Probes, probe blades, tools for probe blades, blade holders, and probe systems for electrically testing devices under test.

Abstract

Disclosed are probes, probe blades, tools for probe blades, blade holders, and probe systems for electrically testing a device under test (DUT). In some examples, the probe blade is configured to provide a Kelvin electrical connection to the DUT. In some examples, the probe blade includes an alignment structure configured to engage with the blade holder when the probe blade is received within the blade receiving area of ​​the blade holder. The blade holder is configured to detachably and operatively mount the probe blade to the probe system. In some examples, the blade holder includes the probe blade. The probe system is configured to electrically test the DUT and includes the blade holder.

Description

Technical Field

[0001] This application claims priority based on U.S. Patent Application No. 18 / 762,393, filed on July 2, 2024, and U.S. Provisional Patent Application No. 63 / 526,630, filed on July 13, 2023, the entire disclosures of which are incorporated herein by reference.

[0002] The present disclosure generally relates to probes, probe blades, probe holders, and probe systems for electrically testing a device under test.

Background Art

[0003] As integrated circuit devices become increasingly more dense, contact pads used to provide an electrical interface between an integrated circuit device and a probe system configured to electrically test the integrated circuit device are proportionally shrinking. In high-precision testing, it is often desirable to form a Kelvin electrical connection, or at least a quasi-Kelvin electrical connection, between the probe system and the integrated circuit device. Conventional testing techniques use separate force probes and sense probes to contact a given contact pad during testing, thereby enabling a Kelvin electrical connection and providing independent verification of the current flowing through the integrated circuit device and the voltage in the integrated circuit device. However, due to the reduction in the size of the contact pads described above, it has become difficult or impossible to contact separate force probes and sense probes to a single contact pad. Further, due to size constraints, conventional probes capable of forming a Kelvin electrical connection on smaller and smaller contact pads are becoming increasingly expensive. Accordingly, there is a need for an improved probe, probe blade, blade holder, or probe system for electrically testing a device under test.

Summary of the Invention

Problems to be Solved by the Invention

[0004] A probe, a probe blade, a tool for the probe blade, a blade holder, and a probe system for electrically testing a device under test (DUT) are disclosed. The probe blade includes a dielectric blade body defined by a dielectric blade body material. This dielectric blade body includes a blade mounting area and a probe mounting area and defines a first blade side and a second blade side opposite to it. The probe blade also includes a probe operatively mounted to the probe mounting area. This probe includes a probe tip configured to electrically contact the DUT.

[0005] In some examples, the probe blade further includes a force conductive trace extending between the blade mounting area and the probe mounting area on the first blade side surface. This force conductive trace is electrically connected to the probe within the probe mounting area. In such examples, the probe blade also includes a sense conductive trace extending between the blade mounting area and the probe mounting area on the first blade side surface. In such examples, the probe blade further includes a conductive guard layer extending on the opposing second blade side surface. In such examples, the probe blade is configured to provide a Kelvin electrical connection to the DUT.

[0006] In some examples, the probe blade further includes a conductive trace extending between the blade mounting region and the probe mounting region, and electrically connected to the probe within the probe mounting region. In such examples, the probe blade also includes an alignment structure configured to engage with the blade holder when the probe blade is received within the blade receiving region of the blade holder. In such examples, the alignment structure includes a notch formed to receive a region of the blade holder and extending into the probe blade, and / or a projection that wraps around the region of the blade holder and extends from the edge region of the probe blade, in order to facilitate consistent alignment between the probe blade and the blade holder.

[0007] The blade holder includes a conductive holder housing and is configured to detachably and operatively mount a probe blade to a probe system. The conductive holder housing defines a blade receiving area configured to receive the blade mounting area of ​​the probe blade. The conductive holder housing also includes an electrical connection area configured to receive multiple electrical connections. The conductive holder housing further includes a housing mounting area configured to operatively mount the conductive holder housing to a probe system. The conductive holder housing also includes at least partially enclosed housing volume extending between the blade receiving area and the electrical connection area. The blade holder also includes a blade contact structure at least partially located within the blade receiving area. This blade contact structure includes a force blade contact configured to electrically contact a force conductive trace and a sense blade contact configured to electrically contact a sense conductive trace. The blade holder further includes a ground electrical connection to the electrical connection area. This ground electrical connection is electrically connected to the conductive holder housing. The blade holder also includes a force electrical connection within the electrical connection area. This force electrical connection is electrically isolated from the conductive holder housing. The blade holder further includes a force conductor extending within the housing volume. This force conductor is electrically isolated from the conductive holder housing and electrically interconnects the force electrical connection with the force blade contact. The blade holder also includes a sense electrical connection to the electrical connection area. This sense electrical connection is electrically isolated from both the conductive holder housing and the force electrical connection. The blade holder further includes a sense conductor extending within the housing volume. This sense conductor is electrically isolated from both the conductive holder housing and the force conductor and electrically interconnects the sense electrical connection with the sense blade contact. In some examples, the blade holder further includes a probe blade.

[0008] The probe system is configured to electrically test a device under test (DUT) and includes a chuck that defines a support surface configured to support a substrate containing the DUT. The probe system also includes a probe assembly that includes a blade holder. The probe system further includes a manipulator configured to move the probe assembly relative to the support surface. The probe system also includes a signal generation and analysis assembly configured to provide a force signal to the DUT via the probe assembly and / or receive a sense signal from the DUT via the probe assembly. The probe system further includes an imaging device configured to acquire an optical image of at least one other component of the probe system and / or the DUT. [Brief explanation of the drawing]

[0009] [Figure 1] This is a schematic diagram illustrating an example of a probe system according to this disclosure. [Figure 2] This figure shows an example of a probe according to this disclosure. [Figure 3] This is another diagram of the probe shown in Figure 2. [Figure 4] This is a schematic diagram illustrating an example of a probe blade including two probes as described herein. [Figure 5] Another view of the probe blade shown in Figure 4. [Figure 6] Figures 4-5 show another view of a region of the probe blade. [Figure 7] This figure shows an example of a probe blade comprising two probes and configured to form a Kelvin connection with a device under test (DUT) according to the present disclosure. [Figure 8] This is another diagram of the probe blade shown in Figure 7. [Figure 9] Figures 7-8 show another view of a region of the probe blade. [Figure 10] This figure shows another example of a probe blade comprising two probes and configured to form a Kelvin connection with the DUT, as disclosed herein. [Figure 11] Another view of the probe blade of FIG. 10. [Figure 12] Another view of an area of the probe blades of FIGS. 10 - 11. [Figure 13] A diagram showing examples of two probes that may be included in a probe blade according to the present disclosure. [Figure 14] A diagram showing an example of a probe blade that includes a single probe and is configured to form a quasi - Kelvin connection with a DUT. [Figure 15] Another view of the probe blade of FIG. 14. [Figure 16] Another view of an area of the probe blades of FIGS. 14 - 15. [Figure 17] A diagram showing an example of a blade holder configured to hold a probe blade according to the present disclosure. [Figure 18] Another view of the blade holder of FIG. 17. [Figure 19] Another view of the blade holder of FIGS. 17 - 18. [Figure 20] Another view of the blade holder of FIGS. 17 - 19. [Figure 21] Another view of the blade holder of FIGS. 17 - 20. [Figure 22] Another view of the blade holder of FIGS. 17 - 20. [Figure 23] A diagram showing an example of a blade contact structure that may be included in a blade holder according to the present disclosure. [Figure 24] Another view of the blade holder of FIGS. 17 - 23. [Figure 25] Another view of the blade holder of FIGS. 17 - 24. [Figure 26] A schematic diagram showing an example of a tool configured to facilitate the insertion and / or removal of a probe blade according to the present disclosure. [Figure 27] A more detailed diagram showing an example of a tool configured to facilitate the insertion and / or removal of a probe blade according to the present disclosure. [Figure 28]A more detailed diagram showing an example of a tool configured to facilitate the insertion and / or removal of a probe blade according to the present disclosure. [Figure 29] A diagram showing a part of the tool of FIG. 28. [Figure 30] A diagram showing a part of the state where the tool of FIG. 28 holds the probe blade.

MODE FOR CARRYING OUT THE INVENTION

[0010] FIGS. 1 to 30 show examples of a probe system 10, a blade holder 100, a probe blade 200, a probe 300, and / or a tool 400 according to the present disclosure. Elements that serve similar or at least substantially similar purposes are denoted by the same reference numerals in each of FIGS. 1 to 30, and these elements may not be individually described in detail for each figure. Similarly, although not all elements are labeled in each figure, corresponding reference numerals may be used herein for consistency. Elements, components, and / or features described in connection with one or more of FIGS. 1 to 30 may be included in and / or utilized in any of FIGS. 1 to 30 without departing from the scope of the present disclosure.

[0011] Generally, elements that are likely to be included in a particular embodiment are shown in solid lines, and optional elements are shown in dashed lines. However, elements shown in solid lines are not necessarily essential to all embodiments and may be omitted without departing from the scope of the present disclosure.

[0012] FIG. 1 is a schematic diagram of an example of a probe system 10 according to the present disclosure. The probe system 10 can include a plurality of components that may be used together to test or electrically test a device under test (DUT) 32. The probe system 10 includes a chuck 20. The chuck 20 includes and / or may define a support surface 22 configured to support a substrate 30 including the DUT 32. Examples of the chuck 20 include a vacuum chuck, a shielded chuck, a chuck with an electromagnetic shield, and / or a temperature-controlled chuck.

[0013] The probe system 10 may further include a probe assembly 90. If a probe assembly 90 is provided, the probe assembly 90 may include a probe, an example of which is disclosed herein as a probe 300. In addition, or alternatively, the probe assembly 90 may include a probe blade, an example of which is disclosed herein as a probe blade 200. Furthermore, or alternatively, the probe assembly 90 may include a blade holder, an example of which is disclosed herein as a blade holder 100.

[0014] The probe 300 may include a probe tip 350 configured to make contact or electrical contact with the DUT 32. This may be done by contact or electrical contact with the contact pad 34 of the DUT 32. As illustrated, one probe may include multiple probe tips 350, which may be configured to make contact or electrical contact with a single contact pad 34. In such a configuration, the probe system 10 and / or its probe 300 may be configured to form a Kelvin electrical connection with the DUT 32.

[0015] As detailed below, the probe 300 may be operatively attached to the probe blade 200. Also, as detailed below, the blade holder 100 may be configured to detachably and operatively attach the probe blade 200 to the remaining portion of the probe system 10. For example, as shown in Figure 1, the blade holder 100 may be operatively attached to a manipulator 40. The manipulator 40 may be configured to move the probe assembly 90 relative to the support surface 22. Examples of the manipulator 40 include linear actuators, rack and pinion mechanisms, lead screw and nut mechanisms, ball screw and nut mechanisms, motors, stepping motors, servo motors, and / or piezoelectric positioning mechanisms. Within the scope of this disclosure, the manipulator 40 may further or alternatively move the support surface 22 relative to the probe assembly 90, or move both the support surface 22 and the probe assembly 90. This movement may be along and / or around one, two, or three axes perpendicular and / or orthogonal to each other.

[0016] As further shown in Figure 1, the probe system 10 may include a signal generation and analysis assembly 50. The signal generation and analysis assembly 50 may be configured to provide a force signal 52 to the DUT 32 via the probe assembly 90 and / or contact pads 34. Alternatively, the signal generation and analysis assembly 50 may be configured to receive a sense signal 54 from the DUT 32 via the probe assembly 90 and / or contact pads 34. Such a configuration may enable or facilitate four-terminal measurement and / or Kelvin measurement of the current flowing through the DUT 32 and the voltage in the DUT 32. Examples of the signal generation and analysis assembly 50 include a voltage source, a current source, an AC source, a DC source, a function generator, a voltmeter, an ammeter, and / or an impedance analyzer.

