Gas control members and gas control devices

Abstract

To provide gas control members and gas control devices that can achieve both high ventilation capacity and low volatility. [Solution] The gas control member includes a flow path forming section in which, in the direction of gas flow, the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel are formed in the order of the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel, and which is positioned at the gas discharge channel and allows gas that has passed through the gas discharge channel to pass through but blocks moisture.

Description

Technical Field

[0001] The present invention relates to a gas control member and a gas control device.

Background Art

[0002] Conventionally, microplates for culturing cells and the like are known (see Patent Documents 1 and 2). A plurality of accommodating portions (wells) are formed in the microplate.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] In a conventional microplate, since there is only one gas inlet / outlet in the well, there is a problem that the ventilation ability is low and the volatility is high.

[0005] Therefore, an object of the present invention is to provide a gas control member and a gas control device capable of achieving both high ventilation ability and low volatility.

Means for Solving the Problems

[0006] A gas control member according to one aspect of the present invention includes a flow path forming section in which, in the direction of gas flow, the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel are formed in the order of the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel, and which is arranged at the gas discharge channel and allows gas that has passed through the gas discharge channel to pass through but blocks moisture. [Effects of the Invention]

[0007] According to the above embodiment, it is possible to achieve both high ventilation capacity and low volatility. [Brief explanation of the drawing]

[0008] [Figure 1] A perspective view of a gas control device according to the first embodiment. [Figure 2] An exploded perspective view of the gas control device according to the first embodiment. [Figure 3] A figure showing an example of a gas control device according to the first embodiment. [Figure 4] A diagram showing an example of configuration combinations for a gas control device according to the first embodiment. [Figure 5] A plan view of the gas control member according to the first embodiment. [Figure 6] A side view of the gas control member according to the first embodiment, as seen from the X direction. [Figure 7] A side view of the gas control member according to the first embodiment, as seen from the Y direction. [Figure 8] A cross-sectional view showing an example of a humidifying member and a culture member according to the first embodiment. [Figure 9] A cross-sectional view showing an example of a culture space according to the first embodiment. [Figure 10]A diagram showing an example of a shaking device and a gas generator according to the first embodiment. [Figure 11] A diagram showing the gas inlet and outlet of a microplate in a comparative example. [Figure 12] A diagram showing the gas flow of a gas control member according to the first embodiment. [Figure 13] A perspective view of a gas control member according to the second embodiment. [Figure 14] A perspective view of a gas control member according to the third embodiment. [Modes for carrying out the invention]

[0009] Embodiments of the present invention will be described below with reference to the drawings. In the following description, expressions indicating relative or absolute arrangements such as "parallel," "orthogonal," "center," and "coaxial" will not only strictly mean such arrangements or states, but will also include arrangements or states that are relatively displaced by an angle or distance that allows for tolerances or the same function to be obtained. In the drawings used in the following description, the scale of each component may be changed as appropriate in order to make each component recognizable.

[0010] <Gas control devices> Figure 1 is a perspective view of the gas control device 1 according to the first embodiment. Figure 2 is an exploded perspective view of the gas control device 1 according to the first embodiment. Figure 3 is a diagram showing an example of the gas control device 1 according to the first embodiment. Figure 4 is a diagram showing an example of a combination of the components of the gas control device 1 according to the first embodiment. Referring to Figures 1 to 4, the gas control device 1 comprises a gas control member 2, a gas introduction pipe 3 connected to gas inlets 12A and 12B, a gas pumping device 4 that pumps gas to the gas inlets 12A and 12B via the gas introduction pipe 3, a check valve 5 provided inside the gas introduction pipe 3, a filter 6 provided upstream or downstream of the check valve 5 in the gas flow direction, a shaking device 7 that shakes the gas control member 2 in the horizontal direction, and a gas generator 8 that generates gas.

[0011] In the following description, the orthogonal coordinate system of X, Y, and Z will be used as necessary. The X direction corresponds to the direction along the horizontal plane (the width direction of the gas control device 1). The Y direction corresponds to the direction orthogonal to the X direction in the horizontal plane (the depth direction of the gas control device 1). The Z direction corresponds to the height direction (vertical direction) of the gas control device 1 orthogonal to the X and Y directions. In the following description, among the X, Y, and Z directions, the side of the arrow in the figure is taken as the plus (+) side, and the side opposite to the arrow is taken as the minus (-) side for explanation. The +Z side corresponds to the upper side in the vertical direction, and the -Z side corresponds to the lower side in the vertical direction.

[0012] <Gas control member> FIG. 5 is a plan view of the gas control member 2 according to the first embodiment. FIG. 6 is a side view of the gas control member 2 according to the first embodiment as viewed from the X direction. FIG. 7 is a side view of the gas control member 2 according to the first embodiment as viewed from the Y direction. Referring to FIGS. 5 to 7 together, the gas control member 2 includes humidifying spaces 10A, 10B for humidifying the gas, culturing spaces 11A, 11B for culturing microorganisms or cells, gas inlets 12A, 12B, gas introduction channels 13A, 13B connecting the gas inlets 12A, 12B and the humidifying spaces 10A, 10B for introducing gas from the gas inlets 12A, 12B to the humidifying spaces 10A, 10B, humidifying gas channels 14A, 14B connecting the humidifying spaces 10A, 10B and the culturing spaces 11A, 11B for flowing the gas humidified in the humidifying spaces 10A, 10B to the culturing spaces 11A, 11B, gas discharge channels 16A, 16B connecting the culturing spaces 11A, 11B and the gas outlets 15A, 15B for discharging the gas that has passed through the culturing spaces 11A, 11B, and a channel forming portion 20 in which the gas introduction channels 13A, 13B, humidifying spaces 10A, 10B, humidifying gas channels 14A, 14B, culturing spaces 11A, 11B, and gas discharge channels 16A, 16B are formed in this order in the gas flow direction, and a moisture blocking portion 23 disposed at the gas outlets 15A, 15B for allowing the gas that has passed through the gas discharge channels 16A, 16B to pass through and blocking moisture. A lid portion 24 covering the humidifying spaces 10A, 10B and the culturing spaces 11A, 11B is provided on the channel forming portion 20.

[0013] [[ID= The flow path forming portion 20 is made of, for example, metal. The flow path forming portion 20 is formed of a metal or alloy containing, for example, aluminum. The flow path forming portion 20 may be formed by performing an anodizing treatment (for example, black anodizing treatment) on the entire surface of an aluminum plate. Thereby, the hardness, corrosion resistance, and wear resistance of the flow path forming portion 20 can be improved. Incidentally, the flow path forming portion 20 may be made of resin. The forming material of the flow path forming portion 20 is not limited to the above and can be changed according to the design specifications.

[0014] The flow path forming portion 20 is formed in a plate shape (plate-like). The flow path forming portion 20 is formed in a rectangular shape having a longitudinal direction in the X direction in plan view. The flow path forming portion 20 is formed in a size corresponding to the standard of a microplate. The standard of the microplate is, for example, the SBS standard. The flow path forming portion 20 is preferably designed to fit within the SBS standard. In the present embodiment, the flow path forming portion 20 is formed in a size corresponding to the standard of a 12-well microplate as a microplate.

