Bathroom Cleaning Methods
The method addresses corrosion issues by using a hypochlorous acid gas supply device to adhere water and generate gas, reducing metal ion content and purifying bathrooms effectively.
JP2026093248APending Publication Date: 2026-06-08PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
- Filing Date
- 2024-11-27
- Publication Date
- 2026-06-08
Smart Images
Figure 2026093248000001_ABST
Abstract
To provide a bathroom purification method that allows the supply of hypochlorous acid gas with reduced metal ion content into the bathroom. [Solution] The bathroom purification method is a method using a hypochlorous acid gas supply device 30. It comprises a water adhesion step (step S11) in which water is applied to at least the wall surface 2 of the bathroom 1, a hypochlorous acid gas generation step (step S12) in which hypochlorous acid gas is generated in the hypochlorous acid gas supply device 30, a hypochlorous acid gas supply step (step S13) in which air containing hypochlorous acid gas is supplied into the bathroom 1, and a purification step (step S14) in which air containing hypochlorous acid gas is supplied into the bathroom 1 and maintained for a predetermined time, and the bathroom is purified by the hypochlorous acid gas dissolving into the water applied to the wall surface 2.
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