Substrate processing equipment

Abstract

The present invention provides a substrate processing apparatus that can effectively spray cleaning solution from a shower ring even when the shower ring is rotated at a relatively low rotational speed. [Solution] The substrate processing apparatus 1 includes a shower ring 37 configured to spray cleaning liquid by centrifugal force. The shower ring 37 is provided below a plurality of discharge ports 53 and includes a lower auxiliary portion 57 that is formed in the shape of a ring. The lower auxiliary portion 57 includes a liquid receiving upper surface 57A formed in the shape of a ring, and a second outer peripheral surface 57B that is formed in the shape of a cylinder and inclined downward from the outer peripheral edge of the liquid receiving upper surface 57A and toward the central axis, in order to separate the cleaning liquid received by the liquid receiving upper surface 57A from the lower auxiliary portion 57 at the boundary with the liquid receiving upper surface 57A.

Description

Technical Field

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[0003]

[0001] The present invention relates to a substrate processing apparatus for processing a substrate. Examples of the substrate include a semiconductor substrate, a substrate for an FPD (Flat Panel Display), a glass substrate for a photomask, a substrate for an optical disk, a substrate for a magnetic disk, a ceramic substrate, a substrate for a solar cell, and the like. Examples of the FPD include a liquid crystal display device, an organic EL (electroluminescence) display device, and the like.

Background Art

[0002] Conventional substrate processing apparatuses include a substrate holding unit for holding a substrate, a rotation driving unit for rotating the substrate holding unit around a vertical axis, a nozzle for supplying a processing liquid to the substrate held by the substrate holding unit, a cup, and a spray disk for cleaning the cup (see, for example, Patent Documents 1 to 3). The processing liquid scattered from the rotating substrate adheres to the inside of the cup. Therefore, a cup cleaning process is performed in which cleaning liquid is periodically supplied from the spray disk to clean the inside of the cup.

[0003] Patent Document 1 discloses a spray disk. An opening is provided on the lower surface of the spray disk, and a plurality of discharge ports are provided on the outer peripheral surface of the spray disk. Further, a storage portion for storing the cleaning liquid is formed inside the spray disk. The plurality of discharge ports communicate with the storage portion, and the storage portion communicates with the opening. The opening receives the cleaning liquid discharged from the cleaning liquid supply portion (nozzle). Further, when the spray disk is rotated, the cleaning liquid in the storage portion scatters from the plurality of discharge ports.

[0004] Patent Document 4 discloses a disk-shaped cleaning jig (spray disk) for supplying cleaning liquid to an outer cup and an inner cup. An annular peripheral ceiling portion and an annular peripheral bottom portion that each project outward are formed on the side surface of the cleaning jig. An annular discharge port is formed over the entire circumference of the cleaning jig between the peripheral ceiling portion and the peripheral bottom portion. A hole leading to the discharge port is formed on the lower surface of the peripheral bottom portion.

[0005] The cleaning jig is rotated at a low speed while cleaning fluid is supplied from the cleaning nozzle toward the underside of the jig. As a result, the cleaning fluid flows along the underside of the jig, and some of the cleaning fluid falls onto the outer slope of the inner cup. Another portion of the cleaning fluid enters the holes at the bottom periphery, forming a reservoir due to surface tension. The cleaning jig is then rotated at high speed. This causes the reservoir of cleaning fluid to be pushed outward by centrifugal force, and the cleaning fluid is sprayed from the annular outlet toward the outer cup.

[0006] Patent Document 5 discloses that a circumferential groove is formed on the side surface of the cup cleaning member (spraying disc), and a discharge port for cleaning liquid is formed deep inside the circumferential groove. [Prior art documents] [Patent Documents]

[0007] [Patent Document 1] Japanese Patent Publication No. 2016-174131 [Patent Document 2] Japanese Patent Publication No. 2017-092244 [Patent Document 3] Japanese Patent Publication No. 2021-044494 [Patent Document 4] International Publication No. 2021 / 193200 [Patent Document 5] Japanese Patent Application Publication No. 09-117708 [Overview of the project] [Problems that the invention aims to solve]

[0008] However, conventional substrate processing equipment has the following problem: When the showering (spraying disc) is rotated at a predetermined rotational speed (rpm: revolutions per minute), the cleaning liquid supplied to the showering is scattered in a height direction corresponding to that rotational speed.

[0009] However, if the rotation speed is reduced beyond that range, the cleaning solution may not be properly dispersed from the shower ring, but instead flow down along the outer surface extending vertically downwards from the multiple outlets of the shower ring and their vicinity. In other words, when the shower ring is rotated at a relatively low rotation speed, it may not be possible to properly disperse the cleaning solution from the shower ring.

[0010] The present invention has been made in view of these circumstances, and aims to provide a substrate processing apparatus that can effectively spray cleaning solution from a showering ring even when the showering ring is rotated at a relatively low rotational speed. [Means for solving the problem]

[0011] To achieve this objective, the present invention has the following configuration. That is, the substrate processing apparatus for processing a substrate according to the present invention comprises a substrate holding part for holding the substrate, a rotating shaft extending downward from the substrate holding part, a processing liquid nozzle for discharging processing liquid onto the substrate held by the substrate holding part, an inner cup formed to surround the outer circumference of the substrate holding part in a plan view, an outer cup formed to surround the outer circumference of the inner cup in a plan view, a shower ring disposed inside the inner cup, the shower ring configured to spray the cleaning liquid by centrifugal force in order to clean the inner cup and the outer cup, a rotation drive unit for rotating the shower ring around the rotating shaft, and a cleaning liquid nozzle for discharging the cleaning liquid onto the shower ring which is rotating around the rotating shaft, wherein the shower ring has a disc-shaped ceiling member and The ceiling member comprises: a side wall extending cylindrically downward from the outer peripheral edge of the ceiling member; a liquid holding member formed in a ring shape on the lower side of the ceiling member so as to extend from the side wall toward the central axis of the side wall and to hold the cleaning liquid discharged from the cleaning liquid nozzle; a plurality of discharge ports provided on the side wall and arranged around the central axis; and a lower auxiliary portion provided on the first outer peripheral surface of the side wall below the plurality of discharge ports and formed in a ring shape, wherein the lower auxiliary portion comprises a liquid receiving upper surface formed in a ring shape to receive the cleaning liquid from below, and a second outer peripheral surface formed in a cylindrical shape so as to be inclined downward from the outer peripheral edge of the liquid receiving upper surface toward the central axis at the boundary with the liquid receiving upper surface to separate the cleaning liquid received on the liquid receiving upper surface from the lower auxiliary portion.

[0012] According to the substrate processing apparatus of the present invention, a lower auxiliary portion is provided on the first outer peripheral surface of the side wall of the shower ring. The lower auxiliary portion comprises a liquid receiving upper surface and a second outer peripheral surface. The liquid receiving upper surface can receive cleaning liquid that flows down along the first outer peripheral surface from the multiple discharge ports of the shower ring and their vicinity. Here, we assume that the second outer peripheral surface extends directly downward from the outer peripheral edge of the liquid receiving upper surface. In this case, even if the cleaning liquid is received by the liquid receiving upper surface, the cleaning liquid may flow down along the second outer peripheral surface. In this regard, the second outer peripheral surface of the lower auxiliary portion of the present invention is formed in a cylindrical shape so as to be inclined downward from the outer peripheral edge of the liquid receiving upper surface and toward the central axis of the cylindrical side wall. Therefore, at the boundary between the liquid receiving upper surface and the second outer peripheral surface, the cleaning liquid that has accumulated on the outer peripheral edge of the liquid receiving upper surface can be easily separated from the lower auxiliary portion. As a result, cleaning liquid can be effectively scattered from the shower ring even when the shower ring is rotated at a relatively low rotational speed.

