Laser processing equipment
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-01-27
- Publication Date
- 2026-08-14
AI Technical Summary
Conventional laser processing apparatuses face issues with water accumulation in the processing area, leading to laser scattering and reduced processing speed.
The apparatus features a vertical head body with a collimator lens, a nozzle aligned differently, a mirror to redirect laser light, and a focusing lens to focus the light onto a nozzle, accompanied by a gas supply system that introduces gas to swirl around the liquid column, enhancing discharge of water and improving processing speed.
The design effectively discharges water from the processing area, increasing processing speed and efficiency by suppressing laser scattering and turbulence, allowing for quicker and deeper processing.
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Abstract
Description
Technical Field
[0001] The present invention relates to a laser processing apparatus.
Background Art
[0002] An apparatus for generating a liquid jet that guides a laser beam inside is known (for example, Japanese Patent No. 5147445). This apparatus has a laser oscillator, a nozzle that injects jet fluid onto a workpiece, a liquid supply means that supplies jet liquid to the nozzle, and a laminar flow forming channel that supplies the jet liquid to the nozzle. The processing head faces upward and downward. The laser is guided in an optical fiber cable and focused toward a nozzle disposed below the top of the processing head.
Summary of the Invention
Problems to be Solved by the Invention
[0003] In a conventional laser processing apparatus, water may accumulate in the processing portion where the liquid column collides with the workpiece, and the laser may scatter. An object of the present invention is to provide a laser processing apparatus that discharges water from the processing portion and improves the processing speed.
Means for Solving the Problems
[0004] A first aspect of the present invention is a head body along a first axis that is in the vertical direction, a collimator lens that converts the laser emitted from the first end of the head body into parallel light, a liquid supply chamber disposed at the second end of the head body, a nozzle having a jet opening that faces the liquid supply chamber and is disposed along a second axis that is a direction different from the first axis, and ejects liquid, a mirror disposed at the second end of the head body that reflects the parallel light traveling along the first axis so as to travel along the second axis, The second end of the head body includes a focusing lens positioned along the second axis, which focuses parallel light reflected from the mirror through the liquid supply chamber onto the nozzle, It is a laser processing device that has [a certain feature].
[0005] The first axis extends vertically. The second axis may be perpendicular to the first axis. The liquid column outlet is located at the second end of the head body and may extend along the second axis. The gas inlet pipe may be connected to the outside of the outlet pipe. Multiple gas nozzles may be arranged rotationally symmetrically with respect to the central axis of each nozzle.
[0006] The laser processing apparatus may have a laser oscillator that emits a laser. The gas inlet passage may be connected to the radially outer side of the outlet pipe. The connecting pipes may extend radially from the nozzle.
[0007] The laser oscillator emits a laser beam. The focusing lens may be used to focus the laser beam at the nozzle. Gas may be introduced from the edge of the liquid column forming chamber of the nozzle toward the nozzle, causing the gas to swirl near the nozzle, and then discharged from the liquid column outlet via the outlet pipe. The gas flows around the liquid column. The gas velocity is higher than the velocity at the surface of the liquid column. The gas also flows around the liquid column inside the outlet tube and outside the laser head.
[0008] The laser head extends vertically. The laser processing apparatus is a vertical machine. The laser is guided to the laser head, for example, via an optical fiber. The optical fiber may be connected to the first end of the head body. The end of the optical fiber may be positioned along the first axis at the connection point of the head body.
