Tinamide compounds, and related compositions and methods

Abstract

A method is provided. The method comprises contacting a tin(IV) compound with a reagent to form at least one reaction product. The reagent comprises at least one of a metal alkoxide compound, a metal amide compound, or any combination thereof. The at least one reaction product comprises at least one of a substituted tin(IV) amide compound, a substituted tin(IV) alkoxide compound, or any combination thereof. In addition, various compositions and various compounds are also provided.

Description

[Technical Field]

[0001] field This disclosure relates to tinamide compounds and related compositions and methods.

[0002] Cross-reference of related applications This application claims the benefit of U.S. Provisional Application No. 63 / 529023, filed on 26 July 2023 under Section 119 of the U.S. Patent Act, the disclosures of which are incorporated herein by reference. [Background technology]

[0003] Some precursors are useful in the fabrication of microelectronic devices. The fabrication of such devices may require the use of extreme ultraviolet (EUV) lithography to form thin films. [Overview of the project]

[0004] Some embodiments relate to methods of synthesis. In some embodiments, the synthesis method involves contacting a tin(IV) alkoxide compound with a metal amide compound to form at least one reaction product. In some embodiments, the tin(IV) alkoxide compound includes compounds of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the metal amide compound includes compounds of the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore it is 5.

[0005] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20form an N-complex ring, n is from 0 to 3].

[0006] Some embodiments relate to compositions. In some embodiments, the composition comprises a metal alkoxide compound of the following formula: M(OR’) q [where: M is an alkali metal cation, an alkaline earth metal cation, a transition metal cation, or a post-transition metal cation, OR’ is independently alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or at least one of any combination thereof].

[0007] Some embodiments relate to methods. In some embodiments, the method comprises contacting a tin(IV) compound with a reagent to form at least one reaction product. In some embodiments, the tin(IV) compound comprises a compound of the following formula: R n Sn(Q) 4-n [where: R is alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or at least one of any combination thereof, Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the reagent comprises at least one of a metal alkoxide compound, a metal amide compound, or any combination thereof.

[0008] Some embodiments relate to a method. In some embodiments, the method involves contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product. In some embodiments, the tin(IV) compound includes compounds of the following formulas: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the metal alkoxide compound includes compounds of the following formula: M(OR)n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5.

[0009] Some embodiments relate to a method. In some embodiments, the method involves contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product. In some embodiments, the tin(IV) compound includes compounds of the following formulas: RnSn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the metal alkoxide compound includes compounds of the following formula: [M(OR)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2.

[0010] Some embodiments relate to a method. In some embodiments, the method involves contacting a tin(IV) compound with a metal amide compound to form at least one reaction product. In some embodiments, the tin(IV) compound includes compounds of the following formulas: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the metal amide compound includes compounds of the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore it is 5.

[0011] Some embodiments relate to a method. In some embodiments, the method involves contacting a tin(IV) compound with a reagent to form at least one reaction product. In some embodiments, the tin(IV) compound includes a compound of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. In some embodiments, the metal amide compound includes compounds of the following formula: [M(NR”2)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2.

[0012] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0013] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other to form a C3-C20 N-heterocycle. n is between 0 and 3.

[0014] Some embodiments relate to compositions. In some embodiments, the composition is a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. [Brief explanation of the drawing]

[0015] Some embodiments of the present disclosure are described herein by way of example only with reference to the accompanying drawings. Here, with particular regard to the details of the drawings, it is emphasized that the embodiments shown are illustrative and are intended for the purpose of discussion based on examples of embodiments of the present disclosure. In this regard, the description made using the drawings will clarify to those skilled in the art how the embodiments of the present disclosure can be realized.

[0016] [Figure 1] It is a flow diagram of a synthesis method according to some embodiments. [Figure 2] It shows a reaction scheme of a synthesis method according to some embodiments. [Figure 3] It shows a reaction scheme of a method for synthesizing a tin(IV) amide compound substituted with an isopropyl group according to some embodiments. [Figure 4] It shows a reaction scheme of a method for synthesizing a tin(IV) amide compound substituted with an isopropyl group according to some embodiments. [Figure 5] It shows a reaction scheme of a method for synthesizing a tin(IV) amide compound substituted with a vinyl group according to some embodiments. **Modes for Carrying Out the Invention**

[0017] Among the benefits and improvements disclosed, other objects and advantages of the present disclosure will become apparent from the following description provided together with the accompanying drawings. Although detailed embodiments of the present disclosure are disclosed herein, it should be understood that the disclosed embodiments are only examples of the present disclosure and can be realized in various forms. In addition, each of the examples provided with respect to various embodiments of the present disclosure is intended to be illustrative and not limiting.

[0018] All patent documents and publications referred to herein are hereby incorporated by reference in their entirety.

[0019] Throughout the specification and claims, the following terms have the meanings expressly given herein unless otherwise clearly inconsistent with the context. The expressions “in one embodiment,” “in an embodiment,” and “in some embodiments” as used herein may refer to the same embodiment, though not necessarily the same embodiment. Furthermore, the expressions “in another embodiment” and “in some other embodiments” as used herein may refer to different embodiments, though not necessarily different embodiments. All embodiments of this disclosure are intended to be combinable without departing from the scope or spirit of this disclosure.

[0020] As used herein, the term "based on" is not exclusive and may refer to additional factors not explicitly mentioned, provided that it does not contradict the context. Furthermore, throughout this specification, the meanings of "a," "an," and "the" include references to the plural. The meaning of "in" includes "in" and "on."

[0021] As used herein, the term "bring into contact" refers to bringing two or more components adjacent to each other, in close proximity, or in direct contact.

[0022] As used herein, the term "alkyl" refers to a hydrocarbyl having 1 to 30 carbon atoms. Alkyls can be bonded via single bonds. An alkyl having n carbon atoms is called "C n It is expressed as "alkyl". For example, "C3 alkyl" may include n-propyl and isopropyl. Alkyls having a certain range of carbon atoms, for example, 1 to 30 carbon atoms, are C1-C 30 It can be represented as alkyl. In some embodiments, alkyl is linear. In some embodiments, alkyl is branched. In some embodiments, alkyl is substituted. In some embodiments, alkyl is unsubstituted. In some embodiments, alkyl is C1-C 30 Alkyl, C1-C 29 Alkyl, C1-C 28 Alkyl, C1-C27 Alkyl, C1-C 27 Alkyl, C1-C 26 Alkyl, C1-C 25 Alkyl, C1-C 24 Alkyl, C1-C 23 Alkyl, C1-C 22 Alkyl, C1-C 21 Alkyl, C1-C 20 Alkyl, C1-C 19 Alkyl, C1-C 18 Alkyl, C1-C 17 Alkyl, C1-C 16 Alkyl, C1-C 15 Alkyl, C1-C 14 Alkyl, C1-C 13 Alkyl, C1-C 12 Alkyl, C1-C 11 Alkyl, C1-C 10 Alkyl, C1-C9 alkyl, C1-C8 alkyl, C1-C7 alkyl, C1-C6 alkyl, C1-C5 alkyl, C1-C4 alkyl, C1-C3 alkyl, C1-C2 alkyl, C2-C 30 Alkyl, C3-C 30 Alkyl, C4-C 30 Alkyl, C5-C 30 Alkyl, C6-C 30 Alkyl, C7-C 30 Alkyl, C8-C 30 Alkyl, C9-C 30 Alkyl, C 10 -C 30 Alkyl, C 11 -C 30 Alkyl, C 12 -C 30 Alkyl, C 13 -C 30 Alkyl, C 14 -C 30 Alkyl, C 15 -C 30 Alkyl, C 16 -C 30 Alkyl, C 17 -C 30 Alkyl, C 18 -C 30 Alkyl, C 19 -C 30Alkyl, C 20 -C 30 Alkyl, C 21 -C 30 Alkyl, C 22 -C 30 Alkyl, C 23 -C 30 Alkyl, C 24 -C 30 Alkyl, C 25 -C 30 Alkyl, C 26 [[ID=ID=26]]-C 30 Alkyl, C 27 -C 30 Alkyl, C 28 -C 30 Alkyl, C 29 -C 30 Alkyl, C2-C 10 Alkyl, C3-C 10 Alkyl, C4-C 10 Alkyl, C5-C 10 Alkyl, C6-C 10 Alkyl, C7-C 10 Alkyl, C8-C 10 Alkyl, C2-C9 alkyl, C2-C8 alkyl, C2-C7 alkyl, C2-C6 alkyl, C2-C5 alkyl, C3-C5 alkyl, or at least one of any combination thereof, or selected from the group consisting of them. In some embodiments, alkyl is methyl, ethyl, n-propyl, 1-methylethyl (isopropyl), n-butyl, isobutyl, sec-butyl, n-pentyl, 1,1-dimethylethyl (t-butyl), n-pentyl, isopentyl, neopentyl, n-hexyl, isohexyl, 3-methylhexyl, 2-methylhexyl, heptyl, octyl, nonyl, decyl, dodecyl, octadecyl, or at least one of any combination thereof, or selected from the group consisting of them. In some embodiments, alkyl is methyl. In some embodiments, alkyl is isopropyl. In some embodiments, alkyl is tert-butyl. In some embodiments, the term "alkyl" generally refers to alkyl, alkenyl, alkynyl, and / or cycloalkyl.

[0023] As used herein, the term “alkenyl” refers to a hydrocarbyl having 1 to 30 carbon atoms and at least one carbon-carbon double bond. In some embodiments, the alkenyl is C1-C 30 Alkenyl, C1-C 29 Alkenyl, C1-C 28 Alkenyl, C1-C 27 Alkenyl, C1-C 27 Alkenyl, C1-C 26 Alkenyl, C1-C 25 Alkenyl, C1-C 24 Alkenyl, C1-C 23 Alkenyl, C1-C 22 Alkenyl, C1-C 21 Alkenyl, C1-C 20 Alkenyl, C1-C 19 Alkenyl, C1-C 18 Alkenyl, C1-C 17 Alkenyl, C1-C 16 Alkenyl, C1-C 15 Alkenyl, C1-C 14 Alkenyl, C1-C 13 Alkenyl, C1-C 12 Alkenyl, C1-C 11 Alkenyl, C1-C 10 Alkenyl, C1-C9 Alkenyl 、 C1-C8 alkenyls, C1-C7 alkenyls, C1-C6 alkenyls, C1-C5 alkenyls, C1-C4 alkenyls, C1-C3 alkenyls, C1-C2 alkenyls, C2-C 30 Alkenil, C3-C 30 Alkenyl, C4-C 30 Alkenil, C5-C 30 Alkenyl, C6-C 30 Alkenil, C7-C 30 Alkenil, C8-C 30 Alkenil, C9-C 30 Alkenil, C 10 -C 30 Alkenil, C 11 -C 30 Alkenil, C 12 -C 30 Alkenil, C13 -C 30 Alkenil, C 14 -C 30 Alkenil, C 15 -C 30 Alkenil, C 16 -C 30 Alkenil, C 17 -C 30 Alkenil, C 18 -C 30 Alkenil, C 19 -C 30 Alkenil, C 20 -C 30 Alkenil, C 21 -C 30 Alkenil, C 22 -C 30 Alkenil, C 23 -C 30 Alkenil, C 24 -C 30 Alkenil, C 25 -C 30 Alkenil, C 26 -C 30 Alkenil, C 27 -C 30 Alkenil, C 28 -C 30 Alkenil, C 29 -C 30 Alkenyl, C2-C 10 Alkenil, C3-C 10 Alkenil 、 C4-C 10 Alkenil, C5-C 10 Alkenyl, C6-C 10 Alkenil, C7-C 10 Alkenil, C8-C 10The alkenyl group comprises, or is selected from, at least one of the following: alkenyl, C2-C9 alkenyl, C2-C8 alkenyl, C2-C7 alkenyl, C2-C6 alkenyl, C2-C5 alkenyl, C3-C5 alkenyl, or any combination thereof. Examples of alkenyl groups, but not limited to, include vinyl, allyl, 1-methylvinyl, 1-propenyl, 1-butenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1,3-butadienyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 1,3-pentadienyl, 2,4-pentadienyl, 1,4-pentadienyl, 3-methyl-2-butenyl, 1 The alkenyl is at least one of the following: -hexenyl, 2-hexenyl, 3-hexenyl, 1,3-hexadienyl, 1,4-hexadienyl, 2-methylpentenyl, 1-heptenyl, 3-heptenyl, 1-octenyl, 1,3-octadienyl, 1-nonenyl, 2-nonenyl, 3-nonenyl, 1-decenyl, 3-decenyl, 1-undecenyl, oleyl, linoleyl, linolenyl, or any combination thereof. In some embodiments, the alkenyl is vinyl. In some embodiments, the alkenyl is isopropenyl.

