Stage apparatus, substrate processing apparatus, and article manufacturing method

Abstract

This technology offers advantages in reducing the effects of reaction forces associated with stage drive. [Solution] A stage device is provided, comprising: a stage for holding an object; a drive unit for driving the stage; a thrust unit for outputting thrust to reduce the effect of reaction force associated with driving the stage by the drive unit; and a generation unit for generating a thrust signal indicating the thrust that the thrust unit should output, based on a profile signal indicating a control target for the stage and an operation signal indicating the amount of operation of the stage to be input to the drive unit.

Description

[Technical Field]

[0001] The present invention relates to a stage apparatus, a substrate processing apparatus, and a method for manufacturing articles. [Background technology]

[0002] The stage device is equipped with a reaction force processing mechanism, including a linear motor, attached to the stage, the stage base plate, or the base plate supporting the stage base plate, in order to counteract the reaction force (acting force) generated when the stage is driven (stepped) (see Patent Document 1). The thrust of the reaction force processing mechanism is generated based on the drive profile signal of the stage or the input signal to the drive mechanism that drives the stage, and is generated simultaneously with the drive of the stage as a feedforward command value.

[0003] In generating input signals for reaction force processing mechanisms, a filter is typically designed for the input signal from the stage. This filter measures the reaction force associated with the stage drive using an acceleration sensor or similar device, and then reduces this reaction force to zero. [Prior art documents] [Patent Documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2001-110717 [Overview of the project] [Problems that the invention aims to solve]

[0005] However, if the dynamic characteristics of the stage fluctuate due to changes in the stage's position or aging, errors may occur in the filter generated under the reference stage state, potentially leading to leakage of reaction force cancellation. Furthermore, it is difficult to maintain stable and highly accurate cancellation of the reaction force associated with stage driving using only the stage drive profile signal or the input signal to the drive mechanism that drives the stage. In this case, thrust leakage may occur, potentially causing deformation or vibration in the stage platen or base platen due to the leaked thrust.

[0006] This invention has been made in view of the problems of the prior art, and its exemplary objective is to provide a technology that is advantageous in reducing the effects of reaction forces associated with the driving of a stage. [Means for solving the problem]

[0007] To achieve the above objective, a stage device as one aspect of the present invention is characterized by comprising: a stage for holding an object; a drive unit for driving the stage; a thrust unit for outputting thrust to reduce the effect of reaction force associated with driving the stage by the drive unit; and a generation unit for generating a thrust signal indicating the thrust that the thrust unit should output, based on a profile signal indicating a control target for the stage and an operation signal indicating the amount of operation of the stage to be input to the drive unit.

[0008] Further objects or other aspects of the present invention will be revealed by embodiments described below with reference to the accompanying drawings. [Effects of the Invention]

[0009] According to the present invention, for example, it is possible to provide a technique that is advantageous in reducing the effects of reaction forces associated with the driving of a stage. [Brief explanation of the drawing]

[0010] [Figure 1] This figure shows an example of the hardware configuration of a stage device, representing one aspect of the present invention. [Figure 2]This is a block diagram of the control system for the stage equipment. [Figure 3] This diagram illustrates the effect of reducing the impact of reaction forces associated with stage movement. [Figure 4] This is a block diagram showing an example of the internal configuration of the first controller. [Figure 5] This is a block diagram showing an example of the internal configuration of the second controller. [Figure 6] This is a schematic diagram showing the configuration of an exposure apparatus as one aspect of the present invention. [Modes for carrying out the invention]

[0011] The embodiments will be described in detail below with reference to the attached drawings. Note that the following embodiments do not limit the invention as defined in the claims. While the embodiments describe multiple features, not all of these features are essential to the invention, and the features may be combined in any way. Furthermore, in the attached drawings, identical or similar configurations are given the same reference numerals, and redundant descriptions are omitted.

[0012] <First Embodiment> Figure 1 shows an example of the hardware configuration of the stage device 100 as one aspect of the present invention. The stage device 100 is a holding device for holding an object, and in this embodiment, it is embodied as a holding device for holding a substrate ST as an object via a stage. The stage device 100 is applied, for example, to a substrate processing apparatus for processing the substrate ST.

