X-ray analysis device

Abstract

This X-ray analysis device comprises: a spectroscopic crystal (140) that spectrally splits a characteristic X-ray generated by a sample irradiated with an excitation ray, into respective wavelengths; and a plurality of detection elements (151) arranged so as to detect the intensities in respective wavelengths spectrally split by the spectroscopic crystal (140). An angle ϕ between the direction of the characteristic X-ray spectrally split at a middle point (140M) of a surface (140A) of the spectroscopic crystal (140) and the direction in which the plurality of detection elements (151) are arranged is less than 80 degrees or is not less than 100 degrees.

Description

[Technical field]

[0001] The present disclosure relates to an X-ray analysis device. [Background technology]

[0002] The characteristic X-rays emitted by a sample irradiated with excitation rays have wavelengths determined by the elements contained in the sample. Therefore, by detecting the intensity of the characteristic X-rays at each wavelength, the composition of the sample can be determined. This method of detecting characteristic X-rays by measuring the intensity at each wavelength is called "wavelength dispersive type."

[0003] As an example of a wavelength dispersive X-ray analyzer, Japanese Patent Application Laid-Open No. 2017-223638 (Patent Document 1) discloses an X-ray analyzer capable of measuring the composition of a sample with high sensitivity by spectroscopy. In this X-ray analyzer, an excitation source irradiates an excitation ray to a sample, and the sample irradiated with the excitation ray generates characteristic X-rays. The generated characteristic X-rays pass through a slit and reach a spectroscopic crystal. As the characteristic X-rays pass through the slit, the angle of incidence of the characteristic X-rays on the spectroscopic crystal becomes different depending on the position where the characteristic X-rays are generated in the sample. The characteristic X-rays diffracted by the spectroscopic crystal reach a detector. The detector is composed of a plurality of detection elements arranged in a predetermined direction, and each of the plurality of detection elements detects the intensity of characteristic X-rays of different energies (hereinafter also referred to as "X-ray intensity") depending on the angle of incidence of the characteristic X-rays on the spectroscopic crystal. The X-ray analyzer generates an X-ray spectrum based on the X-ray intensity corresponding to the energy detected by each of the plurality of detection elements. Then, the X-ray analyzer analyzes the sample based on this X-ray spectrum. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2017-223638 A Summary of the Invention [Problem to be solved by the invention]

[0005] In the above-mentioned X-ray analysis device, in order to detect a wider energy range with a given number of detection elements, it is desirable to set the angle between the direction of the characteristic X-rays dispersed at the midpoint of the surface of the dispersing crystal and the arrangement direction of the multiple detection elements to 90 degrees. In addition, due to the problem of space for arranging the detection elements in the X-ray analysis device and the fact that the pitch of the detection elements varies depending on the detection energy, it may not always be possible to set it to 90 degrees. Even in such a case, the angle between the direction of the characteristic X-rays dispersed at the midpoint of the surface of the dispersing crystal and the arrangement direction of the multiple detection elements is set to be equal to or greater than 80 degrees and less than 100 degrees.

[0006] In addition, in the above-mentioned X-ray analysis device, it is desired to increase the number of measurement points to obtain a more accurate characteristic X-ray spectrum. This allows the peak position in the spectrum to be accurately identified and sample analysis to be performed with high accuracy. For this purpose, it is necessary to reduce the detection element pitch, and for example, it is possible to use multiple detection elements each having a short width by miniaturizing the detection element. However, the shorter the width of the detection element, the higher the dimensional accuracy must be achieved in the manufacturing stage of the detection element, and a problem may arise in that it becomes difficult to manufacture a miniaturized detection element from the viewpoint of manufacturing limitations and manufacturing costs.

[0007] The present invention has been made to solve these problems, and its object is to improve the accuracy of sample analysis without miniaturizing the detection element. [Means for solving the problem]

[0008] The X-ray analysis device of the present disclosure includes an excitation source, a dispersing crystal, and a plurality of detection elements. The excitation source irradiates an excitation ray onto a sample. The dispersing crystal separates characteristic X-rays generated by the sample irradiated with the excitation ray into wavelengths. The plurality of detection elements are arranged so as to detect the intensity of each wavelength dispersed by the dispersing crystal. The angle between the direction of the characteristic X-ray dispersed at the midpoint of the effective surface of the dispersing crystal and the arrangement direction of the plurality of detection elements is less than 80 degrees or equal to or greater than 100 degrees. The effective surface of the dispersing crystal is a portion where the characteristic X-rays incident on the effective area of ​​the detector are dispersed among the characteristic X-rays dispersed by the dispersing crystal. Effect of the Invention

