Faceplate-less multiplenum shower head

JP2026536483APending Publication Date: 2026-10-30LAM RES CORP
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
JP2026520463
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-10-09
Filing Date
2024-10-07
Publication Date
2026-10-30

Smart Images

  • Figure 2026536483000001_ABST
    Figure 2026536483000001_ABST
Patent Text Reader

Abstract

The shower head includes a plate and a baffle. The plate includes a first surface and an opening at the center of the first surface. The baffle is positioned in the opening of the plate. The baffle extends into the plate through the opening. The baffle is in a plane parallel to the first surface of the plate and includes a second surface containing a first set of holes and a second set of holes. The first set of holes and the second set of holes are not in fluid communication with each other. The baffle includes a connecting plate for connecting the baffle to the shower head, a stem extending from the connecting plate, and a gas delivery plate extending from the stem and containing first and second sets of holes for delivering one or more gases.
Need to check novelty before this filing date? Find Prior Art

Description

TECHNICAL FIELD

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims the benefit of U.S. Provisional Application No. 63 / 543,203, filed on October 9, 2023. The entire disclosure of the above-referenced application is incorporated herein by reference.

[0002] The present disclosure relates generally to substrate processing systems, and more particularly to a faceplate-less multi-plenum showerhead for substrate processing systems. BACKGROUND ART

[0003] The background description provided herein is for the purpose of generally presenting the context of the present disclosure. To the extent described in this Background Art section, the work of the present inventors, as well as aspects of the description that may not otherwise qualify as prior art at the time of filing, are neither expressly nor impliedly admitted as prior art against the present disclosure.

[0004] Substrate processing systems (also referred to as tools) are used to process substrates such as semiconductor wafers. The substrate processing system includes a processing chamber. The processing chamber includes a plurality of process modules (also referred to as stations). Each process module is capable of processing a substrate. For example, processing may include deposition, etching, cleaning, and / or other substrate processing. During processing, the substrate is disposed on a substrate support of the process module. A gas delivery system introduces one or more gases and / or vaporized precursors into the process module via a gas delivery device. For example, the gas delivery device may be a showerhead, an injector, or the like. In some processes, plasma may be used to initiate chemical reactions. Examples of processes include chemical vapor deposition (CVD), atomic layer deposition (ALD), plasma-enhanced (PE) CVD (PECVD), and PEALD. SUMMARY OF THE INVENTION

[0005] The shower head comprises a plate and a baffle. The plate comprises a first surface and an opening at the center of the first surface. The baffle is positioned in the opening of the plate. The baffle extends into the plate through the opening. The baffle comprises a second surface located in a plane parallel to the first surface of the plate, and having a first set of holes and a second set of holes within the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

[0006] In the additional feature, the second surface of the baffle is coplanar with the first surface of the plate.

[0007] In the additional feature, nine of the first set of holes form a first square around the center of the second surface of the baffle. One or more of the holes in the first set of holes lie within the first square. None of the holes in the second set lie within the first square.

[0008] In the additional feature, four of the second set of holes form a second square that is larger than the first square. The second square has a center that coincides with the center of the first square and the center of the second surface of the baffle. Each of the four holes is located radially outward from one of the nine holes located at the corners of the first square.

[0009] In the additional features, the second surface of the baffle further comprises a third set of holes having a diameter less than or equal to the diameters of the first and second sets of holes. At least four of the holes in the third set are located within the second square and outside the first square.

[0010] In the additional feature, at least one hole from the third set of holes and two holes from the first set of holes form a triangle, and there are no other holes within the triangle.

[0011] In the additional feature, the third set of holes lies on a circle concentric with the centers of the first and second squares and the center of the second surface of the baffle. The corners of the first square lie on the circle.

[0012] In the additional features, the third set of holes is in fluid communication with the second set of holes, but not with the first set of holes.

[0013] In the additional feature, two diameters of the second surface of the baffle that are perpendicular to each other and intersect at the center of the second surface of the baffle form four quadrants on the second surface of the baffle. The two diameters contain only the holes of the first set. Each quadrant contains one or more holes from the third set of holes.

[0014] In the additional features, each diameter includes nine holes from the first set of holes.

[0015] In an additional feature, the showerhead is configured to supply one or more gases directly to the process chamber via a baffle.

[0016] In the additional feature, the showerhead is configured to supply one or more gases to a substrate facing the plate via a baffle. The showerhead does not have a faceplate with holes facing the substrate.

[0017] In the additional feature, the showerhead is configured to supply a first gas to a plate-facing substrate through a first set of holes and a second gas to a plate-facing substrate through a second set of holes.

[0018] In the additional feature, the first and second sets of holes have the same diameter.

[0019] In the additional feature, the first and second pairs of holes are arranged along concentric circles. At least one hole on each circle has a different diameter from at least one other hole on each circle.

[0020] In the additional features, the first and second sets of holes are arranged in rows and columns.

[0021] In an additional feature, the baffle is coupled to the plate by one or more fasteners.

[0022] In an additional feature, the plate and the baffle are integral.

[0023] In an additional feature, the baffle comprises a ring around the second surface of the baffle. The showerhead further comprises a gap between the outer diameter of the ring and the inner diameter of the opening of the plate.

[0024] In an additional feature, the baffle comprises a ring around the second surface of the baffle. The outer diameter of the ring is smaller than the inner diameter of the opening of the plate.

[0025] In an additional feature, the edge of the first surface of the plate is rounded along the inner diameter of the opening of the plate.

[0026] In an additional feature, the baffle comprises a ring around the second surface of the baffle. The showerhead further comprises a gap between the outer diameter of the ring and the inner diameter of the opening of the plate. The first set of holes of the baffle is configured to supply a first gas. The second set of holes of the baffle is separated from the first set of holes and is configured to supply a second gas. The gap is configured to pass the second gas.

[0027] In an additional feature, the first and second sets of holes are arranged in an alternating pattern.

[0028] In an additional feature, each hole of the first set of holes and the second set of holes is spaced a predetermined distance from adjacent holes of the first set of holes and the second set of holes.

[0029] In an additional feature, the diameter of the second surface of the baffle is 75% to 99% of the diameter of the opening.

[0030] In an additional feature, the diameter of the second surface of the baffle is 0.5% to 50% of the diameter of the first surface of the plate.

[0031] In an additional feature, the diameter of the opening is 0.5% to 50% of the diameter of the plate.

[0032] In an additional feature, the showerhead further comprises a stem connected to the second surface of the plate. The second surface is on the opposite side of the first surface. The stem comprises a base portion coupled to a central region of the second surface of the plate, and comprises a vertical portion extending vertically upward from the base portion.

[0033] In an additional feature, the second surface of the plate (i) extends vertically upward by a first distance from the outer diameter of the first surface, (ii) after the first distance, extends radially inward by a second distance at an angle to the first surface of the plate, and (iii) after the second distance, extends radially inward parallel to the first surface of the plate by a third distance to the base portion of the stem.

[0034] In still other features, a baffle for a showerhead comprises a connection plate, a stem, and a gas delivery plate. The connection plate is configured to connect the baffle to the showerhead. The stem extends from the connection plate. The gas delivery plate extends from the stem and comprises a first set of holes and a second set of holes for delivering one or more gases. The first set of holes and the second set of holes are not in fluid communication with each other.

[0035] In an additional feature, the connection plate, the stem, and the gas delivery plate are cylindrical and have different diameters.

[0036] In an additional feature, at least one of the connection plate, the stem, and the gas delivery plate has a shape different from the others of the connection plate, the stem, and the gas delivery plate.

[0037] In the additional features, at least one of the connecting plate, stem, and gas delivery plate has a different size from the others of the connecting plate, stem, and gas delivery plate.

[0038] In the additional features, the connecting plate and the gas delivery plate have the same size.

[0039] In the additional features, the connecting plate, stem, and gas delivery plate are integrated.

[0040] In the additional features, the connecting plate, stem, and gas delivery plate are joined to each other using one or more fasteners.

[0041] In the additional features, the gas delivery plate has a larger diameter than the stem. The connecting plate has a larger diameter than the gas delivery plate.

[0042] In the additional features, the baffle further comprises an opening that extends through the center of the connecting plate and stem, and partially extends through the center of the gas delivery plate into the gas delivery plate.

[0043] In the additional features, the connecting plate has multiple arc-shaped slots that extend through the connecting plate. The multiple arc-shaped slots are located radially outward from the stem.

[0044] In the additional features, the gas delivery plate comprises a first set of holes and a second set of holes arranged in an alternating pattern. The first set of holes is configured to deliver a first gas, and the second set of holes is configured to deliver a second gas different from the first gas.

[0045] In the additional feature, the first and second sets of holes have the same diameter.

[0046] In the additional feature, the first and second pairs of holes are arranged along concentric circles. At least one hole on each circle has a different diameter from at least one other hole on each circle.

[0047] In the additional features, the first and second sets of holes are arranged in rows and columns.

[0048] In the additional feature, one of the holes in the first set is at the center of the gas delivery plate. Nine of the holes in the first set form a first square at the center of the gas delivery plate. One or more of the holes in the first set are within the first square. None of the holes in the second set are within the first square.

[0049] In the additional feature, four of the second set of holes form a second square whose center coincides with the center of the first square and the center of the gas delivery plate. Each of the four holes is located radially outward from one of the nine holes located at the corners of the first square.

[0050] In the additional features, the gas delivery plate further comprises a third set of holes having a diameter less than or equal to the diameter of each of the first and second sets of holes. At least four of the holes in the third set are located within the second square and outside the first square.

[0051] In the additional feature, at least one hole from the third set of holes and two holes from the first set of holes form a triangle, and there are no other holes within the triangle.

[0052] In the additional features, the third set of holes lies on a circle concentric with the centers of the first and second squares and the center of the gas delivery plate. The corners of the first square lie on the circle.

[0053] In the additional features, the third set of holes is in fluid communication with the second set of holes, but not with the first set of holes.

[0054] In the additional feature, two diameters of the gas delivery plate that are perpendicular to each other and intersect at the center of the gas delivery plate form four quadrants. The two diameters contain only the first set of holes. Each quadrant contains two holes from the third set of holes.

[0055] In the additional features, each diameter includes nine holes from the first set of holes.

[0056] In the additional features, the stem comprises a fourth set of holes along the rim of the stem, and a plurality of channels extending radially inward at an angle with respect to the vertical axis passing through the stem and the gas delivery plate between the third and fourth sets of holes. The third and fourth sets of holes are in fluid communication with each other, with the second set of holes, a plurality of arcuate slots, and an annular volume around the stem between the connecting plate and the gas delivery plate.

[0057] Additional features include second, third, and fourth sets of holes, and multiple arcuate slots. The annular volume is not in fluid communication with the first set of holes.

[0058] In the additional features, the gas delivery plate comprises a plate, a frustoconical portion and a ring attached to the plate. The ring surrounds the frustoconical portion, defining a gap between them.

[0059] In the additional feature, the smaller end of the frustoconical portion is attached to the plate. The inner portion of the ring tapers radially inward as the ring extends toward the plate.

[0060] In the additional feature, the larger end of the frustoconical portion is attached to the plate. The inner portion of the ring tapers radially outward as the ring extends toward the plate.

[0061] In the additional feature, the frustoconical portion comprises a fifth set of holes arranged laterally through the frustoconical portion. The first set of holes is connected perpendicularly to the fifth set of holes via the frustoconical portion.

[0062] In the additional features, the baffle further comprises an opening that extends through the center of the connecting plate and stem, and partially extends through the center of the gas delivery plate into the gas delivery plate. The opening is in fluid communication with the first and fifth sets of holes and the gap between the frustoconical portion and the ring.

[0063] In the additional features, the openings, the first and fifth sets of holes, and the gaps are not in fluid communication with the second, third, and fourth sets of holes. Multiple arc-shaped slots. Annular volume between the connecting plate and the gas delivery plate around the stem.

[0064] In the additional features, the diameter of each hole in the third and fourth sets of holes, and each channel in the multiple channels, are the same. The angles are between 45 and 85 degrees.

[0065] In the additional features, the diameters of the first and second sets of holes are 1% to 25% of the diameter of the fifth set of holes. The diameters of the third and fourth sets of holes, as well as the multiple channels, are 10% to 100% of the diameter of the first and second sets of holes.

[0066] In the additional features, the stem thickness is smaller than the connecting plate thickness. The gas delivery plate thickness is smaller than the stem thickness.

[0067] In other features, the shower head comprises a base plate and a baffle. The base plate comprises a first surface and an opening at the center of the first surface. The baffle is positioned in the opening of the base plate. The baffle extends into the base plate through the opening. The baffle comprises a second surface located in a plane parallel to the first surface of the base plate and comprising a first set of holes and a second set of holes within the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

[0068] In an additional feature, the showerhead is configured to supply one or more gases directly to the process chamber via a baffle.

[0069] In the additional feature, the showerhead is configured to supply one or more gases to a substrate facing the base plate via a baffle. The showerhead does not have a faceplate with holes facing the substrate.

[0070] In the additional feature, the second surface of the baffle is coplanar with the first surface of the base plate.

[0071] In the additional features, the baffle is attached to the base plate by one or more fasteners.

[0072] In the additional features, the base plate and baffle are integrated.

[0073] In the additional features, the diameter of the opening is 0.5% to 50% of the diameter of the base plate.

[0074] In the additional features, the diameter of the second surface of the baffle is 0.5% to 50% of the diameter of the first surface of the base plate.

[0075] In the additional features, the diameter of the second surface of the baffle is 75% to 95% of the diameter of the opening.

[0076] In the additional features, the showerhead is configured to supply a first gas through a first set of holes and a second gas to a substrate facing the base plate through a second set of holes.

[0077] In the additional features, the base plate has a first slot on a second surface of the base plate. The second surface is on the opposite side of the first surface. The shower head further comprises a first component and a second component. The first component comprises a first base portion positioned in the first slot and a first vertical portion extending from the first base portion. The first vertical portion comprises a conduit. The second component comprises a second base portion positioned in the first slot on the first base portion and a second vertical portion extending from the second base portion. The second vertical portion comprises an inlet. The first and second base portions have the same diameter as the first slot. The second vertical portion has a larger diameter than the first vertical portion. The second vertical portions surround the first vertical portion which defines a first annular volume between them. The first annular volume is in fluid communication with the inlet but not with the conduit.

[0078] In the additional feature, the opening has a first diameter. The first slot has a second diameter. The first base portion faces the opening and includes a second slot having a third diameter that is larger than the first diameter and smaller than the second diameter. The baffle is positioned in the second slot.

