Play-on auxiliary ignition system

Abstract

The present invention provides a pre-on auxiliary ignition device that can effectively suppress contamination caused by electrical discharge and increase the lifespan of equipment. [Solution] The pre-onization auxiliary ignition device is provided at the pre-onization gas inlet end 112 of the plasma chamber 110 of the plasma source 100 and comprises a dielectric flow tube 20 and a pre-onization electrode 30 provided outside the dielectric flow tube. When the process gas 200 flows through the dielectric flow tube, the pre-onization electrode is positioned to apply a driving voltage and apply an electric field to the process gas in a capacitive coupling manner, thereby performing a gas pre-onization procedure. As a result, the process gas forms a pre-onized gas 210 with an initial free charge before entering the plasma chamber. This allows the plasma source to be assisted in the plasma ignition procedure, shortening the plasma ignition time and improving ignition delay and reproducibility degradation even if the plasma source is idle for a long time. The dielectric flow tube acts as a solid barrier, reducing the risk of particles from the pre-onization electrode contaminating the process gas.

Description

[Technical Field]

[0001] The present invention relates to the field of semiconductor manufacturing equipment, in particular to a pre-ionization auxiliary ignition device, and is applicable to plasma sources such as Inductive Toroidal Remote Plasma Source (RPS), for example. [Background Art]

[0002] Remote plasma sources are widely used in semiconductor manufacturing processes for chamber cleaning, surface etching, pretreatment for thin film deposition and the like. Such a plasma source ionizes a process gas by means of a radio frequency induced electric field to generate free radicals, which are then transported to a process chamber. However, such a remote plasma source has the following technical problems in the plasma ignition stage.

[0003] (1) Ignition is delayed and unstable. The ignition time is affected by the idle time of the remote plasma source. After a long idle time, the gas adsorbed on the wall of the plasma chamber decreases, resulting in extremely insufficient initial free charge density, which greatly prolongs the ignition time and causes very large variation (in conventional designs, the standard deviation of the ignition time can reach up to 10.12 milliseconds).

[0004] (2) Deterioration becomes severe after long-time idling. When the idle time of the remote plasma source exceeds 360 seconds, under the condition of 3 Torr operating pressure, the average ignition time of the conventional design is greatly extended to 30.62 milliseconds, with the maximum value reaching 55.8 milliseconds, which seriously affects the process reproducibility and the overall production capacity.

[0005] Prior art (e.g., U.S. Patent US6,815,633B1) proposed various annular plasma chamber structures for remote plasma sources and improved plasma generation efficiency by changing the modulation coupling coil and power supply configuration. However, relying solely on such inductively coupled electric field structures often presents practical challenges, particularly during startup at low pressure or in long idle states, due to stringent discharge arc initiation conditions and ignition delay. Subsequently, improvements were proposed in prior art (e.g., U.S. Patent US12,207,385B2). As a solution, a method was proposed in which the ignition electrode is placed outside the dielectric ceramic tube in the mid-block of the plasma main chamber, and direct ignition of the process gas is attempted using capacitively coupled spark discharge. However, because such ignition electrodes or discharge sections are integrated into the structure of the plasma main chamber passage, when the device is restarted after prolonged idle, the density of the initial free charge on the walls of the main channel often becomes significantly insufficient due to the decrease in adsorbed gas. This makes the device highly sensitive to ignition conditions, and in actual operation, it remains difficult to stably eliminate ignition delays over long periods, resulting in technical shortcomings in the success rate of arc ignition and the reproducibility of ignition. [Prior art documents] [Patent Documents]

[0006] [Patent Document 1] United States Patent No. US6,815,633B1 [Patent Document 2] United States Patent No. US12,207,385B2 [Overview of the project] [Problems that the invention aims to solve]

[0007] The main objective of this invention is to provide a pre-on auxiliary ignition device that can effectively suppress contamination caused by electrical discharge and increase the lifespan of equipment.

[0008] The next objective of this invention is to provide a pre-on auxiliary ignition device that significantly improves the efficiency and stability of ignition after prolonged idling.

[0009] Another objective of this invention is to provide a play-on auxiliary ignition device that offers the advantages of high compatibility and non-destructive device upgrades. [Means for solving the problem]

[0010] The pre-onization auxiliary ignition device according to the present invention is provided at the inlet end of the pre-onization gas of the plasma chamber of a plasma source, and assists the plasma source in performing a plasma ignition procedure. It comprises a dielectric flow tube for receiving at least one process gas and at least one pre-onization electrode, wherein the pre-onization electrode is provided outside the dielectric flow tube, and the dielectric flow tube is a dielectric insulating layer between the pre-onization electrode and the process gas flowing through the dielectric flow tube. The pre-onization electrode is arranged to apply a driving voltage and an electric field to the process gas flowing through the dielectric flow tube in a capacitive coupling manner, thereby performing a gas pre-onization procedure. As a result, before the process gas enters the plasma chamber via the dielectric flow tube, a pre-onized gas having at least one initial free charge is formed.

[0011] The pre-ionization auxiliary ignition device according to the present invention has a pre-ionization convergence region downstream of the pre-ionization electrode along the flow direction of the process gas, and the pre-ionization convergence region allows the pre-ionized gas having the initial free charge to pass through, thereby increasing the density of the initial free charge in the pre-ionized gas introduced into the plasma chamber.

[0012] The pre-on auxiliary ignition device according to the present invention is characterized in that the drive voltage is controlled to be applied to the pre-on electrode when the ignition control signal for the plasma ignition procedure is triggered, thereby performing the gas pre-on procedure.

[0013] The pre-on auxiliary ignition device according to the present invention is characterized in that the pre-on electrode is arranged to be electrically connected to the high-voltage source of the plasma source, and the high-voltage source applies the drive voltage to the pre-on electrode when the ignition control signal is triggered.

[0014] The pre-on auxiliary ignition device according to the present invention is characterized in that the high-voltage source is arranged to be electrically connected to the control electrical circuit of the plasma source, and the control electrical circuit is arranged to control the high-voltage source by the ignition control signal and apply the drive voltage to the pre-on electrode.

[0015] The pre-on auxiliary ignition device according to the present invention is characterized in that the timing at which the drive voltage is applied to the pre-on electrode and the electric field is applied is substantially synchronized with the plasma ignition procedure.

[0016] The pre-on auxiliary ignition device according to the present invention is characterized in that the timing at which the driving voltage is applied to the pre-on electrode and the electric field is applied is earlier than the plasma ignition procedure.