[0009] The laser head may have multiple gas nozzles. The multiple gas nozzles are located on the bottom surface of the recess and eject gas toward the tip of the laser head. The gas nozzle may extend parallel to the nozzle opening. The laser processing apparatus may have an annular gas supply chamber. The gas supply chamber is located at the second end of the laser head and is centered on the second axis. Gas outlets may each be connected to the gas supply chamber. The laser processing apparatus may have a gas dispersion chamber and a connecting pipeline. The gas dispersion chamber is located at the tip of the laser head and is positioned radially outward from the gas supply chamber, centered on the second axis. The connecting pipeline connects the gas dispersion chamber and the gas supply chamber. [Effects of the Invention]
[0010] According to the laser processing apparatus of the present invention, water in the processing area can be discharged, thereby improving the processing speed. [Brief explanation of the drawing]
[0011] [Figure 1] Longitudinal cross-sectional view of the laser processing apparatus according to the embodiment. [Figure 2] Enlarged view of part II in Figure 1 [Figure 3] Sectional view along line III-III in Figure 2 [Figure 4] Sectional view of line IV-IV in Figure 2 [Figure 5] Longitudinal cross-sectional view of a laser processing device during use. [Figure 6] Longitudinal cross-sectional view of a laser processing device during use. [Figure 7] Longitudinal cross-sectional view of a laser processing device during use. [Modes for carrying out the invention]
[0012] As shown in Figure 1, the laser processing apparatus 10 of this embodiment includes a laser oscillator 31, a pump 33, a gas source 35, a laser head 11, and an optical fiber 32. The laser head 11 includes a head body 13, a collimator lens 12, a mirror 28, a focusing lens 14, a window 15, a nozzle 17, a packing 18, and a cap 19. The first axis 2 extends in the vertical direction. The second axis 1 extends in the horizontal direction.
[0013] Figure 2 is shown by rotating part II of Figure 1 by 90 degrees for convenience. Figure 2 is a cross-sectional view taken along line II-II of Figure 3. As shown in Figure 2, the laser head 11 has a liquid column discharge port 22. For the laser head 11, along the second axis 1, the side facing the liquid column discharge port 22 is taken as the tip, and the opposite direction of the tip direction is taken as the base end. Along the optical path of the laser, the side facing the optical fiber 32 is taken as the first end, and the opposite direction of the first end is taken as the second end.
[0014] The laser oscillator 31 oscillates a laser. The laser is preferably a pulsed laser. The laser is transmitted through the optical fiber 32 and guided to the laser head 11. The pump 33 is, for example, a piston pump. The pump 33 is a liquid pump. The pump 33 pressurizes the liquid to 10 MPa to several tens of MPa. The liquid is, for example, water. The gas source 35 is an air compressor or a gas cylinder. The gas source 35 supplies compressed air or helium gas to the laser head. The laser oscillator 31, the optical fiber 32, the pump 33, and the gas source 35 may be arranged outside the laser processing apparatus 10.
[0015] As shown in Figures 1 and 2, the head body 13 is columnar and extends in an L shape. The head body 13 has, in order from the base end side (above in Figure 1), a fiber support portion 13m, a collimator lens chamber 13h, a mirror chamber 13j, a condenser lens chamber 13k, a laser passage 13a, a window chamber 13b, a liquid supply chamber 16, a nozzle chamber 13c, a cap chamber 13d, and an end face 13g.
[0016] The fiber support part 13m, the collimator lens chamber 13h, and the mirror chamber 13j are arranged along the first axis 2. The fiber support part 13m is arranged at the first end part (the upper part in FIG. 1) of the head body 13. The fiber support part 13m supports the optical fiber 32 so as to be adjustable in the vertical direction, the horizontal direction, and the front-rear direction. The collimator lens chamber 13h is cylindrical. The collimator lens chamber 13h is connected to the fiber support part 13m and the mirror chamber 13j. The mirror chamber 13j is, for example, prismatic. The mirror chamber 13j is connected to the condenser lens chamber 13k.
[0017] The condenser lens chamber 13k, the laser passage 13a, the window chamber 13b, the liquid supply chamber 16, the nozzle chamber 13c, and the cap chamber 13d are arranged along the second axis 1 at the second end part (the lower left part in FIG. 1) of the head body 13. The condenser lens chamber 13k is connected to the laser passage 13a. The condenser lens chamber 13k is a straight cylindrical shape. The laser passage 13a is a straight frustum of a cone. The window chamber 13b and the nozzle chamber 13c are straight cylindrical shapes. The nozzle chamber 13c may have a packing groove (not shown). The liquid supply chamber 16 has a U-shaped cross section and is a rotating body centered on the second axis 1. The cap chamber 13d is a straight cylindrical shape and has an internal thread 13f. The internal thread 13f is arranged at the tip part of the cap chamber 13d.