[0079] In the additional features, the baffle comprises a connecting plate positioned in a second slot, a stem extending from the connecting plate, and a gas delivery plate extending from the stem. The connecting plate, stem, and gas delivery plate have different diameters.

[0080] In the additional features, the connecting plate, stem, and gas delivery plate are integrated.

[0081] In the additional features, the connecting plate, stem, and gas delivery plate are joined to each other using one or more fasteners.

[0082] In the additional features, the gas delivery plate has a larger diameter than the stem. The connecting plate has a larger diameter than the gas delivery plate.

[0083] In the additional features, the stem thickness is smaller than the connecting plate thickness. The gas delivery plate thickness is smaller than the stem thickness.

[0084] In the additional features, the connecting plate comprises multiple arched slots arranged in a circle with a diameter larger than that of the stem. The first vertical portion comprises multiple rectangular holes extending radially inward and downward through the first base portion to the second slots. The rectangular holes are in fluid communication with the first annular volume and coincide with the arched slots.

[0085] In the additional features, the gas delivery plate comprises a plate, a frustoconical portion having smaller ends attached to the plate, and a ring surrounding the frustoconical portion and attached to the plate. The inner portion of the ring is tapered parallel to the frustoconical portion, defining a gap between them.

[0086] In the additional features, the baffle comprises a third set of holes and a fifth set of holes. The third set of holes extends radially outward at an angle within the stem, passing through the frustoconical portion, and forms a fourth set of holes in the rim of the stem. The fifth set of holes is positioned laterally, passing through the frustoconical portion. The first set of holes is connected perpendicularly to the fifth set of holes via the frustoconical portion.

[0087] In the additional features, the conduit extends through the connecting plate, stem, and center of the plate into the frustoconical portion, and is in fluid communication with the first and fifth sets of holes and the gap between the frustoconical portion and the ring.

[0088] In the additional features, the connecting plate and gas delivery plate define a second annular volume between them and around the stem. The second set of holes extends through the plates and the frustoconical portion. The second set of holes, the third set of holes, and the fourth set of holes are in fluid communication with the second annular volume.

[0089] In the additional features, the conduit, the first and fifth sets of holes, and the gap (296) between the frustoconical portion and the ring are in fluid communication with each other and define the first plenum of the showerhead. The inlet, the first and second annular volumes, the rectangular hole, the arcuate slot, the second, third, and fourth sets of holes, and the second gap between the gas delivery plate and the opening are in fluid communication with each other and define the second plenum of the showerhead.

[0090] In the additional features, the connecting plate, stem, and portion of the conduit that penetrates the center of the plate and extends into the frustoconical portion, the first and fifth sets of holes, and the gap between the frustoconical portion and the ring are in fluid communication with each other and define the first plenum of the baffle. The second annular volume, arcuate slot, and the second, third, and fourth sets of holes are in fluid communication with each other and define the second plenum of the baffle.

[0091] In the additional feature, the first and second sets of holes have the same diameter.

[0092] In the additional feature, the first and second pairs of holes are arranged along concentric circles. At least one hole on each circle has a different diameter from at least one other hole on each circle.

[0093] In the additional feature, the edges of the first surface of the base plate are rounded along the inner diameter of the opening in the base plate.

[0094] In the additional features, the first and second sets of holes are arranged in an alternating pattern.

[0095] In the additional features, each hole in the first set of holes and each hole in the second set are spaced a predetermined distance apart from adjacent holes in the first set of holes and each hole in the second set.

[0096] In the additional features, the first and second sets of holes have a smaller diameter than the fifth set of holes. The diameters of the third and fourth sets of holes are less than or equal to the diameters of the first and second sets of holes.

[0097] Further scope of application of this disclosure will become apparent from the modes for carrying out the invention, the claims, and the drawings. The modes for carrying out the invention and specific examples are for illustrative purposes only and do not limit the scope of this disclosure.

[0098] This disclosure will be better understood from the embodiments for carrying out the invention and the accompanying drawings. [Brief explanation of the drawing]

[0099] [Figure 1] This figure shows an example of a substrate processing system for processing a substrate using a shower head that includes a baffle according to the present disclosure, without having a faceplate. [Figure 2] This figure shows an example of a perspective view of a shower head according to this disclosure. [Figure 3] This figure shows an example of a side view of a shower head according to this disclosure. [Figure 4] This figure shows an example of a bottom view of a shower head according to this disclosure. [Figure 5] This figure shows an example of a cross-sectional view of a shower head according to this disclosure. [Figure 6] This figure shows an example of a shower head base plate according to this disclosure. [Figure 7A] This figure shows an example of the components of a shower head according to this disclosure. [Figure 7B] This figure shows an example of the components of a shower head according to this disclosure. [Figure 7C]This figure shows an example of the components of a shower head according to this disclosure. [Figure 7D] This figure shows an example of the components of a shower head according to this disclosure. [Figure 7E] This figure shows an example of the components of a shower head according to this disclosure. [Figure 8] This figure shows an example of the components of a shower head according to this disclosure. [Figure 9] This figure shows an example of the components of a shower head according to this disclosure. [Figure 10A] This figure shows an example of a perspective view of the baffle of a shower head according to this disclosure. [Figure 10B] This figure shows an example of a perspective view of the baffle of a shower head according to this disclosure. [Figure 10C] This figure shows an example of a perspective view of the baffle of a shower head according to this disclosure. [Figure 11A] This figure shows an example of a side view of the baffle of a shower head according to this disclosure. [Figure 11B] This figure shows an example of a side view of the baffle of a shower head according to this disclosure. [Figure 12] This figure shows an example of a top view of the baffle of a shower head according to this disclosure. [Figure 13] This figure shows a first example of a cross-sectional view of a showerhead baffle according to the present disclosure. [Figure 14] This figure shows a second example of a partial cross-sectional view of the baffle of a shower head according to the present disclosure. [Figure 15] This figure shows an example of a bottom view of the baffle of a shower head according to this disclosure. [Figure 16] This figure shows a third example of a cross-sectional view of the baffle of a shower head according to this disclosure. [Figure 17] This is a perspective view of a shower head having a baffle for a substrate processing system according to the present disclosure. [Figure 18] Figure 17 is a side view of the showerhead. [Figure 19] Figure 17 is a top view of the showerhead. [Figure 20] Figure 17 is a bottom view of the showerhead. [Figure 21] Figure 17 is a perspective view of the showerhead baffle in an upright position. [Figure 22] Figure 17 is a perspective view of the showerhead baffle with the top and bottom reversed. [Figure 23] Figure 22 is a side view of the baffle. [Figure 24] Figure 22 is a top view of the baffle. [Figure 25] Figure 22 is a bottom view of the baffle. [Modes for carrying out the invention]

[0100] In drawings, reference numbers may be reused to identify similar and / or identical elements.

[0101] In deposition processes, showerheads are typically used to deliver process gases to a processing chamber under vacuum in a controlled and uniform manner. A showerhead typically comprises a backplate and a faceplate attached to the backplate. The faceplate typically has a diameter greater than or equal to the diameter of the substrate and less than or equal to the diameter of the backplate. The faceplate has thousands of through-holes distributed across the entire faceplate through which the process gases are introduced into the processing chamber.

[0102] Many factors, including but not limited to gas properties, deposition chemistry and uniformity, temperature, pressure, and throughput, influence showerhead design. Single and double plenum showerheads, with different overall sizes and hole patterns on the faceplate, are typically used to deliver process gases to processing chambers. These designs are typically complex and require advanced manufacturing techniques, making showerheads an expensive component of gas delivery systems. For example, in a double plenum showerhead, the through-holes are cross-perforated, which involves orthogonal perforation through the showerhead's base plate, a costly process. Showerhead design directly impacts throughput, which in turn directly relates to the manufacturing cost of semiconductors.

[0103] This disclosure provides a multiplenum showerhead having a simple and cost-effective design that eliminates the faceplate and allows for the delivery of up to three separate gases into a processing chamber. More specifically, the state-of-the-art technology includes single and double plenum showerheads of various sizes and faceplate perforation patterns. In some designs, the showerhead is mounted (or suspended) above a pedestal in a processing chamber, with a gap between the bottom surface of the showerhead (i.e., the faceplate) and a substrate placed on the pedestal. In other designs, the showerhead and pedestal are inverted, allowing the process gas to flow from the bottom of the processing chamber through a substrate support to the top of the processing chamber. The showerhead can also be used to generate and deliver plasma. In these applications, the showerhead is used as an electrode (ground or active electrode of an RF generating system) in addition to delivering gas into the processing chamber.

[0104] In a single plenum showerhead, all gases flow separately or together through a shared path, while in a double plenum showerhead, two separate paths allow for the passage of two separate gas streams. In either design, the showerhead features a faceplate with many (e.g., thousands) of holes distributed across the entire faceplate through which the process gases are delivered into the processing chamber. The showerhead can be actively heated using different techniques, such as heating elements, or passively heated by radiation, convection, and conduction from components in the processing chamber that are hotter than the showerhead.

[0105] Showerheads can be a source of failure, partly due to their complex and customized design. In a single plenum showerhead, a common gas delivery path can lead to particle generation due to residual (stagnant) gases from chemicals previously supplied in multiple chemical processes. Furthermore, deposit non-uniformity and low throughput are directly related to the showerhead design. Showerhead failures (e.g., clogging of faceplate through-holes) can increase unproductive time (downtime) in the processing chamber. For example, clogged faceplate through-holes need to be cleaned regularly, which increases downtime. Additionally, the cleaning process can alter the dimensions of the holes over time, thus requiring showerhead replacement. Due to the high cost of showerheads, frequent replacement can increase the overall cost of semiconductor manufacturing.

[0106] The faceless multiplenum showerhead according to this disclosure solves the above problems as follows: Unlike conventional showerheads which have a faceplate with thousands of through-holes distributed throughout the faceplate, the multiplenum showerhead according to this disclosure does not have a faceplate. The faceless multiplenum showerhead according to this disclosure is without a faceplate and is therefore called a faceless multiplenum showerhead (or simply a faceless showerhead), where faceless means faceplate-less, i.e., without a faceplate. In a faceless showerhead, baffles are used instead of faceplates. The baffles provide one or more plenums and corresponding through-holes. The baffles are located on the backplate of the showerhead.

[0107] A faceless showerhead has only a backplate and baffles, and no faceplate. The diameter of the baffles is smaller than the diameters of the backplate, substrate, and faceplate, and faceplates are not used in faceless showerheads but are used in conventional showerheads. For example, the diameter of the baffles is less than 50% of the diameters of the backplate, substrate, and faceplate. Multiple (e.g., two or more) separate plenums within the baffles allow for the delivery of multiple (e.g., two or more) separate process gas flows simultaneously or sequentially. The number of through-holes in the baffles (e.g., about 100) is also considerably less than the number of through-holes in the faceplate. Therefore, a faceless showerhead delivers process gases through a considerably smaller area from the bottom of the faceless showerhead (e.g., from 0.5% to 50% of the bottom of the faceless showerhead) compared to a conventional showerhead with a faceplate.

[0108] Faceless showerheads reduce or eliminate particle generation and improve throughput by shortening the time required to deliver and purge gas through multiple plenums compared to conventional showerhead designs. Faceless showerheads are also easier to clean than conventional showerheads with faceplates. For example, faceless showerheads can be cleaned by machining the bottom surface of the faceless showerhead, which is easier than cleaning the clogged through-holes of the faceplate of a conventional showerhead.

[0109] Furthermore, unlike faceplates, baffles are easier to manufacture and less expensive to replace. For example, baffles can be manufactured using additive manufacturing technologies such as 3D printing, which eliminates the need for expensive cross-drilling to create through holes, thus reducing the manufacturing and replacement costs of baffles compared to faceplates. Therefore, faceless showerheads are a simpler and more cost-effective design than conventional showerhead designs.

[0110] More specifically, faceless showerheads use a baffle design instead of a typical faceplate with a perforated pattern to achieve uniformity of gas flow from each plenum. The faceless showerhead design minimizes gas stagnation within the processing chamber, resulting in shorter purging times compared to using conventional showerheads. Faceless showerhead designs can be used in actively and passively heated applications, as well as in RF or non-RF applications. Faceless showerheads can be actively or passively heated and cooled. Thus, compared to conventional showerheads, faceless showerhead designs increase process speed by delivering multiple distinct gases, reduce costs by eliminating complex manufacturing techniques, and reduce processing chamber downtime due to improved reliability. These and other features of this disclosure are described in further detail below.

[0111] This disclosure is organized into two sections. The first section includes Figures 1 to 16. The second section includes Figures 17 to 25. The first section shows and describes in detail the internal and external features of the showerhead and baffle. The second section shows and describes only the external features of the showerhead and baffle. The first section first shows an example of a substrate processing system in which the faceless showerhead of this disclosure can be used, and describes it with reference to Figure 1. Its elements, including the showerhead and baffle, are shown and described with reference to Figures 2 to 9. The baffle of the showerhead is described in detail with reference to Figures 10A to 16. The second section shows various diagrams of the showerhead and baffle. Some of the diagrams in the second section are also shown and described in the first section. Nevertheless, since the figures in the first section include reference numbers, the second section again shows some of the figures shown in the first section, as well as other figures of the showerhead and baffle, to illustrate the external features of the showerhead and baffle without reference numbers.

[0112] Section 1: Internal and External Features of a Shower Head Throughout the following description, as shown in Figures 2 to 16, the axis parallel to the plane on which the backplate (also called the base plate) and baffles of the showerhead are located is referred to as the horizontal axis, x-axis, or first axis, and the axis perpendicular to the plane on which the backplate and baffles of the showerhead are located is referred to as the vertical axis, z-axis, showerhead axis, or second axis. The x-axis is also parallel to the plane on which the substrate exists when the substrate is placed on the substrate support for processing. The x-axis is also parallel to the diameter of the backplate and baffles of the showerhead. The x-axis also extends along the radial direction of the backplate and baffles of the showerhead. Furthermore, examples of various dimensions of different components of the showerhead and baffles will be described last, along with their technical advantages.

[0113] Furthermore, throughout this disclosure, a shower head including a baffle is generally described as comprising various components. These components can be attached to one another using appropriate fasteners as described below, or they can be diffuse-bonded. In some examples, a shower head including a baffle can be manufactured as a single, integrated, and one-piece component using various manufacturing techniques such as 3D printing. Furthermore, throughout this disclosure, a baffle is also generally described as comprising various components. These components can also be attached to one another using appropriate fasteners as described below, or they can be diffuse-bonded. In some examples, a baffle can also be manufactured as a single, integrated, and one-piece component using various manufacturing techniques such as 3D printing. The baffle can then be attached to the rest of the shower head using appropriate fasteners or diffusion bonding.

