Plasma monitoring viewport, plasma generator including the same, and plasma monitoring method

Abstract

The present invention provides a plasma monitoring viewport, a plasma generator including the same, and a plasma monitoring method, which enable observation of the inside of a plasma chamber and measurement of the electromagnetic field from the plasma. [Solution] A plasma monitoring viewport, a plasma generator including the same, and a plasma monitoring method are disclosed. The plasma monitoring viewport may include a transparent substrate and a transparent sensing unit formed on the transparent substrate, and is formed outside a plasma chamber so as to allow observation of the inside of the plasma chamber through the transparent substrate, and the electromagnetic field generated by the plasma in the plasma chamber can be measured using the transparent sensing unit.

Description

[Technical Field]

[0001] The present invention relates to a viewport for plasma electromagnetic field characteristic monitoring, a plasma generator including the same, and a plasma monitoring method. [Background Art]

[0002] In order to use plasma in the manufacture of semiconductors and FPD (flat panel displays), it is essential to control plasma through monitoring of the plasma state, and manage process yield and process products. Generally, a chamber that is a plasma generator is provided with a viewport for visually observing plasma. The present invention aims to maintain the function of visually observing plasma through such a viewport, and at the same time configure an electric circuit capable of monitoring the plasma state on the surface of the viewport or inside the viewport. [Summary of the Invention] [Problem to be Solved by the Invention]

[0003] An object of the present invention is to provide a viewport for plasma monitoring that enables observation of the interior of a plasma chamber and measurement of an electromagnetic field from plasma.

[0004] Another object of the present invention is to provide a plasma generator including the aforementioned viewport for plasma monitoring.

[0005] Still another object of the present invention is to provide a plasma monitoring method that uses the aforementioned viewport for plasma monitoring to observe the interior of a plasma chamber and measure an electromagnetic field from plasma. [Means for Solving the Problem]

[0006] In one aspect, the present invention provides a plasma monitoring viewport comprising a transparent substrate; and a transparent sensing section formed on the transparent substrate, which includes a transparent electrode and a flat coil.

[0007] In one embodiment, the plasma monitoring viewport is formed on the outside of the plasma chamber, allowing observation of the inside of the plasma chamber through the transparent substrate, and simultaneously measuring the electromagnetic field generated by the plasma inside the plasma chamber using the transparent sensing unit.

[0008] In one embodiment, the transparent sensing portion may contain indium tin oxide (ITO).

[0009] In one embodiment, the transparent substrate may further include a printed circuit board (PCB) on which a circuit capable of processing the electromagnetic field signal measured by the transparent sensing unit is printed, which is formed on the outer casing of the transparent substrate.

[0010] In one embodiment, the circuit included in the printed circuit board may include one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter.

[0011] In one embodiment, the circuit included in the printed circuit board can derive one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

[0012] In other aspects, the present invention provides a plasma generator comprising: a plasma chamber having a hollow formed on at least one surface and capable of generating plasma inside; a transparent substrate formed to cover the hollow; and a viewport formed on the transparent substrate and outside the plasma chamber, including a transparent sensing section comprising a transparent electrode and a flat coil.

[0013] In one embodiment, the transparent sensing portion may contain indium tin oxide (ITO).

[0014] In one embodiment, the viewport may further include a printed circuit board (PCB) formed on the outer casing of the transparent substrate, on which a circuit capable of processing the electromagnetic field signal measured by the transparent sensing unit is printed.

[0015] In one embodiment, the circuit included in the printed circuit board may include one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter.

[0016] In one embodiment, the circuit included in the printed circuit board can derive one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

[0017] In other aspects, the present invention provides a plasma monitoring method comprising: observing the interior of a plasma chamber through the plasma monitoring viewport; and measuring the electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport. [Effects of the Invention]

[0018] The plasma monitoring viewport according to an embodiment of the present invention can observe the inside of a plasma chamber and monitor the electromagnetic environment.

[0019] A plasma generator according to an embodiment of the present invention can be configured such that its interior can be observed via the plasma monitoring viewport and the electromagnetic environment can be measured.

