support section 16 of the transport mechanism 62 enters the second rear section 5b. The transport mechanism 62 picks up multiple substrates W from the mounting section 38 at once. The transport mechanism 62 transports multiple substrates W from the second rear section 5b to the bridge section 60 at once.

[0573] Transport operation T17 The transport operation T17 corresponds to the "dispensing" described above. Part of the transport mechanism 62 enters the slider section 50. The support section 16 of the transport mechanism 62 enters the slider section 50. The transport mechanism 62 transports multiple substrates W from the bridge section 60 to the slider section 50 at once. The transport mechanism 62 places multiple substrates W onto the transport mechanism 51 at once (transport operation T17).

[0574] In transport operations T16a and T17, the transport mechanism 62 transports multiple substrates W from the mounting section 23 to the transport mechanism 51 at once. In transport operations T16b and T17, the transport mechanism 62 transports multiple substrates W from the mounting section 33 to the transport mechanism 51 at once. In transport operations T16c and T17, the transport mechanism 62 transports multiple substrates W from the mounting section 28 to the transport mechanism 51 at once. In transport operations T16d and T17, the transport mechanism 62 transports multiple substrates W from the mounting section 38 to the transport mechanism 51 at once.

[0575] Transport operation T18 The transport mechanism 51 transports multiple substrates W from the second position P2 to the first position P1 at once. As a result, the transport mechanism 51 transports multiple substrates W from the bridge section 60 to the indexer section 2 at once. In other words, the transport mechanism 51 transports multiple substrates W from the transport mechanism 62 to the transport mechanism 12 at once.

[0576] Transport operation T19 The transport mechanism 12 picks up multiple substrates W from the transport mechanism 51 at once. The transport mechanism 12 transports multiple substrates W from the slider section 50 to the indexer section 2 at once.

[0577] Transport operation T20 The transport mechanism 12 places multiple substrates W on the carrier C on the carrier stage 11 at once.

[0578] Through transport operations T19 and T20, the transport mechanism 12 transports multiple substrates W from the transport mechanism 51 to the carrier C at once.

[0579] When transport operations T1-T20 are not distinguished, they are collectively referred to as transport operation T. The number of transport operations T for substrate processing apparatus 1 is, for example, 20. The number of transport operations T for transport mechanism 12 is 4. The number of transport operations T for transport mechanism 51 is 2. The number of transport operations T for transport mechanism 61 is 14. The number of transport operations T for transport mechanism 62 is 8. The number of transport operations T for transport mechanism 63 is 3. The number of transport operations T for transport mechanism 64 is 3. The number of transport operations T for transport mechanism 24 is 8. The number of transport operations T for each of transport mechanisms 34 is 8. The number of transport operations T for each of transport mechanisms 29 is 8. The number of transport operations T for each of transport mechanisms 39 is 8.

[0580] <8. Effects of the Embodiment> The substrate processing apparatus 1 comprises a front block 3, a cabinet section 4, and a rear block 5. The front block 3 comprises a chamber 6. The rear block 5 comprises a chamber 8. The cabinet section 4 comprises a processing liquid container 71a, piping 72Fa, and a liquid supply section 79Fa. The processing liquid container 71a stores the processing liquid Ra. Piping 72Fa connects the processing liquid container 71a to the chamber 6. The liquid supply section 79Fa is provided on piping 72Fa.

[0581] Here, the front block 3, cabinet section 4, and rear block 5 are arranged in this order along the front-to-back direction X. Therefore, the cabinet section 4 is close to the front block 3. Thus, it is easy to shorten the piping 72Fa. Consequently, the liquid supply section 79Fa appropriately supplies the processing liquid Ra to the chamber 6.

[0582] In summary, this substrate processing apparatus 1 appropriately supplies the processing solution Ra.

[0583] The cabinet section 4 is equipped with piping 72Ra and a liquid supply section 79Ra. Piping 72Ra connects the processing liquid container 71a and the chamber 8. The liquid supply section 79Ra is located on top of piping 72Ra. As described above, the front block 3, cabinet section 4, and rear block 5 are arranged in this order in the front-to-back direction X. Therefore, the cabinet section 4 is close to the rear block 5. Thus, it is easy to shorten piping 72Ra. Consequently, the liquid supply section 79Ra appropriately supplies the processing liquid Ra to the chamber 8.

[0584] The cabinet section 4 is adjacent to the chamber 6. Therefore, shortening the piping 72Fa is even easier. Consequently, the liquid supply section 79Fa supplies the processing liquid Ra to the chamber 6 more effectively.

[0585] The cabinet section 4 is adjacent to the chamber 8. Therefore, shortening the piping 72Ra is even easier. Consequently, the liquid supply section 79Ra supplies the processing liquid Ra to the chamber 8 more effectively.