[0009] According to the X-ray analysis device of the present disclosure, the angle between the direction of the characteristic X-rays dispersed at the midpoint of the effective surface of the dispersing crystal and the arrangement direction of the multiple detection elements is configured to be less than 80 degrees or greater than 100 degrees. Therefore, by using existing detection elements, the pitch of the multiple detection elements when viewed from the midpoint of the surface of the dispersing crystal can be shortened in a pseudo manner. Therefore, by using existing detection elements, the detection element pitch can be shortened in a pseudo manner, and as a result, the number of measurement points per unit wavelength can be increased, thereby improving the analysis accuracy of the sample. [Brief description of the drawings]

[0010] [Figure 1] 1 is a schematic configuration diagram of an X-ray analysis device according to an embodiment of the present invention. [Diagram 2] FIG. 2 is a diagram showing a schematic internal configuration of the device main body 10. [Diagram 3] FIG. 2 is a diagram showing an analyzing crystal and a detector of the X-ray analysis apparatus. [Figure 4] FIG. 2 shows the detector and direction P in the analysis device when the angle φ is 90 degrees. [Diagram 5] 2 is a diagram showing a detector and a direction P in the X-ray analysis apparatus of the present embodiment. FIG. [Figure 6] FIG. 1 shows a portion of an X-ray spectrum. [Figure 7]13 is a configuration example of an apparatus main body in an analysis apparatus according to a second embodiment. [Figure 8] 13 is an example of a table showing the relationship between the width of a wavelength range input by a user and an angle φ. [Figure 9] 13 is an example of a table showing the relationship between a mode input by a user and an angle φ. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, the embodiments of the present invention will be described in detail with reference to the drawings. The same or corresponding parts in the drawings are given the same reference numerals and their description will not be repeated. In addition, with regard to the embodiments and modified examples, it is planned from the beginning of the application that the configurations described in the embodiments may be appropriately combined within the scope of no inconvenience or contradiction, including combinations not mentioned in the specification.

[0012] [First embodiment] The X-ray analysis apparatus according to this embodiment is an X-ray analysis apparatus equipped with a wavelength-dispersive spectroscope. In the following, a wavelength-dispersive X-ray fluorescence analysis apparatus will be described as an example of the X-ray analysis apparatus according to this embodiment. The "wavelength-dispersive type" is a method of detecting a characteristic X-ray spectrum by dispersing characteristic X-rays using a dispersing element and measuring the characteristic X-ray intensity for each target wavelength. Fig. 1 is a schematic diagram of the configuration of the X-ray analysis apparatus according to this embodiment (hereinafter also referred to as "analysis apparatus 100").

[0013] Referring to FIG. 1, the analysis device 100 has an apparatus main body 10 and a signal processing device 20. The apparatus main body 10 is configured to irradiate an excitation ray to a sample and detect characteristic X-rays generated from the sample. The excitation ray is typically an X-ray. A detection signal corresponding to the characteristic X-ray detected by the apparatus main body 10 is transmitted to the signal processing device 20. The signal processing device 20 has a controller 22, and a display 24 and an operation unit 26 connected to the controller 22. The signal processing device 20 controls the operation of the apparatus main body 10. The signal processing device 20 is configured to analyze the detection signal transmitted from the apparatus main body 10 and display a result based on the analysis on the display 24. The display 24 is configured to be a liquid crystal panel capable of displaying an image or the like. The operation unit 26 accepts an operation input by a user to the analysis device 100. The operation unit 26 is typically configured to be a touch panel, a keyboard, a mouse, or the like.

[0014] The controller 22 has, as its main components, a processor 30, a memory 32, a communication interface (I / F) 34, and an input / output I / F 36. These components are connected to each other via a bus so as to be able to communicate with each other.

[0015] The processor 30 is typically an arithmetic processing unit such as a CPU (Central Processing Unit) or an MPU (Micro Processing Unit). The processor 30 reads and executes a program stored in the memory 32 to control the operation of each part of the analysis device 100. Specifically, the processor 30 executes the program to realize analysis processing of the detection signal transmitted from the device body 10. Note that, although the example of FIG. 1 illustrates a configuration with a single processor, the controller 22 may have a configuration with multiple processors.

[0016] The memory 32 is realized by a non-volatile memory such as a random access memory (RAM), a read only memory (ROM), a flash memory, etc. The memory 32 stores programs executed by the processor 30, data used by the processor 30, etc.

[0017] The input / output I / F 36 is an interface for transmitting various types of data between the processor 30 and the display 24 and operation unit 26 .

[0018] The communication I / F 34 is a communication interface for exchanging various data with the device main body 10, and is realized by an adapter, a connector, etc. The communication method may be a wireless communication method using a wireless LAN (Local Area Network) or the like, or a wired communication method using a USB (Universal Serial Bus) or the like.