[0017] As shown in Figure 1, the probe system 10 may include an imaging device 60. The imaging device 60 may be configured to acquire an image, or optical image, of at least one other component of the probe system 10, such as the probe 300 and / or its probe tip 350. Furthermore or alternatively, the imaging device 60 may be configured to acquire an image of the DUT 32. In specific examples, the imaging device 60 may be configured to acquire images of both the contact pad 34 of the DUT 32 and the probe 300 and / or probe tip 350, thereby enabling or facilitating alignment between the probe tip and the contact pad. Examples of the imaging device 60 include cameras, digital cameras, video cameras, digital video cameras, microscopes, and / or digital microscopes.

[0018] In some examples, the probe system 10 may include multiple probe assemblies 90, as shown by the dashed lines in Figure 1. In such a configuration, the probe system 10 may further include multiple manipulators 40, each manipulator 40 configured to move the corresponding probe assembly 90 relative to the support surface 22. This enables and / or facilitates the alignment and / or contact between one or more probes 300 of each probe assembly 90 and the corresponding contact pads 34 of the DUT 32.

[0019] Figures 2 and 3 show examples of probes 300 according to the present disclosure. The probes 300 may include any suitable structure adapted, configured, designed, and / or constructed to facilitate electrical testing of the DUT 32 by the probe system 10, such as by making electrical contact with the DUT 32, providing force signals to the DUT 32, and / or receiving sense signals from the DUT 32.

[0020] The probes 300 shown in Figures 2-3 may include, and / or show in more detail, the probes 300 shown in Figures 1, 4-22, and 24-25. Accordingly, the structures, functions, and / or features disclosed with respect to the probes 300 in Figures 2-3 may be included in and / or utilized in the probes 300 in Figures 1, 4-22, and / or 24-25 without departing from the scope of this disclosure. Similarly, the structures, functions, and / or features disclosed with respect to the probes 300 in Figures 1, 4-22, and / or 24-25 may be included in and / or utilized in the probes 300 in Figures 2-3 without departing from the scope of this disclosure.

[0021] In the example shown in Figures 2 and 3, the probe 300 includes an integrated probe body 310 defined by a conductive probe body material. This integrated probe body includes a probe mounting section 316, a tip region 340, and a beam region 370. The probe mounting section 316 is configured to be operatively attached to a probe blade, such as a probe blade 200, which will be described in more detail herein. The tip region 340 includes a probe tip 350 and is configured to make electrical contact with the device under test (DUT). The beam region 370 extends along the longitudinal axis 372 of the beam between the probe mounting section 316 and the tip region 340.

[0022] The integrated probe body 310 may include, be formed from, and / or be defined by any suitable conductive probe body material. In specific examples, the probe 300 and / or its integrated probe body 310 may be formed and / or defined by a micro-electromechanical system (MEMS) fabrication process. In this regard, the conductive probe body material may include and / or be a material suitable for the MEMS fabrication process. Examples of conductive probe body materials include metallic materials, semiconductor materials, and / or highly doped semiconductor materials.

[0023] The integrated probe body 310 may be planar, or at least substantially planar. For example, the integrated probe body 310 may define a first probe side surface 311, a second probe side surface 312 opposite to it, and a probe thickness 314. The probe thickness 314 may be measured between the first probe side surface and the second probe side surface. The first probe side surface 311 may be planar, or at least substantially planar. Similarly, the second probe side surface 312 may also be planar, or at least substantially planar. The first probe side surface may extend parallel to, or at least substantially parallel to, the second probe side surface.

[0024] The probe thickness 314 may have any appropriate value and / or be specified. Generally, the probe thickness 314 may be smaller than the maximum dimension of the probe 300. For example, the ratio of the maximum dimension of the probe 300 to the probe thickness 314 may be within a predetermined probe ratio range, such as 20 or more, 25 or more, 30 or more, 35 or more, 40 or more, 45 or more, 50 or more, 200 or less, 150 or less, 100 or less, 90 or less, 80 or less, 70 or less, 60 or less, 50 or less, and / or 40 or less.

[0025] The probe mounting portion 316 may be operatively attached to the probe blade by any suitable method, or the probe may be configured to operatively attach to the probe blade. For example, the probe mounting portion 316 may be attached by welding, brazing, soldering, and / or bonding using a conductive adhesive.

[0026] As shown in Figures 2 and 3, the probe mounting portion 316 may include a mounting tab 318. If a mounting tab 318 is provided, it may project and / or extend away from the beam longitudinal axis 372, for example, by projecting along a tab projection axis 320 and / or by projecting in the probe mounting portion extending direction 322. The tab projection axis 320 may extend perpendicular to the beam longitudinal axis 372, or at least substantially perpendicular to it, and / or the probe mounting portion extending direction 322 may extend parallel to the tab projection axis 320, or at least substantially parallel to it.

[0027] As shown in Figures 2 and 3, the probe mounting portion 316 may include a plurality of regional openings 324. The regional openings 324 may extend through the integrated probe body 310, for example, between the first probe side surface 311 and the second probe side surface 312. This extension may be perpendicular to the beam longitudinal axis 372 and / or perpendicular to the tab projection axis 320. The regional openings 324 may increase the surface area of ​​the probe 300, thereby improving and / or facilitating the dissipation of heat generated by the current flowing through the probe from the probe 300.

[0028] The tip region 340 may include the probe tip 350 and / or any suitable structure adapted, configured, designed and / or constructed to contact or electrically contact the DUT. As shown in Figures 2-3, the tip region 340 may include a tip projection 342, which may extend away from the beam region 370 and / or toward the probe tip 350, for example, along a tip projection axis 344 and / or along a tip region extending direction 346. The tip projection axis 344 may extend at a tip projection angle 348 with respect to the beam longitudinal axis 372. Examples of tip projection angles 348 include 90 degrees or more, 100 degrees or more, 110 degrees or more, 120 degrees or more, 130 degrees or more, 140 degrees or more, 160 degrees or less, 150 degrees or less, 140 degrees or less, 130 degrees or less, 120 degrees or less, 110 degrees or less, and / or 100 degrees or less. Such configurations may enable and / or facilitate the manufacture of a probe assembly 90 including a probe 300 and providing a target and / or desired overdrive-to-scrub ratio, examples of such overdrive-to-scrub ratios are disclosed herein.

[0029] The tip region extension direction 346 may be at least partially opposite to the probe mounting portion extension direction 322. In other words, both the probe mounting portion 316 and the tip projection 342 may extend away from the beam region 370, and may extend in opposite directions, or at least partially opposite directions.

[0030] The beam region 370 may include any suitable structure extending along the longitudinal axis of the beam 372 and / or any suitable structure extending between the probe mounting portion 316 and the tip region 340. In some examples, the beam region 370 may include and / or be an elastic beam region 370, which may be configured, for example, to bend, deform, and / or flex upon contact between the probe tip 350 and the DUT. Such a configuration may enable and / or facilitate overdrive between the probe system and the DUT.

[0031] In some examples, the beam region 370 may include at least one longitudinal aperture 374, as shown by dashed lines in Figures 2 and 3. The longitudinal aperture 374 may extend at least partially along the beam longitudinal axis 372 and / or at least partially parallel to the beam longitudinal axis 372. In addition, or alternatively, the longitudinal aperture 374 may extend from a first probe side surface 311, from a second probe side surface 312, and / or between the first and second probe side surfaces.

[0032] In other words, the beam region 370 may include a plurality of elongated beams 376, each elongated beam 376 may at least partially define and / or surround at least one corresponding longitudinal opening 374. If the beam region 370 includes a plurality of elongated beams, each elongated beam 376 may extend along the beam longitudinal axis 372 and / or parallel to the beam longitudinal axis 372 and / or at least partially between the probe mounting portion 316 and the tip region 340.

[0033] Multiple elongated beams may include any appropriate number of elongated beams, along with a corresponding number of longitudinal apertures. Examples of multiple elongated beams include at least two, at least three, at least four, at least five, up to eight, up to six, and / or up to four elongated beams. More specific examples include two, three, four, five, or six elongated beams.

[0034] Each slender beam 376 may have and / or be defined by any suitable shape. For example, a slender beam may be defined by a rectangular cross-sectional shape, at least substantially rectangular cross-sectional shape, square cross-sectional shape, and / or at least substantially square cross-sectional shape.

[0035] The longitudinal opening 374 may increase the flexibility of the probe 300, for example, in the bending direction which may be parallel to, or at least substantially parallel to, the probe mounting extension direction 322. In addition, or alternatively, the longitudinal opening 374 may enable or facilitate the manufacture of a probe 300 having target and / or desired compliance, for example in the bending direction. In addition, or alternatively, the longitudinal opening 374 may enable or facilitate the manufacture of a probe assembly 90 which includes the probe 300 and provides a target and / or desired overdrive-to-scrub ratio.

[0036] As shown by dashed lines in Figures 2 and 3, the probe 300 may include a reference structure 380. If a reference structure 380 is provided, it may be configured to be visible and / or observable by the imaging device 60 of the probe system 10, even when the probe system is in operation for electrically testing the DUT. In other words, the reference structure 380 may be defined at least partially on the upper surface 304 of the probe 300. Such a configuration may enable imaging and / or identification of the reference structure, thereby improving the probe system's ability to align the probe tip with the DUT.

[0037] In some examples, the reference structure may be located within the tip region 340 and / or adjacent to the tip region 340 relative to the probe mounting portion 316. In other words, the ratio of the reference structure-probe tip distance between the reference structure and the probe tip to the maximum dimension of the probe may be less than a predetermined distance ratio. Examples of distance ratios include 0.1, 0.08, 0.06, 0.04, 0.02, 0.01, 0.005, or 0.001. In some examples, the reference structure 380 may be located directly above, vertically, at least substantially vertically, and / or directly vertically, the probe tip 350 when the probe system is in operation. In other words, when observed from above through the imaging device, the probe tip may be located directly below the reference structure.

[0038] As described above, the probe 300 may be formed and / or defined by a MEMS fabrication process. In this regard, a method for manufacturing and / or forming the probe 300 may include providing a MEMS substrate and forming the probe 300 from, at least partially from, the MEMS substrate and / or on the MEMS substrate using at least one MEMS manufacturing process or semiconductor manufacturing process. Examples of MEMS manufacturing processes include lithography processes, deposition processes, and / or etching processes.

[0039] Figures 4 to 16 show examples of probe blades 200 according to the present disclosure. The probe blades 200 may include any suitable structure adapted, configured, designed and / or constructed to facilitate electrical testing of a DUT by a probe system, for example, a probe blade that is operationally attached to and / or includes the probe 300, transmits force signals to the probe, receives sense signals from the probe, guards the force signals and / or sense signals, and / or operationally attaches the probe to the probe system.

[0040] The probe blades 200 shown in Figures 4 to 16 may include, and / or show in more detail, the probe blades 200 shown in Figures 1, 17 to 22, 24 to 25, and 30. Accordingly, the structures, functions, and / or features disclosed with respect to the probe blades 200 of Figures 4 to 16 may be included in and / or utilized in the probe blades 200 of Figures 1, 17 to 22, 24 to 25, and / or 30 without departing from the scope of this disclosure. Similarly, the structures, functions, and / or features disclosed with respect to the probe blades 200 of Figures 1, 17 to 22, 24 to 25, and / or 30 may be included in and / or utilized in the probe blades 200 of Figures 4 to 16 without departing from the scope of this disclosure.

