Resist composition and method for producing resist pattern

JP7672215B2Active Publication Date: 2025-05-07SUMITOMO CHEM CO LTD
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Patent Information

Application Number
JP2020197074
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2019-12-18
Filing Date
2020-11-27
Publication Date
2025-05-07
Estimated Expiration
2040-11-27

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Abstract

To provide a resin and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: The resin contains a structural unit represented by formula (I) and a structural unit represented by formula (III), and the resist composition contains the resin. [X1 represents a single bond or -CO-O-*; Ar represents an optionally substituted tri- or tetravalent aromatic hydrocarbon group; R2 represents a hydrogen atom or an acid-labile group; n represents 2 or 3; X11 represents a single bond, -CO-O-* or the like; X12 represents a single bond, *-O-L11- or the like; L11 represents an alkanediyl group; and Ar11 represents an optionally substituted aromatic hydrocarbon group.]SELECTED DRAWING: None
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Citation Information

Patent Citations

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