[0018] The collimator lens 12 is arranged in the collimator lens chamber 13h. The collimator lens 12 may have a plurality of lenses. The collimator lens 12 is arranged around the first axis 2. The collimator lens 12 converts the laser emitted from the optical fiber 32 into parallel light (collimated light).
[0019] The mirror 28 is a mirror having a high reflectivity. The mirror 28 is inclined at 45 degrees with respect to the first axis 2. The mirror 28 reflects the parallel light traveling along the first axis 2 and makes it travel along the second axis 1.
[0020] The nozzle 17 is located in the nozzle chamber 13c. The nozzle 17 has a nozzle tip 17a and a liquid column forming chamber 17c. The nozzle tip 17a is, for example, a gemstone. The gemstone includes artificial gemstones and sintered artificial gemstones. The nozzle tip 17a has a nozzle 17b. The nozzle 17b extends along the second axis 1. The liquid column forming chamber 17c is located along the second axis 1. The liquid column forming chamber 17c may have a conical portion 17d. The conical portion 17d extends to the tip of the liquid column forming chamber 17c. The conical portion 17d may occupy almost the entire area of the liquid column forming chamber 17c. In Figure 2, the conical portion 17d occupies the entire area of the liquid column forming chamber 17c. The conical portion 17d may be a right cone. The diameter of the conical portion 17d decreases as it approaches the nozzle 17b.
[0021] The packing 18 is positioned in a packing groove (not shown). The packing 18 seals the space between the head body 13 and the nozzle 17.
[0022] The focusing lens 14 is located in the focusing lens chamber 13k. The focusing lens 14 is positioned around the second axis 1. The focusing lens 14 may have multiple lenses. The focusing lens 14 focuses parallel light. The laser is focused at the nozzle 17b by the focusing lens 14.
[0023] Window 15 is located in window room 13b. Window 15 is a right-circular column. Window 15 is, for example, a gemstone plate. The laser passes through window 15.
[0024] The cap 19 is fastened to the cap chamber 13d. The cap 19 is cylindrical in shape. The nozzle 17 is held by the cap 19. The cap 19 has a first surface 19f, a second surface 19g, an outer cylindrical surface 19c, a male thread 19b, a nozzle chamber 19d, a first gas inlet passage 20, an outlet pipe 21, a liquid column discharge port 22, a second gas inlet passage 24, a recess 25, and a gas outlet 26. The second gas inlet passage 24, the recess 25, and the gas outlet 26 may be omitted.
[0025] The first surface 19f and the second surface 19g are planar. The first surface 19f and the second surface 19g are the end faces of the cap 19. The first surface 19f abuts against the bottom surface of the cap chamber 13d. The second surface 19g is substantially identical to the end face 13g. Substantially identical surfaces include those with a distance between them of 0.5 mm or less.
[0026] The outer cylindrical surface 19c is a cylindrical surface and has a smaller diameter than the thread diameter of the male thread 19b. The outer cylindrical surface 19c is located on the base end side of the side surface of the cap 19. A gap is provided on the radially outer side of the outer cylindrical surface 19c. The height of the outer cylindrical surface 19c is approximately 50% of the distance between the first surface 19f and the second surface 19g. The male thread 19b is located at the tip of the cap 19. The male thread 19b engages with the female thread 13f.
[0027] The recess 25 is located on the second surface 19g. The recess 25 is a frustoconical right circle centered on the second axis 1. The recess 25 has a base surface 25a and a side surface 25b. The base surface 25a is a plane perpendicular to the second axis 1. The side surface 25b is a conical right circle centered on the second axis 1. The side surface 25b has a diameter that decreases towards the first surface 19f.
[0028] The nozzle chamber 19d is positioned with an opening on the first surface 19f. The nozzle chamber 19d is a right cylinder centered on the second axis 1. The tip portion of the nozzle 17 is housed in the nozzle chamber 19d. The bottom surface of the nozzle chamber 19d abuts against the bottom surface of the nozzle 17. The inner cylindrical surface of the nozzle chamber 19d abuts against the outer cylindrical surface of the nozzle 17.
