Organic solvent regeneration method, organic solvent regeneration apparatus, and substrate processing system

JP2026142035AActive Publication Date: 2026-09-07SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
JP2025028889
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-02-26
Publication Date
2026-09-07
Estimated Expiration
2045-02-26

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【0010】 より効率的な分離運転を実現できる。

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Abstract

We provide technology that enables more efficient separation operation. [Solution] The organic solvent regeneration method comprises a recovery step and a separation operation step. In the recovery step, a mixture of organic solvent and water discharged from a substrate processing apparatus that processes substrates is recovered in a recovery tank. In the separation operation step, the mixture is circulated through a circulation path formed by the recovery tank and circulation piping equipped with a membrane separator, and a separation operation is performed in which a vacuum pump reduces the pressure in the second path of the membrane separator, which is separated by a separation membrane from the first path through which the mixture passes, which is interposed in the circulation piping. In the separation operation step, the vacuum pump is controlled by a control set value based on a target concentration for the solvent concentration of the mixture.
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Description

Technical Field

[0001] The present disclosure relates to an organic solvent regeneration method, an organic solvent regeneration apparatus, and a substrate processing system.

Background Art

[0002] Patent Document 1 discloses an IPA recovery system. The IPA recovery system recovers water-containing IPA (isopropyl alcohol) discharged from a processing unit that processes substrates. The IPA recovery system includes a storage tank, a circulation pipe, a pump, and a dehydration unit. The storage tank is supplied with water-containing IPA from the processing unit. The circulation pipe is connected to the storage tank, and returns the water-containing IPA from the storage tank back to the storage tank. The pump is provided in the circulation pipe, and feeds the water-containing IPA from the upstream end to the downstream end of the circulation pipe. The dehydration unit is provided in the circulation pipe. The dehydration unit includes a concentration chamber, a permeation chamber, and a separation membrane that partitions the concentration chamber and the permeation chamber. The concentration chamber is inserted in the circulation pipe. The separation membrane allows water from the concentration chamber to pass through to the permeation chamber, and does not allow IPA to pass through. The permeation chamber is depressurized by a vacuum pump. Thereby, water in the water-containing IPA in the concentration chamber is sucked into the permeation chamber.

[0003] The recovery system circulates the water-containing IPA through a circulation path including the storage tank and the circulation pipe. Through this circulation, the water-containing IPA passes through the concentration chamber of the dehydration unit. When water in the water-containing IPA passes through the separation membrane and flows into the permeation chamber, the IPA concentration of the circulating water-containing IPA increases. That is, through this circulation, water-containing IPA with a high IPA concentration is stored in the storage tank. The water-containing IPA in this storage tank is supplied to the processing unit again. Thereby, the amount of discarded IPA can be reduced.

Prior Art Literature

Patent Literature

[0004]

Patent Document 1

Summary of the Invention

[0005] If the control unit operates the vacuum pump to lower the pressure in the permeation chamber, it will unnecessarily use a large amount of power when the target concentration for IPA is low. This may lead to reduced efficiency.

[0006] Therefore, this disclosure aims to provide a technology that can achieve more efficient separation operation. [Means for solving the problem]

[0007] The organic solvent regeneration method comprises a recovery step of recovering a mixture of organic solvent and water discharged from a substrate processing apparatus that processes substrates in a recovery tank, and a separation operation step of circulating the mixture through a circulation path formed by the recovery tank and circulation piping equipped with a membrane separator, while reducing the pressure in a second path of the membrane separator, which is interposed in the circulation piping and separated by a separation membrane from a first path through which the mixture passes, using a vacuum pump, wherein in the separation operation step, the vacuum pump is controlled by a control set value based on a target concentration for the solvent concentration of the mixture.

[0008] The organic solvent regeneration apparatus includes a recovery tank for storing a mixture of organic solvent and water discharged from a substrate processing apparatus for processing substrates, a circulation pipe connected to the recovery tank, and a membrane separator provided in the circulation pipe. The membrane separator includes a circulation section which is interposed in the circulation pipe and through which the mixture passes, a first path and a second path, and a separation membrane which separates the first path and the second path and allows water in the mixture to pass from the first path to the second path, a separation pipe connected to the second path of the membrane separator, a depressurizing pump which reduces the pressure in the second path through the separation pipe, and a control unit which performs a separation operation in which the mixture is circulated to the circulation section while controlling the depressurizing pump with a control set value based on a target concentration for the solvent concentration of the mixture.

[0009] The substrate processing system comprises the above-mentioned organic solvent regeneration apparatus and the substrate processing apparatus. [Effects of the Invention]

[0010] This enables more efficient separate operation. [Brief explanation of the drawing]

[0011] [Figure 1] Figure 1 is a schematic diagram showing an example of the configuration of a substrate processing system including an organic solvent regeneration device according to the first embodiment. [Figure 2] Figure 2 is a block diagram schematically showing an example of the configuration of the control unit. [Figure 3] Figure 3 is a schematic graph showing an example of the change in solvent concentration over time during separation operation. [Figure 4] Figure 4 is a flowchart showing a first example of the operation of the substrate processing system according to the first embodiment. [Figure 5] Figure 5 is a flowchart showing a first example of a method for determining the separation operation pattern. [Figure 6] Figure 6 is a flowchart showing a second example of the operation of the substrate processing system. [Figure 7] Figure 7 is a flowchart showing a second example of a method for determining the separation operation pattern. [Figure 8] Figure 8 is a graph showing an example of a separate operation pattern. [Figure 9] Figure 9 is a flowchart showing a third example of a method for determining the separation operation pattern. [Figure 10] Figure 10 is a schematic diagram showing a first example of the configuration of a substrate processing system according to the second embodiment. [Figure 11] Figure 11 is a flowchart showing a first example of the operation of the substrate processing system according to the second embodiment. [Figure 12] Figure 12 is a schematic diagram showing a second example of the configuration of a substrate processing system according to the second embodiment. [Figure 13]FIG. 13 is a flowchart showing a second example of the operation of the substrate processing system according to the second embodiment. [Figure 14] FIG. 14 is a diagram schematically showing an example of the configuration of the substrate processing apparatus 1. MODE FOR CARRYING OUT THE INVENTION

[0012] Hereinafter, embodiments will be described in detail with reference to the drawings. In the drawings, for the purpose of easy understanding, the dimensions and numbers of respective parts are exaggerated or simplified as necessary. Portions having similar configurations and functions are denoted by the same reference numerals, and repeated description is omitted in the following description.

[0013] Furthermore, even if ordinal numbers such as "first" or "second" are used in the following description, these terms are used for convenience to facilitate understanding of the content of the embodiments, and are not limited to the order that may be implied by these ordinal numbers.

[0014] When an expression indicating a relative or absolute positional relationship (e.g., "in one direction", "along one direction", "parallel", "perpendicular", "center", "concentric", "coaxial", etc.) is used, unless otherwise specified, said expression shall not only strictly represent such positional relationship, but also represent a state relatively displaced in terms of angle or distance within a tolerance or a range where equivalent functions can be obtained. When an expression indicating an equal state (e.g., "identical", "equal", "homogeneous", etc.) is used, unless otherwise specified, said expression shall not only quantitatively strictly represent an equal state, but also represent a state where there exists a difference within a tolerance or a range where equivalent functions can be obtained. When an expression indicating a shape (e.g., "quadrangular shape" or "cylindrical shape", etc.) is used, unless otherwise specified, said expression shall not only geometrically strictly represent such shape, but also represent a shape having, for example, irregularities, chamfers, etc. within a range where equivalent effects can be obtained. When an expression such as "comprise", "include", "have" or "contain" is used to refer to one component, said expression is not an exclusive expression that excludes the presence of other components. When the expression "at least any one of A, B and C" is used, said expression includes only A, only B, only C, any two of A, B and C, and all of A, B and C.

[0015] <First Embodiment> Figure 1 is a diagram schematically illustrating an example configuration of a substrate processing system 100 including an organic solvent regeneration apparatus 5 according to the first embodiment.

[0016] The substrate processing system 100 includes a substrate processing apparatus 1, an organic solvent regeneration apparatus 5, and a control unit 9. The substrate processing apparatus 1 is a processing apparatus that performs wet processing on a substrate W. The substrate processing apparatus 1 may be a single-sheet type processing apparatus that processes substrates W one by one, or may be a batch-type processing apparatus that processes a plurality of substrates W collectively. In the example of Figure 1, a single-sheet type processing apparatus is schematically illustrated.

[0017] The substrate W is, for example, a semiconductor wafer, a substrate for liquid crystal displays, an organic electroluminescence (EL) substrate, a flat panel display (FPD) substrate, an optical display substrate, a magnetic disk substrate, an optical disk substrate, a magneto-optical disk substrate, a photomask substrate, or a solar cell substrate. The substrate W has a thin, flat shape. In the following, the substrate W is assumed to be a semiconductor wafer. As an example, the substrate W is a silicon substrate. The substrate W has, for example, a disc shape. The diameter of the substrate W is, for example, about 300 mm, and the thickness of the substrate W is, for example, about 0.5 mm or more and about 3 mm or less.

[0018] The substrate processing apparatus 1 supplies various processing liquids to the substrate W and performs processing on the substrate W according to the type of processing liquid. An example of the specific configuration of the substrate processing apparatus 1 will be outlined in the third embodiment, but for example, the substrate processing apparatus 1 supplies pure water (deionized water) and an organic solvent to the substrate W. As an example, the substrate processing apparatus 1 supplies pure water to the substrate W, and then supplies an organic solvent. By supplying pure water to the substrate W, the substrate processing apparatus 1 can wash away any objects adhering to the substrate W (either solids such as particles or liquids such as chemical solutions) with pure water. Next, by supplying an organic solvent to the substrate W, the substrate processing apparatus 1 can replace the liquid adhering to the substrate W from pure water to the rinsing liquid. The organic solvent is, for example, an organic solvent that is more volatile than pure water or an organic solvent with low surface tension, and a specific example is IPA (isopropyl alcohol). Next, the substrate processing apparatus 1 dries the substrate W. When the substrate W is dried, an organic solvent with high volatility or low surface tension is adhering to the substrate W. Therefore, the substrate processing apparatus 1 can dry the substrate W more quickly, or while avoiding the collapse of the patterns on the substrate W.

