Semiconductor wafer manufacturing method

JP7722641B2Active Publication Date: 2025-08-13FUKUDEN MATERIALS CO LTD +1
View PDF 6 Cites 0 Cited by

Patent Information

Application Number
JP2022001711
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-01-07
Publication Date
2025-08-13
Estimated Expiration
2042-01-07

Smart Images

  • Figure 0007722641000001
    Figure 0007722641000001
  • Figure 0007722641000002
    Figure 0007722641000002
  • Figure 0007722641000003
    Figure 0007722641000003
Patent Text Reader

Abstract

To provide a method for manufacturing a semiconductor wafer that can efficiently process a semiconductor wafer with a small diameter and can be applied to a processor for a semiconductor wafer with a large diameter.SOLUTION: The method for manufacturing a semiconductor wafer includes an extraction step of extracting plural second semiconductor wafers W2 with a small diameter from a first semiconductor wafer W1 with a large diameter. In the extraction step, a first semiconductor wafer W1 is divided into a plurality of second semiconductor wafers W2 and a frame part 1 formed after the second semiconductor wafers W2 are extracted. The plurality of second semiconductor wafers W2 are arranged in hole parts 10 of the frame part 1, and a fixation tape 2 is attached to the frame part 1 and one of the front surface and the back surface of the second semiconductor wafers W2 in that state to integrate the frame part 1 and the semiconductor wafers W2 together.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Manufacture for semiconductor wafer

    JP1979024571A

  • Equipment and method for manufacturing device

    JP2012054414A

  • Auxiliary tool for adhesive sheet replacement

    JP2012072341A

  • Semiconductor wafer manufacturing method

    JP2014110411A

  • Silicon wafer manufacturing method and semiconductor device manufacturing method

    JP2016131178A