[0024] As used herein, the term "alkynyl" refers to a hydrocarbyl having 1 to 30 carbon atoms and at least one carbon-carbon triple bond. In some embodiments, the alkynyl is C1-C 30 Alkinyl, C1-C 29 Alkinyl, C1-C 28 Alkinyl, C1-C 27 Alkinyl, C1-C 27 Alkinyl, C1-C 26 Alkinyl, C1-C 25 Alkinyl, C1-C 24 Alkinyl, C1-C 23 Alkinyl, C1-C 22 Alkinyl, C1-C 21 Alkinyl, C1-C 20 Alkinyl, C1-C 19 Alkinyl, C1-C 18 Alkinyl, C1-C17 Alkinyl, C1-C 16 Alkinyl, C1-C 15 Alkinyl, C1-C 14 Alkinyl, C1-C 13 Alkinyl, C1-C 12 Alkinyl, C1-C 11 Alkinyl, C1-C 10 Alkinyl, C1-C9 Alkinyl 、 C1-C8 alkynyl, C1-C7 alkynyl, C1-C6 alkynyl, C1-C5 alkynyl, C1-C4 alkynyl, C1-C3 alkynyl, C1-C2 alkynyl, C2-C 30 Alkinyl, C3-C 30 Alkinyl, C4-C 30 Alkinyl, C5-C 30 Alkinyl, C6-C 30 Alkinyl, C7-C 30 Alkinyl, C8-C 30 Alkinyl, C9-C 30 Alkinyl, C 10 -C 30 Alkinyl, C 11 -C 30 Alkinyl, C 12 -C 30 Alkinyl, C 13 -C 30 Alkinyl, C 14 -C 30 Alkinyl, C 15 -C 30 Alkinyl, C 16 -C 30 Alkinyl, C 17 -C 30 Alkinyl, C 18 -C 30 Alkinyl, C 19 -C 30 Alkinyl, C 20 -C 30 Alkinyl, C 21 -C 30 Alkinyl, C 22 -C 30 Alkinyl, C 23 -C 30 Alkinyl, C 24 -C 30 Alkinyl, C 25-C 30 Alkinyl, C 26 -C 30 Alkinyl, C 27 -C 30 Alkinyl, C 28 -C 30 Alkinyl, C 29 -C 30 Alkinyl, C2-C 10 Alkinyl, C3-C 10 Alkinyl, C4-C 10 Alkinyl, C5-C 10 Alkinyl, C6-C 10 Alkinyl, C7-C 10 Alkinyl, C8-C 10 The alkynyl group comprises at least one of the following: alkynyl, C2-C9 alkynyl, C2-C8 alkynyl, C2-C7 alkynyl, C2-C6 alkynyl, C2-C5 alkynyl, C3-C5 alkynyl, or any combination thereof, or selected from the group consisting of these. Examples of alkynyl groups include, but are not limited to, ethinyl, propynyl, n-butynyl, n-pentynyl, 3-methyl-1-butynyl, n-hexynyl, methyl-pentynyl, or at least one combination thereof.

[0025] As used herein, the term "cycloalkyl" refers to a non-aromatic carbocyclic ring having 3 to 8 carbon atoms in the ring. This term includes monocyclic and polycyclic non-aromatic carbocyclic rings. When used as a modifier, the term "monocyclic" refers to a cycloalkyl having a single cyclic ring structure. When used as a modifier, the term "polycyclic" refers to a cycloalkyl having multiple cyclic ring structures, which may be ring structures linked by condensation, crosslinking, spiro, or other means. For example, three or more cycloalkyls can be condensed, crosslinked, or condensed and crosslinked to obtain a polycyclic non-aromatic carbocyclic ring. In some embodiments, the cycloalkyl may include, consist of, or be essentially composed of, or be selected from the group consisting of, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, or any combination thereof.

[0026] As used herein, the term "aryl" refers to monocyclic or polycyclic aromatic hydrocarbons. The number of carbon atoms in an aryl can range from 5 to 100. In some embodiments, an aryl has 5 to 20 carbon atoms. For example, in some embodiments, an aryl has 6 to 8 carbon atoms, 6 to 10 carbon atoms, 6 to 12 carbon atoms, 6 to 15 carbon atoms, or 6 to 20 carbon atoms. When used as a modifier, the term "monocyclic" refers to an aryl having a single aromatic ring structure. When used as a modifier, the term "polycyclic" refers to an aryl having multiple aromatic ring structures, which may be condensed, cross-linked, spiro-linked, or otherwise bonded ring structures. In some embodiments, the aryl is -C6H5. In some embodiments, the aryl is phenyl.

[0027] As used herein, the term "amino" refers to the formula -N(R a R b ) refers to the functional group, in the formula R a and R bindependently of R, is hydrogen, alkyl (as defined herein), or silyl (as defined herein), or R a and R b These are bonded to each other in a C3-C structure. 20It forms an N-heterocyclic ring. In some embodiments, the amino may include an alkylamino or dialkylamino. In some embodiments, the amino may include at least one of methylamino, dimethylamino, ethylamino, diethylamino, isopropylamino, di-isopropylamino, butylamino, sec-butylamino, tert-butylamino, di-sec-butylamino, isobutylamino, di-isobutylamino, di-tert-pentylamino, ethylmethylamino, isopropyl-n-propylamino, or any combination thereof. Examples of alkylaminos include, but are not limited to, one or more of the following: primary alkylaminos such as methylamino, ethylamino, n-propylamino, isopropylamino, n-butylamino, sec-butylamino, isobutylamino, t-butylamino, pentylamino, 2-aminopentane, 3-aminopentane, 1-amino-2-methylbutane, 2-amino-2-methylbutane, 3-amino-2-methylbutane, 4-amino-2-methylbutane, hexylamino, 5-amino-2-methylpentane, heptylamino, octylamino, nonylamino, decylamino, undecylamino, dodecylamino, tridecylamino, tetradecylamino, pentadecylamino, hexadecylamino, heptadecylamino, and octadecylamino, as well as, for example, limited The term is not defined, but includes secondary alkylaminos such as dimethylamino, diethylamino, dipropylamino, diisopropylamino, dibutylamino, diisobutylamino, di-sec-butylamino, di-t-butylamino, dipentylamino, dihexylamino, diheptylamino, dioctylamino, dinonylamino, didecylamino, methylethylamino, methylpropylamino, methylisopropylamino, methylbutylamino, methylisobutylamino, methyl-sec-butylamino, methyl-t-butylamino, methylamylamino, methylisoamylamino, ethylpropylamino, ethylisopropylamino, ethylbutylamino, ethylisobutylamino, ethyl-sec-butylamino, ethylamino, ethylisoamylamino, propylbutylamino, and propylisobutylamino.

[0028] As used herein, the term "alkoxy" refers to the formula -OR c It refers to the functional group, and in the formula, R c The alkoxy is alkyl (as defined herein), silylalkyl, cycloalkyl, or aryl. In some embodiments, the alkoxy may consist of, consist of, or be essentially composed of, or be selected from the group consisting of, methoxy, ethoxy, methoxy, ethoxy, n-propoxy, 1-methylethoxy (isopropoxy), n-butoxy, iso-butoxy, sec-butoxy, tert-butoxy, or any combination thereof.

[0029] As used herein, the term "silyl" refers to the formula -Si(R e R f R g ) refers to the functional group, in the formula R e , R f , and R g Each of these is independently a hydrogen or alkyl as defined herein. In some embodiments, silyl is a functional group of formula -SiH3. In some embodiments, silyl is a functional group of formula -SiR e H2 is a functional group, and in the formula, R e It is not hydrogen. In some embodiments, silyl is of the formula -SiR e R f H is a functional group, and in the formula, R e and R f It is not hydrogen. In some embodiments, silyl is of the formula -Si(R e R f R g ) is a functional group, in the formula R e , R f , and R g It is not hydrogen. In some embodiments, silyl is a functional group of the formula -Si(CH3)3 (e.g., trimethylsilyl).

[0030] As used herein, the term "alkoxyalkyl" refers to an alkyl group as defined herein, wherein at least one of the hydrogen atoms of the alkyl group is replaced by an alkoxy group as defined herein. In some embodiments, the term "alkoxyalkyl" refers to an alkyl group of the formula -(alkyl)OR a It refers to the functional group, and the alkyl in the formula is defined above, R a is defined above. In some embodiments, the alkoxyalkyl is of formula -(CH2) n Ure a It is a functional group, where n is from 1 to 10, and R a This is defined above. In some embodiments, the alkoxyalkyl is a functional group of the formula -CH2CH2OCH3.

[0031] As used herein, the term "aralkyl" refers to an alkyl group as defined herein, wherein at least one of the hydrogen atoms of the alkyl group is replaced by an aryl group as defined herein. In some embodiments, the term "aralkyl" refers to a functional group of the formula -(alkyl)(aryl), where alkyl is as defined above and aryl is as defined above. In some embodiments, the aralkyl group is -CH2(C6H5).

[0032] As used herein, the term "aminoalkyl" refers to an alkyl group as defined herein, wherein at least one of the hydrogen atoms of the alkyl group is replaced by an amino group as defined herein. In some embodiments, the term "aminoalkyl" refers to an alkyl group of the formula -(alkyl)N(R a R b ) refers to the functional group, where alkyl is defined above, R a and R bThe above definitions apply. In some embodiments, the aminoalkyl is -CH2N(CH3)2. In some embodiments, the aminoalkyl is -(CH2)3N(CH3)2. In some embodiments, the aminoalkyl is aminomethyl (-CH2NH2). In some embodiments, the aminoalkyl is N,N-dimethylaminoethyl (-CH2CH2N(CH3)2). In some embodiments, the aminoalkyl is 3-(N-cyclopropylamino)propyl (-CH2CH2CH2NH-Pr).

[0033] As used herein, the term “silylalkyl” refers to an alkyl group as defined herein, wherein at least one of the hydrogen atoms of the alkyl group is replaced by a silyl group as defined herein. In some embodiments, the term “silylalkyl” refers to a group of the formula -(alkyl)Si(R e R f R g ) refers to the functional group, where alkyl is defined above, R e , R f , and R g This is defined above. In some embodiments, silylalkyl is defined by the formula -(CH2) m Si(R e R f R g ) is a functional group, where m is from 1 to 10, and R e , R f , and R g This is defined above. In some embodiments, the silylalkyl is a functional group of the formula -CH2Si(CH3)3.

[0034] As used herein, the term “haloalkyl” refers to an alkyl group as defined herein, wherein at least one of the hydrogen atoms of the alkyl group is replaced by a halide as defined herein. In some embodiments, the haloalkyl group includes a fluoroalkyl group. In some embodiments, the fluoroalkyl group includes at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0035] As used herein, the term "halogen" refers to -Cl, -Br, -I, or -F.

[0036] As used herein, the term "metal cation" refers to at least one of alkali metal cations, alkaline earth metal cations, transition metal cations, post-transition metal cations, or any combination thereof. In some embodiments, the metal cations include lithium cations, sodium cations, potassium cations, rubidium cations, cesium cations, francium cations, beryllium cations, magnesium cations, calcium cations, strontium cations, barium cations, radium cations, scandium cations, titanium cations, vanadium cations, chromium cations, manganese cations, iron cations, cobalt cations, nickel cations, copper cations, zinc cations, yttrium cations, zirconium cations, niobium cations, molybdenum cations, technetium cations, ruthenium cations, rhodium cations, palladium cations, silver cations, cadmium cations, hafnium cations, tantalum cations, tungsten cations, rhenium cations, osmium cations, iridium cations, platinum cations, gold cations, mercury cations, aluminum cations, gallium cations, indium cations, tin cations, thallium cations, lead cations, bismuth cations, or polonium cations. The charges of the metal cations are known and will not be repeated here for simplicity. However, it will be noted that the metal cations can have any known charge. For example, in some embodiments, the metal cation is Lithium + kaNa + , K + , Rb + , Cs + Mg 2+ Ca 2+ Sr 2+ Ba 2+ , or Zn 2+ This includes the following. In some embodiments, the metal cation is Sn(II) or Sn(IV). In some embodiments, the metal is Ti, Zr, or Hf.

[0037] Some embodiments relate to compositions and systems and methods related thereto. In some embodiments, the compositions are useful, among other applications, in extreme ultraviolet (EUV) lithography and related methods. The compositions disclosed herein include at least one of a tin (IV) amide compound, a metal alkoxide compound, or any combination thereof. The tin (IV) amide compound can be used to form a tin-containing film useful in the manufacture of microelectronic devices including semiconductor devices. For example, the composition can be used as a precursor for forming a functionalized tin oxide film (RSnO x ). The functionalized tin oxide film can be used, among other things, in dry resist coating or as a reflective coating for extreme ultraviolet (EUV) lithography. The composition can be formed in high yield and high purity (i.e., low levels of impurities, unwanted by-products, etc.) according to the methods disclosed herein, while at the same time minimizing the number of steps required to produce the precursor composition.

[0038] Tin-containing films can also be formed according to the methods disclosed herein. That is, the tin-containing films disclosed herein can be formed by one or more deposition processes that utilize the precursor composition. Examples of deposition processes include, but are not limited to, chemical vapor deposition (CVD) processes, digital or pulsed chemical vapor deposition processes, plasma enhanced cyclic chemical vapor deposition processes (PECCVD), fluidized chemical vapor deposition processes (FCVD), atomic layer deposition (ALD) processes, thermal atomic layer deposition, plasma enhanced atomic layer deposition (PEALD) processes, metal organic chemical vapor deposition (MOCVD) processes, plasma enhanced chemical vapor deposition (PECVD) processes, or at least one of any combination thereof.

[0039] The synthetic methods disclosed herein provide synthetic routes for preparing tin(IV) amide compounds, such as monoalkyltinamide compounds (and / or metal alkoxide compounds), from alkoxy derivatives, for example, but not limited to these. The synthetic routes can produce tin(IV) amide compounds that cannot be produced using conventional routes. In addition, the synthetic routes are simpler than conventional routes, do not require strict conditions for product separation, and do not have the difficulty of separating the product from other species with similar boiling points. In some embodiments, the synthetic methods use an initial transition metal compound (e.g., an initial transition metal amine) to introduce the amide group to tin. In some embodiments, the tin(IV) amide compounds are useful as precursors in the vapor deposition process. In some embodiments, metal alkoxide compounds are useful as precursors in the vapor deposition process. In some embodiments, both tin(IV) amide compounds and metal alkoxide compounds are useful as precursors, thus reducing the waste generated by the synthetic methods disclosed herein.

[0040] Figure 1 is a flow chart of synthesis method 100 according to several embodiments. As shown in Figure 1, in some embodiments, synthesis method 100 includes contacting a tin(IV) alkoxide compound 104 with a reagent 106 to form at least one reaction product 108.

