Display device, method for manufacturing a display device, and electronic device
The display device achieves uniform thickness of the light-emitting layer through a substrate, pixel electrode, and counter electrode configuration, enhancing luminous efficiency by maintaining even electric field distribution and consistent light emission.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- SAMSUNG DISPLAY CO LTD
- Filing Date
- 2025-12-22
- Publication Date
- 2026-07-08
AI Technical Summary
Conventional display devices face issues with forming a problem in that the thickness of the light-emitting layer is non-uniform, which can result in uneven luminous efficiency and the luminous efficiency and the luminous efficiency is uneven, resulting in unevenness of the luminous efficiency and the luminous efficiency and the luminous efficiency and the luminous efficiency is uneven, resulting in unevenness of the luminous efficiency and the luminous efficiency is uneven.
A display device with a substrate, a planarization layer, a pixel electrode, a light-emitting layer, and a counter electrode, where the pixel definition film defines pixel apertures to ensure a uniform thickness of the light-emitting layer, and a flattening auxiliary layer is used to maintain flat surfaces.
The uniform thickness of the light-emitting layer improves luminous efficiency by ensuring even electric field distribution and consistent light emission.
Smart Images

Figure 2026114999000001_ABST
Abstract
Description
[Technical Field]
[0001] The present invention relates to a display device, a method for manufacturing a display device, and an electronic device, and more particularly to a display device, a method for manufacturing a display device, and an electronic device in which the luminous efficiency is improved by having a light-emitting layer of uniform thickness. [Background technology]
[0002] Electronic devices include display devices that can provide users with visual information such as images or pictures to support a variety of functions. Such display devices have display elements such as organic light-emitting diodes and thin-film transistors formed on a substrate, and the display elements operate to emit light. Specifically, the display elements include a light-emitting layer between a pixel electrode and a counter electrode. If the thickness of the light-emitting layer of such a display element is non-uniform, the electric field applied to the light-emitting layer becomes non-uniform, reducing the light-emitting area and consequently lowering the luminous efficiency. [Prior art documents] [Patent Documents]
[0003] [Patent Document 1] Japanese Patent Publication No. 2014-072015 [Overview of the project] [Problems that the invention aims to solve]
[0004] However, conventional display devices have a problem in that forming the light-emitting layer within the aperture of the pixel definition film can result in uneven thickness of the light-emitting layer, potentially reducing luminous efficiency.
[0005] The present invention aims to solve several problems, including those described above, and to provide a display device, a method for manufacturing a display device, and an electronic device in which the luminous efficiency is improved by having a uniform thickness of the light-emitting layer. However, these problems are illustrative and do not limit the scope of the present invention. [Means for solving the problem]
[0006] According to one aspect of the present invention, a display device is provided, comprising: a substrate; a planarization layer disposed on the substrate; a first pixel electrode disposed on the planarization layer; a light-emitting layer disposed on the first pixel electrode; a counter electrode disposed on the light-emitting layer; and a pixel defining film interposed between the light-emitting layer and the counter electrode, which defines a first pixel aperture that overlaps with the first pixel electrode when viewed from a direction perpendicular to the substrate.
[0007] A portion of the light-emitting layer is positioned between a portion of the pixel definition film adjacent to the first pixel aperture and a portion of the first pixel electrode, while another portion of the light-emitting layer is positioned between a portion of the counter electrode overlapping the first pixel aperture and another portion of the first pixel electrode.
[0008] The display device further comprises a second pixel electrode disposed on the planarization layer away from the first pixel electrode, and a third pixel electrode disposed on the planarization layer via the first pixel electrode so as to be in the opposite direction to the second pixel electrode, the light-emitting layer is disposed across the first pixel electrode, the second pixel electrode, and the third pixel electrode, the pixel defining film defines a second pixel aperture and a third pixel aperture, the second pixel aperture overlaps the second pixel electrode when viewed from a direction perpendicular to the substrate, and the third pixel aperture overlaps the third pixel electrode when viewed from a direction perpendicular to the substrate.
[0009] A portion of the light-emitting layer is positioned between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode.
[0010] The display device further includes a sealing layer disposed on the counter electrode and including at least one inorganic layer and at least one organic layer; a light-shielding wall portion disposed on the sealing layer and defining a first color conversion opening overlapping with the first pixel opening, a second color conversion opening overlapping with the second pixel opening, and a third color conversion opening overlapping with the third pixel opening; a first color conversion layer disposed in the first color conversion opening; a second color conversion layer disposed in the second color conversion opening; and a light-transmitting layer disposed in the third color conversion opening.
[0011] The display device further includes a sealing layer disposed on the counter electrode and including at least one inorganic layer and at least one organic layer; a light-shielding wall portion disposed on the sealing layer and defining a first color conversion opening overlapping with the first pixel opening, a second color conversion opening overlapping with the second pixel opening, and a third color conversion opening overlapping with the third pixel opening; a first color filter layer disposed in the first color conversion opening; a second color filter layer disposed in the second color conversion opening; and a third color filter layer disposed in the third color conversion opening.
[0012] The display device further includes a flattening auxiliary layer disposed on the flattening layer between the first pixel electrode and the second pixel electrode and between the first pixel electrode and the third pixel electrode.
[0013] The flattening auxiliary layer is in direct contact with the flattening layer, and a part of the light-emitting layer disposed between the first pixel electrode and the second pixel electrode and between the first pixel electrode and the third pixel electrode is in direct contact with the flattening auxiliary layer.
[0014] The upper surface of the flattening auxiliary layer, the upper surface of the first pixel electrode, the upper surface of the second pixel electrode, and the upper surface of the third pixel electrode form flat surfaces.
[0015] The flattening auxiliary layer includes the same material as the material included in the flattening layer.
[0016] The display device further comprises a second pixel electrode disposed on the planarization layer away from the first pixel electrode, and a third pixel electrode disposed on the planarization layer via the first pixel electrode so as to be located in the opposite direction to the second pixel electrode, the light-emitting layer includes a first light-emitting layer, a second light-emitting layer and a third light-emitting layer disposed apart from each other, the first light-emitting layer disposed between the first pixel electrode and the counter electrode, the second light-emitting layer disposed between the second pixel electrode and the counter electrode, and the third light-emitting layer disposed between the third pixel electrode and the counter electrode, the pixel defining film defines a second pixel aperture and a third pixel aperture, the second pixel aperture overlapping the second pixel electrode when viewed from a direction perpendicular to the substrate, and the third pixel aperture overlapping the third pixel electrode when viewed from a direction perpendicular to the substrate.
[0017] A portion of the pixel definition film, which is positioned between the first light-emitting layer and the second light-emitting layer, and between the first light-emitting layer and the third light-emitting layer, is in direct contact with the planarization layer.
[0018] The display device further includes a planarization auxiliary layer disposed on the planarization layer between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, wherein the planarization auxiliary layer is in direct contact with the planarization layer, and a portion of the pixel definition film disposed between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, is in direct contact with the planarization layer.
[0019] The upper surface of the planarization auxiliary layer, the upper surface of the first pixel electrode, the upper surface of the second pixel electrode, and the upper surface of the third pixel electrode form a flat surface.
[0020] The planarization auxiliary layer contains the same substance as the substance contained in the planarization layer.
[0021] According to one aspect of the present invention, the present invention includes the steps of forming a first pixel electrode on a planarization layer formed on a substrate, forming a light-emitting layer on the first pixel electrode, forming a pixel definition film on the light-emitting layer, and forming a counter electrode on the pixel definition film, wherein the step of forming the pixel definition film is to form the pixel definition film such that, when the pixel definition film is viewed from a direction perpendicular to the substrate, it defines a first pixel aperture that overlaps with the first pixel electrode.
[0022] The step of forming the pixel definition film is to form the pixel definition film such that a portion of the light-emitting layer is positioned between a portion of the pixel definition film adjacent to the first pixel aperture and a portion of the first pixel electrode, and the step of forming the counter electrode is to form the counter electrode such that another portion of the light-emitting layer is positioned between a portion of the counter electrode overlapping the first pixel aperture and another portion of the first pixel electrode.
[0023] The step of forming the first pixel electrode includes forming a second pixel electrode on the planarization layer, which is separated from the first pixel electrode, and a third pixel electrode located in the opposite direction to the second pixel electrode via the first pixel electrode; the step of forming the light-emitting layer includes forming the light-emitting layer integrally across the first pixel electrode, the second pixel electrode, and the third pixel electrode; and the step of forming the pixel definition film includes applying a pixel definition film forming material between the central part of the first pixel electrode and the central part of the second pixel electrode, and between the central part of the first pixel electrode and the central part of the third pixel electrode by an inkjet printing method, and then heat-treating the pixel definition film forming material to form the pixel definition film.
[0024] The method for manufacturing the display device further includes the step of forming a preliminary planarization auxiliary layer so as to cover the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the preliminary planarization auxiliary layer to form a planarization auxiliary layer whose upper surface forms a surface flat with the upper surface of the first pixel electrode, the second pixel electrode, and the third pixel electrode, wherein the step of forming the planarization auxiliary layer is performed between the step of forming the first pixel electrode and the step of forming the light-emitting layer.
[0025] The step of forming the first pixel electrode includes forming a second pixel electrode on the planarization layer, which is separated from the first pixel electrode, and a third pixel electrode located in the opposite direction to the second pixel electrode via the first pixel electrode; the step of forming the light-emitting layer includes forming a pre-light-emitting layer integrally across the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the pre-light-emitting layer formed on the planarization layer between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, to form the light-emitting layer; and the step of forming the pixel definition film includes applying a pixel definition film-forming material between the central part of the first pixel electrode and the central part of the second pixel electrode, and between the central part of the first pixel electrode and the central part of the third pixel electrode by an inkjet printing method, and then heat-treating the pixel definition film-forming material to form the pixel definition film.
[0026] The method for manufacturing the display device further includes the step of forming a preliminary planarization auxiliary layer so as to cover the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the preliminary planarization auxiliary layer to form a planarization auxiliary layer whose upper surface forms a surface flat with the upper surface of the first pixel electrode, the second pixel electrode, and the third pixel electrode, wherein the step of forming the planarization auxiliary layer is performed between the step of forming the first pixel electrode and the step of forming the light-emitting layer.
[0027] According to one aspect of the present invention, an electronic device is provided which includes a display device and a housing that houses the display device and forms its appearance, wherein the display device comprises a substrate, a planarization layer disposed on the substrate, a first pixel electrode disposed on the planarization layer, a light-emitting layer disposed on the first pixel electrode, a counter electrode disposed on the light-emitting layer, and a pixel defining film interposed between the light-emitting layer and the counter electrode, which defines a first pixel aperture that overlaps with the first pixel electrode when viewed from a direction perpendicular to the substrate.
[0028] Other aspects, features, and advantages not mentioned above will become apparent from the specific details for carrying out the invention, the claims, and the drawings below. [Effects of the Invention]
[0029] As described above, according to one embodiment of the present invention, a display device, a method for manufacturing a display device, and an electronic device can be realized in which the light-emitting layer has a uniform thickness, thereby improving the luminous efficiency. Needless to say, the scope of the present invention is not limited by such effects. [Brief explanation of the drawing]
[0030] [Figure 1] This is a schematic perspective view of an electronic device according to one embodiment of the present invention. [Figure 2] This is a schematic plan view showing a display device according to one embodiment of the present invention. [Figure 3] Figure 2 is an equivalent circuit diagram of a single pixel circuit included in the display device. [Figure 4] This is a schematic plan view showing an enlarged view of portion A of the display device in Figure 2. [Figure 5] This is a schematic cross-sectional view of the display device shown in Figure 4, taken along the line I-I'. [Figure 6] This is a schematic cross-sectional view showing an enlarged view of portion B of the display device in Figure 5. [Figure 7] This figure illustrates a first color conversion layer, a second color conversion layer, and a light transmission layer included in a display device according to one embodiment of the present invention. [Figure 8] This is a schematic cross-sectional view showing a display device according to one embodiment of the present invention. [Figure 9] This is a schematic cross-sectional view showing a display device according to one embodiment of the present invention. [Figure 10] This is a schematic cross-sectional view showing a display device according to one embodiment of the present invention. [Figure 11] Figure 5 is a schematic cross-sectional view showing part of the manufacturing process of the display device. [Figure 12] Figure 5 is a schematic cross-sectional view showing part of the manufacturing process of the display device. [Figure 13] Figure 5 is a schematic cross-sectional view showing part of the manufacturing process of the display device. [Figure 14] Figure 5 is a schematic cross-sectional view showing part of the manufacturing process of the display device. [Figure 15] Figure 5 is a schematic cross-sectional view showing part of the manufacturing process of the display device. [Figure 16] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 17] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 18] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 19] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 20] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 21] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 22] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 23] This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 24]This is a schematic cross-sectional view illustrating a method for manufacturing a display device according to one embodiment of the present invention. [Figure 25] This is a schematic cross-sectional view showing a display device according to one embodiment of the present invention. [Modes for carrying out the invention]
[0031] The present invention can be subjected to various transformations and has a variety of embodiments. Specific embodiments are illustrated in the drawings and described in detail in the detailed description. The effects and features of the present invention, and how they are achieved, will become clear with reference to the embodiments described in detail below, along with the drawings. However, the present invention is not limited to the embodiments disclosed below and can be embodied in a variety of forms.