[0013] Furthermore, in the substrate processing apparatus described above, it is preferable that the shower ring further comprises an upper auxiliary portion, which is provided above the plurality of discharge ports and on the first outer peripheral surface of the side wall, and is formed in the shape of a ring. The upper auxiliary portion is located above the plurality of discharge ports and can guide the cleaning liquid discharged from the plurality of discharge ports.

[0014] Furthermore, in the substrate processing apparatus described above, the upper auxiliary part is configured to guide the cleaning liquid discharged from the plurality of discharge ports to the outer cup, and the lower auxiliary part is configured to guide the cleaning liquid discharged from the plurality of discharge ports to the inner cup, and it is preferable that the upper surface of the liquid receiver is positioned higher than the inner cup.

[0015] The upper auxiliary section can guide the cleaning liquid discharged from multiple outlets into the outer cup, and the lower auxiliary section can guide the cleaning liquid discharged from multiple outlets into the inner cup.

[0016] Furthermore, in the substrate processing apparatus described above, it is preferable that the upper surface of the liquid receiver is formed to be inclined outward and downward from the side wall side.

[0017] For example, the lower auxiliary section can be easily constructed compared to cases where the upper surface of the liquid receiver is inclined outward and upward toward the side wall, or where the upper surface of the liquid receiver extends horizontally. Furthermore, the liquid separation portion of the outer peripheral edge of the upper surface of the liquid receiver can be changed in the height direction. Therefore, for example, when the shower ring is rotated at a constant rotation speed, the cleaning liquid guided by the upper surface of the lower auxiliary section's liquid receiver can be precisely aimed at the desired position in the inner cup.

[0018] Furthermore, in the substrate processing apparatus described above, when the showering ring sprays the cleaning liquid, one example of the liquid receiving upper surface is formed such that, in a side view, a virtual line extending from the liquid receiving upper surface intersects with the upper surface of the inner cup.

[0019] For example, if the upper surface of the liquid receiver is tilted too far downward, the cleaning liquid may not separate properly from the boundary between the upper surface of the liquid receiver and the second outer peripheral surface, and may flow downward. The present invention makes it easier to separate the cleaning liquid from that boundary.

[0020] Furthermore, in the substrate processing apparatus described above, it is preferable that the upper auxiliary section is provided with a liquid receiving lower surface that receives the cleaning liquid from above, and that each of the multiple discharge ports faces the liquid receiving lower surface. This allows the tip side (outer circumference side) of each discharge port to be brought closer to the liquid receiving lower surface. Therefore, it is relatively easy for each discharge port to supply cleaning liquid to the liquid receiving lower surface.

[0021] Further, in the above-described substrate processing apparatus, a control unit is further provided. The control unit rotates the shower ring at a preset first rotation speed by the rotation driving unit, and when the shower ring is rotated at the first rotation speed, the cleaning liquid is supplied from the cleaning liquid nozzle to the shower ring, so that the cleaning liquid discharged from the plurality of discharge ports is guided by the upper auxiliary part, and the cleaning liquid is scattered on the inner surface of the outer cup. The shower ring is rotated at a preset second rotation speed smaller than the first rotation speed by the rotation driving unit, and when the shower ring is rotated at the second rotation speed, the cleaning liquid is supplied from the cleaning liquid nozzle to the shower ring, so that the cleaning liquid discharged from the plurality of discharge ports is guided by the lower auxiliary part, and the cleaning liquid is scattered on the upper surface of the inner cup. This is preferable.

[0022] The upper auxiliary part can guide the cleaning liquid discharged from the plurality of discharge ports to the outer cup, and the lower auxiliary part can guide the cleaning liquid discharged from the plurality of discharge ports to the inner cup.

[0023] Further, in the above-described substrate processing apparatus, a cup lifting and lowering part for integrally moving the outer cup and the inner cup in the vertical direction is further provided. The inner cup has an opening formed in a circular shape by the inner peripheral edge of the inner cup, and the diameter of the opening is preferably larger than the diameter of the shower ring.

[0024] For example, assume that the diameter of the opening of the inner cup may be smaller than the diameter of the shower ring. In this case, if a processing liquid (for example, a resist liquid) adheres to the upper surface of the inner cup, the lower surface of the shower ring may adhere to the upper surface of the inner cup with the processing liquid intervening. According to the present invention, it is possible to suppress the lower surface of the shower ring from adhering to the upper surface of the inner cup.

[0025] Furthermore, in the substrate processing apparatus described above, one example of the processing liquid nozzle is configured to discharge a resist liquid as the processing liquid, and one example of the cleaning liquid nozzle is configured to discharge an organic solvent as the cleaning liquid. [Effects of the Invention]

[0026] According to the substrate processing apparatus of the present invention, cleaning solution can be effectively sprayed from the showering ring even when the showering ring is rotated at a relatively low rotational speed. [Brief explanation of the drawing]

[0027] [Figure 1] This is a longitudinal cross-sectional view showing a substrate processing apparatus used during cup cleaning according to the embodiment. [Figure 2] This is a longitudinal cross-sectional view showing a substrate processing apparatus used during substrate processing according to the embodiment. [Figure 3] This is a plan view showing a substrate processing apparatus. [Figure 4] This is a longitudinal cross-sectional view showing the left portion of the shower ring and its surrounding area. [Figure 5] This is a side view of the shower ring. [Figure 6] This is a block diagram showing the configuration related to the control of a substrate processing device. [Figure 7] This is a flowchart illustrating an example of the operation of a substrate processing device (substrate processing). [Figure 8] This is a flowchart illustrating an example of the operation of a substrate processing device (cup cleaning process). [Figure 9] This is a timing chart showing an example of a cup washing process. [Figure 10] This is a longitudinal cross-sectional view illustrating the process of primarily cleaning the inner surface of the outer cup. [Figure 11] This is a longitudinal cross-sectional view illustrating the process of primarily cleaning the outer surface of the inner cup. [Figure 12] This is a longitudinal cross-sectional view showing a conventional showering system as a comparative example. [Figure 13] This is a longitudinal cross-sectional view showing a modified showering pattern. [Figure 14] This is a longitudinal cross-sectional view illustrating the operation of the showering in other modified examples. [Figure 15] This is a longitudinal cross-sectional view showing a showering effect related to another modified example. [Modes for carrying out the invention]

[0028] Examples of the present invention will be described below. [Examples]

[0029] Embodiments of the present invention will be described below with reference to the drawings. Figure 1 is a longitudinal cross-sectional view showing the substrate processing apparatus 1 during cup washing. Figure 2 is a longitudinal cross-sectional view showing the substrate processing apparatus 1 during substrate processing. Figure 3 is a plan view showing the substrate processing apparatus 1. Also, for example in Figure 1, the horizontal direction includes the X direction and the Y direction. The X direction is perpendicular to the Y direction. The vertical Z direction is perpendicular to both the X direction and the Y direction.

[0030] <1. Configuration of substrate processing equipment> Refer to Figures 1 and 2. The substrate processing apparatus 1 processes the substrate W. The substrate W is formed, for example, in the shape of a disc. The substrate processing apparatus 1 includes a spin chuck 2, a rotating shaft 3, a rotating drive unit 5, and a processing liquid supply unit 7. The spin chuck 2 corresponds to the substrate holding unit of the present invention.

