Siloxane compound film, component, fixing device, image forming apparatus, and method for manufacturing a siloxane compound film

Abstract

To provide a siloxane compound film that possesses release properties while simultaneously achieving both abrasion resistance and flexibility. [Solution] A siloxane compound film comprising a siloxane compound with Si, O, C, and H as constituent elements, wherein the spectrum measured by X-ray photoelectron spectroscopy (XPS) has a peak in the range of 100 eV to 103 eV, and the full width at half maximum of the peak is 1.80 eV to 4.00 eV.

Description

[Technical Field]

[0001] The present invention relates to a siloxane compound film, a component, a fixing device, an image forming apparatus, and a method for producing a siloxane compound film. [Background technology]

[0002] For example, Patent Document 1 discloses "a fixing member used to fix a recording material applied to a recording medium onto the recording medium, comprising a base material and a release layer as the outermost layer on the base material, wherein the release layer is made of a silicon oxide film containing carbon atoms, the infrared absorption spectrum of the release layer has an absorption peak originating from Si-CH3, and the carbon atom concentration in the release layer [(number of carbon atoms in the silicon oxide film) × 100 / (number of carbon atoms + number of silicon atoms + number of oxygen atoms in the silicon oxide film)] is 40 atomic% or more and 72 atomic% or less." [Prior art documents] [Patent Documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2015-227932 [Overview of the Initiative] [Problems that the invention aims to solve]

[0004] The object of the present invention is to provide a siloxane compound film that exhibits release properties while simultaneously achieving both abrasion resistance and flexibility, compared to cases where the full width at half maximum of a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV. [Means for solving the problem]

[0005] The means for solving the above problems include the following embodiments. <1> A siloxane compound film containing a siloxane compound having Si, O, C, and H as constituent elements, having a peak in the range of 100 eV or more and 103 eV or less in a spectrum measured by X-ray photoelectron spectroscopy (XPS), and having a half-value width of the peak of 1.80 eV or more and 4.00 eV or less. <2> The siloxane compound film according to <1>, having Si-O bonds and Si-R bonds (where R represents a group containing at least one of an alkyl group and a phenyl group). <3> The siloxane compound film according to <2>, wherein R represents a group containing an alkyl group. <4> The siloxane compound film according to any one of <1> to <3>, having a half-value width of the peak of 2.00 eV or more and 3.00 eV or less. <5> The siloxane compound film according to any one of <1> to <4>, having an atomic weight ratio (C / Si) of C to Si of 0.30 or more. <6> A member having a substrate and a surface layer provided on the substrate and composed of the siloxane compound film according to any one of <1> to <5>. <7> The member according to <6>, wherein the substrate is a metal substrate. <8> Comprising a first rotating body and a second rotating body disposed in contact with the outer surface of the first rotating body. A fixing device in which at least one of the first rotating body and the second rotating body is composed of the member according to <6> or <7>. <9> An image carrier, A charging device for charging the surface of the image carrier, An electrostatic latent image forming device for forming an electrostatic latent image on the surface of the charged image carrier, A developing device for accommodating a developer containing toner and developing the electrostatic latent image formed on the surface of the image carrier with the developer to form a toner image, A transfer device for transferring the toner image onto the surface of a recording medium, The fixing device according to <8> for fixing the toner image onto the surface of a recording medium. An image forming apparatus equipped with the following features. <10> A siloxane compound film is formed using plasma CVD (Plasma Enhanced Chemical Vapor Deposition) with the raw material siloxane compound. <1> ~ <5> A method for producing a siloxane compound film according to any one of the items. [Effects of the Invention]

[0006] <1> , or <2> According to the invention, compared to cases where the full width at half maximum of a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.8 e0 V or greater than 4.00 eV, a siloxane compound film is provided that has release properties while achieving both abrasion resistance and flexibility. <3> According to the invention, a siloxane compound film is provided that exhibits release properties while simultaneously achieving both wear resistance and flexibility, compared to the case where R represents a group containing a phenyl group. <4> According to the invention, a siloxane compound film is provided that has release properties while achieving both abrasion resistance and flexibility, compared to cases where the peak full width at half maximum is less than 2.00 eV or greater than 3.00 eV. <5> According to the invention, a siloxane compound film is provided that has release properties while achieving both wear resistance and flexibility, compared to the case where the atomic weight ratio (C / Si) is less than 0.30.

[0007] <6> , <7> , <8> , or <9> According to the present invention, compared to cases where the full width at half maximum of a peak in the range of 100 eV to 103 eV in a spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV, a component having a siloxane compound film that achieves both abrasion resistance and flexibility while having release properties is provided, as well as a fixing device or image forming apparatus having the same.

[0008] <10> The present invention provides a method for producing a siloxane compound film that, compared to a method for producing a siloxane compound film in which the full width at half maximum of a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV, is obtained by plasma CVD, which yields a siloxane compound film that is both releaseable and abrasion resistant and flexible. [Brief explanation of the drawing]

[0009] [Figure 1] This is a schematic diagram showing an example of a film deposition apparatus used to form a siloxane compound film according to this embodiment. [Figure 2] This is a schematic diagram showing an example of a fixing device according to this embodiment. [Figure 3] This is a schematic diagram showing an example of an image forming apparatus according to this embodiment. [Modes for carrying out the invention]

[0010] The following describes an embodiment that is an example of the present invention. These descriptions and examples are illustrative of embodiments and do not limit the scope of the embodiments.

[0011] In the numerical ranges described in stages within this embodiment, the upper or lower limit of one numerical range may be replaced with the upper or lower limit of another numerical range described in stages. Furthermore, in the numerical ranges described within this embodiment, the upper or lower limit of that range may be replaced with the values ​​shown in the examples. In this embodiment, the term "process" includes not only independent processes but also any process that cannot be clearly distinguished from other processes, as long as its intended purpose is achieved. In this embodiment, when describing embodiments with reference to the drawings, the configuration of the embodiment is not limited to the configuration shown in the drawings. Furthermore, the sizes of the members in each figure are conceptual, and the relative relationships between the sizes of the members are not limited thereto. In this embodiment, each component may contain multiple types of the corresponding substance. In this embodiment, when referring to the amount of each component in the composition, if there are multiple types of the substance corresponding to each component in the composition, unless otherwise specified, it refers to the total amount of those multiple types of substances present in the composition.

[0012] <Siloxane compound film> The siloxane compound film according to this embodiment contains a siloxane compound whose constituent elements are Si, O, C, and H. Furthermore, the siloxane compound film has a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS), and the full width at half maximum of the peak is between 1.80 eV and 4.00 eV.

[0013] The siloxane compound film according to this embodiment is thought to have a well-balanced combination of D units (Si oxidation valence 2) that provide flexibility, T units (Si oxidation valence 3) that provide release properties, and Q units (Si oxidation valence 4) that provide wear resistance. Therefore, the siloxane compound film according to this embodiment is a siloxane compound film that has release properties while achieving both abrasion resistance and flexibility.

[0014] The details of the siloxane compound film according to this embodiment will be described below.

[0015] (X-ray photoelectron spectroscopy (XPS) measurement) The siloxane compound film according to this embodiment has a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS), and the full width at half maximum of the peak is 1.80 eV to 4.00 eV. The peaks in the range of 100 eV to 103 eV are due to Si.

[0016] If the peak full width at half maximum is less than 1.80 eV, the siloxane compound film will have an excessively high proportion of D units, resulting in flexibility but low abrasion resistance, or an excessively high proportion of Q units, resulting in abrasion resistance but low flexibility. For the peak full width at half maximum to exceed 4.00 eV, the valence of the Si oxide must be 1 in units of M, and (R3SiO 1 / 2 ) n It is essential to include a certain amount or more of the units shown (where R = substituent), but if there are too many M units corresponding to the bond ends, the film will be unstable as a solid or mechanically brittle. Therefore, siloxane compound films cannot be formed. Therefore, the full width at half maximum of the peak is within the range described above. The peak full width at half maximum is preferably between 2.00 eV and 3.00 eV.