[0013] In this specification and the accompanying drawings, directions are indicated in an XYZ coordinate system where the direction parallel to the plane on which the substrate ST is placed is the XY plane. The directions parallel to the X, Y, and Z axes in the XYZ coordinate system are defined as the X direction, Y direction, and Z direction, respectively, and the rotations around the X axis, Y axis, and Z axis are defined as θX, θY, and θZ, respectively.

[0014] As shown in FIG. 1, the stage device 100 includes a worktable 5, a first stage 1 that moves in the X direction (first direction) on the worktable, for example, reciprocally, and a first driving unit 10 including a mover 10a and a stator 10b that drives the first stage 1. Further, the stage device 100 includes a second stage 2 that moves in the Y direction (second direction different from the first direction) on the first stage, for example, reciprocally, and a second driving unit 20 including a mover 20a and a stator 20b that drives the second stage 2. Furthermore, the stage device 100 includes a reaction force processing mechanism 30 including a mover 30a and a stator 30b that outputs a reaction force for canceling out the reaction force (acting force) accompanying the driving of the first stage 1 and the second stage 2 by the first driving unit 10 and the second driving unit 20. In the present embodiment, the reaction force processing mechanism 30 functions as a thrust unit that outputs a thrust for reducing the influence of the reaction force accompanying the driving of the first stage | 1 and the second stage 2.

[0015] The stage device 100 includes a control unit 90 that comprehensively controls the overall operation of the stage device 100. The control unit 90 is composed of a computer (information processing device) including, for example, a CPU and a memory, and comprehensively controls each part of the stage device 100 according to a program stored in a storage unit or the like.

[0016] FIG. 2 is a block diagram related to the control system of the stage device 100. In FIG. 2, each block is shown in transfer function representation. In FIG. 2, the first stage 1 and the second stage 2 are collectively referred to as a stage 205, and a driving unit (the first driving unit 10 and the second driving unit 20) that drives the stage 205 is referred to as a driving circuit.

[0017] Referring to Figure 2, the input signal to the reaction force processing mechanism 30 is generated based on a drive profile signal 201 indicating the drive profile of the stage 205 and a circuit input signal 204 input to the drive circuit. In this embodiment, a first controller 207 for the drive profile signal 201 and a second controller 206 for the circuit input signal 204 are provided as separate controllers. Therefore, the reaction force processing mechanism 30 receives a combined signal of the signal generated by the first controller 207 and the signal generated by the second controller 206 as its input signal.

[0018] Here, the drive profile signal 201 is a profile signal indicating the control target of the stage 205, and in this embodiment, it is a position profile signal indicating the trajectory of the target position of the stage 205 as the control target of the stage 205. However, the drive profile signal 201 is not limited to a position profile signal, and may also be a speed profile signal indicating the progression of the target speed of the stage 205 as the control target of the stage 205. In addition, the circuit input signal 204 is an operation signal indicating the amount of manipulation of the stage 205 to be input to the drive circuit.

[0019] Stage 205 is controlled to a target control state by a feedforward controller 202 and a feedback controller 203. The feedforward controller 202 generates a feedforward signal for feedforward control of Stage 205 based on the drive profile signal 201. The feedback controller 203 generates a feedback signal for feedback control of Stage 205 based on the state of Stage 205. Therefore, the feedforward signal generated by the feedforward controller 202 and the feedback signal generated by the feedback controller 203 become input signals, i.e., operation signals, to the drive circuit of Stage 205.

[0020] Here, the state variable of stage 205 is a physical quantity indicating the state of stage 205, and in this embodiment, it is the position of stage 205. However, the state variable of stage 205 may also be the velocity, acceleration, jerk, or supercharge of stage 205. In addition, in this embodiment, a measurement unit is provided as an acquisition unit for acquiring the state variable of stage 205, which includes an interferometer or encoder for measuring the position of stage 205.

[0021] When the stage 205 is driven, a reaction force is generated associated with the driving of the stage 205. This reaction force, via the transmission characteristics 211 to the substrate processing apparatus (its main structure) to which the stage device 100 is applied, becomes a factor in generating vibration 209 of the main body of the substrate processing apparatus. Figure 2 shows the average dynamic characteristics P of the stage 205. w In contrast, this assumes a case where the characteristics fluctuate by a variation amount Δ. This variation amount Δ is caused by factors such as the position of stage 205 and changes over time.