[0032] In this specification, terms such as "first," "second," etc., are not used in a restrictive sense, but rather to distinguish one component from other components.
[0033] As used herein, singular expressions include plural expressions unless they imply a clearly different meaning in context.
[0034] In this specification, terms such as “includes” or “having” mean that the features or components described in the specification are present, and do not preclude the possibility that one or more other features or components may be added.
[0035] In this specification, "A and / or B" means that it is either A, B, or both A and B. And "at least one of A and B" means that it is either A, B, or both A and B.
[0036] In this specification, when various components such as layers, films, regions, and plates are said to be "on top of" other components, this includes not only cases where they are "directly on top of" other components, but also cases where other components are interposed between them.
[0037] In this specification, when we say that membranes, regions, components, etc. are connected, this includes cases where membranes, regions, components are directly connected, and / or indirectly connected with other membranes, regions, components interposed between them. For example, when we say that membranes, regions, components, etc. are electrically connected in this specification, this refers to cases where membranes, regions, components are directly and electrically connected, and / or indirectly and electrically connected with other membranes, regions, components, etc. interposed between them.
[0038] In this specification, the x-axis, y-axis, and z-axis are not limited to the three axes on a Cartesian coordinate system, but can be interpreted in a broader sense that includes them. For example, the x-axis, y-axis, and z-axis may be orthogonal to each other, but they may also refer to directions that are not orthogonal to each other and are distinct from each other.
[0039] In this specification, where an embodiment can be embodied in a different way, a particular sequence of steps may be performed in a different order than that described. For example, two steps described consecutively may be performed substantially simultaneously, or in the reverse order of the description.
[0040] In this specification, "on a plane" means when the part in question is viewed from above. That is, "on a plane" in this specification means "when viewed from a direction perpendicular to the substrate 100." In other words, "on a plane" means "in a plan view," "in a top view," "in a plan view perpendicular to the plane of the substrate 100," etc.
[0041] Embodiments of the present invention will be described in detail below with reference to the attached drawings. When referring to the drawings, the same or corresponding components will be denoted by the same reference numerals, and redundant explanations will be omitted. Also, for the sake of clarity, the sizes of components may be exaggerated or reduced in the drawings. For example, the sizes and thicknesses of each component shown in the drawings are shown arbitrarily for the sake of clarity, and the present invention is not necessarily limited to what is shown.
[0042] Figure 1 is a schematic perspective view showing an electronic device 2 according to one embodiment of the present invention. Figure 2 is a schematic plan view showing a display device 1 according to one embodiment of the present invention.
[0043] As shown in Figures 1 and 2, the display device 1 is a device that displays moving images or still images, and the electronic device 2 displays the screen and inputs and outputs data.
[0044] Figure 1 shows an embodiment in which the display device 1 is used in a mobile phone, but the present invention is not limited to this. For example, the display device 1 can be used not only in portable electronic devices such as mobile phones, smartphones, tablet personal computers, mobile communication terminals, electronic organizers, e-books, PMPs (portable multimedia players), navigation systems, and UMPCs (Ultra Mobile PCs), but also as a display screen for various electronic devices such as televisions, laptops, monitors, billboards, and Internet of Things (IoT) devices.
[0045] In one embodiment, the display device 1 is used in electronic devices such as smartwatches, watch phones, eyeglasses displays, and wearable devices such as head-mounted displays (HMDs). In one embodiment, the display device 1 is used as a display for various electronic devices, for example, an instrument panel in a car, a Center Information Display (CID) located in the center fascia or dashboard of a car, a room mirror display replacing a side mirror in a car, and a display located on the back of the front seat as entertainment for the rear seats of a car.
[0046] In one embodiment, the display device 1 is housed in a housing 3 of an electronic device 2. The housing 3 protects internal components such as the display device 1 and can also be a cover that forms the exterior of the electronic device 2. The display device 1 is connected to an electronic module of the electronic device 2 and is driven on the electronic device 2. The following description will focus on the display device 1.
[0047] As shown in Figure 2, the display device 1 includes a display area DA in which multiple pixels PX are arranged, and a peripheral area PA located outside the display area DA. Specifically, the peripheral area PA completely surrounds the display area DA. This can be understood as the substrate 100 (see Figure 5) containing the display device having its display area DA and peripheral area PA.
[0048] Each pixel PX of the display device 1 is a region capable of emitting light of a predetermined color, and the display device 1 can provide an image using the light emitted from the pixels PX. For example, each pixel PX emits red light, green light, or blue light.
[0049] The display area DA may have a polygonal shape, including a rectangle, as shown in Figure 2. For example, the display area DA may have a rectangular shape where the horizontal length is longer than the vertical length, or a rectangular shape where the horizontal length is shorter than the vertical length, or a square shape. Alternatively, the display area DA may have various shapes such as an ellipse or a circle.
[0050] The peripheral region PA may be a non-display area where no pixels PX are located. Drivers and other components for providing electrical signals and power to pixels PX may be located in the peripheral region PA. Pads (not shown) to which various electronic components and printed circuit boards can be electrically connected are located in the peripheral region PA. Each pad is located apart from the others in the peripheral region PA and is electrically connected to the printed circuit board or integrated circuit elements.
[0051] Figure 3 is an equivalent circuit diagram of a pixel circuit PC included in a display device 1 according to one embodiment of the present invention. The pixel circuit PC is electrically connected to a display element, and one display element corresponds to one pixel PX. In Figure 3, an organic light-emitting diode (OLED) is shown as the display element.
[0052] The pixel circuit PC includes a first transistor T1, a second transistor T2, and a storage capacitor (sometimes called a storage condenser) Cst. The second transistor T2 is a switching transistor connected to the scan line SL and the data line DL. It is turned on by a switching signal input from the scan line SL and transmits the data signal input from the data line DL to the first transistor T1. The storage capacitor Cst has one end electrically connected to the second transistor T2 and the other end electrically connected to the drive voltage line PL. It stores a voltage equivalent to the difference between the voltage transmitted from the second transistor T2 and the drive power supply voltage ELVDD supplied to the drive voltage line PL.
[0053] The first transistor T1 is a drive transistor connected to the drive voltage line PL and the storage capacitor Cst, and controls the magnitude of the drive current flowing from the drive voltage line PL to the organic light-emitting diode (OLED) in accordance with the voltage value stored in the storage capacitor Cst. The organic light-emitting diode (OLED) emits light with a predetermined brightness according to the drive current. The counter electrode of the organic light-emitting diode (OLED) is supplied with the electrode power supply voltage ELVSS.
[0054] Figure 3 illustrates a case where the pixel circuit PC includes two transistors and one storage capacitor, but the present invention is not limited thereto. For example, the number of transistors or storage capacitors can be varied depending on the design of the pixel circuit PC.
[0055] Figure 4 is a schematic plan view showing an enlarged view of portion A of the display device 1 in Figure 2. For convenience, Figure 4 shows a plan view on the pixel definition film 119. However, for the sake of explanation, the pixel electrodes located beneath the pixel definition film 119 are also shown.
[0056] As described above, the display area DA has multiple pixels PX arranged within it. Each pixel PX emits red, green, or blue light. Each pixel PX corresponds to a display element such as an organic light-emitting diode. Specifically, each of the multiple display elements included in the display device 1 corresponds to each pixel PX of the display device 1, and each of the multiple display elements emits light. In this specification, when one display element corresponds to one pixel, or when one pixel corresponds to one display element, it means that one pixel is the light-emitting area of one display element.
[0057] As shown in Figure 4, a pixel PX is a first pixel PX1 that emits green light, a second pixel PX2 that emits red light, or a third pixel PX3 that emits blue light. In other words, multiple pixels PX include the first pixel PX1, the second pixel PX2, and the third pixel PX3. Green light is light belonging to the wavelength band from 495 nm to 580 nm, red light is light belonging to the wavelength band from 580 nm to 780 nm, and blue light is light belonging to the wavelength band from 400 nm to 495 nm.
[0058] The stacked structure of pixel electrodes, a light-emitting layer, and counter electrodes forms a single display element, such as an organic light-emitting diode. For example, multiple pixel electrodes are arranged on a display area DA of a substrate 100. The multiple pixel electrodes may be arranged apart from each other on a plane. For example, the first pixel electrode 211 and the second pixel electrode 212 are arranged apart from each other along a first direction (e.g., the x-axis direction), and the third pixel electrode 213 is positioned opposite to the second pixel electrode 212 in the first direction, with the first pixel electrode 211 in between. A light-emitting layer 220 is arranged on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0059] The pixel definition film 119 is positioned above the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Specifically, the pixel definition film 119 is positioned on top of the light-emitting layer 220. The pixel definition film 119 defines the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13. On a plane, the first pixel aperture OP11 overlaps with the first pixel electrode 211. On a plane, the second pixel aperture OP12 overlaps with the second pixel electrode 212, and the third pixel aperture OP13 overlaps with the third pixel electrode 213. As a result, the first pixel aperture OP11 can expose the light-emitting layer 220 positioned above the center of the first pixel electrode 211. Similarly, the second pixel aperture OP12 exposes a light-emitting layer 220 located on the center of the second pixel electrode 212, and the third pixel aperture OP13 exposes a light-emitting layer 220 located on the center of the third pixel electrode 213. Although not shown in Figure 4, counter electrodes may be located on these light-emitting layers 220.
[0060] As a result, one pixel aperture of the pixel definition film 119 can define the light-emitting region of one display element. The light-emitting region defined by the pixel aperture can be defined as a pixel PX. For example, the light-emitting region defined by the first pixel aperture OP11 can be defined as the first pixel PX1. Similarly, the light-emitting region defined by the second pixel aperture OP12 can be defined as the second pixel PX2, and the light-emitting region defined by the third pixel aperture OP13 can be defined as the third pixel PX3. On the other hand, although Figure 4 shows the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13 as having the same size, the present invention is not limited to this. The first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13 may have different sizes from each other.
[0061] On the other hand, although Figure 4 shows only one first pixel PX1, one second pixel PX2, and one third pixel PX3, the present invention is not limited thereto. The first pixel PX1, the second pixel PX2, and the third pixel PX3 can be repeatedly arranged along a first direction (e.g., the x-axis direction) or a second direction (e.g., the y-axis direction). For example, with reference to Figure 4, the second pixel PX2 is positioned in the +x direction of the third pixel PX3, and the third pixel PX3 is positioned in the -x direction of the second pixel PX2. Therefore, the display elements corresponding to the first pixel PX1, the second pixel PX2, and the third pixel PX3, and the pixel circuits electrically connected to these display elements, can also be repeatedly arranged along a first direction (e.g., the x-axis direction) or a second direction (e.g., the y-axis direction).
[0062] Figure 5 is a schematic cross-sectional view showing a cross-section of the display device 1 in Figure 4 taken along the line I-I'. As shown in Figure 5, the display device 1 according to this embodiment includes a substrate 100.