[0586] Pipe 72Ra has the same length as pipe 72Fa. For example, pipe 72Ra1 has the same length as pipe 72Fa1. Pipe 72Ra2 has the same length as pipe 72Fa2. Therefore, it is easy to make the processing quality of the substrate W in chamber 8 the same as the processing quality of the substrate W in chamber 6.

[0587] Piping 72Fa has a downstream section 75Fa from the liquid supply section 79Fa to the chamber 6. Piping 72Ra has a downstream section 75Ra from the liquid supply section 79Ra to the chamber 8. The downstream section 75Ra has the same length as the downstream section 75Fa. Therefore, it is easy to make the processing quality of the substrate W in chamber 8 the same as the processing quality of the substrate W in chamber 6.

[0588] Chamber 8 is positioned at the same height as chamber 6. For example, chamber 8a is positioned at the same height as chamber 6a. Therefore, it is easy for piping 72Ra to have the same length as piping 72Fa.

[0589] The liquid delivery unit 79Ra is positioned at the same height as the liquid delivery unit 79Fa. For example, liquid delivery unit 79Ra1 is positioned at the same height as liquid delivery unit 79Fa1. Liquid delivery unit 79Ra2 is positioned at the same height as liquid delivery unit 79Fa2. Therefore, it is easy for piping 72Ra to have the same length as piping 72Fa.

[0590] The liquid supply unit 79Fa1 is equipped with a pump 91Fa1. The pump 91Fa1 is mounted on the piping 72Fa1. Therefore, it is easy for the liquid supply unit 79Fa1 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6a.

[0591] Similarly, the liquid supply unit 79Fa2 is equipped with a pump 91Fa2. The pump 91Fa2 is mounted on the piping 72Fa2. Therefore, it is easy for the liquid supply unit 79Fa2 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6c.

[0592] The liquid supply unit 79Ra1 is equipped with a pump 91Ra1. The pump 91Ra1 is mounted on the piping 72Ra1. Therefore, it is easy for the liquid supply unit 79Ra1 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 8a.

[0593] Similarly, the liquid supply unit 79Ra2 is equipped with a pump 91Ra2. The pump 91Ra2 is mounted on the piping 72Ra2. Therefore, it is easy for the liquid supply unit 79Ra2 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 8c.

[0594] Pump 91Ra1 is positioned at the same height as pump 91Fa1. Therefore, it is easy to position the liquid delivery unit 79Ra1 at the same height as the liquid delivery unit 79Fa1.

[0595] Similarly, pump 91Ra2 is positioned at the same height as pump 91Fa2. Therefore, it is easy to position the liquid delivery unit 79Ra2 at the same height as the liquid delivery unit 79Fa2.

[0596] The liquid supply unit 79Fa1 is equipped with a pump 92Fa1. The pump 92Fa1 is mounted on the piping 72Fa1. The pump 92Fa1 is positioned downstream of the pump 91Fa1. Therefore, it is easy for the liquid supply unit 79Fa1 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6a.

[0597] Similarly, the liquid supply unit 79Fa2 is equipped with a pump 92Fa2. The pump 92Fa2 is mounted on the piping 72Fa2. The pump 92Fa2 is located downstream of the pump 91Fa2. Therefore, it is easy for the liquid supply unit 79Fa2 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6c.

[0598] The liquid supply unit 79Ra1 is equipped with a pump 92Ra1. The pump 92Ra1 is mounted on the piping 72Ra1. The pump 92Ra1 is positioned downstream of the pump 91Ra1. Therefore, it is easy for the liquid supply unit 79Ra1 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 8a.

[0599] Similarly, the liquid delivery unit 79Ra2 is equipped with a pump 92Ra2. The pump 92Ra2 is mounted on the piping 72Ra2. The pump 92Ra2 is located downstream of the pump 91Ra2. Therefore, it is easy for the liquid delivery unit 79Ra2 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 8c.

[0600] Pump 92Ra1 is positioned at the same height as pump 92Fa1. Therefore, it is easy to position the liquid delivery unit 79Ra1 at the same height as the liquid delivery unit 79Fa1.

[0601] Similarly, pump 92Ra2 is positioned at the same height as pump 92Fa2. Therefore, it is easy to position the liquid delivery unit 79Ra2 at the same height as the liquid delivery unit 79Fa2.

[0602] Pump 92F is closer to the front block 3 than to the center Q4 of the cabinet section 4 in the front-to-back direction X. Therefore, the distance between pump 92F and chamber 6 in the front-to-back direction X is relatively short. Thus, it is easy to shorten the length of the piping 72Fa between pump 92F and chamber 6. Consequently, the liquid delivery section 79Fa properly supplies the processing liquid Ra to chamber 6. Similarly, it is easy to shorten the length of the piping 72Fb between pump 92F and chamber 6. Consequently, the liquid delivery section 79Fb properly supplies the processing liquid Rb to chamber 6.

