Substrate processing apparatus and substrate processing method

Abstract

In a substrate processing apparatus and substrate processing method, which perform coating by facing a nozzle toward a substrate being transported on a stage in a floating state, the present invention provides a technology that can remove foreign matter that has entered between the substrate and the stage and continue the coating process. [Solution] This invention is a substrate processing apparatus comprising: a transport unit that transports a substrate in a horizontal position along a horizontal transport direction; a stage unit provided on the lower side of the transported substrate and having a flat surface that is in close proximity to the lower surface of the substrate with a gap between them; and a nozzle positioned opposite the upper surface of the substrate, with its lower side facing the flat surface, for discharging a processing liquid onto the substrate. A recess is provided on the flat surface upstream in the transport direction from the position where the nozzle and the substrate face each other, with an opening that extends longitudinally in a direction intersecting the transport direction, and this recess can capture foreign matter on the lower surface of the substrate.

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