[0063] The substrate 100 may contain a variety of materials having flexible or bendable properties. For example, the substrate 100 may contain glass, metal, or polymer resin. The substrate 100 may also contain polymer resins such as polyethersulfone, polyacrylate, polyetherimide, polyethylene naphthalate, polyethylene terephthalate, polyphenylene sulfide, polyarylate, polyimide, polycarbonate, or cellulose acetate propionate. Of course, the substrate 100 may consist of two layers containing these polymer resins, with silicon oxide (SiO2) interposed between these layers. X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y Various modifications are possible, such as having a multilayer structure that includes a barrier layer containing inorganic materials (e.g., inorganic materials).
[0064] Multiple display elements and multiple pixel circuits electrically connected to each of these display elements may be arranged on the substrate 100. Specifically, a first pixel circuit PC1, a second pixel circuit PC2, and a third pixel circuit PC3 are arranged on the substrate 100. The first pixel circuit PC1, the second pixel circuit PC2, and the third pixel circuit PC3 can each be electrically connected to a corresponding one of the first display element DPE1, the second display element DPE2, and the third display element DPE3.
[0065] Since the structures of the first pixel circuit PC1, the second pixel circuit PC2, and the third pixel circuit PC3 are identical, the explanation will focus on the first pixel circuit PC1. The first pixel circuit PC1 includes multiple transistor TFTs and a storage capacitor Cst. For convenience, Figure 5 shows one transistor TFT, but this transistor TFT may correspond to the first transistor T1 (see Figure 3).
[0066] Between the transistor TFT and the substrate 100 is silicon oxide SiO X Silicon nitride SiN X and / or silicon oxynitride SiO X N Y A buffer layer 111 containing inorganic materials such as may be interposed. The buffer layer 111 may serve to improve the smoothness of the upper surface of the substrate 100, or to prevent or minimize the intrusion of impurities from the substrate 100, etc., into the semiconductor layer Act of the transistor TFT.
[0067] As shown in Figure 5, the transistor TFT comprises a semiconductor layer Act containing amorphous silicon, polycrystalline silicon, an organic semiconductor material, or an oxide semiconductor material. Furthermore, the transistor TFT may include a gate electrode GE, a source electrode SE, and / or a drain electrode DE. The gate electrode GE can contain a variety of conductive materials and have a variety of layered structures, for example, a Mo layer and an Al layer. Alternatively, the gate electrode GE may contain a TiNx layer, an Al layer, and / or a Ti layer. The source electrode SE and drain electrode DE can also contain a variety of conductive materials and have a variety of layered structures, for example, a Ti layer, an Al layer, and / or a Cu layer.
[0068] To ensure the insulation between the semiconductor layer Act and the gate electrode GE, a gate insulating layer 113 containing an inorganic substance such as silicon oxide (SiO X ), silicon nitride (SiN X ), and / or silicon oxynitride (SiO X N Y ) can be interposed between the semiconductor layer Act and the gate electrode GE. In FIG. 5, the gate insulating layer 113 is shown as having a shape corresponding to the entire surface of the substrate 100 and having a structure in which contact holes are formed in preset portions, but the present invention is not limited thereto. For example, the gate insulating layer 113 is patterned in the same shape as the gate electrode GE.
[0069] Furthermore, a first interlayer insulating layer 115 containing an inorganic insulator such as silicon oxide (SiO X ), silicon nitride (SiN X ), and / or silicon oxynitride (SiO X N Y ) can be disposed on the gate electrode GE. The first interlayer insulating layer 115 has a single-layer or multilayer structure containing the above-described substances. Such an insulating layer containing an inorganic insulator can be formed by CVD (chemical vapor deposition) or ALD (atomic layer deposition). This is the same in the embodiments and their modifications described later.
[0070] The storage capacitor Cst includes a first capacitor electrode CE1 and a second capacitor electrode CE2 that overlap each other via a first interlayer insulating layer 115. The storage capacitor Cst overlaps with the transistor TFT. In this regard, Figure 5 illustrates that the gate electrode GE of the transistor TFT is the first capacitor electrode CE1 of the storage capacitor Cst, but the present invention is not limited thereto. For example, the storage capacitor Cst may not overlap with the transistor TFT. The second capacitor electrode CE2 of the storage capacitor Cst includes a conductive material such as molybdenum (Mo), aluminum (Al), copper (Cu), or titanium (Ti), and may have a multilayer or monolayer structure containing these materials.
[0071] On the second capacitor electrode CE2 of the storage capacitor Cst, silicon oxide (SiO X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y A second interlayer insulating layer 117 containing inorganic materials such as ) may be provided. The second interlayer insulating layer 117 has a single-layer or multilayer structure containing the aforementioned materials.
[0072] The source electrode SE and drain electrode DE are arranged on the second interlayer insulating layer 117. The source electrode SE and drain electrode DE may contain materials with excellent conductivity. The source electrode SE and drain electrode DE contain conductive materials such as molybdenum (Mo), aluminum (Al), copper (Cu), or titanium (Ti), and have a multilayer or single-layer structure containing these materials. For example, the source electrode SE and drain electrode DE have a Ti / Al / Ti multilayer structure.
[0073] Of course, the present invention is not limited thereto. For example, a transistor TFT may have only one of the source electrode SE and the drain electrode DE, or neither. For example, one transistor TFT may not have a drain electrode DE, and another transistor TFT connected to this transistor TFT may not have a source electrode SE, and the semiconductor layers Act of these two transistors may be connected to each other. Such a connection structure produces the same effect as when one transistor TFT also has a source electrode SE, and another transistor TFT also has a drain electrode DE, and the source electrode SE of one transistor TFT is connected to the drain electrode DE of the other transistor TFT.
[0074] As shown in Figure 5, the planarization layer 118 is positioned to cover the transistor TFT and storage capacitor Cst. In other words, the planarization layer 118 is positioned on the substrate 100. The planarization layer 118 contains an organic insulator. For example, the planarization layer 118 contains photoresist, BCB (Benzocyclobutene), polyimide, HMDSO (Hexamethyldisiloxane), PMMA (Polymethylmethacrylate), polystyrene, polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and mixtures thereof. Although not shown in Figure 5, a third interlayer insulating layer (not shown) may be further positioned below the planarization layer 118. The third interlayer insulating layer contains silicon oxide (SiO X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y Includes inorganic insulators such as ).
[0075] Multiple display elements are arranged on the flattening layer 118. Specifically, a first display element DPE1, a second display element DPE2, and a third display element DPE3 are arranged on the flattening layer 118, spaced apart from each other. For example, the first display element DPE1 and the second display element DPE2 are arranged on the flattening layer 118, spaced apart along a first direction (e.g., the x-axis direction), and the third display element DPE3 is arranged on the flattening layer 118 so as to be located in the opposite direction from the second display element DPE2 via the first display element DPE1.
[0076] The first display element DPE1 includes a first pixel electrode 211, a light-emitting layer 220, and a counter electrode 230. The second display element DPE2 includes a second pixel electrode 212, a light-emitting layer 220, and a counter electrode 230. The third display element DPE3 includes a third pixel electrode 213, a light-emitting layer 220, and a counter electrode 230. That is, the first pixel electrode 211, second pixel electrode 212, and third pixel electrode 213 provided in the first display element DPE1, second display element DPE2, and third display element DPE3, respectively, may be patterned and provided for each display element. The light-emitting layer 220 and counter electrode 230 of the first display element DPE1, second display element DPE2, and third display element DPE3 may each be provided integrally across the display elements. Alternatively, the light-emitting layers 220 and counter electrodes 230 of the first display element DPE1, the second display element DPE2, and the third display element DPE3 may be integrally provided across the entire surface of the substrate 100. The light-emitting layer 220 may be arranged between the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 and the counter electrode 230.
[0077] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 may be arranged on the planarization layer 118, separated from each other. For example, the first pixel electrode 211 and the second pixel electrode 212 may be arranged on the planarization layer 118, separated along a first direction (e.g., the x-axis direction), and the third pixel electrode 213 may be arranged on the planarization layer 118 via the first pixel electrode 211, in the opposite direction from the second pixel electrode 212.
[0078] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 each include a translucent conductive layer made of a translucent conductive oxide such as ITO, In2O3, or IZO, and a reflective layer made of a metal such as Al or Ag. For example, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 have a three-layer structure of ITO / Ag / ITO.
[0079] As shown in Figure 5, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 are electrically connected to the transistor TFT by contacting either the source electrode SE or the drain electrode DE. Specifically, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 each contact either the source electrode SE or the drain electrode DE through contact holes formed in the planarization layer 118.
[0080] A light-emitting layer 220 is placed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. That is, the light-emitting layer 220 is arranged across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Specifically, the light-emitting layer 220 is integrally provided across the entire surface of the substrate 100. As a result, the light-emitting layer 220 can be integrally provided across the first display element DPE1, the second display element DPE2, and the third display element DPE3. In other words, the light-emitting layer 220 is integrally formed across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0081] Therefore, a portion of the light-emitting layer 220 can be placed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. A portion of the light-emitting layer 220 can also be placed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Of course, a portion of the light-emitting layer 220 can also be placed between the second pixel electrode 212 and the third pixel electrode 213. Specifically, a portion of the light-emitting layer 220 can be placed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. That is, the light-emitting layer 220 can be provided so as to cover the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0082] Since the light-emitting layer 220 is integrally formed spanning the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, the light-emitting layer 220 can have a uniform thickness. Specifically, a portion of the light-emitting layer 220 placed on the first pixel electrode 211 has a uniform thickness. Similarly, a portion of the light-emitting layer 220 placed on the second pixel electrode 212 has a uniform thickness, and a portion of the light-emitting layer 220 placed on the third pixel electrode 213 also has a uniform thickness.
[0083] On the other hand, the thickness of a portion of the light-emitting layer 220 placed on the first pixel electrode 211 is greater than the thickness of the first pixel electrode 211. Similarly, the thickness of a portion of the light-emitting layer 220 placed on the second pixel electrode 212 is greater than the thickness of the second pixel electrode 212. The thickness of a portion of the light-emitting layer 220 placed on the third pixel electrode 213 is greater than the thickness of the third pixel electrode 213. For example, the thickness of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 are each approximately 100 nm, and the thickness of a portion of the light-emitting layer 220 placed on the first pixel electrode 211, the second pixel electrode 212, or the third pixel electrode 213 is greater than approximately 100 nm and less than or equal to approximately 500 nm.
[0084] The light-emitting layer 220 emits red, green, or blue light. The light-emitting layer 220 may contain organic matter, inorganic matter, or quantum dots. It may also contain organic matter and quantum dots, or inorganic matter and quantum dots. For example, the light-emitting layer 220 contains a polymer or low-molecular-weight organic substance capable of emitting light of a predetermined color (red, green, or blue). For example, the light-emitting layer 220 may contain polymeric substances such as PPV (polyphenylene vinylene) and polyfluorene. Such a light-emitting layer 220 is formed using methods such as spin coating, slit coating, or inkjet printing. However, the present invention is not limited thereto.
[0085] In one embodiment, functional layers (not shown) are arranged below and above the light-emitting layer 220. The functional layers include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and / or an electron injection layer (EIL). These functional layers may be integrated across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. These functional layers, like the light-emitting layer 220, can be formed using methods such as spin coating, slit coating, or inkjet printing, and the uniformity of film thickness that the present invention aims to solve can be ensured in the same way as with the light-emitting layer 220.
[0086] A counter electrode 230 is positioned above the light-emitting layer 220. The counter electrode 230 is integrally provided across the entire surface of the substrate 100. As a result, the counter electrode 230 can be integrally provided across the first display element DPE1, the second display element DPE2, and the third display element DPE3. In other words, the counter electrode 230 is integrally formed across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. As a result, the counter electrode 230 is positioned on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, and the light-emitting layer 220 can be interposed between the first pixel electrode 211 and the counter electrode 230, between the second pixel electrode 212 and the counter electrode 230, and between the third pixel electrode 213 and the counter electrode 230.
[0087] The counter electrode 230 includes a translucent conductive layer formed of ITO, In2O3, or IZO, and may also include a semipermeable film containing a metal such as Al or Ag. For example, the counter electrode 230 is a semipermeable film containing Mg or Ag.
