Plasma source and switching device

Abstract

To provide a highly efficient plasma source and switching device. [Solution] According to the embodiment, the plasma source includes a container, a first magnet, and a first other magnet. The container includes a cylindrical portion and first and second planar portions. The cylindrical portion extends along a first direction. The end of the cylindrical portion is connected to the first planar portion. The first planar portion includes a first base portion and a first convex portion projecting outward. There is a first void inside the first convex portion. The first magnet includes a first portion of one of the S pole and N pole, and a first intermediate portion of the other of the S pole and N pole. The first intermediate portion is between the first portion and the first convex portion. The first other magnet includes a first other portion of the other of the S pole and N pole, and a first other intermediate portion of one of the S pole and N pole. The first other intermediate portion is between the first other portion and the first convex portion. The direction from the first other portion to the first portion is along the first direction. The direction from the first other intermediate portion to the first intermediate portion is along the first direction.

Description

Technical Field

[0001] Embodiments of the present invention relate to a plasma source and a switching device.

Background Art

[0002] For example, there are switches using plasma. A highly efficient plasma source is desired.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] One embodiment provides a highly efficient plasma source and a switching device.

Means for Solving the Problems

[0005] According to the embodiment, the plasma source includes a container, a first magnet, and a first other magnet. The container includes a cylindrical portion, a first planar portion, and a second planar portion. The cylindrical portion is provided between the first planar portion and the second planar portion in a first direction. The cylindrical portion extends along the first direction. The end of the cylindrical portion is connected to the first planar portion. The other part of the cylindrical portion is connected to the second planar portion. The first planar portion includes a first base portion and a first convex portion that protrudes outward from the container with respect to the first base portion. There is a first void inside the first convex portion. The first magnet includes a first portion of one of the S pole and the N pole, and a first intermediate portion of the other of the S pole and the N pole. In a second direction intersecting the first direction, the first intermediate portion is located between the first portion and the first convex portion. The first other magnet includes the first other portion of the S pole and the other of the N pole, and the first other intermediate portion of one of the S pole and the N pole. In the second direction, the first other intermediate portion is located between the first other portion and the first convex portion. The direction from the first other portion to the first portion is along the first direction. The direction from the first other intermediate portion to the first intermediate portion is along the first direction. [Brief explanation of the drawing]

[0006] [Figure 1] Figure 1 is a schematic cross-sectional view illustrating a plasma source according to the first embodiment. [Figure 2] Figure 2 is a schematic cross-sectional view illustrating a plasma source according to the first embodiment. [Figure 3] Figure 3 is a schematic cross-sectional view illustrating a plasma source according to the first embodiment. [Figure 4] Figure 4 is a schematic cross-sectional view illustrating a plasma source according to the first embodiment. [Figure 5] Figures 5(a) and 5(b) are schematic diagrams illustrating the operation of a plasma source according to the first embodiment. [Figure 6] Figures 6(a) and 6(b) are schematic diagrams illustrating the operation of the plasma source according to the first embodiment. [Figure 7]Figures 7(a) and 7(b) are schematic diagrams illustrating the operation of the plasma source according to the first embodiment. [Figure 8] Figures 8(a) and 8(b) are schematic diagrams illustrating the operation of the plasma source according to the first embodiment. [Modes for carrying out the invention]

[0007] The embodiments of the present invention will be described below with reference to the drawings. Drawings are schematic or conceptual, and the relationships between the thickness and width of each part, as well as the ratios of the sizes of different parts, are not necessarily identical to those of reality. Even when representing the same part, the dimensions and ratios may differ between drawings. In this specification and in each figure, elements similar to those described above are denoted by the same reference numerals with respect to previously shown figures, and detailed explanations are omitted as appropriate.

[0008] (First Embodiment) Figures 1 to 4 are schematic cross-sectional views illustrating a plasma source according to the first embodiment. Figure 1 is a cross-sectional view taken along line A1-A2 in Figures 3 and 4. Figure 2 is a cross-sectional view taken along line A3-A4 in Figures 3 and 4. Figure 3 is a cross-sectional view taken along line B1-B2 in Figures 1 and 2. Figure 4 is a cross-sectional view taken along line B3-B4 in Figures 1 and 2.

[0009] As shown in Figures 1, 3, and 4, the plasma source 110 according to this embodiment includes a container 50, a first magnet 21a, and a first other magnet 21b.

[0010] The container 50 includes a cylindrical portion 55, a first planar portion 51, and a second planar portion 52. The cylindrical portion 55 is provided between the first planar portion 51 and the second planar portion 52 in a first direction D1. The cylindrical portion 55 extends along the first direction D1. One end 55a of the cylindrical portion 55 is connected to the first planar portion 51. The other end 55b of the cylindrical portion 55 is connected to the second planar portion 52. The inside of the container 50 is configured to allow for reduced pressure.

[0011] Let the first direction D1 be the Z-axis direction. Let one direction perpendicular to the Z-axis direction be the X-axis direction. Let the direction perpendicular to the Z-axis direction and the X-axis direction be the Y-axis direction.

[0012] The first planar portion 51 includes a first base portion 51B and a first convex portion 11. The first convex portion 11 protrudes outside the container 50 with respect to the first base portion 51B. There is a first gap g1 inside the first convex portion 11.