[0022] In this embodiment, as shown in Figure 2, a technique is provided for reducing (canceling) the main body vibration 209, which is the effect of the reaction force 210 associated with the driving of the stage 205, by the reaction force processing mechanism 30.

[0023] The reaction force A(210) transmitted to the substrate processing device as the stage 205 is driven is expressed by the following equation (1).

[0024]

number

[0025] Furthermore, the thrust B(212) output (generated) from the reaction force processing mechanism 30 is expressed by the following equation (2).

[0026]

number

[0027] Therefore, the difference (composite force) between the reaction force A(210) shown in equation (1) and the thrust B(212) shown in equation (2) appears as the main body vibration y(209).

[0028] Therefore, in this embodiment, the first controller Fr(207) and the second controller Fu(206) are set, preferably, so that the main body vibration y(209) becomes zero, in order to reduce the influence of the reaction force A(210) associated with the driving of the stage 205. Furthermore, the first controller Fr(207) and the second controller Fu(206) are set so that the influence of fluctuations in the dynamic characteristics of the stage 205 does not occur. This makes it possible to cancel out the reaction force A(210) with the thrust B(212) regardless of the amount of fluctuation Δ. Specifically, the first controller Fr(207) and the second controller Fu(206) are set according to the following equations (3) and (4), respectively, obtained from an equation in which the difference between equation (1) (reaction force A(210)) and equation (2) (thrust B(212)) is set to zero.

[0029]

number

[0030]

number

[0031] Feedback Controller C w (203), Feedforward Controller F w (202) Dynamic characteristics P of reaction force processing mechanism 30 d , and transfer characteristics H wd Each of (211) can be determined in advance by pre-calculation or system identification. Therefore, as shown in equations (3) and (4), it becomes possible to set the first controller Fr(207) and the second controller Fu(206).

[0032] In this embodiment, the first controller Fr(207) and the second controller Fu(206) are appropriately set based on the drive profile signal 201 and the circuit input signal 204. This design ensures that the first controller Fr(207) and the second controller Fu(206) output a thrust B from the reaction force processing mechanism 30 that reduces the effect of reaction force A associated with the drive of the stage 205, without being affected by fluctuations in the dynamic characteristics of the stage 205. The first controller Fr(207) and the second controller Fu(206), thus designed, function as generating units that generate a thrust signal indicating the thrust that the reaction force processing mechanism 30 should output, based on the drive profile signal 201 and the circuit input signal 204. In particular, in this embodiment, the first controller Fr(207) and the second controller Fu(206) generate a thrust signal where the difference between reaction force A and thrust B is zero. The settings for the first controller Fr(207) and the second controller Fu(206) refer to determining (adjusting) the parameters for generating thrust signals in each controller.

[0033] Furthermore, by providing multiple generation units (controllers) that generate thrust signals to be input to the reaction force processing mechanism 30, the degree of adjustment freedom can be improved, making it possible to realize a system with excellent resistance to disturbances.

[0034] Referring to Figures 3(a) and 3(b), the effects realized by this embodiment in the stage device 100, namely the effect of reducing the influence of reaction forces associated with the driving of the stage 205, will be explained.

[0035] Figure 3(a) shows the position (displacement) of the stage 205 when the stage 205 is driven in steps. In Figure 3(a), the position of the stage 205 is on the vertical axis, and the time since the start of step driving (elapsed time) is on the horizontal axis. Figure 3(b) shows the vibration of the base plate 5 acquired when the dynamic characteristics of the stage 205 fluctuated while the stage 205 was being driven in steps (Figure 3(a)). In Figure 3(b), the vibration of the base plate 5 is on the vertical axis, and the time since the start of step driving (elapsed time) is on the horizontal axis. Figure 3(b) shows waveform 501 showing the vibration of the base plate 5 in the prior art, and waveforms 502 and 503 showing the vibration of the base plate 5 in this embodiment. Waveform 502 shows the waveform when the first controller Fr(207) and the second controller Fu(206) are set based on the drive profile signal 201 and the circuit input signal 204, respectively. Waveform 503 shows the waveform when the first controller Fr(207) and the second controller Fu(206) are set according to equations (3) and (4).