[0603] Pump 92R is closer to the rear block 5 than to the center Q4 of the cabinet section 4 in the front-rear direction X. Therefore, the distance between pump 92R and chamber 8 in the front-rear direction X is relatively short. Thus, it is easy to shorten the length of the piping 72Ra between pump 92R and chamber 8. Consequently, the liquid delivery section 79Ra properly supplies the processing liquid Ra to chamber 8. Similarly, it is easy to shorten the length of the piping 72Rb between pump 92R and chamber 8. Consequently, the liquid delivery section 79Rb properly supplies the processing liquid Rb to chamber 8.

[0604] The piping 72Fa extends from the cabinet section 4 to the front block 3. The piping 72Fa comprises an inner section 76Fa, an outer section 77Fa, and a joint 78Fa. The inner section 76Fa is located inside the cabinet section 4. The outer section 77Fa is located inside the front block 3. The joint 78Fa connects the inner section 76Fa and the outer section 77Fa. Therefore, it is easy to separate the piping 72Fa at the boundary Q1 between the cabinet section 4 and the front block 3.

[0605] The piping 72Ra extends from the cabinet section 4 to the rear block 5. The piping 72Ra comprises an inner section 76Ra, an outer section 77Ra, and a fitting 78Ra. The inner section 76Ra is located within the cabinet section 4. The outer section 77Ra is located within the rear block 5. The fitting 78Ra connects the inner section 76Ra and the outer section 77Ra. Therefore, it is easy to separate the piping 72Ra at the boundary Q2 between the cabinet section 4 and the rear block 5.

[0606] Piping 72Fa does not extend to the rear block 5. Therefore, it is easy to shorten piping 72Fa.

[0607] As mentioned above, pipe 72Fa does not extend to the rear block 5. Therefore, the number of fittings 78Fa on pipe 72Fa is small. However, when fittings 78Fa are attached and detached, foreign objects or debris may enter pipe 72Fa. As mentioned above, the number of fittings 78Fa on pipe 72Fa is small. Therefore, it is easy to keep pipe 72Fa in good condition.

[0608] Piping 72Ra does not extend to the front block 3. Therefore, it is easy to shorten piping 72Ra.

[0609] As mentioned above, piping 72Ra does not extend to front block 3. Therefore, the number of fittings 78Ra in piping 72Ra is small. For this reason, it is easy to maintain piping 72Ra in good condition.

[0610] The cabinet section 4 is adjacent to the chamber 6. Therefore, shortening the piping 72Fa is even easier. Consequently, the liquid supply section 79Fa supplies the processing liquid Ra to the chamber 6 more effectively.

[0611] The liquid supply unit 79Fa is equipped with a pump 91Fa located on the piping 72Fa. Therefore, it is easy for the liquid supply unit 79Fa to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6.

[0612] The pump 91Fa1 is positioned lower than the processing liquid container 71a. Therefore, gravity facilitates the flow of the processing liquid Ra from the processing liquid container 71a to the pump 91Fa1. Thus, it is easy for the processing liquid Ra to flow from the processing liquid container 71a to the pump 91Fa1. For example, it is easy for the pump 91Fa1 to draw the processing liquid Ra from the processing liquid container 71a. Consequently, the pressure of the processing liquid Ra does not drop significantly between the processing liquid container 71a and the pump 91Fa1. The processing liquid Ra does not generate bubbles between the processing liquid container 71a and the pump 91Fa1. As a result, the liquid delivery unit 79Fa1 properly supplies the processing liquid Ra to the chamber 6a.

[0613] Similarly, the pump 91Fa2 is positioned lower than the processing liquid container 71a. Therefore, the liquid delivery unit 79Fa2 properly supplies the processing liquid Ra to the chamber 6c.

[0614] Similarly, pumps 91Ra1 and 91Ra2 are positioned lower than the processing liquid container 71a. Therefore, the liquid supply units 79Ra1 and 79Ra2 each appropriately supply the processing liquid Ra to the chamber 8.

[0615] In a plan view, the pump 91 overlaps with the processing liquid container 71. Therefore, it is easy to reduce the size of the cabinet section 4 in a plan view. In other words, it is easy to reduce the footprint of the cabinet section 4.

[0616] As described above, the liquid supply unit 79Fa1 is equipped with a pump 92Fa1. The pump 92Fa1 is mounted on the piping 72Fa1. The pump 92Fa1 is positioned downstream of the pump 91F1. Therefore, it is easy for the liquid supply unit 79Fa1 to supply the processing liquid Ra from the processing liquid container 71a to the chamber 6a.

