Cleaning system and cleaning method for optical components

JP2026115721APending Publication Date: 2026-07-09TOPCON CORPORATION +1
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Patent Information

Application Number
JP2024232595
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-12-27
Publication Date
2026-07-09

AI Technical Summary

Benefits of technology

【0025】 本発明の光学部材の洗浄システムおよび洗浄方法によれば、純水に水素を溶解させて水素水としているから、純水リンス工程において軟硝材に潜傷が発生することを抑制することができ、これにより洗浄工程を手作業によらず自動化することができる。また、水素水の酸化還元電位およびpHを所定範囲に制御することにより、乾燥後の洗浄品質が高め、パーティクルが付着しにくい表面性状とすることができる。

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Abstract

This invention provides a cleaning system and method for optical components that can be applied to soft glass materials prone to latent scratches, automates the entire process regardless of the operator's skill level, and provides high cleaning quality after drying with minimal particle adhesion. [Solution] A cleaning system for cleaning an optical member L made of soft glass material, comprising: a cleaning means for immersing the optical member L in a cleaning solution and ultrasonically cleaning it; a tap water rinsing means for rinsing it with tap water; a pure water rinsing means for rinsing it with pure water; and a drying means for drying it. The pure water rinsing means comprises: a hydrogen gas supply means for supplying hydrogen gas; a hydrogen water generation means for injecting the hydrogen gas into pure water to generate hydrogen water; a water purification tank 3 filled with the hydrogen water; and a control means for controlling the oxidation-reduction potential of the hydrogen water. The optical member L is immersed in the hydrogen water in the water purification tank 3 and rinsed while the oxidation-reduction potential of the hydrogen water is maintained at a predetermined value by the control means.
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Claims

1. A cleaning system for cleaning optical components made of soft glass material, A cleaning means for immersing the optical component in a cleaning solution and performing ultrasonic cleaning, A tap water rinsing means for rinsing the optical component with tap water, A pure water rinsing means for rinsing the optical component with pure water, The system includes a drying means for drying the optical component after rinsing off the cleaning solution, The aforementioned pure water rinsing means is A hydrogen gas supply means for supplying hydrogen gas, A hydrogen water generating means that generates hydrogen water by injecting the hydrogen gas into pure water, A water purification tank filled with the aforementioned hydrogen water, The system includes a control means for controlling the oxidation-reduction potential of the hydrogen water, A cleaning system characterized in that the optical component is immersed in hydrogen water in a water purification tank for rinsing, while the control means is configured to maintain the oxidation-reduction potential of the hydrogen water at a predetermined value.

2. The cleaning system according to claim 1, characterized in that the hydrogen gas supplied to the hydrogen water generating means is 2.6 to 4.0 L / min per 30 L of pure water.

3. The cleaning system according to claim 1, characterized in that the pure water rinsing means includes a pH adjusting means for replenishing an alkaline aqueous solution to adjust the pH of the hydrogen water.

4. The cleaning system according to claim 1, further comprising a hydrogen water circulation means that returns the hydrogen water used in the water purification tank to the hydrogen water generating means for a certain period of time, and a filtration means provided in the middle of the hydrogen water circulation means.

5. The cleaning system according to claim 1, characterized in that the hydrogen gas supply means is a water electrolysis device.

6. The cleaning system according to claim 1, characterized in that the oxidation-reduction potential of the hydrogen water is -400 to 0 mV.

7. The cleaning system according to claim 3, characterized in that the pH of the hydrogen water is 6.5 to 9.

0.

8. A cleaning method for cleaning optical components made of soft glass material, A cleaning step in which the optical component is immersed in a cleaning solution and ultrasonically cleaned, A tap water rinsing step in which the optical component is rinsed with tap water, A pure water rinsing step in which the optical component is rinsed with pure water, The process includes a drying step for drying the optical component after rinsing off the cleaning solution, In the aforementioned pure water rinsing process, By supplying hydrogen gas, Hydrogen water is produced by injecting the hydrogen gas into pure water. Fill the water purification tank with the hydrogen water, This controls the oxidation-reduction potential of the hydrogen water. A cleaning method characterized by immersing the optical component in hydrogen water from a water purification tank for rinsing, while maintaining the oxidation-reduction potential of the hydrogen water at a predetermined value using the control means.

9. The cleaning method according to claim 8, characterized in that the hydrogen gas supplied when generating the hydrogen water is 2.6 to 4.0 L / min per 30 L of pure water.

10. The cleaning method according to claim 8, characterized in that the pure water rinsing means comprises a pH adjusting means for replenishing an alkaline aqueous solution to adjust the pH of the hydrogen water.

11. The cleaning method according to claim 8, characterized in that the hydrogen water used in the water purification tank is filtered for a certain period of time and returned to the hydrogen water generating means.

12. The cleaning method according to claim 8, characterized in that the supply of hydrogen gas is carried out by the electrolysis of water.

13. The cleaning method according to claim 8, characterized in that the oxidation-reduction potential of the hydrogen water is -400 to 0 mV.

14. The cleaning method according to claim 10, characterized in that the pH of the hydrogen water is 6.5 to 9.0.

Citation Information

Patent Citations

  • Method for cleaning optical element

    JP2002273358A

  • Cleaning water generating method, cleaning method, cleaning water generating device and cleaning device

    JP3590470B2