Film forming device

Abstract

The film-forming apparatus of this embodiment comprises a coating section, a drying section, and a transport section. The coating section coats the surface of the substrate with a raw material liquid, and the drying section dries the raw material liquid applied to the substrate by the coating section. The transport section is equipped with transport rolls capable of supporting the substrate and transports the substrate by passing it sequentially from the upstream side through the coating area where the raw material liquid is applied by the coating section and the drying area where the raw material liquid is dried by the drying section. The transport section transports the substrate without the substrate coming into contact with the transport rolls from the upstream end of the coating area to the downstream end of the drying area.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application is based on Japanese Patent Application No. 2023-154181 filed on September 21, 2023, claims the benefit of priority thereunder, and the entire content thereof is incorporated herein by reference. Technical Field

[0002] Embodiments of the present invention relate to a film forming apparatus. Background Art

[0003] In a film forming apparatus that forms a coating film such as an insulating film on the surface of a base material such as an electric conductor, a raw material liquid containing an organic material is applied to the surface of the base material conveyed by a conveying unit. The base material is then conveyed to a drying region downstream of the application region where the raw material liquid has been applied. Then, in the drying region, the raw material liquid applied to the base material is dried to form the coating film. In the film forming apparatus that forms a coating film on a base material as described above, there is a demand for properly conveying the base material and properly forming the coating film on the base material through a film forming process including application of the raw material liquid and drying of the applied raw material liquid. Prior Art Documents Patent Documents

[0004] Patent Document 1 Japanese Patent No. 6612715 Patent Document 2 Japanese Unexamined Patent Application Publication No. 2021-172874 Brief Description of the Drawings

[0005] [Figure 1] FIG. 1 is a schematic diagram illustrating an example of the film forming apparatus according to the embodiment. [Figure 2] FIG. 2 is a cross-sectional view schematically illustrating an example of a coated structure formed by the film forming apparatus according to the embodiment. [Figure 3]Figure 3 is a schematic perspective view showing an example of the configuration of a transport roll that serves as a position adjustment roll in a film deposition apparatus according to this embodiment. [Figure 4] Figure 4 is a schematic diagram showing the position adjustment roll of Figure 3 as viewed from a direction perpendicular or nearly perpendicular to the central axis. [Figure 5] Figure 5 is a schematic perspective view showing another example of the configuration of the conveying rolls that serve as position adjustment rolls in the film deposition apparatus according to the embodiment, different from that shown in Figures 3 and 4. [Figure 6] Figure 6 is a schematic diagram showing the position adjustment roll of Figure 5 as viewed from a direction perpendicular or nearly perpendicular to the central axis. [Modes for carrying out the invention]

[0006] The problem that this invention aims to solve is to provide a film-forming apparatus that appropriately transports a substrate and appropriately forms a coating on the substrate by a film-forming process.

[0007] The film-forming apparatus of this embodiment comprises a coating section, a drying section, and a transport section. The coating section coats the surface of the substrate with a raw material liquid, and the drying section dries the raw material liquid applied to the substrate by the coating section. The transport section is equipped with transport rolls capable of supporting the substrate and transports the substrate by passing it sequentially from the upstream side through the coating area where the raw material liquid is applied by the coating section and the drying area where the raw material liquid is dried by the drying section. The transport section transports the substrate without the substrate coming into contact with the transport rolls from the upstream end of the coating area to the downstream end of the drying area.

[0008] The embodiments will be described below with reference to the drawings.

[0009] Figure 1 schematically shows an example of a film-forming apparatus 1 according to an embodiment. As shown in Figure 1, the film-forming apparatus 1 comprises a transport unit 2, an unwinding unit 3, a winding unit 5, a coating unit 6, a drying unit 7, and a control unit 10. In the film-forming apparatus 1, the unwinding unit 3 is equipped with a reel (unwinding reel) 11, and the substrate 15 is wound around the reel 11. By rotating the reel 11, the substrate 15 wound around the reel 11 is unwound to the transport unit 2. Then, a film-forming process is performed on the substrate 15 being transported in the transport unit 2 using the coating unit 6 and the drying unit 7 to form a coating (not shown in Figure 1) such as an insulating film on the surface of the substrate 15. That is, a coated structure 16 is formed by the film-forming process, in which the substrate 15 is covered with a coating. In addition, in the film-forming apparatus 1, the winding unit 5 is equipped with a reel (winding reel) 12, and the coated structure 16 is wound up by rotating the reel 12.

[0010] In the transport section 2, the transport direction in which the substrate 15 is transported, that is, the direction toward the winding section 5, is the downstream side. Conversely, in the transport section 2, the direction opposite to the transport direction, that is, the direction toward the unwinding section 3, is the upstream side. In addition, in the transport section 2 (film deposition apparatus 1), a width direction that intersects (is perpendicular or nearly perpendicular to) the transport direction is defined. In Figure 1, the width direction of the transport section 2 is perpendicular or nearly perpendicular to the plane of the paper. In one example in Figure 1, the substrate 15 is transported from the unwinding section 3 to the winding section 5 in a roll-to-roll manner. Furthermore, each of the reels 11 and 12 rotates about a central axis that is aligned with the width direction of the transport section 2, and the axial directions of each of the reels 11 and 12 are aligned with the width direction of the transport section.

[0011] Furthermore, the conveying section 2 is provided with conveying rolls 18 capable of supporting the conveyed substrate 15. In the example shown in Figure 1, multiple conveying rolls 18 are provided in the conveying section 2. Each conveying roll 18 has a central axis along the width direction of the conveying section 2 and is rotatable about this central axis. Each conveying roll 18 supports the conveyed substrate 15 by contacting it. Each conveying roll 18 contacts the substrate 15 from a direction intersecting both the conveying direction and the width direction of the conveying section 2. In a preferred example, the diameter of each of the multiple conveying rolls 18 is 100 mm or more.

[0012] The control unit 10 controls the overall operation of the film deposition apparatus 1, including the transport of the substrate 15 in the transport unit 2 and the film deposition process of forming a film on the substrate 15. The control unit 10 includes a processor or integrated circuit (control circuit) including a CPU (Central Processing Unit), ASIC (Application Specific Integrated Circuit), or FPGA (Field Programmable Gate Array), and a storage medium such as memory. The control unit 10 may include only one integrated circuit or multiple integrated circuits. The control unit 10 performs processing by executing programs stored in the storage medium.

