Error rate measuring device and error rate measuring method
JP2026165253AActive Publication Date: 2026-10-14ANRITSU CORP
-1 Cites 0 Cited by
Patent Information
- Application Number
- JP2025057541
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-03-31
- Publication Date
- 2026-10-14
- Estimated Expiration
- 2045-03-31
Smart Images

Figure 2026165253000001_ABST
Abstract
The present invention provides an error rate measurement device and method that can detect specific patterns in real time without being affected by unique data that the object under test may transmit along with specific patterns in response to state transitions, thereby enabling expected error measurement. [Solution] The error rate measuring device 1 is configured to include: a pattern setting control unit 602a that sets a specific pattern that is expected to be output from the DUT 10 according to the state of the LTSSM, and a mask pattern that specifies the location of the unique data transmitted together with the specific pattern; an ED5b that measures the error rate of the specific pattern in the input signal by sequentially comparing a detection signal synchronized with the timing at which the beginning of the specific pattern is detected with an internal signal; and a measurement control unit 603g that uses a mask pattern to control the ED5b so as not to measure errors at the location of the unique data in the specific pattern.
Need to check novelty before this filing date? Find Prior Art