[0019] Fig. 2 is a diagram showing a schematic internal configuration of the apparatus body 10. Referring to Fig. 2, the apparatus body 10 has a sample holder 110 for holding a sample S, an excitation source 120, a slit 130, an analyzing crystal 140, and a detector 150.

[0020] The excitation source 120 is an X-ray source that irradiates the sample S with X-rays, which are excitation light (excitation rays). An electron beam source may be used instead of the X-ray source. In FIG. 2, the surface of the sample holder 110 on which the sample S is held is the XY plane, and the irradiation direction of the excitation rays from the excitation source 120 is the Z-axis direction. The sample S may be any of solid, liquid, and gas, and a sample holder 110 suitable for the state of the sample S is used.

[0021] The excitation light emitted from the excitation source 120 is irradiated onto the surface of the sample S. This causes characteristic X-rays to be emitted from the sample S. In the example of Fig. 2, the excitation light is irradiated perpendicularly to the surface of the sample S, but the excitation light may be irradiated at an oblique angle to the surface of the sample S.

[0022] The analyzing crystal 140 is made of, for example, a silicon single crystal, a lithium fluoride single crystal, or a germanium single crystal. In the analyzing crystal 140, a specific crystal plane is parallel to the surface of the crystal. Only the specific crystal plane can be used to detect characteristic X-rays, and it is possible to prevent erroneous detection of characteristic X-rays that are Bragg-reflected by other crystal planes. The detector 150 has a plurality of detecting elements 151 arranged along a predetermined arrangement direction. For convenience, the number of detecting elements 151 is nine in FIG. 2, but in reality, the number is, for example, 1000 or more. The detecting elements 151 are made of, for example, silicon or the like.

[0023] When the surface of the sample S is irradiated with excitation rays from the excitation source 120 while the sample S is held by the sample holder 110, characteristic X-rays are emitted from the sample S. The emitted characteristic X-rays have different wavelengths depending on the elements constituting the sample S. The characteristic X-rays emitted by irradiating the region from position A1 to position A2 with the excitation rays emitted from the excitation source 120 pass through the slit 130 and reach the analyzing crystal 140. In FIG. 2, the characteristic X-rays generated at positions A1 and A2 are shown by dashed lines as an example. Position A2 is located in the positive direction of the X-axis from position A1. Moreover, the irradiation region at position A1 and the irradiation region at position A2 both extend in the Y-axis direction.

[0024] If the angle between the dispersing crystal 140 and the incident characteristic X-rays is θ, the incident angle of the characteristic X-rays is (90-θ) degrees. Due to the arrangement angle between the surface of the sample S fixed to the sample holder 110 and the surface of the dispersing crystal 140, the characteristic X-rays emitted at position A1 are incident on the dispersing crystal 140 at an incident angle of (90-θ1) degrees, and the characteristic X-rays emitted at position A2 are incident on the dispersing crystal 140 at an incident angle of (90-θ2) degrees. In other words, by passing through the slit 130, the incident angle of the characteristic X-rays on the dispersing crystal 140 can be made to differ depending on the generation position of the characteristic X-rays on the sample S.

[0025] Of the characteristic X-rays incident on the dispersing crystal 140 from the sample S at an incident angle of (90-θ) degrees, only the characteristic X-rays having a wavelength that satisfies the Bragg condition equation, λ=(2d / n)sinθ (λ is the wavelength of the characteristic X-ray, d is the crystal plane spacing of the dispersing crystal 140, and n is the order), are diffracted by the dispersing crystal 140 and reach the detector 150. In this embodiment, the slit 130, the dispersing crystal 140, and the detector 150 are fixed, but are configured so that the characteristic X-rays having a wavelength that satisfies the Bragg condition equation within the range of θ2<θ<θ1 are diffracted by the dispersing crystal 140 and reach the detector 150.

[0026] Since the characteristic X-rays diffracted by the analyzing crystal 140 are emitted at the same angle as the incident angle, the Bragg-reflected characteristic X-rays are detected by the detecting element 151 arranged at a position corresponding to the emission angle among the multiple detecting elements 151. Specifically, in the example of Fig. 2, among the characteristic X-rays emitted from position A1, characteristic X-rays that satisfy wavelength λ1 = (2d / n) sin θ1 are shown. Also, among the characteristic X-rays emitted from position A2, characteristic X-rays that satisfy wavelength λ2 = (2d / n) sin θ2 are shown.

[0027] In this way, characteristic X-rays with wavelengths that satisfy the Bragg conditions for different diffraction angles are detected for each of the multiple detection elements. In other words, the analysis device 100 can recognize the wavelengths contained in the characteristic X-rays by knowing the detection element from which the characteristic X-rays were detected. Meanwhile, the wavelengths of the characteristic X-rays differ for each element. Therefore, the analysis device 100 can analyze the sample (for example, identify the elements contained in the sample) by identifying the detection element from which the characteristic X-rays were detected in the detector 150.

