Photocurable composition, cured product, laminate, method for manufacturing a cured product, method for manufacturing a laminate, method for manufacturing a semiconductor device, semiconductor device, and radical polymerization initiator.

Abstract

To provide a photocurable composition having excellent resolution in the resulting cured product, a cured product obtained by curing the photocurable composition, a laminate containing the cured product, a method for producing the cured product, a method for producing the laminate, a method for producing a semiconductor device including the method for producing the cured product, and a semiconductor device containing the cured product, as well as to provide a novel compound. [Solution] A photocurable composition comprising a photoradical polymerization initiator and a curable compound, wherein the photoradical polymerization initiator has 2 to 4 (keto)oxime groups in one molecule that are bonded to an aromatic ring by a single bond, and at least one of these (keto)oxime groups is in an adjacent position to a substituent X whose bonding site to the aromatic ring is an oxygen atom, a sulfur atom, or a nitrogen atom; a cured product obtained by curing the above composition and a method for producing the same; a laminate containing the cured product and a method for producing the same; a semiconductor device and a method for producing the same; and a novel compound.

Description

[Technical Field]

[0001] The present invention relates to a photocurable composition, a cured product, a laminate, a method for producing a cured product, a method for producing a laminate, a method for producing a semiconductor device, a semiconductor device, and a radical polymerization initiator. [Background technology]

[0002] In modern times, resin materials manufactured from photocurable compositions containing resins are being utilized in various fields. For example, heterocyclic polymers such as polyimides are used in a variety of applications due to their excellent heat resistance and insulation properties. While not limited to these applications, examples of such applications include their use as insulating films, encapsulants, or protective films in semiconductor devices for packaging. They are also used as base films and coverlays for flexible substrates.

[0003] For example, in the applications described above, heterocyclic polymers such as polyimides are used in the form of photocurable compositions containing these resins. Such a photocurable composition can be applied to a substrate, for example by coating, to form a photosensitive film, and then, if necessary, exposure, development, heating, etc., can be performed to form a cured product on the substrate. Since photocurable compositions can be applied by known methods, they offer excellent manufacturing adaptability, such as a high degree of design freedom in terms of shape, size, and application location of the photocurable composition. In addition to the high performance of heterocyclic polymers such as polyimides, the industrial applications of the aforementioned photocurable compositions are increasingly anticipated due to these excellent manufacturing adaptability features.

[0004] For example, Patent Document 1 describes a novel biphenyl oxime ester derivative compound, a photopolymerization initiator containing the same, and a photoresist composition containing the same. [Prior art documents] [Patent Documents]

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] With the miniaturization and high integration of devices, higher resolution of patterns obtained in photocurable compositions is desired.

[0007] An object of the present invention is to provide a photocurable composition excellent in resolution in the obtained cured product, a cured product obtained by curing the above photocurable composition, a laminate containing the above cured product, a method for producing the above cured product, a method for producing the above laminate, a method for producing a semiconductor device including the method for producing the above cured product, and a semiconductor device including the above cured product. Another object of the present invention is to provide a novel compound.

Means for Solving the Problems

[0008] Examples of typical embodiments of the present invention are shown below. <1> A photocurable composition containing a photo radical polymerization initiator and a curable compound, where the photo radical polymerization initiator has 2 to 4 (keto)oxime groups bonded to an aromatic ring by a single bond in one molecule, and at least one of the (keto)oxime groups is in a positional relationship adjacent to a substituent X whose bonding site to the aromatic ring is an oxygen atom, a sulfur atom or a nitrogen atom in the aromatic ring, photocurable composition. <2> The photocurable composition according to <1>, where the substituent X is a monovalent organic group. <3> When the above 2 to 4 (keto)oxime groups contain (keto)oxime groups bonded to different aromatic rings, the number of carbon atoms of a linking group connecting the aromatic rings to which the (keto)oxime groups are bonded is 5 or less, and the photocurable composition according to <1> or <2>. <4> The photocurable composition according to any one of <1> to <3>, wherein the photo radical polymerization initiator contains a compound represented by formula (1-1) or formula (1-2).

Chemical formula

Chemical formula

[0009] The present invention provides a photocurable composition having excellent resolution in the resulting cured product, a cured product obtained by curing the photocurable composition, a laminate containing the cured product, a method for manufacturing the cured product, a method for manufacturing the laminate, a method for manufacturing a semiconductor device including the method for manufacturing the cured product, and a semiconductor device containing the cured product. Furthermore, the present invention provides novel compounds. [Modes for carrying out the invention]

[0010] The main embodiments of the present invention will be described below. However, the present invention is not limited to the embodiments specified. In this specification, a numerical range represented by the symbol "~" means a range that includes the numbers written before and after "~" as the lower limit and upper limit, respectively. In this specification, the term "process" includes not only independent processes but also processes that are indistinguishable from other processes insofar as they achieve their intended function. In this specification, when groups (atomic groups) are not specified as substituted or unsubstituted, the notation includes both groups (atomic groups) with and without substituents. For example, "alkyl group" includes not only unsubstituted alkyl groups but also substituted alkyl groups. In this specification, "exposure" includes not only exposure using light but also exposure using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of light used for exposure include the emission spectrum of mercury lamps, far ultraviolet light represented by excimer lasers, extreme ultraviolet (EUV) light, X-rays, electron beams, and other active light or radiation. In this specification, "(meth)acrylate" means both or either "acrylate" and "methacrylate," "(meth)acrylic" means both or either "acrylic" and "methacrylic," and "(meth)acryloyl" means both or either "acryloyl" and "methacryloyl." In this specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, total solids refers to the total mass of all components of the composition excluding the solvent. In this specification, solids concentration refers to the mass percentage of the components other than the solvent relative to the total mass of the composition. In this specification, weight-average molecular weight (Mw) and number-average molecular weight (Mn) are defined as polystyrene equivalent values, unless otherwise specified, and are measured using gel permeation chromatography (GPC). In this specification, weight-average molecular weight (Mw) and number-average molecular weight (Mn) can be determined, for example, by using an HLC-8220GPC (manufactured by Tosoh Corporation) and connecting Guard Column HZ-L, TSKgel Super HZM-M, TSKgel Super HZ4000, TSKgel Super HZ3000, and TSKgel Super HZ2000 (all manufactured by Tosoh Corporation) in series as columns. Unless otherwise specified, these molecular weights are measured using NMP (N-methyl-2-pyrrolidone) as the eluent. However, if NMP is unsuitable as an eluent, such as in cases of low solubility, THF (tetrahydrofuran) may be used. Furthermore, unless otherwise specified, detection in GPC measurements will be performed using a UV (ultraviolet) wavelength 254nm detector. In this specification, when the positional relationship of each layer constituting a laminate is described as "up" or "down," it is sufficient that the other layer is above or below the reference layer among the multiple layers of interest. That is, a third layer or element may be interposed between the reference layer and the other layer, and the reference layer and the other layer do not need to be in contact. Unless otherwise specified, the direction in which layers are stacked on the substrate is referred to as "up," or, if there is a resin composition layer, the direction from the substrate to the resin composition layer is referred to as "up," and the opposite direction is referred to as "down." Note that this setting of up and down directions is for convenience in this specification, and in actual embodiments, the "up" direction in this specification may differ from vertically upward. In this specification, unless otherwise specified, a composition may contain two or more compounds corresponding to each component. Furthermore, unless otherwise specified, the content of each component in a composition means the total content of all compounds corresponding to that component. In this specification, unless otherwise specified, the temperature is 23°C, the atmospheric pressure is 101,325 Pa (1 atmosphere), and the relative humidity is 50% RH. In this specification, a preferred combination of embodiments is a more preferred embodiment.

[0011] (Photocurable composition) The photocurable composition of the present invention (hereinafter also simply referred to as "photocurable composition") comprises a photoradical polymerization initiator and a curable compound, wherein the photoradical polymerization initiator has 2 to 4 (keto)oxime groups in one molecule that are bonded to an aromatic ring by a single bond, and at least one of these (keto)oxime groups is in an adjacent position to a substituent X whose bonding site to the aromatic ring is an oxygen atom, a sulfur atom, or a nitrogen atom. Hereinafter, a radical polymerization initiator having 2 to 4 (keto)oxime groups bonded to an aromatic ring by a single bond in one molecule, and at least one of these (keto)oxime groups being in an adjacent position to substituent X whose bonding site to the aromatic ring is an oxygen atom, sulfur atom, or nitrogen atom, will also be referred to as "compound A".

[0012] The photocurable composition of the present invention is preferably used to form a photosensitive film subjected to exposure and development, and more preferably used to form a photosensitive film subjected to exposure and development using a developer containing an organic solvent. Furthermore, the photocurable composition of the present invention is preferably used to form a photosensitive film for negative-type development. In the present invention, negative development refers to development in which unexposed areas are removed by development, and positive development refers to development in which exposed areas are removed by development. As the above-mentioned exposure method, developer, and developing method, for example, the exposure method, developer, and developing method described in the exposure step, developing step, and developing steps described in the description of the manufacturing method of the cured product described later may be used.

[0013] The photocurable composition of the present invention exhibits excellent resolution in the resulting cured product. The mechanism by which the above effects are achieved is unknown, but it is speculated to be as follows. As a result of diligent research, the inventors have discovered that a novel compound having 2 to 4 (keto)oxime groups in one molecule that are bonded to an aromatic ring by a single bond without the need for a linking group, and in which at least one of these (keto)oxime groups is located adjacent to a substituent X whose bonding site to the aromatic ring is an oxygen atom, sulfur atom, or nitrogen atom, is an extremely sensitive radical polymerization initiator, and thus completed the present invention. The mechanism by which the above effects are achieved is unknown, but it is speculated to be as follows. Conventional (keto)oxime initiators generate polymerization-active radicals (methyl radicals, phenyl radicals, etc.) upon photodegradation, but the radicals on the absorption pigment backbone side are polymerization-inactive and do not contribute to radical polymerization. The photoradical polymerization initiator (compound A) used in the present invention has 2 to 4 (keto)oxime groups in one molecule that are bonded to the aromatic ring by single bonds without the need for linking groups. Furthermore, the polymerization-inactive radical on the absorption pigment skeleton can be reactivated by utilizing intramolecular radical transfer or cyclization, thereby contributing to polymerization. Compared to conventional radical polymerization initiators that have only one (keto)oxime group in one molecule and no substituent X, it is possible to generate several times more active radicals, which is expected to increase sensitivity. Furthermore, when a molecule contains 2 to 4 (keto)oxime groups adjacent to substituent X, a cross-linked structure is formed by reactivated radicals, improving the strength of the cured film. In addition, it is believed that the chromophore decomposition products of the initiator do not volatilize even under high-temperature conditions, thus reducing outgassing. This is thought to prevent equipment contamination, environmental leaks such as those regulated by EUReach, and health hazards. Furthermore, the radical polymerization initiator (compound A) of the present invention (especially when it has a ketoxime group) has high photobleachability, which suppresses discoloration after exposure. Therefore, even when pattern formation is performed on thick films, such as those with a thickness of 5 μm or more, good pattern formation properties (improved rectangularity, reduced roughness, and improved curability at the bottom of the film) are expected to be achieved.

[0014] Furthermore, Patent Document 1 neither describes nor suggests any photocurable composition containing a resin that falls under the category of [the specified category].

[0015] The components included in the photocurable composition of the present invention will be described in detail below.

[0016] <Compound A> The photocurable composition of the present invention contains a radical polymerization initiator (compound A) having 2 to 4 (keto)oxime groups in one molecule that are bonded to an aromatic ring by a single bond, and at least one of these (keto)oxime groups is in an adjacent position to substituent X, the bonding site to the aromatic ring, which is an oxygen atom, a sulfur atom, or a nitrogen atom.

[0017] [A (keto)oxime group that is bonded to an aromatic ring by a single bond] The term (keto)oxime group refers to either an oxime group or a ketoxime group. Here, an oxime group refers to the structure represented by the following formula (Ox), and a ketoxime group refers to the structure represented by the following formula (KOx). The geometric isomers (E and Z forms) of the oxime group (>C=N-OH) or ketoxime group (-C(=O)-C(=N-OH)-) are not particularly limited and either is acceptable. The E and Z forms may be mixed, and the mixing ratio of the E and Z forms is not limited. For the structural formulas (OX), (KOx) and the specific examples of (keto)oxime compounds shown in the text, only one geometric isomer is shown for convenience, but the opposite geometric isomer or a mixture may also be shown.

[0018] [ka] In formula (Ox) or formula (KOx), * represents a bonding site with another structure, and R independently represents a bonding site with an organic group. Here, in the (keto)oxime group bonded to the aromatic ring by a single bond, * represents the bonding site with the aromatic ring.

[0019] A (keto)oxime group that is bonded to an aromatic ring by a single bond means that the aromatic ring and the (keto)oxime group are bonded by a single bond without the need for a connecting group.

[0020] A (keto)oxime ester group is preferred as the (keto)oxime group contained in compound A. As the (keto)oxime ester group, the group represented by formula (Z-1) described below is preferred.

[0021] The number of (keto)oxime groups attached to the aromatic ring by a single bond in compound A is 2 to 4 per molecule, and from the viewpoint of ease of production, it may be 2 or 3, or it may be 2. When the above 2 to 4 (keto)oxime groups include (keto)oxime groups bonded to different aromatic rings, from the viewpoint of increasing the oxime value and thus increasing sensitivity, it is preferable that the number of carbon atoms in the linking group connecting the aromatic rings to which the (keto)oxime groups are bonded is 5 or less. The number of carbon atoms is preferably 0 to 4, more preferably 0 to 3, and even more preferably 0 to 2. Furthermore, an embodiment in which the number of carbon atoms is 0 (i.e., the aromatic rings are bonded together by single bonds) is also one of the preferred embodiments of the present invention. Furthermore, it is preferable that the above-mentioned linking group does not contain polyethylene oxy chains.

[0022] [Substituent X] In compound A, of the (keto)oxime groups bonded to the aromatic ring by a single bond, at least one (keto)oxime group is in an adjacent position on the aromatic ring with substituent X, whose bonding site to the aromatic ring is an oxygen atom, a sulfur atom, or a nitrogen atom.

[0023] The substituent X has an oxygen atom, a sulfur atom, or a nitrogen atom as its bonding site to the aromatic ring. That is, the oxygen atom, sulfur atom, or nitrogen atom of substituent X is bonded to the aromatic ring by a single bond without the need for a linking group. Here, it is preferable that the substituent X has an oxygen atom as the bonding site to the aromatic ring. The substituent X is preferably a monovalent organic group, -OR X1 , -SR X1 and -NR x1 R x2It is more preferable that it be either -OR X1 It is even more preferable that this be the case. If substituent X is a monovalent organic group, substituent X can rotate, making it easier to reactivate. Furthermore, if the compound X has two or more substituents, it is thought that after the decomposition of compound A, it becomes a dialdehyde, which crosslinks with the amine residue of the polyimide to form an imine and create a crosslinked structure, thereby increasing the strength of the cured film. If a molecule has two or more substituents X, the multiple substituents X may be the same or different, but it is preferable that they be the same. R X1 R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. X2 The symbol represents one of the following: a hydrogen atom, an alkyl group, an aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group. R X1 The alkyl group in is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably an alkyl group having 1 to 4 carbon atoms. Furthermore, the alkyl group may be a branched alkyl group, preferably a branched alkyl group having 3 to 10 carbon atoms, more preferably a branched alkyl group having 3 to 8 carbon atoms, and even more preferably a branched alkyl group having 3 to 6 carbon atoms. Furthermore, the alkyl group may be a cyclic alkyl group, preferably a cyclic alkyl group having 4 to 10 carbon atoms, and more preferably a cyclic alkyl group having 5 or 6 carbon atoms. R X1The alkenyl group in is preferably a C3-C10 alkenyl group, more preferably a C3-C6 alkenyl group, and even more preferably a C3-C5 alkenyl group. Furthermore, the above alkenyl group may be a branched alkenyl group, preferably a C4-C10 branched alkenyl group, more preferably a C4-C8 branched alkenyl group, and even more preferably a C4-C6 branched alkenyl group. Furthermore, the above alkenyl group may be a cyclic alkenyl group, preferably a C5-C10 cyclic alkyl group, and even more preferably a C6 cyclic alkyl group. R X1 The alkynyl group in is preferably an alkynyl group having 3 to 10 carbon atoms, more preferably an alkynyl group having 3 to 6 carbon atoms, and even more preferably an alkynyl group having 3 to 5 carbon atoms. The alkyl, alkenyl, and alkynyl groups mentioned above may have further substituents, and examples of substituents include aryl groups, alkoxy groups, alkylcarbonyl groups, alkoxycarbonyl groups, alkylcarbonyloxy groups, vinyl groups, allyl groups, ethynyl groups, carboxyl groups, hydroxyl groups, and the like.

[0024] R X1 The aryl group in this compound may be an aromatic hydrocarbon group or an aromatic heterocyclic group, but an aromatic hydrocarbon group is preferred. The aromatic hydrocarbon group is preferably one having 6 to 20 carbon atoms, more preferably a phenyl group or a naphthyl group, and even more preferably a phenyl group. The above aryl group may have further substituents, and examples of substituents include aryl groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, halogen atoms, and the like.

[0025] The substituent X has 1 or more carbon atoms, and more preferably 2 or more carbon atoms. The upper limit of the carbon atom is preferably 50 or less, more preferably 20 or less, and even more preferably 10 or less.

[0026] R X1In -C(=O)R, -C(=O)OR, and -C(=O)NR, R is preferably an alkyl group or an aryl group, and preferred embodiments of the alkyl group and aryl group are as described above for R X1 The preferred embodiments are the same as those when is an alkyl group or an aryl group.

[0027] R X2 The symbol represents one of the following: a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group. R X2 It is preferable that it is a hydrogen atom. Also, R X2 The preferred embodiments of the alkyl group, alkenyl group, alkynyl group, aryl group in -C(=O)R, -C(=O)OR, and -C(=O)NR are as described above. R X1 and R X2 These elements may be bonded to each other via any divalent linking group to form a ring, and examples of the resulting ring structure include a morpholine ring, a lactam ring, and a succinimide ring.

[0028] Furthermore, substituent X is preferably a group represented by any of the formulas (X-1) to (X-4) described below.

[0029] Specific examples of substituent X are shown below, but the present invention is not limited to these. [ka]

[0030] [Aromatic ring] In compound A, at least one of the (keto)oxime groups bonded to the aromatic ring by a single bond is located adjacent to substituent X on the aromatic ring. Two groups are said to be in adjacent positions on an aromatic ring if they each substitute for a hydrogen atom in an adjacent ring member of the aromatic ring, which is the ortho position if the aromatic ring is a benzene ring.

[0031] Aromatic rings to which (keto)oxime groups are bonded by single bonds include monocyclic aromatic rings (benzene ring, pyridine ring, furan ring, thiophene ring, pyrrole ring, etc.), aromatic rings formed by the condensation of aromatic hydrocarbon rings (naphthalene, anthracene, pyrene, etc.), and aromatic rings formed by the condensation of aromatic hydrocarbon rings and aromatic heterocycles (indole, benzofuran, benzothiophene, carbazole ring, fluorene ring, dibenzofuran ring, dibenzothiophene ring, etc.). These may be combined in any way, and aromatic rings to which (keto)oxime groups are directly bonded are connected by single bonds or any linking group Y. 11 These aromatic rings may be bonded by [a specific mechanism]. These aromatic rings may further have substituents, and the substituents are not particularly limited, but include alkyl groups, alkoxy groups, alkylthio groups, alkylamino groups, halogen atoms, nitro groups, cyano groups, etc. 11 This is Y in equation (1-1) described later. 11 This is synonymous with the same as the preferred configuration. When the aromatic ring to which the (keto)oxime group is bonded by a single bond has a fused ring structure of three or more rings, it is preferable that there is only one such fused ring structure of three or more rings in one molecule of compound A.

[0032] As a skeleton having multiple aromatic rings in a single molecule, structures derived from polyvalent phenol skeletons can also be suitably used. For example, structures described in paragraphs 0025 to 0035 of Japanese Patent Application Publication No. 2019-179078 can be suitably used.

[0033] As an aromatic ring to which a (keto)oxime group is bonded by a single bond, the structure shown in the following formula (X1-1) is also suitably used. [ka] In formula (X1-1), * represents a bonding site, at least one of which is a bonding site to a (keto)oxime group, and in the aromatic ring to which the (keto)oxime group is bonded, at least one of the hydrogen atoms adjacent to the (keto)oxime group is substituted with the substituent X described above. X 11 and X12 Each of these independently represents an aromatic hydrocarbon group, L 11 and L 12 These are independently single bonds, -O-, -S-, and -NR. L1 -, -CR L2 R L3 - or -C(=O)- represents R L1 ~R L3 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, L 11 and L 12 They cannot be single bonds at the same time. L 13 , L 14 Each of these independently represents a single bond or -C(=O)-, X 13 , X 14 Each of these independently represents a single bond, or a group having a pyrrole ring or an indole ring, X 13 or X 14 If it is a single bond, L 13 , L 14 It is a single bond, a represents 0 or 1, and if a is 0, L 11 It does not exist;

[0034] X 13 , X 14 However, in the case of a group having a pyrrole ring or an indole ring, for example, the following structure can be cited. The dashed line represents L. 13 or L 14 This shows the bonding site with the (keto)oxime group. X is a substituent X, and * is a bonding site with the (keto)oxime group. In the following structure, R 101 and R 102 Each of these independently represents a hydrogen atom or a substituent, and is preferably a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an alkylthio group, an aryloxy group, an arylthio group, an amino group, an acyl group, a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, or a halogen atom, and more preferably an alkyl group. [ka]

[0035] X in equation (X1-1) 11 and X 12 Each of these independently represents an aromatic hydrocarbon group. X 11 and X 12 The number of carbon atoms in the aromatic hydrocarbon group represented by is preferably 6 to 20, and more preferably 6 to 18. The aromatic hydrocarbon group may be a monoring or a fused ring. Specific examples of aromatic hydrocarbon groups include benzene ring groups, naphthalene ring groups, and anthracene ring groups, with benzene ring groups or naphthalene ring groups being preferred.

[0036] X 11 and X 12 The aromatic hydrocarbon group represented by may have substituents. Examples of substituents include alkyl groups, aryl groups, alkoxy groups, and aryloxy groups. 13 and X 13 If it is a single bond, X 12 L has the above substituent X adjacent to the (keto)oxime group. 14 and X 14 If it is a single bond, X 11 It has the above-mentioned substituent X adjacent to the (keto)oxime group.

[0037] L in equation (X1-1) 11 and L 12 These are independently single bonds, -O-, -S-, and -NR. L1 -, -CR L2 R L3 - or -C(=O)- represents R L1 ~R L3 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. When the aryl group is an aromatic hydrocarbon group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. When the above aryl group is an aromatic heterocyclic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms include nitrogen, oxygen, and sulfur atoms. Furthermore, the number of heteroatoms constituting the ring is preferably 1 to 3, and more preferably 1 to 2. The aromatic heterocyclic group may be a monocyclic or a fused ring.

[0038] L in equation (X1-1) 11 and L 12 These are, independently, single bonds, -O-, -S-, or -CR bonds. L2 R L3 - is preferable.

[0039] In equation (X1-1), a represents either 0 or 1, and if a is 0, L 11 There is no such thing as a. That is, when a in equation (X1-1) is 0, the group represented by equation (X1-1) is the same as the group represented by equation (X1-1a), and when a in equation (X1-1) is 1, the group represented by equation (X1-1) is the same as the group represented by equation (X1-1b). [ka]

[0040] If a in equation (X1-1) is 0, L 12 These are single bonds, -O-, -S-, or -CR bonds. L2 R L3 - is preferable, and more preferably a single bond, -O- or -S-.

[0041] R L1 ~R L3 It is preferably an alkyl group or an aryl group, and more preferably an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. When the above aryl group is an aromatic hydrocarbon group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. When the above aryl group is an aromatic heterocyclic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms include nitrogen, oxygen, and sulfur atoms. Furthermore, the number of heteroatoms constituting the ring is preferably 1 to 3, and more preferably 1 to 2. The aryl group may be a monocyclic or fused ring.

[0042] When a in equation (X1-1) is 1, L 11 It is preferable that it is a single bond. Also, L 12 is -O-, -S-, or -CR L2 R L3 - is preferable. L 11 and L 12 The following embodiments are examples of preferred combinations. L 11 L is a single bond. 12 The mode in which -O-. L 11 L is a single bond. 12 The mode in which -S-. L 11 L is a single bond. 12 ga-CR L2 R L3 -( Particularly preferred, R L2 and R L3 A configuration in which each of the elements is an alkyl group having 1 to 8 carbon atoms.

[0043] L in equation (X1-1) 13 represents a single bond or -C(=O)-, and -C(=O)- is preferred. Note that X 13 If it is a single bond, L 13 It is a single bond.

[0044] X in equation (X1-1) 13The group represents a single bond or a group having a pyrrole ring or an indole ring, preferably a group having a pyrrole ring or an indole ring, and more preferably a group having an indole ring. An example of a group having a pyrrole ring is the group represented by formula (X3-1). An example of a group having an indole ring is the group represented by formula (X3-2). [ka]

[0045] In the equation, * and the dashed line represent a bond, respectively, and the dashed line represents L in equation (X1-1). 13 This is a combination of X and X, where * is X in equation (X1-1). 13 This is equivalent to * being joined together, R X31 and R X32 Each of these independently represents a substituent. L X31 and L X32 Each of these independently represents a single bond or a linking group. x represents an integer between 0 and 3, and y represents an integer between 0 and 5.

[0046] R in equation (X3-1) X31 and R in equation (X3-2) X32 The substituents represented by include alkyl groups, aryl groups, alkoxy groups, alkylthio groups, aryloxy groups, arylthio groups, amino groups, acyl groups, cyano groups, nitro groups, hydroxyl groups, thiol groups, carboxyl groups, and halogen atoms, with alkyl groups being preferred. Also, R in formula (X3-1) X31 and R in equation (X3-2) X32 Of these, the one located adjacent to * is the substituent X mentioned above.

[0047] L in equation (X3-1) X31 and L of equation (X3-2) X32 Each of these independently represents either a single bond or a linking group, and a linking group is preferred. L X31 and L X32The linking group represented by is preferably an aromatic hydrocarbon group. The aromatic hydrocarbon group has 6 to 20 carbon atoms, and more preferably 6 to 18 carbon atoms. The aromatic hydrocarbon group may be a monoring or a fused ring. Specific examples of aromatic hydrocarbon groups include benzene ring groups, naphthalene ring groups, and anthracene ring groups, with benzene ring groups or naphthalene ring groups being preferred. The above aromatic hydrocarbon group may have substituents. Examples of substituents include alkyl groups, aryl groups, alkoxy groups, and aryloxy groups. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The number of carbon atoms in the above-mentioned alkoxy group is preferably 1 to 15, and more preferably 1 to 10. The alkoxy group is preferably linear or branched, and more preferably linear. When the above aryl group is an aromatic hydrocarbon group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. When the above aryl group is an aromatic heterocyclic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms include nitrogen, oxygen, and sulfur atoms. Furthermore, the number of heteroatoms constituting the ring is preferably 1 to 3, and more preferably 1 to 2. The aromatic heterocyclic group may be a monocyclic or a fused ring. The preferred embodiment of the aryl group in the above-mentioned aryloxy group is the same as the preferred embodiment of the aryl group described above.

[0048] In equation (X3-1), x represents an integer between 0 and 3, preferably 0 or 1, and more preferably 0.

[0049] In equation (X3-2), y represents an integer between 0 and 5, preferably 0 or 1, and more preferably 0.

[0050] The following structures are examples of aromatic rings to which a (keto)oxime group is bonded by a single bond in compound A, but are not limited to these. These can be used in any combination. At least one (keto)oxime group is bonded by a single bond to the aromatic ring in the following structures, and substituent X is bonded to a position adjacent to that (keto)oxime group. R X1 ~R X9 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, with alkyl groups or aryl groups being preferred, and alkyl groups being more preferred. Preferred embodiments of alkyl groups and aryl groups are as described above. L1 ~R L3 This is similar to the preferred embodiment of the alkyl and aryl groups in the above.

[0051] The aromatic ring to which the (keto)oxime group is bonded in the present invention preferably has the following structure, for example. Examples of aromatic rings having a monocyclic structure include (Ar-1) to (Ar-8). [ka]

[0052] Among these, (Ar-1), (Ar-2), (Ar-3), (Ar-7), and (Ar-8) are preferred. More preferably, (Ar-1), (Ar-2), (Ar-7), and (Ar-8) are preferred, and most preferably, (Ar-7) and (Ar-8) are preferred.

[0053] Aromatic rings with a fused ring structure include (Ar-9) to (Ar-29). In this specification, a bond intersecting the edge of a ring structure means that one of the hydrogen atoms of the ring structure is substituted, and a bond intersecting the edges of two or more ring structures means that one of the hydrogen atoms of any of those ring structures is substituted. [ka] Among these, (Ar-9), (Ar-10), (Ar-11), (Ar-12), and (Ar-29) are preferred. More preferably are (Ar-11) and (Ar-12), and most preferably (Ar-12).