[0013] The first planar portion 51 includes a plurality of convex portions 51P. The plurality of convex portions 51P protrude outside the container 50 with respect to the first base portion 51B. There are gaps inside each of the plurality of convex portions 51P. The first convex portion 11 may be any one of the plurality of convex portions 51P. As shown in FIGS. 3 and 4, when cut in the X-Y plane, each of the plurality of convex portions 51P may be annular. There are gaps inside each of the annular plurality of convex portions 51P (see FIGS. 1 and 2).

[0014] The first magnet 21a includes a first portion p1 and a first intermediate portion i1. The first portion p1 is one of the S pole and the N pole. The first intermediate portion i1 is the other of the S pole and the N pole. One of the S pole and the N pole is the first polarity. The other of the S pole and the N pole is the second polarity. In this example, the first polarity is the S pole and the second polarity is the N pole. For example, the first portion p1 is the S pole and the first intermediate portion i1 is the N pole.

[0015] In the second direction D2 intersecting the first direction D1, the first intermediate portion i1 is between the first portion p1 and the first convex portion 11. The second direction D2 may be, for example, the X-axis direction.

[0016] The first other magnet 21b includes a first other portion q1 and a first other intermediate portion j1. The first other portion q1 is the other (second polarity) of the S pole and the N pole. The first other intermediate portion j1 is the one (first polarity) of the S pole and the N pole. For example, the first other portion q1 is the N pole and the first other intermediate portion j1 is the S pole.

[0017] In the second direction D2, the first other intermediate portion j1 is between the first other portion q1 and the first convex portion 11. The direction from the first other portion q1 to the first portion p1 is along the first direction D1. The direction from the first other intermediate portion j1 to the first intermediate portion i1 is along the first direction D1.

[0018] For example, the magnetic field formed by the first magnet 21a and the first other magnet 21b includes a component that intersects the first direction D1 in the vicinity of the opening (the first base portion 51B) of the first convex portion 11. By the effective action of this magnetic field, a high-density plasma can be obtained. According to the embodiment, a high-efficiency plasma source can be provided.

[0019] For example, the magnetic field based on the first magnet 21a and the first other magnet 21b is applied to the space (such as the first gap g1) inside the annular convex portion 51P. Electrons are emitted from the inner surface of the first planar portion 51. The emitted electrons drift while swirling under the action of the magnetic field. The electrons repeatedly collide with particles (such as molecules) contained in the space in the container 50. Thereby, ionization is promoted. Thereby, a high-density plasma is obtained. The inner surface of the first planar portion 51 functions as, for example, a hollow cathode magnetron. The inner surface of the first planar portion 51 functions as, for example, a cathode.

[0020] For example, the magnetic field based on the first magnet 21a and the first other magnet 21b includes a component parallel to the first direction D1. A high-density plasma can be obtained.

[0021] The plasma source 110 may further include a second magnet 22a and a second other magnet 22b. The second magnet 22a includes a second portion p2 and a second intermediate portion i2. The second portion p2 is the other of the S pole and the N pole (the second polarity, for example, the N pole). The second intermediate portion i2 is one of the S pole and the N pole (the first polarity, for example, the S pole).

[0022] In the second direction D2, the first convex portion 11 is between the first intermediate portion i1 and the second intermediate portion i2. In the second direction D2, the second portion p2 is between the first convex portion 11 and the second intermediate portion i2.

[0023] The second other magnet 22b includes a second other portion q2 and a second other intermediate portion j2. The second other portion q2 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole). The second other intermediate portion j2 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole).

[0024] In the second direction D2, the first convex portion 11 is located between the first intermediate portion j1 ​​and the second intermediate portion j2. In the second direction D2, the second intermediate portion q2 is located between the first convex portion 11 and the second intermediate portion j2. The direction from the second intermediate portion q2 to the second portion p2 is along the first direction D1. The direction from the second intermediate portion j2 to the second intermediate portion i2 is along the first direction D1.

[0025] In the first gap g1, the direction of the magnetic field formed by the first magnet 21a and the first other magnet 21b is the same as the direction of the magnetic field formed by the second magnet 22a and the second other magnet 22b. These magnetic fields act in a coordinated manner, resulting in a more efficient plasma generation.

[0026] As shown in Figures 2, 3, and 4, the plasma source 110 may include a third magnet 23a and a third other magnet 23b. The third magnet 23a includes a third portion p3 and a third intermediate portion i3. The third portion p3 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole). The third intermediate portion i3 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole).

[0027] In the third direction D3, the third intermediate portion i3 lies between the third portion p3 and the first convex portion 11. The third direction D3 intersects the plane containing the first direction D1 and the second direction D2. The third direction D3 is, for example, the Y-axis direction.

[0028] The third other magnet 23b includes a third other portion q3 and a third other intermediate portion j3. The third other portion q3 is the other of the above S pole and N pole (second polarity, e.g., N pole). The third other intermediate portion j3 is one of the above S pole and N pole (first polarity, e.g., S pole). In the third direction D3, the third other intermediate portion j3 is located between the third other portion q3 and the first convex portion 11. The direction from the third other portion q3 to the third portion p3 is along the first direction D1. The direction from the third other intermediate portion j3 to the third intermediate portion i3 is along the first direction D1.