[0028] As described above, the device body 10 separates the characteristic X-rays generated by the sample irradiated with the excitation beam and detects the intensity for each wavelength. The device body 10 transmits the intensity for each of the multiple detection elements to the signal processing device 20. The signal processing device 20 can acquire an X-ray spectrum in which the energy corresponding to the wavelength of the characteristic X-ray detected by each of the multiple detection elements and the intensity of the characteristic X-ray corresponding to the energy are associated with each other. Note that, for the energy E and the wavelength λ, the formula E=hc / λ holds (h is Planck's constant, and c is the speed of light). Then, the signal processing device 20 can compare the X-ray spectrum of a known sample with the acquired X-ray spectrum to analyze the sample (for example, identify the elements contained in the sample). Note that the midpoint 140M, midpoint 150M, detection surface 150V, and angle φ in FIG. 2 will be described in FIG. 3.

[0029] 3 is a diagram showing the slit 130, the dispersing crystal 140, and the detector 150 of the analysis device 100 of this embodiment. For convenience, the orientations of the slit 130, the dispersing crystal 140, and the detector 150 are changed in FIG. 3 from those in FIG.

[0030] As shown in FIG. 3, the surface of the dispersing crystal 140 is hereinafter referred to as "surface 140A" (see also FIG. 2). The surface 140A is a surface perpendicular to the arrangement direction S of the crystal planes of the dispersing crystal 140. A portion of the surface 140A within a range in which the characteristic X-rays incident on the effective area of ​​the detector are dispersed is referred to as "effective surface 140A1". A point symmetrical to the center 130M of the opening of the slit 130 with respect to an extension line Q of the surface 140A is referred to as "symmetric point 130L". In addition, the midpoint (a point at the center) of the effective surface 140A1 of the dispersing crystal 140 is referred to as "midpoint 140M". The detection surface where the characteristic X-rays diffracted by the dispersing crystal 140 are detected, that is, the detection effective area of ​​the detector 150 is referred to as "detection surface 150V". The midpoint of detection surface 150V in arrangement direction T of multiple detection elements 151 (a point at the center of detection surface 150V) is referred to as "midpoint 150M." Midpoint 140M and midpoint 150M are the midpoint of effective surface 140A1 and the midpoint of detection surface 150V when viewed in a plan view from the extension direction of surface 140A (the Y-axis direction shown in FIG. 2). The distance between center lines of detection elements 151 is referred to as "width L." Width L is also referred to as "detection element pitch."

[0031] The direction from the midpoint 140M to the midpoint 150M is referred to as "direction P". In this embodiment, the symmetric point 130L, the midpoint 140M, and the midpoint 150M are configured to be located on a straight line along the direction P. The detector 150 is arranged so that the angle φ between the arrangement direction T and the direction P is in the range of less than 80 degrees or more than 100 degrees. In this embodiment, the angle φ and the detector 150 are fixed. The angle φ is also the angle between the traveling direction (i.e., direction P) of the characteristic X-ray diffracted at the midpoint 140M and the arrangement direction T. The reason for setting the angle φ to less than 80 degrees or more than 100 degrees will be described later. As shown in FIG. 2, the angle between the direction (direction P) of the characteristic X-ray diffracted (dispersed) at the midpoint 140M of the effective surface 140A1 of the dispersing crystal and the arrangement direction T of the multiple detection elements is the angle φ. In the example of FIG. 2, the position at which the characteristic X-rays dispersed at the midpoint 140M reach the plurality of detecting elements 151 is the midpoint 150M.

[0032] In order to improve the accuracy of the analysis of a sample by the analytical device 100, it is desirable to increase the number of measurement points in the characteristic X-ray spectrum, that is, to improve the accuracy of peak fitting of the X-ray intensity.

[0033] In order to increase the number of measurement points in the characteristic X-ray spectrum, it is possible to shorten the distance L between the center lines of the detection elements 151. However, in the process of manufacturing the detection elements, if the detection element pitch L is reduced, higher dimensional accuracy is required. In order to achieve high dimensional accuracy, the manufacturing cost generally increases. Furthermore, depending on the required dimensional accuracy, there may be cases where the detection elements themselves cannot be manufactured due to problems such as limitations in the machining accuracy of parts.

[0034] In consideration of such problems, the analyzer 100 of this embodiment employs a configuration in which the detector 150 is disposed with respect to the dispersing crystal 140 so that the angle φ described in Fig. 3 is less than 80 degrees or equal to or greater than 100 degrees. It is also possible to employ a configuration in which the detector 150 is disposed with respect to the dispersing crystal 140 so that all of the straight lines connecting the surface 140A of the dispersing crystal 140 and the detection surface 150V are less than 80 degrees or equal to or greater than 100 degrees.