[0041] In some embodiments, contact 102 includes placing the tin(IV) alkoxide compound 104 and the metal amide compound 106 adjacent or in close proximity. In some embodiments, contact 102 includes directly and physically contacting the tin(IV) alkoxide compound 104 and the metal amide compound 106. In some embodiments, contact 102 includes mixing or stirring the tin(IV) alkoxide compound 104 and the metal amide compound 106. In some embodiments, contact 102 includes vigorously stirring the tin(IV) alkoxide compound 104 and the metal amide compound 106. In some embodiments, contact 102 includes reacting the tin(IV) alkoxide compound 104 and the metal amide compound 106. In some embodiments, contact 102 includes adding the tin(IV) alkoxide compound 104 and the metal amide compound 106 to a reactor or combining them in a reactor. In some embodiments, contact 102 includes dissolving at least one of the tin(IV) alkoxide compound 104, the metal amide compound 106, or any combination thereof, in at least one of a solution, solvent, or reaction medium. In some embodiments, contact 102 includes dissolving the tin(IV) alkoxide compound 104 in a first solution, dissolving the metal amide compound 106 in a second solution, and combining the first and second solutions in a reactor. In some embodiments, contact 102 includes dissolving the tin(IV) alkoxide compound 104 in a first solution, and combining the first solution and the metal amide compound 106 in a reactor. In some embodiments, contact 102 includes dissolving the metal amide compound 106 in a second solution, and combining the tin(IV) alkoxide compound 104 and the second solution in a reactor.

[0042] In some embodiments, at least 0.25 equivalents of the metal amide compound 106 are contacted with the tin(IV) alkoxide compound 104. In some embodiments, at least 0.5, 0.75, 1, 1.25, 1.5, 1.75, or 2 equivalents of the metal amide compound 106 are contacted with the tin(IV) alkoxide compound 104. In some embodiments, 0.25 to 2 equivalents, 0.5 to 2 equivalents, 0.75 to 2 equivalents, 1 to 2 equivalents, 1.25 to 2 equivalents, 1.5 to 2 equivalents, 1.75 to 2 equivalents, 0.25 to 1.75 equivalents, 0.25 to 1.5 equivalents, 0.25 to 1.25 equivalents, 0.25 to 1 equivalent, 0.25 to 0.75 equivalents, or 0.25 to 0.5 equivalents of the metal amide compound 106 are contacted with the tin(IV) alkoxide compound 104.

[0043] In some embodiments, the tin(IV) alkoxide compound 104 includes compounds of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0044] In some embodiments, the tin(IV) alkoxide compound 104 includes compounds of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is 0, 1, 2, or 3.

[0045] In some embodiments, the tin(IV) alkoxide compound 104 includes compounds of the following formula: TIFF2026525471000002.tif49170[in formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof.

[0046] In some embodiments, R comprises at least one of an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof. In some embodiments, R is an unsaturated alkyl. In some embodiments, R is a saturated alkyl. In some embodiments, R is a linear alkyl. In some embodiments, R is a branched alkyl. In some embodiments, R is a fluoroalkyl. In some embodiments, the fluoroalkyl is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0047] In some embodiments, the tin(IV) alkoxide compound is a compound of the following formula: TIFF2026525471000003.tif35170.

[0048] In some embodiments, the tin(IV) alkoxide compound is a compound of the following formula: TIFF2026525471000004.tif36170.

[0049] In some embodiments, the tin(IV) alkoxide compound is a compound of the following formula: TIFF2026525471000005.tif41170.

[0050] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0051] In some embodiments, R is a C1-C6 alkyl group.

[0052] In some embodiments, R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0053] In some embodiments, R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0054] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1.

[0055] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1.

[0056] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3.

[0057] In some embodiments, R is a C1-C6 alkyl group.

[0058] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1.

[0059] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1.

[0060] In some embodiments, reagent 106 comprises at least one of a metal alkoxide compound, a metal amide compound, or any combination thereof.

[0061] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, 3, 4, or 5.

[0062] In some embodiments, the metal amide compound is a compound of the following formula: TIFF2026525471000006.tif49170[In formula: M is Ti, Zr, or Hf. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring.]

[0063] In some embodiments, the metal amide compound is a compound of the following formula: TIFF2026525471000007.tif46170.

[0064] In some embodiments, the metal amide compound is a compound of the following formula: TIFF2026525471000008.tif46170.

[0065] In some embodiments, the metal amide compound is a compound of the following formula: TIFF2026525471000009.tif46170.

[0066] In some embodiments, the metal amide compound is a compound of the following formula: M(NR"2) [In formula: M is lithium, sodium, or magnesium. R is independently a C1-C6 alkyl group.

[0067] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl.

[0068] In some embodiments, the metal amide compound includes a compound of the following formula: [M(NR”2)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2.

[0069] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2.

[0070] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R is a C1-C6 alkyl group. n is 2.

[0071] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2.

[0072] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5.

[0073] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is an alkali metal cation or an alkaline earth metal cation. R'' is independently a C1-C6 alkyl group. n is either 1 or 2.

[0074] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is sodium, lithium, or magnesium. R'' is independently a C1-C6 alkyl group. n is either 1 or 2.

[0075] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1.

[0076] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [M(OR)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2.

[0077] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [Sn(OR)2] n [In formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2.

[0078] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2.

[0079] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is 0, 1, 2, or 3.

[0080] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: TIFF2026525471000010.tif49170[in formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring.]

[0081] In some embodiments, R comprises at least one of an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof. In some embodiments, R is an unsaturated alkyl. In some embodiments, R is a saturated alkyl. In some embodiments, R is a linear alkyl. In some embodiments, R is a branched alkyl. In some embodiments, R is a fluoroalkyl. In some embodiments, the fluoroalkyl is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0082] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: TIFF2026525471000011.tif46170.

[0083] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: TIFF2026525471000012.tif49170.

[0084] In some embodiments, at least one reaction product comprises a metal alkoxide compound of the following formula: M(OR') q [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. q is 2, 3, 4, or 5.

[0085] In some embodiments, at least one reaction product comprises a metal alkoxide compound of the following formula: TIFF2026525471000013.tif49170[in formula: M is a transition metal cation or a post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof.

[0086] In some embodiments, at least one reaction product comprises a metal alkoxide compound of the following formula: TIFF2026525471000014.tif35170.

[0087] In some embodiments, at least one reaction product comprises a metal alkoxide compound of the following formula: TIFF2026525471000015.tif36170.

[0088] In some embodiments, at least one reaction product comprises a metal alkoxide compound of the following formula: TIFF2026525471000016.tif36170.

[0089] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is a C1-C6 alkyl group. R is a C1-C6 alkyl group. n is 1.

[0090] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0091] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1.

[0092] In some embodiments, the tin(IV) compound is a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1] Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0093] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0094] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal amide compounds include compounds of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0095] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal alkoxide compounds include compounds of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. At least one reaction product contains a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1.

[0096] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal alkoxide compounds include compounds of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. At least one reaction product contains a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1.

[0097] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0098] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1.

[0099] In some embodiments, at least one reaction product comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3.

[0100] In some embodiments, at least one reaction product comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is a C1-C6 alkyl group. R is a C1-C6 alkyl group. n is 1.

[0101] In some embodiments, at least one reaction product comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1.

[0102] (RSnX3+M(OR) n →RSn(OR)3)

[0103] In some embodiments, the method includes contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product.

[0104] In some embodiments, the tin(IV) compound includes compounds of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0105] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5.

[0106] In some embodiments, the tin(IV) compound includes a tin(IV) alkoxide compound of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0107] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0108] In some embodiments, R is a C1-C6 alkyl group.

[0109] In some embodiments, R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0110] In some embodiments, R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0111] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3.

[0112] In some embodiments, R is a C1-C6 alkyl group.

[0113] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is an alkali metal cation or an alkaline earth metal cation. R'' is independently a C1-C6 alkyl group. n is either 1 or 2.

[0114] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is sodium, lithium, or magnesium. R'' is independently a C1-C6 alkyl group. n is either 1 or 2.

[0115] In some embodiments, the metal alkoxide compound includes a compound of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1.

[0116] In some embodiments, at least one reaction product comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3.

[0117] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal alkoxide compounds include compounds of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. At least one reaction product contains a tin(IV) alkoxide compound of the following formula: R n Sn(OR)4-n [In formula: R is isopropyl, R is tert-butyl, n is 1.

[0118] (RSnX3+[Sn(OR)2] n →RSn(OR)3)

[0119] In some embodiments, the method includes contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product.

[0120] In some embodiments, the tin(IV) compound includes compounds of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0121] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [M(OR)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2.

[0122] In some embodiments, the tin(IV) compound includes a tin(IV) alkoxide compound of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0123] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0124] In some embodiments, R is a C1-C6 alkyl group.

[0125] In some embodiments, R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0126] In some embodiments, R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0127] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3.

[0128] In some embodiments, R is a C1-C6 alkyl group.

[0129] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [Sn(OR)2] n [In formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2.

[0130] In some embodiments, the metal alkoxide compound includes a compound of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2.

[0131] In some embodiments, at least one reaction product comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3.

[0132] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal alkoxide compounds include compounds of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. At least one reaction product contains a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1.

[0133] (RSnX3+M(NR2) n →RSn(NR2)3)

[0134] In some embodiments, the method includes contacting a tin(IV) compound with a metal amide compound to form at least one reaction product.

[0135] In some embodiments, the tin(IV) compound includes compounds of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0136] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore it is 5.

[0137] In some embodiments, the tin(IV) compound includes a tin(IV) alkoxide compound of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0138] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0139] In some embodiments, R is a C1-C6 alkyl group.

[0140] In some embodiments, R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0141] In some embodiments, R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0142] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3.

[0143] In some embodiments, R is a C1-C6 alkyl group.

[0144] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) [In formula: M is an alkali metal cation or an alkaline earth metal cation. R is independently a C1-C6 alkyl group.

[0145] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) [In formula: M is lithium, sodium, or magnesium. R is independently a C1-C6 alkyl group.

[0146] In some embodiments, the metal amide compound includes a compound of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl.

[0147] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3.

[0148] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal amide compounds include compounds of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0149] (RSnX3+[Sn(NR2)2] n →RSn(NR2)3)

[0150] In some embodiments, the method includes contacting a tin(IV) compound with a reagent to form at least one reaction product.

[0151] In some embodiments, the tin(IV) compound includes compounds of the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0152] In some embodiments, the metal amide compound includes a compound of the following formula: [M(NR”2)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2.

[0153] In some embodiments, the tin(IV) compound includes a tin(IV) alkoxide compound of the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0154] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0155] In some embodiments, R is a C1-C6 alkyl group.

[0156] In some embodiments, R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0157] In some embodiments, R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0158] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3.

[0159] In some embodiments, R is a C1-C6 alkyl group.

[0160] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2.

[0161] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R is a C1-C6 alkyl group. n is 2.

[0162] In some embodiments, the metal amide compound includes a compound of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2.

[0163] In some embodiments, at least one reaction product comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3.

[0164] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0165] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: Rn Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0166] In some embodiments, the tin(IV) compound includes a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1.

[0167] In some embodiments, the tin(IV) compound includes a tin(IV) halogen compound of the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1. Metal amide compounds include compounds of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. At least one reaction product contains a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1.

[0168] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) carboxylate compound of the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3.

[0169] R is independently a C1-C6 alkyl group.

[0170] R' is independently a C1-C6 alkyl group.

[0171] R' is independently either methyl or phenyl.

[0172] In some embodiments, the purity of the tin(IV) carboxylate compound is at least 95%. In some embodiments, the purity of the tin(IV) carboxylate compound is 95% to 99.9999%, 95.5% to 99.9999%, 96% to 99.9999%, 96.5% to 99.9999%, 97% to 99.9999%, 97.5% to 99.9999%, 98% to 99.9999%, 98.5% to 99.9999%, 99% to 99.9999%, and 99.5% to 99.999 9%, 99.9% to 99.9999%, 99.99% to 99.9999%, 99.999% to 99.9999%, 95% to 99.999%, 95% to 999%, 95% to 99%, 95% to 99.5%, 95% to 99%, 95% to 98.5%, 95% to 98%, 95% to 97.5%, 95% to 97%, 95% to 96.5%, 95% to 96%, or 95% to 95.5%.

[0173] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) amide compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3.

[0174] In some embodiments, R is independently a C1-C6 alkyl group.

[0175] In some embodiments, R'' is independently a C1-C6 alkyl group.

[0176] In some embodiments, the purity of the tin(IV)amide compound is at least 95%. In some embodiments, the purity of the tin(IV)amide compound is 95% to 99.9999%, 95.5% to 99.9999%, 96% to 99.9999%, 96.5% to 99.9999%, 97% to 99.9999%, 97.5% to 99.9999%, 98% to 99.9999%, 98.5% to 99.9999%, 99% to 99.9999%, 99.5% to 99.9999%, This is 99.9% to 99.9999%, 99.99% to 99.9999%, 99.999% to 99.9999%, 95% to 99.999%, 95% to 999%, 95% to 99.5%, 95% to 99%, 95% to 98.5%, 95% to 98%, 95% to 97.5%, 95% to 97%, 95% to 96.5%, 95% to 96%, or 95% to 95.5%.

[0177] Some embodiments relate to compositions. In some embodiments, the composition comprises a tin(IV) alkoxide compound of the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3.

[0178] In some embodiments, R is independently a C1-C6 alkyl group.

[0179] In some embodiments, R'' is independently a C1-C6 alkyl group.