[0015] The flow path forming portion 20 is formed in a size such that, in plan view, for example, the dimension in the X direction is 120 mm or more and 130 mm or less, and the dimension in the Y direction is 80 mm or more and 90 mm or less. The flow path forming portion 20 has chamfers with a radius of, for example, about R5 at four corner portions of the outer shape in plan view. The flow path forming portion 20 is formed in a size such that, in side view, for example, the dimension in the Z direction is 10 mm or more and 20 mm or less. Note that each dimension of the flow path forming portion 20 is not limited to the above and can be changed according to the design specifications.

[0016] The flow path forming portion 20 includes a lower structure portion 21 formed in a rectangular parallelepiped shape and an upper structure portion 22 integrally formed on the +Z side of the lower structure portion 21. The lower structure portion 21 is formed in a size such that, in side view, for example, the dimension in the Z direction is larger than that of the upper structure portion 22.

[0017] The superstructure 22 is formed such that, in plan view, its dimensions in the X and Y directions are smaller than those of the substructure. In plan view, the superstructure 22 has recesses 22h formed on both outer ends in the X direction, extending inward from the center in the Y direction. In plan view, the recesses 22h are formed such that, for example, their dimensions in the Y direction are between 40 mm and 60 mm. Note that the dimensions of the substructure 21 and the superstructure 22 are not limited to those described above and can be changed according to the design specifications.

[0018] The humidification spaces 10A and 10B are spaces for humidifying the gas. In a plan view of the flow channel forming section 20, two humidification spaces 10A and 10B are formed in place of the wells on the shorter side of the 12-well microplate. The humidification spaces 10A and 10B open in a first direction of the flow channel forming section 20. The first direction corresponds to the thickness direction of the plate-shaped flow channel forming section 20. In the example in Figure 5, the humidification spaces 10A and 10B open in the Z direction.

[0019] The humidification spaces 10A and 10B are formed in a cylindrical shape with an inner diameter of approximately 30 mm when viewed from above. However, the humidification spaces 10A and 10B may also be formed in a polygonal prism shape, or in a shape that combines different polygonal prisms and cylinders. The shape of the humidification spaces 10A and 10B is not limited to the above and can be changed according to the design specifications.

[0020] The two humidification spaces 10A and 10B are spaced apart from each other in the X direction when viewed from above. The two humidification spaces 10A and 10B are formed with the same volume. The humidification spaces 10A and 10B are formed with a larger volume than each of the multiple culture spaces 11A and 11B. With this configuration, it is easier to efficiently humidify each of the culture spaces 11A and 11B compared to when the humidification spaces 10A and 10B are formed with a volume less than or equal to each of the culture spaces 11A and 11B. The number, dimensions, and volume of humidification spaces 10A and 10B are not limited to those described above and can be changed according to the design specifications.

[0021] Culture spaces 11A and 11B are spaces for culturing microorganisms or cells. In a plan view of the channel formation section 20, multiple culture spaces 11A and 11B are formed around the humidification spaces 10A and 10B. Eight culture spaces 11A and 11B are formed in a 12-well microplate, corresponding to the wells on both sides in the short direction. Culture spaces 11A and 11B open in the first direction of the channel formation section 20. In the example in Figure 5, culture spaces 11A and 11B open in the Z direction.

[0022] The culture spaces 11A and 11B are formed in a cylindrical shape with an inner diameter of approximately 20 mm when viewed from above. However, the culture spaces 11A and 11B may also be formed in a polygonal prism shape, or in a shape that combines different polygonal prisms and cylinders. The shape of the culture spaces 11A and 11B is not limited to the above and can be changed according to the design specifications.

[0023] The four culture spaces 11A and 11B on one side in the Y direction are spaced apart from each other in the X direction when viewed from above. The eight culture spaces 11A and 11B on both sides in the Y direction are formed with the same volume. Note that the number, dimensions, and volume of the culture spaces 11A and 11B are not limited to those described above and can be changed according to the design specifications.

[0024] The gas inlet channels 13A and 13B connect the gas inlets 12A and 12B to the humidification spaces 10A and 10B, and are channels for introducing gas from the gas inlets 12A and 12B to the humidification spaces 10A and 10B. In the example shown in Figure 5, the gas inlets 12A and 12B are formed on the +Z end side (upper structure 22) of the channel forming section 20. The gas inlets 12A and 12B open in the X direction at the center of the Y direction of the recessed side surface (YZ plane) on both outer ends in the X direction of the upper structure 22. In side view, the gas inlets 12A and 12B are formed in a circular shape, for example, with an inner diameter of about 2 mm. Note that the number, dimensions, and shape of the gas inlets 12A and 12B are not limited to those described above and can be changed according to the design specifications.

[0025] In the example shown in Figure 5, the gas introduction channels 13A and 13B are holes formed on the +Z end side (superstructure 22) of the channel forming section 20. In a plan view of the channel forming section 20, the gas introduction channels 13A and 13B extend linearly in the X direction from the gas inlets 12A and 12B toward the humidification spaces 10A and 10B. The two gas introduction channels 13A and 13B on both sides in the X direction are formed to be the same length. The gas introduction channels 13A and 13B are formed in the shape of circular pipes with an inner diameter of approximately 2 mm, for example. Note that the number, dimensions, and shape of the gas introduction channels 13A and 13B are not limited to those described above and can be changed according to the design specifications.

[0026] The humidifying gas channels 14A and 14B connect the humidifying spaces 10A and 10B with the culture spaces 11A and 11B, and are channels for flowing the gas humidified in the humidifying spaces 10A and 10B to the culture spaces 11A and 11B. In the example shown in Figure 5, the humidifying gas channels 14A and 14B are grooves formed on the +Z end side (upper structure 22) of the channel forming section 20.

[0027] In a plan view of the flow path forming section 20, multiple humidifying gas flow paths 14A and 14B are formed with equal lengths, radiating outwards from the humidifying spaces 10A and 10B towards the multiple culture spaces 11A and 11B. In the example shown in Figure 5, eight humidifying gas flow paths 14A and 14B are formed, four from each of the two humidifying spaces 10A and 10B, towards the eight culture spaces 11A and 11B, with equal lengths to each other.

[0028] The gas discharge channels 16A and 16B connect the culture spaces 11A and 11B to the gas outlets 15A and 15B and are channels for discharging gas that has passed through the culture spaces 11A and 11B. In the example shown in the figure, the gas outlets 15A and 15B are formed on the +Z end side (upper structure 22) of the channel forming section 20. The gas outlets 15A and 15B open in the Y direction at locations spaced apart in the X direction on the Y-direction outer end side of the upper structure 22. In side view, the gas outlets 15A and 15B are formed in a circular shape, for example, with an inner diameter of about 2 mm. Note that the number, dimensions, and shape of the gas outlets 15A and 15B are not limited to those described above and can be changed according to the design specifications.