[0035] This allows the detection element pitch L in the radiation direction of the diffracted characteristic X-rays to be artificially reduced. Therefore, in the X-ray analysis device of this embodiment, although the energy range to be measured is reduced, it is possible to increase the number of measurement points per unit wavelength (or per unit energy) in the characteristic X-ray spectrum while using detection elements of existing sizes. Note that the unit wavelength refers to a wavelength of a predetermined length. Also, the unit energy refers to energy of a predetermined magnitude.

[0036] Next, the reason why the number of measurement points increases will be described in detail with reference to Figs. 4 and 5. Fig. 4 is a diagram showing the detector 150 and the direction P in an analysis device (hereinafter also referred to as "comparative X-ray analysis device") when the angle φ is π / 2. As shown in Fig. 4, the pitch of the detection elements 151 when viewed from the direction P (the direction from the midpoint 140M to the midpoint 150M) is a width L. Fig. 5 is a diagram showing the detection elements 151 and the direction P in the X-ray analysis device of this embodiment. As shown in Fig. 5 (also see Fig. 2), the angle φ between the direction P and the detection surfaces 150V of the multiple detection elements 151 is an angle different from π / 2, and is less than 80 degrees and equal to or greater than 100 degrees. Therefore, the width of the detection elements 151 when viewed from the direction P is L1 (=Lsinφ). Therefore, the pitch of the detection elements 151 can be shortened in a pseudo manner, and as a result, although the energy range to be detected is reduced when the detector 150 is viewed as a whole, a predetermined energy range (energy range E3 to E4 in FIG. 6(B) described below) is detected by more detection elements 151, and the number of measurement points in the spectrum can be increased. As a result, the analysis device 100 can perform analysis with higher accuracy.

[0037] For example, if φ=π / 6, then L1=Lsin(π / 6)=L / 2. If φ=π / 4, then L1=Lsin(π / 4)=L / (√2). If φ=π / 3, then L1=Lsin(π / 3)=(L√3) / 2.

[0038] As described above, the angle φ is an angle that falls within the range of less than 80 degrees or equal to or greater than 100 degrees. In particular, a configuration in which the angle φ is an angle that falls within the range of less than 70 degrees or equal to or greater than 120 degrees may be adopted. By adopting such a configuration, the number of measurement points can be further increased. Furthermore, a configuration in which the angle φ is 30 degrees may be adopted. By adopting such a configuration, the number of measurement points can be doubled in the above-mentioned predetermined energy range, compared to the case in which the angle φ is 90 degrees.

[0039] Fig. 6 is a diagram showing a portion of an X-ray spectrum. In the example of Fig. 6, the vertical axis indicates the intensity of characteristic X-rays, and the horizontal axis indicates the energy of characteristic X-rays. Fig. 6(A) is a diagram showing a portion of an X-ray spectrum of an analysis device of a comparative example (analysis device with angle φ=90 degrees). Fig. 6(B) is a diagram showing a portion of an X-ray spectrum of analysis device 100 of the present embodiment when angle φ=π / 6.

[0040] In the example of Fig. 6(A), the detection element pitch as viewed from direction P is width L, and the interval of detection energy corresponding to width L is Ea. Also, Fig. 6(A) shows X-ray intensities P1 to P8 in the energy range E1 to E2. Also, Fig. 6(B) shows X-ray intensities P11 to P18 in the energy range E3 to E4. Note that the energy range E3 to E4 is smaller than the energy range E1 to E2.

[0041] In the X-ray spectrum of FIG. 6(B), the pitch of the detection elements 151 as viewed from the direction P is set to a pseudo width of L / 2. Therefore, the energy detection range is half that of FIG. 6(A), but the analysis device 100 can create a characteristic X-ray spectrum with twice the number of measurement points. For example, in FIG. 6(A), the number of measurement points in that energy range is four, with X-ray intensities P3 to P6, but Figure 6(B) In this case, the number of measurement points is eight, with X-ray intensities P11 to P18.

[0042] For example, the area detected by one detection element in Fig. 6(A) is detected by two adjacent detection elements in Fig. 6(B). That is, for example, X-ray intensity P5 in Fig. 6(A) is the sum of X-ray intensity P15 and X-ray intensity P16 in Fig. 6(B).

[0043] In addition, in the range shown in FIG. 6, the peak is actually located at the energy of P16 as shown in FIG. 6(B). However, in the case of FIG. 6(A), it is shown as P5, which is a position shifted from P16. In this way, the analysis device 100 of this embodiment can create a characteristic X-ray spectrum with a larger number of measurement points by reducing the pitch of the detection elements 151 as viewed from the direction P (in a plan view). In other words, the analysis device 100 of this embodiment can perform a more accurate analysis. This makes it possible to accurately identify the peak position.