[0041] In the examples shown in Figures 4 to 16, the probe blade 200 may include a dielectric blade body 210, a probe 300, and a conductive trace 240. The dielectric blade body 210 may be defined by a dielectric blade body material and may include a blade mounting area 220 and a probe mounting area 230. The probe 300 may be operatively mounted to the probe mounting area 230 and may include a probe tip 350 configured to electrically contact the DUT. The conductive trace 240 may extend between the blade mounting area 220 and the probe mounting area 230 and may be electrically connected to the probe 300 within the probe mounting area.

[0042] The dielectric blade body 210 may include, be formed from, and / or be defined by any suitable dielectric blade body material. In specific examples, the dielectric blade body material may include and / or be a ceramic dielectric blade body material. In another specific example, the dielectric blade body material may be different from the conductive probe body material of the probe 300.

[0043] The dielectric blade body 210 may be planar, or at least substantially planar. For example, the dielectric blade body 210 may define a first blade side surface 211, a second blade side surface 212 opposite to it, and a blade thickness 214, the blade thickness 214 may be measured between the first blade side surface and the second blade side surface. The first blade side surface 211 may be planar, or at least substantially planar. Similarly, the second blade side surface 212 may also be planar, or at least substantially planar. The first blade side surface may extend parallel to, or at least substantially parallel to, the second blade side surface.

[0044] The blade thickness 214 may have any suitable value and / or be specified. Generally, the blade thickness 214 may be smaller than the maximum dimension of the probe blade 200. For example, the ratio of the maximum dimension of the probe blade 200 to the blade thickness 214 may be within a predetermined blade ratio range, such as at least 20, at least 25, at least 30, at least 35, at least 40, at least 45, at least 50, up to 200, up to 150, up to 100, up to 90, up to 80, up to 70, up to 60, up to 50, and / or up to 40.

[0045] As shown in the figure, the dielectric blade body 210 may be L-shaped, or at least partially L-shaped. In other words, the blade mounting area 220 may protrude from the remaining portion of the dielectric blade body along the blade mounting area axis 222, and the probe mounting area 230 may protrude from the remaining portion of the dielectric blade body along a probe mounting area axis 232 different from the blade mounting area axis. The intersection angle 234 between the blade mounting area axis 222 and the probe mounting area axis 232 may have and / or be specified for any suitable value, such as at least 30 degrees, at least 40 degrees, at least 50 degrees, at least 60 degrees, at least 70 degrees, at least 80 degrees, at least 90 degrees, at least 100 degrees, up to 150 degrees, up to 140 degrees, up to 130 degrees, up to 120 degrees, up to 110 degrees, up to 100 degrees, up to 90 degrees, and / or up to 80 degrees. In addition, or alternatively, the blade mounting area axis 222 and / or the probe mounting area axis 232 may extend parallel to, or at least substantially parallel to, the first blade side surface 211 and / or the second blade side surface 212.

[0046] The conductive trace 240 extends between the blade mounting area 220 and the probe mounting area 230 and / or may include any suitable structure electrically connected to the probe 300. In some examples, the conductive trace 240 may be defined by a conductive trace material. The conductive trace material may be different from the dielectric blade body material of the dielectric blade body 210 and / or different from the conductive probe body material of the integrated probe body 310. An example of a conductive trace material is a metallic conductive trace material.

[0047] The conductive trace 240 may be supported by the dielectric blade body 210 and / or its dielectric blade body material. For example, the conductive trace 240 may be deposited on the dielectric blade body material, bonded to the dielectric blade body material, and / or operably attached to the dielectric blade body material.

[0048] In some examples, the conductive trace 240 may be an elongated conductive trace. In some examples, the conductive trace 240 may be at least partially a planar conductive trace.

[0049] The probe 300 may be a conductive probe. The probe 300 may be operationally attached to the probe blade 200 in any suitable way. For example, the probe 300 may be welded, brazed, soldered, and / or bonded to the probe mounting area 230 and / or conductive trace 240.

[0050] In some examples, as shown in Figures 4, 7, 11, and 14, the conductive trace 240 may extend at least partially or completely onto the first blade side surface 211 of the dielectric blade body 210. In such examples, as shown in Figures 5, 8, 12, and 15, the probe blade 200 may include a conductive guard layer 250 extending at least partially or completely onto the opposing second blade side surface 212 of the dielectric blade body 210. The conductive guard layer 250 may be configured to be maintained at a fixed or at least substantially fixed potential, such as ground potential, thereby protecting, guarding, and / or shielding the conductive trace 240 from electrical interference. In some examples, the probe blade 200 may be referred to herein as including a plurality of conductive traces 240, including at least one conductive trace 240 extending onto the first blade side surface 211 and another conductive trace 240 (e.g., the conductive guard layer 250) extending onto the second blade side surface 212. In other words, the conductive guard layer 250 may also be a conductive trace 240.

[0051] The opposing second blade side surface 212 may define a second side surface area, and the conductive guard layer 250 may define a guard layer surface area which is a threshold surface area ratio of the second side surface area. Examples of threshold surface area ratios include at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, or at least 95%.

[0052] The conductive guard layer 250 may face the conductive trace 240 directly across the blade thickness 214 of the probe blade 200, or it may face it along a threshold trace length ratio of the length of the conductive trace. Examples of threshold trace length ratios include at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, or at least 99%.

[0053] The conductive guard layer 250 may extend only on the opposing second blade side surface 212 of the dielectric blade body 210. In other words, the conductive guard layer 250 may be electrically isolated from the conductive trace 240 extending on the first blade side surface 211 via the dielectric blade body, and / or may be spaced apart from the conductive trace via the dielectric blade body over the entire length of the conductive trace.

[0054] As shown in Figures 4, 6-7, 9-10, 12, 14, and 16, the probe blade 200 may include a first conductive trace 241, which may also be referred herein as a force conductive trace 241, and a second conductive trace 242, which may also be referred herein as a sense conductive trace 242. Both the first conductive trace 241 and the second conductive trace 242 may extend between the blade mounting area 220 and the probe mounting area 230, and / or extend at least partially or completely on the first blade side surface 211.

[0055] In some examples, the probe blade 200 may be configured to enable and / or facilitate a Kelvin, or true Kelvin, electrical connection between the probe system 10 and the DUT. In such a configuration, as comprehensively shown in Figures 4-13, the probe blade 200 may include a first probe 301 with a first probe tip 351 and a second probe 302 with a second probe tip 352. Both the first probe 301 and the second probe 302 may be operatively mounted to the probe mounting area 230 via their respective probe mounting portions 316. In such a configuration, a first conductive trace 241 may be electrically connected to the first probe 301 within the probe mounting area 230, and a second conductive trace 242 may be electrically connected to the second probe 302 within the probe mounting area 230. However, the first probe 301 and the second probe 302, and / or the first conductive trace 241 and the second conductive trace 242 may be electrically insulated from each other within the probe blade 200 and / or across the entire probe blade. For example, the second conductive trace may be separated from the first conductive trace via the dielectric blade body over the entire length of the first conductive trace. In another example, the second conductive trace may be electrically insulated from the first conductive trace via the dielectric blade body. In yet another example, the first probe may be separated from the second probe. In yet another example, the first probe may be electrically insulated from the second probe via the dielectric blade body and / or via the air gap between them.

[0056] To facilitate the formation of a Kelvin connection with the DUT, the first probe tip 351 and the second probe tip 352 may be configured, oriented, and / or relatively positioned to electrically contact a single contact pad of the DUT. In this regard, the distance 260 between the first probe tip and the second probe tip may be less than the corresponding width 36 of the single contact pad shown in Figure 1, as shown in Figures 1, 6, and 13, or less than a threshold percentage of its width. Examples of threshold percentages include 80%, 70%, 60%, 50%, 40%, or 30%.

[0057] Generally, the blade thickness 214 of the probe blade 200 may be greater than the corresponding width of a single contact pad. With this in mind, the probe blade 200 may be configured to allow and / or facilitate a distance 260 between the first probe tip and the second probe tip that is less than the blade thickness 214. For example, as shown in Figures 6 and 13, the first probe 301 and / or the second probe 302 may be oriented with respect to the probe blade 200 and / or its first blade side 211 and / or second blade side 212 at a probe extension angle 390. In other words, the first and second probes may taper toward each other as they extend away from the probe blade. Examples of probe extension angles include at least 0 degrees, at least 1 degree, at least 2 degrees, at least 4 degrees, at least 6 degrees, at least 8 degrees, at least 10 degrees, at least 12 degrees, at least 14 degrees, up to 20 degrees, up to 18 degrees, up to 16 degrees, up to 14 degrees, up to 12 degrees, up to 10 degrees, up to 8 degrees, up to 6 degrees, or up to 4 degrees.

[0058] In general, it may not be feasible, or at least impractical, to mount the first probe 301 and the second probe 302, respectively, on corresponding sides of the probe blade 200 (e.g., the first blade side 211 and the second blade side 212), and to orient the first and second probes so that they taper toward each other and / or define a probe extension angle 390 relative to the probe blade. In light of this, as best shown in Figures 6, 9, and 12, the probes 300, such as the first probe 301 and / or the second probe 302, may be operatively mounted to a mounting surface 270 extending between the first blade side 211 and the second blade side 212. In other words, the first probe 301 and the second probe 302 may be operatively mounted to the same surface of the probe blade, i.e., the mounting surface 270.

[0059] To facilitate such a configuration, as shown in the figure, the first conductive trace 241 may extend onto the mounting surface 270 and / or include a defined first trace extension region 271. Similarly, the second conductive trace 242 may extend onto the mounting surface 270 and / or include a defined second trace extension region 272. Both the first trace extension region 271 and the second trace extension region 272 may extend at least partially into a region of the mounting surface 270 directly located between the first blade side surface 211 and the second blade side surface 212. The first probe 301 may be operatively and / or electrically attached to the first trace extension region 271 and / or electrically connected to the first conductive trace 241 via the first trace extension region. Similarly, the second probe 302 may be operatively and / or electrically attached to the second trace extension region 272 and / or electrically connected to the second conductive trace 242 via the second trace extension region.

[0060] The first trace extension region 271 may extend from the remaining portion of the first conductive trace 241 in any suitable manner and / or be electrically connected. For example, as shown in Figures 6 and 9, the first conductive trace 241 may extend along the first blade side surface 211, or along only the first blade side surface 211, wrap around the edge of the first blade side surface and / or extend beyond that edge and extend onto the mounting surface 270 to form and / or define the first trace extension region. Similarly, the second trace extension region 272 may extend from the remaining portion of the second conductive trace 242 in any suitable manner and / or be electrically connected. For example, as shown in Figures 6 and 12, the second conductive trace 242 may extend along or only along the first blade side surface 211, wrap around the edge of the first blade side surface and / or extend beyond that edge, and extend onto the mounting surface 270, thereby forming and / or defining the second trace extension region. In another example, as shown in Figures 6 and 9, the second conductive trace 242 may partially extend along the first blade side surface 211 to a via 246, which may penetrate the probe blade 200 and / or extend between the first blade side surface 211 and the second blade side surface 212. Subsequently, the second conductive trace may partially extend along the second blade side surface 212, wrap around the edge of the second blade side surface, and / or extend beyond that edge, and extend onto the mounting surface 270, thereby forming and / or defining the second trace extension region.

