Systems and methods for implementing micropulsing schemes using dual individual pulsers

Abstract

[0006] Embodiments of the present disclosure presented herein include an apparatus and method for processing a substrate in a plasma processing system. The apparatus includes a pulsed voltage (PV) waveform generator, the PV waveform generator comprising at least one synchronization signal and a plurality of pulsers for providing a plurality of TTL inputs. The PV waveform generator generates a waveform including pulses or bursts containing micropulses corresponding to the plurality of TTL input signals and the at least one synchronization signal. The method includes receiving, from a controller, a first TTL input signal and a synchronization signal; providing a first micropulse to an electrode assembly after receiving the first TTL input signal and synchronization signal; and providing a second micropulse to the electrode assembly after receiving a second TTL input signal and synchronization signal.

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