[0044] As described above, in the analysis device 100 of this embodiment, the number of measurement points can be increased by setting the angle φ to less than 80 degrees or to 100 degrees or more. Therefore, the analysis device 100 of this embodiment can perform a more accurate analysis using an existing detection element.

[0045] In addition, when φ is less than 80 degrees or 100 degrees or more, the amount of characteristic X-rays entering one detection element is small, so the intensity of the characteristic X-rays detected by each detection element is lower than when φ is π / 2. More specifically, when φ is less than 80 degrees or 100 degrees or more, the intensity of the characteristic X-rays detected by one detection element is sinφ times the intensity of the characteristic X-rays detected by one detection element when the angle φ is π / 2. In other words, the smaller the angle φ, the lower the X-ray intensity detected by one detection element, so if the angle φ is made too small, it may become difficult to detect a peak. In addition, since the entire detection range of the detector 150 becomes narrower, it is necessary to increase the number of detection elements in order to detect the same range. In other words, it is preferable to determine the angle φ in consideration of the desired number of measurement points, the X-ray intensity detected by one detection element, and the cost.

[0046] [Second embodiment] In the first embodiment, an example has been described in which detector 150 and angle φ are fixed. In the analysis device 100 of the second embodiment, a configuration in which angle φ is changeable will be described.

[0047] Fig. 7 shows an example of the configuration of the device body 10A in the analysis device of the second embodiment. As shown in Fig. 7, the device body 10A includes a driving device 170 that drives the detector 150 (multiple detection elements 151). The driving device 170 is controlled by the signal processing device 20.

[0048] A user may know the wavelength range of characteristic X-rays generated by a sample S because the user knows the elements of the sample S. In consideration of such a case, the signal processing device 20 of the present embodiment can receive an input of a wavelength range (or energy range) used in the signal processing device 20 from the user. The signal processing device 20 displays an X-ray spectrum in an energy range corresponding to the input wavelength range, but does not display an X-ray spectrum in an energy range corresponding to a wavelength range other than the input wavelength range. Therefore, the analysis device 100 displays only an X-ray spectrum in a wavelength range desired by the user, and therefore can avoid displaying X-ray spectra unnecessary for the user.

[0049] 6, when the angle φ is equal to or greater than 80 degrees and less than 100 degrees, the detected wavelength range (or energy range) becomes wider, whereas when the angle φ is less than 80 degrees and equal to or greater than 100 degrees, the number of measurement points increases. In this embodiment, the angle φ is set to an angle of 90 degrees or less.

[0050] Therefore, the larger the wavelength range width Δλ input by the user, the larger the angle φ is driven by the driving device 170 to drive the detector 150. The wavelength range width Δλ is the difference between the maximum wavelength and the minimum wavelength in the wavelength range. FIG. 8 is an example of a table showing the relationship between the wavelength range width Δλ and the angle φ for the wavelength range input by the user. This table is stored in, for example, the memory 32. In FIG. 8, S1 <S2<S3<S4であり、φ1<φ2<φ3である。

[0051] In the example of FIG. 8, when the wavelength range width Δλ of the input wavelength range satisfies S1 ≦ wavelength range width Δλ < S2, the signal processing device 20 controls the driving device 170 so that the angle φ becomes the angle φ1. When the wavelength range width Δλ of the input wavelength range satisfies S2 ≦ wavelength range width Δλ < S3, the signal processing device 20 controls the driving device 170 so that the angle φ becomes the angle φ2. When the wavelength range width Δλ of the input wavelength range satisfies S3 ≦ wavelength range width Δλ < S4, the signal processing device 20 controls the driving device 170 so that the angle φ becomes the angle φ3.

[0052] In the present embodiment, the signal processing device 20 controls the driving device 170 so that the value (angle) corresponds to the width of the wavelength range input by the user. More specifically, the larger the wavelength range width Δλ, the larger the angle φ becomes. That is, when the input wavelength range width Δλ is large, the signal processing device 20 can increase the wavelength range (energy range) by increasing the angle φ (making the angle φ 90 degrees or a value close to 90 degrees) (see FIG. 6(A)). On the other hand, when the input wavelength range width Δλ is small, the signal processing device 20 can improve the analysis accuracy by increasing the number of measurement points in this wavelength range by decreasing the angle φ. Therefore, in the analyzer of the present embodiment, analysis corresponding to the wavelength range desired by the user can be executed.

