Cleaning base station and cleaning system
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- BEIJING ROCKROBO TECH CO LTD
- Filing Date
- 2023-12-19
- Publication Date
- 2026-06-26
AI Technical Summary
The issue with existing cleaning systems is that after cleaning, dirty water remains in the base station, leading to bacterial growth and unpleasant odors due to the open nature of the wastewater discharge unit.
The cleaning base station incorporates a wastewater discharge unit, liquid collection unit, and a heating assembly that provides heat energy to dry the wastewater, inhibiting bacterial growth and reducing odors.
The heating assembly effectively dries the wastewater, significantly reducing bacterial growth and odor likelihood, making the base station cleaner and more hygienic.
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Abstract
Description
Related Applications
[0001] This application claims priority to a Chinese patent application bearing application number 202211730789.7 and entitled "Cleaning Base Station and Cleaning System," filed with the China Patent Office on December 30, 2022, the entire contents of which are incorporated herein by reference. [Technical Field]
[0002] TECHNICAL FIELD The embodiments of the present application relate to the technical field of smart homes, and in particular to cleaning base stations and cleaning systems. [Background technology]
[0003] With the development of science and technology, various technological innovations are constantly evolving, and smart robot technology in particular has been developing rapidly in recent years. With technological innovations such as artificial intelligence algorithms, integrated suction cleaning and wet mopping, smart dust collection, and smart water washing, cleaning robots are gradually becoming a part of everyday life in ordinary households. Summary of the Invention [Problem to be solved by the invention]
[0004] The inventor discovered that in the prior art, after the cleaning system had cleaned and mopped the floor, it returned to the cleaning base station to complete the smart dust collection and smart water washing cleaning, but the dirty water remained in the narrow space at the bottom of the cleaning base station, which led to the proliferation of bacteria and the generation of unpleasant odors, affecting the user experience. [Means for solving the problem]
[0005] The present application aims to solve at least one of the technical problems existing in the prior art or related art.
[0006] To this end, a first aspect of the present application provides a cleaning base station.
[0007] A second aspect of the present application provides a cleaning system.
[0008] In view of this, a first aspect of an embodiment of the present application proposes a cleaning base station, the cleaning base station including a wastewater discharge part, a liquid collection part, and a heating assembly, the wastewater discharge section is in communication with the liquid collection section; The heating assembly is provided on one side of the wastewater discharge section and is used to provide heat energy to the wastewater discharge tank.
[0009] In one possible embodiment, the wastewater discharge section includes a wastewater discharge pipe and a wastewater discharge tank; the wastewater discharge pipe is in communication with the liquid collection section; The wastewater discharge tank is in communication with the wastewater discharge pipe.
[0010] In one possible embodiment, the heating assembly includes a thermally conductive plate and a heat source; the heat conduction plate is provided on one side of the wastewater discharge tank, and the heat conduction plate is used to provide heat energy to the wastewater discharge tank; The heat source is provided on a side of the heat conduction plate that faces away from the wastewater discharge tank, and the heat source is used to provide heat energy to the heat conduction plate.
[0011] In one possible embodiment, the heat conducting plate is made of a metal material, and the thickness of the heat conducting plate is 0.8 mm to 3 mm.
[0012] In one possible embodiment, the wastewater discharge tank is made of a heat-conducting material, and the heating assembly includes a heat source, which is provided on one side of the wastewater discharge tank and is used to provide heat to the wastewater discharge tank.
[0013] In one possible embodiment, the wastewater discharge pipe comprises a liquid absorption segment and a non-return segment, the liquid absorption segment is connected to the wastewater discharge tank and the liquid collection section, and the non-return segment is located in the middle of the liquid absorption segment.
[0014] In one possible embodiment, the non-return segment comprises at least one bend.
[0015] In one possible embodiment, the bend comprises at least one of an S-shaped bend, a V-shaped bend, and a U-shaped bend.
[0016] In one possible embodiment, the number of said non-return segments is two or more.
[0017] In one possible embodiment, the cleaning base station further comprises an insulating section; The thermal insulation is provided on the side of the heating assembly facing away from the wastewater discharge.
[0018] In one possible embodiment, the thermal insulation includes a first thermal insulation layer, the first thermal insulation layer being provided on a side of the heating assembly facing away from the wastewater discharge portion; The first insulating layer has a recess formed therein to avoid components on the heating assembly.
[0019] In one possible embodiment, the heat insulating portion includes a first air gap and a first heat dissipation hole; the first air gap is formed on a side of the heating assembly away from the wastewater discharge portion; The first heat dissipation hole is opened on the side of the cleaning base station and is connected to the first air gap.