[0029] The plasma source 110 may further include a fourth magnet 24a and a fourth other magnet 24b. The fourth magnet 24a includes a fourth portion p4 and a fourth intermediate portion i4. The fourth portion p4 is the other of the above S pole and N pole (second polarity, e.g., N pole). The fourth intermediate portion i4 is the other of the above S pole and N pole (first polarity, e.g., S pole).

[0030] In the third direction D3, the first protrusion 11 is located between the third intermediate portion i3 and the fourth intermediate portion i4. In the third direction D3, the fourth portion p4 is located between the first protrusion 11 and the fourth intermediate portion i4.

[0031] The fourth other magnet 24b includes a fourth other portion q4 and a fourth other intermediate portion j4. The fourth other portion q4 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole). The fourth other intermediate portion j4 is the other of the above-mentioned S pole and N pole (second polarity, N polarity).

[0032] In the third direction D3, the first convex portion 11 is located between the third intermediate portion j3 and the fourth intermediate portion j4. In the third direction D3, the fourth intermediate portion q4 is located between the first convex portion 11 and the fourth intermediate portion j4. The direction from the fourth intermediate portion q4 to the fourth portion p4 is along the first direction D1. The direction from the fourth intermediate portion j4 to the fourth intermediate portion i4 is along the first direction D1.

[0033] For example, in the second direction D2, a portion of the first protrusion 11 lies between the first magnet 21a and the second magnet 22a. In the second direction D2, another portion of the first protrusion 11 lies between the first other magnet 21b and the second other magnet 22b. For example, in the third direction D3, a portion of the first protrusion 11 lies between the third magnet 23a and the fourth magnet 24a. In the third direction D3, another portion of the first protrusion 11 lies between the third other magnet 23b and the fourth other magnet 24b.

[0034] For example, the first protrusion 11 is surrounded by these magnets. The first gap g1 of the first protrusion 11 is also surrounded by these magnets. The magnetic field formed by these magnets acts effectively. A high-density plasma is obtained.

[0035] As shown in Figures 1, 3, and 4, the first planar portion 51 may further include a second protrusion 12, which is one of a plurality of protrusions 51P. The second protrusion 12 is adjacent to the first protrusion 11. The second protrusion 12 projects outward from the container 50 with respect to the first base portion 51B.

[0036] There is a second gap g2 inside the second protrusion 12. The second magnet 22a is located between the first protrusion 11 and the second protrusion 12 in the second direction D2. The second other magnet 22b is located between the first protrusion 11 and the second protrusion 12 in the second direction D2.

[0037] For example, the second magnet 22a and the second other magnet 22b are shared by the first protrusion 11 and the second protrusion 12. The magnetic field from the second magnet 22a and the second other magnet 22b acts on the first protrusion 11 (first air gap g1) and also on the second protrusion 12 (second air gap g2). For example, the distance between the first protrusion 11 and the second protrusion 12 can be shortened. Multiple protrusions 51P can be provided at a high density. A high-density plasma can be obtained.

[0038] As shown in Figures 2, 3, and 4, the first planar portion 51 may further include a third protrusion 13. The third protrusion 13 is one of a plurality of protrusions 51P. The third protrusion 13 is adjacent to the first protrusion 11. The third protrusion 13 projects outward from the container 50 with respect to the first base portion 51B.

[0039] There is a third gap g3 inside the third protrusion 13. The fourth magnet 24a is located between the first protrusion 11 and the third protrusion 13 in the third direction D3. The fourth other magnet 24b is located between the first protrusion 11 and the third protrusion 13 in the third direction D3.

[0040] For example, the fourth magnet 24a and the fourth other magnet 24b are shared by the first protrusion 11 and the third protrusion 13. The magnetic field from the fourth magnet 24a and the fourth other magnet 24b acts on the first protrusion 11 (first air gap g1) and also on the third protrusion 13 (third air gap g3). For example, the distance between the first protrusion 11 and the third protrusion 13 can be shortened. Multiple protrusions 51P can be provided at a high density. A high-density plasma can be obtained.

[0041] As shown in Figures 1, 3, and 4, the plasma source 110 may further include a fifth magnet 25a and a fifth other magnet 25b. The fifth magnet 25a includes a fifth portion p5 and a fifth intermediate portion i5. The fifth portion p5 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole). The fifth intermediate portion i5 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole).

[0042] In the second direction D2, the second protrusion 12 is located between the second intermediate portion i2 and the fifth intermediate portion i5. In the second direction D2, the fifth portion p5 is located between the second protrusion 12 and the fifth intermediate portion i5.

[0043] The fifth other magnet 25b includes a fifth other portion q5 and a fifth other intermediate portion j5. The fifth other portion q5 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole). The fifth other intermediate portion j5 is the other of the above-mentioned S pole and N pole (first polarity, e.g., S pole).

[0044] In the second direction D2, the second protrusion 12 is located between the second intermediate portion j2 and the fifth intermediate portion j5. In the second direction D2, the fifth intermediate portion q5 is located between the second protrusion 12 and the fifth intermediate portion j5.

[0045] As shown in Figures 2, 3, and 4, the plasma source 110 may further include a sixth magnet 26a and a sixth other magnet 26b. The sixth magnet 26a includes a sixth portion p6 and a sixth intermediate portion i6. The sixth portion p6 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole). The sixth intermediate portion i6 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole).