[0029] In the example shown in Figure 5, the gas discharge channels 16A and 16B are holes formed on the +Z end side (superstructure 22) of the channel forming section 20. In a plan view of the channel forming section 20, the gas discharge channels 16A and 16B extend linearly in the Y direction from the culture spaces 11A and 11B toward the gas outlets 15A and 15B. The eight gas discharge channels 16A and 16B on both sides in the Y direction are formed to be the same length as each other. The gas discharge channels 16A and 16B are formed in the shape of circular tubes with an inner diameter of approximately 2 mm, for example. Note that the number, dimensions, and shape of the gas discharge channels 16A and 16B are not limited to those described above and can be changed according to the design specifications.

[0030] In the flow channel forming section 20, gas introduction channels 13A, 13B, humidification spaces 10A, 10B, humidification gas channels 14A, 14B, culture spaces 11A, 11B, and gas discharge channels 16A, 16B are formed in this order in the direction of gas flow. In a plan view, the flow channel forming section 20 has a first region RA and a second region RB that are adjacent to each other in the longitudinal direction. In a plan view, the first region RA and the second region RB are each formed in a rectangular shape with their longitudinal direction in the Y direction.

[0031] The two humidification spaces 10A and 10B include, in a plan view, a first humidification space 10A located on the central side of the first region RA, and a second humidification space 10B located on the central side of the second region RB. In a plan view, the first humidification space 10A and the second humidification space 10B are spaced apart from each other in the X direction, but are located at the same position from each other in the Y direction. The first humidification space 10A and the second humidification space 10B are formed with the same volume from each other.

[0032] The eight culture spaces 11A and 11B, in a plan view, consist of four first culture spaces 11A arranged around the first humidification space 10A in the first region RA, and four second culture spaces 11B arranged around the second humidification space 10B in the second region RB. The four first culture spaces 11A and the four second culture spaces 11B are spaced apart from each other in the X direction and are located at the same position as each other in the Y direction. The four first culture spaces 11A and the four second culture spaces 11B are formed with the same volume as each other.

[0033] The two gas introduction channels 13A and 13B include, in plan view, a first gas introduction channel 13A connecting a first gas inlet 12A and a first humidification space 10A in a first region RA, and a second gas introduction channel 13B connecting a second gas inlet 12B and a second humidification space 10B in a second region RB. In plan view, the first gas introduction channel 13A and the second gas introduction channel 13B are located on opposite outer ends in the X direction. The first gas introduction channel 13A and the second gas introduction channel 13B are formed to be the same length as each other.

[0034] The eight humidifying gas channels 14A and 14B include, in a plan view, four first humidifying gas channels 14A formed to be of equal length and radiate from the first humidifying space 10A to the four first culture spaces 11A in the first region RA, and four second humidifying gas channels 14B formed to be of equal length and radiate from the second humidifying space 10B to the four second culture spaces 11B in the second region RB. The four first humidifying gas channels 14A and the four second humidifying gas channels 14B are formed to be of equal length.

[0035] The eight gas discharge channels 16A and 16B, in a plan view, include four first gas discharge channels 16A connecting four first culture spaces 11A and four first gas outlets 15A in the first region RA, and four second gas discharge channels 16B connecting four second culture spaces 11B and four second gas outlets 15B in the second region RB. The four first gas discharge channels 16A and the four second gas discharge channels 16B are spaced apart from each other in the X direction and are located at the same position as each other in the Y direction. The four first gas discharge channels 16A and the four second gas discharge channels 16B are formed to be the same length as each other.

[0036] In the first region RA of the flow path forming section 20, the first gas introduction flow path 13A, the first humidification space 10A, the first humidified gas flow path 14A, the first culture space 11A, and the first gas discharge flow path 16A are formed in the first gas flow direction (direction of arrow V1 shown in Figure 5) in this order. In the second region RB of the flow path forming section 20, the second gas introduction channel 13B, the second humidification space 10B, the second humidified gas channel 14B, the second culture space 11B, and the second gas discharge channel 16B are formed in the following order in a second gas flow direction (direction of arrow V2 shown in Figure 5) that is different from the first gas flow direction. In the flow path forming section 20, the first gas flow direction in the first region RA (direction of arrow V1 shown in Figure 5) and the second gas flow direction in the second region RB (direction of arrow V2 shown in Figure 5) are independent gas flow directions.

[0037] <Humidifying component> Figure 8 is a cross-sectional view showing an example of a humidifying member 25 and a culture member 26 according to the first embodiment. Referring also to Figure 8, the gas control member 2 further comprises a humidifying member 25 having a humidifying well 25W, which is attached from one side of the humidifying spaces 10A and 10B in the first direction. With the humidifying member 25 attached, the humidifying spaces 10A and 10B are in communication with the gas introduction passages 13A and 13B and the humidifying gas passages 14A and 14B, respectively. The humidifying member 25 may be detachably attached from one side of the humidifying spaces 10A and 10B.

[0038] The humidifying member 25 is formed in the shape of a bottomed cylindrical body, for example, to a size corresponding to the humidifying spaces 10A and 10B. The humidifying member 25 has a well side portion 25a that forms the outer circumference of the humidifying well 25W, and a well bottom portion 25b that forms the bottom surface of the humidifying well 25W. The humidifying member 25 is installed, for example, from the -Z side (lower structure 21 side) of the humidifying spaces 10A and 10B. When the humidifying member 25 is installed, the upper end of the humidifying member 25 is positioned lower than the gas introduction channels 13A and 13B and the humidifying gas channels 14A and 14B, respectively.

[0039] The humidifying member 25 has a canopy portion 25c that protrudes inward from the upper end of the well side portion 25a of the humidifying well 25W. The canopy portion 25c is formed in an annular shape that protrudes radially inward from the upper edge of the cylindrical well side portion 25a. When the humidifying member 25 is installed, the canopy portion 25c is positioned lower than each of the gas introduction channels 13A, 13B and the humidifying gas channels 14A, 14B.

[0040] <Culture material> The gas control member 2 is attached from one side of the culture spaces 11A and 11B in a first direction and further comprises a culture member 26 in which a culture well 26W is formed. With the culture member 26 attached, the culture spaces 11A and 11B are in communication with the humidifying gas flow paths 14A and 14B and the gas discharge flow paths 16A and 16B, respectively. The culture member 26 may be detachably attached from one side of the culture spaces 11A and 11B.

[0041] The culture member 26 is formed in the shape of a bottomed cylindrical body, for example, to a size corresponding to the culture spaces 11A and 11B. The culture member 26 has a well side portion 26a that forms the outer circumference of the culture well 26W and a well bottom portion 26b that forms the bottom surface of the culture well 26W. The culture member 26 is installed, for example, from the -Z side (lower structure 21 side) of the culture spaces 11A and 11B. When the culture member 26 is installed, the upper end of the culture member 26 is positioned lower than the gas introduction channels 13A and 13B and the humidifying gas channels 14A and 14B, respectively.

[0042] Figure 9 is a cross-sectional view showing an example of culture spaces 11A and 11B according to the first embodiment. Referring to Figure 9, for example, culture spaces 11A and 11B may be provided with baffles 27 for more efficient mixing and stirring of the culture medium, etc. Additionally, culture spaces 11A and 11B may be provided with removable baffles 27 as an option when it is desired to increase the gas supply capacity from the gas phase to the liquid phase. Furthermore, removable scaffolds 28 may be provided in the culture spaces 11A and 11B as an option when it is desired to attach microorganisms or cells.