[0017] The pre-on auxiliary ignition device according to the present invention is characterized in that the control electrical circuit is further arranged to determine the idle time of the plasma source, and only when the idle time is greater than or equal to a preset value, the control electrical circuit controls the high-voltage source to apply the drive voltage to the pre-on electrode when the ignition control signal is triggered, thereby performing the gas pre-on procedure.

[0018] The pre-on auxiliary ignition device according to the present invention is characterized in that the control electrical circuit is further arranged to determine the idle time of the plasma source, and only when the idle time is greater than or equal to a preset value, the control electrical circuit controls the high-voltage source to apply the drive voltage to the pre-on electrode before starting the plasma ignition procedure, thereby generating or maintaining the initial free charge to be used in the plasma ignition procedure.

[0019] The pre-on auxiliary ignition device according to the present invention is characterized in that the preset value is 90 seconds, 260 seconds, or 360 seconds.

[0020] The pre-on auxiliary ignition device according to the present invention further comprises a gas distribution housing, the gas distribution housing being provided in the dielectric flow tube, and at least one gas distribution plate having a plurality of perforations being provided inside the gas distribution housing, thereby distributing the process gas into the dielectric flow tube.

[0021] The pre-on auxiliary ignition device according to the present invention is characterized in that the gas distribution plate includes a first gas distribution plate and a second gas distribution plate located downstream of the first gas distribution plate, and a buffer chamber is formed between the first gas distribution plate and the second gas distribution plate, so that the process gas is divided in two stages via the first gas distribution plate and the second gas distribution plate, and the pressure is stabilized in the buffer chamber.

[0022] The pre-on auxiliary ignition device according to the present invention is characterized in that the gas distribution housing has a first axial length, the dielectric flow tube has a second axial length, and the first axial length is less than or equal to half of the second axial length.

[0023] The pre-ionization auxiliary ignition device according to the present invention further comprises a connecting portion, wherein the connecting portion is provided between the dielectric flow tube and the pre-ionized gas inlet end of the plasma chamber.

[0024] The pre-ionization auxiliary ignition device according to the present invention further comprises at least one module fixing member, wherein the module fixing member is arranged such that the connecting portion, the pre-ionization electrode, the gas distribution housing and the dielectric flow tube are detachably fixed to each other, so that they form a detachable modular component.

[0025] In the pre-ionization auxiliary ignition device according to the present invention, the plasma source is an Inductive Toroidal Remote Plasma Source (RPS), and the plasma source has at least one RF inductive coupling module provided in the plasma chamber, so as to generate a high-frequency inductive electric field, accelerate the initial free charges entering the plasma chamber, and trigger an Avalanche process, thereby forming plasma in the plasma chamber.

[0026] In the pre-ionization auxiliary ignition device according to the present invention, the dielectric flow tube is made of quartz or silicon dioxide with a purity higher than 99%. Effects of the Invention

[0027] The pre-ionization auxiliary ignition device according to the present invention has the following effects. (1) Contamination due to discharge can be effectively suppressed, and the lifespan of the equipment can be increased. By positioning the pre-on electrode outside the dielectric flow tube, the dielectric flow tube acts as a physical barrier, effectively physically isolating the pre-on electrode from the process gas. By providing the pre-on electrode according to this invention, the risk of the electrode surface being struck by charged particles during high-voltage driving or electric field interaction can be reduced, thereby reducing the risk of particle contamination of the process gas by the electrode material, reducing electrode wear, and extending the operating life.

[0028] (2) Significantly improves the efficiency and stability of ignition after prolonged idling. By actively exciting the process gas upstream of the plasma chamber, the density of initial free charge (seed charge) is increased, effectively overcoming ignition delay caused by the decrease in gas adsorbed on the plasma chamber wall after the plasma source has been idle for a long time (e.g., more than 360 seconds). In this invention, by applying a driving voltage to the pre-ionized electrode, the pre-ionized electrode applies an electric field to the process gas in a capacitive coupling manner, thereby pre-ionizing the process gas. Under specific test conditions, the standard deviation of the ignition time after prolonged idling is significantly reduced to the range of 0.06 to 0.17 milliseconds, and the reproducibility of the process is greatly improved.

[0029] (3) It offers the advantages of high compatibility and non-destructive equipment upgrades. The pre-on auxiliary ignition device according to this invention employs an external mounting design, and its operating pressure range substantially matches the ignition operating pressure of the plasma source. According to this invention, it is not necessary to change the design of the plasma chamber of the original plasma source, and the pre-on auxiliary ignition device can be directly integrated into the structure of the existing plasma source, thus providing semiconductor process equipment with high practical application value and low modification costs as a non-destructive upgrade solution.

[0030] To further understand the technical features and achievable technical benefits of this invention, better embodiments and a detailed description are provided below. [Brief explanation of the drawing]

[0031] [Figure 1] This is a cross-sectional view showing the overall layout and operating state of a pre-on auxiliary ignition device according to one embodiment of the present invention, coupled to an inductive toroidal remote plasma source. [Figure 2] This is a front cross-sectional view showing the play-on auxiliary ignition device according to the present invention. [Figure 3] This is a 3D cross-sectional view showing the pre-on auxiliary ignition device according to the present invention. [Figure 4] This is an exploded perspective view showing the pre-on auxiliary ignition device according to the present invention. [Modes for carrying out the invention]

[0032] The embodiments of the present invention will be described below with reference to the drawings. The proportions of each component in the drawings of the embodiments of the present invention are shown for the purpose of facilitating understanding of the explanation and are not the actual proportions. Furthermore, the proportions of the dimensions of the assemblies shown in the figures are for the purpose of explaining each component and its structure, and of course, the present invention is not limited to these. On the other hand, for the sake of ease of understanding, the same components in the following embodiments will be denoted by the same reference numerals.

[0033] Furthermore, unless otherwise specified, terms used throughout this specification and in the claims have the ordinary meanings of each term used in the art, in the materials disclosed herein, and in special contexts. Some terms used to describe the present invention are described below or elsewhere in this specification to provide additional guidance to those skilled in the art regarding the description of the present invention.

[0034] In this specification, the use of terms such as "first," "second," and "third" does not indicate a specific order or sequence, nor is it used to limit the present invention. It is used solely to distinguish components or operations described using the same technical terminology.

[0035] Next, wherever terms such as “includes,” “equip,” “possess,” and “contain” are used in this specification, they are all open terms. That is, they mean “includes” but “not limited to.”

[0036] This invention relates to a pre-on auxiliary ignition device for a plasma source system applied to semiconductor manufacturing equipment. To better understand the technical features, physical mechanism, and significant improvements over the prior art of this invention, a detailed explanation is provided below with specific illustrations. The plasma source in the above-mentioned plasma source system may be a remote plasma source (RPS) or a toroidal remote plasma source. For example, an inductive toroidal remote plasma source may be used.