[0054] Aromatic rings having a naphthalene ring in their fused ring structure are also preferred, for example, (Ar-30) to (Ar-41). [ka]

[0055] Each R independently represents a hydrogen atom or a substituent. * represents a substituent, and at least one of them represents a (keto)oxime group. Examples of substituents on the aromatic ring include alkyl groups, aryl groups, alkoxy groups, alkylthio groups, alkylamino groups, aryloxy groups, arylthio groups, arylamino groups, halogen atoms, nitro groups, cyano groups, acyl groups, acyloxy groups, alkoxycarbonyloxy groups (alkyl carbonate groups), alkylaminocarbonyloxy groups (alkyl carbamate groups), arylcarbonyloxy groups (aryl carbonate groups), arylaminocarbonyloxy groups (aryl carbamate groups), etc. The hydrogen atoms of the aromatic ring may be optionally substituted with the substituents mentioned above.

[0056] Furthermore, the following structure is also preferred for compound A, as it contains an aromatic ring to which the (keto)oxime group is bonded by a single bond. In the following structure, Ox indicates the position to which the (keto)oxime group is bonded by a single bond, and X indicates the site to which the substituent X is bonded. Also, the substitution positions of adjacent Ox and X may be swapped. If there are multiple adjacent Ox and X, the substitution positions may be swapped in one combination, or the substituent values ​​may be swapped in all combinations. [ka] [ka]

[0057] [Equation (1-1) or Equation (1-2)] Compound A preferably contains a compound represented by formula (1-1) or formula (1-2). [ka] In formula (1-1), R 11 Each of these independently represents a monovalent substituent, m11 represents an integer from 0 to 3, and if m11 is 2 or greater, adjacent R 11 They may be joined to each other to form a ring, X 11 は-OR X1 , -SR X1 and -NR x1 R x2 Represents either of the following, R X1 R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. X2 represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group, R X1 and R X2 The elements may be linked to each other via any divalent linking group to form a ring, where n represents an integer from 2 to 4, and when n is 2, Y 11 represents a single bond or an n-valent organic group, and Y is used when n is 3 or 4. 11 represents an n-valent organic group, Z 11 represents the group shown in the following formula (Z-1), and X 11 and Z 11 These are adjacent positions in the benzene ring described in formula (1-1). In formula (1-2), R 21 Each of these independently represents a monovalent substituent, m21 represents an integer from 0 to 2, and when m21 is 2, adjacent R 21 They may bond to each other to form a ring, R 22 Each of these independently represents a monovalent substituent, m22 represents an integer from 0 to 2, and when m22 is 2, adjacent R 22 They may be joined to each other to form a ring, Y21 -O-, -S-, -NR y1 -, -C(R y1 R y2 )-, -C(=O)- represents either Y 22 These are single bonds, -O-, -S-, -NR y1 -, -C(R y1 R y2 )-, -C(=O)- represents either R y1 and R y2 Each of these independently represents a hydrogen atom or a monovalent organic group, and X 21 and X 22 Each is independent of -OR X1 , -SR X1 and -NR x1 R x2 Represents either of the following, R X1 R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. X2 represents a hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group, and Z 21 and Z 22 Each of these independently represents a group shown by the following formula (Z-1), and X 21 and Z 21 In formula (1-2), X is a relative positional relationship in the benzene ring. 22 and Z 22 These are adjacent positions in the benzene ring described in formula (1-2). [ka] In formula (Z-1), Rz 1 Rz represents one of the alkyl, aryl, alkoxy, or aryloxy groups. 2 represents a monovalent organic group, nz represents 0 or 1, and * represents a bonding site with the aromatic ring structure.

[0058] -R 11 - In formula (1-1), R 11Each of these independently represents a monovalent substituent, and examples include alkyl groups, alkenyl groups, alkynyl groups, aryl groups, halogen atoms, and groups corresponding to the substituent X mentioned above. R 11 The alkyl group in is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably an alkyl group having 1 to 4 carbon atoms. Furthermore, the alkyl group may be a branched alkyl group, preferably a branched alkyl group having 3 to 10 carbon atoms, more preferably a branched alkyl group having 3 to 8 carbon atoms, and even more preferably a branched alkyl group having 3 to 6 carbon atoms. Furthermore, the alkyl group may be a cyclic alkyl group, preferably a cyclic alkyl group having 4 to 10 carbon atoms, and more preferably a cyclic alkyl group having 5 or 6 carbon atoms. R 11 The alkenyl group in is preferably a C3-C10 alkenyl group, more preferably a C3-C6 alkenyl group, and even more preferably a C3-C5 alkenyl group. Furthermore, the above alkenyl group may be a branched alkenyl group, preferably a C4-C10 branched alkenyl group, more preferably a C4-C8 branched alkenyl group, and even more preferably a C4-C6 branched alkenyl group. Furthermore, the above alkenyl group may be a cyclic alkenyl group, preferably a C5-C10 cyclic alkyl group, and even more preferably a C6 cyclic alkyl group. R 11 The alkynyl group in is preferably an alkynyl group having 3 to 10 carbon atoms, more preferably an alkynyl group having 3 to 6 carbon atoms, and even more preferably an alkynyl group having 3 to 5 carbon atoms. R 11 The aryl group in this compound may be an aromatic hydrocarbon group or an aromatic heterocyclic group, but an aromatic hydrocarbon group is preferred. The aromatic hydrocarbon group is preferably one having 6 to 20 carbon atoms, more preferably a phenyl group or a naphthyl group, and even more preferably a phenyl group. The above aryl group may have further substituents, and examples of substituents include aryl groups, alkyl groups, alkoxy groups, alkylcarbonyl groups, halogen atoms, and the like. R 11 The preferred embodiment when the substituent X is a group is as described above.

[0059] -m11- In formula (1-1), m11 represents an integer between 0 and 3, preferably between 0 and 2, and more preferably 0 or 1. Furthermore, the embodiment in which m11 is 0 is also one of the preferred embodiments of the present invention. If m11 is 2 or more, adjacent R 11 These elements may bond to each other to form a ring, which may be an aromatic ring, an aliphatic ring, a hydrocarbon ring, or a heteroring.

[0060] -X 11 - In formula (1-1), X 11 は-OR X1 , -SR X1 and -NR x1 R x2 Represents either of the following, R X1 , and R X2 A preferred embodiment is R as described above in substituent X. X1 , and R X2 This is similar to the preferred embodiment. n X 11 The substituents may be the same or different, but it is preferable that they be the same. Also, in equation (1-1), X 11 It is preferable that the group is represented by one of the following formulas (X-1) to (X-4). [ka] In formula (X-1), L x is -O-, -S-, or -NR N1 - represents one of the following, R N1 represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. N1 When is not a hydrogen atom, it may bond with any of the substituents in formula (X-1) to form a ring, L x11 R represents a single bond or an alkylene group having 1 to 6 carbon atoms.x11 , R x12 and R x13 Each of these is independently a hydrogen atom, an alkyl group, an aryl group, and -(C=O)R V1 ,-(C=O)OR V1 or -(C=O)NR V1 R V2 Represents R V1 and R V2 Each of these independently represents a hydrogen atom or a monovalent organic group, and R x11 and R x12 , R x12 and R x13 , R x11 and L x11 , R x13 and L x11 They may be connected to each other to form a ring. In formula (X-2), L x is -O-, -S-, or -NR N1 - represents one of the following, R N1 represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. N1 When is not a hydrogen atom, it may bond with any of the substituents in formula (X-2) to form a ring, L x21 R represents a single bond or an alkylene group with 1 to 6 carbon atoms. x21 This refers to a hydrogen atom, alkyl group, aryl group, -(C=O)R V1 ,-(C=O)OR V1 or -(C=O)NR V1 R V2 Represents R V1 and R V2 Each of these independently represents a hydrogen atom or a monovalent organic group. In formula (X-3), L x is -O-, -S-, or -NR N1 - represents one of the following, R N1 represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. N1 When is not a hydrogen atom, it may bond with any of the substituents in formula (X-3) to form a ring, L x31 L represents a single bond or an alkylene group having 1 to 6 carbon atoms, or a group having any of O, S, or N. x32represents a single bond, -O-, -S-, or -NR-, and R represents a hydrogen atom or a monovalent organic group. x32 , R x33 R represents an alkyl group. x32 and R x33 , R x32 and L x31 , R x33 and L x31 They may be connected to each other to form a ring. In formula (X-4), L x is -O-, -S-, or -NR N1 - represents one of the following, R N1 represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. N1 When is not a hydrogen atom, it may bond with any of the substituents in formula (X-4) to form a ring, and R x41 R represents an alkyl group, aryl group, alkoxy group, aryloxy group, amino group, alkylamino group, or arylamino group. x41 is L x It may also combine with other elements to form a ring.

[0061] -Formula (X-1)- In formula (X-1), L x is -O-, -S-, or -NR N1 It represents one of the following, and is preferably -O-. In formula (X-1), R N1 A preferred embodiment is, as described above, a hydrogen atom. Also, R N1 Preferred embodiments of alkyl groups, aryl groups, and -C(=O)R in the above-mentioned R X1 This is similar to the preferred embodiments of alkyl groups, aryl groups, and -C(=O)R in the above.

[0062] In formula (X-1), L x11 The alkylene group having 1 to 3 carbon atoms is preferred, and the alkylene group having 1 or 2 carbon atoms is more preferred. Also, L x11 Another preferred embodiment of the present invention is that the group is an alkylene group having 1 carbon atom. The alkylene group may be linear, branched, cyclic, or represent any of these structures through bonding. The hydrogen atoms in the alkylene group described above may have substituents. Examples of substituents include halogen atoms, aryl groups, and hydroxyl groups.

[0063] In formula (X-1), R x11 , R x12 , and R x13 Each of these is independently a hydrogen atom, an alkyl group, an aryl group, and -(C=O)R V1 ,-(C=O)OR V1 or -(C=O)NR V1 R V2 Represents R V1 and R V2 Each of these independently represents a hydrogen atom or a monovalent organic group. As the alkyl group, alkyl groups having 1 to 20 carbon atoms are preferred, alkyl groups having 1 to 10 carbon atoms are more preferred, alkyl groups having 1 to 4 carbon atoms are even more preferred, and methyl groups are particularly preferred. The alkyl group may be linear, branched, cyclic, or have a structure formed by the bonding of these elements. The number of carbon atoms in the above aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The above R V1 and R V2 Each of these is preferably a monovalent organic group, and preferably an alkyl group or an aryl group. Preferred embodiments of the alkyl group and aryl group are as described above. x11 , R x12 , and R x13 This is similar to the preferred embodiment when is an alkyl group or an aryl group.

[0064] R x11 and R x12 , R x12 and R x13 , R x11 and L x11 , R x13 and L x11 They may be connected to each other to form a ring. The formed ring structure is preferably an aliphatic ring structure, and more preferably an aliphatic hydrocarbon ring structure. The number of members in the above ring structure is preferably 5 or 6.

[0065] Specific examples of the group represented by formula (X-1) are shown below, but the present invention is not limited to these. [ka]

[0066] -Formula (X-2)- In formula (X-2), L x A preferred embodiment is L in equation (X-1). x This is similar to the above. In formula (X-2), L x21 The alkylene group having 1 to 3 carbon atoms is preferred, and the alkylene group having 1 or 2 carbon atoms is more preferred. Also, L x21 Another preferred embodiment of the present invention is that the group is an alkylene group having 1 carbon atom. The alkylene group may be linear, branched, cyclic, or represent any of these structures through bonding. The hydrogen atoms in the alkylene group described above may have substituents. Examples of substituents include halogen atoms, aryl groups, and hydroxyl groups.

[0067] In formula (X-2), R X21 This refers to a hydrogen atom, alkyl group, aryl group, -(C=O)R V1 ,-(C=O)OR V1 or -(C=O)NR V1 R V2 Represents R V1 and R V2 Each of these independently represents a hydrogen atom or a monovalent organic group. As the alkyl group, alkyl groups having 1 to 20 carbon atoms are preferred, alkyl groups having 1 to 10 carbon atoms are more preferred, alkyl groups having 1 to 4 carbon atoms are even more preferred, and methyl groups are particularly preferred. The alkyl group may be linear, branched, cyclic, or have a structure formed by the bonding of these elements. The number of carbon atoms in the above aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The above R V1 and R V2 Each of these is preferably a monovalent organic group, and preferably an alkyl group or an aryl group. Preferred embodiments of the alkyl group and aryl group are as described above. x21 This is similar to the preferred embodiment when is an alkyl group or an aryl group.

[0068] Specific examples of the group represented by formula (X-2) are shown below, but the present invention is not limited to these. [ka]

[0069] -Formula (X-3)- In formula (X-3), L x A preferred embodiment is L in equation (X-1). x This is similar to the above. In formula (X-3), L x31 The single bond or alkylene group having 1 to 3 carbon atoms is preferred, and an alkylene group having 1 or 2 carbon atoms is more preferred. Also, L x31 In the above embodiment, L x31 It is preferable that it is a 1,2-ethanediyl group. The alkylene group may be linear, branched, cyclic, or represent any of these structures through bonding. The hydrogen atoms in the alkylene group described above may have substituents. Examples of substituents include halogen atoms, aryl groups, and hydroxyl groups.

[0070] In formula (X-3), L x32 The symbol (-) represents a single bond, -O-, -S-, or -NR-. A preferred embodiment of R in -NR- is R in the above equation (X-1). N1This is similar to the preferred embodiment when is not a hydrogen atom. Among these, L x32 If L is not included in the ring structure, 32 A single bond or -O- is preferred.

[0071] In formula (X-3), R x32 represents an alkyl group. R X32 The alkyl group in is preferably an alkyl group having 1 to 15 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and even more preferably an alkyl group having 1 to 4 carbon atoms. The alkyl group described above may be linear, branched, cyclic, or represent any of these structures through bonding.

[0072] R X33 The alkyl group in is preferably an alkyl group having 1 to 15 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and even more preferably an alkyl group having 1 to 4 carbon atoms. The alkyl group described above may be linear, branched, cyclic, or represent any of these structures through bonding.

[0073] R X32 and R X33 , R X32 and L X31 , R X33 and L X31 These elements may be linked to each other to form a ring. An aliphatic ring structure is preferred as the resulting ring structure. The above aliphatic ring structure may be a monoring, a fused ring, a bridging ring, or a spiroring, but a monoring or bridging ring is preferred. The number of members in the above aliphatic ring structure is preferably 5 to 15, and more preferably 5 to 10. When the above aliphatic ring structure is a monoring structure, it is preferable to form a 3- to 7-membered ring, and more preferably a 5 or 6-membered ring. Also, from the viewpoint of sensitivity, R 32 and R 33 It is preferable that a five-membered ring is formed. Examples of aliphatic ring structures that are bridging ring structures include dicyclopentane rings and isonorbornane rings.

[0074] Specific examples of the group represented by formula (X-3) are shown below, but the present invention is not limited to these. [ka]

[0075] -Formula (X-4)- In formula (X-4), L X A preferred embodiment is L in equation (X-1). X This is similar to the above. R x41 R represents an alkyl group, aryl group, alkoxy group, aryloxy group, amino group, alkylamino group, or arylamino group. y1 and R y2 These may be linked via single bonds or linking groups to form a ring.

[0076] The above R X41 The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The number of carbon atoms in the above-mentioned alkoxy group is preferably 1 to 15, and more preferably 1 to 10. The alkoxy group is preferably linear or branched, and more preferably linear. The number of carbon atoms in the above-mentioned aryl group and aryloxy group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. Furthermore, when the aryl group in the above-mentioned aryl group and aryloxy group is a heteroaromatic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms constituting the ring of the above-mentioned heteroaromatic group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms is preferably 1 to 3, and more preferably 1 to 2. The aryl group in the above-mentioned aryl group and aryloxy group may be a monocyclic or fused ring. A preferred embodiment of the alkyl group in the alkylamino group is R X41 This is similar to the preferred embodiment of the alkyl group in the above. A preferred embodiment of the aryl group in the above arylamino group is R X41 This is similar to the preferred embodiment of the aryl group in [the relevant context].

[0077] From the standpoint of sensitivity as a photopolymerization initiator, R X41 Alkyl, aryl, or alkoxy groups are more preferred. Alkyl and alkoxy groups have 1 to 5 carbon atoms, and aryl groups have 6 to 10 carbon atoms more preferred. Specifically, methyl groups, phenyl groups, 2,4,6-trimethylphenyl groups, methoxy groups, and ethoxy groups are more preferred.

[0078] Specific examples of the base represented by formula (X-4) are shown below, but the present invention is not limited to these. [ka]

[0079] -n- In formula (1-1), n ​​represents an integer between 2 and 4, preferably 2 or 3, and more preferably 2. Also, n in equation (1-1) is 2, and Y 11 These are single bonds, -O-, -S-, -S(=O)-, -S(=O)2-, -NR y31 - or -CR y32 R y33 - and R y32 , R y33 In the present invention, each of these is independently a hydrogen atom, an alkyl group, an aryl group, a trifluoromethyl group, or a group represented by formula (Q-1) described below. R y32 , R y33The preferred embodiments of formula (Q-1) are the same as those in formula (2-1) described later.

[0080] -Y 11 - If n is 2, then Y 11 represents a single bond or an n-valent organic group, and Y is used when n is 3 or 4. 11 This represents an n-valent organic group.

[0081] Y 11 Examples include single bonds or groups consisting of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms. Groups consisting of 1 to 60 carbon atoms, 0 to 10 nitrogen atoms, 0 to 40 oxygen atoms, 1 to 120 hydrogen atoms, and 0 to 10 sulfur atoms are preferred, groups consisting of 1 to 50 carbon atoms, 0 to 10 nitrogen atoms, 0 to 30 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 7 sulfur atoms are more preferred, and groups consisting of single bonds or groups consisting of 1 to 40 carbon atoms, 0 to 8 nitrogen atoms, 0 to 20 oxygen atoms, 1 to 80 hydrogen atoms, and 0 to 5 sulfur atoms are particularly preferred. 11 Examples include single bonds, or groups composed of the following structural units or two or more of the following structural units combined (which may form a ring structure). In the following formulas, * represents a bond. [ka]

[0082] Y 11 The linking group in may have substituents. Examples of substituents include C1-C20 alkyl groups, C6-C16 aryl groups, carboxyl groups, sulfonamide groups, N-sulfonylamide groups, C1-C6 acyloxy groups, C1-C20 alkoxy groups, halogen atoms, C2-C7 alkoxycarbonyl groups, cyano groups, carbonate ester groups, ethylenically unsaturated bond-containing groups, epoxy groups, oxetane groups, and the like.

[0083] Y11 The linking group in is preferably a group represented by either formula (Za-1) or (Za-2). [ka] In equation (Za-1), La 3 represents a trivalent group, Ta 3 represents a single bond or a divalent linking group, and there are three Ta 3 They may be the same or different from one another. In equation (Za-2), La 4 represents a tetravalent group, Ta 4 represents a single bond or a divalent linking group, and there are four Ta 4 They may be the same or different from one another. In the above formula, * represents a bond.

[0084] Ta 3 ~Ta 4 Examples of divalent linking groups represented by include alkylene groups, arylene groups, heterocyclic groups, -C(CF3)2-, -NH-, -S(=O)-, -S(=O)2-, -C(=O)-, -O-, -C(=O)O-, -OC(=O)-, -S-, -NHC(=O)-, -C(=O)NH-, and groups formed by combining two or more of these. The alkylene group preferably has 1 to 20 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkylene group may be linear, branched, or cyclic, and is preferably linear or branched, and more preferably linear. The number of carbon atoms in the arylene group is preferably 6 to 20, and more preferably 6 to 12. The heterocyclic group may be a non-aromatic heterocyclic group or an aromatic heterocyclic group. The heterocyclic group is preferably a 5-membered or 6-membered ring. Examples of heteroatoms constituting the heterocyclic group include nitrogen, oxygen, and sulfur atoms. The number of heteroatoms constituting the heterocyclic group is preferably 1 to 3. The heterocyclic group may be a monocyclic group or a fused ring. The alkylene group, arylene group, and heterocyclic group may have substituents within the range that allows the effects of the present invention to be obtained.

[0085] La 3 The trivalent group represented by can be seen as the group obtained by removing one hydrogen atom from the divalent linking group mentioned above. 4 An example of a tetravalent group represented by this is a group obtained by removing two hydrogen atoms from the divalent linking group mentioned above. La 3 ~La 4 The 3- to 4-valent group represented by may have substituents within the range in which the effects of the present invention can be obtained.

[0086] Y 11 Specific examples of n-valent linking groups represented by include the group with the following structure. * represents a bond. Also, Y 11 Examples of n-valent linking groups represented by include the group with the structure described in paragraphs 0056-0059 of International Publication No. 2016 / 136089, and the group with the structure in which the OH group of a polyvalent phenol is replaced with a linking group, as described in paragraph 0050 of Japanese Patent Publication No. 2013-177542.

[0087] Linking group Y when it consists of hydrocarbon groups 11 It is even more preferable that the structure is one of the following groups. * indicates a linkage between a (keto)oxime group and an aromatic group having a heterosubstituted group as an adjacent group. [ka] R can be a hydrogen atom, an alkyl group, an aryl group, a hydroxyl group, a carboxyl group, or a fluorine-containing alkyl group (such as -CF3 or -C2F5). If there are multiple R groups, they may bond to each other to form a ring.

[0088] -Z 11 - Z 11 represents the group shown in equation (Z-1), and X 11 and Z 11 These are adjacent positions in the benzene ring described in formula (1-1).

[0089] < <Rz 1 >> In formula (Z-1), Rz 1The group represents one of an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, more preferably an alkyl group, an aryl group, an alkoxy group, or an aryloxy group, even more preferably an alkyl group, and particularly preferably a methyl group. Rz 1 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. 1 The alkyl group represented is preferably a methyl group. Rz 1 The number of carbon atoms in the alkoxy group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkoxy group is preferably linear or branched, and more preferably linear. Rz 1 When the aryl group in the aryl group and aryloxy group is an aromatic hydrocarbon group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. Rz 1 In the aryl group and aryloxy group represented by , if the aryl group is an aromatic heterocyclic group, the number of atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms is preferably 1 to 3, and more preferably 1 to 2. The aryl group in the aryl group and aryloxy group may be a monocyclic or fused ring. Below, Rz in equation (Z-1) 1 Preferred embodiments are described below, but the present invention is not limited thereto. In the following structures, * represents the bonding site with the carbonyl group in formula (Z-1). [ka]

[0090] < <Rz2 >> In formula (Z-1), Rz 2 It is preferably an alkyl group or an aryl group, more preferably an alkyl group or an aryl group, and even more preferably an alkyl group.

[0091] Rz 2 From the viewpoint of sensitivity, it is preferable that the alkyl group is an unsubstituted linear alkyl group, a branched alkyl group, a ring alkyl group, or an alkyl group having at least one substituent selected from group A below, more preferably a branched alkyl group or a ring alkyl group, and even more preferably a ring alkyl group. Of the ring alkyl group, it is preferable that the alkyl group has a cyclic alkyl group as a substituent, more preferably an alkyl group having a 3- to 7-membered ring cyclic alkyl group as a substituent, even more preferably an alkyl group having a 5- to 7-membered ring cyclic alkyl group as a substituent, particularly preferably an alkyl group having a 5- or 6-membered ring cyclic alkyl group as a substituent, and most preferably an alkyl group having a 6-membered ring cyclic alkyl group as a substituent.

[0092] From the viewpoint of sensitivity, the position of the branched structure is preferably at the γ position of the oxime group, and it is more preferable that there is one hydrogen atom (γ hydrogen) at the γ position.

[0093] Rz 2 From the viewpoint of sensitivity, it is also preferable that the alkyl group has a heteroatom-containing group as a substituent. The heteroatom-containing group is preferably a group having an oxygen atom, a sulfur atom, or a nitrogen atom.

[0094] (Group A) Cyano group, alkenyl group, alkynyl group, -N(R a )2, -SR a -C(=O)OH, -OR a -OC(=O)R c , -OC(=O)-OR c -C(=O)NRa R b , -NR a -C(=O)-R b -OC(=O)-NR a R b , -NR a -C(=O)-OR b , -NR a -C(=O)-NR a R b -S(=O)-R c -S(=O)2-R c , -OS(=O)2-R c -S(=O)2-NR a R b , -NR a -SO2-R a -C(=O)-NR a -C(=O)R b -C(=O)-NR a -S(=O)2-R b -S(=O)2-NR a -C(=O)-R b -S(=O)2-NR a -S(=O)2-R c , -Si(R a ) L (OR b ) K , heterocyclic group, and -O(R d O) J -R a Here, R a and R b Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R c Each of these independently represents an alkyl group or an aryl group, and R d Each of the following independently represents an alkylene group, an arylene group, or a group formed by combining two or more of these groups; L and K independently represent integers from 0 to 3, satisfying L + K = 3; and J represents an integer from 1 to 100.

[0095] The above R a Each of these is preferably an alkyl group or an aryl group, more preferably an alkyl group, and particularly preferably a cyclic alkyl group. The above Rb Each of these is preferably independently a hydrogen atom or an alkyl group, and more preferably an alkyl group. The above R c It is preferably an alkyl group or an aryl group, and is preferably an alkyl group. The above R d Each of these groups is preferably an alkylene group, and more preferably an ethylene group or a propylene group.

[0096] The above R a ~R c Two or more of these may be linked by single bonds or linking groups to form a ring. The linking groups used to form the ring may be -O-, -S-, -NR L101 -, -CR L102 R L103 - is one example. L101 ~R L103 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. L101 ~R L103 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. L101 ~R L103 The number of carbon atoms in the aryl group represented is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7.

[0097] Furthermore, from the viewpoint of sensitivity as a photopolymerization initiator, in formula (Z-1), Rz 2 It is preferable that the group is represented by formula (P-1). [ka] In equation (P-1), * represents a bond, L Z1 L represents a single bond or an alkylene group. Z2 ~L Z4 Each of these is independent of -CRL1 R L2 -, -O-, -S-, or -NR L3 - represents R L1 ~R L3 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Z1 and R Z2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Z1 and R Z2 L may be linked via single bonds or linking groups to form a ring, however, Z2 ~L Z4 At least two of them are -CR L1 R L2 - is

[0098] L in equation (P-1) Z1 The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 to 3, even more preferably 1 or 2, and particularly preferably 1. L Z1 It is preferable that it is a single bond or a methylene group, and more preferably a single bond.

[0099] L in equation (P-1) Z2 ~L Z4 These are, independently, -CR L1 R L2 -, -O-, -S-, or -NR L3 - represents R L1 ~R L3 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. R L1 ~R L3 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. R L1 ~R L3When the aryl group represented is an aromatic hydrocarbon group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. R L1 ~R L3 When the aryl group represented is an aromatic heterocyclic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms constituting the ring of the aromatic heterocyclic group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the aromatic heterocyclic group is preferably 1 to 3, and more preferably 1 to 2. The aromatic heterocyclic group may be a monocyclic or a fused ring. R L1 ~R L3 Each of these is preferably independently a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.

[0100] In equation (P-1), L Z2 ~L Z4 At least two of them are -CR L1 R L2 - is In a preferred embodiment, L Z2 However, -CR L1 R L2 -An example of this is L Z2 -CR L1 R L2 -R in L1 and R L2 It is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. In another preferred embodiment, L Z3 and L Z4 However, each is independently -CR L1 R L2 -An example of this is L Z3 and L Z4 -CR L1 R L2 -R in L1 and R L2 It is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom.

[0101] L in equation (P-1) Z2 ~L Z4 These are, independently, -CR L1 R L2 - is particularly preferable.

[0102] In equation (P-1), L Z1 is a single bond or a methylene group, L Z2 ga-CR L1 R L2 - is preferable, L Z1 L is a single bond. Z2 ga-CR L1 R L2 - is more preferable.

[0103] R in equation (P-1) Z1 and R Z2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group. R Z1 and R Z2 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. R Z1 and R Z2 When the aryl group represented is an aromatic hydrocarbon ring group, the number of carbon atoms is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. R Z1 and R Z2 When the aryl group represented is an aromatic heterocyclic group, the number of carbon atoms constituting the ring is preferably 1 to 15, and more preferably 1 to 10. Examples of heteroatoms constituting the ring of the aromatic heterocyclic group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the aromatic heterocyclic group is preferably 1 to 3, and more preferably 1 to 2. The aromatic heterocyclic group may be a monocyclic or a fused ring. R Z1 and R Z2Each of these is preferably a hydrogen atom or an alkyl group, independently of the others.

[0104] R in equation (P-1) Z1 and R Z2 These may be bonded via single bonds or linking groups to form a ring. The linking groups used to form the ring may be -O-, -S-, and -NR. L101 -, -CR L102 R L103 - is one example. L101 ~R L103 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. L101 ~R L103 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. L101 ~R L103 The number of carbon atoms in the aryl group represented is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. The formed ring is preferably a 3 to 8-membered ring, more preferably a 4 to 7-membered ring, and even more preferably a 5-membered or 6-membered ring. The formed ring is preferably a non-aromatic ring, and more preferably an aliphatic hydrocarbon ring. The formed ring is particularly preferably a 5-membered or 6-membered aliphatic hydrocarbon ring.

[0105] As a preferred embodiment of the base represented by formula (P-1), L Z1 is a single bond or a methylene group, L Z2 ~L Z4 However, each is independent of -CR L1 R L2 - and R L1 and R L2 Each of these is independently a hydrogen atom or an alkyl group, R Z1 and R Z2Examples include embodiments that are each independently a hydrogen atom or an alkyl group. In this embodiment, R L1 , R L2 , R Z1 and R Z2 are each preferably a hydrogen atom.