[0029] As shown in Figures 2 and 3, the first gas introduction passage 20 has a first distribution chamber 20a, a plurality of first connecting pipes 20b, and a collection chamber 20c. The first gas introduction passage 20 is located on the first surface 19f. The first gas introduction passage 20 may also be open to the first surface 19f. The first dispersion chamber 20a is hollow and disc-shaped. The collection chamber 20c is hollow and disc-shaped. The outer diameter of the collection chamber 20c is smaller than the inner diameter of the first dispersion chamber 20a. The collection chamber 20c is located radially inward of the first dispersion chamber 20a. The depth of the collection chamber 20c from the first surface 19f may be the same as the depth of the first dispersion chamber 20a from the first surface 19f.
[0030] Each first connecting conduit 20b connects the first distribution chamber 20a and the collection chamber 20c. The first connecting conduit 20b extends radially from the collection chamber 20c. The cross-section of the first connecting conduit 20b is, for example, rectangular. The depth of the first connecting conduit 20b from the first surface 19f may be the same as the depth of the first distribution chamber 20a from the first surface 19f. The first connecting conduit 20b may be rotationally symmetric with respect to the second axis 1. As shown in Figure 3, the first connecting conduit 20b in this embodiment is rotationally symmetric eight times with respect to the second axis 1. The first connecting conduit 20b may be located at the nozzle 17. In this case, the collection chamber 20c may be integrated with the liquid column forming chamber 17c.
[0031] The outlet pipe 21 and the liquid column outlet 22 are positioned on the second axis 1. The outlet pipe 21 is a hollow cylinder. The outlet pipe 21 extends from the upper surface of the collection chamber 20c toward the nozzle 17. The outlet pipe 21 is positioned inside the liquid column forming chamber 17c. The outlet pipe 21 protrudes in the proximal direction beyond the proximal edge of the collection chamber 20c. The liquid column outlet 22 is positioned on the bottom surface 25a. The liquid column outlet 22 is a cylindrical hole and communicates with the inner surface of the outlet pipe 21. The inner diameter of the liquid column outlet 22 is the same as the inner diameter of the outlet pipe 21.
[0032] As shown in Figures 2 and 4, the second gas introduction passage 24 has a second distribution chamber 24a, a plurality of second connecting pipes 24b, and a gas supply chamber 24c. The second gas introduction passage 24 is located further forward than the first gas introduction passage 20. For example, the second distribution chamber 24a is partitioned by an outer cylindrical surface 19c and a cap chamber 13d. The second distribution chamber 24a is thin-walled cylindrical. The second distribution chamber 24a is located radially outward than the first distribution chamber 20a. The gas supply chamber 24c is hollow disc-shaped. The gas supply chamber 24c is located further forward than the collection chamber 20c. Each second connecting pipe 24b connects the second distribution chamber 24a and the gas supply chamber 24c. The second connecting pipes 24b are located further forward than the first connecting pipes 20b. The second connecting pipes 24b extend, for example, along a straight line passing through the second axis 1. The second connecting conduit 24b may be rotationally symmetric with respect to the second axis 1. As shown in Figure 4, the second connecting conduit 24b in this embodiment is rotationally symmetric eight times with respect to the second axis 1.
[0033] As shown in Figure 2, multiple gas outlets 26 penetrate from the gas supply chamber 24c toward the bottom surface 25a. The gas outlets 26 extend parallel to the second axis 1. As shown in Figure 4, the gas outlets 26 are cylindrical holes. The gas outlets 26 may be small diameter holes. The diameter of the gas outlets 26 may be 1 mm or less. For example, the diameter of the gas outlets 26 is 0.4 mm to 0.8 mm. The gas outlets 26 are arranged rotationally symmetrically with respect to the second axis 1. As shown in Figure 4, the gas outlets 26 in this embodiment are rotationally symmetrical 8 times with respect to the second axis 1. The gas outlets 26 may be located in the center of the radial width of the gas supply chamber 24c.
[0034] As shown in Figure 5, when the pump 33 supplies liquid to the laser head 11, a liquid column 41 is formed from the nozzle 17b via the liquid supply chamber 16. The liquid column 41 is discharged from the laser head 11 through the liquid column formation chamber 17c, the outlet pipe 21, and the liquid column discharge port 22. The laser oscillator 31 oscillates a laser. The focusing lens 14 focuses the laser on the nozzle 17b via the window 15. The laser then propagates inside the liquid column 41.