[0043] <Moisture-blocking section> The moisture-blocking section 23 is positioned at the gas outlets 15A and 15B and has the function of allowing gas to pass through the gas outlet channels 16A and 16B while blocking moisture. The moisture-blocking section 23 is detachably attached to the openings of the gas outlets 15A and 15B in the channel forming section 20. The moisture-blocking section 23 is a filter with fine pores between 0.1 μm and 10 μm in size.

[0044] The moisture barrier section 23 has a structure in which, for example, a porous membrane and a packing material are laminated. The porous membrane is made of a fluororesin such as PTFE (polytetrafluoroethylene). The packing material is made of a resin such as polyester or polypropylene, and a nonwoven fabric, etc.

[0045] The moisture barrier section 23 is formed by, for example, attaching a porous membrane and packing material to the openings of the gas outlets 15A and 15B in this order via an adhesive layer. The adhesive layer is composed of, for example, a base material such as nonwoven fabric or PET (polyethylene terephthalate), and an acrylic adhesive. The configuration of the moisture barrier section 23 and the adhesive layer is not limited to the above and can be changed according to the design specifications.

[0046] <Gas introduction piping> Referring to Figures 1 and 2, one end of the gas introduction pipe 3 is connected to the gas inlets 12A and 12B of the flow path forming section 20. The other end of the gas introduction pipe 3 is connected to the gas pumping device 4. The gas introduction pipe 3 comprises a cylindrical first pipe section 31 and a circular second pipe section 32 with a smaller diameter than the first pipe section 31. The first pipe section 31 and the second pipe section 32 are arranged in this order in the direction of gas flow.

[0047] <Check valves and filters> The check valve 5 and filter 6 are installed inside the gas introduction piping 3. The check valve 5 and filter 6 are installed inside the first piping section 31 in the gas introduction piping 3. The filter 6 is installed upstream or downstream of the check valve 5 in the gas flow direction. The filter 6 may be composed of a porous membrane made of a fluororesin such as PTFE.

[0048] In the example shown in Figure 1, the filter 6 is installed downstream of the check valve 5 in the gas flow direction. Alternatively, the filter 6 may be installed upstream of the check valve 5 in the gas flow direction. The filter 6 may also be installed both upstream and downstream of the check valve 5 in the gas flow direction. The installation configuration of the filter 6 can be changed according to the design specifications.

[0049] <Cap> The gas control device 1 may further include a cap 35 that is detachably provided at the end of the gas introduction pipe 3 opposite to the gas inlet ports 12A and 12B. With this configuration, when the gas control device 1 is not in use, the opening of the gas introduction pipe 3 can be sealed with the cap 35, thereby preventing dust, bacteria, and other contaminants from entering the gas introduction pipe 3.

[0050] Furthermore, gas pumping devices 4 may be provided at both the gas inlet 12A (for example, the first gas inlet 12A) and the gas inlet 12B on the opposite side (for example, the second gas inlet 12B), or caps 35 may be provided at both.

[0051] <Gas pumping device> The gas pumping device 4 is a device that pumps gas to the gas inlets 12A and 12B via the gas introduction piping 3. The gas pumping device 4 includes a bellows pump having a cylindrical body 40 and a sphere 41 that can reciprocate inside the cylindrical body 40. The gas generated in the gas generator 8 is pumped to the gas inlets 12A and 12B by the reciprocating motion of the sphere 41 caused by the horizontal shaking motion of the gas control member 2.

[0052] <Shaking device> The shaking device 7 is a device that shakes the gas control member 2 in the horizontal direction. Referring to Figures 3 and 4, the shaking device 7 is, for example, a rotary shaking machine. The rotary shaking machine is composed of, for example, a base 70, a motor (not shown) that rotates the base 70, and a control device (not shown) that controls the rotational speed of the motor. Note that the configuration of the shaking device 7 is not limited to the above and can be changed according to the design specifications.

[0053] <Gas Generator> The gas generator 8 is a device that generates gas. The gas generator 8 is composed of, for example, a first gas generator 81 that generates a first gas and a second gas generator 82 that generates a second gas different from the first gas. In the example in Figure 3, the gas generator 8 is composed of a first gas generator 81 (nitrogen gas generator) that generates nitrogen (N2) and a second gas generator 82 (carbon dioxide gas generator) that generates carbon dioxide (CO2). Note that the configuration of the gas generator 8 is not limited to the above and can be changed according to the design specifications.

[0054] Figure 10 shows an example of a shaking device 7 and a gas generator 8 according to the first embodiment. Referring also to Figure 10, the shaking device 7 rotates the base 70 in the direction of arrow VR, thereby shaking the gas control member 2 (not shown in Figure 10) on the base 70 in a horizontal direction. Due to the horizontal shaking motion of the gas control member 2, the sphere 41 reciprocates inside the cylindrical body 40 of the gas pumping device 4, as shown in the frame FR of the figure. As a result, the gas generated in the gas generator 8 (for example, at least one of nitrogen gas and carbon dioxide gas) is pumped to the gas inlets 12A and 12B.

[0055] <Explanation of the comparative example> Figure 11 shows the gas inlet and outlet of the microplate 102 in the comparative example. As shown in Figure 11, the microplate 102 in the comparative example has multiple wells 102W arranged horizontally. A ventilation membrane 124 with multiple ventilation holes is provided on the microplate 102. In the comparative example, since there is only one gas inlet and outlet in each well 102W, there was a problem of low ventilation capacity and high volatility.

[0056] <Gas flow in gas control components> Figure 12 shows the gas flow in the gas control member 2 according to the first embodiment. As shown in Figure 12, the gas control member 2 according to the first embodiment includes a flow path forming section 20 and a moisture barrier section 23. A lid section 24 is provided on the flow path forming section 20 to cover the humidification spaces 10A, 10B and the culture spaces 11A, 11B. In the flow path forming section 20, gas introduction flow paths 13A, 13B (not shown in Figure 12), humidification spaces 10A, 10B, humidification gas flow paths 14A, 14B, culture spaces 11A, 11B, and gas discharge flow paths 16A, 16B are formed in this order in the direction of gas flow. In the first embodiment, gas introduced from gas inlets 12A, 12B flows in the order of gas introduction flow paths 13A, 13B, humidification spaces 10A, 10B, humidification gas flow paths 14A, 14B, culture spaces 11A, 11B, and gas discharge flow paths 16A, 16B, and is discharged through the moisture barrier section 23 of the gas outlets 15A, 15B. In the first embodiment, the gas flow is unidirectional, as indicated by the arrows in Figure 12. Therefore, the ventilation capacity is higher compared to the comparative example. Furthermore, moisture is blocked in the moisture-blocking section 23, allowing only gas to be discharged, thus maintaining humidity in the culture spaces 11A and 11B. Consequently, the volatility is lower compared to the comparative example.