[0013] Figure 2 shows an example of a coated structure 16 formed by the film deposition apparatus 1. In the example in Figure 2, an electrically conductive material is used as the base material 15, and the film deposition apparatus 1 forms an electrically insulating film as a coating 17 on the surface of the base material 15. Therefore, a coated conductor, in which an insulating film is coated on an electric conductor, is formed as the coated structure 16. The base material 15 has defined longitudinal directions (directions perpendicular or approximately perpendicular to the plane of the paper in Figure 2), width directions (directions indicated by arrow B in Figure 2) that intersect (orthogonal or approximately perpendicular to) the longitudinal direction, and thickness directions (directions indicated by arrow T in Figure 2) that intersect (orthogonal or approximately perpendicular to) both the longitudinal and width directions. In the base material 15, the dimensions along the longitudinal direction are larger than the dimensions along the width direction, and the dimensions along the width direction are larger than the dimensions along the thickness direction. Figure 2 shows a cross-section of the base material 15 perpendicular or approximately perpendicular to the longitudinal direction.

[0014] The base material 15 has a pair of main surfaces 21 and 22. Main surface 21 faces one side in the thickness direction, and main surface 22 faces the opposite side of main surface 21 in the thickness direction. In the example shown in Figure 2, the coating 17 is applied to both main surfaces 21 and 22 of the base material 15. The base material 15 also has an edge E1 on one side in the width direction, and an edge E2 on the opposite side of edge E1 in the width direction. In the example shown in Figure 2, the coating 17 is applied to each of edges E1 and E2.

[0015] In one example, a superconductor such as a superconducting wire is used as a base material 15, and an insulating film 17 is formed as a coating on the surface of the base material 15, including the main surfaces 21 and 22. Then, a coated superconductor such as a coated superconducting wire is formed as a coating structure 16. When a superconductor is used as the base material 15, the base material 15 contains, for example, one of the following as a superconducting material: a niobium-titanium alloy system, a niobium-tin compound system, a niobium-aluminum compound system, a magnesium diboride system, a bismuth oxide system, or a yttrium oxide system. When a coated superconducting wire is formed as the coating structure 16, for example, a superconducting wire with dimensions of 3 mm or more and 20 mm or less along the width direction is used as the base material 15.

[0016] In the example film-forming apparatus 1 shown in Figure 1, the substrate 15 is transported from the upstream side to the downstream side in the transport section 2, as described above. At this time, the substrate 15 is transported with its longitudinal direction aligned with the transport direction in the transport section 2, and its width direction aligned with the width direction of the transport section 2. That is, the substrate 15 is transported with its thickness direction intersecting (orthogonal or nearly orthogonal to) both the transport direction and the width direction of the transport section 2. In addition, each of the transport rolls 18 supports the transported substrate 15 by contacting it from one side in the thickness direction of the substrate 15.

[0017] In the film-forming apparatus 1, the coating unit 6 applies the raw material liquid to the surface of the substrate 15 being transported in the transport unit 2. The drying unit 7 then dries the raw material liquid applied by the coating unit 6. In the film-forming apparatus 1, a film-forming process including the application of the raw material liquid by the coating unit 6 and the drying of the raw material liquid by the drying unit 7 is performed, thereby forming a film 17 on the surface of the substrate 15. In the transport unit 2 of the film-forming apparatus 1, the raw material liquid is applied to the substrate 15 by the coating unit 6 in the coating area A1. Then, in the transport unit 2, the raw material liquid applied to the substrate 15 is dried by the drying unit 7 in the drying area A2.

[0018] In the transport unit 2, the drying area A2 is located downstream of the coating area A1. Therefore, the substrate 15 is transported by passing through the coating area A1 and the drying area A2 in order from upstream. Consequently, in the transport unit 2, the substrate 15 coated with the raw material liquid in the coating area A1 is transported to the drying area A2, which is downstream of the coating area A1. Then, in the drying area A2, the raw material liquid applied to the substrate 15 is dried.

[0019] In the example of FIG. 1, the drying area A2 is provided adjacent to the downstream side of the coating area A1, and is continuous with the downstream side of the coating area A1. That is, no conveying roller 18 or the like for supporting the base material 15 is provided between the coating area A1 and the drying area A2. Further, in the example of FIG. 1, no conveying roller 18 or the like for supporting the base material 15 is provided in each of the coating area A1 and the drying area A2. Therefore, in the conveying unit 2 of the example of FIG. 1, the conveying roller 18 is not disposed between the upstream end of the coating area A1 and the downstream end of the drying area A2. For this reason, the conveying unit 2 conveys the base material 15 in a state where the base material 15 does not contact the conveying roller 18 from the upstream end of the coating area A1 to the downstream end of the drying area A2.

[0020] The raw material liquid to be coated onto the base material 15 is produced by dissolving an organic substance in a solvent. As the organic substance used in the raw material liquid, one or more selected from, for example, polyolefin, polyether, polyimide, polyketone, polysulfone, cellulose, polyvinyl alcohol (PVA), polyamide, polyamideimide and polyvinylidene fluoride (PVdf) are selected. Examples of the polyolefin include polypropylene (PP) and polyethylene (PE).

[0021] Further, as the solvent for dissolving the organic substance in the raw material liquid, any one of dimethylacetamide (DMAc), dimethyl sulfoxide (DMSO), N,N-dimethylformamide (DMF), N-methylpyrrolidone (NMP), acetone, dimethoxyethylene, toluene, tetrahydrofuran, water, and alkanes, ketones, esters, alcohols, ethers, etc. is used. In the raw material liquid, for example, the organic substance is dissolved in the solvent at a concentration of 5 mass% or more and 60 mass% or less.

[0022] The coating unit 6 includes coating heads 23, and in the example shown in Fig. 1, a plurality of coating heads 23 are arranged in the coating area A1. The film forming apparatus 1 includes a supply unit (not shown) that supplies a raw material liquid to each of the coating heads 23. In one example, the supply unit is composed of a tank for storing the raw material liquid and a supply driving unit such as a supply pump. Then, the control unit 10 controls the driving of the supply driving unit to cause the raw material liquid to be supplied from the tank to each of the coating heads 23. Each of the coating heads 23 discharges the supplied raw material liquid toward the conveyed substrate 15. By discharging the raw material liquid from each of the coating heads 23, the raw material liquid is coated onto the surface of the substrate 15 in the coating area A1.