[0036] Comparing waveform 501 with waveforms 502 and 503, as shown in Figure 5(b), it can be seen that in this embodiment, the vibration of the surface plate 5 is smaller than in the conventional technology. Furthermore, comparing waveform 502 with waveform 503, it can be seen that the vibration of the surface plate 5 can be further reduced by setting the first controller Fr(207) and the second controller Fu(206) according to equations (3) and (4).

[0037] <Second Embodiment> The detailed configurations of the first controller Fr(207) and the second controller Fu(206) will be described with reference to Figures 4 and 5. In this embodiment, an example is shown in which the control of the stage 205 and the control of the reaction force processing mechanism 30 are realized by discrete control using computing elements such as a microcontroller and a digital signal processor (DSP). Figure 4 is a block diagram showing an example of the internal configuration of the first controller Fr(207) that receives the drive profile signal 201 as input. Figure 5 is a block diagram showing an example of the internal configuration of the second controller Fu(206) that receives the circuit input signal 204 as input.

[0038] In FIGS. 4 and 5, each block represents a Z-transformed (Laplace-transformed) block, and block Z -1 (302 to 305, 402, 403) is an operator that generates a 1-sample delay for an input signal. A difference of multiple orders is obtained for each sampling, and gains g vel (306), g acc (307), g jerk (308), g snap (309), k acc (404), k jerk (405) and k snap (406) are applied. In this embodiment, the signal to which these gains are applied is used as the input signal to the reaction force processing mechanism 30.

[0039] In FIG. 4, the drive profile signal 201 is used as the position profile signal (position command). Gains can be set for each of the velocity dimension (vel) of the first derivative of the drive profile signal 201, the acceleration dimension (acc) of the second derivative, the jerk dimension of the third derivative, and the snap dimension of the fourth derivative. Then, the signal obtained by integrating the signals in all dimensions becomes the output signal, that is, the input signal to the reaction force processing mechanism 30. In the first controller Fr (207), the transfer characteristics from the input to the output are represented by the following equation (5).

[0040] [Number]

[0041] Thus, in this embodiment, the first controller Fr (207) is configured to include individual controllers for each of a plurality of different characteristics obtained by decomposing the drive profile signal 201. Further, when the drive profile signal 201 is a position profile signal, the plurality of characteristics are, as described above, the snap characteristic, the jerk characteristic, the acceleration characteristic, and the velocity characteristic.

[0042] In Figure 5, the circuit input signal 204 is an acceleration profile signal (acceleration command) that shows the acceleration progression of the stage 205. Gains can be set for each of the first-order difference jerk dimension and the second-order difference snap dimension of the circuit input signal 204. The signal obtained by integrating the signals of all dimensions becomes the output signal, i.e., the input signal to the reaction force processing mechanism 30. In the second controller Fu(206), the transfer characteristics from input to output are expressed by the following equation (6).

[0043]

number

[0044] Thus, in this embodiment, the second controller Fu(206) is configured to include separate controllers for each of the multiple distinct characteristics obtained by decomposing the circuit input signal 204. Furthermore, when the circuit input signal 204 is an acceleration profile signal, the multiple characteristics are, as described above, jerk acceleration characteristics and jerk acceleration characteristics.

[0045] In this embodiment, the first controller Fr(207) shown in equation (5) and the second controller Fu(206) shown in equation (6) are configured by determining (adjusting) the gain values ​​(parameters) of each dimension so as to satisfy equations (3) and (4). This results in a controller that can reduce the effects of fluctuations in the dynamic characteristics of the stage 205 and the effects of reaction forces associated with the driving of the stage 205.

[0046] In this embodiment, the number of gain parameters is kept relatively small at seven, thus reducing the computational load on the controller. While this embodiment applies differentiation up to the galvanic acceleration dimension (snap), higher differentiation dimensions (Crackle, Pop, ...) may also be applied. Furthermore, integration may be applied to utilize velocity characteristics or position characteristics.

[0047] Furthermore, by decomposing the physical quantities into the characteristics of each difference dimension and providing controllers, it becomes possible to identify and correct thrust differences caused by disturbances other than the acceleration characteristics generated by the predetermined disturbance elements of the stage device 100, thereby configuring a system with excellent disturbance resistance. The predetermined disturbance elements include, for example, mounted spring elements, damping elements by magnetic circuits, actuator differences between the stage linear motor and the reaction force linear motor, and thrust variations within the actuator.