[0061] The probe 300 includes a first probe 301 and a second probe 302, and may have an asymmetrical and / or side-by-side configuration. In other words, a particular probe 300 may be positioned and / or mounted on a particular side of the probe blade 200. For example, referring to Figures 6 and 13, the first probe 301 may be manufactured and / or configured such that the first probe tip 351 is located on the side of the first probe facing the second probe 302, and / or may be positioned relatively closer to the side of the first probe facing the second probe compared to the side of the first probe facing away from the second probe. In other words, the first probe tip may be positioned closer to the side facing the second probe compared to the side facing away from the second probe. Similarly, as shown in Figures 6 and 13, the second probe 302 may be manufactured and / or configured such that the second probe tip 352 is located on the side of the second probe facing away from the first probe 301, and / or may be configured to be located relatively closer to the side of the second probe facing the first probe compared to the side of the second probe facing away from the first probe. In other words, the second probe tip may be located closer to the side facing the first probe compared to the side facing away from the first probe. Such a configuration may enable and / or facilitate a distance 260 between probe tips 351 and 352 that is smaller and / or shorter than the distance achievable when the first and second probes are identical in structure.

[0062] As most clearly shown in Figures 4-5, 7-9, and 14-16, in some examples the probe blade 200 may include and / or define a clearance area 280. The clearance area 280 may extend away from the mounting surface 270 and / or the probe 300 and may be formed, dimensioned, and / or positioned to provide additional clearance and / or space for the probe 300 to interact with and / or contact the contact pad of the DUT. For example, the presence of the clearance area 280 may allow the use of a relatively large and / or rigid probe blade 200 while simultaneously reducing the possibility of contact between the probe blade and the DUT when the probe tip 350 is brought into contact with the DUT.

[0063] In some examples, the probe blade 200 may be configured to enable and / or facilitate a Kelvin or quasi-Kelvin electrical connection between the probe system 10 and the DUT. In such a configuration, as shown collectively in Figures 4, 14, and 16 and indicated by 244, the probe near end of the second conductive trace 242 may be electrically connected to and / or short-circuited with the probe near end of the first conductive trace 241. In other words, the first conductive trace 241 and the second conductive trace 242 may be short-circuited with each other within the probe mounting area 230. However, the first and second conductive traces may be spaced apart from each other along the remaining length of the first conductive trace and / or electrically isolated from each other. Such a configuration may enable and / or facilitate the formation of a quasi-Kelvin connection in the vicinity of a single probe tip 350 electrically connected to both conductive traces, for example, within a few millimeters from the probe tip. This may improve the accuracy of quasi-Kelvin measurements performed using probe system 10 compared to conventional probe systems where the short circuit between corresponding conductors transmitting force and sense signals is located relatively distal to the corresponding probe tip.

[0064] As shown by the dashed lines in Figures 4-5 and the solid lines in Figures 7-8, 10-11, and 14-15, in some examples the probe blade 200 may include an alignment structure 290. The alignment structure 290 may be adapted, configured, dimensioned, formed, and / or constructed to interact with and / or engage with the blade holder 100 to enable and / or facilitate better, more consistent, and / or more repeatable alignment between the probe blade 200 and the blade holder 100 when the probe blade 200 is detachably and operably mounted to the blade holder 100. An example of an alignment structure 290 includes a notch 292 defined within and / or extending from the probe blade, or a notch 292 defined within the edge region 202 of the probe blade. Another example of an alignment structure 290 includes a projection 294 protruding from and / or extending from the probe blade or its edge region. The edge region 202 may include the region of the probe blade extending between the first blade side surface 211 and the second blade side surface 212. The notch 292 may be formed to receive the region of the blade holder 100, and / or the projection 294 may be configured to wrap around the region of the blade holder 100, thereby precisely positioning the probe blade relative to the blade holder and / or defining a specific, and / or single relative orientation between them when the probe blade is detachably and operably mounted to the blade holder. An example of this is shown in Figure 18.

[0065] Figures 17–25 show examples of blade holders 100 according to the present disclosure. The blade holder 100 may include any suitable structure adapted, configured, designed, and / or constructed to detachably and operably mount a probe blade 200 to a probe system 10 and / or to form one or more electrical connections with the probe blade. As comprehensively shown in Figures 17–25, the blade holder 100 may include a conductive holder housing 110, a blade contact structure 130, a ground electrical connection 140, a force electrical connection 152, a force conductor 154, a sense electrical connection 162, and / or a sense conductor 164.

[0066] Examples of blade holders 100 shown in Figures 17-25 may be more detailed examples of the blade holder 100 shown in Figure 1. Accordingly, the structures, functions, and / or features disclosed herein with respect to the blade holders 100 shown in Figures 17-25 may be included in and / or used in the probe blades 200 shown in Figures 1, 4-22, 24-25, and / or Figure 30 without departing from the scope of this disclosure. Similarly, the structures, functions, and / or features disclosed herein with respect to the probe blades 200 shown in Figures 1, 4-22, 24-25, and / or Figure 30 may be included in and / or used in the probe blades 200 shown in Figures 4-16 without departing from the scope of this disclosure.

[0067] The conductive holder housing 110 may be formed from and / or defined by any suitable conductive material and / or a plurality of conductive materials. For example, the conductive holder housing 110 may be made of metal. In some examples, the conductive holder housing may be further and / or alternatively a single piece.

[0068] The conductive holder housing 110 defines a blade receiving region 112, which may be configured to receive a blade mounting region 220 of the probe blade 200. The blade receiving region 112 may be formed in a shape and / or dimensions to receive the blade mounting region of the probe blade. For example, the shape of the blade receiving region may correspond to the shape of the blade mounting region. In some examples, the blade receiving region may have a rectangular or at least partially rectangular cross-sectional shape. In some examples, as already described, the probe blade 200 may include one or more alignment structures 290 which may be configured, formed, dimensionally set and / or designed to engage with or interact with the blade holder 100 when the probe blade is placed within the blade receiving region 112. For example, as shown in Figure 18, a portion of the bottom surface of the conductive holder housing 110 defining the blade receiving region 112 may be received within a notch 292 of the alignment structure 290. As another example, continuing to refer to Figure 18, the projection 294 of the alignment structure 290 may abut or contact a portion of the outer surface and / or edge of the conductive holder housing that defines the blade receiving area. Such a configuration allows the probe blade 200 to define a predetermined, established, and / or reproducible relative orientation with respect to the blade holder, thereby reducing variations in the orientation of the probe blade relative to the blade holder and / or reducing the possibility of relative movement of the probe blade when the probe 300 is brought into contact with the DUT. Furthermore, or alternatively, contact between the projection 294 and the outer surface of the conductive holder housing may suppress upward movement of the probe blade 200 relative to the blade holder 100 (in the configuration of Figure 18) when the probe 300 is brought into contact with the DUT.

[0069] The conductive holder housing 110 also defines an electrical connection area 114, which may be configured to accept multiple electrical connections. For example, the electrical connection area 114 may include a force connection opening 116, which may be configured to accept a force electrical connection 152. For another example, the electrical connection area 114 may include a sense connection opening 118, which may be configured to accept a sense electrical connection 162. The force connection opening 116 and / or the sense connection opening 118 may extend within a housing volume 122 that is at least partially enclosed by the conductive holder housing 110, as shown in Figure 18, and / or allow at least a portion of the force electrical connection 152 and / or the sense electrical connection 162 to be located within the housing volume and / or extend outside the conductive holder housing from within the housing volume.

[0070] The conductive holder housing 110 further defines a housing mounting area 120, which may be configured to operatively attach the conductive holder housing to the probe system 10 or to the remaining portion of the probe system 10. An example of the housing mounting area 120 may be a housing mounting projection extending from the conductive holder housing.

[0071] The conductive holder housing 110 may also define a housing volume 122 that is at least partially enclosed, and the housing volume 122 may extend between the blade receiving area 112 and the electrical connection area 114. The enclosed housing volume 122 may be electrically guarded and / or shielded by the conductive holder housing, thereby protecting electrical signals transmitted within it from electrical interference. The conductive holder housing 110 may at least partially or completely enclose the housing volume 122 on at least three, at least four, at least five, or at least six sides.

[0072] The blade contact structure 130 is located within the blade receiving region 112 of the conductive holder housing 110 and includes a force blade contact 132 and a sense blade contact 136, as shown in the example in Figures 18 and 21-23. The force blade contact may be configured to electrically contact one of the force conductive traces of the probe blade 200, for example, a first conductive trace 241 and a second conductive trace 242. The sense blade contact may be configured to electrically contact the other of the sense conductive traces, for example, a first conductive trace and a second conductive trace.

[0073] The blade contact structure 130 may be adapted, configured, designed, and / or constructed to hold the blade mounting region 220 of the probe blade 200 within the blade receiving region 112. For example, the blade contact structure 130 may include and / or be a biasing blade contact structure, which may be configured to apply a biasing force to the probe blade to hold the probe blade within the blade receiving region. In some examples, the force blade contact 132 may include and / or be an elastic force blade contact, which may be configured to deform to allow the blade mounting region of the probe blade to be accepted within the blade receiving region. After deformation, the elastic force blade contact may exert a restoring force corresponding to the probe blade 200 and / or its blade mounting region 220, holding the blade mounting region within the blade receiving region. Furthermore, and / or alternatively, in some examples, the sense blade contact 136 may include and / or be an elastic sense blade contact, which may be configured to deform to allow the blade mounting region of the probe blade to be accepted within the blade receiving region. After deformation, the elastic sensing blade contact may exert a restoring force corresponding to the probe blade 200 and / or its blade mounting area 220, holding the blade mounting area within the blade receiving area.

[0074] As shown comprehensively in Figures 4 to 16, the force conductive trace 241 and the sense conductive trace 242 may be positioned on the first blade side surface 211 of the probe blade 200, and the probe blade may also include a conductive guard layer 250 positioned on the second blade side surface 212. In such a configuration, the blade contact structure 130 may be configured to press and contact the conductive guard layer with the inner surface of the blade receiving region 112, which is at least partially defined by the conductive holder housing 110, thereby electrically connecting the conductive guard layer with the conductive holder housing.

[0075] As described above, the electrical connection area 114 may be configured to accept multiple electrical connections. The multiple electrical connections may include a ground electrical connection 140, which is electrically connected to the conductive holder housing 110 and / or may ground the conductive holder housing. The multiple electrical connections may further include a force electrical connection 152 electrically isolated from the conductive holder housing and a sense electrical connection 162 electrically isolated from both the conductive holder housing and the force electrical connection.

[0076] In a specific example, the force electrical connection 152 may be defined by the inner conductor of the force coaxial connector 150. In such an example, the ground electrical connection 140 may be defined at least partially by the outer conductor of the force coaxial connector. Similarly, the sense electrical connection 162 may be defined by the inner conductor of the sense coaxial connector 160. In such an example, the ground electrical connection 140 may be defined at least partially by the outer conductor of the sense coaxial connector.

[0077] The force conductor 154 may extend within the enclosed housing volume 122, be electrically isolated from the conductive holder housing 110, and / or electrically interconnect the force electrical connection 152 with the force blade contact 132. Similarly, the sense conductor 164 may extend within the enclosed housing volume 122, be electrically isolated from the conductive holder housing 110, and / or electrically interconnect the sense electrical connection 162 with the sense blade contact 136.

[0078] In some examples, the blade holder 100 may include and / or be operatively mounted to the probe system 10 via a blade holder mounting plate 180, and the blade holder mounting plate 180 may be operatively mounted to a housing mounting area 120 of a conductive holder housing 110. This is shown in Figures 17-22 and 24-25. In such examples, the blade holder mounting plate 180 and the housing mounting area 120 may have a key structure that allows only a single relative orientation between them, for example, shown by 124 and 184 in Figures 22 and 24-25, respectively.