[0023] In one example, each of the coating heads 23 discharges the raw material liquid toward the substrate 15 by an electrospinning method (also referred to as charge spinning method, charge-induced spinning method, etc.). In this case, the film forming apparatus 1 includes a power source (not shown) such as a direct current power source. Then, the power source generates a potential difference between the conveyed substrate 15 and each of the coating heads 23 by, for example, applying a voltage to each of the coating heads 23. Accordingly, in each of the coating heads 23, the raw material liquid supplied from the supply unit is charged by the applied voltage, and each of the coating heads 23 discharges the charged raw material liquid toward the substrate 15.

[0024] The control unit 10 appropriately adjusts the voltage between each of the coating heads 23 and the substrate 15 in accordance with the types of solvent and solute in the raw material liquid, the boiling point and vapor pressure curve of the solvent of the raw material liquid, the concentration and temperature of the raw material liquid, the distance between the substrate 15 and the coating heads 23, and the like. In one example, the voltage (potential difference) applied between each of the coating heads 23 and the substrate 15 is appropriately adjusted within a range from 1 kV to 100 kV.

[0025] In one example, a voltage is applied by the aforementioned power supply, etc., to either the source supplying the raw material liquid to the coating head 23 or to the supply path of the raw material liquid between the source and the coating head 23, thereby charging the raw material liquid. In this case as well, the charged raw material liquid is discharged from each of the coating heads 23 toward the substrate 15, and the raw material liquid is discharged from each of the coating heads 23 by the electrospinning method. Furthermore, the discharge of the raw material liquid from the coating heads 23 may be performed by a method other than the electrospinning method. In one example, instead of the electrospinning method, the raw material liquid is discharged from each of the coating heads 23 toward the substrate 15 by the solution blowing method.

[0026] In the coating area A1, a height direction is defined that intersects both the transport direction and the width direction of the transport unit 2. The substrate 15 is transported in the coating area A1 with its thickness direction aligned with the height direction. In the example shown in Figure 1, the multiple coating heads 23 include a coating head 23A that discharges the raw material liquid toward the substrate 15 from one side in the height direction (thickness direction of the substrate 15), and a coating head 23B that discharges the raw material liquid toward the substrate 15 from the opposite side of the height direction from coating head 23A. For example, coating head 23A discharges the raw material liquid from the side facing the main surface 21, and coating head 23B discharges the raw material liquid from the side facing the main surface 22.

[0027] In the example shown in Figure 1, multiple coating heads 23A and 23B are provided. Each coating head 23A is positioned in the transport direction with respect to its corresponding coating head 23B, either not offset or only slightly offset. Therefore, when the substrate 15 is being transported, each coating head 23A faces its corresponding coating head 23B with the substrate 15 in between.

[0028] In coating area A1, each coating head 23A may be positioned offset in the transport direction relative to any of the coating heads 23B. In one example, coating heads 23A and coating heads 23B that discharge the raw material liquid from the opposite side of the coating heads 23A in the height direction are arranged alternately along the transport direction. In another example, each coating head 23B is positioned downstream of any of the coating heads 23A. In this case, the portion where all coating heads 23B are aligned along the transport direction is formed downstream of the portion where all coating heads 23A are aligned along the transport direction.

[0029] Furthermore, it is not always necessary to provide both coating heads 23A and 23B as the coating head 23. In one example, only one of the coating heads 23A or 23B is provided, and in the coating area A1, the raw material liquid is discharged onto the substrate 15 from only one side in the height direction. However, when a coated superconductor is formed as the coating structure 16, even with a configuration where the raw material liquid is discharged onto the substrate 15 from only one side in the height direction, the raw material liquid is applied to both the main surfaces 21 and 22 of the substrate 15. Then, a coating 17 that serves as an insulating film is formed on both the main surfaces 21 and 22 of the substrate 15.

[0030] The drying unit 7 is equipped with a dryer 25, which dries the raw material liquid applied to the substrate 15 by blowing air and heating, at least one of the two. In this process, the raw material liquid is dried by volatilizing the solvent contained in it. In one example, the drying unit 7 is equipped with a blower as the dryer 25, and the air blown from the blower creates a flow of gas from the blower toward the conveyed substrate 15. The raw material liquid applied to the substrate 15 is then dried by supplying drying gas or the like from the blower to the substrate 15. In a configuration in which the raw material liquid is dried by blowing air from a blower, heated gas or the like may be supplied as warm air from the blower toward the substrate 15.

[0031] In another example, the dryer 25 is equipped with a heater such as an infrared heater. In the drying area A2, the heater heats the transported substrate 15 and the raw material liquid applied to the substrate 15. For example, in a configuration where an infrared heater is provided as the heater, infrared rays are emitted from the infrared heater toward the substrate 15, and the infrared rays from the infrared heater heat the substrate 15 and the raw material liquid. The heating from the heater dries the raw material liquid applied to the substrate 15 in the dryer 25. In yet another example, the dryer 25 is equipped with both a blower and a heater, and the raw material liquid applied to the substrate 15 is dried by both airflow from the blower and heating from the heater.

[0032] In drying region A2, a height direction is defined that intersects both the transport direction and the width direction of the transport section 2. In drying region A2, the substrate 15 is transported with its thickness direction aligned with the height direction. In the example shown in Figure 1, the drying section 7 is equipped with dryers 25A and 25B as dryers 25. In drying region A2, the substrate 15 is transported passing between dryers 25A and 25B in the height direction. Therefore, dryer 25A faces the substrate 15 from one side in the height direction and performs at least one of blowing air onto the substrate 15 and heating the substrate 15 from that side in the height direction. Dryer 25B faces the substrate 15 from the opposite side of the height direction from dryer 25A and performs at least one of blowing air onto the substrate 15 and heating the substrate 15 from the opposite side of the height direction from dryer 25A.

[0033] It should be noted that both dryers 25A and 25B are not necessarily provided as the dryer 25. In one example, only one of the dryers 25A or 25B is provided, and in the drying area A2, air is blown to the substrate 15 and / or the substrate 15 is heated from only one side in the height direction. In the example in Figure 1, a temperature sensor 26 is placed in the drying area A2. The temperature sensor 26 detects the temperature of the substrate 15 without contacting the conveyed substrate 15. In the example in Figure 1, the temperature sensor 26 is placed in the drying area A2 at a position adjacent to the upstream side of the dryers 25A and 25B, and at a position adjacent to the downstream side of the dryers 25A and 25B.