[0020] In one possible embodiment, the thermal insulation section includes a second thermal insulation layer, a second air gap, and a second heat dissipation hole; the second insulating layer is provided on a side of the heating assembly away from the wastewater discharge; The second air gap is formed on a side of the second insulation layer away from the wastewater discharge portion, the second heat dissipation hole is opened on a side of the cleaning base station and is connected to the second air gap; The second insulating layer has a recess formed therein to avoid components on the heating assembly.
[0021] In one possible embodiment, the cleaning base station further includes a bottom cover; The bottom cover is provided on the side of the heat insulating section facing away from the heating assembly.
[0022] In one possible embodiment, the cleaning base station further includes a filtration section, The filtering section covers the wastewater discharge section, and a plurality of through holes are formed in the filtering section.
[0023] In one possible embodiment, the density of the through-holes is positively correlated with the depth of the sewage discharge tank of the sewage discharge section.
[0024] A second aspect of the present application provides a cleaning system, which includes a cleaning base station according to any one of the technical solutions above and a cleaning device; The cleaning base station is used to clean the cleaning device. [Effects of the Invention]
[0025] Compared with the prior art, the present application has at least the following beneficial effects: The cleaning base station provided by the embodiment of the present application includes a wastewater discharge unit, a liquid collection unit, and a heating assembly. During operation, after a cleaning device of the cleaning system completes a cleaning task, it can return to the cleaning base station for cleaning. After cleaning, the wastewater can be discharged into the liquid collection unit through the wastewater discharge unit. Although the liquid collection unit can store the wastewater in a centralized manner, some wastewater still remains in the wastewater discharge unit. The wastewater discharge unit is always open, which makes it easy for bacteria to grow and unpleasant odors to occur. Based on this, the cleaning base station provided by the embodiment of the present application can activate the heating assembly to provide heat energy to the wastewater discharge unit, thereby drying the liquid stored in the wastewater discharge unit, significantly inhibiting bacterial growth and significantly reducing the likelihood of unpleasant odors, making the cleaning base station cleaner and more hygienic and improving the user experience. [Brief explanation of the drawings]
[0026] Various other advantages and benefits will become apparent to those skilled in the art upon reading the following detailed description of the preferred embodiments. The accompanying drawings are intended only to illustrate preferred embodiments and are not to be construed as limiting the present application. Also, like reference numerals refer to like parts throughout the drawings.
[0027] [Figure 1] 1 is a schematic diagram of a cleaning base station according to an embodiment of the present application; [Figure 2] FIG. 2 is a schematic diagram of a heating assembly of a cleaning base station according to one embodiment of the present application. [Figure 3] 1 is a schematic exploded view of a portion of a structure of a cleaning base station according to an embodiment of the present application; [Figure 4] 1 is a schematic cross-sectional view of a cleaning base station according to an embodiment of the present application, viewed from one angle. [Figure 5]FIG. 2 is a schematic diagram of a wastewater discharge tank of a cleaning base station according to an embodiment of the present application. [Figure 6] FIG. 2 is a schematic diagram illustrating the configuration of a filtering section of a cleaning base station according to an embodiment of the present application. [Figure 7] FIG. 10 is a schematic diagram of a filtering section of a cleaning base station according to another embodiment of the present application. [Figure 8] 1 is a schematic diagram of a cleaning base station according to an embodiment of the present application; [Figure 9] FIG. 2 is a schematic diagram of a wastewater discharge pipe of a cleaning base station according to an embodiment of the present application. [Figure 10] FIG. 2 is a schematic diagram illustrating the operation of a sewage discharge pipe of a cleaning base station according to an embodiment of the present application; [Figure 11] FIG. 10 is a schematic diagram of another operating state of the wastewater discharge pipe of the cleaning base station according to an embodiment of the present application.
[0028] The correspondence between the reference numerals and the names of the components in FIGS. 1 to 11 is as follows: (Explanation of symbols) 110 wastewater discharge section, 120 liquid collection section, 130 heating assembly, 140 insulation section, 150 bottom cover, 160 filtration section, 170 housing, 180 cleaning assembly, 190 water supply section, 200 dust collection section, 210 guide slope, 111 wastewater discharge pipe, 112 wastewater discharge tank, 131 heat conduction plate, 132 heat source, 141 first heat dissipation hole, 1111 liquid absorption segment, 1112 check segment. DETAILED DESCRIPTION OF THE INVENTION
[0029] In order to better understand the above technical solutions, the technical solutions of the embodiments of the present application are described in detail below with reference to the drawings and specific examples. It should be understood that the embodiments of the present application and the specific features in the embodiments are detailed explanations of the technical solutions of the embodiments of the present application, and do not limit the technical solutions of the present application. If there is no conflict, the embodiments of the present application and the technical features in the embodiments can be combined with each other.