[0020] The plasma monitoring method according to an embodiment of the present invention provides a method for observing the inside of a plasma generator and measuring the electromagnetic environment. [Brief explanation of the drawing]

[0021] [Figure 1] This is a schematic diagram showing a plasma monitoring viewport according to an embodiment of the present invention. [Figure 2] This is a front view, plan view, or side view showing one side of a plasma generator according to an embodiment of the present invention. [Figure 3] This flowchart shows one embodiment of a plasma monitoring method according to an embodiment of the present invention. [Modes for carrying out the invention]

[0022] Embodiments of the present invention will be described in detail below with reference to the attached drawings. The present invention can be modified in various ways and may take many forms, and specific embodiments are illustrated in the drawings and described in detail in the text. However, this should be understood not as an attempt to limit the present invention to any particular disclosure, but rather as including all modifications, equivalents, or substitutes that fall within the spirit and technical scope of the present invention. Similar reference numerals have been used for similar components in the description of each drawing. In the attached drawings, the dimensions of structures have been enlarged to enhance clarity of the present invention.

[0023] The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. Unless the context clearly implies otherwise, a singular expression includes plural expressions. It should be understood that terms such as "comprising" or "having" in the present application are intended to specify that the recited features, numbers, steps, operations, components, or combinations thereof exist, and do not pre-exclude the existence or possible addition of one or more other features, numbers, steps, operations, components, or combinations thereof.

[0024] Unless otherwise defined, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by a person having ordinary knowledge in the technical field to which the present invention pertains. Terms defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the related art, and shall not be interpreted as having an idealized or overly formal meaning unless explicitly defined otherwise in the present application.

[0025] FIG. 1 is a schematic diagram illustrating a viewport for plasma monitoring according to an embodiment of the present invention.

[0026] Referring to FIG. 1, the viewport 1 for plasma monitoring according to an embodiment of the present invention may comprise a transparent substrate 10, and a transparent sensing unit 20 formed on the transparent substrate 10 and including a transparent electrode and a planar coil.

[0027] The transparent substrate 10 is a component that contains a transparent material and is substantially transparent, allowing visible light to pass through the transparent substrate 10. In the context of this specification, "transparent" means a property that allows all or part of incident visible light to pass through, and that has a degree of transparency that allows all or a significant portion of visible information about a substance, object, or phenomenon located on the other side of the transparent component to be perceived and processed through the naked eye, instruments, or circuits. In one embodiment, if the transparent substrate 10 is formed on the outside of the plasma chamber, the inside of the plasma chamber can be observed through the transparent substrate 10.

[0028] The transparent sensing portion 20 is a member comprising a transparent conductive material, which substantially allows visible light to pass through the transparent sensing portion 20, is conductive, and in particular has conductive passages formed so that it can respond to the electromagnetic environment of the plasma formed in the plasma chamber on the opposite side of the viewport, including the periphery. In the context of this specification, "conductive" means the property of being able to provide a significant level of electrical transport pathway. In one embodiment, the electromagnetic field generated by the plasma in the plasma chamber can be measured through the transparent sensing portion 20. In one embodiment, the electromagnetic field, such as the intensity of the induced magnetic field and the intensity of the induced electric field, generated by the plasma in the plasma chamber can be measured through the transparent sensing portion 20. Therefore, as described above, the type of material constituting the transparent sensing portion 20 is not particularly limited as long as it is substantially transparent and conductive enough to perform the function of measuring electromagnetic fields. In one embodiment, the transparent sensing portion may include indium tin oxide (ITO).

[0029] A plasma monitoring viewport 1 according to an embodiment of the present invention solves one objective of the present invention by simultaneously performing the roles of the transparent substrate 10 and the transparent sensing unit 20. In one embodiment, the plasma monitoring viewport 1 is formed on the outside of a plasma chamber, allowing observation of the inside of the plasma chamber through the transparent substrate 10, and simultaneously measuring the electromagnetic field generated by the plasma in the plasma chamber through the transparent sensing unit 20.