[0079] In some examples, the blade holder 100 may be operationally mounted to a probe system 10, for example, its manipulator 40, via a probe arm 190. In such examples, the blade holder mounting plate 180 and the probe arm 190 may have a key structure to allow only a single relative orientation between them, as shown, for example, by 186 and 196 in Figures 20, 22, and 24, respectively. Such a configuration may reduce the possibility of the blade holder 100 rotating during operation when testing the DUT, and / or reduce the time required for alignment of the blade holder. Furthermore, and / or alternatively, such a configuration may improve the alignment of both the first and second probes with the contact pad in an example of a probe blade 200 including two probes 300 configured to contact a single contact pad.

[0080] The probe assembly 90 according to this disclosure may offer clear advantages over conventional probe assemblies. For example, the overdrive-to-scrub ratio obtained by the probe assembly 90 (i.e., the magnitude of the overdrive motion relative to the scrub motion of the probe tip on the contact pad) may be greater than the corresponding overdrive-to-scrub ratio obtained by conventional probe assemblies. In other words, in a given amount of movement of the probe assembly 90 toward the DUT, after contact between the probe tip and the DUT, the movement of the probe tip 350 on the contact pad of the DUT may be less than the corresponding movement shown by conventional probe assemblies, relative to the movement in a direction parallel to the surface normal of the DUT. Examples of overdrive-to-scrub ratios in the probe assembly 90 may include at least 6:1, at least 8:1, at least 10:1, at least 12:1, or at least 14:1. This increase in the overdrive-to-scrub ratio may result in a greater contact force with the DUT while maintaining electrical contact with the small contact pad, and may be due to various structures and / or combinations thereof of the probe assembly 90.

[0081] For example, the orientation of the probe tip 350 of the probe 300 relative to the beam region 370 (e.g., the orientation defined by the tip projection angle 348) may increase the overdrive-to-scrub ratio compared to a conventional probe assembly. As another example, the orientation of the probe mounting portion 316 relative to the beam region 370 (generally a perpendicular orientation) may also increase the overdrive-to-scrub ratio compared to a conventional probe assembly. As yet another example, the vertical compliance provided by the beam region 370 may increase the overdrive-to-scrub ratio compared to a conventional probe assembly. As yet another example, when the probe contacts the DUT, the beam region 370 may generally be oriented parallel to, or at least substantially parallel to, the surface of the DUT, which may also increase the overdrive-to-scrub ratio compared to a conventional probe assembly.

[0082] As another example, since the probe blade 200 is a composite structure in which the probe 300 is manufactured separately and then attached to the remaining portion of the probe blade, the material properties of the probe and the dielectric blade body 210 may be independently selected and / or adjusted to obtain one or more desired properties. For example, the dielectric blade body 210 may be rigid, or at least substantially rigid, and / or may be formed from a blade body material of rigidity, or at least substantially rigid, as in the examples disclosed herein. In other words, the dielectric blade body 210 and / or the blade body material may be more rigid than the probe 300. This may limit most, almost all, or at least substantially all, of the deflection and / or motion when the probe assembly 90 contacts the DUT to the probe 300. As another example, the overall geometry of the probe blade 200 may resist its deflection and / or motion. As yet another example, the materials of the individual components of the probe assembly 90 may be selected to provide high thermal stability.

[0083] Figures 26 to 30 show examples of a tool 400 configured to facilitate the insertion of a probe blade 200 into and / or removal from a blade holder 100, according to the present disclosure. As shown collectively in Figures 26 to 30, the tool 400 includes a handle area 410, a blade receiving area 420, a contact surface 430, and a blade gripping structure 440. The handle area 410 is adapted, configured, dimensionalized, and / or shaped to be gripped by the user of the tool, for example, when inserting and / or removing the probe blade 200. The blade receiving area 420 is adapted, configured, dimensionalized, and / or shaped to receive at least a portion of the probe blade 200. The contact surface 430 defines at least partially the blade receiving portion 420 and is adapted, configured, dimensioned, and / or shaped to press against the edge region 202 of the probe blade 200, as best shown in Figure 30, when inserting and / or removing the probe blade from the blade holder using a tool. The blade gripping structure 440 is configured to be selectively actuated by the user to grip the probe blade 200 by applying a compressive gripping force between the first blade side 211 and the second blade side 212 when inserting and / or removing the probe blade from the blade holder using a tool. In the examples shown in Figures 27 to 30, the blade gripping structure 440 includes an elastic structure configured to grip the probe blade by being gripped and / or compressed by the user of the tool, but other configurations of the blade gripping structure 440 including clamps, cams, and / or mechanical actuators are also within the scope of this disclosure.

[0084] Figures 27-28 show that the tool 400 may be left- or right-handed (i.e., configured to be gripped from a specific side). This may allow and / or facilitate insertion and / or removal of the probe blade 200 that is more easily accessible from the left side (for example, when using the tool 400 shown in Figure 27, which may be referred to herein as the left-handed tool), or insertion and / or removal of the probe blade that is more easily accessible from the right side (for example, when using the tool 400 shown in Figure 28, which may be referred to herein as the right-handed tool).

[0085] Referring to Figure 30, in the operation of inserting and / or removing the probe blade 200 into and / or from the blade holder 100 using the tool 400, the probe blade 200 may be positioned within the blade receiving portion 420 and gripped by the blade gripping structure 440. The probe blade 200 may then be inserted into the blade receiving portion 112 of the blade holder 100, for example, by moving the blade's corresponding blade mounting area into the blade receiving portion. During such insertion, the contact surface 430 (which may also be referred to herein as the handle proximity contact surface 430) relatively close to the handle portion 410 may press and / or contact the edge portion 202 of the blade, thereby providing a driving force for inserting the blade into the blade holder. Furthermore, and / or alternatively, the probe blade 200 may be removed from the blade receiving portion by moving the blade, or the corresponding blade mounting area, away from and / or outside the blade receiving portion. During such removal, the contact surface 430 (which may also be referred to herein as the distal handle contact surface 430), which is relatively far from the handle area 410, may press against and / or contact the edge area 202 of the blade, thereby providing a driving force for removing the blade from the blade holder.

[0086] In this specification, the term "and / or" placed between a first element and a second element means any of the following: (1) the first element, (2) the second element, or (3) both the first and second elements. Multiple elements enumerated by "and / or" are similarly interpreted, meaning "one or more" elements. Other elements may be present, whether related to or not to the elements identified by the "and / or" phrase. Thus, as an example without limitation, a reference to "A and / or B" used with an open expression such as "comprising" may mean A only in one embodiment (which may optionally include elements other than B), B only in another embodiment (which may optionally include elements other than A), or both A and B in yet another embodiment (which may optionally include other elements). These elements may refer to elements, actions, structures, processes, operations, values, etc.

[0087] In this specification, the phrase "at least one" used in reference to a list of one or more elements should be understood to mean at least one element selected from any one or more elements contained in the element list, and not to mean that the list must necessarily contain at least one of every element specifically enumerated in it, nor to exclude any combination of elements contained in the element list. This definition also allows for the presence of elements other than those specifically identified in the element list referred to by the phrase "at least one," whether or not they relate to those elements. Therefore, as an example without limitation, “at least one of A and B” (or similarly, “at least one of A or B” or similarly, “at least one of A and / or B”) may, in one embodiment, mean at least one A (which may optionally include multiple A's and any element other than B), without B; in another embodiment, mean at least one B (which may optionally include multiple B's and any element other than A); and in yet another embodiment, mean at least one A (which may optionally include multiple A's) and at least one B (which may optionally include multiple B's and any other element). In other words, the phrases “at least one,” “one or more,” and “and / or” are all open expressions and function in both conjunctive and disjunctive senses. For example, the expressions "at least one of A, B, and C", "at least one of A, B, or C", "one or more of A, B, and C", "one or more of A, B, or C", and "one or more of A, B, and / or C" can mean A only, B only, C only, a combination of A and B, a combination of A and C, a combination of B and C, a combination of A, B and C, and optionally any combination of any of these with at least one other element.

[0088] If any patent, patent application, or other document incorporated by reference herein contains (1) definitions that conflict with this disclosure, and / or (2) definitions that conflict with any portion of this disclosure not incorporated by reference or with any other incorporated document, the portion not incorporated by reference shall prevail, and any definitions or incorporated disclosures of such terms shall apply only with respect to the document in which such definitions or disclosures originally appeared.

[0089] In this specification, the terms “adapted” and “configured” mean that an element, component, or other object is designed and / or intended to perform a given function. Thus, these terms mean not merely that an element is capable of performing a function, but that it is specifically selected, produced, implemented, utilized, programmed, and / or designed for the purpose of performing a particular function. Furthermore, an element described as adapted to perform a particular function may also be described as configured to perform the same function, and vice versa.

[0090] In this specification, the terms “for example,” “as an example,” and / or simply “example,” when used with respect to components, features, details, structures, embodiments, and / or methods of this disclosure, are intended to indicate that what is described is illustrative and non-exclusive. Accordingly, the components etc. described are not restrictive, essential, or exclusive, and other structurally and / or functionally similar or equivalent components etc. are also included in the scope of this disclosure.

[0091] In this specification, the phrase “at least substantially” used to modify a degree or relationship may include not only the “substantial” degree or relationship described, but also the entire extent of the described degree or relationship. The substantial amount of the described degree or relationship may include at least 75% of the described degree or relationship. For example, an object formed at least substantially from a material includes an object formed at least 75% from that material, and also an object formed entirely from that material. Another example is when a first length is at least substantially the same as a second length, including when the first length is no more than 75% of the second length, and also when the first length is identical to the second length.

[0092] Exemplary and non-exclusive examples of probes, probe blades, blade holders, probe systems, and methods relating to this disclosure are presented in the following enumerated paragraphs. Within the scope of this disclosure, individual steps of the methods described herein (including those described in the following enumerated paragraphs) may be additionally or alternatively referred to as “steps for” to perform the operations described.

[0093] A1. A probe for a probe system configured to electrically test a device under test (DUT), The device comprises an integrated probe body defined by the conductive probe body material, and the integrated probe body is (i) A probe mounting section configured to be operably attached to the probe blade, (ii) A tip region including a probe tip configured to electrically contact the DUT, (iii) A probe including a beam region extending along the longitudinal axis of the beam between the probe mounting portion and the tip region.

[0094] A2. The probe according to A1, wherein the conductive probe body material comprises at least one of a metallic material, a semiconductor material, and a highly doped semiconductor material.

[0095] A3. The probe according to any one of A1 to A2, wherein the integrated probe body may include, or may be, a planar, or at least substantially planar integrated probe body.

[0096] A4. The integrated probe body is a probe according to any one of A1 to A3, which defines a first probe side, a second probe side facing it, and the probe thickness measured between the first probe side and the second probe side, or the average probe thickness.

[0097] A5.(i) The first probe side surface is planar, or at least substantially planar, and (ii) The probe according to A4, satisfying at least one of the following: (ii) The second probe side is planar, or at least substantially planar.

[0098] A6. The ratio of the maximum probe dimension to the probe thickness or average probe thickness is: (i) 20 or older, 25 or older, 30 or older, 35 or older, 40 or older, 45 or older, or 50 or older, (ii) A probe according to any one of A4 to A5, which is within at least one threshold probe ratio range of 200 or less, 150 or less, 100 or less, 90 or less, 80 or less, 70 or less, 60 or less, 50 or less, or 40 or less.

[0099] A7. The probe mounting section is (i) To be welded to the probe blade, (ii) To be brazed to the probe blade, (iii) To be soldered to the probe blade, (iv) A probe according to any one of A1 to A6, configured to satisfy at least one of the following: (iv) being bonded to a probe blade using a conductive adhesive material.

[0100] A8. The probe mounting portion includes a mounting tab that protrudes along the tab projection axis away from the longitudinal axis of the beam, as described in any one of A1 to A7.