[0030] As shown in Figures 1 to 7, a first aspect of an embodiment of the present application proposes a cleaning base station, which includes a wastewater discharge section 110, a liquid collection section 120, and a heating assembly 130, where the wastewater discharge section 110 is connected to the liquid collection section 120, and the heating assembly 130 is provided on one side of the wastewater discharge section 110 and is used to provide thermal energy to the wastewater discharge section 110.
[0031] The cleaning base station provided in the embodiment of the present application includes a wastewater discharge unit 110, a liquid collection unit 120, and a heating assembly 130. During operation, after a cleaning device of the cleaning system completes a cleaning task, it can return to the cleaning base station for cleaning, and the wastewater after cleaning can be discharged into the liquid collection unit 120 via the wastewater discharge unit 110. Although the liquid collection unit 120 can store wastewater in one place, some wastewater still remains in the wastewater discharge unit 110, and the wastewater discharge unit 110 is always open, which makes it easy for bacteria to grow and unpleasant odors to occur. Based on this, the cleaning base station provided in the embodiment of the present application can activate the heating assembly 130 to provide heat energy to the wastewater discharge unit 110, thereby drying the liquid stored in the wastewater discharge unit 110 and significantly inhibiting bacterial growth and significantly reducing the likelihood of unpleasant odors, making the cleaning base station cleaner and more hygienic and improving the user experience.
[0032] In this technical solution, the heating assembly 130 is arranged on one side of the wastewater discharge section 110, for example, the heating assembly 130 is arranged on the underside of the wastewater discharge section 110, by arranging it in this way, the heating assembly 130 can be in contact with the wastewater discharge section 110, which is advantageous in that the thermal energy of the heating assembly 130 acts directly on the wastewater discharge section 110, which can improve the heat conduction efficiency and further improve the drying efficiency of the stored liquid.
[0033] As shown in Figures 2 and 3, in one possible embodiment, the sewage discharge section 110 includes a sewage discharge pipe 111 and a sewage discharge tank 112, where the sewage discharge pipe 111 is connected to the liquid collection section 120 and the sewage discharge tank 112 is connected to the sewage discharge pipe 111.
[0034] The technical solution further provides a structural configuration of the wastewater discharge unit 110, which may include a wastewater discharge pipe 111 and a wastewater discharge tank 112. During the process of cleaning the cleaning equipment by the cleaning base station, the wastewater after cleaning can directly flow into the wastewater discharge tank 112, and further be transported into the liquid collection unit 120 through the wastewater discharge pipe 111. This configuration facilitates the discharge and recovery of wastewater.
[0035] In some examples, the bottom surface of the wastewater discharge tank 112 is sloped.
[0036] In this technical solution, the bottom surface of the wastewater discharge tank 112 is inclined, which makes it easier for the wastewater to be discharged into the wastewater discharge pipe 111, making the wastewater discharge easier and reducing the total amount of wastewater accumulated, which is advantageous for the heating assembly 130 to dry the wastewater accumulated in the wastewater discharge section 110, and furthermore, greatly inhibits the growth of bacteria and greatly reduces the probability of unpleasant odors, making the use of the cleaning base station cleaner and more hygienic and improving the user experience.
[0037] As shown in FIG. 5, in some examples, the wastewater discharge tank 112 may be funnel-shaped, which allows for easier drainage of wastewater.
[0038] As shown in Figures 2 and 3, in one possible embodiment, the heating assembly 130 includes a heat conduction plate 131 and a heat source 132, and the heat conduction plate 131 is provided on one side of the sewage discharge tank 112, for example, the heat conduction plate 131 is provided below the bottom surface of the sewage discharge tank 112 and is used to provide thermal energy to the sewage discharge tank 112, and the heat source 132 is provided on one side of the heat conduction plate 131 away from the sewage discharge tank 112 and is used to provide thermal energy to the heat conduction plate 131.
[0039] The technical solution further provides a structural configuration of the heating assembly 130, which may include a heat conduction plate 131 and a heat source 132, and the heat source 132 can provide thermal energy to the heat conduction plate 131, and the thermal energy can be transferred to the sewage discharge tank 112 through the heat conduction plate 131, based on which the sewage in the sewage discharge tank 112 can be dried. The installation of the heat conduction plate 131 and the heat source 132 can avoid the heat source 132 from directly contacting the sewage discharge tank 112 and preventing the leachate from entering the heat source 132, thereby improving the stability of the operation of the cleaning base station.
[0040] In this technical solution, the heat conduction plate 131 is made of metal material, and by providing it in this way, it is easy for the heat conduction plate 131 to transfer heat energy to the sewage discharge tank 112 .