[0019] The mixture of organic solvent and water used to process the substrate W is discharged from the substrate processing apparatus 1 to the organic solvent regeneration apparatus 5 through the recovery pipe 51. In other words, the recovery pipe 51 connects the substrate processing apparatus 1 and the organic solvent regeneration apparatus 5. The substrate processing apparatus 1 is installed, for example, on an upper floor (above the floor) of the factory, and the organic solvent regeneration apparatus 5 is installed, for example, on a lower floor (below the floor) of the factory.

[0020] The organic solvent regeneration device 5 performs a separation operation to separate water from the mixture and increase the concentration of the organic solvent in the mixture. A detailed example of the configuration of the organic solvent regeneration device 5 and a detailed example of the separation operation will be described later. In the following, the concentration of the organic solvent in the mixture will also be referred to as the solvent concentration.

[0021] The control unit 9 controls the substrate processing system 100. In other words, the control unit 9 controls the various configurations of the substrate processing apparatus 1 and the organic solvent regeneration apparatus 5. Figure 2 is a schematic block diagram showing an example of the configuration of the control unit 9. The control unit 9 is an electronic circuit and includes, for example, an arithmetic processing unit 91 and a memory unit 92. In the specific example in Figure 2, the arithmetic processing unit 91 and the memory unit 92 are interconnected via a bus 93. The arithmetic processing unit 91 is, for example, a CPU (Central Processor Unit). The memory unit 92 may include a non-temporary memory unit (e.g., ROM (Read Only Memory)) 921 and a temporary memory unit (e.g., RAM (Random Access Memory)) 922. The non-temporary memory unit 921 may store, for example, a program that defines the processing to be executed by the control unit 9. By executing this program, the arithmetic processing unit 91 enables the control unit 9 to execute the processing defined in the program. Of course, some or all of the processing performed by the control unit 9 may be performed by hardware such as dedicated logic circuits.

[0022] As shown in Figure 2, the control unit 9 may be electrically connected to the storage unit 94. The storage unit 94 is a non-temporary storage unit and may be, for example, a memory or a hard disk. In the example in Figure 2, the storage unit 94 stores the operation pattern data D1 and the power data D2. The operation pattern data D1 and the power data D2 will be described in detail later.

[0023] In the example shown in Figure 1, the substrate processing system 100 includes a display unit 951. The display unit 951 is, for example, a liquid crystal display unit or an organic EL (Electro-Luminescence) display unit. The display unit 951 is controlled by a control unit 9 and displays various data. In the example shown in Figure 1, the substrate processing system 100 also includes an input unit 952. The input unit 952 receives input from the user. The input unit 952 outputs the input information to the control unit 9. The input unit 952 is an input device that includes, for example, at least one of a keyboard, mouse, microphone, and image sensor. The display unit 951 and the input unit 952 can form a user interface 95.

[0024] As shown in Figure 1, the organic solvent regeneration apparatus 5 includes a recovery tank Tk1, a circulation unit 60, a separation pipe 71, and a pressure reducing pump 75.

[0025] The downstream end of the recovery piping 51 is connected to the recovery tank Tk1. The mixed liquid discharged from the substrate processing apparatus 1 flows into the recovery tank Tk1 through the recovery piping 51. The recovery tank Tk1 stores the mixed liquid. In the example in Figure 1, a recovery valve 52 is provided in the recovery piping 51. The recovery valve 52 is controlled by the control unit 9, which switches the opening and closing of the recovery piping 51. Although not shown in Figure 1, a buffer tank may be provided between the recovery tank Tk1 and the substrate processing apparatus 1. For example, the buffer tank may be provided between the substrate processing apparatus 1 and the recovery valve 52.

[0026] Since the mixture of pure water and organic solvent used to treat the substrate W flows into the recovery tank Tk1, the solvent concentration in the mixture in the recovery tank Tk1 is initially low. Hereafter, the solvent concentration of the mixture before the separation operation will also be referred to as the initial concentration. For example, the initial concentration may be 80% or less, 70% or less, or 60% or less. The initial concentration may be even lower.

[0027] The organic solvent regeneration device 5 may include a storage volume sensor Sn2. The storage volume sensor Sn2 measures the amount of the mixed liquid stored in the recovery tank Tk1 and outputs an electrical signal indicating the measurement result to the control unit 9. The storage volume sensor Sn2 may also be a liquid level sensor that detects the height of the liquid level of the mixed liquid in the recovery tank Tk1. The control unit 9 may perform a separation operation when the amount of the mixed liquid stored in the recovery tank Tk1 exceeds a predetermined standard recovery amount.

[0028] The circulation unit 60 includes a circulation pipe 61 and a membrane separator 62. The circulation pipe 61 is connected to the recovery tank Tk1. The circulation pipe 61 is the pipe that returns the mixed liquid from the recovery tank Tk1 to the recovery tank Tk1. In other words, the upstream and downstream ends of the circulation pipe 61 are connected to the recovery tank Tk1. The recovery tank Tk1 and the circulation pipe 61 form a circulation path through which the mixed liquid circulates. In the example in Figure 1, the upstream end of the circulation pipe 61 is connected to the bottom of the recovery tank Tk1, and the downstream end of the circulation pipe 61 is connected to the top of the recovery tank Tk1.

[0029] In the example shown in Figure 1, a liquid delivery unit 63 is provided in the circulation piping 61. The liquid delivery unit 63 delivers the processed liquid from the upstream end to the downstream end of the circulation piping 61. The liquid delivery unit 63 is, for example, a liquid delivery pump and is controlled by the control unit 9. The liquid delivery pump may be, for example, a magnetic levitation pump.

[0030] In the example shown in Figure 1, a circulation valve 64 is provided in the circulation piping 61. The circulation valve 64 is controlled by the control unit 9 to switch the opening and closing of the circulation piping 61. In the example shown in Figure 1, the circulation valve 64 is located on the downstream end side of the circulation piping 61 relative to the liquid supply unit 63.

[0031] The membrane separator 62 is installed in the circulation piping 61 and separates water from the mixed liquid. Specifically, the membrane separator 62 includes a casing, and within the casing, it includes a first path 62a, a second path 62b, and a separation membrane 62c. The first path 62a is interposed in the circulation piping 61 and constitutes part of the circulation path of the circulation section 60. Therefore, the mixed liquid passes through the first path 62a. The separation membrane 62c separates the first path 62a and the second path 62b. The separation membrane 62c is a membrane that allows water from the mixed liquid to pass from the first path 62a to the second path 62b and almost completely blocks the organic solvent. In this way, the membrane separator 62 separates water from the mixed liquid.

[0032] The separation membrane 62c may be a zeolite membrane, an organic separation membrane, or a CNT (carbon nanotube) separation membrane. The zeolite membrane may be, for example, a tetrahedral (SiO4) membrane. 4- ) and (AlO4) 5- The membrane has a crystalline structure in which the elements are interconnected. Organic separation membranes are, for example, organic membranes such as polyvinyl alcohol, chitosan, and polyimide. CNT separation membranes are, for example, membranes obtained by adding carbon nanotubes to a membrane such as polyamide. Alternatively, a two-dimensional material may be used as the material for the separation membrane 62c. The two-dimensional material is a material composed of one atomic layer, and may be, for example, molybdenum sulfide (MoS2), or a composite atomic layer compound of an early transition metal (such as titanium or vanadium) and a light element (carbon or nitrogen). Alternatively, a MOF (Metal Organic Frameworks) material or a carbon material (for example, graphene or graphene oxide) may be used as the material for the separation membrane 62c. Here, a zeolite membrane is used as the separation membrane 62c.

[0033] The separation pipe 71 is connected to the membrane separator 62, and the water separated by the membrane separator 62 flows through it. Specifically, the upstream end of the separation pipe 71 is connected to the second path 62b of the membrane separator 62. Therefore, water that has passed through the separation membrane 62c flows into the separation pipe 71. Hereafter, the fluid separated from the mixed liquid by the membrane separator 62 will also be called the separated fluid. The separated fluid mainly contains water. The separated fluid may contain small amounts of organic solvent.

[0034] The pressure reducing pump 75 reduces the pressure in the second path 62b through the separation piping 71. In the example in Figure 1, the separation piping 71 is connected to a separation tank Tk2. The separation fluid separated by the membrane separator 62 flows into the separation tank Tk2. The separation tank Tk2 stores the separation fluid. Hereafter, the portion of the separation piping 71 between the membrane separator 62 and the separation tank Tk2 will also be referred to as piping section 711, and the portion downstream of the separation tank Tk2 will also be referred to as piping section 712. In the example in Figure 1, the upstream end of piping section 711 is connected to the second path 62b, and the downstream end of piping section 711 is connected to the ceiling of the separation tank Tk2. The downstream opening of piping section 711 is above the liquid level of the separation fluid inside the separation tank Tk2. In the example in Figure 1, the upstream end of piping section 712 is connected to the bottom of the separation tank Tk2.

[0035] In the example shown in Figure 1, the upstream end of the pressure reducing pipe 74 is also connected to the separation tank Tk2. For example, the upstream end of the pressure reducing pipe 74 is connected to the ceiling of the separation tank Tk2. The upstream port of the pressure reducing pipe 74 opens above the liquid level of the separation fluid inside the separation tank Tk2. A pressure reducing pump 75 is connected to the pressure reducing pipe 74. The pressure reducing pump 75 is controlled by the control unit 9. When the pressure reducing pump 75 is activated, the gas in the second path 62b of the membrane separator 62 is drawn to the pressure reducing pump 75 through the piping section 711, the separation tank Tk2, and the pressure reducing pipe 74 in that order. As a result, the pressure in the second path 62b of the membrane separator 62 decreases, and the water in the mixed liquid in the first path 62a is effectively drawn into the second path 62b through the separation membrane 62c.