[0037] First, refer to Figures 1 to 4. Figure 1 is a cross-sectional view showing the overall layout and operation of the pre-onization auxiliary ignition device according to the present invention, installed at the pre-onization gas inlet end of the plasma chamber of an inductive toroidal remote plasma source (for example, as shown in the annular passage at the bottom of Figure 1). Figures 2 and 3 are a front cross-sectional view and a 3D cross-sectional view showing the structure of the pre-onization auxiliary ignition device, respectively. Figure 4 is an exploded perspective view showing the pre-onization auxiliary ignition device according to the present invention. The pre-onization auxiliary ignition device 10 according to the present invention is provided, for example, at the pre-onization gas inlet end 112 of the plasma chamber 110 (e.g., an inductive annular plasma chamber) of the plasma source (e.g., an inductive toroidal remote plasma source) 100. The pre-onization auxiliary ignition device 10 according to the present invention assists the plasma source 100 in performing the plasma ignition procedure by performing a gas pre-onization procedure. The pre-onization auxiliary ignition device 10 according to the present invention comprises a dielectric flow tube 20 and at least one pre-onization electrode 30. The dielectric flow tube 20 has at least one gas passage inside, with a process gas inlet end 22 and a pre-onization gas outlet end 24. The dielectric flow tube 20 receives at least one process gas 200 via the process gas inlet end 22, and the process gas 200 enters the plasma chamber 110 of the plasma source 100 via the pre-onization gas outlet end 24. The process gas 200 is a molecular gas, an inert gas, or a mixture thereof. For example, molecular gases are, for example, oxygen gas (O2), nitrogen gas (N2), or nitrogen trifluoride (NF3), and inert gases are, for example, argon gas (Ar) or helium gas (He).

[0038] The pre-on electrode 30 according to the present invention is arranged to perform a gas pre-on procedure by applying a driving voltage, for example, to the process gas 200 flowing through the dielectric flow tube 20 in a capacitively coupled manner. To illustrate with an example, as shown in Figures 1 to 4, the pre-on electrode 30 is provided on the dielectric flow tube 20. The pre-on electrode 30 is attached to the outer circumferential surface of the dielectric flow tube 20, or adjacent to the dielectric flow tube 20, in a manner that does not contact the process gas 200. The pre-on electrode 30 may be provided so as to surround the dielectric flow tube 20 in the circumferential direction, or it may be provided on a part of the outer circumferential surface of the dielectric flow tube 20. The configuration is applicable to the present invention as long as the dielectric flow tube 20 can apply an electric field E (for example, a capacitively coupled electric field) to the process gas 200 flowing through the dielectric flow tube 20.

[0039] One of the features of this invention is that the pre-on electrode 30 is not provided inside the dielectric flow tube 20, but is provided outside the dielectric flow tube 20. With this configuration, the dielectric flow tube 20 functions as a physical barrier that reduces collisions of charged particles (i.e., sputtering effect) that occur on the metal electrode when driven at high voltage (HV) or during field effect, thereby suppressing the peeling of the electrode material in the form of metal particles and contamination of the process gas 200 in the plasma chamber 110. In the embodiment of this invention, the dielectric flow tube 20 can be made of any material having high insulation properties and resistance to plasma corrosion, but for example, quartz or silicon dioxide with a purity of more than 99% may be used. Specifically, in the gas pre-ionization procedure of the pre-ionization auxiliary ignition device according to this invention, the dielectric flow tube 20 may be a dielectric insulating layer (Dielectric Barrier) between the pre-ionization electrode 30 and the process gas 200 flowing inside the dielectric flow tube 20. As a result, the pre-ionization electrode 30 applies an electric field E to the process gas 200 in a capacitive coupling manner to constitute an externally mounted capacitive type pre-ionization structure. The gas pre-ionization procedure performed by the pre-ionization auxiliary ignition device according to this invention employs a capacitive pre-ionization mechanism and may therefore be called a capacitive ionization pre-ionization device (CIP). This allows the initial free charge density to be increased before the process gas 200 enters the plasma chamber 110 of the plasma source 100 (i.e., before or simultaneously with the plasma ignition procedure of the plasma source 100), ensuring that the plasma ignition procedure of the plasma source 100 proceeds smoothly.

[0040] The pre-on auxiliary ignition device 10 according to the present invention communicates with the plasma chamber 110 of the plasma source 100 via the dielectric flow tube 20. In one embodiment, the operating pressure range for the gas pre-on procedure is substantially the same as the operating pressure range for the plasma ignition procedure, covering a range of, for example, 1.5 Torr to 3 Torr. Alternatively, the operating pressure range for ignition of the plasma source covers an even wider pressure range, covering a range of, for example, 0.5 Torr to 10 Torr. In the experimental example below, it can be seen that the variation in ignition delay and ignition time of the pre-on auxiliary ignition device 10 according to the present invention relative to the plasma source 100 has been improved to within the operating pressure range of 1.5 Torr to 3 Torr. Of particular note is that the pre-on electrode 30 is not provided outside the dielectric flow tube 20 and does not come into direct contact with the process gas 200 inside the dielectric flow tube 20, thus offering greater freedom of choice in material selection. The pre-on electrode 30 according to the present invention can be made of various materials with high conductivity, such as copper (Cu), aluminum (Al), stainless steel (SUS), gold (Au), platinum (Pt), titanium (Ti), tungsten (W), graphite, or alloys of these metals, and their coating structures, but is not limited to these. The technical solution of the present invention is not practically limited to these. The pre-on electrode 30 may be a ring electrode, sleeve electrode, sheet electrode, arc electrode, semi-ring electrode, coil electrode, or a multi-plate electrode group in which multiple electrode sheets are arranged at regular intervals.