[0017] One method for setting the peak full width at half maximum within the above range is, for example, to form a film using a siloxane compound containing D units, T units, and Q units within appropriate ranges, as described later.

[0018] The peak full width at half maximum is measured using the JEOL X-ray photoelectron spectrometer "JPS-9030". Specifically, the measurement is performed as follows: In an X-ray photoelectron spectrometer, MgKα rays with a photon energy of 1253.6 eV are generated under the conditions of an acceleration voltage of 10 kV and an emission current of 20 mA, and the siloxane compound film sample to be measured is irradiated with X-rays. A narrow spectrum of Si with peaks in the range of 100 eV to 103 eV is obtained under the conditions of an initial energy of 108.243 [eV], an ending energy of 95.243 [eV], and a step of 0.1 [eV]. Next, the full width at half maximum (FWHM) of the narrow spectrum of Si is calculated using the XPS analysis software SpecSurf, which is included with the JEOL X-ray photoelectron spectrometer "JPS-9030".

[0019] (composition) The siloxane compound film according to this embodiment contains a siloxane compound whose constituent elements are Si, O, C, and H. Specifically, the siloxane compound film (i.e., the siloxane compound) preferably has Si-O bonds and Si-R bonds, for example, from the viewpoint of improving high-temperature release properties. However, R represents a group containing at least one of an alkyl group and a phenyl group. From the viewpoint of improving release properties, it is preferable that R represents a group containing an alkyl group.

[0020] In the siloxane compound film according to this embodiment, the atomic ratio of C to Si (C / Si) is preferably 0.30 or higher, more preferably 0.50 or higher, and even more preferably 1.00 or higher. When the atomic weight ratio (C / Si) is within the above range, release properties, wear resistance, and flexibility are improved. In particular, high-temperature release properties are improved. However, from the viewpoint of mechanical strength and material stability, the atomic ratio of C to Si (C / Si) is preferably 20 or less.

[0021] In the siloxane compound film according to this embodiment, the atomic ratio of O to Si (O / Si) is preferably 0.50 or more and 2.00 or less, more preferably 0.70 or more and 1.80 or less, and even more preferably 0.80 or more and 1.50 or less. When the atomic weight ratio (O / Si) is within the above range, release properties, wear resistance, and flexibility are improved. In particular, high-temperature release properties are improved.

[0022] As a method for achieving the above ranges for atomic weight ratios (C / Si) and (O / Si), one example is to apply a siloxane compound containing D units, T units, and Q units within appropriate ranges, as described later.

[0023] The atomic weight ratios (C / Si) and (O / Si) are measured using the JEOL X-ray photoelectron spectrometer "JPS-9030". Specifically, the measurements are performed as follows: In an X-ray photoelectron spectrometer, MgKα rays with a photon energy of 1253.6 eV are generated under the conditions of an acceleration voltage of 10 kV and an emission current of 20 mA, and the siloxane compound film sample to be measured is irradiated with X-rays. This allows us to obtain a wide spectrum. Next, the area ratios of the spectra of Si, O, and C are determined using the XPS analysis software SpecSurf, which is included with the JEOL X-ray photoelectron spectrometer "JPS-9030". For a sample with known atomic weights of Si, O, and C, the area ratio of the spectra of each of the elements Si, O, and C is similarly determined. Then, from the area ratios of the spectra of these respective elements, the atomic weights (atom%) of Si, O, and C in the sample of the siloxane compound film to be measured are quantified, and the atomic weight ratios (C / Si) and atomic weight ratio (O / Si) are determined.

[0024] The siloxane compound film according to this embodiment may be a film containing a siloxane compound as a main component (for example, a matrix material serving as a binder), or may be a film containing a binder resin and a siloxane compound. The siloxane compound film may contain other additives. Here, a film containing a siloxane compound as a main component (for example, a matrix material serving as a binder) refers to a layer containing only a siloxane compound or a layer having the largest amount of the siloxane compound.

[0025] -Siloxane compound- The siloxane compound preferably has a D unit (valence of Si oxidation: 2) that imparts flexibility, a T unit (valence of Si oxidation: 3) that imparts release properties, and a Q unit (valence of Si oxidation: 4) that imparts wear resistance. Here, the D unit has the formula: (R D1 R D2 SiO 2 / 2 ) nd where the D unit is as represented by this formula. However, in the D unit, R D1 and R D2 are organic groups, nd represents an integer of 2 or more, and among the plurality of R D1 and R D2 present in the D unit, at least one of R D1 and R D2 is a group containing at least one of an alkyl group and an aryl group, respectively. The T unit has the formula: [R T1 SiO 3 / 2 nr where the T unit is as represented by this formula. However, in the T unit, R T1 is an organic group, nt represents an integer of 2 or more, and among the plurality of R T1 present in the T unit, at least one of R​T1 The group is one that includes at least one of an alkyl group and an aryl group. The unit Q is given by the formula:[SiO 4 / 2 ] nq The Q unit is represented by , where nq is an integer greater than or equal to 2.

[0026] In the D and T units, R in the formula D1 , R D2 , and R T1 The organic groups include, for example, hydroxyl groups, siloxy groups, hydrocarbon groups, hydrocarbon groups in which one or more methylene groups are replaced by carbonyl groups, hydrocarbon groups in which one or more carbon atoms are replaced by heteroatoms (oxygen atoms, nitrogen atoms, or sulfur atoms), or groups that combine these.

[0027] R D1 , R D2 , and R T1 Examples of siloxy groups represented by the organic group described include monoalkylsiloxy groups, dialkylsiloxy groups, and trialkylsiloxy groups, with dialkylsiloxy groups and trialkylsiloxy groups being preferred, and trialkylsiloxy groups being more preferred.

[0028] R D1 , R D2 , and R T1 Examples of hydrocarbon groups described using the organic group represented by include aliphatic hydrocarbon groups and aromatic hydrocarbon groups.

[0029] Examples of aliphatic hydrocarbon groups include linear, branched, or alicyclic saturated aliphatic hydrocarbon groups, and linear, branched, or alicyclic unsaturated aliphatic hydrocarbon groups. As the aliphatic hydrocarbon group, a hydrocarbon group having 1 to 20 carbon atoms is preferred, and a hydrocarbon group having 1 to 15 carbon atoms is more preferred. Aliphatic hydrocarbon groups may be substituted with substituents such as halogen atoms, hydroxyl groups, amino groups, or aryl groups.

[0030] Aromatic hydrocarbon groups include hydrocarbon groups having 6 to 18 carbon atoms (preferably 6 to 14 carbon atoms). Examples of aromatic hydrocarbon groups include phenyl groups, naphthyl groups, and anthracenyl groups. Aromatic hydrocarbon groups may be substituted with substituents such as halogen atoms, hydroxyl groups, amino groups, alkyl groups, and alkoxy groups.

[0031] R D1 , R D2 , and R T1 The organic group represented by may have a reactive group. Examples of reactive groups include vinyl, allyl, styryl, maleimide, epoxy, oxetanyl, and (meth)acryloyl groups. In other words, the polysiloxane compound may be a cured particle formed by the reaction of the above reactive groups.

[0032] Multiple R units exist within the T and D units. D1 , R D2 , and R T1 These may be the same organic group or different organic groups. However, each of the multiple R units within the D unit D1 , and R D2 Of these, at least one R D1 , and R D2 Each of these groups is preferably a group containing at least one of an alkyl group and an aryl group. In other words, there are multiple R units within a D unit. D1 Of these, at least one R D1 Each of these groups preferably contains at least one of an alkyl group and an aryl group. Multiple R groups are present in the D unit. D2 Of these, at least one R D2 It is preferable that the group comprises at least one of an alkyl group and an aryl group. Multiple R values ​​exist within the T unit. T1 Of these, at least one R T1 Preferably, the group is one that includes at least one of an alkyl group and an aryl group.