[0114] Furthermore, all or some of the components of the showerhead and / or baffle may be made of the same or different materials. Examples of materials include metallic materials (e.g., metals and alloys) and ceramic materials. For example, ceramic materials offer the advantage of being non-corrosive to some of the chemicals used to process the substrate, while metallic materials can be used in high-temperature applications.

[0115] Examples of substrate processing systems Figure 1 shows an example of a substrate processing system 100 that can use a faceless showerhead with baffles as described above and further described below with reference to Figures 2 to 16. The substrate processing system 100 comprises a station (also called a process module or processing chamber) 112 on which substrates are processed. Although only one station 112 is shown as an example, the substrate processing system 100 may comprise multiple stations 112. Each station 112 can use the faceless showerhead with baffles of the Disclosure. For example, substrates may be processed sequentially in the stations 112. Using the faceless showerhead with baffles of the Disclosure, different processes such as atomic layer deposition (ALD), chemical vapor deposition (CVD), plasma-enhanced ALD (PEALD), plasma-enhanced CVD (PECVD), and thermal ALD (T-ALD) can be performed on substrates at different stations.

[0116] Station 112 comprises a pedestal (also called a substrate support) 114 and a shower head 116. The pedestal 114 comprises a base portion (also called a base plate) 118 and a stem portion 120. The stem portion 120 extends from the base portion 118 and is coupled to the bottom of station 112. During processing, the substrate 124 is placed on the upper surface of the base portion 118 of the pedestal 114.

[0117] The substrate 124 can be clamped to the upper surface of the base portion 118 of the pedestal 114 using a clamping mechanism such as a vacuum clamp. Alternatively, although not shown, the pedestal 114 may be equipped with another type of clamping mechanism. For example, the pedestal 114 may be equipped with an electrostatic chuck (ESC). The ESC may be located on the base portion 118 of the pedestal 114. The ESC comprises clamp electrodes located close to the upper surface of the base portion 118 of the pedestal 114. The clamp electrodes electrostatically clamp the substrate 124 to the upper surface of the base portion 118 of the pedestal 114. Other examples of clamping mechanisms include mechanical clamps, mesas (small contact areas or MCAs) located on the upper surface of the base portion 118 of the pedestal 114, etc. In some processes (e.g., ALD), regardless of the clamping method used, the pedestal 114 with the substrate 124 can be moved by an actuator 121 near the bottom of the showerhead 116.

[0118] The shower head 116 will be described in detail below with reference to Figures 2 to 16. Briefly, the shower head 116 comprises a base portion (also called a base plate) 126 and a stem portion (or stem) 128. The base plate 126 of the shower head 116 is substantially cylindrical. The diameter of the base plate 126 of the shower head 116 is greater than or equal to the diameter of the substrate 124. The stem 128 of the shower head 116 is also substantially cylindrical. The stem 128 of the shower head 116 has a smaller diameter than the base plate 126 of the shower head 116. The stem 128 of the shower head 116 extends from the base plate 126 of the shower head 116. The stem 128 of the shower head 116 is attached to the upper plate of the station 112. Although the shower head 116 is shown as a chandelier-type shower head with a stem 128 attached to the top plate of station 112, the shower head 116 can be any other type (for example, flush-mounted to the top plate of station 112).

[0119] The stem 128 of the showerhead 116 receives various gases (e.g., process gas, vaporized precursor, purge gas, cleaning gas, etc.) from the gas delivery system 150 via the manifold 152. The base plate 126 of the showerhead 116 does not have a faceplate with through holes or slots (not shown) through which the gas is introduced to the station 112. Instead, the base plate 126 of the showerhead 116 has a baffle 127 with a much smaller diameter than the base plate 126 (see dimensions below). Thus, the diameter of the baffle 127 is also much smaller than the substrate 124 (see dimensions below). The baffle 127 comprises a double separation plenum and various holes through which the gas is introduced to the station 112. The showerhead 116 and baffle 127 are described in detail below with reference to Figures 2 to 16.

[0120] The substrate processing system 100 includes a gas delivery system 150. The gas delivery system 150 includes a gas source 154, a valve 156, and a mass flow controller (MFC) 158. The gas source 154 supplies various gases, such as process gas, inert gas (also called purge gas, edge gas, or carrier gas), and cleaning gas. The valve 156 is connected to the gas supply source 154 and the MFC 158. The valve 156 can be controlled to supply gas from the gas source 154 to the MFC 158. The MFC 158 regulates the flow of gas to the manifold 152. The gas is supplied to the showerhead 116 and baffle 127 through the manifold 152, as will be described in more detail below with reference to Figures 2 to 16.

[0121] Furthermore, in some applications, the substrate processing system 100 includes a separate delivery system configured to deliver the vaporized precursor through respective valves, collectively shown as the vaporized precursor and valve 151. The vaporized precursor and valve 151 deliver the vaporized precursor to a manifold 152. The manifold 152 supplies the gas or gas mixture from the gas delivery system 150 and / or the vaporized precursor from the vaporized precursor and valve 151 to the showerhead 116. Thus, the gas delivery system 150 and the vaporized precursor and valve 151 can supply different chemical species to the showerhead 116 and baffle 127, as will be further described below with reference to Figures 2 to 16.

[0122] The substrate processing system 100 further comprises a radio frequency (RF) power supply 160. In some processes, where plasma is used, the RF power supply 160 supplies RF power to the showerhead 116 during processing of the substrate 124 and during cleaning of the station 112 with the pedestal 114 grounded or floating. Although not shown, in some applications, the RF power supply 160 supplies RF power to the pedestal 114 during processing of the substrate 124 and during cleaning of the station 112 with the showerhead 116 grounded or floating. The RF power excites a gas (e.g., process gas, vaporized precursor, cleaning gas, etc.) introduced into the station 112 through the showerhead 116 and baffle 127 to generate plasma between the showerhead 116 and the pedestal 114. The plasma can be used to process the substrate 124 and to clean various components within the station 112 (e.g., the pedestal 114, the side walls of the station 112, etc.).

[0123] The base portion 118 of the pedestal 114 includes a heater 162. The heater 162 heats the base portion 118 of the pedestal 114, thereby heating the substrate 124. The base portion 118 of the pedestal 114 includes a temperature sensor 164 for detecting the temperature of the pedestal 114. Although not shown, the base plate 126 of the shower head 116 may also include a heater for heating the gas, gas mixture, and / or vaporized precursor introduced into the station 112 via the shower head 116. Furthermore, the base plate 126 of the shower head 116 may also include a temperature sensor 168 for sensing the temperature of the shower head 116.

[0124] The substrate processing system 100 further comprises a vacuum pump 172 and a valve 170. When a vacuum clamp is used to clamp the substrate 124 to the pedestal 114, the vacuum pump 172 creates a vacuum on the top surface of the pedestal 114. The vacuum pump 172 also discharges gases and reactants from the station 112. The vacuum pump 172 also maintains pressure (e.g., vacuum) inside the station 112 during the processing of the substrate 124.

[0125] The substrate processing system 110 further comprises a controller 180. The controller 180 controls valves 156, 170, MFC 158, heaters in the pedestal 114 and shower head 116, actuator 121, RF power supply 160, and vacuum pump 172. The controller 180 monitors the temperature of the pedestal 114 and shower head 116 using temperature sensors 164, 168 in the pedestal 114 and shower head 116. The controller 180 controls the temperature of the pedestal 114 and shower head 116 by controlling the heaters in the pedestal 114 and shower head 116. Furthermore, although not shown, the substrate processing system 100 may also comprise a cooling system that supplies coolant to cooling channels in the pedestal 114 and shower head 116. The controller 180 controls the temperature of the pedestal 114 and shower head 116 by controlling the supply of coolant to the cooling channels in the pedestal 114 and shower head 116.

[0126] Examples of shower heads Figures 2 to 5 show various diagrams of an example of a shower head 116 according to this disclosure. Figures 6 to 9 show various diagrams of examples of different components (elements) of the shower head 116. Figures 10A to 16 show an example of a baffle 127 of the shower head 116 in more detail. Hereinafter, the shower head 116 and the baffle 127 will be described in more detail with reference to Figures 2 to 16.

[0127] Referring to Figures 2 to 4, Figure 2 shows a perspective view of the shower head 116. Figure 3 shows a side view of the shower head 116. Figure 4 shows a bottom view of the shower head 116. In Figures 2 and 3, the shower head 116 comprises a base plate 126 and a stem 128 extending vertically upward (along the z-axis) from the base plate 126. The base plate 126 and the stem 128 are substantially cylindrical. The stem 128 has a smaller diameter than the base plate 126. The base plate 126 is shown and described in more detail below with reference to Figures 5 and 6. The stem 128 comprises a shell 190 and a tube 192, both of which are shown and described in more detail below with reference to Figures 7A to 9.

[0128] In Figures 2 and 3, broadly speaking, the stem 128 is connected to the upper surface of the base plate 126. The stem 128 comprises a base portion 200 and a vertical portion 202, which form (define) the shell 190. The stem 128 further comprises a tube 192. The base portion 200 is coupled to the central region of the upper surface of the base plate 126. The vertical portion 202 of the stem 128 extends vertically upward (along the z-axis) from the base portion 200 of the stem 128. Gas is supplied to the shower head 116 via the tube 192 and the inlet 194. The gas received through the tube 192 and the inlet 194 is supplied to the station 112 through a separate plenum (see Figure 5) in the baffle 127, as will be described in detail later.

[0129] Figure 3 shows a side view of the shower head 116. The upper surface of the base plate 126 has, for example, the following shape: The upper surface of the base plate 126 extends vertically upward by a first distance (along the z axis) from the outer diameter (OD) of the lower surface of the base plate 126. After the first distance, the upper surface of the base plate 126 extends radially inward (along the x axis) by a second distance at a certain angle with respect to the lower surface of the base plate 126 (i.e., with respect to the x axis). After the second distance, the upper surface of the base plate 126 extends radially inward (along the x axis) parallel to the lower surface of the base plate 126 over a third distance toward the stem 128.

[0130] Figure 4 shows a bottom view of the shower head 116. The underside of the base plate 126 has an opening 204 at the center of the underside of the base plate 126. The baffle 127 is positioned in the opening 204 of the base plate 126. The baffle 127 extends into the base plate 126 (along the z-axis) through the opening 204, as will be described in more detail below with reference to Figures 5 and 6. The diameters of the underside of the opening 204 and the baffle 127 as seen in the bottom view of the shower head 116 are much smaller than the diameter of the base plate 126 (e.g., less than half). The base plate 126 does not have a hole between the outer diameter ("OD") of the opening 204 and the OD of the base plate 126 through which gas can be supplied to the station 112.

[0131] The lower surface of the baffle 127 lies in a plane parallel to the lower surface of the base plate 126. For example, the lower surface of the baffle 127 may be coplanar with the lower surface of the base plate 126. In some examples, the lower surface of the baffle 127 may be recessed or shifted upward from the opening 204 along the z-axis. The lower surface of the baffle 127 comprises at least a first set of holes and a second set of holes. At least the first and second sets of holes are generally indicated as 212, 210 on the lower surface of the baffle 127 as seen in Figure 4. The layout and geometric arrangement of the first and second sets of holes 212, 210 are shown and described below in detail with reference to Figure 15.

[0132] The first and second sets of holes 212 and 210 are in fluid communication with the inner and outer plenums of the showerhead 116, respectively, and are shown and described in more detail below with reference to Figures 5 to 16. The first and second sets of holes 212 and 210 are not in fluid communication with each other. The baffle 127 has various additional holes, which are shown as the third, fourth, and fifth sets of holes in Figures 10A to 16 as 262, 264, and 260, respectively. These holes in the baffle 127 are shown and described in more detail below with reference to Figures 10A to 16.

[0133] Figure 5 shows a cross-sectional view of the shower head 116. The shower head 116 comprises a base plate 126, a baffle 127, and a stem 128. The baffle 127 is shown and described in detail with reference to Figures 10A to 16. Therefore, when describing some elements (features) of the baffle 127, Figures 10A to 16 will also be referenced as necessary.

[0134] The stem 128 comprises a shell 190 and a tube 192. The base plate 126, shell 190, and tube 192 are shown and described in detail with reference to Figures 6 to 9. Therefore, when describing some elements (features) of the base plate 126, shell 190, and tube 192, Figures 6 to 9 will also be referenced as necessary.

[0135] Generally, as will be described in detail below, the shell 190 and tube 192 are concentric cylindrical components around the axis of the shower head 116, with the shell 190 surrounding the tube 192. Thus, the tube 192 can also generally be called the stem 128 or the first component or inner component of the shower head 116, and the shell 190 can also generally be called the stem 128 or the second component or outer component 190 of the shower head 116.

[0136] The shell 190 comprises a base portion 200 and a vertical portion 202. The vertical portion 202 of the shell 190 extends vertically upward (along the z-axis) from the central region of the base portion 200 of the shell 190. The base portion 200 and the vertical portion 202 of the shell 190 are cylindrical. The vertical portion 202 of the shell 190 has a smaller diameter than the base portion 200 of the shell 190.

[0137] Tube 192 also comprises a base portion 220 and a vertical portion 222. The vertical portion 222 of tube 192 extends vertically upward (along the z-axis) from the central region of the base portion 220 of tube 192. Both the base portion 220 and the vertical portion 222 of tube 192 are cylindrical. The vertical portion 222 of tube 192 has a smaller diameter than the base portion 220 of tube 192.

[0138] The shell 190 is a single, integrated, single component. The tube 192 is also a single, integrated, single component. The base plate 126, shell 190, and tube 192 can be separate elements that can be connected to each other using fasteners or diffuse-bonded to each other. Alternatively, the base plate 126, shell 190, and tube 192 can be manufactured as a single, integrated, single component.

[0139] The base plate 126 has a cylindrical slot 230 formed through the upper surface of the base plate 126. The slot 230 extends approximately halfway vertically (along the Z-axis) through the base plate 126. The slot 230 does not extend through the lower surface of the base plate 126. The base portion 220 of the tube 192 is positioned within the slot 230. The base portion 220 of the tube 192 has the same diameter as the slot 230. The height (thickness) (measured along the z-axis) of the base portion 220 of the tube 192 is less than the depth (also measured along the z-axis) of the slot 230.

