Resin microparticles, methods for producing the same, and applications thereof.
The two-stage polymerization process for resin fine particles reduces metallic and ionic content, addressing high dielectric loss tangents and ion migration issues, ensuring excellent dielectric properties for semiconductor applications.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SEKISUI PLASTICS CO LTD
- Filing Date
- 2026-04-16
- Publication Date
- 2026-07-07
AI Technical Summary
Existing resin microparticles used in semiconductor applications have high dielectric loss tangents and contain significant metallic and ionic components, which affect their performance and ion migration, particularly in miniaturized components.
Resin fine particles with reduced metallic and eluted ion content, achieved through a two-stage polymerization process using specific monomers and surfactants, resulting in a dielectric loss tangent of 0.0050 or less and total ion content of 100 ppm or less.
The resin fine particles exhibit excellent dielectric properties and prevent ion migration, suitable for use in miniaturized semiconductor components.
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