[0034] The control unit 10 acquires the temperature detection result of the temperature sensor 26 regarding the temperature of the substrate 15. Based on the temperature detection result of the substrate 15, the control unit 10 controls the operation of the dryer 25 to adjust the temperature of the substrate 15 in the drying region A2. At this time, the control unit 10 controls the operation of the dryer 25 so that the temperature of the substrate 15 is below the threshold temperature. In one example, a superconductor is transported as the substrate 15 in the transport unit 2. Then, the control unit 10 controls the operation of the dryer 25 in accordance with the detection result of the temperature sensor 26 so that the temperature of the substrate 15 in the drying region A2 is below 200°C.

[0035] Furthermore, in the film deposition apparatus 1, the transport speed of the substrate 15 being transported in the transport section 2 is controlled. In the example shown in Figure 1, an encoder 27 is attached to one of the transport rolls 18, namely transport roll 18A. Transport roll 18A is positioned upstream of the coating area A1. The encoder 27 detects the rotational speed of transport roll 18A. When the substrate 15 is being transported, the control unit 10 calculates the transport speed of the substrate 15 based on the detected rotational speed of transport roll 18A. The control unit 10 then controls the transport speed of the substrate 15 based on the calculated transport speed.

[0036] In the example shown in Figure 1, the conveying roll 18A sandwiches the substrate 15 being conveyed between it and the conveying roll 18B, and nip pressure is applied to the substrate 15 by the conveying rolls 18A and 18B. One of the conveying rolls 18A or 18B rotates due to a driving force from a motor (not shown). The control unit 10 controls the motor drive based on the calculation result of the conveying speed, and adjusts the rotational speed of the conveying roll (18A or 18B) that rotates due to the driving force from the motor. The control unit 10 controls the conveying speed of the substrate 15 by adjusting the rotational speed of the conveying roll (18A or 18B) as described above. At this time, the control unit 10 controls the conveying speed of the substrate 15 while maintaining the conveying speed of the substrate 15 within the reference speed range.

[0037] In the example shown in Figure 1, the conveyor roll 18A whose rotational speed is detected, and the conveyor roll (18A or 18B) whose rotational speed is adjusted by motor drive control, are positioned upstream of the coating area A1. However, in this embodiment, the conveying speed of the substrate 15 may be adjusted downstream of the drying area A2, in the same manner as in the example shown in Figure 1. In this case, the conveyor roll 18 whose rotational speed is detected, and the conveyor roll 18 whose rotational speed is adjusted by motor drive control, are positioned downstream of the drying area A2.

[0038] Furthermore, in the film deposition apparatus 1, the tension acting on the substrate 15 being transported in the transport section 2 is controlled. In the example shown in Figure 1, a tension sensor 28A is attached to transport roll 18C, which is separate from transport rolls 18A and 18B within the transport roll 18, and a tension sensor 28B is attached to transport roll 18D, which is separate from transport rolls 18A to 18C within the transport roll 18. Transport roll 18C is positioned upstream of the coating area A1, and transport roll 18D is positioned downstream of the drying area A2. Tension sensor 28A detects the tension acting on the substrate 15 at transport roll 18C, and tension sensor 28B detects the tension acting on the substrate 15 at transport roll 18D.

[0039] The control unit 10 controls the tension acting on the substrate 15 based on the detection results from tension sensors 28A and 28B regarding the tension acting on the substrate 15. In one example, in the film deposition apparatus 1, one or more of the transport rolls 18 are movable, for example, each of the transport rolls 18C and 18D is movable. As the position of the movable transport rolls 18 changes, the tension acting on the transported substrate 15 changes. The control unit 10 adjusts the position of the movable transport rolls 18 and adjusts the tension acting on the transported substrate 15 based on the tension detection results from tension sensors 28A and 28B. At this time, the control unit 10 controls the tension acting on the substrate 15 while maintaining the tension acting on the substrate 15 within the reference tension range.

[0040] In another example, a braking mechanism is provided in the unwinding section 3 to apply braking torque to the unwinding operation of the base material 15 from the reel 11. The control unit 10 adjusts the braking torque applied by the braking mechanism based on the tension detection results from the tension sensors 28A and 28B, thereby adjusting the tension acting on the conveyed base material 15. In yet another example, the control unit 10 adjusts the rotational torque applied to the reel 12 of the winding section 5 during the winding of the base material 15 onto the reel 12 based on the tension detection results from the tension sensors 28A and 28B. The control unit 10 then adjusts the tension acting on the conveyed base material 15 by adjusting the rotational torque of the reel 12.

[0041] The control unit 10 may adjust the tension acting on the conveyed base material 15 by performing two or more of the following: adjusting the position of the movable conveying roll 18, adjusting the brake torque for the unwinding operation of the base material 15 in the unwinding unit 3, and adjusting the rotational torque of the reel 12 in the winding unit 5. Therefore, to adjust the tension acting on the base material 15, it is sufficient to perform one or more of the following: adjusting the position of the movable conveying roll 18, adjusting the brake torque for the unwinding operation of the base material 15 in the unwinding unit 3, and adjusting the rotational torque of the reel 12 in the winding unit 5.

[0042] In the example shown in Figure 1, the tension acting on the substrate 15 is detected by the conveyor roll 18C positioned upstream of the coating area A1, and by the conveyor roll 18D positioned downstream of the drying area A2. However, in this embodiment, the tension acting on the substrate 15 may be detected only on either the upstream side of the coating area A1 or the downstream side of the drying area A2. In this case as well, the tension acting on the substrate 15 is controlled in the same manner as in any of the examples described above.

[0043] Furthermore, in the example shown in Figure 1, the position of the substrate 15 in the width direction of the conveying section 2 is adjusted by a conveying roll 18E, which is separate from the conveying rolls 18A to 18D within the conveying roll 18. In other words, the conveying roll 18E acts as a position adjustment roll that adjusts the position of the substrate 15 in the width direction of the conveying section 2. The conveying roll 18E is positioned adjacent to the drying area A2 on the downstream side. Therefore, in the conveying section 2, the substrate 15 is positioned by the conveying roll 18E immediately after passing through the coating area A1 and the drying area A2 in sequence, that is, immediately after passing through an area that does not come into contact with the conveying rolls 18, etc. The conveying roll 18E, which is a position adjustment roll, adjusts the position of the substrate 15 in the width direction of the conveying section 2 without causing twisting of the substrate 15.