[0033] Here, from the viewpoint of improving release properties, the alkyl group is preferably an alkyl group itself or a siloxy group containing an alkyl group. In other words, at least one of the multiple R groups in structure A is preferably an alkyl group or a siloxy group containing an alkyl group. From the viewpoint of improving release properties, the alkyl group is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and more preferably an alkyl group having 1 carbon atom (i.e., a methyl group).

[0034] The preferred group containing the aryl group is either the aryl group itself or an aralkyl group. Examples of aryl groups include phenyl groups and naphthyl groups. The alkyl group in the aralkyl group may include, for example, an alkyl group having a linear or branched alkyl chain with 1 to 4 carbon atoms. The aryl group in the aralkyl group may include a phenyl group, a naphthyl group, etc. Examples of aralkyl groups include a benzyl group, a 1-phenylethyl group, a 2-phenylethyl group, a 2-methyl-2-phenylethyl group, etc. From the viewpoint of improving release properties, a phenyl group is preferred as the group containing the aryl group.

[0035] From the viewpoint of improving release properties, the proportion of groups containing at least one alkyl group and an aryl group is preferably 10 mol% to 50 mol% and more preferably 25 mol% to 50 mol% relative to the polysiloxane compound. The relative abundance of groups containing at least one alkyl group and an aryl group can be measured by liquid NMR (liquid nuclear magnetic resonance) or solid-state NMR (solid-state nuclear magnetic resonance).

[0036] In the D, T, and Q units, nd, nt, and nq in the formulas represent integers of 2 or greater. In the D, T, and Q units, nd / nt is preferably 0.1 or more and 10 or less, and more preferably 0.25 or more and 4.0 or less. nq / nt is preferably between 0.010 and 2.0, and more preferably between 0.012 and 1.0. When nd, nt, and nq are within the above ratio range, the full width at half maximum of the peak is controlled within the above range, making it easier to improve release properties, wear resistance, and flexibility.

[0037] The siloxane compound content is preferably 50% to 100% by volume relative to the surface layer, more preferably 75% to 100% by volume, and even more preferably 90% to 100% by volume.

[0038] Siloxane compounds can be exemplified by high-molecular-weight compounds called silsesquioxanes (SQ), which can take on various skeletal structures. The polysiloxane compound may have any of the following skeletal structures: a cage structure (complete cage structure or cage structure), a ladder structure, or a random structure.

[0039] -Binding material- Examples of binders include polyamide resin, polyurethane resin, polyvinylidene fluoride resin, tetrafluoroethylene copolymer resin, polyester resin, polyimide resin, silicone resin, acrylic resin, polyvinyl butyral resin, ethylene tetrafluoroethylene copolymer resin, melamine resin, fluororubber, epoxy resin, polycarbonate resin, polyvinyl alcohol resin, cellulose resin, polyvinylidene chloride resin, polyvinyl chloride resin, polyethylene resin, and ethylene vinyl acetate copolymer resin. In particular, urethane resin is preferred as the binder. The urethane resin may be acrylic urethane resin, polyester polyurethane resin, polyether polyurethane resin, etc. Among these, silicone-modified urethane resin is preferred, and silicone-modified acrylic urethane resin is preferred.

[0040] The amount of binder shall be the amount that constitutes the main component of the siloxane compound film. Here, the amount that constitutes the main component of the siloxane compound film means the amount of the most abundant component among the components contained in the siloxane compound film, excluding the siloxane compound itself.

[0041] (Other additives) Siloxane compound films may contain other additives. Examples of additives include conductive agents, fillers, softeners (paraffin-based, etc.), processing aids (stearic acid, etc.), and antioxidants (amine-based, etc.).

[0042] The thickness of the siloxane compound film is preferably 10 μm to 100 μm, and more preferably 20 μm to 50 μm.

[0043] <Method for producing siloxane compound films> One example of a method for producing a siloxane compound film according to this embodiment is a method of forming it by plasma CVD (Plasma Enhanced Chemical Vapor Deposition) using a raw material siloxane compound. In plasma CVD, DC or AC power can be used as an excitation means for activating and decomposing the raw material siloxane compound. As AC power, microwaves, radio waves, etc., can be used. By adjusting the output of DC power, AC power, or the frequency of AC power, the excited state and reaction atmosphere can be controlled, thereby controlling the composition or bonding state of the resulting siloxane compound film. In other words, a siloxane compound film satisfying the above peak characteristics, atomic weight ratio (C / Si), and atomic weight ratio (O / Si) can be obtained depending on the output of DC power, AC power, or the frequency of AC power.

[0044] Examples of raw material siloxane compounds include alkyldisiloxanes (such as hexamethyldisiloxane) and alkylcyclosiloxanes (such as octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, and dodecamethylcyclohexasiloxane), which are "siloxane compounds consisting of siloxane bonds and organic groups." From the viewpoint of improving release properties by introducing alkyl groups (especially methyl groups) into the resulting siloxane compound film, compounds having alkyl groups (especially methyl groups), such as the compounds exemplified above, are preferred as the raw material siloxane compound. By exciting, decomposing, and reacting raw material siloxane compounds under a plasma atmosphere, a target siloxane compound film can be formed.

[0045] Other supply gases besides the raw material siloxane compounds include inert gases (argon gas, helium gas, etc.), H2 gas, N2 gas, O2 gas, and lower hydrocarbon gases (CH4 gas, C2H2 gas, C6H6 gas, etc.). By supplying an inert gas (such as argon or helium) together with the raw material siloxane compound, the excited state and reaction atmosphere can be controlled, thereby controlling the composition or bonding state of the resulting film. By supplying H2 gas, N2 gas, O2 gas, and lower hydrocarbon gases (such as CH4 gas, C2H2 gas, and C6H6 gas) together with the raw material siloxane compound, the excited state and reaction atmosphere can be controlled, and the elements of these gases can be incorporated into the film, thereby controlling the composition or bonding state of the resulting siloxane compound film. In other words, by adjusting the type or amount of supplied gas, a siloxane compound film satisfying the above peak characteristics, the above atomic ratio (C / Si), and the above atomic ratio (O / Si) can be obtained.

[0046] The method for producing a siloxane compound film according to this embodiment will be described below with specific examples, showing an example of a film deposition apparatus utilizing plasma CVD in the drawings. The following description shows a method in which a siloxane compound film is deposited directly onto a substrate, but it is not limited to this. For example, instead of a substrate, a siloxane compound film may be deposited onto a layered substrate, such as one with an elastic layer.

[0047] Figure 1 is a schematic diagram showing an example of a film deposition apparatus used for forming a siloxane compound film according to this embodiment. Figure 1(A) shows a schematic cross-sectional view of the film deposition apparatus viewed from the side. Figure 1(B) shows a schematic cross-sectional view between A1 and A2 of the film deposition apparatus shown in Figure 1(A). In Figure 1, 210 is the film deposition chamber, 211 is the exhaust port, 212 is the substrate rotation section, 213 is the substrate support member, 214 is the substrate, 215 is the gas introduction pipe, 216 is the shower nozzle having an opening for spraying the gas introduced from the gas introduction pipe 215, 217 is the plasma diffusion section, 218 is the high-frequency power supply section, 219 is the flat plate electrode, 220 is the gas introduction pipe, and 221 is the high-frequency discharge tube section.

