In-line deposition system for manufacturing buffer layers of high-temperature superconducting wires
The in-line deposition system addresses the challenges of continuous substrate flow and uniform film deposition in high-temperature superconducting wire manufacturing by using a continuous process chamber with vacuum maintenance and easy maintenance features, improving productivity and reliability.
JP2026520249APending Publication Date: 2026-06-23MARU L&C CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- MARU L&C CO LTD
- Filing Date
- 2025-03-06
- Publication Date
- 2026-06-23
Smart Images
Figure 2026520249000001_ABST
Abstract
The present invention relates to an in-line deposition system for manufacturing a buffer layer for high-temperature superconducting wires, and includes a extraction unit for drawing out a substrate, a buffer layer deposition unit for forming a multilayer metal oxide buffer layer on the substrate drawn out from the extraction unit, and a recovery unit for recovering the substrate on which the buffer layer has been formed, wherein the extraction unit, the buffer layer deposition unit, and the recovery unit are housed in a continuous process chamber for a continuous flow of substrates.
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