[0048] <Third Embodiment> As explained with reference to Figure 1, in this embodiment, the stage 205 includes a first stage 1 that moves in the Y direction and a second stage 2 that moves in the X direction. In such a case, it is preferable to provide a reaction force processing mechanism 30 that functions as a thrust unit and a first controller Fr(207) and a second controller Fu(206) that functions as generation units for each of the first stage 1 and the second stage 2. This results in each controller for each stage (each pressure processing mechanism) having different parameters. Therefore, even if different disturbances occur in the X and Y directions, the influence of reaction forces associated with the driving of each stage can be reduced without impairing the disturbance resistance of each stage.

[0049] <Fourth Embodiment> Preferably, the parameters of the first controller Fr(207) and the second controller Fu(206) are determined based on evaluation values ​​relating to at least one of the acceleration, velocity, and deviation of the stage 205 at the target position. In this embodiment, these are used as evaluation values, and the parameters of the individual controllers are determined from evaluation value data in the domains of jerk characteristics, jerk characteristics, velocity characteristics, and position characteristics when the stage 205 is driven. The target position can be set arbitrarily and includes, for example, the position where the effect of the reaction force associated with the driving of the stage 205 should be minimized.

[0050] <Fifth Embodiment> In the stage device 100, it is conceivable that the evaluation value of at least one of the acceleration, velocity, and deviation of the stage 205 at the target position may change beyond a certain value. In such a case, it is preferable for the control unit 90 to notify that the parameters of the first controller Fr(207) and the second controller Fu(206) should be re-determined (readjusted), for example, by suggesting the determination of new parameters. Such notification is made, for example, by displaying an image or outputting sound through the user interface of the stage device 100. Alternatively, or in addition to such notification, the control unit 90 may re-determine the parameters of the first controller Fr(207) and the second controller Fu(206).

[0051] <Sixth Embodiment> As described above, the stage device 100 is applied to a substrate processing apparatus that processes a substrate ST. The substrate processing apparatus is used in lithography processes for various devices and includes a lithography apparatus that forms a pattern on a substrate. In this embodiment, as shown in Figure 6, it is embodied as an exposure apparatus EXA that exposes the substrate ST via a master plate R. Figure 6 is a schematic diagram showing the configuration of the exposure apparatus EXA as one aspect of the present invention. In this embodiment, the exposure apparatus EXA is a step-and-scan type exposure apparatus (scanner) that exposes the substrate ST while moving (scanning) the master plate R and the substrate ST relative to each other in the scanning direction, thereby transferring the pattern of the master plate R to the substrate ST.

[0052] As shown in Figure 6, the exposure apparatus EXA includes a stage device 100, a lens barrel platen 696, a damper 698, a master plate platen 694, and a master plate stage 695. The exposure apparatus EXA also includes a projection optical system 697 and an illumination optical system 699 as processing units for processing the substrate ST. In this embodiment, the direction perpendicular to the plane of Figure 6 is defined as the scanning direction, and the horizontal direction within the plane of Figure 6 is defined as the step direction. Furthermore, a coordinate system is defined in which the scanning direction is the Y direction, the direction intersecting the scanning direction, in particular the step direction perpendicular to the scanning direction, is defined as the X direction, and the direction perpendicular to both the X and Y directions is defined as the Z direction.

[0053] The surface plate 5 is supported on the floor 691 via a mount (not shown). A substrate stage (first stage 1 and second stage 2) for holding the substrate ST is provided on the surface plate 5. Linear motors are also provided as drive units (first drive unit 10 and second drive unit 20) for driving the substrate stage. The lens barrel surface plate 696 is supported on the floor 691 via a damper 698. The lens barrel surface plate 696 is provided with a projection optical system 697 and a master plate surface plate 694. A master plate stage 695 for holding and moving the master plate R is provided on the master plate surface plate 694. An illumination optical system 699 is provided above the master plate stage 695.

