A block copolymer capable of cleaving the main chain, a photoresist composition containing the same, and a patterning method.

JP2026085888APending Publication Date: 2026-05-25DUPONT ELECTRONIC MATERIALS INT LLC
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
DUPONT ELECTRONIC MATERIALS INT LLC
Filing Date
2025-11-10
Publication Date
2026-05-25

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Abstract

The present invention provides a block copolymer capable of cleaving the main chain, a photoresist composition containing the same, and a method for pattern formation. [Solution] A block copolymer comprising a central block containing an acid-unstable group in the backbone of the block copolymer, and at least two copolymer arms covalently bonded to the central block, wherein each copolymer arm comprises a first repeating unit and a second repeating unit different from the first repeating unit.
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