Method for producing aluminum nitride crystals
JP7599643B2Active Publication Date: 2024-12-16TOHOKU UNIV
Patent Information
- Application Number
- JP2020141981
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2020-08-25
- Publication Date
- 2024-12-16
- Estimated Expiration
- 2040-08-25
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Abstract
To provide a method for manufacturing an aluminum nitride crystal, capable of manufacturing an aluminum nitride crystal at a low cost and at a larger growth rate.SOLUTION: A method for manufacturing an aluminum nitride crystal comprises: a heating step of heating an Al containing alloy melt 7 at a temperature higher than the minimum temperature in a temperature range in which an aluminum nitride crystal is decomposed in the melt 7, in the state of contacting the Al containing alloy melt to an aluminum nitride containing sintered body; and a deposit step of depositing the aluminum nitride crystal in the melt 7 by reducing the melt 7 to a temperature equal to or higher than the liquidus temperature of the alloy and a temperature lower than the minimum temperature at which the aluminum nitride crystal is decomposed. The heating step and the deposit step are performed in an atmosphere including nitrogen.SELECTED DRAWING: Figure 2
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Citation Information
Patent Citations
Production of nitride crystal, mixture, liquid phase growth, nitride crystal, nitride crystal powder, and vapor growth
JP1999189498A
Manufacturing method of group iii nitride substrate, and semiconductor device
JP2004224600A
Production method for aln single crystal
JP2006306638A
Production method of aluminum nitride crystal
JP2019194133A
