Substrate processing equipment

Abstract

The chamber space 102a, which is to be evacuated, is maintained at a high vacuum. [Solution] The substrate processing apparatus 100 of the present invention comprises a first chamber 10 having a first end portion 10, a second chamber 50, a movable member 40 positioned across the first chamber 10 and the second chamber 50, and an interlocking mechanism 60 for operating the movable member 40. Even when the first end portion 10d moves in the direction of movement D, the interlocking mechanism 60 operates the movable member 40 to maintain a high vacuum in the chamber space 102a.

Description

Technical Field

[0001] The present invention relates to a substrate processing apparatus that performs predetermined processing on a substrate.

Background Art

[0002] Patent Document 1 discloses an ion implantation apparatus used in manufacturing processes of liquid crystal displays and the like. This ion implantation apparatus includes an ion generator, an ion mass separator, and a processing chamber in which a base material as an object to be processed is disposed. The ion mass separator further includes an ion deflection casing through which the ion beam generated by the ion generator passes.

[0003] The ion deflection casing has an inlet portion serving as an inlet for the ion beam and an outlet portion serving as an outlet for the ion beam. While the ion beam passes through the inside of the ion deflection casing, the ion beam is subjected to mass separation by the action of a magnetic field generated inside the ion deflection casing.

[0004] The ion deflection casing is connected at the inlet portion to a chamber communicating with the ion generator, and is connected at the outlet portion to a chamber communicating with the processing chamber. In addition, during operation of the ion implantation apparatus, the inside of the ion deflection casing is kept at a high vacuum.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] The ion deflection casing described in Patent Document 1 has a shape that follows the path of the ion beam. In other words, the entire ion deflection casing has an arc shape. Therefore, as the ion deflection casing is evacuated to a high vacuum, the entire ion deflection casing deforms, and the inlet and outlet sections tend to move toward the center of the arc shape. As a result, if a misalignment occurs between the ion deflection casing and the chamber connected to it at the inlet or outlet section, it may become impossible to maintain the high vacuum in the ion deflection casing. In other words, it may become impossible to maintain a high vacuum inside the chamber through which the ion beam passes.

[0007] In substrate processing devices, including ion implantation devices, where multiple chambers are connected to form a single chamber space, there is a problem that if a misalignment occurs between two connected chambers, it may become impossible to maintain a vacuum in the chamber space.

[0008] The present invention aims to solve the above problems and to provide a substrate processing apparatus that can maintain a high vacuum in the chamber space that is evacuated. [Means for solving the problem]

[0009] The substrate processing apparatus of the present invention is a substrate processing apparatus having a chamber space that is evacuated by vacuum, and performing a predetermined process on a substrate, comprising: a first chamber having a first end and a first inner surface that forms a first internal space, the first inner surface having a first end region on the side of the first end; a second chamber having a second end and a second inner surface that forms a second internal space, the second inner surface having a second end region on the side of the second end, wherein the first chamber and the second chamber are positioned such that the first end and the second end face each other in one direction while maintaining a predetermined distance apart, and a third inner surface that forms a third internal space that is connected to the first internal space and the second internal space, and the first The device further comprises: a movable member having an outer surface facing the first inner surface in the end region and facing the second inner surface in the second end region; a first sealing member held in the first chamber and making airtight between the first inner surface and the outer surface; a second sealing member held in the second chamber and making airtight between the second inner surface and the outer surface; and an interlocking mechanism that operates the movable member in conjunction with the movement of the first end in a direction perpendicular to the one direction, wherein the first internal space, the second internal space, and the third internal space form at least a part of the chamber space, and the movable member operates while always in contact with the first sealing member and the second sealing member.

[0010] In this configuration, a first sealing member is positioned between the first inner surface of the first chamber and the outer surface of the movable member, and a second sealing member is positioned between the second inner surface of the second chamber and the outer surface of the movable member. Furthermore, the interlocking mechanism operates the movable member while the movable member is always in contact with the first and second sealing members. Therefore, even when the first end of the first chamber moves, airtightness is maintained between the first inner surface of the first chamber and the outer surface of the movable member, and between the second inner surface of the second chamber and the outer surface of the movable member.

[0011] Furthermore, the substrate processing apparatus of the present invention may be configured such that the interlocking mechanism moves the movable member in the direction of movement.

[0012] Furthermore, the substrate processing apparatus of the present invention may be configured such that the interlocking mechanism moves the movable member in the direction of movement while simultaneously rotating the movable member around a predetermined axis.

[0013] With this configuration, the movable member can move in accordance with the first end and also perform rotational movement around a predetermined axis. Therefore, airtightness is more reliably maintained between the first inner surface of the first chamber and the outer surface of the movable member, and between the second inner surface of the second chamber and the outer surface of the movable member.

[0014] Furthermore, the substrate processing apparatus of the present invention may have a configuration in which the interlocking mechanism comprises a first shaft member that moves in accordance with the first end, a second shaft member connected to the movable member, and a first connecting member that connects the first shaft member and the second shaft member.

[0015] In this configuration, the first and second shaft members are connected to the first connecting member, and the second shaft member is connected to the movable member. Therefore, the second shaft member and the movable member move in the same direction as the first shaft member. Consequently, when the first end moves, the first shaft member moves in accordance with the first end, and the movable member moves in the direction in which the first end moves.

[0016] Furthermore, the substrate processing apparatus of the present invention may further include, in the interlocking mechanism, a third shaft member connected to the second chamber, and a second connecting member connecting the second shaft member and the third shaft member, wherein the second shaft member is connected to the second connecting member so that it can rotate about the second shaft member as an axis, and the second connecting member can rotate about the third shaft member as an axis.