[0046] In the third direction D3, the third protrusion 13 is located between the fourth intermediate portion i4 and the sixth intermediate portion i6. In the third direction D3, the sixth portion p6 is located between the third protrusion 13 and the sixth intermediate portion i6.

[0047] The sixth other magnet 26b includes a sixth other portion q6 and a sixth other intermediate portion j6. The sixth other portion q6 is the other of the above-mentioned S pole and N pole (second polarity, e.g., N pole). The sixth other intermediate portion j6 is one of the above-mentioned S pole and N pole (first polarity, e.g., S pole).

[0048] In the third direction D3, the third protrusion 13 is located between the fourth intermediate portion j4 and the sixth intermediate portion j6. In the third direction D3, the sixth intermediate portion q6 is located between the third protrusion 13 and the sixth intermediate portion j6.

[0049] The first planar portion 51 may further include a fourth protrusion 14. The second protrusion 12 is one of a plurality of protrusions 51P. The second protrusion 12 is adjacent to the first protrusion 11. The fourth protrusion 14 projects outward from the container 50 with respect to the first base portion 51B. Inside the fourth protrusion 14 is a fourth void g4.

[0050] The first magnet 21a is located between the fourth protrusion 14 and the first protrusion 11 in the second direction D2. The first other magnet 21b is located between the fourth protrusion 14 and the first protrusion 11 in the second direction D2.

[0051] For example, the first magnet 21a and the first other magnet 21b are shared by the first protrusion 11 and the fourth protrusion 14. The magnetic field from the first magnet 21a and the first other magnet 21b acts on the first protrusion 11 (first air gap g1) and also on the fourth protrusion 14 (fourth air gap g4). For example, the distance between the first protrusion 11 and the fourth protrusion 14 can be shortened. Multiple protrusions 51P can be provided at a high density. A high-density plasma can be obtained.

[0052] The first planar portion 51 may further include a fifth protrusion 15. The fifth protrusion 15 is one of a plurality of protrusions 51P. The fifth protrusion 15 is adjacent to the first protrusion 11. The fifth protrusion 15 projects outward from the container 50 with respect to the first base portion 51B. Inside the fifth protrusion 15 is a fifth void g5.

[0053] The third magnet 23a is located between the fifth protrusion 15 and the first protrusion 11 in the third direction D3. The third other magnet 23b is located between the fifth protrusion 15 and the first protrusion 11 in the third direction D3.

[0054] For example, the third magnet 23a and the third other magnet 23b are shared by the first protrusion 11 and the fifth protrusion 15. The magnetic field from the third magnet 23a and the third other magnet 23b acts on the first protrusion 11 (first air gap g1) and also on the fifth protrusion 15 (fifth air gap g5). For example, the distance between the first protrusion 11 and the fifth protrusion 15 can be shortened. Multiple protrusions 51P can be provided at a high density. A high-density plasma can be obtained.

[0055] As shown in Figures 3 and 4, the direction in which the fourth protrusion 14, the first protrusion 11, and the second protrusion 12 are aligned may be perpendicular to the direction in which the fifth protrusion 15, the first protrusion 11, and the third protrusion 13 are aligned. For example, multiple protrusions 51P may be aligned along two perpendicular directions.

[0056] As shown in Figure 1, the pitch of the fourth protrusion 14, the first protrusion 11, and the second protrusion 12 is defined as the first pitch pt1. As shown in Figure 2, the pitch of the fifth protrusion 15, the first protrusion 11, and the third protrusion 13 is defined as the second pitch pt2. The first pitch pt1 may be substantially the same as the second pitch pt2. For example, the first pitch pt1 may be between 0.8 and 1.2 times the second pitch pt2. The multiple protrusions 51P may be arranged, for example, in a square lattice. A uniform magnetic field can be obtained. A high-density plasma is easily obtained.

[0057] The first magnet 21a and the first other magnet 21b may be oriented along the first direction D1 and the third direction D3. These magnets may be plate-shaped and oriented along the first direction D1 and the third direction D3.

[0058] The second magnet 22a and the second other magnet 22b may be oriented along the first direction D1 and the third direction D3. These magnets may be plate-shaped and oriented along the first direction D1 and the third direction D3.

[0059] The third magnet 23a and the third other magnet 23b may be oriented along the first direction D1 and the second direction D2. These magnets may be plate-shaped and oriented along the first direction D1 and the second direction D2.

[0060] The fourth magnet 24a and the fourth other magnet 24b may be oriented along the first direction D1 and the second direction D2. These magnets may be plate-shaped and oriented along the first direction D1 and the second direction D2.

[0061] The shape of the first protrusion 11 in the first plane (XY plane) perpendicular to the first direction D1 may be circular. The shapes of the multiple protrusions 51P in the first plane (XY plane) may also be circular.

[0062] As shown in Figure 1, a gap may be provided between the first other magnet 21b and the first magnet 21a.

[0063] The length of the first magnet 21a in the first direction D1 is defined as the first length La1. The length of the first other magnet 21b in the first direction D1 is defined as the first other length Lb1. In this embodiment, it is preferable that the first length La1 is 0.8 times or more and 1.2 times or less the first other length Lb1. For example, a uniform magnetic field distribution can be easily obtained in the first protrusion 11 (first gap g1).