[0106] As another preferred embodiment of the group represented by formula (P-1), L Z1 is a single bond or a methylene group, L Z2 ~L Z4 are each independently -CR L1 R L2 -, where R L1 and R L2 are each independently a hydrogen atom or an alkyl group, R Z1 and R Z2 are bonded via a single bond or a linking group to form a ring. In this embodiment, R L1 and R L2 are each preferably a hydrogen atom. R Z1 and R Z2 The ring formed by the bonding of is preferably an aliphatic hydrocarbon ring, more preferably an aliphatic hydrocarbon ring having 3 to 8 members, still more preferably an aliphatic hydrocarbon ring having 4 to 7 members, and particularly preferably an aliphatic hydrocarbon ring having 5 or 6 members.

[0107] From the perspective of the sensitivity as a photopolymerization initiator, in formula (Z-1), Rz 2 is preferably a group represented by formula (P-2).

Chemical formula

[0108] L Z11 It is preferable that it is an alkylene group having 1 to 3 carbon atoms.

[0109] R Z11 ~R Z14 , R LZ11 and R LZ12 The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. R Z11 ~R Z14 , R LZ11 and R LZ12 It is preferable that it is a hydrogen atom.

[0110] p represents an integer between 1 and 5, preferably 3 or 4, and more preferably 3.

[0111] In equation (P-2), L Z11 R Z11 or R Z12 It may also bond with to form a ring. The formed ring is more preferably a 3- to 8-membered aliphatic hydrocarbon ring, even more preferably a 4- to 7-membered aliphatic hydrocarbon ring, and particularly preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0112] Below, Rz in equation (Z-1) 2Preferred embodiments are described below, but the present invention is not limited thereto. In the following structures, * represents Rz in formula (Z-1). 2 This represents the bonding site with the carbon atom to which it is bonded. [ka]

[0113] < <nz>> In formula (Z-1), it is preferable that nz is 1 from the viewpoint of enabling photobleaching to cure even thick films to deep layers.

[0114] -R 21 , m21, R 22 , m22, Z 21 , Z 22 , X 21 , X 22 - In formula (1-2), R 21 A preferred embodiment is R in formula (1-1). 11 This is similar to the preferred embodiment. In formula (1-2), the preferred embodiment of m21 is the same as the preferred embodiment of m11 in formula (1-1). If m21 is 2, then adjacent R 21 These elements may bond to each other to form a ring, which may be an aromatic ring, an aliphatic ring, a hydrocarbon ring, or a heteroring. In formula (1-2), R 22 A preferred embodiment is R in formula (1-1). 11 This is similar to the preferred embodiment. In formula (1-2), the preferred embodiment of m22 is the same as the preferred embodiment of m11 in formula (1-1). If m22 is 2, then adjacent R 22 These elements may bond to each other to form a ring, which may be an aromatic ring, an aliphatic ring, a hydrocarbon ring, or a heteroring. In formula (1-2), Z 21 A preferred embodiment is Z in equation (1-1). 11 This is similar to the preferred embodiment. In formula (1-2), Z 22 A preferred embodiment is Z in equation (1-1). 11 This is similar to the preferred embodiment. In formula (1-2), X 21 A preferred embodiment is X in formula (1-1). 11 This is similar to the preferred embodiment. In formula (1-2), X 22 A preferred embodiment is X in formula (1-1). 11 is the same as the preferred embodiment. X 21 and X 22 may be the same or different substituents, but are preferably the same. In addition, R 21 and R 22 , m21 and m22, Z 21 and Z 22 may also be the same or different.

[0115] -Y 21 - Y 21 is any one of -O-, -S-, -NR y1 -, -C(R y1 R y2 )-, -C(=O)-, and -O- and -C(R y1 R y2 )- are preferred, and -C(R y1 R y2 )- is more preferred.

[0116] R y1 and R y2 each independently represent a hydrogen atom or a monovalent organic group, preferably a hydrogen atom, an alkyl group or an aryl group, and more preferably a hydrogen atom or an alkyl group. As the alkyl group, an alkyl group having 1 to 10 carbon atoms is preferred, an alkyl group having 1 to 6 carbon atoms is more preferred, and an alkyl group having 1 to 4 carbon atoms is even more preferred. Further, the alkyl group may be a branched alkyl group, and as the branched alkyl group, a branched alkyl group having 3 to 10 carbon atoms is preferred, a branched alkyl group having 3 to 8 carbon atoms is more preferred, and a branched alkyl group having 3 to 6 carbon atoms is even more preferred. Furthermore, the alkyl group may be a cyclic alkyl group, and as the cyclic alkyl group, a cyclic alkyl group having 4 to 10 carbon atoms is preferred, and a cyclic alkyl group having 5 or 6 carbon atoms is more preferred. Also, being a linear alkyl group is also one of the preferred embodiments of the present invention. The above alkyl group may further have a substituent, and examples of the substituent include a halogen atom. The aryl group may be an aromatic hydrocarbon group or an aromatic heterocyclic group, but an aromatic hydrocarbon group is preferred. The aromatic hydrocarbon group is preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms, more preferably a phenyl group or a naphthyl group, and even more preferably a phenyl group.

[0117] Y 22 These are single bonds, -O-, -S-, -NR y1 -, -C(R y1 R y2 Represents either -, -C(=O)-, and is a single bond, -O- or -C(R y1 R y2 )- is preferred, and single bonds are more preferred. R y1 and R y2 The preferred embodiment is as described above.

[0118] [Formula (2-1)] Furthermore, it is preferable that compound A contains the compound represented by formula (2-1). [ka] In formula (2-1), Y 31 These are single bonds, -O-, -C(=O)-, -S-, -S(=O)-, -S(=O)2-, and -NR y31 - or -CR y32 R y33 - represents R y31 R is a hydrogen atom, an alkyl group, an aryl group, or a group represented by the following formula (Q-1), y32 , R y33 Each of these is independently a hydrogen atom, an alkyl group, an aryl group, a trifluoromethyl group, or a group represented by the following formula (Q-1), and R y32 and R y33 They may be joined to each other to form a ring, X 11 Each is independent of -OR X1 , -SR X1 and -NR x1 R x2 Represents either of the following, R X1 R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. X2 represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, and R represents a monovalent organic group. X1 and R X2 They may be bonded to each other via any divalent linking group to form a ring, Z 11 Each of these independently represents the group shown in the above formula (Z-1), and R 101 and R 102 Each of the following independently represents an alkyl group, an aryl group, and a halogen atom, and a1 and a2 independently represent an integer of 0 or 1. [ka] In formula (Q-1), X 11 は-OR X1 , -SR X1 and -NR x1 R x2 Represents either of the following, R X1 R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. X2 represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group, R X1 and R X2 They may be bonded to each other via any divalent linking group to form a ring, Z 11 represents the group shown in the above formula (Z-1), and X 11 and Z 11 This refers to the adjacent positional relationship in the benzene ring described in formula (Q-1), and R 103 represents an alkyl group, aryl group, or halogen atom, and a3 represents an integer of 0 or 1.

[0119] -Y 31 - In formula (2-1), Y 31 These are single bonds, -O-, -C(=O)-, -S-, -S(=O)-, -S(=O)2-, and -NR y31 - or -CR y32 R y33 - represents a single bond, -O- or -CR y32 R y33 - is preferred, and single bonds are more preferred. R y31 is a hydrogen atom, an alkyl group, an aryl group, or a group represented by the following formula (Q-1), with a hydrogen atom or an alkyl group being preferred, and an alkyl group being more preferred. The alkyl group is preferably a C1-C10 alkyl group, more preferably a C1-C6 alkyl group, and even more preferably a C1-C4 alkyl group. The alkyl group may also be a branched alkyl group, preferably a C3-C10 branched alkyl group, more preferably a C3-C8 branched alkyl group, and even more preferably a C3-C6 branched alkyl group. Furthermore, the alkyl group may also be a cyclic alkyl group, preferably a C4-C10 cyclic alkyl group, and more preferably a C5 or C6 cyclic alkyl group. A linear alkyl group is also one of the preferred embodiments of the present invention. The alkyl group described above may have further substituents, such as halogen atoms. The aryl group may be an aromatic hydrocarbon group or an aromatic heterocyclic group, but an aromatic hydrocarbon group is preferred. The aromatic hydrocarbon group is preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms, more preferably a phenyl group or a naphthyl group, and even more preferably a phenyl group.

[0120] -Formula (Q-1)- In formula (Q-1), X 11 A preferred embodiment is X in equation (1-1) 11 This is similar to the preferred embodiment. In formula (Q-1), Z 11 A preferred embodiment is Z in equation (1-1) 11 This is similar to the preferred embodiment. In formula (Q-1), R 103 The group represents an alkyl group, an aryl group, or a halogen atom, with alkyl groups being preferred. Here, R 103 A preferred embodiment of the alkyl group and aryl group in formula (1-1) is R 11 The preferred embodiments are the same as those when is an alkyl group or an aryl group. R 103 The halogen atom in this mixture is preferably a fluorine atom, a chlorine atom, or a bromine atom, with a fluorine atom being more preferred. In equation (Q-1), it is preferable that a3 is 0.

[0121] -X 11 , Z 11 - In formula (2-1), X 11 A preferred embodiment is X in formula (1-1). 11 This is similar to the preferred embodiment. In particular, in equation (2-1), X 11 It is preferable that the group is represented by any of the above formulas (X-1) to (X-4). In formula (2-1), Z 11 A preferred embodiment is Z in equation (1-1). 11 This is similar to the preferred embodiment.

[0122] -R 101 and R 102 - In formula (2-1), R 101 and R 102 A preferred embodiment is R in formula (Q-1). 103 This is similar to the preferred embodiment.

[0123] -a1 and a2- In formula (2-1), it is preferable that a1 and a2 are each 0.

[0124] [Molecular weight] The molecular weight of compound A is preferably less than 1000, more preferably less than 800, even more preferably less than 600, and most preferably less than 500. The lower limit is not particularly limited, but for example, it is 200 or more.

[0125] The molecular weight per (keto)oxime group in compound A (molecular weight of compound A / number of (keto)oxime groups) is preferably less than 600, more preferably less than 500, even more preferably less than 400, and most preferably less than 300. The lower limit is not particularly limited, but for example, it is 100 or more. By setting it within the above range, a cured film with high sensitivity and excellent strength can be obtained.

[0126] The molar absorption coefficient of compound A is 1 to 5000 (L·mol) at 365 nm. -1 ·cm -1 ) is preferred, 10 to 3000 is more preferred, 20 to 2000 is even more preferred, and 30 to 1000 is most preferred. The Gram absorption coefficient of the initiator is 50 to 10000 (L·g) at 365 nm. -1 ·cm -1 A range of 0 is preferred, 100 to 7000 is more preferred, 200 to 6000 is even more preferred, and 300 to 5000 is most preferred. By setting the range to this, it is possible to obtain a radical polymerization initiator that exhibits little sensitivity fluctuation even in thick films (1 μm to 10 μm) and has excellent internal film curing properties.

[0127] The molar extinction coefficient of compound A shall be measured by the following method. Accurately weigh 12.5 mg of compound A and place it in a 100 mL volumetric flask. Add acetonitrile and dissolve it. The amount of acetonitrile should be adjusted as needed to enable absorbance measurement as described below. Take 2 mL of this solution with a volumetric pipette and make up the volume in a 25 mL volumetric flask. This will be the measurement sample. Add the measurement sample to a 1 cm square 5 mL quartz glass cell and measure the absorbance under air to calculate the molar extinction coefficient. Suitable measuring instruments include a UV-Vis-Near Infrared spectrophotometer (UH4150, manufactured by Hitachi High-Tech Corporation).

[0128] When geometric isomers E and Z exist for compound A, compound A may be the geometric isomer of E, the geometric isomer of Z, or a mixture of the geometric isomers of E and Z. For convenience, the chemical structural formulas show only one isomer, but unless otherwise specified, neither E nor Z is selected or distinguished. Furthermore, the above chemical structural formulas also include forms in which E and Z isomers are present together.

[0129] The maximum absorption wavelength of compound A is preferably in the wavelength range of 230 to 380 nm. There may be one maximum absorption wavelength or two or more. If there are two or more maximum absorption wavelengths, they are preferably separated by 20 nm or more, and more preferably by 50 nm or more.

[0130] From the viewpoint of solubility in solvents, the melting point of compound A is preferably 50 to 150°C, more preferably 60 to 130°C, and even more preferably 70 to 120°C.

[0131] When compound A is in the form of particles, the 50% integrated value of compound A measured by dynamic light scattering (DLS) is preferably 0.001 to 1000 μm, more preferably 0.01 to 100 μm, and even more preferably 0.1 to 10 μm, from the viewpoint of handling and solubility in solvents.

[0132] The photocurable composition of the present invention may use only one of the above-mentioned compound A, or it may use two or more in combination. By using two or more in combination, it is possible to achieve a better balance between resolution and sensitivity, whether the exposure light source is KrF line or i line.

[0133] The impurities that may be included in compound A described above will be explained. The water content in compound A is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, even more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, per 100 parts by mass of compound A. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. The content of the organic solvent in compound A is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, even more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, per 100 parts by mass of compound A. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. The content of organic acids and organic acid anhydrides in compound A is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, even more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, per 100 parts by mass of compound A. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of organic acids include formic acid, acetic acid, propionic acid, pivalic acid, succinic acid, phthalic acid, and benzoic acid. Examples of organic acid anhydrides include these anhydrides. The content of organic base in compound A is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, even more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, per 100 parts by mass of compound A. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of organic bases include triethylamine, dimethylamine, diethylamine, pyridine, piperidine, pyrrolidine, morpholine, or amines used in the production of compound A. The halogen content in compound A is preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and even more preferably 1 part by mass or less, per 100 parts by mass of compound A. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of halogens include Cl, Br, F, I, etc., and may also be organic compounds having these halogen atoms. Alternatively, these may be ions of halogens. The residual metal content in compound A is preferably 0.1 parts by mass or less, more preferably 0.01 parts by mass or less, and even more preferably 0.001 parts by mass or less, per 100 parts by mass of compound A. It is even more preferably less than 0.0001 parts by mass, and particularly preferably below the detection limit. The type of residual metal is not particularly limited, but examples include Li, Na, Mg, Al, K, Ca, Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd, Pb, Ti, V, As, Ag, Sn, Ba, W, Au, Zr, etc.

[0134] Compound A can be synthesized, for example, by the following method. However, the synthesis method is not particularly limited, as long as compound A with the structure described above can be obtained. For example, as an oxime raw material intermediate, phenol derivatives, naphthol derivatives, and polyhydric phenol derivatives having a group corresponding to substituent X can be used. For example, if it is desired to introduce substituent X in which the bonding site to the aromatic ring is an oxygen atom, a polyhydric phenol compound can be used as an aromatic compound containing a substituent with an oxygen atom. As a polyhydric phenol compound, for example, the structure described in paragraphs 0025 to 0035 of Japanese Patent Application Publication No. 2019-179078 is preferably used. Here, when converting the oxygen atom in these derivatives to a sulfur atom or nitrogen atom, O can be converted to a leaving group such as TfO-, MsO-, or TsO-, and then synthesized by various coupling reactions with thiols, primary amines, secondary amines, amides, etc. (Synthesis Example 1) A general method for synthesizing radical polymerization initiators having heterosubstituted groups adjacent to the (keto)oxime group can be used by utilizing the o and p orientation by the electron-donating groups of electrophilic aromatics in the Friedel-Craft reaction of the heterosubstituted groups (O, S, N) in the above derivatives. That is, if the p-position has substituents that are less electron-donating than O, S, and N, an electrophilic substitution reaction can be preferentially brought about at the o-position. (Synthesis Example 2): After acylation of the phenolic hydroxyl group, the adjacent position can be selectively acylated by thermal Fries transition using light or a Lewis acid. Such a synthesis method can be used from the method described in CN117326975A1 or CN117342977A.

[0135] A specific example of compound A is the compound used as compound A in the examples described later.

[0136] The content of compound A in the total solid content of the photocurable composition is preferably 0.1 to 50% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 45% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less. In the photocurable composition of the present invention, compound A may be used alone or two or more types. When two or more types are used, it is preferable that their total amount is within the above range.

[0137] When the photocurable composition contains other photopolymerization initiators as described later, the content of compound A relative to the total content of compound A and other photopolymerization initiators is preferably 50% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more.

[0138] <Curable compound> The photocurable composition of the present invention contains a curable compound. Examples of curable compounds include resins having polymerizable groups, polymerizable compounds, and the like, as described later. The photocurable composition of the present invention preferably contains, as a curable compound, at least one of a resin having polymerizable groups and a polymerizable compound described later. Furthermore, an embodiment in which the photocurable composition of the present invention contains, as a curable compound, a resin having polymerizable groups and a polymerizable compound described later is also one of the preferred embodiments of the present invention.

[0139] <Resin> The photocurable composition of the present invention preferably contains a resin. The resin is added, for example, to disperse pigments or other materials in the photocurable composition, or as a binder. A resin mainly used to disperse pigments or other materials in a photocurable composition is also called a dispersant. However, such uses of the resin are just examples, and the resin can also be used for purposes other than those mentioned above.

[0140] Examples of resins include (meth)acrylic resins, epoxy resins, (meth)acrylamide resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene etherphosphine oxide resins, polyimide resins, polyamic acid resins (polyimide precursors), polyamideimide resins, polybenzoxazole resins, polybenzoxazole precursors, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, and siloxane resins. Among these, it is preferable to include at least one resin selected from the group consisting of (meth)acrylic resin, polyester resin, polyimide precursor, and polyimide resin. Furthermore, the resins include the resin described in paragraphs 0091-0099 of International Publication No. 2022 / 065215, the blocked polyisocyanate resin described in Japanese Patent Publication No. 2016-222891, the resin described in Japanese Patent Publication No. 2020-122052, the resin described in Japanese Patent Publication No. 2020-111656, the resin described in Japanese Patent Publication No. 2020-139021, the resin described in Japanese Patent Publication No. 2017-138503 which includes a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resin described in paragraphs 0199-0233 of Japanese Patent Publication No. 2020-186373, the alkali-soluble resin described in Japanese Patent Publication No. 2020-186325, and Korean Published Patent No. 10-2020-007 You can also use a resin represented by formula 1 as described in Japanese Patent Publication No. 8339, a copolymer containing epoxy groups and acid groups as described in International Publication No. 2022 / 030445, a resin as described in Japanese Patent Application Publication No. 2018-135514, a copolymer as described in Japanese Patent Application Publication No. 2020-041046, a resin as described in Japanese Patent Application Publication No. 2023-033156, a resin as described in Japanese Patent Application Publication No. 2023-030386, a resin as described in Japanese Patent Application Publication No. 2023-027753, a crosslinkable group-containing negative-type photosensitive polyamic acid resin as described in Japanese Patent Application Publication No. Hei 5-040340 and Japanese Patent Application Publication No. 2021-131543, or a crosslinkable group-containing negative-type photosensitive polyimide resin as described in Japanese Patent Application Publication No. 2022-135427 and Japanese Patent Application Publication No. 2023-166413. As the polybenzoxazole resin and polybenzoxazole precursor, the resin described in International Publication No. 2024 / 143209 is preferably used.

[0141] It is preferable to use a resin having acidic groups. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, and phenolic hydroxyl groups.

[0142] Resins having acidic groups preferably contain repeating units having acidic groups in their side chains, and more preferably contain repeating units having acidic groups in their side chains in an amount of 5 to 70 mol% of the total repeating units of the resin. The upper limit of the content of repeating units having acidic groups in their side chains is preferably 50 mol% or less, and more preferably 30 mol% or less. The lower limit of the content of repeating units having acidic groups in their side chains is preferably 10 mol% or more, and more preferably 20 mol% or more.

[0143] Regarding resins having acid groups, reference can be made to paragraphs 0558-0571 of Japanese Patent Application Publication No. 2012-208494 (paragraphs 0685-0700 of the corresponding US Patent Application Publication No. 2012 / 0235099) and paragraphs 0076-0099 of Japanese Patent Application Publication No. 2012-198408, the contents of which are incorporated herein by reference. Furthermore, commercially available resins having acid groups can also be used. There are no particular restrictions on the method of introducing acid groups into the resin, but for example, the method described in Japanese Patent No. 6349629 can be cited. In addition, as a method of introducing acid groups into the resin, a method can be cited in which an acid anhydride is reacted with a hydroxyl group produced by a ring-opening reaction of an epoxy group to introduce an acid group.

[0144] The photocurable composition of the present invention may also preferably contain a resin having basic groups. The resin having basic groups is preferably a resin containing repeating units having basic groups in their side chains, more preferably a copolymer having repeating units having basic groups in their side chains and repeating units not having basic groups, and even more preferably a block copolymer having repeating units having basic groups in their side chains and repeating units not having basic groups. The resin having basic groups can also be used as a dispersant.

[0145] Commercially available resins containing basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, BYK-LPN6919 (all manufactured by Bic Chemie Co., Ltd.), and Solspers 112. Examples include 00, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by Lubrizol Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), etc. Furthermore, the resin having basic groups may also be the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Publication No. 2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of Japanese Patent Publication No. 2018-156021, or the vinyl resin having basic groups described in paragraphs 0150 to 0153 of Japanese Patent Publication No. 2019-184763, and these details are incorporated herein by reference.

[0146] The photocurable composition of the present invention may also preferably contain a resin having an acidic group and a resin having a basic group. According to this embodiment, the storage stability of the photocurable composition can be further improved. When a resin having an acidic group and a resin having a basic group are used in combination, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass, per 100 parts by mass of the resin having an acidic group.

[0147] As the resin, it is also preferable to use a resin having aromatic carboxyl groups. In a resin having aromatic carboxyl groups, the aromatic carboxyl groups may be included in the main chain of the repeating unit or in the side chain of the repeating unit. It is preferable that the aromatic carboxyl groups are included in the main chain of the repeating unit. In this specification, an aromatic carboxyl group is a group having a structure in which one or more carboxyl groups are bonded to an aromatic ring. In an aromatic carboxyl group, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2. Examples of resins having aromatic carboxyl groups include the resins described in paragraphs 0082 to 0107 of International Publication No. 2021 / 166858. In this specification, "main chain" refers to the relatively longest bonding chain in the resin molecule, and "side chains" refers to all other bonding chains.

[0148] It is also preferable to use a resin having polymerizable groups as the resin. That is, it is preferable that the resin is a compound corresponding to the curable compound and that the resin has polymerizable groups. The polymerizable group preferably has at least one selected from a group having an ethylenically unsaturated bond, an acetylene group, an epoxy group, and an oxetane group. Groups having an ethylenically unsaturated bond include (meth)acrylic groups, aromatic vinyl groups, vinyl groups, allyl groups, and maleimide groups, with (meth)acrylic groups, vinylphenyl groups, or maleimide groups being preferred. When using a resin having polymerizable groups, the content of the resin having polymerizable groups in the resin contained in the photocurable composition is preferably 30% by mass or more, more preferably 50% by mass or more, and even more preferably 70% by mass or more. When using a resin having polymerizable groups, the content of polymerizable groups relative to the mass of the resin is preferably 0.1 to 5.0 mmol / g, more preferably 0.2 to 4.0 mmol / g, and even more preferably 0.3 to 3.0 mmol / g.

[0149] <Specific resin> It is preferable to use a resin having at least one of the substructures represented by formula (C-1) and the substructure represented by formula (C-2) (hereinafter also referred to as "specific resin") as the resin, and it is more preferable to use a resin having at least one of the substructures represented by formula (C-1) and the substructure represented by formula (C-2) as repeating units. Here, the specific resin is preferably a polyimide resin or a polyamic acid resin. [ka] In formula (C-1), X 1 represents an organic group with 4+m valence, Y 1 represents a 2+n valent organic group, R 1 represents a group containing a polymerizable group, R 2 The group contains polymerizable groups, n is an integer from 0 to 6, m is an integer from 0 to 6, and n+m is an integer greater than or equal to 1. In formula (C-2), X 1 represents an organic group with 4+m valence, Y 1 represents a 2+n valent organic group, A x1 and A x2 represents a monovalent organic group, Ay 1 represents a group containing a polymerizable group, n is an integer from 0 to 6, m is an integer from 0 to 6, and n+m is an integer greater than or equal to 1, where A x1 and A x2 n+m may be 0 if at least one of them has a polymerizable group.

[0150] [X 1 ] In equation (C-1) or equation (C-2), X 1 The structure is preferably derived from an acid anhydride monomer, but is not limited thereto. The acid anhydride monomer is not particularly limited as long as it has two cyclic acid anhydride groups in one molecule. It may be an aromatic acid anhydride, an aliphatic acid anhydride, or a mixture thereof.

[0151] X 1 The following formulas (Xp-1) to (Xp-23) are preferably used. In the following formulas (Xp-1) to (Xp-23), *1 represents the bonding site with the carbonyl group indicated as *1 in the following formula (CX-1) or formula (CX-2), and *2 represents the bonding site with the carbonyl group indicated as *2 in the following formula (CX-1) or formula (CX-2). The following formulas (CX-1) and (CX-2) are formulas (C-1) and (C-2) respectively to which the symbols *1 and *2 have been added for convenience. [ka] [ka]

[0152] In formulas (Xp-1) to (Xp-23), L independently represents either no presence, a single bond, -CH=CH-, -CH2CH2-, -CH2-, -C(CH3)2-, or -C(CF3)2-, R1 and R2 independently represent a hydrogen atom or a substituent, and R1 and R2 may bond to form a ring structure, which may be an aromatic ring, or R1 and R2 may form a ring to form a benzene ring. If there are multiple L in one molecule, they may be the same or different. R3, R4, R5, and R6 independently represent a hydrogen atom, an alkyl group, or an aryl group, and adjacent R3 to R6 may be linked by a divalent organic group to form a ring. R7 and R8 represent one of the following: an alkyl group, an aryl group, a fluoroalkyl group, a fluoroaryl group, an alkoxy group, an aryloxy group, a hydroxyl group, a carboxyl group, or a halogen atom. n1 and n2 independently represent an integer from 0 to 4. When geometric isomers of a three-dimensional structure exist, the distinction between cis / trans and endo / exo is not particularly limited.

[0153] In formulas (Xp-1) to (Xp-23), X1 to X4 represent single bonds or divalent linking groups, and are single bonds, or -C(Rx)2- (where Rx represents a hydrogen atom or substituent; if Rx is a substituent, they may be linked together to form a ring), -O-, -S(=O)2-, -C(=O), -S-, -NR N -, alkylene group, cycloalkylene group, alkenylene group, alkylylene group, arylene group, heteroarylene group, -C(=O)O-, -C(=O)NH-, or combinations thereof are preferred, and single bonds or -C(Rx)2- are more preferred. When Rx is a substituent, specific examples include an alkyl group, an alkyl group which may be substituted with a fluorine atom, or a fluorenyl group. R N represents a hydrogen atom or an organic group, preferably a hydrogen atom, an alkyl group, or an aryl group, and more preferably a hydrogen atom or an alkyl group.

[0154] It is even more preferable that the linking groups X1 to X4 are divalent linking groups represented by the following general formula (X1-1), as this exhibits superior mechanical strength. [ka] In formula (X1-1), n ​​and m independently represent either 0 or 1. T1 and T2 independently represent a single bond, -O-, -S-, or -NR-, where R represents a hydrogen atom, an alkyl group, or an aryl group. P1, P2, and P3 each independently represent one of the following: an aromatic group having 6 to 12 carbon atoms, a heterocyclic group having 5 to 12 carbon atoms, an aliphatic group having 1 to 12 carbon atoms, or an alicyclic group having 4 to 12 carbon atoms. Each of the groups P1, P2, and P3 may further have substituents, such as alkyl groups, fluoroalkyl groups, aryl groups, alkoxy groups, aryloxy groups, hydroxyl groups, carboxyl groups, and halogen atoms. The positions of these substituents are not particularly limited. Q1 and Q2 each independently represent one of the following: a single bond, a divalent organic group consisting of -C(R)2-, -O-, -S-, -NR-, -C(=O)O-, -C(=O)NR-, -C(=O)-, -OC(=O)O-, -OC(=O)NR-, -NRC(=O)NR-, -S(=O)-, -S(=O)2-, or a combination thereof. Here, R independently represents one of the following: a hydrogen atom, an alkyl group, a fluoroalkyl group, or an aryl group, and R groups may be bonded to each other to form a ring. p and q independently represent either 0 or 1.

[0155] More specifically, the following structures are preferred for the linking groups X1 to X4 because they offer both high strength and high elongation.