[0044] Figures 3 and 4 show an example of the configuration of the conveyor roll 18E, which serves as a position adjustment roll. In Figures 3 and 4, the direction indicated by arrow Y is the width direction of the conveyor section 2, and coincides with or approximately coincides with the axial direction of the conveyor roll 18E, which is the direction along the central axis C of the conveyor roll 18E. Here, Figure 3 is a perspective view, and Figure 4 shows the view from a direction perpendicular or approximately perpendicular to the central axis C of the conveyor roll 18E.

[0045] In the example shown in Figures 3 and 4, the conveyor roll 18E is provided with a recess 31 formed on its outer circumferential surface, and on the outer circumferential surface of the conveyor roll 18E, the recess 31 is recessed toward the inner circumferential side. The recess 31 is formed along the circumferential direction of the conveyor roll 18E. In the example shown in Figures 3 and 4, the recess 31 is formed over the entire circumference of the conveyor roll 18E, and the recess 31 is formed in the central part of the conveyor roll 18E in the axial direction (width direction of the conveying section 2) of the conveyor roll 18E. The outer diameter of the conveyor roll 18E in the region where the recess 31 is formed is smaller than the outer diameter of the conveyor roll 18E in the region other than the recess 31.

[0046] Furthermore, the dimensions (width dimension) W0 of the base material 15 along the width direction and the dimensions W1 of the recess 31 along the axial direction of the conveying roll 18E (width direction of the conveying section 2) are defined. The dimensions W0 of the base material 15 are smaller than the dimensions W1 of the recess 31. In a preferred example, the value obtained by subtracting the dimensions W0 of the base material 15 from the dimensions W1 of the recess 31 is 1 mm or more and 2 mm or less. That is, the relationship W0 + 1 mm ≤ W1 ≤ W0 + 2 mm holds. The conveying roll 18E supports the base material 15 being conveyed in a state where the entire width of the base material 15 fits into the recess 31. The conveying roll 18E supports the base material 15 in a state where the bottom surface of the recess 31 is in contact with the base material 15 being conveyed.

[0047] Since the base material 15 is transported with its entire width contained within the recess 31, the transport roll 18E restricts the movement of the base material 15 in the width direction of the transport section 2 by the recess 31 (the side surface of the recess 31). As a result, the transported base material 15 is prevented from shifting beyond the recess 31 in the width direction of the transport section 2. Consequently, the transport roll 18E, which acts as a position adjustment roll, prevents the base material 15 from shifting to one side in the width direction of the transport section 2, as well as preventing the base material 15 from meandering.

[0048] Figures 5 and 6 show an example of the configuration of the conveyor roll 18E, which serves as the position adjustment roll, different from that shown in Figures 3 and 4. In Figures 5 and 6, the direction indicated by arrow Y is the width direction of the conveyor section 2, and coincides with or approximately coincides with the axial direction of the conveyor roll 18E, which is the direction along the central axis C of the conveyor roll 18E. Here, Figure 5 is a perspective view, and Figure 6 shows the view from a direction perpendicular or approximately perpendicular to the central axis C of the conveyor roll 18E.

[0049] In the example shown in Figures 5 and 6, the conveyor roll 18E includes a diameter uniform section 32 and tapered sections 33A and 33B. In the conveyor roll 18E, the tapered section (first tapered section) 33A is adjacent to the diameter uniform section 32 on one side in the axial direction (width direction of the conveyor section 2). The tapered section (second tapered section) 33B is adjacent to the diameter uniform section 32 on the opposite side from the tapered section 33A in the axial direction (width direction of the conveyor section 2). Therefore, the diameter uniform section 32 is formed between the tapered sections 33A and 33B in the width direction of the conveyor section 2. Also, in the example shown in Figures 5 and 6, the diameter uniform section 32 is formed in the central part of the conveyor roll 18E in the axial direction (width direction of the conveyor section 2).

[0050] In the diameter uniform section 32, the outer diameter of the conveyor roll 18E does not change, or hardly changes, between the connection point with the tapered section 33A and the connection point with the tapered section 33B. In other words, in the diameter uniform section 32, the outer diameter of the tapered section 33A becomes uniform. Furthermore, in each of the tapered sections 33A and 33B, the outer diameter of the conveyor roll 18E decreases as it moves away from the diameter uniform section 32 in the axial direction of the conveyor roll 18E (width direction of the conveying section 2).

[0051] Here, we define the end face 35A on one side in the axial direction and the end face 35B on the opposite side in the axial direction from end face 35A in the conveying roll 18E. In the example shown in Figures 5 and 6, the tapered portion 33A extends along the axial direction (width direction of the conveying section 2) of the conveying roll 18E from the connection point with the diameter uniform portion 32 to end face 35A. The tapered portion 33B extends along the axial direction of the conveying roll 18E from the connection point with the diameter uniform portion 32 to end face 35A. Therefore, in the example shown in Figures 5 and 6, the conveying roll 18E has its maximum outer diameter in the diameter uniform portion 32, and a crown roll is used as the conveying roll 18E.

[0052] Furthermore, the dimensions (width dimension) W0 of the base material 15 along the width direction and the dimensions W2 of the diameter uniform section 32 along the axial direction of the conveying roll 18E (width direction of the conveying section 2) are defined. In the embodiments, the dimensions W2 of the diameter uniform section 32 are 2 times or less the dimensions W0 of the base material 15. However, in the example configurations shown in Figures 5 and 6, it is preferable that the dimensions W2 of the diameter uniform section 32 be less than or equal to the dimensions W0 of the base material 15. It is also preferable that the dimensions W2 of the diameter uniform section 32 be 1 mm or more. For this reason, if the dimensions W0 of the base material 15 are about 3 mm, it is preferable that the dimensions W2 of the diameter uniform section 32 be 1 mm or more and 3 mm or less. Furthermore, if the dimensions W0 of the base material 15 are 3 mm or more and the dimensions W2 of the diameter uniform section 32 are less than or equal to the dimensions W0 of the base material 15, it is more preferable that the value obtained by subtracting the dimensions W2 of the diameter uniform section 32 from the dimensions W0 of the base material 15 is 2 mm or more. In other words, it is more preferable that the relationship W2 ≤ W0 - 2 mm (W0 ≥ 3 mm) holds.