[0031] <1-1. Spin Chuck> The spin chuck 2 holds the substrate W in a horizontal position by vacuum adsorption, for example, by adsorbing the underside of the substrate W. Multiple adsorption holes are provided on the surface 2A of the spin chuck 2 that contacts the substrate W. Multiple adsorption holes communicate with a suction pipe 2B located inside the rotating shaft 3. A vacuum pump PP is provided in the suction pipe 2B. The vacuum pump PP draws gas through the multiple adsorption holes via the suction pipe 2B. As a result, the spin chuck 2 vacuum adsorbs the substrate W.

[0032] The rotating shaft 3 extends downward (in the Z direction) from the spin chuck 2. The rotating shaft 3 is fixed to the lower surface of the spin chuck 2. The rotation drive unit 5 rotates the spin chuck 2 around the rotating shaft 3 (or vertical axis AX1) via the rotating shaft 3. As shown in Figure 1, the vertical axis AX1 passes through the central axis of the rotating shaft 3. The rotation drive unit 5 is equipped with an electric motor. The rotation drive unit 5 can also rotate the shower ring 37 around the rotating shaft 3. Further details on this will be described later.

[0033] The processing liquid supply unit 7 supplies processing liquid to the substrate W held by the spin chuck 2. The processing liquid supply unit 7 includes a processing liquid nozzle 9, processing liquid piping 11, an on / off valve V1, and a pump (not shown).

[0034] The processing liquid nozzle 9 discharges the processing liquid onto the upper surface of the substrate W held by the spin chuck 2. The processing liquid nozzle 9 discharges, for example, a resist solution as the processing liquid. Note that the processing liquid may be a liquid other than a resist solution (for example, a liquid for forming a film such as an anti-reflective coating). The processing liquid is also called, for example, a chemical solution or a coating solution. The processing liquid nozzle 9 is moved to an arbitrary position, such as a discharge position above the center of the substrate W held by the spin chuck 2, by a nozzle moving mechanism (not shown).

[0035] One end of the processing liquid piping 11 is connected to the processing liquid nozzle 9. The other end of the processing liquid piping 11 is connected to the processing liquid supply source 13. The on-off valve V1 and the pump are installed in the processing liquid piping 11. The pump sends the processing liquid from the processing liquid supply source 13 to the processing liquid nozzle 9 through the processing liquid piping 11. The on-off valve V1 selectively controls the supply of processing liquid and stops its supply.

[0036] <1-2. Outer cup and inner cup> The substrate processing apparatus 1 includes an outer cup 15 and an inner cup 16 as cups for receiving processing liquid splashed from the rotating substrate W. The substrate processing apparatus 1 also includes a disc-shaped support plate 17. The support plate 17 is provided between the spin chuck 2 and the rotation drive unit 5. A through hole 17A is provided in the central part of the support plate 17 for the rotation shaft 3 to pass through.

[0037] As shown in Figure 3, the outer cup 15 is formed to surround the spin chuck 2 (outer circumference of the spin chuck 2) and the inner cup 16 (outer circumference of the inner cup 16) in a plan view. The outer cup 15 is also formed to surround the substrate W and shower ring 37 held by the spin chuck 2 in a plan view. In Figure 3, the outer cup 15 is indicated by a dashed line.

[0038] The outer cup 15 comprises a main body 21, a ceiling member 23, and a bottom container 25. The main body 21 is formed in a cylindrical shape. The main body 21 surrounds the inner cup 16 around the rotating shaft 3 (vertical axis AX1). The ceiling member 23 is formed in a ring shape so as to be inclined upward from the upper end of the main body 21 and toward the rotating shaft 3.

[0039] The ceiling member 23 has an upper opening 27 that is circularly formed by the inner periphery of the ceiling member 23. Specifically, the ceiling member 23 has a guard member 29 that is ring-shaped and formed on the inner periphery of the ceiling member 23, and an upper opening 27 that is circularly formed by the inner periphery of the guard member 29. The guard member 29 protrudes downward from the upper end of the outer cup 15. The guard member 29 has an inner circumferential surface 29A that is inclined downward and outward from the rotating shaft 3. The guard member 29 prevents mist of, for example, processing liquid collected in the outer cup 15 from being blown back onto the upper surface of the substrate W held by the spin chuck 2.

[0040] The bottom container 25 is a ring-shaped container with an open top. The bottom container 25 is attached to the support plate 17 while surrounding it. The bottom container 25 comprises an outer peripheral wall 25A, an inner peripheral wall 25B, a partition wall 25C, and a bottom wall 25D. The outer peripheral wall 25A, the inner peripheral wall 25B, and the partition wall 25C are each formed in a cylindrical shape. The upper end of the outer peripheral wall 25A is connected to the lower end of the main body 21. The upper end of the inner peripheral wall 25B extends upward to the inner cup 16. The partition wall 25C is provided on the bottom surface (bottom wall 25D) of the bottom container 25. The partition wall 25C is a wall that separates the liquid discharge space SP1 on the outer peripheral side of the bottom container 25 from the exhaust space SP2 on the inner peripheral side. A flow path for exhaust is formed between the upper end of the partition wall 25C and the inner cup 16.

[0041] A drain pipe 31 for discharging the processing liquid and cleaning liquid is connected to the bottom wall 25D of the liquid discharge space SP1. In addition, an exhaust pipe 32 for exhausting gas is connected to the bottom wall 25D of the exhaust space SP2. The inside of the exhaust pipe 32 is suctioned so that the gas flowing in from the upper opening 27 is collected in the exhaust pipe 32.

[0042] The inner cup 16 is located inside the outer cup 15. In a plan view, the inner cup 16 is formed to surround the spin chuck 2 (the outer circumference of the spin chuck 2) (see Figure 3). The inner cup 16 is attached to at least one of the support plate 17 and the bottom container 25. The inner cup 16 is formed in a ring shape so as to extend from the rotating shaft 3 side at least outward from the rotating shaft 3.

[0043] The inner cup 16 includes an upper flow straightening member 33 and a lower flow straightening member 35. The upper flow straightening member 33 is formed in a ring shape so as to extend downward from the outer peripheral edge of the support plate 17 (or shower ring 37) and inclined outward from the support plate 17 (or shower ring 37). The highest part of the upper flow straightening member 33 is the upper end 16A of the upper end of the inner cup 16. The lower flow straightening member 35 is formed to extend downward in a cylindrical shape from the outer peripheral edge of the upper flow straightening member 33. As shown in Figure 1, the lower flow straightening member 35 is positioned between the outer peripheral wall 25A and the partition wall 25C of the bottom container 25. A flow path for liquid discharge and exhaust is formed between the lower end of the lower flow straightening member 35 and the bottom wall 25D of the liquid discharge space SP1.

[0044] <1-3. Showering and cleaning fluid supply section> The substrate processing apparatus 1 includes a shower ring 37 and a cleaning fluid supply unit 39. The shower ring 37 is configured to spray cleaning fluid by centrifugal force to clean the outer cup 15 and the inner cup 16. The shower ring 37 is positioned inside the outer cup 15 and, in a plan view, inside the inner cup 16. The shower ring 37 is positioned below the spin chuck 2. The shower ring 37 is also positioned between the spin chuck 2 and the support plate 17.