[0048] In the film deposition apparatus shown in Figure 1, an exhaust port 211 connected to a vacuum exhaust device (not shown) is provided at one end of the film deposition chamber 210. On the side of the film deposition chamber 210 opposite to the side with the exhaust port 211, a plasma generator consisting of a high-frequency power supply unit 218, a flat plate electrode 219, and a high-frequency discharge tube unit 221 is provided. In the plasma generator, the high-frequency power supply unit 218 is connected to the side of the flat electrode 219 opposite to the discharge surface, outside the high-frequency discharge tube section 221. The flat electrode 219 is positioned inside the high-frequency discharge tube section 221 with its discharge surface facing the exhaust port 211. Furthermore, a gas inlet pipe 220 for supplying gas into the high-frequency discharge tube section 221 is connected to the high-frequency discharge tube section 221. The other end of this gas inlet pipe 220 is connected to a first gas supply source (not shown).

[0049] A rod-shaped shower nozzle 216 extending along the discharge surface is connected to the discharge surface side of the flat electrode 219, and one end of the shower nozzle 216 is connected to a gas introduction pipe 215. The gas introduction pipe 215 is connected to a second gas supply source (not shown) located outside the film deposition chamber 210.

[0050] A substrate rotating section 212 is provided inside the film deposition chamber 210. The cylindrical substrate 214 is attached to the substrate rotating section 212 via a substrate support member 213 so that the longitudinal direction of the shower nozzle 216 and the axial direction of the substrate 214 face each other along the same axis. During film formation, the substrate 214 rotates in the circumferential direction as the substrate rotating part 212 rotates.

[0051] The formation of the siloxane compound film can be carried out, for example, as follows: First, a supply gas other than the raw material siloxane compound (inert gas, H2 gas, N2 gas, O2 gas, lower hydrocarbon gas) is introduced into the high-frequency discharge tube section 221 from the gas introduction pipe 220, and radio waves as AC power are supplied to the flat electrode 219 from the high-frequency power supply section 218. At this time, a plasma diffusion section 217 is formed so as to spread radially from the discharge surface side of the flat electrode 219 to the exhaust port 211 side. Here, the supply gas introduced from the gas introduction pipe 220 flows through the film deposition chamber 210 from the flat electrode 219 side to the exhaust port 211 side. The flat electrode 219 may also be surrounded by an earth shield.

[0052] Next, the raw material siloxane compound is introduced into the deposition chamber 210 via the gas introduction pipe 215 and the shower nozzle 216 located downstream of the plate electrode 219, which is an activation device. This allows the desired siloxane compound film to be deposited on the surface of the substrate 214.

[0053] Since the substrate 214 (or the layer provided on the substrate 214) may be damaged by heat, it is preferable to control the surface temperature of the substrate 214 taking this effect into consideration. The surface temperature of the substrate 214 may be controlled by at least one of a heating device and a cooling device (not shown in the figure), or it may be left to the natural rise in temperature during discharge. When heating the base material 214, the heater may be installed on the outside or inside of the base material 214. When cooling the base material 214, a cooling gas or liquid may be circulated inside the base material 214. To avoid a temperature rise on the substrate 214 surface due to electrical discharge, it is effective to adjust the high-energy gas flow hitting the substrate 214 surface. In this case, conditions such as gas flow rate, discharge output, and pressure are adjusted to achieve the desired temperature.

[0054] The plasma generator in the film deposition apparatus shown in Figure 1 uses a high-frequency oscillator, but is not limited to this. For example, a microwave oscillator may be used, or an electrocyclotron resonance or helicon plasma system may be used. In the case of a high-frequency oscillator, it may be either an inductive or capacitive type. Furthermore, two or more types of these devices may be used in combination, or two or more devices of the same type may be used. A high-frequency oscillator is preferred to suppress the temperature rise of the substrate 214 surface due to plasma irradiation, but a device to suppress heat irradiation may also be provided.

[0055] When using two or more different plasma generators, it is preferable to ensure that discharges occur simultaneously at the same pressure. Alternatively, a pressure difference may be provided between the discharge region and the film-forming region (the area where the substrate 214 is placed). These devices may be arranged in series with respect to the gas flow formed within the film-forming apparatus from the gas introduction section to the gas discharge section, or each device may be arranged facing the film-forming surface of the substrate.

[0056] For example, when performing plasma CVD using high-frequency discharge, the following conditions are preferred for forming a siloxane compound film that satisfies the above peak characteristics, atomic ratio (C / Si), and atomic ratio (O / Si). • The surface temperature of the substrate 214 during film formation is between 10°C and 300°C. • Reaction pressure in deposition chamber 210: 1 Pa to 110,000 Pa • Radio wave frequency as AC power: 100kHz to 10GHz • Radio wave output as AC power: 10W to 5000W • Rotational speed of base material 214: 0.1 rpm to 100 rpm

[0057] Furthermore, the method for producing a siloxane compound film according to this embodiment is not limited to a film deposition method utilizing plasma CVD. For example, one method for producing a siloxane compound film according to this embodiment is to bake a coating film of a mixture of a silicone material (such as dimethylsiloxane or silsesquioxane) and silica particles. Examples of commercially available silicone materials that can be used include Dow's "DOWSIL series."

[0058] <Components> The component according to this embodiment is a component having a base material and a surface layer provided on the base material and composed of a siloxane compound film according to this embodiment. The surface layer, composed of the siloxane compound film according to the above embodiment, is the outermost layer of the component.

[0059] The component according to this embodiment may include layers other than the substrate and the siloxane compound film (for example, an elastic layer provided between the substrate and the siloxane compound film). The member according to this embodiment may be cylindrical or in the shape of an endless belt.

[0060] (base material) Examples of base materials include cylindrical base materials composed of metals (aluminum, stainless steel, iron, copper, etc.), alloys, ceramics, FRM (fiber-reinforced metal), etc. The outer diameter and wall thickness of the cylindrical base material should, for example, be between 10 mm and 50 mm in outer diameter. In the case of an aluminum cylindrical base material, the thickness should be, for example, between 0.5 mm and 4 mm, and in the case of a SUS (stainless steel) or iron cylindrical base material, the thickness should be, for example, between 0.1 mm and 2 mm.

[0061] Examples of base materials include metal belts and resin belts. Examples of metal belts include those made of nickel, aluminum, and stainless steel.

[0062] Examples of resin belts include heat-resistant resin belts made of polyimide, polyamide-imide, polyphenylene sulfide, polyetheretherketone, and polybenzimidazole. Furthermore, the volume resistivity of the resin belt may be controlled by adding and dispersing conductive powder or the like. Specifically, examples of resin belts include polyimide resin belts to which carbon black is added and dispersed. Another example of a resin belt is one in which both ends of a long polyimide sheet are assembled in a puzzle-like manner and heat-sealed together using a heat-sealing member to form a belt.

[0063] Here, it is preferable to use a metal substrate (i.e., the above-mentioned metal substrate and metal belt, etc.) as the substrate. Even with a metal substrate, if a siloxane compound film is directly formed on the metal substrate by plasma CVD, the adhesion between the metal substrate and the siloxane compound film will be improved.

[0064] The thickness of the belt base material is preferably, for example, 20 μm to 200 μm, more preferably 30 μm to 150 μm, and even more preferably 40 μm to 130 μm.

[0065] A metal layer may be provided on the substrate as needed. If a metal layer is provided, the metal layer may be formed as a single layer or as multiple layers. A single-layer metal layer may be an electromagnetic induction metal layer that self-heats due to electromagnetic induction. A multiple-layer metal layer may, for example, be formed as a three-layer structure consisting of a base metal layer, an electromagnetic induction metal layer, and a metal protective layer.

[0066] Furthermore, an adhesive may be applied to the surface of the substrate. In other words, the adhesive may be used as needed, and the substrate (or the metal layer on the substrate) and the elastic layer or surface layer may be laminated via the adhesive. The adhesive is not particularly limited, but examples include adhesive compounds having hydrogen-bonded silyl groups (-SiH) to which hydrogen atoms are bonded.