[0053] [Third Embodiment] As described above, when the angle φ is equal to or greater than 80 degrees and less than 100 degrees, the wavelength range (or energy range) to be detected is widened, whereas when the angle φ is less than 80 degrees and equal to or greater than 100 degrees, the number of measurement points per unit wavelength (or per unit energy) is increased (see FIG. 6). In view of this, in the third embodiment, the user can select one of a plurality of modes including the first mode and the second mode by operating the operation unit 26. The signal processing device 20 sets the selected mode. For example, the signal processing device 20 stores a mode flag indicating the mode selected by the user in the memory 32. For example, when the first mode is selected, the signal processing device 20 stores the first mode flag in the memory 32. Also, when the second mode is selected, the signal processing device 20 stores the second mode flag in the memory 32.

[0054] FIG. 9 is a diagram showing the first mode and the second mode. As shown in FIG. 9, the first mode is a mode in which the energy detection range is expanded more than that of the second mode. In the first mode, the angle φ is angle φ1. The angle φ1 is any angle in the range of 80 degrees or more and less than 100 degrees. The angle φ1 is, for example, 90 degrees. Also, the second mode is a mode in which the number of measurement points can be increased more than that of the first mode. In the second mode, the angle φ is angle φ2. The angle φ2 is any angle in the range of less than 80 degrees and greater than or equal to 100 degrees. The angle φ2 is, for example, 30 degrees.

[0055] According to the third embodiment, the user can select between the first mode in which the detection range is expanded and the second mode in which the number of measurement points is increased, thereby improving user convenience.

[0056] In the second and third embodiments, the signal processing device 20 controls the driving device 170 so as to automatically change the angle φ. However, the user may control the driving device 170 by operating the operation unit 26. With such a configuration, the angle φ can be set to an angle desired by the user.

[0057] [Aspects] It will be appreciated by those skilled in the art that the exemplary embodiments described above are examples of the following aspects.

[0058] (Item 1) An X-ray analysis apparatus according to one embodiment includes an excitation source that irradiates an excitation ray onto a sample, a dispersing crystal that disperses characteristic X-rays generated by the sample irradiated with the excitation ray into separate wavelengths, and a plurality of detection elements arranged so as to detect the intensity of each wavelength dispersed by the dispersing crystal, wherein the angle between the direction of the characteristic X-rays dispersed at the midpoint of the effective surface of the dispersing crystal and the arrangement direction of the plurality of detection elements is less than 80 degrees or greater than 100 degrees.

[0059] According to the X-ray analysis device of the first aspect, the number of measurement points in the characteristic X-ray spectrum can be increased, and therefore the energy resolution of the characteristic X-rays can be improved.

[0060] (Item 2) In the X-ray analysis apparatus of item 1, the angle is less than 70 degrees or greater than or equal to 120 degrees.

[0061] According to the X-ray analysis device of the second aspect, the number of measurement points in the characteristic X-ray spectrum can be increased, and therefore the energy resolution of the characteristic X-rays can be improved.

[0062] (Item 3) In the X-ray analysis apparatus of item 1, the angle is 30 degrees. According to the X-ray analysis apparatus of the second aspect, the number of measurement points can be doubled compared to the characteristic X-ray spectrum in which the angle is 90 degrees as described above.

[0063] (Item 4) The X-ray analysis apparatus according to any one of items 1 to 3, further comprising a drive device that moves the plurality of detection elements so as to change the angle.

[0064] According to the X-ray analysis apparatus of the fourth aspect, it is possible to prevent the same characteristic X-ray from being detected by a plurality of detection elements.

[0065] (Item 5) The X-ray analysis apparatus of item 4 further includes a signal processing device that analyzes the sample based on the intensities of each wavelength detected by the multiple detection elements and controls the drive device, and the signal processing device receives input of a wavelength range for analyzing the sample from a user, analyzes the sample based on the intensities of each wavelength included in the input wavelength range among the intensities of each wavelength detected by the multiple detection elements, and moves the multiple detection elements by controlling the drive device so that the angle becomes a value corresponding to the width of the wavelength range input by the user.

[0066] According to the X-ray analysis apparatus of the fifth aspect, it is possible to control the angle according to the wavelength range input by the user.

[0067] (Clause 6) The apparatus comprises an excitation source which irradiates an excitation ray onto a sample, a dispersing crystal which disperses characteristic X-rays generated by the sample irradiated with the excitation ray into separate wavelengths, a plurality of detecting elements arranged so as to detect the intensity of each wavelength dispersed by the dispersing crystal, a driving device which moves the plurality of detecting elements so as to change the angle between the direction of the characteristic X-rays dispersed at the midpoint of the effective surface of the dispersing crystal and the arrangement direction of the plurality of detecting elements, and a control device which sets a first mode and a second mode, wherein when the first mode is set, the driving device moves the plurality of detecting elements so that the angle is within the range of 80 degrees or more and less than 100 degrees, and when the second mode is set, the driving device moves the plurality of detecting elements so that the angle is within the range of less than 80 degrees and 100 degrees or more.

