Method for forming an electrode layer on a substrate, and apparatus for forming an electrode layer on a substrate

JP2026085806APending Publication Date: 2026-05-25TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
TOKYO ELECTRON LTD
Filing Date
2024-11-13
Publication Date
2026-05-25

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Abstract

To form an electrode layer consisting of a first layer containing titanium and nitrogen, and a second layer containing vanadium and nitrogen. [Solution] The electrode layer is formed by stacking the first and second layers, comprising the steps of: performing a first cycle at least once in which a titanium-containing titanium raw material gas and a nitriding gas for nitriding titanium are alternately supplied to a substrate, thereby forming a first layer containing titanium and nitrogen; and performing a second cycle at least once in which a vanadium-containing vanadium raw material gas and a nitriding gas for nitriding vanadium are alternately supplied to the substrate, thereby forming a second layer containing vanadium and nitrogen. The set of steps of forming the first layer and forming the second layer is performed at least once to form an electrode layer in which the first and second layers are stacked.
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