[0180] In some embodiments, the purity of the tin(IV) alkoxide compound is at least 95%. In some embodiments, the purity of the tin(IV) alkoxide compound is 95% to 99.9999%, 95.5% to 99.9999%, 96% to 99.9999%, 96.5% to 99.9999%, 97% to 99.9999%, 97.5% to 99.9999%, 98% to 99.9999%, 98.5% to 99.9999%, 99% to 99.9999%, and 99.5% to 99.9999%. These are %, 99.9% to 99.9999%, 99.99% to 99.9999%, 99.999% to 99.9999%, 95% to 99.999%, 95% to 999%, 95% to 99.5%, 95% to 99%, 95% to 98.5%, 95% to 98%, 95% to 97.5%, 95% to 97%, 95% to 96.5%, 95% to 96%, or 95% to 95.5%.

[0181] Some embodiments relate to compositions comprising tin(IV)amide compounds. In some embodiments, the tin(IV)amide compound is a compound of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is 0, 1, 2, or 3.

[0182] In some embodiments, the tin(IV) amide compound is a compound of the following formula: TIFF2026525471000017.tif49170[In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring.]

[0183] In some embodiments, R comprises at least one of an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof. In some embodiments, R is an unsaturated alkyl. In some embodiments, R is a saturated alkyl. In some embodiments, R is a linear alkyl. In some embodiments, R is a branched alkyl. In some embodiments, R is a fluoroalkyl. In some embodiments, the fluoroalkyl is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0184] In some embodiments, the tin(IV) amide compound includes compounds of the following formulas: TIFF2026525471000018.tif46170.

[0185] In some embodiments, the tin(IV) amide compound includes compounds of the following formulas: TIFF2026525471000019.tif49170.

[0186] In some embodiments, the composition comprises, based on the total weight of the composition, at least 95% by weight, at least 95.5% by weight, at least 96% by weight, at least 96.5% by weight, at least 97% by weight, at least 97.5% by weight, at least 98% by weight, at least 98.5% by weight, at least 99% by weight, at least 99.5% by weight, at least 99.9% by weight, at least 99.99% by weight, at least 99.999% by weight, and at least 99.9999% by weight of a tin(IV) amide compound. Several orientations and compositions are based on the total weight of the composition, ranging from 95% to 99.9999% by weight, 95.5% to 99.9999% by weight, 96% to 99.9999% by weight, 96.5% to 99.9999% by weight, 97% to 99.9999% by weight, 97.5% to 99.9999% by weight, 98% to 99.9999% by weight, 98.5% to 99.9999% by weight, 99% to 99.9999% by weight, 99.5% to 99.9999% by weight, and 99.9% to 99.9999% by weight. The product contains a tin(IV) amide compound in the following amounts: by weight %, 99.99% to 99.9999% by weight, 99.999% to 99.9999% by weight, 95% to 99.999% by weight, 95% to 999% by weight, 95% to 99% by weight, 95% to 99.5% by weight, 95% to 99% by weight, 95% to 98.5% by weight, 95% to 98% by weight, 95% to 97.5% by weight, 95% to 97% by weight, 95% to 96.5% by weight, 95% to 96% by weight, or 95% to 95.5% by weight.

[0187] Some embodiments relate to compositions comprising a metal alkoxide compound. In some embodiments, the metal alkoxide compound is a compound of the following formula: M(OR') q [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof.

[0188] In some embodiments, the metal alkoxide compound is a compound of the following formula: TIFF2026525471000020.tif49170[in formula: M is a transition metal cation or a post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof.

[0189] In some embodiments, the metal alkoxide compound is a compound of the following formula: TIFF2026525471000021.tif35170.

[0190] In some embodiments, the metal alkoxide compound is a compound of the following formula: TIFF2026525471000022.tif36170.

[0191] In some embodiments, the metal alkoxide compound is a compound of the following formula: TIFF2026525471000023.tif36170.

[0192] In some embodiments, the composition comprises, based on the total weight of the composition, at least 95% by weight, at least 95.5% by weight, at least 96% by weight, at least 96.5% by weight, at least 97% by weight, at least 97.5% by weight, at least 98% by weight, at least 98.5% by weight, at least 99% by weight, at least 99.5% by weight, at least 99.9% by weight, at least 99.99% by weight, at least 99.999% by weight, and at least 99.9999% by weight of a metal alkoxide compound. Several orientations and compositions are based on the total weight of the composition, ranging from 95% to 99.9999% by weight, 95.5% to 99.9999% by weight, 96% to 99.9999% by weight, 96.5% to 99.9999% by weight, 97% to 99.9999% by weight, 97.5% to 99.9999% by weight, 98% to 99.9999% by weight, 98.5% to 99.9999% by weight, 99% to 99.9999% by weight, 99.5% to 99.9999% by weight, and 99.9% to 99.999% by weight. The material contains 9% by weight, 99.99% to 99.9999% by weight, 99.999% to 99.9999% by weight, 95% to 99.999% by weight, 95% to 999% by weight, 95% to 99% by weight, 95% to 99.5% by weight, 95% to 99% by weight, 95% to 98.5% by weight, 95% to 98% by weight, 95% to 97.5% by weight, 95% to 97% by weight, 95% to 96.5% by weight, 95% to 96% by weight, or 95% to 95.5% by weight of a metal alkoxide compound.

[0193] Figure 2 is a flowchart of a method for producing a tin-containing film 200 according to several embodiments. As shown in Figure 2, the method for producing a tin-containing film 200 includes, consists of, or can be essentially comprised of, one or more of the following steps: obtaining a precursor 202, obtaining at least one co-reactant precursor 204, vaporizing the precursor to obtain a vaporized precursor 206, vaporizing at least one co-reactant precursor to obtain at least one vaporized co-reactant precursor 208, and contacting at least one of the vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof, with a substrate under deposition conditions to form a tin-containing film on the substrate 210.

[0194] Step 202 may include, consist of, or essentially consist of obtaining a precursor. The precursor may include, consist of, or essentially consist of, any one or more compositions comprising tin(IV) amide compounds disclosed herein. Obtaining the precursor may include obtaining a container or other reaction vessel containing the precursor. In some embodiments, the precursor may be obtained in a container or other reaction vessel for vaporizing the precursor.

[0195] Step 204 may include, consist of, or essentially consist of obtaining at least one co-reactant precursor. In some embodiments, the at least one co-reactant precursor includes, consists of, essentially consists of, or is selected from the group consisting of, oxidizing gases, reducing gases, hydrocarbons, or any combination thereof. The at least one co-reactant precursor may be selected to obtain a desired tin-containing film. In some embodiments, the at least one co-reactant precursor may include, consist of, or essentially consists of, at least one of, N2, H2, NH3, N2H4, CH3HNNH2, CH3HNNHCH3, NCH3H2, NCH3CH2H2, N(CH3)2H, N(CH3CH2)2H, N(CH3)3, N(CH3CH2)3, Si(CH3)2NH, pyrazoline, pyridine, ethylenediamine, or any combination thereof. In some embodiments, the at least one co-reactant precursor may consist of, be composed of, or be essentially composed of, at least one of H2, O2, O3, H2O, H2O2, NO, N2O, NO2, CO, CO2, carboxylic acids, alcohols, diols, or any combination thereof. In some embodiments, the at least one co-reactant precursor may consist of, be composed of, or be essentially composed of, at least one of methane, ethane, ethylene, acetylene, or any combination thereof. Obtaining the precursor may involve obtaining a container or other reaction vessel containing the at least one co-reactant precursor. In some embodiments, the at least one co-reactant precursor may be obtained in a container or other reaction vessel that vaporizes the at least one co-reactant precursor. In some embodiments, the method further includes an inert gas, such as argon, helium, nitrogen, or at least one of any combination thereof.

[0196] Step 206 includes, or consists of, or essentially consists of, vaporizing the precursor to obtain a vaporized precursor. Vaporization includes, or consists of, or essentially consists of, heating the precursor sufficiently to obtain a vaporized precursor. In some embodiments, vaporization includes, or consists of, heating the container containing the precursor. In some embodiments, vaporization includes, or consists of, or essentially consists of, heating the precursor in a deposition chamber in which the deposition process is carried out. In some embodiments, vaporization includes, or consists of, or essentially consists of, heating a conduit for delivering the precursor, the vaporized precursor, or any combination thereof to, for example, the deposition chamber. In some embodiments, vaporization includes, or consists of, or essentially consists of, heating a gas phase supply system containing the precursor. In some embodiments, vaporization may include, consist of, or essentially consist of, heating the precursor to a temperature sufficient to vaporize it and obtain a vaporized precursor. In some embodiments, vaporization may include, consist of, or essentially consist of, heating to a temperature below the decomposition temperature of at least one of the precursor, the vaporized precursor, or any combination thereof. In some embodiments, the precursor may exist in the gas phase if step 206 is optional and not required. For example, the precursor may include, consist of, or essentially consist of a vaporized precursor.

[0197] Step 208 includes, or consists of, or essentially consists of, vaporizing at least one co-reactant precursor to obtain at least one vaporized co-reactant precursor. In some embodiments, vaporization includes, or consists of, or essentially consists of, heating at least one co-reactant precursor sufficiently to obtain at least one vaporized co-reactant precursor. In some embodiments, vaporization includes, or consists of, heating a container containing at least one co-reactant precursor, or essentially consists of heating the container. In some embodiments, vaporization includes, or consists of, or essentially consists of, heating at least one co-reactant precursor in a deposition chamber in which the deposition process is carried out. In some embodiments, vaporization may include, consist of, or essentially consist of, heating a conduit for delivering at least one co-reactant precursor, at least one vaporized co-reactant precursor, or any combination thereof to, for example, a deposition chamber. In some embodiments, vaporization may include, consist of, or essentially consist of, operating a gas phase supply system containing at least one co-reactant precursor. In some embodiments, vaporization may include, consist of, or essentially consist of, heating at least one co-reactant precursor to a temperature sufficient to vaporize it in order to obtain at least one vaporized co-reactant precursor. In some embodiments, vaporization may include, consist of, or essentially consist of, heating at least one of the co-reactant precursors, at least one vaporized co-reactant precursor, or any combination thereof to a temperature below its decomposition temperature.In some embodiments, at least one co-reactant precursor may be present in the gas phase if step 108 is optional and not required. For example, the at least one co-reactant precursor may include, consist of, or essentially consist of at least one vaporized co-reactant precursor.

[0198] Step 210 includes, consists of, or essentially consists of, contacting a substrate with at least one of a vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof, under deposition conditions sufficient to form a tin-containing film on the surface of the substrate. The contact can be carried out within any system, apparatus, device, assembly, chamber, or component thereof suitable for a deposition process, including, but not limited to, a deposition chamber. The vaporized precursor and at least one co-reactant precursor can be contacted with the substrate simultaneously or at different time points. For example, each of the vaporized precursor, at least one vaporized co-reactant precursor, and the substrate may be present simultaneously in the deposition chamber. That is, in some embodiments, contact may include contacting the vaporized precursor and at least one vaporized co-reactant precursor with the substrate simultaneously or at the same time. Alternatively, each of the vaporized precursor and at least one vaporized co-reactant precursor may be present in the deposition chamber at different time points. In other words, in some embodiments, contact may include alternately and / or sequentially contacting vaporized precursors with a substrate in one or more cycles, and then contacting at least one vaporized co-reactant precursor with the substrate.

[0199] Evaporation conditions may include conditions for the evaporation process. Examples of evaporation conditions include, but are not limited to, conditions for evaporation processes that include chemical evaporation (CVD) processes, digital or pulsed chemical evaporation processes, plasma-enhanced cycle chemical evaporation processes (PECCVD), fluid chemical evaporation processes (FCVD), atomic layer deposition (ALD) processes, thermal atomic layer deposition, plasma-enhanced atomic layer deposition (PEALD) processes, metal-organic chemical evaporation (MOCVD) processes, plasma-enhanced chemical evaporation (PECVD) processes, or at least one of any combination thereof.

[0200] The deposition conditions may include, consist of, or essentially consist of the deposition temperature. The deposition temperature may be below the thermal decomposition temperature of at least one of the vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof. The deposition temperature may be high enough to reduce or avoid condensation of at least one of the vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof. In some embodiments, the substrate may be heated to the deposition temperature. In some embodiments, the substrate and the chamber or other reaction vessel in contact with the vaporized precursor and at least one vaporized co-reactant precursor are heated to the deposition temperature. In some embodiments, at least one of the vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof may be heated to the deposition temperature.

[0201] The deposition temperature can be between 200°C and 2500°C. In some embodiments, the deposition temperature may be between 500°C and 700°C. For example, in some embodiments, the deposition temperature may be between 500°C and 680°C, 500°C and 660°C, 500°C and 640°C, 500°C and 620°C, 500°C and 600°C, 500°C and 580°C, 500°C and 560°C, 500°C and 540°C, 500°C and 520°C, 520°C and 700°C, 540°C and 700°C, 560°C and 700°C, 580°C and 700°C, 600°C and 700°C, 620°C and 700°C, 640°C and 700°C, 660°C and 700°C, or 680°C and 700°C. In other embodiments, the deposition temperature is, for example, not limited to, 400°C to 2000°C, 500°C to 2000°C, 550°C to 2400°C, 600°C to 2400°C, 625°C to 2400°C, 650°C to 2400°C, 675°C to 2400°C, 700°C to 2400°C, 725°C to 2400°C, 750°C to 2400°C, 775°C to 2400°C, and 800°C to 2400°C. °C, 825°C to 2400°C, 850°C to 2400°C, 875°C to 2400°C, 900°C to 2400°C, 925°C to 2400°C, 950°C to 2400°C, 975°C to 2400°C, 1000°C to 2400°C, 1025°C to 2400°C, 1050°C to 2400°C, 1075°C to 2400°C, 1100°C to 2400°C, 1200°C to 2400°C, 1300 From 1°C to 2400°C, 1400°C to 2400°C, 1500°C to 2400°C, 1600°C to 2400°C, 1700°C to 2400°C, 1800°C to 2400°C, 1900°C to 2400°C, 2000°C to 2400°C, 2100°C to 2400°C, 2200°C to 2400°C, 2300°C to 2400°C, 500°C to 2000°C, 500°C to 1900°C, 500°C or Temperatures can range from 200°C to 2500°C, such as 1800°C, 500°C to 1700°C, 500°C to 1600°C, 500°C to 1500°C, 500°C to 1400°C, 500°C to 1300°C, 500°C to 1200°C, 500°C to 1100°C, 500°C to 1000°C, 500°C to 1000°C, 500°C to 900°C, or 500°C to 800°C.