[0053] The conveying roll 18E, which serves as a position adjustment roll, supports the conveyed substrate 15 with the diameter uniform section 32 in contact with the substrate 15 from the inner circumference side. As described above, in the rotation of the conveying roll 18E, which has a diameter uniform section 32 and tapered sections 33A and 33B, the peripheral speed of the diameter uniform section 32 is faster than the peripheral speeds of the respective tapered sections 33A and 33B. Therefore, the tension acting on the substrate 15 supported by the conveying roll 18E is greater at the contact point with the diameter uniform section 32 than at the contact points with the respective tapered sections 33A and 33B.

[0054] Therefore, as the conveyor roll 18E conveys the base material 15 with the diameter uniform portion 32 in contact with the base material 15, the conveyor roll 18E applies a force to the base material 15 that pulls it towards the region where the diameter uniform portion 32 is located in the width direction of the conveyor section 2 (the axial direction of the conveyor roll 18E). As a result, the conveyor roll 18E, which acts as a position adjustment roll, suppresses the shifting of the base material 15 to one side in the width direction of the conveyor section 2, and the occurrence of meandering of the base material 15.

[0055] In the examples shown in Figures 3 and 4, and in the examples shown in Figures 5 and 6, the conveyor roll 18E, which acts as a position adjustment roll, adjusts the position of the base material 15 in the width direction of the conveying section 2 without causing twisting of the base material 15. The position of the base material 15 in the width direction of the conveying section 2 is adjusted due to the structure of the conveyor roll 18E itself and the support structure of the base material 15 by the conveyor roll 18E. Therefore, the position of the base material 15 in the width direction of the conveying section 2 is adjusted without any operation control by the control unit 10. In other words, the position adjustment of the base material 15 is performed by the conveyor roll 18E without the need for a control system by the control unit 10.

[0056] Here, the position adjustment of the substrate 15 in the width direction of the conveying section 2, performed by the conveying roll 18E as described above, is different from a mechanism that corrects meandering and misalignment of the substrate 15 by controlling the operation of an operating part. In a mechanism that corrects meandering of the substrate 15, a sensor that detects meandering of the substrate 15 and an operating part such as a roll guide are provided. When meandering of the substrate 15 is detected by the sensor, the operating part is operated by controlling its operation to correct the meandering of the substrate 15. In this case, for example, the meandering of the substrate 15 is corrected by tilting the conveying roll of the roll guide, which is the operating part. Note that in the example in Figure 1, a mechanism that corrects meandering of the substrate 15 by controlling the operation of an operating part is not provided.

[0057] Furthermore, one or more of the transport rolls 18 other than the transport roll 18E may be formed in the same configuration as the transport roll 18E. In this case, for example, one or more of the transport rolls 18 other than the transport roll 18E may be formed in the same manner as the examples in Figures 3 and 4, and the examples in Figures 5 and 6. With this configuration, in addition to the transport roll 18E, one or more of the transport rolls 18 other than the transport roll 18E become position adjustment rolls, and each of the position adjustment rolls adjusts the position of the substrate 15 in the width direction of the transport section 2 without causing twisting of the substrate 15.

[0058] In the example shown in Figure 1, inspections of the substrate 15 and the coating 17 formed on the substrate 15 are performed downstream of the drying area A2 and the conveyor roll 18E. In the film formation apparatus 1, a film thickness measuring instrument 41 is positioned downstream of the conveyor roll 18E. The film thickness measuring instrument 41 measures the film thickness of the coating 17 formed on the surface of the substrate 15 by the coating section 6 and the drying section 7. In the inspection of the coating 17, it is determined whether or not the coating 17 has been properly formed on the substrate 15 based on the measurement results of the film thickness 17.

[0059] In one example, the film thickness measuring instrument 41 is equipped with an optical system and measures the film thickness of the coating 17 using an optical interference method. In another example, the film thickness measuring instrument 41 takes a photograph of the transported substrate 15 (coating structure 16) to acquire an image of the coating 17 formed on the surface of the substrate 15. The film thickness measuring instrument 41 then calculates the color density of the coating 17 in the acquired image. The film thickness measuring instrument 41 then calculates the film thickness of the coating 17 based on the color density of the coating 17 in the image and a calibration curve showing the relationship between the color density of the coating 17 and the film thickness.

[0060] In addition, in the example film deposition apparatus 1 shown in Figure 1, a detector 42 for detecting the degradation state of the substrate 15 is positioned downstream of the transport roll 18E. The detector 42 detects a physical quantity that indicates the degradation state of the transported substrate 15. In one example, a superconductor is transported as the substrate 15, and the detector 42 detects the Ic value (critical current value) of the substrate 15 as a physical quantity indicating the degradation state of the substrate 15 using the Hall element method. In this case, the detector 42 measures the Ic value of the substrate 15 using, for example, "Tapestar(registered trademark) XL" manufactured by THEVA GmbH. In the inspection of the substrate 15, it is determined whether the substrate 15 has degraded beyond a standard level, etc., based on the detection results of the physical quantity indicating the degradation state of the substrate 15.

[0061] In addition, in the example shown in Figure 1, an accumulator 43 is provided downstream of the drying area A2 and the conveyor roll 18E. The accumulator 43 is positioned downstream of the area where inspection is performed using the film thickness measuring instrument 41 and the detector 42, etc. In the example shown in Figure 1, the accumulator 43 is equipped with five conveyor rolls 18, and two of the five conveyor rolls 18, 18F and 18G, are movable. Each of the conveyor rolls 18F and 18G is movable between the position shown by the solid line and the position shown by the dashed line.

[0062] At the positions indicated by the solid lines, the transport rolls 18F and 18G do not come into contact with the transported substrate 15 (coating structure 16). Then, as the transport rolls 18F and 18G move from the positions indicated by the solid lines to the positions indicated by the dashed lines, they come into contact with the transported substrate 15. The control unit 10 adjusts the positions of the transport rolls 18F and 18G by controlling their movement, etc. In the accumulator 43, the tension acting on the transported substrate 15 changes in response to the change in the positions of the transport rolls 18F and 18G.

[0063] In the film deposition apparatus 1, the coating structure 16 (base material 15) may be wound onto the reel 12 in a shape other than a perfect circle when viewed from the width direction of the transport section 2 (axial direction of the reel 12) in the winding section 5. In one example, the coating structure 16 is wound into an elliptical shape when viewed from the width direction of the transport section 2. When the coating structure 16 is wound into a shape other than a perfect circle when viewed from the width direction of the transport section 2, a speed difference occurs between the peripheral speed of the base material 15 during unwinding and the peripheral speed of the coating structure 16 during winding. As a result, a speed difference occurs in the transport speed of the base material 15 between the upstream and downstream sides of the accumulator 43. Therefore, by adjusting the positions of the transport rolls 18F and 18G, the tension acting on the base material 15 in the accumulator 43 is adjusted to suppress the occurrence of slack in the base material 15 caused by the aforementioned speed difference.