[0041] In this technical solution, the heat conduction plate 131 is disposed on one side of the sewage discharge tank 112, and the heat source 132 is disposed on the side of the heat conduction plate 131 that is away from the sewage discharge tank 112. For example, the heat source 132 is disposed in contact with the heat conduction plate 131 and is located below the bottom plate of the heat conduction plate 131. This arrangement allows the heat conduction plate 131 to be in contact with the sewage discharge tank 112, which is advantageous for the thermal energy of the heat conduction plate 131 to act directly on the sewage discharge tank 112, improving the efficiency of heat conduction and further improving the drying efficiency of the stored liquid.
[0042] In this technical solution, the heat source 132 is disposed on the side of the heat conduction plate 131 that faces away from the wastewater discharge tank 112, so that the thermal energy of the heat source 132 can directly act on the heat conduction plate 131. The installation of the heat conduction plate 131 serves to separate the heat source 132 from the heat conduction plate, protecting the heat source and preventing it from being contaminated by water vapor or filth, thereby improving the service life of the heating assembly.
[0043] In one possible embodiment, the heat conducting plate 131 is made of a metal material, and the thickness of the heat conducting plate 131 is 0.8 mm to 3 mm.
[0044] In this technical solution, the thickness of the heat conduction plate 131 is 0.8mm to 3mm, which can ensure heat conduction efficiency and uniformly supply heat energy to the wastewater discharge tank 112. If the thickness of the heat conduction plate 131 is less than 0.8mm, the heat energy output may be uneven, and some areas of the wastewater discharge tank 112 may not be able to effectively dry the wastewater. If the thickness of the heat conduction plate 131 is greater than 3mm, the heat conduction efficiency will decrease and the power consumption of the heat source 132 will increase.
[0045] In some examples, the heat conduction plate 131 may be made of an aluminum material to further improve heat conduction efficiency.
[0046] In some examples, the heat source 132 may be a point heating heat source 132 or a surface heating heat source 132. For example, the heat source 132 may be a heating film, which uniformly supplies heat energy to the heat conduction plate 131.
[0047] In one possible embodiment, the wastewater discharge tank 112 is made of a heat-conductive material, and the heating assembly 130 includes a heat source 132, which is provided on one side of the wastewater discharge tank 112, for example, the heat source 132 is provided in contact with the wastewater discharge tank 112 and is located below the bottom surface of the wastewater discharge tank, and is used to provide heat to the wastewater discharge tank 112.
[0048] In this technical solution, the wastewater discharge tank 112 may be made of a heat-conducting material, so that the thermal energy of the heat source 132 can be directly transferred to the wastewater discharge tank 112, which is advantageous for simplifying the structure of the cleaning base station, especially the structure of the heating assembly 130, i.e., the heating assembly 130 does not include the heat-conducting plate 131, but only includes the heat source 132.
[0049] As shown in Figures 8 to 11, in one possible embodiment, the sewage discharge pipe 111 has one end connected to the sewage discharge tank 112 and the other end connected to the liquid collection section 120, where the sewage discharge pipe 111 includes a liquid absorption segment 1111 and a non-return segment 1112, the liquid absorption segment 1111 is connected to the sewage discharge tank 112 and the liquid collection section 120, and the non-return segment 1112 is located in the middle of the liquid absorption segment 1111.
[0050] In this technical solution, the cleaning base station includes a liquid collection unit 120 and a wastewater discharge unit 110, the wastewater discharge unit 110 includes a wastewater discharge pipe 111 and a wastewater discharge tank 112, the wastewater discharge pipe 111 includes a liquid absorption segment and a non-return segment 1112, and in the process of use, after the cleaning equipment of the cleaning system completes a cleaning task, it can return to the cleaning base station for cleaning, and the wastewater after cleaning can be discharged into the liquid collection unit 120 through the wastewater discharge unit 110. The liquid collection unit 120 can store the wastewater in one place, and the wastewater discharge tank 112 can better receive the wastewater generated after cleaning is completed, thereby preventing the wastewater from overflowing. The installation of the sewage discharge pipe 111 makes it easier to discharge sewage into the liquid collection section 120, and the installation of the check segment 1112 on the sewage discharge pipe 111 can prevent sewage from backflowing, further allowing the liquid in the sewage discharge section 110 to be discharged more thoroughly, reducing the amount of liquid remaining on the sewage discharge section 110, and greatly reducing the probability of sewage remaining in the narrow space at the bottom of the cleaning base station, causing bacteria to grow and producing unpleasant odors, making the use of the cleaning base station cleaner and more hygienic and improving the user experience.