[0064] As shown in Figure 1, the first protrusion 11 includes the inner surface 11s of the first protrusion. The inner surface 11s of the first protrusion faces the first gap g1. The inner surface 11s of the first protrusion includes a center 11c in the first direction D1. For example, the position of the center 11c in the first direction D1 (center position) lies between the position of at least a portion of the first other magnet 21b in the first direction D1 (first other magnet position) and the position of at least a portion of the first magnet 21a in the first direction D1 (first magnet position). A uniform magnetic field distribution is easily obtained.

[0065] As shown in Figures 1 to 4, the container 50 may further include a first layer 58. The first layer 58 is provided on the inner surface of the first planar portion 51. For example, the first layer 58 may contain diamond. For example, electron emission with high efficiency can be obtained.

[0066] In an embodiment, the container 50 is airtight. The container 50 may be configured to contain 50 g of gas. The 50 g of gas includes, for example, at least one of argon, helium, hydrogen, and deuterium. For example, electrons collide with these substances contained in the 50 g of gas.

[0067] As shown in Figures 1 and 3, the plasma source 110 may further include an anode member 40. The anode member 40 is provided inside the container 50. The anode member 40 moves away from the first planar portion 51 along the first direction D1. The anode member 40 may be in contact with the second planar portion 52. The anode member 40 may be integral with the second planar portion 52. A part of the second planar portion 52 may be the anode member 40.

[0068] As shown in Figures 1 and 2, the plasma source 110 may include a control unit 70. The control unit 70 is configured to apply a voltage between the first planar portion 51 and the anode member 40. The voltage causes electrons to be emitted from the inner surface of the first planar portion 51. The emitted electrons collide effectively with particles contained in the gas 50g due to the action of the magnetic field.

[0069] The shape of the cylindrical portion 55 in the XY plane can be substantially circular.

[0070] Figures 5(a), 5(b), 6(a), 6(b), 7(a), 7(b), 8(a), and 8(b) are schematic diagrams illustrating the operation of the plasma source according to the first embodiment. Figures 5(a), 6(a), 7(a), and 8(a) are cross-sectional views. Figures 5(b), 6(b), 7(b), and 8(b) are plan views.

[0071] As shown in Figures 5(a) and 5(b), a magnetic field M1 is generated by the magnet (first magnet 21a, etc.) and other magnets (first other magnet 21b, etc.). In the vicinity of the first base portion 51B, the magnetic field M1 includes a component along the XY plane.

[0072] As shown in Figures 6(a) and 6(b), the plasma PZ1 is present in the voids of the container 50 (such as the first void g1).

[0073] As shown in Figures 7(a) and 7(b), the electric field E1 and the magnetic field M1 intersect. For example, in the vicinity of the first base portion 51B, the electric field E1 and the magnetic field M1 are orthogonal to each other. Forces based on the electric field E1 and the magnetic field M1 are efficiently generated.

[0074] As shown in Figures 8(a) and 8(b), a first drift motion DM1 occurs in the air gap (such as the first air gap g1) based on the electric field E1 and magnetic field M1. A second drift motion DM2 occurs near the first base portion 51B based on the electric field E1 and magnetic field M1. Due to the drift motion, repeated collisions occur with particles (such as molecules) contained in the space inside the container 50. Ionization is efficiently promoted. For example, a high-current DC plasma source that can be used at low gas pressure can be provided.

[0075] (Second Embodiment) The second embodiment relates to a switch device. The switch device 210 according to the embodiment (see Figure 1, etc.) includes a plasma source 110 according to the first embodiment and a control conductive part 45. The control conductive part 45 is provided inside a container 50. For example, the conductive state in the switch device 210 is controlled by controlling the potential of the control conductive part 45. For example, the control unit 70 may be configured to control the potential of the control conductive part 45.

[0076] The embodiments may include the following technical proposals. (Technical proposal 1) A container comprising a cylindrical portion, a first planar portion, and a second planar portion, wherein the cylindrical portion is provided between the first planar portion and the second planar portion in a first direction, the cylindrical portion extends along the first direction, the end of the cylindrical portion is connected to the first planar portion, the other part of the cylindrical portion is connected to the second planar portion, and the first planar portion includes a first base portion and a first convex portion that protrudes outward from the container with respect to the first base portion, and there is a first void inside the first convex portion, A first magnet comprising a first portion of one of the south pole and the north pole, and a first intermediate portion of the other of the south pole and the north pole, wherein in a second direction intersecting the first direction, the first intermediate portion is located between the first portion and the first convex portion, and the first magnet, A first other magnet comprising the S pole and the other first other portion of the N pole, and the first other intermediate portion of one of the S pole and the N pole, wherein in the second direction, the first other intermediate portion is located between the first other portion and the first convex portion, the direction from the first other portion to the first portion is along the first direction, and the direction from the first other intermediate portion to the first intermediate portion is along the first direction, A plasma source equipped with this feature.