[0045] The cleaning fluid supply unit 39 supplies cleaning fluid to the shower ring 37. The cleaning fluid supply unit 39 includes a cleaning fluid nozzle 41, cleaning fluid piping 43, an on-off valve V2, and a pump (not shown). The cleaning fluid nozzle 41 discharges cleaning fluid to the shower ring 37, which is rotating around the rotating shaft 3. The cleaning fluid nozzle 41 discharges an organic solvent as the cleaning fluid.

[0046] The cleaning fluid nozzle 41 is provided on the upper surface of the support plate 17. There is one or more cleaning fluid nozzles 41. One end of the cleaning fluid piping 43 is connected to the cleaning fluid nozzle 41. The other end of the cleaning fluid piping 43 is connected to the cleaning fluid supply source 45. The on-off valve V2 and the pump are provided on the cleaning fluid piping 43. The pump sends the cleaning fluid from the cleaning fluid supply source 45 to the cleaning fluid nozzle 41 through the cleaning fluid piping 43. The on-off valve V2 selectively supplies the cleaning fluid and stops the supply.

[0047] Next, the detailed configuration of the shower ring 37 will be described. Figure 4 is a longitudinal cross-sectional view showing the left portion of the shower ring 37. Figure 5 is a side view of the shower ring 37. The shower ring 37 comprises a ceiling member 47, a side wall 49, a liquid holding member 51, a plurality of discharge ports 53, an upper auxiliary part 55, and a lower auxiliary part 57.

[0048] The ceiling member 47 is formed in a disc shape. A through hole 47A is provided in the central part of the ceiling member 47 for the rotating shaft 3 to pass through (see Figure 1). The side wall 49 extends cylindrically downward from the approximate outer edge of the ceiling member 47. That is, the side wall 49 is a cylindrical member. The liquid holding member 51 is formed in a ring shape on the lower side of the ceiling member 47, extending from the side wall 49 toward the central axis (vertical axis AX1) of the side wall 49. In Figure 4, the liquid holding member 51 is provided at the lower end or lower part of the side wall 49. In Figures 1 and 2, the central axis of the shower ring 37 (side wall 49) coincides with the vertical axis AX1.

[0049] The inner periphery of the liquid-holding member 51 forms a circular lower opening 59. The cleaning liquid discharged from the cleaning liquid nozzle 41 flows into the shower ring 37 through the lower opening 59. As shown in Figure 1, the tip of the cleaning liquid nozzle 41 may be located above the lower end of the shower ring 37 from the lower opening 59, in other words, a portion of it may be at the same height as the shower ring 37 in a side view. The liquid-holding member 51 holds the cleaning liquid discharged from the cleaning liquid nozzle 41. Specifically, the space enclosed by the ceiling member 47, the side wall 49, and the liquid-holding member 51 forms a storage section 61 for storing the cleaning liquid. The storage section 61 communicates with a plurality of discharge ports 53.

[0050] The number of discharge ports 53 is, for example, 12. The 12 discharge ports 53 are provided on the side wall 49. The 12 discharge ports 53 are arranged at equal intervals (for example, 30-degree intervals) around the central axis (vertical axis AX1).

[0051] As shown in Figures 1 and 4, each of the 12 discharge ports 53 faces outward from the vertical axis AX1 and inclined upward. In other words, each of the 12 discharge ports 53 faces diagonally upward. As a result, each of the 12 discharge ports 53 faces the lower liquid receiving surface 55A (described later) of the upper auxiliary part 55. Therefore, the tip side (outer circumference side) of each discharge port 53 can be brought close to the lower liquid receiving surface 55A. Thus, it is relatively easy for each discharge port 53 to supply cleaning fluid to the lower liquid receiving surface 55A. Note that each discharge port 53 may face horizontally or diagonally downward.

[0052] Next, the upper auxiliary section 55 and the lower auxiliary section 57 will be described. The upper auxiliary section 55 mainly guides the cleaning fluid discharged from the 12 discharge ports 53 to the outer cup 15 when rotating at high speed. The lower auxiliary section 57 mainly guides the cleaning fluid discharged from the 12 discharge ports 53 to the inner cup 16 when rotating at low speed.

[0053] The upper auxiliary portion 55 is provided above the 12 discharge ports 53 and on the first outer peripheral surface 63 of the side wall 49. The upper auxiliary portion 55 is formed in a ring shape. The first outer peripheral surface 63 is a cylindrical surface extending in the vertical direction (Z direction) as shown by the dashed and solid lines in Figure 4. The upper auxiliary portion 55 is equipped with a liquid receiving lower surface 55A that receives cleaning liquid from above. The liquid receiving lower surface 55A is formed in a ring shape so as to extend from the side wall 49 outward from the side wall 49. That is, the liquid receiving lower surface 55A is formed so as to extend horizontally from the side wall 49.

[0054] In this regard, the lower liquid receiving surface 55A may be formed extending outward from the side wall 49 and upward (or downward). That is, the lower liquid receiving surface 55A may be formed to extend diagonally upward (or diagonally downward) from the side wall 49. This allows the liquid separation portion RE1 shown in Figure 4 to be changed in the height direction. The liquid separation portion RE1 is the portion from which the cleaning liquid separates and is formed in a circular linear shape.

[0055] The lower auxiliary portion 57 is provided below the 12 discharge ports 53 and on the first outer peripheral surface 63 of the side wall 49. The lower auxiliary portion 57 is formed in a ring shape. The lower auxiliary portion 57 includes a liquid receiving upper surface 57A and a second outer peripheral surface 57B. The liquid receiving upper surface 57A is a surface for receiving cleaning liquid from below and is formed in a ring shape.

[0056] Before describing the upper liquid receiving surface 57A, the second outer peripheral surface 57B will be described. If the second outer peripheral surface 57B extends straight down, the cleaning liquid received by the upper liquid receiving surface 57A may not be properly scattered, and the cleaning liquid may flow down along the second outer peripheral surface 57B. Therefore, in this embodiment, the second outer peripheral surface 57B is formed in a cylindrical shape so as to be inclined downward from the outer peripheral edge of the upper liquid receiving surface 57A and inward toward the vertical axis AX1 (central axis). In other words, the second outer peripheral surface 57B extends in a direction that is a combination of downward and inward. This makes it easier to separate the cleaning liquid received by the upper liquid receiving surface 57A from the lower auxiliary part 57 at the boundary with the upper liquid receiving surface 57A. In the vertical cross-sectional view of Figure 4, the angle AG1 between the second outer peripheral surface 57B and the vertical plane (line) is greater than 0 degrees and less than 90 degrees. Most preferably, the angle AG1 is greater than 45 degrees and less than 90 degrees.

[0057] The boundary between the upper surface 57A of the liquid receiver and the second outer peripheral surface 57B is the liquid separation portion RE2. The liquid separation portion RE2 is formed in a circular linear shape concentric with the outer shape of the shower ring 37. The side view of Figure 5 shows the linear liquid separation portion RE2 in a semicircular section. In the vertical section of Figure 4, the second outer peripheral surface 57B is formed such that the liquid separation portion RE2 at the upper end of the second outer peripheral surface 57B and the lower end P1 of the second outer peripheral surface 57B are connected, for example, by a straight line. Also, in the vertical section of Figure 4, for example, the angle between the upper surface 57A of the liquid receiver and the second outer peripheral surface 57B is a right angle. When the angle between the upper surface 57A of the liquid receiver and the second outer peripheral surface 57B is a right angle or obtuse angle, the strength of the lower auxiliary portion 57 can be increased relatively compared to when the angle is acute.