[0017] In this configuration, when the first end moves, the second shaft member, which is fixed to the movable member, moves in the direction of movement of the first end, and as a result, the second connecting member rotates around the third shaft member.

[0018] Furthermore, in the substrate processing apparatus of the present invention, the interlocking mechanism may further include a fourth shaft member fixed to the first chamber, and the fourth shaft member may be connected to the second connecting member.

[0019] Furthermore, in the substrate processing apparatus of the present invention, the interlocking mechanism may further include a guide member that is fixed to the first chamber and causes the first shaft member to operate in conjunction with the first end portion, and the guide member may be configured to move the first shaft member in the movement direction while allowing the first shaft member to move while rotating within the guide member. Effects of the Invention

[0020] According to the substrate processing apparatus of the present invention, airtightness between the first inner peripheral surface of the first chamber and the outer peripheral surface of the movable member, and between the second inner peripheral surface of the second chamber and the outer peripheral surface of the movable member is maintained. That is, according to the substrate processing apparatus of the present invention, the chamber space that is evacuated can be maintained at a high vacuum. Brief Description of the Drawings

[0021] [Figure 1] A schematic plan view of a substrate processing apparatus (ion implantation apparatus) according to an embodiment of the present invention. [Figure 2] A side view showing the vicinity of the first end portion in the same embodiment. [Figure 3] A cross-sectional view of the vicinity of the first end portion taken along line B-B in Figure 2 in the same embodiment. [Figure 4] A top view showing the vicinity of the first end portion in the same embodiment. [Figure 5] A top view of the first chamber around the first end portion in the same embodiment. [Figure 6] A diagram showing the positional relationship of the first shaft, the second shaft, and the third shaft before and after the guide member moves in the same embodiment. [Figure 7] A top view showing the vicinity of the first end portion after the first end portion has moved in the same embodiment. [Figure 8] A cross-sectional view of the vicinity of the first end portion after the first end portion has moved in the same embodiment. [Modes for carrying out the invention]

[0022] A substrate processing apparatus, which is one embodiment of the present invention, is described with reference to Figures 1 to 8. Note that the figures referenced are prepared for the purpose of understanding the present invention, and the shapes and scale ratios of the components in each figure do not necessarily correspond. Furthermore, the X, Y, and Z axes shown in Figures 1 to 8 are orthogonal to each other, and the X axis is parallel to the direction of propagation of the ion beam IB at the exit end 10b of the first chamber 10, which will be described later. The Z axis is parallel to the vertical direction.

[0023] The substrate processing apparatus in this embodiment is an ion implantation apparatus used in a semiconductor manufacturing process or a flat panel display manufacturing process. Hereafter, the substrate processing apparatus in this embodiment will be described as the ion implantation apparatus 100. Therefore, the ion implantation apparatus 100 in this embodiment may be read as the substrate processing apparatus 100. Note that the substrate processing apparatus of the present invention is not limited to an ion implantation apparatus.

[0024] Figure 1 is a schematic plan view of the ion implantation apparatus 100 of this embodiment. The ion implantation apparatus 100 of this embodiment is used in the manufacturing process of flat panel displays such as liquid crystal displays and organic EL displays, and is a device that implants ions into a substrate S. In this embodiment, the substrate S is a rectangular glass substrate.

[0025] The substrate processing apparatus of the present invention performs a predetermined process on a substrate, and the ion implantation apparatus 100 of this embodiment performs an ion implantation process on the substrate S as a predetermined process.

[0026] As shown in Figure 1, the ion implantation apparatus 100 comprises an ion source 101, a transport chamber 102, and a processing chamber 103. The ion source 101 has a plasma chamber 101a in which plasma is generated. The ion implantation apparatus 100 further comprises an extraction electrode 104 for extracting an ion beam IB from the plasma generated in the plasma chamber 101a. The transport chamber 102 has a chamber space 102a that is evacuated.

[0027] The ion beam IB drawn from the plasma chamber 101a is guided through the chamber space 102a inside the transport chamber 102 to the processing chamber 103. Inside the processing chamber 103, a substrate S held in a holder (not shown) is placed, and the ion beam IB is irradiated onto the substrate S.

[0028] In this embodiment, the transport chamber 102 refers to the entire chamber through which the ion beam IB passes between the plasma chamber 101a and the processing chamber 103, and is composed of multiple chamber members connected together. Furthermore, the chamber space in this invention is not limited to the space through which the ion beam IB passes. The chamber space in this invention may be any space formed within a chamber whose interior is evacuated, and is not limited to any particular application.

[0029] The ion implantation apparatus 100 is equipped with a mass spectrometry magnet 105. The mass spectrometry magnet 105 forms a magnetic field for mass-separating the ion beam IB, and the ion beam IB is mass-separated as it travels through the mass spectrometry magnet 105 while being bent by the magnetic field.

[0030] In this embodiment, the transport chamber 102 has a first chamber 10, part of which is located inside the mass spectrometry magnet 105. The first chamber 10 has an inlet end 10a, which is the inlet end of the ion beam IB, and an outlet end 10b, which is the outlet end of the ion beam IB. The first chamber 10 is also located inside the mass spectrometry magnet 105 and has a deflection section 10c through which the ion beam IB passes while deflected.

[0031] Inside the deflection section 10c, the ion beam IB propagates while being bent by the magnetic field of the mass spectrometer magnet 105. The deflection section 10c has a curved shape that follows the propagation path of the ion beam IB.