[0054] During exposure, light emitted from a light source (not shown) illuminates the master plate R via an illumination optical system 699. The pattern on the master plate R is projected (imaged) onto the substrate ST held by the stage device 100 via a projection optical system 697. At this time, the master plate stage 695 and the substrate stage 600 move the master plate R and the substrate ST relative to each other in the scanning direction. Therefore, the exposure apparatus EXA can provide devices (articles such as semiconductor elements, magnetic storage media, and liquid crystal display elements) economically with high throughput.

[0055] Furthermore, the present invention is not limited to lithography apparatuses as exposure apparatuses, but can also be applied to, for example, imprint apparatuses and drawing apparatuses. An imprint apparatus brings an imprint material supplied (placed) on a substrate into contact with a mold (master plate), and applies curing energy to the imprint material to form a pattern on a cured material into which the pattern of the mold has been transferred. A drawing apparatus forms a pattern (latent image pattern) on a substrate by drawing on the substrate with a charged particle beam (electron beam) or a laser beam. In addition, the present invention can be applied to substrate processing apparatuses that use stage equipment such as transport apparatuses, machine tools, production apparatuses, precision processing apparatuses, and precision measuring apparatuses.

[0056] <Seventh Embodiment> The method for manufacturing an article in the embodiment of the present invention is suitable for manufacturing articles such as devices (semiconductor elements, magnetic storage media, liquid crystal display elements, etc.). Such a manufacturing method includes the steps of forming a pattern on a substrate using an exposure apparatus EXA, processing the substrate on which the pattern has been formed, and manufacturing an article from the processed substrate. Such a manufacturing method may also include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article in this embodiment is advantageous compared to conventional methods in at least one of the performance, quality, productivity, and production cost of the article.

[0057] The disclosures herein include the following stage apparatus, substrate processing apparatus, and method for manufacturing articles.

[0058] (Item 1) A stage for holding an object, A drive unit that drives the aforementioned stage, A thrust unit that outputs thrust to reduce the effect of reaction force associated with the driving of the stage by the drive unit, A generation unit generates a thrust signal indicating the thrust that the thrust unit should output, based on a profile signal indicating the control target of the stage and an operation signal indicating the amount of operation of the stage to be input to the drive unit. A stage apparatus characterized by having the following:

[0059] (Item 2) The stage apparatus according to item 1, characterized in that the control target includes the trajectory of the target position of the stage.

[0060] (Item 3) The stage apparatus according to item 1, characterized in that the control target includes the transition of the target speed of the stage.

[0061] (Item 4) The stage apparatus according to any one of items 1 to 3, characterized in that the generation unit generates the thrust signal such that the difference between the reaction force associated with the driving of the stage by the drive unit and the thrust output from the thrust unit becomes zero.

[0062] (Item 5) The generating unit is A first controller for the profile signal, A second controller for the aforementioned operation signal, A stage device according to any one of items 1 to 4, characterized by including the following:

[0063] (Item 6) The stage apparatus according to item 5, characterized in that the first controller includes separate controllers for each of a plurality of different characteristics obtained from the profile signal.

[0064] (Item 7) The profile signal indicates the trajectory of the target position of the stage. The aforementioned multiple characteristics include jerk characteristics, jerk characteristics, acceleration characteristics, velocity characteristics and position characteristics. The stage apparatus described in item 6, characterized by the features described herein.

[0065] (Item 8) The stage apparatus according to any one of items 5 to 7, characterized in that the second controller includes separate controllers for each of a plurality of different characteristics obtained from the operation signal.

[0066] (Item 9) The aforementioned operation signal indicates the change in the acceleration of the stage. The aforementioned plurality of characteristics include accelerating characteristics and accelerating characteristics. The stage apparatus described in item 8, characterized by the features described above.

[0067] (Item 10) The stage includes a first stage that moves in a first direction and a second stage that moves in a second direction different from the first direction. The thrust unit and the generation unit are provided for each of the first and second stages. A stage apparatus as described in any one of items 1 to 9, characterized by the above.

[0068] (Item 11) The stage apparatus according to any one of items 1 to 10, characterized in that the generation unit determines the parameters for generating the thrust signal based on evaluation values ​​relating to at least one of the acceleration, velocity, and deviation of the stage at the position where the effect of the reaction force associated with the driving of the stage should be reduced the most.

