Power transmission device, lithography device, and method for manufacturing articles
The force transmission device in lithography apparatuses addresses torsional stress accumulation by guiding force lines with opposing stress directions, improving vibration reduction and apparatus performance.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- CANON KK
- Filing Date
- 2024-12-26
- Publication Date
- 2026-07-08
Smart Images

Figure 2026114579000001_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to a force transmission device, a lithography apparatus, and an article manufacturing method.
Background Art
[0002] In a manufacturing process of a semiconductor device or the like, a lithography apparatus for forming a pattern on a substrate is used. In the lithography apparatus, it is necessary to transmit a force such as electric power, gas, liquid, etc. between a plurality of structures provided with various units, and a force line for transmitting the force is provided across the plurality of structures. Patent Document 1 describes a configuration in which an exposure apparatus main body and a pedestal are connected by cables.
Prior Art Documents
Patent Documents
[0003]
Patent Document 1
Summary of the Invention
Problems to be Solved by the Invention
[0004] In a lithography apparatus, when routing a force line across a plurality of structures, torsional stress may occur in the force line. If the force line is not routed considering such torsional stress, torsional stress accumulates throughout the force line, and an unintended force (e.g., tension) by the force line may act between the plurality of structures.
[0005] Therefore, an object of the present invention is to provide an advantageous technique for reducing the influence of a force line connecting a plurality of structures.
Means for Solving the Problems
[0006] To achieve the above objective, a force transmission device as one aspect of the present invention is a force transmission device for transmitting force between a first structure and a second structure, comprising: a force line connecting the first structure and the second structure; a first guide member for guiding a first portion of the force line in a curved manner; and a second guide member for guiding a second portion of the force line in a curved manner, wherein the force line is guided by the first guide member and the second guide member such that the direction of the torsional stress generated in the first portion and the direction of the torsional stress generated in the second portion are opposite to each other.
[0007] Further objects or other aspects of the present invention will be revealed by preferred embodiments described below with reference to the accompanying drawings. [Effects of the Invention]
[0008] According to the present invention, for example, it is possible to provide an advantageous technique for reducing the influence of force lines connecting multiple structures. [Brief explanation of the drawing]
[0009] [Figure 1] Schematic diagram showing an example of the configuration of the exposure apparatus in the first embodiment. [Figure 2] Schematic diagram showing an example of the routing of force lines in an exposure apparatus. [Figure 3] Schematic diagram showing an example configuration of the power transmission device in the first embodiment. [Figure 4] A diagram showing an example of the routing of force lines in the first embodiment. [Figure 5] A diagram showing another embodiment of the routing of force lines in the first embodiment. [Figure 6] Schematic diagram showing another configuration example of the power transmission device in the first embodiment. [Figure 7] A diagram showing an example of the routing of force lines in the second embodiment. [Figure 8] A diagram showing an example of the routing of force lines in the third embodiment. [Figure 9] A diagram showing an example of the routing of force lines in the fourth embodiment. [Modes for carrying out the invention]
[0010] The embodiments will be described in detail below with reference to the attached drawings. Note that the following embodiments do not limit the invention as defined in the claims. While the embodiments describe multiple features, not all of these features are essential to the invention, and the features may be combined in any way. Furthermore, in the attached drawings, identical or similar configurations are given the same reference numerals, and redundant descriptions are omitted.
[0011] In this specification and the accompanying drawings, directions are indicated in an XYZ coordinate system with the substrate surface as the XY plane. The directions parallel to the X, Y, and Z axes in the XYZ coordinate system are defined as the X direction, Y direction, and Z direction, respectively, and the rotations around the X, Y, and Z axes are defined as θX, θY, and θZ, respectively. Control and driving (movement) related to the X, Y, and Z axes refer to control or driving (movement) related to the direction parallel to the X, Y, and Z axes, respectively. Furthermore, control or driving related to the θX, θY, and θZ axes refer to control or driving related to rotation around the axis parallel to the X, Y, and Z axes, respectively.
[0012] The lithography apparatus according to the present invention is an apparatus for forming a pattern on a substrate. Examples of lithography apparatuses include an exposure apparatus that exposes a substrate to transfer a pattern from a master plate (mask) onto the substrate, and an imprint apparatus that uses a master plate (mold) to form a pattern on an imprint material on a substrate. In the following, an exposure apparatus will be used as an example to explain the lithography apparatus.