[0035] When the gas source 35 supplies gas to the first gas inlet passage 20, the gas is evenly distributed within the first distribution chamber 20a. The gas flows almost evenly into the collection chamber 20c from multiple first connecting pipes 20b. The gas flows out of the collection chamber 20c into the liquid column forming chamber 17c. The gas becomes a swirling flow 42 within the liquid column forming chamber 17c. The gas flows along the periphery of the cylindrical section 17f towards the nozzle 17b. Near the nozzle 17b, in the conical section 17d, the gas changes direction toward the second axis 1. Then, from near the nozzle 17b, the gas swirls along the liquid column 41 toward the tip, passes through the center of the liquid column forming chamber 17c, and enters the inside of the outlet pipe 21. The gas is ejected from the liquid column discharge port 22.
[0036] From the vicinity of the nozzle 17b of the liquid column forming chamber 17c, the gas flows so as to envelop the outer circumference of the liquid column 41. The liquid column 41 is enveloped in the swirling gas flow 42 and flows together with the gas flow inside the liquid column forming chamber 17c. In the section from the base end of the outlet pipe 21 to the liquid column discharge port 22, the gas also flows so as to envelop the liquid column 41. The gas flow 43 ejected from the liquid column discharge port 22 flows together with the liquid column 41, enveloping its periphery. The swirling flow 42 and the gas flow 43 flow at a higher speed than the liquid column 41. The gas has a lower viscosity than the liquid. As the gas flows so as to envelop the liquid column 41, the velocity of the gas flowing around the liquid column 41 increases compared to the surface of the liquid column 41. As a result, the swirling flow 42 and the gas flow 43 reduce the vorticity at the interface between the surface of the liquid column 41 and the gas. Furthermore, the swirling flow 42 and gas flow 43 promote the straightening of the liquid column 41.
[0037] The outlet pipe 21 extends along the second axis 1 inside the liquid column forming chamber 17c. The collection chamber 20c is connected below the liquid column forming chamber 17c. As a result, the gas flows from the periphery of the liquid column forming chamber 17c toward the nozzle 17b, swirls near the nozzle 17b, and flows along the liquid column 41. The swirling flow 42 is created inside the liquid column forming chamber 17c, forming a tubular flow of gas around the liquid column 41 discharged from the nozzle 17b. This suppresses tilting of the liquid column 41 and turbulence of the flow of the liquid column 41 inside the liquid column forming chamber 17c. The liquid column forming chamber 17c has a cylindrical portion 17f located at its tip and a conical portion 17d located at its base. This promotes the formation of the swirling flow 42.
[0038] The flow of the liquid column 41 begins to become turbulent as it moves away from the nozzle 17. At position 45, where the outer surface of the liquid column 41 becomes turbulent, the laser leaks out of the liquid column 41. According to the laser processing device 10, effective cutting can be performed between the end face 13g and position 45. The distance from the end face 13g to position 45 is called the effective cutting length 49. In this embodiment, the first gas introduction passage 20 is positioned near the tip face of the nozzle 17. The length of the first gas introduction passage 20 in the second axis direction is short. The second gas introduction passage 24 is formed in a thin disc shape. Therefore, the distance 48 from the tip face of the nozzle 17 to the end face 13g is short. This makes it possible to increase the effective cutting length 49.
[0039] The inner diameter of the liquid column discharge port 22 is the same as the inner diameter of the outlet pipe 21. Therefore, gas flow and vorticity of the liquid column 41 are suppressed between the inlet (base end) of the outlet pipe 21 and the liquid column discharge port 22. This suppresses turbulence in the liquid column 41 and increases the effective cutting length 49. It also suppresses laser attenuation within the liquid column 41. As a result, the processing capacity of the laser processing device 10 is improved.
[0040] The energy of the laser propagating through the liquid column tends to decrease as the distance 47 from the nozzle 17 increases. Therefore, it is preferable to bring the nozzle 17 and the workpiece 3 as close together as possible. With the laser head 11, the distance 48 is short, so the distance 46 (see Figure 6) between the workpiece 3 and the nozzle 17 can be shortened.