[0051] As shown in Figures 10 and 11, the hatching in Figures 10 and 11 indicates wastewater, and the right pipe in Figures 3 and 11 is used to connect to the liquid collection section 120. In Figure 10, the working state of the wastewater pipe is that the power source applies suction force to the wastewater, and the wastewater is sucked in. In Figure 11, the power source stops suctioning the wastewater, and the wastewater loses suction force, and the wastewater accumulates in the check segment 1112 due to the action of gravity.
[0052] In some examples, in order to thoroughly discharge the liquid in the wastewater discharge tank 112, the cleaning base station may further include a pump body, which can be used to suck in the gas in the liquid collection section 120 to create negative pressure, and then the wastewater in the wastewater discharge tank 112 can be sucked into the liquid collection section 120 by activating the pump body, thereby using the negative pressure to discharge the wastewater in the wastewater discharge tank 112, thereby achieving a better wastewater discharge effect.
[0053] As can be appreciated, in order to improve the mechanical strength of the wastewater discharge pipe 111, the suction segment 1111 and the check segment 1112 of the wastewater discharge pipe 111 may be of an integral structure.
[0054] As shown in Figures 2 to 4, in one possible embodiment, the non-return segment 1112 includes a bend, which may be multiple, and which includes at least one of an S-shaped bend, a V-shaped bend, or a U-shaped bend.
[0055] This technical solution further provides a form of the check segment 1112, and the check segment 1112 may include one or more of a bent section, an S-shaped bend, or a U-shaped bend. The reason for providing it in this way is that in the prior art, when sewage is sucked by a power source, if the power source loses power, the liquid accumulated in the sewage discharge pipe 111 will return to the drainage tank due to the action of gravity, and the liquid in the drainage tank will not be completely discharged, and the remaining sewage and dirt will not be completely sucked when sewage and dirt are sucked, resulting in a lot of residue and a putrid odor. The sewage discharge pipe 111 of the cleaning base station provided in the embodiments of the present application is provided with one or more of a bent section, an S-shaped bend, or a U-shaped bend. When the power source loses power, the bent section, S-shaped bend, or U-shaped bend can store the backflowing liquid so that the stored liquid does not flow back into the sewage discharge tank 112, which further improves the sewage suction in the sewage discharge tank 112 and reduces the probability of liquid being stored in the sewage discharge tank 112. Meanwhile, the liquid stored in the bent section, S-shaped bend, or U-shaped bend can serve to seal the sewage discharge pipe 111, reducing the probability of odor release and making the cleaning base station more hygienic and clean to use.
[0056] In one possible embodiment, there are two or more check segments 1112. By installing two or more check segments 1112, the liquid check effect can be further improved and the liquid can be further prevented from flowing back into the wastewater discharge tank 112.
[0057] As shown in Figures 2 and 3, in one possible embodiment, the cleaning base station further includes an insulating section 140, which is provided on the side of the heating assembly 130 away from the wastewater discharge section 110.
[0058] In this technical solution, the cleaning base station may further include a heat insulating unit 140. By installing the heat insulating unit 140, heat energy can be output to the wastewater discharge unit 110, which can greatly reduce the waste of heat energy, lower the energy consumption of the cleaning base station, and improve the user experience.
[0059] In one possible embodiment, the insulation 140 includes a first insulating layer that is located on the side of the heating assembly 130 away from the wastewater discharge section 110. The first insulating layer has recesses formed therein to allow for clearance for components on the heating assembly 130.
[0060] The technical solution further provides a structural configuration for the thermal insulation unit 140, which may include a first thermal insulation layer. The first thermal insulation layer may be attached to the side of the heating assembly 130 that faces away from the wastewater discharge unit 110, thereby allowing heat energy to be more easily output to the wastewater discharge unit 110, greatly reducing the waste of heat energy, lowering the energy consumption of the cleaning base station, and improving the user experience. The first thermal insulation layer may also dry out the liquid accumulated in the wastewater discharge unit 110, greatly inhibiting the growth of bacteria and significantly reducing the probability of odor generation, making the cleaning base station cleaner and more hygienic, and improving the user experience.
[0061] In this technique, a recess is formed in the first insulating layer, and by providing it in this manner, it is possible to avoid components on the heating assembly 130, such as fuses, spare NTCs, and protrusions of terminal adhesive on the heating assembly 130, thereby making the operation of the heating assembly 130 more stable.
[0062] As shown in FIG. 5, in one possible embodiment, the insulation section 140 includes a first air gap and a first heat dissipation hole 141, the first air gap being formed on the side of the heating assembly 130 away from the wastewater discharge section 110, and the first heat dissipation hole 141 being opened on the side of the cleaning base station and connected to the first air gap.