[0041] One of the features of this invention is that when the plasma source 100 performs a plasma ignition procedure, the pre-on auxiliary ignition device 10 according to this invention has the effect of assisting ignition. To illustrate with an example, the pre-on electrode 30 of the pre-on auxiliary ignition device 10 according to this invention is arranged to be electrically connected to, for example, the high voltage source 70 of the plasma source 100. The high voltage source 70 applies a drive voltage to the pre-on electrode 30 when an ignition control signal S is triggered. The high voltage source 70 is electrically connected to the control electrical circuit 80 of the plasma source 100, and the control electrical circuit 80 is arranged to control the application of a drive voltage to the pre-on electrode 30 by the ignition control signal S. The ignition control signal S is, for example, sent from the plasma source 100 and controls the signal for the plasma ignition procedure. Due to the drive voltage, the pre-on electrode 30 applies an electric field E to the process gas 200 flowing through the dielectric flow tube 20 in a capacitive coupling manner, thereby performing a gas pre-on procedure. As a result, the process gas 200 generates at least one initial free charge before entering the plasma chamber 110 of the plasma source 100 via the pre-on gas outlet end 24 of the dielectric flow tube 20, thereby forming a pre-on gas 210 with an initial free charge. Briefly, the timing of the gas pre-on procedure of the pre-on auxiliary ignition device 10 according to the present invention can be set according to the ignition control logic of the plasma source 100, the type of process gas, the operating pressure, or the idle time. Thus, the gas pre-on procedure is earlier than the plasma ignition procedure, or substantially synchronized with the plasma ignition procedure, but the present invention is not limited to a specific timing. "The gas pre-on procedure is earlier than the plasma ignition procedure, or substantially synchronized with the plasma ignition procedure" means that the start time of the gas pre-on procedure is not later than the start time of the plasma ignition procedure. That is, the gas pre-on procedure is already started before the plasma ignition procedure is started, or is started synchronously with the start of the plasma ignition procedure.

[0042] In the gas pre-onization procedure of the present invention, the drive voltage applied to the pre-onization electrode 30 may be a high-voltage, high-frequency, alternating current, or pulsed voltage signal. When the drive voltage is applied to the pre-onization electrode 30, the pre-onization electrode 30 applies an electric field E to the process gas 200 in a capacitive coupling manner via the dielectric flow tube 20. As a result, the pre-onization electrode 30 does not directly contact the process gas 200, but forms a capacitively coupled electric field with respect to the process gas 200 under high-voltage, high-frequency, alternating current, or pulsed driving conditions, thereby generating an initial free charge. In one embodiment, the magnitude of the drive voltage applied to the pre-onization electrode 30 is 100 volts (V) to 10,000 volts, preferably 500 volts to 3,000 volts. The drive frequency of the drive voltage is 10 Hz to 14 MHz, preferably 10 kHz to 500 kHz, or it may be the waveform of a specific high-voltage pulse. In practice, measuring instruments such as an oscilloscope can be used to observe the transient voltage waveform, control signal waveform, or plasma state signal waveform during ignition, confirming that the pre-on electrode 30 is exposed to a high-voltage pulse or AC electric field during ignition. However, the voltage, frequency, waveform, and rate of change mentioned above are merely examples of operating parameters, and the present invention is not limited to specific dU / dt values. As long as the process gas 200 in the dielectric flow tube 20 can be excited in a capacitive coupling manner to generate an initial free charge, all specific electric field operating parameters are applicable to the present invention, but the present invention is not limited to these.

[0043] The pre-onization auxiliary ignition device 10 according to the present invention can increase the density of initial free charge entering the plasma chamber 110 by performing a gas pre-onization procedure on the process gas 200, thereby transforming the process gas 200 into a pre-onized gas 210 having an initial free charge. Furthermore, with respect to the operating principle, the pre-onization auxiliary ignition device 10 according to the present invention may have a pre-onization convergence region 26 downstream of the pre-onized electrode 30. Specifically, the pre-onization convergence region 26 may be located downstream of the pre-onized electrode 30 along the flow direction of the process gas 200, and may also be designed as a section or functional region inside the gas passage of the dielectric flow tube 20 and outside the pre-onized gas outlet end 24 of the dielectric flow tube 20, and may, in some cases, be designed as an independent component or an additional chamber. Specifically, the pre-onization convergence region 26 may be located downstream of the pre-onization electrode 30 along the flow direction of the process gas 200, for example, inside the gas passage of the dielectric flow tube 20, in the region adjacent to the pre-onization gas outlet end 24 of the dielectric flow tube 20, in the region adjacent to the pre-onization gas inlet end 112 of the plasma chamber 110, or a combination thereof. This allows the pre-onization gas 210 with initial free charge to pass through. In terms of the physical mechanism, the pre-onization convergence region 26 is preferably the edge of the high-frequency induced electric field or high electric field generated by the RF inductive coupling module 50 adjacent to the periphery of the plasma chamber 110. This preferably accelerates the initial free charge in the pre-onization gas 210 to the high-frequency alternating electric field of the RF inductive coupling module 50 as it flows through the pre-onization convergence region 26 with the gas flow. This increases the possibility of collision with surrounding neutral gas molecules and ionization. For example, if the process gas 200 contains oxygen gas, oxygen molecules may be ionized by collision and undergo an ionization reaction (e.g., O2+e - →O2 + +2e -This generates ions, or other process gases generate ionization reactions with the same effect. This increases the density of initial free charge in the pre-onification convergence region 26. Thus, the pre-onification auxiliary ignition device 10 according to the present invention can increase the density of initial free charge entering the plasma chamber 110 of the plasma source 100, which helps to induce the avalanche effect and thereby enables a rapid and stable ignition effect.

[0044] Specifically, when the ignition control signal is triggered, the drive voltage is applied to the pre-on electrode 30, which then applies an electric field E to the process gas 200 in a capacitively coupled manner. This allows the gas pre-on procedure and the plasma ignition procedure of the plasma chamber 110 to establish a predefined timing relationship, generating an initial free charge before the process gas 200 enters the plasma chamber 110, or close to the ignition period of the plasma ignition procedure. With such a timing arrangement that places a common system signal at the core of the control, the present invention offers improved compatibility with various plasma source control architectures, and the gas pre-on procedure can flexibly respond to the actual ignition timing.

[0045] To address common problems in plasma ignition procedures, such as ignition delays, instability, and severe degradation when remote plasma sources are idle for extended periods, this invention allows for the selective introduction of intelligent trigger logic based on idle time. In one embodiment, a control electrical circuit determines the idle time of the plasma source 100 and controls the drive voltage applied to the pre-on electrode 30 of the high-voltage source 70 based on the idle time. The intelligent trigger logic may include one or a combination of the following implementation modes. The first is the active maintenance mode. In this mode, when the idle time of the plasma source 100 reaches or exceeds a preset value, the control electrical circuit 80 controls the high-voltage source 70 to apply the drive voltage to the pre-on electrode 30 and apply an electric field E to the process gas 200 to perform the gas pre-on procedure before initiating the plasma ignition procedure. This pre-generates or maintains an initial free charge for plasma ignition in the upstream or adjacent region of the pre-on gas inlet end 112 of the plasma chamber 110. The second is a conditional trigger mode. In this mode, the control electrical circuit 80 controls the high-voltage source 70 to apply the drive voltage to the pre-on electrode 30 and perform the gas pre-on procedure only when the idle time of the plasma source 100 reaches or exceeds the preset value, and the ignition control signal S is triggered. In another embodiment, the control electrical circuit 80 also controls the high-voltage source 70 to apply the drive voltage to the pre-on electrode 30 when the ignition control signal S is triggered, without requiring that the idle time be the preset value. The above-mentioned preset value for idle time is, for example, not shorter than 60 seconds, but the present invention is not limited thereto and may be set to 90 seconds, 260 seconds, 360 seconds, or more. It is particularly important to note that, based on actual process experience, if the plasma source 100 (e.g., a remote plasma source system) idles for a very long time, for example, not shorter than one day, the ignition delay in conventional designs can increase to 0.5 seconds or more. In such situations, the idle time-based trigger control logic of this invention allows for control of the timing of the application of the drive voltage, which helps to reduce the ignition failure rate after prolonged idling.