[0088] A pixel definition film 119 is interposed between the light-emitting layer 220 and the counter electrode 230. As described above, the pixel definition film 119 defines the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13. When viewed from a direction perpendicular to the substrate 100, the first pixel aperture OP11 overlaps with the first pixel electrode 211. When viewed from a direction perpendicular to the substrate 100, the second pixel aperture OP12 overlaps with the second pixel electrode 212, and the third pixel aperture OP13 overlaps with the third pixel electrode 213.
[0089] As a result, as shown in Figure 6, a schematic cross-sectional view of portion B of the display device 1 in Figure 5, a portion of the light-emitting layer 220 may be positioned between a portion of the pixel definition film 119 adjacent to the first pixel aperture OP11 and a portion of the first pixel electrode 211, and another portion of the light-emitting layer 220 may be positioned between a portion of the counter electrode 230 overlapping with the first pixel aperture OP11 and another portion of the first pixel electrode 211. Similarly, a portion of the light-emitting layer 220 may be positioned between a portion of the pixel definition film 119 adjacent to the second pixel aperture OP12 and a portion of the second pixel electrode 212, and another portion of the light-emitting layer 220 may be positioned between a portion of the counter electrode 230 overlapping with the second pixel aperture OP12 and another portion of the second pixel electrode 212. A portion of the light-emitting layer 220 may be positioned between a portion of the pixel definition film 119 adjacent to the third pixel aperture OP13 and a portion of the third pixel electrode 213, while another portion of the light-emitting layer 220 may be positioned between a portion of the counter electrode 230 overlapping the third pixel aperture OP13 and another portion of the third pixel electrode 213.
[0090] The pixel definition film 119 plays a role in defining pixels by defining apertures corresponding to pixels, i.e., apertures that expose the light-emitting layer 220 located at least on the central part of the pixel electrode. The pixel definition film 119 can also increase the distance between the edge of the pixel electrode and the counter electrode 230 above the pixel electrode. This can prevent damage to display elements such as short circuits caused by electric field concentration at the edge of the pixel electrode. Such a pixel definition film 119 may include, for example, an organic material such as polyimide or HMDSO.
[0091] A sealing layer 300 is placed on the first display element DPE1, the second display element DPE2, and the third display element DPE3. Specifically, the sealing layer 300 is placed on the counter electrode 230. In other words, since the display element DPE is easily damaged by moisture, oxygen, etc. from the outside, the sealing layer 300 covers the first display element DPE1, the second display element DPE2, and the third display element DPE3, thereby protecting them.
[0092] The sealing layer 300 may include at least one inorganic layer and at least one organic layer. For example, as shown in Figure 5, the sealing layer 300 includes a first inorganic sealing layer 310, an organic sealing layer 320, and a second inorganic sealing layer 330. Specifically, the sealing layer 300, which includes a first inorganic sealing layer 310, a second inorganic sealing layer 330, and an organic sealing layer 320 interposed between them, may be placed on the counter electrode 230.
[0093] The first inorganic sealing layer 310 covers the counter electrode 230 and contains silicon oxide (SiO2). X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y ) and so on. Since such a first inorganic sealing layer 310 is formed along the structure below it, its upper surface is not flat, as shown in Figure 5. The organic sealing layer 320 covers such a first inorganic sealing layer 310, but unlike the first inorganic sealing layer 310, its upper surface can be made almost flat.
[0094] Such an organic encapsulation layer 320 comprises one or more materials selected from the group consisting of polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyimide, polyethylene sulfonate, polyoxymethylene, polyarylate, and hexamethyldisiloxane. The second inorganic encapsulation layer 330 covers the organic encapsulation layer 320 and contains silicon oxide (SiO2). X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y ) and others.
[0095] Thus, the sealing layer 300 includes a first inorganic sealing layer 310, an organic sealing layer 320, and a second inorganic sealing layer 330. This multilayer structure prevents cracks from forming between the first inorganic sealing layer 310 and the organic sealing layer 320, or between the organic sealing layer 320 and the second inorganic sealing layer 330, even if cracks occur within the sealing layer 300. This prevents or minimizes the formation of pathways through which moisture, oxygen, and other external elements can penetrate into the interior of the display device 1.
[0096] On the sealing layer 300, a light-shielding wall portion 410, a first color conversion layer 451, a second color conversion layer 452, and a light-transmitting layer 453 are arranged. The first color conversion layer 451, the second color conversion layer 452, and the light-transmitting layer 453 convert or transmit light emitted by the display element into light having a specific color. The light whose color is converted or transmitted by the first color conversion layer 451, the second color conversion layer 452, and the light-transmitting layer 453 may be green light, red light, or blue light. The first color conversion layer 451, the second color conversion layer 452, and the light-transmitting layer 453 are spaced apart from each other at regular intervals, with the light-shielding wall portion 410 positioned between them. This prevents the light-shielding wall portion 410 from causing color mixing between the light converted or transmitted by the first color conversion layer 451, the second color conversion layer 452, and the light-transmitting layer 453.
[0097] The light-shielding wall portion 410 defines a first color conversion aperture OP21, a second color conversion aperture OP22, and a third color conversion aperture OP23. The first color conversion aperture OP21 overlaps with the first pixel aperture OP11, the second color conversion aperture OP22 overlaps with the second pixel aperture OP12, and the third color conversion aperture OP23 overlaps with the third pixel aperture OP13. As a result, the first color conversion aperture OP21 can correspond to the first display element DPE1, the second color conversion aperture OP22 can correspond to the second display element DPE2, and the third color conversion aperture OP23 can correspond to the third display element DPE3.
[0098] The light-shielding wall portion 410 can be various colors, including black, white, red, purple, and blue. The light-shielding wall portion 410 contains a colored pigment or dye. The light-shielding wall portion 410 contains a light-shielding material, which includes an opaque inorganic insulating material containing metal oxides such as titanium dioxide (TiO2), chromium oxide (Cr2O3), or molybdenum oxide (MoO3), or an opaque organic insulating material such as black resin. As another example, the light-shielding wall portion 410 contains an organic insulating material such as white resin.
[0099] The first color conversion layer 451 is located within the first color conversion aperture OP21, the second color conversion layer 452 is located within the second color conversion aperture OP22, and the light transmission layer 453 is located within the third color conversion aperture OP23. As shown in Figure 7, which illustrates the first color conversion layer 451, the second color conversion layer 452, and the light transmission layer 453 included in the display device 1 according to one embodiment of the present invention, incident light Lib is incident on the first color conversion layer 451, the second color conversion layer 452, and the light transmission layer 453. The incident light Lib is light emitted from the first display element DPE1, the second display element DPE2, and the third display element DPE3. For example, the incident light Lib is blue light having a wavelength band of 400 nm or more and less than 495 nm. The incident light Lib emitted from the display elements is converted or transmitted as green light, red light, and blue light by passing through the first color conversion layer 451, the second color conversion layer 452, and the light transmission layer 453, and the display device 1 can generate a color image.
[0100] Specifically, the first color conversion layer 451 can convert blue incident light Lib into green light Lg. For this purpose, the first color conversion layer 451 includes a first photosensitive polymer 451a in which first quantum dots 451b are dispersed.
[0101] The first photosensitive polymer 451a is a light-transmitting organic material such as a silicone resin or epoxy resin. The first quantum dot 451b is excited by blue incident light Lib and isotropically emits green light Lg having a wavelength longer than the wavelength of blue light. The first quantum dot 451b contains a group II-group VI compound, a group III-group V compound, a group IV-group VI compound, a group IV compound, or any combination thereof.
[0102] Further dispersion of first scattering particles 451c can be found within the first photosensitive polymer 451a. The first scattering particles 451c scatter blue incident light Lib that was not absorbed by the first quantum dots 451b, thereby increasing the contribution of more first quantum dots 451b and improving the color conversion efficiency of the first color conversion layer 451. The first scattering particles 451c are, for example, titanium dioxide (TiO2) or metal particles.
[0103] The second color conversion layer 452 converts blue incident light Lib into red light Lr. The second color conversion layer 452 contains a second photosensitive polymer 452a in which second quantum dots 452b are dispersed, and second scattering particles 452c are dispersed within the second photosensitive polymer 452a together with the second quantum dots 452b, thereby improving the color conversion rate of the second color conversion layer 452.
[0104] The second photosensitive polymer 452a contains the same material as the first photosensitive polymer 451a, and the second scattering particle 452c contains the same material as the first scattering particle 451c. The second quantum dot 452b contains a group II-group VI compound, a group III-group V compound, a group IV-group VI compound, a group IV compound, or any combination thereof. In other words, the second quantum dot 452b is made of the same material as the first quantum dot 451b. However, the size of the second quantum dot 452b is larger than that of the first quantum dot 451b. As a result, the second quantum dot 452b can be excited by blue incident light Lib and emit red light Lr isotropically, which has a wavelength longer than the wavelength of blue light and longer than the wavelength of green light Lg.
[0105] The light-transmitting layer 453 contains a third photosensitive polymer 453a in which third scattering particles 453c are dispersed. That is, the light-transmitting layer 453 does not contain other quantum dots excited by the blue incident light Lib. On the other hand, the third photosensitive polymer 453a is formed of an organic material that has light-transmitting properties, similar to the first photosensitive polymer 451a, and the third scattering particles 453c contain the same material as the first scattering particles 451c. Therefore, the blue incident light Lib incident on the light-transmitting layer 453 can pass through the light-transmitting layer 453 without a change in color, and the light emitted through the light-transmitting layer 453 can be blue light Lb. However, the blue incident light Lib is scattered by the third scattering particles 453c within the light-transmitting layer 453 and emitted to the outside. The light-transmitting layer 453 can obtain higher light efficiency by transmitting the incident blue incident light Lib without a change in color.
[0106] A capping layer 470 is placed on top of the first color conversion layer 451, the second color conversion layer 452, and the light transmission layer 453. As a result, the first color conversion layer 451, the second color conversion layer 452, the light transmission layer 453, and the capping layer 470 are interposed between the sealing layer 300 and the capping layer 470. The capping layer 470 may be formed to cover the first color conversion layer 451, the second color conversion layer 452, and the light transmission layer 453. The capping layer 470 is made of silicon oxide (SiO2). X ), silicon nitride (SiN X ) and / or silicon oxynitride (SiO X N Y It contains inorganic substances such as ).
[0107] Since the quantum dots contained in the first color conversion layer 451 and the second color conversion layer 452 are composed of nanoparticles, they may degrade by reacting with moisture or oxygen. The sealing layer 300 and the capping layer 470 can cover the first color conversion layer 451 and the second color conversion layer 452 from above and below to prevent moisture or oxygen from entering the quantum dots within the first color conversion layer 451 and the second color conversion layer 452.
[0108] In Figure 5, the display elements and color conversion layer of the display device 1 are formed on a single substrate, but the present invention is not limited to this. For example, the display elements and sealing layer 300 may be formed on a lower substrate, and the color conversion layer and light-shielding wall portion 410 may be formed on an upper substrate, and then these may be bonded together to form the display device 1.
[0109] Figure 8 is a schematic cross-sectional view showing a display device 1 according to one embodiment of the present invention. Since the display device 1 according to this embodiment is similar to the display device 1 described above with reference to Figures 1 to 7, the following explanation will focus on the differences from the display device 1 described above with reference to Figures 1 to 7. In Figure 8, the same reference numerals as in Figures 1 to 7 indicate the same components, and redundant explanations will be omitted.
[0110] In the case of the display device 1 according to the embodiment described above with reference to Figures 1 to 7, a portion of the light-emitting layer 220 may be placed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Specifically, a portion of the light-emitting layer 220 is placed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. In the case of the display device 1 according to this embodiment, a portion of the light-emitting layer 220 may also be placed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213.
[0111] In the display device 1 according to the embodiment described above with reference to Figures 1 to 7, a portion of the light-emitting layer 220 disposed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, may be in direct contact with the planarization layer 118. However, as shown in Figure 8, in the display device 1 according to this embodiment, a portion of the light-emitting layer 220 disposed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, is not in direct contact with the planarization layer 118.