[0140] The base portion 200 of the shell 190 is positioned within the slot 230 on top of the base portion 220 of the tube 192. The base portion 200 of the shell 190 has the same diameter as the base portion 220 of the tube 192. The base portion 200 of the shell 190 has the same diameter as the slot 230.

[0141] The height (thickness) (measured along the z-axis) of the base portion 200 of the shell 190 is less than the depth of the slot 230. The height of the base portion 200 of the shell 190 is less than the height of the base portion 220 of the tube 192. As will be described in detail later, the height of the base portion 220 of the tube 192 is greater than the height of the base portion 200 of the shell 190, and the connecting plate 240 of the baffle 127 is housed within the base portion 220 of the tube 192. The sum of the heights of the base portion 200 of the shell 190 and the base portion 220 of the tube 192 is equal to the depth of the slot 230.

[0142] The upper surface of the base portion 200 of the shell 190 forms (defines) the upper surface of the base plate 126. The diameters of the equal slot 230, the base portion 220 of the tube 192, and the base portion 200 of the shell 190 are greater than the diameter of the opening 204, greater than the diameter of the connecting plate 240 of the baffle 127, and smaller than the diameter of the base plate 126.

[0143] The height of the vertical portion 222 of tube 192 (measured along the z-axis) from the base portion 220 of tube 192 is lower than the height of the vertical portion 202 of shell 190 (measured along the z-axis) from the base portion 200 of shell 190. The outer diameter (OD) of the vertical portion 202 of shell 190 is greater than the OD of the vertical portion 222 of tube. The vertical portion 222 of tube 192 is hollow in the center, extending from the upper end of the vertical portion of tube 192 through it to the bottom end of the base portion 220 of tube 192. The hollow portion of tube 192 is cylindrical.

[0144] The vertical portion 202 of the shell 190 is partially hollow in the center. The partially hollow portion of the shell 190 is also cylindrical. The partially hollow portion of the shell 190 extends through the bottom end of the base portion 200 of the shell 190. The partially hollow portion of the shell 190 does not extend through the upper end of the vertical portion 202 of the shell 190.

[0145] The height (measured along the z-axis) of the partially hollow portion of the vertical section 202 of the shell 190 is equal to the height of the vertical section 222 of the tube 192. The partially hollow portion of the shell 190 surrounds and encloses the vertical section 222 of the tube 192. Therefore, the vertical section 202 of the shell 190 surrounds and encloses the vertical section 222 of the tube 192. In general, the shell 190 partially surrounds and encloses the tube 192. In other words, in general, the shell 190 surrounds and encloses the vertical section 222 of the tube 192.

[0146] The inner diameter (ID) of the partially hollow portion of the vertical section 202 of the shell 190 is greater than the outer diameter (OD) of the vertical section 222 of the tube 192. The ID of the partially hollow portion of the vertical section 202 of the shell 190 and the OD of the vertical section 222 of the tube 192 define an annular volume 232. The inlet 194 is connected to the annular volume 232 by a channel (shown as 237 in Figure 7C) and an opening 236 in the vertical section 202 of the shell 190. The channel 237 is not visible in the figure shown in Figure 5, but is shown in Figures 7A to 7E. The opening 236 is located near the upper end of the partially hollow portion of the vertical section 202 of the shell 190, along the ID of the partially hollow portion of the vertical section 202 of the shell 190. The channel 237 extends from the opening 194 to the opening 236 in the vertical section 202 of the shell 190. Channel 237 and opening 236 are shown and described below in detail with reference to Figures 7A to 7E.

[0147] The vertical portion 222 of the tube 192 is provided with a groove 238 around the OD of the vertical portion 222 of the tube 192 near the upper end of the vertical portion 222 of the tube 192. For example, the groove 238 is in the same horizontal plane as the opening 236 along the x-axis. The groove 238 is circular around the entire circumference of the tube 192. The opening 236 may be around the entire shell 190 or in a portion of the shell 190. The groove 238 is in fluid communication with the annular volume 232.

[0148] The vertical portion 202 of the shell 190 also has a groove 239 around the ID of a partially hollow portion of the vertical portion 202 of the shell 190 near the lower end of the vertical portion 202 of the shell 190. The groove 239 is also in fluid communication with the annular volume 232. For example, the annular volume 232 can be adjusted to suit different applications by changing the inner diameter of the vertical portion 202 of the shell 190 and the outer diameter of the vertical portion 222 of the tube 192. Gas supplied from the inlet 194 flows into the annular volume 232 through the channel 237 and the opening 236. The groove 239 can be larger in size than the groove 238 and helps to ensure uniformity of the gas flow as the gas flows down through the annular volume 232 to the baffle 127. The grooves 238 and 239 are configured to adjust the direction and velocity of the gas.

[0149] The height of the vertical portion 222 of the tube 192 is lower than the height of the vertical portion 202 of the shell 190 (along the z axis). The upper end of the vertical portion 222 of the tube 192 is inside and below the upper end of the vertical portion 202 of the shell 190 (along the z axis). The upper end of the vertical portion 222 of the tube 192 extends radially inward (along the x axis), narrows in diameter, and extends vertically upward (along the z axis) to form a conduit 224. The vertical portion 202 of the shell 192 has an opening 225 (shown in Figure 7B) at the center of the vertical portion 202 of the shell 190. The conduit 224 extends through the opening 225.

[0150] The ID of conduit 224 is equal to the ID of the hollow portion of the vertical portion 222 of tube 192. Conduit 224 extends through the upper end of the vertical portion 202 of the base portion 200. Conduit 224 is in fluid communication with the hollow portion of tube 192. Conduit 224 is not in fluid communication with the annular volume 232 between tube 192 and shell 190. Gas supplied through conduit 224 flows through the hollow portion of tube 192 to the baffle 127, as will be described in detail below. Gas supplied through conduit 224 does not flow through the annular volume 232. Gas supplied through the annular volume 232 does not flow through conduit 224. The annular volume 232 is separated from conduit 224 and the hollow portion of tube 192.

[0151] The baffle 127 is described in detail below with reference to Figures 10A to 16. Briefly, the baffle 127 comprises a connecting plate 240, a stem 242, and a gas delivery plate 244. The connecting plate 240 connects the baffle 127 to the shower head 116, as will be described later. The connecting plate 240 is connected to the stem 242. The stem 242 is connected to the gas delivery plate 244. The connecting plate 240, the stem 242, and the gas delivery plate 244 can be separate elements that can be connected to each other using fasteners or diffuse-bonded to each other. Alternatively, the connecting plate 240, the stem 242, and the gas delivery plate 244 can be manufactured as a single, integrated component.

[0152] In some embodiments, the baffle 127 is connected to the shower head 116 as follows: The base portion 220 of the tube 192 includes a cylindrical slot 246 formed through the lower surface of the base portion 220 of the tube 192. The slot 246 extends approximately half or one-third vertically (along the Z-axis) through the base portion 220 of the tube 192. The slot 246 does not extend through the upper surface of the base portion 220 of the tube 192. The base portion 220 of the tube 192 includes an alignment pin 285 that engages with a corresponding hole 286 on the upper surface of the connecting plate 240 of the baffle 127. The alignment pin 285 and the hole 286 orient the baffle 127 as described in detail below.

[0153] The underside of the base plate 126 includes an opening 204 at the center of the base plate 126. The diameter of the slot 246 is greater than the diameter of the opening 204. The slot 230 of the base plate 126 and the slot 246 of the base portion 220 of the tube 192 are concentric with the opening 204. Therefore, when the base portion 220 of the tube 192 is placed in the slot 230, an annular ledge 207 is formed in the base plate 126 above the opening 204. In some examples, the diameter of the connecting plate 240 of the baffle 127 is greater than the diameter of the opening 204. The diameter of the connecting plate 240 of the baffle 127 is equal to the diameter of the slot 246. The height (measured along the z-axis) of the connecting plate 240 of the baffle 127 is equal to the depth (measured along the z-axis) of the slot 246. Therefore, when the connecting plate 240 of the baffle 127 is positioned within the base plate 126 of the shower head 116, passing through the opening 204, the outer lower edge of the connecting plate 240 of the baffle 127 rests on the annular ledge 207. The stem 242 and gas delivery plate 244 of the baffle 127 extend downward (along the z-axis) through the opening 204.

[0154] A gap 250 is maintained between the opening 204 of the base plate 126 and the bottom of the baffle 127. The size of the gap 250 (i.e., the width along the x-axis) can be changed according to application requirements by changing the ID of the opening 204 and / or the OD of the ring 294 of the baffle 127 (refer to and described below with reference to Figures 10A to 16). For example, the ratio of the OD of the ring 294 of the baffle 127 to the ID of the opening 204 can be 75% to 99%. The gap 250 provides radially outward flow to the edges of the substrate 124, improving process uniformity across the substrate 124. If the application does not require uniform deposition / etching across the substrate 124 and only requires processing of the central region of the substrate 124, the gap 250 can be completely eliminated. Furthermore, the diameter of the bottom surface of the baffle 127 can be 0.5% to 50% of the diameter of the bottom surface of the base plate 126. The diameter of the bottom surface of the baffle 127 is selected based on the diameter of the substrate 124 and the focal area of ​​uniformity on the substrate 124. The size of the bottom surface of the baffle 127 is configured to be within 50% of the bottom surface of the base plate 126 so that the gas delivery velocity at the edge of the baffle 127 is more uniform than the gas delivery velocity around the center of the baffle 127. The edge of the bottom surface of the base plate 126 at the opening 204 may be rounded, as shown in 205 of Figure 5. The rounded edge of the bottom surface of the base plate 126 at the opening 204 facilitates gas flow through the gap 250 radially outward toward the outer diameter (OD) of the bottom surface of the base plate 126.

[0155] The gas delivery plate 244 has a larger diameter than the stem 242. The connecting plate 240 has a larger diameter than the gas delivery plate 244. The gas delivery plate 244 has a smaller diameter than the opening 204. Therefore, a gap 250 exists between the gas delivery plate 244 and the opening 204. The annular volume 252 is defined around the stem 242 by the connecting plate 240 and the gas delivery plate 244. The annular volume 252 is in fluid communication with the gap 250.

[0156] The lower surface of the gas delivery plate 244 is in the same plane as the lower surface of the base plate 126. In some examples, the lower surface of the gas delivery plate 244 is coplanar and at the same height as the lower surface of the base plate 126. In other examples, the lower surface of the gas delivery plate 244 is slightly recessed or shifted vertically upward (in the z-axis direction) relative to the lower surface of the base plate 126.

[0157] In some examples, at least one of the connecting plate 240, stem 242, and gas delivery plate 244 may have a different shape from the others of the connecting plate 240, stem 242, and gas delivery plate 244. For example, any of the connecting plate 240, stem 242, and gas delivery plate 244 may be square, rectangular, hexagonal, octagonal, circular, cylindrical, or any other polygon. In some examples, at least one of the connecting plate 240, stem 242, and gas delivery plate 244 may have a different size (e.g., dimensions measured along the x-axis and / or z-axis) from the others of the connecting plate 240, stem 242, and gas delivery plate 244. For example, the size may include any dimensions defining area and volume. The slot 246 in the base portion 220 of the tube 192 may have a shape and size corresponding to the shape and size of the connecting plate 240. Any combination of shape and size can be used to mount the connecting plate 240, stem 242, and gas delivery plate 244.

[0158] The baffle 127 may be connected to the shower head 116 using fasteners, or they may be diffusion-bonded to each other. For example, the connecting plate 240 may be fastened or diffusion-bonded to the base plate 126 and slot 246 in the annular ledge 207. Alternatively, the baffle 127 and the shower head 116 may be manufactured as a single, integrated component.

[0159] The baffle 127 comprises several different holes, which are described throughout this disclosure as the first to fifth sets of holes. The first to fifth sets of holes are shown as 212, 210, 262, 264, and 260 in Figures 5 and 10 to 16, respectively. Some holes are not visible in the diagram shown in Figure 5 and are shown and described in detail below with reference to Figures 10A to 16, but these holes are briefly described below so as to illustrate the gas flow path through the showerhead 116 and the baffle 127 with reference to Figure 5. Furthermore, although the holes in each set of holes are shown as circular throughout this disclosure, the holes in each set of holes do not have to be circular and can have other polygonal shapes. Furthermore, the ends of these holes from which the gas exits can be flared. For example, the ends of a circular hole can be conical, and for each hole, the radius of the conical end is greater than the radius of the hole. The flared ends of the holes help to properly distribute the gases exiting the holes and also prevent clogging and cleaning of the holes.

[0160] The gas delivery plate 244 is shown and described in more detail with reference to Figures 10A to 16. Briefly, the gas delivery plate 244 has at least two sets of holes, generally indicated as 212 and 210, on the underside of the baffle 127 shown in Figure 4. Of the two sets of holes 212 and 210, only the first set of holes 212 is shown in Figure 5. The second set of holes 210 is not visible in Figure 5 but is shown in Figures 10A to 16. The second set of holes 210 extends through the gas delivery plate 244 (see Figures 10A to 16). The second set of holes 210 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and with the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126 (see Figures 10A to 16). Furthermore, the gas delivery plate 244 has a third set of holes, indicated as 262 in Figures 10A to 16, although it is not visible in the diagram shown in Figure 5. The third set of holes 262 contains fewer holes than the first and second sets of holes 212 and 210, with reference to Figures 10A to 16. In some embodiments, the first and second sets of holes 212 and 210 have the same diameter when measured from the bottom side of the baffle 127, while the third set of holes 262 has a smaller diameter.

[0161] The stem 242 of the baffle 127, not visible in the diagram shown in Figure 5, further comprises a fourth set of holes, indicated by 264 in Figures 10A to 16, which will be described in detail below with reference to Figures 10A to 16. As described later, the fourth set of holes 264 extends radially inward and downward from the stem 242, at an angle to the lower surface of the gas delivery plate 244, and through it, to the third set of holes 262 on the lower surface of the gas delivery plate 244. As illustrated and described below, each of the third and fourth sets of holes 262, 264 is a single angled (inclined) continuous hole. The third and fourth sets of holes 262, 264 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and with the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126.

[0162] The gas delivery plate 244 is provided with a fifth set of holes 260. As will be described in detail below with reference to Figure 14, the fifth set of holes 260 are arranged laterally (along the x-axis) through the frustoconical portion of the gas delivery plate 244 shown in Figures 10A to 16. The first set of holes 212 extends from the lower surface of the gas delivery plate 244 to the fifth set of holes 260, as shown in Figures 5 and 10A to 16. According to some embodiments, the first and fifth sets of holes 212, 260 are in fluid communication with each other. The first and fifth sets of holes 212, 260 are not in fluid communication with the second, third, and fourth sets of holes 210, 262, 264, the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126.