[0617] As described above, the pump 92Fa1 is closer to the front block 3 than to the center Q4 of the cabinet section 4 in the front-to-back direction X. Therefore, the distance between the pump 92Fa1 and the chamber 6a in the front-to-back direction X is relatively short. Thus, it is easy to shorten the length of the piping 72Fa1 between the pump 92Fa1 and the chamber 6a. Consequently, the liquid delivery section 79Fa1 appropriately supplies the processing liquid Ra to the chamber 6a.

[0618] At least a portion of the pump 92Fa1 is positioned at the same height as at least a portion of the chamber 6a. Therefore, the distance in the vertical Z between the pump 92Fa1 and the chamber 6a is relatively short. Thus, it is even easier to shorten the length of the piping 72Fa1 between the pump 92Fa1 and the chamber 6a. Consequently, the liquid delivery unit 79Fa1 properly supplies the processing liquid Ra to the chamber 6a.

[0619] Chamber 6 includes a processing unit 20a. The processing unit 20a includes a holding part 41 and a nozzle 42. The holding part 41 holds the substrate W. The nozzle 42 discharges processing liquid onto the substrate W held by the holding part 41. Piping 72Fa connects the processing liquid container 71a and the nozzle 42. Therefore, it is easy for the liquid supply unit 79Fa to supply processing liquid Ra from the processing liquid container 71a to the nozzle 42.

[0620] At least a portion of the pump 92Fa1 is positioned lower than the nozzle 42 of the chamber 6a. Therefore, the liquid delivery unit 79Fa1 properly supplies the processing liquid Ra to the nozzle 42 of the chamber 6a.

[0621] Chamber 6 is equipped with a processing unit 20b. Therefore, Chamber 6 efficiently processes the substrate W.

[0622] Processing unit 20b shares the nozzle 42 of processing unit 20a. Therefore, it is easy to make the processing quality of the substrate W in processing unit 20b equal to the processing quality of the substrate W in processing unit 20a.

[0623] The processing unit 20a includes a cup 43. The cup 43 is positioned outside the holding portion 41. The cup 43 has an upper end 43T. At least a portion of the pump 92Fa1 is positioned lower than the upper end 43T of the cup 43 in the chamber 6a. Therefore, the liquid delivery unit 79Fa1 properly supplies the processing liquid Ra to the nozzle 42 in the chamber 6a.

[0624] The cabinet section 4 comprises a processing liquid container 71b, piping 72Fb1, and a liquid supply section 79Fb1. The processing liquid container 71b stores the processing liquid Rb. Piping 72Fb1 connects the processing liquid container 71b to the chamber 6a. The liquid supply section 79Fb1 is provided on piping 72Fb1. The liquid supply section 79Fb1 comprises pumps 91Fb1 and 92Fb1. Pump 91Fb1 is provided on piping 72Fb1. Pump 92Fb1 is provided on piping 72Fb1. Pump 92Fb1 is located downstream of pump 91Fb1. Therefore, it is easy for the liquid supply section 79Fb1 to supply the processing liquid Rb from the processing liquid container 71b to the chamber 6a.

[0625] Pumps 92Fa1 and 92Fb1 are positioned at the same height. Therefore, it is easy to improve the processing quality of the substrate W in chamber 6a. For example, it is easy to make the processing quality of the substrate W using processing solution Rb in chamber 6a equal to the processing quality of the substrate W using processing solution Ra in chamber 6a.

[0626] Pumps 92Fa1 and 92Fb1 are aligned in the width direction Y. The width direction Y is horizontal. Therefore, it is easy to position pump 92Fb1 at the same height as pump 92Fa1.

[0627] The width direction Y is perpendicular to the front-to-back direction X. Therefore, pumps 92Fa1 and 92Fb1 are not aligned in the front-to-back direction X. Thus, it is easy to shorten the length of the cabinet section 4 in the front-to-back direction X.

[0628] The substrate processing apparatus 1 includes an indexer section 2. The indexer section 2 includes a carrier stage 11 and a transport mechanism 12. The carrier stage 11 and the transport mechanism 12 are aligned in the width direction Y. The width direction Y is horizontal. The width direction Y is perpendicular to the front-to-back direction X. Therefore, it is easy to shorten the length U of the indexer section 2 in the front-to-back direction X. Thus, even if the substrate processing apparatus 1 includes a cabinet section 4, the length of the substrate processing apparatus 1 in the front-to-back direction X does not increase significantly.

[0629] The indexer unit 2, front block 3, cabinet unit 4, and rear block 5 are arranged in this order in the front-to-back direction X. Even when the indexer unit 2, front block 3, cabinet unit 4, and rear block 5 are arranged in this order in the front-to-back direction X, the liquid supply unit 79Fa appropriately supplies the processing liquid Ra to the chamber 6.