[0036] In the example shown in Figure 1, a separation valve 721 is provided in the piping portion 711 of the separation pipe 71. The separation valve 721 is controlled by the control unit 9 to switch the opening and closing of the piping portion 711. In the example shown in Figure 1, a separation valve 722 is provided in the piping portion 712 of the separation pipe 71. The separation valve 722 is controlled by the control unit 9 to switch the opening and closing of the piping portion 712.

[0037] In the example shown in Figure 1, a temperature controller 65 is provided in the circulation piping 61. The temperature controller 65 adjusts the temperature of the mixed liquid flowing through the circulation piping 61. For example, the temperature controller 65 may include a heater. The heater may be an electrically resistive heater with a heating wire, an optical heater that emits heating light (e.g., infrared rays), or an electronic cooling unit with a Peltier element. By heating the mixed liquid with the temperature controller 65, a high-temperature mixed liquid can be introduced into the membrane separator 62. Since the speed of molecules in the mixed liquid is higher at higher temperatures, water molecules in the high-temperature mixed liquid can easily pass through the separation membrane 62c. Therefore, the membrane separator 62 can separate the separation fluid from the mixed liquid with higher efficiency. The temperature controller 65 is controlled by the control unit 9.

[0038] In the example shown in Figure 1, the membrane separator 62 is located on the downstream end side of the circulation piping 61 relative to the circulation valve 64. Also in the example shown in Figure 1, the temperature controller 65 is located on the upstream end side of the circulation piping 61 relative to the membrane separator 62. As a result, since the temperature controller 65 is located on the inflow side of the membrane separator 62, the temperature of the mixed liquid flowing into the membrane separator 62 can be adjusted with greater precision. As a specific example, the temperature controller 65 may be located between the circulation valve 64 and the membrane separator 62.

[0039] When the mixture is heated by the temperature controller 65, more vapor from the mixture can flow through the circulation piping 61. In other words, more water vapor and organic solvent vapor can flow through the circulation piping 61. As a result, water vapor can pass through the separation membrane 62c of the membrane separator 62 and flow into the separation piping 71. In other words, the separated fluid may contain water vapor.

[0040] Therefore, as shown in Figure 1, a cooler 73 may be provided in the piping portion 711 of the separation piping 71. Separation fluid flows into the cooler 73. The cooler 73 cools the separation fluid and condenses it. The cooler 73 may include, for example, a heat exchanger (not shown) and a refrigerant supply source (not shown) that supplies refrigerant to the heat exchanger. The heat exchanger has a separation path through which the separation fluid passes and a refrigerant path through which the refrigerant passes. The separation fluid in the separation path is cooled by heat exchange with the refrigerant in the refrigerant path. The refrigerant supply source cools the refrigerant flowing in from the heat exchanger and supplies the cooled refrigerant to the heat exchanger. The refrigerant supply source may be, for example, a heat pump. The separation fluid (i.e., separation liquid) condensed in the cooler 73 is supplied to the separation tank Tk2 and stored in the separation tank Tk2.

[0041] The control unit 9 controls the various components of the organic solvent regeneration device 5 to perform separation operation. As a specific example, the control unit 9 opens the circulation valve 64 and the separation valve 721, and activates the temperature controller 65, the liquid supply unit 63, the cooler 73, and the pressure reducing pump 75 to perform separation operation. As a result, the mixed liquid circulates through a circulation path including the recovery tank Tk1 and the circulation piping 61. Through this circulation, the mixed liquid continues to pass through the membrane separator 62. The pressure reducing pump 75 reduces the pressure in the second path 62b, so that mainly water (including water vapor) in the mixed liquid is drawn from the first path 62a through the separation membrane 62c to the second path 62b. As a result, the membrane separator 62 continues to separate the separation fluid (mainly water) from the mixed liquid, and the separation fluid continues to be discharged through the separation piping 71. Therefore, the solvent concentration of the mixed liquid in the circulation path increases over time.

[0042] In the example shown in Figure 1, the organic solvent regeneration device 5 includes a concentration sensor Sn1. The concentration sensor Sn1 measures the solvent concentration of the mixed liquid and outputs an electrical signal indicating the measurement result to the control unit 9. In the example shown in Figure 1, the concentration sensor Sn1 is installed in the circulation piping 61. As a specific example, the concentration sensor Sn1 is installed on the downstream end side of the circulation piping 61 relative to the membrane separator 62. The concentration sensor Sn1 measures the solvent concentration of the mixed liquid flowing through the circulation piping 61. Since the solvent concentration of the mixed liquid flowing through the circulation piping 61 is approximately equal to the solvent concentration of the mixed liquid in the recovery tank Tk1, the concentration sensor Sn1 can indirectly measure the solvent concentration of the mixed liquid in the recovery tank Tk1. The control unit 9 may stop the separation operation when the solvent concentration measured by the concentration sensor Sn1 becomes equal to or greater than the target concentration.

[0043] As a result of the separation operation described above, a mixed liquid with a solvent concentration equal to or greater than the target concentration is stored in the recovery tank Tk1. Hereafter, the mixed liquid with a solvent concentration equal to or greater than the target concentration will also be referred to as the concentrated liquid.

[0044] In the example shown in Figure 1, the organic solvent regeneration device 5 includes a concentrated liquid supply unit 80. The concentrated liquid supply unit 80 supplies the concentrated liquid from the recovery tank Tk1 to the outside. Here, "outside" refers to the outside of the organic solvent regeneration device 5. The concentrated liquid supply unit 80 may also supply the concentrated liquid to the substrate processing device 1. The substrate processing device 1 supplies the concentrated liquid to the substrate W. As a result, the substrate processing system 100 can reuse the organic solvent. In other words, the organic solvent regeneration device 5 contributes to saving organic solvent.

[0045] In the example shown in Figure 1, the concentrated liquid supply unit 80 includes a supply pipe 81 and a supply valve 82. In the example shown in Figure 1, the upstream end of the supply pipe 81 is connected to the circulation pipe 61 between the liquid delivery unit 63 and the circulation valve 64. The downstream end of the supply pipe 81 is connected to the outside. The supply valve 82 is provided on the supply pipe 81. The supply valve 82 is controlled by the control unit 9 to switch the opening and closing of the supply pipe 81.

[0046] The control unit 9 opens the supply valve 82 and activates the liquid delivery unit 63 while the concentrated liquid is stored in the recovery tank Tk1. This supplies the concentrated liquid from the recovery tank Tk1 to the outside through the supply pipe 81. At this time, the control unit 9 may stop the circulation of the circulation unit 60. In other words, the organic solvent regeneration device 5 can supply the concentrated liquid to the outside while the separation operation is stopped. The upstream end of the supply pipe 81 may be connected to, for example, the bottom of the recovery tank Tk1. In this case, a separate liquid delivery unit from the liquid delivery unit 63 is provided on the supply pipe 81.

[0047] As described above, the organic solvent regeneration device 5 performs a separation operation to increase the solvent concentration of the mixed liquid discharged from the substrate processing device 1.

[0048] Next, the relationship between the pressure in the second path 6bc of the membrane separator 62 during separation operation and the solvent concentration will be explained. Figure 3 is a schematic graph showing an example of the time change of the solvent concentration during separation operation. In the example in Figure 3, multiple graphs G1 to G3 are shown. Graphs G1 to G3 can be obtained, for example, by simulation or experiment. Graphs G1 to G3 are graphs obtained under different operating conditions of the vacuum pump 75. In other words, graphs G1 to G3 are graphs obtained under different pressures in the second path 62b controlled by the vacuum pump 75. More specifically, graph G1 shows the time change of the solvent concentration when the pressure in the second path 62b is at its lowest, and graph G3 shows the time change of the solvent concentration when the pressure in the second path 62b is at its highest. The target pressure range for the second path 62b may be, for example, 100 kPa or less.

[0049] As can be seen from Figure 3, the solvent concentration during separation operation increases over time and eventually converges. The concentration convergence value is higher the lower the pressure in the second path 62b. This concentration convergence value is mainly determined by the pressure in the second path 62b. Hereafter, the change in solvent concentration over time will also be referred to as the separation operation pattern. Since the separation operation pattern differs depending on the pressure in the second path 62b, it can be said that the separation operation pattern depends on the operating state of the vacuum pump 75.

[0050] The control unit 9 controls the pressure reducing pump 75 based on the control setpoint described below. The control setpoint is a setpoint (target value) correlated with the pressure in the second path 62b, and may be, for example, a target pressure indicating a target value for the pressure in the second path 62b. For example, a pressure sensor for measuring the pressure in the second path 62b may be provided, and the control unit 9 may control the pressure reducing pump 75 so that the pressure measured by the pressure sensor approaches the target pressure. Alternatively, the control setpoint may be, for example, a target speed indicating a target value for the rotational speed of the pressure reducing pump 75. For example, a speed sensor (which may also be called an encoder) for measuring the rotational speed of the pressure reducing pump 75 may be provided, and the control unit 9 may control the pressure reducing pump 75 so that the speed measured by the speed sensor approaches the target speed. The higher the rotational speed, the more the pressure reducing pump 75 can reduce the pressure in the second path 62b.

[0051] The multiple separation operation patterns show the time change in solvent concentration when separation operations are performed while controlling the vacuum pump 75 with different control setpoints. For example, the separation operation pattern in graph G1 shows the time change in solvent concentration when separation operations are performed with the control setpoint that results in the lowest pressure in the second path 62b. In other words, each separation operation pattern corresponds to a control setpoint.

[0052] In this embodiment, the control unit 9 controls the vacuum pump 75 with a control set value based on a target solvent concentration. Target concentration data, for example, is pre-set and input to the control unit 9. For example, a user may input the target concentration to the control unit 9 using the user interface 95. Alternatively, an external device may transmit the target concentration data to the substrate processing apparatus 1 (control unit 9) via wired or wireless connection.