[0030] The addition of additional members to the plasma monitoring viewport 1 according to embodiments of the present invention is not limited. Referring thereto to Figure 1, in one embodiment, the plasma monitoring viewport 1 according to embodiments of the present invention may further include a printed circuit board (PCB) 30 formed on the outer casing of the transparent substrate 10, on which a circuit capable of processing the electromagnetic field signal measured by the transparent sensing unit 20 is printed.

[0031] The printed circuit board 30 may include a substrate on which a circuit is pre-formed. The circuit printed on the substrate of the printed circuit board 30 can process the electromagnetic field signal from the transparent sensing unit 20 when formed on the substrate, and as long as it performs the function described above, there are no particular limitations on the type of circuit, the material of the circuit, the function of the circuit, and the method by which the circuit is formed.

[0032] In one embodiment, the circuit included in the printed circuit board 30 may include one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter. In one embodiment, the circuit included in the printed circuit board 30 can derive one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

[0033] As described above, the plasma monitoring viewport according to the embodiment of the present invention can observe the inside of the plasma chamber and derive the electromagnetic environment.

[0034] Figure 2 is a front view, plan view, or side view showing one side of a plasma generator according to an embodiment of the present invention.

[0035] Referring to Figure 2, the plasma generator 5 according to an embodiment of the present invention may include a plasma chamber 40 having a hollow H formed on at least one surface and capable of generating plasma inside; a transparent substrate 10' formed to cover the hollow H; and a viewport 50 including a transparent sensing section 20' formed on the transparent substrate 10' and outside the plasma chamber 40.

[0036] The hollow H formed on at least one surface of the plasma generator 5 is configured to allow observation of the interior of the plasma chamber 40. In the context of this specification, “hollow” can mean a configuration formed by being surrounded by a member and perforated to pass through both opposing surfaces of the member. The hollow H may be formed on at least one surface of the plasma generator 5, i.e., one or more of the top, bottom, and side surfaces, and since Figure 2 shows one surface of the plasma generator 5 on which the hollow H is formed, Figure 2 may be a front view, a top view, or a side view.

[0037] The description of all or part of the configuration of the plasma generator 5 according to the embodiments of the present invention can be applied in the same or similar manner to the description of the configuration of the plasma monitoring viewport according to the embodiments of the present invention. Accordingly, the object of the present invention can be solved by applying the plasma monitoring viewport that can observe the inside of the plasma chamber 40 through at least the hollow H, and the viewport b 50 becoming the plasma monitoring viewport described above.

[0038] In one embodiment, the transparent sensing unit 20' may also contain indium tin oxide (ITO). In one embodiment, the viewport 50 may further include a printed circuit board (PCB) 30' formed on the outer casing of the transparent substrate 10', on which a circuit capable of processing the electromagnetic field signal measured by the transparent sensing unit 20' is printed. In one embodiment, the circuit included in the printed circuit board 30' may include one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter. In one embodiment, the circuit included in the printed circuit board 30' can derive one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

[0039] As described above, the plasma generator according to the embodiment of the present invention allows the interior to be observed via the plasma monitoring viewport, and the electromagnetic environment can be derived.

[0040] Figure 3 is a flowchart showing one embodiment of the plasma monitoring method according to an embodiment of the present invention.

[0041] Referring to Figure 3, the plasma monitoring method 100 according to an embodiment of the present invention may include observing the inside of a plasma chamber via a plasma monitoring viewport (S110) and measuring the electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport (S120). In one embodiment, the plasma monitoring method 100 according to an embodiment of the present invention may include simultaneously performing the observation of the inside of a plasma chamber via a plasma monitoring viewport (S110) and the measurement of the electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport (S120). In one embodiment, observing the inside of a plasma chamber via a plasma monitoring viewport (S110) may be the observation of the inside of a plasma chamber via a plasma monitoring viewport according to the embodiment of the present invention described above. In one embodiment, measuring the electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport (S120) may be the measurement of the electromagnetic field generated by the plasma in the plasma chamber using the plasma monitoring viewport according to the embodiment of the present invention described above.