[0112] Specifically, the display device 1 according to this embodiment includes a planarization auxiliary layer 118A. The planarization auxiliary layer 118A is disposed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, and the planarization auxiliary layer 118A is in direct contact with the planarization layer 118. In this case, a portion of the light-emitting layer 220 disposed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213 is in direct contact with the planarization auxiliary layer 118A. That is, the planarization auxiliary layer 118A is interposed between the planarization layer 118 and the light-emitting layer 220.
[0113] The upper surface of this planarization auxiliary layer 118A forms a flat surface with the upper surfaces of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. That is, the upper surface of the planarization auxiliary layer 118A, the upper surface of the first pixel electrode 211, the upper surface of the second pixel electrode 212, and the upper surface of the third pixel electrode 213 form a flat surface, that is, they are approximately flush. As a result, the light-emitting layer 220, which is integrally formed spanning the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, can have a more uniform thickness. In other words, the first, second, and third pixel electrodes 211, 212, and 213 are formed on the planarization layer 118, and the planarization auxiliary layer 118A is formed between the first, second, and third pixel electrodes 211, 212, and 213 on the planarization layer 118. At this time, the planarization auxiliary layer 118A is formed so that it fills the spaces between the first, second, and third pixel electrodes 211, 212, and 213, and the upper surfaces of the first, second, and third pixel electrodes 211, 212, and 213 and the upper surface of the planarization auxiliary layer 118A are approximately flush. Therefore, the light-emitting layer 220 can be formed with a generally uniform thickness over the first, second, and third pixel electrodes 211, 212, and 213 and the planarization auxiliary layer 118A.
[0114] Furthermore, the planarization auxiliary layer 118A contains the same substances as the planarization layer 118. Specifically, the planarization auxiliary layer 118A contains organic insulators. For example, the planarization auxiliary layer 118A includes photoresist, BCB (Benzocyclobutene), polyimide, HMDSO (Hexamethyldisiloxane), PMMA (Polymethylmethacrylate), polystyrene, polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and mixtures thereof.
[0115] Figure 9 is a schematic cross-sectional view showing a display device 1 according to one embodiment of the present invention. Since the display device 1 according to this embodiment is similar to the display device 1 described above with reference to Figures 1 to 7, the following explanation will focus on the differences from the display device 1 described above with reference to Figures 1 to 7. In Figure 9, the same reference numerals as in Figures 1 to 7 indicate the same components, and redundant explanations will be omitted.
[0116] In the case of the display device 1 according to the embodiment described above with reference to Figures 1 to 7, a portion of the light-emitting layer 220 can be arranged on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. In the case of the display device 1 according to this embodiment, a portion of the light-emitting layer 220 can also be arranged on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213.
[0117] In the case of the display device 1 according to the embodiment described above with reference to Figures 1 to 7, the light-emitting layer 220 may be integrally provided over the entire surface of the substrate 100. However, as shown in Figure 9, in the case of the display device 1 according to this embodiment, the light-emitting layer 220 is not integrally provided over the entire surface of the substrate 100. That is, the light-emitting layer 220 may be provided only on a part of the planarization layer 118 arranged on the substrate 100. Specifically, the light-emitting layer 220 includes a plurality of sub-light-emitting layers. The plurality of sub-light-emitting layers are separated from each other and arranged on the planarization layer 118.
[0118] For example, the light-emitting layer 220 includes a first light-emitting layer 221, a second light-emitting layer 222, and a third light-emitting layer 223. The first light-emitting layer 221, the second light-emitting layer 222, and the third light-emitting layer 223 are spaced apart from each other and arranged on the planarization layer 118. The first light-emitting layer 221 is positioned between the first pixel electrode 211 and the counter electrode 230, the second light-emitting layer 222 is positioned between the second pixel electrode 212 and the counter electrode 230, and the third light-emitting layer 223 is positioned between the third pixel electrode 213 and the counter electrode 230.
[0119] In this case, a portion of the pixel definition film 119 positioned between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, can be in direct contact with the planarization layer 118. Specifically, a portion of the pixel definition film 119 positioned between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, is in direct contact with the planarization layer 118. Even in this case, a portion of the first light-emitting layer 221 may be positioned between a portion of the pixel definition film 119 adjacent to the first pixel aperture OP11 and a portion of the first pixel electrode 211, and another portion of the first light-emitting layer 221 may be positioned between a portion of the counter electrode 230 overlapping the first pixel aperture OP11 and another portion of the first pixel electrode 211.
[0120] Similarly, a portion of the second light-emitting layer 222 may be positioned between a portion of the pixel definition film 119 adjacent to the second pixel aperture OP12 and a portion of the second pixel electrode 212, and the other portion of the second light-emitting layer 222 may be positioned between a portion of the counter electrode 230 overlapping with the second pixel aperture OP12 and the other portion of the second pixel electrode 212. A portion of the third light-emitting layer 223 may be positioned between a portion of the pixel definition film 119 adjacent to the third pixel aperture OP13 and a portion of the third pixel electrode 213, and the other portion of the third light-emitting layer 223 may be positioned between a portion of the counter electrode 230 overlapping with the third pixel aperture OP13 and the other portion of the third pixel electrode 213. To further explain, in the example shown in Figure 9, the first pixel electrode 211 is formed on the planarization layer 118 in the portion that overlaps with the first color conversion aperture OP21 of the first pixel PX1. As shown in the cross-sectional view of Figure 9, the first light-emitting layer 221 is formed in an island shape in a plan view so as to cover the periphery and top surface of the first pixel electrode 211. Similarly, a second pixel electrode 212 is formed in the portion of the second pixel PX2 adjacent to the first pixel PX1 that overlaps with the second color conversion aperture OP22. As shown in the cross-sectional view in Figure 9, a second light-emitting layer 222 is formed in an island shape in a plan view so as to cover the periphery and top surface of the second pixel electrode 212. Similarly, a third pixel electrode 213 is formed in the portion of the third pixel PX3 adjacent to the first pixel PX1 that overlaps with the third color conversion aperture OP23. As shown in the cross-sectional view in Figure 9, a third light-emitting layer 223 is formed in an island shape in a plan view so as to cover the periphery and top surface of the third pixel electrode 213. As shown in the example in Figure 9, the island-shaped first, second, and third light-emitting layers 221, 222, and 223 are separated from each other. The pixel definition film 119 is formed on the planarization layer 118 and the island-shaped first, second, and third light-emitting layers 221, 222, and 223 so as to have first, second, and third pixel apertures OP11, OP12, and OP13 superimposed on the first, second, and third pixel electrodes 211, 212, and 213. In other words, the pixel definition film 119 is formed on the planarization layer 118 exposed between the island-shaped first, second, and third light-emitting layers 221, 222, and 223, and also on the first, second, and third light-emitting layers 221, 222, and 223 excluding the first, second, and third pixel apertures OP11, OP12, and OP13.
[0121] Generally, when any layer is provided in common across multiple display elements, leakage current may flow between the multiple display elements through that layer. In such cases, the display quality of the display device may deteriorate, such as a decrease in the color purity of the display device. However, in the case of the display device 1 according to this embodiment, the portions of the light-emitting layer 220 included in the first display element DPE1, the portions of the light-emitting layer 220 included in the second display element DPE2, and the portions of the light-emitting layer 220 included in the third display element DPE3 can be arranged separately from each other. That is, the portions of the light-emitting layer 220 included in the first display element DPE1, the portions of the light-emitting layer 220 included in the second display element DPE2, and the portions of the light-emitting layer 220 included in the third display element DPE3 can be separated from each other. As a result, the amount of leakage current flowing between the display elements through the light-emitting layer 220 is reduced or eliminated. Therefore, the display quality of the display device 1 according to this embodiment does not deteriorate.
[0122] Figure 10 is a schematic cross-sectional view showing a display device 1 according to one embodiment of the present invention. Since the display device 1 according to this embodiment is similar to the display device 1 described above with reference to Figure 8, the following explanation will focus on the differences from the display device 1 described above with reference to Figure 8. In Figure 10, the same reference numerals as in Figure 8 indicate the same components, and redundant explanations will be omitted.
[0123] In the case of the display device 1 according to the embodiment described above with reference to Figure 8, the display device 1 includes a planarization auxiliary layer 118A. In the case of the display device 1 according to the embodiment described above with reference to Figure 8, the upper surface of the planarization auxiliary layer 118A, the upper surface of the first pixel electrode 211, the upper surface of the second pixel electrode 212, and the upper surface of the third pixel electrode 213 form a flat surface, and the planarization auxiliary layer 118A contains the same substance as the substance contained in the planarization layer 118. In the case of the display device 1 according to this embodiment, the display device 1 also includes a planarization auxiliary layer 118A. In the case of the display device 1 according to this embodiment, the upper surface of the planarization auxiliary layer 118A, the upper surface of the first pixel electrode 211, the upper surface of the second pixel electrode 212, and the upper surface of the third pixel electrode 213 form a flat surface, and the planarization auxiliary layer 118A contains the same substance as the substance contained in the planarization layer 118.
[0124] In the case of the display device 1 according to the embodiment described above with reference to Figure 8, the light-emitting layer 220 may be integrally provided over the entire surface of the substrate 100. However, as shown in Figure 10, in the case of the display device 1 according to this embodiment, the light-emitting layer 220 is not integrally provided over the entire surface of the substrate 100. That is, the light-emitting layer 220 may be provided only on a part of the planarization layer 118 located on the upper part of the substrate 100. Specifically, the light-emitting layer 220 includes a plurality of sub-light-emitting layers. The plurality of sub-light-emitting layers are separated from each other and arranged on the planarization layer 118.
[0125] For example, the light-emitting layer 220 includes a first light-emitting layer 221, a second light-emitting layer 222, and a third light-emitting layer 223. The first light-emitting layer 221, the second light-emitting layer 222, and the third light-emitting layer 223 are spaced apart from each other and arranged on the planarization layer 118. The first light-emitting layer 221 is positioned between the first pixel electrode 211 and the counter electrode 230, the second light-emitting layer 222 is positioned between the second pixel electrode 212 and the counter electrode 230, and the third light-emitting layer 223 is positioned between the third pixel electrode 213 and the counter electrode 230.
[0126] In this case, a portion of the pixel definition film 119 positioned between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, is in direct contact with the planarization auxiliary layer 118A. Specifically, a portion of the pixel definition film 119 positioned between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, is in direct contact with the planarization auxiliary layer 118A. In this case as well, a portion of the first light-emitting layer 221 may be positioned between a portion of the pixel definition film 119 adjacent to the first pixel aperture OP11 and a portion of the first pixel electrode 211, and another portion of the first light-emitting layer 221 may be positioned between a portion of the counter electrode 230 overlapping the first pixel aperture OP11 and another portion of the first pixel electrode 211.
[0127] Similarly, a portion of the second light-emitting layer 222 may be positioned between a portion of the pixel definition film 119 adjacent to the second pixel aperture OP12 and a portion of the second pixel electrode 212, and the other portion of the second light-emitting layer 222 may be positioned between a portion of the counter electrode 230 overlapping with the second pixel aperture OP12 and the other portion of the second pixel electrode 212. A portion of the third light-emitting layer 223 may be positioned between a portion of the pixel definition film 119 adjacent to the third pixel aperture OP13 and a portion of the third pixel electrode 213, and the other portion of the third light-emitting layer 223 may be positioned between a portion of the counter electrode 230 overlapping with the third pixel aperture OP13 and the other portion of the third pixel electrode 213.
[0128] Referring to Figure 9, similar to the display device 1 according to the previously described embodiment, in the display device 1 according to this embodiment, the portions of the light-emitting layer 220 included in the first display element DPE1, the portions of the light-emitting layer 220 included in the second display element DPE2, and the portions of the light-emitting layer 220 included in the third display element DPE3 may be separated from each other. As a result, the amount of leakage current flowing between the display elements through the light-emitting layer 220 is reduced or eliminated. Therefore, the display device 1 according to this embodiment also does not suffer from a decrease in display quality.
[0129] Figures 11 to 15 are schematic cross-sectional views illustrating part of the manufacturing process of the display device 1 shown in Figure 5. Specifically, Figures 11 to 15 are schematic cross-sectional views illustrating the formation process of the pixel electrodes, light-emitting layer 220, pixel definition film 119, and counter electrode 230 of the display device 1 shown in Figure 5. For the sake of explanation, in Figures 11 to 15, a cross-section taken along the line I-I' of the display device 1 in Figure 4 is used as a reference to describe part of the manufacturing process of the display device 1 shown in Figure 5.