[0101] A9. The probe described in A8, wherein the tab projection axis is perpendicular to the longitudinal axis of the beam, or at least substantially perpendicular to it.

[0102] A10. The probe according to any one of A1 to A9, wherein the probe mounting portion penetrates the integrated probe body and includes a plurality of regional openings that are perpendicular to or at least substantially perpendicular to at least one of the beam longitudinal axis and the tab projection axis.

[0103] A11. The probe according to any one of A1 to A10, wherein the tip region includes a tip projection that protrudes from the beam region toward the probe tip along the tip projection axis.

[0104] A12. The tip projection axis extends with respect to the longitudinal axis of the beam at a tip projection angle, and the tip projection angle can be arbitrarily set. (i) 90 degrees or more, 100 degrees or more, 110 degrees or more, 120 degrees or more, 130 degrees or more, or 140 degrees or more, (ii) The probe described in A11, which has a temperature of at least one of 160 degrees or less, 150 degrees or less, 140 degrees or less, 130 degrees or less, 120 degrees or less, 110 degrees or less, or 100 degrees or less.

[0105] A13. The probe according to any one of A1 to A12, wherein the probe attachment portion extends from the beam region in the direction of extension of the probe attachment portion, and the tip region extends from the beam region in the direction of extension of the tip region that is at least partially opposite to the direction of extension of the probe attachment portion.

[0106] A14. The probe according to A13, wherein the tip region extension and the probe attachment portion extend from the tip region in directions opposite to each other, or at least partially opposite to each other.

[0107] A15. The beam region includes multiple elongated beams, and the probe is as described in any one of the items A1 to A14.

[0108] A16. The probe according to A15, wherein each of the multiple elongated beams extends along the longitudinal axis of the beam and between the probe mounting portion and the tip region.

[0109] A17. Multiple elongated beams, (i) Two or more, three or more, four or more, or five or more elongated beams, (ii) Elongated beams of 8 or fewer, 6 or fewer, or 4 or fewer, and (iii) A probe according to any one of A15 to A16, comprising at least one of two, three, four, five, or six elongated beams.

[0110] A18. Each of the multiple elongated beams is, (i) Rectangular cross-sectional shape, (ii) A cross-sectional shape that is at least substantially rectangular, (iii) square cross-sectional shape, and (iv) A probe according to any one of the following, having a cross-sectional shape that is at least substantially square:

[0111] A19. The probe further includes the reference structure, as described in any one of items A1 to A18.

[0112] A20. The probe described in A19, wherein the reference structure is defined at least partially on the upper surface of the probe.

[0113] A21. The reference structure is a probe as described in any one of A19 to A20, configured to be visible to the imaging device of the probe system when the probe system is in operation to electrically test the DUT.

[0114] A22. The reference structure is the probe as described in A21, which is positioned vertically, at least substantially vertically, or directly vertically above the probe tip when the probe system is in operation to electrically test the DUT.

[0115] A23. The standard structure is, (i) located within the tip region, and (ii) A probe according to any one of A19 to A22, wherein at least one of the above is positioned in close proximity to the tip region with respect to the probe mounting portion.

[0116] A24. A probe as described in any one of sections A19 to A23, wherein the ratio of the reference structure-probe tip distance to the maximum dimension of the probe is less than the threshold distance ratio, and the threshold distance ratio is 0.1, 0.08, 0.06, 0.04, 0.02, 0.01, 0.005, or 0.001.

[0117] A25. The probe is formed by a microelectromechanical system (MEMS) fabrication process, as described in any one of A1 to A24.

[0118] A26. A method for forming a probe as described in any one of A1 to A25, To provide a MEMS substrate, A method comprising: using at least one of a lithography process, a deposition process, and an etching process to define a probe at least partially on a MEMS substrate and to define a probe at least partially from a MEMS substrate.

[0119] B1. A probe blade for a probe system configured to electrically test a device under test (DUT), wherein the probe blade is A dielectric blade body defined by a dielectric blade body material, comprising a dielectric blade body including a blade mounting area and a probe mounting area, A probe operatively mounted in a probe mounting area, including a probe tip configured to electrically contact the DUT, and optionally including any structure, function, and / or features of a probe described in any of A1 to A25, A probe blade comprising a conductive trace extending between a blade mounting area and a probe mounting area, and electrically connected to the probe within the probe mounting area.

[0120] B2. The probe blade according to B1, wherein the dielectric blade body material includes or is a ceramic dielectric blade body material.

[0121] B3. The dielectric blade body material is different from the conductive probe body material of the probe, and is a probe blade as described in any of B1 to B2.

[0122] B4. The probe blade according to any one of B1 to B3, wherein the dielectric blade body includes or is a dielectric blade body that is planar or at least substantially planar.

[0123] B5. A probe blade according to any of paragraphs B1 to B4, wherein the dielectric blade body defines a first blade side, a second blade side opposite to it, and a blade thickness or average blade thickness, the blade thickness or average blade thickness being measured between the first blade side and the second blade side.

[0124] B6.(i) The first blade surface is planar or at least substantially planar. (ii) The probe blade according to paragraph B5, satisfying at least one of the following: (ii) The second blade side surface is planar or at least substantially planar.

[0125] B7. The ratio of the maximum blade dimension to the blade thickness or average blade thickness is (i) 20 or older, 25 or older, 30 or older, 35 or older, 40 or older, 45 or older, or 50 or older, (ii) A probe blade as described in any of paragraphs B5 to B6, which is within at least one threshold blade ratio range of 200 or less, 150 or less, 100 or less, 90 or less, 80 or less, 70 or less, 60 or less, 50 or less, or 40 or less.

[0126] B8. The dielectric blade body is (i) L-shaped dielectric blade body, and (ii) A probe blade according to any of paragraphs B1 to B7, which is at least one of the dielectric blade bodies that are at least partially L-shaped.

[0127] B9. A probe blade according to any of paragraphs B1 to B8, wherein the blade mounting area protrudes from the remaining portion of the dielectric blade body along the blade mounting area axis, and the probe mounting area protrudes from the remaining portion of the dielectric blade body along a probe mounting area axis different from the blade mounting area axis.

[0128] B10. The intersection angle between the blade mounting area axis and the probe mounting area axis is (i) 30 degrees or more, 40 degrees or more, 50 degrees or more, 60 degrees or more, 70 degrees or more, 80 degrees or more, 90 degrees or more, or 100 degrees or more, (ii) A probe blade as described in B9, satisfying at least one of the following: 150 degrees or less, 140 degrees or less, 130 degrees or less, 120 degrees or less, 110 degrees or less, 100 degrees or less, 90 degrees or less, or 80 degrees or less.

[0129] B11. A probe blade according to any one of B9 to B10, wherein the blade mounting area axis and the probe mounting area axis of the dielectric blade body extend parallel to at least one of the first blade side surface and the opposing second blade side surface of the dielectric blade body.

[0130] B12. A probe blade as described in any of B1 to B11, wherein the conductive trace is defined by a conductive tracing material.

[0131] B13. The probe blade described in B12, wherein the conductive tracing material is different from the dielectric blade body material.

[0132] B14. A probe blade according to any one of B12 to B13, wherein the conductive tracing material is a metallic conductive tracing material.

[0133] B15. Conductive traces (i) Conductive traces deposited on the dielectric blade body material, (ii) A conductive trace bonded to the dielectric blade body material, and (iii) A probe blade according to any one of B1 to B14, wherein the probe blade is at least one of the following: (iii) a conductive trace operatively attached to the dielectric blade body material.

[0134] B16. A probe blade as described in any of B1 to B15, wherein the conductive trace is an elongated conductive trace.

[0135] B17. A probe blade according to any one of B1 to B16, wherein the conductive trace is at least partially a planar conductive trace.

[0136] B18. A probe blade as described in any of B1 to B17, wherein the probe is a conductive probe.

[0137] B19. The probe mounting part of the probe is (i) Welded to at least one of the probe mounting area and the conductive trace, (ii) At least one of the probe mounting area and the conductive trace is brazed, (iii) Soldered to at least one of the probe mounting area and conductive trace, (iv) A probe blade according to any one of B1 to B18, wherein it is bonded to at least one of the probe mounting area and the conductive trace by bonding, which may include bonding using a conductive adhesive material.

[0138] B20. A probe blade according to any one of B1 to B19, wherein a conductive trace extends at least partially or completely along a first blade side of the dielectric blade body, and the probe blade further includes a conductive guard layer extending onto an opposing second blade side of the dielectric blade body.

[0139] B21. The probe blade according to B20, wherein the opposing second blade side surface of the dielectric blade body defines a second side surface area, and the conductive guard layer further defines a guard layer surface area which is a threshold surface area ratio of the second side surface area, and the threshold surface area ratio is 50% or more, 60% or more, 70% or more, 80% or more, 90% or more, or 95% or more.

[0140] B22. A probe blade according to any one of B20 to B21, wherein the conductive guard layer is positioned directly opposite the conductive trace along a threshold trace length ratio of the length of the conductive trace, and the threshold trace length ratio is 70% or more, 75% or more, 80% or more, 85% or more, 90% or more, 95% or more, or 99% or more.

[0141] B23. A probe blade according to any one of B20 to B22, wherein the conductive guard layer extends only to the opposing second blade side of the dielectric blade body.

[0142] B24. The conductive guard layer is (i) electrically insulated from the conductive trace via the dielectric blade body, (ii) A probe blade according to any one of B20 to B23, wherein the probe blade is positioned spaced apart from the conductive trace via the dielectric blade body over the entire length of the conductive trace.

[0143] B25. A probe blade according to any one of B1 to B24, wherein the conductive trace is a first conductive trace or a force conductive trace, and the probe blade further includes a second conductive trace or a sense conductive trace extending between the blade mounting area and the probe mounting area.

[0144] B26. The probe blade according to B25, wherein the first conductive trace and the second conductive trace extend between the blade mounting region and the probe mounting region on the first blade side surface of the dielectric blade body.

[0145] B27. A probe blade as described in any of B25 to B26, wherein the probe blade is configured to provide a Kelvin electrical connection or a quasi-Kelvin electrical connection with the DUT.

[0146] B28. A probe blade according to any one of B25 to B27, wherein the probe proximity end of the second conductive trace is short-circuited to the probe proximity end of the first conductive trace within the probe mounting area.

[0147] B29. The probe blade according to B28, wherein the second conductive trace is positioned spaced apart from the first conductive trace along the remaining portion of the length of the first conductive trace.

[0148] B30. A probe blade as described in any of B25 to B29, configured to provide a Kelvin electrical connection or true Kelvin electrical connection with the DUT.

[0149] B31. The probe blade according to any of B25 to B30, wherein the probe is a first probe including a first probe tip, and the probe blade includes a second probe including a second probe tip configured to be operatively mounted in a probe mounting area and to be electrically in contact with the DUT, the second conductive trace being electrically connected to the second probe within the probe mounting area, and optionally the second probe may further include any structure, function, and / or features of any of the probes A1 to A25.

[0150] B32. The probe blade described in B31, wherein the first probe tip and the second probe tip are configured to electrically contact a single contact pad of the DUT.

[0151] B33. The probe blade according to B32, wherein the distance between the first probe tip and the second probe tip is less than the corresponding width of a single contact pad of the DUT, or less than a threshold percentage of said width, where said threshold percentage is optionally 80%, 70%, 60%, 50%, 40%, or 30%.

[0152] B34. A probe blade according to any of B31 to B33, wherein the distance between the first probe tip and the second probe tip is less than the blade thickness of the probe blade.