[0053] The control unit 9 circulates the mixed liquid in the circulation unit 60 while controlling the vacuum pump 75 with a control set value corresponding to the target concentration to perform separation operation. Specifically, the control unit 9 controls the vacuum pump 75 with one of the control set values ​​corresponding to separation operation patterns in which the concentration convergence value is equal to or greater than the target concentration. In the example in Figure 3, target concentrations TC1, TC2, and TC3 are also shown. Target concentration TC1 is lower than the concentration convergence value in graph G1 and higher than the concentration convergence values ​​in graphs G2 and G3. Target concentration TC1 may be set to, for example, 99 wt% or higher. Target concentration TC2 is lower than target concentration TC1. In the example in Figure 3, target concentration TC2 is lower than the concentration convergence values ​​in graphs G1 and G2 and higher than the concentration convergence value in graph G3. Target concentration TC2 may be set to, for example, around 95 wt%. Target concentration TC3 is lower than target concentration TC2. In the example in Figure 3, target concentration TC3 is lower than the concentration convergence values ​​in graphs G1 to G3. The target concentration TC3 can be set to, for example, around 90 wt%.

[0054] For example, when the target concentration is target concentration TC1, the control unit 9 controls the vacuum pump 75 with a control setting value corresponding to the first separation operation pattern in graph G1. When the target concentration is target concentration TC2, the control unit 9 controls the vacuum pump 75 with a control setting value corresponding to the first separation operation pattern or the second separation operation pattern in graph G2. When the target concentration is target concentration TC3, the control unit 9 controls the vacuum pump 75 with a control setting value corresponding to either the first separation operation pattern, the second separation operation pattern, or the third separation operation pattern in graph G3. This allows the organic solvent regeneration device 5 to more reliably raise the solvent concentration of the mixed liquid to above the target concentration.

[0055] Figure 4 is a flowchart showing a first example of the operation of the substrate processing system 100 according to the first embodiment. In the example in Figure 4, the target concentration of the mixed solution is first set (step S1: target concentration setting step). As a specific example, the user inputs the target concentration to the control unit 9 using the user interface 95.

[0056] Next, the control unit 9 controls the substrate processing apparatus 1 to start processing the substrate W (step S2: substrate processing start step: recovery step). As a result, the substrate processing apparatus 1 supplies pure water and organic solvent to the substrate W. The pure water and organic solvent used to process the substrate W are discharged from the substrate processing apparatus 1 through the recovery pipe 51 to the recovery tank Tk1. In other words, the mixture of organic solvent and water discharged from the substrate processing apparatus 1 is recovered in the recovery tank Tk1. Therefore, the amount of the mixture stored in the recovery tank Tk1 increases over time.

[0057] Next, the control unit 9 determines whether the amount of mixed liquid stored in the recovery tank Tk1 is equal to or greater than the standard recovery amount (step S3: storage amount determination step). For example, the storage amount sensor Sn2 measures the amount of mixed liquid stored in the recovery tank Tk1 and outputs the measurement result to the control unit 9. The control unit 9 compares the amount of mixed liquid stored by the storage amount sensor Sn2 with a pre-set standard recovery amount. If the storage amount is still less than the standard recovery amount, the control unit 9 executes step S3 again.

[0058] When the amount of the mixed liquid stored, as measured by the storage amount sensor Sn2, is equal to or greater than the standard recovery amount, the control unit 9 causes the organic solvent regeneration device 5 to start separation operation. First, the control unit 9 may close the recovery valve 52. In this case, the mixed liquid from the substrate processing device 1 may be recovered into another recovery tank. For example, the control unit 9 may recover the mixed liquid into another recovery tank by opening a valve in a branch pipe (not shown) that branches off from the recovery pipe 51 and is connected to another recovery tank. Alternatively, if a buffer tank is provided in the recovery pipe 51 between the substrate processing device 1 and the recovery valve 52, the buffer tank recovers the mixed liquid.

[0059] Next, the control unit 9 determines a separation operation pattern based on the target concentration set in step S1 (step S4: separation operation pattern determination step). For example, the control unit 9 adopts a separation operation pattern in which the concentration convergence value is equal to or greater than the target concentration. For example, when the target concentration is target concentration TC1, the control unit 9 determines the separation operation pattern to be the first separation operation pattern. In other words, the control unit 9 circulates the mixed liquid in the circulation unit 60 while controlling the pressure reducing pump 75 with a control setting value corresponding to the first separation operation pattern to perform the separation operation (step S5: separation operation step). Specifically, the control unit 9 opens the circulation valve 64 and the separation valve 721, activates the temperature controller 65, the liquid supply unit 63 and the cooler 73, and controls the pressure reducing pump 75 with a control setting value corresponding to the first separation operation pattern. In other words, the control unit 9 controls the pressure reducing pump 75 with a control setting value based on the target concentration TC1.

[0060] Furthermore, for example, when the target concentration is the target concentration TC2, the control unit 9 determines the separation operation pattern to be the second separation operation pattern. In other words, the control unit 9 circulates the mixed liquid in the circulation unit 60 while controlling the pressure reducing pump 75 with control setpoints corresponding to the second separation operation pattern, thereby performing the separation operation (step S6: separation operation step). Specifically, the control unit 9 opens the circulation valve 64 and the separation valve 721, activates the temperature controller 65, the liquid supply unit 63 and the cooler 73, and controls the pressure reducing pump 75 with control setpoints corresponding to the second separation operation pattern. In other words, the control unit 9 controls the pressure reducing pump 75 with control setpoints based on the target concentration TC2.

[0061] Furthermore, for example, when the target concentration is the target concentration TC3, the control unit 9 determines the separation operation pattern to be the third separation operation pattern. In other words, the control unit 9 circulates the mixed liquid in the circulation unit 60 while controlling the pressure reducing pump 75 with control setpoints corresponding to the third separation operation pattern, thereby performing the separation operation (step S7: separation operation step). Specifically, the control unit 9 opens the circulation valve 64 and the separation valve 721, activates the temperature controller 65, the liquid supply unit 63 and the cooler 73, and controls the pressure reducing pump 75 with control setpoints corresponding to the third separation operation pattern. In other words, the control unit 9 controls the pressure reducing pump 75 with control setpoints based on the target concentration TC3.

[0062] If the solvent concentration of the mixed liquid in the recovery tank Tk1 exceeds the target concentration due to any of the separation operations from step S5 to step S7, the control unit 9 stops the separation operation. For example, the control unit 9 stops the separation operation when the solvent concentration measured by the concentration sensor Sn1 is equal to or greater than the target concentration. Specifically, the control unit 9 closes the circulation valve 64 and the separation valve 721, and stops the temperature controller 65, the liquid supply unit 63, the cooler 73, and the pressure reducing pump 75.

[0063] Next, the organic solvent regeneration device 5 supplies the concentrated liquid in the recovery tank Tk1 to the outside (step S8: concentrated liquid supply step). Specifically, the control unit 9 opens the supply valve 82 and activates the liquid delivery unit 63. As a result, the concentrated liquid in the recovery tank Tk1 is supplied to the outside through the supply pipe 81.

[0064] As described above, the control unit 9 controls the vacuum pump 75 in the separation operation with a control setting value corresponding to the separation operation pattern in which the concentration convergence value is equal to or greater than the target concentration. Therefore, the organic solvent regeneration device 5 can more reliably bring the solvent concentration of the mixed liquid to a level equal to or greater than the target concentration.

[0065] Incidentally, the power of the pressure reducing pump 75 changes depending on the control setting value. For example, if the control setting value is the target pressure, the lower the target pressure, the higher the power of the pressure reducing pump 75 tends to be. If the control setting value is the target speed of the pressure reducing pump 75, the higher the target speed, the higher the power of the pressure reducing pump 75 tends to be.

[0066] Therefore, the control unit 9 may control the vacuum pump 75 with a control setting value that lowers the pressure in the second path 62b as the target concentration increases. For example, when the target concentration is target concentration TC1, the control unit 9 controls the vacuum pump 75 with a control setting value corresponding to the first separation operation pattern (step S5), when the target concentration is target concentration TC2, it controls the vacuum pump 75 with a control setting value corresponding to the second separation operation pattern (step S6), and when the target concentration is target concentration TC3, it controls the vacuum pump 75 with a control setting value corresponding to the third separation operation pattern (step S7). According to this, when the target concentration is high, the pressure in the second path 62b is low, so the organic solvent regeneration device 5 can more reliably raise the solvent concentration of the mixed liquid to above the target concentration. On the other hand, when the target concentration is low, the organic solvent regeneration device 5 can control the vacuum pump with lower power. Therefore, more efficient operation can be achieved.

[0067] Furthermore, as can be seen from Figure 3, the minimum operating time required for the solvent concentration of the mixture to reach the target concentration varies depending on the separation operation pattern, i.e., the control set value. For example, when the target concentration is target concentration TC3, the minimum operating time t31 corresponding to the first separation operation pattern is the shortest, the minimum operating time t33 corresponding to the third separation operation pattern is the longest, and the minimum operating time t32 corresponding to the second separation operation pattern is longer than the minimum operating time t31 and shorter than the minimum operating time t33. In other words, the lower the pressure in the second path 6bc, the shorter the minimum operating time. To put it another way, the lower the target pressure or the higher the target speed, the shorter the minimum operating time.

[0068] As described above, the power consumption and minimum operating time of the vacuum pump 75 depend on the separation operation pattern. Therefore, the amount of electricity required to reach the target solvent concentration (= power consumption × minimum operating time) also depends on the separation operation pattern. In the following, the amount of electricity required to achieve the target concentration will also be referred to as the required amount of electricity.

[0069] In this embodiment, the control unit 9 selects a separation operation pattern from among multiple separation operation patterns to be used for the separation operation. Therefore, the control unit 9 can also adopt a separation operation pattern that requires less power. As a result, the organic solvent regeneration device 5 can raise the solvent concentration of the mixed liquid to above the target concentration with less power.