[0032] Furthermore, the transport chamber 102 includes an ion source side chamber 20 positioned opposite the inlet end 10a of the first chamber 10 with a gap between them, and a processing chamber side chamber 30 positioned opposite the outlet end 10b with a gap between them.

[0033] A movable member 40, which will be described later, is positioned between the first chamber 10 and the ion source side chamber 20, and between the first chamber 10 and the processing chamber side chamber 30. Hereafter, the movable member 40 positioned between the first chamber 10 and the ion source side chamber 20 may be referred to as the first movable member 40a, and the movable member 40 positioned between the first chamber 10 and the processing chamber side chamber 30 may be referred to as the second movable member 40b.

[0034] In this embodiment, the transport chamber 102 is composed of an ion source side chamber 20, a first movable member 40a, a first chamber 10, a second movable member 40b, and a processing chamber side chamber 30. That is, the ion beam IB drawn from the plasma chamber 101a passes sequentially through the internal spaces of the ion source side chamber 20, the first movable member 40a, the first chamber 10, the second movable member 40b, and the processing chamber side chamber 30, and is guided into the processing chamber 103.

[0035] In this embodiment, the first chamber 10 and the ion source side chamber 20, and the first chamber 10 and the processing chamber side chamber 30 are both connected via a movable member 40, but the ion implantation apparatus 100 is not limited to this. In other words, the ion implantation apparatus 100 may be configured such that only one of the two, the first chamber 10 and the ion source side chamber 20, or the first chamber 10 and the processing chamber side chamber 30, is connected via the movable member 40.

[0036] The ion implantation apparatus 100 is equipped with multiple vacuum pumps 106 that evacuate the inside of the transport chamber 102 to create a high vacuum. In this embodiment, two vacuum pumps 106 are connected to the ion source side chamber 20 and the processing chamber side chamber 30, respectively, but the number of vacuum pumps 106 and the positions where the vacuum pumps 106 are connected to the transport chamber 102 are not limited to this.

[0037] In this embodiment, the first chamber 10 and the ion source side chamber 20 are arranged facing each other in one direction C1 and separated by a predetermined distance. The first chamber 10 and the processing chamber side chamber 30 are arranged facing each other in one direction C2 and separated by a predetermined distance. In this embodiment, one direction C1 is parallel to the Y-axis in the figure, and one direction C2 is parallel to the X-axis in the figure.

[0038] When the transport chamber 102 is evacuated, the deflection portion 10c of the first chamber 10 deforms further, bending as it moves. As a result of this deformation of the deflection portion 10c, the inlet end 10a and the outlet end 10b attempt to move toward the center of the arc shape formed by the deflection portion 10c.

[0039] At this time, the inlet end 10a attempts to move in the direction of movement D1, which is perpendicular to the direction C1. The outlet end 10b also attempts to move in the direction of movement D2, which is perpendicular to the direction C1. In this embodiment, the direction of movement D1 is parallel to the X-axis in the figure, and the direction of movement D2 is parallel to the Y-axis in the figure.

[0040] Although both the inlet end 10a and the outlet end 10b move in a strictly arc-shaped trajectory, the amount of movement of the inlet end 10a and the outlet end 10b is small relative to the size of the first chamber 10. Therefore, both the inlet end 10a and the outlet end 10b can be considered to be moving substantially in a straight line. In other words, the movement directions D1 and D2 only need to be directions that can be considered substantially unidirectional.

[0041] When the inlet end 10a moves in the direction of movement D1, or when the outlet end 10b moves in the direction of movement D2, the inlet end 10a or the outlet end 10b will be displaced from their original positions. Generally, as the size of the substrate S increases and the ion implantation apparatus 100 becomes larger, this amount of displacement increases. The ion implantation apparatus 100 of this embodiment is designed to maintain a high vacuum in the chamber space 102a within the transport chamber 102 by operating the movable member 40, even when the inlet end 10a or the outlet end 10b is displaced from its original position.

[0042] Next, a structure in which the first chamber 10 and the ion source side chamber 20, and the first chamber 10 and the processing chamber side chamber 30 are connected via a movable member 40 will be described. In this embodiment, the structure connecting the first chamber 10 and the ion source side chamber 20, and the structure connecting the first chamber 10 and the processing chamber side chamber 30 are the same.

[0043] Hereafter, the inlet or outlet end of the ion beam IB in the first chamber 10 will be generally referred to as the first end 10d, and the chamber positioned opposite the first end 10d will be generally referred to as the second chamber 50. In other words, in the structure connecting the first chamber 10 and the ion source side chamber 20, the second chamber 50 corresponds to the ion source side chamber 20, and the first end 10d corresponds to the inlet side end 10a. Furthermore, in the structure connecting the first chamber 10 and the processing chamber side chamber 30, the second chamber 50 corresponds to the processing chamber side chamber 30, and the first end 10d corresponds to the outlet side end 10b.

[0044] Furthermore, the direction in which the first chamber 10 and the second chamber 50 face each other is generalized and referred to as unidirectional C. In other words, for the structure connecting the first chamber 10 and the ion source side chamber 20, unidirectional C corresponds to unidirectional C1. Also, for the structure connecting the first chamber 10 and the processing chamber side chamber 30, unidirectional C corresponds to unidirectional C2.

[0045] Furthermore, the direction in which the first end portion 10d moves is generalized and referred to as the direction of movement D. That is, for the structure connecting the first chamber 10 and the ion source side chamber 20, the direction of movement D corresponds to the direction of movement D1. Also, for the structure connecting the first chamber 10 and the processing chamber side chamber 30, the direction of movement D corresponds to the direction of movement D2. The direction of movement D only needs to be a direction that can be considered substantially as one direction.

