Method for producing a high-purity fluoropolymer-containing composition and a high-purity fluoropolymer-containing composition

JP7730048B2Active Publication Date: 2025-08-27DAIKIN INDUSTRIES LTD
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Patent Information

Application Number
JP2023532060
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-06-30
Filing Date
2022-06-30
Publication Date
2025-08-27
Estimated Expiration
2042-06-30

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Abstract

A method for producing a high-purity fluoropolymer-containing composition is provided in which a composition including a fluoropolymer and a polymer (I) containing a polymerized unit (I) based on a monomer (I) represented by general formula (I) is subjected to a treatment with fluorine radicals to thereby obtain the high-purity fluoropolymer-containing composition.　Formula (I): CX1X3=CX2R(-CZ1Z2-A0)m (In the formula, X1 and X3 are each independently F, Cl, H, or CF3; X2 is H, F, an alkyl group, or a fluoroalkyl group; A0 is an anionic group; R is a linking group; Z1 and Z2 are each independently H, F, an alkyl group, or a fluoroalkyl group; and m is an integer of 1 or larger.)
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Citation Information

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