Cleaning system and cleaning method for optical components
Patent Information
- Application Number
- JP2024232595
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-12-27
- Publication Date
- 2026-07-09
AI Technical Summary
【0025】 本発明の光学部材の洗浄システムおよび洗浄方法によれば、純水に水素を溶解させて水素水としているから、純水リンス工程において軟硝材に潜傷が発生することを抑制することができ、これにより洗浄工程を手作業によらず自動化することができる。また、水素水の酸化還元電位およびpHを所定範囲に制御することにより、乾燥後の洗浄品質が高め、パーティクルが付着しにくい表面性状とすることができる。
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Figure 2026115721000001_ABST
Abstract
Claims
1. A cleaning system for cleaning optical components made of soft glass material, A cleaning means for immersing the optical component in a cleaning solution and performing ultrasonic cleaning, A tap water rinsing means for rinsing the optical component with tap water, A pure water rinsing means for rinsing the optical component with pure water, The system includes a drying means for drying the optical component after rinsing off the cleaning solution, The aforementioned pure water rinsing means is A hydrogen gas supply means for supplying hydrogen gas, A hydrogen water generating means that generates hydrogen water by injecting the hydrogen gas into pure water, A water purification tank filled with the aforementioned hydrogen water, The system includes a control means for controlling the oxidation-reduction potential of the hydrogen water, A cleaning system characterized in that the optical component is immersed in hydrogen water in a water purification tank for rinsing, while the control means is configured to maintain the oxidation-reduction potential of the hydrogen water at a predetermined value.
2. The cleaning system according to claim 1, characterized in that the hydrogen gas supplied to the hydrogen water generating means is 2.6 to 4.0 L / min per 30 L of pure water.
3. The cleaning system according to claim 1, characterized in that the pure water rinsing means includes a pH adjusting means for replenishing an alkaline aqueous solution to adjust the pH of the hydrogen water.
4. The cleaning system according to claim 1, further comprising a hydrogen water circulation means that returns the hydrogen water used in the water purification tank to the hydrogen water generating means for a certain period of time, and a filtration means provided in the middle of the hydrogen water circulation means.
5. The cleaning system according to claim 1, characterized in that the hydrogen gas supply means is a water electrolysis device.
6. The cleaning system according to claim 1, characterized in that the oxidation-reduction potential of the hydrogen water is -400 to 0 mV.
7. The cleaning system according to claim 3, characterized in that the pH of the hydrogen water is 6.5 to 9.
0.
8. A cleaning method for cleaning optical components made of soft glass material, A cleaning step in which the optical component is immersed in a cleaning solution and ultrasonically cleaned, A tap water rinsing step in which the optical component is rinsed with tap water, A pure water rinsing step in which the optical component is rinsed with pure water, The process includes a drying step for drying the optical component after rinsing off the cleaning solution, In the aforementioned pure water rinsing process, By supplying hydrogen gas, Hydrogen water is produced by injecting the hydrogen gas into pure water. Fill the water purification tank with the hydrogen water, This controls the oxidation-reduction potential of the hydrogen water. A cleaning method characterized by immersing the optical component in hydrogen water from a water purification tank for rinsing, while maintaining the oxidation-reduction potential of the hydrogen water at a predetermined value using the control means.
9. The cleaning method according to claim 8, characterized in that the hydrogen gas supplied when generating the hydrogen water is 2.6 to 4.0 L / min per 30 L of pure water.
10. The cleaning method according to claim 8, characterized in that the pure water rinsing means comprises a pH adjusting means for replenishing an alkaline aqueous solution to adjust the pH of the hydrogen water.
11. The cleaning method according to claim 8, characterized in that the hydrogen water used in the water purification tank is filtered for a certain period of time and returned to the hydrogen water generating means.
12. The cleaning method according to claim 8, characterized in that the supply of hydrogen gas is carried out by the electrolysis of water.
13. The cleaning method according to claim 8, characterized in that the oxidation-reduction potential of the hydrogen water is -400 to 0 mV.
14. The cleaning method according to claim 10, characterized in that the pH of the hydrogen water is 6.5 to 9.0.
Citation Information
Patent Citations
Method for cleaning optical element
JP2002273358A
Cleaning water generating method, cleaning method, cleaning water generating device and cleaning device
JP3590470B2