[0077] (Technical proposal 2) The second magnet, The second other magnet, Furthermore, The second magnet is, The S pole and the other second portion of the N pole, The second intermediate portion of the S pole and the N pole, Includes, In the second direction, the first protrusion is located between the first intermediate portion and the second intermediate portion. In the second direction, the second portion is located between the first convex portion and the second intermediate portion. The second other magnet is, The aforementioned S pole and the aforementioned N pole, and the aforementioned second other portion of the other, The second intermediate portion of the other of the S pole and the N pole, Includes, In the second direction, the first protrusion is located between the first intermediate portion and the second intermediate portion. In the second direction, the second other portion is located between the first protrusion and the second other intermediate portion. The direction from the second other part to the second part is along the first direction, The direction from the second intermediate portion to the second intermediate portion is along the first direction, as described in Technical Proposal 1, for the plasma source.

[0078] (Technical proposal 3) The third magnet, The third other magnet, Furthermore, The third magnet is, The third portion of the aforementioned S pole and the aforementioned N pole, The third intermediate portion of the other of the S pole and the N pole, Includes, In a third direction intersecting the plane including the first and second directions, the third intermediate portion is located between the third portion and the first convex portion. The third other magnet is, The third other portion of the aforementioned S pole and the aforementioned N pole, The aforementioned S pole and the aforementioned N pole, and the aforementioned third intermediate portion of one of them, Includes, In the third direction, the third intermediate portion is located between the third other portion and the first protrusion. The direction from the third other part to the third part is along the first direction, The direction from the third intermediate portion to the third intermediate portion is along the first direction, as described in Technical Proposal 2, for the plasma source.

[0079] (Technical proposal 4) The fourth magnet and The fourth other magnet, Furthermore, The fourth magnet is, The fourth portion of the other of the S pole and the N pole, The fourth intermediate portion of the S pole and the N pole, Includes, In the third direction, the first protrusion is located between the third intermediate portion and the fourth intermediate portion. In the third direction, the fourth portion is located between the first convex portion and the fourth intermediate portion. The fourth other magnet is, The aforementioned S pole and the aforementioned N pole, and the aforementioned fourth other portion, The aforementioned S pole and the aforementioned N pole, the other fourth intermediate portion, Includes, In the third direction, the first protrusion is located between the third intermediate portion and the fourth intermediate portion. In the third direction, the fourth other portion is located between the first protrusion and the fourth other intermediate portion. The direction from the fourth other part to the fourth part is along the first direction, The direction from the fourth intermediate portion to the fourth intermediate portion is along the first direction, as described in Technical Proposal 3, for the plasma source.

[0080] (Technical proposal 5) The first planar portion further includes a second convex portion that protrudes outward from the container with respect to the first base portion, There is a second void inside the second protrusion, The second magnet is located between the first protrusion and the second protrusion in the second direction. The second other magnet is located between the first protrusion and the second protrusion in the second direction, and is a plasma source as described in Technical Proposal 4.

[0081] (Technical proposal 6) The first planar portion further includes a third convex portion that protrudes outward from the container with respect to the first base portion, There is a third void inside the third protrusion, The fourth magnet is located between the first protrusion and the third protrusion in the third direction. The fourth other magnet is a plasma source according to Technical Proposal 5, located between the first protrusion and the third protrusion in the third direction.

[0082] (Technical proposal 7) The fifth magnet and, The fifth other magnet, Furthermore, The fifth magnet is, The fifth portion of the aforementioned S pole and the aforementioned N pole, The S pole and the other fifth intermediate portion of the N pole, Includes, In the second direction, the second protrusion is located between the second intermediate portion and the fifth intermediate portion. In the second direction, the fifth portion is located between the second protrusion and the fifth intermediate portion. The aforementioned fifth other magnet is, The other fifth portion of the aforementioned S pole and N pole, The fifth intermediate portion of the S pole and the N pole, Includes, In the second direction, the second protrusion is located between the second intermediate portion and the fifth intermediate portion. In the second direction, the fifth other portion is the plasma source according to Technical Proposal 6, located between the second protrusion and the fifth other intermediate portion.

[0083] (Technical proposal 8) The sixth magnet and, The sixth other magnet, Furthermore, The sixth magnet is, The sixth portion of the aforementioned S pole and the aforementioned N pole, The sixth intermediate portion of the other of the S pole and the N pole, Includes, In the third direction, the third protrusion is located between the fourth intermediate portion and the sixth intermediate portion. In the third direction, the sixth portion is located between the third protrusion and the sixth intermediate portion. The aforementioned sixth other magnet is, The other sixth portion of the aforementioned S pole and N pole, The sixth intermediate portion of the S pole and the N pole, Includes, In the third direction, the third protrusion is located between the fourth intermediate portion and the sixth intermediate portion. In the third direction, the sixth other portion is the plasma source according to Technical Proposal 7, located between the third protrusion and the sixth other intermediate portion.

[0084] (Technical proposal 9) The first planar portion further includes a fourth convex portion that protrudes outward from the container with respect to the first base portion, Inside the fourth protrusion, there is a fourth void. The first magnet is located between the fourth protrusion and the first protrusion in the second direction. The first other magnet is a plasma source according to Technical Proposal 8, located between the fourth protrusion and the first protrusion in the second direction.