[0630] The piping 72Fa does not extend to the indexer section 2. Therefore, it is easy to shorten the piping 72Fa.

[0631] As mentioned above, piping 72Fa does not extend to indexer section 2. Therefore, the number of fittings 78Fa on piping 72Fa is small. For this reason, it is easy to maintain piping 72Fa in good condition.

[0632] The substrate processing apparatus 1 includes a bridge section 60. The bridge section 60 transports the substrate W to the front block 3 and the rear block 5. Therefore, it is easy for the front block 3 to process the substrate W. It is also easy for the rear block 5 to process the substrate W.

[0633] The front block 3, the bridge section 60, and the rear block 5 are arranged in this order in the front-to-back direction X. Therefore, it is easy for the bridge section 60 to transport the substrate W to the front block 3 and the rear block 5.

[0634] The cabinet section 4 and the bridge section 60 are aligned in the width direction Y. Therefore, it is easy to arrange the front block 3, the bridge section 60, and the rear block 5 in this order in the front-to-back direction X.

[0635] The substrate processing apparatus 1 includes a slider unit 50. The slider unit 50 transports the substrate W between the indexer unit 2 and the bridge unit 60. Therefore, the substrate W is efficiently transported between the indexer unit 2 and the bridge unit 60.

[0636] In a plan view, the slider section 50 overlaps with the front block 3. Therefore, even when the substrate processing apparatus 1 is equipped with the slider section 50, the substrate processing apparatus 1 does not become significantly larger in a plan view. In other words, even when the substrate processing apparatus 1 is equipped with the slider section 50, the footprint of the substrate processing apparatus 1 does not become significantly larger.

[0637] <9. Modified Embodiments> This invention is not limited to the embodiments described below and can be modified and implemented as follows.

[0638] (1) The cabinet section 4 may supply the processing liquid Ra to only either the front block 3 or the rear block 5. The cabinet section 4 may supply the processing liquid Ra to only either the chamber 6 or the chamber 8. Two modified embodiments will be described.

[0639] (1-1) Figure 22 is a schematic side view of a modified embodiment of the substrate processing apparatus 1. The cabinet section 4 supplies processing liquid Ra to the front block 3. The cabinet section 4 supplies processing liquid Ra to the chamber 6.

[0640] Cabinet section 4 does not supply processing liquid Ra to the rear block 5. Cabinet section 4 does not supply processing liquid Ra to the chamber 8.

[0641] Cabinet section 4 includes a processing liquid container 71a, piping 72Fa, and liquid supply section 79Fa. Cabinet section 4 does not include piping 72Ra. Cabinet section 4 does not include liquid supply section 79Ra.

[0642] In the modified embodiment of (1-1) above, the chamber 8 may perform liquid treatment on the substrate W. For example, the chamber 8 may use a treatment liquid from equipment outside the substrate processing apparatus 1. The equipment outside the substrate processing apparatus 1 is, for example, utility equipment. The treatment liquid from the equipment outside the substrate processing apparatus 1 is, for example, a developer. Alternatively, the chamber 8 may perform non-liquid treatment on the substrate W.

[0643] (1-2) Figure 23 is a schematic side view of a modified embodiment of the substrate processing apparatus 1. The cabinet section 4 supplies processing liquid Ra to the rear block 5. The cabinet section 4 supplies processing liquid Ra to the chamber 8.

[0644] Cabinet section 4 does not supply processing liquid Ra to the front block 3. Cabinet section 4 does not supply processing liquid Ra to the chamber 6.

[0645] Cabinet section 4 includes a processing liquid container 71a, piping 72Ra, and a liquid supply section 79Ra. Cabinet section 4 does not include piping 72Fa. Cabinet section 4 does not include a liquid supply section 79Fa.

[0646] In the modified embodiments described in (1-2) above, the chamber 6 may perform liquid treatment on the substrate W. For example, the chamber 6 may use a treatment liquid from equipment outside the substrate processing apparatus 1. Alternatively, the chamber 6 may perform non-liquid treatment on the substrate W.

[0647] In the modified embodiments described in (1-2) above, the front block 3 is an example of the second block of the present invention. The rear block 5 is an example of the first block of the present invention.

[0648] (2) The indexer section 2 may be adjacent to the rear block 5. The front block 3, the cabinet section 4, the rear block 5, and the indexer section 2 may be arranged in this order in the front-to-back direction X.

[0649] Even when the front block 3, cabinet section 4, rear block 5, and indexer section 2 are arranged in this order in the front-to-back direction X, the liquid supply section 79Fa will appropriately supply the processing liquid Ra to the chamber 6.

