High temperature faceplate for deposition applications
JP7672434B2Active Publication Date: 2025-05-07APPLIED MATERIALS INC
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Patent Information
- Application Number
- JP2022577124
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2020-06-17
- Filing Date
- 2021-05-18
- Publication Date
- 2025-05-07
- Estimated Expiration
- 2041-05-18
Abstract
Several embodiments of the present disclosure relate to a faceplate for a processing chamber. In one example, the faceplate includes a body having a plurality of apertures formed therethrough. A heating element is disposed within the body and surrounds the plurality of apertures. A support ring is disposed within the body. The support ring surrounds the heating element. The support ring includes a main body and a cantilever extending radially inward from the main body. The cantilever contacts the body of the faceplate.
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Citation Information
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