[0057] <Examples of gas control device usage> In the example shown in Figure 3, six gas control members 2 are provided on the base of the shaking device 7. The six gas control members 2 are arranged in a row of three on each side in the X direction, on both outer sides in the Y direction of the base.

[0058] In the four gas control members 2 on both outer sides in the X direction, the gas pumping device 4 is provided on only one side of the first region RA and the second region RB. In other words, in the four gas control members 2 on both outer sides in the X direction, the gas pumping device 4 is provided via the gas introduction piping 3 at the gas inlet on one side of the first region RA and the second region RB, and a cap 35 is provided on the gas inlet side of the other side.

[0059] In the two gas control members 2 located in the center of the X-direction, gas pumping devices 4 are provided on both sides of the first region RA and the second region RB. In other words, in the two gas control members 2 located in the center of the X-direction, gas pumping devices 4 are provided via gas introduction piping 3 at the gas inlets on both sides of the first region RA and the second region RB.

[0060] As shown in the example of gas control device 1 in Figure 3, in the four gas control members 2 on both outer sides in the X direction, a cap 35 is provided on one side of the gas inlet of the first region RA and the second region RB. Therefore, microorganisms or cells can be cultured under conditions where there is only one gas inlet or outlet. On the other hand, in the four gas control members 2 on both outer sides in the X direction, a gas pumping device 4 is provided via a gas introduction pipe 3 at the other gas inlet, so the gas flow becomes unidirectional, and a high ventilation capacity can be obtained. For example, comparative culture experiments can be performed using the first region RA and the second region RB in the gas control member 2.

[0061] Furthermore, the piping extending from one gas pumping device 4 to the gas inlets on both sides may be branched by T-junctions or the like, so that gas is pumped from one gas pumping device 4 to the gas inlets on both sides. The number of gas control members 2 installed on the base and the manner in which the gas pumping devices 4 and caps 35 are installed on the gas control members 2 are not limited to the above and can be changed according to the design specifications.

[0062] <Effects and Effects> As described above, the gas control member 2 of this embodiment includes humidification spaces 10A, 10B for humidifying the gas, culture spaces 11A, 11B for culturing microorganisms or cells, gas introduction channels 13A, 13B that connect the gas inlets 12A, 12B to the humidification spaces 10A, 10B and introduce gas from the gas inlets 12A, 12B to the humidification spaces 10A, 10B, and a humidification gas channel 14A that connects the humidification spaces 10A, 10B to the culture spaces 11A, 11B and flows the gas humidified in the humidification spaces 10A, 10B to the culture spaces 11A, 11B. ,14B and gas discharge channels 16A,16B which connect culture spaces 11A,11B and gas outlets 15A,15B and discharge gas that has passed through culture spaces 11A,11B are formed in the order of gas introduction channels 13A,13B, humidification spaces 10A,10B, humidification gas channels 14A,14B, culture spaces 11A,11B and gas discharge channels 16A,16B in the direction of gas flow, and moisture blocking sections 23 which are positioned at gas outlets 15A,15B and allow gas that has passed through gas discharge channels 16A,16B to pass through but block moisture. With this configuration, gas introduced from gas inlets 12A and 12B flows through gas inlet channels 13A and 13B, humidification spaces 10A and 10B, humidification gas channels 14A and 14B, culture spaces 11A and 11B, and gas discharge channels 16A and 16B in that order, and is discharged through moisture barrier sections 23 at gas outlets 15A and 15B, thereby enabling ventilation. In addition, moisture is blocked at the moisture barrier sections 23, allowing the culture spaces 11A and 11B to be kept moist. Therefore, both high ventilation capacity and low volatility can be achieved.

[0063] In this embodiment, in a plan view of the flow path forming section 20, multiple culture spaces 11A and 11B are formed around the humidification spaces 10A and 10B, and multiple humidification gas flow paths 14A and 14B are formed with the same length to radiate from the humidification spaces 10A and 10B toward the multiple culture spaces 11A and 11B. For example, if, in a plan view of the flow path forming section 20, multiple culture spaces 11A, 11B are formed unevenly to one side of the humidification spaces 10A, 10B, and multiple humidification gas flow paths 14A, 14B are formed with different lengths, there is a high possibility that the gas humidified in the humidification spaces 10A, 10B will not flow uniformly to each culture space 11A, 11B. In contrast, with this configuration, in a plan view of the flow path forming section 20, multiple culture spaces 11A, 11B are formed around the humidification spaces 10A, 10B, and multiple humidification gas flow paths 14A, 14B are formed radially with the same length, so that the gas humidified in the humidification spaces 10A, 10B can flow uniformly to each culture space 11A, 11B.

[0064] In this embodiment, the channel forming section 20 is formed to a size corresponding to the specifications of the microplate. This configuration allows for the replacement of the gas control member 2 in a conventional microplate.

[0065] In this embodiment, the channel forming section 20 is formed to a size corresponding to the standard of a 12-well microplate. In a plan view of the channel forming section 20, two humidification spaces 10A and 10B are formed in place of the wells on the short-side central side of the 12-well microplate, eight culture spaces 11A and 11B are formed corresponding to the wells on both sides of the short-side of the 12-well microplate, and eight humidification gas channels 14A and 14B are formed, four from each of the two humidification spaces 10A and 10B, and directed toward the eight culture spaces 11A and 11B, with each channel being of the same length. This configuration allows the gas control component 2 to be replaced in a conventional 12-well microplate. Furthermore, compared to the case where the eight humidifying gas channels 14A and 14B are formed with different lengths, the humidified gas in the humidifying spaces 10A and 10B can be made to flow uniformly to each culture space 11A and 11B.

[0066] In this embodiment, the humidification spaces 10A and 10B open in a first direction to the flow path forming section 20. The gas control member 2 is attached from one side of the humidification spaces 10A and 10B in the first direction and further comprises a humidification member 25 in which a humidification well 25W is formed. With the humidification member 25 attached, the humidification spaces 10A and 10B are in communication with the gas introduction flow paths 13A and 13B and the humidification gas flow paths 14A and 14B, respectively. With this configuration, when the humidifying member 25 is installed, the culture spaces 11A and 11B can be humidified by filling the humidifying well 25W with water. In addition, when the humidifying member 25 is installed, the gas flow can be kept from being interrupted.

[0067] In this embodiment, the humidifying member 25 has a canopy portion 25c that protrudes inward from the upper end side of the well side portion 25a of the humidifying well 25W. With this configuration, when the humidifying member 25 is installed, the eaves portion 25c can prevent the water filling the humidifying well 25W from splashing out. This prevents water from splashing out into the culture spaces 11A and 11B.

[0068] In this embodiment, the culture spaces 11A and 11B open in the first direction of the flow path forming section 20. The gas control member 2 is attached from one side of the culture spaces 11A and 11B in the first direction and further comprises a culture member 26 in which a culture well 26W is formed. With the culture member 26 attached, the culture spaces 11A and 11B are in communication with the humidifying gas flow paths 14A and 14B and the gas discharge flow paths 16A and 16B, respectively. With this configuration, microorganisms or cells can be placed in the culture well 26W and cultured while the culture member 26 is attached. Furthermore, the gas flow can be kept from being interrupted while the culture member 26 is attached.