[0013] <First Embodiment> A first embodiment of the present invention will now be described. Figure 1 is a schematic diagram showing an example of the configuration of an exposure apparatus 100 in this embodiment. The exposure apparatus 100 includes an illumination optical system 1 that illuminates a reticle 8 (master plate) with light, a projection optical system 3 that projects the pattern image of the reticle 8 onto a substrate 9, a reticle stage 2 that can hold and move the reticle 8, and a substrate stage 7 that can hold and move the substrate 9. The position of at least one of the reticle 8 and the reticle stage 2 is measured by a measuring instrument 10. The measuring instrument 10 is, for example, a laser interferometer or an encoder.
[0014] Furthermore, the exposure apparatus 100 may comprise a first structure 6 and a second structure 4. The second structure 4 is equipped with a reticle stage 2 and a projection optical system 3. The first structure 6 is connected to the floor 11 on which the exposure apparatus 100 is installed and is affected by vibrations from the floor 11 and / or vibrations generated by the driving of the reticle stage 2 and the substrate stage 7. The second structure is positioned on the first structure 6 via a vibration reduction mechanism 5 (vibration isolation mechanism) that reduces vibrations and supports the projection optical system 3 and / or measuring instrument 10.
[0015] Figure 2 shows an example of the routing of a force line 21 connecting a first structure 6 and a second structure 4 in an exposure apparatus 100. In the exposure apparatus 100, it is necessary to transmit forces such as electricity, gas (including vacuum), and liquid between multiple structures on which various units are installed, and force lines 21 for transmitting these forces are provided across multiple structures. In the example in Figure 2, a force line 21 is provided between the first structure 6 and the second structure 4, which are arranged via a vibration reduction mechanism 5, and the first structure 6 and the second structure 4 are connected by the force line 21. Examples of force lines 21 include cables for transmitting electricity to electrical equipment, and / or tubes (piping) for transmitting (supplying, recovering) gas or liquid to electrical equipment. Cables and / or tubes as force lines 21 are flexible.
[0016] One end of the force line 21 is connected to a first connection part 13 that is connected to electrical devices (not shown) or piping components (not shown) on the first structure 6. The other end of the force line 21 is connected to a second connection part 14 that is connected to electrical devices (not shown) or piping components (not shown) on the second structure 4. Also, a part of the force line 21 between the first connection part 13 and the second connection part 14 is fixed to the first structure 6 by a fixing member 22 (a bundling member) provided on the first structure 6. In the present embodiment, an example in which the first connection part 13 is provided on the first structure 6 and the second connection part 14 is provided on the second structure 4 will be described, but the first connection part 13 may be provided on electrical devices or the like on the first structure 6, and the second connection part 14 may be provided on electrical devices or the like on the second structure 4.
[0017] Here, the vibration transmitted between the first structure 6 and the second structure 4 may include not only the vibration from the floor 11 but also the vibration generated by the driving of the reticle stage 2 and the substrate stage 7. In order to reduce such vibration, in the exposure apparatus 100 of the present embodiment, the first structure 6 and the second structure 4 are arranged via a vibration reduction mechanism 5. However, the first structure 6 and the second structure 4 are connected by the force line 21, and when routing the force line between the first structure 6 and the second structure 4, torsional stress may occur in the force line 21. If the force line 21 is not routed in consideration of such torsional stress, torsional stress will accumulate throughout the force line 21, and an unintended force (for example, tension) by the force line 21 may act between the first structure 6 and the second structure 4. As a result, even if a vibration reduction mechanism 5 is provided between the first structure 6 and the second structure 4, vibration will be transmitted via the force line 21. That is, the vibration of the first structure 6 may be transmitted to the second structure 4 (specifically, the projection optical system 3 and the measuring instrument 10 on the second structure 4) via the force line 21, which may degrade the apparatus performance. Therefore, it is desirable to route the force line 21 in consideration of the torsional stress generated in the force line 21 so that the influence of the force line 21 between the first structure 6 and the second structure 4 is reduced.