[0064] In another example shown in Figure 1, an insulating tape 46 having electrical insulating properties is wound around a reel 45. The insulating tape 46 unwound from the reel 45 merges with the covering structure 16 (base material 15) on a transport roll 18H located downstream of the accumulator 43. The insulating tape 46 is then laminated onto the covering structure 16 on the transport roll 18H, and the covering structure 16 with the laminated insulating tape 46 is wound onto the reel 12 in the winding section 5.

[0065] Furthermore, the aforementioned inspections concerning the substrate 15 and the coating 17 formed on the substrate 15 are not required in the film deposition apparatus 1. Also, the accumulator 43 is not required to be provided in the film deposition apparatus 1. In addition, the coating structure 16 may be wound in the winding section 5 in the film deposition apparatus 1 without the insulating tape 46 being laminated.

[0066] As described above, in this embodiment, the substrate 15 is transported from the upstream end of the coating area A1 to the downstream end of the drying area A2 without contacting the transport roll 18. With this configuration, after the raw material liquid is applied to the substrate 15 in the coating area A1, peeling of the coating film formed by the raw material liquid from the substrate 15 is effectively prevented. As a result, a coating 17 is properly formed on the substrate 15 by the film formation process, which includes the application of the raw material liquid to the substrate 15 and the drying of the raw material liquid applied to the substrate 15. In particular, by configuring the transport roll 18 not to contact the substrate 15 throughout the entire coating area A1 and drying area A2, the coating 17 is properly formed even when the coating 17 is formed on both the main surfaces 21 and 22 of the substrate 15.

[0067] Furthermore, in this embodiment, even if the transport rolls 18 do not come into contact with the substrate 15 throughout the entire coating area A1 and drying area A2, the substrate 15 is still transported appropriately in the transport section 2. In particular, in this embodiment, the transport speed of the substrate 15 is adjusted at least on the upstream side of the coating area A1 and the downstream side of the drying area A2. Also, the tension acting on the substrate 15 is detected at least on the upstream side of the coating area A1 and the downstream side of the drying area A2, and the tension acting on the substrate 15 is adjusted based on the detection result. By adjusting the transport speed and tension as described above, the substrate 15 is transported appropriately from the upstream end of the coating area A1 to the downstream end of the drying area A2 without coming into contact with the transport rolls 18.

[0068] Furthermore, in this embodiment, one or more conveying rolls 18, including the conveying roll 18E, serve as position adjustment rolls. These position adjustment rolls adjust the position of the base material 15 in the width direction of the conveying section 2 without causing twisting of the base material 15. The provision of position adjustment rolls effectively suppresses the occurrence of shifting and meandering of the base material 15. Therefore, the base material 15 is properly conveyed in the conveying section 2.

[0069] In the example configuration shown in Figures 3 and 4, the value obtained by subtracting the dimension W0 of the base material 15 from the dimension W1 of the recess 31 is 1 mm or more (W0 + 1 mm ≤ W1), which allows the entire width of the conveyed base material 15 to be appropriately accommodated in the recess 31. Furthermore, the value obtained by subtracting the dimension W0 of the base material 15 from the dimension W1 of the recess 31 is 2 mm or less (W1 ≤ W0 + 2 mm), which allows the displacement (shifting) of the base material 15 in the width direction of the conveying unit 2 to be suppressed to 1 mm or less, when the center position of the recess 31 and the center position of the base material 15 are aligned.

[0070] Furthermore, in the example configurations shown in Figures 5 and 6, by making the dimension W2 of the diameter uniform section 32 1 mm or more, it becomes possible to appropriately realize a configuration in which the diameter uniform section 32 contacts the conveyed base material 15. Also, by making the dimension W2 of the diameter uniform section 32 less than or equal to twice the dimension W0 of the base material 15, the displacement of the base material 15 in the width direction of the conveying section 2 can be effectively suppressed. And by making the dimension W2 of the diameter uniform section 32 less than or equal to the dimension W0 of the base material 15, the displacement of the base material 15 in the width direction of the conveying section 2 can be suppressed even more effectively. When the dimension W0 of the base material 15 is 3 mm or more, by making the value obtained by subtracting the dimension W2 of the diameter uniform section 32 from the dimension W0 of the base material 15 2 mm or more (W2 ≤ W0 - 2 mm (W0 ≥ 3 mm)), the displacement (shift) of the base material 15 in the width direction of the conveying section 2 can be suppressed to 1 mm or less when the center position of the diameter uniform section 32 and the center position of the base material 15 are aligned.

[0071] Furthermore, when the position of the base material 15 is adjusted by the position adjustment roll, the position of the base material 15 is adjusted without causing twisting of the base material 15, thus suppressing deterioration of the base material 15 caused by position adjustment. In particular, when a superconductor is transported as the base material 15, by configuring the system so that twisting of the base material 15 is not caused during position adjustment, deterioration of the base material 15 caused by position adjustment is effectively suppressed. In addition, in this embodiment, the position of the base material 15 is adjusted without the control unit 10 controlling the operation of the position adjustment roll.

[0072] Furthermore, the transport roll 18E, which is one of the position adjustment rolls, is positioned adjacent to the drying area A2 on the downstream side. Therefore, even if the transport roll 18 does not come into contact with the substrate 15 throughout the entire coating area A1 and drying area A2, uneven distribution and meandering of the substrate 15 are appropriately suppressed in the transport section 2.

[0073] Furthermore, in this embodiment, the raw material liquid is applied to the surface of the substrate 15 by discharge from the coating head 23. This makes it possible to lower the temperature at which the raw material liquid is dried in the drying region A2. Lowering the temperature at which the raw material liquid is dried suppresses deterioration of the substrate 15 caused by the drying process of the raw material liquid. In particular, when a superconductor is transported as the substrate 15, lowering the temperature at which the raw material liquid is dried effectively suppresses deterioration of the substrate 15 caused by the drying process.

[0074] In one embodiment, the temperature of the substrate 15 is detected in the drying region A2, and the control unit 10 controls the operation of the dryer 25 to keep the temperature of the substrate 15 below a threshold temperature based on the detected temperature. This further effectively suppresses the deterioration of the substrate 15 caused by the drying process.