[0058] As shown in Figure 1, when the shower ring 37 sprays the cleaning solution, the liquid separation portion RE2 is positioned higher than the upper end (upper end portion 16A) of the inner cup 16. In this embodiment, when the shower ring 37 sprays the cleaning solution, it means when the outer cup 15, inner cup 16, and support plate 17 are in the cup cleaning position H1, as shown in Figure 1. At this time, the shower ring 37 is also in the cup cleaning position H1.

[0059] The liquid receiving surface 57A is formed to be inclined outward and downward from the side wall 49, the rotating shaft 3, and the vertical axis AX1. If the liquid receiving surface 57A is inclined too far downward, the cleaning liquid may not separate properly from the liquid separation portion RE2 and may flow downward. In this case, the cleaning liquid will not reach the inner cup 16.

[0060] Therefore, when the shower ring 37 sprays the cleaning liquid, it is preferable that the liquid receiving upper surface 57A is formed such that, in a side view or a vertical cross-section (see Figure 4), a virtual line LN extending from the liquid receiving upper surface 57A intersects with the upper surface 33A of the upper flow straightening member 33 of the inner cup 16. This makes it easier for the cleaning liquid from the liquid separation portion RE2 to reach the upper surface 33A of the upper flow straightening member 33 of the inner cup 16.

[0061] Furthermore, the angle between the imaginary line LN and the horizontal is defined here as the inclination angle AG2 (see Figure 4). In this case, as described above, it is preferable that the inclination angle AG2 is the intersection angle at which the imaginary line LN intersects the upper surface 33A. Alternatively, the inclination angle AG2 may be a non-intersection angle that is greater than 0 degrees and smaller than the intersection angle at which the imaginary line LN intersects the upper surface 33A. A non-intersection angle is an angle at which the imaginary line LN does not intersect the upper surface 33A.

[0062] Furthermore, as shown in Figure 4, the lower auxiliary portion 57 includes a ring-shaped horizontal surface 65 formed between the first outer peripheral surface 63 of the side wall 49 and the upper surface 57A of the liquid receiving tray. If the horizontal surface 65 is not required, the lower auxiliary portion 57 does not need to have the horizontal surface 65. Note that the first outer peripheral surface 63 corresponds to the first outer peripheral surface of the present invention. The second outer peripheral surface 57B corresponds to the second outer peripheral surface of the present invention.

[0063] <1-4. Cup Lifting Mechanism> Refer to Figures 1 and 2. The substrate processing apparatus 1 includes a cup lifting unit 67 and a holding unit 69. The cup lifting unit 67 moves the outer cup 15, the inner cup 16, and the support plate 17 together in the vertical direction (Z direction). The cup lifting unit 67 includes, for example, an air cylinder.

[0064] In this case, the cup lifting mechanism 67 comprises a rod 67A, an internal space SP7, and a partition. The partition is positioned in the internal space SP7 so as to be movable in the vertical direction Z, and is fixed to the lower end of the rod 67A. The partition divides the internal space SP7 into two spaces (a lower space and an upper space). The cup lifting mechanism 67 also comprises a first pipe 67B, a second pipe 67C, a switching valve V3, and a gas supply pipe 67D. The first pipe 67B connects the lower space to the switching valve V3. The second pipe 67C connects the upper space to the switching valve V3. The gas supply pipe 67D connects the switching valve V3 to the gas supply source 68.

[0065] By operating the switching valve V3, gas from the gas supply source 68 is supplied to the lower space through the first pipe 67B, and the gas in the upper space is exhausted through the second pipe 67C. As a result, the rod 67A and the partition section rise. Also, by operating the switching valve V3, gas from the gas supply source 68 is supplied to the upper space through the second pipe 67C, and the gas in the lower space is exhausted through the first pipe 67B. As a result, the rod 67A and the partition section descend.

[0066] The cup lifting section 67 may be equipped with an electric actuator instead of an air cylinder. The electric actuator is equipped with an electric motor. The tip of the rod 67A of the cup lifting section 67 is connected to the lower surface of the support plate 17. The outer cup 15 and the inner cup 16 are attached to the support plate 17.

[0067] Furthermore, the cup lifting section 67 moves the shower ring 37 up and down in conjunction with the lifting and lowering of the outer cup 15, etc. The shower ring 37 is movable vertically (Z direction) along the rotating shaft 3. The holding section 69 is fixed to the rotating shaft 3 between the spin chuck 2 and the rotation drive section 5. The holding section 69 can pass through the through hole 17A of the support plate 17, but it cannot pass through the through hole 47A of the shower ring 37. Therefore, the shower ring 37 is placed on the upper surface of the holding section 69.

[0068] Furthermore, the lower surface of the ceiling member 47 of the shower ring 37 is provided with a plurality of protrusions 47B. In contrast, the upper surface of the holding part 69 is provided with a plurality of holes 69A, each of which accommodates the plurality of protrusions 47B. The holding part 69 holds the shower ring 37 by accommodating the plurality of protrusions 47B of the shower ring 37 in the plurality of holes 69A. In this way, the holding part 69 can transmit the rotation of the rotating shaft 3 to the shower ring 37.

[0069] When the cup lifting mechanism 67 raises the rod 67A, the outer cup 15 and other components rise to the processing position H2, as shown in Figure 2. As a result, the outer cup 15 surrounds the spin chuck 2 and the substrate W held by the spin chuck 2. The shower ring 37 is placed on the upper surface of the support plate 17 and separated from the holding mechanism 69. Therefore, the shower ring 37 does not rotate integrally with the spin chuck 2.

[0070] When the cup lifting unit 67 lowers the rod 67A, the outer cup 15 and the like descend to the cup washing position H1, as shown in Figure 1. As a result, the shower ring 37 is held by the holding unit 69 and separated from the support plate 17. With the shower ring 37 held by the holding unit 69, the shower ring 37 becomes ready to wash the outer cup 15 and the like. Specifically, the upper liquid receiving surface 57A, the upper end of the second outer peripheral surface 57B, and the liquid separation portion RE2 of the shower ring 37 are positioned higher than the inner cup 16. The shower ring 37 also rotates integrally with the spin chuck 2.

[0071] As shown in Figure 3, the inner cup 16 has a circular opening 33B formed by the inner periphery of the inner cup 16 (upper rectifier member 33). For example, the diameter DM2 of the opening 33B of the inner cup 16 may be smaller than the diameter DM1 of the shower ring 37 (outer periphery) (diameter DM1 > diameter DM2). In this case, the up-and-down movement of the shower ring 37 will cause interference between the shower ring 37 and the inner cup 16. Also, if processing liquid (e.g., resist liquid) adheres to the upper surface 33A of the inner cup 16, the lower surface of the shower ring 37 may adhere to the upper surface 33A of the inner cup 16 with the processing liquid in between.

[0072] As shown in Figure 3, the diameter DM2 of the opening 33B is larger than the diameter DM1 of the shower ring 37. This prevents the lower surface of the shower ring 37 from adhering to the upper surface of the inner cup 16. Note that the diameter DM3 of the upper opening 27 of the outer cup 15 is larger than the diameter of the opening 33B of the inner cup 16 (diameter DM3 > diameter DM2 > diameter DM1).

[0073] <1-5. Control Unit> Refer to Figure 6. The substrate processing apparatus 1 comprises a control unit 71 and a storage medium 73. The control unit 71 controls each component of the substrate processing apparatus 1. The control unit 71 controls the vacuum pump PP and rotary drive unit 5 of the spin chuck 2, the on / off valve V1 of the processing liquid supply unit 7, the V2 of the cleaning liquid supply unit 39, and the switching valve V3 of the cup lifting unit 67. The control unit 71 comprises one or more processors, such as a central processing unit (CPU). The storage medium 73 comprises at least one of, for example, ROM (Read-Only Memory), RAM (Random-Access Memory), and a hard disk. The storage medium 73 stores the computer programs necessary to control each component of the substrate processing apparatus 1. The storage medium 73 also stores the control parameters of the controlled objects for executing the operation (process) of each component.