[0046] More specifically, the ignition control signal S for initiating the plasma ignition procedure of the plasma source 100, in a particular embodiment, further includes a first control signal and a second control signal. These control signals are sent from, for example, an external controller, a system main control electrical circuit, or a control module of the plasma source 100, and input to the control electrical circuit 80. The control electrical circuit 80 controls the high-voltage source 70 by the relative timing of the first and second control signals to apply a drive voltage to the pre-on electrode 30 and apply an electric field E to the pre-on electrode 30, and the timing of the ignition control of the plasma ignition procedure operates in conjunction with this timing. In one embodiment, the first control signal is a request signal indicating that the plasma ignition procedure will soon be initiated, but the present invention is not limited thereto. The second control signal is an active signal indicating that the plasma source 100 is permitted to enter or trigger the plasma ignition procedure, but the present invention is not limited thereto. This allows the control electrical circuit 80 to determine the timing at which the drive voltage is applied to the pre-on electrode 30 based on the relative timing of the first control signal and the second control signal.

[0047] Furthermore, the timing of applying a drive voltage to the pre-on electrode 30 and applying an electric field E to the process gas 200 may be earlier than the plasma ignition procedure of the plasma chamber 110, or substantially synchronized with the plasma ignition procedure. In one embodiment, the procedure of applying the drive voltage can be started after the generation of a first control signal or a second control signal, and can be maintained continuously until an annular plasma 220 is excited in the plasma chamber 110 and a plasma ignition confirmation signal is generated. The plasma ignition confirmation signal is, for example, a plasma-on confirmation signal, but the present invention is not limited thereto. In another embodiment, the duration of the gas pre-on procedure can be set by the ignition control logic of the plasma source 100, the type of process gas, the operating pressure, the idle time, or the ignition success determination method. The duration of the gas pre-on procedure may be shorter than, the same as, or longer than the duration of the plasma ignition procedure.

[0048] Through the signal interleaving relationship between the first control signal, the second control signal, the discharge state confirmation signal, and the drive voltage application state, the pre-on electrode 30 generates or increases an initial free charge on the upstream side of the flow before the process gas 200 enters the plasma chamber 110 via the pre-on gas outlet end 24, providing greater timing adjustment flexibility between the gas pre-on procedure and the plasma ignition procedure of the plasma chamber 110. According to this invention, the limitation that the pre-on procedure must be perfectly synchronized with the plasma ignition procedure of the plasma chamber 110 can be reduced, and the scope of application of this invention is also improved for control architectures of various plasma sources.

[0049] Refer to Figures 2, 3, and 4. The pre-onization auxiliary ignition device according to the present invention further selectively includes a connection portion 28. The connection portion 28 is detachably coupled between the pre-onization gas outlet end 24 of the dielectric flow tube 20 and the pre-onization gas inlet end 112 of the plasma chamber 110. Specifically, one side of the connection portion 28 (e.g., the top side) is detachably coupled to the dielectric flow tube 20, and the other side of the connection portion 28 (e.g., the bottom side) is detachably coupled to the pre-onization gas inlet end 112 of the plasma chamber 110 of the plasma source 100. Furthermore, it is preferable that the other side of the connection portion 28 (e.g., the bottom side) corresponds to the pre-onization gas inlet end 112 of the plasma chamber 110 of an existing plasma source 100 (e.g., a conventional plasma source). This design makes the entire pre-on auxiliary ignition device according to the present invention very convenient for on-site installation, maintenance, or partial replacement, and after coupling, the pre-on electrode 30 is located completely outside the plasma chamber 110, allowing for retrofitting without altering the internal structure of the plasma chamber 110. Specifically, the connection portion 28 includes, for example, a flange surface, bolt holes, bolt fastening portions, seal grooves, or seals, and can be detachably fixed to the pre-on gas outlet end 24 of the dielectric flow tube 20 and the pre-on gas inlet end 112 of the plasma chamber 110 by screwing, clamping, locking, or bolting, but the present invention is not limited thereto. As a result, the pre-on gas outlet end 24 of the dielectric flow tube 20 and the pre-on gas inlet end 112 of the plasma chamber 110 are in communication with each other.

[0050] See also Figures 2, 3, and 4. The pre-on auxiliary ignition device 10 according to the present invention further comprises a gas distribution housing 40. The gas distribution housing 40 is connected to the process gas inlet end 22 of the dielectric flow tube 20. At least one gas distribution plate 42 having a plurality of perforations is provided in the internal space of the gas distribution housing 40. As a result, the process gas 200 introduced from the gas distribution housing 40 is uniformly distributed and then guided into the gas passage of the dielectric flow tube 20. This prevents the flow field of the process gas 200 from becoming too concentrated or turbulent, and ensures uniformity of the electric field distribution when performing the gas pre-on procedure. Specifically, the gas distribution housing 40 is detachably coupled to the process gas inlet end 22 of the dielectric flow tube 20 by screwing, locking, clamping, pressing, sleevering, or bolting. Furthermore, a seal groove, seal ring, gasket, or other seal is provided between the gas distribution housing 40 and the dielectric flow tube 20 to maintain the airtightness of the dielectric flow tube 20 when the process gas 200 is introduced from the gas distribution housing 40.

[0051] Specifically, as shown in the configuration of Figures 2 and 3, the gas distribution plate 42 preferably includes a first gas distribution plate 42a and a second gas distribution plate 42b located downstream of the first gas distribution plate 42a. There is a predetermined distance between the first gas distribution plate 42a and the second gas distribution plate 42b. Consequently, a buffer chamber 44 is formed inside the gas distribution housing 40. When the process gas 200 enters the gas distribution housing 40, it passes sequentially through the first gas distribution plate 42a and the second gas distribution plate 42b, performing a two-stage flow branching, and the air pressure is stabilized in the buffer chamber 44. With this flow branching mechanism, the process gas 200 flows through the section of the dielectric flow tube 20 corresponding to the pre-on electrode 30 with a uniform and stable flow velocity and pressure cross-section. This can further improve the efficiency of initial free charge generation.