[0018] As shown in Fig. 2, when changing the direction of the force line 21 between the fixed member 22 and the second connection portion 14 at an angle between 90° and 180°, it is necessary to route the force line 21 in a non-linear, curved (arc) manner so that the reaction force and restoring force of the force line 21 do not increase. For example, when routing the force line 21 such as in a cable or a tube, it is advisable to ensure a radius of curvature that is 5 to 6 times the recommended value of the radius of curvature recommended by the manufacturer. However, it is better for the radius of curvature when routing the force line 21 to be even larger, preferably routing it with a radius of curvature of 10 times or more the recommended value. Specifically, when the diameter of the force line 21 is Φ10, the radius of curvature when routing the force line 21 should be 100 mm or more. However, in the routing path of the force line 21, when a part of the force line 21 is wound in a coil shape to perform a direction change or extra length processing, etc., the force line 21 may be twisted in the rotational direction about the axis center, increasing the reaction force and restoring force of the force line 21. As a result, the force required to bend or move the force line 21 in an arbitrary direction may increase. Here, the twist of the force line 21 can be defined as the stress (torsional stress) generated in the rotational direction about the axis center in the force line 21.
[0019] Also, the fixed member 22 is a member that clamps and fixes the force line 21, such as a binding band. In Fig. 2, the fixed member 22 fixes the force line 21 in the X direction, Y direction, and rotational direction, but it cannot be completely fixed in the rotational direction. Therefore, on the routing path of the force line 21, as the twist (torsional stress) of the force line 21 increases by half a rotation, one rotation,... in the rotational direction about the axis center, torsional stress accumulates in the force line 21, and the influence of the torsional stress can be transmitted to the second structure 4 (the second connection portion 14). In a state where torsional stress has accumulated in the force line 21 like this, an unintended force (e.g., tension) is generated in the force line 21, and even if the radius of curvature in the routing path of the force line 21 is increased, the vibration reduction effect by the vibration reduction mechanism 5 may decrease. Therefore, reducing the overall torsional stress of the force line 21 between the first connection portion 13 and the second connection portion 14 can lead to an improvement in the vibration reduction effect between the first structure 6 and the second structure 4.
[0020] Furthermore, the force line 21 may be composed of multiple wires. If torsional stress accumulates in the force line 21, which is composed of multiple wires bundled together, the multiple wires will be squeezed against each other, and the effects of reaction force and restoring force will become greater. In large equipment such as exposure equipment 100, force lines 21 composed of multiple wires bundled together are often routed, so reducing the accumulation of torsional stress in the force line 21 is even more important.
[0021] Therefore, the exposure apparatus 100 of this embodiment is provided with a plurality of guide members 23 for guiding the force line 21. The plurality of guide members 23 include a first guide member 23a that guides the first portion 21a of the force line 21 in a curved shape (so that it becomes a curve), and a second guide member 23b that guides the second portion 21b of the force line 21 in a curved shape (so that it becomes a curve). The force line 21 is guided by the first guide member 23a and the second guide member 23b such that the direction of the torsional stress generated in the first portion 21a and the direction of the torsional stress in the second portion 21b are opposite to each other. Here, in the exposure apparatus 100 of this embodiment, the force line 21 and the plurality of guide members 23 (first guide member 23a, second guide member 23b) constitute a force transmission device 20 that transmits (supplies) force between the first structure 6 and the second structure 4. The force transmission device 20 may include a fixing member 22.
[0022] Figure 3 shows an example configuration of a force transmission device 20 that transmits force between the first structure 6 and the second structure 4 in this embodiment. The force transmission device 20 in Figure 3 may include a force line 21, a fixing member 22, a first guide member 23a, and a second guide member 23b. The fixing member 22 is provided on the first structure 6 and fixes a portion of the force line 21 between the second portion 21b guided by the second guide member 23b and the end connected to the second structure 4 (second connection part 14) to the first structure 6. The first guide member 23a and the second guide member 23b are provided on the first structure 6. In Figure 3, the first portion 21a of the force line 21 is wound around the first guide member 23a around a first axis, and the second portion 21b of the force line 21 is wound around the second guide member 23b around a second axis parallel to the first axis. In Figure 3, the first and second axes are both parallel to the Z-axis. Although Figure 3 shows two force lines 21 as an example, the number of force lines 21 is not limited to two; there may be one or three or more.
