Synthesis of fluorosilicon polymers
A modified process for producing fluorosilicon polymers reduces manufacturing costs by minimizing gel formation and shortening equilibrium time, making them suitable for low-to-medium-performance release coatings.
Patent Information
- Application Number
- JP2025564210
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-05-10
- Publication Date
- 2026-07-13
AI Technical Summary
Current processes for producing fluorosilicon (F-Si) polymers used in low-to-medium-performance release coatings are costly due to long equilibrium times and gel formation, which hinders reactant mixing and increases manufacturing costs.
A modified process involving the combination of octamethylcyclotetrasiloxane, polydimethylsiloxane, tetrakis(vinyldimethylsiloxy)silane, potassium silanolate siloxane, and optionally trifluoropropylmethylcyclotrisiloxane, with polydimethylaminophosphazenium hydroxide, where trifluoropropylmethylcyclotrisiloxane is added dropwise, and the reaction is maintained at specific temperatures to minimize gel formation and reduce equilibrium time.
The process reduces the number of steps, minimizes gel formation, and significantly shortens the equilibrium time, resulting in a more cost-effective production of F-Si polymers suitable for low-to-medium-performance applications.
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