[0153] B35. A probe blade according to any one of B31 to B34, wherein the first probe and the second probe taper toward each other as they extend away from the probe blade, thereby facilitating electrical contact between the tips of both the first and second probes and a single contact pad of the DUT.

[0154] B36. At least one of the first probe and the second probe is oriented at a probe extension angle with respect to the corresponding side of the first blade and the side of the second blade, and optionally the probe extension angle is (i) 0 degrees or more, 1 degree or more, 2 degrees or more, 4 degrees or more, 6 degrees or more, 8 degrees or more, 10 degrees or more, 12 degrees or more, or 14 degrees, (ii) A probe blade according to any of B31 to B35, wherein the temperature is at least one of the following: 20 degrees or less, 18 degrees or less, 16 degrees or less, 14 degrees or less, 12 degrees or less, 10 degrees or less, 8 degrees or less, 6 degrees or less, or 4 degrees.

[0155] B37. A probe blade according to any one of B31 to B36, wherein a first conductive trace includes a first trace extension region defined on the mounting surface of the probe blade, a second conductive trace includes a second trace extension region defined on the mounting surface, a first probe is operably mounted to the first trace extension region, and a second probe is operably mounted to the second trace extension region, and the mounting surface optionally extends between the first blade side and the second blade side of the probe blade.

[0156] B38.(i) The first probe tip of the first probe is positioned relatively close to the side of the first probe facing the second probe compared to the side facing away from the second probe, and (ii) A probe blade according to any one of B31 to B37, wherein the tip of the second probe is positioned relatively close to the side of the second probe facing the first probe compared to the side facing away from the first probe.

[0157] B39. The second conductive trace is (i) The dielectric blade body is positioned across the entire length of the first conductive trace, spaced apart from the first conductive trace, and (ii) A probe blade according to any one of B31 to B38, satisfying at least one of the following: (ii) being electrically insulated from the first conductive trace via the dielectric blade body.

[0158] B40. A probe blade according to any of B1 to B39, further comprising a clearance region formed to provide additional clearance for the probe to contact the DUT, wherein the probe blade extends away from the probe.

[0159] B41. A probe blade according to any one of B1 to B40, wherein the probe blade includes an alignment structure configured to engage with the blade holder when the probe blade is received within the blade receiving area of ​​the blade holder.

[0160] B42. The probe blade according to B41, wherein the alignment structure includes a notch extending and formed within the probe blade, the notch being configured to receive a region of the blade holder to facilitate consistent alignment between the probe blade and the blade holder.

[0161] B43. A probe blade according to any one of B41 to B42, wherein the alignment structure includes a projection extending from the edge region of the probe blade, the projection being configured to extend around the region of the blade holder to facilitate consistent alignment between the probe blade and the blade holder.

[0162] C1. A blade holder configured to detachably and operably mount a probe blade to a probe system, wherein the blade holder is A conductive holder housing, (i) A blade receiving area configured to receive the blade mounting area of ​​a probe blade, (ii) An electrical connection area configured to accept multiple electrical connections, (iii) a housing mounting area configured to operatively attach the conductive holder housing to the probe system, and (iv) A conductive holder housing defining a housing volume that extends between the blade receiving region and the electrical connection region, at least partially enclosed, A blade contact structure, at least partially disposed within a blade receiving region, comprising a force blade contact configured to electrically contact a force conductive trace of a probe blade, and a sense blade contact configured to electrically contact a sense conductive trace of a probe blade, A ground electrical connection to an electrical connection area, electrically connected to a conductive holder housing, Force electrical connections within an electrical connection area electrically isolated from the conductive holder housing, A force conductor extending within the housing volume, electrically insulated from the conductive holder housing, and electrically interconnecting the force electrical connection and the force blade contact, A sense electrical connection to an electrical connection area that is electrically isolated from both the conductive holder housing and the force electrical connection, A blade holder comprising a sense conductor that extends within the housing volume, is electrically insulated from both the conductive holder housing and the force conductor, and electrically interconnects the sense electrical connection and the sense blade contact.

[0163] C2. The blade holder described in C1, wherein the conductive holder housing is a metal conductive holder housing.

[0164] C3. A blade holder as described in any of C1 to C2, wherein the conductive holder housing is an integrated conductive holder housing.

[0165] C4. A blade holder according to any one of C1 to C3, wherein the blade receiving area defines a rectangular or at least substantially rectangular cross-sectional shape.

[0166] C5. A blade holder according to any one of C1 to C4, wherein the blade receiving area is shaped and dimensionally set to receive the blade mounting area of ​​the probe blade.

[0167] C6. A blade holder according to any one of C1 to C5, wherein the electrical connection area includes a force connection opening configured to accept a force electrical connection and a sense connection opening configured to accept a sense electrical connection, the force connection opening and the sense connection opening extending within a housing volume enclosed by them.

[0168] C7. A blade holder according to any one of C1 to C6, wherein the housing mounting area includes a housing mounting projection that protrudes from the rest of the conductive holder housing.

[0169] C8. A blade holder according to any one of C1 to C7, wherein the housing volume is enclosed at least partially on at least three sides, at least four sides, or at least five sides.

[0170] C9. A blade holder according to any one of C1 to C8, wherein the blade contact structure is a biased blade contact structure configured to operatively hold the probe blade within the blade receiving region.

[0171] C10.(i) The force blade contact includes a deformable elastic force blade contact to enable the blade mounting region of the probe blade to be received within the blade receiving region, and (ii) The blade holder according to any one of C1 to C9, wherein the sensing blade contact includes a deformable elastic sensing blade contact that allows the blade mounting region of the probe blade to be received within the blade receiving region.

[0172] C11. A blade holder according to any one of C1 to C10, wherein a conductive trace for force and a conductive trace for sense are located on the first blade side of the probe blade, the probe blade further includes a conductive guard layer located on the second blade side of the probe blade, and the blade contact structure is configured to press the conductive guard layer into electrical contact with the inner surface of a blade receiving area at least partially defined by the conductive holder housing, thereby electrically connecting the conductive guard layer to the conductive holder housing.

[0173] C12. A blade holder according to any of C1 to C11, wherein the force electrical connection is defined by the inner conductor of the force coaxial connector, and furthermore, the ground electrical connection is defined at least partially by the outer conductor of the force coaxial connector.

[0174] C13. A blade holder according to any of C1 to C12, wherein the sense electrical connection is defined by the inner conductor of the sense coaxial connector, and furthermore, the ground electrical connection is defined at least partially by the outer conductor of the sense coaxial connector.

[0175] C14. Blade holder containing a probe blade, and optionally the probe blade may include any structure, function, and / or features of a probe blade as described in any of B1 to B43.

[0176] C15. The blade holder according to any one of C1 to C14, further comprising a blade holder mounting plate operatively mounted in the housing mounting area of ​​a conductive holder housing.

[0177] C16. The blade holder according to C15, wherein the blade holder mounting plate and the housing mounting area have a key structure that allows only a single relative orientation between them.

[0178] C17. The blade holder as described in any of C15 to C16, further comprising a probe arm configured to operatively attach the blade holder mounting plate to the remaining portion of the probe system.

[0179] C18. The blade holder according to C17, wherein the probe arm and the blade holder mounting plate have a key structure that allows only a single relative orientation between them.

[0180] D1. A probe system configured to electrically test a device under test (DUT), A chuck that defines a support surface configured to support a substrate including a DUT, A probe assembly, (i) A probe described in any of A1 to A25, (ii) A probe blade as described in any of B1 to B43, and (iii) A probe assembly comprising at least one of the blade holders described in any of C1 to C17, A manipulator configured to move the probe assembly relative to the support surface, A signal generation and analysis assembly, (i) providing force signals to the DUT via the probe assembly, and (ii) receiving a sense signal from the DUT via a probe assembly, a signal generation and analysis assembly configured to do at least one of the above, An imaging device, (i) at least one other component of the probe system, and (ii) A probe system comprising an imaging device configured to acquire an optical image of at least one of the DUTs.

[0181] E1. A tool configured to facilitate the insertion of a probe blade into a blade holder and the removal of a probe blade from a blade holder, A handle area configured to be gripped by the tool user, A blade receiving portion formed to receive at least a portion of the probe blade, A contact surface that defines at least partially the blade receiving portion and is formed to abut against the edge region of the blade, A tool comprising a blade gripping structure configured to grip a probe blade, which is selectively operated by the user.

[0182] E2.(i) A handle proximity contact surface located relatively close to the handle area and configured to contact the edge area when the tool inserts the probe blade into the blade holder, (ii) A plurality of contact surfaces including a distal handle contact surface, which is located relatively far from the handle area and is configured to contact the edge area when the tool removes the probe blade from the blade holder, The tools listed in E1.

[0183] E3. The tool according to any one of E1 to E2, wherein the blade gripping structure includes an elastic structure configured to be selectively pressed by the user, and the blade gripping structure selectively grips the probe blade by said pressing.

[0184] E4. The tool according to any one of E1 to E3, wherein the blade gripping structure is configured to selectively grip the probe blade by selectively applying a compressive gripping force between the first blade side and the second blade side of the blade, and optionally the edge region of the blade extends between the first blade side and the second blade side.

[0185] F1. A kit of components configured for use with the probe assembly of a probe system, At least one probe blade, optionally including any suitable structure, function, and / or features of any probe blade described in any of B1 to B43, A kit comprising at least one, or optionally both, of the following: at least one tool configured to facilitate insertion of at least one probe blade into a blade holder of a probe assembly and removal of said at least one probe blade from the blade holder, optionally including any structure, function, and / or features of any of the tools described in any of E1 to E4.

[0186] F2. A left-handed tool configured to facilitate insertion and removal of at least one probe blade from the left side of at least one probe blade, The kit described in F1 includes a plurality of tools, including a right-handed tool configured to facilitate the insertion and removal of at least one probe blade from the right side of at least one probe blade.

[0187] F3. A kit according to any of F1 to F2, further comprising a blade holder, the blade holder optionally including any structure, function, and / or features of any of the blade holders described in any of C1 to C18. [Industrial applicability]

[0188] The probes, probe blades, blade holders, probe systems, and methods disclosed herein are applicable to the semiconductor manufacturing and testing industries. The disclosures described above are considered to encompass several distinct inventions having independent utility. While each of these inventions is disclosed in a preferred form, the specific embodiments disclosed and illustrated herein should not be constrained, and numerous modifications are possible. The subject matter of the present invention includes all novel and non-obvious combinations and partial combinations of the various elements, features, functions and / or characteristics disclosed herein. Similarly, where a claim describes an element "one (a)" or "a first" or equivalent thereof, the claim means that it includes one or more such elements, and does not require or exclude two or more. The following claims specifically point to certain combinations and subcombinations directed toward one of the disclosed inventions and are considered novel and non-obvious. Inventions embodied in other combinations and subcombinations of features, functions, elements and / or properties may be claimed by amendment of the claims in this application or by introducing new claims in this application or related applications. Such amended or new claims, whether directed toward a separate invention or the same invention, and whether in a different, broader, narrower, or equivalent scope than the original claims, shall be deemed to be included in the subject matter of the inventions relating to this disclosure.

Claims

1. A probe blade for a probe system configured to electrically test a device under test (DUT), A dielectric blade body defined by a dielectric blade body material, including a blade mounting region and a probe mounting region, and defining a first blade side surface and a second blade side surface opposite it, A probe that is operably mounted in the probe mounting area, and includes a probe tip configured to electrically contact the DUT, A conductive force trace extending between the blade mounting area and the probe mounting area on the side surface of the first blade, wherein the conductive force trace is electrically connected to the probe within the probe mounting area, On the side surface of the first blade, a conductive trace for sensing extends between the blade mounting area and the probe mounting area, The facility comprises a conductive guard layer extending on the opposing second blade side surface, The probe blade is configured to provide a Kelvin electrical connection with the DUT.