[0041] As shown in Figure 6, the laser processing apparatus 10 of this embodiment processes the workpiece 3. The workpiece 3 has a surface 3a. When the liquid column 41 collides with the workpiece 3, the liquid column 41 bounces back from the surface 3a as rebound liquid 51. The rebound liquid 51 adheres to the tip surface of the laser head 11 as a droplet 53. As the machining of workpiece 3 progresses, machined holes 44 and machined grooves are created in workpiece 3.
[0042] According to conventional technology, liquid can accumulate on the surface 3a or in the processed holes 44, causing the laser to scatter within the accumulated liquid. This reduces the laser density at the bottom of the processed holes 44, and consequently, the processing speed decreases.
[0043] In this embodiment, the laser processing apparatus 10 has a processing hole 44 that opens horizontally, so liquid is discharged from the surface 3a and the processing hole 44, and the laser guided by the liquid column 41 reaches the bottom surface of the processing hole 44. This suppresses a decrease in processing speed, and allows the processing hole 44 to be processed quickly and deeply. The same principle applies to grooving and cutting processes.
[0044] The laser processing device 10 uses optical fibers 32 to introduce the laser to the laser head 11. Therefore, the laser head 11 can be easily moved. The laser processing device 10 can easily have a smaller installation area compared to a device in which the laser head 11 is fixed and the table (workpiece) is moved. In addition, the laser processing device 10 is a vertical device. Therefore, the laser processing device 10 can be easily obtained by replacing the spindle of a vertical machine tool with the laser head 11. This makes it easy to manufacture the laser processing device 10.
[0045] In conventional technology, droplets 53 were sometimes attracted to the liquid column discharge port 22. When droplets 53 adhere to the liquid column discharge port 22, the liquid column 41 is easily disturbed. This can easily reduce the energy of the laser propagating within the liquid column 41. In addition, dross generated during processing, along with the droplets 53, sometimes adheres to the tip surface of the laser head 11. When the dross is attracted to the liquid column discharge port 22 along with the droplets 53, the liquid column discharge port 22 can become clogged with the dross.
[0046] The laser processing apparatus 10 of this embodiment has a gas nozzle 26. Because the diameter of the gas nozzle 26 is small, the total cross-sectional area of the gas nozzle 26 can be reduced. Therefore, the flow rate of the gas ejected from the gas nozzle 26 can be reduced. Furthermore, even if the gas flow rate is reduced, the flow velocity of the gas ejected from the gas nozzle 26 can be increased. Because the gas flow rate is small, the effect of the gas ejected from the gas nozzle 26 on the liquid column 41 is small. Accordingly, turbulence of the liquid column 41 caused by the gas ejected from the gas nozzle 26 can be reduced. The gas ejected from the gas nozzle 26 divides the reflected liquid 51, and the scattering of the reflected liquid 51 is promoted. As a result, the adhesion of reflected liquid 51 to the tip surface of the laser head 11 is reduced. By increasing the gas flow velocity, the adhesion of reflected liquid 51 can be suppressed.
[0047] The laser processing apparatus 10 of this embodiment has a recess 25. The recess 25 has a bottom surface 25a. The gas nozzle 26 is located on the bottom surface 25a. By injecting gas from the gas nozzle 26, droplets 53 adhering to the bottom surface 25a move outward. Most of the droplets 53 are then discharged from the side surface 25b, passing through the second surface 19g and the end surface 13g. The side surface 25b is inclined outward, which promotes the discharge of droplets 53. The fact that the second surface 19g and the end surface 13g are substantially the same plane also promotes the discharge of droplets 53. This reduces the adverse effect of splashed liquid 51 adhering to the laser head 11. It also suppresses clogging of the liquid column discharge port 22 due to dross.
[0048] Liquids have viscosity and surface tension. As shown in Figure 7, as the distance 61 between the laser head 11 and the workpiece 3 is reduced, a liquid reservoir tends to form between the laser head 11 and the workpiece 3. In the conventional technology, the space between the laser head 11 and the surface 3a of the workpiece 3 could be filled with liquid. In this case, the laser cannot be efficiently irradiated to the processing point, resulting in a significant decrease in processing capability.