[0070] For example, the control unit 9 may calculate the required power for each control setting value of the vacuum pump 75 (i.e., each separation operation pattern) and control the vacuum pump 75 with the control setting value that requires the least amount of power. For example, the memory unit 94 has operation pattern data D1 and power data D2 stored in advance (see also Figure 2). Operation pattern data D1 is data that shows the separation operation pattern, which is the time change of solvent concentration during separation operation, for each control setting value. Power data D2 is data that shows the power of the vacuum pump 75 for each control setting value (i.e., each separation operation pattern). Operation pattern data D1 and power data D2 are set in advance, for example, by simulation or experiment.

[0071] Figure 5 is a flowchart showing a first example of a method for determining the separation operation pattern. The control unit 9 calculates the required power for each separation operation pattern based on the target concentration, operation pattern data D1, and power data D2 (step S40). For example, first the control unit 9 calculates the minimum operating time for each separation operation pattern based on the target concentration and operation pattern data D1 (step S41). The minimum operating time may be, for example, the time when the solvent concentration matches the target concentration in each separation operation pattern (see also Figure 3).

[0072] As a specific example, if the target concentration is target concentration TC3, the control unit 9 calculates the minimum operating time t31 corresponding to the first separation operation pattern, the minimum operating time t32 corresponding to the second separation operation pattern, and the minimum operating time t33 corresponding to the third separation operation pattern. If the target concentration is target concentration TC2, the control unit 9 calculates the minimum operating time t21 corresponding to the first separation operation pattern and the minimum operating time t22 corresponding to the second separation operation pattern. Since the concentration convergence value for the third separation operation pattern is lower than the target concentration TC2, the minimum operating time for the third separation operation pattern is not calculated. If the target concentration is target concentration TC1, the control unit 9 calculates the minimum operating time t11 corresponding to the first separation operation pattern. Since the concentration convergence value for the third separation operation pattern in the second separation operation pattern is lower than the target concentration TC1, the minimum operating times for the second and third separation operation patterns are not calculated.

[0073] Next, the control unit 9 calculates the required power for each separation operation pattern based on the calculated minimum operating time and power data D2 (step S42). As an example, the case where a target concentration TC3 is set will be described. The control unit 9 calculates the required power for the first separation operation pattern by multiplying the minimum operating time t31 corresponding to the first separation operation pattern by the power corresponding to the first separation operation pattern. The same applies to the second and third separation operation patterns. As a result, the control unit 9 can obtain the required power for the pressure reducing pump 75 when separation operation is performed in the first separation operation pattern, the required power for the pressure reducing pump 75 when separation operation is performed in the second separation operation pattern, and the required power for the pressure reducing pump 75 when separation operation is performed in the third separation operation pattern.

[0074] Next, the control unit 9 adopts an isolated operation pattern corresponding to the power requirement that is smaller than the average power requirement among these multiple power requirements (step S43). As a more specific example, the control unit 9 adopts an isolated operation pattern corresponding to the minimum power requirement among the multiple power requirements.

[0075] Then, the control unit 9 controls the pressure reducing pump 75 with a control setting value corresponding to the separation operation pattern adopted in step S43 (any of steps S5 to S7).

[0076] As described above, the control unit 9 calculates the required power for each separation operation pattern and controls the vacuum pump 75 with a control setting value that minimizes the required power. Therefore, the organic solvent regeneration device 5 can increase the solvent concentration of the mixed liquid with less power consumption.

[0077] Incidentally, the solvent concentration of the mixed solution discharged from the substrate processing apparatus 1 depends on the processing method (recipe) of the substrate W by the substrate processing apparatus 1. For example, if the substrate processing apparatus 1 supplies pure water to the substrate W at a larger flow rate and for a longer period of time, the solvent concentration of the mixed solution discharged from the substrate processing apparatus 1 will be lower. On the other hand, if the substrate processing apparatus 1 supplies organic solvent to the substrate W at a larger flow rate and for a longer period of time, the solvent concentration of the mixed solution discharged from the substrate processing apparatus 1 will be higher. For this reason, it is conceivable that the initial concentration of the mixed solution discharged from the substrate processing apparatus 1 may vary. For example, the initial concentration may vary if the recipe is changed.

[0078] Furthermore, the minimum operating time required to raise the solvent concentration of the mixed liquid in the recovery tank Tk1 to the target concentration or higher also depends on the initial concentration. Specifically, the lower the initial concentration, the longer the minimum operating time. Therefore, the control unit 9 may calculate the minimum operating time based not only on the target concentration and operating pattern data D1, but also on the initial concentration.

[0079] Figure 6 is a flowchart showing a second example of the operation of the substrate processing system 100. In the example in Figure 6, steps S11 to S19 are executed. Steps S11 to S13 are the same as steps S1 to S3, respectively.

[0080] In step S13, if the amount of stored liquid measured by the storage amount sensor Sn2 is equal to or greater than the standard recovery amount, the concentration sensor Sn1 measures the initial concentration in the recovery tank Tk1 (step S14). For example, the control unit 9 stops the pressure reducing pump 75 and keeps the separation valve 721 closed, while circulating the mixed liquid in the circulation unit 60. Specifically, the control unit 9 opens the circulation valve 64 and operates the liquid delivery unit 63. This causes the mixed liquid to circulate through the circulation path. The control unit 9 does not need to operate the temperature controller 65. Then, the concentration sensor Sn1 measures the solvent concentration of the circulating mixed liquid. In this way, the concentration sensor Sn1 can indirectly measure the initial concentration of the mixed liquid in the recovery tank Tk1.

[0081] Next, the control unit 9 determines the separation operation pattern (step S15). Figure 7 is a flowchart showing a second example of the method for determining the separation operation pattern. Based on the target concentration, initial concentration, operation pattern data D1, and power data D2, the control unit 9 calculates the required power for each separation operation pattern (step S150). For example, first, the control unit 9 calculates the minimum operating time for each operation pattern based on the initial concentration, target concentration, and operation pattern data D1 (step S151). Figure 8 is a graph showing an example of a separation operation pattern. In Figure 8, the initial concentration C0 and target concentration TC3 are also shown. The minimum operating time is the time from the time when the solvent concentration matches the initial concentration C0 to the time when it matches the target concentration for each separation operation pattern.

[0082] For example, if the target concentration is TC3, the control unit 9 calculates the minimum operating time t31 corresponding to the first separation operation pattern, the minimum operating time t32 corresponding to the second separation operation pattern, and the minimum operating time t33 corresponding to the third separation operation pattern. Specifically, the control unit 9 calculates the time from the time corresponding to the initial concentration C0 to the time corresponding to the target concentration TC3 in the first separation operation pattern (graph G1) as the minimum operating time t31. The same applies to the minimum operating times t32 and t33.

[0083] Next, the control unit 9 calculates the required power for each isolated operation pattern based on the minimum operating time and power data D2, similar to step S42 (step S152).

[0084] Next, the control unit 9, similar to step S43, adopts a separate operation pattern corresponding to the power requirement that is smaller than the average power requirement among these multiple power requirements (step S153).

[0085] Then, the control unit 9 controls the pressure reducing pump 75 with control setting values ​​corresponding to the adopted separation operation pattern, similar to steps S5 to S7 (steps S16 to S18).

[0086] Then, when the solvent concentration of the mixed liquid in the recovery tank Tk1 exceeds the target concentration due to any of the separation operations from step S16 to step S18, the control unit 9 stops the separation operation.

[0087] Next, the organic solvent regeneration device 5 supplies the concentrated liquid in the recovery tank Tk1 to the outside, similar to step S8 (step S19).

[0088] As described above, in the second example of the operation of the substrate processing system 100, the control unit 9 calculates the minimum operating time using the initial concentration as well. Therefore, the control unit 9 can calculate the minimum operating time with higher accuracy, and consequently, the required power consumption can be calculated with higher accuracy. As a result, the organic solvent regeneration device 5 can perform separation operation more reliably and with less power consumption. In other words, efficiency can be further improved.

[0089] In the example described above, the organic solvent regeneration device 5 performs the separation operation with the recovery valve 52 closed. Therefore, the organic solvent regeneration device 5 can avoid a situation where a mixture with a low solvent concentration flows into the recovery tank Tk1 during the separation operation. The mixture discharged from the substrate processing device 1 during the separation operation is recovered by another recovery tank (or buffer tank). Therefore, the amount of mixture stored in the other recovery tank increases over time during the separation operation. Consequently, the separation operation must be completed before the amount of mixture stored in the other recovery tank reaches a predetermined standard storage amount.

[0090] Therefore, an upper limit operating time may be set for the minimum operating time of the separation operation. This upper limit operating time may be set in advance, for example. Upper limit operating time data indicating the upper limit operating time may also be stored in the storage unit 94. The control unit 9 may select a separation operation pattern that can raise the solvent concentration to a target concentration or higher within the upper limit operating time, and calculate the required power for each selected separation operation pattern. The control unit 9 may then control the vacuum pump 75 with a control setting value corresponding to the separation operation pattern with a small required power.

[0091] Figure 9 is a flowchart showing a third example of a method for determining the separation operation pattern. The control unit 9 calculates the required power for each operation pattern based on the initial concentration, target concentration, operation pattern data D1, upper limit operation time data, and power data D2 (step S150A). For example, first, the control unit 9 calculates the minimum operation time for each separation operation pattern based on the initial concentration, target concentration, and operation pattern data D1, similar to step S151 (step S151A).

[0092] Next, the control unit 9 selects a separate operation pattern in which the minimum operating time is less than or equal to the upper limit operating time (step S152A).

[0093] Next, the control unit 9 calculates the required power for each selected separation operation pattern (step S153A). As an example, the control unit 9 calculates the required power as the product of the minimum operating time and power, similar to step S152.

[0094] Next, the control unit 9, similar to step S153, adopts a separate operation pattern corresponding to the power requirement that is smaller than the average power requirement among these multiple power requirements (step S154A).

[0095] As described above, according to the third example, the control unit 9 controls the vacuum pump 75 with a control setting value that reduces the minimum operating time to less than or equal to the upper limit operating time and reduces the amount of power required. Therefore, the organic solvent regeneration device 5 can raise the solvent concentration of the mixed liquid to above the target concentration with less power required and within the upper limit operating time.