[0202] The deposition conditions may include, consist of, or essentially consist of, the deposition pressure. In some embodiments, the deposition pressure may include, consist of, or essentially consist of, the vapor pressure of at least one of the vaporized precursor, at least one vaporized co-reactant precursor, or any combination thereof. In some embodiments, the deposition pressure may include, consist of, or essentially consist of, the chamber pressure.

[0203] The deposition pressure can range from 0.001 Torre to 100 Torre. For example, in some embodiments, the deposition pressure may be 1 Torre to 30 Torre, 1 Torre to 25 Torre, 1 Torre to 20 Torre, 1 Torre to 15 Torre, 1 Torre to 10 Torre, 5 Torre to 50 Torre, 5 Torre to 40 Torre, 5 Torre to 30 Torre, 5 Torre to 20 Torre, or 5 Torre to 15 Torre. In other embodiments, the initial pressure may be between 1 Torre and 100 Torre, 5 Torre and 100 Torre, 10 Torre and 100 Torre, 15 Torre and 100 Torre, 20 Torre and 100 Torre, 25 Torre and 100 Torre, 30 Torre and 100 Torre, 35 Torre and 100 Torre, 40 Torre and 100 Torre, 45 Torre and 100 Torre, 50 Torre and 100 Torre, 55 Torre and 100 Torre, 60 Torre and 100 Torre, 65 Torre and 100 Torre, 70 Torre and 100 Torre, 75 Torre and 100 Torre, 80 Torre and 100 Torre, 85 Torre and 100 Torre, 90 Torre and 100 Torre, 95 Torre and 100 Torre, 1 Torre and 95 Torre, 1 Torre and 90 Torre, 1 Torre and 85 Torre, 1 Torre and 80 Torre, 1 Torre and 75 Torre, or 1 Torre and 70 Torre. In other further embodiments, the deposition pressure may be a pressure of 1m Torre to 100m Torre, 1m Torre to 90m Torre, 1m Torre to 80m Torre, 1m Torre to 70m Torre, 1m Torre to 60m Torre, 1m Torre to 50m Torre, 1m Torre to 40m Torre, 1m Torre to 30m Torre, 1m Torre to 20m Torre, 1m Torre to 10m Torre, 100m Torre to 300m Torre, 150m Torre to 300m Torre, 200m Torre to 300m Torre, or 150m Torre to 250m Torre, or 150m Torre to 225m Torre.

[0204] The substrate includes, consists of, or may essentially consist of, Si, Co, Cu, Al, W, WN, WC, TiN, Mo, MoC, SiO2, W, SiN, WCN, Al2O3, AlN, ZrO2, La2O3, TaN, RuO2, IrO2, Nb2O3, Y2O3, hafnium oxide, or any combination thereof.

[0205] The tin-containing film may include tin oxide or a tin oxide film. In some embodiments, the tin-containing film includes functionalized tin oxide. In some embodiments, the tin-containing film includes functionalized tin oxide of the following formula: RSnO z (wherein z is 1 to 6). In some embodiments, R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, or indenyl.

[0206] Some embodiments relate to tin-containing films on the surface of a substrate. In some embodiments, the tin-containing film includes any film formed according to the methods disclosed herein. In some embodiments, the tin-containing film includes any film prepared from the precursors disclosed herein.

[0207] Figure 2 shows the reaction scheme of synthesis method 200 according to several embodiments. As shown in Figure 2, synthesis method 200 involves reacting a tin(IV) alkoxide compound 202 with a metal amide compound 204 to form at least one reaction product. In some embodiments, at least one reaction product includes a tin(IV) amide compound 206. In some embodiments, at least one reaction product includes a metal alkoxide compound 208.

[0208] In some embodiments, the synthesis method proceeds according to the following reaction scheme: TIFF2026525471000024.tif40170.

[0209] In some embodiments, the synthesis method is [ i [PrSn(O2CMe)3] and [[Sn(NMe2)2]2] are reacted to form [ i This includes forming [PrSn(NMe2)3]. TIFF2026525471000025.tif41170

[0210] In some embodiments, the synthesis method is i Reacting PrSn(O2CMe)3 with LiNMe2 i This includes forming PrSn(NMe2)3. TIFF2026525471000026.tif39170

[0211] In some embodiments, the synthesis method proceeds according to the following reaction scheme: TIFF2026525471000027.tif49170

[0212] In some embodiments, the synthesis method proceeds according to the following reaction scheme: TIFF2026525471000028.tif48170

[0213] In some embodiments, the synthesis method includes reacting iPrSn(benzoate)3 with [Sn(NMe2)2]2 to form iPrSn(NMe2)3.

[0214] In some embodiments, the synthesis method includes reacting iPropenylSnCl3 with [Sn(NMe2)2]2 to form iPropenylSn(NMe2)3.

[0215] In some embodiments, the synthesis method includes the following: TIFF2026525471000029.tif49170

[0216] In some embodiments, the synthesis method proceeds according to the following reaction scheme: TIFF2026525471000030.tif49170

[0217] In some embodiments, the synthesis method is i Reacting PrSn(O2CMe)3 with LiNMe2 i This includes forming PrSn(NMe2)3. TIFF2026525471000031.tif39170

[0218] In some embodiments, the synthesis method is i Reacting PrSnCl3 with [Sn(NMe2)2]2 i This includes forming PrSn(NMe2)3. TIFF2026525471000032.tif40170

[0219] In some embodiments, the synthesis method is i Reacting PrSn(O2CMe)3 with [Sn(NMe2)2]2 i This includes forming PrSn(NMe2)3. TIFF2026525471000033.tif41170

[0220] In some embodiments, the synthesis method includes reacting iPrSn(benzoate)3 with [Sn(NMe2)2]2 to form iPrSn(NMe2)3.

[0221] In some embodiments, the synthesis method includes reacting iPropenylSnCl3 with [Sn(NMe2)2]2 to form iPropenylSn(NMe2)3. [Examples]

[0222] Example 1 Figure 3 shows the reaction schemes for the synthesis of isopropyl-substituted tin(IV) amide compounds according to several embodiments. To synthesize the tin(IV) amide compounds, 320 g (52.4 mmol) of iPrSn(OtBu) was packed into a 40 mL amber vial fitted with a stirring bar. To this, Ti(NMe2)4 (8.8 g, 39.3 mmol) was slowly added dropwise to control the exothermic reaction. The reaction mixture was stirred overnight. iPrSn(NMe2)3: 1 H-NMR (400MHz, C6D6, 298K): 1.46 (d, 6H), 1.89 (m, 1H), 2.83 (s, 18H), 119 Sn{ 1 H}-NMR(149MHz,C6D6,298K):-64.9ppm.

[0223] Example 2 Figure 4 shows the reaction schemes for the synthesis of isopropyl-substituted tin(IV) amide compounds according to several embodiments. iPrSn(OTMS)3 (1.22 g, 2.86 mmol) was placed in an amber vial and dissolved in C6D6 (0.500 g). Separately, Hf(NMe2)4 (0.54 g, 2.86 mmol) was dissolved in C6D6 (0.500 g), and the colorless solution was added to the iPrSn(OTMS)3 solution. The reaction was rapidly exothermic, and the solution remained colorless. iPrSn(NMe2)3: 119 Sn{ 1 H}-NMR(149MHz,C6D6,298K):-64.3ppm.

[0224] Example 3 Figure 5 shows the reaction schemes for the synthesis of vinyl-substituted tin(IV) amide compounds according to several embodiments. To synthesize the tin(IV) amide compounds, ViSn(OTMS)3 (1 g, 2.41 mmol) was dissolved in 1 g of C6D6 in a 40 mL amber vial. Ti(NMe2)4 (270 mg, 1.21 mmol) was added. A slight rise in temperature was observed. The solution was pale yellow. ViSn(NMe2)3: 1H-NMR (400MHz, C6D6, 298K): 2.73 (s, 18H), 5.61~6.43 (m, 3H) 119 Sn{ 1 H}-NMR(149MHz,C6D6,298K):-92.0ppm.

[0225] Example 4 Synthesis of iPrSn(NMe2)3 from iPrSn(benzoate)3 and [Sn(NMe2)2]2 [Sn(NMe2)2]2 (1.31 g, 6.34 mmol) and iPrSn(benzoate)3 (1.11 g, 2.11 mmol) were combined in a 40 mL amber vial in a glove box. 2 mL of C6D6 was added, and the vial was shaken. After about 1 minute, the mixture became opaque. After 20 minutes, the material was filtered through a 0.2 μm syringe filter. The collected liquid was bright yellow in color. The NMR recorded for the stock solution of the product was consistent with the formation of iPrSn(NMe2)3 (-64 ppm). 119 Sn-NMR analysis revealed that the dialkyl group (iPr2Sn(NMe2)2) was not present.

[0226] Example 5 Synthesis of iPropenylSn(NMe2)3 from iPropenylSnCl3 and [Sn(NMe2)2]2 In a 100 mL Schlenk flask, dimethylamine (1.78 g, 19.7 mL, 2.0 mol, 39.5 mmol) was added, followed by rapid addition of isopropenyl SnCl3 (5.00 g, 18.8 mmol). The mixture was stirred overnight.

[0227] The volatile substances were then removed by vacuum, and the solid was dried. The solid was then suspended in 50 mL of hexane, and [Sn(NMe2)2]2 (11.7 g, 56.4 mmol) was rapidly added. The mixture was stirred overnight.

[0228] The following morning, the flask was placed in a -35°C freezer for 20 minutes. The reaction mixture was then filtered through disposable polypropylene frit. The solid was washed with additional cold hexane. Volatile substances were removed under reduced pressure. 5.2 g of a cloudy yellow liquid was collected. The sample was prepared for NMR analysis.

[0229] 119 Sn-NMR confirmed that the material is isopropenyl Sn(NMe2)3 (-99 ppm) and that less than 0.1% of dialkyl (isopropenyl 2Sn(NMe2)2, -87 ppm) is present.

[0230] Example 6 From PrSnCl3 and [Sn(NMe2)2]2 i Synthesis of PrSn(NMe2)3 i PrSnCl3 (1.00 g, 3.73 mmol) was packed into a 40 mL amber vial fitted with a magnetic stirring rod and diluted with hexane (10 mL). [Sn(NMe2)2]2 (2.31 g, 5.59 mmol) was dissolved in hexane (25 mL) to form a flax-colored solution, and this was used. i When the compound was added to a vial containing PrSnCl3 over 2 minutes with stirring, a precipitate formed. After complete addition, the resulting mixture was stirred for 72 hours. The mixture was allowed to precipitate, and the mother liquor was filtered through a 0.2 μm syringe filter. The resulting pale green / pale yellow solution was dried under reduced pressure to obtain 0.54 g of a nearly colorless liquid. The NMR spectrum recorded for the C6D6 solution of the product was as follows: i It has consistency with the formation of PrSn(NMe2)3, 119 Sn NMR is dialkyl( i The presence of Pr2Sn(NMe2)2) was not shown.

[0231] Example 7 i From PrSn(O2CMe)3 and [Sn(NMe2)2]2 i Synthesis of PrSn(NMe2)3 iPrSn(O2CMe)3 (1.0 g, 2.95 mmol) and Sn(NMe2)2]2 (1.83 g, 4.43 mmol) were combined in a 40 mL amber vial equipped with a magnetic stirring rod and diluted with 30 mL of hexane. The resulting mixture was stirred at 60°C for 12 hours, and after a few seconds, the reaction products appeared as a concentrated bright yellow mixture. The yellow mixture was cooled to room temperature, the mother liquor was decanted, and the mixture was filtered through a 0.2 μm syringe filter. The resulting pale yellow solution was dried under reduced pressure to obtain a bright yellow liquid. NMR was collected for the C6D6 solution. 119 Sn-NMR determined that the target molecule (iPrSn(NMe2)3) was formed.

[0232] Example 8 i From PrSn(O2CMe)3 and LiNMe2 i Synthesis of PrSn(NMe2)3 i PrSn(O2CMe)3 (0.250 g, 0.738 mmol) was packed into a 40 mL vial equipped with a magnetic stirring rod and diluted with C6D6 (0.5 mL) to form a yellow solution. LiNMe2 (0.119 g, 2.32 mmol) was added directly to the yellow solution with stirring, forming a thick white mixture, which was stirred at room temperature for 72 hours. The reaction mixture was allowed to precipitate, aliquots were collected, and filtered through a 0.2 μm syringe filter. The resulting colorless solution was subjected to NMR analysis. 119 Sn-NMR (-64 ppm) determined that the starting material (iPrSn(O2CMe)3) was no longer present, and the target molecule ( i PrSn(NMe2)3) was observed.

[0233] manner Various embodiments are described below. It should be understood that any one or more of the features described in the embodiments below can be combined with any one or more other embodiments.

[0234] Embodiment 1. A method of synthesis: The process involves contacting a tin(IV) alkoxide compound with a metal amide compound to form at least one reaction product. The tin(IV) alkoxide compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a+b=2, therefore 5. A method comprising the compound.

[0235] Embodiment 2. The method according to Embodiment 1, wherein at least 0.25 equivalents of a metal amide compound are brought into contact with a tin(IV) alkoxide compound.