[0046] Figure 2 is a side view showing the area around the first end 10d of the first chamber 10 in the ion implantation apparatus 100. Figure 3 is a cross-sectional view of the area around the first end 10d of the first chamber 10 along line BB in Figure 2. Note that the X, Y, and Z axes in Figures 2 to 8 are indicated according to the case where the second chamber 50 corresponds to the processing chamber side chamber 30 shown in Figure 1.

[0047] As shown in Figures 2 and 3, the first chamber 10 has a first end 10d which is the inlet or outlet end of the ion beam IB.

[0048] As shown in Figure 3, a first internal space 11, through which the ion beam IB passes, is formed inside the first chamber 10. The first chamber 10 has a first inner surface 12, which is the inner surface forming this first internal space 11. The first inner surface 12 also has a first end region 12a, which is the terminal region on the first end 10d side.

[0049] As shown in Figures 2 and 3, the second chamber 50 has a second end 50a which is the end opposite to the first end 10d of the first chamber 10. The first chamber 10 and the second chamber 50 are positioned such that the first end 10d and the second end 50a face each other in one direction C while maintaining a predetermined distance between them.

[0050] As shown in Figure 3, a second internal space 51, through which the ion beam IB passes, is formed inside the second chamber 50. The second chamber 50 has a second internal surface 52, which is the inner surface that forms this second internal space 51. The second internal surface 52 has a second end region 52a, which is the terminal region on the side of the second end 50a.

[0051] The first end 10d and the second end 50a face each other at a predetermined distance apart, and a movable member 40 is positioned between the first end 10d and the second end 50a. More specifically, the movable member 40 is positioned to span from the interior of the first end 10d to the interior of the second end 50a. In other words, the movable member 40 is positioned to span from the first internal space 11 to the second internal space 51.

[0052] As shown in Figure 3, a third internal space 41, through which the ion beam IB passes, is formed inside the movable member 40. The movable member 40 has a third inner surface 42, which is the inner surface that forms this third internal space 41. The movable member 40 also has an outer surface 43 that faces the first inner surface 12 in the first end region 12a and faces the second inner surface 52 in the second end region 52a.

[0053] The third internal space 41 is connected to the first internal space 11 and the second internal space 51, and the first internal space 11, the second internal space 51, and the third internal space 41 form part of the chamber space 102a.

[0054] The ion implanter 100 includes a first sealing member 13 that is held in the first chamber 10 and creates an airtight seal between the first inner surface 12 and the outer surface 43. The ion implanter 100 also includes a second sealing member 53 that is held in the second chamber 50 and creates an airtight seal between the second inner surface 52 and the outer surface 43. The first sealing member 13 and the second sealing member 53 create an airtight seal around the movable member 40, and the inside of the transport chamber 102, i.e., the chamber space 102a, is maintained at a high vacuum.

[0055] The first chamber 10 of this embodiment has a first retaining portion 14 formed on the end face of the first end 10d, which holds the first sealing member 13. The first retaining portion 14 of this embodiment is composed of one or more members attached to the end face of the first end 10d by fixing members such as bolts (not shown). The first end 10d of this embodiment is composed of one or more members that can fix the first retaining portion 14.

[0056] The first retaining portion 14 and the first end portion 10d are not limited to the above configuration. The first retaining portion 14 only needs to be capable of holding the first sealing member 13 that makes the space between the first inner circumferential surface 12 and the outer circumferential surface 43 airtight. For example, the first retaining portion 14 may be formed in the first end portion 10d by a groove capable of accommodating the first sealing member 13.

[0057] The second chamber 50 in this embodiment has a second retaining portion 54 formed on the end face of the second end 50a and holding the second sealing member 53. The second retaining portion 54 in this embodiment is composed of one or more members attached to the end face of the second end 50a by fixing members such as bolts (not shown). Furthermore, the second end 50a in this embodiment is composed of one or more members that can fix the second retaining portion 54.

[0058] The second retaining portion 54 and the second end portion 50a are not limited to the above configuration. The second retaining portion 54 only needs to be capable of holding the second sealing member 53, which makes the space between the second inner circumferential surface 52 and the outer circumferential surface 43 airtight. For example, the second retaining portion 54 may be formed in the second end portion 50a by a groove capable of accommodating the second sealing member 53.

[0059] In this embodiment, the first end 10d and the second end 50a are detachably attached to the first chamber 10 and the second chamber 50, respectively. In this embodiment, the first end region 12a refers to the region formed by the inner surface of the first end 10d of the first inner surface 12, and the second end region 52a refers to the region formed by the inner surface of the second end 50a of the second inner surface 52.

[0060] Furthermore, in this embodiment, the ion implantation apparatus 100 can secure working space by removing the first end 10d and the second end 50a, or by moving the movable member 40 into the first chamber 10 or the second chamber 50. This allows for maintenance work and other operations to be performed.

[0061] Figure 4 is a top view showing the area around the first end 10d of the first chamber 10 in the ion implantation apparatus 100. As shown in Figures 2 and 4, the ion implantation apparatus 100 further includes an interlocking mechanism 60 that moves the movable member 40 in conjunction with the deformation of the first chamber 10.