[0650] In the modified embodiment of (2) above, it is preferable that the slider portion 50 overlaps with the rear block 5 in a plan view. Therefore, even when the substrate processing apparatus 1 is equipped with a slider portion 50, the substrate processing apparatus 1 does not become significantly larger in a plan view. In other words, even when the substrate processing apparatus 1 is equipped with a slider portion 50, the footprint of the substrate processing apparatus 1 does not become significantly larger.

[0651] (3) Processing unit 20b does not have to share the nozzle 42 of processing unit 20a. Processing unit 20b may have a nozzle different from the nozzle 42 of processing unit 20a.

[0652] (4) The processing performed by chamber 8 on substrate W may be different from the processing performed by chamber 6 on substrate W.

[0653] (5) The processing performed by chamber 7 on substrate W may be the same as the processing performed by chamber 6 on substrate W. The processing performed by chamber 7 on substrate W may be different from the processing performed by chamber 6 on substrate W.

[0654] The processing performed by chamber 9 on substrate W may be the same as the processing performed by chamber 8 on substrate W. The processing performed by chamber 9 on substrate W may be different from the processing performed by chamber 8 on substrate W. Chamber 8 may be modified in the same way as chamber 6.

[0655] (6) The number of chambers 6 may be just one. For example, chambers 6b, 6c, and 6d may be omitted.

[0656] Chamber 8 may be modified in the same way as Chamber 6.

[0657] Processing unit 30b may be modified in the same way as processing unit 20b.

[0658] (7) The number of processing units 20 in the chamber 6 may be one. For example, either processing unit 20a or 20b may be omitted. Alternatively, the number of processing units 20 in the chamber 6 may be three or more.

[0659] Chamber 8 may be modified in the same way as Chamber 6.

[0660] (8) The number of pumps in the liquid delivery unit 79Fa may be one. For example, either pump 91Fa or 92Fa may be omitted. Alternatively, the number of pumps in the liquid delivery unit 79Fa may be three or more. Two modified embodiments will be described.

[0661] (8-1) Although not shown in the diagram, the liquid supply unit 79Fa is equipped with pumps 91Fa and 92Fa, as well as pump 111Fa. For convenience, refer to Figure 14. Pumps 91Fa, 92Fa, and 111Fa are mounted on piping 72Fa. Piping 72Fa connects pumps 91Fa, 92Fa, and 111Fa in series. Pumps 91Fa, 92Fa, and 111Fa operate when the liquid supply unit 79Fa supplies the processing liquid Ra to chamber 6a. Pumps 91Fa, 92Fa, and 111Fa also operate when the liquid supply unit 79Fa supplies the processing liquid Ra to chamber 6b.

[0662] (8-2) Although not shown in the diagram, the liquid delivery unit 79Fa is equipped with pumps 91Fa and 92Fa, as well as pump 113Fa. For convenience, refer to Figure 14. Pump 113Fa is installed in the branch pipe 86Fa1. Pumps 92Fa and 113Fa are connected in parallel. When the liquid delivery unit 79Fa supplies the processing liquid Ra to chamber 6a, pumps 91Fa and 92Fa operate, but pump 113Fa does not. When the liquid delivery unit 79Fa supplies the processing liquid Ra to chamber 6b, pumps 91Fa and 113Fa operate, but pump 92Fa does not.

[0663] The liquid delivery unit 79Ra may be changed in the same way as the liquid delivery unit 79Fa.

[0664] (9) The number of chambers 6 to which the liquid supply unit 79Fa supplies the processing liquid Ra may be one. For example, the liquid supply unit 79Fa may supply the processing liquid Ra to only chamber 6a. Alternatively, the number of chambers 6 to which the liquid supply unit 79Fa supplies the processing liquid Ra may be three or more.

[0665] The liquid delivery unit 79Ra may be changed in the same way as the liquid delivery unit 79Fa.

[0666] (10) The slider section 50 may be omitted. For example, the indexer section 2 and the front block 3 may transfer the substrate W. Although not shown in the figures, the substrate processing apparatus 1 may include a mounting section located at the boundary Q3 between the indexer section 2 and the front block 3. For example, the indexer section 2 and the front block 3 may transfer the substrate W. For example, the indexer section 2 and the front block 3 may transfer the substrate W via the mounting section on the boundary Q3.

[0667] (11) The bridge section 60 may be omitted. For example, the front block 3 and the rear block 5 may pass the substrate W. Although not shown in the figures, the substrate processing apparatus 1 may include a mounting section located between the front block 3 and the rear block 5. For example, the front block 3 and the rear block 5 may pass the substrate W. For example, the front block 3 and the rear block 5 may pass the substrate W via the mounting section between the front block 3 and the rear block 5.