[0156] Commercially available acid anhydride monomers include, for example, pyromellitic anhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 4-chloroformylphthalic anhydride, trimellitic anhydride, tetrachlorophthalic anhydride, phthalic anhydride, naphthalene-1,4,5,8-tetracarboxylic dianhydride, 4,4'-(hexafluoroisopropylidene)diphthalic anhydride, 4,4'-oxydiphthalic anhydride, 4,4'-(4,4'-isopropylidene diphenoxy)diphthalic anhydride, 4,4'-biphthalic anhydride, tetrabromophthalic anhydride, 3,4'-oxydiphthalic anhydride, 4-(1-propynyl)phthalic anhydride, 4,4'-(ethyn-1,2-diyl)diphthalic anhydride, bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylic acid)1,4-phenylene, 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride Examples include (sublimation purified products), pyromellitic anhydride (sublimation purified products), 4-phenylethynylphthalic anhydride, tetrafluorophthalic anhydride, 4,4'-sulfonyl diphthalic anhydride, 4-ethynylphthalic anhydride, and diphenyl-2,3,3',4'-tetracarboxylic dianhydride.Examples of aliphatic dianhydrides include bicyclo[2.2.2]octo-7-ene-2,3,5,6-tetracarboxylic acid dianhydride, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid anhydride, ethylenediaminetetraacetic acid dianhydride, dicyclohexyl-3,4,3',4'-tetracarboxylic acid dianhydride, meso-butane-1,2,3,4-tetracarboxylic acid dianhydride, 1,2,3,4-cyclopentanetetracarboxylic acid dianhydride, and 4-(2,5-dioxotetrahydrofuran-3 The following can be suitably used: -yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid anhydride, octahydrobiphenylene-4a,8b:4b,8a-tetracarboxylic acid dianhydride, 1,2,4,5-cyclohexanetetracarboxylic acid dianhydride, 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride, 1,2,3,4-tetramethyl-1,2,3,4-cyclobutanetetracarboxylic acid dianhydride, and 3-(carboxymethyl)-1,2,4-cyclopentanetricarboxylic acid 1,4:2,3-dianhydride.

[0157] Other acid anhydrides that can be used include CpODA (manufactured by ENEOS Corporation), BzDA (manufactured by ENEOS Corporation), BzDAxx (manufactured by ENEOS Corporation), BNBDA (manufactured by ENEOS Corporation), TMPBP-TME (manufactured by Honshu Chemical Co., Ltd.), BPZ-TME (manufactured by Honshu Chemical Co., Ltd.), BPF-PA (manufactured by JFE Chemical Corporation), and 5,5′-[p-phenylenebis(oxycarbonyl)]diphthalic anhydride (trade name: TAHQ, manufactured by Manac Corporation), which can be suitably used to enhance the transparency of polyimide or amical resins.

[0158] In addition, acid anhydrides described in International Publication No. 2022 / 019253, Japanese Patent Publication No. 2023-166413, and International Publication No. 2022 / 019255 can be suitably used.

[0159] [Y 1 ] In formula (C-1) or formula (C-2), Y 1 The structure is preferably derived from a diamine monomer, but is not limited thereto. The diamine monomer is not particularly limited as long as it has two primary amino groups in one molecule. It may be an aromatic diamine, an aliphatic diamine, or a mixture thereof.

[0160] Y 1 The structure is preferably one of the following formulas (Yp-1) to (Yp-16). * indicates a bonding site with the nitrogen atom. [ka]

[0161] In equations (Yp-1) to (Yp-16), L is equivalent to the above. 10 ~R 15 Each of these independently represents one of the following: an alkyl group, an aryl group, a fluoroalkyl group, a fluoroaryl group, an alkoxy group, an aryloxy group, a hydroxyl group, a carboxyl group, or a halogen atom. 16 and R 17 Each of the following independently represents a hydrogen atom, an alkyl group, or an aryl group. a-f each independently represents an integer from 0 to 3. n represents an integer from 1 to 12. R 10 ~R 15 The replacement position is not specifically specified.

[0162] In formulas (Yp-1) to (Yp-16), Y1 or Y2 represents a single bond or a divalent linking group, and can be a single bond or -C(Rx)2- (where Rx represents a hydrogen atom or substituent; if Rx is a substituent, they may be linked together to form a ring), -O-, -S(=O)2-, -C(=O), -S-, or -NR N -, alkylene group, cycloalkylene group, alkenylene group, alkylylene group, arylene group, heteroarylene group, -C(=O)O-, -C(=O)NH-, or combinations thereof are preferred, and single bonds or -C(Rx)2- are more preferred. When Rx is a substituent, specific examples include an alkyl group, an alkyl group which may be substituted with a fluorine atom, or a fluorenyl group. R N represents a hydrogen atom or an organic group, preferably a hydrogen atom, an alkyl group, or an aryl group, and more preferably a hydrogen atom or an alkyl group.

[0163] It is even more preferable that the linking group Y1 or Y2 is a divalent linking group represented by the following general formula (Y1-1) in that it exhibits excellent mechanical strength. [ka] In equation (Y1-1), each of the units T1, T2, P1, P2, P3, Q1, Q2, n, m, p, and q are equivalent to those in equation (X1-1).

[0164] More specifically, the following structure is preferred for the linking group Y1 or Y2, as it can achieve both high strength and high elongation.

[0165] Examples of commercially available diamine monomers mentioned above include aromatic diamines such as 4,4'-diaminodiphenylsulfone, 1,5-naphthalenediamine, 4,4'-diaminostilbene-2,2'-disulfonic acid, m-xylylenediamine, p-xylylenediamine, 4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenylsulfone, 4,4'-methylenebis(2,6-diethylaniline), 1,3-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-Methylenebis(2-chloroaniline), 1,4-Bis[2-(4-aminophenyl)-2-propyl]benzene, 4,4'-Diamino-2,2'-Biphenyldisulfonic acid, 1,4-Phenylenediamine, o-Tolidine, m-Tolidine, 1,3-Phenylenediamine, 4-Aminobenzylamine, 2,2-Bis[4-(4-aminophenoxy)phenyl]propane, 2,5-Dimethyl-1,4-Phenylene Diamine, 9,9-bis(4-aminophenyl)fluorene, o-dianisidine, 2,2-bis(4-aminophenyl)hexafluoropropane, 2,2'-bis(trifluoromethyl)benzidine, 2,7-diaminofluorene, 3,4'-diaminodiphenylmethane, 3,3',5,5'-tetramethylbenzidine, 9,9-bis(4-amino-3-methylphenyl)fluorene, bis(3-amino-4-hydrox bis(4-aminophenoxy)sulfone, 3-aminobenzylamine, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, 4,4'-bis(4-aminophenoxy)biphenyl, 1,1-bis(4-aminophenyl)cyclohexane, 4,6-diaminoresorcinol, 3,4'-diaminodiphenyl ether, 4,4'-ethylenedianiline, 2,3,5,6-tetramethyl-1,4-phenylenediamine, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 1,4-bis(4-amino-2-trifluoromethylphenoxy)benzene, 2,6-diaminoanthraquinone, bis(2-aminophenyl)sulfide, 1,3-Bis[2-(4-aminophenyl)-2-propyl]benzene, 1,3-Bis(4-aminophenoxy)benzene, Bis[4-(3-aminophenoxy)phenyl]sulfone, Bis[4-(4-aminophenoxy)phenyl]sulfone, 4,4'-Methylenebis(2-ethyl-6-methylaniline), Bis(4-aminophenyl)sulfide, 3,7-Diamino-2,8-Dimethyldibenzothiophenesulfone, 4,4'-Diamino-3,3'-Dimethyldiphenylmethane, 2,4,5,6-Tetrafluoro-1,3-Phenylenediamine, 4,4''-Diamino-p Examples include terphenyl, 3,3'-dimethylnaphthidine, 4,4'-diaminobenzophenone, 4,4'-diaminooctafluorobiphenyl, 3,3'-diaminobenzophenone, 3,3'-diaminodiphenylmethane, 3,6-diaminocarbazole, 9,9-bis(4-amino-3-fluorophenyl)fluorene, 9,9-bis(4-amino-3-chlorophenyl)fluorene, 4,4'-diamino-2,2'-dimethylbibenzyl, 9,9-bis(4-aminophenyl)fluorene, and 2,3,5,6-tetrafluoro-1,4-phenylenediamine. Suitable aliphatic diamines include, for example, bicyclo[2.2.1]heptanedimethanamine (isomer mixture), 4,4'-methylenebis(cyclohexylamine) (isomer mixture), 4,4'-methylenebis(2-methylcyclohexylamine) (isomer mixture), isophoronediamine (cis-, trans- mixture), 1,3-bis(aminomethyl)cyclohexane (cis-, trans- mixture), 1,4-bis(aminomethyl)cyclohexane (cis-, trans- mixture), 1,3-bis(3-aminopropyl)tetramethyldisiloxane, 1,3-cyclohexanediamine (cis-, trans- mixture), and 1,4-cyclohexanediamine (cis-, trans- mixture).

[0166] Other diamines that can be used include BPF-AN (manufactured by JFE Chemical Co., Ltd.) and pyridazine-based sulfur-containing diamine APP (manufactured by Nippon Materials Technology Co., Ltd.), which can be suitably used to enhance the transparency of polyimide or amical resins.

[0167] In addition, diamines described in Japanese Patent Publication No. 2023-166413 and International Publication No. 2022 / 019255 can be suitably used.

[0168] <R 1 ,R 2 > Resins containing a substructure represented by formula (C-1) or formula (C-2) (preferably a repeating unit) preferably have polymerizable groups. The polymerizable groups are not limited as long as they can form chemical bonds with each other through the effects of radicals generated by light or heat, acids, or bases. Specifically, examples include (meth)acrylic groups, carbon-carbon unsaturated groups (aromatic vinyl groups, vinyl groups, allyl groups, acetylene groups, maleimide groups, etc.), epoxy groups, and oxetane groups. In resins, polymerizable groups may be located in side chains or at the ends of the main chain.

[0169] In equation (C-1) or (C-2), R 1 or R 2 The polymerizable group shown is preferably a structure represented by the following formula (A-1). [ka] In formula (A-1), Lx 1 These are single bonds, -O-, -NR 1 -, -C(=O)O-, -OC(=O)-, -OC(=O)O-, -C(=O)NR 2 -, -NR 2 C(=O)-, -NR 2 C(=O)O-, -OC(=O)NR 2 -, -NR 2 C(=O)NR 3 -, ―NR 3 C(=O)NR 2 -, -CH2CH(OH)-CH2-, or -CH2CH(OR 4 )-CH2- indicates Lx 2 -O-, -NR 1 -, -C(=O)O-, -OC(=O)-, -OC(=O)O-, -C(=O)NR 2 -, -NR 2 C(=O)-, -NR 2 C(=O)O-, -OC(=O)NR 2 -, -NR 2 C(=O)NR 3 -, -NR 3 C(=O)NR 2 -, -CH2CH(OH)-CH2-, or -CH2CH(OR 4 )-CH2- indicates R 1 R represents a hydrogen atom or a monovalent organic group. 2 R represents a hydrogen atom or a monovalent organic group. 3 R represents a hydrogen atom or a monovalent organic group. 4 represents a monovalent organic group, La represents the group shown in the following formula (La-1), Lb represents a C1-C12 r4+1 valent hydrocarbon group consisting of any or a combination of the following formulas (Lb-1)-(Lb-3), A represents an epoxy group, an oxetanyl group, or a group having an ethylenically unsaturated bond, r1 represents 0 or 1, r2 represents 0 or 1, r3 represents an integer from 0 to 5, r4 represents an integer from 1 to 10, and * represents X in formula (C-1) or formula (C-2). 1 (R 2 (If Y 1 (R 1 (In the case of) This indicates the binding site with [ka] In formula (La-1), Ra 1 Ra 2 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and * represents Lx 1 The wavy lines indicate the bonding sites with Lb or A, respectively. [ka] In formulas (Lb-1) to (Lb-3), Lc1 represents an alkylene group having 2 to 12 carbon atoms, an arylene group having 6 to 18 carbon atoms, or a combination thereof, and x, y, and z each independently represent an integer from 1 to 30.

[0170] In formula (A-1), Lx 1 Regarding the structure illustrated, the left side is X in equation (C-1) or equation (C-2). 1 Or Y 1 Alternatively, it indicates the bonding site with an oxygen atom, with the right side representing the bonding site with La (when r1=1), Lb (when r1=0 and r2=an integer from 1 to 5), or A (when r1=0 and r2=0). For example, L X1 If is -C(=O)O-, then the carbon atom is X in formula (P-1) or formula (P-2). 1 Or Y 2 Alternatively, it is a bonding site with an oxygen atom, where the oxygen atom is a bonding site with La, Lb, or A. In formula (A-1), Lx 1 -O-, -C(=O)O-, -NR 2 C(=O)O-, -OC(=O)NR 2 -, -CH2CH(OH)-CH2-, or -CH2CH(OR 4 It is preferably -CH2-, and more preferably -O- or -C(=O)O-.

[0171] R 1 The group is preferably a hydrogen atom, an alkyl group, or an aryl group, and more preferably a hydrogen atom. R 2 The group is preferably a hydrogen atom, an alkyl group, or an aryl group, and more preferably a hydrogen atom. R 3 The group is preferably a hydrogen atom, an alkyl group, or an aryl group, and more preferably a hydrogen atom. R 4 The group is preferably an alkyl group or an aryl group, and more preferably an alkyl group.

[0172] In formula (A-1), La represents the group shown in formula (La-1), and in formula (La-1), Ra 1 ,Ra 2 Each of these is preferably a hydrogen atom, a C1-C10 alkyl group, or a phenyl group, more preferably a hydrogen atom or a C1-C10 alkyl group, and even more preferably a methyl group. Also, Ra 1 and Ra 2 Another preferred embodiment of the present invention is one in which one of the atoms is a hydrogen atom and the other is an alkyl group having 1 to 10 carbon atoms (preferably a methyl group).

[0173] In formula (A-1), r1 is 1 or 0, and is preferably 0.

[0174] In formula (A-1), Lx 2 -O-, -C(=O)O-, -NR 2 C(=O)O-, -OC(=O)NR 2 -, -CH2CH(OH)-CH2-, or -CH2CH(OR 4 It is preferably -CH2- and more preferably -O-.

[0175] In formula (A-1), r2 is 1 or 0, and if Lb is one of formulas (Lb-1) to (Lb-3), or a combination thereof, it is preferably 1.

[0176] In formula (A-1), when Lb is a C1-C12 r4+1 valent hydrocarbon group, Lb is preferably a C1-C12 r4+1 valent saturated aliphatic hydrocarbon group, and more preferably a C2-C6 r4+1 valent saturated aliphatic hydrocarbon group. For example, when r4=1, Lb is preferably an alkylene group having 1 to 12 carbon atoms, and more preferably an alkylene group having 2 to 6 carbon atoms. The hydrocarbon group at Lb, or the hydrogen atom in the saturated aliphatic hydrocarbon group, may be substituted with a known substituent.

[0177] Furthermore, Lb is preferably a group represented by formulas (Lb-1) to (Lb-3), or by a combination thereof, and is also preferably a group represented by formula (Lb-1), formula (Lb-2), or by a combination thereof. In formulas (Lb-1) to (Lb-3), Lc1 is preferably an alkylene group having 2 to 8 carbon atoms, an arylene group having 6 to 10 carbon atoms, or a combination thereof, and more preferably an alkylene group having 2 to 8 carbon atoms. In equations (Lb-1) to (Lb-3), x, y, and z each independently represent integers from 1 to 30, preferably from 1 to 20, and more preferably from 1 to 10.

[0178] In formula (A-1), r3 represents an integer from 0 to 5, preferably an integer from 0 to 3, and preferably 0, 1, or 2. Another preferred embodiment of the present invention is one in which r3 is between 1 and 5, and Lb includes any of the formulas (Lb-1) to (Lb-3). The structures represented by equations (Lb-1) to (Lb-3) are thought to be easily decomposed by heating. Therefore, for example, if heating (e.g., heating to 180°C or higher) is performed during the formation of the cured product, the structures represented by equations (Lb-1) to (Lb-3) will decompose, making it easier for the resin to orient in the cured product, and thus likely lowering the CTE (coefficient of thermal expansion).

[0179] In formula (A-1), A represents an epoxy group, an oxetanyl group, or a group having an ethylenically unsaturated bond, and it is preferable that A is a group having an ethylenically unsaturated bond. Preferred groups having an ethylenically unsaturated bond include (meth)acryloyl groups, vinylphenyl groups, or maleimide groups. Other known groups having an ethylenically unsaturated bond, such as vinyl groups and allyl groups, may also be used.

[0180] In formula (A-1), r4 is preferably an integer between 1 and 6, more preferably an integer between 1 and 3, and even more preferably 1 or 2.

[0181] In formula (C-2), AX2 is preferably an alkyl group, an aryl group, or a group represented by formula (A-1) above, and more preferably a group represented by formula (A-1) above.

[0182] In formula (C-1), m is preferably an integer between 0 and 2. Furthermore, the embodiment in which m is 0 is also one of the preferred embodiments of the present invention. In formula (C-1), n ​​is preferably an integer between 0 and 2, and more preferably 1 or 2. In formula (C-1), n+m is preferably an integer between 1 and 4, and more preferably 1 or 2. In formula (C-2), m is preferably an integer between 0 and 2. Furthermore, the embodiment in which m is 0 is also one of the preferred embodiments of the present invention. In formula (C-2), n is preferably an integer between 0 and 2. Furthermore, the embodiment in which n is 0 is also one of the preferred embodiments of the present invention. In equation (C-2), n+m is preferably an integer between 0 and 4, and more preferably 0, 1, or 2. Also, in equation (C-2), A X2 and A X2 A preferred embodiment of the present invention is one in which at least one of the elements is a group represented by the above formula (A-1), and n+m is 0.

[0183] The specific resin preferably has an alicyclic hydrocarbon group. Specifically, X in the above equation (C-1) or equation (C-2) 1 or Y 1 It is preferable that it contains an alicyclic hydrocarbon group. Specific embodiments of the alicyclic hydrocarbon group are as described above in X 1 or Y 1 As illustrated in the example above.

[0184] The main chain terminus of the specific resin may be a structure derived from a carboxylic acid dianhydride or a structure derived from a diamine. Furthermore, these carboxylic acid dianhydrides may be substituted or deprotected by light or heat. For example, one embodiment is one in which the end is sealed with the end-capping agent shown below.

[0185] -End-capturing agent- In the production of specific resins, it is preferable to encapsulate the ends of polyimide precursors, etc., with end-capping agents such as acid anhydrides, monocarboxylic acids, monoacid chloride compounds, and monoactive ester compounds to further improve storage stability. It is more preferable to use monoamines as end-capping agents, and preferred monoamine compounds include aniline, 2-ethynylaniline, 3-ethynylaniline, 4-ethynylaniline, 5-amino-8-hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy-4-aminonaphthalene, 2-hydroxy-7-aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene, and 1-carboxy Examples include C-5-aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4-aminobenzoic acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 2-aminobenzenesulfonic acid, 3-aminobenzenesulfonic acid, 4-aminobenzenesulfonic acid, 3-amino-4,6-dihydroxypyrimidine, 2-aminophenol, 3-aminophenol, 4-aminophenol, 2-aminothiophenol, 3-aminothiophenol, and 4-aminothiophenol. Two or more of these may be used, and multiple different end groups may be introduced by reacting multiple end encapsulants. The end encapsulant may have polymerizable groups, and a structure represented by formula (A-1) at the end is preferred. The presence of a crosslinking group in the end encapsulant is preferable because it linearly increases the molecular weight of the polyimide main chain, thereby improving mechanical strength without impairing elongation at break.

[0186] The acid anhydride monomer may be either an aromatic acid anhydride or an aliphatic acid anhydride. From the viewpoint of permeability, it is more preferable to mix in an aliphatic acid anhydride. In terms of achieving both mechanical strength and permeability, the mixing ratio of aromatic acid anhydrides to aliphatic acid anhydrides is preferably 100 / 0 to 0 / 100, more preferably 90 / 10 to 30 / 70, and even more preferably 80 / 20 to 50 / 50, out of 100 moles of total acid anhydrides constituting the resin.

[0187] The diamine monomer may be either an aromatic diamine or an aliphatic diamine. From the viewpoint of polymerizability, an aromatic diamine is more preferable.

[0188] [Transmittance] From the viewpoint of improving deep curing properties, it is preferable that the resin has high transmittance to the exposure light source (KrF (248 nm), i-line (365 nm)). The transmittance of a resin film coated to a thickness of 5 μm at 365 nm is preferably 10% or more, more preferably 30% or more, even more preferably 50% or more, and most preferably 70% or more. There is no particular upper limit to the transmittance, and it is acceptable as long as it is 100% or less. The above resin film can be obtained by applying a photocurable composition to a glass substrate and then drying it on a hot plate at 100°C for 5 minutes.

[0189] [Imidification rate] The imidization rate represents the proportion of imide ring structures to the total of amic acid structures, amic acid ester structures, and imide ring structures in a specific resin. When the specific resin is a polyamic acid resin, the imidization rate is preferably less than 70%, more preferably 60% or less, even more preferably 50% or less, even more preferably 40% or less, and particularly preferably 30% or less, from the viewpoint of the film strength and insulating properties of the resulting organic film. The lower limit of the imidization rate is not particularly limited; it may be 0% or higher, or 4% or higher. The range of the imidization rate may be any combination of the lower and upper limits mentioned above, but it is particularly preferable that it be between 0% and 30%. When the specific resin is a polyimide acid resin, the imidization rate is preferably 70% or more, more preferably 80% or more, even more preferably 90% or more, even more preferably 95% or more, and particularly preferably 98% or more, from the viewpoint of the film strength and insulating properties of the resulting organic film. There is no particular upper limit, and it is acceptable as long as it is 100% or less.

[0190] In this invention, the imidization rate is a value calculated by the following method. The resin is dissolved in γ-butyrolactone, diluted to a viscosity of 2,000 mPa·s, and applied to a silicon wafer by spin coating to form a resin layer. If a resin layer cannot be formed due to reasons such as low solubility of the resin in γ-butyrolactone, the solvent may be changed to another solvent. Other solvents that can be used include solvents contained in photocurable compositions, such as NMP. The viscosity may also be adjusted as appropriate within the adjustable range. The silicon wafer to which the obtained resin layer has been applied is dried on a hot plate at 110°C for 5 minutes to obtain a resin layer with a uniform thickness of approximately 15 μm on the silicon wafer after film formation. Here, if only a resin solution with low viscosity can be obtained, and it is difficult to obtain a resin layer with a thickness of 15 μm, the film thickness may be changed as appropriate. For example, if the film thickness is 5 μm or more, a similar value for the imidization rate can be obtained. The above resin layer was measured using the ATR method with Nicoleti S20 (manufactured by Thermofisher), with a measurement range of 4000-700 cm. -1 The measurement will be taken 50 times. 1380cm -1 Nearby (1350~1450cm) -1 (If there are multiple peaks, the peak height of the one with the highest peak intensity) and 1500cm -1 Nearby (1460~1550cm) -1 The imidization index A of the resin is calculated by dividing the value by the peak height of the peak with the highest peak intensity (if there are multiple peaks). For a film heated at 350°C for 1 hour under a nitrogen atmosphere at a heating rate of 10°C / min, the imidization index B is calculated using the same method, and the imidization rate of the resin is calculated by dividing the imidization index A by the imidization index B. In measuring the imidization rate, the resin to be measured can be obtained from the composition by, for example, the following method: A solution of 1 g of the composition and 2 g of tetrahydrofuran is added to 50 g of methanol or water and crystallized to precipitate the resin, which is then filtered. The filtrate is collected, dissolved in 3.0 g of THF (tetrahydrofuran), added to 50 g of methanol or water and crystallized, filtered, and dried at 40°C for 20 hours to obtain the resin.

[0191] [Esterification rate] Furthermore, the ratio of the molar amount of the amic acid ester structure to the total molar amount of the amic acid structure and the amic acid ester structure in the specific resin (esterification rate) is preferably 90% or more, more preferably 95% or more, and even more preferably 97% or more. Furthermore, there is no particular upper limit to the above percentage; it is sufficient if it is 100% or less. The esterification rate mentioned above can be estimated from the acid value and structure of the resin.

[0192] [Dispersion resin] The photocurable composition of the present invention may also preferably contain a resin (dispersion resin) as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, an acidic dispersant (acidic resin) refers to a resin in which the amount of acidic groups is greater than the amount of basic groups. As an acidic dispersant (acidic resin), it is preferable that the amount of acidic groups is 70 mol% or more when the total amount of acidic groups and basic groups is set to 100 mol%. The acidic group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mg KOH / g. Furthermore, a basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acidic groups. As a basic dispersant (basic resin), it is preferable that the amount of basic groups exceeds 50 mol% when the total amount of acidic groups and basic groups is set to 100 mol%. The basic group of the basic dispersant is preferably an amino group.

[0193] The resin used as a dispersant is preferably a resin having graft chains (graft resin). For details of graft resins, refer to paragraphs 0025 to 0094 of Japanese Patent Application Publication No. 2012-255128, which are incorporated herein by reference.

[0194] In this specification, a graft chain refers to a polymer chain that branches off from a repeating main chain. The graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2,000 atoms excluding hydrogen atoms, and even more preferably 60 to 500 atoms excluding hydrogen atoms.

[0195] The graft chain preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, polystyrene structures, polyurethane structures, polyurea structures, and polyamide structures; more preferably contains repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, and polystyrene structures; even more preferably contains repeating units of polyester structures or polyether structures; and particularly preferably contains repeating units of polyester structures.

[0196] Examples of repeating units for polyester structures include those represented by the following formulas (G-1), (G-4), or (G-5). Examples of repeating units for polyether structures include those represented by the following formula (G-2). Examples of repeating units for poly(meth)acrylic structures include those represented by the following formula (G-3). Examples of repeating units for polystyrene structures include those represented by the following formula (G-6). [ka]

[0197] In the above formula, R G1 and R G2 Each of these independently represents an alkylene group. R G1 The number of carbon atoms in the alkylene group represented by is preferably 1 to 20, more preferably 2 to 16, and even more preferably 2 to 12. The alkylene group is preferably linear or branched, and more preferably linear. R G2 The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 2 to 5, and even more preferably 2 or 3. The alkylene group is preferably linear or branched, and more preferably linear.

[0198] In the above formula, R G3 Q represents a hydrogen atom or a methyl group. G1 represents -O- or -NH-, L G1 R represents a single bond or a divalent linking group. G4 represents a hydrogen atom or substituent. L G1 Examples of divalent linking groups represented by include alkylene groups (preferably alkylene groups having 1 to 12 carbon atoms), alkylene oxy groups (preferably alkylene oxy groups having 1 to 12 carbon atoms), oxyalkylene carbonyl groups (preferably oxyalkylene carbonyl groups having 1 to 12 carbon atoms), arylene groups (preferably arylene groups having 6 to 20 carbon atoms), -NH-, -SO-, -SO2-, -C(=O)-, -O-, -C(=O)O-, -OC(=O)-, -S-, and groups formed by combining two or more of these. R G4 Examples of substituents represented by include hydroxyl groups, carboxyl groups, alkyl groups, aryl groups, heterocyclic groups, alkoxy groups, aryloxy groups, heterocyclic oxy groups, alkylthioether groups, arylthioether groups, and heterocyclic thioether groups.

[0199] R G5 R represents a hydrogen atom or a methyl group. G6 R represents an aryl group. G6 The number of carbon atoms in the aryl group represented by is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. G6 The aryl group represented by may have substituents. Examples of substituents include hydroxyl groups, carboxyl groups, alkyl groups, aryl groups, heterocyclic groups, alkoxy groups, aryloxy groups, heterocyclic oxy groups, alkylthioether groups, arylthioether groups, and heterocyclic thioether groups.

[0200] The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of substituents include hydroxyl groups, carboxyl groups, alkyl groups, aryl groups, heterocyclic groups, alkoxy groups, aryloxy groups, heterocyclic oxy groups, alkylthioether groups, arylthioether groups, and heterocyclic thioether groups. Among these, groups having a steric repulsion effect are preferred, and alkyl or alkoxy groups having 5 to 24 carbon atoms are preferred. The alkyl and alkoxy groups may be linear, branched, or cyclic, with linear or branched being preferred.

[0201] The graft chain is preferably structured as shown in formulas (G-1a), (G-2a), (G-3a), (G-4a), (G-5a), or (G-6a), and more preferably as shown in formulas (G-1a), (G-4a), or (G-5a). [ka]

[0202] In the above formula, R G1 and R G2 Each of these represents an alkylene group, and R G3 Q represents a hydrogen atom or a methyl group. G1 represents -O- or -NH-, L G1 R represents a single bond or a divalent linking group. G4 R represents a hydrogen atom or substituent. G5 R represents a hydrogen atom or a methyl group. G6 represents an aryl group, W 100 R represents a hydrogen atom or substituent, and n1 to n6 each independently represent an integer greater than or equal to 2. G1 ~R G6 Q G1 , L G1 For this, see R explained in equations (G-1) to (G-6). G1 ~R G6 Q G1 , L G1 This is synonymous with the same thing, and the preferred range is also similar.

[0203] In equations (G-1a) to (G-6a), W 100 It is preferable that the substituent is a substituent. Examples of substituents include hydroxyl groups, carboxyl groups, alkyl groups, aryl groups, heterocyclic groups, alkoxy groups, aryloxy groups, heterocyclic oxy groups, alkylthioether groups, arylthioether groups, and heterocyclic thioether groups. Among these, groups having a steric repulsion effect are preferred, and alkyl or alkoxy groups having 5 to 24 carbon atoms are preferred. The alkyl and alkoxy groups may be linear, branched, or cyclic, with linear or branched being preferred.

[0204] In equations (G-1a) to (G-6a), n1 to n6 are preferably integers between 2 and 100, more preferably between 2 and 80, and even more preferably between 8 and 60.

[0205] In equation (G-1a), when n1 is 2 or greater, R in each repeating unit G1 The same elements may be identical or different. Also, R G1 When it contains two or more different repeating units, the arrangement of each repeating unit is not particularly limited and may be random, alternating, or block. The same applies to formulas (G-2a) to (G-6a). Furthermore, the graft chain is a structure represented by formula (G-1a), formula (G-4a), or formula (G-5a), and R G1 It is also preferable that the structure includes two or more different repeating units.