[0063] The technical solution further provides a structural configuration of the heat insulating part 140, and the heat insulating part 140 may include a first air gap, whereby the thermal conductivity of air is low, and the formation of the first air gap reduces the cost of insulation, greatly reduces the waste of heat energy, lowers the energy consumption of the cleaning base station, and further improves the user experience; it can dry out the liquid accumulated in the wastewater discharge part 110, greatly inhibit the growth of bacteria, and greatly reduce the probability of unpleasant odors, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.
[0064] In this technical solution, the heat insulating part 140 may further include a first heat dissipation hole 141. The first heat dissipation hole 141 is opened on the side of the cleaning base station and connected to the air gap, which can achieve heat dissipation and prevent heat energy from being directly output to the user's floor, further improving the user experience.
[0065] In one possible embodiment, the thermal insulation section 140 includes a second thermal insulation layer, a second air gap, and a second heat dissipation hole, the second thermal insulation layer being provided on the side of the heating assembly 130 away from the wastewater discharge section 110, the second air gap being formed on the side of the heating assembly 130 away from the wastewater discharge section 110, and the second heat dissipation hole being opened on the side of the cleaning base station and leading to the air gap. The second thermal insulation layer has a recess formed to avoid components on the heating assembly 130.
[0066] The technical solution further provides a structural configuration for the thermal insulation unit 140, which may include a second thermal insulation layer and a second air gap. The thermal insulation layer may be attached to the side of the heating assembly 130 facing away from the wastewater discharge unit 110, thereby allowing heat energy to be more easily output to the wastewater discharge unit 110, greatly reducing the waste of heat energy, lowering the energy consumption of the cleaning base station, and further improving the user experience. The technical solution may also dry out the liquid accumulated in the wastewater discharge unit 110, greatly inhibiting the growth of bacteria and significantly reducing the probability of odor generation, making the cleaning base station cleaner and more hygienic, and improving the user experience. The low thermal conductivity of air and the formation of the second air gap reduce insulation costs, significantly reduce thermal energy waste, lower the energy consumption of the cleaning base station, and further improve the user experience. Liquid accumulated in the wastewater discharge unit 110 can be dried, significantly inhibiting bacterial growth and significantly reducing the likelihood of odor generation, making the cleaning base station cleaner and more hygienic and improving the user experience. The installation of the second insulation layer and second air gap improves the insulation effect. The insulation unit 140 may further include a second heat dissipation hole. The second heat dissipation hole is located on the side of the cleaning base station and connects to the second air gap. This configuration achieves heat dissipation, preventing heat energy from being directly output to the user's floor, and further improving the user experience.
[0067] In this technique, a recess is formed in the second insulating layer, and by providing it in this manner, it is possible to avoid components on the heating assembly 130, such as fuses, spare NTCs, and protrusions of terminal adhesive on the heating assembly 130, thereby making the operation of the heating assembly 130 more stable.
[0068] As shown in Figures 2 and 3, in one possible embodiment, the cleaning base station further includes a bottom cover 150, which is provided on the side of the insulating section 140 away from the heating assembly 130.
[0069] In this technical solution, the cleaning base station may further include a bottom cover 150. The bottom cover 150 is provided on the side of the insulating part 140 that is away from the heating assembly 130. This arrangement can seal the cleaning base station and improve the design of the cleaning base station, while the bottom cover 150 can also serve as a heat insulator, greatly reducing the probability of heat energy being output to the user's floor and improving the user experience.
[0070] As shown in Figures 6 and 7, in one possible embodiment, the cleaning base station further includes a filtration section 160, which covers the wastewater discharge section 110 and has a plurality of through holes formed in the filtration section 160.
[0071] As shown in Figures 6 and 7, in this technical solution, the cleaning base station may further include a filter unit 160. The filter unit 160 covers the wastewater discharge unit 110, and a plurality of through holes are formed in the filter unit 160. During operation, wastewater generated after cleaning is completed flows through the filter unit 160 for initial filtration before entering the wastewater discharge unit 110. This configuration allows particulate matter in the wastewater to be blocked by the filter unit 160, thereby preventing clogging of the wastewater discharge unit 110.
[0072] In some examples, the density of the through-holes is positively correlated with the depth of the wastewater discharge tank 112 of the wastewater discharge section 110.
[0073] 6 and 7, in some examples, the through holes in the filtration unit 160 may be unevenly distributed to facilitate the discharge of water vapor generated when the sewage in the sewage discharge unit 110 is heated while still providing a filtering function. For example, the lower the water level in the sewage discharge unit 110, the denser the distribution of the through holes. This is because the deeper the sewage discharge tank 112, the greater the liquid flow rate. Therefore, the denser the distribution of the through holes, the more effective the filtering.