[0163] The connecting plate 240 and the stem 242 of the baffle 127 are hollow in the center. In some examples, the hollow portions of the connecting plate 240 and the stem 242 have the same diameter as the hollow portion of the vertical section 222 of the tube 192. In some examples, the hollow portion of the connecting plate 240 has a larger or smaller diameter compared to the hollow portion of the vertical section 222. The hollow portions of the connecting plate 240 and the stem 242 of the baffle 127, as well as the hollow portion of the vertical section 222 of the tube 192, are concentric.

[0164] The connecting plate 240 of the baffle 127 has an opening 245 (shown in Figures 10A to 16) at the center of the upper surface of the connecting plate 240 that connects to the stem 242 of the baffle 127. The opening 245 at the center of the upper surface of the connecting plate 240 is concentric with the hollow portion of the connecting plate 240 and stem 242 of the baffle 127. The opening 245 at the center of the upper surface of the connecting plate 240 is also concentric with the hollow portion of the vertical portion 222 of the tube 192. In some examples, the diameter of the opening 245 on the upper surface of the connecting plate 240 is the same as the diameter of the hollow portion of the connecting plate 240 and stem 242 of the baffle 127. The diameter of the opening 245 on the upper surface of the connecting plate 240 is also equal to the diameter of the hollow portion of the vertical portion 222 of the tube 192. In some examples, the above-mentioned portions have different diameters.

[0165] The opening 245 in the center of the upper surface of the connecting plate 240, as well as the hollow portions of the connecting plate 240 and the stem 242, extend only partway, or less than halfway, into the passage into the gas delivery plate 244. The hollow portions of the connecting plate 240, the stem 242, and the vertical portion 222 of the tube 192 are in fluid communication with the fifth set of holes 260. As a result, the conduit 224 of the tube 192 of the showerhead 116 is in fluid communication with the fifth set of holes 260 of the baffle 127.

[0166] Therefore, the conduit 224, the hollow portion of the vertical section 222 of the tube 192, the connecting plate 240, the stem 242, and the hollow portions of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 are in fluid communication with one another. The conduit 224, the hollow portion of the vertical section 222 of the tube 192, the connecting plate 240, the stem 242, and the hollow portions of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 form (define) an internal flow path for the gas supplied to the shower head 116 through the conduit 224. The internal flow path may also be called the internal plenum of the shower head 116.

[0167] The hollow portion of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 form (define) the inner plenum of the baffle 127. The inner flow path of the showerhead 116 is in fluid communication with the inner plenum of the baffle 127. The inner flow path is separated from and does not have fluid communication with the second, third, and fourth sets of holes 210, 262, and 264, the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126.

[0168] Multiple rectangular holes 270 are located near the lower end of the vertical portion 222 of the tube 192. The rectangular holes 270 are positioned radially opposite to the groove 239 of the shell 190 along the x-axis. The rectangular holes 270 are in fluid communication with the annular volume 232 between the vertical portion 202 of the shell 190 and the vertical portion 222 of the tube 192. The rectangular holes 270 extend radially inward and downward from the lower end edge of the vertical portion 222 of the tube 192 at an angle with respect to the z-axis. The rectangular holes 270 penetrate the base portion 220 of the tube 192 and extend to the slot 246 of the base portion 220 of the tube 192.

[0169] The connecting plate 240 of the baffle 127 is provided with a number of arc-shaped slots (collectively referred to as arc-shaped slots 272) as shown in Figures 10A-10B and 12, 272-1, 272-2, and 272-3. The arc-shaped slots 272 are shown and described in detail below with reference to Figure 12. In the diagram shown in Figure 5, only two arc-shaped slots 272-1 and 272-2 are visible. The arc-shaped slots 272 extend through the connecting plate 240 of the baffle 127 along the z-axis. The arc-shaped slots 272 are positioned around the central hollow portion of the connecting plate 240 of the baffle 127. The arc-shaped slots 272 are located along a circle having a diameter larger than the diameter of the stem 242 of the baffle 127. Thus, the arc-shaped slots 272 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. Furthermore, the arc-shaped slot 272 is in fluid communication with the second, third, and fourth sets of holes 210, 262, and 264 of the gas delivery plate 244 of the baffle 127.

[0170] The arc length and radial width of the arched slot 272 are configured to guide the gas flow at an appropriate velocity into the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. The shape of the arched slot 272 is roughly consistent with the overall shape of the baffle 127, which is cylindrical in the illustrated example. Alternatively, the shape of the slot 272 could be square or rectangular to match the corresponding overall shape of the baffle 127, instead of the baffle 127 being square or rectangular, which can be manufactured using additive manufacturing techniques (e.g., 3D printing). The shape of the slot 272 must match the overall shape of the baffle 127 in order to provide a consistent and uniform gas flow through the baffle 127.

[0171] The rectangular holes 270 are grouped around the lower end rim of the vertical portion 222 of the tube 192, depending on the position of the arched slots 272 in the connecting plate 240 of the baffle 127. The rectangular holes 270 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. Therefore, the inlet 194, channel 237, and opening 236 of the vertical portion 202 of the shell 190, the groove 238 of the vertical portion 222 of the tube, the annular volume 232 between the vertical portion 202 of the shell 190 and the vertical portion 222 of the tube 192, the groove 239 of the vertical portion 202 of the shell 190, the square hole 270, the arched slot 272, the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas delivery plate 244, the second, third, and fourth sets of holes 210, 262, 264 of the gas delivery plate 244 of the baffle 127, and the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126 form (define) an outer flow path for the gas supplied to the shower head 116 through the inlet 194. The outer flow path may also be called the outer plenum of the shower head 116. The outer flow path is separate from the inner flow path and is not in fluid communication with the inner flow path. In other words, the outer plenum of the showerhead 116 is not in fluid communication with the inner plenum of the showerhead 116.

[0172] The arc-shaped slots 272 in the connecting plate 240 of baffle 127, and the second, third, and fourth sets of holes 210, 262, 264 in the gas delivery plate 244 of baffle 127, form (define) the outer plenum of baffle 127. The outer flow path of showerhead 116 is in fluid communication with the outer plenum of baffle 127. The outer plenum of baffle 127 is separated from the inner plenum of baffle 127 and is not in fluid communication with it. Therefore, the inner and outer flow paths (i.e., the inner plenum and the outer plenum) of showerhead 116 and baffle 127 are separated from each other (i.e., are not in fluid communication). Thus, the gases flowing through the inner and outer flow paths (i.e., the inner plenum and the outer plenum) of showerhead 116 and baffle 127 do not mix within showerhead 116 and baffle 127.

[0173] For convenience, the inner flow path and inner plenum of the showerhead 116 and baffle 127 can be referred to as the first flow path and first plenum of the showerhead 116 and baffle 127, respectively. The outer flow path and outer plenum of the showerhead 116 and baffle 127 can be referred to as the second flow path and second plenum of the showerhead 116 and baffle 127, respectively. The first gas supplied to the showerhead 116 through conduit 224 flows through the first flow path and first plenum of the showerhead 116 and baffle 127. The second gas supplied to the showerhead 116 through inlet 194 flows through the second flow path and second plenum of the showerhead 116 and baffle 127. The first gas does not mix with the second gas within the showerhead 116 and baffle 127. In some examples, the first gas and the second gas may be the same. For example, the same gas can be supplied simultaneously, sequentially, or otherwise through the first and second plenums.

[0174] Examples of showerhead components Figures 6 to 9 show examples and various diagrams of the base plate 126, shell 190, and tube 192 of the shower head 116. Figure 6 shows the base plate 126. Figures 7A to 7E show the shell 190. Figures 8 and 9 show the tube 192. The baffle 127 of the shower head 116 is shown and described in detail with reference to Figures 10A to 16.

[0175] Figure 6 shows a top perspective view of the base plate 126. The bottom surface of the base plate 126 has an opening 204 in which the baffle 127 is placed within the shower head 116, as described above. The top surface of the base plate 126 has a slot 230. The base portions 220 and 200 of the tube 192 and shell 190 are placed within the slot 230, as described above. If the base plate 126, shell 190 and tube 192 are manufactured as separate components, the base plate 126 has a circular groove 280 in the slot 230. The circular groove 280 surrounds the opening 204. A sealing element (e.g., an O-ring) is placed within the circular groove 280 to seal the bottom of the base portion 220 of the tube 192 against the slot 230. The circular groove 280 is unnecessary and can be removed if the shower head 116 (e.g., base plate 126, shell 190, and tube 192) is manufactured as a single, integrated, one-piece component (e.g., using additive manufacturing techniques such as 3D printing).

[0176] Figures 7A to 7E show various views of the shell 190. Figure 7A shows a side view of the shell 190, showing the base portion 200 and the vertical portion 202 of the shell 190. The side view also shows the arched member 284 (shown in Figure 7E) that covers the opening 236 of the vertical portion 202 of the shell 190. A cross-section along line AA is shown in Figure 7C, which will be discussed later.

[0177] Figure 7B shows a top view of the shell 190 showing the inlet 194 and opening 225. A cross section along line BB is shown later in Figure 7D. Figure 7C shows the inlet 194, opening 236, and groove 239 of the vertical portion 202 of the shell 190. Figure 7C also shows the channel 237 of the vertical portion 202 of the shell 190 connecting the inlet 194 to the opening 236.

[0178] Figure 7D shows the opening 225, inlet 194, and channel 237 in the vertical portion 202 of the shell 190. Figure 7D also shows the opening 282 in the side wall of the vertical portion 202 of the shell 190. The opening 282 provides access to form the channel 237 in the vertical portion 202 of the shell 190. The opening 282 is closed by the arched member 284 shown in Figure 7E after the channel 237 has been formed. The opening 282 and the arched member 284 are not required and can be omitted if the showerhead 116 (e.g., base plate 126, shell 190, and tube 192) is manufactured as a single, integrated component (e.g., using 3D printing).

[0179] Figures 8 and 9 show various views of the tube 192. Figure 8 shows a side view of the tube 192, showing the conduit 224, the base portion 220 with a slot 246, and the vertical portion 222 with a square hole 270 around the edge of the vertical portion 222. Figure 8 also shows an alignment pin 285 in the slot 246 that engages with a hole 286 on the upper surface of the connecting plate 240 of the baffle 127 to orient the baffle 127, with the other end of the square hole 270 in the slot 246 aligning with the curved slot 272 of the connecting plate 240 of the baffle 127.

[0180] In some examples, the alignment pin 285 can be located on the upper surface of the connecting plate 240 of the baffle 127, and the hole 286 can be located in the slot 246 of the base portion 220 of the tube 192. Furthermore, if the shower head 116 and the baffle 127 are manufactured as a single, integrated structure (e.g., using 3D printing), the alignment pin 285 and the hole 286 can be omitted.

[0181] Figure 9 shows a bottom view of tube 192, showing the slot 246 of the base portion 220 of tube 192, which has a square hole 270 at the other end of the slot 246, located at the edge of the vertical portion 222 of tube 192. Figure 9 also shows the square holes 270 arranged in a group so that the other end of the square hole 270 in the slot 246 aligns with the curved slot 272 of the connecting plate 240 of baffle 127. The other end of the square hole 270 in the slot 246 of the base portion 220 of tube 192 engages with the curved slot 272 of the connecting plate 240 of baffle 127.

[0182] Example of a baffle Figures 10A to 16 show the baffle 127 in detail. Figures 10A to 10C show different perspective views of the baffle 127. Figures 11A and 11B show a side view of the baffle 127. Figures 12 and 15 show the top and bottom views of the baffle 127, respectively. Figures 13, 14, and 16 show different cross-sectional views of the baffle 127.

[0183] Figure 10A shows a top perspective view of baffle 127. Figure 10B shows a side perspective view of baffle 127. Figure 10C shows a bottom perspective view of baffle 127. Elements (features) of baffle 127 identified by the same reference number and already described above will not be described again for the sake of brevity.

[0184] In Figures 10A and 10B, the baffle 127 comprises the connecting plate 240, stem 242, and gas delivery plate 244 described above with reference to Figure 5. The connecting plate 240, stem 242, and gas delivery plate 244 are cylindrical and have different diameters. For example, the diameter of the stem 242 is smaller than the diameter of the gas delivery plate 244, and the diameter of the gas delivery plate is smaller than the diameter of the connecting plate 240. The stem 242 is not visible in Figures 10A to 10C, but is visible in Figures 11A, 11B, 13, and 16. The gas delivery plate 244 comprises a plate 290, a frustoconical portion 292 (visible in Figure 10C), and a ring 294. The plate 290 and ring 294 have the same outer diameter. The connecting plate 240, stem 242, and gas delivery plate 244 also have different thicknesses (heights) measured along the z-axis. For example, the thickness of the stem 242 is less than the thickness of the connecting plate 240, and the thickness of the gas delivery plate 244 is less than the thickness of the stem 242.

[0185] Although the plate 290, the frustoconical portion 292, and the ring 294 are shown and described as separate components of the gas delivery plate 244, the gas delivery plate 244 is a single, integrated, single component. Furthermore, although the baffle 127 is described as comprising a connecting plate 240, a stem 242, and the gas delivery plate 244, the baffle 127 can be manufactured as a single, integrated, single component (for example, using additive manufacturing techniques such as 3D printing).

[0186] The upper surface of the connecting plate 240 includes an opening 245, a curved slot 272, a hole 286 for engaging with the alignment pin 285, and a second set of holes 210, all of which have already been described with reference to Figure 5. The upper surface of the connecting plate 240 includes an annular groove 247 surrounding the opening 245 and enclosed by the curved slot 272. A sealing element (e.g., an O-ring) is placed in the annular groove 247 to seal the upper surface of the connecting plate 240 to the bottom of the base portion 220 of the tube 192. The annular groove 247 is not necessary and can be omitted when the baffle 127 is diffusion-bonded to the bottom of the base portion 220 of the tube 192, or when the showerhead 116 (e.g., base plate 126, shell 190, and tube 192) and the baffle 127 are manufactured as a single integrated single component (e.g., using 3D printing).