[0236] Embodiment 3. A method according to Embodiment 1 or 2, wherein 0.5 to 2 equivalents of a metal amide compound are contacted with a tin(IV) alkoxide compound.

[0237] Apparatus 4. The tin(IV) alkoxide compound is of the following formula: TIFF2026525471000034.tif49170[in formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently includes at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. A method according to any one of embodiments 1 to 3, comprising the compound.

[0238] Embodiment 5. The method according to Embodiment 4, wherein R comprises at least one of an unsaturated alkyl, saturated alkyl, linear alkyl, branched alkyl, fluoroalkyl, halogen, oxygen, nitrogen, silicon, or any combination thereof.

[0239] Embodiment 6. The method according to Embodiment 4, wherein R is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0240] Embodiment 7. The method according to Embodiment 4, wherein R is isopropyl.

[0241] Embodiment 8. The method according to Embodiment 4, wherein R is vinyl.

[0242] Embodiment 9. The method according to Embodiment 4, wherein OR' contains tert-butyl.

[0243] Embodiment 10. The method according to Embodiment 4, wherein OR' contains trimethylsilyl.

[0244] Apparatus 11. The tin(IV) alkoxide compound is the following compound: A method according to any one of embodiments 1 to 10, which is at least one of TIFF2026525471000035.tif111170.

[0245] Apparatus 12. The metal amide compound is of the following formula: TIFF2026525471000036.tif49170[in formula: M is Ti, Zr, or Hf. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring] A method according to any one of embodiments 1 to 11, wherein the compound is [the compound].

[0246] Embodiment 13. The method according to Embodiment 12, wherein M is Ti, Zr, or Hf.

[0247] Embodiment 14. The method according to Embodiment 12, wherein R'' is methyl.

[0248] Apparatus 15. The metal amide compound is one of the following compounds: A method according to any one of embodiments 1 to 14, which is at least one of TIFF2026525471000037.tif137170.

[0249] Embodiment 16. At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A method according to any one of embodiments 1 to 15, comprising a tin(IV) amide compound.

[0250] Embodiment 17. At least one reaction product is given by the following formula: TIFF2026525471000038.tif49170[in formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring] A method according to any one of embodiments 1 to 16, comprising a tin(IV) amide compound.

[0251] Embodiment 18. The method according to Embodiment 17, wherein R comprises at least one of an unsaturated alkyl, saturated alkyl, linear alkyl, branched alkyl, fluoroalkyl, halogen, oxygen, nitrogen, silicon, or any combination thereof.

[0252] Embodiment 19. The method according to Embodiment 17, wherein R is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0253] Embodiment 20. The method according to Embodiment 17, wherein R is isopropyl.

[0254] Embodiment 21. The method according to Embodiment 17, wherein R is vinyl.

[0255] Embodiment 22. The method according to Embodiment 17, wherein R'' is methyl.

[0256] Embodiment 23. At least one reaction product is given by the following formula: A method according to any one of embodiments 1 to 22, comprising at least one tin(IV) amide compound from TIFF2026525471000039.tif94170.

[0257] Embodiment 24. At least one reaction product is given by the following formula: M(OR') q [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. q is between 2 and 5. A method according to any one of embodiments 1 to 23, comprising a metal alkoxide compound.

[0258] Embodiment 25. At least one reaction product is given by the following formula: TIFF2026525471000040.tif49170[in formula: M is a transition metal cation or a post-transition metal cation. OR' independently includes at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. A method according to any one of embodiments 1 to 24, comprising a metal alkoxide compound.

[0259] Embodiment 26. The method according to Embodiment 25, wherein M is Ti, Zr, or Hf.

[0260] Embodiment 27. The method according to Embodiment 25, wherein OR' contains tert-butyl.

[0261] Embodiment 28. The method according to Embodiment 25, wherein OR' contains trimethylsilyl.

[0262] Embodiment 29. At least one reaction product is: A method according to any one of embodiments 1 to 28, comprising at least one metal alkoxide compound from TIFF2026525471000041.tif106170.

[0263] Embodiment 30. A composition comprising the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A composition comprising a tin(IV) amide compound.

[0264] Apparatus 31. The tin(IV) amide compound is of the following formula: TIFF2026525471000042.tif49170[in formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 [Forms an N-heterogenetic ring] A composition according to embodiment 30, which is a compound of the above.

[0265] Embodiment 32. A composition according to Embodiment 31, wherein R comprises at least one of the following: an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof.

[0266] Embodiment 33. A composition according to Embodiment 31, wherein R is at least one of -CH2CF3, -CH(CF3)2, -CH2F, -CH2CH2F, -CF3, -CF2CF3, or any combination thereof.

[0267] Embodiment 34. A composition according to Embodiment 31, wherein R is isopropyl.

[0268] Embodiment 35. A composition according to Embodiment 31, wherein R is vinyl.

[0269] Embodiment 36. A composition according to Embodiment 31, wherein R'' is methyl.

[0270] Apparatus 37. The tin(IV) amide compound is of the following formula: A composition according to any one of embodiments 30 to 36, comprising at least one of TIFF2026525471000043.tif94170.

[0271] Embodiment 38. A composition according to any one of Embodiments 30 to 37, wherein the purity of the tin(IV) amide compound is at least 99%.

[0272] Embodiment 39. A composition comprising the following formula: M(OR') q [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently includes at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. A composition containing a metal alkoxide compound.

[0273] Apparatus 40. The metal alkoxide compound is of the following formula: TIFF2026525471000044.tif49170[in formula: M is a transition metal cation or a post-transition metal cation. OR' independently includes at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. A composition according to embodiment 39, which is a compound of [the compound].

[0274] Embodiment 41. A composition according to Embodiment 40, wherein M is Ti, Zr, or Hf.

[0275] Embodiment 42. A composition according to Embodiment 40, wherein OR' contains tert-butyl.

[0276] Embodiment 43. A composition according to Embodiment 40, wherein OR' contains trimethylsilyl.

[0277] Apparatus 44. The metal alkoxide compound is of the following formula: A composition according to any one of embodiments 39 to 43, comprising at least one of TIFF2026525471000045.tif106170.

[0278] Embodiment 45. A composition according to any one of Embodiments 39 to 44, wherein the purity of the metal alkoxide compound is at least 99%.

[0279] Embodiment 46. A method comprising contacting a tin(IV) compound with a reagent to form at least one reaction product, The tin(IV) compound is given by the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, The reagent comprises at least one of a metal alkoxide compound, a metal amide compound, or any combination thereof. method.

[0280] Apparatus 47. A tin(IV) compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 46, comprising a tin(IV) alkoxide compound.

[0281] Apparatus 48. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 46 or 47, comprising a tin(IV) carboxylate compound.

[0282] Embodiment 49. The method according to Embodiment 48, wherein R is a C1-C6 alkyl group.

[0283] Embodiment 50. The method according to Embodiment 49, wherein R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0284] Embodiment 51. The method according to Embodiment 49, wherein R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0285] Apparatus 52. The tin(IV) compound is of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. A method according to any one of embodiments 46 to 51, comprising a tin(IV) carboxylate compound.

[0286] Apparatus 53. The tin(IV) compound is of the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1. A method according to any one of embodiments 46 to 52, comprising a tin(IV) carboxylate compound.

[0287] Apparatus 54. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3. A method according to any one of embodiments 46 to 53, comprising a tin(IV) halogen compound.

[0288] Embodiment 55. The method according to Embodiment 54, wherein R is a C1-C6 alkyl group.

[0289] Apparatus 56. A tin(IV) compound is of the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1. A method according to any one of embodiments 46 to 55, comprising a tin(IV) halogen compound.

[0290] Apparatus 57. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1. A method according to any one of embodiments 46 to 55, comprising a tin(IV) halogen compound.

[0291] Apparatus 58. The metal amide compound is of the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a+b=2, therefore 5. A method according to any one of embodiments 46 to 57, comprising the compound.

[0292] Apparatus 59. The metal amide compound is of the following formula: M(NR"2) [In formula: M is lithium, sodium, or magnesium. R is independently a C1-C6 alkyl group. A method according to any one of embodiments 46 to 58, comprising the compound.

[0293] Apparatus 60. The metal amide compound is of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. A method according to any one of embodiments 46 to 59, comprising the compound.

[0294] Apparatus 61. The metal amide compound is of the following formula: [M(NR”2)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2. A method according to any one of embodiments 46 to 60, comprising the compound.

[0295] Apparatus 62. The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2. A method according to any one of embodiments 46 to 61, comprising the compound.

[0296] Embodiment 63. The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R is a C1-C6 alkyl group. n is 2. A method according to any one of embodiments 46 to 62, comprising the compound.

[0297] Apparatus 64 The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. A method according to any one of embodiments 46 to 63, comprising the compound.

[0298] Apparatus 65. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5. A method according to any one of embodiments 46 to 64, comprising the compound.

[0299] Apparatus 66. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is an alkali metal cation or an alkaline earth metal cation. R'' is independently a C1-C6 alkyl group. n is either 1 or 2. A method according to any one of embodiments 46 to 65, comprising the compound.

[0300] Apparatus 67. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is sodium, lithium, or magnesium. R'' is independently a C1-C6 alkyl group. n is either 1 or 2. A method according to any one of embodiments 46 to 66, comprising the compound.

[0301] Apparatus 68 The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. A method according to any one of embodiments 46 to 67, comprising the compound.

[0302] Apparatus 69. The metal alkoxide compound is of the following formula: [M(OR)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. A method according to any one of embodiments 46 to 68, comprising the compound.

[0303] Apparatus 70. The metal alkoxide compound is of the following formula: [Sn(OR)2] n [In formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. A method according to any one of embodiments 46 to 69, comprising the compound.

[0304] Apparatus 71. The metal alkoxide compound is of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. A method according to any one of embodiments 46 to 70, comprising the compound.

[0305] Embodiment 72. At least one reaction product is of the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A method according to any one of embodiments 46 to 71, comprising a tin(IV) amide compound.

[0306] Embodiment 73. At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is a C1-C6 alkyl group. R is a C1-C6 alkyl group. n is 1. A method according to any one of embodiments 46 to 72, comprising a tin(IV) amide compound.

[0307] Embodiment 74. At least one reaction product is of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 73, comprising a tin(IV) amide compound.

[0308] Embodiment 75. At least one reaction product is of the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 74, comprising a tin(IV) amide compound.

[0309] Apparatus 76. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1. It contains a tin(IV) halogen compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 75, comprising a tin(IV) amide compound.

[0310] Apparatus 77. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2]n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 76, comprising a tin(IV) amide compound.

[0311] Apparatus 78. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 77, comprising a tin(IV) amide compound.

[0312] Apparatus 79. A tin(IV) compound is given by the following formula: R n Sn(O2CR')4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal alkoxide compounds are given by the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. Contains the compound, At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1. A method according to any one of embodiments 46 to 78, comprising a tin(IV) alkoxide compound.

[0313] Apparatus 80. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal alkoxide compounds are given by the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(OR)4-n [In formula: R is isopropyl, R is tert-butyl, n is 1. A method according to any one of embodiments 46 to 79, comprising a tin(IV) alkoxide compound.

[0314] Apparatus 81. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1. It contains a tin IV carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 80, comprising a tin(IV) amide compound.

[0315] Apparatus 82. The tin(IV) compound is of the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1. It contains a tin-IV halogen compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1. A method according to any one of embodiments 46 to 81, comprising a tin(IV) amide compound.

[0316] Embodiment 83. At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. A method according to any one of embodiments 46 to 82, comprising a tin(IV) alkoxide compound.

[0317] Embodiment 84. At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is a C1-C6 alkyl group. R is a C1-C6 alkyl group. n is 1. A method according to any one of embodiments 46 to 83, comprising a tin(IV) alkoxide compound.

[0318] Embodiment 85. At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1. A method according to any one of embodiments 46 to 84, comprising a tin(IV) alkoxide compound.

[0319] (RSnX3+M(OR) n →RSn(OR)3)

[0320] Embodiment 86. A method comprising contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal alkoxide compounds are given by the following formula: M(OR) n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5. A method comprising the compound.

[0321] Apparatus 87. A tin(IV) compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 86, comprising a tin(IV) alkoxide compound.

[0322] Apparatus 88. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 86 or 87, comprising a tin(IV) carboxylate compound.

[0323] Embodiment 89. A method according to any one of Embodiments 86 to 88, wherein R is a C1-C6 alkyl group.

[0324] Embodiment 90. A method according to any one of Embodiments 86 to 89, wherein R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0325] Embodiment 91. A method according to any one of Embodiments 86 to 90, wherein R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0326] Apparatus 92. The tin(IV) compound is of the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3. A method according to any one of embodiments 86 to 91, comprising a tin(IV) halogen compound.

[0327] Embodiment 93. A method according to any one of Embodiments 86 to 92, wherein R is a C1-C6 alkyl group.

[0328] Apparatus 94. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is an alkali metal cation or an alkaline earth metal cation. R'' is independently a C1-C6 alkyl group. n is either 1 or 2. A method according to any one of embodiments 86 to 93, comprising the compound.

[0329] Apparatus 95. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is sodium, lithium, or magnesium. R'' is independently a C1-C6 alkyl group. n is either 1 or 2. A method according to any one of embodiments 86 to 94, comprising the compound.

[0330] Apparatus 96. The metal alkoxide compound is of the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. A method according to any one of embodiments 86 to 95, comprising the compound.

[0331] Embodiment 97. At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. A method according to any one of embodiments 86 to 96, comprising a tin(IV) alkoxide compound.

[0332] Apparatus 98. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal alkoxide compounds are given by the following formula: M(OR) n [In formula: M is sodium (Na), R is tert-butyl, n is 1. Contains the compound, At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1. A method according to any one of embodiments 86 to 97, comprising a tin(IV) alkoxide compound.