[0069] In this embodiment, the moisture-blocking section 23 is a filter that is detachably attached to the openings of the gas outlets 15A and 15B in the flow path forming section 20 and has fine pores of 0.1 μm to 10 μm formed therein. With this configuration, the moisture-blocking section 23 is a detachable filter, making it easy to use.

[0070] The gas control device 1 of this embodiment comprises the gas control member 2 described above, a gas introduction pipe 3 connected to gas inlets 12A and 12B, a gas pumping device 4 that pumps gas to the gas inlets 12A and 12B via the gas introduction pipe 3, a check valve 5 provided inside the gas introduction pipe 3, and a filter 6 provided upstream or downstream of the check valve 5 in the gas flow direction. This configuration provides a gas control device 1 that achieves both high ventilation capacity and low volatility by incorporating the gas control member 2 described above. Furthermore, the check valve 5 prevents backflow of the gas being pumped into the gas inlets 12A and 12B. Additionally, the filter 6 prevents dust, bacteria, and other contaminants from entering the gas inlets 12A and 12B.

[0071] In this embodiment, the gas control device 1 further comprises a shaking device 7 that shakes the gas control member 2 in the horizontal direction, and a gas generator 8 that generates gas. The gas pumping device 4 includes a bellows pump having a cylindrical body 40 and a sphere 41 that can reciprocate inside the cylindrical body 40. The reciprocating motion of the sphere 41 due to the horizontal shaking operation of the gas control member 2 causes the gas generated by the gas generator 8 to be pumped to the gas inlets 12A and 12B. With this configuration, the gas generated by the gas generator 8 can be pumped under pressure by the operation of the shaking device 7 and the bellows pump.

[0072] <Second Embodiment> Figure 13 is a perspective view of the gas control member 202 according to the second embodiment. The gas control member 202 according to the second embodiment will now be described with reference to Figure 13. In the configuration shown in Figure 13, components similar to those in the above-described embodiment are denoted by the same reference numerals, and their detailed descriptions are omitted.

[0073] The gas control member 202 includes a flow path forming section 220 and a moisture barrier section (not shown). The flow path forming section 220 comprises a lower structure section 221 formed in the shape of a rectangular parallelepiped (plate), and an upper structure section 222 provided on the +Z side of the lower structure section 221. The upper structure section 222 may be detachably attached to the lower structure section 221. The lower structure section 221 may have an opening 221h, such as a recess or through hole, that opens in the Z direction so that the upper structure section 222 can be fitted into it.

[0074] The superstructure 222 comprises a first structural group 222AG including a plurality of first structural elements 222A, and a second structural group 222BG including a plurality of second structural elements 222B that are different from the first structural elements 222A. The first structural group 222AG is located on the -Y end side of the substructure 221 in a plan view. The first structural group 222AG comprises four first structural elements 222A arranged in the X direction. Note that the arrangement and configuration of the first structural group 222AG are not limited to those described above and can be changed according to the design specifications.

[0075] The first structure 222A is formed in a rectangular shape with sides along the X and Y directions in a plan view. In a plan view, the first structure 222A includes a humidification space 210 located in the center of the first structure 222A, four culture spaces 211 arranged around the humidification space 210, a gas introduction channel 213 connecting the gas inlet 212 and the humidification space 210, four humidification gas channels 214 formed radially from the humidification space 210 toward the four culture spaces 211 and of equal length, and four gas discharge channels 216 connecting the four culture spaces 211 toward the four gas outlets 215. In the first structure 222A, the gas introduction channel 213, humidification space 210, humidification gas channels 214, culture spaces 211, and gas discharge channels 216 are formed in this order in the direction of gas flow. Note that the shape of the first structure 222A is not limited to the above and can be changed according to the design specifications.

[0076] The second structural group 222BG is located on the opposite outer end side in the Y direction from the first structural group 222AG in a plan view. The second structural group 222BG is located on the +Y end side of the substructure 221 in a plan view. The second structural group 222BG comprises four second structures 222B arranged in the X direction. Note that the arrangement and configuration of the second structural group 222BG are not limited to those described above and can be changed according to the design specifications.

[0077] The second structure 222B is formed in a rectangular shape with sides along the X and Y directions in a plan view. Multiple culture spaces 211B are formed in the second structure 222B. In a plan view, nine culture spaces 211B are formed in the second structure 222B, arranged in a 3x3 grid. Note that the shape of the second structure 222B is not limited to the above and can be changed according to the design specifications.

[0078] As described above, the gas control member 202 of this embodiment comprises a first structural group 222AG including a plurality of first structural groups 222A, and a second structural group 222BG including a plurality of second structural groups 222B that are different from the first structural groups 222A. In the first structural group 222A, a gas introduction channel 213, a humidification space 210, a humidified gas channel 214, a culture space 211, and a gas discharge channel 216 are formed in this order in the gas flow direction. In the second structural group 222B, a plurality of culture spaces 211B are formed. With this configuration, a high ventilation capacity can be obtained because the gas flow is unidirectional in each first structure 222A. Furthermore, in each second structure 222B, microorganisms or cells can be cultured under conditions where there is only one gas inlet or outlet. For example, comparative culture experiments can be conducted using the first structure group 222AG and the second structure group 222BG.

[0079] <Third Embodiment> Figure 14 is a perspective view of the gas control member 302 according to the third embodiment. The gas control member 302 according to the third embodiment will now be described with reference to Figure 14. In the configuration shown in Figure 14, components similar to those in the embodiments described above are denoted by the same reference numerals, and their detailed descriptions are omitted.

[0080] The gas control member 302 includes a flow path forming section 320 and a moisture barrier section (not shown). The flow path forming section 320 comprises a lower structure section 321 formed in the shape of a rectangular parallelepiped (plate), and an upper structure section 322 provided on the +Z side of the lower structure section 321. The upper structure section 322 may be detachably attached to the lower structure section 321. The lower structure section 321 may have an opening 321h, such as a recess or through hole, that opens in the Z direction so that the upper structure section 322 can be fitted into it.

[0081] The superstructure 322 comprises a plurality of first structures 322A and a plurality of second structures 322B that are different from the first structures 322A. In a plan view, the first structures 322A are arranged in pairs in the X direction on the Y-center side of the lower structure 321. In a plan view, the second structures 322B are arranged in a total of eight, four on each side in the X direction, on both Y-outer sides of the lower structure 321.

[0082] The first structure 322A is formed in a rectangular shape with a longitudinal side along the X direction in a plan view. The first structure 322A includes a humidification space 310 which includes two cylindrical spaces 310a spaced apart in the X direction and a communication space 310b connecting them in a plan view, a gas introduction channel 313 which connects the gas inlet 312 to the humidification space 310, and four first humidification gas channels 314A which are formed from the humidification space 310 toward the culture space 311 and are of equal length to each other. Note that the shape of the first structure 322A is not limited to the above and can be changed according to the design specifications.