[0206] Examples of repeating units having graft chains include the repeating unit represented by formula (b1-2). [ka]

[0207] In the formula, A b12 represents a trivalent linking group, L b12 represents a single bond or a divalent linking group, Y b12 This represents a graft chain.

[0208] A b12 Examples of trivalent linking groups represented by include poly(meth)acrylic linking groups, polyalkyleneimine linking groups, polyester linking groups, polyurethane linking groups, polyurea linking groups, polyamide linking groups, polyether linking groups, and polystyrene linking groups. It is preferable that the linking group be a poly(meth)acrylic linking group or a polyalkyleneimine linking group, and more preferably a poly(meth)acrylic linking group.

[0209] L b12 Examples of divalent linking groups represented by include alkylene groups (preferably alkylene groups having 1 to 12 carbon atoms), arylene groups (preferably arylene groups having 6 to 20 carbon atoms), -NH-, -SO-, -SO2-, -C(=O)-, -O-, -C(=O)O-, -OC(=O)-, -S-, and groups formed by combining two or more of these groups.

[0210] Y b12 The graft chains represented by this include the graft chains mentioned above.

[0211] In graft resins, the weight-average molecular weight of the repeating unit having a graft chain is preferably 1000 or more, more preferably 1000 to 10000, and even more preferably 1000 to 7500. In this specification, the weight-average molecular weight of the repeating unit having a graft chain is the value calculated from the weight-average molecular weight of the raw material monomers used in the polymerization of the repeating unit. For example, a repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, a macromonomer refers to a polymer compound in which polymerizable groups are introduced at the polymer ends. When a repeating unit having a graft chain is formed using a macromonomer, the weight-average molecular weight of the macromonomer corresponds to the repeating unit having a graft chain.

[0212] In graft resins, the content of repeating units having graft chains is preferably 1 to 60 mol% of the total repeating units of the graft resin. The upper limit is preferably 50 mol% or less, and more preferably 40 mol% or less. The lower limit is preferably 2 mol% or more, and more preferably 5 mol% or more.

[0213] The graft resin may also preferably contain repeating units having polymerizable groups. Examples of polymerizable groups include ethylenically unsaturated bond-containing groups and cyclic ether groups. Examples of ethylenically unsaturated bond-containing groups include vinyl groups, (meth)allyl groups, (meth)acryloyl groups, and styrene groups. Examples of cyclic ether groups include epoxy groups and oxetanyl groups.

[0214] In graft resins, the content of repeating units having polymerizable groups is preferably 1 mol% or more, and more preferably 1 to 80 mol%, of the total repeating units of the graft resin. The upper limit is preferably 70 mol% or less, and more preferably 60 mol% or less. The lower limit is preferably 2 mol% or more, and more preferably 5 mol% or more.

[0215] The graft resin may also preferably contain repeating units having acidic groups. Examples of acidic groups include carboxyl groups, sulfo groups, and phosphate groups.

[0216] In the graft resin, the content of repeating units having acid groups is preferably 1 to 80 mol%, more preferably 5 to 80 mol%, and even more preferably 10 to 80 mol% of the total repeating units of the graft resin.

[0217] As the graft resin, a resin containing repeating units represented by formula (Ac-2) can also be used. [ka] In formula (Ac-2), Ar 10 L represents a group containing an aromatic carboxyl group. 11 This represents -C(=O)O- or -CONH-, L 12 represents a trivalent linking group, P 10 represents a polymer chain.

[0218] Ar in equation (Ac-2) 10 Groups containing aromatic carboxyl groups represented by include structures derived from aromatic tricarboxylic acid anhydrides and structures derived from aromatic tetracarboxylic acid anhydrides. Examples of aromatic tricarboxylic acid anhydrides and aromatic tetracarboxylic acid anhydrides include compounds with the following structures. [ka]

[0219] In the above formula, Q 1 This represents a single bond, -O-, -C(=O)-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the following formula (Q-1), or a group represented by the following formula (Q-2). [ka]

[0220] Ar 10 The group containing the aromatic carboxyl group represented by may have polymerizable groups. 10 Specific examples of groups containing aromatic carboxyl groups represented by the formula (Ar-11), the group represented by formula (Ar-12), and the group represented by formula (Ar-13) are examples of such groups. [ka]

[0221] In formula (Ar-11), n1 represents an integer from 1 to 4, and is preferably 1 or 2, and more preferably 2. In formula (Ar-12), n² represents an integer between 1 and 8, preferably between 1 and 4, more preferably 1 or 2, and even more preferably 2. In formula (Ar-13), n3 and n4 each independently represent integers between 0 and 4, preferably between 0 and 2, more preferably 1 or 2, and even more preferably 1. However, at least one of n3 and n4 is an integer of 1 or greater. In formula (Ar-13), Q 1 This represents a single bond, -O-, -C(=O)-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, the group represented by formula (Q-1) above, or the group represented by formula (Q-2) above. In equations (Ar-11) to (Ar-13), *1 is L 10 This indicates the connection point with [the other element].

[0222] L in equation (Ac-2) 11 This represents -C(=O)O- or -CONH-, and -C(=O)O- is preferred.

[0223] L in equation (Ac-2) 12 The trivalent linking group represented by includes hydrocarbon groups, -O-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NH-, -S-, and combinations of two or more of these. Hydrocarbon groups include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have substituents. Examples of substituents include hydroxyl groups. 12 The trivalent linking group represented by is preferably the group represented by formula (L12-1), and more preferably the group represented by formula (L12-2). [ka]

[0224] In formula (L12-1), L 12b represents a trivalent linking group, X 1 represents S, and *1 is L in equation (Ac-2). 11 This represents the bond position with, and *2 is P in equation (Ac-2). 10 This indicates the connection position with L. 12b Examples of trivalent linking groups represented by include hydrocarbon groups; groups formed by combining a hydrocarbon group with at least one selected from -O-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NH-, and -S-, and it is preferable that the group is a hydrocarbon group or a group formed by combining a hydrocarbon group with -O-.

[0225] In formula (L12-2), L 12c represents a trivalent linking group, X 1 represents S, and *1 is L in equation (Ac-2). 11 This represents the bond position with, and *2 is P in equation (Ac-2). 10 This indicates the connection position with L. 12c Examples of trivalent linking groups represented by include hydrocarbon groups; groups formed by combining a hydrocarbon group with at least one selected from -O-, -C(=O)-, -C(=O)O-, -OC(=O)-, -NH-, and -S-, and it is preferable that the group is a hydrocarbon group.

[0226] P in equation (Ac-2) 10 The polymer chain represented by includes polymer chains containing repeating units of at least one structure selected from the group consisting of polyester structures, polyether structures, poly(meth)acrylic structures, polystyrene structures, polyurethane structures, polyurea structures, and polyamide structures. Examples of repeating units of polyester structures include repeating units of structures represented by formulas (G-1), (G-4), or (G-5) above. Examples of repeating units of polyether structures include repeating units of structures represented by formula (G-2) above. Examples of repeating units of poly(meth)acrylic structures include repeating units of structures represented by formula (G-3) above. Examples of repeating units of polystyrene structures include repeating units of structures represented by formula (G-6) above.

[0227] P 10 The polymer chain represented by may include repeating units having polymerizable groups. 10 If the polymer chain represented by contains repeating units having polymerizable groups, P 10 The proportion of repeating units having polymerizable groups among all repeating units constituting the material is preferably 1 mol% or more, and more preferably 1 to 80 mol%. The upper limit is preferably 70 mol% or less, and more preferably 60 mol% or less. The lower limit is preferably 2 mol% or more, and more preferably 5 mol% or more.

[0228] P 10 The polymer chain represented by may contain repeating units containing acidic groups. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, and phenolic hydroxyl groups. 10 If the polymer chain represented by contains repeating units having acidic groups, P 10 The proportion of repeating units having acidic groups among all repeating units constituting the material is preferably 1 to 80 mol%, more preferably 5 to 80 mol%, and even more preferably 10 to 80 mol%.

[0229] P 10 The weight-average molecular weight of the polymer chain represented by is preferably 500 to 20000. The lower limit is preferably 1000 or more. The upper limit is preferably 10000 or less, more preferably 5000 or less, and even more preferably 3000 or less.

[0230] The resin used as a dispersant is preferably a resin having aromatic carboxyl groups. Examples of resins having aromatic carboxyl groups include those mentioned above.

[0231] The resin used as a dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chains. Preferably, the polyimine-based dispersant has a main chain having a substructure with functional groups having a pKa of 14 or less, and side chains with 40 to 10,000 atoms, and contains a basic nitrogen atom in at least one of its main chain and side chains. The basic nitrogen atom is not particularly limited as long as it exhibits basic properties. For polyimine-based dispersants, refer to paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128, the contents of which are incorporated herein by reference.

[0232] The resin used as a dispersant is preferably a resin with a structure in which multiple polymer chains are bonded to the core. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Publication No. 2013-043962.

[0233] The resin used as a dispersant is preferably a resin containing repeating units having ethylenically unsaturated bond-containing groups in their side chains. The content of repeating units having ethylenically unsaturated bond-containing groups in their side chains is preferably 10 mol% or more, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol% of the total repeating units of the resin.

[0234] As a dispersant, the resin described in JP 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077, polyethyleneimine having polyester side chains as described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having acrylamide structural units as described in JP 2020-066687, the block polymer having acrylamide structural units as described in JP 2020-066688, the dispersant described in International Publication No. 2016 / 104803, and the main chain described in International Publication No. 2021 / 182268 ( Other resins that can be used include meth)acrylic repeating units and resins having a graft structure with oxetane groups in the side chains, star-shaped polymers described in International Publication No. 2021 / 187257 and resins in which a portion of the arm portion has repeating units with oxetane groups, resins described in International Publication No. 2022 / 019253 that have an amic acid repeating structure in the main chain and graft structures in the side chains, resins described in International Publication No. 2022 / 019254 that have an amic acid repeating structure in the main chain and block polymers at the ends, and resins described in International Publication No. 2022 / 019255 that have amic acid repeating units and polyester repeating units in the main chain and graft structures in the side chains.

[0235] Dispersants are also available commercially, and specific examples include the DISPERBYK series from BYKChemie, the SOLSPERSE series from Lubrizol Nippon, the Efka series from BASF, and the Azisper series from Ajinomoto Fine Techno Co., Ltd. Furthermore, the products described in paragraph 0129 of Japanese Patent Publication No. 2012-137564 and paragraph 0235 of Japanese Patent Publication No. 2017-194662 can also be used as dispersants.

[0236] [Other resin properties] [Acid value] From the viewpoint of storage stability and adhesion, the acid value of the resin is preferably 0.066 to 0.400 mmol / g, more preferably 0.069 to 0.356 mmol / g, and even more preferably 0.071 to 0.321 mmol / g. Furthermore, the acid value of the specific resin is preferably 3.70 to 200 mg KOH / g, more preferably 3.85 to 150 mg KOH / g, and even more preferably 4.00 to 80 mg KOH / g. The above acid value is measured by a known method, for example, by the method described in JIS K 0070:1992.

[0237] Furthermore, from the viewpoint of adhesion, it is also preferable that the resin is a polyamic acid ester in which the acidic functional groups at a pH of less than 8.0 are less than 0.1 mg KOH / g, and the acidic functional groups at a pH of 8.0 or higher are 3.70 to 22.5 mg KOH / g. Conditions: 0.300 g of resin is completely dissolved in 80 mL of NMP, then 5 mL of water is mixed in, and the mixture is titrated with a 0.01 mol / L NaOH aqueous solution. Whether or not it has completely dissolved can be confirmed by visual inspection by checking for the absence of any residue. If the above amount of resin does not completely dissolve in NMP, the amount of resin may be appropriately reduced and the measurement may be taken at a concentration at which it completely dissolves. The acidic functional group at a pH of less than 8.0 is preferably less than 0.01 mg KOH / g, and more preferably less than 0.001 mg KOH / g. The acidic functional group with a pH of 8.0 or higher is preferably 3.70 to 22.5 mg KOH / g, and more preferably 4.00 to 18.0 mg KOH / g.

[0238] [Amine value] From the viewpoint of storage stability of the photocurable composition, the amine value of the resin is preferably 10 mmol / g or less, more preferably 0.0001 to 1 mmol / g, and even more preferably 0.001 to 0.1 mmol / g. The lower limit of the amine value mentioned above is not particularly limited and may be 0.00 mmol / g. The amine value was prepared by dissolving 0.62 g of resin in 50 mL of diglym, then adding 10 mL of acetic acid to create a measurement solution. This solution was then titrated with a 0.01 N (0.01 mol / L) perchloric acid solution and the neutralization point was detected.

[0239] [Molecular weight] The weight-average molecular weight (Mw) of the resin is preferably 180,000 or less, more preferably 150,000 or less, even more preferably 75,000 or less, and particularly preferably 50,000 or less. The inventors have found that resolution can be further improved by appropriately reducing the molecular weight of a specific resin. The reason for this is presumed to be improved developability due to a moderate improvement in solubility. Furthermore, the above Mw is preferably 5,000 or more, more preferably 10,000 or more, even more preferably 12,000 or more, even more preferably 15,000 or more, and particularly preferably 18,000 or more. The weight-average molecular weight (Mw) range of the resin may be any combination of the lower and upper limits mentioned above, but it is particularly preferable that it be between 18,000 and 50,000. The number-average molecular weight (Mn) of the resin is preferably 100,000 or less, more preferably 80,000 or less, and even more preferably 50,000 or less. Furthermore, the above Mn is preferably 2,000 or more, more preferably 3,000 or more, and even more preferably 4,000 or more. The degree of molecular weight dispersion of the resin is preferably 1.5 or higher, more preferably 1.8 or higher, and even more preferably 2.0 or higher. There is no upper limit for the degree of molecular weight dispersion of the resin, but for example, it is preferably 7.0 or lower, more preferably 6.5 or lower, and even more preferably 6.0 or lower. In this specification, the degree of molecular weight dispersion is the value calculated by dividing the weight-average molecular weight by the number-average molecular weight. When a photocurable composition contains multiple types of resins as specific resins, it is preferable that the weight-average molecular weight, number-average molecular weight, and degree of dispersion of at least one of the resins are within the above ranges. It is also preferable that the weight-average molecular weight, number-average molecular weight, and degree of dispersion calculated by treating the multiple types of resins as a single resin are, respectively, within the above ranges.

[0240] [Content] The resin content in the total solids of the photocurable composition is preferably 1 to 60% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 50% by mass or less, and more preferably 40% by mass or less. The content of the resin having acid groups in the total solids of the photocurable composition is preferably 1 to 60% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 50% by mass or less, and more preferably 40% by mass or less. Furthermore, if the photocurable composition contains a polymerizable compound as described later, the resin content is preferably 100 to 1000 parts by mass per 100 parts by mass of the polymerizable compound. The lower limit is preferably 150 parts by mass or more, and more preferably 200 parts by mass or more. The upper limit is preferably 600 parts by mass or less, and more preferably 500 parts by mass or less. The content of the specific resin in the photocurable composition of the present invention is preferably 20% by mass or more, more preferably 30% by mass or more, even more preferably 40% by mass or more, and even more preferably 50% by mass or more, based on the total solid content of the photocurable composition. Furthermore, the content of the resin in the photocurable composition of the present invention is preferably 99.5% by mass or less, more preferably 99% by mass or less, even more preferably 98% by mass or less, even more preferably 97% by mass or less, and even more preferably 95% by mass or less, based on the total solid content of the photocurable composition. The photocurable composition of the present invention may contain only one type of resin or may contain two or more types. When two or more types of resins are included, it is preferable that their total amount falls within the above range.

[0241] <Colorants> The photocurable composition of the present invention preferably contains a colorant. Examples of colorants include white colorants, black colorants, chromatic colorants, and infrared absorbing colorants. In this invention, the white colorant includes not only pure white but also light gray colorants that are close to white (e.g., off-white, light gray, etc.).

[0242] The colorant may be a pigment or a dye. A combination of pigments and dyes may also be used. The pigment may be either an inorganic or organic pigment, but organic pigments are preferred from the viewpoint of a wide range of color variations, ease of dispersion, and safety. It is preferable that the colorant contains a pigment.

[0243] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined by observing the primary particles of the pigment with a transmission electron microscope and obtaining the resulting photograph. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding equivalent circle diameter is calculated as the primary particle diameter of the pigment.

[0244] The crystallite size of the pigment, determined from the full width at half maximum of the peaks originating from any crystal plane in the X-ray diffraction spectrum when CuKα rays are used as the X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0245] The specific surface area of ​​the pigment is 1 to 300 m². 2 It is preferable that it be / g. The lower limit is 10m 2 It is preferable that the amount be 30m or more. 2 It is more preferable that the amount is 250mg or more. The upper limit is 250mg. 2 It is preferable that it be less than / g, and 200m 2 It is more preferable that the value is less than or equal to / g. The specific surface area can be measured according to DIN 66131: determination of the specific surface area of ​​solids by gas adsorption, in accordance with the BET (Brunauer, Emmett, and Teller) method.

[0246] [Chromatic color materials] Examples of chromatic pigments include those with maximum absorption wavelengths in the range of 400 to 700 nm. Examples include green pigments, red pigments, yellow pigments, purple pigments, blue pigments, and orange pigments.

[0247] Examples of red colorants include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, azomethine compounds, xanthene compounds, quinacridone compounds, perylene compounds, and thioindigo compounds. Diketopyrrolopyrrole compounds, anthraquinone compounds, and azo compounds are preferred, and diketopyrrolopyrrole compounds are more preferred. Furthermore, the red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0248] Specific examples of red pigments include CI (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, Examples of red pigments include 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, and 297. Furthermore, as a red colorant, the compound described in paragraph 0034 of International Publication No. 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in Japanese Patent Publication No. 2020-085947 can also be used.

[0249] As for the red colorants, CI Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, CI Pigment Red 254, 264, and 272 are more preferred, and CI Pigment Red 254 and 264 are even more preferred.

[0250] Examples of green colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. Furthermore, the green colorant is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0251] Specific examples of green colorants include green pigments such as CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Alternatively, zinc phthalocyanine halides, which have an average of 10-14 halogen atoms, 8-12 bromine atoms, and 2-5 chlorine atoms per molecule, can also be used as green colorants. A specific example is the compound described in International Publication No. 2015 / 118720. Furthermore, compounds described in paragraph 0029 of International Publication No. 2022 / 085485, aluminum phthalocyanine compounds described in Japanese Patent Publication No. 2020-070426, and diarylmethane compounds described in Japanese Patent Publication No. 2020-504758 can also be used as green colorants.

[0252] As for the green coloring agent, CI Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0253] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. Preferably, the orange colorant is a pigment (orange pigment). Specific examples of orange colorants include CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0254] Examples of yellow colorants include azo compounds, azomethine compounds, isoindoline compounds, pteridine compounds, quinophthalone compounds, and perylene compounds. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of yellow pigments include CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120 Examples of yellow pigments include 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, and 236.

[0255] Nickel azobarbiturate complex can also be used as a yellow coloring agent.

[0256] As a yellow coloring agent, the compounds described in paragraphs 0031 to 0033 of International Publication No. 2022 / 085485, the methine dye described in Japanese Patent Publication No. 2019-073695, and the methine dye described in Japanese Patent Publication No. 2019-073696 can be used.

[0257] Examples of purple colorants include oxazine compounds, quinacridone compounds, perylene compounds, and indigo compounds, with oxazine compounds being preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of purple colorants include purple pigments such as CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0258] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include blue pigments such as CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds containing phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022-0030 of Japanese Patent Publication No. 2012-247591 and paragraph 0047 of Japanese Patent Publication No. 2011-157478.

[0259] Dyes can also be used as chromatic colorants. There are no particular restrictions on the dyes used, and known dyes can be used. Examples of dyes include pyrazole azo, anilino azo, triarylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, phthalocyanine, benzopyran, indigo, and pyromethene dyes.

[0260] Chromatic pigments can also be made from pigment polymers. The pigment polymer is preferably a dye that is dissolved in a solvent. The pigment polymer may also form particles. When the pigment polymer is in particle form, it is usually used in a dispersed state in a solvent. Particle-form pigment polymers can be obtained, for example, by emulsion polymerization, and the compound and manufacturing method described in Japanese Patent Publication No. 2015-214682 are specific examples. The pigment polymer has two or more pigment structures in one molecule, preferably three or more. There is no particular upper limit, but it can be 100 or less. The multiple pigment structures in one molecule may be the same pigment structure or different pigment structures. The weight-average molecular weight (Mw) of the pigment polymer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and even more preferably 6000 or more. The upper limit is more preferably 30000 or less, and even more preferably 20000 or less. The pigment polymer can also be a compound described in Japanese Patent Publication No. 2011-213925, Japanese Patent Publication No. 2013-041097, Japanese Patent Publication No. 2015-028144, Japanese Patent Publication No. 2015-030742, International Publication No. 2016 / 031442, etc.

[0261] As chromatic colorants, the following are used: the triarylmethane dye polymer described in Korean Published Patent No. 10-2020-0028160, the xanthene compound described in Japanese Patent Publication No. 2020-117638, the phthalocyanine compound described in International Publication No. 2020 / 174991, the isoindoline compound described in Japanese Patent Publication No. 2020-160279 or salts thereof, the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069442, the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069730, and the compound represented by Formula 1 described in Korean Published Patent No. 10-2020-0069070. The following compounds can be used: a compound represented by formula 1, a compound represented by formula 1 described in Korean Published Patent No. 10-2020-0069067, a compound represented by formula 1 described in Korean Published Patent No. 10-2020-0069062, a zinc halide phthalocyanine pigment described in Japanese Patent No. 6809649, an isoindoline compound described in Japanese Patent Publication No. 2020-180176, a phenothiazine compound described in Japanese Patent Publication No. 2021-187913, a zinc halide phthalocyanine described in International Publication No. 2022 / 004261, and a zinc halide phthalocyanine described in International Publication No. 2021 / 250883. The chromatic colorant may be a rotaxane, and the pigment skeleton may be used in a cyclic structure of the rotaxane, in a rod-like structure, or in both structures. As chromatic colorants, the following are used: a quinophthalone compound represented by formula 1 in Korean Published Patent No. 10-2020-0030759, a polymer dye described in Korean Published Patent No. 10-2020-0061793, a chromatic colorant described in Japanese Patent Publication No. 2022-029701, an isoindoline compound described in International Publication No. 2022 / 014635, an aluminum phthalocyanine compound described in International Publication No. 2022 / 024926, and Japanese Patent Publication No. 2022-045 Compounds described in Publication No. 895, compounds described in International Publication No. 2022 / 050051, compounds described in Japanese Patent Publication No. 2020-090676, compounds described in Japanese Patent Publication No. 2020-055956, compounds described in Japanese Patent Publication No. 2021-031681, compounds described in Japanese Patent Publication No. 2022-056354, compounds described in U.S. Patent Application Publication No. 2021 / 0355327, compounds described in International Publication No. 2022 / 065357,Compounds described in Japanese Patent Publication No. 2020-045436, compounds described in Korean Published Patent No. 10-2021-0146726, compounds described in Japanese Patent Publication No. 2018-178039, compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, Japanese Patent Publication No. 2022-1048 Compounds described in Patent Publication No. 22, Compounds described in Japanese Patent Application Publication No. 2022-096701, Compounds described in Japanese Patent Application Publication No. 2020-023652, Green pigment described on pages 80-84 of the Journal of the Color Materials Association (published in 2022), Compounds described in Japanese Patent Application Publication No. 2022-143135, Compounds described in Japanese Patent Application Publication No. 2022-140287, Compounds described in International Publication No. 2022 / 136308, Chinese Patent Application Publication No. 11306134 Perylene compound described in Specification No. 9, cyanide pigment described in Korean Published Patent No. 10-2017-0018993, isoindoline compound described in Japanese Patent Publication No. 2020-180176, compound described in Japanese Patent Publication No. 2023-013209, compound described in Japanese Patent Publication No. 2023-013166, xanthene compound described in International Publication No. 2023 / 286526, chemical compound described in Japanese Patent Publication No. 2021-155746 Compounds, compounds described in Japanese Patent Publication No. 2021-155747, compounds described in Japanese Patent Publication No. 2021-155748, compounds described in Japanese Patent Publication No. 2021-155749, compounds described in International Publication No. 2018 / 051876, compounds described in Japanese Patent Publication No. 2020-083981, compounds described in Japanese Patent Publication No. 2023-056463, compounds described in Japanese Patent Publication No. 2023-515473, etc. may also be used.

[0262] Two or more chromatic colorants may be used in combination. Furthermore, when two or more chromatic colorants are used in combination, the combination of two or more chromatic colorants may form black. Examples of such combinations include the following embodiments (1) to (7). When the photocurable composition contains two or more chromatic colorants and exhibits black color through a combination of two or more chromatic colorants, the photocurable composition of the present invention can be preferably used as a photocurable composition for forming infrared transmission filters. (1) An embodiment containing a red colorant and a blue colorant. (2) An embodiment containing a red colorant, a blue colorant, and a yellow colorant. (3) A form containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant. (4) An embodiment containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant. (5) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a green colorant. (6) An embodiment containing a red colorant, a blue colorant, and a green colorant. (7) An embodiment containing a yellow colorant and a purple colorant.

[0263] [White coloring material] Examples of white pigments include inorganic pigments such as titanium dioxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, and zinc sulfide. The white pigments described in paragraphs 0040-0043 of International Publication No. 2022 / 085485 can be used.

[0264] [Black colorant] The black colorant is not particularly limited, and known materials can be used. The black colorant may be an inorganic black colorant or an organic black colorant. The black colorant is preferably a pigment. In this specification, the term "black colorant" refers to a colorant that exhibits absorption over the entire wavelength range of 400 to 700 nm.

[0265] Examples of inorganic black colorants include carbon black, titanium black, and graphite, with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black refers to black particles containing titanium atoms, with lower-order titanium oxide and titanium oxynitride being preferred. The titanium black used can be the titanium black described in paragraph 0044 of International Publication No. 2022 / 085485. Zirconium nitride powder described in Japanese Patent Application Publication No. 2023-048173 can also be used as an inorganic black colorant.

[0266] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. The organic black colorant can be a compound described in paragraph 0166 of International Publication No. 2022 / 065215. Alternatively, perylene black (such as Lumogen Black FK4280) described in paragraphs 0016-0020 of Japanese Patent Publication No. 2017-226821 or a black azo pigment described in Japanese Patent Publication No. 2022-121935 may be used as the organic black colorant.

[0267] [Infrared absorbing colorant] The infrared absorbing colorant is preferably a compound having a maximum absorption wavelength longer than 700 nm. It is preferable that the infrared absorbing colorant is a compound having a maximum absorption wavelength in the range of 700 nm to 1800 nm, more preferably a compound having a maximum absorption wavelength in the range of 700 nm to 1400 nm, even more preferably a compound having a maximum absorption wavelength in the range of 700 nm to 1200 nm, and particularly preferably a compound having a maximum absorption wavelength in the range of 700 nm to 1000 nm. Furthermore, the absorbance A of the infrared absorbing colorant at a wavelength of 500 nm is also specified. 1 and absorbance A at the maximum absorption wavelength 2 Ratio A 1 / A 2 It is preferable that the ratio is 0.08 or less, and more preferably 0.04 or less. Furthermore, the infrared absorbing colorant is preferably a pigment, and more preferably an organic pigment.

[0268] Examples of infrared absorbing colorants include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, crokonium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. Specific examples include the compounds described in paragraph 0114 of International Publication No. 2022 / 065215. Furthermore, examples of infrared absorbing colorants include the compounds described in paragraph 0121 of International Publication No. 2022 / 065215, and the squarylium compounds described in Japanese Patent Publication No. 2020-075959. Copper complex described in Korean Published Patent No. 10-2019-0135217, croconic acid compound described in Japanese Patent Publication No. 2021-195515, infrared absorbing dye described in Japanese Patent Publication No. 2022-022070, croconium compound described in International Publication No. 2019 / 021767, compound described in Japanese Patent Publication No. 2019-127549, compound described in International Publication No. 2022 / 059619, Japanese Patent Publication No. 2022-151682 The compounds described in the publication, the squarylium compounds described in Japanese Patent Publication No. 2022-188858, the compounds described in Japanese Patent Publication No. 2022-184710, the compounds described in Japanese Patent Publication No. 2022-189736, the squarylium compounds described in Japanese Patent Publication No. 2023-004570, the squarylium compounds described in International Publication No. 2019 / 230660, and the compounds described in International Publication No. 2020 / 218615 may also be used.

[0269] The colorant content in the total solids of the photocurable composition is preferably 30 to 80% by mass. The upper limit is preferably 70% by mass or less, and more preferably 65% ​​by mass or less. The lower limit is preferably 35% by mass or more, and more preferably 40% by mass or more.

[0270] The pigment content in the total solids of the photocurable composition is preferably 20 to 80% by mass. The upper limit is preferably 75% by mass or less, more preferably 65% ​​by mass or less, and even more preferably 63% by mass or less. The lower limit is preferably 25% by mass or more, more preferably 30% by mass or more, and even more preferably 35% by mass or more. According to the photocurable composition of the present invention, even when the pigment content is high, a film with suppressed foreign matter defects can be formed, so the effects of the present invention are more pronounced when the pigment content is high.