[0187] Figure 10C shows another perspective view of baffle 127 with baffle 127 in the inverted (downward-upward) position. The frustoconical portion 292 and ring 294 of the gas delivery plate 244 are shown in detail. The first end of the frustoconical portion 292 (i.e., the upper end when baffle 127 is installed on the shower head 116) has a smaller diameter than the second end of the frustoconical portion 292 (i.e., the lower end when baffle 127 is installed on the shower head 116). The upper end of the frustoconical portion 292 is connected to the bottom of plate 290, which is more clearly seen in Figures 11A, 13, and 16. The lower end of the frustoconical portion 292 defines the bottom of baffle 127. The lower end of the frustoconical portion 292 is provided with the first, second, and third sets of holes 212, 210, and 262 described above with reference to Figure 5. The fifth set of holes 260, located around the edge of the frustoconical portion 292, are formed in the frustoconical portion 292 as described below with reference to Figure 14.

[0188] When the baffle 127 is installed inside the showerhead 116, the ring 294 extends vertically downward from the outer diameter (OD) of the plate 290. The OD of the ring 294 is the same as the OD of the plate 290. The ring 294 surrounds the frustoconical portion 292, as is clearly seen in Figures 11A and 11B. The inner portion of the ring 294 expands radially outward parallel to the outer portion or circumference of the frustoconical portion 292, and the frustoconical portion also expands radially outward (see Figures 11A, 13, and 16). The circumference of the frustoconical portion 292 and the inner portion of the ring 294 define a gap 296 between the frustoconical portion 292 and the ring 294. The gas flowing through the fifth set of holes 260 flows through the gap 296 and is directed downward toward the substrate 124 (shown in Figure 1) (Figure 10C shows the baffle 127 in an inverted or upside-down position). For example, the size of the gap 296 (i.e., width along the x-axis) can be changed by changing the ID of the ring 294 and / or the OD of the bottom of the frustoconical portion 292. Depending on the application, the gap 296 can be reduced or increased to restrict or increase the gas flow from the fifth set of holes 260 and the gap 296 toward the substrate 124. Thus, the fifth set of holes 260 form the inner plenum of the baffle 127, and the fifth set of holes 260 and the gap 296, together with the frustoconical portion 292 and the tapered portion of the ring 294, direct the gas flowing through the inner plenum of the baffle 127 downward toward the substrate 124.

[0189] In the example of the baffle 127 shown in Figures 10A to 16, a frustoconical portion 292 is shown, with a first end having a smaller diameter connected to a connecting plate 290. However, in other examples, a second end of the frustoconical portion 292 having a larger diameter can instead be connected to the connecting plate 290. In such a design, the inner portion of the ring 294 tapers radially inward parallel to the outer portion or circumference of the frustoconical portion 292. In yet another example, the element 292 may be cylindrical instead of frustoconical, in which case the ring 294 is also cylindrical or annular, and the inner portion of the ring 294 is perpendicular (i.e., parallel to the z-axis and parallel to the outer portion or circumference of the cylindrical element 292).

[0190] Figures 11A and 11B show side views of the baffle 127. Figure 11A partially shows the ring 294 to show a fifth set of holes 260 found around the edge of the frustoconical portion 292. Figure 11A also shows the inner portion of the ring 294 tapering parallel to the outer circumference of the frustoconical portion 292. Figure 11B shows the ring 294 covering the fifth set of holes 260 found around the edge of the frustoconical portion 292. The side views of Figures 11A and 11B also show the stem 242 and the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, as described above with reference to Figure 5. The side views also show a fourth set of holes 264 on the rim of the stem 242, which will be described in detail later.

[0191] Figure 12 shows a top view of the baffle 127. The arched slot 272 and the hole 286 that engages with the alignment pin 285 are visible, which have already been described with reference to Figure 5. Part of the second set of holes 210 in the plate 290 of the baffle 127 can be seen through the arched slot 272. As described above with reference to Figure 5, the opening 245 in the connecting plate 240 extends through the connecting plate 240 and the stem 242, and extends partially through the gas delivery plate 244. The opening 245 extends through the plate 290 to the upper end of the frustoconical portion 292. Thus, the upper end of the frustoconical portion 292 can be seen through the opening 245 in the top view of the baffle 127. Furthermore, at least one of the first pair of holes 212 located at the center of the bottom of the baffle 127 (i.e., at the center of the lower end of the frustoconical portion 292) is also visible through the opening 245 in the top view of the baffle 127. In some examples, several of the holes in the first pair of holes 212 may be located near the holes in the first pair of holes 212 located at the center of the bottom of the baffle 127 (i.e., at the center of the lower end of the frustoconical portion 292). A cross-section of the baffle 127 along line CC is shown in Figure 13.

[0192] Figure 13 shows a cross-sectional view of the baffle 127 along line CC shown in Figure 12. An arc-shaped slot 272-1 is visible extending through the connecting plate 240 along the z-axis. An opening 245 is visible, extending through the connecting plate 240 and the stem 242, through the plate 290, and partially extending within the frustoconical portion 292 along the z-axis. A ring 294 is visible surrounding the frustoconical portion 292 and tapering parallel to the frustoconical portion 292. A first set of holes 260 is visible extending from the lower end of the frustoconical portion 292 to the fifth set of holes 212. A cross-section of the frustoconical portion 292 along line DD is shown in Figure 14.

[0193] Figure 14 shows a cross-sectional view of the frustoconical portion 292 along line DD shown in Figure 13. The fifth set of holes 260 are positioned laterally (along the x-axis) within the frustoconical portion 292. For example, the fifth set of holes 260 is defined by forming two sets of channels perpendicular to the frustoconical portion 292 laterally (along the x-axis). In some examples, the two sets of perpendicular channels can be formed by intersecting the fifth set of holes 260 through the frustoconical portion 292 in the diametrical direction. However, the potentially cumbersome intersecting process can be eliminated by manufacturing the baffle 127 or at least the gas delivery plate 244 using additive manufacturing techniques such as 3D printing. Using additive manufacturing also allows for the formation of more complex channels (e.g., helical channels), which are not achievable using CNC machining, which is typically used to form perpendicular channels.

[0194] The first set of holes 212 is formed from the lower end of the frustoconical portion 292 and connects the first set of holes 212 to the fifth set of holes 260. The second set of holes 210 extends through the plate 290 and the frustoconical portion 292. The third set of holes 262 extends radially outward at an angle from the lower end of the frustoconical portion 292 to the rim of the stem 242 of the baffle 127, as will be described in more detail below with reference to Figure 16. The third set of holes 262 is located along a circle, as will be described in more detail below with reference to Figure 15 (also shown at 304 in Figure 15). If the baffle 127 is manufactured using three-dimensional printing, the first, second, and third sets of holes 212, 210, and 262 can also be formed while forming the other components of the baffle 127.

[0195] Figure 15 shows a bottom view of the baffle 127. The first, second, and third sets of holes 212, 210, and 262 are visible. The layout and geometric arrangement of the first, second, and third sets of holes 212, 210, and 262 will now be described in more detail. The layout and geometric arrangement of these holes will be described in two ways: firstly, from the viewpoint of the shower head 116, which has the shower head and baffle 127 as a whole; and secondly, from the viewpoint of the baffle 127 only. Therefore, some of the following description from the viewpoint of the shower head 116 will overlap (i.e., be repeated) with some of the description from the viewpoint of the baffle 127.

[0196] From the viewpoint of the showerhead 116, nine of the first set of holes 212 form a first square 300 (which may also be called the first square region) around the center of the lower surface of the baffle 127. The lower surface of the baffle 127 is the lower surface of the gas delivery plate 244 or the lower surface of the frustoconical portion 292 of the baffle 127. One or more of the first set of holes 212 are located within the first square 300. In one example, depending on the process recipe, one hole 212 is located at the center of the first square 300, as shown. In another example, although not shown, depending on the process recipe, the hole 212 at the center of the first square 300 may be optional and can be omitted. None of the second set of holes 210 are located within the first square 300. Four of the holes in the second set of holes 210 are larger than the first square 300 and form a second square 302 (which may also be called a second square region) surrounding the first square 300. The center of the second square 302 coincides with the center of the first square 300 and the center of the bottom surface of the baffle 127. Each of the four holes in the second set of holes 210 is located radially outward from the holes located at the corners of the first square 300 among the nine holes in the first set of holes 212.

[0197] The lower surface of the baffle 127 further comprises a third set of holes 262 having a diameter less than or equal to the diameters of the first and second sets of holes 212, 210. At least four of the third set of holes 262 are located within the second square 302 and outside the first square 300. In some examples, eight of the third set of holes 262 are located within the second square 302 and outside the first square 300. At least one of the third set of holes 262 and two of the first set of holes 212 form a triangular pattern within the second square 302, with no other holes in the triangle.

[0198] The third set of holes 262 lies within a circle 304 that is concentric with the centers of the first and second squares 300 and 302 and the center of the lower surface of the baffle 127. The corners of the first square 300 lie on the circle 304. The second square 302 is circumscribed with the circle 304 and the first square 300. The third set of holes 262 is in fluid communication with the second set of holes 210, but not with the first set of holes 212.

[0199] The aforementioned pore pattern results in uniform gas flow and distribution from the baffle 127 to the substrate 124. Specifically, the pore pattern allows for gas mixing between the baffle 127 and the substrate 124 when gases are supplied simultaneously through these pores (e.g., in a CVD process) without using a faceplate with pores distributed throughout the entire faceplate to achieve gas mixing. Furthermore, the relationship of the pore patterns between the first set of pores, the second set of pores, and the third set of pores (including spaces designated without pores) improves the uniformity of gas delivery from at least two separate delivery channels. For example, the relationship of the pore patterns allows some process recipes to more uniformly mix gases just outside the bottom surface of the baffle 127, providing different gases of nearly equal concentration in any given region of the substrate 124. Alternatively, if the gas is supplied sequentially through these holes (for example, in an ALD process), the hole pattern provides uniform gas flow and distribution from the baffle 127 onto the substrate 124, thereby improving process uniformity in the central region of the substrate 124 without using a faceplate with holes distributed across the entire faceplate to achieve process uniformity. The number of holes in the hole pattern described above is just an example. Different numbers of holes in the hole pattern can be selected based on process requirements and the diameter of the substrate 124 to provide uniform gas flow and distribution from the baffle 127 onto the substrate 124.

[0200] Two diameters 306-1 and 306-2 (collectively diameter 306) on the underside of baffle 127, perpendicular to each other and intersecting at the center of the underside of baffle 127, form four quadrants on the underside of baffle 127. The two diameters 306 contain only the first set of holes 212. Each quadrant contains one or more holes from the third set of holes 262. Each diameter contains nine holes from the first set of holes 212.

[0201] The holes 212, 210 of the first and second sets are arranged in an alternating pattern. Each hole in the first and second sets of holes 212, 210 is spaced a predetermined distance from adjacent holes in the first and second sets of holes. In some examples, the holes 212, 210 of the first and second sets have the same diameter. The holes 212, 210 of the first and second sets are arranged in rows and columns, as shown in Figure 15. In some examples, although not shown, the holes 212 of the first set may have a different diameter from the holes 210 of the second set. Furthermore, in some examples, although not shown, the holes 212, 210 of the first and second sets may be arranged along concentric circles with increasing radii, where at least one hole on one circle has a different diameter from at least one hole on another circle. In other examples, the holes 212, 210 of the first and second sets may be arranged in various patterns. For example, the first and second pairs of holes 212 and 210 can be arranged in a radially expanding shape, and the shape can be any polygon.

[0202] From the viewpoint of the baffle 127, the gas delivery plate 244 (i.e., the underside of the frustoconical portion 292 of the baffle 127) comprises a first set of holes 212 and a second set of holes 210 arranged in an alternating pattern. The first and second sets of holes 212, 210 have the same diameter. In some examples, not shown, the first set of holes 212 may have a different diameter from the second set of holes 210. Furthermore, in some examples, not shown, the first and second sets of holes 212, 210 may be arranged along concentric circles with increasing radii, where at least one hole on one circle has a different diameter from at least one hole on the other circle.

[0203] One of the holes in the first set of holes 212 is located in the center of the gas delivery plate 244. Eight of the holes in the first set of holes 212 form a first square 300 in the center of the gas delivery plate 244. One or more of the holes in the first set of holes 212 are located within the first square 300. None of the holes in the second set of holes 210 are located within the first square 300. Four of the holes in the second set of holes 210 form a second square 302 whose center coincides with the center of the first square 300 and the center of the gas delivery plate 244. Each of the four holes in the second set of holes 210 is located radially outward from the holes in the first square 300 that are located at the corners of the eight holes in the first set of holes 212.

[0204] The gas delivery plate 244 further comprises a third set of holes 262 having a diameter less than or equal to the diameter of each of the first and second sets of holes 212, 210. At least four of the holes in the third set of holes 262 are located within the second square 302 and outside the first square 300. At least one of the holes in the third set of holes 262 and two of the holes in the first set of holes 212 form a triangle, and no other holes are located within that triangle. The third set of holes 262 are located along a circle 304 that is concentric with the centers of the first and second squares 300, 302 and the center of the gas delivery plate 244. The corners of the first square 300 lie on the circle 304. The second square 302 is circumscribed with the circle 304 and the first square 300. The third set of holes 262 are in fluid communication with the second set of holes 210, but not with the first set of holes 212. Two diameters 306 of the gas delivery plate 244, perpendicular to each other and intersecting at the center of the gas delivery plate 244, form four quadrants. The two diameters 306 contain only the first set of holes 212. Each of the four quadrants contains two of the holes from the third set of holes 262. Each diameter contains nine of the holes from the first set of holes 212.

[0205] Figure 16 shows a cross-sectional view of the baffle 127 along line EE shown in Figure 15. The baffle 127 is shown upside down. The fourth set of holes 264 extends radially inward and downward at an angle from the edge of the stem 242, through the plate 290 and frustoconical portion 292 of the gas delivery plate 244 to the third set of holes 262 on the underside of the gas delivery plate 244. The channel 266 connects the holes of the third set of holes 262 and the fourth set of holes 264. The channel 266 and the third and fourth sets of holes 262, 264 have the same diameter. The holes of the third and fourth sets of holes 262, 264 are a single angled (inclined) continuous hole.

[0206] The third and fourth sets of holes 262, 264 and channels 266 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, the arc-shaped slot 272, the second set of holes 210, and the gap 250 (see Figure 5) between the gas delivery plate 244 and the opening 204 of the base plate 126. The third and fourth sets of holes 262, 264 and channels 266 are not in fluid communication with the opening 245 of the connecting plate 240, the hollow portion of the connecting plate 240 and the stem 242, the partially hollow portion of the gas delivery plate 244, the fifth set of holes 260, the first set of holes 212 (not shown in the figure) connected to the fifth set of holes 260, and the gap 296 between the ring 294 and the frustoconical portion 292 of the gas delivery plate 244.