[0052] Refer to the geometric configuration shown in Figure 2. The gas distribution housing 40 has a first axial length L1 along its axial direction, and the dielectric flow tube 20 has a second axial length L2 along its axial direction. The first axial length L1 is the same as the overall axial length of the gas distribution housing 40 in the direction of process gas 200 flow, or the length of the main flow guide section, for example, the axial distance from its upstream side to its downstream side, or the length of the main flow diversion section defined by the first gas distribution plate 42a located upstream and the second gas distribution plate 42b located downstream. The second axial length L2 may be the distance of the dielectric flow tube 20 along the direction of process gas 200 flow from the process gas inlet end 22 to the pre-on gas outlet end 24. In another embodiment, the connection interface between the gas distribution housing 40 and the dielectric flow tube 20 consists of a stepped section, a socket section, or a sealed section, and L1 and L2 are defined by the axial lengths of their main flow guide sections, respectively. In one variation, the present invention optimizes the fluid field within the limited space of a semiconductor facility and improves pre-onization efficiency by making the first axial length L1 smaller than, for example, the second axial length L2, and the first axial length L1 may be, for example, half of the second axial length L2, or even, for example, 1 / 3 to 1 / 4. With such a ratio of lengths, the process gas 200 passes through a short path in the gas distribution housing 40, and after being divided at a stable pressure, the length of the flow section in the dielectric flow tube 20 is sufficient, and the density of the initial free charge can be increased by receiving the capacitively coupled electric field of the pre-onization electrode 30. In a preferred embodiment, the first axial length L1 of the gas distribution housing 40 is about 5 mm to 15 mm, preferably about 10.0 mm, and the second axial length L2 of the dielectric flow tube 20 is about 30 mm to 50 mm, preferably about 40.0 mm. Furthermore, the first axial length L1 and the second axial length L2 of this invention can be set to values ​​or ratios according to the actual equipment space and gas flow requirements.

[0053] Furthermore, the pre-on auxiliary ignition device 10 according to the present invention selectively includes at least one module fixing member 60. The module fixing member 60 is provided on the outer surface of the dielectric flow tube 20 and receives, positions, or fixes the pre-on electrode 30, thereby maintaining a predetermined positional relationship with the outer surface of the dielectric flow tube 20. This improves the assembly accuracy of the pre-on electrode 30 to the dielectric flow tube 20 and makes attachment, detachment, repair, or replacement of the pre-on electrode 30 more convenient. To prevent the pre-on electrode 30 from forming unintended conductive paths through the external fixing structure, the module fixing member 60 employs an insulating material, or an insulating separation structure is provided between the module fixing member 60 and the pre-on electrode 30. As a result, the pre-on electrode 30 does not form a short-circuit path via the module fixing member 60 and the metal case of the plasma source 100, the plasma chamber 110, or other grounding members. Furthermore, the module fixing member 60 is also positioned to be detachably fixed to the connection part 28, the pre-on electrode 30, the gas distribution housing 40, and the dielectric flow tube 20. As a result, the gas distribution housing 40, the dielectric flow tube 20, the pre-on electrode 30, and the connection part 28 form a detachable modular component, and the pre-on electrode 30 can maintain positional accuracy with respect to the dielectric flow tube 20 and the pre-on gas inlet end 112 of the plasma chamber 110.

[0054] Finally, refer to Figure 1. At least one RF inductive coupling module 50 is provided on the outer circumferential surface of the plasma chamber 110 of the plasma source 100 according to the present invention. The RF inductive coupling module 50 is for generating a high-frequency inductive electric field. When the pre-onized gas 210, which has an initial free charge, flows out of the dielectric flow tube 20 and enters the plasma chamber 110, the high-frequency inductive electric field accelerates the initial free charge (i.e., electrons and ions) entering the plasma chamber 110, triggering an avalanche process. This excites and forms a stable annular plasma 220 in the plasma chamber 110, providing an effect that allows for rapid ignition. In embodiments of the present invention, the RF inductive coupling module 50 may include a coil, winding, magnetic coupling member, magnetic core, or a combination thereof. However, the technical focus of the present invention is not to limit the specific internal structure of the RF inductive coupling module 50, but any configuration is acceptable as long as it can provide a high-frequency inductive electric field for igniting or maintaining the annular plasma 220 in the plasma chamber 110. The RF inductively coupled module 50 in Figure 1 is only schematically shown and may be a single module or multiple modular coupling units, and may be provided on the outer periphery of the plasma chamber 110 or adjacent to the plasma chamber 110, depending on the design of existing inductive toroidal remote plasma sources, and the present invention does not limit its number, location or internal configuration. Furthermore, the plasma chamber 110 may be an annular plasma chamber of an existing inductive toroidal remote plasma source, and its annular passage is used to form an annular plasma by allowing process gas or plasma to flow along a closed or substantially closed path and receiving RF induction combined with a high-frequency induction field provided by the RF inductively coupled module 50. However, the technical focus of the present invention is not limited to the structure of the annular chamber of the plasma chamber 110.The RF power applied by the plasma source 100 is, for example, 500 watts (W) to 10,000 watts, preferably 1,500 watts to 5,000 watts, and particularly preferably 2,500 watts, although the present invention is not limited thereto. Furthermore, its RF frequency is preferably 100 kHz to 60 MHz, and preferably 400 kHz to 13.56 MHz. The above power and frequency values ​​are merely examples, and in practice, all specific operating parameters can be adjusted according to process requirements. The present invention is not limited by any particular value.

[0055] To demonstrate that the ignition stability of this invention is improved compared to conventional designs, the following actual test data is presented. This test example compares the ignition time of a conventional OEM design with the ignition time of the pre-on auxiliary ignition device 10 according to this invention. Ignition time refers to the time interval from when the plasma ignition control signal is triggered until the plasma source 100 generates a discharge state confirmation signal that the system determines to have successfully ignited the system. However, this invention is not limited to a specific single-signal determination method. The above test conditions are as follows: RF power is set to 2,500 W, process gas is oxygen gas (O2), flow rate is 4,000 sccm, plasma duration is set to 3 seconds, and other process control conditions are fixed. Test idle times include 90 seconds, 260 seconds, and 360 seconds, and operating pressures include 1.5 Torr and 3 Torr. Under each test condition, this invention evaluates the average degree of ignition delay and ignition reproducibility by performing 10 consecutive ignition tests and calculating the average value (AVG) and population standard deviation (STDEVP) of ignition time. From the test results, it can be seen that good ignition stability is observed under conditions where the operating pressure is between 1.5 Torr and 3 Torr, and the idle time is long, such as between 90 and 360 seconds.