[0062] As shown in Figure 2, the ion implanter 100 of this embodiment is equipped with two interlocking mechanisms 60, each interlocking mechanism 60 positioned above and below the movable member 40. Each interlocking mechanism 60 has the same configuration and performs the same operation. Therefore, the following description will focus on the interlocking mechanism 60 located above the movable member 40, and the description of the interlocking mechanism 60 located below the movable member 40 will be omitted. Note that the ion implanter 100 may also be configured to include only one of the two interlocking mechanisms 60 positioned above and below the movable member 40.

[0063] The interlocking mechanism 60 operates the movable member 40 so that a high vacuum can be maintained inside the transport chamber 102 even if the first end 10d moves in the direction of movement D and shifts from its original position. In other words, while the interlocking mechanism 60 operates the movable member 40, the movable member 40 operates while always in contact with the first sealing member 13 and the second sealing member 53.

[0064] As shown in Figures 2 and 4, the interlocking mechanism 60 of this embodiment includes a first shaft member 61 that moves in accordance with the first end 10d of the first chamber 10. As shown in Figure 2, the first shaft member 61 has a cylindrical first cylindrical portion 61a at one end in the longitudinal direction. The first cylindrical portion 61a is guided by a guide member 64 fixed to the first end 10d, which will be described later, so that the first shaft member 61 moves in accordance with the movement of the first end 10d.

[0065] Hereafter, the axis of the first shaft member 61 defined by the first cylindrical portion 61a will be referred to as the first shaft A1. The first shaft member 61 does not need to rotate on its own. The first shaft A1 is the axis defined by the first cylindrical portion 61a, and is the axis of rotation if the first cylindrical portion 61a were to perform a rotational movement. The first shaft A1 may be considered as a straight line passing through the center of the circle in the cross-section of the first cylindrical portion 61a and parallel to the longitudinal direction of the first shaft member 61. As will be explained later, the first shaft member 61 operates integrally with the movable member 40.

[0066] The interlocking mechanism 60 further includes a second shaft member 62 fixed to the movable member 40. More specifically, one end of the second shaft member 62 in the longitudinal direction is fixed to a region exposed to the outside of the outer peripheral surface 43, and the second shaft member 62 is positioned between the first holding portion 14 and the second holding portion 54. Since the movable member 40 and the second shaft member 62 are fixed to each other, the movable member 40 and the second shaft member 62 operate as a single unit. In this embodiment, the second shaft member 62 is positioned centrally between the first end 10d and the second end 50a. The second shaft member 62 is also positioned centrally between the first sealing member 13 and the second sealing member 53.

[0067] More specifically, the second shaft member 62 is located at an equidistant position from the end face of the first end 10d and the end face of the second end 50a. In this embodiment, the end face of the first end 10d refers to the end face of the first retaining portion 14 facing the second end 50a. The end face of the second end 50a refers to the end face of the second retaining portion 54 facing the first end 10d. In Figures 3 to 8, the center line E, which indicates a position equidistant from the end face of the first retaining portion 14 and the end face of the second end 50a, is shown as a dashed line. The center line E also indicates a position equidistant from the first sealing member 13 and the second sealing member 53.

[0068] The interlocking mechanism 60 further includes a first connecting member 63 that connects a first shaft member 61 and a second shaft member 62. The first shaft member 61 is fixed to the first connecting member 63 at its other end in the longitudinal direction.

[0069] The first shaft member 61 and the second shaft member 62 are both connected to the first connecting member 63, and the first shaft member 61, the second shaft member 62, and the first connecting member 63 move together as a single unit. Also, as mentioned above, the movable member 40 and the second shaft member 62 operate together as a single unit. Therefore, as shown in Figure 4, when the first end 10d moves in the direction of movement D, the first shaft member 61, the second shaft member 62, the first connecting member 63, and the movable member 40 all move together towards the direction of movement D.

[0070] The interlocking mechanism 60 further comprises a third shaft member 65 connected to the second chamber 50, and a second connecting member 66 connecting the second shaft member 62 and the third shaft member 65. The second shaft member 62 is connected to the second connecting member 66 so that it can rotate around its axis. Hereafter, the axis of rotation when the second shaft member 62 performs this rotational movement will be referred to as the second axis A2.

[0071] More specifically, the second shaft member 62 has a cylindrical second cylindrical portion 62a that is connected to the second connecting member 66. Also, as shown in Figure 4, the second connecting member 66 has a first through hole 66a with an opening that is slightly larger in diameter than the diameter of the second cylindrical portion 62a. The second shaft member 62 is connected to the second connecting member 66 such that the second cylindrical portion 62a is inserted through the first through hole 66a. As a result, the second shaft member 62 can rotate around the second shaft A2 within the first through hole 66a relative to the second connecting member 66.

[0072] As shown in Figure 2, the third axis member 65 is fixed to the second chamber 50 and has a cylindrical third cylindrical portion 65a that is connected to the second connecting member 66. As shown in Figure 4, the second connecting member 66 has a second through hole 66b with an opening that has a diameter slightly larger than the diameter of the third cylindrical portion 65a. The second connecting member 66 is positioned so that the third cylindrical portion 65a is inserted through the second through hole 66b. This allows the second connecting member 66 to rotate around the third axis A3 defined by the third cylindrical portion 65a.

[0073] Furthermore, the third axis A3 is the rotation axis of the second connecting member 66 and is not limited to being defined by the third cylindrical portion 65a fixed to the second chamber 50. The second connecting member 66 only needs to be rotatable around the third axis A3 located on the second chamber 50. For example, an axis member defining the third axis A3 may be fixed to the end of the second connecting member 66, and a member that rotatably supports the axis member may be provided in the second chamber 50.