[0075] Furthermore, in a preferred embodiment, the diameter of each of the multiple conveying rolls 18 is 100 mm or more. This reduces the force acting on the substrate 15 from each of the conveying rolls 18. Therefore, deterioration of the substrate 15 caused by the force from the conveying rolls 18 is suppressed.

[0076] In the embodiments described above, the drying area A2 is continuous with the coating area A1 downstream, and the transport rolls 18 are not arranged across the entire coating area A1 and drying area A2. However, in one modified example, an air turn bar is arranged as the transport rolls 18 in the range from the upstream end of the coating area A1 to the downstream end of the drying area A2. The air turn bar discharges air from its outer surface. The air turn bar supports the transported substrate 15 by the pressure of the discharged air, supporting the substrate 15 without contacting it. Therefore, in this modified example, in which the air turn bar is arranged in the range from the upstream end of the coating area A1 to the downstream end of the drying area A2, the transport unit 2 transports the substrate 15 from the upstream end of the coating area A1 to the downstream end of the drying area A2 without the substrate 15 contacting the transport rolls 18, similar to the embodiments described above.

[0077] Furthermore, in the embodiments described above, a superconductor was given as an example of the substrate 15 to be transported. However, the configuration of the film deposition apparatus 1 described above is also applicable when the electrodes (positive and negative electrodes) of a battery and the electrodes (anode and cathode) of an electrolytic capacitor are transported as the substrate 15. In this case, a coating 17 is formed on the surface of the substrate 15 as a separator, and an electrode integrated with the separator is formed as a coating structure 16.

[0078] Furthermore, if twisting of the substrate 15 is acceptable, such as when an electrode with an integrated separator is formed as the coating structure 16, the aforementioned mechanism for correcting meandering and misalignment of the substrate 15 by controlling the operation of a moving part such as a roll guide may be provided in the film deposition apparatus 1. In this case, the mechanism for correcting meandering of the substrate 15 using a roll guide is provided at least on the upstream side of the coating area A1 and the downstream side of the drying area A2. Even when a mechanism for correcting meandering of the substrate 15 using a roll guide is provided, one or more of the transport rolls 18 are used as position adjustment rolls to adjust the position of the substrate 15 in the width direction of the transport section 2 without causing twisting of the substrate 15.

[0079] Furthermore, the configuration in which the substrate 15 does not come into contact with the transport roll 18 from the upstream end of the coating area A1 to the downstream end of the drying area A2, and the position adjustment of the substrate 15 in the width direction of the transport section 2 using position adjustment rolls, are also applicable when the raw material liquid is applied to the substrate 15 by a method other than discharge of the raw material liquid from the coating head. In one example, in the coating area A1, the substrate 15 is transported through a liquid tank containing the raw material liquid, and the raw material liquid is applied to the substrate 15 by electrodeposition. Even when the raw material liquid is applied to the substrate 15 by electrodeposition, the configuration in which the substrate 15 does not come into contact with the transport roll 18 from the upstream end of the coating area A1 to the downstream end of the drying area A2, and the position adjustment of the substrate 15 in the width direction of the transport section 2 using position adjustment rolls, are also applicable.

[0080] According to at least one of these embodiments or examples, the conveying unit conveys the substrate from the upstream end of the coating area to the downstream end of the drying area without the substrate contacting the conveying rolls. Furthermore, according to at least one of these embodiments or examples, the conveying rolls include position adjustment rolls that adjust the position of the substrate in the width direction of the conveying unit without causing twisting of the substrate. By including any of these configurations, it is possible to provide a film-forming apparatus that appropriately conveys the substrate and appropriately forms a coating on the substrate by the film-forming process.

[0081] While several embodiments of the present invention have been described, these embodiments are presented as examples only and are not intended to limit the scope of the invention. These novel embodiments can be carried out in a variety of other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their variations are included in the scope and spirit of the invention, as well as in the claims of the invention and its equivalents. [Explanation of symbols]

[0082] 1...Film forming apparatus, 2...Conveying section, 6...Coating section, 7...Drying section, 10...Control section, 15...Substrate, 16...Coating structure, 17...Coating film, 18 (18A~18H)...Conveying roll, 31...Recess, 32...Uniform diameter section, 33A...Tapered section (first tapered section), 33B...Tapered section (second tapered section).

Claims

1. A coating section for applying the raw material liquid to the surface of the substrate, A drying unit for drying the raw material liquid applied to the substrate by the coating unit, A film-forming apparatus comprising: a conveying section that conveys the substrate by passing it through a coating area where the raw material liquid is applied by the coating section and a drying area where the raw material liquid is dried by the drying section, in order from the upstream side, wherein the conveying section conveys the substrate in such a state that the substrate does not come into contact with the conveying roll from the upstream end of the coating area to the downstream end of the drying area.

2. The film-forming apparatus according to claim 1, wherein in the transport section, the drying area is continuous with the downstream side of the coating area.

3. The conveying rolls of the conveying section include position adjustment rolls that adjust the position of the substrate in the width direction of the conveying section without causing twisting of the substrate, The position adjustment roll is positioned at least at a location adjacent to the drying region on the downstream side. A film deposition apparatus according to claim 1 or 2.

4. A coating section for applying the raw material liquid to the surface of the substrate, A drying unit for drying the raw material liquid applied to the substrate by the coating unit, A conveying unit comprising a conveying roll capable of supporting the substrate, which conveys the substrate by passing it sequentially from the upstream side through a coating area where the raw material liquid is applied by the coating section and a drying area where the raw material liquid is dried by the drying section, wherein the conveying roll includes a position adjustment roll that adjusts the position of the substrate in the width direction of the conveying unit without causing twisting of the substrate, A film deposition apparatus equipped with the following:

5. The film-forming apparatus according to claim 4, wherein the position adjustment roll has a recess that is recessed toward the inner circumference, and the substrate is supported in a state in which the entire width of the substrate is housed in the recess.

6. The position adjustment roll is, A diameter uniform section where the outer diameter is uniform, A first tapered portion is adjacent to the diameter uniform portion on one side in the width direction of the conveying portion, and its outer diameter decreases as it moves away from the diameter uniform portion. In the width direction of the conveying section, a second tapered section is adjacent to the uniform diameter section on the opposite side from the first tapered section, and the outer diameter decreases as it moves away from the uniform diameter section. Equipped with, The position adjustment roll supports the substrate with the diameter uniform portion in contact with the substrate. The film deposition apparatus according to claim 4.

Images