[0049] The laser head 11 of this embodiment has a recess 25. A gas nozzle 26 is positioned in the recess 25. Gas is ejected from the gas nozzle 26. The ejected gas promotes the discharge of liquid outwards from between the laser head 11 and the surface 3a. This makes it easier for a gas-filled space to form between the recess 25 and the workpiece 3. As a result, the liquid column 41 reaches the surface 3a, and the processing of the workpiece 3 is promoted.
[0050] Furthermore, the gas flow path to the recess 25 (for example, the second gas inlet passage 24 or the gas outlet 26) may be replaced with a prior art element (for example, the second conduit in European Patent No. 31054043).
[0051] The present invention is not limited to the embodiments described above, and various modifications are possible without departing from the spirit of the invention. All technical matters included in the technical concept described in the claims are covered by the present invention. The embodiments described above are preferred examples, but those skilled in the art can realize various alternatives, modifications, variations, or improvements from the contents disclosed herein, and these are included in the technical scope described in the appended claims. [Explanation of Symbols]
[0052] 1 2nd axis 2 1st axis 10 Laser processing equipment 11 Laser Heads 12 Collimator lenses 13 Head Body 14. Focusing lens 16 Liquid supply chamber 17 nozzles 17b spout 17c Liquid column formation chamber 20. First gas introduction channel (gas introduction channel) 21 Outlet pipe 22 Liquid column outlet 28 Mirror 31. Laser Oscillator
Claims
1. A head body extending along the first axis, which is in the vertical direction, A collimator lens that converts the laser emitted from the first end of the head body into parallel light, A liquid supply chamber is located at the second end of the head body, A nozzle for ejecting liquid, having a nozzle opening that faces the liquid supply chamber and is positioned along a second axis which is in a different direction from the first axis, A mirror is positioned at the second end of the head body and reflects parallel light traveling along the first axis so that it travels along the second axis, The second end of the head body includes a focusing lens positioned along the second axis, which focuses parallel light reflected from the mirror through the liquid supply chamber onto the nozzle, A laser processing device having the following features.
2. The nozzle is connected to the nozzle and has a liquid column forming chamber through which the liquid column generated from the nozzle passes. The aforementioned laser processing apparatus is A discharge pipe through which the liquid column passes and which is inserted into the liquid column forming chamber, A gas introduction passage connected to the inside of the liquid column forming chamber, It further has, The laser processing apparatus according to claim 1.
3. The system further comprises a laser oscillator that generates the aforementioned laser. The laser processing apparatus according to claim 1 or 2.
4. It is connected to the aforementioned outlet pipe and further has a liquid column outlet having the same inner diameter as the aforementioned outlet pipe, The laser processing apparatus according to claim 2.
5. The aforementioned gas introduction path is An annular dispersion chamber is positioned radially outward from the nozzle, An annular collection chamber connected to the liquid column forming chamber, Multiple connecting conduits connecting the aforementioned distributed room and the aforementioned collective room, Having, The laser processing apparatus according to claim 4.
6. The multiple connecting pipes are arranged rotationally symmetrically with respect to the second axis of the nozzle. The laser processing apparatus according to claim 5.
7. The connecting conduit extends along a straight line passing through the second axis, The laser processing apparatus according to claim 5.
8. The liquid column forming chamber has a right circular cone centered on the second axis, The aforementioned collection room is connected to the bottom surface of the right circular cone, The laser processing apparatus according to claim 5.
9. A cap having the aforementioned liquid column discharge port, further comprising a cap having a recess at its tip, The laser processing apparatus according to claim 4.
10. The head body further has a recess at its second end that is centered on the second axis and has a liquid column discharge port for ejecting a liquid column. The laser processing apparatus according to claim 1 or 2.
11. The bottom surface is a plane perpendicular to the second axis, The liquid column discharge port is located on the bottom surface, The laser processing apparatus according to claim 8.
12. The recess is frustoconical in shape. The laser processing apparatus according to claim 9.