[0023] The first guide member 23a is a member that guides the first portion 21a of the force line 21 in a curved manner (to become a curve), and may be understood as a member around which the first portion 21a of the force line 21 is wound. The second guide member 23b is a member that guides the second portion 21b of the force line 21 in a curved manner (to become a curve), and may be understood as a member around which the second portion 21b of the force line 21 is wound. The second portion 21b of the force line 21 is the portion of the force line 21 that is closer to the second structure 4 than the first portion 21a. Each of the first guide member 23a and the second guide member 23b can be used to change the orientation of the force line 21 at an angle between 90° and 180° along the routing route of the force line 21, and / or to adjust the excess length of the force line 21.
[0024] In each of the first guide member 23a and the second guide member 23b, torsional stress is generated in the force line 21 when changing the direction of the force line 21 and / or handling the excess length. Therefore, in the force transmission device 20 of this embodiment, the force line 21 is guided by the first guide member 23a and the second guide member 23b such that the direction of the torsional stress generated in the first part 21a and the direction of the torsional stress generated in the second part 21b are opposite to each other. In this case, it is preferable that the force line 21 is guided by the guide members 23a and 23b in such a way that the difference between the magnitude of the torsional stress generated in the first part 21a and the magnitude of the torsional stress generated in the second part 21b is reduced. For example, the force line 21 is guided by guide members 23a to 23b such that the magnitude of the torsional stress generated in the second part 21b is within the range of 50% to 150% (preferably 80% to 120%) of the magnitude of the torsional stress generated in the first part 21a. This allows at least a portion of the magnitude of the torsional stress generated in the first part 21a to be offset by the torsional stress generated in the second part 21b, thereby reducing the overall torsional stress of the force line 21 and enabling the force line 21 to be routed in this manner. In other words, the force line 21 can be routed between the fixing member 15 and the second structure 4 (second connection part 14) with a small reaction force and restoring force on the force line 21.
[0025] The first guide member 23a and the second guide member 23b are preferably mechanisms such as reels, which can be used to wind the force wire 21. By configuring each guide member 23 in this way, the radius of curvature R of the force wire 21 can be made as small as possible, enabling space-saving routing of the force wire 21. In addition, between the first guide member 23a and the second guide member 23b, it is preferable to route the force wire 21 while keeping it taut to prevent it from interfering with surrounding members. For the same reason, when winding the force wire 21 around each of the first guide member 23a and the second guide member 23b, it is preferable to keep the force wire 21 taut.
[0026] Figure 4 shows an example of how the force line 21 is routed in this embodiment. The first portion 21a of the force line 21 is turned by approximately 180° by being wrapped around the first guide member 23a by half a turn. At this time, a torsional stress 31 is generated in the first portion 21a guided by the first guide member 23a. Therefore, the second portion 21b of the force line 21 is wrapped around the second guide member 23b by one turn so that a torsional stress 32 is generated in the opposite direction to the torsional stress 31 generated in the first portion 21a. As a result, at least a portion of the torsional stress 31 of the first portion 21a is offset by the torsional stress 32 of the second portion 21b, and the overall torsional stress of the force line 21 can be reduced.
[0027] Figure 5 also shows another embodiment of the routing of the force line 21 in this embodiment. The embodiment in Figure 5 shows a different routing route for the force line 21 than the embodiment in Figure 4. In Figure 5 as well, the first portion 21a of the force line 21 is wound around the first guide member 23a by half a turn, resulting in a change of direction of approximately 180°. Then, the second portion 21b of the force line 21 is wound around the second guide member 23b such that a torsional stress 32 is generated in the opposite direction to the torsional stress 31 generated in the first portion 21a. In the second guide member 23b, the second portion 21b of the force line 21 undergoes a change of direction of approximately 90°. In the example in Figure 5, the force line 21 is guided by the first guide member 23a and the second guide member 23b in such a way that it forms a figure eight when viewed from the Z direction. Even with this configuration, at least a portion of the torsional stress 31 of the first part 21a is offset by the torsional stress 32 of the second part 21b, thereby reducing the overall torsional stress of the force line 21. Therefore, depending on the routing of the force line 21, either the embodiment shown in Figure 4 or the embodiment shown in Figure 5 can be selected.
[0028] Here, the force wire 21 may be wound multiple times around each of the first guide member 23a and the second guide member 23b. In this case, the force wire 21 may be wound multiple times around a guide member 23 such that at least a portion of the torsional stress generated when it is wound around a single guide member 23 for the first time is offset by the torsional stress generated when it is wound around the same guide member 23 for the second time. This makes it possible to perform excess length processing, etc., to reduce the overall torsional stress of the force wire 21.