2. The probe blade according to claim 1, wherein the probe-proximal end of the sensing conductive trace is short-circuited to the probe-proximal end of the force conductive trace within the probe mounting area, the sensing conductive trace is spaced apart from the force conductive trace along the remaining portion of the force conductive trace's length, and the Kelvin electrical connection is a quasi-Kelvin electrical connection.

3. The probe blade according to claim 1, wherein the probe is a first probe including a first probe tip, the probe blade includes a second probe including a second probe tip configured to be operatively mounted in the probe mounting area and to electrically contact the DUT, the conductive trace for sensing is electrically connected to the second probe within the probe mounting area, and the Kelvin electrical connection is a true Kelvin electrical connection.

4. The probe blade according to claim 3, wherein the first probe tip and the second probe tip are configured to electrically contact a single contact pad of the DUT, and further, the distance between the first probe tip and the second probe tip is less than the corresponding width of the single contact pad of the DUT.

5. The probe blade according to claim 3, wherein the distance between the first probe tip and the second probe tip is less than the blade thickness of the probe blade.

6. The probe blade according to claim 3, wherein the first probe and the second probe taper toward each other as they extend away from the probe blade, thereby facilitating electrical contact between the tips of both the first and second probes and a single contact pad of the DUT.

7. The probe blade according to claim 3, wherein at least one of the first probe and the second probe is oriented with respect to a corresponding side of the first blade and the side of the second blade at a probe extension angle, the probe extension angle being 0 degrees or more and 20 degrees or less.

8. The probe blade according to claim 3, wherein the conductive trace for force includes a first trace extension region defined on the mounting surface of the probe blade, the conductive trace for sense includes a second trace extension region defined on the mounting surface, the first probe is operably mounted to the first trace extension region, and the second probe is operably mounted to the second trace extension region.

9. The probe blade according to claim 8, wherein the mounting surface extends between the first blade side and the second blade side of the probe blade.

10. (i) The tip of the first probe is positioned such that the side of the first probe facing the second probe is relatively close to the side of the first probe facing away from the second probe, (ii) The probe blade according to claim 3, wherein the tip of the second probe is positioned such that the side of the second probe facing the first probe is relatively close to the side of the second probe facing away from the first probe.

11. The probe blade according to claim 1, wherein the probe blade includes an alignment structure configured to engage with the blade holder when the probe blade is received within the blade receiving region of the blade holder.

12. The probe blade according to claim 11, wherein the alignment structure includes a notch formed extending from the probe blade, the notch being configured to accept a region of the blade holder in order to facilitate consistent alignment between the probe blade and the blade holder.

13. The probe blade according to claim 11, wherein the alignment structure includes a projection extending from the edge region of the probe blade, the projection being configured to wrap around the region of the blade holder to facilitate consistent alignment between the probe blade and the blade holder.

14. The probe blade according to claim 1, further comprising a clearance region that extends away from the probe and is shaped to provide additional clearance for the probe to contact the DUT.

15. The probe blade according to claim 1, wherein the opposing second blade side surfaces define a second side surface area, and the conductive guard layer further defines a guard layer surface area that is at least 50% of the second side surface area.

16. The probe blade according to claim 1, wherein the dielectric blade body material is different from the conductive probe body material of the probe.

17. The probe blade according to claim 1, wherein the dielectric blade body is at least partially L-shaped.

18. It is a blade holder, A probe blade according to claim 1, configured to be detachably and operably attached to a probe system by the blade holder, A conductive holder housing, (i) A blade receiving region configured to receive the blade mounting region of the probe blade, (ii) an electrical connection area configured to accept multiple electrical connections, (iii) A housing mounting area configured to operatively attach the conductive holder housing to the probe system, and (iv) A conductive holder housing defining a housing volume that extends between the blade receiving region and the electrical connection region, at least partially enclosed, A blade contact structure at least partially disposed within the blade receiving region, comprising a force blade contact configured to electrically contact the force conductive trace, and a sense blade contact configured to electrically contact the sense conductive trace, A ground electrical connection to the electrical connection area, which is electrically connected to the conductive holder housing, A force electrical connection within the electrical connection region, electrically insulated from the conductive holder housing, A force conductor extending within the housing volume, electrically insulated from the conductive holder housing, and electrically interconnecting the force electrical connection and the force blade contact, A sense electrical connection to the electrical connection area, which is electrically insulated from both the conductive holder housing and the force electrical connection, A blade holder comprising a sense conductor that extends within the housing volume, is electrically insulated from both the conductive holder housing and the force conductor, and electrically interconnects the sense electrical connection and the sense blade contact.

19. The blade holder according to claim 18, wherein the blade contact structure is a biased blade contact structure configured to operatively hold the probe blade within the blade receiving region.

20. The blade contact structure is configured to bias the conductive guard layer to electrically contact the inner surface of the blade receiving region, which is at least partially defined by the conductive holder housing, thereby electrically connecting the conductive guard layer to the conductive holder housing, as described in claim 18.

21. A probe system configured to electrically test a device under test (DUT), A chuck that defines a support surface configured to support the substrate including the DUT, A probe assembly including the blade holder described in claim 18, A manipulator configured to move the probe assembly relative to the support surface, A signal generation and analysis assembly, (i) providing a force signal to the DUT via the probe assembly, and (ii) A signal generation and analysis assembly configured to receive a sense signal from the DUT via the probe assembly, An imaging device, (i) at least one other component of the probe system, and (ii) A probe system comprising an imaging device configured to acquire an optical image of at least one of the DUTs.

22. A kit of components configured for use with a probe assembly of a probe system, The probe blade according to claim 1, The tool comprises a tool configured to facilitate inserting the probe blade into the blade holder and removing the probe blade from the blade holder, The aforementioned tool is (i) A handle area configured to be gripped by the user of the tool, (ii) A blade receiving portion shaped to receive at least a portion of the probe blade, (iii) A contact surface that defines at least partially the blade receiving portion and is molded to press against the edge region of the blade, (iv) A kit of components comprising a blade gripping structure configured to be selectively operated by the user for gripping the probe blade.

23. A probe blade for a probe system configured to electrically test a device under test (DUT), A dielectric blade body defined by a dielectric blade body material, comprising a dielectric blade body including a blade mounting area and a probe mounting area, A probe that is operably mounted in the probe mounting area, and includes a probe tip configured to electrically contact the DUT, A conductive trace extending between the blade mounting region and the probe mounting region, and electrically connected to the probe within the probe mounting region, The system includes an alignment structure configured to engage with the blade holder when the probe blade is received within the blade receiving region of the blade holder, The aforementioned alignment structure is, (i) A notch formed extending from the probe blade and configured to receive a region of the blade holder in order to facilitate consistent alignment between the probe blade and the blade holder, and (ii) A probe blade comprising at least one of the following: a projection extending from the edge region of the probe blade and configured to wrap around the region of the blade holder in order to facilitate consistent alignment between the probe blade and the blade holder.

24. It is a blade holder, A probe blade according to claim 23, configured to be detachably and operably attached to a probe system by the blade holder, A conductive holder housing, (i) A blade receiving region configured to receive the blade mounting region of the probe blade, (ii) an electrical connection area configured to accept multiple electrical connections, (iii) A housing mounting area configured to operatively attach the conductive holder housing to the probe system, and (iv) A conductive holder housing defining a housing volume that extends between the blade receiving region and the electrical connection region, at least partially enclosed, A blade contact structure at least partially disposed within the blade receiving region, comprising a force blade contact configured to electrically contact the force conductive trace, and a sense blade contact configured to electrically contact the sense conductive trace, A ground electrical connection to the electrical connection area, which is electrically connected to the conductive holder housing, A force electrical connection within the electrical connection region, electrically insulated from the conductive holder housing, A force conductor extending within the housing volume, electrically insulated from the conductive holder housing, and electrically interconnecting the force electrical connection and the force blade contact, A sense electrical connection to the electrical connection area, which is electrically insulated from both the conductive holder housing and the force electrical connection, A blade holder comprising a sense conductor that extends within the housing volume, is electrically insulated from both the conductive holder housing and the force conductor, and electrically interconnects the sense electrical connection and the sense blade contact.

25. A probe system configured to electrically test a device under test (DUT), A chuck that defines a support surface configured to support the substrate including the DUT, A probe assembly including the blade holder described in claim 24, A manipulator configured to move the probe assembly relative to the support surface, A signal generation and analysis assembly, (i) providing a force signal to the DUT via the probe assembly, and (ii) A signal generation and analysis assembly configured to receive a sense signal from the DUT via the probe assembly, An imaging device, (i) at least one other component of the probe system, and (ii) A probe system comprising an imaging device configured to acquire an optical image of at least one of the DUTs.

26. A kit of components configured for use with a probe assembly of a probe system, The probe blade according to claim 23, The tool comprises a tool configured to facilitate inserting the probe blade into the blade holder and removing the probe blade from the blade holder, The aforementioned tool is (i) A handle area configured to be gripped by the user of the tool, (ii) A blade receiving portion shaped to receive at least a portion of the probe blade, (iii) A contact surface that defines at least partially the blade receiving portion and is molded to press against the edge region of the blade, (iv) A kit of components comprising a blade gripping structure configured to be selectively operated by the user for gripping the probe blade.

27. A blade holder configured to allow a probe blade to be detachably and operably attached to a probe system, A conductive holder housing, (i) A blade receiving region configured to receive the blade mounting region of the probe blade, (ii) an electrical connection area configured to accept multiple electrical connections, (iii) A housing mounting area configured to operatively attach the conductive holder housing to the probe system, and (iv) A conductive holder housing defining a housing volume that extends between the blade receiving region and the electrical connection region, at least partially enclosed, A blade contact structure at least partially disposed within the blade receiving region, comprising a force blade contact configured to electrically contact a force conductive trace of the probe blade, and a sense blade contact configured to electrically contact a sense conductive trace of the probe blade, A ground electrical connection to the electrical connection area, which is electrically connected to the conductive holder housing, A force electrical connection within the electrical connection region, electrically insulated from the conductive holder housing, A force conductor extending within the housing volume, electrically insulated from the conductive holder housing, and electrically interconnecting the force electrical connection and the force blade contact, A sense electrical connection to the electrical connection area, which is electrically insulated from both the conductive holder housing and the force electrical connection, A blade holder comprising a sense conductor that extends within the housing volume, is electrically insulated from both the conductive holder housing and the force conductor, and electrically interconnects the sense electrical connection and the sense blade contact.

28. The blade holder according to claim 27, wherein the conductive trace for force and the conductive trace for sense are arranged on the first blade side surface of the probe blade, the probe blade further includes a conductive guard layer arranged on the second blade side surface of the probe blade, and the blade contact structure is configured to bias the conductive guard layer to electrically contact the inner surface of the blade receiving region, which is at least partially defined by the conductive holder housing, thereby electrically connecting the conductive guard layer to the conductive holder housing.

29. A probe system configured to electrically test a device under test (DUT), A chuck that defines a support surface configured to support the substrate including the DUT, A probe assembly including the blade holder described in claim 27, A manipulator configured to move the probe assembly relative to the support surface, A signal generation and analysis assembly, (i) providing a force signal to the DUT via the probe assembly, and (ii) A signal generation and analysis assembly configured to receive a sense signal from the DUT via the probe assembly, An imaging device, (i) at least one other component of the probe system, and (ii) A probe system comprising an imaging device configured to acquire an optical image of at least one of the DUTs.

Images