Transparent conductive film and method for manufacturing the transparent conductive film

JP7672273B2Active Publication Date: 2025-05-07KANEKA CORP
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Patent Information

Application Number
JP2021069582
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2021-04-16
Publication Date
2025-05-07
Estimated Expiration
2041-04-16

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Patent Text Reader

Abstract

To provide a transparent conductive film in which increase of a sheet resistance or decline of transmittance is suppressed, and to provide its manufacturing method.SOLUTION: A glutarimide resin containing a glutarimide structure having a hydrogen atom on a nitrogen atom, and a glutarimide structure having a methyl group on a nitrogen atom, is used as a substrate, and a transparent conductive layer is formed through an optical regulation layer. Thus, not only damage onto the substrate at the transparent conductive layer formation time can be reduced but also an excellent transparent conductive film in which increase of a sheet resistance or decline of transmittance as the transparent conductive film is suppressed can be obtained.SELECTED DRAWING: Figure 2
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Citation Information

Patent Citations

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    JP2016155328A

  • Imide Resin, Production Method of Imide Resin, and Usage of Imide Resin

    US20080318072A1

  • Imide resin, and production method and use thereof

    WO2005054311A1

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    WO2015030118A1