[0668] (12) The second front section 3b may be omitted.

[0669] (13) The second rear section 5b may be omitted.

[0670] (14) The embodiments and each modified embodiment described in (1) to (13) above may be further modified as appropriate by substituting or combining each component with the components of other modified embodiments. [Explanation of Symbols]

[0671] 1 ... Substrate processing equipment 2… Indexer section 3… Front block (Block 1, Block 2) 4. Cabinet section 5… Rear block (Block 1, Block 2) 6, 6a, 6b, 6c, 6d... Chambers (First Chamber) 6aT ... Upper end of the chamber 6aB ... Lower end of the chamber 8, 8a, 8b, 8c, 8d... Chambers (Second Chamber) 11… Career Stages 12 ... Conveying mechanism 20… Processing units (first processing unit, second processing unit) 20a ... Processing unit (first processing unit) 20b ... Processing unit (second processing unit) 30… Processing Unit 41 … Holding part 42… Nozzle 43... cup 43T… Top edge of the cup 71a ... Processing liquid container (first processing liquid container) 71b ... Processing liquid container (second processing liquid container) 72Fa ... Piping (First piping) 72Ra … Piping (Second piping) 72Fb … Piping (Third piping) 73Fa ... Upstream section (upstream section of the first piping) 73Ra ... Upstream section (upstream section of the second pipe) 75Fa … Downstream section (downstream section of the first pipe) 75Ra … Downstream section (downstream section of the second pipe) 76Fa…Inner part (first inner part) 77Fa … External part (first external part) 76Ra…Inner part (second inner part) 77Ra...Outer part (second outer part) 78Fa ... Joint (First joint) 78Rb ... Joint (Second joint) 79Fa ... Fluid delivery section (First fluid delivery section) 79Ra ... Fluid delivery section (Second fluid delivery section) 79Fb ... Fluid delivery section (3rd fluid delivery section) 91Fa1, 91Fa2… Pumps (Pump 1) 92Fa1, 92Fa2… Pumps (Second Pump) 91Ra1, 91Ra2… Pump (3rd pump) 92Ra1, 92Ra2… Pump (4th pump) 91Fb1, 91Fb2… Pump (5th pump) 92Fb1, 92Fb2… Pump (Pump No. 6) Q1…Boundary between the cabinet and the front block Q2...Boundary between the cabinet section and the rear block Q3... Boundary between the indexer section and the front block Q4...Center of the cabinet section in the front-to-back direction Ra, Rb... Treatment solution U ... Length of the indexer in the front-to-back direction V... Height position of the nozzle outlet W… Circuit board X…Anteroposterior direction (first direction) Y… Width direction (second direction) Z ... Vertical direction

Claims

1. A substrate processing apparatus, Block 1 and, Cabinet section, Block 2 and, Equipped with, The first block, the cabinet section, and the second block are arranged in this order in the first direction. The first direction is horizontal, The first block comprises a first chamber, The aforementioned second block comprises a second chamber, The aforementioned cabinet section is A first treatment liquid container for storing the treatment liquid, A first pipe connecting the first processing liquid container and the first chamber, A first liquid supply unit provided on the first piping, Equipped with Circuit board processing equipment.

2. In the substrate processing apparatus according to claim 1, The aforementioned cabinet section is A second pipe connecting the first processing liquid container and the second chamber, A second liquid supply unit provided on the second piping and Equipped with Circuit board processing equipment.

3. In the substrate processing apparatus according to claim 2, The cabinet section is adjacent to the first chamber, The cabinet section is adjacent to the second chamber. Circuit board processing equipment.

4. In the substrate processing apparatus according to claim 2, The second pipe has the same length as the first pipe. Circuit board processing equipment.

5. In the substrate processing apparatus according to claim 2, The first piping has a downstream section from the first liquid delivery section to the first chamber, The second piping has a downstream section from the second liquid delivery section to the second chamber, The downstream portion of the second pipe has the same length as the downstream portion of the first pipe. Circuit board processing equipment.

6. In the substrate processing apparatus according to claim 2, The second chamber is positioned at the same height as the first chamber. Circuit board processing equipment.

7. In the substrate processing apparatus according to claim 2, The second liquid delivery unit is positioned at the same height as the first liquid delivery unit. Circuit board processing equipment.

8. In the substrate processing apparatus according to claim 2, The first liquid supply unit includes a first pump provided on the first piping, The second liquid supply unit includes a third pump provided on the second piping, The third pump is positioned at the same height as the first pump. Circuit board processing equipment.

9. In the substrate processing apparatus according to claim 8, The first liquid supply unit includes a second pump provided on the first piping, The second pump is located downstream of the first pump. The second liquid supply unit includes a fourth pump installed on the second piping, The fourth pump is located downstream of the fourth pump, The fourth pump is positioned at the same height as the second pump. Circuit board processing equipment.