[0029] Figure 6 shows another example of the configuration of the force transmission device 20 in this embodiment, specifically an example where the force line 21 is rotated 90° in the height direction (Z direction) of the exposure apparatus 100. In Figure 6, the first portion 21a of the force line 21 is wound around the first guide member 23a with respect to the first axis, and the second portion 21b of the force line 21 is wound around the second guide member 23b with respect to the second axis which intersects (is perpendicular to) the first axis. In Figure 6, the first axis is parallel to the Z axis, and the second axis is parallel to the X axis. In large devices such as the exposure apparatus 100, the force line 21 may be routed along a complex path, such as being routed in the height direction from the first structure 6 to the second structure 4. As mentioned above, the routing of the force line 21 connecting the first structure 6 and the second structure 4 also affects the magnitude of the reaction force and restoring force of the force line 21. Therefore, if the second guide member 23b can change the direction of the routing route of the force lines 21 in the height direction, it becomes possible to offset at least a portion of the torsional stress generated in the first part 21a and to secure the radius of curvature R of the second part 21b.
[0030] As described above, in the force transmission device 20 of this embodiment, the force line 21 is guided by the first guide member 23a and the second guide member 23b such that the direction of the torsional stress generated in the first portion 21a and the direction of the torsional stress generated in the second portion 21b are opposite to each other. This reduces the accumulation of torsional stress in the force line 21 and reduces the torsional stress generated throughout the force line 21.
[0031] <Second Embodiment> A second embodiment of the present invention will now be described. In this embodiment, an example of the configuration of a power transmission device 20 in which the number of guide members 23 is three or more will be described. This embodiment basically follows the first embodiment, and can be followed in accordance with the first embodiment except for the matters mentioned below.
[0032] In the force transmission device 20 of this embodiment, three or more guide members 23 may be provided on the first structure 6 along the routing route of the force line 21. Figure 7 shows an example of routing the force line 21 in this embodiment. The force transmission device 20 in Figure 7 may include four guide members 23a to 23d.
[0033] The first portion 21a of the force line 21 is turned by approximately 180° when it is wound around the first guide member 23a by half a turn. At this time, a torsional stress 31 is generated in the first portion 21a guided by the first guide member 23a. Therefore, the second portion 21b of the force line 21 is wound around the second guide member 23b so that a torsional stress 32 is generated in the opposite direction to the torsional stress 31 generated in the first portion 21a. In the second guide member 23b, the second portion 21b of the force line 21 is turned by approximately 90°. As a result, at least a portion of the torsional stress 31 in the first portion 21a is offset by the torsional stress 32 in the second portion 21b.
[0034] Furthermore, the force transmission device 20 in Figure 7 is further provided with a third guide member 23c that guides the third portion 21c of the force line 21 in a curved shape (to become a curve), and a fourth guide member 23d that guides the fourth portion 21d of the force line 21 in a curved shape (to become a curve). The third portion 21c and the fourth portion 21d of the force line 21 are the parts of the force line 21 that are closer to the second connection portion 14 than the second portion 21b.
[0035] The third portion 21c of the force line 21 undergoes a change of direction of approximately 90° when it is wound around the third guide member 23c. At this time, a torsional stress 33 is generated in the third portion 21c guided by the third guide member 23c. Therefore, the fourth portion 21d of the force line 21 is wound around the fourth guide member 23d so that a torsional stress 34 is generated in the opposite direction to the torsional stress 33 generated in the third portion 21c. In the fourth guide member 23d, the fourth portion 21d of the force line 21 undergoes a change of direction of approximately 90°. As a result, at least a portion of the torsional stress 33 in the third portion 21a is offset by the torsional stress 34 in the second portion 21b.
[0036] Thus, in the force transmission device 20 of this embodiment, the routing route of the force line 21 can be changed using four guide members 23a to 23d, and the accumulation of torsional stress in the force line 21 can be reduced, thereby reducing the overall torsional stress of the force line 21. Here, in this embodiment, an example using four guide members 23a to 23d has been described, but if there are many changes in direction in the routing route of the force line 21, the number of guide members 23 can be further increased. In this case as well, each part of the force line 21 can be guided by each guide member 23 in order to reduce the accumulation of torsional stress in the force line 21 and reduce the overall torsional stress of the force line 21.