[0085] (Technical proposal 10) The first planar portion further includes a fifth convex portion that protrudes outward from the container with respect to the first base portion, There is a fifth void inside the fifth protrusion, The third magnet is located between the fifth protrusion and the first protrusion in the third direction. The third other magnet is a plasma source according to Technical Proposal 9, located between the fifth protrusion and the first protrusion in the third direction.

[0086] (Technical proposal 11) A plasma source according to any one of the technical proposals 1 to 10, wherein an air gap is provided between the first other magnet and the first magnet.

[0087] (Technical proposal 12) The first magnet and the first other magnet are aligned along the first direction and the third direction, The second magnet and the second other magnet are aligned along the first direction and the third direction, The third magnet and the third other magnet are aligned along the first and second directions, The fourth magnet and the fourth other magnet are aligned along the first and second directions, respectively, and form a plasma source as described in Technical Proposal 4.

[0088] (Technical proposal 13) The plasma source according to any one of the technical proposals 1 to 12, wherein the shape of the first protrusion in the first plane perpendicular to the first direction is circular.

[0089] (Technical proposal 14) The plasma source according to technical proposal 10, wherein the direction in which the fourth protrusion, the first protrusion, and the second protrusion are aligned is perpendicular to the direction in which the fifth protrusion, the first protrusion, and the third protrusion are aligned.

[0090] (Technical proposal 15) The plasma source according to Technical Proposal 14, wherein the first pitch of the fourth protrusion, the first protrusion, and the second protrusion is the same as the second pitch of the fifth protrusion, the first protrusion, and the third protrusion.

[0091] (Technical proposal 16) The container further comprises a first layer, The first layer is provided on the inner surface of the first planar portion, The first layer is a plasma source according to any one of the technical proposals 1 to 14, which includes a diamond.

[0092] (Technical proposal 17) Further comprising an anode component, The anode member is provided inside the container. The anode member is separated from the first planar portion along the first direction, the plasma source according to any one of the technical proposals 1 to 16.

[0093] (Technical proposal 18) A plasma source according to any one of Technical Proposals 1 to 17, wherein the first length of the first magnet in the first direction is 0.8 times or more and 1.2 times or less the first other length of the first other magnet in the first direction.

[0094] (Technical proposal 19) The first protrusion includes the inner surface of the first protrusion, The inner surface of the first protrusion faces the first void, The inner surface of the first protrusion includes the center in the first direction, The plasma source according to any one of Technical Proposals 1 to 18, wherein the central position of the center in the first direction is between the first position of at least a portion of the first other magnet in the first direction and the first position of at least a portion of the first magnet in the first direction.

[0095] (Technical proposal 20) A plasma source described in any one of Technical Proposals 1 to 19, A control conductive part provided inside the container, A switch device equipped with the following features.

[0096] According to the embodiment, a highly efficient plasma source and switching device can be provided.

[0097] The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, the specific configuration of each element, such as the container, magnet, anode member, and control unit included in the plasma source and switch device, is included within the scope of the present invention as long as those skilled in the art can appropriately select from the known range to implement the present invention and obtain similar effects.

[0098] Furthermore, combinations of two or more elements from any of the specific examples, to the extent technically feasible, are also included within the scope of the present invention, insofar as they encompass the gist of the invention.

[0099] Furthermore, all plasma source and switch devices that a person skilled in the art can implement by appropriately modifying the design based on the plasma source and switch device described above as embodiments of the present invention also fall within the scope of the present invention, insofar as they encompass the gist of the present invention.

[0100] Furthermore, within the scope of the concept of the present invention, a person skilled in the art could conceive of various modifications and alterations, and it is understood that such modifications and alterations also fall within the scope of the present invention.

[0101] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of Symbols]

[0102] 11~15: 1st to 5th protrusions, 11c: center, 11s: inner surface of the 1st protrusion, 21a~26a: 1st to 6th magnets, 21b~26b: 1st to 6th other magnets, 40: anode member, 45: control conductive part, 50: container, 50g: gas, 51, 52: 1st and 2nd planar parts, 51B: 1st base part, 51P: protrusion, 52: 2nd planar part, 55: cylindrical part, 55a: end, 55b: other part, 58: 1st layer, 70: control unit, 110: plasma source, 210: switch device, D1~D3: 1st to 3rd directions, DM1, DM2: 1st and 2nd drift motion, E1: electric field, La1: 1st length, Lb1: 1st other length, M1: Magnetic field, PZ1: Plasma, g1~g5: 1st to 5th voids, i1~i6: 1st to 6th intermediate parts, j1~j6: 1st to 6th other intermediate parts, p1~p6: 1st to 6th parts, pt1, pt2: 1st and 2nd pitches, q1~q6: 1st to 6th other parts

Claims

1. A container comprising a cylindrical portion, a first planar portion, and a second planar portion, wherein the cylindrical portion is provided between the first planar portion and the second planar portion in a first direction, the cylindrical portion extends along the first direction, one end of the cylindrical portion is connected to the first planar portion, the other end of the cylindrical portion is connected to the second planar portion, and the first planar portion includes a first base portion and a first convex portion that protrudes outward from the container with respect to the first base portion, and there is a first void inside the first convex portion, A first magnet comprising a first portion of one of the S pole and the N pole, and a first intermediate portion of the other of the S pole and the N pole, wherein in a second direction intersecting the first direction, the first intermediate portion is located between the first portion and the first protrusion, and the first magnet, A first other magnet comprising the S pole and the other first other portion of the N pole, and the first other intermediate portion of one of the S pole and the N pole, wherein in the second direction the first other intermediate portion is located between the first other portion and the first convex portion, the direction from the first other portion to the first portion is along the first direction, and the direction from the first other intermediate portion to the first intermediate portion is along the first direction, and the first other magnet, A plasma source equipped with this feature.