[0096] Incidentally, there are times when the user may want to know which separation operation pattern the pressure reducing pump 75 is being controlled by. In such cases, the control unit 9 may display the separation operation pattern determined in step S4 or step S15 on the display unit 951. In other words, the control unit 9 may display the separation operation pattern corresponding to the control setting value used for separation operation on the display unit 951. For example, the control unit 9 may display the separation operation pattern on the display unit 951 during separation operation. The display unit 951 may display the separation operation pattern in graph format. Specifically, the display unit 951 may display the change in solvent concentration over time in graph format, with the horizontal axis representing time and the vertical axis representing solvent concentration, as shown in graphs G1 to G3. The control unit 9 may also display the separation operation pattern on the display unit 951 in response to a user's display instruction input to the input unit 952.

[0097] When the display unit 951 displays the separation operation pattern, the user can visually confirm the separation operation pattern on the display unit 951. Therefore, the usability of the organic solvent regeneration device 5 can be improved.

[0098] In the example described above, during separation operation, after the pressure reducing pump 75 is started, the control unit 9 keeps the pressure reducing pump 75 running continuously. This reduces the power consumption of the pressure reducing pump 75 compared to when the control unit 9 operates the pressure reducing pump 75 intermittently. This is because a large amount of power is required when starting the pressure reducing pump 75. In other words, if the pressure reducing pump 75 is repeatedly started and stopped, a large amount of power is consumed each time the pressure reducing pump 75 is restarted. In contrast, if the pressure reducing pump 75 is operated continuously for the entire duration of the separation operation, the pressure reducing pump 75 is started only once, thus reducing the power consumption.

[0099] Furthermore, in the example described above, the control unit 9 calculates the required power without using the power required to start the pressure reducing pump 75 (hereinafter referred to as starting power), but this is not necessarily the only way. For example, power data D2 also includes information on starting power. The control unit 9 may also calculate the required power by adding the starting power required to start the pressure reducing pump 75.

[0100] Furthermore, in the above example, although the power requirement for the pressure reducing pump 75 is calculated in step S40, step S150, or step S150A, the power requirement for the organic solvent regeneration device 5 may also be calculated. For example, since the power consumption of the temperature controller 65 is relatively large, the power consumption of the temperature controller 65 may be added to the power requirement for the organic solvent regeneration device 5. In other words, the control unit 9 may calculate the sum of the power consumption of the temperature controller 65 and the power consumption of the pressure reducing pump 75 as the power requirement for each separation operation pattern. Specifically, the power data D2 also includes information on the power consumption of the temperature controller 65. The control unit 9 then calculates the power consumption of the temperature controller 65 for each separation operation pattern by multiplying the power consumption of the temperature controller 65 included in the power data D2 by the minimum operating time. Also, as described above, the control unit 9 calculates the power consumption of the pressure reducing pump 75 for each separation operation pattern by multiplying the power consumption of the pressure reducing pump 75 included in the power data D2 by the minimum operating time. The control unit 9 then calculates the sum of the power consumption of the temperature controller 65 and the power consumption of the pressure reducing pump 75 as the required power consumption for the organic solvent regeneration device 5, for each separation operation pattern. The control unit 9 then adopts the separation operation pattern corresponding to the required power consumption that is smaller than the average power consumption among the multiple calculated required power consumptions.

[0101] Furthermore, the power consumption of the cooler 73 may also be high. In this case, the power consumption of the cooler 73 may be added to the power consumption of the organic solvent regeneration device 5. For example, power data D2 may also include information on the power consumption of the cooler 73. In this case, the control unit 9 may calculate the power consumption of the organic solvent regeneration device 5 for each separation operation pattern by summing the product of the power consumption and minimum operating time of the temperature controller 65, the product of the power consumption and minimum operating time of the cooler 73, and the product of the power consumption and minimum operating time of the pressure reducing pump 75. The control unit 9 may then adopt a separation operation pattern that corresponds to a power consumption that is smaller than the average power consumption among the multiple power consumption amounts.

[0102] Furthermore, although the initial concentration of the mixture is measured by the concentration sensor Sn1 in the above example, if the initial concentration is known in advance, the initial concentration may be pre-set and stored in the storage unit 94. Alternatively, the control unit 9 may calculate the initial concentration based on the amount of pure water and organic solvent supplied by the substrate processing apparatus 1 to the substrate W. An example of a method for calculating the initial concentration will be described in the third embodiment.

[0103] <Second Embodiment> If the initial concentration of the mixed liquid discharged from the substrate processing apparatus 1 is too low, the organic solvent regeneration apparatus 5 may not be able to raise the solvent concentration of the mixed liquid to the target concentration or higher within the upper limit operating time, even in the first separation operation pattern which has the highest rate of increase in solvent concentration. Therefore, in the second embodiment, countermeasures for when the initial concentration is low will be described.

[0104] Figure 10 is a schematic diagram showing a first example of the configuration of the substrate processing system 100 according to the second embodiment. The first example of the configuration of the substrate processing system 100 according to the second embodiment differs from the configuration of the substrate processing system 100 according to the first embodiment in that it has a discharge section 85. The discharge section 85 discharges the mixed liquid in the recovery tank Tk1 to a drainage section (for example, a drainage facility of a factory utility not shown). In the example of Figure 10, the discharge section 85 includes a discharge pipe 86 and a discharge valve 87. The upstream end of the discharge pipe 86 is connected to, for example, the bottom of the recovery tank Tk1, and the downstream end of the discharge pipe 86 is connected to the drainage section. The discharge valve 87 is provided on the discharge pipe 86. The discharge valve 87 is controlled by the control unit 9 and switches the opening and closing of the discharge pipe 86.

[0105] In the second embodiment, a lower limit concentration is set for the initial concentration of the mixture. This lower limit concentration is set lower than the target concentration. For example, the lower limit concentration is set to the lower limit of the initial concentration that allows the solvent concentration to be raised to above the target concentration within the upper limit operating time in the first separation operation pattern, which has the highest rate of increase in solvent concentration. This lower limit concentration can be set in advance, for example, and lower limit concentration data indicating the lower limit concentration can be stored in the storage unit 94.

[0106] The control unit 9 causes the discharge unit 85 to discharge the mixed liquid from the recovery tank Tk1 when the initial concentration of the mixed liquid in the recovery tank Tk1 is below the lower limit concentration.

[0107] Figure 11 is a flowchart showing a first example of the operation of the substrate processing system 100 according to the second embodiment. In the example in Figure 11, steps S21 to S31 are executed. Steps S21 to S24 are the same as steps S11 to S14, respectively.

[0108] Following step S24, the control unit 9 determines whether separation operation is possible based on the initial concentration (step S25: operation feasibility determination step). Specifically, the control unit 9 determines whether the initial concentration measured in step S24 is below the lower limit concentration. If the initial concentration is below the lower limit concentration, the solvent concentration cannot be raised to above the target concentration even if separation operation is performed, so the discharge unit 85 discharges the mixed liquid in the recovery tank Tk1 (step S26: drainage step). Specifically, the control unit 9 opens the discharge valve 87. As a result, the mixed liquid in the recovery tank Tk1 is discharged to the drainage unit through the discharge pipe 86. With the mixed liquid in the recovery tank Tk1 discharged, the recovery tank Tk1 can once again receive the mixed liquid discharged from the substrate processing apparatus 1.

[0109] On the other hand, if the initial concentration is above the lower limit concentration, the control unit 9 determines a separation operation pattern in the same manner as in step S4 or step S15 (step S27). The organic solvent regeneration device 5 then performs the separation operation according to the determined separation operation pattern (steps S28 to S30), and after the separation operation is completed, it supplies the concentrated liquid in the recovery tank Tk1 to the outside (step S31).

[0110] As described above, the organic solvent regeneration device 5 discharges the mixed liquid in the recovery tank Tk1 when the initial concentration of the mixed liquid in the recovery tank Tk1 is below the lower limit concentration. In other words, it does not perform a separation operation on the mixed liquid in the recovery tank Tk1, and instead discards the mixed liquid in the recovery tank Tk1. Therefore, unnecessary separation operations can be avoided, and the power consumption of the organic solvent regeneration device 5 can be reduced.

[0111] Figure 12 is a schematic diagram showing a second example of the configuration of the substrate processing system 100 according to the second embodiment. The second example of the configuration of the substrate processing system 100 according to the second embodiment differs from the configuration of the substrate processing system 100 according to the first embodiment in that it has an organic solvent supply unit 55. The organic solvent supply unit 55 supplies organic solvent to the recovery tank Tk1. The organic solvent supply unit 55 may also supply fresh organic solvent that has not been used to process the substrate W to the recovery tank Tk1. By supplying organic solvent to the recovery tank Tk1, the solvent concentration of the mixed liquid in the recovery tank Tk1 can be increased.

[0112] In the example shown in Figure 12, the organic solvent supply unit 55 includes a supply pipe 56 and a supply valve 57. The upstream end of the supply pipe 56 is connected to an organic solvent supply source, and the downstream end of the supply pipe 56 is connected to a recovery tank Tk1. The organic solvent supply source includes a storage unit (e.g., a tank) for storing the organic solvent. The supply valve 57 is provided on the supply pipe 56. The supply valve 57 is controlled by the control unit 9 to switch the supply pipe 56 open and closed.

[0113] When the initial concentration of the mixed liquid in the recovery tank Tk1 is below the lower limit, the control unit 9 instructs the organic solvent supply unit 55 to supply organic solvent to the recovery tank Tk1. This raises the initial concentration of the mixed liquid in the recovery tank Tk1 to above the lower limit. Once the initial concentration is above the lower limit, the control unit 9 performs the separation operation.

[0114] Figure 13 is a flowchart showing a second example of the operation of the substrate processing system 100 according to the second embodiment. In the example in Figure 13, steps S41 to S51 are executed. Steps S41 to S45 and steps S47 to S51 are the same as steps S21 to S25 and steps S27 to S31, respectively.