[0037] <Third Embodiment> A third embodiment of the present invention will now be described. In this embodiment, an example will be described in which the heating element 18 as the first structure 6 and the first guide member 23a are arranged inside the housing 17. This embodiment basically follows the first embodiment, and can be carried out according to the first embodiment except for the matters mentioned below. Furthermore, this embodiment may also be based on the second embodiment.
[0038] Figure 8 shows an example of routing the force wire 21 in this embodiment. When the first connection part 13 to which one end of the force wire 21 is connected is provided on a heating element 18 such as an electrical circuit board, that is, when the first structure 6 is a heating element 18, at least a part of the heating element 18 can be housed and cooled within the housing 17. For example, when the exposure apparatus 100 is placed in a chamber (not shown) and temperature control is performed, it is necessary to reduce the temperature influence on the surroundings within the space of the chamber. For this reason, the heating element 18 can be housed within the housing 17, and the inside of the housing 17 can be air-cooled by exhaust or the sides of the housing 17 can be liquid-cooled. In a housing 17 with a temperature control function, it is necessary to route the force wire 21 in a limited space, but if the direction is changed frequently, torsional stress will accumulate in the force wire 21. In this embodiment, the first guide member 23a is arranged inside the housing 17, and the second guide member 23b is arranged outside the housing 17. By providing the first guide member 23a inside the housing 17, it becomes possible to secure a sufficient radius of curvature R and change direction of the force line 21 in a space-saving manner, thereby reducing the torsional stress generated throughout the force line 21.
[0039] <Fourth Embodiment> A fourth embodiment of the present invention will now be described. In this embodiment, an example will be described in which a fifth guide member 23e is further provided between the second guide member 23b and the second connecting portion 14. This embodiment basically follows the first embodiment, and can be applied to the first embodiment except for matters mentioned below. Furthermore, this embodiment may also apply to the second and / or third embodiments.
[0040] Figure 9 shows an example of routing the force line 21 in this embodiment. The force transmission device 20 in this embodiment is further provided with a fifth guide member 23e that guides a portion of the force line 21 between the second guide member 23b and the second connection part 14 (second structure 4). Torsional stress 35 is generated in the portion of the force line 21 (fifth portion 21e) between the fifth guide member 23e and the second connection part 14.
[0041] In the embodiment shown in Figure 9, the first portion 21 of the force line 21 is wound around the first guide member 23a by half a turn, resulting in a change of direction of approximately 180°. Then, the second portion 21b of the force line 21 is wound around the second guide member 23b so as torsional stress 32a is generated in the opposite direction to the torsional stress 31 generated in the first portion 21a. Similarly, the second portion 21b of the force line 21 is wound around the second guide member 23b so as torsional stress 32b is generated in the opposite direction to the torsional stress 35 generated in the fifth portion 21e of the force line 21. As a result, at least a portion of the sum of the torsional stress 31 generated in the first portion 21a of the force line 21 and the torsional stress 35 generated in the fifth portion 21e of the force line 21 is offset by the sum of the torsional stresses 32a to 32b generated in the second portion 21b of the force line 21.
[0042] Thus, in the embodiment shown in Figure 9, at least a portion of the torsional stress 35 generated in the fifth portion 21e of the force line 21 is preemptively offset by the torsional stress 32b generated in the second portion 21b of the force line 21. By preemptively generating torsional stress in a relatively spacious area, the overall torsional stress of the force line 21 is reduced, enabling space-saving in the device. Here, the fifth guide member 23e can be a simple component such as a bundle member solely for changing direction, allowing for a space-saving design at the point where direction change is desired. For example, the fifth guide member 23e may be configured as a fixing member for fixing a portion of the force line 21 to the first structure 6. Furthermore, by using a mechanism such as a reel that can generate torsional stress 32 in the second portion 21b of the force line 21 as the second guide member 23b, the force line 21 can be routed in a space-saving manner.
[0043] <Embodiment of Article Manufacturing Method> The article manufacturing method according to an embodiment of the present invention is suitable for manufacturing articles such as microdevices such as semiconductor devices and elements having a microstructure. The article manufacturing method of this embodiment includes a forming step of forming a pattern on a substrate using the above-described lithography apparatus, a processing step of processing the substrate on which the pattern was formed in the forming step, and a manufacturing step of manufacturing an article from the substrate processed in the processing step. When the lithography apparatus is configured as an exposure apparatus, the forming step may be a step of forming a latent image pattern on a photosensitive agent coated on a substrate by exposing the substrate using the above-described exposure apparatus (exposure method). In this case, the processing step may include a step of developing the substrate on which the latent image pattern was formed. Furthermore, the article manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The article manufacturing method of this embodiment is advantageous compared to conventional methods in at least one of the performance, quality, productivity, and production cost of the article.