[0271] The pigment content in the colorant is preferably 20 to 100% by mass, more preferably 50 to 100% by mass, and even more preferably 70 to 100% by mass.

[0272] <Pigment derivatives> The photocurable composition of the present invention may contain a pigment derivative. The pigment derivative can be used, for example, as a dispersion aid. A dispersion aid is a material used to improve the dispersibility of colorants such as pigments in a photocurable composition.

[0273] Examples of pigment derivatives include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acidic group or a basic group.

[0274] Examples of the above-mentioned pigment structures include quinoline pigment structure, benzimidazolone pigment structure, benzoisoindole pigment structure, benzothiazole pigment structure, iminium pigment structure, squarylium pigment structure, crokonium pigment structure, oxonol pigment structure, pyrrolopyrrole pigment structure, diketopyrrolopyrrole pigment structure, azo pigment structure, azomethine pigment structure, phthalocyanine pigment structure, naphthalocyanine pigment structure, anthraquinone pigment structure, quinacridone pigment structure, dioxazine pigment structure, perinone pigment structure, perylene pigment structure, thiaidine indigo pigment structure, thioindigo pigment structure, isoindoline pigment structure, isoindolinone pigment structure, quinophthalone pigment structure, dithiol pigment structure, triarylmethane pigment structure, pyromethene pigment structure, and the like.

[0275] Examples of acidic groups found in pigment derivatives include carboxyl groups, sulfo groups, phosphate groups, boronic acid groups, imido acid groups, and salts thereof. Examples of atoms or groups of atoms constituting the salt include alkali metal ions (Li + na + , K + (e.g.), alkaline earth metal ions (Ca 2+ Mg 2+ Examples include ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions. Examples of imido acid groups include -SO2NHSO2R X1 -CONHSO2R X2 -CONHCOR X3 or -SO2NHCOR X4 A group represented by -SO2NHSO2R is preferred. X1 -CONHSO2R X2 , or -SO2NHCOR X4 The group represented by -SO2NHSO2R is more preferred. X1 Or -CONHSO2R X2 This is even more preferable. X1 ~R X4 Each of these independently represents an alkyl group or an aryl group. X1 ~R X4 The alkyl and aryl groups represented by may have substituents. The substituents are preferably halogen atoms, and more preferably fluorine atoms. X1 ~R X4 Each of these is preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The alkyl group containing a fluorine atom has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The aryl group containing a fluorine atom has 6 to 20 carbon atoms, more preferably 6 to 12, and even more preferably 6.

[0276] Basic groups found in pigment derivatives include amino groups, pyridinyl groups and their salts, ammonium groups, and phthalimidomethyl groups. Atoms or groups of atoms that make up the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0277] As for amino groups, -NR x11 R x12 Examples include the group represented by and the cyclic amino group.

[0278] -NR x11 R x12 In a base represented by R x11 and R x12 Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and is preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but linear or branched is preferred, and linear is more preferred. The alkyl group may have substituents. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have substituents.

[0279] Examples of cyclic amino groups include pyrrolidine, piperidine, piperazine, and morpholine groups. These groups may also have substituents.

[0280] Pigment derivatives with excellent visible transparency (hereinafter also referred to as transparent pigment derivatives) can also be used. The maximum molar extinction coefficient (εmax) of transparent pigment derivatives in the wavelength range of 400-700 nm is 3000 L·mol -1 ·cm -1 Preferably, the following: 1000 L·mol -1 ·cm -1 It is more preferable that the following conditions apply: 100 L·mol -1 ·cm -1 It is even more preferable that the following conditions are met: The lower limit of εmax is, for example, 1 L·mol. -1 ·cm -1 That is all. 10 L·mol -1 ·cm -1 That's fine too.

[0281] Specific examples of pigment derivatives include the compounds described in the examples below, the compounds described in paragraph 0124 of International Publication No. 2022 / 085485, the benzimidazolone compounds or salts thereof described in Japanese Patent Application Publication No. 2018-168244, the compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282, the compounds described in Japanese Patent Application Publication No. 2019-172968, and the compounds described in the specification of Chinese Patent Application Publication No. 115124889.

[0282] The pigment derivative content is preferably 1 to 30 parts by mass, and more preferably 3 to 20 parts by mass, per 100 parts by mass of pigment. Furthermore, the total content of the pigment derivative and colorant is preferably 40% by mass or more, more preferably 50% by mass or more, and even more preferably 60% by mass or more, of the total solid content of the photocurable composition. The upper limit is preferably 80% by mass or less, and more preferably 70% by mass or less. Only one type of pigment derivative may be used, or two or more types may be used in combination.

[0283] <Polyalkylenes> The photocurable composition of the present invention may also contain polyalkyleneimines. Polyalkyleneimines are used, for example, as dispersing aids for pigments. A dispersing aid is a material used to improve the dispersibility of colorants such as pigments in a photocurable composition. A polyalkyleneimine is a polymer obtained by ring-opening polymerization of alkyleneimines. Preferably, the polyalkyleneimine is a polymer having a branched structure containing primary amino groups, secondary amino groups, and tertiary amino groups. The number of carbon atoms in the alkyleneimine is preferably 2 to 6, more preferably 2 to 4, even more preferably 2 or 3, and particularly preferably 2.

[0284] The molecular weight of the polyalkyleneimine is preferably 200 or more, and more preferably 250 or more. The upper limit is preferably 100,000 or less, more preferably 50,000 or less, even more preferably 10,000 or less, and particularly preferably 2,000 or less. Regarding the molecular weight of the polyalkyleneimine, if the molecular weight can be calculated from the structural formula, the molecular weight of the polyalkyleneimine is the value calculated from the structural formula. On the other hand, if the molecular weight of a specific amine compound cannot be calculated from the structural formula, or is difficult to calculate, the number-average molecular weight measured by the boiling point elevation method is used. Furthermore, if measurement is not possible or difficult even with the boiling point elevation method, the number-average molecular weight measured by the viscosity method is used. Furthermore, if measurement is not possible or difficult even with the viscosity method, the number-average molecular weight in polystyrene equivalent, measured by GPC (gel permeation chromatography), is used.

[0285] The amine value of the polyalkyleneimine is preferably 5 mmol / g or higher, more preferably 10 mmol / g or higher, and even more preferably 15 mmol / g or higher.

[0286] Specific examples of alkyleneimines include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine, with ethyleneimine or propyleneimine being preferred, and ethyleneimine being more preferred. Polyalkyleneimines are particularly preferably polyethyleneimine. Furthermore, polyethyleneimine preferably contains 10 mol% or more of primary amino groups relative to the total of primary, secondary, and tertiary amino groups, more preferably 20 mol% or more, and even more preferably 30 mol% or more. Commercially available polyethyleneimines include Epomin SP-003, SP-006, SP-012, SP-018, SP-200, and P-1000 (all manufactured by Nippon Shokubai Co., Ltd.).

[0287] The polyalkylene imine content in the total solids of the photocurable composition is preferably 0.1 to 5% by mass. The lower limit is preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is preferably 4.5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. Furthermore, the polyalkylene imine content is preferably 0.5 to 20 parts by mass per 100 parts by mass of pigment. The lower limit is preferably 0.6 parts by mass or more, more preferably 1 part by mass or more, and even more preferably 2 parts by mass or more. The upper limit is preferably 10 parts by mass or less, and even more preferably 8 parts by mass or less. Only one type of polyalkylene imine may be used, or two or more types may be used. When two or more types are used, it is preferable that their total amount is within the above range.

[0288] <Polymerization initiator> [Other photopolymerization initiators] The photocurable composition of the present invention may contain other photopolymerization initiators. Here, the other photopolymerization initiators shall not include compounds corresponding to compound A described above. Other photopolymerization initiators are not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light in the ultraviolet to visible regions are preferred. Other photopolymerization initiators are preferably photoradical polymerization initiators.

[0289] Other photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, and α-aminoketone compounds. From the viewpoint of exposure sensitivity, other photopolymerization initiators are preferably trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, hexaarylbiimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds, and 3-arylsubstituted coumarin compounds, more preferably compounds selected from oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds, and even more preferably oxime compounds.Other photopolymerization initiators include the compounds described in paragraphs 0065-0111 of JP 2014-130173, the compounds described in Japanese Patent No. 6301489, the peroxide-based photopolymerization initiator described in MATERIAL STAGE 37-60p, vol.19, No.3, 2019, the photopolymerization initiator described in International Publication No. 2018 / 221177, the photopolymerization initiator described in International Publication No. 2018 / 110179, the photopolymerization initiator described in JP 2019-043864, the photopolymerization initiator described in JP 2019-044030, the peroxide-based initiator described in JP 2019-167313, and the aminoacetophenone-based initiator having an oxazolidine group described in JP 2020-055992. Initiators, oxime-based photopolymerization initiators described in JP 2013-190459, polymers described in JP 2020-172619, compounds represented by formula 1 described in International Publication No. 2020 / 152120, compounds described in JP 2021-181406, photopolymerization initiators described in JP 2022-013379, compounds represented by formula (1) described in JP 2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP 2021-507058, Chinese patent application publications Initiators described in Specification No. 110764367, initiators described in JP 2022-518535, initiators described in International Publication No. 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP 2022-078550, compounds described in Korean Published Patent No. 10-2017-0087330, compounds described in International Publication No. 2022 / 075452, oxime ester compounds described in Specification No. 110066225, Korean Published Patent No. Examples include compounds described in Publication No. 10-2022-0076157, compounds described in paragraphs 0042 to 0062 of International Publication No. 2019 / 013112 having a triarylamine or N-arylcarbazole skeleton, oxime ester-based photopolymerization initiators described in Japanese Patent No. 7219378, photopolymerization initiators described in Korean Published Patent No. 10-2021-0146174, photopolymerization initiators described in International Publication No. 2019 / 013112, and photopolymerization initiators described in Japanese Patent Application Publication No. 2023-033731.

[0290] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0291] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins BV), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins BV), and Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), and Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0292] Examples of oxime compounds include the compounds described in paragraph 0142 of International Publication No. 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by general formula (1) and described in paragraphs 0022 to 0024 of Japanese Patent Publication No. 2021-173858, and the compounds represented by general formula (1) and described in paragraphs 0117 to 0120 of Japanese Patent Publication No. 2021-170089. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropane-1-one, and 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime). Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, and Irgacure OXE05 (manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-P BG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR-PBG-358, TR-PBG-365, TR-P Examples include BG-380, TR-PBG-610, TR-PBG-A, TR-PBG-B, TR-NPI-807, TR-PSS-206, TR-NPI-800, TR-NPI-20400 (all manufactured by TRONLY), and ADEKA Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in Japanese Patent Publication No. 2012-014052). Furthermore, it is preferable to use compounds that do not produce color or compounds that are highly transparent and resistant to discoloration as oxime compounds.Commercially available products include the ADEKA Arcles NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation), SpeedCure PDO (manufactured by ARKEMA Sartmar), and SPI-02, SPI-03, SPI-05, SPI-06, and SPI-07 (manufactured by SAMYANG).

[0293] Other photopolymerization initiators may include oxime compounds having a fluorene ring, oxime compounds having a skeleton in which at least one benzene ring of the carbazole ring is replaced by a naphthalene ring, oxime compounds having a fluorine atom, oxime compounds having a nitro group, oxime compounds having a benzofuran skeleton, oxime compounds in which a substituent having a hydroxyl group is attached to the carbazole skeleton, and compounds described in paragraphs 0143-0149 of International Publication No. 2022 / 085485.

[0294] The oxime compound preferably has the structures represented by (Ar-1) to (Ar-41) described above as substructures.

[0295] Initiators having a branched alkyl structure or a branched alicyclic structure at a position 2 carbon atoms away from the (keto)oxime group can also be suitably used. An example of such a structure is the compound represented by formula (1) in International Publication No. 2024004732.

[0296] Initiators in which a (keto)oxime group is substituted at the 3-position of the indole structure can also be suitably used. Examples of such structures include the compounds described in International Publication No. 2015 / 152153, formula (1) in International Publication No. 2024 / 004425, and formula (1) in International Publication No. 2024 / 004426.

[0297] Initiators having a fused ring structure with three or more (keto)oxime groups can also be suitably used. Examples of such structures include the group of structures described in paragraphs 0034 to 0036 of International Publication No. 2024 / 111393, which have three or more fused rings.

[0298] Ketooxime ester compounds having an allyl oil oxy group in the ortho position can also be suitably used. An example of such a compound is published in Chinese Patent Application No. 117342977.

[0299] Ketooxime ester compounds having an acyl oil oxy group in the carbazole structure can also be suitably used. An example of such a compound is given in International Publication No. 2021 / 175855.

[0300] Specific examples of compounds are shown below, but the initiators that may be used in combination with the present invention are not limited to these. [ka] [ka]

[0301] Other photopolymerization initiators may include bifunctional or trifunctional or higher photoradical polymerization initiators. By using such photoradical polymerization initiators, two or more radicals are generated from one molecule of the photoradical polymerization initiator, thus providing good sensitivity. Furthermore, when asymmetric compounds are used, crystallinity decreases and solubility in solvents improves, making precipitation less likely over time and improving the storage stability of the photocurable composition. Specific examples of bifunctional or trifunctional or higher photoradical polymerization initiators include the compounds described in paragraph 0148 of International Publication No. 2022 / 065215.

[0302] The content of the photopolymerization initiator in the total solid content of the photocurable composition is preferably 1 to 10% by mass. The lower limit is preferably 1% by mass or more, and more preferably 2% by mass or more. The upper limit is preferably 10% by mass or less, and more preferably 8% by mass or less. The photocurable composition of the present invention may contain only one type of photopolymerization initiator or may contain two or more types. When two or more types of photopolymerization initiators are included, it is preferable that their total amount be within the above range.

[0303] [Thermal polymerization initiator] Examples of thermal polymerization initiators include thermal radical polymerization initiators. Thermal radical polymerization initiators are compounds that generate radicals using thermal energy, thereby initiating or accelerating the polymerization reaction of polymerizable compounds. By adding thermal radical polymerization initiators, the polymerization reaction of resins and polymerizable compounds can be advanced, thereby further improving solvent resistance.

[0304] Examples of thermal radical polymerization initiators include the compounds described in paragraphs 0074 to 0118 of Japanese Patent Publication No. 2008-063554, the contents of which are incorporated herein by reference.

[0305] If a thermal polymerization initiator is included, its content is preferably 0.1 to 30% by mass, more preferably 0.1 to 20% by mass, and even more preferably 0.5 to 15% by mass, relative to the total solid content of the photocurable composition. The photocurable composition may contain only one thermal polymerization initiator or two or more. If two or more thermal polymerization initiators are included, the total amount is preferably within the above range.

[0306] <Sensitizer> The photocurable composition may contain a sensitizer. The sensitizer absorbs specific active radiation and enters an electronically excited state. When the sensitizer enters an electronically excited state, it comes into contact with a thermal radical polymerization initiator, a photoradical polymerization initiator, etc., causing electron transfer, energy transfer, and heat generation. As a result, the thermal radical polymerization initiator and the photoradical polymerization initiator undergo chemical changes and decompose, generating radicals, acids, or bases. Suitable sensitizers include compounds such as benzophenones, Michlar's ketones, coumarins, pyrazole azos, anilino azos, triphenylmethanes, anthraquinones, anthracenes, anthrapyridones, benzylidenes, oxonols, pyrazolotriazole azos, pyridone azos, cyanines, phenothiazines, pyrrolopyrazole azomethine, xanthenes, phthalocyanines, benzopyranes, and indigos. Using a commonly known sensitizer in combination is also preferable as it promotes the photodegradation of compound A and increases its sensitivity. Preferably, electron transfer sensitization to singlet or triplet states or energy transfer sensitization to singlet or triplet states can be used as the sensitizer. For example, among those mentioned above, Michlah's ketones, thioxanthones, coumarins, anthracenes, etc., can be preferably used. Furthermore, the sensitizing effect can be further enhanced by using it in combination with amine compounds, which will be discussed later. Examples of sensitizers include Michla's ketone, 4,4'-bis(diethylamino)benzophenone, 2,5-bis(4'-diethylaminobenzal)cyclopentane, 2,6-bis(4'-diethylaminobenzal)cyclohexanone, 2,6-bis(4'-diethylaminobenzal)-4-methylcyclohexanone, 4,4'-bis(dimethylamino)chalcone, 4,4'-bis(diethylamino)chalcone, p-dimethylaminocinnamyrideneindanone, and p-dimethylaminobenzylideneindanone. Non, 2-(p-dimethylaminophenylbiphenylene)-benzothiazole, 2-(p-dimethylaminophenylvinylene)benzothiazole, 2-(p-dimethylaminophenylvinylene)isonaphthothiazole, 1,3-bis(4'-dimethylaminobenzal)acetone, 1,3-bis(4'-diethylaminobenzal)acetone, 3,3'-carbonyl-bis(7-diethylaminocoumarin), 3-acetyl-7-dimethylaminocoumarin, 3-ethoxycarbonyl-7-dimethylaminocoumarin Phosphorus, 3-Benzyloxycarbonyl-7-dimethylaminocoumarin, 3-Methoxycarbonyl-7-diethylaminocoumarin, 3-Ethoxycarbonyl-7-diethylaminocoumarin (7-(diethylamino)coumarin-3-carboxylate ethyl), N-Phenyl-N'-ethylethanolamine, N-phenyldiethanolamine, Np-Tolyldiethanolamine, N-phenylethanolamine, 4-Morpholinobenzophenone, Isoamyl dimethylaminobenzoate, Isoamyl diethylaminobenzoate Examples include amyl, 2-mercaptobenzimidazole, 1-phenyl-5-mercaptotetrazol, 2-mercaptobenzothiazole, 2-(p-dimethylaminostyryl)benzoxazole, 2-(p-dimethylaminostyryl)benzothiazole, 2-(p-dimethylaminostyryl)naphtho(1,2-d)thiazole, 2-(p-dimethylaminobenzoyl)styrene, diphenylacetamide, benzanilide, N-methylacetanilide, and 3',4'-dimethylacetanilide. Other sensitizing dyes may also be used. For details regarding the sensitizing dye, please refer to paragraphs 0161 to 0163 of Japanese Patent Publication No. 2016-027357, which are incorporated herein by reference.

[0307] If the photocurable composition contains a sensitizer, the sensitizer content is preferably 0.01 to 20% by mass, more preferably 0.1 to 15% by mass, and even more preferably 0.5 to 10% by mass, relative to the total solid content of the photocurable composition. The sensitizer may be used alone or in combination of two or more types.

[0308] <Co-sensitizer> In addition to the sensitizers described above, using an amine compound as a co-sensitizer is also preferable in that it promotes the photodegradation of the initiator of the present invention and increases its sensitivity. The reason is not entirely clear, but it is thought that the abstraction of the α-hydrogen of the amine can regenerate polymerization-active carbon radicals from polymerization-inactive peroxide radicals generated in an oxygen atmosphere, and that electron injection into the initiator of the present invention occurs through one-electron transfer from the amine, making it easier for the NO bond of the oxime to be photocleaved from the radical anionized initiator. Examples include bis(hydroxyethyl)phenylamine and N-phenylmorpholine. Such amine compounds can preferably be those described in paragraph 0089 of Japanese Patent Application Publication No. 2024-25724. Furthermore, the amine compound is preferably a tertiary amine, and more preferably at least one of the substituents of the tertiary amine is an aromatic group. In particular, those with the following structure are preferably used.

[0309] The molecular weight of the amine compound is preferably 100 to 1000. The upper limit is preferably 800 or less, and more preferably 500 or less. The lower limit is preferably 150 or more, and more preferably 200 or more.

[0310] The amine compound is preferably a compound having 1 to 8 amino groups in one molecule, more preferably a compound having 1 to 4 amino groups, and even more preferably a compound having 1 to 2 amino groups.

[0311] The amine compound is preferably colorless. That is, the molar extinction coefficient of the amine compound at wavelengths of 400-700 nm is 200 L·mol. -1 ·cm -1 Preferably less than 100 L·mol -1 ·cm -1 It is more preferable that it be less than [a certain value].

[0312] The amine compound may be a primary, secondary, or tertiary amine, but a tertiary amine is preferred.

[0313] In amine compounds, the three groups connected to the nitrogen atom are preferably selected from hydrogen atoms, alkyl groups, or aryl groups. Among these, the combination of alkyl groups and aromatic hydrocarbon groups is most preferred.

[0314] For the purpose of improving alkali developability and reducing residue, amine compounds preferably have one of the following groups: a carboxyl group, a sulfonic acid group, a phosphate group, or a hydroxyl group.

[0315] The amine compound is preferably a compound represented by formula (B-1). [ka] In formula (B-1), R a and R b Each of these independently represents a monovalent organic group having 1 to 10 carbon atoms, which may contain heteroatoms, and R c represents a monovalent organic group that may contain a heteroatom, and m represents an integer from 0 to 5.

[0316] R a , R b and R c The organic group represented by is an alkyl group and an aryl group, with alkyl groups being preferred. The alkyl group and aryl group may have substituents. Examples of substituents are carboxyl groups, sulfonic acid groups, phosphate groups, and hydroxyl groups, with hydroxyl groups being preferred. m represents an integer between 0 and 5, preferably between 0 and 3, more preferably 0 or 1, and even more preferably 0.

[0317] <Chain movement agent> The photocurable composition of the present invention may contain a chain transfer agent. A chain transfer agent is defined, for example, on pages 683-684 of the Polymer Dictionary, Third Edition (edited by the Society of Polymer Science, Japan, 2005). Examples of chain transfer agents include compounds having -SS-, -SO2-S-, -NO-, SH, PH, SiH, and GeH in their molecules, as well as dithiobenzoates, trithiocarbonates, dithiocarbamates, and xanthanthate compounds having a thiocarbonylthio group used in RAFT (Reversible Addition Fragmentation Chain Transfer) polymerization. These can generate radicals by donating hydrogen to low-activity radicals, or by being oxidized and then deprotonated. Thiol compounds are particularly preferred.

[0318] Furthermore, the chain transfer agent may be a compound described in paragraphs 0152-0153 of International Publication No. 2015 / 199219, which is incorporated herein by reference.

[0319] If the photocurable composition contains a chain transfer agent, the content of the chain transfer agent is preferably 0.01 to 20 parts by mass, more preferably 0.1 to 10 parts by mass, and even more preferably 0.5 to 5 parts by mass, per 100 parts by mass of the total solids content of the photocurable composition. There may be only one type of chain transfer agent or two or more types. If there are two or more types of chain transfer agents, it is preferable that their total content is within the above range.

[0320] <Polymerizable compound> The photocurable composition of the present invention preferably contains a polymerizable compound. Polymerizable compounds include radical crosslinking agents or other crosslinking agents.

[0321] [Radical Crosslinking Agent] The photocurable composition of the present invention preferably contains a radical crosslinking agent. A radical crosslinking agent is a compound having a radical polymerizable group. Preferably, the radical polymerizable group is one containing an ethylenically unsaturated bond. Examples of such groups containing an ethylenically unsaturated bond include vinyl, allyl, vinylphenyl, (meth)acryloyl, maleimide, and (meth)acrylamide groups. Among these, the (meth)acryloyl group, (meth)acrylamide group, and vinylphenyl group are preferred, and from the viewpoint of reactivity, the (meth)acryloyl group is more preferred.

[0322] The radical crosslinking agent is preferably a compound having one or more ethylenically unsaturated bonds, but more preferably a compound having two or more. The radical crosslinking agent may also have three or more ethylenically unsaturated bonds. As for the compounds having two or more ethylenically unsaturated bonds, compounds having 2 to 15 ethylenically unsaturated bonds are preferred, compounds having 2 to 10 ethylenically unsaturated bonds are more preferred, and compounds having 2 to 6 ethylenically unsaturated bonds are even more preferred. From the viewpoint of the film strength of the resulting pattern (cured product), it is also preferable that the photocurable composition of the present invention includes a compound having two ethylenically unsaturated bonds and a compound having three or more of the above-mentioned ethylenically unsaturated bonds.

[0323] The molecular weight of the radical crosslinking agent is preferably 2,000 or less, more preferably 1,500 or less, and even more preferably 900 or less. The lower limit of the molecular weight of the radical crosslinking agent is preferably 100 or more.

[0324] Specific examples of radical crosslinking agents include unsaturated carboxylic acids (e.g., acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and their esters and amides, preferably esters of unsaturated carboxylic acids with polyhydric alcohol compounds, and amides of unsaturated carboxylic acids with polyhydric amine compounds. Addition reaction products of unsaturated carboxylic acid esters or amides having nucleophilic substituents such as hydroxyl groups, amino groups, or sulfanyl groups with monofunctional or polyfunctional isocyanates or epoxys, and dehydration condensation reaction products with monofunctional or polyfunctional carboxylic acids are also suitably used. Addition reaction products of unsaturated carboxylic acid esters or amides having electrophilic substituents such as isocyanate groups or epoxy groups with monofunctional or polyfunctional alcohols, amines, or thiols, and substitution reaction products of unsaturated carboxylic acid esters or amides having leaving substituents such as halogeno groups or tosyloxy groups with monofunctional or polyfunctional alcohols, amines, or thiols are also suitable. As another example, it is also possible to use a group of compounds in which the above-mentioned unsaturated carboxylic acids are replaced with unsaturated phosphonic acids, vinylbenzene derivatives such as styrene, vinyl ethers, allyl ethers, etc. For specific examples, refer to paragraphs 0113 to 0122 of Japanese Patent Application Publication No. 2016-027357, the contents of which are incorporated herein by reference.

[0325] The radical crosslinking agent should also be a compound with a boiling point of 100°C or higher under normal pressure. Examples of compounds with a boiling point of 100°C or higher under normal pressure include the compounds described in paragraph 0203 of International Publication No. 2021 / 112189. This information is incorporated herein by reference.

[0326] Other preferred radical crosslinking agents include the radical polymerizable compounds described in paragraphs 0204-0208 of International Publication No. 2021 / 112189. This information is incorporated herein by reference.

[0327] Preferred radical crosslinking agents include dipentaerythritol triacrylate (commercially available as KAYARAD D-330 (manufactured by Nippon Kayaku Co., Ltd.)), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320 (manufactured by Nippon Kayaku Co., Ltd.) and A-TMMT (manufactured by Shin Nakamura Chemical Industry Co., Ltd.)), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310 (manufactured by Nippon Kayaku Co., Ltd.)), dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) and A-DPH (manufactured by Shin Nakamura Chemical Industry Co., Ltd.)), and structures in which the (meth)acryloyl groups of these are linked via ethylene glycol residues or propylene glycol residues. These oligomer types can also be used.

[0328] Commercially available radical crosslinking agents include, for example, SR-494, a tetrafunctional acrylate with four ethylene oxy chains; SR-209, 231, and 239, bifunctional methacrylates with four ethylene oxy chains (all manufactured by Sartomer Co., Ltd.); DPCA-60, a hexafunctional acrylate with six pentylene oxy chains; and TPA-330, a trifunctional acrylate with three isobutylene oxy chains (both manufactured by Nippon Kayaku Co., Ltd.); and urethane oligomers. Examples include UAS-10, UAB-140 (both manufactured by Nippon Paper Industries), NK Ester M-40G, NK Ester 4G, NK Ester M-9300, NK Ester A-9300, UA-7200 (all manufactured by Shin Nakamura Chemical Industry Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (all manufactured by Kyoeisha Chemical Co., Ltd.), and Bremmer PME400 (manufactured by NOF Corporation).

[0329] Suitable radical crosslinking agents include urethane acrylates as described in Japanese Patent Publication No. 48-041708, Japanese Unexamined Patent Publication No. 51-037193, Japanese Unexamined Patent Publication No. 02-032293, and Japanese Unexamined Patent Publication No. 02-016765, as well as urethane compounds having an ethylene oxide-based skeleton as described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418. Compounds having an amino or sulfide structure within the molecule, as described in Japanese Unexamined Patent Publication No. 63-277653, Japanese Unexamined Patent Publication No. 63-260909, and Japanese Unexamined Patent Publication No. 01-105238, can also be used as radical crosslinking agents.

[0330] The radical crosslinking agent may be a radical crosslinking agent having an acidic group such as a carboxyl group or a phosphate group. The radical crosslinking agent having an acidic group is preferably an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and more preferably a radical crosslinking agent obtained by reacting the unreacted hydroxyl group of the aliphatic polyhydroxy compound with a non-aromatic carboxylic acid anhydride to give it an acidic group. Particularly preferred is a radical crosslinking agent obtained by reacting the unreacted hydroxyl group of an aliphatic polyhydroxy compound with a non-aromatic carboxylic acid anhydride to give it an acidic group, wherein the aliphatic polyhydroxy compound is pentaerythritol or dipentaerythritol. Examples of commercially available products include M-510 and M-520, which are polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.

[0331] The acid value of the radical crosslinking agent having an acid group is preferably 0.1 to 300 mg KOH / g, and more preferably 1 to 100 mg KOH / g. When the acid value of the radical crosslinking agent is within the above range, it exhibits excellent handling properties during manufacturing and excellent developability. It also exhibits good polymerization properties. The above acid value is measured in accordance with the description in JIS K 0070:1992.

[0332] As a radical crosslinking agent, a radical crosslinking agent having at least one selected from the group consisting of urea bonds and urethane bonds (hereinafter also referred to as "crosslinking agent U") is also preferred. The inclusion of a crosslinking agent U in the photocurable composition may improve chemical resistance, resolution, and other properties. Examples of crosslinking agent U include the compounds described in paragraphs 0133-0143 of International Publication No. 2023 / 190064. This content is incorporated herein by reference.