[0069] (Item 12) The stage apparatus according to item 11, further comprising a control unit that notifies the user that the parameter should be re-determined when the evaluation value changes by more than a certain value.

[0070] (Item 13) The stage apparatus according to item 11 or 12, further comprising a control unit that re-determines the parameter when the evaluation value changes beyond a certain value.

[0071] (Item 14) A substrate processing apparatus for processing substrates, A stage device described in any one of items 1 to 13 that holds the substrate as an object, A processing unit for processing the substrate held by the stage device, A substrate processing apparatus characterized by having

[0072] (Item 15) The substrate processing apparatus according to item 14, characterized in that the processing unit includes a projection optical system for projecting the pattern of the master plate onto the substrate.

[0073] (Item 16) A step of forming a pattern on a substrate using a substrate processing apparatus described in item 14 or 15, A step of processing the substrate on which the pattern has been formed in the above step, A process for manufacturing an article from the processed substrate, A method for manufacturing an article, characterized by having the following:

[0074] The invention is not limited to the embodiments described above, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, claims are attached to disclose the scope of the invention. [Explanation of symbols]

[0075] 1: First stage 2: Second stage 10: First drive unit 20: Second drive unit 30: Reaction force processing mechanism 90: Control unit 100: Stage device 206: Second controller 207: First controller

Claims

1. A stage for holding an object, A drive unit that drives the aforementioned stage, A thrust unit that outputs thrust to reduce the effect of reaction force associated with the driving of the stage by the drive unit, A generation unit generates a thrust signal indicating the thrust that the thrust unit should output, based on a profile signal indicating the control target of the stage and an operation signal indicating the amount of operation of the stage to be input to the drive unit. A stage apparatus characterized by having the following:

2. The stage apparatus according to claim 1, characterized in that the control target includes the trajectory of the target position of the stage.

3. The stage apparatus according to claim 1, characterized in that the control target includes the transition of the target speed of the stage.

4. The stage apparatus according to claim 1, characterized in that the generation unit generates the thrust signal such that the difference between the reaction force associated with the driving of the stage by the drive unit and the thrust output from the thrust unit becomes zero.

5. The generating unit is A first controller for the profile signal, A second controller for the aforementioned operation signal, The stage apparatus according to claim 1, characterized by including the following:

6. The stage apparatus according to claim 5, wherein the first controller includes separate controllers for each of a plurality of different characteristics obtained from the profile signal.

7. The profile signal indicates the trajectory of the target position of the stage. The aforementioned multiple characteristics include jerk characteristics, jerk characteristics, acceleration characteristics, velocity characteristics and position characteristics. The stage apparatus according to feature 6.

8. The stage apparatus according to claim 5, wherein the second controller includes separate controllers for each of a plurality of different characteristics obtained from the operation signal.

9. The aforementioned operation signal indicates the change in the acceleration of the stage. The aforementioned plurality of characteristics include accelerating characteristics and accelerating characteristics. The stage apparatus according to feature 8.

10. The stage includes a first stage that moves in a first direction and a second stage that moves in a second direction different from the first direction. The thrust unit and the generation unit are provided for each of the first and second stages. The stage apparatus according to feature 1.

11. The stage apparatus according to claim 1, characterized in that the generation unit determines the parameters for generating the thrust signal based on an evaluation value relating to at least one of the acceleration, velocity, and deviation of the stage at the position where the effect of the reaction force associated with the driving of the stage should be reduced the most.

12. The stage apparatus according to claim 11, further comprising a control unit that notifies that the parameter should be re-determined when the evaluation value changes by more than a certain value.

13. The stage apparatus according to claim 11, further comprising a control unit that re-determines the parameter when the evaluation value changes beyond a certain value.

14. A substrate processing apparatus for processing substrates, A stage device according to claim 1 that holds the substrate as an object, A processing unit for processing the substrate held by the stage device, A substrate processing apparatus characterized by having

15. The substrate processing apparatus according to claim 14, characterized in that the processing unit includes a projection optical system for projecting the pattern of the original plate onto the substrate.

16. A step of forming a pattern on a substrate using the substrate processing apparatus described in claim 14, A step of processing the substrate on which the pattern has been formed in the above step, A process for manufacturing an article from the processed substrate, A method for manufacturing an article, characterized by having the following:

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