[0115] In step S45, if the initial concentration is below the lower limit concentration, the organic solvent supply unit 55 supplies organic solvent to the recovery tank Tk1 (step S46: organic solvent supply step). Specifically, the control unit 9 opens the supply valve 57. As a result, the organic solvent flows into the recovery tank Tk1 through the supply pipe 56 and joins the mixed liquid in the recovery tank Tk1. Therefore, the initial concentration of the mixed liquid in the recovery tank Tk1 increases in proportion to the amount of organic solvent flowing in. The control unit 9 may close the supply valve 57 when the initial concentration measured by the concentration sensor Sn1 becomes equal to or above the lower limit concentration.

[0116] Next, the control unit 9 executes steps S47 to S51. On the other hand, if the initial concentration is below the lower limit concentration in step S45, the control unit 9 also executes steps S47 to S51.

[0117] As described above, in the second example of the second embodiment, when the initial concentration in the recovery tank Tk1 is below the lower limit concentration, the organic solvent regeneration device 5 increases the initial concentration to above the lower limit concentration by supplying organic solvent to the recovery tank Tk1. Then, the organic solvent regeneration device 5 increases the solvent concentration above the lower limit concentration to above the target concentration through separation operation. As a result, the amount of organic solvent waste can be further reduced.

[0118] <Third Embodiment> In the third embodiment, an example of the configuration of the substrate processing apparatus 1 will be outlined. Figure 14 is a schematic diagram showing an example of the configuration of the substrate processing apparatus 1. In the example of Figure 14, the substrate processing apparatus 1 includes a plurality of processing units 4. Each processing unit 4 wet processes the substrate W. In the example of Figure 14, each processing unit 4 is a single-wafer processing apparatus that processes one substrate W at a time. In the example of Figure 14, the plurality of processing units 4 are stacked in the vertical direction. In this case, the plurality of processing units 4 constitute a tower TW. The plurality of towers TW may be arranged adjacent to each other in the horizontal direction.

[0119] The processing unit 4 includes a substrate holding section 10, a discharge section 20, and a guard 30. The substrate holding section 10 holds the substrate W in a horizontal position and rotates the substrate W around a rotation axis Q1. Here, a horizontal position means that the thickness direction of the substrate W is aligned with the vertical direction. The rotation axis Q1 is an axis that passes through the center of the substrate W and is aligned with the vertical direction. Such a substrate holding section 10 may also be called a spin chuck. The substrate holding section 10 may be a spin chuck of the mechanical chuck type, suction chuck type, or electrostatic chuck type.

[0120] The discharge unit 20 sequentially discharges multiple types of processing liquids toward the main surface of the substrate W held by the substrate holding unit 10. For example, the discharge unit 20 discharges a chemical solution, pure water, and an organic solvent onto the substrate W in this order. The discharge unit 20 includes a nozzle 21. In the example shown in Figure 14, the discharge unit 20 includes a nozzle 21c for the chemical solution, a nozzle 21w for pure water, and a nozzle 21i for the organic solvent. Nozzle 21c is connected to a chemical solution supply source via a supply pipe 22c, nozzle 21w is connected to a pure water supply source via a supply pipe 22w, and nozzle 21i is connected to a solvent tank Tk3 via a supply pipe 22i. A supply valve 23c is provided on the supply pipe 22c, a supply valve 23w is provided on the supply pipe 22w, and a supply valve 23i is provided on the supply pipe 22i.

[0121] In the example shown in Figure 14, the supply pipe 22i is equipped with a liquid delivery unit 24i, a temperature controller 25i, and a filter 26i. The liquid delivery unit 24i is a liquid delivery pump that delivers organic solvent from the solvent tank Tk3 to the nozzle 21i. The temperature controller 25i adjusts the temperature of the organic solvent flowing through the supply pipe 22i. The temperature controller 25i is, for example, a heater. The filter 26i captures impurities in the organic solvent flowing through the supply pipe 22i.

[0122] Solvent tank Tk3 is connected to an organic solvent supply source via a replenishment pipe 27i. A replenishment valve 28i is provided in the replenishment pipe 27i. When the replenishment valve 28i opens, the organic solvent is supplied to solvent tank Tk3 through the replenishment pipe 27i.

[0123] In the example shown in Figure 14, the solvent tank Tk3 is connected to the downstream end of the supply pipe 81 of the organic solvent regeneration device 5. In this structure, the concentrated liquid from the organic solvent regeneration device 5 is supplied to the solvent tank Tk3 through the supply pipe 81.

[0124] In the example shown in Figure 14, the processing unit 4 includes a nozzle movement drive unit 211 that moves each nozzle 21. The nozzle movement drive unit 211 moves the nozzles 21 between a processing position and a nozzle standby position. The processing position is the position where the nozzle 21 discharges the processing liquid toward the substrate W, for example, a position perpendicular to the center of the substrate W. The standby position is the position where the nozzle 21 does not discharge the processing liquid toward the substrate W, for example, a position radially outside the substrate W. The nozzle movement drive unit 211 includes, for example, a motor.

[0125] When the discharge unit 20 discharges the processing liquid onto the main surface of the rotating substrate W, the processing liquid that lands on the main surface of the substrate W is affected by the centrifugal force accompanying the rotation of the substrate W and flows radially outward. The processing liquid then splashes outward from the periphery of the substrate W. As the processing liquid flows across the main surface of the substrate W, processing is performed on the substrate W according to the type of processing liquid.

[0126] The guard 30 has a cylindrical shape that surrounds the substrate holding part 10 and catches the processing liquid splashed from the periphery of the substrate W. In the example shown in Figure 14, multiple guards 30 are arranged concentrically. Each guard 30 moves up and down between an upper position and a lower position by a guard lifting drive unit 31. The upper position is when the upper end of the guard 30 is above the substrate W held by the substrate holding part 10. When the guard 30 is in the upper position, it catches the processing liquid splashed from the periphery of the substrate W. The lower position is when the upper end of the guard 30 is below the substrate W held by the substrate holding part 10. Multiple guards 30 may be used depending on the type of processing liquid. The guard lifting drive unit 31 includes, for example, a motor.

[0127] A cup 32 is provided below each guard 30. The processing liquid received by each guard 30 flows down into the cup 32 and is collected in the cup 32. Each cup 32 is connected to the upstream end of its respective recovery piping. For example, the cup 32 for organic solvents is connected to the upstream end of the recovery piping 51.

[0128] The discharge unit 20 discharges a chemical solution, pure water, and an organic solvent toward the substrate W in this order. By discharging the chemical solution, the discharge unit 20 can perform chemical treatment (e.g., etching) on ​​the main surface of the substrate W. When the chemical solution is discharged, the chemical solution guard 30 is positioned in the upper position, and any chemical solution scattered from the periphery of the substrate W is caught by the chemical solution guard 30. Next, the discharge unit 20 discharges pure water. As a result, the chemical solution on the main surface of the substrate W is washed away by the pure water. Thus, the treatment liquid on the main surface of the substrate W is replaced from the chemical solution to the rinsing liquid. Next, the discharge unit 20 discharges the organic solvent. As a result, the pure water on the main surface of the substrate W is washed away by the organic solvent. Thus, the treatment liquid on the main surface of the substrate W is replaced from the chemical solution to the rinsing liquid. When the organic solvent is discharged, the organic solvent guard 30 is positioned in the upper position, and any pure water and organic solvent scattered from the periphery of the substrate are caught by the organic solvent guard 30. The pure water and organic solvent are recovered into the recovery tank Tk1 through the cup 32 and the recovery pipe 51. Next, the substrate holder 10 rotates the substrate W at high speed to dry the substrate W.

[0129] Incidentally, as mentioned above, if the initial concentration of the mixture is lower than the lower limit concentration, it is difficult to raise the solvent concentration to above the target concentration by separation operation. The initial concentration depends on the recipe. Therefore, the control unit 9 may calculate the initial concentration of the mixture discharged from the substrate processing apparatus 1 based on recipe information that indicates the recipe. The recipe information is stored in the storage unit 94. The initial concentration can be calculated, for example, based on the amount of pure water initially present on the main surface of the substrate W in the solvent recovery state where the guard 30 for the organic solvent is in the upper position, the flow rate and discharge time of the pure water discharged to the substrate W, and the flow rate and discharge time of the organic solvent discharged to the substrate W. The amount of pure water on the main surface of the substrate W depends on the rotation speed of the substrate W. Therefore, the correspondence between the amount of pure water on the main surface of the substrate W and the rotation speed of the substrate W may be set in advance. The control unit 9 may estimate the amount of pure water on the main surface of the substrate W based on the rotation speed of the substrate W and the correspondence. The control unit 9 calculates the amount of pure water flowing into the recovery pipe 51 based on the amount of pure water initially present on the main surface of the substrate W in the solvent recovery state, the flow rate of pure water in the solvent recovery state, and the discharge time. The control unit 9 also calculates the amount of organic solvent flowing into the recovery pipe 51 based on the flow rate of organic solvent in the solvent recovery state and the discharge time. Finally, the control unit 9 calculates the initial concentration based on the amount of pure water and the amount of organic solvent.

[0130] The control unit 9 may display information on the display unit 951 indicating that the initial concentration is below the lower limit concentration. For example, when a user sets a recipe using the user interface 95, the control unit 9 calculates the initial concentration based on the recipe and displays the concentration information on the display unit 951 if the initial concentration is below the lower limit concentration. The user can recognize that the initial concentration is decreasing by visually checking the concentration information on the display unit 951. The user may then perform a recipe update input, for example, to update the flow rate of the organic solvent supplied to the substrate W to a larger value.

[0131] As described above, the organic solvent regeneration method, the organic solvent regeneration apparatus 5, and the substrate processing system 100 have been described in detail. However, the above description is illustrative in all respects, and this disclosure is not limited thereto. Furthermore, the various modifications described above can be applied in combination as long as they do not contradict each other. It is understood that numerous modifications not illustrated can be conceivable without falling outside the scope of this disclosure.