[0074] The interlocking mechanism 60 further comprises a fourth shaft member 67 fixed to the first chamber 10. The fourth shaft member 67 has a cylindrical fourth cylindrical portion 67a. The second connecting member 66 has a third through hole 66c with an elongated opening that receives the fourth cylindrical portion 67a. The second connecting member 66 is positioned so that the fourth cylindrical portion 67a is inserted through the third through hole 66c. While it is not essential for the interlocking mechanism 60 to have the fourth shaft member 67 and the third through hole 66c, having them allows the interlocking mechanism 60 to operate more stably.

[0075] Figure 5 is a top view of the first chamber 10 around the first end 10d. To facilitate understanding of this embodiment, Figure 5 also shows the general shape of the first cylindrical portion 61a of the first shaft member 61, the second connecting member 66, and the guide member 64, which will be described later. In addition, Figure 5 shows the first chamber 10, the first cylindrical portion 61a, the second connecting member 66, and the guide member 64 with dashed lines after the first end 10d has moved a distance d in the direction of movement D. Furthermore, Figure 5 shows the first seal member 13 with a dashed line in the initial position of the first end 10d (the position before moving in the direction of movement D).

[0076] As shown in Figures 2 and 5, the interlocking mechanism 60 further includes a guide member 64 that moves the first shaft member 61 in conjunction with the first end 10d. The guide member 64 is fixed to the first end 10d. The guide member 64 is positioned on the upper surface of the first holding portion 14 and above the first sealing member 13.

[0077] As shown in Figure 5, the guide member 64 has a U-shaped inner surface 64a, and the first cylindrical portion 61a of the first shaft member 61 is positioned inside the inner surface 64a. As the first chamber 10 deforms, when the first end portion 10d moves a distance d in the direction of movement D, the guide member 64 also moves a distance d in the direction of movement D together with the first end portion 10d.

[0078] In Figures 3 to 8, a dashed line indicates a reference line F that is perpendicular to the first axis A1 and parallel to the direction of movement D, when the first end portion 10d is in its initial position (the position before moving in the direction of movement D). As shown in Figure 3, the first sealing member 13 lies on the reference line F.

[0079] Figure 6 shows the positional relationship between the first axis A1, the second axis A2, and the third axis A3 before and after the guide member 64 moves a distance d in the direction of movement D. In addition to the first axis A1, the second axis A2, and the third axis A3, Figure 6 also shows the inner surface 64a and the first cylindrical portion 61a of the guide member 64. In Figure 6, the inner surface 64a and the first cylindrical portion 61a before the guide member 64 moves are shown with dashed lines, and the inner surface 64a and the first cylindrical portion 61a after the guide member 64 moves are shown with solid lines.

[0080] As shown in Figure 6, the inner surface 64a of the guide member 64 has an arc-shaped arc portion 64b and a pair of opposing straight portions 64c, 64c, and the arc portion 64b and the pair of straight portions 64c, 64c are continuously connected to form a U-shape.

[0081] The first cylindrical portion 61a of the first shaft member 61 is positioned to be housed inside the inner surface 64a of the guide member 64. The pair of straight portions 64c, 64c face each other at a distance slightly greater than the diameter of the first cylindrical portion 61a. Therefore, when the guide member 64 moves in the direction of movement D, the first cylindrical portion 61a also moves toward the direction of movement D while being sandwiched between the pair of straight portions 64c, 64c.

[0082] As shown in Figure 2, from this point forward, the distance between the first axis A1 and the second axis A2 will be referred to as the first distance L1, and the distance between the second axis A2 and the third axis A3 will be referred to as the second distance L2. The first distance L1 is considered to be the distance between the first axis member 61 and the second axis member 62, and the second distance L2 is considered to be the distance between the second axis member 62 and the third axis member 65.

[0083] Since the positions where the first shaft member 61 and the second shaft member 62 are connected to the first connecting member 63 are fixed, the first distance L1 is constant. Also, since the positions where the second shaft member 62 and the third shaft member 65 are connected to the second connecting member 66 are fixed, the second distance L2 is constant.

[0084] As shown in Figures 4 and 5, when the first end 10d is in its initial position, the first axis A1, the second axis A2, and the third axis A3 are positioned so as to be aligned on the same straight line. In Figures 5 and 6, the positions of the first axis A1 and the second axis A2 when the first end 10d is in its initial position are shown as P1 and Q1, respectively. Furthermore, the positions of the first axis A1 and the second axis A2 after the first end 10d has moved a distance d in the direction of movement D from its initial position are shown as P2 and Q2, respectively.

[0085] As shown by the dashed line in Figure 5, as the first end portion 10d moves, the guide member 64 moves a distance d in the direction of movement D, and the inner surface 64a of the guide member 64 also moves a distance d in the direction of movement D. At this time, the first cylindrical portion 61a of the first shaft member 61 is guided by the guide member 64, and the first shaft member 61 also moves toward the direction of movement D. At the same time, the second shaft member 62 also moves toward the direction of movement D together with the first connecting member 63 via the first connecting member 63.

[0086] At this time, as the second shaft member 62 moves toward the direction of movement D, the second shaft member 62 rotates the second connecting member 66 around the third axis A3. In this embodiment, the second connecting member 66 is connected to the fourth shaft member 67. Therefore, as the first end portion 10d moves, the fourth shaft member 67 moves toward the direction of movement D, and as a result, the second connecting member 66 rotates around the third axis A3.