[0074] <2. Operation of the substrate processing device> Next, we will explain the operation of the substrate processing apparatus 1. First, we will explain the coating process (substrate processing) with reference to Figure 7.

[0075] Refer to Figures 2 and 7. The spin chuck 2 holds the substrate W, which has been transported by a transport robot (not shown), in a horizontal position by suction (step S01). The outer cup 15 is positioned at the processing position H2. By operating the on / off valve V1, a preset amount of processing liquid (e.g., resist liquid) is discharged from the processing liquid nozzle 9 onto the upper surface of the substrate W. The rotary drive unit 5 rotates the spin chuck 2, which holds the substrate W, around the rotary shaft 3. This spreads the discharged processing liquid over the entire upper surface of the substrate W (step S02).

[0076] Subsequently, the rotary drive unit 5 stops the rotation of the spin chuck 2, and then the spin chuck 2 releases the substrate W (step S03). Also, for example, the cup lifting unit 67 lowers the outer cup 15, inner cup 16, and support plate 17 together to the cup washing position H1 (see Figure 1). After that, a substrate transport robot (not shown) transports the substrate W coated with processing liquid from the spin chuck 2.

[0077] Next, the cup cleaning process will be explained with reference to Figures 7, 8, and 9. Figure 9 is a timing chart showing an example of the cup cleaning process. In Figure 9, the symbol CL indicates that the on-off valve V2 is in the closed state. The symbol OP indicates that the on-off valve V2 is in the open state.

[0078] The cup cleaning process is performed when the spin chuck 2 is not holding the substrate W. Specifically, it is performed after step S03 in Figure 7. In this embodiment, the cup cleaning process is performed every time after step S03, but the storage medium 73 stores the number of substrates W processed by the substrate processing apparatus 1, and the cup cleaning process may be performed after a predetermined number of substrates W have been processed.

[0079] At time points T1 to T7 in Figure 9, the shower ring 37 primarily cleans the inner surface of the outer cup 15 (step S11 in Figure 8). At time points T7 to T8, the shower ring 37 primarily cleans the outer surface of the inner cup 16 (step S12 in Figure 8). At time points T8 to T11, the shower ring 37 is dried (step S13 in Figure 8).

[0080] At time T0 in Figure 9, the outer cup 15, etc., is located at the cup washing position H1 (see Figure 1). Therefore, the shower ring 37 is separated from the support plate 17 and held by the holding part 69. As a result, the shower ring 37 rotates integrally with the spin chuck 2 around the rotating shaft 3 (and vertical axis AX1). The spin chuck 2 does not hold the substrate W. The shower ring 37 is also in a stationary state (0 rpm) and not rotating.

[0081] At time T1, the control unit 71 rotates the shower ring 37 at a preset first rotational speed (for example, 400 rpm) by the rotary drive unit 5. That is, the rotary drive unit 5 increases the rotational speed of the shower ring 37 from 0 rpm to 400 rpm.

[0082] The following outlines the operation from time point T2 to time point T7. When the shower ring 37 is rotating at a preset first rotation speed, the control unit 71 supplies cleaning fluid to the shower ring 37 from the cleaning fluid nozzle 41. This causes the cleaning fluid discharged from the 12 discharge ports 53 to be guided by the upper auxiliary unit 55, and mainly sprayed onto the inner surface of the outer cup 15.

[0083] The operation from time point T2 to time point T7 will be explained in detail. At time point T2, the rotary drive unit 5 maintains the rotation speed of the shower ring 37 at 400 rpm for a predetermined time (period). Also, by opening the on / off valve V2, cleaning fluid is discharged from the cleaning fluid nozzle 41 toward the rotating shower ring 37. Due to the centrifugal force caused by the rotation of the shower ring 37, the cleaning fluid is stored in the storage unit 61 and discharged from the 12 discharge ports 53.

[0084] The cleaning fluid discharged from the 12 outlets 53 is guided by the lower liquid receiving surface 55A of the upper auxiliary section 55 and is scattered from the liquid separation section RE1 in a direction corresponding to the rotation speed (see Figure 10). When the rotation speed of the showering 37 is 400 rpm, the cleaning fluid is scattered toward the lower end of the guard member 29 of the outer cup 15, indicated by the circle WK in Figure 10, and its vicinity. The scattered cleaning fluid flows, for example, along the inner surfaces of the ceiling member 23, the main body 21, and the outer peripheral wall 25A of the outer cup 15. In addition, the cleaning fluid that hits the inner peripheral surface 29A of the guard member 29 and flows down (see arrow AR1 in Figure 10) flows along the upper surface 33A of the inner cup 16 to the bottom container 25. The cleaning fluid collected in the bottom container 25 is discharged from the drain pipe 31 (see Figure 1).

[0085] Furthermore, the discharge of cleaning fluid from the cleaning fluid nozzle 41 continues at a constant flow rate from time T2 to time T8. In addition, the cleaning fluid nozzle 41 and the support plate 17 are not rotated around the rotating shaft 3.

[0086] At time T3, the rotary drive unit 5 reduces the rotation speed of the shower ring 37 to, for example, 390 rpm. Thereafter, the rotary drive unit 5 maintains the rotation speed of the shower ring 37 at 390 rpm for a preset time. The cleaning liquid discharged from the 12 discharge ports 53 is guided by the lower surface 55A of the liquid receiver of the upper auxiliary unit 55 and is scattered from the liquid separation portion RE1 in a direction corresponding to the rotation speed. For example, the cleaning liquid is scattered toward position P11 in Figure 10.

[0087] At time T4, the rotary drive unit 5 reduces the rotational speed of the shower ring 37 to, for example, 380 rpm. Thereafter, the rotary drive unit 5 maintains the rotational speed of the shower ring 37 at 380 rpm for a preset time. The cleaning fluid discharged from the 12 discharge ports 53 is guided by the lower surface 55A of the liquid receiver of the upper auxiliary unit 55. For example, the cleaning fluid guided by the upper auxiliary unit 55 is sprayed toward position P12 in Figure 10.

[0088] At time T5, the rotary drive unit 5 reduces the rotational speed of the shower ring 37 to, for example, 370 rpm. Thereafter, the rotary drive unit 5 maintains the rotational speed of the shower ring 37 at 370 rpm for a preset time. The cleaning fluid discharged from the 12 discharge ports 53 is guided by the lower surface 55A of the liquid receiver of the upper auxiliary unit 55. For example, the cleaning fluid guided by the upper auxiliary unit 55 is sprayed toward position P13 in Figure 10.

[0089] At time T6, the rotary drive unit 5 increases the rotational speed of the shower ring 37 to, for example, 400 rpm. Thereafter, the rotary drive unit 5 maintains the rotational speed of the shower ring 37 at 400 rpm for a preset time. Again, the cleaning fluid is sprayed toward the lower end of the guard member 29 of the outer cup 15, indicated by the circular frame WK in Figure 10, and its vicinity.

[0090] The cleaning solution is sprayed from the liquid separation section RE1 in a direction corresponding to the rotation speed. If the rotation speed is too high, the cleaning solution will spray out of the upper opening 27 to the outside of the outer cup 15. Therefore, the cleaning solution is sprayed at a rotation speed that does not cause it to spray outside the outer cup 15. Position P11 is higher than position P12, and position P12 is higher than position P13 (position P11 > position P12 > position P13).