[0083] The second structure 322B is formed in a rectangular shape with sides along the X and Y directions in a plan view. The second structure 322B has a culture space 311 located on the central side of the second structure 322B in a plan view, a second humidifying gas channel 314B connecting the culture space 311 and the humidifying space 310, and a gas discharge channel 316 connecting the culture space 311 and the gas outlet 315. The shape of the second structure 322B is not limited to the above and can be changed according to the design specifications.

[0084] In the flow channel forming section 320, with the upper structure 322 attached to the lower structure 321, the gas introduction flow channel 313, humidification space 310, humidification gas flow channels 314A, 314B, culture space 311, and gas discharge flow channel 316 are formed in this order in the gas flow direction. In other words, in the flow channel forming section 320, with multiple first structures 322A and multiple second structures 322B combined, the gas introduction flow channel 313, humidification space 310, humidification gas flow channels 314A, 314B, culture space 311, and gas discharge flow channel 316 are formed in this order in the gas flow direction.

[0085] As described above, the gas control member 302 of this embodiment comprises a plurality of first structures 322A and a plurality of second structures 322B that are different from the first structures 322A. When the plurality of first structures 322A and the plurality of second structures 322B are combined, the gas introduction channel 313, humidification space 310, humidification gas channels 314A, 314B, culture space 311, and gas discharge channel 316 are formed in this order in the gas flow direction. With this configuration, when multiple first structures 322A and multiple second structures 322B are combined, the gas flow becomes unidirectional, thus providing high ventilation capacity. Furthermore, multiple first structures 322A and multiple second structures 322B can be freely combined to perform culture of microorganisms or cells. For example, wells of various sizes (humidified wells, culture wells, etc.) can be freely configured in the plate's exoskeleton (lower structure 321) according to the user's purpose.

[0086] <Variation> In the embodiments described above, in a plan view of the flow path forming section, multiple culture spaces are formed around the humidification space, and multiple humidification gas flow paths are formed radially from the humidification space toward the multiple culture spaces, with each path being of the same length. However, the invention is not limited to this example. For example, in a plan view of the flow path forming section, multiple culture spaces may be formed biased toward one side of the humidification space, and multiple humidification gas flow paths may be formed with different lengths. The configuration of the culture spaces and humidification gas flow paths (number, shape, and location) can be changed according to the design specifications.

[0087] In the embodiments described above, the channel forming portion was described as being formed to a size corresponding to the microplate specifications, but this is not limited to this. For example, the channel forming portion may be formed to a size different from the microplate specifications. The configuration of the channel forming portion can be changed according to the design specifications.

[0088] In the embodiment described above, the channel forming section is formed to a size corresponding to the specifications of a 12-well microplate, and in a plan view of the channel forming section, two humidification spaces are formed in place of the central well in the short direction of the 12-well microplate, eight culture spaces are formed corresponding to the wells on both sides in the short direction of the 12-well microplate, and eight humidification gas channels are formed, four from each of the two humidification spaces toward the eight culture spaces, all of equal length. However, the embodiment is not limited to this example. For example, the channel forming section may be formed to a size corresponding to the specifications of other microplates such as 6-well microplates, 24-well microplates, 48-well microplates, and 96-well microplates. The configuration of the channel forming section can be changed according to the design specifications.

[0089] In the embodiment described above, the humidification space is open in the first direction of the flow path forming section, and the gas control member is attached from one side of the humidification space in the first direction. The gas control member further comprises a humidification member having a humidification well formed therein, and in the state in which the humidification member is attached, the humidification space is in communication with the gas introduction flow path and the humidification gas flow path, respectively. However, the embodiment is not limited to this example. For example, the gas control member itself may have a humidification well formed therein. The installation method of the humidification member can be changed according to the design specifications.

[0090] In the embodiments described above, the humidifying member was described as having a canopy portion that protrudes inward from the upper end of the well side surface of the humidifying well, but it is not limited to this. For example, the humidifying member does not need to have a canopy portion on the well side surface. The installation method of the canopy portion can be changed according to the design specifications.

[0091] In the embodiment described above, the culture space is open in the first direction of the flow path forming section, and the gas control member is attached from one side of the culture space in the first direction, further comprising a culture member in which a culture well is formed. In the state in which the culture member is attached, the culture space is described as being in communication with the humidifying gas flow path and the gas discharge flow path, respectively, but it is not limited to this. For example, the culture well may be formed in the gas control member itself. The installation method of the culture member can be changed according to the design specifications.

[0092] In the embodiments described above, the moisture barrier was described as a filter that is detachably attached to the opening of the gas outlet in the flow channel forming section and has fine pores of 0.1 μm to 10 μm formed therein, but it is not limited to this. For example, the moisture barrier may be integrally formed with the opening of the gas outlet in the flow channel forming section. For example, the moisture barrier may be a filter with fine pores of less than 0.1 μm or more than 10 μm formed therein. For example, the moisture barrier may be formed from a material other than a filter with fine pores. The form of the moisture barrier can be changed according to the design specifications.

[0093] The gas control device of the above-described embodiment includes, but is not limited to, an example comprising the gas control member, a gas introduction pipe connected to a gas inlet, a gas pumping device that pumps gas to the gas inlet via the gas introduction pipe, a check valve provided inside the gas introduction pipe, and a filter provided upstream or downstream of the check valve in the gas flow direction. For example, the gas control device may further include a control device for controlling the gas pumping device. The configuration of the gas control device can be changed according to the design specifications.

[0094] In the embodiments described above, the gas control device further comprises a shaking device that shakes the gas control member horizontally and a gas generator that generates gas, and the gas pumping device includes a bellows pump having a cylindrical body and a sphere capable of reciprocating motion inside the cylindrical body, and the gas generated by the gas generator is pumped to the gas inlet by the reciprocating motion of the sphere due to the horizontal shaking operation of the gas control member, but the invention is not limited to this. For example, the gas pumping device may include a pump other than a bellows pump. For example, the gas control device may include a drive device other than a shaking device. The configuration of the gas control device can be changed according to the design specifications.

[0095] Although embodiments of the present invention have been described above, the present invention is not limited thereto, and additions, omissions, substitutions, and other modifications to the configuration are possible without departing from the spirit of the invention, and the above embodiments can be combined as appropriate.

[0096] (Note 1) A flow path forming section is formed in the order of gas flow direction, with the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel, comprising: a humidification space for humidifying gas; a culture space for culturing microorganisms or cells; a gas introduction channel connecting a gas inlet to the humidification space and introducing the gas from the gas inlet to the humidification space; a humidification gas channel connecting the humidification space and the culture space and flowing the gas humidified in the humidification space to the culture space; and a gas discharge channel connecting the culture space to a gas outlet and discharging the gas that has passed through the culture space. The system includes a moisture-blocking section positioned at the gas outlet, which allows gas that has passed through the gas discharge channel to pass through but blocks moisture. Gas control component.

[0097] (Note 2) In a plan view of the aforementioned channel forming section, Multiple culture spaces are formed around the humidification space. The humidifying gas flow path is formed in multiple locations of equal length, radiating outwards from the humidifying space to the multiple culture spaces. The gas control component described in Appendix 1.

