Information processing device, simulation method, and information processing system

JP7636076B2Active Publication Date: 2025-02-26TOKYO ELECTRON LTD
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Patent Information

Application Number
JP2021093049
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2021-06-02
Publication Date
2025-02-26
Estimated Expiration
2041-06-02

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Patent Text Reader

Abstract

To construct a simulation model in which process parameters include the temperature of gas introduced into a semiconductor manufacturing apparatus.SOLUTION: An information processor that uses a simulation model of a semiconductor manufacturing apparatus to execute simulation of a condition of a process being performed in the semiconductor manufacturing apparatus includes: a physical sensor data acquisition unit that acquires physical sensor data measured by the semiconductor manufacturing apparatus that is performing the process according to process parameters; and a simulation execution unit that executes simulation using the simulation model according to the process parameters including the physical sensor data, and calculates virtual sensor data and virtual process result data. The physical sensor data acquired by the physical sensor data acquisition unit includes temperature of gas introduced into the semiconductor manufacturing apparatus that is performing the process.SELECTED DRAWING: Figure 5
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Citation Information

Patent Citations

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    JP2007507888A

  • Liquefied gas supply device and supply method

    JP2009052595A

  • Semiconductor process simulation

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    WO2020050072A1