[0091] The operation at time points T7 to T8 is outlined below. The control unit 71 rotates the shower ring 37 at a preset second rotation speed (e.g., 170 rpm) that is smaller than the first rotation speed, using the rotary drive unit 5. The control unit 71 also supplies cleaning fluid to the shower ring 37 from the cleaning fluid nozzle 41 while the shower ring 37 is rotating at 170 rpm. As a result, the cleaning fluid discharged from the 12 discharge ports 53 is guided by the lower auxiliary unit 57 and mainly sprayed onto the upper surface of the inner cup 16 (see Figure 11).

[0092] The details of this operation are explained below. At time T7, the rotary drive unit 5 reduces the rotational speed of the shower ring 37 to, for example, 170 rpm. The cleaning liquid discharged from the 12 discharge ports 53 is not held by the lower liquid receiving surface 55A of the upper auxiliary unit 55 and falls almost completely. The falling cleaning liquid is received by the upper liquid receiving surface 57A of the lower auxiliary unit 57. Then, guided by the upper liquid receiving surface 57A, the cleaning liquid is scattered from the liquid separation section RE2 in a direction corresponding to the rotational speed (see Figure 11).

[0093] Subsequently, the rotary drive unit 5 maintains the rotation speed of the shower ring 37 at 170 rpm for a preset time. As a result, the cleaning solution is directly sprayed onto the upper surface 33A of the inner cup 16. Because the cleaning solution is sprayed directly onto the upper surface 33A, it hits the upper surface 33A with relatively strong force. Therefore, the treatment solution adhering to the inner cup 16 can be removed relatively effectively.

[0094] Between time points T8 and T10, the shower ring 37 is dried. At time point T8, the on / off valve V2 is closed to stop the discharge of cleaning fluid from the cleaning fluid nozzle 41. The rotary drive unit 5 also increases the rotation speed of the shower ring 37 to, for example, 400 rpm. As a result, the cleaning fluid remaining in the storage unit 61 is scattered towards the guard member 29 in the circular frame WK in Figure 10.

[0095] At time T9, the rotary drive unit 5 increases the rotation speed of the shower ring 37 to, for example, 500 rpm. The shower ring 37 is spun-dried. The shower ring 37 is rotated at a speed that prevents cleaning fluid from splashing outside the outer cup 15. At times T10 and T11, the rotary drive unit 5 stops the rotation of the shower ring 37.

[0096] Next, the effects of this embodiment will be explained. Figure 12 is a longitudinal cross-sectional view showing a conventional shower ring 37 as a comparative example. In Figure 12, the components of the conventional shower ring 37 and other components are denoted by the same reference numerals as those in the embodiment. When the shower ring 37 is rotated at a rotation speed within a preset range, the cleaning liquid supplied to the shower ring is scattered in a height direction corresponding to that rotation speed.

[0097] However, if the rotation speed is reduced outside that range, the cleaning fluid may not be properly dispersed from the shower ring 37 and may flow down along the multiple discharge ports 53 of the shower ring 37 and the first outer peripheral surface 63 that extends straight down from its vicinity (see arrow AR2 in Figure 12). In other words, when the shower ring 37 is rotated at a relatively low rotation speed, it may not be possible to properly disperse the cleaning fluid from the shower ring 37.

[0098] In this embodiment, a lower auxiliary portion 57 is provided on the first outer peripheral surface 63 of the side wall 49 of the shower ring 37. The lower auxiliary portion 57 comprises a liquid receiving upper surface 57A and a second outer peripheral surface 57B. The liquid receiving upper surface 57A can receive cleaning liquid that flows down along the first outer peripheral surface 63 from the 12 discharge ports 53 of the shower ring 37 and their vicinity. Here, we assume that the second outer peripheral surface 57B extends directly downward from the outer peripheral edge of the liquid receiving upper surface 57A. In this case, even if the cleaning liquid is received by the liquid receiving upper surface 57A, the cleaning liquid may flow down along the second outer peripheral surface 57B.

[0099] In this embodiment, the second outer peripheral surface 57B of the lower auxiliary portion 57 is formed in a cylindrical shape so as to be inclined downward from the outer peripheral edge of the liquid receiving upper surface 57A and toward the central axis (vertical axis AX1) of the cylindrical side wall 49. Therefore, at the boundary between the liquid receiving upper surface 57A and the second outer peripheral surface 57B, the cleaning liquid that has accumulated on the outer peripheral edge of the liquid receiving upper surface 57A can be easily separated from the lower auxiliary portion 57 (liquid separation portion RE2). As a result, even when the shower ring 37 is rotated at a relatively low rotational speed, the cleaning liquid can be effectively scattered from the shower ring 37. Furthermore, as shown by angle AG3 in Figure 11, the shower ring 37 can scatter the cleaning liquid over a wide area in the height direction.

[0100] Furthermore, the liquid receiving upper surface 57A is formed to incline outward and downward from the side wall 49, the side wall 49, the rotating shaft 3, and the vertical axis AX1. For example, compared to cases where the liquid receiving upper surface 57A is incline outward and upward from the side wall 49, and where the liquid receiving upper surface 57A extends horizontally, it is possible to easily create the lower auxiliary part 57. In addition, the liquid separation portion RE2 at the outer edge of the liquid receiving upper surface 57A can be changed in the height direction. Therefore, for example, when the shower ring 37 is rotated at a constant rotational speed, the cleaning liquid guided by the liquid receiving upper surface 57A of the lower auxiliary part 57 can be precisely aimed at the desired position in the inner cup 16.

[0101] The present invention is not limited to the embodiments described above, and can be modified and implemented as follows.

[0102] (1) In the above-described embodiment, the upper surface 57A of the liquid receiver was formed to be inclined outward from the side wall 49 and downward. In this respect, as shown in Figure 13, the upper surface 57A of the liquid receiver may be formed to extend outward from the side wall 49 (i.e., horizontally). In this case as well, similar to the embodiment, the second outer peripheral surface 57B is formed in a cylindrical shape to be inclined downward from the outer peripheral edge of the upper surface 57A and inward toward the vertical axis AX1 (central axis). Note that in Figure 13, the angle between the upper surface 57A of the liquid receiver and the second outer peripheral surface 57B is acute.

[0103] Furthermore, the upper liquid receiving surface 57A may be formed to be inclined outward and upward from the side wall 49. In this case, the upper liquid receiving surface 57A is formed so as not to interfere with the lower liquid receiving surface 55A of the upper auxiliary part 55.

[0104] (2) In the above-described embodiment and modification (1), the cleaning liquid discharged from the 12 discharge ports 53 was guided to the lower liquid receiving surface 55A of the upper auxiliary part 55 in order to clean the inner surface of the outer cup 15. In this case, depending on the rotation speed of the shower ring 37, some of the cleaning liquid may separate from the lower liquid receiving surface 55A. In this case, the upper liquid receiving surface 57A of the lower auxiliary part 57 may receive the cleaning liquid. As a result, the shower ring 37 can scatter the cleaning liquid guided by both the lower liquid receiving surface 55A and the upper liquid receiving surface 57A in the height direction (arrow AR3 in Figure 14) according to its rotation speed.