[0098] (Note 3) The channel forming section is formed to a size corresponding to the specifications of the microplate. The gas control member described in Appendix 1 or 2.

[0099] (Note 4) The channel forming section is formed to a size corresponding to the specifications of a 12-well microplate as the microplate. In a plan view of the aforementioned channel forming section, The aforementioned humidification spaces are formed in two locations in the 12-well microplate, replacing the wells on the shorter side in the center. The culture spaces are formed in eight locations in the 12-well microplate, corresponding to the wells on both sides in the shorter direction. The humidifying gas flow paths are formed in eight equal lengths, four from each of the two humidifying spaces, and extending toward the eight culture spaces. The gas control component described in Appendix 3.

[0100] (Note 5) The humidification space is open in the first direction of the flow path forming section, The humidifying member is further attached from one side of the humidifying space in the first direction and has a humidifying well formed therein, In the state in which the humidifying member is installed, the humidifying space is in communication with the gas introduction path and the humidifying gas path, respectively. A gas control component as described in any of the appendices 1 to 4.

[0101] (Note 6) The humidifying member has a canopy portion that protrudes inward from the upper end of the well side portion of the humidifying well. The gas control component described in Appendix 5.

[0102] (Note 7) The culture space is open in the first direction of the channel forming section, The culture member further comprises a culture member attached from one side of the culture space in the first direction, and having a culture well formed therein. In the state in which the culture member is installed, the culture space is in communication with the humidifying gas flow path and the gas discharge flow path, respectively. A gas control component as described in any of the notes 1 to 6.

[0103] (Note 8) The moisture-blocking portion is a filter that is detachably attached to the opening portion of the gas outlet in the flow path forming portion and has fine pores of 0.1 μm to 10 μm formed therein. A gas control component as described in any of the appendices 1 to 7.

[0104] (Note 9) A gas control member described in any of the appendices 1 to 8, A gas introduction pipe connected to the aforementioned gas inlet, A gas pumping device that pumps gas to the gas inlet via the gas introduction piping, A check valve is provided inside the aforementioned gas introduction pipe, A filter provided on the upstream or downstream side of the check valve in the gas flow direction, Gas control device.

[0105] (Note 10) A shaking device for shaking the gas control member in the horizontal direction, The gas generator further comprises the gas generating device that generates the aforementioned gas, The gas pumping device includes a bellows pump having a cylindrical body and a sphere capable of reciprocating motion inside the cylindrical body. The horizontal shaking motion of the gas control member causes the sphere to reciprocate, thereby pressurizing the gas generated by the gas generator and sending it to the gas inlet. The gas control device described in Appendix 9. [Explanation of symbols]

[0106] 1...Gas control device, 2...Gas control component, 3...Gas introduction piping, 4...Gas pumping device, 5...Check valve, 6...Filter, 7...Shaking device, 8...Gas generator, 10A,10B...Humidification space, 11A,11B...Culture space, 12A,12B...Gas inlet, 13A,13B...Gas introduction channel, 14A,14B...Humidification gas channel, 15A,15B...Gas outlet, 16A,16B...Gas outlet channel, 20...Channel forming section, 23...Moisture blocking section, 25...Humidification component, 25a...Well side section, 25W...Humidification well, 25c...Eaves section, 26 ...Culture component, 26W...Culture well, 40...Cylinder, 41...Sphere, 202...Gas control component, 210...Humidification space, 211, 211B...Culture space, 212...Gas inlet, 213...Gas inlet channel, 214...Humidification gas channel, 215...Gas outlet, 216...Gas outlet channel, 220...Channel forming section, 302...Gas control component, 310...Humidification space, 311...Culture space, 312...Gas inlet, 313...Gas inlet channel, 314A, 314B...Humidification gas channel, 315...Gas outlet, 316...Gas outlet channel, 320...Channel forming section

Claims

1. A flow path forming section is formed in the order of gas flow direction, with the gas introduction channel, the humidification space, the humidification gas channel, the culture space, and the gas discharge channel, comprising: a humidification space for humidifying gas; a culture space for culturing microorganisms or cells; a gas introduction channel connecting a gas inlet to the humidification space and introducing the gas from the gas inlet to the humidification space; a humidification gas channel connecting the humidification space and the culture space and flowing the gas humidified in the humidification space to the culture space; and a gas discharge channel connecting the culture space to a gas outlet and discharging the gas that has passed through the culture space. The system includes a moisture-blocking section positioned at the gas outlet, which allows gas that has passed through the gas discharge channel to pass through but blocks moisture. Gas control component.

2. In a plan view of the aforementioned channel forming section, Multiple culture spaces are formed around the humidification space. The humidifying gas flow path is formed in multiple locations of equal length, radiating outwards from the humidifying space to the multiple culture spaces. The gas control member according to claim 1.

3. The channel forming section is formed to a size corresponding to the specifications of the microplate. The gas control member according to claim 1 or 2.

4. The channel forming section is formed to a size corresponding to the specifications of a 12-well microplate as the microplate. In a plan view of the aforementioned channel forming section, The aforementioned humidification spaces are formed in two places in the 12-well microplate, replacing the wells on the shorter side in the center. The culture spaces are formed in eight locations in the 12-well microplate, corresponding to the wells on both sides in the shorter direction. The humidifying gas flow paths are formed in eight equal lengths, four from each of the two humidifying spaces, and extending toward the eight culture spaces. The gas control member according to claim 3.

5. The humidification space is open in the first direction of the flow path forming section, The humidifying member is further provided, which is attached from one side of the humidifying space in the first direction and has a humidifying well formed therein. In the state in which the humidifying member is installed, the humidifying space is in communication with the gas introduction path and the humidifying gas path, respectively. The gas control member according to claim 1 or 2.

6. The humidifying member has a canopy portion that protrudes inward from the upper end of the well side portion of the humidifying well. The gas control member according to claim 5.

7. The culture space is open in the first direction of the channel forming section, The culture member further comprises a culture member attached from one side of the culture space in the first direction, and having a culture well formed therein. In the state in which the culture member is installed, the culture space is in communication with the humidifying gas flow path and the gas discharge flow path, respectively. The gas control member according to claim 1 or 2.

8. The moisture-blocking portion is a filter that is detachably attached to the opening portion of the gas outlet in the flow path forming portion and has fine pores of 0.1 μm to 10 μm formed therein. The gas control member according to claim 1 or 2.

9. A gas control member according to claim 1 or 2, A gas introduction pipe connected to the aforementioned gas inlet, A gas pumping device that pumps gas to the gas inlet via the gas introduction piping, A check valve is provided inside the aforementioned gas introduction pipe, A filter provided on the upstream or downstream side of the check valve in the gas flow direction, Gas control device.

10. A shaking device for shaking the gas control member in the horizontal direction, The gas generator further comprises the gas generating device that generates the aforementioned gas, The gas pumping device includes a bellows pump having a cylindrical body and a sphere capable of reciprocating motion inside the cylindrical body. The horizontal shaking motion of the gas control member causes the sphere to reciprocate, thereby pressurizing the gas generated by the gas generator and sending it to the gas inlet. The gas control device according to claim 9.

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