[0130] First, as shown in Figure 11, a first pixel electrode 211 is formed on the planarization layer 118. A second pixel electrode 212 and a third pixel electrode 213 may also be formed on the planarization layer 118. Specifically, the second pixel electrode 212 may be formed on the planarization layer 118 so as to be separated from the first pixel electrode 211 along a first direction (e.g., the x-axis direction). The third pixel electrode 213 may be formed on the planarization layer 118 so as to be positioned in the opposite direction to the second pixel electrode 212 relative to the first pixel electrode 211 in the first direction. In other words, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 are formed on the planarization layer 118.
[0131] Here, the planarization layer 118 can be formed on the substrate 100. Before the planarization layer 118 is formed on the substrate 100, the pixel circuit PC can be formed on the substrate 100. Specifically, a buffer layer 111 is formed on the substrate 100, a semiconductor layer Act is formed on the buffer layer 111, a gate insulating layer 113 is formed on the semiconductor layer Act, and a gate electrode GE is formed on the gate insulating layer 113. The gate electrode GE may be the first capacitor electrode CE1 of a storage capacitor Cst. Next, a first interlayer insulating layer 115 is formed on the gate electrode GE, and a second capacitor electrode CE2 is formed on the first interlayer insulating layer 115. Next, a second interlayer insulating layer 117 is formed on the second capacitor electrode CE2. Next, a source electrode SE and a drain electrode DE are formed on the second interlayer insulating layer 117, and the planarization layer 118 is formed on the source electrode SE and the drain electrode DE. The formation of such a planarization layer 118 and pixel circuit PC can be carried out by known photoprocessing, etc., so a detailed explanation thereof is omitted.
[0132] Next, contact holes are formed in the planarization layer 118 so that each of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 contacts either the source electrode SE or the drain electrode DE. Then, a preliminary pixel electrode layer (not shown) is formed on the planarization layer 118 to cover the entire surface of the substrate 100. By patterning such a preliminary pixel electrode layer, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 can be formed. In other words, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 can be formed on the planarization layer 118 formed on the substrate 100.
[0133] The first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 each include a translucent conductive layer made of a translucent conductive oxide such as ITO, In2O3, or IZO, and a reflective layer made of a metal such as Al or Ag. For example, the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 have a three-layer structure of ITO / Ag / ITO.
[0134] Next, as shown in Figure 12, a light-emitting layer 220 is formed on the first pixel electrode 211. Specifically, the light-emitting layer 220 is formed integrally across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. For example, the light-emitting layer 220 is formed over the entire surface of the substrate 100. As a result, a portion of the light-emitting layer 220 is formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, and a portion of the light-emitting layer 220 may also be formed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Specifically, a portion of the light-emitting layer 220 is formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Of course, a portion of the light-emitting layer 220 may also be formed between the second pixel electrode 212 and the third pixel electrode 213.
[0135] This light-emitting layer 220 contains polymeric substances such as PPV (polyphenylene vinylene) and polyfluorene. As will be described later, since a pixel definition film 119 is formed on the light-emitting layer 220, the substances contained in the light-emitting layer 220 may be substances that do not dissolve in the solvent contained in the pixel definition film forming material 119P. When a functional layer (HIL, HTL, ETL, EIL, etc.) is placed on the light-emitting layer 220, similar to the substances contained in the light-emitting layer 220, the substances contained in the functional layer may be substances that do not dissolve in the solvent contained in the pixel definition film forming material 119P.
[0136] Next, as shown in Figures 13 and 14, a pixel definition film 119 is formed on the light-emitting layer 220. Specifically, as shown in Figure 13, the pixel definition film forming material 119P is applied by an inkjet printing method between the center of the first pixel electrode 211 and the center of the second pixel electrode 212, and between the center of the first pixel electrode 211 and the center of the third pixel electrode 213. That is, the pixel definition film forming material 119P can be applied by an inkjet printing method onto the light-emitting layer 220 between the center of the first pixel electrode 211 and the center of the second pixel electrode 212, and between the center of the first pixel electrode 211 and the center of the third pixel electrode 213.
[0137] The pixel-defining film-forming material 119P is a solution prepared by mixing polyimide or an organic substance such as HMDSO (hexamethyldisiloxane) with a solvent. It is desirable that the pixel-defining film-forming material 119P contains a substance that can undergo a crosslinking reaction at a temperature lower than the temperature at which the material constituting the light-emitting layer 220 deteriorates. For example, the pixel-defining film-forming material 119P may be UPIA-LB2001 from UBE, Photoneece-LT from TORAY, or ZEOCOAT-ZC100 from ZEON.
[0138] For example, an inkjet printing method may use an inkjet head IH that includes multiple nozzles. That is, the multiple nozzles included in the inkjet head IH may be arranged on the light-emitting layer 220 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Using the multiple nozzles of such an inkjet head IH, the pixel-defining film-forming material 119P can be applied on the light-emitting layer 220 between the central part of the first pixel electrode 211 and the central part of the second pixel electrode 212, and between the central part of the first pixel electrode 211 and the central part of the third pixel electrode 213.
[0139] Of course, the multiple nozzles included in the inkjet head IH may be arranged on the light-emitting layer 220 between the second pixel electrode 212 and the third pixel electrode 213, and the pixel-defining film-forming material 119P can also be applied between the central part of the second pixel electrode 212 and the central part of the third pixel electrode 213 using these multiple nozzles of the inkjet head IH. That is, the pixel-defining film-forming material 119P can be applied to the light-emitting layer 220 excluding the parts corresponding to the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13. However, the method of applying the pixel-defining film-forming material 119P in the present invention is not limited to the inkjet printing method. Any method that can selectively apply the pixel-defining film-forming material 119P only to the positions where the pixel-defining film 119 is formed can be used as the method of applying the pixel-defining film-forming material 119P in the present invention.
[0140] Next, as shown in Figure 14, the pixel definition film forming material 119P is heat-treated to form the pixel definition film 119. For example, the pixel definition film forming material 119P is dried or heated. Alternatively, the pixel definition film forming material 119P may be dried at a first temperature to remove some of the solvent contained in the pixel definition film forming material 119P, and then heated at a second temperature higher than the first temperature. For example, the pixel definition film forming material 119P may be dried at room temperature to remove some of the solvent contained in the pixel definition film forming material 119P, and then heat-treated by heating to a temperature of approximately 100°C to approximately 200°C.
[0141] However, the heat treatment conditions for such pixel-defining film-forming material 119P are not particularly limited. Any heat treatment conditions that are normally performed after applying an organic film-forming material to form an organic film can be used as heat treatment conditions for the pixel-defining film-forming material 119P. Therefore, a detailed explanation is omitted. For example, if the pixel-defining film-forming material 119P is UPIA-LB2001 manufactured by UBE, the pixel-defining film-forming material 119P is dried at room temperature and then heated to 150°C. If the pixel-defining film-forming material 119P is Photoneece-LT manufactured by TORAY, the pixel-defining film-forming material 119P is dried at room temperature and then heated to 170°C. If the pixel-defining film-forming material 119P is ZEOCOAT-ZC100 manufactured by ZEON, the pixel-defining film-forming material 119P is dried at room temperature and then heated to 180°C.
[0142] By applying the pixel definition film forming material 119P, which forms the pixel definition film 119, onto the light-emitting layer 220 between the central part of the first pixel electrode 211 and the central part of the second pixel electrode 212, between the central part of the first pixel electrode 211 and the central part of the third pixel electrode 213, and between the central part of the second pixel electrode 212 and the central part of the third pixel electrode 213, the pixel definition film 119 can define the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13. On a plane, the first pixel aperture OP11 overlaps with the first pixel electrode 211. As a result, a part of the light-emitting layer 220 can be positioned between a part of the pixel definition film 119 adjacent to the first pixel aperture OP11 and a part of the first pixel electrode 211. On the other hand, on a plane, the second pixel aperture OP12 overlaps with the second pixel electrode 212, and the third pixel aperture OP13 overlaps with the third pixel electrode 213. In the example shown in Figure 14, the light-emitting layer 220 is formed in a series on the first, second, and third pixel electrodes 211, 212, and 213, and on the planarization layer 118 between the first, second, and third pixel electrodes 211, 212, and 213.
[0143] Generally, a pixel definition film is formed by coating the entire surface of a substrate with a pixel definition film-forming material, heat-treating it, and then forming pixel apertures using a photoprocessing step or the like. However, if the light-emitting layer is formed before the pixel definition film is formed, there is a risk that the light-emitting layer placed beneath the pixel definition film-forming material may be damaged during the process of coating the entire surface of the substrate with the pixel definition film-forming material and performing the photoprocessing step or the like. However, in the manufacturing method of the display device according to this embodiment, the pixel definition film-forming material 119P is applied only to the light-emitting layer 220, excluding the portions corresponding to the first pixel aperture OP11, the second pixel aperture OP12, and the third pixel aperture OP13. Therefore, no photoprocessing step or the like is performed to form the pixel apertures of the pixel definition film 119. Consequently, there is a possibility that the light-emitting layer 220 will not be damaged during the process of forming the pixel definition film 119.
[0144] Next, as shown in Figure 15, a counter electrode 230 is formed on the pixel definition film 119. The pixel definition film 119 is formed on the light-emitting layer 220, which is formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. In other words, a counter electrode 230 is formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0145] Specifically, the counter electrode 230 can be integrally formed to correspond to the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Therefore, the counter electrode 230 can overlap with all of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. Since the first pixel aperture OP11 overlaps with the first pixel electrode 211, a portion of the light-emitting layer 220 can be positioned between the portion of the counter electrode 230 that overlaps with the first pixel aperture OP11 and the portion of the first pixel electrode 211. Similarly, a portion of the light-emitting layer 220 can be positioned between the portion of the counter electrode 230 that overlaps with the second pixel aperture OP12 and the portion of the second pixel electrode 212. A portion of the light-emitting layer 220 can be positioned between the portion of the counter electrode 230 that overlaps with the third pixel aperture OP13 and the portion of the third pixel electrode 213.
[0146] The counter electrode 230 includes a translucent conductive layer formed of ITO, In2O3, or IZO, and may also include a semipermeable film containing a metal such as Al or Ag. For example, the counter electrode 230 is a semipermeable film containing Mg or Ag.
[0147] Generally, the light-emitting layer is formed by coating a light-emitting layer-forming material into the pixel aperture of the pixel definition film and then drying it. The light-emitting layer-forming material is a solution prepared by mixing the organic materials that constitute the light-emitting layer with a solvent. In such cases, during the drying process of the light-emitting layer-forming material, the solid components contained in the material (e.g., the organic materials that constitute the light-emitting layer) move towards the edge of the pixel aperture. As a result, the thickness of a portion of the light-emitting layer adjacent to the pixel aperture becomes thicker than the thickness of a portion of the light-emitting layer further away from the pixel aperture. In other words, the portion of the light-emitting layer formed on the pixel electrode has an uneven thickness. To put it another way, when a light-emitting layer is formed by coating a light-emitting layer-forming material into the pixel aperture of the pixel definition film and then drying it, the coffee ring effect occurs during the drying process of the light-emitting layer-forming material.
[0148] However, in the manufacturing method of the display device according to this embodiment, an integrated light-emitting layer 220 is formed spanning the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213 before the formation of the pixel definition film 119. Therefore, the portion of the light-emitting layer formed on the pixel electrodes has a uniform thickness. Specifically, the portion of the light-emitting layer 220 formed on the first pixel electrode 211 has a uniform thickness. Of course, the portions of the light-emitting layer 220 formed on the second pixel electrode 212 and the portion formed on the third pixel electrode 213 also have a uniform thickness. Therefore, the luminous efficiency of the display device 1 is improved.