[0105] (3) In the embodiments and modifications described above, the cleaning liquid discharged from the 12 discharge ports 53 was guided to the upper liquid receiving surface 57A of the lower auxiliary part 57 in order to clean the outer surface of the inner cup 16. In this case, depending on the rotation speed of the shower ring 37, some of the cleaning liquid may move from the upper liquid receiving surface 57A to the lower liquid receiving surface 55A. In this case as well, the shower ring 37 may similarly spray the cleaning liquid guided to both the lower liquid receiving surface 55A and the upper liquid receiving surface 57A in the height direction (arrow AR3 in Figure 14) according to its rotation speed.

[0106] (4) In the embodiments and modifications described above, the discharge port 53 is formed such that the length of the tip of the discharge port 53 in the height direction is less than the height of the gap between the lower surface 55A of the liquid receiver and the horizontal surface 65. In this regard, the discharge port 53 may be formed such that the length LG1 of the tip of the discharge port 53 in the height direction is the same as the height LG2 of the gap between the lower surface 55A of the liquid receiver and the horizontal surface 65, as shown in Figure 15.

[0107] (5) In the above-described embodiments and modifications, in Figure 4, the outer edge of the shower ring 37 was both the outer edge of the upper auxiliary portion 55 (e.g., the liquid separation portion RE1) and the outer edge of the lower auxiliary portion 57 (liquid separation portion RE2). That is, the diameter of the outer edge of the lower auxiliary portion 57 was the same as the diameter of the outer edge of the upper auxiliary portion 55. In this regard, the diameter of the outer edge of the lower auxiliary portion 57 may be larger than the diameter of the outer edge of the upper auxiliary portion 55. Also, the diameter of the outer edge of the lower auxiliary portion 57 may be smaller than the diameter of the outer edge of the upper auxiliary portion 55.

[0108] (6) In the embodiments and modifications described above, the shower ring 37 may be fixed to the lower part of the spin chuck 2. Alternatively, the shower ring 37 may be held by the spin chuck 2, like the substrate W.

[0109] (7) In the embodiments and modifications described above, the lower auxiliary part 57 is configured to primarily guide the cleaning liquid discharged from the 12 discharge ports 53 to the inner cup 16. Alternatively, the lower auxiliary part 57 may be configured to primarily guide the cleaning liquid discharged from the 12 discharge ports 53 to the outer cup 15. [Explanation of symbols]

[0110] 1 ... Substrate processing equipment 2… Spin Chuck 3… Rotating shaft 5. Rotary drive unit 9… Processing liquid nozzle 11… Processing liquid piping 15… Outer cup 16… Inner cup 33A…Top surface 33B…Aperture 37… Showering 41… Cleaning solution nozzle 47… Ceiling components 49 … side wall 51 ... Liquid holding member 53…Discharge port 55 … Upper auxiliary part 55A ... Lower surface of liquid receiver 57 … Lower auxiliary part 57A ... Top surface of liquid receiver 57B…Second outer peripheral surface 63 … First outer peripheral surface 67... Cup lifting mechanism 71 ... Control Unit LN ... virtual line

Claims

1. A substrate processing apparatus for processing substrates, A substrate holding portion for holding the substrate, A rotating shaft extending downward from the substrate holding portion, A processing liquid nozzle for discharging processing liquid onto the substrate held by the substrate holding section, In a plan view, an inner cup is formed to surround the outer circumference of the substrate holding portion, In a plan view, an outer cup is formed to surround the outer circumference of the inner cup, A shower ring disposed inside the inner cup, configured to spray the cleaning liquid by centrifugal force in order to clean the inner cup and the outer cup, A rotational drive unit that rotates the shower ring around the rotating shaft, A cleaning liquid nozzle that discharges the cleaning liquid onto the shower ring which is rotated around the rotating shaft, Equipped with, The aforementioned shower ring is A disc-shaped ceiling member, A side wall extending cylindrically downward from the outer edge of the ceiling member, A liquid holding member is formed in a ring shape on the lower side of the ceiling member, extending from the side wall toward the central axis of the side wall, and holding the cleaning liquid discharged from the cleaning liquid nozzle, Multiple discharge ports are provided on the side wall and arranged around the central axis, A lower auxiliary portion is provided below the plurality of discharge ports and on the first outer peripheral surface of the side wall, and is formed in the shape of a ring, Equipped with, The aforementioned lower auxiliary part is, The upper surface of the liquid receiving area is formed in the shape of a ring to receive the cleaning liquid from below, In order to separate the cleaning liquid received on the upper surface of the liquid receiver from the lower auxiliary portion at the boundary with the upper surface of the liquid receiver, a second outer peripheral surface is formed in a cylindrical shape so as to be inclined downward from the outer peripheral edge of the upper surface of the liquid receiver and toward the central axis, A substrate processing apparatus characterized by comprising:

2. In the substrate processing apparatus according to claim 1, The substrate processing apparatus is characterized in that the shower ring further comprises an upper auxiliary portion that is provided above the plurality of discharge ports and on the first outer peripheral surface of the side wall, and is formed in the shape of a ring.

3. In the substrate processing apparatus according to claim 2, The upper auxiliary section is configured to guide the cleaning liquid discharged from the plurality of outlets into the outer cup, and, The lower auxiliary section is configured to guide the cleaning liquid discharged from the plurality of discharge ports into the inner cup. The substrate processing apparatus is characterized in that the upper surface of the liquid receiver is positioned higher than the inner cup.

4. In the substrate processing apparatus according to claim 1 or 2, The substrate processing apparatus is characterized in that the upper surface of the liquid receptacle is formed to be inclined outward and downward from the side wall side.

5. In the substrate processing apparatus according to claim 4, A substrate processing apparatus characterized in that, when the showering ring sprays the cleaning liquid, the upper surface of the liquid receiver is formed such that, in a side view, an imaginary line extending from the upper surface of the liquid receiver intersects with the upper surface of the inner cup.

6. In the substrate processing apparatus according to claim 2, The upper auxiliary part is equipped with a liquid receiving lower surface that receives the cleaning liquid from above. The substrate processing apparatus is characterized in that each of the multiple discharge ports is configured to face the lower surface of the liquid receiver.

7. In the substrate processing apparatus according to claim 2, Further equipped with a control unit, The control unit, The aforementioned rotational drive unit rotates the shower ring at a preset first rotational speed. When the shower ring is rotating at the first rotational speed, the cleaning liquid is supplied to the shower ring from the cleaning liquid nozzle, and the cleaning liquid discharged from the multiple discharge ports is guided by the upper auxiliary part, causing the cleaning liquid to be scattered onto the inner surface of the outer cup. The rotational drive unit rotates the shower ring at a preset second rotational speed that is smaller than the first rotational speed. A substrate processing apparatus characterized in that, when the shower ring is rotating at the second rotational speed, the cleaning liquid is supplied to the shower ring from the cleaning liquid nozzle, thereby guiding the cleaning liquid discharged from the plurality of discharge ports with the lower auxiliary part, and scattering the cleaning liquid onto the upper surface of the inner cup.

8. In the substrate processing apparatus according to claim 1 or 2, The cup lifting mechanism further comprises a cup lifting mechanism that moves the outer cup and the inner cup together in a vertical direction. The inner cup has an opening formed in a circular shape by the inner periphery of the inner cup, A substrate processing apparatus characterized in that the diameter of the opening is larger than the diameter of the shower ring.

9. In the substrate processing apparatus according to claim 1 or 2, The processing liquid nozzle is configured to discharge a resist liquid as the processing liquid, and The substrate processing apparatus is characterized in that the cleaning solution nozzle is configured to discharge an organic solvent as the cleaning solution.

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