Lithography apparatus with fluid handling structure

Abstract

This specification discloses a lithography apparatus comprising: a fluid handling structure spaced apart from a substrate and / or substrate support by a separation distance; a positioning device configured to move the substrate support, thereby moving the substrate; and a control system configured to control the positioning device so that the substrate support moves along a route including one or more preparation operations and one or more scan operations, wherein the control system is further configured to control the position of the fluid handling structure and / or substrate support to change the separation distance depending on whether a preparation operation or a scan operation is being performed, each preparation operation for moving the substrate to a position from which a new scan operation can be initiated, and each scan operation for moving and / or positioning the substrate during one or more exposure processes.

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