[0067] [Elastic layer] The elastic layer is preferably a layer that returns to its original shape even when deformed by an external force of 100 Pa.

[0068] Examples of elastic materials that constitute the elastic layer include isoprene rubber, chloroprene rubber, epichlorohydrin rubber, butyl rubber, polyurethane, silicone rubber, fluororubber, styrene-butadiene rubber, butadiene rubber, nitrile rubber, ethylene propylene rubber, epichlorohydrin-ethylene oxide copolymer rubber, epichlorohydrin-ethylene oxide-allyl glycidyl ether copolymer rubber, ethylene-propylene-diene terpolymer rubber (EPDM), acrylonitrile-butadiene copolymer rubber (NBR), natural rubber, and blends thereof. Among these, silicone rubber is more preferable as an elastic material from the viewpoint of heat resistance, thermal conductivity, and insulation properties.

[0069] Examples of silicone rubber include RTV silicone rubber, HTV silicone rubber, and liquid silicone rubber. Specifically, examples include polydimethyl silicone rubber (MQ), methyl vinyl silicone rubber (VMQ), methylphenyl silicone rubber (PMQ), and fluorosilicone rubber (FVMQ).

[0070] As for the silicone rubber, those with an addition reaction type as the crosslinking mechanism are preferred. Furthermore, various types of functional groups are known for silicone rubber, and dimethyl silicone rubber having methyl groups, methylphenyl silicone rubber having methyl and phenyl groups, and vinyl silicone rubber having vinyl groups (vinyl group-containing silicone rubber) are preferred. Furthermore, as the silicone rubber, vinyl silicone rubber having vinyl groups is more preferred, and silicone rubber having an organopolysiloxane structure having vinyl groups and a hydrogen organopolysiloxane structure having hydrogen atoms (SiH) bonded to silicon atoms is even more preferred.

[0071] The elastic layer may be a foamed elastic layer or a non-foamed elastic layer.

[0072] The elastic layer may contain other additives. Examples of other additives include fillers, softeners (paraffin-based, etc.), processing aids (stearic acid, etc.), antioxidants (amine-based, etc.), and vulcanizing agents (sulfur, metal oxides, peroxides, etc.).

[0073] The thickness of the elastic layer is preferably, for example, 30 μm or more and 600 μm or less, and more preferably 100 μm or more and 500 μm or less.

[0074] (Uses of the components) Examples of components according to this embodiment include transfer members, fixing members, recording medium transport members, and the like, for use in electrophotography. Transfer members include intermediate transfer members, primary transfer members, and secondary transfer members. Fixing members include heating members, pressurizing members, etc. The heating member may be either a heating belt heated by electromagnetic induction or a heating member heated by an external heat source. However, when applying the component according to this embodiment to a heating component that is heated by electromagnetic induction, it is preferable to provide a metal layer (heating layer) that generates heat by electromagnetic induction. Other components according to this embodiment include cooking utensils such as frying pans. In this case, the base material is the main body of the "cooking utensil such as a frying pan" which is the target for forming the siloxane compound film according to this embodiment as the surface layer. In other words, an example of the application of the siloxane compound film according to this embodiment is as a surface layer for the above-described example of a component.

[0075] <Fusing device> The fixing device according to this embodiment comprises a first rotating body and a second rotating body arranged in contact with the outer surface of the first rotating body, wherein at least one of the first rotating body and the second rotating body is made of the member according to this embodiment.

[0076] Below, we will describe a fixing device according to this embodiment that includes a heating roll (an example of a first rotating body) and a pressure belt (an example of a second rotating body). The fixing device according to this embodiment is not limited to this embodiment and may be a fixing device comprising a heating roll and a pressure belt, a fixing device comprising a heating belt and a pressure roll, or a fixing device comprising a heating belt and a pressure belt. Furthermore, in the fixing device according to this embodiment, the fixing member according to this embodiment may be applied to any of the pressure roll, heating belt, pressure roll, and pressure belt. Furthermore, the fixing device according to this embodiment can be a well-known fixing device, such as an electromagnetic induction heating method.

[0077] Figure 2 is a schematic diagram showing an example of a fixing device according to this embodiment. The fixing device 60 shown in Figure 2 comprises a heating roll 62 (an example of a heating member) and a pressure roll 63 (an example of a pressure member). A heating source 66 for heating the heating roll 62 is provided inside the heating roll 62.

[0078] In the fixing device 60, the heating roll 62 and the pressure roll 63 are arranged to rotate freely. The heating roll 62 is connected to a drive source (e.g., a motor, etc.) not shown via a power transmission member (gear, etc.) not shown. The power generated by the drive source (e.g., a motor, etc.) is transmitted to the heating roll 62 by the power transmission member (gear, etc.). As a result, the heating roll 62 is driven to rotate in the direction of arrow C. The pressure roll 63 is positioned by being pressed against the heating roll 62 by a spring or the like (not shown). The pressure roll 63 rotates in conjunction with the rotational drive of the heating roll.

[0079] In the fixing device 60, the paper (an example of a recording medium) P on which the unfixed toner image has been transferred enters the contact area between the heating roll 62 and the pressure roll 63, which are heated by the heating source 66, via a transport mechanism (not shown). As the paper P is transported in the direction of arrow D, the toner image transferred to the paper P is heated and pressurized at the contact point between the heating roll 62 and the pressure roll 63. This fixes the toner image to the paper P.

[0080] <Image forming apparatus> Next, the image forming apparatus according to this embodiment will be described. The image forming apparatus according to this embodiment is The system comprises an image holder, a charging device for charging the surface of the image holder, an electrostatic latent image forming device for forming an electrostatic latent image on the charged surface of the image holder, a developing device containing a developer including toner and using the developer to develop the electrostatic latent image formed on the surface of the image holder to form a toner image, a transfer device for transferring the toner image to the surface of a recording medium, and a fixing device for fixing the toner image to the surface of a recording medium. The fixing device according to this embodiment is then applied as the fixing device.

[0081] In this embodiment, the fixing device may be a cartridge that can be attached to and detached from the image forming apparatus. In other words, the image forming apparatus according to this embodiment may include the fixing device according to this embodiment as a component of the process cartridge.

[0082] The image forming apparatus according to this embodiment will be described below with reference to the drawings. Figure 3 is a schematic diagram showing the configuration of the image forming apparatus according to this embodiment.

[0083] As shown in Figure 3, the image forming apparatus 100 according to this embodiment is, for example, an intermediate transfer type image forming apparatus generally known as a tandem type. The image forming apparatus 100 comprises a plurality of image forming units 1Y, 1M, 1C, and 1K, an intermediate transfer belt 15, a primary transfer section 10, a secondary transfer section 20, and a fixing device 60. The image forming apparatus 100 also has a control unit 40 that controls the operation of each device (or section). Here, image forming units 1Y, 1M, 1C, and 1K are image forming units that form toner images of each color component using an electrophotographic method. The primary transfer unit 10 is a transfer unit that sequentially transfers (primary transfer) the toner images of each color component formed by the image forming units 1Y, 1M, 1C, and 1K to the intermediate transfer belt 15. The secondary transfer unit 20 is a transfer unit that transfers the superimposed toner image transferred onto the intermediate transfer belt 15 to the recording medium, paper K, in one go (secondary transfer). The fixing device 60 is a device that fixes the secondary transferred image onto the paper K.

[0084] Each image forming unit 1Y, 1M, 1C, and 1K of the image forming apparatus 100 is equipped with a photoreceptor 11 that rotates in the direction of arrow A, as an example of an image holder that holds the toner image formed on its surface.

[0085] Around the photoreceptor 11, a charger 12 is provided as an example of a charging device to charge the photoreceptor 11. Around the photoreceptor 11, a laser exposure unit 13 (indicated by the symbol Bm in the figure) is provided as an example of an electrostatic latent image forming device to write an electrostatic latent image onto the photoreceptor 11.