[0056] In detail, the conventional OEM design, under conditions of a long idle time of 360 seconds and an operating pressure of 3 Torr, experiences increased ignition time extension and variability due to the reduction in process gas adsorbed on the chamber walls. The average ignition time is 30.62 milliseconds, the maximum is 55.8 milliseconds, and the standard deviation of ignition time (STDEVP) is 10.12 milliseconds. Therefore, it can be seen that the reproducibility of ignition is more unstable. In contrast, with the pre-on auxiliary ignition device 10 of the present invention, under the same test conditions, the average ignition time is reduced to 19.37 milliseconds, the improvement in average time is approximately 37%, and the population standard deviation of ignition time (STDEVP) drops to 0.08 milliseconds. Therefore, the technical solution of the present invention not only shortens the ignition time but also effectively reduces ignition time variability, thereby improving ignition stability and ignition reproducibility during ignition with long idle times.

[0057] To more comprehensively illustrate the quantitative advantages mentioned above, the table below shows a complete quantitative comparison of the average time (AVG) and standard deviation (STDEVP) of the two designs after multiple ignition tests, for various idle time combinations (e.g., 90 seconds, 260 seconds, 360 seconds) and different operating pressures (e.g., 1.5 Torr, 3 Torr).

[0058] JPEG0003257497000002.jpg68145

[0059] As can be seen from the data in the table above, with conventional designs, the ignition delay and fluctuations become significant with increasing idle time or changes in pressure. In particular, with a long idle time of 360 seconds and a pressure of 3 Torr, the process gas adsorbed on the walls of the plasma chamber decreases, severely degrading ignition, and the standard deviation of the ignition time reaches 10.12 milliseconds. Conversely, with the pre-on auxiliary ignition device 10 of the present invention, under various operating conditions of different idle times and pressures, the ignition time is stably maintained in a lower range and is shortened compared to conventional designs (the improvement range is 14% to 37%), and most importantly, the standard deviation of the ignition time (STDEVP) is always stably within a very short range of 0.06 milliseconds to 0.17 milliseconds. This quantitative data fully demonstrates that the technical solution of the present invention can not only significantly reduce the ignition time but also effectively and stably overcome the adverse effects on ignition performance caused by long idle times in the system, and has a practical effect in solving a long-standing problem in the industry.

[0060] In particular, to further confirm that the hardware shape of the present invention itself (i.e., a short-path configuration in which the first axial length L1 of the gas distribution housing 40 is not greater than half the second axial length L2 of the dielectric flow tube 20) also has an independent improvement effect, the following presents test data from an independent control group under conditions in which high-pressure driving of the pre-on electrode 30 is not enabled. Under the same test conditions, for example, with an RF power of 2,500 W, an oxygen gas flow rate of 4,000 sccm, and other process control conditions fixed, 10 ignition tests were performed consecutively with a long idle time of 360 seconds and an operating pressure of 3 Torr. The quantitative comparison results are shown in the table below.

[0061] TIFF0003257497000003.tif78134

[0062] As can be seen from the comparative data above, under baseline conditions of high-pressure drive assistance without using the pre-on electrode 30, the geometric configuration of the gas distribution housing 40 and dielectric flow tube 20 according to the present invention reduces the standard deviation of ignition time from 4.89 milliseconds in the conventional OEM design to 0.11 milliseconds, and the average ignition time also decreases from 22.45 milliseconds to 19.33 milliseconds. As can be seen from these results, the arrangement of the gas distribution housing 40, dielectric flow tube 20, and their configuration relative to the pre-on gas inlet end 112 of the plasma chamber 110 helps to stabilize the gas flow field, improve the gas introduction position, and enhance the reproducibility of the plasma ignition procedure.

[0063] Therefore, the present invention has two technical effects. First, the basic stability of the plasma ignition timing is improved by improving the geometric configuration and gas introduction position. Second, by capacitively pre-oning the process gas 200 with the pre-on electrode 30, the initial free charge of the process gas 200 increases before it enters the plasma chamber 110, thereby assisting the subsequent plasma ignition procedure. By combining the above structural configuration and pre-oning procedure, the present invention can reduce variations in ignition time and improve ignition reproducibility in ignition scenarios after a long idle period.

[0064] Based on the hardware structure and operating mechanism of the above-described pre-on auxiliary ignition device 10, this invention also specifically discloses a pre-on auxiliary ignition method. This method assists the plasma source 100 in performing the plasma ignition procedure. This method mainly includes the following steps. First, at least one process gas 200 is received through the process gas inlet end 22 of the dielectric flow tube 20. The dielectric flow tube 20 has a process gas inlet end 22 and a pre-on gas outlet end 24. The process gas 200 is introduced into the plasma chamber 110 via the pre-on gas outlet end 24 through the dielectric flow tube 20. In this gas inlet process, the process gas 200 is further received through the gas distribution housing 40 and divided using the gas distribution plates 42 inside the gas distribution housing 40, for example, by performing a two-stage division using the first gas distribution plate 42a and the second gas distribution plate 42b, and then the pressure is stabilized in the buffer chamber 44. Next, by applying a driving voltage to the pre-on electrode 30 provided outside the dielectric flow tube 20, the pre-on electrode 30 applies an electric field E to the process gas 200 flowing through the dielectric flow tube 20 in a capacitive coupling manner, and performs the gas pre-on procedure.

[0065] Specifically, this gas pre-on procedure applies an electric field E to the process gas 200 using a capacitive coupling method, and its trigger control is selectively performed in one of the following ways. The first is to apply the drive voltage to the pre-on electrode 30 and apply the electric field E to the process gas 200 when the idle time of the plasma source 100 is not less than a preset value, thereby performing the gas pre-on procedure. This generates an initial free charge or maintains the density of the initial free charge. The second is to apply the drive voltage to the pre-on electrode 30 and apply the electric field E to the process gas 200 only when the idle time of the plasma source 100 is not less than a preset value, triggered by the ignition control signal S of the plasma ignition procedure. The third is to apply the drive voltage to the pre-on electrode 30 and apply the electric field E to the process gas 200 when the ignition control signal S of the plasma ignition procedure is triggered, regardless of whether the idle time of the plasma source 100 is greater than or equal to a preset value. As a result, before the process gas 200 enters the plasma chamber 110 of the plasma source 100, a pre-onized gas 210 with an initial free charge is formed, and the charge density increases in the pre-onization convergence region 26. Furthermore, the density of the initial free charge excited by the gas pre-onization procedure helps, in actual operation, trigger the process gas 200 to enter the avalanche process by the plasma source 100 under the subsequent action of the RF-induced electric field. Finally, the RF inductive coupling module 50 located on the outer periphery of the plasma chamber 110 of the plasma source 100 is used to generate an RF-induced electric field, accelerating the initial free charge entering the plasma chamber 110, thereby triggering the avalanche process and forming a stable annular plasma 220 within the plasma chamber 110.