[0149] Figures 16 to 18 are schematic cross-sectional views illustrating a method for manufacturing a display device according to one embodiment of the present invention. Specifically, Figures 16 to 18 are schematic cross-sectional views showing the formation process of the light-emitting layer 220 of the display device 1 in Figure 8. The method for manufacturing a display device according to this embodiment is a modified embodiment of the method for manufacturing a display device described above with reference to Figures 11 to 15. Therefore, the following explanation will focus on the differences from the method for manufacturing a display device described above with reference to Figures 11 to 15. In Figures 16 to 18, the same reference numerals as in Figures 11 to 15 indicate the same components, and redundant explanations will be omitted.
[0150] In the method for manufacturing a display device according to this embodiment, a first pixel electrode 211 can be formed on the planarization layer 118, a pixel definition film 119 can be formed on the light-emitting layer 220, and a counter electrode 230 can be formed on the pixel definition film 119. These processes are the same as those described above with reference to Figures 11 and 13 to 15, so any overlapping information will be omitted. However, in the case of the method for manufacturing a display device according to this embodiment, as shown in Figures 16 to 18, a planarization auxiliary layer 118A is formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, and then the light-emitting layer 220 is formed.
[0151] First, as shown in Figure 16, a preliminary planarization auxiliary layer 118P is formed to cover the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. In other words, the preliminary planarization auxiliary layer 118P is formed integrally across the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0152] Therefore, a portion of the pre-planarization auxiliary layer 118P can be placed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. A portion of the pre-planarization auxiliary layer 118P can also be placed between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Specifically, a portion of the pre-planarization auxiliary layer 118P can be placed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Of course, a portion of the pre-planarization auxiliary layer 118P can also be placed between the second pixel electrode 212 and the third pixel electrode 213. That is, the pre-planarization auxiliary layer 118P can be formed to cover the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0153] The pre-planarization auxiliary layer 118P contains the same substances as the planarization layer 118. Specifically, the pre-planarization auxiliary layer 118P contains organic insulators. For example, the pre-planarization auxiliary layer 118P contains photoresist, BCB (Benzocyclobutene), polyimide, HMDSO (Hexamethyldisiloxane), PMMA (Polymethylmethacrylate), polystyrene, polymer derivatives having phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and mixtures thereof.
[0154] Next, as shown in Figure 17, a planarization auxiliary layer 118A can be formed by removing a portion of the preliminary planarization auxiliary layer 118P. That is, if the direction perpendicular to the substrate 100 is considered the third direction (for example, the z-axis direction), the portion of the preliminary planarization auxiliary layer 118P that is longer than the length from the first pixel electrode 211 to the substrate 100 in the third direction (for example, the z-axis direction) can be removed. This exposes the upper surface of the first pixel electrode 211, and the upper surface of the planarization auxiliary layer 118A can form a flat surface with the upper surface of the first pixel electrode 211. Of course, the upper surfaces of the second pixel electrode 212 and the third pixel electrode 213 can also be exposed, and the upper surface of the planarization auxiliary layer 118A can form a flat surface with the upper surfaces of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213.
[0155] In one embodiment, the removal of a portion of the preliminary planarization auxiliary layer 118P is performed through a polishing process, such as a chemical mechanical polishing (CMP) process. As a result, the upper surface of the planarization auxiliary layer 118A forms a flat surface with the upper surfaces of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. That is, the upper surface of the planarization auxiliary layer 118A does not form a step with the upper surfaces of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, and forms a flat surface.
[0156] Next, as shown in Figure 18, a light-emitting layer 220 is formed on the first pixel electrode 211. Since the upper surface of the planarization auxiliary layer 118A forms a flat surface with the upper surfaces of the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, the light-emitting layer 220 formed on such a flat surface can have a more uniform thickness.
[0157] Figures 19 to 21 are schematic cross-sectional views illustrating a method for manufacturing a display device according to one embodiment of the present invention. Specifically, Figures 19 to 21 are schematic cross-sectional views showing the formation process of the light-emitting layer 220 of the display device 1 in Figure 9. The method for manufacturing a display device according to this embodiment is a modified embodiment of the method for manufacturing a display device described above with reference to Figures 11 to 15. Therefore, the following explanation will focus on the differences from the method for manufacturing a display device described above with reference to Figures 11 to 15. In Figures 19 to 21, the same reference numerals as in Figures 11 to 15 indicate the same components, and redundant explanations will be omitted.
[0158] In the method for manufacturing a display device according to this embodiment, a first pixel electrode 211 can be formed on the planarization layer 118, a pixel definition film 119 can be formed on the light-emitting layer 220, and a counter electrode 230 can be formed on the pixel definition film 119. These processes are the same as those described above with reference to Figures 11 and 13 to 15, so any overlapping information will be omitted. However, in the case of the method for manufacturing a display device according to this embodiment, as shown in Figures 19 to 21, the light-emitting layer 220 is formed such that the portion of the light-emitting layer 220 placed on the first pixel electrode 211, the portion of the light-emitting layer 220 placed on the second pixel electrode 212, and the portion of the light-emitting layer 220 placed on the third pixel electrode 213 are separated from each other.
[0159] First, as shown in Figure 19, a pre-emissive layer 220P is formed on the first pixel electrode 211. Specifically, a single pre-emissive layer 220P is formed spanning the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. For example, the pre-emissive layer 220P is formed over the entire surface of the substrate 100. As a result, a portion of the pre-emissive layer 220P is formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, and a portion of the pre-emissive layer 220P may also be formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Of course, a portion of the pre-emissive layer 220P may also be formed on the planarization layer 118 between the second pixel electrode 212 and the third pixel electrode 213.
[0160] This pre-emissive layer 220P contains polymeric materials such as PPV (polyphenylene vinylene) and polyfluorene.
[0161] Next, as shown in Figure 20, a portion of the pre-emissive layer 220P is removed. For example, a laser irradiation unit LAI is used to remove a portion of the pre-emissive layer 220P. That is, the laser irradiation unit LAI irradiates a portion of the pre-emissive layer 220P formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213 with a laser LA. Of course, the laser irradiation unit LAI may also irradiate a portion of the pre-emissive layer 220P formed on the planarization layer 118 between the second pixel electrode 212 and the third pixel electrode 213 with a laser LA. Note that the type of laser used as the laser LA is not particularly limited. Any laser used to remove organic matter can be used as the laser LA to remove a portion of the pre-emissive layer 220P.
[0162] This allows for the formation of an emissive layer 220 as shown in Figure 21. Specifically, a portion of the pre-emissive layer 220P formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213 is removed. Of course, a portion of the pre-emissive layer 220P formed on the planarization layer 118 between the second pixel electrode 212 and the third pixel electrode 213 may also be removed. This allows the portion of the pre-emissive layer 220P located on the first pixel electrode 211, the portion of the pre-emissive layer 220P located on the second pixel electrode 212, and the portion of the pre-emissive layer 220P located on the third pixel electrode 213 to be separated from each other.
[0163] In other words, the first light-emitting layer 221 in Figure 21 is at least a portion of the pre-light-emitting layer 220P formed on the first pixel electrode 211, the second light-emitting layer 222 in Figure 21 is at least a portion of the pre-light-emitting layer 220P formed on the second pixel electrode 212, and the third light-emitting layer 223 in Figure 21 is at least a portion of the pre-light-emitting layer 220P formed on the third pixel electrode 213. In other words, the light-emitting layer 220 includes the first light-emitting layer 221, the second light-emitting layer 222, and the third light-emitting layer 223 may be arranged on the planarization layer 118, separated from each other.
[0164] Figures 22 to 24 are schematic cross-sectional views illustrating a method for manufacturing a display device according to one embodiment of the present invention. Specifically, Figures 22 to 24 are schematic cross-sectional views showing the formation process of the light-emitting layer 220 of the display device 1 of Figure 10. The method for manufacturing a display device according to this embodiment is a modified embodiment of the method for manufacturing a display device described above with reference to Figures 16 to 18. Therefore, the following explanation will focus on the differences from the method for manufacturing a display device described above with reference to Figures 16 to 18. In Figures 22 to 24, the same reference numerals as in Figures 16 to 18 indicate the same components, and redundant explanations will be omitted.
[0165] In the method for manufacturing a display device according to this embodiment, a first pixel electrode 211 can be formed on the planarization layer 118, a pixel definition film 119 can be formed on the light-emitting layer 220, and a counter electrode 230 can be formed on the pixel definition film 119. These processes are the same as those described above with reference to Figures 11 and 13 to 15, so any overlapping information will be omitted. However, in the case of the method for manufacturing a display device according to this embodiment, as shown in Figures 16 to 18, a planarization auxiliary layer 118A is formed on the planarization layer 118 between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213, and then the light-emitting layer 220 is formed. Also, as shown in Figures 22 to 24, the light-emitting layer 220 is formed such that the portion of the light-emitting layer 220 placed on the first pixel electrode 211, the portion of the light-emitting layer 220 placed on the second pixel electrode 212, and the portion of the light-emitting layer 220 placed on the third pixel electrode 213 are separated from each other.
[0166] First, as shown in Figure 22, a pre-emissive layer 220P is formed on the first pixel electrode 211. Specifically, a single pre-emissive layer 220P is formed spanning the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213. For example, the pre-emissive layer 220P is formed over the entire surface of the substrate 100. As a result, a portion of the pre-emissive layer 220P is formed on the first pixel electrode 211, the second pixel electrode 212, and the third pixel electrode 213, and a portion of the pre-emissive layer 220P may also be formed on the planarization auxiliary layer 118A between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213. Of course, a portion of the pre-emissive layer 220P may also be formed on the planarization auxiliary layer 118A between the second pixel electrode 212 and the third pixel electrode 213.
[0167] This pre-emissive layer 220P contains polymeric materials such as PPV (polyphenylene vinylene) and polyfluorene.
[0168] Next, as shown in Figure 23, a portion of the pre-emissive layer 220P is removed. For example, a laser irradiation unit LAI is used to remove a portion of the pre-emissive layer 220P. That is, the laser irradiation unit LAI irradiates a portion of the pre-emissive layer 220P formed on the planarization auxiliary layer 118A between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213 with a laser LA. Of course, the laser irradiation unit LAI may also irradiate a portion of the pre-emissive layer 220P formed on the planarization auxiliary layer 118A between the second pixel electrode 212 and the third pixel electrode 213 with a laser LA. Note that the type of laser used as the laser LA is not particularly limited. Any laser used to remove organic matter can be used as the laser LA to remove a portion of the pre-emissive layer 220P.
[0169] This allows for the formation of an emissive layer 220 as shown in Figure 24. Specifically, a portion of the pre-emissive layer 220P formed on the planarization auxiliary layer 118A between the first pixel electrode 211 and the second pixel electrode 212, and between the first pixel electrode 211 and the third pixel electrode 213 is removed. Of course, a portion of the pre-emissive layer 220P formed on the planarization auxiliary layer 118A between the second pixel electrode 212 and the third pixel electrode 213 may also be removed. This allows the portion of the pre-emissive layer 220P located on the first pixel electrode 211, the portion of the pre-emissive layer 220P located on the second pixel electrode 212, and the portion of the pre-emissive layer 220P located on the third pixel electrode 213 to be separated from each other.
[0170] In other words, the first light-emitting layer 221 in Figure 24 is at least a portion of the pre-light-emitting layer 220P formed on the first pixel electrode 211, the second light-emitting layer 222 in Figure 24 is at least a portion of the pre-light-emitting layer 220P formed on the second pixel electrode 212, and the third light-emitting layer 223 in Figure 24 is at least a portion of the pre-light-emitting layer 220P formed on the third pixel electrode 213. In other words, the light-emitting layer 220 includes the first light-emitting layer 221, the second light-emitting layer 222, and the third light-emitting layer 223 may be arranged on the planarization layer 118, separated from each other.
[0171] On the other hand, Figure 5 shows that a first color conversion layer 451, a second color conversion layer 452, and a light transmission layer 453 are arranged on the sealing layer 300 so that the display device 1 generates a color image, but the present invention is not limited to this. For example, a color filter layer may also be arranged on the sealing layer 300 so that the display device 1 generates a color image.
[0172] Figure 25 is a schematic cross-sectional view showing a display device 1 according to one embodiment of the present invention. Since the display device 1 according to this embodiment is similar to the display device 1 described above with reference to Figures 1 to 7, the following explanation will focus on the differences from the display device 1 described above with reference to Figures 1 to 7. In Figure 25, the same reference numerals as in Figures 1 to 7 indicate the same components, and redundant explanations will be omitted.