[0207] The first gas flowing through the opening 245 of the connecting plate 240 flows through the hollow portion of the connecting plate 240 and the stem 242, the partially hollow portion of the gas delivery plate 244, the fifth set of holes 260, the first set of holes 212 connected to the fifth set of holes 260 (not visible in the illustrated diagram), and the gap 296 between the ring 294 and the frustoconical portion 292 of the gas delivery plate 244. The second gas flowing through the arc-shaped slot 272 flows through the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, the third and fourth sets of holes 262, 264, the second set of holes 210, and the gap 250 between the gas delivery plate 244 and the opening 204 of the base plate 126 (see Figure 5). As a result, the first gas and the second gas do not mix within the baffle 127.

[0208] Examples of dimensions The dimensions of the various components and features of the showerhead 116 and baffle 127 depend on the size of the substrate 124 and are therefore a function of the substrate size. These dimensions may vary depending on the size of the substrate 124. For example, the diameter of the base plate 126 is greater than or equal to the diameter of the substrate 124 to ensure proper flow and containment of the precursor on the substrate 124. The diameters of the opening 204 in the base plate 126 and the diameters of the baffle 127 (i.e., the diameters of the connecting plate 240, stem 242, and gas delivery plate 244) change as the diameter of the base plate 126 changes, which in turn changes depending on the diameter of the substrate. Therefore, examples of the dimensions of the various components and features of the showerhead 116 and baffle 127 are provided below in relative terms. That is, the dimensions of two components or features are expressed as a ratio or percentage of the dimensions of each other. However, regardless of the variation, the dimensional descriptions of the various components and features of the showerhead 116 and baffle 127 described above as "greater than," "less than," "equal to," or "the same," "greater than or equal to," and "less than or equal to," remain unchanged.

[0209] For example, the diameter of the underside of the baffle 127 (i.e., the gas delivery plate 244) is between 0.5% and 50% of the diameter of the underside of the base plate 126 of the showerhead 116. This dimensional relationship is not merely a design choice, but defines the area or radial portion of the substrate 124 from the center that can receive the gas supplied by the baffle 127. For example, if the diameter of the baffle 127 is less than 5%, the gas flow from the baffle 127 may cause undesirable jetting (concentrated gas delivery causing non-uniformity) in the central portion of the substrate 124.

[0210] Having a small baffle 127 offers some advantages in terms of deposition rate for some processes. However, there are practical limitations when manufacturing the baffle 127 as a separable assembly. For example, if the baffle 127 is manufactured by welding together separately manufactured elements 240, 242, and 244, the size of the baffle 127 cannot be reduced beyond a certain limit. In some other applications, the baffle 127 can be made larger to help with gas flow uniformity.

[0211] The gas from the baffle 127 is distributed primarily toward the central region of the substrate 124, but the base plate 126 of the showerhead 116 needs to have a larger bottom surface for various reasons and technical effects. For example, the bottom surface of the base plate 126 of the showerhead 116 serves several purposes. Firstly, the bottom surface of the base plate 126 absorbs heat from the pedestal 114, thus providing thermal management. Secondly, the bottom surface of the base plate 126 provides an upper surface of the substrate 124 to hold and guide the precursor to the region of interest on the substrate 124, rather than causing the precursor to expand throughout the processing chamber 112. To achieve these objectives, the bottom surface of the base plate 126 can have various sizes depending on the size of the substrate 124 and process parameters.

[0212] Furthermore, typically, showerheads with faceplates have gas delivery holes that cover the size of the substrate 124 across the entire faceplate. However, as mentioned above, these showerheads suffer from the problem of the faceplate holes becoming clogged over time, which requires maintenance (cleaning) and eventual replacement of the showerhead, increasing not only the cost but also the tool downtime and throughput. In contrast, showerheads 116 with baffles 127 solve the problem of showerhead clogging and cleaning by having holes just in the central region of the showerhead 116. Moreover, baffles 127 can be replaced or cleaned more easily and at a much lower cost than replacing the entire showerhead. Furthermore, by using showerheads 116 with baffles 127, the baffles 127 can deliver precursors at a faster flow rate, which improves wafer throughput because it allows for faster deposition on the substrate 124 compared to typical showerheads with faceplates having hundreds (or thousands) of holes, which add long purging times to clean thousands of holes between feeding different precursors.

[0213] Similar to the baffle 127, the diameter of the opening 204 in the base plate of the shower head 116 is 0.5% to 50% of the diameter of the base plate 126 of the shower head. This dimensional relationship is not merely a design choice, but coincides with the dimensions of the baffle 127 and the gap 250 between the baffle 127 and the base plate 126, which is important for guiding the gas flow through the gap 250 toward the substrate 124. Thus, the opening 204 is sized not only to fit the baffle 127 to the shower head 116, but also to provide the appropriate gap 250.

[0214] The diameter of the lower surface of the baffle 127 (i.e., the gas delivery plate 244) is 75% to 95% of the diameter of the opening 204 in the base plate 126 of the showerhead 116. This dimensional relationship is not merely a design choice, but defines the gap 250 between the baffle 127 and the base plate 126, which is the material that guides the gas flow through the gap 250 toward the substrate 124. In some embodiments, the lower surface of the baffle 127 is not flat. For example, the bottom surface may include one or more concave or convex regions.

[0215] In the baffle 127, the diameters of the first and second sets of holes 212, 210 are 1% to 25% of the diameter of the fifth set of holes 260, and the diameters of the third and fourth sets of holes 262, 264 and channel 266 are 10% to 100% of the diameters of the first and second sets of holes 212, 210. The diameters of these holes are not merely a design choice, but determine the flow rate and pressure of the gas flowing out of these holes onto the substrate 124, which is also important in preventing undesirable jetting (concentrated gas delivery causing non-uniformity) in the central portion of the substrate 124. The third set of holes 262 is shown to be smaller than the first and second sets of holes 212, 210, but the third set of holes 262 can be as close as possible in size to the first and second sets of holes 212, 210. However, the size of the third set of holes 262 cannot be made very large, and the angle of the channel 266 associated with the third set of holes 262 cannot be set to an angle that allows the third set of holes 262 to penetrate the outer plenum of the baffle 127. Furthermore, the angle of the channel 266 connecting the third set of holes 262 and the fourth set of holes 264 (e.g., 45 to 85 degrees with respect to the z-axis) is also configured to guide gas from the annular volume 252 through the third set of holes to the central portion of the substrate 124, ensuring process uniformity in the central portion of the substrate 124.

[0216] The number of holes in the various sets of holes described above also serves a specific purpose. For example, although only one of the holes 212 of the first set of holes 212 is shown in the center of the bottom surface of the baffle 127, depending on the application, more holes 212 can be provided in close proximity to the central hole 212 (e.g., within the first square 300). However, in some applications, providing more holes 212 in the central region of the bottom surface of the baffle 127 may cause a jetting effect that can adversely affect the uniformity of deposition on the substrate 124. Whether or not there is one or more holes 212 in the central region of the bottom surface of the baffle 127 also depends on the size of the holes 212, 210 of the first and second sets. If the diameters of the holes 212 of the first and second sets are larger, fewer holes 212, 210 can be placed in the central region of the bottom surface of the baffle 127. Since the baffle 127 can be a removable component of the showerhead 116, the baffle 127 can have different pore sizes and patterns for different process applications (e.g., thermal ALD vs. CVD, or larger pores for more viscous precursor molecules).

[0217] In the baffle 127, the size of the fifth set of holes 260 is larger than the size of the first set of holes 212 for the following reason: As already mentioned above, the fifth set of holes 260 is positioned laterally within the frustoconical portion 282 of the gas delivery plate 244 of the baffle 127. Thus, the fifth set of holes 260 provides a channel for passing gas into the inner plenum of the baffle 127, whereas the first set of holes 212 are individual holes. Therefore, in order to deliver fluid to the smaller holes of the first set of holes 212 and to the gap 250 between the baffle 127 and the opening 204 on the lower surface of the base plate 126 of the shower head 116, the fifth set of holes 260 must be larger than the first set of holes 212.

[0218] The grooves 238 and 239 in the tube 192 and shell 190 are configured to reduce the velocity of the gas flowing through the annular volume 232 between the tube 192 and the shell 190, thereby increasing flow uniformity. The angle of the rectangular holes 270, as well as the arc length and radial width of the arched slots 272, are also configured to guide the gas flow at an appropriate velocity into the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. Furthermore, the angle of the channel 266 connecting the third set of holes 262 and the fourth set of holes 264 (e.g., 45 to 85 degrees with respect to the z-axis) is also configured to guide the gas from the annular volume 252 through the third set of holes 262 onto the central portion of the substrate 124. Furthermore, the tapered angles (e.g., 15 to 45 degrees) of the inner portion of the ring 294 and the outer circumference of the frustoconical portion 292 are also configured to guide the gas from the fifth set of holes 260 through the gap 296 between the ring 294 and the frustoconical portion 292, distributing the gas radially outward onto the substrate 124.

[0219] Section 2: External Features of Shower Heads and Baffles Figures 17–25 show examples of various diagrams of the showerhead 116 and baffle 127. Some of the diagrams shown in Figures 17–25 are also shown and explained above with reference to Figures 1–16. Nevertheless, since Figures 1–16 contain reference numerals, some of the diagrams shown in Figures 1–16, as well as other diagrams of the showerhead 116 and baffle 127, are shown again in Figures 17–25 to show the external features of the showerhead 116 and baffle 127 without reference numerals.

[0220] Figure 17 shows an example of a perspective view of a shower head 116 having a baffle 127. Figure 17 is similar to Figure 2 and shows the base plate 126 and stem 128 of the shower head 116, which have already been described in detail above with reference to Figures 1 to 16. Figure 18 shows an example of a side view of the shower head 116 shown in Figure 17. Figure 18 is similar to Figure 3 and therefore will not be described again for brevity. Figure 19 shows an example of a top view of the shower head 116 shown in Figure 17. Figure 19 shows an example of optional fasteners used to attach the shell 190 and tube 192 to each other and to the base plate 126 of the shower head 116. Figure 20 shows an example of a bottom view of the shower head 116 shown in Figure 17. Figure 20 is similar to Figure 4 and therefore will not be described again for brevity.

[0221] Figure 21 shows an example of a perspective view of the baffle 127 of the showerhead 116 shown in Figure 17, with the baffle 127 in an upright position. Figure 21 is similar to Figure 10B and therefore will not be explained again for brevity. Figure 22 shows an example of a perspective view of the baffle 127 of the showerhead 116 shown in Figure 17, with the baffle 127 upside down. Figure 22 is similar to Figure 10C and therefore will not be explained again for brevity. Figure 23 shows an example of a side view of the baffle 127 shown in Figure 22. Figure 23 is similar to Figure 11B and therefore will not be explained again for brevity. Figure 24 shows an example of a top view of the baffle 127 shown in Figure 22. Figure 24 is similar to Figure 12 and therefore will not be explained again for brevity. Figure 25 shows an example of a bottom view of the baffle 127 shown in Figure 22. Figure 25 is similar to Figure 15 and therefore will not be explained again for brevity.

[0222] The foregoing description is merely illustrative and is not intended to limit the Disclosure, its uses, or any application. The broad teachings of this Disclosure can be implemented in various forms. Therefore, while this Disclosure includes certain examples, the true scope of this Disclosure should not be limited in this way, as other modifications become apparent when considering the drawings, specification, and the claims below.

[0223] It should be understood that, without altering the principles of this disclosure, one or more steps within the method may be performed in a different order (or simultaneously). Furthermore, although each example is described above as having a specific feature, one or more of those features described in relation to any one of the examples in this disclosure may be implemented and / or combined with features in any of the other examples, even if the combination is not explicitly described. In other words, the examples described are not mutually exclusive, and permutations of one or more examples with respect to each other remain within the scope of this disclosure.

[0224] Spatial and functional relationships between elements (e.g., between modules, between circuit elements, between semiconductor layers, etc.) are described using a variety of terms, including “connected,” “engaged,” “coupled,” “adjacent,” “next to,” “on top of,” “above,” “below,” and “disposed.” Unless explicitly stated to be “direct,” if a relationship between a first and second element is described in the above disclosure, that relationship may be a direct relationship in which no other intervening elements exist between the first and second elements, or it may be an indirect relationship in which one or more intervening elements (spatially or functionally) exist between the first and second elements. As used herein, the phrase "at least one of A, B, and C" should be interpreted as meaning a logic operation (A OR B OR C) using non-exclusive OR, and not as meaning "at least one of A, at least one of B, and at least one of C."

[0225] In some implementations, the controller is part of a system, which may be part of the examples described above. Such a system may comprise a semiconductor processing apparatus including one or more process tools, one or more chambers, one or more processing platforms, and / or specific processing components (such as a wafer pedestal or gas flow system). These systems may be integrated with electronic equipment for controlling pre-processing, in-processing, and post-processing operations of a semiconductor wafer or substrate.

[0226] Electronic devices may be referred to as “controllers” that can control various components or sub-components of one or more systems. Depending on the processing requirements and / or the type of system, a controller may be programmed to control any of the processes disclosed herein, including the delivery of process gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, position and operation settings, and loading and unloading wafers into and out of tools and other transport tools and / or load locks connected to or interfaced with a particular system.

[0227] Generally speaking, a controller may be defined as an electronic device having various integrated circuits, logic, memory, and / or software that receive and issue instructions, control operations, enable cleaning operations, enable endpoint measurement, etc. Integrated circuits may include chips in the form of firmware that store program instructions, chips defined as digital signal processors (DSPs), application-specific integrated circuits (ASICs), and / or one or more microprocessors, or microcontrollers that execute program instructions (e.g., software).

[0228] Program instructions may be instructions communicated to the controller in the form of various individual settings (or program files) that define operational parameters for executing a specific process on a semiconductor wafer or system. In some examples, operational parameters may be part of a recipe defined by a process engineer to achieve one or more process steps during the manufacturing of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or dies of a wafer.

[0229] In some implementations, the controller may be part of, or coupled to, a computer integrated with, coupled to, or otherwise networked to, the system, or a combination thereof. For example, the controller may be all or part of a “cloud” or fab-host computer system, enabling remote access to wafer processing. The computer may enable remote access to the system to monitor the current progress of a manufacturing operation, examine the history of past manufacturing operations, examine trends or performance metrics from multiple manufacturing operations, modify parameters of the current process, set process steps following the current process, or initiate a new process.