[0087] In Figure 6, the inner surface 64a and the first cylindrical portion 61a when the guide member 64 is in its initial position are shown by dashed lines, and the inner surface 64a and the first cylindrical portion 61a after the guide member 64 has moved a distance d in the direction of movement D are shown by solid lines.

[0088] As the guide member 64 and the first axis member 61 move as described above, the first cylindrical portion 61a and the inner surface 64a move from the position shown by the dashed line to the position shown by the solid line, as shown in Figure 6. During this time, the second axis A2 moves in an arc-shaped trajectory, so the second axis A2 moves slightly toward the third axis A3 from the center line E. At this time, the distance the second axis A2 moves toward the third axis A3 is small compared to the distance d that the first end portion 10d moves toward the direction of movement D, so the second axis A2 can be considered to move roughly along the center line E. In other words, the second axis member 62 that defines the second axis A2 can be considered to move roughly along the center line E.

[0089] As the guide member 64 and the first shaft member 61 move as described above, the line segment connecting the first shaft A1 and the second shaft A2 moves so as to tilt by a first angle α with respect to the second shaft A2, as shown in Figure 6. Here, the movement of the line segment connecting the first shaft A1 and the second shaft A2 corresponds to the movement of the first connecting member 63 that connects the first shaft member 61 and the second shaft member 62. In other words, the first connecting member 63 operates so as to tilt by a first angle α. That is, at this time, the second shaft member 62 rotates by a first angle α with respect to the second connecting member 66, and the movable member 40 rotates by a first angle α with respect to the second connecting member 66.

[0090] Figure 7 is a top view of the area around the first end 10d after it has moved a distance d in the direction of movement D. Figure 7 shows the state of the movable member 40 after the first end 10d has moved. As mentioned above, while the first end 10d moves in the direction of movement D, the second shaft member 62 moves roughly along the center line E. At this time, the second shaft member 62 rotates by a first angle α around the second axis A2. As a result, the movable member 40 rotates by a first angle α around the second axis A2.

[0091] Figure 8 is a cross-sectional view of the area around the first end 10d after it has moved a distance d in the direction of movement D. In Figure 8, some of the hatching of the movable member 40 is omitted. When the first end 10d moves a distance d in the direction of movement D, the movable member 40 moves from the state shown in Figure 3 to the state shown in Figure 8.

[0092] As shown in Figure 8, as the first end portion 10d moves, the position of the first sealing member 13 relative to the second sealing member 53 also shifts. At this time, since the first sealing member 13 moves together with the first end portion 10d, the first sealing member 13 moves by a distance d in the direction of movement D.

[0093] Furthermore, as the first sealing member 13 moves, the straight line connecting the first sealing member 13 and the second sealing member 53 tilts by a second angle β, as shown in Figure 8. In other words, the line connecting the first sealing member 13 and the second sealing member 53, which the outer surface 43 of the movable member 40 needs to contact, tilts by a second angle β.

[0094] If we assume that the first axis A1 (first axis member 61) moves along the reference line F and the second axis A2 (second axis member 62) moves along the center line E, then the first axis A1, along with the first sealing member 13, moves along the reference line F by a distance d in the direction of movement D, so the first angle α and the second angle β become equal.

[0095] Here, the first axis A1 (first axis member 61) and the second axis A2 (second axis member 62) move approximately along the reference line F and approximately along the center line E, respectively. In other words, at this time, the amount by which the first axis A1 and the second axis A2 deviate from the reference line F and the center line E, respectively, is small, so the first angle α and the second angle β are approximately equal.

[0096] Therefore, the movable member 40 tilts its outer circumferential surface 43 to match the movement of the first sealing member 13. In other words, the interlocking mechanism 60 of this embodiment tilts the outer circumferential surface 43 of the movable member 40 to match the movement of the first sealing member 13.

[0097] In the ion implantation apparatus 100 of this embodiment, as shown in Figure 2, the movable member 40 is supported by two interlocking mechanisms 60 positioned above and below the movable member 40. Also, in the initial position shown in Figure 3 (the position before the first end 10d moves), the movable member 40 is positioned floating above the first inner circumferential surface 12 and the second inner circumferential surface 52. In other words, the movable member 40 is positioned so that its outer circumferential surface 43 does not come into contact with the first inner circumferential surface 12 and the second inner circumferential surface 52. Furthermore, as described above, the interlocking mechanism 60 moves in conjunction with the movement of the first end 10d by a distance d in the direction of movement D, causing the movable member 40 to rotate around the second axis A2 and tilting the outer circumferential surface 43 by a first angle α.

[0098] In this case, as described above, the first angle α and the second angle β are approximately equal, and the movable member 40 operates without contacting the first inner surface 12 and the second inner surface 52. In other words, even if the first sealing member 13 and the second sealing member 53 were not present, the movable member 40 would always operate in a state of being floating above the first inner surface 12 and the second inner surface 52, that is, without contacting the first inner surface 12 and the second inner surface 52. By operating in this manner, the first sealing member 13 and the second sealing member 53 maintain a uniform deformation at all times, and the vacuum level inside the transport chamber 102 is maintained.

[0099] The ion implantation apparatus 100 of this embodiment may include a jig or mechanism that changes the length of the second distance L2, so that the second shaft member 62 (second shaft A2) is always on the center line E. In this case, since the first angle α and the second angle β coincide, the outer circumferential surface 43 can be tilted more reliably to follow the movement of the first sealing member 13.