[0333] (RSnX3+[Sn(OR)2] n →RSn(OR)3)

[0334] Embodiment 99. A method comprising contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal alkoxide compounds are given by the following formula: [M(OR)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. A method comprising the compound.

[0335] Apparatus 100. A tin(IV) compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 99, comprising a tin(IV) alkoxide compound.

[0336] Apparatus 101. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 99 or 100, comprising a tin(IV) carboxylate compound.

[0337] Embodiment 102. A method according to any one of Embodiments 99 to 101, wherein R is a C1-C6 alkyl group.

[0338] Embodiment 103. A method according to any one of Embodiments 99 to 102, wherein R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0339] Embodiment 104. A method according to any one of Embodiments 99 to 103, wherein R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0340] Apparatus 105. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3. A method according to any one of embodiments 99 to 104, comprising a tin(IV) halogen compound.

[0341] Embodiment 106. A method according to any one of Embodiments 99 to 105, wherein R is a C1-C6 alkyl group.

[0342] Apparatus 107. The metal alkoxide compound is of the following formula: [Sn(OR)2] n [In formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. A method according to any one of embodiments 99 to 106, comprising the compound.

[0343] Apparatus 108. The metal alkoxide compound is of the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. A method according to any one of embodiments 99 to 107, comprising the compound.

[0344] Embodiment 109. At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. A method according to any one of embodiments 99 to 108, comprising a tin(IV) alkoxide compound.

[0345] Apparatus 110. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal alkoxide compounds are given by the following formula: [Sn(OR)2] n [In formula: R is tert-butyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(OR) 4-n [In formula: R is isopropyl, R is tert-butyl, n is 1. A method according to any one of embodiments 99 to 109, comprising a tin(IV) alkoxide compound.

[0346] (RSnX3+M(NR2) n →RSn(NR2)3)

[0347] Embodiment 111. A method comprising contacting a tin(IV) compound with a metal amide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: M(NR"2) a X b [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a+b=2, therefore 5. A method comprising the compound.

[0348] Apparatus 112. A tin(IV) compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 111, comprising a tin(IV) alkoxide compound.

[0349] Apparatus 113. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 111 or 112, comprising a tin(IV) carboxylate compound.

[0350] Embodiment 114. A method according to any one of Embodiments 111 to 113, wherein R is a C1-C6 alkyl group.

[0351] Embodiment 115. A method according to any one of Embodiments 111 to 114, wherein R' is independently hydrogen, a C1-C6 alkyl group, or phenyl.

[0352] Embodiment 116. A method according to any one of Embodiments 111 to 115, wherein R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0353] Apparatus 117. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3. A method according to any one of embodiments 111 to 117, comprising a tin(IV) halogen compound.

[0354] Embodiment 118. A method according to any one of Embodiments 111 to 117, wherein R is a C1-C6 alkyl group.

[0355] Apparatus 119. The metal amide compound is of the following formula: M(NR"2) [In formula: M is an alkali metal cation or an alkaline earth metal cation. R is independently a C1-C6 alkyl group. A method according to any one of embodiments 111 to 118, comprising the compound.

[0356] Apparatus 120. The metal amide compound is of the following formula: M(NR"2) [In formula: M is lithium, sodium, or magnesium. R is independently a C1-C6 alkyl group. A method according to any one of embodiments 111 to 119, comprising the compound.

[0357] Apparatus 121. The metal amide compound is of the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. A method according to any one of embodiments 111 to 120, comprising the compound.

[0358] Embodiment 122. At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A method according to any one of embodiments 111 to 121, comprising a tin(IV) amide compound.

[0359] Apparatus 123. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: M(NR"2) [In formula: M is lithium (Li), R is methyl. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 111 to 122, comprising a tin(IV) amide compound.

[0360] (RSnX3+[Sn(NR2)2] n →RSn(NR2)3)

[0361] Embodiment 124. A method comprising contacting a tin(IV) compound with a reagent to form at least one reaction product, The tin(IV) compound is given by the following formula: R n Sn(Q) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: [M(NR”2)2] n [In formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2. A method comprising the compound.

[0362] Apparatus 125. A tin(IV) compound is given by the following formula: R n Sn(OR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 124, comprising a tin(IV) alkoxide compound.

[0363] Apparatus 126. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A method according to embodiment 124 or 125, comprising a tin(IV) carboxylate compound.

[0364] Embodiment 127. A method according to any one of Embodiments 124 to 126, wherein R is a C1-C6 alkyl group.

[0365] Embodiment 128. A method according to any one of Embodiments 124 to 127, wherein R' is independently hydrogen, a C1-C6 alkyl group, or a phenyl group.

[0366] Embodiment 129. A method according to any one of Embodiments 124 to 128, wherein R' is independently -H, -CH3, -CH2CH3, -CH2CH2CH3, or -(phenyl).

[0367] Apparatus 130. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halides are Cl, Br, or I. n is between 0 and 3. A method according to any one of embodiments 124 to 129, comprising a tin(IV) halogen compound.

[0368] Embodiment 131. A method according to any one of Embodiments 124 to 130, wherein R is a C1-C6 alkyl group.

[0369] Embodiment 132. The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is either 1 or 2. A method according to any one of embodiments 124 to 131, comprising the compound.

[0370] Embodiment 133. The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R is a C1-C6 alkyl group. n is 2. A method according to any one of embodiments 124 to 132, comprising the compound.

[0371] Apparatus 134. The metal amide compound is of the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. A method according to any one of embodiments 124 to 133, comprising the compound.

[0372] Embodiment 135. At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A method according to any one of embodiments 124 to 134, comprising a tin(IV) amide compound.

[0373] Apparatus 136. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is isopropyl, The halides are Cl, Br, or I. n is 1. It contains a tin(IV) halogen compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 124 to 135, comprising a tin(IV) amide compound.

[0374] Apparatus 137. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 124 to 136, comprising a tin(IV) amide compound.

[0375] Apparatus 138. A tin(IV) compound is given by the following formula: R n Sn(O2CR') 4-n [In formula: R is isopropyl, R' is phenyl, n is 1. It contains a tin IV carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropyl, R is methyl, n is 1. A method according to any one of embodiments 124 to 137, comprising a tin(IV) amide compound.

[0376] Apparatus 139. A tin(IV) compound is given by the following formula: R n Sn (halide) 4-n [In formula: R is isopropenyl, The halides are Cl, Br, or I. n is 1. It contains a tin-IV halogen compound, Metal amide compounds are given by the following formula: [Sn(NR”2)2] n [In formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R n Sn(NR”2) 4-n [In formula: R is isopropenyl, R is methyl, n is 1. A method according to any one of embodiments 124 to 138, comprising a tin(IV) amide compound.

[0377] Apparatus 140. A composition comprising the following formula: R n Sn(O2CR') 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A composition comprising a tin(IV) carboxylate compound.

[0378] Embodiment 141. A composition according to Embodiment 140, wherein R is independently a C1-C6 alkyl group.

[0379] Embodiment 142. A composition according to Embodiment 140 or 141, wherein R' is independently a C1-C6 alkyl group.

[0380] Embodiment 143. A composition according to any one of Embodiments 140 to 142, wherein R' is independently methyl or phenyl.

[0381] Embodiment 144. A composition according to any one of Embodiments 140 to 143, wherein the purity of the tin(IV) carboxylate compound is at least 99%.

[0382] Apparatus 145. A composition comprising the following formula: R n Sn(NR”2) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other in a C3-C3 combination. 20 Forming an N-heterogenetic ring, n is between 0 and 3. A composition comprising a tin(IV) amide compound.

[0383] Embodiment 146. A composition according to Embodiment 145, wherein R is independently a C1-C6 alkyl group.

[0384] Embodiment 147. A composition according to Embodiment 145 or 146, wherein R'' is independently a C1-C6 alkyl group.

[0385] Embodiment 148. A composition according to any one of Embodiments 145 to 147, wherein the purity of the tin(IV) amide compound is at least 99%.

[0386] Apparatus 149. A composition comprising the following formula: R n Sn(OR) 4-n [In formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. A composition comprising a tin(IV) alkoxide compound.

[0387] Embodiment 150. A composition according to Embodiment 149, wherein R is independently a C1-C6 alkyl group.

[0388] Embodiment 151. A composition according to Embodiment 149 or 150, wherein R'' is independently a C1-C6 alkyl group.

[0389] Embodiment 152. A composition according to any one of Embodiments 149 to 151, wherein the purity of the tin(IV) alkoxide compound is at least 99%.

[0390] Please understand that modifications are possible in detail, particularly in the constituent materials used, as well as in the shape, size, and configuration of the parts, without departing from the scope of this disclosure. This specification and the embodiments described herein are examples, and the true scope and spirit of this disclosure are shown in the claims.

Claims

1. A method of synthesis: The process involves contacting a tin(IV) alkoxide compound with a metal amide compound to form at least one reaction product. The tin(IV) alkoxide compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: M(NR” ２ ) ａ X ｂ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore 5. A method comprising the compound.

2. The method according to claim 1, wherein at least 0.25 equivalents of a metal amide compound are contacted with a tin(IV) alkoxide compound.

3. The method according to claim 1, wherein 0.5 to 2 equivalents of a metal amide compound are contacted with a tin(IV) alkoxide compound.

4. The tin(IV) alkoxide compound is given by the following formula: [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. The method according to claim 1, comprising the compound.

5. The method according to claim 4, wherein R comprises at least one of an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof.

6. R is -CH ２ CF ３ -, -CH(CF ３ ) ２ -, -CH ２ F, -CH ２ CH ２ F, -CF ３ -, -CF ２ CF ３ The method according to claim 4, wherein it is at least one of these arbitrary combinations.

7. The method according to claim 4, wherein R is isopropyl.

8. The method according to claim 4, wherein R is vinyl.

9. The method according to claim 4, wherein OR' contains tert-butyl.

10. The method according to claim 4, wherein OR' contains trimethylsilyl.

11. Tin(IV) alkoxide compounds include the following compounds: The method according to claim 1, wherein at least one of the following:

12. Metal amide compounds are given by the following formula: [In the formula: M is Ti, Zr, or Hf. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ [Forms an N-heterogenetic ring] The method according to claim 1, wherein the compound is [the compound].

13. The method according to claim 12, wherein M is Ti, Zr, or Hf.

14. The method according to claim 12, wherein R'' is methyl.

15. Metal amide compounds include the following compounds: The method according to claim 1, wherein at least one of the following:

16. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. The method according to claim 1, comprising a tin(IV)amide compound.

17. At least one reaction product is given by the following formula: [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ [Forms an N-heterogenetic ring] The method according to claim 1, comprising a tin(IV)amide compound.

18. The method according to claim 17, wherein R comprises at least one of an unsaturated alkyl, saturated alkyl, linear alkyl, cycloalkyl, branched alkyl, fluoroalkyl, halogen, oxygen, nitrogen, silicon, or any combination thereof.

19. R is -CH ２ CF ３ ,-CH(CF ３ ) ２ ien-CH ２ F, -CH ２ CH ２ F, -CF ３ , -CF ２ CF ３ The method according to claim 17, or at least one of any combination thereof.

20. The method according to claim 17, wherein R is isopropyl.

21. The method according to claim 17, wherein R is vinyl.

22. The method according to claim 17, wherein R'' is methyl.

23. At least one reaction product is given by the following formula: The method according to claim 1, comprising at least one tin(IV) amide compound.

24. At least one reaction product is given by the following formula: M(OR’) ｑ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. q is between 2 and 5. The method according to claim 1, comprising a metal alkoxide compound.

25. At least one reaction product is given by the following formula: [In the formula: M is a transition metal cation or a post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. The method according to claim 1, comprising a metal alkoxide compound.

26. The method according to claim 25, wherein M is Ti, Zr, or Hf.

27. The method according to claim 25, wherein OR' contains tert-butyl.

28. The method according to claim 25, wherein OR' contains trimethylsilyl.

29. At least one reaction product is given by the following formula: The method according to claim 1, comprising at least one metal alkoxide compound.

30. A composition, The following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. A composition comprising a tin(IV) amide compound.

31. The tin(IV) amide compound is given by the following formula: [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ [Forms an N-heterogenetic ring] The composition according to claim 30, which is a compound of the above.

32. The composition according to claim 31, wherein R comprises at least one of an unsaturated alkyl, a saturated alkyl, a linear alkyl, a branched alkyl, a fluoroalkyl, a halogen, oxygen, nitrogen, silicon, or any combination thereof.

33. R is -CH ２ CF ３ ,-CH(CF ３ ) ２ ien-CH ２ F, -CH ２ CH ２ F, -CF ３ , -CF ２ CF ３ The composition according to claim 31, which is at least one of any combination thereof.

34. The composition according to claim 31, wherein R is isopropyl.

35. The composition according to claim 31, wherein R is vinyl.

36. The composition according to claim 31, wherein R'' is methyl.

37. The tin(IV) amide compound is given by the following formula: The composition according to claim 30, comprising at least one of the following.

38. The composition according to claim 30, wherein the purity of the tin(IV)amide compound is at least 99%.

39. A composition, the following formula: M(OR’) ｑ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. A composition containing a metal alkoxide compound.

40. The metal alkoxide compound is given by the following formula: [In the formula: M is a transition metal cation or a post-transition metal cation. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. The composition according to claim 39, which is a compound of the above.

41. The composition according to claim 40, wherein M is Ti, Zr, or Hf.

42. The composition according to claim 40, wherein OR' contains tert-butyl.

43. The composition according to claim 40, wherein OR' contains trimethylsilyl.

44. The metal alkoxide compound is given by the following formula: The composition according to claim 39, comprising at least one of the following.