[0074] As shown in FIG. 1, in one possible embodiment, the cleaning base station further includes a housing 170, a cleaning assembly 180, a water supply section 190, a dust collection section 200, and a guide slope 210, wherein the wastewater discharge section 110, the liquid collection section 120, and the heating assembly 130 are provided in the housing 170, the cleaning assembly 180 is movably connected to the housing 170, the water supply section 190 is connected to the cleaning assembly 180, the dust collection section 200 is provided in the housing 170 and leads to the wastewater discharge section 110, and the guide slope 210 is provided in the housing 170, and one end of the guide slope 210 guides to the cleaning assembly 180.
[0075] In the technical solution, the cleaning base station may include a housing 170, a cleaning assembly 180, a water supply unit 190, a dust collection unit 200, and a guide slope 210. The housing 170 provides mounting positions for the wastewater discharge unit 110, the liquid collection unit 120, and the heating assembly 130. During operation, after the cleaning equipment of the cleaning system completes its cleaning task, it returns to its designated position in the cleaning base station through the guide slope 210 to start dust collection and washing operations. At this time, the water supply unit 190 supplies water to the cleaning assembly 180, which moves back and forth to automatically clean the mop of the cleaning equipment. The generated wastewater is vacuumed by the air pump of the wastewater discharge unit 110 to generate negative pressure, and the wastewater is sucked into the liquid collection unit 120. A small amount of wastewater remains in the wastewater discharge unit 110. The heating assembly 130 completes drying of the remaining wastewater by heating evaporation, and the dust collection unit 200 collects foreign matter, which further inhibits the growth of bacteria and significantly reduces the probability of unpleasant odors, making the use of the cleaning base station cleaner and more hygienic and improving the user experience.
[0076] As shown in Figures 1 to 7, a second aspect of an embodiment of the present application proposes a cleaning system, which includes a cleaning base station according to any one of the above technical solutions and a cleaning device, and the cleaning base station is used to clean the cleaning device.
[0077] The cleaning system provided in the embodiment of the present application includes the cleaning base station described in any of the above technical solutions, so the cleaning system has all the beneficial effects of the cleaning base station of the above technical solutions.
[0078] In some examples, the cleaning system may further include a cleaning appliance. The cleaning appliance may be a cleaning robot. The cleaning base station of the cleaning system provided in the embodiments of the present application includes a wastewater discharge unit 110, a liquid collection unit 120, and a heating assembly 130. During operation, after the cleaning appliance of the cleaning system completes a cleaning task, it can return to the cleaning base station for cleaning. After cleaning, the wastewater can be discharged into the liquid collection unit 120 by the wastewater discharge unit 110. Although the liquid collection unit 120 can store the wastewater in a centralized manner, some wastewater still remains in the wastewater discharge unit 110. Since the wastewater discharge unit 110 is always open, bacteria can easily grow and unpleasant odors can easily occur. Based on this, the cleaning base station provided in the embodiments of the present application can activate the heating assembly 130 to provide heat energy to the wastewater discharge unit 110, thereby drying the liquid stored in the wastewater discharge unit 110, significantly inhibiting bacterial growth and significantly reducing the likelihood of unpleasant odors, making the cleaning base station cleaner and more hygienic and improving the user experience.
[0079] In some examples, the cleaning system may further include cleaning equipment. The cleaning base station may further include a housing 170, a cleaning assembly 180, a water supply 190, a dust collection 200, and a guide slope 210. The housing 170 provides mounting locations for the wastewater discharge 110, the liquid collection 120, and the heating assembly 130. During operation, after the cleaning equipment of the cleaning system completes its cleaning task, it returns to its designated position in the cleaning base station through the guide slope 210 to start dust collection and washing operations. At this time, the water supply unit 190 supplies water to the cleaning assembly 180, which moves back and forth to automatically clean the mop of the cleaning equipment. The generated wastewater is vacuumed by the air pump of the wastewater discharge unit 110 to generate negative pressure, and the wastewater is sucked into the liquid collection unit 120. A small amount of wastewater remains in the wastewater discharge unit 110. The heating assembly 130 completes drying of the remaining wastewater by heating evaporation, and the dust is collected by the dust collection unit 200, which further significantly inhibits the growth of bacteria and significantly reduces the probability of unpleasant odors. This makes the use of the cleaning base station cleaner and more hygienic, and improves the user experience.
[0080] In this application, the terms "first," "second," and "third" are used for descriptive purposes only and should not be understood as indicating or implying relative importance, and the term "plurality" refers to two or more unless expressly limited otherwise. Terms such as "attached," "coupled," "connected," and "fixed" should all be understood broadly; for example, "connected" may mean a fixed connection, a detachable connection, or an integral connection, and "connected" may mean a direct connection or an indirect connection via an intermediary. Those skilled in the art can understand the specific meanings of the above terms in this application depending on the specific circumstances.
