Salt, acid generator, resist composition and method for producing resist pattern

JP7672231B2Active Publication Date: 2025-05-07SUMITOMO CHEM CO LTD
View PDF 5 Cites 0 Cited by

Patent Information

Application Number
JP2021016655
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2020-03-19
Filing Date
2021-02-04
Publication Date
2025-05-07
Estimated Expiration
2041-02-04

Smart Images

  • Figure 0007672231000001
    Figure 0007672231000001
  • Figure 0007672231000002
    Figure 0007672231000002
  • Figure 0007672231000003
    Figure 0007672231000003
Patent Text Reader

Abstract

To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [In the formula, R1, R2 and R3 each represent a halogen atom or a C1-6 perfluoroalkyl group, R4, R5 and R6 each represent a halogen atom, a hydroxy group, a C1-6 fluorinated alkyl group or a C1-12 alkyl group, provided that -CH2- contained in the alkyl group may be substituted with -O- or -CO-, m4 represents an integer of 0-2, m5 and m6 each represent an integer of 0-4, X1 represents a single bond, -CH2-, -O-, -S-, -CO-, -SO- or -SO2-, and AI- represents an organic anion.]SELECTED DRAWING: None
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Salt and resist composition

    JP2011037839A

  • Resist composition and method for forming resist pattern, and compound and acid generator

    JP2017111206A

  • Sulfonium salt, polymer, resist composition, and pattern forming method

    JP2019026572A

  • Salt, acid generator, resist composition, and method for producing resist pattern

    JP2019182861A

  • Active light sensitive or radiation sensitive resin composition, resist film, pattern forming method and method for manufacturing electronic device

    WO2017154345A1