[0333] From the viewpoint of pattern resolution and film stretchability, it is preferable to use a bifunctional methacrylate or acrylate as the photocurable composition. Specific compounds include triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, tetraethylene glycol diacrylate, PEG (polyethylene glycol) 200 diacrylate, PEG 200 dimethacrylate, PEG 600 diacrylate, PEG 600 dimethacrylate, polytetraethylene glycol diacrylate, polytetraethylene glycol dimethacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, 3-methyl-1,5-pentanediol diacrylate, and 1,6-methyl-1,5-pentanediol diacrylate. Xanediol diacrylate, 1,6-hexanediol dimethacrylate, dimethylol-tricyclodecane diacrylate, dimethylol-tricyclodecane dimethacrylate, ethylene oxide (EO) adduct diacrylate of bisphenol A, ethylene oxide (EO) adduct dimethacrylate of bisphenol A, propylene oxide (PO) adduct diacrylate of bisphenol A, PO adduct dimethacrylate of bisphenol A, 2-hydroxy-3-acryloyloxypropyl methacrylate, isocyanuric acid EO-modified diacrylate, isocyanuric acid EO-modified dimethacrylate, and other bifunctional acrylates and bifunctional methacrylates having urethane bonds can be used. Two or more of these can be mixed and used as needed. For example, PEG200 diacrylate refers to polyethylene glycol diacrylate in which the molecular weight of the polyethylene glycol chain is approximately 200. From the viewpoint of suppressing warping of the pattern (cured product), monofunctional radical crosslinking agents are preferably used as the radical crosslinking agents in the photocurable composition of the present invention. Preferred monofunctional radical crosslinking agents include (meth)acrylic acid derivatives such as n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, butoxyethyl (meth)acrylate, carbitol (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, phenoxyethyl (meth)acrylate, N-methylol (meth)acrylamide, glycidyl (meth)acrylate, polyethylene glycol mono(meth)acrylate, and polypropylene glycol mono(meth)acrylate, as well as N-vinyl compounds such as N-vinylpyrrolidone and N-vinylcaprolactam, and allyl glycidyl ether. As monofunctional radical crosslinking agents, compounds with a boiling point of 100°C or higher under normal pressure are also preferred in order to suppress volatilization before exposure. Other examples of bifunctional or more radical crosslinking agents include allyl compounds such as diallyl phthalate and triallyl trimellitate.

[0334] If a radical crosslinking agent is included, the content of the radical crosslinking agent is preferably greater than 0% by mass and 60% by mass or less, relative to the total solids content of the photocurable composition. The lower limit is more preferably 5% by mass or more. The upper limit is more preferably 50% by mass or less, and even more preferably 30% by mass or less.

[0335] A single radical crosslinking agent may be used alone, or two or more may be used in combination. When two or more are used in combination, it is preferable that their total amount be within the above range.

[0336] [Other crosslinking agents] The photocurable composition of the present invention may also preferably contain other crosslinking agents different from the radical crosslinking agents described above. Other crosslinking agents refer to crosslinking agents other than the radical crosslinking agents described above, and are preferably compounds having multiple groups in their molecule that promote the formation of covalent bonds with other compounds in the composition or their reaction products upon exposure to the photoacid generator or photobase generator described above, and are preferably compounds having multiple groups in their molecule that promote the formation of covalent bonds with other compounds in the composition or their reaction products through the action of an acid or a base. The above-mentioned acid or base is preferably an acid or base generated from a photoacid generator or photobase generator during the exposure process. Other crosslinking agents include the compounds described in paragraphs 0179-0207 of International Publication No. 2022 / 145355. The foregoing description is incorporated herein by reference.

[0337] The content of other crosslinking agents is preferably 0.1 to 30% by mass, more preferably 0.1 to 20% by mass, even more preferably 0.5 to 15% by mass, and particularly preferably 1.0 to 10% by mass, based on the total solid content of the photocurable composition. The other crosslinking agents may be present as one type or as two or more types. If two or more other crosslinking agents are present, it is preferable that their total content is within the above range.

[0338] <Base Generator> The photocurable composition of the present invention may contain a base generator. Here, a base generator is a compound that can generate a base by physical or chemical action. Preferred base generators include thermal base generators and photobase generators. By containing a thermal base generator in the photocurable composition, the cyclization reaction of the precursor can be accelerated, for example by heating, resulting in a cured product with good mechanical properties and chemical resistance, and thus good performance as an interlayer insulating film for redistribution layers included in semiconductor packages. The base generator can be either an ionic or nonionic base generator. Examples of bases generated from the base generator include secondary amines and tertiary amines. The base-generating agent is not particularly limited, and known base-generating agents can be used. Examples of known base-generating agents include carbamoyloxime compounds, carbamoylhydroxylamine compounds, carbamic acid compounds, formamide compounds, acetamide compounds, carbamate compounds, benzylcarbamate compounds, nitrobenzylcarbamate compounds, sulfonamide compounds, imidazole derivative compounds, amineimide compounds, pyridine derivative compounds, α-aminoacetophenone derivative compounds, quaternary ammonium salt derivative compounds, iminium salts, pyridinium salts, α-lactone ring derivative compounds, amineimide compounds, phthalimide derivative compounds, acyloxyimino compounds, borate guanidine compounds, guanidide carboxylate compounds, and the like. Specific examples of nonionic base generators include the compounds described in paragraphs 0249-0275 of International Publication No. 2022 / 145355. The above description is incorporated herein by reference.

[0339] The molecular weight of the nonionic base generator is preferably 800 or less, more preferably 600 or less, and even more preferably 500 or less. The lower limit is preferably 100 or more, more preferably 200 or more, and even more preferably 300 or more.

[0340] Specific preferred compounds for ionic base generators include, for example, the compounds described in paragraphs 0148-0163 of International Publication No. 2018 / 038002.

[0341] Specific examples of ammonium salts include, but are not limited to, International Publication No. 2022 / 064933. Specific examples of iminium salts include, but are not limited to, International Publication No. 2022 / 064933.

[0342] Furthermore, as a base-generating agent, it is preferable that the amino group is protected by a t-butoxycarbonyl group, from the viewpoint of storage stability and base generation by deprotection during curing.

[0343] Examples of amine compounds protected by a t-butoxycarbonyl group include ethanolamine, 3-amino-1-propanol, 1-amino-2-propanol, 2-amino-1-propanol, 4-amino-1-butanol, 2-amino-1-butanol, 1-amino-2-butanol, 3-amino-2,2-dimethyl-1-propanol, 4-amino-2-methyl-1-butanol, valinol, 3-amino-1,2-propanediol, and 2-amino-1,3-propanediol. Alcohol, tyramine, norephedrine, 2-amino-1-phenyl-1,3-propanediol, 2-aminocyclohexanol, 4-aminocyclohexanol, 4-aminocyclohexaneethanol, 4-(2-aminoethyl)cyclohexanol, N-methylethanolamine, 3-(methylamino)-1-propanol, 3-(isopropylamino)propanol, N-cyclohexylethanolamine, α-[2-(methylamino)ethyl]benzyl alcohol, diethanol Luamine, diisopropanolamine, 3-pyrrolidinel, 2-pyrrolidinemethanol, 4-hydroxypiperidine, 3-hydroxypiperidine, 4-hydroxy-4-phenylpiperidine, 4-(3-hydroxyphenyl)piperidine, 4-piperidinemethanol, 3-piperidinemethanol, 2-piperidinemethanol, 4-piperidineethanol, 2-piperidineethanol, 2-(4-piperidyl)-2-propanol, 1,4-butanol bis(3-aminopropyl) Examples include, but are not limited to, ethers, 1,2-bis(2-aminoethoxy)ethane, 2,2'-oxybis(ethylamine), 1,14-diamino-3,6,9,12-tetraoxatetradecane, 1-aza-15-crown 5-ether, diethylene glycol bis(3-aminopropyl) ether, 1,11-diamino-3,6,9-trioxaundecane, or compounds in which the amino group of an amino acid or its derivative is protected by a t-butoxycarbonyl group.

[0344] As a photobase generator, commercially available products such as the WPBG series (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) can be used, and for example, WPBG-300, WPBG-345, WPBG-266, WPBG-018, WPBG-027, WPBG-140, and WPBG-165 can be suitably used.

[0345] <Solvent> The photocurable composition of the present invention preferably contains a solvent. Any known solvent can be used as the solvent. Organic solvents are preferred. Examples of organic solvents include compounds such as esters, ethers, ketones, cyclic hydrocarbons, sulfoxides, amides, ureas, and alcohols.

[0346] Examples of esters include ethyl acetate, n-butyl acetate, isobutyl acetate, hexyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, γ-butyrolactone, ε-caprolactone, δ-valerolactone, γ-valerolactone, alkyloxyacetates (e.g., methyl alkyloxyacetate, ethyl alkyloxyacetate, butyl alkyloxyacetate (e.g., methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.)), alkyl esters of 3-alkyloxypropionates (e.g., methyl 3-alkyloxypropionate, ethyl 3-alkyloxypropionate, etc. (e.g., methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.)), 2-A Suitable examples include alkyl esters of alkyloxypropionates (e.g., methyl 2-alkyloxypropionate, ethyl 2-alkyloxypropionate, propyl 2-alkyloxypropionate, etc. (e.g., methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-alkyloxy-2-methylpropionate and ethyl 2-alkyloxy-2-methylpropionate (e.g., methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, ethyl hexanoate, ethyl heptanoate, dimethyl malonate, diethyl malonate, etc.).

[0347] Suitable ethers include, for example, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol butyl methyl ether, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, diethylene glycol ethyl methyl ether, propylene glycol monopropyl ether acetate, and dipropylene glycol dimethyl ether.

[0348] Suitable ketones include, for example, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3-heptanone, 3-methylcyclohexanone, levoglucocenone, and dihydrolevoglucocenone.

[0349] Suitable cyclic hydrocarbons include, for example, aromatic hydrocarbons such as toluene, xylene, and anisole, and cyclic terpenes such as limonene.

[0350] As an example of a sulfoxide, dimethyl sulfoxide is a suitable choice.

[0351] Suitable amides include N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-cyclohexyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, N,N-dimethylisobutylamide, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, N-formylmorpholine, and N-acetylmorpholine.

[0352] Suitable ureas include N,N,N',N'-tetramethylurea and 1,3-dimethyl-2-imidazolidinone.

[0353] Examples of alcohols include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-pentanol, 1-hexanol, benzyl alcohol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, 2-ethoxyethanol, diethylene glycol monoethyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether, polyethylene glycol monomethyl ether, polypropylene glycol, tetraethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monobenzyl ether, ethylene glycol monophenyl ether, methylphenylcarbinol, n-amyl alcohol, methylamyl alcohol, and diacetone alcohol.

[0354] From the viewpoint of improving the properties of the coated surface, it is also preferable to use a mixture of two or more solvents.

[0355] In the present invention, one solvent selected from methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclopentanone, γ-butyrolactone, γ-valerolactone, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, toluene, dimethyl sulfoxide, ethyl carbitol acetate, butyl carbitol acetate, N-methyl-2-pyrrolidone, propylene glycol methyl ether, and propylene glycol methyl ether acetate, levoglucocenone, and dihydrolevoglucocenone, or a mixed solvent composed of two or more of these, is preferred. The combination of dimethyl sulfoxide and γ-butyrolactone, the combination of dimethyl sulfoxide and γ-valerolactone, the combination of 3-methoxy-N,N-dimethylpropanamide and γ-butyrolactone, the combination of 3-methoxy-N,N-dimethylpropanamide, γ-butyrolactone and dimethyl sulfoxide, or the combination of N-methyl-2-pyrrolidone and ethyl lactate is particularly preferred. Another preferred embodiment of the present invention is the addition of toluene to these combined solvents in an amount of about 1 to 10% by mass relative to the total mass of the solvent. In particular, from the viewpoint of storage stability of the photocurable composition, an embodiment containing γ-valerolactone as a solvent is also one of the preferred embodiments of the present invention. In such an embodiment, the content of γ-valerolactone relative to the total mass of the solvent is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably 70% by mass or more. Furthermore, the upper limit of the above content is not particularly limited and may be 100% by mass. The above content may be determined by considering the solubility of components such as resins contained in the photocurable composition. Furthermore, when dimethyl sulfoxide and γ-valerolactone are used in combination, it is preferable to contain 60-90% by mass of γ-valerolactone and 10-40% by mass of dimethyl sulfoxide relative to the total mass of the solvent, more preferably 70-90% by mass of γ-valerolactone and 10-30% by mass of dimethyl sulfoxide, and even more preferably 75-85% by mass of γ-valerolactone and 15-25% by mass of dimethyl sulfoxide.

[0356] From the viewpoint of coatability, the solvent content is preferably such that the total solid content concentration of the photocurable composition of the present invention is 5 to 80% by mass, more preferably 5 to 75% by mass, even more preferably 10 to 70% by mass, and even more preferably 20 to 70% by mass. The solvent content can be adjusted according to the desired thickness of the coating film and the application method. If two or more solvents are included, it is preferable that their total is within the above range.

[0357] <Metal Adhesion Improver> The photocurable composition of the present invention preferably contains a metal adhesion modifier from the viewpoint of improving adhesion to metal materials used in electrodes, wiring, etc. Examples of metal adhesion modifiers include silane coupling agents having an alkoxysilyl group, aluminum-based adhesion aids, titanium-based adhesion aids, compounds having a sulfonamide structure and compounds having a thiourea structure, phosphoric acid derivative compounds, β-ketoester compounds, amino compounds, and the like.

[0358] [Silane coupling agent] Examples of silane coupling agents include the compounds described in paragraph 0316 of International Publication No. 2021 / 112189 and the compounds described in paragraphs 0067 to 0078 of Japanese Patent Publication No. 2018-173573, the contents of which are incorporated herein by reference. It is also preferable to use two or more different silane coupling agents, as described in paragraphs 0050 to 0058 of Japanese Patent Publication No. 2011-128358. The following compounds are also preferable as silane coupling agents. In the following formulas, Me represents a methyl group and Et represents an ethyl group. R below represents a structure derived from the blocking agent in the blocked isocyanate group. The blocking agent can be selected according to the elimination temperature, but examples include alcohol compounds, phenol compounds, pyrazole compounds, triazole compounds, lactam compounds, and active methylene compounds. For example, from the viewpoint of wanting to set the elimination temperature to 160 to 180°C, caprolactam is preferred. Examples of commercially available compounds of this type include X-12-1293 (manufactured by Shin-Etsu Chemical Co., Ltd.).

[0359] [ka]

[0360] Other silane coupling agents include, for example, vinyltrimethoxysilane, vinyltriethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, N-2- Examples include (aminoethyl)-3-aminopropylmethyldimethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N-(1,3-dimethylbutylidene)propylamine, N-phenyl-3-aminopropyltrimethoxysilane, tris-(trimethoxysilylpropyl)isocyanurate, 3-ureidopropyltrialkoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-isocyanatetopropyltriethoxysilane, and 3-trimethoxysilylpropyl succinic anhydride. These can be used individually or in combination of two or more. Furthermore, oligomeric compounds having multiple alkoxysilyl groups can also be used as silane coupling agents.

[0361] [Aluminum-based adhesive aid] Examples of aluminum-based adhesives include aluminum tris(ethyl acetate), aluminum tris(acetylacetonate), and ethyl acetate aluminum diisopropylate.

[0362] Other metal adhesion modifiers that can be used include the compounds described in paragraphs 0046 to 0049 of Japanese Patent Publication No. 2014-186186 and the sulfide compounds described in paragraphs 0032 to 0043 of Japanese Patent Publication No. 2013-072935, the details of which are incorporated herein by reference.

[0363] The content of the metal adhesion improver is preferably 0.01 to 30 parts by mass, more preferably 0.1 to 10 parts by mass, and even more preferably 0.5 to 5 parts by mass, per 100 parts by mass of resin. A value above the lower limit ensures good adhesion between the pattern and the metal layer, while a value below the upper limit ensures good heat resistance and mechanical properties of the pattern. Only one type of metal adhesion improver may be used, or two or more types may be used. If two or more types are used, it is preferable that their total content is within the above range.

[0364] <Light absorber> The photocurable composition of the present invention may also preferably contain a compound (light absorber) whose absorbance at the exposure wavelength decreases upon exposure. Examples of light absorbers include compounds described in paragraphs 0159-0183 of International Publication No. 2022 / 202647 and compounds described in paragraphs 0088-0108 of Japanese Patent Publication No. 2019-206689. These contents are incorporated herein by reference.

[0365] The content of the light absorber relative to the total solid content of the photocurable composition of the present invention is not particularly limited, but is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass, and even more preferably 1 to 5% by mass.

[0366] <Migration inhibitor> The photocurable composition of the present invention preferably further comprises a migration inhibitor. By including a migration inhibitor, for example, when the photocurable composition is applied to a metal layer (or metal wiring) to form a film, the migration of metal ions originating from the metal layer (or metal wiring) into the film can be effectively suppressed.

[0367] While there are no particular limitations on the migration inhibitors, examples include compounds having heterocyclic rings (pyrrole ring, furan ring, thiophene ring, imidazole ring, oxazole ring, thiazole ring, pyrazole ring, isoxazole ring, isothiazole ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, piperidine ring, piperazine ring, morpholine ring, 2H-pyran ring, and 6H-pyran ring, triazine ring), thioureas and compounds having sulfanyl groups, hindered phenol compounds, salicylic acid derivative compounds, and hydrazide derivative compounds. In particular, triazole compounds such as 1,2,4-triazole, benzotriazole, 3-amino-1,2,4-triazole, and 3,5-diamino-1,2,4-triazole, and tetrazole compounds such as 1H-tetrazole, 5-phenyltetrazole, and 5-amino-1H-tetrazole can be preferably used.

[0368] As migration inhibitors, ion trapping agents that capture anions such as halogen ions can also be used.

[0369] Other migration inhibitors that can be used include the rust inhibitor described in paragraph 0094 of Japanese Patent Publication No. 2013-015701, the compounds described in paragraphs 0073 to 0076 of Japanese Patent Publication No. 2009-283711, the compounds described in paragraph 0052 of Japanese Patent Publication No. 2011-059656, the compounds described in paragraphs 0114, 0116 and 0118 of Japanese Patent Publication No. 2012-194520, and the compounds described in paragraph 0166 of International Publication No. 2015 / 199219, the contents of which are incorporated herein by reference.

[0370] Specific examples of migration inhibitors include the following compounds.

[0371] [ka]

[0372] If the photocurable composition of the present invention contains a migration inhibitor, the content of the migration inhibitor is preferably 0.01 to 5.0% by mass, more preferably 0.05 to 2.0% by mass, and even more preferably 0.1 to 1.0% by mass, based on the total solid content of the photocurable composition.

[0373] There may be only one type of migration inhibitor, or there may be two or more types. If there are two or more types of migration inhibitors, it is preferable that their total number is within the above range.

[0374] <Organo-titanium compounds> By including an organotitanium compound in the photocurable composition, a resin layer with excellent chemical resistance can be formed even when cured at low temperatures.

[0375] Examples of usable organotitanium compounds include those in which an organic group is bonded to a titanium atom via covalent or ionic bonds. Specific examples of organotitanium compounds are shown in I) to VII) below: I) Titanium chelate compounds: Titanium chelate compounds having two or more alkoxy groups are more preferred because they provide good storage stability for the photocurable composition and yield a good curing pattern. Specific examples include titanium bis(triethanolamine)diisopropoxide, titanium di(n-butoxide)bis(2,4-pentanedione), titanium diisopropoxidebis(2,4-pentanedione), titanium diisopropoxidebis(tetramethylheptanedione), and titanium diisopropoxidebis(ethylacetoacetate). II) Tetraalkoxy titanium compounds: For example, titanium tetra(n-butoxide), titanium tetraethoxide, titanium tetra(2-ethylhexoxide), titanium tetraisobutoxide, titanium tetraisopropoxide, titanium tetramethoxide, titanium tetramethoxypropoxide, titanium tetramethylphenoxide, titanium tetra(n-nonyloxide), titanium tetra(n-propoxide), titanium tetrastearaloxide, titanium tetrakis[bis{2,2-(alyloxymethyl)butoxide}], etc. III) Titanocene compounds: For example, pentamethylcyclopentadienyltitanium trimethoxide, bis(η5-2,4-cyclopentadien-1-yl)bis(2,6-difluorophenyl)titanium, bis(η5-2,4-cyclopentadien-1-yl)bis(2,6-difluoro-3-(1H-pyrrole-1-yl)phenyl)titanium, etc. IV) Monoalkoxy titanium compounds: For example, titanium tris(dioctyl phosphate) isopropoxide, titanium tris(dodecylbenzenesulfonate) isopropoxide, etc. V) Titanium oxide compounds: For example, titanium oxide bis(pentanedione), titanium oxide bis(tetramethylheptanedione), phthalocyanine titanium oxide, etc. VI) Titanium tetraacetylacetonate compounds: For example, titanium tetraacetylacetonate. VII) Titanate coupling agents: For example, isopropyltridodecylbenzenesulfonyl titanate.

[0376] In particular, from the viewpoint of better chemical resistance, the organotitanium compound is preferably at least one compound selected from the group consisting of I) titanium chelate compounds, II) tetraalkoxy titanium compounds, and III) titanocene compounds. Titanium diisopropoxide bis(ethyl acetoacetate), titanium tetra(n-butoxide), and bis(η5-2,4-cyclopentadien-1-yl)bis(2,6-difluoro-3-(1H-pyrrole-1-yl)phenyl)titanium are preferred.

[0377] Furthermore, it is preferable to include a titanium complex compound as an organotitanium compound, or in place of an organotitanium compound, and examples of titanium complex compounds include the compound represented by the following formula (T-1). [ka] In equation (T-1), M is titanium, zirconium, or hafnium, l1 is an integer between 0 and 2, l2 is 0 or 1, l1 + l2 × 2 is an integer between 0 and 2, m is an integer between 0 and 4, n is an integer between 0 and 2, l1 + l2 + m + n × 2 = 4, R 11 Each of these is independently a substituted or unsubstituted cyclopentadienyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted phenoxy group, and R 12 R is a substituted or unsubstituted hydrocarbon group, 2 Each of these is an independent group containing a structure represented by the following formula (T-2), and R 3 Each of these is an independent group containing a structure represented by the following formula (T-2), and X A Each of these is independently either an oxygen atom or a sulfur atom. [ka] In formula (T-2), X 1 ~X 3 Each of these independently represents -C(-*)= or -N=, where * represents a bonding site with another structure, and # represents a bonding site with a metal atom.

[0378] In formula (T-1), M is preferably titanium from the viewpoint of storage stability of the composition. In equation (T-1), the embodiment in which l1 and l2 are 0 is also one of the preferred embodiments of the present invention. In formula (T-1), m is preferably 2 or 4, and more preferably 2. In formula (T-1), n ​​is preferably 1 or 2, and more preferably 1. Here, it is also preferable that in equation (T-1), l1 and l2 are 0, and m is 0, 2, or 4.

[0379] In formula (T-1), from the viewpoint of the stability of the specific metal complex, R 11 A substituted or unsubstituted cyclopentadienyl ligand is preferred. Also, R 11 The cyclopentadienyl group, alkoxy group, and phenoxy group in the compound may be substituted, but an unsubstituted configuration is also a preferred embodiment of the present invention.

[0380] In formula (T-1), R 12 It is preferably a hydrocarbon group having 1 to 20 carbon atoms, and more preferably a hydrocarbon group having 2 to 10 carbon atoms. R 12 The hydrocarbon group in this compound may be either an aliphatic hydrocarbon group or an aromatic hydrocarbon group, but an aromatic hydrocarbon group is preferred. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group, but a saturated aliphatic hydrocarbon group is preferred. As for the aromatic hydrocarbon group, an aromatic hydrocarbon group having 6 to 20 carbon atoms is preferred, an aromatic hydrocarbon group having 6 to 10 carbon atoms is more preferred, and a phenylene group is even more preferred. R 12 The substituents in are preferably monovalent substituents, such as halogen atoms. 12 If the group is an aromatic hydrocarbon group, it may have an alkyl group as a substituent. Among these, in equation (T-1), R 12 It is preferable that R is an unsubstituted phenylene group. 12 The phenylene group in this is preferably a 1,2-phenylene group.

[0381] In equation (T-1), m is 2 or greater, and R 2 If there are 2 or more of them, then 2 or more of those R 2 The structures of each may be the same or different. In equation (T-1), n ​​is 2 or greater, and R 3 If there are 2 or more of them, then 2 or more of those R 3 The structures of each may be the same or different.

[0382] In formula (T-2), X 1 ~X 3 Each of these independently represents -C(-*)= or -N=, preferably at least one represents -C(-*)=, and more preferably at least two represent -C(-*)=.

[0383] Specific examples of compounds represented by formula (T-1) include, but are not limited to, the following compounds. [ka]

[0384] When an organotitanium compound is included, its content is preferably 0.05 to 10 parts by mass, and more preferably 0.1 to 5 parts by mass, per 100 parts by mass of resin. When the content is 0.05 parts by mass or more, the heat resistance and chemical resistance of the resulting cured pattern are better, and when it is 10 parts by mass or less, the storage stability of the composition is better.

[0385] When an organotitanium compound is included, its content is preferably 0.05 to 10 parts by mass, and more preferably 0.1 to 2 parts by mass, per 100 parts by mass of resin. When the content is 0.05 parts by mass or more, the heat resistance and chemical resistance of the resulting cured pattern are better, and when it is 10 parts by mass or less, the storage stability of the composition is better.

[0386] <Antioxidant> The cured product of the present invention may contain an antioxidant. In the present invention, an antioxidant refers to a compound that has the function of preventing the oxidation of metals, and examples include phenol compounds, phosphite ester compounds, and thioether compounds. As the phenol compound, any phenol compound known as a phenolic antioxidant can be used. A preferred phenol compound is a hindered phenol compound. Compounds having a substituent at the ortho position adjacent to the phenolic hydroxyl group are preferred. As the substituent, substituted or unsubstituted alkyl groups having 1 to 22 carbon atoms are preferred. Furthermore, the antioxidant is also a compound having both a phenol group and a phosphite ester group in the same molecule. Since the oxidation of the metal is prevented by the antioxidant, the cured product containing the antioxidant is thought to have excellent adhesion. Furthermore, because antioxidants suppress the polymerization of polymerizable compounds during storage of the photocurable composition, photocurable compositions containing antioxidants are considered to have excellent storage stability and resolution of the resulting cured product.

[0387] The antioxidant content is preferably 0.1 to 10 parts by mass, and more preferably 0.5 to 5 parts by mass, per 100 parts by mass of resin. Adding 0.1 parts by mass or more makes it easier to obtain improved elongation properties and adhesion to metal materials even in high-temperature and high-humidity environments. Adding 10 parts by mass or less improves the sensitivity of the photocurable composition, for example, through interaction with the photosensitive agent. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, it is preferable that their total amount falls within the above range.

[0388] <Polymerization inhibitors> The photocurable composition of the present invention preferably contains a polymerization inhibitor. Examples of polymerization inhibitors include phenolic compounds, quinone compounds, amino compounds, N-oxyl free radical compounds, nitro compounds, nitroso compounds, heteroaromatic ring compounds, and metal compounds.

[0389] Specific polymerization inhibitor compounds include those described in paragraph 0310 of International Publication No. 2021 / 112189, p-hydroquinone, o-hydroquinone, 4-hydroxy-2,2,6,6-tetramethylpiperidine 1-oxyl free radical, phenoxazine, 1,4,4-trimethyl-2,3-diazabicyclo[3.2.2]nona-2-ene-N,N-dioxide, and others. This information is incorporated herein by reference.

[0390] If the photocurable composition of the present invention contains a polymerization inhibitor, the content of the polymerization inhibitor is preferably 0.01 to 20% by mass, more preferably 0.02 to 15% by mass, and even more preferably 0.05 to 10% by mass, based on the total solid content of the photocurable composition.

[0391] There may be only one polymerization inhibitor or two or more. If there are two or more polymerization inhibitors, it is preferable that their total number is within the above range.

[0392] <Other additives> The photocurable composition of the present invention may optionally contain various additives, such as surfactants, higher fatty acid derivatives, inorganic particles, ultraviolet absorbers, photoacid generators, anti-aggregating agents, phenolic compounds, other polymer compounds, plasticizers, and other auxiliary agents (e.g., defoamers, flame retardants, etc.), to the extent that the effects of the present invention are obtained. By appropriately including these components, properties such as film properties can be adjusted. These components can be described, for example, in paragraphs 0183 onwards of Japanese Patent Application Publication No. 2012-003225 (paragraph 0237 of the corresponding US Patent Application Publication No. 2013 / 0034812), paragraphs 0101-0104, 0107-0109 of Japanese Patent Application Publication No. 2008-250074, and these contents are incorporated herein. When these additives are included, their total content is preferably 3% by mass or less of the solid content of the photocurable composition of the present invention.

[0393] [Surfactants] Various surfactants can be used, including fluorine-based surfactants, silicone-based surfactants, and hydrocarbon-based surfactants. The surfactant may be a nonionic surfactant, a cationic surfactant, or an anionic surfactant.