[0100] In this embodiment, as the first end portion 10d moves in the direction of movement D, the movable member 40 rotates around the first axis A1 while moving in the direction of movement D, while the entire movable member 40 moves in the direction of movement D, while contacting the first seal member 13 and the second seal member 53. As a result, the space between the outer circumferential surface 43 of the movable member 40 and the first inner circumferential surface 12, and the space between the outer circumferential surface 43 of the movable member 40 and the second inner circumferential surface 52 are always airtightly closed by the first seal member 13 and the second seal member 53, respectively. That is, even when the first end portion 10d moves in the direction of movement D, the inside of the transport chamber 102 is always maintained at a high vacuum.

[0101] In the ion implantation apparatus 100 of this embodiment, a first seal member 13 is positioned between the first inner surface 12 of the first chamber 10 and the outer surface 43 of the movable member 40, and a second seal member 53 is positioned between the second inner surface 52 of the second chamber 50 and the outer surface 43 of the movable member 40. Furthermore, the interlocking mechanism 60 operates the movable member 40 while the movable member 40 is always in contact with the first seal member 13 and the second seal member 53. Therefore, even if the first chamber 10 deforms and the first end 10d moves in the direction of movement D, the airtightness between the first inner surface 12 and the outer surface 43, and between the second inner surface 52 and the outer surface 43 is maintained.

[0102] Furthermore, in the ion implantation apparatus 100 of this embodiment, the interlocking mechanism 60 moves the movable member 40 toward the direction of movement D of the first end 10d while rotating the movable member 40. With this configuration, the movable member 40 can move in accordance with the first end 10d and also perform rotational movements. Therefore, airtightness between the first inner circumferential surface 12 and the outer circumferential surface 43, and between the second inner circumferential surface 52 and the outer circumferential surface 43 is maintained more reliably.

[0103] According to the ion implantation apparatus 100 of this embodiment, airtightness is maintained between the first inner surface 12 of the first chamber 10 and the outer surface 43 of the movable member 40, and between the second inner surface 52 of the second chamber 50 and the outer surface 43 of the movable member 40. In other words, according to the ion implantation apparatus 100 of this embodiment, the chamber space 102a that is evacuated can be maintained at a high vacuum.

[0104] The interlocking mechanism 60 of this embodiment is not limited to use in the ion implantation apparatus 100 of this embodiment, and it is clear that it can also be applied to a substrate processing apparatus having two chamber members that face each other with a space between them, and in which the end of one chamber moves in one direction.

[0105] The present invention is not limited to the embodiments described above, and it goes without saying that various modifications are possible without departing from the spirit of the invention. [Explanation of Symbols]

[0106] S substrate 100 Ion implantation apparatus (substrate processing apparatus) 102a Chamber space 10 First Chamber 10d First end 11 First interior space 12 First inner peripheral surface 12a First end area 13 First sealing member 40 Movable member 41 Third internal space 42 Third inner peripheral surface 43 Outer surface 50 Second Chamber 50a Second end 51 Second internal space 52 Second inner peripheral surface 52a Second end region 53 Second sealing member 60 Interlocking mechanism 61 First shaft member 62 Second shaft member 63 First connecting member 64 Guide member 65 Third axis member 66 Second connecting member

Claims

1. A substrate processing apparatus having a chamber space that is evacuated under vacuum, and which performs a predetermined process on a substrate, A first chamber having a first end and a first inner circumferential surface that forms a first internal space, and having a first end region where the first inner circumferential surface is on the side of the first end, A second chamber having a second end and a second inner surface forming a second internal space, wherein the second inner surface has a second end region on the side of the second end, Equipped with, The first chamber and the second chamber are positioned such that their first and second ends face each other in one direction while maintaining a predetermined distance between them. A movable member having a third inner circumferential surface that forms a third inner space connected to the first inner space and the second inner space, and an outer circumferential surface that faces the first inner circumferential surface in the first end region and faces the second inner circumferential surface in the second end region, A first sealing member is held in the first chamber and provides airtightness between the first inner surface and the outer surface, A second sealing member is held in the second chamber and provides airtightness between the second inner surface and the outer surface, An interlocking mechanism that operates the movable member in conjunction with the movement of the first end in a direction perpendicular to the aforementioned one direction, Furthermore, The first internal space, the second internal space, and the third internal space form at least a part of the chamber space. A substrate processing apparatus in which the movable member operates while constantly in contact with the first sealing member and the second sealing member.

2. The substrate processing apparatus according to claim 1, wherein the interlocking mechanism moves the movable member in the direction of movement.

3. The substrate processing apparatus according to claim 2, wherein the interlocking mechanism moves the movable member in the direction of movement and rotates the movable member around a predetermined axis.

4. The aforementioned interlocking mechanism A first shaft member that moves in accordance with the first end, A second shaft member connected to the aforementioned movable member, A first connecting member that connects the first shaft member and the second shaft member, A substrate processing apparatus according to claim 1, comprising:

5. The aforementioned interlocking mechanism A third shaft member connected to the second chamber, A second connecting member that connects the second shaft member and the third shaft member, Furthermore, The second shaft member is connected to the second connecting member so that it can rotate about the second shaft member as an axis. The substrate processing apparatus according to claim 4, wherein the second connecting member can rotate about the third shaft member as an axis.

6. The interlocking mechanism further comprises a fourth axial member fixed to the first chamber, The substrate processing apparatus according to claim 5, wherein the four-axis member is connected to the second connecting member.

7. The interlocking mechanism further comprises a guide member fixed to the first chamber, which moves the first shaft member in conjunction with the first end, The substrate processing apparatus according to any one of claims 4 to 6, wherein the guide member moves the first shaft member in the direction of movement while allowing the first shaft member to rotate and move within the guide member.

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