[0086] Surrounding the photoreceptor 11, a developer unit 14 is provided, as an example of a developing device. This unit contains toners for each color component and visualizes the electrostatic latent image on the photoreceptor 11 using the toners. A primary transfer roll 16 is provided around the photoreceptor 11, which transfers the toner images of each color component formed on the photoreceptor 11 to the intermediate transfer belt 15 via the primary transfer unit 10.

[0087] A photoreceptor cleaner 17 is provided around the photoreceptor 11 to remove any residual toner on the photoreceptor 11. Around the photoreceptor 11, electrophotographic devices such as a charger 12, a laser exposure unit 13, a developer unit 14, a primary transfer roll 16, and a photoreceptor cleaner 17 are sequentially arranged along the rotational direction of the photoreceptor 11. These image forming units 1Y, 1M, 1C, and 1K are arranged in a nearly linear fashion from the upstream side of the intermediate transfer belt 15, in the order of yellow (Y), magenta (M), cyan (C), and black (K).

[0088] The intermediate transfer belt 15 is driven (rotated) by various rolls in the direction of arrow B shown in Figure 2 at a speed appropriate for the purpose. The various rolls include a drive roll 31, a support roll 32, a tensioning roll 33, a back roll 25, and a cleaning back roll 34. The drive roll 31 is a roll that rotates the intermediate transfer belt 15, driven by a motor (not shown) with excellent constant-speed performance. The support roll 32 is a roll that supports the intermediate transfer belt 15, which extends substantially in a straight line along the arrangement direction of each photoreceptor 11. The tension-applying roll 33 is a roll provided in the secondary transfer section 20 that applies tension to the intermediate transfer belt 15 and functions as a corrective roll to prevent the intermediate transfer belt 15 from meandering. The cleaning back roll 34 is a roll provided in the cleaning section that scrapes off residual toner from the intermediate transfer belt 15.

[0089] The primary transfer section 10 consists of a primary transfer roll 16 positioned opposite the photoreceptor 11, with an intermediate transfer belt 15 in between.

[0090] The primary transfer roll 16 is then pressed against the photoreceptor 11 with the intermediate transfer belt 15 in between, and a voltage (primary transfer bias) with the opposite polarity to the charge polarity of the toner (negative polarity; the same applies hereafter) is applied to the primary transfer roll 16. As a result, the toner images on each photoreceptor 11 are sequentially electrostatically attracted to the intermediate transfer belt 15, and superimposed toner images are formed on the intermediate transfer belt 15.

[0091] The secondary transfer section 20 comprises a back roll 25 and a secondary transfer roll 22 positioned on the toner image holding surface side of the intermediate transfer belt 15.

[0092] The secondary transfer roll 22 is then pressed against the back roll 25 with the intermediate transfer belt 15 in between, and the secondary transfer roll 22 is grounded to form a secondary transfer bias between itself and the back roll 25, thereby secondary transferring the toner image onto the paper K that is transported to the secondary transfer section 20.

[0093] Furthermore, an intermediate transfer belt cleaner 35 is provided downstream of the secondary transfer section 20 of the intermediate transfer belt 15 so as to be able to move toward and away from the intermediate transfer belt 15. The intermediate transfer belt cleaner 35 is a cleaner that removes residual toner and paper dust from the intermediate transfer belt 15 after secondary transfer, and cleans the surface of the intermediate transfer belt 15.

[0094] The intermediate transfer belt 15, the primary transfer section 10 (primary transfer roll 16), and the secondary transfer section 20 (secondary transfer roll 22) are examples of a transfer apparatus.

[0095] On the other hand, a reference sensor (home position sensor) 42 is installed upstream of the yellow image forming unit 1Y. The reference sensor 42 is a sensor that generates a reference signal that serves as a reference for determining the image formation timing in each image forming unit 1Y, 1M, 1C, and 1K. The reference sensor 42 recognizes a mark provided on the back of the intermediate transfer belt 15 and generates a reference signal. Based on the recognition of this reference signal, the control unit 40 issues instructions, and each image forming unit 1Y, 1M, 1C, and 1K is configured to start image formation. A black image forming unit 1K is located downstream of an image density sensor 43 for adjusting image quality.

[0096] The image forming apparatus 100 includes a paper storage section 50, a paper feed roll 51, a transport roll 52, a transport guide 53, a transport belt 55, and a fuser entrance guide 56. The paper storage section 50 is a storage section for storing paper K, which is a transport device for transporting paper K. The paper feed roll 51 is a roll that takes out and transports the paper K accumulated in the paper storage section 50 at predetermined timings. The transport roll 52 is a roll that transports the paper K that has been fed out by the paper feed roll 51. The transport guide 53 is a guide that feeds the paper K, which has been transported by the transport roll 52, to the secondary transfer section 20. The conveyor belt 55 is a belt that conveys the paper K, which has been secondarily transferred by the secondary transfer roll 22, to the fixing device 60. The fuser entrance guide 56 is a guide that leads the paper K to the fuser unit 60.

[0097] Next, the basic image formation process of the image forming apparatus 100 according to this embodiment will be described. In the image forming apparatus 100 according to this embodiment, image data output from an image reading device (not shown) or a personal computer (PC) (not shown) is processed by an image processing device (not shown), and then image formation is performed by image forming units 1Y, 1M, 1C, and 1K.

[0098] The image processing device performs various image processing operations on the input image data, including shading correction, positional shift correction, brightness / color space conversion, gamma correction, frame removal, color editing, and movement editing. The processed image data is converted into four-color gradation data (yellow (Y), magenta (M), cyan (C), and black (K)) and output to the laser exposure unit 13.

[0099] In the laser exposure unit 13, according to the input color tone data, an exposure beam Bm emitted from, for example, a semiconductor laser is irradiated onto each of the photoreceptors 11 of the image forming units 1Y, 1M, 1C, and 1K. After the surface of each photoreceptor 11 of the image forming units 1Y, 1M, 1C, and 1K is charged by the charger 12, the surface is scanned and exposed by the laser exposure unit 13, and an electrostatic latent image is formed. The formed electrostatic latent image is then developed into toner images of yellow (Y), magenta (M), cyan (C), and black (K) by each of the image forming units 1Y, 1M, 1C, and 1K.

[0100] The toner images formed on the photoreceptors 11 of the image forming units 1Y, 1M, 1C, and 1K are transferred onto the intermediate transfer belt 15 in the primary transfer section 10, where each photoreceptor 11 comes into contact with the intermediate transfer belt 15. More specifically, in the primary transfer section 10, a primary transfer roll 16 applies a voltage (primary transfer bias) with the opposite polarity to the toner's charge polarity (negative polarity) to the substrate of the intermediate transfer belt 15, and the toner images are sequentially superimposed on the surface of the intermediate transfer belt 15 to perform primary transfer.

[0101] After the toner image is sequentially transferred to the surface of the intermediate transfer belt 15, the intermediate transfer belt 15 moves and the toner image is transported to the secondary transfer section 20. When the toner image is transported to the secondary transfer section 20, the transport device rotates the paper feed roll 51 in time with the transport of the toner image to the secondary transfer section 20, and paper K of the desired size is supplied from the paper storage section 50. The paper K supplied by the paper feed roll 51 is transported by the transport roll 52 and reaches the secondary transfer section 20 via the transport guide 53. Before reaching the secondary transfer section 20, the paper K is temporarily stopped, and the position of the paper K and the position of the toner image are aligned by rotating the alignment roll (not shown) in time with the movement of the intermediate transfer belt 15 holding the toner image.