[0230] In some examples, a remote computer (e.g., a server) can provide process recipes to the system over a network that may include a local network or the internet. The remote computer may include a user interface that allows input or programming of parameters and / or settings, which are then transmitted from the remote computer to the system. In some examples, the controller receives instructions in the form of data that specify the parameters of each process step performed during one or more operations. It should be understood that the parameters may be specific to the type of process being performed and the type of tool the controller is configured to interface with or control.

[0231] Therefore, as described above, the controllers may be distributed, for example, by comprising one or more individual controllers that are networked together and operate toward a common purpose, such as the processes and control described herein. An example of a distributed controller for such purposes may be one or more integrated circuits on a chamber that communicate with one or more remotely located integrated circuits (such as platform-level or part of a remote computer) that are combined to control the processes on the chamber.

[0232] Exemplary systems may include, but are not limited to, plasma etching chambers or modules, deposition chambers or modules, spin rinse chambers or modules, metal plating chambers or modules, clean chambers or modules, bevel edge etching chambers or modules, physical vapor deposition (PVD) chambers or modules, chemical vapor deposition (CVD) chambers or modules, atomic layer deposition (ALD) chambers or modules, atomic layer etching (ALE) chambers or modules, ion implantation chambers or modules, track chambers or modules, and any other semiconductor processing systems related to or usable in the fabrication and / or manufacture of semiconductor wafers.

[0233] As described above, depending on one or more process steps performed by the tool, the controller may communicate with one or more of the following: other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, nearby tools, tools located throughout the factory, a main computer, another controller, or tools used for material transfer to carry wafer containers to and from tool locations and / or load ports in the semiconductor manufacturing plant. [Explanation of Symbols]

[0234] 100 Substrate processing system, 112 Station / processing chamber, 114 Pedestal, 116 Shower head, 118 Base section, 120 Stem section, 121 Actuator, 124 Substrate, 126 Base plate, 127 Baffle, 128 Stem, 150 Gas delivery system, 151 Valve, 152 Manifold, 154 Gas source, 156 Valve, 158 Mass flow controller, 160 RF power supply, 162 Heater, 164 Temperature sensor, 168 Temperature sensor, 170 Valve, 172 Vacuum pump, 180 Controller, 190 Shell / outer component, 192 Tube, 194 Inlet, 200 Base section, 202 Vertical section, 204 Opening, 207 Annular ledge, 210 Second set of holes, 212 First set of holes, 220 Base section, 222 Vertical section, 224 Conduit, 225 Opening, 230 Cylindrical slot, 232 Annular volume, 236 Opening, 237 Channel, 238 Groove, 239 Groove, 240 Connecting plate, 242 Stem, 244 Gas delivery plate, 245 Opening, 246 Cylindrical slot, 247 Annular groove, 250 Gap, 252 Annular volume, 260 Fifth set of holes, 262 Third set of holes, 264 Fourth set of holes, 266 Channel, 270 Square hole, 272 Bow-shaped slot, 280 Circular groove, 282 Opening, 284 Bow-shaped member, 285 Alignment pin, 286 Hole, 290 Connecting plate, 292 Truncated cone section, 294 Ring, 296 Gap, 300 First square, 302 Second square, 304 circle, 306 diameter

Claims

1. It is a shower head, A plate comprising a first surface and an opening in the center of the first surface, A baffle disposed within the opening of the plate, wherein the baffle extends into the plate through the opening, the baffle has a second surface in a plane parallel to the first surface of the plate, and the second surface has a first set of holes and a second set of holes, the first set of holes and the second set of holes are not in fluid communication with each other, and A shower head equipped with [a specific feature].

2. The shower head according to claim 1, wherein the second surface of the baffle is coplanar with the first surface of the plate.

3. Nine of the first set of holes form a first square around the center of the second surface of the baffle. One or more of the holes in the first set are located within the first square. None of the holes in the second set are located within the first square. The shower head according to claim 1.

4. Four of the holes in the second set form a second square that is larger than the first square, and the second square has a center that coincides with the center of the first square and the center of the second surface of the baffle. Each of the four holes is located radially outward from one of the nine holes located at the corners of the first square. The shower head according to claim 3.

5. The shower head according to claim 4, wherein the second surface of the baffle further comprises a third set of holes having a diameter less than or equal to the diameter of the first set of holes and the second set of holes, and at least four of the holes of the third set of holes are located within the second square and outside the first square.

6. The shower head according to claim 5, wherein at least one hole from the third set of holes and two holes from the first set of holes form a triangle, and there are no other holes within the triangle.

7. The shower head according to claim 5, wherein the third set of holes lies in a circle concentric with the centers of the first square and the second square and the center of the second surface of the baffle, and the corners of the first square lie on the circle.

8. The shower head according to claim 5, wherein the third set of holes is in fluid communication with the second set of holes, but is not in fluid communication with the first set of holes.

9. Two diameters of the second surface of the baffle that are perpendicular to each other and intersect at the center of the second surface of the baffle form four quadrants on the second surface of the baffle. The two diameters include only the first set of holes, Each quadrant includes one or more holes from the third set of holes, The shower head according to claim 5.

10. The shower head according to claim 9, wherein each diameter includes nine of the holes from the first set of holes.

11. The shower head according to claim 1, wherein the shower head is configured to supply one or more gases directly to the process chamber via the baffle.

12. The shower head according to claim 1, wherein the shower head is configured to supply one or more gases to a substrate facing the plate via the baffle, and the shower head does not include a face plate having holes facing the substrate.

13. The shower head according to claim 1, wherein the shower head is configured to supply a first gas through a first set of holes and to supply a second gas to a substrate facing the plate through a second set of holes.

14. The shower head according to claim 1, wherein the first set of holes and the second set of holes have the same diameter.

15. The shower head according to claim 1, wherein the first set of holes and the second set of holes are arranged along concentric circles, and the holes on at least one circle have a different diameter from the holes on at least one other circle.

16. The shower head according to claim 1, wherein the first set of holes and the second set of holes are arranged in rows and columns.

17. The shower head according to claim 1, wherein the baffle is connected to the plate by one or more fasteners.

18. The shower head according to claim 1, wherein the plate and the baffle are integrated.

19. The shower head according to claim 1, wherein the baffle comprises a ring around the second surface of the baffle, and the shower head further comprises a gap between the outer diameter of the ring and the inner diameter of the opening of the plate.

20. The shower head according to claim 1, wherein the baffle comprises a ring around the second surface of the baffle, and the outer diameter of the ring is smaller than the inner diameter of the opening of the plate.

21. The shower head according to claim 1, wherein the edge of the first surface of the plate is rounded along the inner diameter of the opening of the plate.

22. The baffle comprises a ring around the second surface of the baffle, and the shower head is A gap exists between the outer diameter of the ring and the inner diameter of the opening in the plate. Furthermore, The first set of holes in the baffle are configured to supply the first gas, The second set of holes in the baffle is separated from the first set of holes and is configured to supply a second gas. The shower head according to claim 1, wherein the gap is configured to allow the second gas to pass through.

23. The shower head according to claim 1, wherein the first set of holes and the second set of holes are arranged in an alternating pattern.

24. The shower head according to claim 1, wherein each hole in the first set of holes and the second set of holes are spaced a predetermined distance apart from adjacent holes in the first set of holes and the second set of holes.

25. The shower head according to claim 1, wherein the diameter of the second surface of the baffle is 75% to 99% of the diameter of the opening.

26. The shower head according to claim 1, wherein the diameter of the second surface of the baffle is 0.5% to 50% of the diameter of the first surface of the plate.

27. The shower head according to claim 1, wherein the diameter of the opening is 0.5% to 50% of the diameter of the plate.

28. A stem connected to the second surface of the plate, wherein the second surface is on the opposite side of the first surface. Furthermore, The stem comprises a base portion coupled to the central region of the second surface of the plate, and a vertical portion extending vertically upward from the base portion. The shower head according to claim 1.

29. The shower head according to claim 28, wherein the second surface of the plate (i) extends vertically upward by a first distance from the outer diameter of the first surface, (ii) after the first distance extends radially inward by a second distance at a certain angle with respect to the first surface of the plate, and (iii) after the second distance extends radially inward parallel to the first surface of the plate by a third distance to the base portion of the stem.

30. It is a baffle for a shower head, A connecting plate configured to connect the baffle to the shower head, A stem extending from the aforementioned connecting plate, A gas delivery plate extending from the stem and comprising a first set of holes and a second set of holes for delivering one or more gases, wherein the first set of holes and the second set of holes are not in fluid communication with each other. A baffle equipped with this feature.

31. The baffle according to claim 30, wherein the connecting plate, the stem, and the gas delivery plate are cylindrical and have different diameters.

32. The baffle according to claim 30, wherein at least one of the connecting plate, the stem, and the gas delivery plate has a different shape from the others of the connecting plate, the stem, and the gas delivery plate.

33. The baffle according to claim 30, wherein at least one of the connecting plate, the stem, and the gas delivery plate has a different size from the others of the connecting plate, the stem, and the gas delivery plate.

34. The baffle according to claim 30, wherein the connecting plate and the gas delivery plate are of the same size.

35. The baffle according to claim 30, wherein the connecting plate, the stem, and the gas delivery plate are integrally formed.

36. The baffle according to claim 30, wherein the connecting plate, the stem, and the gas delivery plate are joined to each other using one or more fasteners.

37. The baffle according to claim 31, wherein the gas delivery plate has a larger diameter than the stem, and the connecting plate has a larger diameter than the gas delivery plate.

38. The baffle according to claim 31, further comprising an opening that extends through the center of the connecting plate and the stem, and that extends through the center of the gas delivery plate and partially into the gas delivery plate.

39. The baffle according to claim 31, wherein the connecting plate comprises a plurality of arc-shaped slots extending through the connecting plate, and the plurality of arc-shaped slots are arranged radially outward from the stem.

40. The baffle according to claim 31, wherein the gas delivery plate comprises a first set of holes and a second set of holes arranged in an alternating pattern, the first set of holes configured to deliver a first gas, and the second set of holes configured to deliver a second gas different from the first gas.

41. The baffle according to claim 40, wherein the first set of holes and the second set of holes have the same diameter.

42. The baffle according to claim 40, wherein the first set of holes and the second set of holes are arranged along concentric circles, and at least one of the holes on the circle has a different diameter from the holes on at least one other circle.

43. The baffle according to claim 40, wherein the first set of holes and the second set of holes are arranged in rows and columns.

44. One of the holes in the first set is located in the center of the gas delivery plate. Nine of the first set of holes form a first square in the center of the gas delivery plate. One or more of the holes in the first set are located within the first square. None of the holes in the second set are located within the first square. The baffle according to claim 40.

45. Four of the holes in the second set form a second square whose center coincides with the first square and the center of the gas delivery plate. Each of the four holes is located radially outward from one of the nine holes located at the corners of the first square. The baffle according to claim 44.

46. The baffle according to claim 45, wherein the gas delivery plate further comprises a third set of holes having a diameter less than or equal to the diameter of each of the first set of holes and the second set of holes, and at least four of the holes of the third set of holes are located within the second square and outside the first square.

47. The baffle according to claim 46, wherein at least one hole from the third set of holes and two holes from the first set of holes form a triangle, and there are no other holes within the triangle.

48. The baffle according to claim 46, wherein the third set of holes lies in a circle concentric with the centers of the first square and the second square and the center of the gas delivery plate, and the corners of the first square lie on the circle.

49. The baffle according to claim 46, wherein the third set of holes is in fluid communication with the second set of holes, but is not in fluid communication with the first set of holes.

50. Two diameters of the gas delivery plate that are perpendicular to each other and intersect at the center of the gas delivery plate form four quadrants. The two diameters include only the first set of holes, Each quadrant includes two holes from the third set of holes, The baffle according to claim 46.

51. The baffle according to claim 50, wherein each diameter includes nine holes from the first set of holes.

52. The stem comprises a fourth set of holes along the rim of the stem, and a plurality of channels extending radially inward at an angle with respect to a vertical axis that penetrates the stem and the gas delivery plate between the third set of holes and the fourth set of holes, The third set of holes and the fourth set of holes are in fluid communication with each other, with the second set of holes, with the plurality of arc-shaped slots, and with the annular volume between the connecting plate and the gas delivery plate around the stem. The baffle according to claim 46.

53. The baffle according to claim 52, wherein the second, third, and fourth sets of holes, the plurality of arc-shaped slots, and the annular volume are not in fluid communication with the first set of holes.

54. The aforementioned gas delivery plate, A plate and A truncated cone-shaped portion and a ring attached to the aforementioned plate Equipped with, The baffle according to claim 52, wherein the ring surrounds the frustoconical portion and defines a gap between the ring and the frustoconical portion.

55. The smaller end of the aforementioned frustoconical portion is attached to the plate. As the ring extends toward the plate, the inner portion of the ring tapers radially inward. The baffle according to claim 54.

56. The larger end of the aforementioned frustoconical portion is attached to the plate. As the ring extends toward the plate, the inner portion of the ring tapers radially outward. The baffle according to claim 54.

57. The aforementioned frustoconical portion A fifth set of holes, arranged laterally and penetrating the aforementioned frustoconical portion. Equipped with, The baffle according to claim 54, wherein the first set of holes is connected to the fifth set of holes by passing through the frustoconical portion perpendicularly.

58. An opening that extends through the center of the connecting plate and the stem, and partially extends through the center of the gas delivery plate into the gas delivery plate. Furthermore, The opening is in fluid communication with the first set of holes and the fifth set of holes, and with the gap between the frustoconical portion and the ring. The baffle according to claim 57.

59. The baffle according to claim 58, wherein the opening, the first set of holes and the fifth set of holes, and the gap are not in fluid communication with the second, third and fourth sets of holes, the plurality of arc-shaped slots, and the annular volume between the connecting plate and the gas delivery plate around the stem.

60. The diameters of each hole in the third set of holes and the fourth set of holes, and each channel in the plurality of channels are the same. The aforementioned angle is between 45 and 85 degrees. The baffle according to claim 52.

61. The diameters of the first set of holes and the second set of holes are 1% to 25% of the diameter of the fifth set of holes. The diameters of the third set of holes and the fourth set of holes, as well as the plurality of channels, are 10% to 100% of the diameters of the first set of holes and the second set of holes. The baffle according to claim 57.

62. The thickness of the stem is smaller than the thickness of the connecting plate, The thickness of the gas delivery plate is smaller than the thickness of the stem. The baffle according to claim 30.