[0081] In describing this application, it should be understood that orientations or positional relationships indicated by terms such as "upper," "lower," "left," "right," "front," "rear," etc. are based on the orientations or positional relationships shown in the drawings, and are intended merely to facilitate and simplify the description of this application, and do not indicate or imply that the devices or units referred to have a particular direction or must be configured and operated in a particular orientation, and should not be understood as limiting this application.
[0082] In the description herein, the terms "one embodiment," "some embodiments," "particular embodiments," etc., mean that the specific feature, structure, material, or characteristic described with reference to the embodiment or example is included in at least one embodiment or example of the present application. In the description herein, exemplary descriptions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the described specific feature, structure, material, or characteristic may be combined in any suitable manner in any one or more embodiments or examples.
[0083] The above is only a preferred embodiment of the present application, and does not limit the present application. Those skilled in the art can make various modifications and variations to the present application. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present application shall fall within the protection scope of the present application.
Claims
1. A cleaning base station comprising a wastewater discharge section, a liquid collection section, and a heating assembly, The wastewater discharge section is in communication with the liquid collection section, The cleaning base station is characterized in that the heating assembly is provided on one side of the wastewater discharge section and is used to provide thermal energy to the wastewater discharge tank.
2. The wastewater discharge section includes a wastewater discharge pipe and a wastewater discharge tank. The wastewater discharge pipe is connected to the liquid collection section, The cleaning base station according to claim 1, characterized in that the wastewater discharge tank is in communication with the wastewater discharge pipe.
3. The heating assembly includes a heat conductive plate and a heat source. The heat conduction plate is provided on one side of the wastewater discharge tank, and the heat conduction plate is used to provide thermal energy to the wastewater discharge tank. The cleaning base station according to claim 2, characterized in that the heat source is provided on the side of the heat conduction plate away from the wastewater discharge tank, and the heat source is used to provide thermal energy to the heat conduction plate.
4. The cleaning base station according to claim 3, characterized in that the heat conductive plate is made of a metal material and the thickness of the heat conductive plate is 0.8 mm to 3 mm.
5. The cleaning base station according to claim 2, characterized in that the wastewater discharge tank is made of a heat conductive material, the heating assembly includes a heat source, the heat source is provided on one side of the wastewater discharge tank and is used to provide heat to the wastewater discharge tank.
6. The cleaning base station according to claim 2, characterized in that the wastewater discharge pipe comprises a liquid absorption segment and a check segment, the liquid absorption segment communicates with the wastewater discharge tank and the liquid collection section, and the check segment is located in the middle of the liquid absorption segment.
7. The cleaning base station according to claim 6, characterized in that the check segment includes at least one bent portion.
8. The cleaning base station according to claim 7, characterized in that the bent portion includes at least one of an S-shaped bend, a V-shaped bend, and a U-shaped bend.
9. Including an insulating section, The cleaning base station according to any one of claims 1 to 7, characterized in that the heat insulating portion is provided on the side of the heating assembly away from the wastewater discharge portion.
10. The heat insulating portion includes a first heat insulating layer, and the first heat insulating layer is provided on the side of the heating assembly away from the wastewater discharge portion. The cleaning base station according to claim 9, characterized in that the first insulating layer has a relief portion formed therein for avoiding the member on the heating assembly.
11. The heat insulating portion includes a first air gap and a first heat dissipation hole. The first air gap is formed on the side of the heating assembly away from the wastewater discharge section, The cleaning base station according to claim 9, characterized in that the first heat dissipation hole is provided on the side of the cleaning base station and is conductive to the first air gap.
12. The aforementioned heat insulating portion includes a second heat insulating layer, a second air gap, and a second heat dissipation vent. The second insulating layer is provided on the side of the heating assembly away from the wastewater discharge section, The second air gap is formed on the side of the second heat insulating layer that is away from the wastewater discharge section. The second heat dissipation vent is provided on the side of the cleaning base station and is conductive to the second air gap. The cleaning base station according to claim 9, characterized in that the second insulating layer has a relief portion formed therein for avoiding the member on the heating assembly.
13. Including the bottom lid, The cleaning base station according to claim 9, characterized in that the bottom cover is provided on the side of the heat insulating portion that is away from the heating assembly.
14. The cleaning base station according to claim 13, characterized in that the density of the through-holes shows a positive correlation with the depth of the wastewater discharge tank of the wastewater discharge section.
15. A cleaning system, A cleaning base station according to any one of claims 1 to 8, and a cleaning device, A cleaning system characterized in that the cleaning base station is used to clean the cleaning equipment.