[0102] In the secondary transfer section 20, the secondary transfer roll 22 is pressed against the back roll 25 via the intermediate transfer belt 15. At this time, the paper K, which has been transported in sync with the timing, is sandwiched between the intermediate transfer belt 15 and the secondary transfer roll 22. When a voltage (secondary transfer bias) with the same polarity as the charge polarity (negative polarity) of the toner is applied from the power supply roll 26, a transfer electric field is formed between the secondary transfer roll 22 and the back roll 25. Then, the unfixed toner image held on the intermediate transfer belt 15 is electrostatically transferred all at once onto the paper K in the secondary transfer section 20, which is pressed by the secondary transfer roll 22 and the back roll 25.

[0103] Subsequently, the paper K on which the toner image has been electrostatically transferred is peeled off the intermediate transfer belt 15 by the secondary transfer roll 22 and transported as is. The paper K is transported to a transport belt 55 located downstream of the secondary transfer roll 22 in the paper transport direction. The transport belt 55 transports the paper K to the fuser 60 at an optimal transport speed for the fuser 60. The unfixed toner image on the paper K transported to the fuser 60 is fixed to the paper K by the fuser 60 through a fixing process using heat and pressure. The paper K with the fixed image formed is then transported to a paper discharge and storage section (not shown) located in the discharge section of the image forming apparatus 100.

[0104] Meanwhile, after the transfer to paper K is complete, any residual toner remaining on the intermediate transfer belt 15 is transported to the cleaning section as the intermediate transfer belt 15 rotates. The residual toner is removed from the intermediate transfer belt 15 by the cleaning back roll 34 and the intermediate transfer belt cleaner 35.

[0105] Although this embodiment has been described above, it is not intended to be interpreted as being limited to the above embodiment, and various modifications, changes, and improvements are possible. [Examples]

[0106] The embodiment will be described in more detail below with reference to examples, but this embodiment is not limited to the following examples. In the following, "part" refers to "mass parts" unless otherwise specified.

[0107] <Example 1> -Making the heating roll- First, a cylindrical aluminum base material with an outer diameter of 102 mm, a length of 380 mm, and a thickness of 10 mm was prepared. Next, a surface layer consisting of a siloxane compound film was formed. The siloxane compound film was formed using a film deposition apparatus having the configuration shown in Figure 1.

[0108] First, a cylindrical aluminum substrate is placed on the base support member 213 inside the deposition chamber 210 of the deposition apparatus, and a pressure of 1 × 10⁻¹⁰ is released inside the deposition chamber 210 through the exhaust port 211. -2 The system was evacuated to a vacuum of Pa. Next, helium gas (flow rate 100 sccm) is introduced from the gas introduction tube 220 through a mass flow controller (not shown) into the high-frequency discharge tube section 221, which is equipped with a flat plate electrode 219 with a diameter of 85 mm. Next, hexamethyldisiloxane (HMDSO) (flow rate 100 sccm) was introduced into the plasma diffusion section 217 in the deposition chamber 210 via a shower nozzle 216 through a gas introduction pipe 215 via a mass flow controller (not shown). At this time, the reaction pressure in the deposition chamber 210, as measured by a Balatron vacuum gauge, was adjusted to 10 Pa using a conductance valve (not shown). The high-frequency power supply unit 218 and the matching circuit (not shown in Figure 1) were used to set the output of a 13.56 MHz radio wave as AC power to 500 W, and the tuner was used for matching before discharge was performed from the flat plate electrode 219. The reflected wave at this time was 0 W. In this state, the substrate was rotated at a speed of 20 rpm while the film was deposited, forming a 20 μm thick surface layer consisting of a siloxane compound film on the surface of the substrate.

[0109] - Fabrication of pressure rolls - First, a cylindrical aluminum base material with an outer diameter of 102 mm, a length of 380 mm, and a thickness of 10 mm was prepared. Next, a 2mm thick elastic layer made of Ricorn rubber (product name SE6920-A / B, manufactured by Toray Dow Corning) was formed on the surface of the substrate. Next, using a film deposition apparatus having the same configuration as shown in Figure 1 as used for the fabrication of the heated roll, a 20 μm thick surface layer made of a siloxane compound film was formed on the surface of the substrate with the elastic layer.

[0110] Through the above operations, a heated roll and a pressurized roll were obtained.

[0111] <Example 2> In forming the surface layers of the heating roll and pressure roll in Example 1, the surface layers were formed in the same manner as in Example 1, except that the following items were changed. • Changed the output of radio waves as AC power to 1000[W].

[0112] <Example 3> In forming the surface layers of the heating roll and pressure roll in Example 1, the surface layers were formed in the same manner as in Example 1, except that the following items were changed. • Changed the output of radio waves as AC power to 750[W].

[0113] <Example 4> In forming the surface layers of the heating roll and pressure roll in Example 1, the surface layers were formed in the same manner as in Example 1, except that the following items were changed. Oxygen gas (flow rate 5 sccm) is introduced along with helium gas from the gas introduction pipe 220 to the high-frequency discharge tube section 221. • Changed the output of radio waves as AC power to 300[W].

[0114] <Example 5> 90 parts by mass of silicone material (DOWSIL MS-4002 Moldable Silicone Part A / B) was mixed with 10 parts by mass of silica particles (AEROSIL RX50). The mixture was stirred with a magnetic stirrer for 10 hours to obtain a coating solution. In forming the surface layers of the heating roll and pressure roll in Example 1, the above coating solution was applied to the substrate or the substrate with an elastic layer using a blade coat. The coating film was baked at 115°C for 20 minutes, and then baked again at 230°C for 60 minutes to form a surface layer with a thickness of 20 μm.

[0115] <Example 6> In forming the surface layers of the heating roll and pressure roll in Example 1, the surface layers were formed in the same manner as in Example 1, except that the following items were changed. Oxygen gas (flow rate 20 sccm) is introduced into the high-frequency discharge tube section 221 from the gas introduction pipe 220 along with helium gas. • Changed the output of radio waves as AC power to 500 [W].

[0116] <Comparative Example 1> A silicone material (Dow's "DOWSIL MS-4002 Moldable Silicone Part A / B") was used as the coating solution. In forming the surface layers of the heating roll and pressure roll in Example 1, the above coating solution was applied to the substrate or the substrate with an elastic layer using a blade coat. The coating film was baked at 115°C for 20 minutes, and then baked again at 230°C for 60 minutes to form a surface layer with a thickness of 20 μm.

[0117] <Comparative Example 2> A silicone material (Shin-Etsu Chemical Co., Ltd.'s "Silicone KR-242A") was used as the coating solution. In forming the surface layers of the heating roll and pressure roll in Example 1, the above coating solution was applied to the substrate or the substrate with an elastic layer using a blade coat. The coating film was baked at 200°C for 60 minutes to form a surface layer with a thickness of 20 μm.

[0118] <Characteristic Evaluation> The following characteristics of the components in each example were measured using the method described above. • Peak positions of spectra measured by X-ray photoelectron spectroscopy (XPS) in siloxane compound films. • Peak width at half maximum • Atomic ratio of C to Si in siloxane compound films (C / Si)

[0119] <Actual device evaluation> For use as the heating and pressure rolls in the fixing device, the heating and pressure rolls from each example were mounted on an evaluation image forming apparatus (DocuCentre III 7000, manufactured by Fujifilm Business Innovation Co., Ltd.). Then, the following evaluations were performed using an evaluation image forming apparatus.

[0120] (Mold releasability) Using an evaluation image forming apparatus, 100 images were printed on A3 paper, each with a patch having an average image density of 100% placed at the leading edge of the paper. The images formed on the last three printed A4 sheets were observed. The occurrence of image defects caused by offset due to toner image adhesion to the heating roll was then evaluated according to the following evaluation criteria. The evaluation criteria are as follows: A+: No offset is observed at all. A: The offset does not affect image quality, although this is rarely observed. B: There is some offset, but it doesn't affect the image quality. C: An offset is visible, which is a concern regarding image quality. D: The image cannot be recognized due to the offset.

[0121] (Abrasion resistance) Using an evaluation image forming apparatus, 10,000 images with an average image density of 10% were printed on A4 paper. Then, the film thickness of the surface layer of the heating roll was measured before and after 10,000 prints, and the amount of wear was calculated. The following evaluation criteria were then used for evaluation. A: The reduction in film thickness of the surface layer of the heated roll was 0.1 μm or less. B: The reduction in film thickness of the surface layer of the heated roll was greater than 0.1 μm and less than or equal to 1.0 μm. C: The reduction in film thickness of the surface layer of the heated roll exceeded 1.0 μm. D: The surface layer of the heating roll was partially worn away due to abrasion.

[0122] (Flexibility) Using an evaluation image forming apparatus, 10,000 images with an average image density of 10% were printed on A4 paper. Then, after printing 10,000 sheets, the surface layer of the pressure roll was evaluated for the presence or absence of cracks and delamination of the surface layer associated with cracks, according to the following evaluation criteria. A: There are absolutely no cracks in the surface layer of the pressure roll. B: There are slight cracks in the surface layer of the pressure roll, but there is no delamination of the surface layer. C: Cracks have occurred in the surface layer of the pressure roll, and the surface layer is partially peeling off.

[0123] [Table 1]

[0124] From the above results, it can be seen that the component of this embodiment has a siloxane compound film that provides both release properties and abrasion resistance and flexibility, compared to the component of the comparative example.

[0125] This embodiment includes the following aspects. (((1))) A siloxane compound film containing a siloxane compound composed of Si, O, C, and H, wherein the spectrum measured by X-ray photoelectron spectroscopy (XPS) has a peak in the range of 100 eV to 103 eV, and the full width at half maximum of the peak is 1.80 eV to 4.00 eV. (((2))) A siloxane compound film according to (((1))) having Si-O bonds and Si-R bonds (wherein R represents a group containing at least one of an alkyl group and a phenyl group). (((3))) The siloxane compound film described in (((2))) wherein R represents a group containing an alkyl group. (((4))) A siloxane compound film according to any one of (((1))) to (((3))), wherein the full width at half maximum of the aforementioned peak is 2.00 eV or more and 3.00 eV or less. (((5))) A siloxane compound film according to any one of the items (((1))) to (((4))), wherein the atomic ratio of C to Si (C / Si) is 0.30 or greater. (((6))) A member having a base material and a surface layer provided on the base material and composed of a siloxane compound film as described in any one of (((1))) to (((5))). (((7))) The member according to (((6))), wherein the base material is a metal base material. (((8))) It comprises a first rotating body and a second rotating body positioned in contact with the outer surface of the first rotating body, A fixing device in which at least one of the first rotating body and the second rotating body is made of the member described in (((6))) or (((7))). (((9))) Image holder and, A charging device for charging the surface of the image holder, An electrostatic latent image forming apparatus for forming an electrostatic latent image on the surface of the charged image holder, A developing apparatus that contains a developer containing toner, and uses the developer to develop an electrostatic latent image formed on the surface of the image holder to form a toner image, A transfer device for transferring the toner image onto the surface of a recording medium, A fixing apparatus according to (((8))) for fixing the toner image onto the surface of a recording medium, An image forming apparatus equipped with the following features. (((10))) A method for producing a siloxane compound film according to any one of the following (((1))) to (((5))), wherein the siloxane compound film is formed by plasma CVD (Plasma Enhanced Chemical Vapor Deposition) using a raw material siloxane compound.

[0126] The effects of the above embodiment are as follows: According to the invention of (((1))) or (((2))), a siloxane compound film is provided that has release properties while achieving both abrasion resistance and flexibility, compared to a case where the full width at half maximum of a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV. According to the invention of (((3))), a siloxane compound film is provided that has release properties while achieving both abrasion resistance and flexibility, compared to the case where R represents a group containing a phenyl group. According to the invention of (((4))), a siloxane compound film is provided that has release properties while achieving both abrasion resistance and flexibility, compared to cases where the peak full width at half maximum is less than 2.00 eV or greater than 3.00 eV. According to the invention of (((5))), a siloxane compound film is provided that has release properties while achieving both wear resistance and flexibility, compared to the case where the atomic weight ratio (C / Si) is less than 0.30.

[0127] According to the inventions of (((6))), (((7))), (((8))), or (((9))), a member having a siloxane compound film that exhibits both release properties and abrasion resistance and flexibility, compared to a case where the full width at half maximum of a peak in the range of 100 eV to 103 eV in a spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV, is provided, as well as a fixing apparatus or image forming apparatus having the same.

[0128] The invention relating to (((10))) presents a method for producing a siloxane compound film in which, compared to a method for producing a siloxane compound film in which the full width at half maximum of a peak in the range of 100 eV to 103 eV in the spectrum measured by X-ray photoelectron spectroscopy (XPS) is less than 1.80 eV or greater than 4.00 eV, plasma CVD provides a method for producing a siloxane compound film that has release properties while achieving both wear resistance and flexibility. [Explanation of Symbols]

[0129] 100 Image forming apparatus 1Y, 1M, 1C, 1K Image Forming Unit 10 Primary Transfer Section 11 Photoreceptor 12 Chargers 13. Laser exposure unit 14. Developer 15 Intermediate transfer belt 16 Primary transfer roll 17 Photoconductor Cleaner 20 Secondary transfer section 22 Secondary transfer roll 25 Back Roll 26 Power supply roll 31 Drive Roll 32 support rolls 33 Tension-applying roll 34 Cleaning back roll 35 Intermediate Transfer Belt Cleaner 40 Control Unit 42 Reference Sensor 43 Image density sensor 50 Paper storage compartments 51 Paper feed roll 52 Conveyor Rolls 53 Conveyor Guide 55 Conveyor belt 56 Fixing entrance guide 60 Fixing device 62 Heating Roll 63 Pressure Roll 66 Heating source

Claims

1. A siloxane compound film comprising a siloxane compound with Si, O, C, and H as constituent elements, wherein the spectrum measured by X-ray photoelectron spectroscopy (XPS) has a peak in the range of 100 eV to 103 eV, and the full width at half maximum of the peak is 1.80 eV to 4.00 eV.

2. A siloxane compound film according to claim 1, having an Si-O bond and a Si-R bond (wherein R represents a group including at least one of an alkyl group and a phenyl group).

3. The siloxane compound film according to claim 2, wherein R represents a group containing an alkyl group.

4. The siloxane compound film according to claim 1, wherein the full width at half maximum of the peak is 2.00 eV or more and 3.00 eV or less.

5. The siloxane compound film according to claim 1, wherein the atomic ratio of C to Si (C / Si) is 0.30 or more.

6. A member having a base material and a surface layer provided on the base material and composed of a siloxane compound film according to any one of claims 1 to 5.

7. The member according to claim 6, wherein the base material is a metal base material.

8. It comprises a first rotating body and a second rotating body arranged in contact with the outer surface of the first rotating body, A fixing device in which at least one of the first rotating body and the second rotating body is made of the member described in claim 6.

9. Image holder and, A charging device for charging the surface of the image holder, An electrostatic latent image forming apparatus for forming an electrostatic latent image on the surface of the charged image holder, A developing apparatus that contains a developer containing toner, and uses the developer to develop an electrostatic latent image formed on the surface of the image holder to form a toner image, A transfer device for transferring the toner image onto the surface of a recording medium, A fixing apparatus according to claim 8, which fixes the toner image to the surface of a recording medium, An image forming apparatus equipped with the following features.

10. A method for producing a siloxane compound film according to any one of claims 1 to 5, comprising forming a siloxane compound film by plasma CVD (Plasma Enhanced Chemical Vapor Deposition) using a raw material siloxane compound.

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