[0068] According to the X-ray analysis apparatus of the sixth aspect, it is possible to control the angle according to the mode input by the user.

[0069] The embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. The scope of the present invention is defined by the claims, not the above description, and is intended to include all modifications within the meaning and scope of the claims. [Explanation of symbols]

[0070] 10, 10A apparatus main body, 20 signal processing device, 22 controller, 24 display, 26 operation unit, 30 processor, 32 memory, 100 analyzer, 110 sample holder, 120 excitation source, 130 slit, 130L symmetry point, 130M central part, 140 analyzing crystal, 140A surface, 150 detector, 151 detection element.

Claims

1. an excitation source for irradiating an excitation beam onto a sample; an analyzing crystal for dispersing characteristic X-rays generated by a sample irradiated with the excitation beam into individual wavelengths; a plurality of detection elements arranged so as to detect the intensity of each of the wavelengths separated by the analyzing crystal; the characteristic X-rays dispersed at the midpoint of the effective surface of the analyzing crystal reach the midpoints of the detection surfaces of the plurality of detecting elements; an angle between a direction of the characteristic X-rays dispersed at the midpoint of the effective surface of the analyzing crystal and an arrangement direction of the plurality of detecting elements is less than 80 degrees or greater than 100 degrees.

2. The X-ray analysis apparatus according to claim 1 , wherein the angle is less than 70 degrees or greater than or equal to 120 degrees.

3. The X-ray analysis apparatus according to claim 2 , wherein the angle is 30 degrees.

4. 4. The X-ray analysis apparatus according to claim 1, further comprising a drive device that moves the plurality of detection elements so as to change the angle.

5. a signal processing device that analyzes the sample based on the intensities of the wavelengths detected by the plurality of detection elements and controls the drive device; The signal processing device includes: receiving from a user an input of a wavelength range for analyzing the sample; analyzing the sample based on the intensity of each wavelength included in the input wavelength range among the intensities of each wavelength detected by the plurality of detection elements; The X-ray analysis apparatus according to claim 4 , wherein the driving device is controlled to move the plurality of detection elements so that the angle has a value corresponding to a width of the wavelength range input by a user.

6. An X-ray analysis apparatus comprising: an excitation source for irradiating an excitation beam onto a sample; an analyzing crystal for dispersing characteristic X-rays generated by a sample irradiated with the excitation beam into individual wavelengths; a plurality of detection elements arranged so as to detect the intensity of each of the wavelengths separated by the analyzing crystal; the characteristic X-rays dispersed at the midpoint of the effective surface of the analyzing crystal reach the midpoints of the detection surfaces of the plurality of detecting elements; The X-ray analysis apparatus further comprises: a driving device that moves the plurality of detecting elements so as to change an angle between a direction of the characteristic X-rays dispersed at the midpoint of the effective surface of the analyzing crystal and an arrangement direction of the plurality of detecting elements; a control device that sets a first mode and a second mode, The drive device is When the first mode is set, the plurality of detection elements are moved so that the angle falls within a range of 80 degrees or more and less than 100 degrees; When the second mode is set, the X-ray analysis apparatus moves the plurality of detection elements so that the angle falls within a range of less than 80 degrees and equal to or greater than 100 degrees.

7. The X-ray analysis apparatus further includes a control device that analyzes the sample based on an X-ray spectrum generated by the wavelength of the characteristic X-ray detected by each of the plurality of detection elements and the intensity detected by each of the plurality of detection elements; 2. The X-ray analysis apparatus according to claim 1, wherein the plurality of detection elements are configured so that a range of wavelengths of characteristic X-rays detected by the entirety of the plurality of detection elements is narrower and an intensity detected by each of the plurality of detection elements is lower than when the angle is 90 degrees.

8. The control device analyzes the sample based on an X-ray spectrum generated by the wavelengths of characteristic X-rays detected by each of the plurality of detection elements and the intensities detected by each of the plurality of detection elements; 7. The X-ray analysis apparatus according to claim 6, wherein the plurality of detection elements are configured so that a range of wavelengths of characteristic X-rays detected by the entirety of the plurality of detection elements is narrower and an intensity detected by each of the plurality of detection elements is lower than when the angle is 90 degrees.

9. An X-ray analysis apparatus as described in claim 1 or claim 6, wherein the effective surface of the spectroscopic crystal is a surface onto which characteristic X-rays incident on the effective areas of the multiple detection elements are spectroscopically separated from the characteristic X-rays dispersed by the spectroscopic crystal.

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