10. In the substrate processing apparatus according to claim 9, The second pump is closer to the first block than to the center of the cabinet in the first direction. The fourth pump is closer to the second block than to the center of the cabinet in the first direction. Circuit board processing equipment.

11. In the substrate processing apparatus according to claim 2, The first piping extends from the cabinet section to the first block, The first pipe is, The first internal portion is located within the cabinet section, A first external component located within the first block, A first joint connecting the first inner portion and the first outer portion, Equipped with, The second piping extends from the cabinet section to the second block, The aforementioned second pipe is, A second internal portion is located within the cabinet section, A second external component located within the second block, A second joint connecting the second inner portion and the second outer portion, Equipped with Circuit board processing equipment.

12. In the substrate processing apparatus according to claim 2, The first piping does not extend to the second block. The second piping does not extend to the first block. Circuit board processing equipment.

13. In the substrate processing apparatus according to claim 1, The cabinet section is adjacent to the first chamber. Circuit board processing equipment.

14. In the substrate processing apparatus according to claim 1, The first liquid supply unit includes a first pump provided on the first piping. Circuit board processing equipment.

15. In the substrate processing apparatus according to claim 14, The first pump is positioned lower than the first processing liquid container. Circuit board processing equipment.

16. In the substrate processing apparatus according to claim 14, In a plan view, the first pump overlaps with the first processing liquid container. Circuit board processing equipment.

17. In the substrate processing apparatus according to claim 14, The first liquid supply unit includes a second pump provided on the first piping, The second pump is located downstream of the first pump. Circuit board processing equipment.

18. In the substrate processing apparatus according to claim 17, The second pump is closer to the first block than the center of the cabinet in the first direction. Circuit board processing equipment.

19. In the substrate processing apparatus according to claim 17, At least a portion of the second pump is positioned at the same height as at least a portion of the first chamber. Circuit board processing equipment.

20. In the substrate processing apparatus according to claim 17, The first chamber comprises a first processing unit, The first processing unit is, A holding part that holds the substrate, A nozzle for discharging processing liquid onto a substrate held in the holding part, Equipped with, The first piping connects the first processing liquid container and the nozzle. Circuit board processing equipment.

21. In the substrate processing apparatus according to claim 20, At least a portion of the second pump is positioned lower than the nozzle. Circuit board processing equipment.

22. In the substrate processing apparatus according to claim 20, The first chamber comprises a second processing unit, The second processing unit shares the nozzle of the first processing unit. Circuit board processing equipment.

23. In the substrate processing apparatus according to claim 20, The first processing unit includes a cup positioned outside the holding portion, The cup has an upper end, At least a portion of the second pump is positioned lower than the upper end of the cup. Circuit board processing equipment.

24. In the substrate processing apparatus according to claim 17, The aforementioned cabinet section is A second treatment liquid container for storing the treatment liquid, A third pipe connecting the second processing liquid container and the first chamber, A third liquid supply unit is provided on the third piping, Equipped with, The third liquid delivery unit is, A fifth pump is provided on the third piping, A sixth pump is provided on the third piping, Equipped with, The sixth pump is located downstream of the fifth pump. The sixth pump is positioned at the same height as the second pump. Circuit board processing equipment.

25. In the substrate processing apparatus according to claim 24, The second pump and the sixth pump are arranged in the second direction, The second direction is horizontal and perpendicular to the first direction. Circuit board processing equipment.

26. In the substrate processing apparatus according to claim 1, Equipped with an indexer section, The indexer section is, Career stages, Conveying mechanism, Equipped with, The carrier stage and the transport mechanism are aligned in the second direction. The second direction is horizontal and perpendicular to the first direction. Circuit board processing equipment.

27. In the substrate processing apparatus according to claim 26, The indexer section, the first block, the cabinet section, and the second block are arranged in this order in the first direction. Circuit board processing equipment.

28. In the substrate processing apparatus according to claim 26, The first block, the cabinet section, the second block, and the indexer section are arranged in this order in the first direction. Circuit board processing equipment.

29. In the substrate processing apparatus according to claim 26, The first piping does not extend to the indexer section. Circuit board processing equipment.

30. In the substrate processing apparatus according to claim 26, Equipped with a bridge section, The bridge section transports the substrate to the first block and the second block. The first block, the bridge section, and the second block are arranged in this order in the first direction. The cabinet section and the bridge section are aligned in the second direction. Circuit board processing equipment.

31. In the substrate processing apparatus according to claim 30, Equipped with a slider section, The slider section transports the substrate between the indexer section and the bridge section. The slider portion overlaps with either the first block or the second block in a plan view. Circuit board processing equipment.

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