45. The composition according to claim 39, wherein the purity of the metal alkoxide compound is at least 99%.

46. A method comprising contacting a tin(IV) compound with a reagent to form at least one reaction product, The tin(IV) compound is given by the following formula: R ｎ Sn(Q) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, A method wherein the reagent comprises at least one of a metal alkoxide compound, a metal amide compound, or any combination thereof.

47. The tin(IV) compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 46, comprising a tin(IV) alkoxide compound.

48. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 46, comprising a tin(IV) carboxylate compound.

49. R is C １ -C ６ The method according to claim 48, wherein the alkyl group is alkyl.

50. R' independently produces hydrogen and C １ -C ６ The method according to claim 49, wherein the alkyl or phenyl is used.

51. R' independently becomes -H, -CH ３ ien-CH ２ CH ３ ien-CH ２ CH ２ CH ３ The method according to claim 49, wherein the compound is , or -(phenyl).

52. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. The method according to claim 46, comprising a tin(IV) carboxylate compound.

53. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is phenyl, n is 1. The method according to claim 46, comprising a tin(IV) carboxylate compound.

54. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halide is Cl, Br, or I. n is between 0 and 3. The method according to claim 46, comprising a tin(IV) halogen compound.

55. R is C １ -C ６ The method according to claim 54, wherein the alkyl group is alkyl.

56. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropyl, The halide is Cl, Br, or I. n is 1. The method according to claim 46, comprising a tin(IV) halogen compound.

57. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropenyl, The halide is Cl, Br, or I. n is 1. The method according to claim 46, comprising a tin(IV) halogen compound.

58. Metal amide compounds are given by the following formula: M(NR” ２ ) ａ X ｂ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. "R” is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or is bonded to each other to form a C ３ -C ２０ N-heterocyclic ring, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore 5. The method according to claim 46, comprising the compound.

59. Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium, sodium, or magnesium. R is independent of C １ -C ６ It is alkyl. The method according to claim 46, comprising the compound.

60. Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium (Li), R is methyl. The method according to claim 46, comprising the compound.

61. Metal amide compounds are given by the following formula: [M(NR” ２ ) ２ ] ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is either 1 or 2. The method according to claim 46, comprising the compound.

62. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is either 1 or 2. The method according to claim 46, comprising the compound.

63. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is C １ -C ６ It is alkyl, n is 2. The method according to claim 46, comprising the compound.

64. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. The method according to claim 46, comprising the compound.

65. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5. The method according to claim 46, comprising the compound.

66. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is an alkali metal cation or an alkaline earth metal cation. R is independent of C １ -C ６ It is alkyl, n is either 1 or 2. The method according to claim 46, comprising the compound.

67. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium, lithium, or magnesium. R is independent of C １ -C ６ It is alkyl, n is either 1 or 2. The method according to claim 46, comprising the compound.

68. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium (Na), R is tert-butyl, n is 1. The method according to claim 46, comprising the compound.

69. The metal alkoxide compound is given by the following formula: [M(OR”) ２ ] ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. The method according to claim 46, comprising the compound.

70. The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. The method according to claim 46, comprising the compound.

71. The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R is tert-butyl, n is 2. The method according to claim 46, comprising the compound.

72. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. The method according to claim 46, comprising a tin(IV)amide compound.

73. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is C １ -C ６ It is alkyl, R is C １ -C ６ It is alkyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

74. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

75. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropenyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

76. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropyl, The halide is Cl, Br, or I. n is 1. It contains a tin(IV) halogen compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

77. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

78. The tin(IV) compound is given by the following formula: RnSn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium (Li), R is methyl. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

79. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium (Na), R is tert-butyl, n is 1. Contains the compound, At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is isopropyl, R is tert-butyl, n is 1. The method according to claim 46, comprising a tin(IV) alkoxide compound.

80. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R is tert-butyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is isopropyl, R is tert-butyl, n is 1. The method according to claim 46, comprising a tin(IV) alkoxide compound.

81. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is phenyl, n is 1. It contains a tin IV carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

82. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropenyl, The halide is Cl, Br, or I. n is 1. It contains a tin IV halogen compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropenyl, R is methyl, n is 1. The method according to claim 46, comprising a tin(IV)amide compound.

83. At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. The method according to claim 46, comprising a tin(IV) alkoxide compound.

84. At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is C １ -C ６ It is alkyl, R is C １ -C ６ It is alkyl, n is 1. The method according to claim 46, comprising a tin(IV) alkoxide compound.

85. At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is isopropyl, R is tert-butyl, n is 1. The method according to claim 46, comprising a tin(IV) alkoxide compound.

86. A method comprising contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R ｎ Sn(Q) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 1 and 5. A method comprising the compound.

87. The tin(IV) compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 86, comprising a tin(IV) alkoxide compound.

88. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 86, comprising a tin(IV) carboxylate compound.

89. R is C １ -C ６ The method according to claim 88, wherein the alkyl group is used.

90. R' independently produces hydrogen and C １ -C ６ The method according to claim 89, wherein the alkyl or phenyl is used.

91. R' independently becomes -H, -CH ３ ien-CH ２ CH ３ ien-CH ２ CH ２ CH ３ The method according to claim 89, wherein the compound is , or -(phenyl).

92. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halide is Cl, Br, or I. n is between 0 and 3. The method according to claim 86, comprising a tin(IV) halogen compound.

93. R is C １ -C ６ The method according to claim 92, wherein the alkyl group is used.

94. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is an alkali metal cation or an alkaline earth metal cation. R is independent of C １ -C ６ It is alkyl, n is either 1 or 2. The method according to claim 86, comprising the compound.

95. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium, lithium, or magnesium. R is independent of C １ -C ６ It is alkyl, n is either 1 or 2. The method according to claim 86, comprising the compound.

96. The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium (Na), R is tert-butyl, n is 1. The method according to claim 86, comprising the compound.

97. At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. The method according to claim 86, comprising a tin(IV) alkoxide compound.

98. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, The metal alkoxide compound is given by the following formula: M(OR”) ｎ [In the formula: M is sodium (Na), R is tert-butyl, n is 1. Contains the compound, At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is isopropyl, R is tert-butyl, n is 1. The method according to claim 86, comprising a tin(IV) alkoxide compound.

99. A method comprising contacting a tin(IV) compound with a metal alkoxide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R ｎ Sn(Q) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, The metal alkoxide compound is given by the following formula: [M(OR”) ２ ] ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. A method comprising the compound.

100. The tin(IV) compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 99, comprising a tin(IV) alkoxide compound.

101. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 99, comprising a tin(IV) carboxylate compound.

102. R is C １ -C ６ The method according to claim 101, wherein the alkyl group is used.

103. R' independently produces hydrogen and C １ -C ６ The method according to claim 102, wherein the alkyl or phenyl is used.

104. R' independently becomes -H, -CH ３ ien-CH ２ CH ３ ien-CH ２ CH ２ CH ３ The method according to claim 102, wherein the compound is -(phenyl).

105. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halide is Cl, Br, or I. n is between 0 and 3. The method according to claim 99, comprising a tin(IV) halogen compound.

106. R is C １ -C ６ The method according to claim 105, wherein the alkyl group is used.

107. The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is either 1 or 2. The method according to claim 99, comprising the compound.

108. The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R is tert-butyl, n is 2. The method according to claim 99, comprising the compound.

109. At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. The method according to claim 99, comprising a tin(IV) alkoxide compound.

110. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, The metal alkoxide compound is given by the following formula: [Sn(OR”) ２ ] ｎ [In the formula: R is tert-butyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is isopropyl, R is tert-butyl, n is 1. The method according to claim 99, comprising a tin(IV) alkoxide compound.

111. A method comprising contacting a tin(IV) compound with a metal amide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R ｎ Sn(Q) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: M(NR” ２ ) ａ X ｂ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, X is independently cyclopentadienyl, indenyl, chloro, bromo, iodine, or fluoro. a + b = 2, therefore 5. A method comprising the compound.

112. The tin(IV) compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 111, comprising a tin(IV) alkoxide compound.

113. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 111, comprising a tin(IV) carboxylate compound.

114. R is C １ -C ６ The method according to claim 113, wherein the alkyl group is used.

115. R' independently produces hydrogen and C １ -C ６ The method according to claim 114, wherein the alkyl or phenyl is used.

116. R' independently becomes -H, -CH ３ ien-CH ２ CH ３ ien-CH ２ CH ２ CH ３ The method according to claim 114, wherein the compound is , or -(phenyl).

117. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halide is Cl, Br, or I. n is between 0 and 3. The method according to claim 111, comprising a tin(IV) halogen compound.

118. R is C １ -C ６ The method according to claim 117, wherein the alkyl group is used.

119. Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is an alkali metal cation or an alkaline earth metal cation. R is independent of C １ -C ６ It is alkyl. The method according to claim 111, comprising the compound.

120. Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium, sodium, or magnesium. R is independent of C １ -C ６ It is alkyl. The method according to claim 111, comprising the compound.

121. Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium (Li), R is methyl. The method according to claim 111, comprising the compound.

122. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. The method according to claim 111, comprising a tin(IV)amide compound.

123. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: M(NR” ２ ) [In the formula: M is lithium (Li), R is methyl. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 111, comprising a tin(IV)amide compound.

124. A method comprising contacting a tin(IV) compound with a metal amide compound to form at least one reaction product, The tin(IV) compound is given by the following formula: R ｎ Sn(Q) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. Q independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. Contains the compound, Metal amide compounds are given by the following formula: [M(NR” ２ ) ２ ] ｎ [In the formula: M is an alkali metal cation, alkaline earth metal cation, transition metal cation, or post-transition metal cation. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is either 1 or 2. A method comprising the compound.

125. The tin(IV) compound is given by the following formula: R ｎ Sn(OR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. OR' independently comprises at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 124, comprising a tin(IV) alkoxide compound.

126. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is independently at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. The method according to claim 124, comprising a tin(IV) carboxylate compound.

127. R is C １ -C ６ The method according to claim 126, wherein the alkyl group is alkyl.

128. R' independently produces hydrogen and C １ -C ６ The method according to claim 127, wherein the alkyl or phenyl is used.

129. R' independently becomes -H, -CH ３ ien-CH ２ CH ３ ien-CH ２ CH ２ CH ３ The method according to claim 127, wherein the compound is -(phenyl).

130. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. The halide is Cl, Br, or I. n is between 0 and 3. The method according to claim 124, comprising a tin(IV) halogen compound.

131. R is C １ -C ６ The method according to claim 130, wherein the alkyl group is used.

132. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is either 1 or 2. The method according to claim 124, comprising the compound.

133. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is C １ -C ６ It is alkyl, n is 2. The method according to claim 124, comprising the compound.

134. Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. The method according to claim 124, comprising the compound.

135. At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. The method according to claim 124, comprising a tin(IV)amide compound.

136. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropyl, The halide is Cl, Br, or I. n is 1. It contains a tin(IV) halogen compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 124, comprising a tin(IV)amide compound.

137. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is methyl, n is 1. It contains a tin(IV) carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 124, comprising a tin(IV)amide compound.

138. The tin(IV) compound is given by the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is isopropyl, R' is phenyl, n is 1. It contains a tin IV carboxylate compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropyl, R is methyl, n is 1. The method according to claim 124, comprising a tin(IV)amide compound.

139. The tin(IV) compound is given by the following formula: R ｎ Sn (halide) ４－ｎ [In the formula: R is isopropenyl, The halide is Cl, Br, or I. n is 1. It contains a tin IV halogen compound, Metal amide compounds are given by the following formula: [Sn(NR” ２ ) ２ ] ｎ [In the formula: R is methyl, n is 2. Contains the compound, At least one reaction product is given by the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is isopropenyl, R is methyl, n is 1. The method according to claim 124, comprising a tin(IV)amide compound.

140. A composition, the following formula: R ｎ Sn(O ２ CR’) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R' is at least one of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, carboxylate, enolate, ester, cyclopentadienyl, or any combination thereof. n is between 0 and 3. A composition comprising a tin(IV) carboxylate compound.

141. R is independent of C １ -C ６ The composition according to claim 140, wherein it is alkyl.

142. R' becomes independent, C １ -C ６ The composition according to claim 141, wherein it is alkyl.

143. The composition according to claim 141, wherein R' is independently methyl or phenyl.

144. The composition according to claim 140, wherein the purity of the tin(IV) carboxylate compound is at least 99%.

145. A composition, the following formula: R ｎ "Sn(NR)" ２ ) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is independently hydrogen, alkyl, cycloalkyl, aryl, or silyl, or bonded to each other, C ３ -C ２０ Forms an N-heterogene, n is between 0 and 3. A composition comprising a tin(IV) amide compound.

146. R is independent of C １ -C ６ The composition according to claim 145, wherein it is alkyl.

147. R' is independent, C １ -C ６ The composition according to claim 146, wherein it is alkyl.

148. The composition according to claim 145, wherein the purity of the tin(IV)amide compound is at least 99%.

149. A composition, the following formula: R ｎ Sn(OR”) ４－ｎ [In the formula: R is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, alkoxide, cyclopentadienyl, indenyl, or any combination thereof. R'' is at least one of alkyl, alkenyl, alkynyl, cycloalkyl, aryl, silyl, silylalkyl, aminoalkyl, alkoxyalkyl, aralkyl, fluoroalkyl, haloalkyl, silylated alkoxide, ether, amine, halide, imide, cyanate, nitrile, cyclopentadienyl, indenyl, or any combination thereof. n is between 0 and 3. A composition comprising a tin(IV) alkoxide compound.

150. R is independent of C １ -C ６ The composition according to claim 149, wherein it is alkyl.

151. R' is independent, C １ -C ６ The composition according to claim 150, wherein it is alkyl.

152. The composition according to claim 149, wherein the purity of the tin(IV) alkoxide compound is at least 99%.

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