[0173] In the case of the display device 1 according to the embodiment described above with reference to Figures 1 to 7, a light-shielding wall portion 410 is arranged on the sealing layer 300, and the light-shielding wall portion 410 can define a first color conversion aperture OP21, a second color conversion aperture OP22, and a third color conversion aperture OP23. In the case of the display device 1 according to this embodiment as well, a light-shielding wall portion 410 is arranged on the sealing layer 300, and the light-shielding wall portion 410 can define a first color conversion aperture OP21, a second color conversion aperture OP22, and a third color conversion aperture OP23.
[0174] In the display device 1 according to the embodiment described above with reference to Figures 1 to 7, a first color conversion layer 451 is arranged in the first color conversion aperture OP21, a second color conversion layer 452 is arranged in the second color conversion aperture OP22, and a light transmission layer 453 is arranged in the third color conversion aperture OP23. However, as shown in Figure 25, in the display device 1 according to this embodiment, a first color filter layer 461 is arranged in the first color conversion aperture OP21, a second color filter layer 462 is arranged in the second color conversion aperture OP22, and a third color filter layer 463 is arranged in the third color conversion aperture OP23.
[0175] The first color filter layer 461, the second color filter layer 462, and the third color filter layer 463 can selectively transmit light of a predetermined color. For example, the first color filter layer 461 transmits green light, the second color filter layer 462 transmits red light, and the third color filter layer 463 transmits blue light.
[0176] Specifically, the first color filter layer 461 is a green color filter. The first color filter layer 461 can transmit only light belonging to the wavelength band from 495 nm to 580 nm. For this purpose, the first color filter layer 461 contains a green pigment or dye. The second color filter layer 462 is a red color filter. The second color filter layer 462 can transmit only light belonging to the wavelength band from 580 nm to 780 nm. For this purpose, the second color filter layer 462 contains a red pigment or dye. The third color filter layer 463 is a blue color filter. The third color filter layer 463 transmits only light with wavelengths belonging to the 450 nm to 495 nm. For this purpose, the third color filter layer 463 contains a blue pigment or dye.
[0177] In this case, the light emitted by the first display element DPE1, the second display element DPE2, and the third display element DPE3 is white light. Generally, the wavelength range of white light is evenly spread over the visible light wavelength range of 450 nm to 780 nm. That is, only the portion of the light emitted by the first display element DPE1 that belongs to the wavelength range of 495 nm to 580 nm can pass through the first color filter layer 461. Similarly, only the portion of the light emitted by the second display element DPE2 that belongs to the wavelength range of 580 nm to 780 nm can pass through the second color filter layer 462, and only the portion of the light emitted by the third display element DPE3 that belongs to the wavelength range of 450 nm to 495 nm can pass through the third color filter layer 463. Therefore, the display device 1 can generate a color image using the first color filter layer 461, the second color filter layer 462, and the third color filter layer 463.
[0178] Thus, the embodiments of the present invention have been described by reference as shown in the drawings, but these are merely illustrative, and those skilled in the art will understand that a wider variety of modifications and equivalent other embodiments are possible. Therefore, the true scope of technical protection of the present invention must be determined by the technical idea of the claims. [Explanation of Symbols]
[0179] 1:Display device 100: Circuit board 118: Flattening layer 211: First pixel electrode 220: Emitting layer 230: Counter electrode 119: Pixel Definition Film
Claims
1. circuit board and A planar layer disposed on the substrate, A first pixel electrode is disposed on the planarization layer, A light-emitting layer disposed on the first pixel electrode, A counter electrode disposed on the light-emitting layer, A display device comprising: a pixel defining film interposed between the light-emitting layer and the counter electrode, which defines a first pixel aperture that overlaps with the first pixel electrode when viewed from a direction perpendicular to the substrate.
2. A portion of the light-emitting layer is positioned between a portion of the pixel definition film adjacent to the first pixel aperture and a portion of the first pixel electrode. The display device according to claim 1, wherein the other part of the light-emitting layer is disposed between the part of the counter electrode that overlaps with the first pixel aperture and the other part of the first pixel electrode.
3. A second pixel electrode is disposed on the planarization layer, separated from the first pixel electrode, The device further comprises a third pixel electrode positioned on the planarization layer so as to be located in the opposite direction to the second pixel electrode via the first pixel electrode, The light-emitting layer is arranged across the first pixel electrode, the second pixel electrode, and the third pixel electrode. The aforementioned pixel defining film defines the second pixel aperture and the third pixel aperture, The second pixel aperture overlaps with the second pixel electrode when viewed from a direction perpendicular to the substrate. The display device according to claim 1, wherein the third pixel aperture overlaps with the third pixel electrode when viewed from a direction perpendicular to the substrate.
4. The display device according to claim 3, wherein a portion of the light-emitting layer is disposed between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode.
5. A sealing layer disposed on the counter electrode, comprising at least one inorganic layer and at least one organic layer, A light-shielding wall portion is disposed on the sealing layer and defines a first color conversion aperture that overlaps with the first pixel aperture, a second color conversion aperture that overlaps with the second pixel aperture, and a third color conversion aperture that overlaps with the third pixel aperture, A first color conversion layer is disposed within the first color conversion aperture, A second color conversion layer is disposed within the second color conversion aperture, The display device according to claim 3, further comprising a light-transmitting layer disposed within the third color conversion aperture.
6. A sealing layer disposed on the counter electrode, comprising at least one inorganic layer and at least one organic layer, A light-shielding wall portion is disposed on the sealing layer and defines a first color conversion aperture that overlaps with the first pixel aperture, a second color conversion aperture that overlaps with the second pixel aperture, and a third color conversion aperture that overlaps with the third pixel aperture, A first color filter layer is disposed within the first color conversion aperture, A second color filter layer is disposed within the second color conversion aperture, The display device according to claim 3, further comprising a third color filter layer disposed within the third color conversion aperture.
7. The system further includes a planarization auxiliary layer disposed on the planarization layer between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, The planarization auxiliary layer is in direct contact with the planarization layer, The display device according to claim 3, wherein a portion of the light-emitting layer disposed between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, is in direct contact with the planarization auxiliary layer.
8. The display device according to claim 7, wherein the upper surface of the planarization auxiliary layer, the upper surface of the first pixel electrode, the upper surface of the second pixel electrode, and the upper surface of the third pixel electrode form a flat surface.
9. The display device according to claim 7, wherein the planarization auxiliary layer contains the same substance as the substance contained in the planarization layer.
10. A second pixel electrode is disposed on the planarization layer, separated from the first pixel electrode, The device further comprises a third pixel electrode positioned on the planarization layer so as to be located in the opposite direction to the second pixel electrode via the first pixel electrode, The light-emitting layer includes a first light-emitting layer, a second light-emitting layer, and a third light-emitting layer, which are arranged apart from each other. The above-mentioned first light-emitting layer is disposed between the above-mentioned first pixel electrode and the counter electrode. The second light-emitting layer is positioned between the second pixel electrode and the counter electrode. The third light-emitting layer is positioned between the third pixel electrode and the counter electrode. The aforementioned pixel defining film defines the second pixel aperture and the third pixel aperture, The second pixel aperture overlaps with the second pixel electrode when viewed from a direction perpendicular to the substrate. The display device according to claim 1, wherein the third pixel aperture overlaps with the third pixel electrode when viewed from a direction perpendicular to the substrate.
11. The display device according to claim 10, wherein a portion of the pixel definition film disposed between the first light-emitting layer and the second light-emitting layer, and between the first light-emitting layer and the third light-emitting layer, is in direct contact with the planarization layer.
12. The system further includes a planarization auxiliary layer disposed on the planarization layer between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, The planarization auxiliary layer is in direct contact with the planarization layer, The display device according to claim 10, wherein a portion of the pixel definition film disposed between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, is in direct contact with the planarization auxiliary layer.
13. The display device according to claim 12, wherein the upper surface of the planarization auxiliary layer, the upper surface of the first pixel electrode, the upper surface of the second pixel electrode, and the upper surface of the third pixel electrode form a flat surface.
14. The display device according to claim 12, wherein the planarization auxiliary layer contains the same substance as the substance contained in the planarization layer.
15. The steps include forming a first pixel electrode on a planarization layer formed on a substrate, The steps include forming a light-emitting layer on the aforementioned single pixel electrode, The steps include forming a pixel definition film on the light-emitting layer, The step of forming a counter electrode on the pixel defining film, The step of forming the pixel definition film is, A method for manufacturing a display device, comprising the step of forming the pixel definition film such that, when the pixel definition film is viewed from a direction perpendicular to the substrate, it defines a first pixel aperture that overlaps with the first pixel electrode.
16. The step of forming the pixel definition film is, The step of forming the pixel definition film is such that a portion of the light-emitting layer is positioned between a portion of the pixel definition film adjacent to the first pixel aperture and a portion of the first pixel electrode. The step of forming the counter electrode is, The method for manufacturing a display device according to claim 15, the step of forming the counter electrode such that the other part of the light-emitting layer is positioned between the part of the counter electrode that overlaps with the first pixel aperture and the other part of the first pixel electrode.
17. The step of forming the first pixel electrode is: The step of forming a second pixel electrode on the planarized layer, which is separated from the first pixel electrode, and a third pixel electrode located in the opposite direction to the second pixel electrode via the first pixel electrode, The step of forming the light-emitting layer is, The process includes the step of integrally forming the light-emitting layer across the first pixel electrode, the second pixel electrode, and the third pixel electrode, The step of forming the pixel definition film is, A method for manufacturing a display device according to claim 15, comprising the steps of applying a pixel definition film forming material between the central part of the first pixel electrode and the central part of the second pixel electrode, and between the central part of the first pixel electrode and the central part of the third pixel electrode, and then heat-treating the pixel definition film forming material to form the pixel definition film.
18. The method further includes the step of forming a pre-planarization auxiliary layer so as to cover the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the pre-planarization auxiliary layer to form a planarization auxiliary layer whose upper surface forms a surface flat with the upper surface of the first pixel electrode, the second pixel electrode, and the third pixel electrode, The method for manufacturing a display device according to claim 17, wherein the step of forming the planarization auxiliary layer is performed between the step of forming the first pixel electrode and the step of forming the light-emitting layer.
19. The step of forming the first pixel electrode is: The step of forming a second pixel electrode on the planarized layer, which is separated from the first pixel electrode, and a third pixel electrode located in the opposite direction to the second pixel electrode via the first pixel electrode, The step of forming the light-emitting layer is, The process includes the step of forming a pre-emissive layer integrally across the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the pre-emissive layer formed on the planarization layer between the first pixel electrode and the second pixel electrode, and between the first pixel electrode and the third pixel electrode, to form the emissive layer. The step of forming the pixel definition film is, A method for manufacturing a display device according to claim 15, comprising the steps of applying a pixel definition film forming material between the central part of the first pixel electrode and the central part of the second pixel electrode, and between the central part of the first pixel electrode and the central part of the third pixel electrode, and then heat-treating the pixel definition film forming material to form the pixel definition film.
20. The method further includes the step of forming a pre-planarization auxiliary layer so as to cover the first pixel electrode, the second pixel electrode, and the third pixel electrode, and then removing a portion of the pre-planarization auxiliary layer to form a planarization auxiliary layer whose upper surface forms a surface flat with the upper surface of the first pixel electrode, the second pixel electrode, and the third pixel electrode, The method for manufacturing a display device according to claim 19, wherein the step of forming the planarization auxiliary layer is performed between the step of forming the first pixel electrode and the step of forming the light-emitting layer.
21. Display device and The housing includes the display device and forms its exterior, The aforementioned display device is circuit board and A planar layer disposed on the substrate, A first pixel electrode is disposed on the planarization layer, A light-emitting layer disposed on the first pixel electrode, A counter electrode disposed on the light-emitting layer, An electronic device comprising: a pixel defining film interposed between the light-emitting layer and the counter electrode, which defines a first pixel aperture that overlaps with the first pixel electrode when viewed from a direction perpendicular to the substrate.