[0044] <Summary of Embodiments> The disclosures herein include at least the following power transmission devices, lithography devices, and methods for manufacturing articles. (Item 1) A force transmission device for transmitting force between a first structure and a second structure, A force line connecting the first structure and the second structure, A first guide member that guides the first portion of the aforementioned force line in a curved shape, A second guide member that guides the second portion of the aforementioned force line in a curved manner, Equipped with, A force transmission device characterized in that the force lines are guided by the first guide member and the second guide member such that the direction of the torsional stress generated in the first part and the direction of the torsional stress generated in the second part are opposite to each other. (Item 2) The force transmission device according to item 1, characterized in that the force line is guided by the first guide member and the second guide member such that the difference between the magnitude of the torsional stress generated in the first part and the magnitude of the torsional stress generated in the second part is reduced. (Item 3) The force transmission device according to item 1 or 2, characterized in that the force line is guided by the first guide member and the second guide member such that the magnitude of the torsional stress generated in the second part is within the range of 50% to 150% of the magnitude of the torsional stress generated in the first part. (Item 4) A force transmission device according to any one of items 1 to 3, characterized in that the first part is wound around the first guide member, and the second part is wound around the second guide member. (Item 5) The force transmission device according to item 4, characterized in that the first portion is wound around the first guide member with respect to a first axis, and the second portion is wound around the second guide member with respect to a second axis parallel to the first axis. (Item 6) The force transmission device according to item 4, characterized in that the first portion is wound around the first guide member with respect to the first axis, and the second portion is wound around the second guide member with respect to the second axis intersecting the first axis. (Item 7) The power transmission device according to any one of items 1 to 6, characterized in that the first guide member and the second guide member are provided in the first structure. (Item 8) The first structure further includes a fixing member for fixing a portion of the force lines, The aforementioned force line has an end connected to the second structure, and the second portion is closer to the end than the first portion. The force transmission device according to any one of items 1 to 7, characterized in that a portion of the force line fixed to the first structure by the fixing member is located between the second portion and the end portion. (Item 9) The force transmission device according to any one of items 1 to 8, characterized in that each of the first guide member and the second guide member guides the force line so as to change the direction of the force line at an angle between 90° and 180°. (Item 10) The power transmission device according to any one of items 1 to 9, characterized in that the first structure and the second structure are arranged via a vibration reduction mechanism. (Item 11) A third guide member that guides the third portion of the aforementioned force line in a curved manner, A fourth guide member that guides the fourth portion of the aforementioned force line in a curved manner, Furthermore, The force transmission device according to any one of items 1 to 10, characterized in that the force lines are guided by the third guide member and the fourth guide member such that the direction of the torsional stress generated in the third part and the direction of the torsional stress generated in the fourth part are opposite to each other. (Item 12) The system further comprises a housing that accommodates at least a portion of the first structure, The power transmission device according to any one of items 1 to 11, characterized in that the first guide member is arranged inside the housing and the second guide member is arranged outside the housing. (Item 13) The power transmission device according to item 12, characterized in that the first structure is a heat-generating element. (Item 14) A fifth guide member is further provided between the second guide member and the second structure 4 to guide the force line, A force transmission device according to any one of items 1 to 13, characterized in that the force lines are guided such that a torsional stress is generated in the second part in the opposite direction to the direction of the torsional stress generated in the fifth part between the fifth guide member and the second structure. (Item 15) The force transmission device according to item 14, characterized in that the force lines are guided such that at least a portion of the sum of the torsional stress generated in the first part and the torsional stress generated in the fifth part is offset by the torsional stress generated in the second part. (Item 16) The force transmission device according to any one of items 1 to 15, characterized in that the force line is a flexible cable and / or tube. (Item 17) A lithography apparatus for forming patterns on a substrate, A lithography apparatus comprising a first structure, a second structure, and a force transmission device according to any one of items 1 to 16 for transmitting force between the first structure and the second structure. (Item 18) A forming step of forming a pattern on a substrate using the lithography apparatus described in item 17, A processing step for processing the substrate on which the pattern has been formed in the forming step, A manufacturing process for producing an article from the substrate processed in the above-mentioned processing step, A method for manufacturing articles, characterized by including the following:
[0045] The invention is not limited to the embodiments described above, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, claims are attached to disclose the scope of the invention. [Explanation of symbols]
[0046] 4: Second structure, 6: First structure, 20: Power transmission device, 21: Line of power, 22: Fixing member, 23a: First guide member, 23b: Second guide member, 100: Exposure device (lithography device)
Claims
1. A force transmission device for transmitting force between a first structure and a second structure, A force line connecting the first structure and the second structure, A first guide member that guides the first portion of the aforementioned force line in a curved shape, A second guide member that guides the second portion of the aforementioned force line in a curved manner, Equipped with, A force transmission device characterized in that the force lines are guided by the first guide member and the second guide member such that the direction of the torsional stress generated in the first part and the direction of the torsional stress generated in the second part are opposite to each other.