2. The second magnet and The second other magnet, Furthermore, The second magnet is, The S pole and the other second portion of the N pole, The second intermediate portion of the S pole and the N pole, Includes, In the second direction, the first protrusion is located between the first intermediate portion and the second intermediate portion. In the second direction, the second portion is located between the first protrusion and the second intermediate portion. The second other magnet is, The second other portion of the S pole and the N pole, The second intermediate portion of the other of the S pole and the N pole, Includes, In the second direction, the first protrusion is located between the first intermediate portion and the second intermediate portion. In the second direction, the second other portion is located between the first protrusion and the second other intermediate portion. The direction from the second other part to the second part is along the first direction, The plasma source according to claim 1, wherein the direction from the second intermediate portion to the second intermediate portion is along the first direction.

3. The third magnet and The third other magnet, Furthermore, The third magnet is, The third portion of the S pole and the N pole, The third intermediate portion of the other of the S pole and the N pole, Includes, In a third direction intersecting the plane including the first and second directions, the third intermediate portion is located between the third portion and the first convex portion. The third other magnet is, The third other portion of the S pole and the N pole, The third intermediate portion of the S pole and the N pole, Includes, In the third direction, the third other intermediate portion is located between the third other portion and the first protrusion. The direction from the third other part to the third part is along the first direction, The plasma source according to claim 2, wherein the direction from the third intermediate portion to the third intermediate portion is along the first direction.

4. The fourth magnet, The fourth other magnet, Furthermore, The fourth magnet is, The fourth portion of the other of the S pole and the N pole, The fourth intermediate portion of the S pole and the N pole, Includes, In the third direction, the first protrusion is located between the third intermediate portion and the fourth intermediate portion. In the third direction, the fourth portion is located between the first protrusion and the fourth intermediate portion. The fourth other magnet is, The fourth other portion of the S pole and the N pole, The S pole and the N pole, and the other fourth intermediate portion, Includes, In the third direction, the first protrusion is located between the third intermediate portion and the fourth intermediate portion. In the third direction, the fourth other portion is located between the first protrusion and the fourth other intermediate portion. The direction from the fourth other part to the fourth part is along the first direction, The plasma source according to claim 3, wherein the direction from the fourth intermediate portion to the fourth intermediate portion is along the first direction.

5. The first planar portion further includes a second convex portion that protrudes outward from the container with respect to the first base portion, There is a second void inside the second protrusion, The second magnet is located between the first protrusion and the second protrusion in the second direction. The plasma source according to claim 4, wherein the second other magnet is located between the first protrusion and the second protrusion in the second direction.

6. The first planar portion further includes a third convex portion that protrudes outward from the container with respect to the first base portion, There is a third void inside the third protrusion, The fourth magnet is located between the first protrusion and the third protrusion in the third direction. The plasma source according to claim 5, wherein the fourth other magnet is located between the first protrusion and the third protrusion in the third direction.

7. The fifth magnet, The fifth other magnet, Furthermore, The fifth magnet is, The fifth portion of the aforementioned S pole and the aforementioned N pole, The fifth intermediate portion of the other of the S pole and the N pole, Includes, In the second direction, the second protrusion is located between the second intermediate portion and the fifth intermediate portion. In the second direction, the fifth portion is located between the second protrusion and the fifth intermediate portion. The fifth other magnet is, The S pole and the other fifth portion of the N pole, The fifth intermediate portion of the S pole and the N pole, Includes, In the second direction, the second protrusion is located between the second intermediate portion and the fifth intermediate portion. The plasma source according to claim 6, wherein in the second direction, the fifth other portion is located between the second convex portion and the fifth other intermediate portion.

8. The sixth magnet and The sixth other magnet, Furthermore, The sixth magnet is, The sixth portion of the aforementioned S pole and the aforementioned N pole, The sixth intermediate portion of the other of the S pole and the N pole, Includes, In the third direction, the third protrusion is located between the fourth intermediate portion and the sixth intermediate portion. In the third direction, the sixth portion is located between the third protrusion and the sixth intermediate portion. The sixth other magnet is, The sixth other portion of the S pole and the N pole, The sixth intermediate portion of the S pole and the N pole, Includes, In the third direction, the third protrusion is located between the fourth intermediate portion and the sixth intermediate portion. The plasma source according to claim 7, wherein in the third direction, the sixth other portion is located between the third convex portion and the sixth other intermediate portion.

9. The first magnet and the first other magnet are aligned along the first direction and the third direction, The second magnet and the second other magnet are aligned along the first direction and the third direction, The third magnet and the third other magnet are aligned along the first and second directions, The plasma source according to claim 4, wherein the fourth magnet and the fourth other magnet are aligned along the first direction and the second direction.

10. A plasma source according to any one of claims 1 to 9, A control conductive part provided inside the container, A switch device equipped with the following features.

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