[0042] As described above, the plasma monitoring method according to the embodiment of the present invention provides a method for observing the inside of a plasma generator and deriving the electromagnetic environment.

[0043] The embodiments of the present invention will be described below. However, the embodiments described below are only a part of the present invention, and the scope of the present invention is not limited to the embodiments described below.

[0044] Manufacturing of viewports for plasma monitoring

[0045] A viewport for plasma monitoring is manufactured. A printed circuit board (PCB) is formed on the outer casing of a transparent substrate containing transparent material. A resonant circuit suitable for plasma monitoring is constructed on the transparent substrate using ITO (Iron Oxide) to form a flat coil and capacitor, and this is connected to the PCB substrate located on the outer casing. A BNC port is installed on the PCB substrate so that it can be connected to a monitoring instrument such as an oscilloscope. This configuration allows for the measurement of the plasma operating frequency or harmonic frequency.

[0046] Operation of plasma generators

[0047] A closed plasma chamber was constructed, and the fabricated plasma monitoring viewport was attached to one side of the plasma chamber. The interior of the plasma chamber could be observed through the viewport and analyzed using optical equipment, while simultaneously, the electromagnetic environment was derived using the functions of the ITO transparent sensing unit and printed circuit board. In particular, the plasma operating frequency and harmonic frequency were derived.

[0048] While preferred embodiments of the present invention have been described above with reference to the present invention, those skilled in the art should understand that the present invention can be modified and altered in various ways without departing from the spirit and scope of the invention as set forth in the following claims. [Explanation of Symbols]

[0049] 1. Viewport for plasma monitoring 10, 10'... Transparent substrate 20, 20'...transparent sensing part 30, 30'... Printed circuit board 5. Plasma generator H...Hollow part 40. Plasma Chamber 50...Viewport 100 Plasma Monitoring Methods

Claims

1. Transparent substrate and The transparent sensing portion includes a transparent electrode and a flat coil formed on the transparent substrate, A plasma monitoring viewport formed on the outside of a plasma chamber, which allows observation of the inside of the plasma chamber through the transparent substrate, and allows measurement of the electromagnetic field generated by the plasma inside the plasma chamber using the transparent sensing unit.

2. The transparent sensing portion comprises indium tin oxide (ITO), as described in claim 1, for use as a plasma monitoring viewport.

3. The plasma monitoring viewport according to claim 1, further comprising a printed circuit board (PCB) formed on the outer casing of the transparent substrate, on which a circuit capable of processing the electromagnetic field signal measured by the transparent sensing unit is printed.

4. The plasma monitoring viewport according to claim 3, wherein the circuit included in the printed circuit board includes one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter.

5. The plasma monitoring viewport according to claim 4, wherein the circuit included in the printed circuit board derives one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

6. A plasma chamber having a hollow space formed on at least one surface and capable of generating plasma inside, A plasma generator comprising: a transparent substrate formed to cover the hollow; a viewport formed on the transparent substrate outside the plasma chamber and including a transparent sensing section containing a transparent electrode and a flat coil.

7. The plasma generator according to claim 6, wherein the transparent sensing part contains indium tin oxide (ITO).

8. The plasma generator according to claim 6, wherein the viewport further includes a printed circuit board (PCB) formed on the outer casing of the transparent substrate, on which circuits capable of processing electromagnetic field signals measured by the transparent sensing unit are printed.

9. The plasma generator according to claim 8, wherein the circuit included in the printed circuit board includes one or more components selected from the group including a low-pass filter, a high-pass filter, and a resonance filter.

10. The plasma generator according to claim 9, wherein the circuit included in the printed circuit board derives one or more frequencies selected from the group including the plasma frequency, plasma operation frequency, and plasma instability frequency of the plasma.

11. Observing the inside of a plasma chamber through a plasma monitoring viewport according to any one of claims 1 to 5, Using the aforementioned plasma monitoring viewport, the electromagnetic field generated by the plasma in the plasma chamber is measured, Plasma monitoring methods, including those mentioned above.

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