[0132] This disclosure includes the following aspects:

[0133] The first embodiment is an organic solvent regeneration method comprising: a recovery step of recovering a mixture of organic solvent and water discharged from a substrate processing apparatus for processing substrates in a recovery tank; and a separation operation step of circulating the mixture through a circulation path formed by the recovery tank and circulation piping provided with a membrane separator, while performing a separation operation in which a vacuum pump reduces the pressure of a second path in the membrane separator, which is interposed in the circulation piping and separated by a separation membrane from a first path through which the mixture passes, wherein in the separation operation step, the vacuum pump is controlled by a control set value based on a target concentration for the solvent concentration of the mixture.

[0134] A second embodiment is an organic solvent regeneration method according to the first embodiment, wherein in the separation operation step, the vacuum pump is controlled by a control set value such that the pressure in the second path decreases as the target concentration increases.

[0135] A third embodiment is an organic solvent regeneration method according to the first embodiment, wherein power data indicating the power of the vacuum pump for each control setting value, operation pattern data indicating the time change of the solvent concentration during the separation operation for each control setting value, and the amount of power required to achieve the target concentration are calculated for each separation operation pattern based on the target concentration, and the vacuum pump is controlled by the control setting value corresponding to the separation operation pattern in which the amount of power required is smaller than the average amount of the multiple calculated amounts of power required.

[0136] A fourth aspect is an organic solvent regeneration method according to the third aspect, wherein the required amount of power is calculated for each separation operation pattern based on the initial concentration, which is the solvent concentration of the mixed liquid before the execution of the separation operation, the target concentration, the power data, and the operation pattern data.

[0137] A fifth aspect is an organic solvent regeneration method according to the third or fourth aspect, wherein the power data includes power information of a temperature controller installed in the circulation piping, and the required power amount is calculated as the sum of the power amount of the temperature controller and the power amount of the pressure reducing pump.

[0138] The sixth aspect is an organic solvent regeneration method according to the fifth aspect, wherein the power data includes power information of a cooler provided in the separation piping connected to the second path of the membrane separator, and the required power is calculated as the sum of the power of the temperature controller, the power of the cooler, and the power of the pressure reducing pump.

[0139] The seventh aspect is an organic solvent regeneration method according to any one of the third to sixth aspects, wherein a separation operation pattern is selected that increases the solvent concentration to the target concentration or higher within a predetermined upper limit operating time, and the required amount of power is calculated for each selected separation operation pattern.

[0140] The eighth aspect is an organic solvent regeneration method according to any one of the third to seventh aspects, wherein the separation operation pattern corresponding to the control set value used for controlling the vacuum pump is displayed on the display unit.

[0141] The ninth aspect is an organic solvent regeneration method according to any one of the first to eighth aspects, further comprising a draining step in which, when the initial concentration, which is the solvent concentration of the mixture before the execution of the separation operation, is below a lower limit concentration, the mixture in the recovery tank is discharged to the outside through a discharge pipe.

[0142] A tenth embodiment is an organic solvent regeneration method according to any one of the first to ninth embodiments, further comprising an organic solvent supply step of supplying the organic solvent to the recovery tank through a supply pipe when the initial concentration, which is the solvent concentration of the mixed liquid before the execution of the separation operation, is below a lower limit concentration.

[0143] An eleventh embodiment is an organic solvent regeneration apparatus comprising: a recovery tank for storing a mixture of organic solvent and water discharged from a substrate processing apparatus for processing substrates; a circulation pipe connected to the recovery tank; and a membrane separator provided in the circulation pipe, wherein the membrane separator comprises a circulation section including a first path and a second path through which the mixture passes, interposed in the circulation pipe, and a separation membrane that separates the first path and the second path and allows water in the mixture to pass from the first path to the second path; a separation pipe connected to the second path of the membrane separator; a depressurizing pump that reduces the pressure in the second path through the separation pipe; and a control unit that performs a separation operation in which the mixture is circulated to the circulation section while controlling the depressurizing pump with a control set value based on a target concentration for the solvent concentration of the mixture.

[0144] The twelfth embodiment is a substrate processing system comprising an organic solvent regeneration apparatus according to the eleventh embodiment and the substrate processing apparatus.

[0145] According to the first, eleventh, and twelfth embodiments, more efficient separation operation can be achieved.

[0146] According to the second embodiment, when the target concentration is high, the pressure in the second path is low, so the solvent concentration of the mixture can be more reliably raised to above the target concentration. On the other hand, when the target concentration is low, the vacuum pump can be controlled with lower power.

[0147] According to the third embodiment, the solvent concentration of the mixture can be increased to a target concentration or higher with a smaller amount of electricity.

[0148] According to the fourth embodiment, the amount of power can be reduced with higher precision.

[0149] According to the fifth and sixth embodiments, the amount of energy can be calculated with higher accuracy.

[0150] According to the seventh embodiment, the solvent concentration of the mixture can be more reliably increased to a target concentration or higher within the upper limit operating time.

[0151] According to the eighth aspect, usability can be improved.

[0152] According to the ninth aspect, unnecessary separation operation can be avoided.

[0153] According to the tenth embodiment, the solvent concentration can be increased to above the lower limit concentration by supplying the organic solvent to the recovery tank. Therefore, the solvent concentration can be increased to above the target concentration by the subsequent separation operation. [Explanation of symbols]

[0154] 1. Substrate processing device 100 substrate processing systems 56 Supply Piping 60 Circulation section 61 Circulation piping 62 Membrane separator 62a Route 1 62b Second Route 62c separation membrane 65 Temperature controller 71 Separate piping 73 Cooler 75 Pressure pump 86 Discharge piping 9. Control Unit 951 Display section C0 initial concentration D1 Driving Pattern Data D2 Power Data S2, S12, S22, S42 Recovery Step (Step) S5-S7, S16-S18, S28-S30, S48-S50 Separation operation steps (steps) S26 Drainage Step (Step) S46 Organic solvent supply step (step) TC1~TC3 Target concentration Tk1 Recovery Tank W board

Claims

1. A recovery step involves recovering a mixture of organic solvent and water discharged from a substrate processing apparatus in a recovery tank, A separation operation step in which the mixture is circulated through a circulation path formed by the recovery tank and circulation piping provided with the membrane separator, and the pressure in the second path of the membrane separator, which is separated by a separation membrane from the first path through which the mixture passes and is interposed in the circulation piping, is reduced by a depressurizing pump. Equipped with, An organic solvent regeneration method comprising controlling the vacuum pump with a control set value based on a target concentration for the solvent concentration of the mixed liquid during the separation operation step.

2. A method for regenerating an organic solvent according to claim 1, An organic solvent regeneration method comprising controlling the vacuum pump in the separation operation step with a control set value such that the pressure in the second path decreases as the target concentration increases.

3. A method for regenerating an organic solvent according to claim 1, A method for regenerating an organic solvent, comprising: power data indicating the power of the vacuum pump for each control setting value; operation pattern data indicating the time change of the solvent concentration during the separation operation for each control setting value; and calculating the amount of electricity required to achieve the target concentration for each separation operation pattern based on the target concentration, and controlling the vacuum pump with the control setting value corresponding to the separation operation pattern in which the amount of electricity required is less than the average amount of electricity calculated from a plurality of the required amounts.

4. A method for regenerating an organic solvent according to claim 3, An organic solvent regeneration method for calculating the required power amount for each separation operation pattern based on the initial concentration, which is the solvent concentration of the mixed liquid before the execution of the separation operation, the target concentration, the power data, and the operation pattern data.

5. A method for regenerating an organic solvent according to claim 3 or claim 4, The power data includes information on the power of the temperature controller installed in the circulation piping. An organic solvent regeneration method in which the required power is calculated as the sum of the power consumption of the temperature controller and the power consumption of the pressure reducing pump.

6. A method for regenerating an organic solvent according to claim 5, The power data includes information on the power of a cooler provided in the separation piping connected to the second path of the membrane separator. An organic solvent regeneration method in which the required power is calculated as the sum of the power consumption of the temperature controller, the power consumption of the cooler, and the power consumption of the pressure reducing pump.

7. A method for regenerating an organic solvent according to claim 3 or claim 4, A method for regenerating an organic solvent, comprising selecting a separation operation pattern that increases the solvent concentration to a target concentration or higher within a predetermined upper limit operating time, and calculating the required power amount for each selected separation operation pattern.

8. A method for regenerating an organic solvent according to claim 3 or claim 4, A method for regenerating an organic solvent, comprising displaying the separation operation pattern corresponding to the control set value used for controlling the pressure reducing pump on a display unit.

9. A method for regenerating an organic solvent according to any one of claims 1 to 4, An organic solvent regeneration method further comprising a draining step of discharging the mixed liquid in the recovery tank to the outside through a discharge pipe when the initial concentration, which is the solvent concentration of the mixed liquid before the execution of the separation operation, is below a lower limit concentration.

10. A method for regenerating an organic solvent according to any one of claims 1 to 4, An organic solvent regeneration method further comprising an organic solvent supply step of supplying the organic solvent to the recovery tank through a supply pipe when the initial concentration, which is the solvent concentration of the mixed liquid before the execution of the separation operation, is below a lower limit concentration.

11. A recovery tank for storing a mixture of organic solvent and water discharged from a substrate processing apparatus that processes substrates, The system includes a circulation pipe connected to the recovery tank, and a membrane separator provided in the circulation pipe, the membrane separator comprising a circulation section including a first path through which the mixed liquid passes, a second path, and a separation membrane that separates the first path and the second path and allows water in the mixed liquid to pass from the first path to the second path, Separation piping connected to the second path of the membrane separator, A pressure reducing pump that reduces the pressure in the second path through the separation piping, A control unit performs a separation operation in which the mixture is circulated to the circulation unit while controlling the vacuum pump with a control set value based on a target concentration for the solvent concentration of the mixture. An organic solvent regeneration device equipped with the following features.

12. The organic solvent regeneration apparatus according to claim 11, The substrate processing apparatus and A substrate processing system comprising:

Citation Information

Patent Citations

  • Substrate processing apparatus and substrate processing method

    JP2017041505A