[0394] By incorporating a surfactant into the photocurable composition of the present invention, the liquid properties (especially fluidity) of the prepared coating liquid composition are further improved, and the uniformity of the coating thickness and the liquid-saving properties can be further enhanced. Specifically, when forming a film using a coating liquid containing a surfactant, the interfacial tension between the surface to be coated and the coating liquid decreases, improving wettability to the surface to be coated and improving coatability to the surface to be coated. Therefore, it is possible to more favorably form a uniform film with less thickness variation.

[0395] Examples of silicone-based surfactants, hydrocarbon-based surfactants, nonionic surfactants, cationic surfactants, and anionic surfactants include the compounds described in paragraphs 0329-0334 of International Publication No. 2021 / 112189, respectively, which are incorporated herein by reference.

[0396] One type of surfactant may be used, or two or more types may be used in combination. The surfactant content is preferably 0.001 to 2.0% by mass, and more preferably 0.005 to 1.0% by mass, relative to the total solid content of the composition. It will be included in the specifications.

[0397] <Properties of photocurable compositions> The viscosity of the photocurable composition of the present invention can be adjusted by the solid content concentration of the photocurable composition. From the viewpoint of coating film thickness, 1,000 mm 2 / s~12,000mm 2 / s is preferred, and 2,000 mm 2 / s~10,000mm 2 / s is more preferable, 2,500mm 2 / s~8,000mm 2 / s is even more preferable. Within the above range, it becomes easier to obtain a highly uniform coating film. 1,000 mm 2 If the rate is 1 / s or higher, it is easy to coat the film thickness required for, for example, as an insulating film for rewiring, and 12,000 mm 2 If the rate is less than or equal to / s, an excellent coating film can be obtained on the coated surface.

[0398] <Restrictions on substances contained in photocurable compositions> The water content of the photocurable composition of the present invention is preferably less than 2.0% by mass, more preferably less than 1.5% by mass, and even more preferably less than 1.0% by mass. If it is less than 2.0%, the storage stability of the photocurable composition is improved. Methods for maintaining moisture content include adjusting humidity during storage and reducing the porosity of the storage container.

[0399] From the viewpoint of insulating properties, the metal content of the photocurable composition of the present invention is preferably less than 5 ppm (parts per million) by mass, more preferably less than 1 ppm by mass, and even more preferably less than 0.5 ppm by mass. Examples of metals include sodium, potassium, magnesium, calcium, iron, copper, chromium, and nickel, but excludes metals included as complexes between organic compounds and metals. If multiple metals are included, it is preferable that the total amount of these metals is within the above range.

[0400] Furthermore, methods for reducing metal impurities unintentionally included in the photocurable composition of the present invention include selecting raw materials with a low metal content as the raw materials constituting the photocurable composition of the present invention, performing filter filtration on the raw materials constituting the photocurable composition of the present invention, and performing distillation under conditions in which contamination is suppressed as much as possible by lining the inside of the apparatus with polytetrafluoroethylene or the like.

[0401] When considering the application of the photocurable composition of the present invention as a semiconductor material, the halogen atom content is preferably less than 500 ppm by mass, more preferably less than 300 ppm by mass, and even more preferably less than 200 ppm by mass, from the viewpoint of preventing wiring corrosion. In particular, the amount of halogen atoms present in the form of halogen ions is preferably less than 5 ppm by mass, more preferably less than 1 ppm by mass, and even more preferably less than 0.5 ppm by mass. Examples of halogen atoms include chlorine atoms and bromine atoms. It is preferable that the total amount of chlorine atoms and bromine atoms, or the sum of chloride ions and bromine ions, is within the above ranges. Methods for adjusting the halogen atom content include ion exchange treatment.

[0402] Conventional containers can be used as containers for the photocurable composition of the present invention. To suppress the incorporation of impurities into the raw materials and the photocurable composition of the present invention, it is also preferable to use multilayer bottles with an inner wall constructed of six types of resin in six layers, or bottles with a seven-layer structure of six types of resin. Examples of such containers include the container described in Japanese Patent Application Publication No. 2015-123351.

[0403] <Cured product of a photocurable composition> By curing the photocurable composition of the present invention, a cured product of the photocurable composition can be obtained. The cured product of the present invention is a cured product obtained by curing a photocurable composition. Curing of the photocurable composition is preferably by heating, with a heating temperature of 120°C to 400°C being more preferable, 140°C to 380°C being even more preferable, and 170°C to 350°C being particularly preferable. The form of the cured product of the photocurable composition is not particularly limited and can be selected according to the application, such as in the form of a film, rod, sphere, or pellet. In the present invention, the cured product is preferably in the form of a film. By pattern processing of the photocurable composition, the shape of the cured product can also be selected according to the application, such as forming a protective film on the wall surface, forming via holes for conductivity, adjusting impedance, capacitance or internal stress, or providing heat dissipation functions. The film thickness of the cured product (film made of the cured product) is preferably 0.5 μm or more and 150 μm or less. The shrinkage rate of the photocurable composition of the present invention upon curing is preferably 50% or less, more preferably 45% or less, and even more preferably 40% or less. Here, the shrinkage rate refers to the percentage of the volume change of the photocurable composition before and after curing, and can be calculated using the following formula. Shrinkage rate [%] = 100 - (Volume after hardening ÷ Volume before hardening) × 100

[0404] <Properties of cured products of photocurable compositions> The imidization reaction rate of the cured product of the photocurable composition of the present invention is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. If it is 70% or more, the cured product may have excellent mechanical properties. The elongation at break of the cured product of the photocurable composition of the present invention is preferably 30% or more, more preferably 40% or more, and even more preferably 50% or more. The glass transition temperature (Tg) of the cured product of the photocurable composition of the present invention is preferably 180°C or higher, more preferably 210°C or higher, and even more preferably 230°C or higher.

[0405] <Preparation of photocurable compositions> The photocurable composition of the present invention can be prepared by mixing the above components. The mixing method is not particularly limited and can be carried out by conventionally known methods. Mixing methods include mixing with a stirring blade, mixing with a ball mill, and mixing by rotating a tank. The mixing temperature is preferably 10-30°C, and more preferably 15-25°C.

[0406] For the purpose of removing foreign matter such as dust and fine particles from the photocurable composition of the present invention, filtration using a filter is preferable. The filter pore size is preferably, for example, 5 μm or less, more preferably 1 μm or less, even more preferably 0.5 μm or less, and even more preferably 0.1 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon. If the filter material is polyethylene, it is more preferably HDPE (high-density polyethylene). An example of a filter is the filter described in paragraph 0287 of International Publication No. 2023 / 190064. The above contents are incorporated herein by reference.

[0407] (Method of manufacturing a cured product) The method for producing a cured product of the present invention preferably includes a film formation step in which a photocurable composition is applied to a substrate to form a film. The method for producing the cured product more preferably includes the above-mentioned film formation step, an exposure step for selectively exposing the film formed in the film formation step, and a developing step for developing the film exposed in the exposure step using a developer to form a pattern. The method for producing the cured product is particularly preferably to include the above-mentioned film formation step, exposure step, development step, and at least one of the following: a heating step for heating the pattern obtained in the development step and a post-development exposure step for exposing the pattern obtained in the development step. Furthermore, the method for producing the cured product may also preferably include the above-mentioned film formation step and the step of heating the above-mentioned film. The details of each step are explained below.

[0408] <Film formation process> The photocurable composition of the present invention can be used in a film formation process in which it is applied to a substrate to form a film. The method for producing a cured product of the present invention preferably includes a film formation step in which a photocurable composition is applied to a substrate to form a film.

[0409] [Base material] The type of substrate can be determined as appropriate depending on the application and is not particularly limited. Examples of substrates include the substrate described in paragraph 0341 of Japanese Patent Application Publication No. 2024-149522. The above content is incorporated herein by reference.

[0410] When a photocurable composition is applied to the surface of a resin layer (for example, a layer made of cured material) or a metal layer to form a film, the resin layer or metal layer serves as the substrate.

[0411] As a means of applying the photocurable composition onto the substrate, coating is preferred. A specific example of an application method is the method described in paragraph 0344 of Japanese Patent Publication No. 2024-149522.

[0412] <Drying process> The above film may be subjected to a drying step (drying step) after the film formation step (layer formation step) in order to remove the solvent. The drying process is carried out, for example, by the method described in paragraph 0345 of Japanese Patent Publication No. 2024-149522. The above is incorporated herein by reference.

[0413] <Exposure process> The above film may be subjected to an exposure process in which the film is selectively exposed. The method for producing the cured product may include an exposure step in which the film formed by the film formation step is selectively exposed to light. Selective exposure means exposing only a portion of a film. Selective exposure creates areas on the film that are exposed (exposed regions) and areas that are not exposed (unexposed regions). Examples of exposure methods and means include those described in paragraphs 0346-0348 of Japanese Patent Publication No. 2024-149522. The above is incorporated herein by reference.

[0414] <Post-exposure heating process> The above film may be subjected to a heating step after exposure (post-exposure heating step). The post-exposure heating step is carried out, for example, by the method described in paragraph 0349 of Japanese Patent Application Publication No. 2024-149522. The above is incorporated herein.

[0415] <Developing process> The film after exposure may be subjected to a developing process in which a pattern is formed by developing it with a developing solution. In other words, the method for producing a cured product of the present invention may include a developing step in which a film exposed in an exposure step is developed using a developer to form a pattern. During development, one of the exposed or unexposed areas of the film is removed, forming a pattern. Here, development in which the unexposed parts of the film are removed by the development process is called negative development, and development in which the exposed parts of the film are removed by the development process is called positive development.

[0416] The developing process is carried out, for example, by the method described in paragraphs 0350 to 0366 of Japanese Patent Publication No. 2024-149522. The above is incorporated herein by reference.

[0417] <Heating process> The pattern obtained by the developing process (or the pattern after rinsing, if a rinsing process is performed) ma...

Claims

1. It contains a photoradical polymerization initiator and a curable compound, The photoradical polymerization initiator has 2 to 4 (keto)oxime groups in one molecule that are bonded to an aromatic ring by a single bond, and at least one of these (keto)oxime groups is located adjacent to a substituent X whose bonding site to the aromatic ring is an oxygen atom, a sulfur atom, or a nitrogen atom. Photocurable composition.

2. The photocurable composition according to claim 1, wherein the substituent X is a monovalent organic group.

3. The photocurable composition according to claim 1, wherein, when the 2 to 4 (keto)oxime groups include (keto)oxime groups bonded to different aromatic rings, the number of carbon atoms in the linking group connecting the aromatic rings to which the (keto)oxime groups are bonded is 5 or less.

4. The photocurable composition according to claim 1, wherein the photoradical polymerization initiator comprises a compound represented by formula (1-1) or formula (1-2). 【Chemistry 1】 In formula (1-1), R １１ each independently represents a monovalent substituent, m11 represents an integer from 0 to 3, and when m11 is 2 or more, adjacent R １１ may be bonded to each other to form a ring, X １１ is -OR Ｘ１ , -SR Ｘ１ and -NR ｘ１ R ｘ２ represents any one of them, R Ｘ１ represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, -C(=O)R, -C(=O)OR, -C(=O)NR, R Ｘ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, -C(=O)R, -C(=O)OR, -C(=O)NR, R represents a monovalent organic group, R Ｘ１ and R Ｘ２ may be bonded to each other via any divalent linking group to form a ring, n represents an integer from 2 to 4, and when n is 2, Y １１ represents a single bond or a polyvalent organic group, and when n is 3 or 4, Y １１ represents a polyvalent organic group, Z １１ represents a group represented by the following formula (Z-1), and X １１ and Z １１ are in an adjacent positional relationship in the benzene ring described in formula (1-1). In formula (1-2), R ２１ Each of these independently represents a monovalent substituent, m21 represents an integer from 0 to 2, and when m21 is 2, adjacent R ２１ They may bond to each other to form a ring, R ２２ Each of these independently represents a monovalent substituent, m22 represents an integer from 0 to 2, and when m22 is 2, adjacent R ２２ They may be joined to each other to form a ring, Y ２１ -O-, -S-, -NR ｙ１ -, -C(R ｙ１ R ｙ２ ) -, -C (=O) - represents either Y ２２ These are single bonds, -O-, -S-, -NR ｙ１ -, -C(R ｙ１ R ｙ２ ) represents either - or -C (=O)-, R ｙ１ and R ｙ２ Each of these independently represents a hydrogen atom or a monovalent organic group, X ２１ and X ２２ Each is independent of -OR Ｘ１ ,-SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group, and Z ２１ and Z ２２ Each of these independently represents a group shown by the following formula (Z-1), and X ２１ and Z ２１ In formula (1-2), X is a relative positional relationship in the benzene ring. ２２ and Z ２２ These are adjacent positions in the benzene ring described in formula (1-2). 【Chemistry 2】 In formula (Z-1), Rz １ Rz represents one of the alkyl, aryl, alkoxy, or aryloxy groups. ２ represents a monovalent organic group, nz represents 0 or 1, and * represents the bonding site with the aromatic ring structure.

5. X in equation (1-1) １１ , and also X in equation (1-2) ２１ and X ２２ The photocurable composition according to claim 4, wherein is a group represented by any of the following formulas (X-1) to (X-4). 【Transformation 3】 In formula (X-1), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-1) to form a ring, L ｘ１１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ１１ , R ｘ１２ and R ｘ１３ Each of these is independently a hydrogen atom, an alkyl group, an aryl group, and -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each of these independently represents a hydrogen atom or a monovalent organic group, R ｘ１１ and R ｘ１２ , R ｘ１２ and R ｘ１３ , R ｘ１１ and L ｘ１１ , R ｘ１３ and L ｘ１１ They may be connected to each other to form a ring. In formula (X-2), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-2) to form a ring, L ｘ２１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ２１ is a hydrogen atom, an alkyl group or aryl group, -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each of these independently represents a hydrogen atom or a monovalent organic group. In formula (X-3), L ｘ represents any one of -O-, -S-, or -NR Ｎ１ -, and R Ｎ１ represents any one of a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, R represents a monovalent organic group, and when R Ｎ１ is other than a hydrogen atom, it may combine with any substituent in formula (X-3) to form a ring. L ｘ３１ represents a single bond or an alkylene group having 1 to 6 carbon atoms, or a group having any one of O, S, or N. L ｘ３２ represents any one of a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or a monovalent organic group, and R ｘ３２ , R ｘ３３ represents an alkyl group, and R ｘ３２ and R ｘ３３ , R ｘ３２ and L ｘ３１ , R ｘ３３ and L ｘ３１ may be linked to each other to form a ring. In formula (X-4), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-4) to form a ring, R ｘ４１ R represents an alkyl group, aryl group, alkoxy group, aryloxy group, amino group, alkylamino group, or arylamino group. ｘ４１ is L ｘ It may also combine with other elements to form a ring.

6. The photocurable composition according to claim 1, wherein the photoradical polymerization initiator comprises a compound represented by formula (2-1). 【Chemistry 4】 In formula (2-1), Y ３１ These are single bonds: -O-, -C(=O)-, -S-, -S(=O)-, -S(=O) ２ -, -NR ｙ３１ - or -CR ｙ３２ R ｙ３３ - represents R ｙ３１ R is a hydrogen atom, an alkyl group, an aryl group, or a group represented by the following formula (Q-1), ｙ３２ , R ｙ３３ Each of these is independently a hydrogen atom, an alkyl group, an aryl group, a trifluoromethyl group, or a group represented by the following formula (Q-1), R ｙ３２ and R ｙ３３ They may be joined to each other to form a ring, X １１ Each is independent of -OR Ｘ１ , -SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, and R represents a monovalent organic group. Ｘ１ and R Ｘ２ They may be bonded to each other via any divalent linking group to form a ring, Z １１ Each of these independently represents a group shown by the following formula (Z-1), and R １０１ and R １０２ Each of these independently represents an alkyl group, an aryl group, and a halogen atom, and a1 and a2 independently represent an integer of 0 or 1. 【Transformation 5】 In formula (Q-1), X １１ ha-OR Ｘ１ , -SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, and R represents a monovalent organic group. Ｘ１ and R Ｘ２ They may be bonded to each other via any divalent linking group to form a ring, Z １１ represents the group shown in the following formula (Z-1), and X １１ and Z １１ This refers to the positional relationship between adjacent positions in the benzene ring described in formula (Q-1), and R １０３ represents an alkyl group, aryl group, or halogen atom, and a3 represents an integer of 0 or 1. 【Transformation 6】 In formula (Z-1), Rz １ Rz represents one of the alkyl, aryl, alkoxy, or aryloxy groups. ２ represents a monovalent organic group, nz represents 0 or 1, and * represents the bonding site with the aromatic ring structure.

7. X in equation (2-1) １１ The photocurable composition according to claim 6, wherein is a group represented by any of the following formulas (X-1) to (X-4). 【Transformation 7】 In formula (X-1), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-1) to form a ring, L ｘ１１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ１１ , R ｘ１２ and R ｘ１３ Each of these is independently a hydrogen atom, an alkyl group, an aryl group, and -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each of these independently represents a hydrogen atom or a monovalent organic group, R ｘ１１ and R ｘ１２ , R ｘ１２ and R ｘ１３ , R ｘ１１ and L ｘ１１ , R ｘ１３ and L ｘ１１ These elements may be linked to each other to form a ring, and * indicates a bonding site with the aromatic ring structure. In formula (X-2), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-2) to form a ring, L ｘ２１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ２１ is a hydrogen atom, alkyl group, aryl group, -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each of these independently represents a hydrogen atom or a monovalent organic group, and * represents a bonding site with an aromatic ring structure. In formula (X-3), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-3) to form a ring, L ｘ３１ L represents a single bond or an alkylene group having 1 to 6 carbon atoms, or a group having O, S, or N. ｘ３２ represents a single bond, -O-, -S-, or -NR-, and R represents a hydrogen atom or a monovalent organic group. ｘ３２ , R ｘ３３ represents an alkyl group, R ｘ３２ and R ｘ３３ , R ｘ３２ and L ｘ３１ , R ｘ３３ and L ｘ３１ These elements may be linked to each other to form a ring, and * indicates a bonding site with the aromatic ring structure. In formula (X-4), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-4) to form a ring, R ｘ４１ R represents an alkyl group, aryl group, alkoxy group, aryloxy group, amino group, alkylamino group, or arylamino group. ｘ４１ is L ｘ They may combine to form a ring, and * indicates the bonding site with the aromatic ring structure.

8. In the formula (Z-1), the substituent Rz ２ The curable composition according to any one of claims 4 to 7, wherein the group is represented by the following formula (P-1). 【Transformation 8】 In equation (P-1), * represents a bonding, L Ｚ１ represents a single bond or an alkylene group, L Ｚ２ ~L Ｚ４ Each is independent of -CR Ｌ１ R Ｌ２ -, -O-, -S-, or -NR Ｌ３ - represents R Ｌ１ ~R Ｌ３ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Ｚ１ and R Ｚ２ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Ｚ１ and R Ｚ２ L may be bonded via single bonds or linking groups to form a ring, however, Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is the case.

9. In the formula (Z-1), the substituent Rz ２ The curable composition according to any one of claims 4 to 7, wherein the group is represented by the following formula (P-2). 【Chemistry 9】 In equation (P-2), * represents a bonding, L Ｚ１１ R represents a single bond or an alkylene group having 1 to 3 carbon atoms. Ｚ１１ ~R Ｚ１４ Each of these independently represents a hydrogen atom or an alkyl group, L Ｚ１１ R Ｚ１１ or R Ｚ１２ It may also be bonded to form a ring, L Ｚ１２ is, -(CR ＬＺ１１ R ＬＺ１２ ) ｐ - represents R ＬＺ１１ and R ＬＺ１２ Each of these independently represents a hydrogen atom or an alkyl group, and p represents an integer from 1 to 5.

10. The photocurable composition according to any one of claims 4 to 7, wherein in the formula (Z-1), nz is 1.

11. A photocurable composition according to any one of claims 1 to 7, comprising at least one resin selected from the group consisting of (meth)acrylic resin, polyester resin, polyimide precursor, and polyimide resin.

12. The photocurable composition according to claim 11, wherein the resin is a compound corresponding to the curable compound, and the resin has polymerizable groups.

13. The photocurable composition according to claim 11, wherein the resin has an acid group.

14. The photocurable composition according to claim 11, wherein the resin is a resin having graft chains.

15. The photocurable composition according to claim 11, wherein the resin has at least one of the substructures represented by the following formulas (C-1) and (C-2). 【Chemistry 10】 In formula (C-1), X １ represents an organic group with 4+m valence, Y １ represents a 2+n valent organic group, R １ R represents a group containing a polymerizable group. ２ The group contains a polymerizable group, n is an integer from 0 to 6, m is an integer from 0 to 6, and n+m is an integer greater than or equal to 1. In formula (C-2), X １ represents an organic group with 4+m valence, Y １ represents a 2+n valent organic group, A ｘ１ and A ｘ２ represents a monovalent organic group, Ay １ represents a group containing a polymerizable group, n is an integer from 0 to 6, m is an integer from 0 to 6, and n+m is an integer of 1 or more, where A ｘ１ and A ｘ２ If at least one of the components has a polymerizable group, then n+m may be 0.

16. The photocurable composition according to claim 15, wherein the resin has an alicyclic hydrocarbon group.

17. A photocurable composition according to any one of claims 1 to 7, further comprising a colorant.

18. A photocurable composition according to any one of claims 1 to 7, further comprising a chain transfer agent.

19. A photocurable composition according to any one of claims 1 to 7, further comprising a sensitizer.

20. A cured product obtained by curing a photocurable composition according to any one of claims 1 to 7.

21. A laminate comprising two or more layers made of the cured product described in claim 20, wherein a metal layer is included between any of the layers made of the cured product.

22. A method for producing a cured product, comprising a film-forming step of applying a photocurable composition according to any one of claims 1 to 7 onto a substrate to form a film.

23. A method for producing a cured product according to claim 22, comprising an exposure step of selectively exposing the film and a developing step of developing the film using a developer to form a pattern.

24. A method for producing a cured product according to claim 22, comprising a heating step of heating the film at 50 to 450°C.

25. A method for manufacturing a laminate, comprising the method for manufacturing a cured product described in claim 22.

26. A method for manufacturing a semiconductor device, comprising the method for manufacturing a cured product as described in claim 22.

27. A semiconductor device comprising the cured product described in claim 20.

28. As shown by equation (1-1) or equation (1-2) Radical polymerization initiator. 【Chemistry 11】 In formula (1-1), R １１ Each of these independently represents a monovalent substituent, m11 represents an integer from 0 to 3, and if m11 is 2 or greater, adjacent R １１ They may be joined to each other to form a ring, X １１ ha-OR Ｘ１ ,-SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents one of the following: hydrogen atom, alkenyl group, alkynyl group, alkyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, and R represents a monovalent organic group. Ｘ１ and R Ｘ２ The elements may be linked to each other via any divalent linking group to form a ring, where n represents an integer from 2 to 4, and when n is 2, Y １１ represents a single bond or an n-valent organic group, and Y is used when n is 3 or 4. １１ represents an n-valent organic group, Z １１ represents the group shown in the following formula (Z-1), and X １１ and Z １１ These are adjacent positions in the benzene ring described in formula (1-1). In formula (1-2), R ２１ Each of these independently represents a monovalent substituent, m21 represents an integer from 0 to 2, and when m21 is 2, adjacent R ２１ They may bond to each other to form a ring, R ２２ Each of these independently represents a monovalent substituent, m22 represents an integer from 0 to 2, and when m22 is 2, adjacent R ２２ They may be joined to each other to form a ring, Y ２１ -O-, -S-, -NR ｙ１ -, -C(R ｙ１ R ｙ２ ) -, -C (=O) - represents either Y ２２ These are single bonds, -O-, -S-, -NR ｙ１ -, -C(R ｙ１ R ｙ２ ) represents either - or -C (=O)-, R ｙ１ and R ｙ２ Each of these independently represents a hydrogen atom or a monovalent organic group, X ２１ and X ２２ Each is independent of -OR Ｘ１ ,-SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents a hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, where R represents a monovalent organic group, and Z ２１ and Z ２２ Each of these independently represents a group shown by the following formula (Z-1), and X ２１ and Z ２１ In formula (1-2), X is a relative positional relationship in the benzene ring. ２２ and Z ２２ These are adjacent positions in the benzene ring described in formula (1-2). 【Chemistry 12】 In formula (Z-1), Rz １ Rz represents one of the alkyl, aryl, alkoxy, or aryloxy groups. ２ represents a monovalent organic group, nz represents 0 or 1, and * represents the bonding site with the aromatic ring structure.

29. It is expressed by equation (1-1), where n in equation (1-1) is 2, and Y １１ These are single-combined, -C(=O)-, -O-, -S-, -S(=O)-, -S(=O) ２ -, -NR ｙ３１ - or -CR ｙ３２ R ｙ３３ - and R ｙ３２ , R ｙ３３ The radical polymerization initiator according to claim 28, wherein each of the elements is independently a hydrogen atom, an alkyl group, an aryl group, a trifluoromethyl group, or a group represented by the following formula (Q-1). 【Chemistry 13】 In formula (Q-1), X １１ ha-OR Ｘ１ , -SR Ｘ１ and -NR ｘ１ R ｘ２ Represents one of the following, R Ｘ１ R represents one of the following: alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR. Ｘ２ represents one of the following: hydrogen atom, alkyl group, alkenyl group, alkynyl group, aryl group, -C(=O)R, -C(=O)OR, or -C(=O)NR, and R represents a monovalent organic group. Ｘ１ and R Ｘ２ They may be bonded to each other via any divalent linking group to form a ring, Z １１ represents the group shown in the following formula (Z-1), and X １１ and Z １１ This refers to the positional relationship between adjacent positions in the benzene ring described in formula (Q-1), and R １０３ represents an alkyl group, aryl group, or halogen atom, and a3 represents an integer of 0 or 1.

30. X in equation (1-1) １１ , and also X in equation (1-2) ２１ and X ２２ The radical polymerization initiator according to claim 28, wherein is a group represented by any of the following formulas (X-1) to (X-4). 【Chemistry 14】 In formula (X-1), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-1) to form a ring, L ｘ１１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ１１ , R ｘ１２ and R ｘ１３ Each of these is independently a hydrogen atom, an alkyl group, an aryl group, and -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each is independently a hydrogen atom or a monovalent organic group, R ｘ１１ and R ｘ１２ , R ｘ１２ and R ｘ１３ , R ｘ１１ and L ｘ１１ , R ｘ１３ and L ｘ１１ They may be connected to each other to form a ring. In formula (X-2), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-2) to form a ring, L ｘ２１ R represents a single bond or an alkylene group having 1 to 6 carbon atoms. ｘ２１ is a hydrogen atom, alkyl group, aryl group, -(C=O)R Ｖ１ , -(C=O) OR Ｖ１ or -(C=O)NR Ｖ１ R Ｖ２ Represents R Ｖ１ and R Ｖ２ Each of these independently represents a hydrogen atom or a monovalent organic group. In formula (X-3), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-3) to form a ring, L ｘ３１ L represents a single bond or an alkylene group having 1 to 6 carbon atoms, or a group having O, S, or N. ｘ３２ represents a single bond, -O-, -S-, or -NR-, and R represents a hydrogen atom or a monovalent organic group. ｘ３２ , R ｘ３３ represents an alkyl group, R ｘ３２ and R ｘ３３ , R ｘ３２ and L ｘ３１ , R ｘ３３ and L ｘ３１ They may be connected to each other to form a ring. In formula (X-4), L ｘ is -O-, -S-, or -NR Ｎ１ Represents either -, R Ｎ１ represents one of the following: a hydrogen atom, an alkyl group, an aryl group, or -C(=O)R, where R represents a monovalent organic group. Ｎ１ When is not a hydrogen atom, it may bond with any of the substituents in formula (X-4) to form a ring, R ｘ４１ R represents an alkyl group, aryl group, alkoxy group, aryloxy group, amino group, alkylamino group, or arylamino group. ｘ４１ is L ｘ It may also combine with other elements to form a ring.

31. In the formula (Z-1), the substituent Rz ２ The radical polymerization initiator according to claim 28 or 29, wherein is a group represented by the following formula (P-1). 【Chemistry 15】 In equation (P-1), * represents a bonding, L Ｚ１ represents a single bond or an alkylene group, L Ｚ２ ~L Ｚ４ Each is independent of -CR Ｌ１ R Ｌ２ -, -O-, -S-, or -NR Ｌ３ - represents R Ｌ１ ~R Ｌ３ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Ｚ１ and R Ｚ２ Each of these independently represents a hydrogen atom, an alkyl group, or an aryl group, and R Ｚ１ and R Ｚ２ L may be bonded via single bonds or linking groups to form a ring, however, Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is the case.

32. In the formula (Z-1), the substituent Rz ２ The radical polymerization initiator according to claim 28 or 29, wherein is a group represented by the following formula (P-2). 【Chemistry 16】 In equation (P-2), * represents a bonding, L Ｚ１１ R represents a single bond or an alkylene group having 1 to 3 carbon atoms. Ｚ１１ ~R Ｚ１４ Each of these independently represents a hydrogen atom or an alkyl group, L Ｚ１１ R Ｚ１１ or R Ｚ１２ It may also be bonded to form a ring, L Ｚ１２ is, -(CR ＬＺ１１ R ＬＺ１２ ) ｐ - represents R ＬＺ１１ and R ＬＺ１２ Each of these independently represents a hydrogen atom or an alkyl group, and p represents an integer from 1 to 5.

33. The radical polymerization initiator according to claim 28 or 29, wherein in formula (Z-1), nz is 1.

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