[0066] The above description is merely illustrative and not limiting. Any equivalent modifications or changes made thereto, which do not deviate from the spirit and scope of this invention, are also included in the claims. [Explanation of symbols]

[0067] 10. Play-on auxiliary ignition device 20 Dielectric flow tubes 22 Process gas inlet end 24. Pre-on gas outlet end 26. Play-on convergence region 28 Connection part 30 Pre-on electrodes 40 Gas distribution housing 42 Gas distribution plate 42a First gas distribution plate 42b Second gas distribution plate 44 buffer chambers 50 RF Inductively Coupled Module 60 Module fixing members 70 High-voltage source 80 Control Electrical Circuits 100 Plasma Source 110 Plasma Chamber 112 Pre-on gas inlet end 200 process gases 210 Pre-on gas 220 Annular Plasma E electric field S Ignition control signal L1 First axial length L2 Second axial length

Claims

1. It is located at the inlet end of the plasma chamber of the plasma source, and assists the plasma source in performing the plasma ignition procedure. A dielectric flow tube for receiving at least one process gas, At least one pre-on electrode, Equipped with, The pre-ionized electrode is provided outside the dielectric flow tube, and the dielectric flow tube is a dielectric insulating layer between the pre-ionized electrode and the process gas flowing through the dielectric flow tube. The pre-ionized electrode is positioned to apply a driving voltage and a capacitively coupled electric field to the process gas flowing through the dielectric flow tube, thereby performing a gas pre-ionization procedure, and thereby forming a pre-ionized gas having at least one initial free charge before the process gas enters the plasma chamber via the dielectric flow tube. Play-on auxiliary ignition device.

2. The pre-onization auxiliary ignition device according to claim 1, characterized in that it has a pre-onization convergence region downstream of the pre-onization electrode along the flow direction of the process gas, the pre-onization convergence region allows the pre-onization gas having the initial free charge to pass through, and the density of the initial free charge in the pre-onization gas introduced into the plasma chamber can be increased.

3. The pre-on auxiliary ignition device according to claim 1, characterized in that the drive voltage is controlled to be applied to the pre-on electrode when the ignition control signal for the plasma ignition procedure is triggered, thereby performing the gas pre-on procedure.

4. The pre-on electrode is arranged to be electrically connected to a high-voltage source of the plasma source, and the high-voltage source applies the drive voltage to the pre-on electrode when the ignition control signal is triggered, as described in claim 3.

5. The pre-on auxiliary ignition device according to claim 4, characterized in that the high-voltage source is arranged to be electrically connected to the control electrical circuit of the plasma source, and the control electrical circuit is arranged to control the high-voltage source by the ignition control signal to apply the drive voltage to the pre-on electrode.

6. The pre-on auxiliary ignition device according to any one of claims 3 to 5, characterized in that the timing of applying the driving voltage to the pre-on electrode and the application of the electric field is substantially synchronized with the plasma ignition procedure.

7. The pre-on auxiliary ignition device according to any one of claims 3 to 5, characterized in that the driving voltage is applied to the pre-on electrode and the timing of applying the electric field is earlier than the plasma ignition procedure.

8. The pre-on auxiliary ignition device according to claim 5, wherein the control electrical circuit is further arranged to determine the idle time of the plasma source, and only when the idle time is greater than or equal to a preset value, the control electrical circuit controls the high-voltage source to apply the drive voltage to the pre-on electrode when the ignition control signal is triggered, thereby performing the gas pre-on procedure.

9. The pre-on auxiliary ignition device according to claim 5, further comprising a control electrical circuit configured to determine the idle time of the plasma source, and when the idle time is greater than or equal to a preset value, the control electrical circuit controls the high-voltage source to apply the drive voltage to the pre-on electrode before starting the plasma ignition procedure, thereby pre-generating or maintaining the initial free charge to be used in the plasma ignition procedure.

10. The pre-on auxiliary ignition device according to claim 8 or 9, characterized in that the preset value is 90 seconds, 260 seconds, or 360 seconds.

11. Furthermore, the pre-on auxiliary ignition device according to claim 1, further comprising a gas distribution housing, the gas distribution housing being provided in the dielectric flow tube, and at least one gas distribution plate having a plurality of perforations being provided inside the gas distribution housing, thereby distributing the process gas into the dielectric flow tube.

12. The pre-on auxiliary ignition device according to claim 11, wherein the gas distribution plate includes a first gas distribution plate and a second gas distribution plate located downstream of the first gas distribution plate, and a buffer chamber is formed between the first gas distribution plate and the second gas distribution plate, so that the process gas is divided in two stages via the first gas distribution plate and the second gas distribution plate, and the pressure is stabilized in the buffer chamber.

13. The pre-on auxiliary ignition device according to claim 11, characterized in that the gas distribution housing has a first axial length, the dielectric flow tube has a second axial length, and the first axial length is less than or equal to half of the second axial length.

14. Furthermore, the pre-onization auxiliary ignition device according to claim 11, characterized in that it further comprises a connecting portion, the connecting portion being provided between the dielectric flow tube and the pre-onization gas inlet end of the plasma chamber.

15. Furthermore, the pre-on auxiliary ignition device according to claim 14, further comprising at least one module fixing member, wherein the module fixing member is arranged such that the connection portion, the pre-on electrode, the gas distribution housing, and the dielectric flow tube are detachably fixed to each other, thereby forming a detachable modular component.

16. The pre-on auxiliary ignition device according to claim 1, wherein the plasma source is an inductive toroidal remote plasma source (RPS), and the plasma source has at least one RF inductive coupling module provided in the plasma chamber, thereby generating a high-frequency inductive electric field to accelerate the initial free charge entering the plasma chamber and triggering an avalanche process to form a plasma in the plasma chamber.

17. The pre-on auxiliary ignition device according to claim 1, characterized in that the dielectric flow tube is made of quartz or silicon dioxide with a purity of 99% or higher.

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