2. The force transmission device according to claim 1, characterized in that the force line is guided by the first guide member and the second guide member such that the difference between the magnitude of the torsional stress generated in the first part and the magnitude of the torsional stress generated in the second part is reduced.
3. The force transmission device according to claim 1, characterized in that the force line is guided by the first guide member and the second guide member such that the magnitude of the torsional stress generated in the second part is within the range of 50% to 150% of the magnitude of the torsional stress generated in the first part.
4. The force transmission device according to claim 1, characterized in that the first portion is wound around the first guide member and the second portion is wound around the second guide member.
5. The force transmission device according to claim 4, characterized in that the first portion is wound around the first guide member with respect to a first axis, and the second portion is wound around the second guide member with respect to a second axis parallel to the first axis.
6. The force transmission device according to claim 4, characterized in that the first portion is wound around the first guide member with respect to a first axis, and the second portion is wound around the second guide member with respect to a second axis intersecting the first axis.
7. The power transmission device according to claim 1, characterized in that the first guide member and the second guide member are provided in the first structure.
8. The first structure further includes a fixing member for fixing a portion of the force lines, The aforementioned force line has an end connected to the second structure, and the second portion is closer to the end than the first portion. The force transmission device according to claim 1, characterized in that a portion of the force line fixed to the first structure by the fixing member is located between the second portion and the end portion.
9. The force transmission device according to claim 1, characterized in that each of the first guide member and the second guide member guides the force line such that the direction of the force line is changed by an angle between 90° and 180°.
10. The power transmission device according to claim 1, characterized in that the first structure and the second structure are arranged via a vibration reduction mechanism.
11. A third guide member that guides the third portion of the aforementioned force line in a curved manner, A fourth guide member that guides the fourth portion of the aforementioned force line in a curved manner, Furthermore, The force transmission device according to claim 1, characterized in that the force lines are guided by the third guide member and the fourth guide member such that the direction of the torsional stress generated in the third portion and the direction of the torsional stress generated in the fourth portion are opposite to each other.
12. The first structure further comprises a housing that accommodates at least a portion of the first structure, The power transmission device according to claim 1, characterized in that the first guide member is arranged inside the housing and the second guide member is arranged outside the housing.
13. The power transmission device according to claim 12, characterized in that the first structure is a heating element.
14. A fifth guide member is further provided between the second guide member and the second structure 4 to guide the force line, The force transmission device according to claim 1, characterized in that the force lines are guided such that a torsional stress is generated in the second portion of the force lines in the opposite direction to the direction of the torsional stress generated in the fifth portion between the fifth guide member and the second structure.
15. The force transmission device according to claim 14, characterized in that the force lines are guided such that at least a portion of the sum of the torsional stress generated in the first part and the torsional stress generated in the fifth part is offset by the torsional stress generated in the second part.
16. The force transmission device according to claim 1, characterized in that the force line is a flexible cable and / or tube.
17. A lithography apparatus for forming patterns on a substrate, A lithography apparatus comprising a first structure, a second structure, and a force transmission device according to any one of claims 1 to 16 for transmitting force between the first structure and the second structure.
18. A forming step of forming a pattern on a substrate using the lithography apparatus described in claim 17, A processing step for processing the substrate on which the pattern has been formed in the forming step, A manufacturing process for producing an article from the substrate processed in the above-mentioned processing step, A method for manufacturing articles, characterized by including the following: