Imaging device

Abstract

To provide an imaging device that is smaller overall and capable of capturing clearer images. [Solution] The imaging device includes a planar optical sensor containing a plurality of photodiodes; an optical shutter device having a code mask sheet arranged on the z1 side of the optical sensor and including a plurality of code patterns and a light-shielding region that borders each of the plurality of code patterns so as to individually separate the plurality of code patterns, and an optical shutter laminated on the z1 side of the code mask sheet and capable of switching between light transmission and light shielding; a subject accommodation section arranged on the z1 side of the optical shutter and accommodating a subject; and a processing circuit that makes a portion of the optical shutter that overlaps with some of the plurality of code patterns in the z direction into a light-transmitting state and the other portion of the optical shutter that does not overlap into a light-shielding state.

Description

Technical Field

[0001] This disclosure relates to an imaging device.

Background Art

[0002] Patent Document 1 discloses an imaging device including a lens and an optical sensor (imaging element). Light from a subject is incident on the optical sensor through the lens. Patent Document 2 discloses a pinhole camera. The pinhole camera includes a pinhole plate provided with a pinhole and an optical sensor (light receiving element). Light from a subject is incident on the optical sensor through the pinhole of the pinhole plate.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0004] Regarding the imaging device having the lens according to Patent Document 1, it is necessary to increase the focal length, and the entire device may become large. Regarding the pinhole camera according to Patent Document 2, since the amount of light passing through the pinhole is limited, it may be difficult to capture a clear image.

[0005] An object of the present invention is to provide an imaging device that can capture a clearer image with reduced blur while being more compact as a whole.

Means for Solving the Problems

[0006] An imaging device according to one aspect of the present invention includes a planar optical sensor including a plurality of photodiodes, an optical shutter device arranged to overlap with the optical sensor on one side in a first direction and capable of switching the display of a plurality of code patterns, a subject accommodating section arranged to overlap with the optical shutter device on one side in the first direction and for accommodating a subject, and a processing circuit that makes a part of the optical shutter device that overlaps with some of the plurality of code patterns and in the first direction transparent, and makes the other part of the optical shutter device that does not overlap the aforementioned part transparent. [Brief explanation of the drawing]

[0007] [Figure 1] Figure 1 is a schematic perspective view showing an imaging device according to the first embodiment. [Figure 2] Figure 2 is a schematic diagram showing a magnified portion of the code mask sheet. [Figure 3] Figure 3 is a block diagram showing an example configuration of an imaging device according to the first embodiment. [Figure 4] Figure 4 is a schematic diagram showing a cross-section along the line IV-IV in Figure 1. [Figure 5] Figure 5 is a schematic diagram showing the image processing procedure according to the first embodiment. [Figure 6] Figure 6 is a flowchart illustrating the method for acquiring the first image data according to the first embodiment. [Figure 7] Figure 7 is a flowchart illustrating the method for obtaining the result image according to the first embodiment. [Figure 8] Figure 8 is a schematic diagram showing the image processing procedure according to the second embodiment. [Figure 9] Figure 9 is a schematic perspective view showing an imaging device according to the third embodiment. [Figure 10] Figure 10 is a schematic diagram showing a magnified view of a part of the optical shutter device shown in Figure 9. [Figure 11] Figure 11 is a schematic cross-sectional view taken along the line XI-XI in Figure 10. [Figure 12A]Figure 12A is a plan view of the optical shutter device showing the first of four code patterns illuminated. [Figure 12B] Figure 12B is a plan view of the optical shutter device showing the second of the four code patterns illuminated. [Figure 12C] Figure 12C is a plan view of the optical shutter device showing the third of the four code patterns illuminated. [Figure 12D] Figure 12D is a plan view of the optical shutter device showing the fourth of four code patterns illuminated. [Modes for carrying out the invention]

[0008] Embodiments for carrying out the present invention will be described in detail with reference to the drawings. The present disclosure is not limited by the contents described in the following embodiments. Furthermore, the components described below include those that can be easily conceived by a person skilled in the art, and those that are substantially the same. In addition, the components described below can be combined as appropriate. The disclosure is merely an example, and any modifications that a person skilled in the art can easily conceive while maintaining the spirit of the disclosure are naturally included within the scope of the disclosure. Furthermore, in order to make the explanation clearer, the drawings may schematically represent the width, thickness, shape, etc. of each part compared to the actual embodiment, but these are merely examples and do not limit the interpretation of the disclosure. Furthermore, in the present disclosure and each drawing, elements that are the same as those described above with respect to previously shown drawings are denoted by the same reference numerals, and detailed explanations may be omitted as appropriate.

[0009] In the xyz coordinate system, the x1 side of the x-direction is opposite to the x2 side. The y1 side of the y-direction is opposite to the y2 side. The z1 side of the z-direction is opposite to the z2 side. The z1 side is also called the lower side, and the z2 side is also called the upper side. The z-direction is also called the first direction. The z1 side is also called one side of the first direction, and the z2 side is also called the other side of the first direction.

[0010] [First Embodiment] First, the first embodiment will be described. FIG. 1 is a perspective view schematically showing an imaging device according to the first embodiment. FIG. 2 is an enlarged schematic view of a part of the code mask sheet.

[0011] As shown in FIG. 1, the imaging device 1 includes an optical sensor 10, a light shutter device 50, a subject accommodation part 103, and a light source 104.

[0012] As shown in FIG. 1, the optical sensor 10 is a planar detection device including a plurality of photodiodes 30 (light detection elements, see FIG. 3) arranged in a planar shape. The light shutter device 50 is arranged to overlap the optical sensor 10 on the z1 side. The light shutter device 50 has a code mask sheet 60 and a light shutter 51.

[0013] The code mask sheet 60 is rectangular in plan view. Here, plan view means "viewed from a direction perpendicular to the optical sensor 10 or the code mask sheet 60" or "viewed from the z direction". The code mask sheet 60 includes a plurality of code patterns 61 and a light-shielding region 62. The light-shielding region 62 borders each of the plurality of code patterns 61 so as to separate them individually. In the first embodiment, four code patterns 61 are provided on one code mask sheet 60. As shown in Figure 1, the four code patterns 61 are code patterns 611, 612, 613, and 614. The four code patterns 61 are arranged in a matrix. Code pattern 611 is located on the y1 side and the x1 side of the code mask sheet 60. Code pattern 612 is located on the y1 side and the x2 side of the code mask sheet 60. Code pattern 613 is located on the y2 side and the x2 side of the code mask sheet 60. Code pattern 614 is located on the y2 side and x1 side of the code mask sheet 60. As shown in Figure 2, each of the four (or more) code patterns 61 on the code mask sheet 60 includes a light-transmitting portion 61a and a light-shielding portion 61b. The total area of ​​the light-transmitting portions 61a in the entirety of the four (or more) code patterns 61 is between 40% and 60% of the total area of ​​the four (or more) code patterns 61.

[0014] The optical shutter 51 is laminated on the z1 side (lower side) of the code mask sheet 60. The optical shutter 51 can be a liquid crystal shutter 82 or an electrochromic shutter that can switch between light transmission and light blocking. When a portion of the optical shutter 51 that overlaps with some of the code patterns 61 in the z direction becomes light-transmitting, the optical shutter 51 other than the portion becomes light-blocking. For example, when a portion of the optical shutter 51 that overlaps with the code pattern 611 in the z direction as shown in Figure 1 becomes light-transmitting, light from the light source 104 passes through that portion of the optical shutter 51, passes through the code pattern 611 and is imaged by the optical sensor 10. At this time, light does not pass through code patterns 612, 613, and 614.

[0015] The object housing section 103 is disposed to overlap the optical shutter 51 on the z1 side. The object housing section 103 houses the object 101. The object housing section 103 is, for example, a transparent container such as a petri dish. The object 101 is, for example, a microorganism 102b (see FIG. 5 described later) disposed on the surface 102a of the culture medium 102. Specifically, the culture medium 102 is accommodated in a petri dish, the microorganism 102b is cultured on the culture medium 102, and the growth state of the microorganism 102b is imaged.

[0016] The light source 104 is, for example, a planar backlight, and specifically, a plurality of LEDs or the like are arranged to emit light uniformly.

[0017] FIG. 3 is a block diagram showing a configuration example of the imaging device according to the first embodiment. As shown in FIG. 3, the imaging device 1 further includes a control circuit 70 that controls the optical sensor 10. The control circuit 70 is composed of, for example, an MCU (Micro Control Unit), a RAM, an EEPROM, a ROM, and the like.

[0018] The optical sensor 10 includes an array substrate 2, a plurality of sensor pixels 3 (photodiodes 30) formed on the array substrate 2, gate line drive circuits 15A and 15B, a signal line drive circuit 16A, and an imaging circuit 11. The imaging circuit 11 includes a readout integrated circuit.

[0019] The array substrate 2 is formed with a substrate 21 as a base. Each of the plurality of sensor pixels 3 includes a photodiode 30, a plurality of transistors, and various wirings. The array substrate 2 on which the photodiodes 30 are formed is a drive circuit substrate that drives sensors for each predetermined detection region, and is also called a backplane or an active matrix substrate.

[0020] The substrate 21 has an active region AA and a peripheral region GA. The active region AA is a region where multiple sensor pixels 3 (multiple photodiodes 30) are provided. The peripheral region GA is the region between the outer periphery of the active region AA and the outer edge of the substrate 21, and is a region where no multiple sensor pixels 3 are provided. The gate line driving circuits 15A, 15B, the signal line driving circuit 16A, and the imaging circuit 11 are provided in the peripheral region GA.

[0021] Each of the multiple sensor pixels 3 is a light sensor having a photodiode 30 as a sensor element. Each photodiode 30 outputs an electrical signal corresponding to the light irradiated upon it. More specifically, the photodiodes 30 are PIN (Positive Intrinsic Negative) photodiodes or OPDs (Organic Photodiodes) using organic semiconductors. The multiple sensor pixels 3 (multiple photodiodes 30) are arranged in a matrix in the active region AA. The distance between two adjacent sensor pixels 3 (multiple photodiodes 30) is distance PS1 and PS2.

[0022] The imaging circuit 11 supplies control signals Sa, Sb, and Sc to the gate line drive circuits 15A and 15B and the signal line drive circuit 16A, respectively, and controls their operation. Specifically, the gate line drive circuits 15A and 15B output gate drive signals to the gate lines based on the control signals Sa and Sb. The signal line drive circuit 16A electrically connects the selected signal line SLS, based on the control signal Sc, to the imaging circuit 11. The imaging circuit 11 also includes a signal processing circuit that processes the imaging signals Vdet from the multiple photodiodes 30.

[0023] The photodiodes 30 of each of the multiple sensor pixels 3 perform detection according to the gate drive signals supplied from the gate line drive circuits 15A and 15B. Each of the multiple photodiodes 30 outputs an electrical signal corresponding to the light irradiated upon it as an imaging signal Vdet to the signal line drive circuit 16A. The imaging circuit 11 is electrically connected to the multiple photodiodes 30. The imaging circuit 11 processes the imaging signals Vdet from the multiple photodiodes 30 and outputs pixel data Cap based on the imaging signals Vdet to the control circuit 70. Pixel data Cap is the sensor value acquired for each sensor pixel 3.

[0024] The control circuit 70, as a control circuit on the optical sensor 10 side, includes a pixel data storage circuit 71, an image generation circuit 72, a storage circuit 73, and a processing circuit 74. The pixel data storage circuit 71 stores the pixel data Cap output from the imaging circuit 11 of the optical sensor 10. The image generation circuit 72 generates a second image IM of the subject 101 based on the pixel data Cap of the photodiode 30. The second image IM is an image captured by the optical sensor 10 of the light and dark pattern obtained by passing light from the light source 104 through the optical shutter device 50 while the subject 101 is housed in the subject housing unit 103.

[0025] The memory circuit 73 stores a first image IM-P that shows the light and dark pattern captured by the optical sensor 10 when the point light source 110 and the optical shutter device 50 are facing each other.

[0026] As described above, the processing circuit 74 makes a portion of the optical shutter 51 that overlaps with some of the code patterns 61 in the z direction transparent, and makes the other portion of the optical shutter 51 that does not overlap transparent. The processing circuit 74 also performs image processing to generate a third image IM-R by performing deconvolution processing based on the second image IM and the first image IM-P captured by the optical sensor 10 via the code patterns 61 of the optical shutter device 50. The control circuit 70 transmits the third image IM-R to an external host PC 76. This image processing will be described in detail later with reference to Figure 5.

[0027] Furthermore, a liquid crystal shutter 82, which is an example of an optical shutter 51, has a plurality of divided regions 820. The control circuit 822 supplies a control signal Sg to each of the divided regions 820 and controls their operation. The optical sensor 10 has a plurality of photodetectors 813. The divided regions 820 of the liquid crystal shutter 82 overlap with the photodetectors 813 of the optical sensor 10 when viewed from the z direction. In detail, for example, one divided region 820 overlaps with four photodetectors 813 when viewed from the z direction. Also, each of the divided regions 820 of the liquid crystal shutter 82 overlaps with each of the plurality of code patterns 61 shown in Figure 1 when viewed from the z direction. The positions of the plurality of divided regions 820 that become light-transmitting are switched in a time-division manner. In other words, the processing circuit 74 switches the divided regions 820, which are the parts of the liquid crystal shutter 82 that become light-transmitting, in a time-division manner, and sequentially switches the predetermined code patterns 61 that allow light to pass through among the plurality of code patterns 61.

[0028] Figure 4 is a schematic diagram showing a cross-section along the line IV-IV in Figure 1. Of the two code patterns 61 shown in Figure 4, the light passing through the x1 code pattern 61 spreads across light 400a to 400c. The light passing through the x2 code pattern 61 spreads across light 400b to 400d. Furthermore, on the optical sensor 10, the light passing through the x1 code pattern 61 and the light passing through the x2 code pattern 61 overlap in the x direction. Therefore, if light is to pass through both the x1 code pattern 61 and the x2 code pattern 61 simultaneously, an overlapping portion 400p is formed on the optical sensor 10 where light 400c and light 400d overlap.

[0029] However, in this embodiment, the portion of the light shutter 51 that is in a light-transmitting state is switched in a time-division manner to sequentially switch between predetermined code patterns 61 that allow light to pass through from among the multiple code patterns 61. That is, when light 400a and 400c passing through the code pattern 61 on the x1 side is irradiated onto the optical sensor 10, light 400b and 400d on the x2 side is not irradiated onto the optical sensor 10. Also, when light 400b and 400d passing through the code pattern 61 on the x2 side is irradiated onto the optical sensor 10, light 400a and 400c on the x1 side is not irradiated onto the optical sensor 10. In this way, imaging by the optical sensor 10 is performed at multiple imaging timings, and the image acquisition range of the optical sensor 10 does not overlap at each of the multiple imaging timings. wS represents the x-direction width of the subject 101 (specifically, the width of the surface 102a of the culture medium 102), wC represents the irradiation width on the optical sensor 10, dS represents the z-direction distance from the code mask sheet 60 to the subject, and dC represents the z-direction distance from the optical sensor 10 to the code mask sheet 60. More specifically, dS is the z-direction distance from the z-center of the code mask sheet 60 to the microorganism 102b provided on the surface 102a of the culture medium 102. dC represents the z-direction distance from the photodiode 30 of the optical sensor 10 to the z-center of the code mask sheet 60. dS is also referred to as the "first distance L1," and dC is also referred to as the "second distance L2." The irradiation width wC is longer than the x-direction width wS. The first distance L1 is shorter than the second distance L2.

[0030] Figure 5 is a schematic diagram showing the image processing procedure according to the first embodiment. Figure 6 is a flowchart showing the method for acquiring the first image data according to the first embodiment.

[0031] First, the method for acquiring the first image according to the first embodiment will be explained with reference to Figures 5 and 6. The first image IM-P is a light and dark pattern captured by the optical sensor 10 when the point light source 105 and the optical shutter device 50 are facing each other. In other words, the first image IM-P is an image captured by the optical sensor 10 of the light and dark pattern obtained by passing light from the point light source 105 through the optical shutter device 50 when the subject 101 is not housed in the subject housing unit 103. As shown in Figures 5 and 6, the operator first positions the point light source 105 (step ST101).

[0032] Next, adjust the distance between the point light source 105 and the code mask sheet 60 (step ST102).

[0033] Next, the point light source 105 is turned on (step ST103). As a result, the light emitted from the point light source 105 is irradiated onto the photodiode 30 of the optical sensor 10 via one code pattern 61 on the code mask sheet 60, and the first image IM-P is captured by the optical sensor 10 (step ST104).

[0034] Next, the memory circuit 73 (see Figure 3) stores the first image IM-P (step ST105). Specifically, the memory circuit 73 stores the first image IM-P, which shows the light and dark pattern captured by the optical sensor 10 when the point light source 105 and the optical shutter device 50 are facing each other. The timing of storing the data for the first image IM-P is, for example, during the design or shipment of the imaging device 1, or when the imaging device 1 is started up.

[0035] Next, referring to Figures 5 and 7, a method for generating a third image IM-R and a result image IM-S by performing a deconvolution process IM100 using the first image IM-P on the second image IM, which captures the subject 101, will be described. Figure 7 is a flowchart showing the method for acquiring the result image according to the first embodiment.

[0036] The second image IM includes multiple partial images (partial images 1 to 4) corresponding to the light that has passed through each of the predetermined code patterns 61 that transmit light in a time-division manner. First, as shown in Figures 5 and 7, the optical sensor 10 captures partial image 1 (IM-1) of the second image IM of the subject 101 (step ST201). Partial image 1 (IM-1) is the image corresponding to the light that has passed through code pattern 611 of the four code patterns. Note that the second image IM is rotated 180 degrees relative to the subject 101.

[0037] Next, the first image IM-P is read out (step ST202). As mentioned above, the data of the first image IM-P is pre-stored in the memory circuit 73.

[0038] Next, the processing circuit 74 performs deconvolution processing IM100 individually on multiple partial images (IM-1 to IM-4) in the second image IM to generate multiple third images IM-R. Specifically, first, deconvolution processing IM100 is performed on partial image 1 (IM-1) in the second image IM to generate a third image (IM-R-1) of partial image 1 (IM-1) (step ST203).

[0039] The control circuit 70 transmits the third image (IM-R-1) to an external host PC 76 (see Figure 3) (step ST204).

[0040] Using the procedure described above, the third image is generated similarly for partial image 2 (IM-2), partial image 3 (IM-3), and partial image 4 (IM-4). Below, we will briefly explain how to generate the third image (IM-R) of partial image 4 (IM-4) from partial image 2 (IM-2).

[0041] The optical sensor 10 captures a partial image 2 (IM-2) of the second image IM of the subject 101 (step ST205). Partial image 2 (IM-2) is the image corresponding to the light that passed through code pattern 612 of the four code patterns. Next, a deconvolution process IM100 is performed to generate a third image (IM-R-2) of partial image 2 (IM-2) (step ST206). The control circuit 70 transmits the third image (IM-R-2) to an external host PC 76 (see Figure 3) (step ST207).

[0042] The optical sensor 10 captures a partial image 3 (IM-3) of the second image IM of the subject 101 (step ST208). Partial image 3 (IM-3) is the image corresponding to the light that passed through code pattern 613 of the four code patterns. Next, a deconvolution process IM100 is performed to generate a third image (IM-R-3) of the partial image 3 (IM-3) (step ST209). The control circuit 70 transmits the third image (IM-R-3) to an external host PC 76 (see Figure 3) (step ST210).

[0043] The optical sensor 10 captures a partial image 4 (IM-4) of the second image IM of the subject 101 (step ST211). Partial image 4 (IM-4) is the image corresponding to the light that passed through code pattern 614 of the four code patterns. Next, a deconvolution process IM100 is performed to generate a third image (IM-R-4) of partial image 4 (IM-4) (step ST212). The control circuit 70 transmits the third image (IM-R-4) to an external host PC 76 (see Figure 3) (step ST213).

[0044] Next, a synthesis process IM200 is performed to merge the third images of partial images 1 to 4 (step ST214). This synthesis process IM200 determines the distances between the generated third images based on a first distance L1 and a second distance L2, and merges the multiple third images (IM-R). Thus, in step ST214, a synthesis process IM200 is performed to merge the third image (IM-R-1), the third image (IM-R-2), the third image (IM-R-3), and the third image (IM-R-4). This synthesis process IM200 generates the resulting image IM-S. The synthesis process IM200 is performed by the processing circuit 74.

[0045] As described above, the imaging device 1 comprises an optical sensor 10, an optical shutter device 50, a subject accommodating section 103, and a processing circuit 74. The optical shutter device 50 has a code mask sheet 60 including a plurality of code patterns 61 and a light-shielding area 62, and an optical shutter 51. The processing circuit 74 makes a portion of the optical shutter 51 that overlaps with some of the code patterns 61 in the z direction transparent, and makes the other portion of the optical shutter 51 that does not overlap transparent.

[0046] As described above with reference to Figure 4, the light from the light source 104 passes through the subject 101 in the subject housing section 103, through the code pattern 61 of the code mask sheet 60, and then illuminates the optical sensor 10. Here, if light is to pass through two adjacent code patterns 61 simultaneously, an overlapping area 400p may be formed on the optical sensor 10 where the light from each overlaps. That is, if light is to pass through all of the code patterns 61 simultaneously, the distance in the z direction between the light shutter device 50 and the optical sensor 10 must be increased so that the light from each overlaps on the optical sensor 10.

[0047] In contrast, in this embodiment, a portion of the optical shutter 51 that overlaps with some of the multiple code patterns 61 in the z direction is made transparent, while the other portion of the optical shutter 51 is made opaque. This allows light to pass through each portion of the multiple code patterns 61 sequentially. Therefore, even if the distance in the z direction between the optical shutter device 50 and the optical sensor 10 is set to be shorter, the light that has passed through adjacent code patterns 61 will not overlap on the optical sensor 10.

[0048] Based on the above, this embodiment makes it possible to provide an imaging device 1 that is smaller overall and capable of capturing clearer images with reduced blurring.

[0049] Furthermore, by using the optical shutter 51 to take time-division images for each region, the second distance L2 can be made smaller than when the optical shutter 51 is not provided.

[0050] The processing circuit 74 performs image processing to generate a third image IM-R by performing a deconvolution process IM100 based on the second image IM and the first image IM-P captured by the optical sensor 10 via the code pattern 61 of the optical shutter device 50.

[0051] As mentioned above, Patent Document 1 requires a large focal length, which may increase the overall size of the device. In Patent Document 2, the amount of light passing through the pinhole is limited, which may make it difficult to capture a clear image.

[0052] In contrast, in this embodiment, a deconvolution process IM100 is performed based on the second image IM and the first image IM-P to generate a third image IM-R. Therefore, compared to the imaging device having a lens described in Patent Document 1, the imaging device 1 according to this embodiment can be made smaller overall. Furthermore, since the pinhole camera described in Patent Document 2 suffers from insufficient light, the imaging device 1 according to this embodiment can generate a clearer image without insufficient light compared to Patent Document 2. Thus, according to this embodiment, it is possible to provide an imaging device 1 that is smaller overall and capable of capturing clearer images with suppressed blurring.

[0053] The processing circuit 74 switches the light-transmitting portion of the light shutter 51 in a time-division manner, sequentially switching a predetermined code pattern 61 that allows light to pass through from among a plurality of code patterns 61. The second image IM also includes a plurality of partial images (partial image 1 to partial image 4) corresponding to the light that has passed through each of the predetermined code patterns 61 that allow light to pass through in a time-division manner. The processing circuit 74 performs a deconvolution process IM100 on the plurality of partial images individually to generate a plurality of third images IM-R, determines the distance between the plurality of generated third images IM-R based on a first distance L1 and a second distance L2, and performs a synthesis process IM200 to integrate the plurality of third images IM-R.

[0054] As a result, light can be passed through parts of each of the multiple code patterns 61 in a time-division manner, so even if the second distance L2 in the z direction between the optical shutter device 50 and the optical sensor 10 is set to a shorter distance, the light that has passed through adjacent code patterns 61 will not overlap on the optical sensor 10. Therefore, according to this embodiment, it is possible to provide an imaging device 1 that can be made smaller overall and capture sharper images with suppressed blurring.

[0055] The total area of ​​the light-transmitting portion 61a in the entirety of the multiple code patterns 61 is between 40% and 60% of the total area of ​​the multiple code patterns 61. If it is less than 40%, the image will become dark, and if it is greater than 60%, the quality of the deconvolution process IM100 will deteriorate. Therefore, it is desirable to have an area between 40% and 60% that yields an image with appropriate brightness.

[0056] The optical shutter 51 is either a liquid crystal shutter 82 or an electrochromic shutter. Therefore, it becomes easy to switch the portion of the optical shutter 51 that is in a light-transmitting state using a time-division method. In particular, the liquid crystal shutter 82 can switch the portion that is in a light-transmitting state more quickly.

[0057] [Second Embodiment] Next, a second embodiment will be described. Figure 8 is a schematic diagram showing the image processing procedure according to the second embodiment.

[0058] In the first embodiment, as shown in Figure 1, a code mask sheet 60 having four code patterns 61 (code patterns 611, 612, 613, and 614) was applied. In the second embodiment, four (two or more) code pattern groups 620, 630, 640, and 650 are provided, and each of the code pattern groups 620, 630, 640, and 650 is fitted with a code mask sheet 60A containing four (or more) code patterns.

[0059] Specifically, as shown in the upper part of Figure 8, the code mask sheet 60A is rectangular in plan view. The code pattern group 620 is located on the x1 and y1 sides of the code mask sheet 60A. The code pattern group 630 is located on the x2 and y1 sides of the code mask sheet 60A. The code pattern group 640 is located on the x2 and y2 sides of the code mask sheet 60A. The code pattern group 650 is located on the x1 and y2 sides of the code mask sheet 60A.

[0060] Furthermore, four code patterns 61 are provided in one code pattern group. Specifically, code pattern group 620 is provided with code patterns 621, 622, 623, and 624. Code pattern 621 is located on the x1 and y1 side of code pattern group 620. Code pattern 622 is located on the x2 and y1 side of code pattern group 620. Code pattern 623 is located on the x2 and y2 side of code pattern group 620. Code pattern 624 is located on the x1 and y2 side of code pattern group 620.

[0061] The code pattern group 630 includes code patterns 631, 632, 633, and 634. Code pattern 631 is located on the x1 and y1 sides of the code pattern group 630. Code pattern 632 is located on the x2 and y1 sides of the code pattern group 630. Code pattern 633 is located on the x2 and y2 sides of the code pattern group 630. Code pattern 634 is located on the x1 and y2 sides of the code pattern group 630.

[0062] The code pattern group 640 includes code patterns 641, 642, 643, and 644. Code pattern 641 is located on the x1 and y1 sides of the code pattern group 640. Code pattern 642 is located on the x2 and y1 sides of the code pattern group 640. Code pattern 643 is located on the x2 and y2 sides of the code pattern group 640. Code pattern 644 is located on the x1 and y2 sides of the code pattern group 640.

[0063] The code pattern group 650 includes code patterns 651, 652, 653, and 654. Code pattern 651 is located on the x1 and y1 sides of the code pattern group 650. Code pattern 652 is located on the x2 and y1 sides of the code pattern group 650. Code pattern 653 is located on the x2 and y2 sides of the code pattern group 650. Code pattern 655 is located on the x1 and y2 sides of the code pattern group 650.

[0064] According to the above configuration, when the leftmost pattern 1 is used, the code patterns that become translucent on the code mask sheet 60A are code pattern 621 of code pattern group 620, code pattern 631 of code pattern group 630, code pattern 641 of code pattern group 640, and code pattern 651 of code pattern group 650.

[0065] In the case of pattern 2, the second from the left, the code mask sheet 60A will be translucent if code pattern 622 of code pattern group 620, code pattern 632 of code pattern group 630, code pattern 642 of code pattern group 640, and code pattern 652 of code pattern group 650 are translucent.

[0066] In the case of pattern 3, the third from the left, the code mask sheet 60A will be translucent if code pattern 623 of code pattern group 620, code pattern 633 of code pattern group 630, code pattern 643 of code pattern group 640, and code pattern 653 of code pattern group 650 are translucent.

[0067] When pattern 4 is the fourth from the left, the code mask sheet 60A will be translucent with respect to code pattern 624 of code pattern group 620, code pattern 634 of code pattern group 630, code pattern 644 of code pattern group 640, and code pattern 654 of code pattern group 650.

[0068] Thus, in the second embodiment, one predetermined code pattern is sequentially switched between each of the four code pattern groups 620, 630, 640, and 650.

[0069] Furthermore, as shown in the lower part of Figure 8, the optical sensor 10A generates separate partial images in multiple sections that are divided so that the image acquisition ranges do not overlap, from pattern 1 to pattern 4.

[0070] Specifically, in the leftmost pattern 1 in Figure 8, the optical sensor 10A is arranged so that the image acquisition ranges 111, 121, 131, and 141 do not overlap. Image acquisition range 111 corresponds to code pattern 621, image acquisition range 121 corresponds to code pattern 631, image acquisition range 131 corresponds to code pattern 641, and image acquisition range 141 corresponds to code pattern 651.

[0071] In pattern 2, the optical sensor 10A is arranged so that the image acquisition ranges 112, 122, 132, and 142 do not overlap. Image acquisition range 112 corresponds to code pattern 622, image acquisition range 122 corresponds to code pattern 632, image acquisition range 132 corresponds to code pattern 642, and image acquisition range 142 corresponds to code pattern 652.

[0072] In pattern 3, the optical sensor 10A is arranged so that the image acquisition ranges 113, 123, 133, and 143 do not overlap. Image acquisition range 113 corresponds to code pattern 623, image acquisition range 123 corresponds to code pattern 633, image acquisition range 133 corresponds to code pattern 643, and image acquisition range 143 corresponds to code pattern 653.

[0073] In pattern 4, the optical sensor 10A is arranged so that the image acquisition ranges 114, 124, 134, and 144 do not overlap. Image acquisition range 114 corresponds to code pattern 624, image acquisition range 124 corresponds to code pattern 634, image acquisition range 134 corresponds to code pattern 644, and image acquisition range 144 corresponds to code pattern 654.

[0074] As described above, in the second embodiment, the code mask sheet 60A is provided with four (two or more) code pattern groups 620, 630, 640, and 650, and each of the four code pattern groups 620, 630, 640, and 650 includes multiple code patterns (code patterns 621 to 654). The second image IM is captured at four (multiple) imaging timings. At each of the four imaging timings, individual partial images are generated in multiple parts that are divided so as not to overlap the image acquisition range of the optical sensor 10A (image acquisition range 111 to image acquisition range 144), and each partial image reflects the brightness and darkness pattern caused by light passing through one code pattern (one of code patterns 621 to 654).

[0075] In the first embodiment, four code patterns 61 were provided on one code mask sheet 60. In contrast, in the second embodiment, a total of 16 code patterns 61 were provided on one code mask sheet 60, and the image acquisition ranges of the optical sensor 10A did not overlap at each imaging timing. Therefore, according to the second embodiment, by increasing the number of divisions from 4 to 16, L1 and L2 could be shortened, making the device more compact.

[0076] [Third Embodiment] Next, a third embodiment will be described. The optical shutter device 50B according to the third embodiment is capable of switching the display of multiple code patterns. In other words, the optical shutter device 50B is an example in which the optical shutter has a pixel structure and constitutes a code mask. Figure 9 is a schematic perspective view showing the imaging device according to the third embodiment. Figure 10 is a schematic diagram that enlarges a part of the optical shutter device in Figure 9. Figure 11 is a schematic cross-sectional view taken along the line XI-XI in Figure 10. A detailed explanation follows below.

[0077] The imaging device 1B shown in Figure 9 has an optical shutter device 50B. In the optical shutter device 50B, only code pattern 611B of the four code patterns 61B is in a light-transmitting state. As shown in Figure 10, the entire surface of the optical shutter device 50B is divided into a plurality of square pixels 63. In detail, in code pattern 611B, the plurality of pixels 63 in a light-transmitting state form a light-transmitting portion 61a, and the plurality of pixels 63 in a light-shielding state form a light-shielding portion 61b. In addition, the light-shielding region 62 is formed by the plurality of pixels 63 in a light-shielding state.

[0078] As shown in Figure 11, for each pixel 53, the twisting state of the liquid crystal molecules can be controlled by switching the voltage applied to the electrode on and off, thereby allowing light to be transmitted or blocked by the polarizing plate on the side of the liquid crystal layer LC that emits light. In other words, the portion that transmits light forms the light-transmitting portion 61a, and the portion that blocks light forms the light-blocking portion 61b and the light-blocking region 62.

[0079] As shown in Figure 11, the pixel structure, divided into individual pixels, comprises a first substrate 280a, a second substrate 280b, and a liquid crystal layer LC. Specifically, the second substrate 280b is positioned at a distance of z2 from the first substrate 280a, and the liquid crystal layer LC is provided between the second substrate 280b and the first substrate 280a.

[0080] The first substrate 280a comprises a first deflection plate 289a, a first transparent substrate 283, an insulating layer 287a, an insulating layer 287b, an insulating layer 287c, a first electrode 281, and a first alignment film 290a. Specifically, the first deflection plate 289a, the first transparent substrate 283, the insulating layer 287a, the insulating layer 287b, the insulating layer 287c, the first electrode 281, and the first alignment film 290a are stacked in that order from the z1 side to the z2 side.

[0081] The second substrate 280b comprises a second deflection plate 289b, a second transparent substrate 288, a second electrode 282, and a second alignment film 290b. Specifically, the second deflection plate 289b, the second transparent substrate 288, the second electrode 282, and the second alignment film 290b are stacked in that order from the z2 side to the z1 side.

[0082] The first polarizing plate 289a and the second polarizing plate 289b are polarizing plates that transmit light components that vibrate in a predetermined direction from the incident light, and block light components that vibrate in other directions.

[0083] The first transparent substrate 283 and the second transparent substrate 288 are, for example, glass substrates. The first electrode 281 and the second electrode 282 are light-transmitting electrodes made of, for example, indium tin oxide (ITO). The first alignment film 290a and the second alignment film 290b are made of, for example, polyimide (PI). The alignment film is provided to control the orientation of liquid crystal molecules when it is required that the liquid crystal molecules be aligned in one direction over a relatively large area. The first electrode 281 is electrically connected to the wiring 286. Current is passed to the first electrode 281 via the wiring 286 by a switch or the like (not shown).

[0084] With the above configuration, a pixel 63 through which current is passed to the first electrode 281 becomes a light-transmitting portion 61a, while a plurality of pixels 63 through which current is not passed to the first electrode 281 become light-shielding portions 61b and light-shielding regions 62. Therefore, for example, in Figure 9, the code pattern 611B becomes light-transmitting.

[0085] In the third embodiment as well, predetermined code patterns 61B that transmit light can be sequentially switched in a time-division manner. Figure 12A is a plan view of the optical shutter device showing the state in which the first of the four code patterns is transmitted. Figure 12B is a plan view of the optical shutter device showing the state in which the second of the four code patterns is transmitted. Figure 12C is a plan view of the optical shutter device showing the state in which the third of the four code patterns is transmitted. Figure 12D is a plan view of the optical shutter device showing the state in which the fourth of the four code patterns is transmitted.

[0086] The four code patterns 61B in the third embodiment are code patterns 611B, 612B, 613B, and 614B. Code pattern 611B in Figure 12A corresponds to code pattern 611 in Figure 5. In Figure 12A, the pixels 63 of the light-transmitting portion 61a in code pattern 611B are in a light-transmitting state, and the remaining pixels 63 are in a light-shielding state. Code pattern 612B in Figure 12B corresponds to code pattern 612 in Figure 5. In Figure 12B, the pixels 63 of the light-transmitting portion 61a in code pattern 612B are in a light-transmitting state, and the remaining pixels 63 are in a light-shielding state. Code pattern 613B in Figure 12C corresponds to code pattern 613 in Figure 5. In Figure 12C, the pixels 63 of the light-transmitting portion 61a in code pattern 613B are in a light-transmitting state, and the remaining pixels 63 are in a light-shielding state. Code pattern 614B in Figure 12D corresponds to code pattern 614 in Figure 5. In Figure 12D, the pixels 63 of the light-transmitting portion 61a in the code pattern 614B are set to a light-transmitting state, while the remaining pixels 63 are set to a light-blocking state.

[0087] In this way, predetermined code patterns 61B that transmit light are switched sequentially in a time-division manner from code pattern 611B to code pattern 614B.

[0088] As described above, in the third embodiment as well, by making some of the multiple code patterns 61B transparent, light can be sequentially passed through each of the multiple code patterns 61B. [Explanation of Symbols]

[0089] 1, 1B Imaging device 3 sensor pixels 10, 10A Optical Sensor 11 Imaging circuit 30 Photodiodes 50, 50B Optical Shutter Device 51 Optical shutter 60, 60A Cord Mask Sheet 61, 61B Code Patterns 61a Translucent part 61b Light shielding part 62 Shading area 63 pixels 611, 612, 613, 614 Code Patterns 611B, 612B, 613B, 614B code patterns 620, 630, 640, 650 Code Patterns 73 Memory circuit 74 Processing Circuits 76 Host PC 82. Liquid crystal shutter (optical shutter) 820 Split area 101 Subject 102 culture medium 102b Microorganisms (subject) 103 Subject storage section 104 Light source 105 Point light source IM-P Image 1 IM Image 2 IM100 Deconvolution Process IM-R 3rd image IM200 Synthesis Processing IM-S result image

Claims

1. A planar optical sensor including multiple photodiodes, An optical shutter device is positioned to overlap one side of the optical sensor in the first direction and capable of switching the display of multiple code patterns. A subject accommodating section is positioned to overlap with the optical shutter device on one side in the first direction and accommodates a subject, A processing circuit that causes a portion of the optical shutter device that overlaps with some of the multiple code patterns in the first direction to be in a light-transmitting state, and the other portion of the optical shutter device that is not in the light-blocking state, Equipped with, Imaging device.

2. The aforementioned optical shutter device is The optical sensor is arranged to overlap with one side in the first direction and includes a code mask sheet which includes a plurality of code patterns and a light-shielding region which frames each of the plurality of code patterns so as to individually separate them, and a light shutter which is laminated on one side in the first direction with respect to the code mask sheet and is capable of switching between light transmission and light shielding. The imaging apparatus according to claim 1.

3. The processing circuit controls the operation of the optical sensor, When the distance in the first direction between the subject housing section and the optical shutter device is defined as the first distance, and the distance in the first direction between the optical shutter device and the optical sensor is defined as the second distance, The processing circuit can change at least one of the size and shape of the image captured by the optical sensor in correspondence with the first distance and the second distance. The imaging apparatus according to claim 1 or 2.

4. The first distance is shorter than the second distance. The imaging device according to claim 3.

5. The system further includes a memory circuit for storing a first image showing a light and dark pattern captured by the optical sensor when the point light source and the light shutter device are facing each other. The aforementioned processing circuit is Image processing is performed to generate a third image by performing deconvolution processing on the subject captured by the optical sensor via the code pattern of the optical shutter device, based on the second image and the first image. The imaging apparatus according to claim 1 or 2.

6. The aforementioned processing circuit is The portion of the light shutter device that is made transparent is switched in a time-division manner to sequentially switch between predetermined code patterns that allow light to pass through from among the multiple code patterns. The imaging apparatus according to claim 5.

7. The processing circuit controls the operation of the optical sensor, When the distance in the first direction between the subject housing section and the optical shutter device is defined as the first distance, and the distance in the first direction between the optical shutter device and the optical sensor is defined as the second distance, The second image includes a plurality of sub-images corresponding to the light that has passed through each of the predetermined code patterns that transmit light in time division, The aforementioned processing circuit is The deconvolution process is performed individually on the plurality of partial images to generate a plurality of third images, and the distances between the generated plurality of third images are determined based on the first distance and the second distance, and a synthesis process is performed to integrate the plurality of third images. The imaging device according to claim 6.

8. The optical shutter device is provided with two or more code pattern groups, and each of the two or more code pattern groups includes the plurality of code patterns. The second image above is Images are captured at multiple imaging timings, and at each of these multiple imaging timings, individual partial images are generated in multiple parts that are divided so as not to overlap the image acquisition range of the optical sensor, and each partial image reflects the brightness and darkness pattern caused by light passing through a single code pattern. The imaging apparatus according to claim 7.

9. Each of the plurality of code patterns in the optical shutter device includes a light-transmitting portion and a light-shielding portion, and the total area of ​​the light-transmitting portion in the plurality of code patterns is 40% or more and 60% or less of the total area of ​​the plurality of code patterns. The imaging apparatus according to claim 1.

10. The aforementioned optical shutter is an electrochromic shutter. The imaging apparatus according to claim 2.

11. The aforementioned light shutter is a liquid crystal shutter. The imaging apparatus according to claim 2.

Images